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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 25. Отображено 25.
02-05-2018 дата публикации

DISPLAY DEVICE AND METHOD OF MANUFACTURING SAME

Номер: KR1020180043896A
Автор: KANG, BYUNG HOON, KIM, KWANG SUK, BAE, JOON HWA, CHO, WOO JIN, CHO, HYUN JIN, CHEON, JUN HYUK, CHOO, BYOUNG KWON
Принадлежит:

According to one embodiment of the present invention, a method of manufacturing a display device comprises the steps of: forming an active layer on a substrate; forming a first insulating layer covering the active layer; forming a gate metal line over the first insulating layer; forming a third insulating layer covering the gate metal line and including silicon oxide; forming a fourth insulating layer including silicon nitride on the third insulating layer; forming a fifth insulating layer including the silicon oxide on the fourth insulating layer; forming a barrier member on a portion in which the active layer and the gate metal line overlap each other; forming a fifth auxiliary insulating layer on a portion of the fifth insulating layer by doping the fifth insulating layer with nitrogen ions by using the barrier member as a mask; removing the barrier member; and polishing a fifth main insulating layer of the fifth insulating layer, which is not overlapping with the fifth auxiliary insulating ...

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Номер записи: 1
07-09-2016 дата публикации

LASER OPTICAL SYSTEM AND LASER ANNEALING DEVICE INCLUDING SAME

Номер: KR1020160105610A
Автор: CHO, JOO WOAN, AHN, SANG HOON, CHEONG, BYOUNG HO, CHOO, BYOUNG KWON
Принадлежит:

The present invention discloses a laser optical system. The laser optical system includes a light division unit which reflects and transmits part of a laser beam to divide a laser beam into a first beam as a transmitted beam and a second beam as reflected beam; a first reflection member which is arranged on a traveling progress path of the first beam and reflects the first beam; and a second reflection member which is arranged on the traveling path of the first beam reflected on the first reflection member, and reflects the first beam to project the first beam to the light division unit. Part of the first beam projected by the light division unit transmits the light division unit. At least part of the first beam overlaps the second beam. So, the uniformity of beam shape can be improved. COPYRIGHT KIPO 2016 ...

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Номер записи: 2
14-02-2017 дата публикации

레이저빔 어닐링 장치 및 이를 이용한 디스플레이 장치 제조방법

Номер: KR0101700392B1
Автор: 안상훈, 추병권, 정병호, 나정균, 이승환, 조주완, 조현진, 프루드니코브 올레그
Принадлежит: 삼성디스플레이 주식회사

... 본 발명은 비정질실리콘을 고품질의 폴리실리콘으로 결정화할 수 있는 레이저빔 어닐링 장치 및 이를 이용한 디스플레이 장치 제조방법을 위하여, 마스터 레이저빔을 방출할 수 있는 마스터 레이저빔 방출부와, 상기 마스터 레이저빔 방출부에서 방출된 마스터 레이저빔을 제1편광상태의 제1마스터빔과 제2편광상태의 제2마스터빔으로 스플릿할 수 있는 제1스플릿부와, 제1마스터빔의 편광 상태를 제1편광상태에서 제2편광상태로 변환시키는 제1편광부와, 편광 상태가 같아진 제1마스터빔과 제2마스터빔을 머지(merge)하는 머지부를 구비하는, 레이저빔 어닐링 장치 및 이를 이용한 디스플레이 장치 제조방법을 제공한다.

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Номер записи: 3
26-01-2016 дата публикации

LASER ANNEAL APPARATUS AND LASER ANNEAL METHOD USING SAME

Номер: KR1020160009153A
Автор: CHO, JOO WOAN, AHN, SANG HOON, CHEONG, BYOUNG HO, CHOO, BYOUNG KWON
Принадлежит:

A laser annealing apparatus comprises: a beam splitter which splits a beam, which is emitted from a laser source, into a reflection light beam and a transmission light beam; a beam vibrator which makes an irradiation point of a light beam, which is split by the beam splitter, to reciprocate and vibrate in one direction; a beam inverter which inverts the light beam, which is split by the beam splitter; and a light collector which collects the split light beam. COPYRIGHT KIPO 2016 ...

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Номер записи: 4
23-03-2023 дата публикации

기판 연마 장치

Номер: KR102512720B1
Автор: 조주완, 나정균, 배준화, 정병호, 추병권
Принадлежит: 삼성디스플레이 주식회사

... 본 발명의 일 실시예는 연마패드를 포함하는 제1축을 중심으로 회전하는 제1정반; 상기 제1정반과 대향하도록 배치되고 돌기를 포함하는 제2정반; 상기 제2정반의 돌기와 결합하는 결합홀을 포함하는 기판로딩부재; 및 상기 제2정반의 상기 돌기가 상기 기판로딩부재의 상기 결합홀과 대응하도록 상기 기판로딩부재에 삽입되어 상기 기판로딩부재를 상기 제2정반을 향해 이동시키는 이동부재;를 포함하는, 기판 연마 장치를 제공한다.

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Номер записи: 5
15-06-2015 дата публикации

LASER CRYSTALLIZING APPARATUS AND ORGANIC LIGHT EMITTING DIODE DISPLAY USING SAME

Номер: KR1020150065391A
Автор: CHO, JOO WOAN, CHEONG, BYOUNG HO, CHOO, BYOUNG KWON
Принадлежит:

An laser crystallizing apparatus according to an embodiment of the present invention may include a stage for loading an object substrate having an amorphous silicon layer, a first laser part which performs a laser crystallizing process for changing the amorphous silicon layer into a polycrystalline silicon layer, and a second laser part which performs an application process for removing a protrusion generated in the polycrystalline silicon layer. COPYRIGHT KIPO 2015 ...

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Номер записи: 6
10-12-2015 дата публикации

ACTIVE LAYER OF THIN FILM TRANSISTOR CRYSTALLIZING APPARATUS AND CRYSTALLIZING METHOD USING SAME

Номер: KR1020150138530A
Автор: CHOO, BYOUNG KWON, AHN, SANG HOON, CHEONG, BYOUNG HO, CHO, JOO WOAN, CHO, HYUN JIN, HAN, SOO YEON
Принадлежит:

According to an embodiment of the present invention, disclosed is an active layer of a thin film transistor crystallizing apparatus which includes: a first laser for irradiating a first beam to crystallize an active layer, and a second laser for irradiating a second beam to heat the active layer, and has an asymmetric shape of a profile of the second beam. COPYRIGHT KIPO 2016 ...

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Номер записи: 7
08-11-2016 дата публикации

SUBSTRATE POLISHING DEVICE

Номер: KR1020160128541A
Автор: CHO, JOO WOAN, CHO, HYUN JIN, CHOO, BYOUNG KWON, PRUDNIKOV OLEG, NA, JEONG KYUN, AHN, SANG HOON, LEE, SEUNG HWAN, CHEONG, BYOUNG HO
Принадлежит:

A substrate polishing device comprises: a support unit in which at least one substrate is arranged; first moving units configured to reciprocate in a first direction and arranged on both sides of the support unit in a second direction crossing the first direction to be extended upwardly; a second moving unit arranged between the first moving units to be connected to an upper side of the first moving units; a plurality of polishing units arranged in a lower portion of the second moving unit to contact the substrate; and a plurality of nozzles arranged in the lower portion of the second moving unit and configured to spray slurry to the substrate. The polishing units rotate and revolve along a predetermined trajectory. COPYRIGHT KIPO 2016 ...

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Номер записи: 8
07-10-2016 дата публикации

LASER CRYSTALLIZATION DEVICE AND MANUFACTURING METHOD OF SUBSTRATE INCLUDING CRYSTAL LAYER USING SAME

Номер: KR1020160116242A
Автор: CHO, JOO WOAN, CHEONG, BYOUNG HO, CHOO, BYOUNG KWON, NA, JEONG KYUN, AHN, SANG HOON, CHO, HYUN JIN
Принадлежит:

The present invention relates to a laser crystallization device capable of reducing energy waste of a laser beam when crystallizing an amorphous silicon layer and a manufacturing method of a substrate including a crystal layer using the same. The present invention includes: a stage on which a substrate with a laser beam radiation target layer can be placed; a source which radiates a laser beam along a first route onto the target layer formed on the substrate place on the stage; and a reflective mirror which reflects the laser beam generated from the source, reaching the target layer formed on the substrate placed on the stage, and then reflected and radiates the laser beam along a second route onto the target layer formed on the substrate placed on the stage. The area of the second area where the laser beam radiated along the second route on the target layer formed on the substrate placed on the stage is radiated is wider than the area of the first area where the laser beam radiated along ...

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Номер записи: 9
15-05-2017 дата публикации

LASER CRYSTALLIZATION METHOD

Номер: KR1020170052746A
Автор: BAE, JOON HWA, CHOO, BYOUNG KWON, NA, JEONG KYUN, CHEONG, BYOUNG HO, CHO, JOO WOAN
Принадлежит:

A laser crystallization method according to an embodiment of the present invention includes the steps of: forming a plurality of first uneven parts with a pitch of a nanometer size on a surface of an amorphous silicon layer; and forming a polycrystalline silicon layer by emitting a laser beam to the amorphous silicon layer. Accordingly, the present invention can reduce manufacturing costs and time. COPYRIGHT KIPO 2017 ...

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Номер записи: 10
19-09-2017 дата публикации

SUBSTRATE POLISHING APPARATUS

Номер: KR1020170105157A
Автор: CHO, JOO WOAN, NA, JEONG KYUN, BAE, JOON HWA, CHEONG, BYOUNG HO, CHOO, BYOUNG KWON
Принадлежит:

The object of the present invention is to provide a substrate polishing apparatus capable of inverting a substrate loading member and coupling the substrate loading member to a second plate at the same time. According to one embodiment of the present invention, provided is a substrate polishing apparatus comprising: a first plate rotating about a first axis including a polishing pad; a second plate disposed to face the first plate and including a projection; a substrate loading member including a coupling hole engaging with the projection of the second plate; and a moving member inserted into the substrate loading member such that the projection of the second plate corresponds to the coupling hole of the substrate loading member to move the substrate loading member toward the second plate. COPYRIGHT KIPO 2017 ...

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Номер записи: 11
12-05-2017 дата публикации

LASER CRYSTALLIZATION APPARATUS

Номер: KR1020170051613A
Автор: CHO, JOO WOAN, NA, JEONG KYUN, BAE, JOON HWA, CHEONG, BYOUNG HO, CHOO, BYOUNG KWON, PRUDNIKOV OLEG
Принадлежит:

A laser crystallization apparatus according to an embodiment of the present invention includes a laser generator for generating an incident laser beam including P polarized light and S polarized light, an optical system for converting the incident laser beam into an output laser beam, a stage for mounting a target substrate having a target thin film crystallized by the output laser beam, and a polarization tester for measuring the polarization axis direction and energy of the output laser beam that passes the optical system, feeding back polarization axis direction and energy information to the optical system and adjusting the polarization axis direction of the output laser beam. So, grain alignment can be improved. COPYRIGHT KIPO 2017 ...

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Номер записи: 12
07-12-2016 дата публикации

LASER BEAM ANNEALING DEVICE AND MANUFACTURING METHOD FOR DISPLAY DEVICE USING SAME

Номер: KR1020160139116A
Автор: AHN, SANG HOON, CHOO, BYOUNG KWON, CHEONG, BYOUNG HO, NA, JEONG KYUN, LEE, SEUNG HWAN, CHO, JOO WOAN, CHO, HYUN JIN, PRUDNIKOV OLEG
Принадлежит:

The present invention relates to a laser beam annealing device, capable of crystallizing an amorphous silicon to be polysilicon with high quality, and a manufacturing method for a display device using the same. The laser beam annealing device includes: a master laser beam discharge unit discharging a master laser beam; a first split unit splitting the master laser beam discharged by the master laser beam discharge unit into a first master beam of a first polarization state and a second master beam of a second polarization state; a first polarization unit changing a polarization state of the first master beam from the first polarization state to the second polarization state; and a merge unit merging the first master beam and the second master beam, in which the polarization states thereof become same. COPYRIGHT KIPO 2016 ...

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Номер записи: 13
27-04-2018 дата публикации

DISPLAY DEVICE AND MANUFACTUING METHOD THEREOF

Номер: KR1020180042882A
Автор: CHO, HYUN JIN, BAE, JOON HWA, CHOO, BYOUNG KWON, KANG, BYUNG HOON, KIM, KWANG SUK, CHO, WOO JIN, CHEON, JUN HYUK
Принадлежит:

According to an embodiment of the present invention, a manufacturing method of a display device comprises the steps of: forming a first gate metal line on a substrate; forming a first insulating layer covering the first gate metal line; forming a second gate metal line on the first insulating layer; forming a second main insulating layer covering the second gate metal line; forming a second auxiliary insulating layer on the second main insulating layer; polishing the second auxiliary insulating layer using a polishing device to expose a portion of an upper surface of the second main insulating layer; and forming a first data metal line on the second main insulating layer and the second auxiliary insulating layer. An upper surface of the second auxiliary insulating layer is positioned on the same horizontal plane as an exposed upper surface of the second main insulating layer. The uppermost layer of the second main insulating layer includes silicon nitride, and the second auxiliary insulating ...

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Номер записи: 14
07-07-2015 дата публикации

THIN FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND DISPLAY APPARATUS HAVING THE SAME

Номер: KR0101534009B1
Автор: 추병권, 최준후, 조규식, 박승규, 박용환, 문상호
Принадлежит: 삼성디스플레이 주식회사

... 본 발명은 기판, 상기 기판 위에 형성된 제1 게이트 전극및 제2 게이트 전극, 상기 제1 및 제2 게이트 전극 위에 형성된 게이트 절연막, 상기 게이트 절연막 위에 형성되며 상기 제1 게이트 전극과 중첩하는 제1 반도체 및 상기 제2 게이트 전극과 중첩하는 제2 반도체, 상기 제1 반도체 위에 형성되어 있으며, 서로 이격되어 마주하는 제1 소스 전극 및 제1 드레인 전극, 상기 제2 반도체 위에 형성되며 상기 제1 드레인 전극과 연결된 제2 소스 전극 및 상기 제2 소스 전극과 이격되어 마주하는 제2 드레인 전극, 및 상기 제2 드레인 전극과 전기적으로 연결되어있는 화소 전극을 포함하는 박막 트랜지스터 표시판, 이의 제조 방법 및 이를 갖는 표시 장치에 관한 것이다.

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Номер записи: 15
24-12-2018 дата публикации

THIN FILM TRANSISTOR ARRAY SUBSTRATE AND DISPLAY DEVICE USING SAME, AND METHOD FOR MANUFACTURING SAME

Номер: KR1020180136015A
Автор: CHOO, BYOUNG KWON, BAE, JOON HWA, CHO, HYUN JIN, CHEON, JUN HYUK, YOON, ZI YEON, CHO, WOO JIN, CHOI, SUNG HWAN, CHOI, JEONG HYE
Принадлежит:

A thin film transistor array substrate, a display device including the same, and a method for manufacturing the same are provided. The thin film transistor array substrate includes a substrate, a semiconductor layer disposed on the substrate, an insulating layer disposed on the semiconductor layer, and a gate electrode disposed on the insulating layer. The upper surface of the insulating layer in a region overlapping the semiconductor layer and the upper surface of the gate electrode have the same level in a plan view. The dispersion of the width of the channel of the thin film transistor array substrate can be improved. COPYRIGHT KIPO 2019 ...

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Номер записи: 16
16-02-2016 дата публикации

LASER CRYSTALLIZING DEVICE

Номер: KR1020160017363A
Автор: CHOO, BYOUNG KWON, AHN, SANG HOON, CHEONG, BYOUNG HO, CHO, JOO WOAN
Принадлежит:

According to an embodiment of the present invention, a laser crystallizing device comprises: a laser generator which generates an incident laser beam; an optical system which optically converts the incident laser beam to form an output laser beam; and a stage on which a target substrate, having a target film formed therein, is mounted wherein the target film is laser-crystalized by irradiating the output laser beam. The optical system increases pulse duration time of the incident laser beam and simultaneously comprises a pulse extender and a vertical inverting module which vertically inverts a pulse shape of the incident laser beam. COPYRIGHT KIPO 2016 ...

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Номер записи: 17
04-09-2015 дата публикации

LASER ANNEALING APPARATUS AND METHOD FOR MANUFACTURING DISPLAY APPARATUS USING SAME

Номер: KR1020150101530A
Автор: CHOO, BYOUNG KWON, AHN, SANG HOON, CHEONG, BYOUNG HO, CHO, JOO WOAN
Принадлежит:

The present invention provides a laser annealing apparatus to emit a uniform laser beam and anneal a high-quality amorphous silicon layer, and a method for manufacturing a display apparatus using the same. The laser annealing apparatus includes: a master laser beam emitting part which emits a master laser beam; a laser beam split part which splits the mater laser beam emitted from the master laser beam emitting part into master sub laser beams; phase modulators which are located on each path of the master sub laser beams split by the laser beam slit part, and modulate the phase of a passing laser beam; and a laser beam merge part which merges laser beams passed through the phase modulators. COPYRIGHT KIPO 2015 ...

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Номер записи: 18
09-05-2018 дата публикации

TRANSISTOR ARRAY PANEL MANUFACTURING METHOD AND POLISHING SLURRY USED THEREIN

Номер: KR1020180046420A
Автор: CHOO, BYOUNG KWON, PARK, JIN HYUNG, KANG, BYUNG HOON, KIM, KWANG SUK, BAE, JOON HWA, CHO, WOO JIN, CHO, HYUN JIN, CHEON, JUN HYUK
Принадлежит:

The present invention relates to a transistor array panel manufacturing method and polishing slurry used therein. According to one embodiment of the present invention, the method comprises the steps of: forming a semiconductor layer on a substrate; patterning the semiconductor layer to form an active layer; forming a first insulating film converting the substrate and the active layer; exposing the active layer by polishing the first insulating film; and forming a second insulating film covering the first insulating film and the active layer. The step of polishing the first insulating film to expose the active layer is carried out using the polishing slurry including abrasive particles, a dispersant, a dispersion stabilizer, a nonionic polishing inhibitor, and a pH regulator. Therefore, display quality of a transistor array panel can be increased by removing a step of the insulating film covering the active layer. COPYRIGHT KIPO 2018 ...

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Номер записи: 19
22-02-2018 дата публикации

TRANSISTOR DISPLAY PANEL AND MANUFACTURING METHOD THEREOF

Номер: KR1020180018974A
Автор: BAE, JOON HWA, CHOO, BYOUNG KWON, KANG, BYUNG HOON, CHO, WOO JIN, CHO, HYUN JIN, CHEON, JUN HYUK, LEE, JEE HYUN
Принадлежит:

A method for manufacturing a transistor display panel according to an embodiment of the present invention includes the steps of: forming a polycrystalline silicon layer on a substrate; forming an active layer by patterning the polycrystalline silicon layer; forming a first insulation film covering the active layer and the substrate; exposing the active layer by planarizing the first insulation film using a polishing apparatus; and forming a second insulation film in contact with the first insulation film and the active layer. The step of exposing the active layer by planarizing the first insulation film includes the step of applying first slurry to reduce a polishing rate of the active layer on the surface of the first insulation film. Accordingly, the present invention can reduce manufacturing costs and improve the characteristic of a transistor. COPYRIGHT KIPO 2018 ...

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Номер записи: 20
31-05-2017 дата публикации

THIN-FILM TRANSISTOR DISPLAY PANEL, DISPLAY DEVICE INCLUDING SAME, AND MANUFACTURING METHOD THEREOF

Номер: KR1020170059502A
Автор: CHOO, BYOUNG KWON, NA, JEONG KYUN, BAE, JOON HWA, CHEONG, BYOUNG HO, HWANG, IN SUN, KIM, MU GYEOM, CHO, JOO WOAN
Принадлежит:

According to an embodiment of the present invention, a method for manufacturing a thin-film transistor display panel includes the steps of: preparing a substrate having an amorphous silicon thin-film formed thereon; forming a polycrystalline silicon thin-film by emitting a laser beam onto the amorphous silicon thin-film; attaching the polycrystalline silicon thin-film onto a first plate; supplying slurry to the polycrystalline silicon thin-film; removing protrusions formed on the surface of the polycrystalline silicon thin-film by rotating the first plate and a second plate facing the first plate; detaching the polycrystalline silicon thin-film from the first plate; forming a semiconductor layer by patterning the polycrystalline silicon thin-film; and forming a gate insulation film on the semiconductor layer. COPYRIGHT KIPO 2017 (S100) Step of preparing a substrate having an amorphous silicon thin-film formed thereon (S101) Step of emitting laser beams onto the amorphous silicon thin-film ...

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Номер записи: 21
08-03-2017 дата публикации

LASER CRYSTALLIZING APPARATUS

Номер: KR1020170024644A
Автор: CHO, JOO WOAN, NA, JEONG KYUN, LEE, SEUNG HWAN, BAE, JOON HWA, CHEONG, BYOUNG HO, CHOO, BYOUNG KWON, PRUDNIKOV OLEG
Принадлежит:

According to an embodiment of the present invention, a laser crystallizing apparatus comprises: a laser generator to generate an incident laser beam including P-polarized light and S-polarized light; an optical system to optically convert the incident laser beam to make an exit laser beam; and a stage to load a target substrate with a target thin film laser-crystallized by emitting the exit laser beam thereto. The optical system comprises: at least one half wave plate (HWP) to change a polarization axis of a laser beam entered from the laser generator; at least one mirror to reflect the entire laser beam; and a polarization beam splitter (PBS) to reflect a portion of the laser beam while transmitting another portion of the laser beam. COPYRIGHT KIPO 2017 ...

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Номер записи: 22
31-05-2017 дата публикации

POLISHING SLURRY FOR SILICON, METHOD OF POLISHING POLYCRYSTALLINE SILICON AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE

Номер: KR1020170059529A
Автор: CHOO, BYOUNG KWON, PARK, JIN HYUNG, NA, JEONG KYUN, BAE, JOON HWA, CHEONG, BYOUNG HO, CHO, JOO WOAN, HWANG, IN SUN
Принадлежит:

Disclosed polishing slurry contains: polishing particles; a dispersing agent containing at least one from the group consisting of a negative ion-based polymer, hydroxy acid and amino acid; a stabilizing agent containing organic acid with a carboxyl group; a hydrophilicity applying agent having a hydrophobic group and a hydrophilic group; and a remainder consisting of water. The content of the polishing particles is 0.1-10 wt%, and the weight ratio between the polishing particles and the dispersing agent is 1:0.01 to 0.2. The weight ratio between the polishing particles and the stabilizing agent is 1:0.001 to 0.1, and the weight ratio between the polishing particles and the hydrophilicity applying agent is 1:0.01 to 3. COPYRIGHT KIPO 2017 ...

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Номер записи: 23
22-02-2018 дата публикации

SUBSTRATE POLISHING SYSTEM AND SUBSTRATE POLISHING METHOD

Номер: KR1020180018975A
Автор: CHO, HYUN JIN, BAE, JOON HWA, CHOO, BYOUNG KWON, KANG, BYUNG HOON, CHEON, JUN HYUK, CHOI, JEONG HYE, JEONG, YOUNG HO, CHO, WOO JIN
Принадлежит:

A substrate polishing system includes: a polishing machine including a lower plate on which a substrate is placed; and a substrate transfer device being adjacent to the polishing machine, attaching the substrate to the lower plate, separating the substrate from the lower plate, and transferring the substrate in a first direction. Accordingly, the present invention is able to easily polish a protrusion of a body to be processed. COPYRIGHT KIPO 2018 ...

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Номер записи: 24
10-04-2017 дата публикации

POLARIZATION MODULE AND LASER IRRADIATION APPARATUS INCLUDING SAME

Номер: KR1020170039005A
Автор: CHEONG, BYOUNG HO, PRUDNIKOV OLEG, NA, JEONG KYUN, BAE, JOON HWA, LEE, SEUNG HWAN, CHO, JOO WOAN, CHOO, BYOUNG KWON
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The present invention relates to a polarization module and a laser irradiation apparatus including the same. The polarization module or laser irradiation apparatus according to an embodiment of the present invention includes a first lens and a second lens which reduce the length of one direction of a cross section of an incident laser beam which is incident based on an optical axis, a polarization beam splitter which splits the laser beam passing through the first and second lenses into two laser beams polarized in mutually different directions, a first prism lens and a second prism lens which emit an output laser beam by adjusting the two laser beams split by the polarization beam splitter to a symmetrical position based on the optical axis, and at least one half wave plate which is located between the polarization beam splitter and the first prism lens. Accordingly, the present invention can control the polarization state of a laser beam with random polarization properties and can output ...

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