Synthetic diamond optical elements

An optical element 10 is made of synthetic diamond material and has an anti-reflective surface pattern 16 formed directly in at least one surface. The optical element has an absorption coefficient measured at room temperature of ≤ 0.5 cm-1 at a wavelength of 10.6 µm. It has a reflectance at said at least one surface of no more than 2% at an operating wavelength of the optical element. It has a laser induced damage threshold which is at least 30 Jcm-2 measured using a pulsed laser at a wavelength of 10.6 µm with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz and/or is at least 1 MW/cm2 measured using a continuous wave laser at a wavelength of 10.6 µm. The surface pattern may be formed by an inductively coupled plasma (ICP) etching process which minimises nitrogen-vacancy (NV) defects in single crystal chemical vapour deposition (CVD) diamond materials.

Chemical vapour deposition diamond synthesis

A method for synthesizing diamond materials by chemical vapour deposition (CVD) comprises: providing a substrate, providing a source gas and allowing homoepitaxial diamond synthesis on the substrate. The environment in which synthesis takes place comprises nitrogen at an atomic concentration of between 0.4-50 ppm and the source gas comprises; an atomic fraction of hydrogen, Hf, of 0.4-0.75, an atomic fraction of carbon, Cf, of 0.15-0.3 and an atomic fraction of oxygen, Of, of 0.13-0.4, wherein Hf+ Cf+ Of=1 and the ration of the atomic fractions of carbon and oxygen is 0.45:1 < Cf:Of < 1.25:1 and the hydrogen atoms present in the source gas are added as H2at an atomic fraction of the total number of hydrogen, oxygen and carbon atoms present of 0.05-0.4, wherein Hf, Cf, and Ofare fractions of the total number of hydrogen, oxygen and carbon atoms present in the gas source. Diamond material made by this method and its use as a gemstone or as part of an electronic device is also disclosed.

SYNTHETIC CVD DIAMOND

A chemical vapour deposition (CVD) method for synthesizing diamond material on a substrate in a synthesis environment, said method comprising: providing the substrate; providing a source gas; dissociating the source gas; and allowing homoepitaxial diamond synthesis on the substrate; wherein the synthesis environment comprises nitrogen at an atomic concentration of from about 0.4 ppm to about 50 ppm; and and wherein the source gas comprises: a) an atomic fraction of hydrogen, II f, from about 0.40 to about 0.75; b) an atomic fraction of carbon, C f, from about 0.15 to about 0.30; c) an atomic fraction of oxygen, O f, from about 0.13 to about 0.40; wherein H f - C f + O f = 1; wherein the ratio of atomic fraction of carbon to the atomic fraction of oxygen, C f:O f, satisfies the ratio of about 0.45: 1 C f:O f < about 1.25: 1; wherein the source gas comprises hydrogen atoms added as hydrogen molecules, H2, at an atomic fraction of the total number of hydrogen, oxygen and carbon atoms present of between 0.05 and 0.40; and wherein the atomic fractions H f, C f and O f are fractions of the total number of hydrogen, oxygen and carbon atoms present in the source gas.

SYNTHETIC CVD DIAMOND

A chemical vapour deposition (CVD) method for synthesizing diamond material on a substrate in a synthesis environment, said method comprising: providing the substrate; providing a source gas; dissociating the source gas; and allowing homoepitaxial diamond synthesis on the substrate; wherein the synthesis environment comprises nitrogen at an atomic concentration of from about 0.4 ppm to about 50 ppm; and and wherein the source gas comprises: a) an atomic fraction of hydrogen, II f, from about 0.40 to about 0.75; b) an atomic fraction of carbon, C f, from about 0.15 to about 0.30; c) an atomic fraction of oxygen, O f, from about 0.13 to about 0.40; wherein H f - C f + O f = 1; wherein the ratio of atomic fraction of carbon to the atomic fraction of oxygen, C f:O f, satisfies the ratio of about 0.45: 1 C f:O f < about 1.25: 1; wherein the source gas comprises hydrogen atoms added as hydrogen molecules, H2, at an atomic fraction of the total number of hydrogen, oxygen and carbon atoms present ...

Synthetic diamond optical elements

An optical element 10 is made of synthetic diamond material and has a flattened lens structure in the form of a zone plate, Fresnel lens, or aspherical lens 16 formed directly in at least one surface. The optical element has an absorption coefficient measured at room temperature of ≤ 0.5 cm-1 at a wavelength of 10.6 µm. It has a laser induced damage threshold which is at least 30 Jcm-2 measured using a pulsed laser at a wavelength of 10.6 µm with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz and/or is at least 1 MW/cm2 measured using a continuous wave laser at a wavelength of 10.6 µm. The surface pattern may be formed by an inductively coupled plasma (ICP) etching process which minimises nitrogen-vacancy (NV) defects in single crystal chemical vapour deposition (CVD) diamond materials.

Method of fabricating plates of super-hard material using a collimated cutting beam

A method of fabricating plates of super-hard material and cutting techniques suitable for such a method. A method of fabricating a plate (14) of super-hard material, the method comprising: •providing a substrate (4) have a lateral dimension of at least 40 mm; •growing a layer of super-hard material on the substrate (4) using a chemical vapor deposition process; and •slicing one or more plates (14) of super-hard material from the substrate using a collimated cutting beam (8), the or each plate of super-hard material (14) having a lateral dimension of at least 40 mm, wherein the collimated cutting beam (8) is collimated with a half angle divergence of no more than 5 degrees.

Synthetic diamond optical elements

An optical element comprising: synthetic diamond material; and an anti-reflective surface pattern formed directly in at least one surface of the synthetic diamond material, wherein the optical element has an absorption coefficient measured at room temperature of ≤0.5 cm−1 at a wavelength of 10.6 μm, wherein the optical element has a reflectance at said at least one surface of no more than 2% at an operating wavelength of the optical element, and wherein the optical element has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm−2 measured using a pulsed laser at a wavelength of 10.6 μm with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm2 measured using a continuous wave laser at a wavelength of 10.6 μm.

SYNTHESIS OF THICK SINGLE CRYSTAL DIAMOND MATERIAL VIA CHEMICAL VAPOUR DEPOSITION

A method of fabricating a plurality of single crystal CVD diamonds. The method includes mounting a plurality of single crystal diamond substrates on a first carrier substrate. The plurality of single crystal diamond substrates is subjected to a first CVD diamond growth process to form a plurality of single crystal CVD diamonds on the plurality of single crystal diamond substrates. The plurality of single crystal CVD diamonds are mounted in a recessed carrier substrate and subjected to a second CVD diamond growth process.

Chemical vapour deposition diamond synthesis

The invention relates to chemical vapour deposition (CVD) diamond synthesis and a CVD method of synthesizing diamond materials on a substrate in a synthesis environment. The method includes: providing a substrate, providing a source gas and allowing homoepitaxial diamond synthesis on the substrate. The environment in which synthesis takes place comprises nitrogen at an atomic concentration of between 0.4-50 ppm and the source gas comprises; an atomic fraction of hydrogen, Hf, of 0.4-0.75, an atomic fraction of carbon, Cf, of 0.15-0.3 and an atomic fraction of oxygen, Of, of 0.13-0.4, wherein Hf+ Cf+ Of=1 and the ration of the atomic fractions of carbon and oxygen is 0.45:1 < Cf:Of < 1.25:1 and the hydrogen atoms present in the source gas are added as H2at an atomic fraction of the total number of hydrogen, oxygen and carbon atoms present of 0.05-0.4, wherein Hf, Cf, and Ofare fractions of the total number of hydrogen, oxygen and carbon atoms present in the gas source.

Synthetic CVD diamond

The present disclosure relates to methods for synthesizing synthetic CVD diamond material and high quality synthetic CVD diamond materials.

Synthetic diamond optical elements

An optical element comprising: synthetic diamond material; and a flattened lens surface structure in the form of a zone plate, Fresnel lens, or a spherical lens formed directly in at least one surface of the synthetic diamond material, wherein the synthetic diamond material has an absorption coefficient measured at room temperature of ≤0.5 cm −1 at a wavelength of 10.6 μm, and wherein the synthetic diamond material has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm −2 measured using a pulsed laser at a wavelength of 10.6 μm with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm 2 measured using a continuous wave laser at a wavelength of 10.6 μm.

SYNTHETIC CVD DIAMOND

The present disclosure relates to methods for synthesizing synthetic CVD diamond material and high quality synthetic CVD diamond materials. 1. A chemical vapour deposition (CVD) method for synthesizing diamond material on a substrate in a synthesis environment , said method comprising:providing the substrate;providing a source gas;dissociating the source gas; andallowing homoepitaxial diamond synthesis on the substrate;wherein the synthesis environment comprises nitrogen at an atomic concentration of from about 0.4 ppm to about 50 ppm; and [{'sub': 'f', 'a) an atomic fraction of hydrogen, H, from about 0.40 to about 0.75;'}, {'sub': 'f', 'b) an atomic fraction of carbon, C, from about 0.15 to about 0.30;'}], 'and wherein the source gas comprises{'sub': 'f', 'c) an atomic fraction of oxygen, O, from about 0.13 to about 0.40;'}{'sub': f', 'f', 'f, 'wherein HCO=1;'}{'sub': f', 'f', 'f', 'f, 'wherein the ratio of atomic fraction of carbon to the atomic fraction of oxygen, C:O, satisfies the ratio of about 0.45:1 Подробнее

SYNTHETIC CVD DIAMOND

A chemical vapour deposition (CVD) method for synthesizing diamond material on a substrate in a synthesis environment, said method comprising: providing the substrate; providing a source gas; dissociating the source gas; and allowing homoepitaxial diamond synthesis on the substrate; wherein the synthesis environment comprises nitrogen at an atomic concentration of from about 0.4 ppm to about 50 ppm; and and wherein the source gas comprises: a) an atomic fraction of hydrogen, Hf, from about 0.40 to about 0.75; b) an atomic fraction of carbon, Cf, from about 0.15 to about 0.30; c) an atomic fraction of oxygen, Of, from about 0.13 to about 0.40; wherein Hf + Cf + Of = 1; wherein the ratio of atomic fraction of carbon to the atomic fraction of oxygen, Cf:Of, satisfies the ratio of about 0.45: 1 < Cf:Of < about 1.25: 1; wherein the source gas comprises hydrogen atoms added as hydrogen molecules, H2, at an atomic fraction of the total number of hydrogen, oxygen and carbon atoms present of between ...

THICK OPTICAL QUALITY SYNTHETIC POLYCRYSTALLINE DIAMOND MATERIAL WITH LOW BULK ABSORPTION AND LOW MICROFEATURE DENSITY

A poly crystalline chemical vapour deposited (CVD) diamond wafer comprising: —a diameter >40 mm; —a thickness >1.0 mm; —an absorption coefficient ≤0.1 cm−1 at 10.6 μm; and ⋅a micro feature density, especially in the form of “black spots”, meeting the following specification: —in a central area of the polycrystalline CVD diamond wafer from 0 to 20 mm radius there are no more than 100 micro features of a size between 0.002 and 0.008 mm2, no more than 50 micro features of a size between 0.008 and 0.018 mm2, no more than 25 microfeatures of a size between 0.018 and 0.05 mm2, and zero microfeatures of a size between 0.05 and 0.1 mm2, and ⋅in an outer region of the polycrystalline CVD diamond wafer from 20 to 40 mm radius there are no more than 200 microfeatures 2 of a size between 0.002 and 0.008 mm2, no more than 150 microfeatures of a size between 0.008 and 0.018 mm2, no more than 100 microfeatures of a size between 0.018 and 0.05 mm2, and zero microfeatures of a size between 0.05 and 0.1 mm2.

Synthetic CVD diamond

The present disclosure relates to methods for synthesizing synthetic CVD diamond material and high quality synthetic CVD diamond materials.

SYNTHETIC CVD DIAMOND

SYNTHETIC DIAMOND OPTICAL ELEMENTS

An optical element comprising: synthetic diamond material; and an anti-reflective surface pattern formed directly in at least one surface of the synthetic diamond material, wherein the optical element has an absorption coefficient measured at room temperature of ≦0.5 cmat a wavelength of 10.6 μm, wherein the optical element has a reflectance at said at least one surface of no more than 2% at an operating wavelength of the optical element, and wherein the optical element has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcmmeasured using a pulsed laser at a wavelength of 10.6 μm with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cmmeasured using a continuous wave laser at a wavelength of 10.6 μm. 1. An optical element comprising:synthetic diamond material; andan anti-reflective surface pattern formed directly in at least one surface of the synthetic diamond material,{'sup': '−1', 'wherein the optical element has an absorption coefficient measured at room temperature of ≦0.5 cmat a wavelength of 10.6 μm,'}wherein the optical element has a reflectance at said at least one surface of no more than 2% at an operating wavelength of the optical element, andwherein the optical element has a laser induced damage threshold meeting one or both of the following characteristics:{'sup': '−2', 'the laser induced damage threshold is at least 30 Jcmmeasured using a pulsed laser at a wavelength of 10.6 μm with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and'}{'sup': '2', 'the laser induced damage threshold is at least 1 MW/cmmeasured using a continuous wave laser at a wavelength of 10.6 μm.'}2. An optical element according to claim 1 , wherein the operating wavelength is selected from one of: 10.6 μm; 1.06 μm; 532 nm; 355 nm; or 266 nm.3. (canceled)4. An optical ...

SYNTHETIC DIAMOND OPTICAL ELEMENTS

An optical element comprising: synthetic diamond material; and a flattened lens surface structure in the form of a zone plate, Fresnel lens, or a spherical lens formed directly in at least one surface of the synthetic diamond material, wherein the synthetic diamond material has an absorption coefficient measured at room temperature of ≦0.5 cmat a wavelength of 10.6 μm, and wherein the synthetic diamond material has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcmmeasured using a pulsed laser at a wavelength of 10.6 μm with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cmmeasured using a continuous wave laser at a wavelength of 10.6 μm. 1. An optical element comprising:synthetic diamond material; anda flattened lens surface structure in the form of a zone plate, Fresnel lens, or aspherical lens formed directly in at least one surface of the synthetic diamond material,{'sup': '−1', 'wherein the synthetic diamond material has an absorption coefficient measured at room temperature of ≦0.5 cmat a wavelength of 10.6 μm, and'}wherein the synthetic diamond material has a laser induced damage threshold meeting one or both of the following characteristics:{'sup': '−2', 'the laser induced damage threshold is at least 30 Jcmmeasured using a pulsed laser at a wavelength of 10.6 μm with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and'}{'sup': '2', 'the laser induced damage threshold is at least 1 MW/cmmeasured using a continuous wave laser at a wavelength of 10.6 μm.'}2. An optical element according to claim 1 ,{'sup': −2', '−2', '−2', '−2', '−2, 'wherein the laser induced damage threshold is at least 50 Jcm, 75 Jcm, 100 Jcm, 150 Jcm, or 200 Jcmmeasured using said pulsed laser.'}3. An optical element according to claim 1 ,{'sup': 2', '2', '2', '2, 'wherein the ...

A method of fabricating plates of super-hard material using a collimated cutting beam

A method of fabricating plates of super-hard material and cutting techniques suitable for such a method. A method of fabricating a plate ( 14 ) of super-hard material, the method comprising: • providing a substrate ( 4 ) have a lateral dimension of at least 40 mm; • growing a layer of super-hard material on the substrate ( 4 ) using a chemical vapour deposition process; and • slicing one or more plates ( 14 ) of super-hard material from the substrate using a collimated cutting beam ( 8 ), the or each plate of super-hard material ( 14 ) having a lateral dimension of at least 40 mm, wherein the collimated cutting beam ( 8 ) is collimated with a half angle divergence of no more than 5 degrees.

Synthetic diamond optical elements

An optical element comprising: synthetic diamond material; and an anti-reflective surface pattern formed directly in at least one surface of the synthetic diamond material, wherein the optical element has an absorption coefficient measured at room temperature of ≤ 0.5 cm -1 at a wavelength of 10.6 µm, wherein the optical element has a reflectance at said at least one surface of no more than 2% at an operating wavelength of the optical element, and wherein the optical element has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm -2 measured using a pulsed laser at a wavelength of 10.6 µm with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm 2 measured using a continuous wave laser at a wavelength of 10.6 µm.

Synthetic diamond optical elements

An optical element comprising: synthetic diamond material; and a flattened lens surface structure in the form of a zone plate, Fresnel lens, or a spherical lens formed directly in at least one surface of the synthetic diamond material, wherein the synthetic diamond material has an absorption coefficient measured at room temperature of ≤ 0.5 cm -1 at a wavelength of 10.6 μm, and wherein the synthetic diamond material has a laser induced damage threshold meeting one or both of the following characteristics: the laser induced damage threshold is at least 30 Jcm -2 measured using a pulsed laser at a wavelength of 10.6 μm with a pulse duration of 100 ns and a pulse repetition frequency in a range 1 to 10 Hz; and the laser induced damage threshold is at least 1 MW/cm 2 measured using a continuous wave laser at a wavelength of 10.6 μm.

Diamond lens

A diamond lens (3) configured for use in a multispectral imaging system (1). The diamond lens (3) has a largest linear dimension of at least 10 mm and is formed from diamond material having a birefringence An of greater than 1x10 -4 , measured over a specified area of at least 4 mm by 4 mm through a maximum thickness of at least 400 μm. A multispectral imaging system (1) comprising the diamond lens (3) and a component (2) comprising the diamond lens are also described.

Methods and systems for processor agnostic encryption management

A method for securing memory via an external memory controller, that includes receiving, by the external memory controller, an allocation request to allocate a memory region from a processor core, and in response to receiving the allocation request, allocating the memory region from the memory, associating the processor core with the memory region, and associating an encryption key and a decryption key with the memory region.

Thick optical quality synthetic polycrystalline diamond material with low bulk absorption and low microfeature density

A poly crystalline chemical vapour deposited (CVD) diamond wafer comprising: ∙ a diameter > 40 mm; ∙ a thickness > 1.0 mm; ∙ an absorption coefficient ≤ 0.1 cm-1 at 10.6 μm; and ∙ a micro feature density, especially in the form of "black spots", meeting the following specification: ∙ in a central area of the polycrystalline CVD diamond wafer from 0 to 20 mm radius there are no more than 100 micro features of a size between 0.002 and 0.008 mm2, no more than 50 micro features of a size between 0.008 and 0.018 mm2, no more than 25 microfeatures of a size between 0.018 and 0.05 mm2, and zero microfeatures of a size between 0.05 and 0.1 mm2, and ∙ in an outer region of the polycrystalline CVD diamond wafer from 20 to 40 mm radius there are no more than 200 microfeatures 2 of a size between 0.002 and 0.008 mm2, no more than 150 microfeatures of a size between 0.008 and 0.018 mm2, no more than 100 microfeatures of a size between 0.018 and 0.05 mm2, and zero microfeatures of a size between 0.05 and 0.1 mm2.

Thick optical quality synthetic polycrystalline diamond material with low bulk absorption and low microfeature density

A poly crystalline chemical vapour deposited (CVD) diamond wafer comprising: ∙ a diameter > 40 mm; ∙ a thickness > 1.0 mm; ∙ an absorption coefficient ≤ 0.1 cm -1 at 10.6 μm; and ∙ a micro feature density, especially in the form of "black spots", meeting the following specification: ∙ in a central area of the polycrystalline CVD diamond wafer from 0 to 20 mm radius there are no more than 100 micro features of a size between 0.002 and 0.008 mm 2 , no more than 50 micro features of a size between 0.008 and 0.018 mm 2 , no more than 25 microfeatures of a size between 0.018 and 0.05 mm 2 , and zero microfeatures of a size between 0.05 and 0.1 mm 2 , and ∙ in an outer region of the polycrystalline CVD diamond wafer from 20 to 40 mm radius there are no more than 200 microfeatures 2 of a size between 0.002 and 0.008 mm 2 , no more than 150 microfeatures of a size between 0.008 and 0.018 mm 2 , no more than 100 microfeatures of a size between 0.018 and 0.05 mm 2 , and zero microfeatures of a size between 0.05 and 0.1 mm 2 .

Thick optical quality synthetic polycrystalline diamond material with low bulk absorption and low microfeature density