15-06-2017 дата публикации
Номер: US20170170131A1
Принадлежит:
A semiconductor substrate comprises both vertical interconnects and vertical capacitors with a common dielectric layer. The substrate can be suitably combined with further devices to form an assembly. The substrate can be made in etching treatments including a first step on the one side, and then a second step on the other side of the substrate. 2. A method as claimed in claim 1 , wherein the first trenches and the second trenches are etched in a single step claim 1 , said first trenches having a smaller diameter than the second trenches leading to the through-holes claim 1 , with the result that the second trenches will extend further into the substrate than the first trenches claim 1 , said trenches having inner faces.3. A method as claimed in claim 2 , characterized in that the step of applying conductive material in the second trenches comprises the steps of applying a seed layer and electroplating.4. A method as claimed in claim 2 , characterized in that a plurality of second trenches are neighbouring and mutually interconnected so as to form a single vertical interconnect.5. A method as claimed in claim 4 , wherein the electrically conductive material applied in the first and the second trenches is polysilicon.6. A method as claimed in claim 1 , wherein the step of removing material for opening the second trenches comprises the step of wet-chemical etching to form a cavity claim 1 , said cavity having a larger diameter than the second trenches.7. A method as claimed in claim 1 , wherein the second trenches are formed by wet-chemical etching from the second side of the substrate before provision of the first trenches claim 1 , said second trenches being shaped as cavities and have a larger diameter than the first trenches.8. A method as claimed in claim 7 , wherein the second trenches are opened by etching in the same step as the etching of the first trenches.9. A method as claimed in claim 7 , wherein the second trenches extend up to the first side of the ...
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