BURST ATOMIZATION FRACTIONATION SYSTEM, METHOD AND APPARATUS

Systems, methods and apparatus for fractioning mixtures comprising combinations of volatiles, essentially non-volatiles and non-volatile solutes are disclosed. Embodiments of a burst atomization fractionation apparatus comprises an atomization chamber into which a liquid mixture is atomized across a pressure gradient. In various embodiments, a mixture for fractionation comprises mixtures of solvents, solvents and oils, used engine oil, or salt water. In various examples, a solute undergoes a chemical transformation during the fractionation process, such as dehydrogenation, dehydration, or decarboxylation. 1. A burst atomization fractionation apparatus comprising:an atomization chamber having interior walls defining an interior, the atomization chamber fitted with an atomizer fluidically connecting a liquid feed inlet to the interior of the atomization chamber, the atomizer configured to atomize a liquid mixture from the liquid feed inlet into the interior of the atomization chamber in the form of atomized fine particles;a vacuum pump fluidically connecting the interior of the atomization chamber through a vapor outlet to an environment outside the atomization chamber; anda liquid outlet fluidically connecting the interior of the atomization chamber to an environment outside the atomization chamber.2. The burst atomization fractionation apparatus of claim 1 , wherein the atomizer comprises an atomization nozzle or an ultrasonic nebulizer.3. The burst atomization fractionation apparatus of claim 1 , further comprising a liquid feed tank fluidically connected to the liquid feed inlet claim 1 , the liquid feed tank configured to feed a liquid mixture contained in the liquid feed tank to the liquid feed inlet.4. The burst atomization fractionation apparatus of claim 3 , further comprising a pressurized tank of process gas fluidically connected to at least one of the liquid feed tank or the liquid feed inlet claim 3 , the pressurized tank of process gas configured to ...

SYSTEMS AND METHODS FOR COATING SURFACES

A chemical vapor deposition system for coating one or more workpieces is described herein. The deposition system includes a plurality of processing chambers which may be operated independently to increase throughput of the deposition system. Each chamber includes a modular fixture that is configured to maintain the workpieces in a predetermined arrangement which allows for a hollow cathode effect to be maintained in an Interior space of the chamber. The deposition system achieves significantly faster, higher-quality deposition and more complete, conformal coverage. 1150119. A chemical vapor deposition system () for coating one or more workpieces () , the system comprising:{'b': 101', '113', '115', '117', '113', '117', '111', '117', '101, 'a. an openable hollow chamber () comprising (i) a first end (), (ii) an opposing second end (), (iii) an interior space () between the first end () and the second end (), and (iv) a movable door () for accessing the interior space () of the chamber ();'}{'b': 103', '101', '103', '117', '101', '103', '101, 'b. a modular, tubular shield () lining an interior surface of the chamber (), wherein the tubular shield () is sized to fit within the interior space () of the chamber (), wherein the tubular shield () is effective to prevent deposition of the coating onto the interior surface of the chamber ();'}{'b': 125', '113', '115', '101, 'c. one or more anodes () positioned on the first and second ends (, ) of the chamber (); and'}{'b': 131', '101', '131', '119', '101, 'd. a DC power supply () operably coupled to the chamber (), wherein the DC power supply () is configured to apply a negative pulse for biasing the one or more workpieces () and the chamber () as cathodes,'}{'b': 119', '101', '111', '117', '101', '117', '101', '129', '117', '101', '119', '111', '103', '117', '101, 'wherein the one or more workpieces () are loaded and unloaded from the chamber () via the moveable door (), wherein the workpieces are positioned inside the ...

METHOD FOR PRODUCING AMORPHOUS CARBON COATINGS ON EXTERNAL SURFACES USING DIAMONDOID PRECURSORS

The invention relates to a method for depositing high spcontent amorphous carbon coatings onto external surfaces. This method allows adjustment of tribological properties, such as hardness, Young's modulus, wear resistance, and coefficient of friction as well as optical properties, such as refractive index. In addition, the resulting coatings are uniform and have high corrosion resistance. By controlling pressure, type of diamondoid precursor, and bias voltage, the method prevents the diamondoid precursor from fully breaking upon impact with the substrate. The diamondoid retains spbonds which yields a high spcontent film. This enables a faster deposition rate than would be possible without the use of a diamondoid precursor. 2202215. The system of claim 1 , wherein a plasma beam source is established in a region adjacent the substrate () by introducing a diamondoid precursor into the region and ionizing the diamondoid precursor via a first power supply ().3202217202202202. The system of claim 2 , wherein a negative bias is applied to the substrate () via a second power supply () claim 2 , wherein ionization of the diamondoid precursor results in a formation of a plasma claim 2 , wherein the plasma diffuses to the substrate () from the region adjacent the substrate () claim 2 , wherein selection of the pressure and the negative bias results in deposition of the diamond-like carbon coating onto the external surface of the substrate ().4215217. The system of claim 3 , wherein the first power supply () is a radio frequency (“RF”) generator and the second power supply () is a DC pulsed power supply.5215. The system of claim 4 , wherein an RF matching network claim 4 , coupled to the first power supply () claim 4 , compensates for an impedance of the plasma to effectively maximize power absorbed by the plasma.6. The system of claim 2 , wherein the diamondoid precursor is an adamantane claim 2 , a diamantane claim 2 , a triamantane claim 2 , or combinations thereof.7. The ...

MULTIPLE ANODE PLASMA FOR CVD IN A HOLLOW ARTICLE

A method and apparatus for plasma enhanced chemical vapor deposition to an interior region of a hollow, tubular, high aspect ratio workpiece are disclosed. A plurality of anodes are disposed in axially spaced apart arrangement, to the interior of the workpiece. A process gas is introduced into the region. A respective individualized DC or pulsed DC bias is applied to each of the anodes. The bias excites the process gas into a plasma. The workpiece is biased in a hollow cathode arrangement. Pressure is controlled in the interior region to maintain the plasma. An elongated support tube arranges the anodes, and receives a process gas tube. A current splitter provides a respective selected proportion of a total current to each anode. One or more notch diffusers or chamber diffusers may diffuse the process gas or a plasma moderating gas. Plasma impedance and distribution may be controlled using various means. 1. An apparatus for chemical vapor deposition to an elongated interior region of a hollow tubular workpiece , comprising:a plurality of anodes in axial spaced apart arrangement, dimensioned to be distributed along an elongated interior region of a hollow conductive workpiece;an electrical biasing circuit connected to provide an individualized DC or pulsed DC bias to each of the plurality of anodes; anda gas supply conduit connectable to deliver a process gas to the interior region of the workpiece at a pressure of the interior region of the workpiece controlled to achieve a plasma.2. The apparatus of wherein the plasma includes at least a portion having a hollow cathode effect.3. The apparatus of further comprising an elongated support tube containing the plurality of anodes and dimensioned to fit into the elongated interior region of the workpiece.4. The apparatus of wherein the elongated support tube has at least one anode slot and at least one electron access hole.5. The apparatus of further comprising at least one gas diffuser that diffuses the process gas from ...

Plasma nitriding with pecvd coatings using hollow cathode ion immersion technology

Rapid plasma nitriding is achieved by harnessing the power and increased density of plasma discharges created by hollow cathodes. When opposing surfaces are maintained at the proper voltage, sub atmospheric pressure, and spacing, a phenomenon known as the hollow cathode effect creates additional hot oscillating electrons capable of multiple ionization events thereby increasing the number of ions and electrons per unit volume (plasma density). The present invention describes the harnessing of this phenomenon to rapidly plasma nitride metal surfaces and optionally rapidly deposit functional coatings in a continuous operation for duplex coatings.

High throughput continuous operation reactor system

A modular, offset In-line vacuum processing system is disclosed. The system comprises a plurality of independently operable process chambers each configured to accommodate a given number of carriers, where each carrier may hold a set of independently biased substrates. Further, each process chamber may be configured to execute one or more steps in one or more processes performed on each set of substrates. A plurality of Independently operable transfer chambers may be configured to transfer each carrier to and from process chambers for completing each step in the one or more processes. As a result, the system is able to: simultaneously coat the sets of substrates via a designated coating process (i.e., unique to each set of carriers); obtain a set of desired coating properties for each set of parts; perform processes having varying process step lengths; coat parts of multiple geometries; shut down individual chambers without interrupting production capacity.

Systems and methods for coating surfaces

A chemical vapor deposition system for coating one or more workpieces is described herein. The deposition system includes a plurality of processing chambers which may be operated independently to increase throughput of the deposition system. Each chamber includes a modular fixture that is configured to maintain the workpieces in a predetermined arrangement which allows for a hollow cathode effect to be maintained in an Interior space of the chamber. The deposition system achieves significantly faster, higher-quality deposition and more complete, conformal coverage.

Systems and methods for coating surfaces

Chemical vapor deposition for an interior of a hollow article with high aspect ratio

A method and apparatus for plasma enhanced chemical vapor deposition to an interior region of a hollow, tubular, high aspect ratio workpiece are disclosed. A plurality of anodes are disposed in axially spaced apart arrangement, to the interior of the workpiece. A process gas is introduced into the region. A respective individualized DC or pulsed DC bias is applied to each of the anodes. The bias excites the process gas into a plasma. The workpiece is biased in a hollow cathode arrangement. Pressure is controlled in the interior region to maintain the plasma. An elongated support tube arranges the anodes, and receives a process gas tube. A current splitter provides a respective selected proportion of a total current to each anode. One or more notch diffusers or chamber diffusers may diffuse the process gas or a plasma moderating gas. Plasma impedance and distribution may be controlled using various means.

Plasma nitriding with PECVD coatings using hollow cathode ion immersion technology

Rapid plasma nitriding is achieved by harnessing the power and increased density of plasma discharges created by hollow cathodes. When opposing surfaces are maintained at the proper voltage, sub atmospheric pressure, and spacing, a phenomenon known as the hollow cathode effect creates additional hot oscillating electrons capable of multiple ionization events thereby increasing the number of ions and electrons per unit volume (plasma density). The present invention describes the harnessing of this phenomenon to rapidly plasma nitride metal surfaces and optionally rapidly deposit functional coatings in a continuous operation for duplex coatings.

Method for producing amorphous carbon coatings on external surfaces using diamondoid precursors

The invention relates to a method for forming high sp 3 content amorphous carbon coatings deposited by plasma enhanced chemical vapor deposition on external surfaces. This method allows adjustment of tribological properties, such as hardness, Young's modulus, wear resistance and coefficient of friction as well as optical properties, such as refractive index. In addition the resulting coatings are uniform and have high corrosion resistance. By controlling pressure, type of diamondoid precursor and bias voltage, the new method prevents the diamondoid precursor from fully breaking upon impact with the substrate. The diamondoid retains sp 3 bonds which yields a high sp 3 content film at higher pressure. This enables a faster deposition rate than would be possible without the use of a diamondoid precursor.

Method for producing amorphous carbon coatings on external surfaces using diamondoid precursors

The invention relates to a method for forming high sp3 content amorphous carbon coatings deposited by plasma enhanced chemical vapor deposition on external surfaces. This method allows adjustment of tribological properties, such as hardness, Young's modulus, wear resistance and coefficient of friction as well as optical properties, such as refractive index. In addition the resulting coatings are uniform and have high corrosion resistance. By controlling pressure, type of diamondoid precursor and bias voltage, the new method prevents the diamondoid precursor from fully breaking upon impact with the substrate. The diamondoid retains sp3 bonds which yields a high sp3 content film at higher pressure. This enables a faster deposition rate than would be possible without the use of a diamondoid precursor.

Plasma nitriding with pecvd coatings using hollow cathode ion immersion technology

Rapid plasma nitriding is achieved by harnessing the power and increased density of plasma discharges created by hollow cathodes. When opposing surfaces are maintained at the proper voltage, sub atmospheric pressure, and spacing, a phenomenon known as the hollow cathode effect creates additional hot oscillating electrons capable of multiple ionization events thereby increasing the number of ions and electrons per unit volume (plasma density). The present invention describes the harnessing of this phenomenon to rapidly plasma nitride metal surfaces and optionally rapidly deposit functional coatings in a continuous operation for duplex coatings.

High throughput continuous operation reactor system

A modular, offset In-line vacuum processing system is disclosed. The system comprises a plurality of independently operable process chambers each configured to accommodate a given number of carriers, where each carrier may hold a set of independently biased substrates. Further, each process chamber may be configured to execute one or more steps in one or more processes performed on each set of substrates. A plurality of Independently operable transfer chambers may be configured to transfer each carrier to and from process chambers for completing each step in the one or more processes. As a result, the system is able to: simultaneously coat the sets of substrates via a designated coating process (i.e., unique to each set of carriers); obtain a set of desired coating properties for each set of parts; perform processes having varying process step lengths; coat parts of multiple geometries; shut down individual chambers without interrupting production capacity.