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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Форма поиска

Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 5. Отображено 5.
11-12-2014 дата публикации

DEVICE FOR COLLECTING BODY FLUIDS

Номер: US20140364764A1

The present invention relates to a device for collecting body fluids, the device comprising: (a) an internal pressure adjustment means for adjusting the internal pressure of the device, and the internal pressure adjustment means has an internal space and is made of an elastic deformable material; (b) a fluid accommodation means, which is openly connected to the internal pressure adjustment means, for accommodating body fluids collected from the human body; and (c) a perforation means which is connected to the fluid accommodation means, is located at the lower part of the device, and comprises a hollow microstructure for forming an opening on the body. 1. A device for extraction of body fluids , the device comprising:(a) an internal pressure regulator made of an elastically deformable material and having an internal space therein, the internal pressure regulator regulating the internal pressure of the device;(b) a fluid reservoir openly connected to the internal pressure regulator and receiving body fluids extracted from the body; and(c) a perforator connected to the fluid reservoir and disposed at a lower portion of the device, the perforator including a hollow microstructure that forms a hole in the body.2. The device of claim 1 , further comprising an outlet valve connected to the fluid reservoir and an inlet valve provided between the fluid reservoir and the hollow microstructure.3. The device of claim 1 , wherein the elastically deformable material is an epoxy polymer claim 1 , a silicon polymer claim 1 , or an acrylic polymer.4. The device of claim 1 , wherein the internal pressure regulator is deformed from its shape by a downward external pressure claim 1 , resulting in reducing the volume of the internal space claim 1 , thereby applying a perforation force to allow the hollow microstructure in contact with a body surface barrier to perforate the body surface barrier.5. The device of claim 2 , wherein the internal pressure regulator is deformed from its shape ...

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09-01-2020 дата публикации

Method and Device for Manufacturing Dissolving Microneedle

Номер: US20200009767A1
Автор: LI Chengguo
Принадлежит:

A method and a device for manufacturing dissolving microneedle, wherein the method comprises manufacturing a mold with a plurality of microporous cavities, and manufacturing a polymer solution to be sprayed into the microporous cavity by a high pressure spraying device to enable the sprayed solution to fill in each microporous cavity. After the dryness of the solution, a microneedle is extracted from the mold. The process for manufacturing the microneedle is without vacuum pumping or any load of centrifugal force, and the process is simple and the excellent rate is high. 1. A method for manufacturing dissolving microneedle , comprising manufacturing a microneedle mold , said microneedle mold has a plurality of microporous cavities , wherein a polymer solution is sprayed into the microporous cavity by a high pressure spraying device to enable the polymer solution to fill into each of the microporous cavities; and the solidified microneedle are extracted from the microneedle mold after the dryness of polymer solution.2. The method for manufacturing dissolving microneedle according to claim 1 , wherein said polymer solution sprayed into the microporous cavity by the high pressure spray device comprises the atomized polymer solution sprayed into the microporous cavity by a high pressure atomizing device.3. The method for manufacturing dissolving microneedle according to claim 2 , wherein the particle size of said atomized polymer solution sprayed by the high pressure atomizing device ranges from 0.1 to 100 micrometers.4. The method for manufacturing dissolving microneedle according to claim 1 , wherein said polymer solution sprayed into the microporous cavity by the high pressure spray device comprises the droplets of the polymer solution sprayed to the microporous cavity by the high pressure spotting device.5. The method for manufacturing dissolving microneedle according to claim 4 , wherein the particle size of said droplets of the polymer solution sprayed by the high ...

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11-07-2019 дата публикации

MICROSTRUCTURE USING WATERPROOF THIN FILM AND MANUFACTURING METHOD THEREFOR

Номер: US20190209822A1
Принадлежит:

The present invention relates to a microstructure and a manufacturing method therefor, the method comprising the steps of: (a) forming a water-soluble microstructure core on a substrate; and (b) forming a waterproof thin film on the water-soluble microstructure core. 1. A method for manufacturing a microstructure , the method comprising the steps of:(a) forming a water-soluble microstructure on a substrate; and(b) forming a waterproof thin film on the water-soluble microstructure core.2. The method of claim 1 , wherein the water-soluble microstructure core comprises a drug or an additive.3. The method of claim 1 , wherein the waterproof thin film comprises one or more waterproof polymers selected from the group consisting of a parylene-based polymer claim 1 , an ethylene-based polymer claim 1 , an ester-based polymer claim 1 , an acrylic polymer claim 1 , an acetyl-based polymer claim 1 , a styrene-based polymer claim 1 , a Teflon-based polymer claim 1 , a vinyl chloride-based polymer claim 1 , a urethane-based polymer claim 1 , a nylon-based polymer claim 1 , a sulfone-based polymer claim 1 , an epoxy-based polymer claim 1 , a fluorine-based polymer claim 1 , and a silicone-based polymer.4. The method of claim 1 , wherein the waterproof thin film has a thickness of 10 nm to 10 μm.5. The method of claim 1 , further comprising the step of (c) depositing a metal onto the waterproof thin film claim 1 , and then plating the waterproof thin film.6. The method of claim 5 , further comprising the step of (d) separating the substrate claim 5 , and then removing the water-soluble microstructure core.7. A microstructure comprising:a substrate;a water-soluble microstructure core formed on the substrate; anda waterproof thin film formed on the water-soluble microstructure core.8. The microstructure of claim 1 , wherein the water-soluble microstructure core comprises a drug or an additive.9. The microstructure of claim 1 , wherein the waterproof thin film comprises one or more ...

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05-10-2017 дата публикации

One-touch device for collecting fluid

Номер: US20170285056A1
Автор: Chengguo Li, Hyung II Jung
Принадлежит: Juvic Inc

The present invention relates to a device for collecting body fluids including (a) a fluid receiving part including a fluid receiving space in which an internal low pressure less than an external atmospheric pressure is formed; (b) a fluid collection part including a hollow microstructure connected to form an open system with the fluid receiving space of the fluid receiving part; and (c) a microstructure hollow barrier for blocking the hollow of the microstructure to maintain the internal low pressure formed in the fluid receiving means.

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14-12-2023 дата публикации

Manufacturing method for n-polar gan transistor structure and semiconductor structure

Номер: US20230402525A1

Embodiments of the present application relate to the technical field of semiconductors, and provide a manufacturing method for an N-polar GaN transistor structure and a semiconductor structure. A Ga-polar epitaxial functional layer is formed by depositing, a supporting substrate is formed on the epitaxial functional layer by bonding, after the epitaxial structure is inverted, a structural substrate and a buffer layer are removed, and a source, a drain, and a gate are manufactured on the side of the exposed epitaxial functional layer away from the supporting substrate, to form an N-polar GaN transistor structure.

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