Imaging apparatus and imaging method

An imaging apparatus analyzes a periodic pattern of a Moiré due to Talbot interference by the Fourier transform method and forms an image. The imaging apparatus includes a first grating having a structure that transmits light beams from a beam source to refract or diffract the light beams and forms a self image based on a first periodic pattern by the Talbot interference at a predetermined position; a second grating that absorbs part of the first periodic pattern and causes a Moiré to be generated based on a second periodic pattern when the second grating is arranged at a position at which the self image is formed. All cross sections of the Moiré with axes in differential directions of a wavefront for the analysis by the Fourier transform method have a two-dimensional periodic structure in which periods of patterns in the second periodic pattern are the same.

X-RAY IMAGING APPARATUS, X-RAY IMAGING METHOD, AND X-RAY IMAGING PROGRAM

An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

Exposure apparatus and device manufacturing method using the same

An exposure apparatus includes an illumination optical system for illuminating a pattern of a reticle with laser light outputted from a continuous emission laser, a projection optical system for projecting the illuminated pattern onto a subject to be exposed, and an interferometer, of a Fizeau type, being operable while using laser light outputted from the continuous emission laser.

Measuring device and measuring method

A wavefront measuring device is disclosed which is capable of measuring an average wavefront and the retardation of a lens including birefringence. The measuring device includes a light source for emitting a linearly polarized light; a polarization orientation setting member for switching the polarization orientation of the light flux from the light source between at least two orientations; a light synthesizing member for synthesizing the light flux after passing the light fluxes through an object to be measured and a reference surface; an analyzer for switching the polarization orientation so as to pass only the same polarized component as the polarized light incident on the object to be measured; an image pickup member for detecting interference information of the light flux obtained through the analyzer; and a calculating section for calculating the average wavefront and/or the retardation of the object to be measured.

X-RAY IMAGING APPARATUS

Provided is an X-ray imaging apparatus having simple configuration and obtaining differential phase contrast images in two directions crossing each other without rotating the diffraction grating and the masking grating. The apparatus including: a diffraction grating diffracting X-rays; a masking grating masking portions rays and transmitting portions are two-dimensionally arranged to partially mask bright zones of the interference pattern; a moving device changing the relative position between the interference pattern and the masking grating; a detector detecting the intensity distribution of the X-rays transmitted through the masking grating; and a calculator calculating a differential phase contrast image or a phase contrast image of a subject, the calculator being configured to calculate the differential phase contrast image or the phase contrast image in each of two mutually crossing directions on the basis of results of detection performed a plurality of times by the detector. 1. An X-ray imaging apparatus comprising:a diffraction grating which diffracts X-rays emitted from an X-ray source to thereby form an interference pattern having two-dimensionally arranged bright and dark zones;a masking grating in which masking portions for masking the X-rays and transmitting portions for transmitting the X-rays are two-dimensionally arranged to partially mask each of the bright zones of the interference pattern;a moving device which changes the relative position between the interference pattern and the masking grating;a detector which detects an intensity distribution of the X-rays transmitted through the masking grating; anda calculator which calculates a differential phase contrast image or a phase contrast image of a subject on the basis of the result of detection performed by the detector, the calculator being configured to calculate the differential phase contrast image or the phase contrast image in each of two mutually crossing directions on the basis of results ...

Wavefront aberration measuring method, mask, wavefront aberration measuring device, exposure apparatus, and device manufacturing method

A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.

Interference system and semiconductor exposure apparatus having the same

Disclosed is a Fizeau interference system for causing interference between reflection lights from a reflection surface and a semi-transmission surface, respectively, disposed along one and the same optical axis. The interference system includes a light source, an optical path difference applying optical system for dividing light from the light source into two lights and for re-combining them, and an interference optical system for causing reflection of the two lights passed through the optical path difference applying optical system, at corresponding one of the reflection surface and the semi-transmission surface, and to cause interference of them, wherein a difference ΔF in optical path length of the light reflected by the reflection surface and with respect to the light reflected by the semi-transmission surface satisfies a relation |ΔD−ΔF|<ΔL , where the optical path difference ΔD between the two lights as applied by the optical path difference applying optical system is ΔD, and the ...

Measurement apparatus, exposure apparatus having the same, and device manufacturing method

A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/ where Pg is a grating pitch of the diffraction grating, is a wavelength of the measurement light, and m is an integer except for 0.

X-ray imaging apparatus, X-ray imaging method, and X-ray imaging program

An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

Interference system and semiconductor exposure apparatus having the same

An exposure apparatus for exposing a substrate with a pattern of an original includes a projection optical system for projecting the pattern of the original onto the substrate with light from a light source, and an interferometer for measuring an optical characteristic of the projection optical system by use of the light from the light source, which passes a pinhole and the projection optical system. The pinhole has a diameter which is smaller than a diameter of an Airy disc.

Exposure apparatus and device manufacturing method using the same

Disclosed is a projection exposure apparatus including an illumination optical system for illuminating a pattern of a reticle with laser light outputted from a continuous emission laser, a projection optical system for projecting the illuminated pattern onto a wafer to be exposed, and an interferometer operable while using laser light outputted from the continuous emission laser. This structure enables use of the laser light outputted from the continuous emission laser, both for the exposure process and for the measurement. Thus, an interferometer can be incorporated into the exposure apparatus while avoiding bulkiness of the same.

IMAGING APPARATUS AND IMAGING METHOD

An imaging apparatus analyzes a periodic pattern of a Moiré due to Talbot interference by the Fourier transform method and forms an image. The imaging apparatus includes a first grating having a structure that transmits light beams from a beam source to refract or diffract the light beams and forms a self image based on a first periodic pattern by the Talbot interference at a predetermined position; a second grating that absorbs part of the first periodic pattern and causes a Moiré to be generated based on a second periodic pattern when the second grating is arranged at a position at which the self image is formed. All cross sections of the Moiré with axes in differential directions of a wavefront for the analysis by the Fourier transform method have a two-dimensional periodic structure in which periods of patterns in the second periodic pattern are the same.

MEASURING APPARATUS, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD

A measuring apparatus includes a pinhole mask, located at an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole mask and the optical system, wherein Lg=m·Pg2/λ is met, where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measuring light beam, m is an integer other than zero, and Lg is a distance between the diffraction grating and an image plane of the optical system. The measuring apparatus calculates a wavefront aberration of the optical system from an interferogram formed by causing interference of the measuring light beams split by the diffraction grating.

Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method

A measuring method for measuring wave front of light, which passed through a target optical system includes the steps of, generating an interference fringe using a shearing interference with light that passes a target optical system, calculating a differential wave front between a first wave front of the light that passes the target optical system and a second wave front made by offsetting the first wave front by a predetermined amount in a predetermined direction, and correcting the differential wave front based on the predetermined amount and the wave number in the predetermined direction.

Measuring device and measuring method

A wavefront measuring device is disclosed which is capable of measuring an average wavefront and the retardation of a lens including birefringence. The measuring device includes a light source for emitting a linearly polarized light; a polarization orientation setting member for switching the polarization orientation of the light flux from the light source between at least two orientations; a light synthesizing member for synthesizing the light flux after passing the light fluxes through an object to be measured and a reference surface; an analyzer for switching the polarization orientation so as to pass only the same polarized component as the polarized light incident on the object to be measured; an image pickup member for detecting interference information of the light flux obtained through the analyzer; and a calculating section for calculating the average wavefront and/or the retardation of the object to be measured.

ABSOLUTE POSITION MEASUREMENT APPARATUS AND METHOD

An absolute position measurement apparatus measures an absolute position of an object to be measured using a first light source and a second light source which has coherency lower than that of the first light source. The absolute position measurement apparatus includes a measurement part which measures a point where phases of interference signals from the first and the second light sources coincide with each other or a point where an intensity of the interference signal from the second light source is maximized, an origin defining part which defines the point measured by the measurement part as an origin position, a phase storing part which stores the phase of the interference signal from the first light source at the origin position, an origin redefining part which redefines the origin position, and a position calculating part which calculates the absolute position of the object to be measured.

WAVEFRONT ABERRATION MEASURING METHOD, MASK, WAVEFRONT ABERRATION MEASURING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.

Exposure apparatus and device manufacturing method using the same

An exposure apparatus includes a first dispersing element for dispersing substantially parallel laser light, from a laser, with respect to the wavelength to provide light beams of wavelength units, a first optical system for collecting each light beam of a wavelength unit from the first dispersing element, a wavelength selecting device for passing a predetermined wavelength region of light, of the light beams of wavelength units each being collected by the first optical system, a second optical system for receiving the light from the wavelength selecting device and providing parallel light beams of wavelength units, and a second dispersing element for combining the parallel light beams of wavelength units from the second optical system, the second dispersing element having substantially the same angular dispersion as that of the first dispersing element and a direction of dispersion opposite to that of the first dispersing element.

X-ray imaging apparatus

An X-ray imaging apparatus which takes an image of an object to be detected, comprises: a first grating to form a periodic bright-dark pattern by a Talbot effect, based on an X-ray from an X-ray source; a second grating, disposed at a position where the bright-dark pattern is formed, to block a part of the bright-dark pattern; a detector to detect an X-ray intensity distribution of the X-ray which passed through the second grating; and a calculator to calculate phase information of the X-ray based on the detected X-ray intensity distribution, wherein the second grating includes a first region having a first blocking pattern and a second region having a second blocking pattern, and a direction in which the first blocking pattern blocks a bright section of the bright-dark pattern is different from a direction in which the second blocking pattern blocks the bright section of the bright-dark pattern.

X-RAY IMAGING APPARATUS

An X-ray imaging apparatus comprises a grating configured to form an interference pattern by diffracting X-rays from an X-ray source, a amplitude grating configured to partly shield X-rays forming the interference pattern, and an X-ray detector configured to detect an intensity distribution of X-rays from the amplitude grating. The amplitude grating is comprised of a central area and a peripheral area and the peripheral area shows an X-ray transmittance higher than the central area relative to X-rays perpendicularly entering the amplitude grating.

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

An exposure apparatus includes an illumination optical system. The illumination optical system includes a first member configured to define an illuminated region of a reflective mask having a pattern to be projected onto a substrate; a second member configured to define an illuminated region in which a measurement pattern used in measuring wavefront aberration of a projection optical system is illuminated, the second member being able to be inserted into and removed from an optical path of the illumination optical system; and a condensing mirror configured to condense light from the first member on the pattern to be projected onto the substrate and light from the second member on the measurement pattern. The illuminated region defined by the second member is smaller than the illuminated region defined by the first member.

X-RAY IMAGING APPARATUS AND WAVEFRONT MEASURING APPARATUS

There is provided an X-ray imaging apparatus which images a specimen. The X-ray imaging apparatus comprises: an X-ray source; a diffraction grating configured to diffract an X-ray from the X-ray source; an X-ray detector configured to detect the X-ray diffracted by the diffraction grating; and a calculator configured to calculate phase information of the specimen on the basis of an intensity distribution of the X-ray detected by the X-ray detector, wherein the calculator obtains a spatial frequency spectrum from the plural intensity distributions, and calculates the phase information from the obtained spatial frequency spectrum.

Measuring apparatus, exposure apparatus and method, and device manufacturing method

A measuring apparatus includes a pinhole mask, located on an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole mask and the optical system, in which Lg=m·Pg 2 /λ is met, where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measuring light beam, m is an integer other than zero, and Lg is a distance between the diffraction grating and an image plane of the optical system. The measuring apparatus detects an interferogram formed by interference between a plurality of the measuring light beams split by the diffraction grating. The plurality of measuring light beams includes an aberration of the optical system.

X-ray imaging apparatus, X-ray imaging method, and X-ray imaging program

An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

X-ray imaging apparatus, X-ray imaging method, and X-ray imaging program

An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

MEASUREMENT APPARATUS, EXPOSURE APPARATUS HAVING THE SAME, AND DEVICE MANUFACTURING METHOD

A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/ where Pg is a grating pitch of the diffraction grating, is a wavelength of the measurement light, and m is an integer except for 0.

X-ray imaging apparatus

An X-ray imaging apparatus comprises a grating configured to form an interference pattern by diffracting X-rays from an X-ray source, a amplitude grating configured to partly shield X-rays forming the interference pattern, and an X-ray detector configured to detect an intensity distribution of X-rays from the amplitude grating. The amplitude grating is comprised of a central area and a peripheral area and the peripheral area shows an X-ray transmittance higher than the central area relative to X-rays perpendicularly entering the amplitude grating.

X-RAY IMAGING APPARATUS, X-RAY IMAGING METHOD, AND X-RAY IMAGING PROGRAM

An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method

A measuring method for measuring a wave front of light, which has passed through a target optical system. The method includes the steps of dividing the light that passes the target optical system into a first wave front and a second wave front made by offsetting the first wave front by a predetermined amount in a predetermined direction, obtaining information concerning an interference fringe using shearing interference with divided light, calculating a differential wave front between the first wave front and the second wave front by using the information concerning the interference fringe obtained in the obtaining step, and correcting the differential wave front based on the predetermined amount and a wave number in the predetermined direction.

Projection exposure apparatus and device manufacturing method that change a resonator length of a continuous emission excimer laser

A projection exposure apparatus includes a continuous emission excimer laser for providing laser light having a predetermined wavelength, an illumination optical system for illuminating a pattern of a reticle with laser light having the predetermined wavelength, a projection optical system for projecting the illuminated pattern of the reticle onto a substrate, wherein the projection optical system is provided by a lens system made of a substantially single glass material, a laser for injecting light having the predetermined wavelength into a resonator of the continuous emission excimer laser, a wavemeter for measuring the wavelength of the laser light from the continuous emission excimer laser, and a changing device for changing a resonator length of the continuous emission excimer laser on the basis of a signal from the wavemeter so that the wavelength of the laser light from the continuous emission excimer laser becomes equal to the predetermined wavelength.

Interference system and semiconductor exposure apparatus having the same

An exposure apparatus for exposing a substrate with a pattern of an original includes a projection optical system for projecting the pattern of the original onto the substrate with light from a light source, and an interferometer for measuring an optical characteristic of the projection optical system by use of the light from the light source, which passes a pinhole and the projection optical system. The pinhole has a diameter which is smaller than a diameter of an Airy disc.

WAVEFRONT-ABERRATION-MEASURING DEVICE AND EXPOSURE APPARATUS

A wavefront-aberration-measuring device measures wavefront aberration of a to-be-tested optical system and includes a diffraction grating that splits light transmitted through the optical system, a detecting unit that detects interference fringes produced by beams of the split light, an arithmetic unit that calculates the wavefront aberration from the detected interference fringes, an image-side mask insertable into and retractable from an image plane of the optical system, and an illuminating unit that incoherently illuminates the image-side mask. The image-side mask has an aperture with a diameter larger than /2NA, where denotes a wavelength of the illuminating unit and NA denotes a numerical aperture of the to-be-tested optical system. The arithmetic unit calculates the wavefront aberration of the optical system from the interference fringes detected with the image-side mask being retracted from the image plane and the interference fringes detected with the image-side mask being in the ...

Surface shape measuring apparatus and method

An apparatus for measuring the surface shape of the surface to be measured of an optical system to be measured includes a rotary stage holding the optical system to be measured thereon and rotatable about the optical axis of the optical system to be measured, a device for detecting the rotation azimuth of the rotary stage, an irradiating optical system for sequentially applying a coherent light beam to the plurality of measuring diameter positions of the surface to be measured of the optical system to be measured held on the rotary stage, a light receiving element for detecting the reflected light of the coherent light beam from the surface to be measured as an interference signal, and a calculating system for effecting the measurement of the surface shape of the surface to be measured on the basis of the result of the detection of the interference signal at each of the plurality of measuring diameter positions of the surface to be measured and the result of the detection by the rotation ...

X-RAY IMAGING APPARATUS

An X-ray imaging apparatus which takes an image of an object to be detected, comprises: a first grating to form a periodic bright-dark pattern by a Talbot effect, based on an X-ray from an X-ray source; a second grating, disposed at a position where the bright-dark pattern is formed, to block a part of the bright-dark pattern; a detector to detect an X-ray intensity distribution of the X-ray which passed through the second grating; and a calculator to calculate phase information of the X-ray based on the detected X-ray intensity distribution, wherein the second grating includes a first region having a first blocking pattern and a second region having a second blocking pattern, and a direction in which the first blocking pattern blocks a bright section of the bright-dark pattern is different from a direction in which the second blocking pattern blocks the bright section of the bright-dark pattern.

Wavefront-aberration-measuring device and exposure apparatus

A wavefront-aberration-measuring device measures wavefront aberration of a to-be-tested optical system and includes a diffraction grating that splits light transmitted through the optical system, a detecting unit that detects interference fringes produced by beams of the split light, an arithmetic unit that calculates the wavefront aberration from the detected interference fringes, an image-side mask insertable into and retractable from an image plane of the optical system, and an illuminating unit that incoherently illuminates the image-side mask. The image-side mask has an aperture with a diameter larger than /2NA, where denotes a wavelength of the illuminating unit and NA denotes a numerical aperture of the to-be-tested optical system. The arithmetic unit calculates the wavefront aberration of the optical system from the interference fringes detected with the image-side mask being retracted from the image plane and the interference fringes detected with the image-side mask being in the ...

X-RAY IMAGING APPARATUS

An X-ray imaging apparatus for imaging a subject includes a diffraction grating configured to form an interference pattern by diffracting X-ray radiation from an X-ray source, a shielding grating configured to shield part of the interference pattern, a detector configured to detect the X-ray radiation passing through the shielding grating, and a moving unit configured to change an angle between each of the diffraction grating, the shielding grating and the detector and an optical axis, wherein the detector is configured to detect the X-ray according to a change in the angle between each of the diffraction grating, the shielding grating and the detector and the optical axis. 1. An X-ray imaging apparatus for imaging a subject , the X-ray imaging apparatus comprising:a diffraction grating configured to form an interference pattern by diffracting X-ray radiation from an X-ray source;a shielding grating configured to block part of the interference pattern;a detector configured to detect the X-ray radiation passing through the shielding grating; anda moving unit configured to change an angle of each of the diffraction grating, the shielding grating and the detector with respect to an optical axis,wherein the detector is configured to detect the X-ray radiation passing through the shielding grating according to a change in the angle between the optical axis and at least one of the diffraction grating, the shielding grating and the detector.2. The X-ray imaging apparatus according to claim 1 , wherein the X-ray radiation from the radiation source includes a divergent beam incident on the diffraction grating.3. The X-ray imaging apparatus according to claim 1 , wherein the moving unit is configured to change the angle of each of the diffraction grating claim 1 , the shielding grating and the detector with respect to the optical axis by moving the diffraction grating claim 1 , the shielding grating and the detector.4. The X-ray imaging apparatus according to claim 1 ,wherein ...

Interference system and semiconductor exposure apparatus having the same

Disclosed is a Fizeau interference system for causing interference between reflection lights from a reflection surface and a semi-transmission surface, respectively, disposed along one and the same optical axis. The interference system includes a light source, an optical path difference applying optical system for dividing light from the light source into two lights and for re-combining them, and an interference optical system for causing reflection of the two lights passed through the optical path difference applying optical system, at corresponding one of the reflection surface and the semi-transmission surface, and to cause interference of them, wherein a difference DeltaF in optical path length of the light reflected by the reflection surface and with respect to the light reflected by the semi-transmission surface satisfies a relation |DeltaD-DeltaF| Подробнее

Talbot interferometer, its adjustment method, and measurement method

A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit.

Absolute position measurement apparatus and method

An absolute position measurement apparatus measures an absolute position of an object to be measured using a first light source and a second light source which has coherency lower than that of the first light source. The absolute position measurement apparatus includes a measurement part which measures a point where phases of interference signals from the first and the second light sources coincide with each other or a point where an intensity of the interference signal from the second light source is maximized, an origin defining part which defines the point measured by the measurement part as an origin position, a phase storing part which stores the phase of the interference signal from the first light source at the origin position, an origin redefining part which redefines the origin position, and a position calculating part which calculates the absolute position of the object to be measured.

X-RAY IMAGING APPARATUS, X-RAY IMAGING METHOD, AND X-RAY IMAGING PROGRAM

An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image. 2. The X-ray imaging apparatus according to claim 1 ,wherein the Moiré is detected by a single detection performed by the detector.3. The X-ray imaging apparatus according to claim 1 ,wherein the calculator obtains the information of the differential phase image of the subject from the information of the intensity distribution of a single Moiré.4. The X-ray imaging apparatus according to claim 1 ,wherein the diffraction grating forms an interference intensity distribution in which bright and dark sections are arranged two-dimensionally,wherein the shielding grating forms the Moiré having a two-dimensional period by shielding part of the X-ray from the diffraction grating, andwherein the calculator obtains the information of the differential phase image of the subject in a first direction and in a second direction intersecting with the first direction, by performing the Fourier transform on the information of the intensity distribution of the Moiré having the two-dimensional period.5. The X-ray imaging apparatus according to claim 4 ,wherein the calculator obtains the information of the differential phase image of the subject in the first direction and in the second direction from the information of the intensity distribution of a single Moiré.6. The X-ray imaging apparatus according to claim 1 ,wherein the diffraction grating is a phase grating,wherein the phase ...

X-ray imaging apparatus and wavefront measuring apparatus

There is provided an X-ray imaging apparatus which images a specimen. The X-ray imaging apparatus comprises: an X-ray source; a diffraction grating configured to diffract an X-ray from the X-ray source; an X-ray detector configured to detect the X-ray diffracted by the diffraction grating; and a calculator configured to calculate phase information of the specimen on the basis of an intensity distribution of the X-ray detected by the X-ray detector, wherein the calculator obtains a spatial frequency spectrum from the plural intensity distributions, and calculates the phase information from the obtained spatial frequency spectrum.

X-RAY IMAGING APPARATUS

An X-ray imaging apparatus comprises a grating configured to form an interference pattern by diffracting X-rays from an X-ray source, a amplitude grating configured to partly shield X-rays forming the interference pattern, and an X-ray detector configured to detect an intensity distribution of X-rays from the amplitude grating. The amplitude grating is comprised of a central area and a peripheral area and the peripheral area shows an X-ray transmittance higher than the central area relative to X-rays perpendicularly entering the amplitude grating.

Projection exposure apparatus and device manufacturing method using the same

Disclosed are a projection exposure apparatus and a device manufacturing method using the same, in which a pattern of a reticle illuminated with laser light from a continuous emission excimer laser is projected on a substrate by use of a projection optical system. The projection optical system comprises a lens system made of a substantially single glass material. There is a pulse emission laser provided, for injecting pulse light into the continuous emission excimer laser, for injection locking. This structure assures accurate projection of the reticle pattern, while enabling improvements of the throughput.

X-ray imaging apparatus

An X-ray imaging apparatus for imaging a subject includes a diffraction grating configured to form an interference pattern by diffracting X-ray radiation from an X-ray source, a shielding grating configured to shield part of the interference pattern, a detector configured to detect the X-ray radiation passing through the shielding grating, and a moving unit configured to change an angle between each of the diffraction grating, the shielding grating and the detector and an optical axis, wherein the detector is configured to detect the X-ray according to a change in the angle between each of the diffraction grating, the shielding grating and the detector and the optical axis.

TALBOT INTERFEROMETER, ITS ADJUSTMENT METHOD, AND MEASUREMENT METHOD

A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit.

X-ray imaging apparatus

Provided is an X-ray imaging apparatus having simple configuration and obtaining differential phase contrast images in two directions crossing each other without rotating the diffraction grating and the masking grating. The apparatus including: a diffraction grating diffracting X-rays; a masking grating masking portions rays and transmitting portions are two-dimensionally arranged to partially mask bright zones of the interference pattern; a moving device changing the relative position between the interference pattern and the masking grating; a detector detecting the intensity distribution of the X-rays transmitted through the masking grating; and a calculator calculating a differential phase contrast image or a phase contrast image of a subject, the calculator being configured to calculate the differential phase contrast image or the phase contrast image in each of two mutually crossing directions on the basis of results of detection performed a plurality of times by the detector.

X-RAY TALBOT INTERFEROMETER AND X-RAY TALBOT IMAGING SYSTEM

An X-ray Talbot interferometer includes a source grating configured to spatially split X-rays emitted from an X-ray source, a diffraction grating configured to form an interference pattern with the X-rays from the source grating, and an X-ray detector configured to detect the X-rays from the diffraction grating. The X-ray Talbot interferometer further includes an angle varying unit configured to vary an angle formed by an optical axis, which is the center of a flux of the X-rays from the X-ray source, and the source grating. The angle varying unit varies the angle formed by the optical axis and the source grating from a first angle to a second angle. The X-ray detector detects the X-rays at least when the optical axis and the source grating form the first angle and when the optical axis and the source grating form the second angle. 1. An X-ray Talbot interferometer , comprising:a source grating configured to spatially split X-rays emitted from an X-ray source;a diffraction grating configured to diffract the X-rays from the source grating to form an interference pattern;an X-ray detector configured to detect the X-rays from the diffraction grating; andan angle varying unit configured to vary an angle formed by an optical axis and at least one periodic direction of the source grating, the optical axis being a center of a flux of the X-rays from the X-ray source.2. The X-ray Talbot interferometer according to claim 1 ,wherein the angle varying unit varies the angle formed by the optical axis and the periodic direction from a first angle to a second angle, andwherein the X-ray detector detects the X-rays at least when the optical axis and the periodic direction form the first angle and when the optical axis and the periodic direction form the second angle.32. The X-ray Talbot interferometer according to claim claim 1 ,wherein the X-rays are incident normally on the source grating at a center of a first area of the source grating when the optical axis and the periodic ...

X-ray imaging apparatus

Provided is an X-ray imaging apparatus having simple configuration and obtaining differential phase contrast images in two directions crossing each other without rotating the diffraction grating and the masking grating. The apparatus including: a diffraction grating diffracting X-rays; a masking grating masking portions rays and transmitting portions are two-dimensionally arranged to partially mask bright zones of the interference pattern; a moving device changing the relative position between the interference pattern and the masking grating; a detector detecting the intensity distribution of the X-rays transmitted through the masking grating; and a calculator calculating a differential phase contrast image or a phase contrast image of a subject, the calculator being configured to calculate the differential phase contrast image or the phase contrast image in each of two mutually crossing directions on the basis of results of detection performed a plurality of times by the detector.

Measuring apparatus, exposure apparatus and method, and device manufacturing method

A measuring apparatus includes a pinhole mask, located at an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light, and a diffraction grating for splitting the measuring light that has passed the pinhole mask and the optical system, wherein Lg = m · Pg2 / λ is met, where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measuring light, m is an integer other than 0, and Lg is a distance between the diffraction grating and an image plane of the optical system, and wherein the measuring apparatus calculates a wavefront aberration of the optical system from an interferogram formed by causing interference of the measuring light split by the diffraction grating.

X-ray imaging apparatus

An X-ray imaging apparatus which takes an image of an object to be detected, comprises: a first grating to form a periodic bright-dark pattern by a Talbot effect, based on an X-ray from an X-ray source; a second grating, disposed at a position where the bright-dark pattern is formed, to block a part of the bright-dark pattern; a detector to detect an X-ray intensity distribution of the X-ray which passed through the second grating; and a calculator to calculate phase information of the X-ray based on the detected X-ray intensity distribution, wherein the second grating includes a first region having a first blocking pattern and a second region having a second blocking pattern, and a direction in which the first blocking pattern blocks a bright section of the bright-dark pattern is different from a direction in which the second blocking pattern blocks the bright section of the bright-dark pattern.

Röntgenstrahlabbildungsgerät und Röntgenstrahlabbildungsverfahren

Röntgenstrahlabbildungsgerät zur Abbildung eines Gegenstands, mit:einem Phasengitter (130), das Röntgenstrahlen (111) von einer Röntgenstrahlquelle (110) zur Bildung einer Interferenzintensitätsverteilung durch den Talbot-Effekt überträgt, wobei das Phasengitter (130) Phasenvoreilabschnitte (131) und Phasenverzögerungsabschnitte (132) umfasst, wobei die Phasenvoreilabschnitte (131) und Phasenverzögerungsabschnitte (132) zweidimensional angeordnet sind;einem Absorptionsgitter (150), das die Interferenzintensitätsverteilung, die durch das Phasengitter (130) gebildet wird, zur Erzeugung eines Moire-Musters teilweise abschirmt, wobei das Absorptionsgitter (150) durchlässige Abschnitte (151) und lichtabschirmende Abschnitte (152) umfasst, wobei die durchlässigen Abschnitte (151) und die lichtabschirmenden Abschnitte (152) zweidimensional angeordnet sindeiner Erfassungseinrichtung (170), die Informationen einer Intensitätsverteilung des Moire-Musters erfasst, das durch das Absorptionsgitter (150) erzeugt wird, undeiner arithmetischen Einheit (180), die eingerichtet ist, die Informationen eines Differenzialphasenbilds des Gegenstands durch Ausführen einer Fourier-Transformation für die Informationen der Intensitätsverteilung des Moire-Musters, die durch die Erfassungseinrichtung (170) erfasst werden, zu berechnenwobei die arithmetische Einheit (180) eingerichtet ist, die Informationen des Differenzialphasenbilds in den zwei Richtungen durch Ausführung der Fourier-Transformation für die Informationen der Intensitätsverteilung des Moire-Musters zu berechnen, die durch ein einzelnes Erfassungsergebnis durch die Erfassungseinrichtung (170) erhalten wird, undwobei die arithmetische Einheit (180) eingerichtet ist, eine Phasenrückgewinnungsverarbeitung auszuführen, die umfasst:ein Ausführen eines Trennungsschritts (S631) derart, dass das Spektrum, das einer Trägerfrequenz entspricht, aus einem Frequenzraum extrahiert wird, der in dem Schritt zum Ausführen der Fourier- ...

Measurement apparatus, exposure apparatus having the same, and device manufacturing method

A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg = m Pg / where Pg is a grating pitch of the diffraction grating, is a wavelength of the measurement light, and m is an integer except for 0.

Exposure apparatus and device manufacturing method