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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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22-06-2011 дата публикации

Plasma processing apparatus

Номер: CN0101620972B
Автор: DENCHU SEIJI, SATOYOSHI TSUTOMU, SEIJI DENCHU, TSUTOMU SATOYOSHI
Принадлежит:

The present invention provides a plasma processing apparatus, capable of preventing air exhaust airflow from concentrating in a plurality of exhaust outlets formed in a processing chamber, and evening the air exhaust airflow in the processing chamber. The plasma processing apparatus is provided with a baffle part (350) fro separating plasma generating areas of the processing chamber (200) from exhaust passages of the processing chamber, the baffle part is composed of an upstream side baffle and a downstream side baffle arranged with a distance in a mode of covering a loading bench (300), eachbaffle is provided with a plurality of openings for communicating the plasma generating areas and the exhaust passages, and the openings of the downstream side baffle (360) are gap-shaped openings (364) that the opening has a larger width when it is more far away from the exhaust outlet (208).

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Номер записи: 1
06-01-2010 дата публикации

Plasma processing apparatus

Номер: CN0101620972A
Автор: DENCHU SEIJI, SATOYOSHI TSUTOMU, SEIJI DENCHU, TSUTOMU SATOYOSHI
Принадлежит:

The present invention provides a plasma processing apparatus, capable of preventing air exhaust airflow from concentrating in a plurality of exhaust outlets formed in a processing chamber, and evening the air exhaust airflow in the processing chamber. The plasma processing apparatus is provided with a baffle part (350) fro separating plasma generating areas of the processing chamber (200) from exhaust passages of the processing chamber, the baffle part is composed of an upstream side baffle and a downstream side baffle arranged with a distance in a mode of covering a loading bench (300), each baffle is provided with a plurality of openings for communicating the plasma generating areas and the exhaust passages, and the openings of the downstream side baffle (360) are gap-shaped openings (364) that the opening has a larger width when it is more far away from the exhaust outlet (208).

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Номер записи: 2
16-11-2011 дата публикации

Substrate processing device and substrate processing system

Номер: CN0102243987A
Автор: YOSHIHIKO SASAKI, SEIJI DENCHU, SASAKI YOSHIHIKO, DENCHU SEIJI
Принадлежит:

The invention provides a substrate processing device and a substrate processing system which have high maintainability and small configuring spaces. A vacuum conveying chamber (4) which comprises a substrate conveying mechanism (41) for conveying a substrate S of an article to be processed is surrounded by a plurality of side surfaces in a way with a top view having a shape of more than five angles. A plurality of processing chambers (5a-5d) each having a cover body (52) on the upper part are connected to the plurality of side surfaces except an outer side surface having a maintaining area (6). A cover body conveying mechanism (7) is applied for conveying the cover bodies (52) between the processing chambers (5a-5d) and the maintaining area (6).

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Номер записи: 3