Photomask template and test method implemented by using photomask template

The invention discloses a photomask template and a test method implemented by using the photomask template. The photomask template comprises a first mask structure and a second mask structure, wherein the first mask structure is used for forming circuit patterns, the second mask structure is used for forming test patterns, and the types of patterns in the second mask structure comprise all the types of patterns in the first mask structure. The test method implemented by using the photomask template is implemented just by testing the test patterns formed on a silicon wafer by the second mask structure without searching the types of circuit patterns in different positions, thereby saving time and improving efficiency.

Method for seeking target area for integrated circuit layout design

Method for rendering optical approximate revision more accurate based on model

The optical similar correction based on module is an error compensative corrective rule that can better control the feature pattern critical dimension of the photo-etching, to allow the data module going to stability and constriction to better control the tolerance within a tolerable scope.

Personnel flow and consumption prediction method and system based on deep learning

A deep learning-based personnel flow and consumption prediction method relates to the technical field of personnel flow and consumption prediction, and mainly comprises a community total personnel flow and consumption prediction method and a regional personnel flow and consumption prediction method. The community total personnel flow and consumption prediction method is composed of a community total personnel flow prediction method and a community total consumption prediction method. The community total personnel flow prediction method comprises training generation methods of a personnel entry flow prediction model, a personnel exit flow prediction model and a personnel net stock prediction model. The personnel flow processing method has the beneficial effects that the personnel flow can be accurately monitored, and the problem that the personnel flow cannot be accurately measured in the prior art is solved.

Method for automatically matching picture and tower based on unmanned aerial vehicle

The invention relates to a method for automatically matching a picture and a tower based on an unmanned aerial vehicle, and the method comprises the steps: S01, data uploading: the data uploading is mainly responsible for uploading a patrol picture of the unmanned aerial vehicle to a system server; s02, pole tower matching: processing the uploaded and input picture information, and automatically matching pole towers according to the corresponding latitude and longitude information; and S03, storing and recording: mainly taking charge of storing the inspection picture information. According to the method for automatically matching the pictures and the towers based on the unmanned aerial vehicle, related personnel are liberated from complicated and monotonous work by machine languages, so that a real-time, efficient and intelligent processing effect is achieved, visualization of positioning of the pictures and the corresponding towers is provided for follow-up polling picture processing personnel ...

Optical short distance amending method

A method of optics close distance correction is provided, which comprises the following steps: providing at least a circuit figure to be exposed; forming at least one assistant figure to be exposed perpendicular to the circuit figure to be exposed, the dimension of the assistant figure to be exposed is less than the resolution of the lithography machine; transferring the circuit figure to be exposed and the assistant figure to be exposed to the photomask, so as to form the circuit figure and the assistant figure. Through the steps, not only the assistant figure on the photomask perpendicular to the circuit figure can be reflected on the semiconductor underlayer, without forming lithography glue film figure opposite to the assistant figure, so that the imaging effect turns good, but also the figure resolution and DOF are improved.

Mixed type optical approximate correcting method based on regular

Exposure method, photolithography method and method for making through-hole

The invention relates to an exposure method. The exposure method comprises the following steps: forming a photoresistive layer on a substrate; and exposing the photoresistive layer on the substrate through a light shield, wherein in the process of exposure, relative angle and relative distance of each lens in an exposure light source and ambient atmosphere in the lens group are adjusted to enable an obtained corresponding photoresistive layer opening to have an area larger than that of a masking pattern on the light shield. The method also discloses a photolithographic method and a preparation method for a through hole. The methods can be carried out without extra optical proximity correction of the prior through hole masking pattern, thereby bringing about simple process operation and improving the efficiency.

Exposure method, photolithography method and method for making through-hole

The invention relates to an exposure method. The exposure method comprises the following steps: forming a photoresistive layer on a substrate; and exposing the photoresistive layer on the substrate through a light shield, wherein in the process of exposure, relative angle and relative distance of each lens in an exposure light source and ambient atmosphere in the lens group are adjusted to enablean obtained corresponding photoresistive layer opening to have an area larger than that of a masking pattern on the light shield. The method also discloses a photolithographic method and a preparation method for a through hole. The methods can be carried out without extra optical proximity correction of the prior through hole masking pattern, thereby bringing about simple process operation and improving the efficiency.

Method for using inverse scattering belt

The application of backscattering band is mainly used in the optical similar correction of semiconductor process. Meanwhile, it forms the isolation line figure and the isolation channel pattern into scattering band for correction. Through this method, it can easily proceed back scattering band insertion, expand process window, and improve the chip tolerance testing and performance.

Photomask template and test method implemented by using photomask template

Method for rendering optical approximate revision more accurate based on model

The optical similar correction based on module is an error compensative corrective rule that can better control the feature pattern critical dimension of the photo-etching, to allow the data module going to stability and constriction to better control the tolerance within a tolerable scope.

Method for using inverse scattering belt

The application of backscattering band is mainly used in the optical similar correction of semiconductor process. Meanwhile, it forms the isolation line figure and the isolation channel pattern into scattering band for correction. Through this method, it can easily proceed back scattering band insertion, expand process window, and improve the chip tolerance testing and performance.

Security inspection prediction method based on deep learning

A security inspection prediction method based on deep learning relates to the field of security inspection, and mainly comprises the following steps: acquiring map information of an inspection area, and storing the map information in a database for defining a security range; a plurality of inspection points are arranged on the inspection area, a corresponding people flow monitoring point is arranged near each inspection point, and the inspection points and the people flow monitoring points are associated and correspond to each other; through the trained LSTM human traffic model, obtaining the predicted human traffic of each inspection point in unit time; determining the number of security personnel in the unit time of each inspection point according to the predicted pedestrian flow in the unit time of each inspection point; the system has the beneficial effects that security strength is scientifically and reasonably arranged, and a safe environment and high-quality security service are ...

Mixed type optical approximate correcting method based on regular

The invention provides an optical approximately correcting method of mixed pattern on account of regulation. The method integrated a plurality of advantages of optical approximately correcting methods based on regulation. The main procedure is that the objective pattern is divided into two kinds according to the polygonal rule, the optical approximately correcting based on the sides in the X and Y direction to the distinguished two kinds of the objective patterns and inspecting optical approximately correcting based on the sides. The optical approximately correcting method of mixed pattern on account of regulation overcomes the shortcoming of imprecise correcting of the existing method and in no way rises the cost of optical approximately correcting.

Optical short distance amending method