17-11-2016 дата публикации
Номер: US20160333139A1
Provided herein are the polymers shown below. The value n is a positive integer. Ris an organic group, and each Ris H or a chemisorbed group, with at least one Rbeing a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties. 2. The polymer of claim 1 , wherein the polymer is a nanostructured film made by:converting a trifluoroacetyl-di-p-xylylene paracyclophane dimer to a reactive vapor of monomers, the reactive vapor having a flux;depositing the reactive vapor under vacuum onto a substrate held fixed in a specific angle of orientation relative to the vapor flux to form nanostructured poly(trifluoroacetyl-p-xylylene) film; andreacting the nanostructured poly(trifluoroacetyl-p-xylylene) film with a suitable reducing agent to form the polymer. This application is a divisional application of U.S. patent application Ser. No. 14/018,507, file on Sep. 5, 2103, which is a divisional application of U.S. Pat. No. 8,535,805, issued on Sep. 17, 2013, which claims the benefit of U.S. Provisional Patent Application No. 61/048,475, filed on Apr. 28, 2008. The provisional application, all publications referenced therein, and all other publications and patent documents referenced throughout this nonprovisional application are incorporated herein by reference.The disclosure is generally related to hydrophobic ...
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