Disc refiner

A disc refiner (10) is described, which has a rotor (14) on a shaft (20) and which has a stator (12) in which the shaft (20) is rotatably mounted. The stator (12) and the rotor (14) are provided with grinding elements (32), every grinding element (32) having, on its two opposing base surfaces, grinding surfaces provided with grinding teeth (40). Between every grinding element (32) and the associated main surface (30) of the stator (12) or rotor (14) on which the associated grinding element (32) is fastened, at least one spacer element (44) is provided for the purpose of achieving an exactly defined distance between the unused new grinding surface (40) of the grinding element (32) having a worn-out grinding surface (38) and the corresponding main surface (30). <IMAGE>

PHENYLTHIO-PHTHALIC ACIDS AND THEIR PRODUCTION

THIOXANTHONECARBOXYLIC ACIDS AND THIOXANTHONECARBOXYLIC ACID DERIVATIVES

Novel thioxanthonecarboxylic acids and thioxanthonecerboxylic acid derivatives of the formula I (I) in which Y is -COOH, -CO-halogen, -CN or a carboxylic acid ester, thioester or amide group and X, Z and W are as defined in the patent claim, are described, The compounds of the formula I in which Y is other than -CO-halogen are suitable as sensitisers for photo-crosslinkable polymers or as initiators for photo-polymerisation of ethylerically unsaturated compounds or for photo-chemical crosslinking of polyoleilns, The acid halides of the formula I are starting materials for the preparation of the corresponding nitriles and carboxylic acid esters, thioesters and amides.

SENSITIZERS FOR PHOTOPOLYMERISATION

Novel aromatic-aliphatic ketones of the formula: (I) wherein Ar represents arylene or phenylene-T-phenylene, X represents substituted amino, hydroxy, optionally substituted alkoxy, optionally substituted phenoxy or alkylated silyloxy and R1 and R2 generally represent optionally substituted alkyl, cycloalkyl or phenylalkyl are disclosed. The compounds (1) are useful as sensitizers for the photopolymerization of unsaturated compounds and for the photochemical crosslinking of polyolefins.

AROMATIC ALIPHATIC KETONE SENSITIZERS FOR PHOTOPOLYMER- ISATION

SENSITIZERS FOR PHOTOPOLYMERISATION

ABSTRACT Novel aromatic-aliphatic ketones of the formula:

3-AMINO-PROPIOPHENONES

Aromatic-aliphatic ketones of the formula I < IMG > Ar is an aryl radical, R1, R2, R4 and R5 are monovalent aliphatic, cycloaliphatic or araliphatic radicals, are suitable sensitizers for the photopolymerisation of unsaturated compounds and for the photochemical crosslinking of polyolefins. Some of these compounds can be obtained by methods analogous to those for obtaining the known compounds of this type.

SENSITIZERS FOR PHOTOPOLYMERISATION

SENSITIZERS FOR PHOTOPOLYMERISATION Abstract of the Disclosure Aromatic-aliphatic kittens of the formulae I, II, III or IV I III IV wherein n is 1 or 2, Ar is an aryl radical, R1 and R2 are monovalent aliphatic, cycloaliphatic or araliphatic radi-cals, R3 is a direct bond or a divalent organic radical, X is a hydroxyl or amino group or the monovalent etherifi-cation or silylation products thereof, and X' is a divalent amino, ether or silyloxy group, Y is a direct bond or CH2 and Z is O, S, SO2, CH2 or C(CH3)2, are suitable sensitizers for the photopolymerisation of unsaturated compounds and for the photochemical crosslinking of polyolefins. Some of these compounds are novel and can be obtained by methods analogous to those for obtaining the known compounds of this type.

POLYMERS HAVING THIOXANTHONE RADICALS AS SIDE CHAINS

Polymers having thioxanthone radicals as side chains Polymers having side chains of the formula (I') in which X, Y, Z and n are as defined in the patent claim, can be employed as sensitisers for photocrosslinkable polymers or as initiators, if desired in a mixture with amines, for the photopolymerisation of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefines.

THIOXANTHONECARBOXYLIC ACIDS, ESTERS, THIOESTERS AND AMIDES WITH REACTIVE FUNCTIONAL GROUPS

Thioxanthone carboxylic acid esters, thioesters and amides with reactive functional groups of the formula (I) in which X, Y, Z, n and Q are as defined in the patent claim and O is, for example, -OCH=CH2, -OCH2CH=CH2, -SCH2CH=CH2 or -NHCH2CH=CH2 (n = 1), -OH, -SH, -NH2, -COOH, -COC1 or -OCO-C(R'')=CH2, in which R'' is methyl or hydrogen (n = 2), are suitable for the preparation of polymers with thioxanthone radicals in side chains. The compounds (I) and also the polymers which can be prepared therefrom can be employed as sensitisers for photocrosslinkable polymers or as initiators, if desired in a mixture with amines, for the polymerization of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefines.

Process for the curing of stoving lacquers

Phenylthio-phthalic acids and their production

Thioxanthonecarboxylic acid esters, thioesters or amides of the formula I (I) in which X and Z are hydrogen or one of the substituents defined in more detail in claim 1 and Y is -OR1, -SR1 or -N(R1)(R2), in which R1 is C1-24alkyl and R2 is H or R1, are suitable, if desired together with amines, as initiators for the photopolymerization of ethylenically unsaturated compounds or for photochemical crosslinking of polyolefines. They are also used as sensitizers for photocrosslinkable polymers. They can be prepared by methods known per se, for example by cyclization of phenylthio-phthalic, -isophthalic or -terephthalic acids, which can be correspondingly substituted, and subsequent reaction with suitable alcohols, thiols or amines.

PROCESS FOR THE CURING OF STOVING LACQUERS

AROMATIC ALIPHATIC KETONE SENSITIZERS FOR PHOTOPOLYMER- ISATION

Druckgasbeaufschlagte Kolben-Zylinder-Anordnung

INITIATOREN FUER DIE PHOTOPOLYMERISATION

Industrial vat bottom support structure - comprises lattice grids lying on beams fixed to base

The support structure is for the sheet metal, or similar, flexible bottom of a tank or vat, esp. as used in the paper-making and cellular material industry. Over all or most of its surface, the bottom (4) is supported by one or more lattice grid structure (8), lying on beams (6) fixed to the foundations. The sheet forming the bottom, which may comprise several interconnected pieces, may incorporate areas (5) with different degrees of slope, each individually supported by flat lattice grids. Costs are reduced, with less labour and material involved, and the support structure is adaptable to any tank or base configuration.

PHOTOPOLYMERIZATION INITIATOR

PURPOSE: To provide a photopolymerization initiator for unsaturated compounds by using aromatic-aliphatic ketone as the starting material, and generating a specific reaction. CONSTITUTION: Aromatic-aliphatic ketone is used as the starting material, and reaction according to formula I is made so that a photopolymerization initiator is obtained as 2-hydroxy-2-methyl-p-chloropropiophenone expressed by formula III contained in compounds given by formula II. In formula I, (n) takes 1 or 2, Ar is a 6-14C aryl, thieyl, pyridyl, furyl, indanyl, tetrahydronaphtyl (substituted with one or more Cl, Br, CN, OH, 1-12C alkyl, etc.) when n=1 and a 6-12C arylene,-phenylene-T-phenylene, bivalent 9,10-dihydroanthracene when n=2, and further R1 is a 1-8C alkyl, etc., (substituted with CN, etc.), when X=-OR6 in n=1, R2 is the same as R1, X is -NR4R5, -OR6, etc., R4 is a 1-12C alkyl, -OH, etc., R5 is a 3-5C alkenyl, etc., and R6 is H a 1-12C alkyl, etc. COPYRIGHT: (C)1989,JPO ...

AROMATIC ALPHA-AMINOKETONE

NEW MATERIAL: A compd. of formula I [Ar is OH, a phenyl substd. with (-alk, -O-phenyl or -S-alk); R1, R2 are each a 1-8C alkyl, together form (CH2)5; R4, R5 are each a 1-12C alkyl, a 2-4C alkyl-substd. O-alk, together form a 4-5C alkylene which may be interrupted with O, NH or N-alk-; alk is a 1-4C alkyl]. USE: A photopolymn. initiator of an ethylenic unsatd. compd. PROCESS: The compd. of formula I is obtd. by brominating a compd. of the formula Ar-Co-CHR1R2, then bringing sodium methoxide into reaction to obtain an epoxide of formula II and, in succession, bringing the compd. into reaction with a secondary amine. COPYRIGHT: (C)1989,JPO ...

PHOTOINITIATORS FOR UV-CURABLE MASSES

THIOXANTHONIC CARBON ACIDS AND THIOXANTHON CARBON ACID DERIVATIVES.

THIAXANTHONE-CARBOXYLIC ACIDS AND THIAXANTHONE-CARBOXYLIC ACID DERIVATIVES, THEIR PREPARATION AND USE, IN PARTICULAR FOR PHOTOPOLYMERIZATION AND PHOTORETICULATION REACTIONS

ACIDES THIAXANTHONE-CARBOXYLIQUES ET DERIVES DE CES ACIDES, ET LEUR PREPARATION. ILS SONT REPRESENTES PAR LA FORMULE GENERALE: (CF DESSIN DANS BOPI) DANS LAQUELLE Y REPRESENTE UN GROUPE - COOH, -CO-HALOGENE, -CN, ESTER OU THIOESTER OU AMIDE CARBOXYLIQUE, LES SIGNIFICATIONS DES AUTRES SYMBOLES, X, Z ET W, ETANT INDIQUEES DANS LA DESCRIPTION ET LES REVENDICATIONS. UTILISATION DE CES CORPS (DANS LESQUELS Y N'EST PAS UN GROUPE -CO-HALOGENE) COMME PHOTOSENSIBILISANTS POUR MATIERES POLYMERES PHOTORETICULABLES, ET COMME INDUCTEURS DE PHOTOPOLYMERISATION DE COMPOSES ETHYLENIQUES OU DE RETICULATION PHOTOCHIMIQUE DE POLYOLEFINES, LES HALOGENURES D'ACIDES SERVANT A OBTENIR LES NITRILES, ESTERS ET THIOESTERS ET AMIDES CORRESPONDANTS. THIAXANTHONE-CARBOXYLIC ACIDS AND DERIVATIVES OF THESE ACIDS, AND THEIR PREPARATION. THEY ARE REPRESENTED BY THE GENERAL FORMULA: (CF DRAWING IN BOPI) IN WHICH A GROUP IS REPRESENTED - COOH, -CO-HALOGEN, -CN, ESTER OR THIOESTER OR CARBOXYL AMIDE, THE MEANINGS OF THE OTHER SYMBOLS, X, Z AND W, BEING INDICATED IN THE DESCRIPTION AND THE CLAIMS. USE OF THESE BODIES (IN WHICH IS NOT A -CO-HALOGEN GROUP) AS PHOTOSENSITIZERS FOR PHOTORETICULABLE POLYMERIC MATERIALS, AND AS INDUCTERS OF PHOTOPOLYMERIZATION OF ETHYLENIC COMPOUNDS OR OF PHOTOCHEMICAL CROSS-LINKING OF POLYOALOGENICIDES NITRILS, ESTERS AND CORRESPONDING THIOESTERS AND AMIDS.

Photopolymerizable composition containing anthrones

Anthrone derivatives having hydroxy, ether or hydrocarbyl groups in 10-position, for example 10,10-dimethoxyanthrone, are excellent photoinitiators for the UV-curing of unsaturated systems. Preferable systems are monomeric or oligomeric acrylates and their mixtures. The systems may be used in thin layers as for instance for coatings or printing inks.

Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones

Sensitizers for photopolymerization

Aromatic-aliphatic ketones of the formulae I, II, III or IV ##STR1## wherein n is 1 or 2, Ar is an aryl radical, R 1 and R 2 are monovalent aliphatic, cycloaliphatic or araliphatic radicals, R 3 is a direct bond or a divalent organic radical, X is a hydroxyl or amino group or the monovalent etherification or silylation products thereof, and X' is a divalent amino, ether or silyloxy group, Y is a direct bond or CH 2 and Z is O, S, SO 2 , CH 2 or C(CH 3 ) 2 , are suitable sensitizers for the photopolymerization of unsaturated compounds and for the photochemical crosslinking of polyolefins. Some of these compounds are novel and can be obtained by methods analogous to those for obtaining the known compounds of this type.

Use of 2-hydroxy-2-methyl-(p-chloropropionphenone) as a photoinitiator

1. Use of 2-hydroxy-2-methyl-(p-chloropropiophenone) of the formula see diagramm : EP0107198,P4,F2 as initiator for the photopolymerisation of unsaturated compounds.

Support structure for a container bottom

Curing stoving lacquers using a quinolinium sulfonate as latent curing catalyst

Curing stoving lacquers using a quinolinium sulfonate as curing catalyst. Abstract Quinolinium sulfonates of the formula I (I), wherein R1 is C1-C8-alkyl, C1-C4-alkyl substituted by halogen, hydroxyl or C1-C4-alkoxy, or it is C2-C8-alkenyl, C7-C9-phenylalkyl or C5-C8-cycloalkyl, R2, R3, R4 and R5 independently of one another are each hydrogen, C1-C4-alkyl, halogen, -CN, -COO(C1-C4-alkyl), -CHO, hydroxyl, C1-C4-alkoxy, an acyloxy group R7COO-, a group R8-CH=CH-, C7-C9-phenylalkyl or phenyl, R6 is C1-C12-alkyl, C6-C10-aryl which is unsubstituted or mono- or polysubstituted by C1-C12-alkyl, C1-C4-alkoxy, halogen or a group R7CONH-, or it is fluorine, NH2 or CF3, and R7 and R8 independently of one another are each C1-C4-alkyl or phenyl, are suitable as latent curing catalysts for acid-curable stoving lacquers. There is formed by irradiation with W light the actual acid catalyst, which renders possible curing at relatively low stoving temperatures.

Stützkonstruktion für einen Behälterboden

Verfahren zur herstellung von benzophenonthioaethern