PROCEDURE FOR THE PRODUCTION OF A FUNCTION LAYER

PROCEDURE FOR THE PRODUCTION OF A FUNCTION LAYER

FUNCTIONAL FILM AND METHOD OF MANUFACTURING FUNCTIONAL FILM

PURPOSE: A functional film, and a manufacturing method thereof are provided to reduce the amount of mixed layers of organic and inorganic materials for securing the safety of the film. CONSTITUTION: A functional film includes an inorganic layer formed with silicon oxide, silicon nitride, silicon oxynitride, or silicon oxynitriding carbide. A manufacturing method of the functional film comprises the following steps: returning a long-length substrate with a surface formed with an organic layer to the longitudinal direction; forming the inorganic layer on the substrate using a layer forming device(10) with electrode pairs using a plasma CVD; and setting the plasma electron density at the highest position on the substrate returning direction, lower than the plasma electron density at lowest position. COPYRIGHT KIPO 2012 ...

PROCEDURE FOR THE PRODUCTION OF STRUCTURING LAYERS

Verfahren zur Herstellung einer Funktionsschicht

FUNCTIONAL FILM AND METHOD FOR MANUFACTURING THE FUNCTIONAL FILM

A method for manufacturing a functional film includes steps of: feeding a support continuously from a first film roll, forming a coating film on the support, providing a laminate film on a surface of the coating film, and taking up the support to a second film roll; and loading the second film roll made by the aforementioned step in a vacuum film-forming apparatus, feeding the support provided with the laminate film continuously from the film roll, peeling off the laminate film, forming an inorganic film on the coating film on the support, and taking up the support to a third film roll.

Verfahren zur Herstellung strukturierter Schichten

Manufacturing method of functional film

When manufacturing a functional film to be formed by using a plasma CVD method while transporting an elongated substrate in a longitudinal direction, an object is to provide a manufacturing method which can prevent a product or the inside of a film forming system from being contaminated during the exposure to air after the film forming is stopped, and can improve productivity and a product quality. The object is achieved by introducing a gas for the exposure to the air into the film forming system after hindering a surface of a film forming electrode from coming into contact with the air inside the film forming system.

Plasma apparatus and plasma processing method

The plasma apparatus includes a conveying unit for conveying a substrate in a conveying direction while being situated at a processing position, an elongated electric field forming unit for forming an induction electric field by a coil, opposed to the processing position, a power supply for supplying high frequency power to the coil, an elongated gas introducing unit and a separating unit for separating a region where the forming unit is arranged and a region where the introducing unit is arranged from each other in an airtight fashion, having an elongated dielectric window arranged between the processing position and the forming unit. The forming unit, the introducing unit and the dielectric window are arranged in such a way that there longitudinal directions are matched with a width direction of the substrate being conveyed, and orthogonal to the conveying direction.

FILM DEPOSITION METHOD CAPABLE OF PREVENTING DAMAGE TO A SUBSTRATE

PURPOSE: A film deposition method is provided to efficiently and consecutively deposit films with high-quality by preventing damage to a substrate and a film deposition device. CONSTITUTION: A film deposition method is as follows. First and second sequestration rooms(16,20) are arranged between a space and a deposition room(18). The space is a position where a substrate(Z) is wound around a drum(30). The sequestration rooms connect the room and the deposition room. The deposition room supplies power to the drum and deposits films. COPYRIGHT KIPO 2011 ...

FILM DEPOSITION DEVICE HAVING A DIFFERENTIAL PRESSURE CHAMBER TO TRANSFER LONG SUBSTRATES IN THE LONGITUDINAL DIRECTION CONTINUOUSLY

PURPOSE: A film deposition device is provided to enable continuous processing of a plurality of substrates and prevent the inflow of processing gas into a differential pressure chamber. CONSTITUTION: A film deposition device comprises a CVD chamber, a processing chamber, and a differential pressure chamber. The CVD chamber has a fuel gas supply unit and a first exhaust unit arranged in the transfer path of substrates and is to deposit a film on a substrate through CVD(Chemical Vapor Deposition). The processing chamber has a second exhaust unit and is to carry out a specific process on the substrate arranged before or after the CVD chamber in the transfer path. The differential pressure chamber is arranged and connected between the CVD chamber and the processing chamber and includes a third exhaust unit, a gas intake unit, and control unites(54,70,84) for keeping the internal pressure of the differential pressure chamber higher than those of the CVD chamber and the processing chamber. COPYRIGHT ...

Optical component and method manufacturing the same

The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less. The plurality of films are formed by performing melting of film forming materials other than a film forming material for a film formed on ...

Method of forming patterned films

This method forms a patterned film. The method prepares a transfer member having a transfer surface on which asperities are formed in accordance with a film pattern to be formed, performs stripping treatment on surfaces of at least ridges formed on the transfer surface of the transfer member, thereafter forms a thin film formed by a technology of vacuum film formation on the surfaces of the at least ridges formed on the transfer surface of the transfer member and transfers the thin film formed on the surfaces of at least ridges of the transfer member onto a substrate, thereby forming the patterned film on the substrate.

Optical component and method of manufacturing the same

The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less. The plurality of films are formed by performing melting of film forming materials other than a film forming material for a film formed on the surface of the substrate after the film is formed on the surface of the substrate.

Method for producing functional film

The method for producing a functional film includes a step of forming an organic film on a surface of a substrate and a step of forming an inorganic film by vacuum deposition on a surface of the organic film to produce the functional film. Prior to forming the inorganic film, a member contacts the surface of the organic film in a vacuum chamber at portions where the organic film does not exhibit its functions.

Gas barrier film and method of producing the same

The invention provides a gas barrier film having a high gas barrier property and excellences in transparency, durability and flexibility, and a method of producing the same. In the gas barrier film of the invention, a composition ratio of nitrogen and silicon N/Si in the film is 1.00 to 1.35, a film density is 2.1 g/cm3 to 2.4 g/cm3, a film thickness is 10 nm to 60 nm, and a thickness of a mixed layer at an interface of a substrate and an inorganic film is 5 nm to 40 nm.

Film deposition device

The film deposition device includes a CVD film forming room disposed on a travel path of a substrate and having a function of performing the film deposition on a substrate by CVD, a treatment room disposed upstream or downstream of the CVD film forming room on the travel path and having a function of performing a predetermined treatment on the substrate, and a differential room disposed between and communicating with the CVD film forming room and the treatment room. The differential room includes a evacuation unit, a gas introducing unit for introducing at least one of a gas to be supplied to both of the CVD film forming room and the treatment room, and an inert gas, and a controller which controls the evacuation unit and the gas introducing unit to keep the differential room at a higher pressure than the CVD film forming room and the treatment room.

Functional film and method for manufacturing the functional film

A method for manufacturing a functional film includes steps of: feeding a support continuously from a first film roll, forming a coating film on the support, providing a laminate film on a surface of the coating film, and taking up the support to a second film roll; and loading the second film roll made by the aforementioned step in a vacuum film-forming apparatus, feeding the support provided with the laminate film continuously from the film roll, peeling off the laminate film, forming an inorganic film on the coating film on the support, and taking up the support to a third film roll.

Pattern film forming method and pattern film forming apparatus

A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

Film deposition method

A film deposition method deposits a film on a surface of a substrate in strip form traveling on a peripheral surface of a cylindrical drum in at least one film deposition compartment around the peripheral surface of the drum. The method disposes previously a differential compartment between one film deposition compartment and a compartment including a wrapping space containing at least one of a first position at which the substrate starts to travel on the drum and a second position at which the substrate separates from the drum, the differential compartments communicating with the compartment including the wrapping space and the film deposition compartment, sets a first pressure of the wrapping space lower than a second pressure of the at least one film deposition compartment and performs film deposition in the film deposition compartment with electric power supplied to the drum.

Functional film and method for manufacturing the functional film

The invention provides a functional film and a method for manufacturing a functional film includes steps of: feeding a support continuously from a first film roll, forming a coating film on the support, providing a laminate film on a surface of the coating film, and taking up the support to a second film roll; and loading the second film roll made by the aforementioned step in a vacuum film-forming apparatus, feeding the support provided with the laminate film continuously from the film roll, peeling off the laminate film, forming an inorganic film on the coating film on the support, and taking up the support to a third film roll.

Gas barrier film and method of producing the same

PLASMA APPARATUS AND PLASMA PROCESSING METHOD

The plasma apparatus includes a conveying unit for conveying a substrate in a conveying direction while being situated at a processing position, an elongated electric field forming unit for forming an induction electric field by a coil, opposed to the processing position, a power supply for supplying high frequency power to the coil, an elongated gas introducing unit and a separating unit for separating a region where the forming unit is arranged and a region where the introducing unit is arranged from each other in an airtight fashion, having an elongated dielectric window arranged between the processing position and the forming unit. The forming unit, the introducing unit and the dielectric window are arranged in such a way that there longitudinal directions are matched with a width direction of the substrate being conveyed, and orthogonal to the conveying direction.

GAS BARRIER FILM AND MANUFACTURING METHOD OF GAS BARRIER FILM

A gas barrier film including a substrate of which the surface is formed of an organic material; an inorganic film which is formed on the substrate and contains silicon nitride; and a mixed layer which is formed in an interface between the substrate and the inorganic film, and contains components derived from the organic material and the inorganic film, wherein a compositional ratio N/Si between nitrogen and silicon contained in the inorganic film is 1.00 to 1.35, the inorganic film has a film density of 2.1 g/cmto 2.4 g/cmand a film thickness of 10 nm to 60 nm, and the mixed layer has a thickness of 5 nm to 40 nm. 1. A gas barrier film comprising:a substrate of which the surface is formed of an organic material;an inorganic film which is formed on the substrate and contains silicon nitride; anda mixed layer which is formed in an interface between the substrate and the inorganic film, and contains components derived from the organic material and the inorganic film,wherein a compositional ratio N/Si between nitrogen and silicon contained in the inorganic film is 1.00 to 1.35,{'sup': 3', '3, 'the inorganic film has a film density of 2.1 g/cmto 2.4 g/cmand a film thickness of 10 nm to 60 nm, and'}the mixed layer has a thickness of 5 nm to 40 nm.2. The gas barrier film according to claim 1 , further comprising:an organic film formed on the inorganic film; andan inorganic film formed on the organic film.3. The gas barrier film according to claim 1 ,wherein the substrate has a layer in which an organic film and an inorganic film are alternately formed.4. A manufacturing method of the gas barrier film according to claim 1 ,wherein while a long substrate of which the surface is formed of an organic material is being transported in a longitudinal direction thereof, by using a film forming unit having a pair of electrodes disposed so as to make the substrate being transported interposed therebetween, an inorganic film containing silicon nitride is formed on the substrate by ...

METHOD FOR PRODUCING FUNCTIONAL FILM

A functional film having a particular organic film and a particular inorganic film is produced. The functional film is consistently produced and exhibits the intended performance. The functional film production method includes forming an organic film on a surface of a substrate, handling the substrate having the organic film formed thereon so that no member comes in contact with an organic film surface in vacuum until formation of an inorganic film, and forming the inorganic film by vacuum deposition on the organic film surface.

Film deposition method

A film deposition method deposits a film on a surface of a substrate in strip form traveling on a peripheral surface of a cylindrical drum in at least one film deposition compartment around the peripheral surface of the drum. The method disposes previously a differential compartment between one film deposition compartment and a compartment including a wrapping space containing at least one of a first position at which the substrate starts to travel on the drum and a second position at which the substrate separates from the drum, the differential compartments communicating with the compartment including the wrapping space and the film deposition compartment, sets a first pressure of the wrapping space lower than a second pressure of the at least one film deposition compartment and performs film deposition in the film deposition compartment with electric power supplied to the drum.

Pattern film forming method and pattern film forming apparatus

A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

Pattern film forming method and pattern film forming apparatus

A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

Method for producing functional film

A functional film having a particular organic film and a particular inorganic film is produced. The functional film is consistently produced and exhibits the intended performance. The functional film production method includes forming an organic film on a surface of a substrate, handling the substrate having the organic film formed thereon so that no member comes in contact with an organic film surface in vacuum until formation of an inorganic film, and forming the inorganic film by vacuum deposition on the organic film surface.

METHOD FOR PRODUCING FUNCTIONAL FILM

The method for producing a functional film includes a step of forming an organic film on a surface of a substrate and a step of forming an inorganic film by vacuum deposition on a surface of the organic film to produce the functional film. Prior to forming the inorganic film, a member contacts the surface of the organic film in a vacuum chamber at portions where the organic film does not exhibit its functions.

Pattern film forming method and pattern film forming apparatus

A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

Gas barrier film and method for producing gas barrier film

The purpose of the present invention is to provide: a gas barrier film which exhibits high gas barrier performance, while having excellent transparency, durability and flexibility; and a method for producing the gas barrier film. A gas barrier film of the present invention has a composition ratio of nitrogen to silicon in the film, namely N/Si of 1.00-1.35, a film density of 2.1-2.4 g/cm3, a film thickness of 10-60 nm, and a thickness of a mixed layer of 5-40 nm, said mixed layer being at the interface between a substrate and an inorganic film.

Optical component

This optical component includes a film formation substrate made of plastic, a magnesium fluoride film formed at an upper side of the film formation substrate and a first silicon oxide film formed on the magnesium fluoride film. The magnesium fluoride film may be formed on a surface of the film formation substrate. Alternatively, the optical component further may include a second silicon oxide film formed on a surface of the film formation substrate and between the film formation substrate and the magnesium fluoride film. The optical component can be realized, which is excellent in film adhesiveness, mechanical strength, drug resistance, environment resistance, and the like, as well as optical characteristics, and which is also excellent in productivity, film formation operability, cost, and the like.

MANUFACTURING METHOD OF FUNCTIONAL FILM

When manufacturing a functional film to be formed by using a plasma CVD method while transporting an elongated substrate in a longitudinal direction, an object is to provide a manufacturing method which can prevent a product or the inside of a film forming system from being contaminated during the exposure to air after the film forming is stopped, and can improve productivity and a product quality. The object is achieved by introducing a gas for the exposure to the air into the film forming system after hindering a surface of a film forming electrode from coming into contact with the air inside the film forming system. 1. A manufacturing method of a functional film , comprising:forming a film on a surface of a substrate by using a plasma CVD method while transporting the elongated substrate in the longitudinal direction;stopping the film forming on the substrate; andexposing an inside of a film forming system to the air,wherein the exposing the inside of the film forming system to the air is conducted by introducing the air into the film forming system in a state where a surface of a film forming electrode for forming the film using the plasma CVD method is hindered from coming into contact with the air inside of the film forming system.2. The manufacturing method of a functional film according to claim 1 , further comprising:covering the surface of the film forming electrode with a predetermined cover to hinder the surface of the film forming electrode from coming into contact with the air inside the film forming system.3. The manufacturing method of a functional film according to claim 2 ,wherein the predetermined cover has a shape capable of covering the surface of the film forming electrode to come into contact with the entire surface of the film forming electrode.4. The manufacturing method of a functional film according to claim 2 ,wherein the covering the surface of the film forming electrode with the predetermined cover is conducted by moving and inserting ...

Film forming method

The film forming method first forms a film having at least one layer by a film forming process on a surface of a heat-resistant member having higher heat resistance than a substrate on which the film is to be formed and the film forming process includes a step of performing at a temperature higher than a heat resistance temperature of the substrate. The method thereafter transfers the film formed on the heat-resistant member to the surface of the substrate at a temperature less than the heat resistance temperature of the substrate.

Method of forming patterned films

This method forms a patterned film. The method prepares a transfer member having a transfer surface on which asperities are formed in accordance with a film pattern to be formed, performs stripping treatment on surfaces of at least ridges formed on the transfer surface of the transfer member, thereafter forms a thin film formed by a technology of vacuum film formation on the surfaces of the at least ridges formed on the transfer surface of the transfer member and transfers the thin film formed on the surfaces of at least ridges of the transfer member onto a substrate, thereby forming the patterned film on the substrate.

Film deposition method

Optical component and method of manufacturing the same

The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less. The plurality of films are formed by performing melting of film forming materials other than a film forming material for a film formed on the surface of the substrate after the film is formed on the surface of the substrate.

Plasma apparatus and plasma processing method

The plasma apparatus includes a conveying unit for conveying a substrate in a conveying direction while being situated at a processing position, an elongated electric field forming unit for forming an induction electric field by a coil, opposed to the processing position, a power supply for supplying high frequency power to the coil, an elongated gas introducing unit and a separating unit for separating a region where the forming unit is arranged and a region where the introducing unit is arranged from each other in an airtight fashion, having an elongated dielectric window arranged between the processing position and the forming unit. The forming unit, the introducing unit and the dielectric window are arranged in such a way that there longitudinal directions are matched with a width direction of the substrate being conveyed, and orthogonal to the conveying direction.

Verfahren zur herstellung einer funktionsschicht

Method for producing functional film

The method for producing a functional film includes a step of forming an organic film on a surface of a substrate and a step of forming an inorganic film by vacuum deposition on a surface of the organic film to produce the functional film. Prior to forming the inorganic film, a member contacts the surface of the organic film in a vacuum chamber at portions where the organic film does not exhibit its functions.

Verfahren zur herstellung strukturierter schichten

Verfahren zur herstellung einer funktionsschicht

Optical component

This optical component includes a film formation substrate made of plastic, a magnesium fluoride film formed at an upper side of the film formation substrate and a first silicon oxide film formed on the magnesium fluoride film. The magnesium fluoride film may be formed on a surface of the film formation substrate. Alternatively, the optical component further may include a second silicon oxide film formed on a surface of the film formation substrate and between the film formation substrate and the magnesium fluoride film. The optical component can be realized, which is excellent in film adhesiveness, mechanical strength, drug resistance, environment resistance, and the like, as well as optical characteristics, and which is also excellent in productivity, film formation operability, cost, and the like.