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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Применить Всего найдено 4. Отображено 4.
23-04-2020 дата публикации

SUPER THIN HEATING DISK

Номер: US20200126824A1
Автор: Chen Yi Hsiang, Chou Wei-Chuan, Ho Mu-Chun, Li Cheng Feng, Li Pei-Shan, Ma Kuo Yang
Принадлежит:

A super thin heating disk includes an upper cover made of metal, the upper cover being formed with a receiving groove; a lower cover made of metal and installed within the receiving groove; the heating coil being distributed in the receiving groove; a heating coil installed within the receiving groove, two ends of the heating coil being installed with two electrodes, respectively, which are connected to external positive and negative electrodes for current conduction; a thermal couple installed in the receiving groove for detecting temperatures of the heating coil; the thermal couple being connected to two connection wires for conducting external transmission lines so that detection temperature data can be transferred out; and two insulation layers installed in the receiving groove and at an upper and a lower side of the heating coil. 1. A super thin heating disk , comprising:an upper cover made of metal, the upper cover being formed with a receiving groove;a lower cover made of metal and installed within the receiving groove; the heating coil being distributed in the receiving groove;a heating coil installed within the receiving groove, two ends of the heating coil being installed with two electrodes, respectively, which are connected to external positive and negative electrodes for current conduction;a thermal couple installed in the receiving groove for detecting temperatures of the heating coil; the thermal couple being connected to two connection wires for conducting external transmission lines so that detection temperature data can be transferred out; andtwo insulation layers installed in the receiving groove and at an upper and a lower side of the heating coil.2. The super thin heating disk as claimed in claim 1 , further including a plurality of combining studs claim 1 , a peripheral edge of a bottom of the upper cover is formed with a protrusion; an inner side of the protrusion is formed with a stepped edge; an inner side of the stepped edge is formed with ...

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Номер записи: 1
08-08-2019 дата публикации

PLASMA ETCHING REACTION CHAMBER

Номер: US20190244787A1
Автор: CHEN YI-HSIANG, Cheng Yao-Syuan, CHIU Hsin-Chih, Chou Wei-Chuan, Ho Mu-Chun, Huang Zhi Kai, Wang Chun-Fu
Принадлежит:

A plasma etching reaction chamber includes a casing having a receiving chamber; a base liftably installed below the receiving chamber; a first electrode and a second electrode; and a radio frequency electrode rod. The second electrode has a plurality of water channels and a bottom of the second electrode is installed with two cooling water tubes which are communicated with the plurality of water channels; upper sides of the two cooling water tubes are hidden within the driving rod and lower sides thereof extend downwards to be out of the casing so that external cooling water can flow into the cooling water tubes and then to the water channels to achieve the object of cooling. 1. A plasma etching reaction chamber , comprising:a casing having a receiving chamber; an inner periphery and a bottom of the receiving chamber being formed with respective inner shielding plates for sticking the sub-products generated in the process of plasma cleaning;a base liftably installed below the receiving chamber; a bottom of the base being extended with a driving rod; the driving rod extending downwards to pass through the casing; a driving unit serving to drive the base to move upwards or downwards;a first electrode installed in an upper side of the receiving chamber;a second electrode installed on the base for supporting a wafer;a radio frequency electrode rod installed on a bottom of the second electrode; an upper side of the radio frequency electrode rod being within the driving rod and a lower side of the radio frequency electrode rod extending downwards to expose out of the driving rod and extending out of the casing for supplying externally RF power into the second electrode so that the first electrode and the second electrode can generate plasma therebetween; andwherein the second electrode has a plurality of water channels and a bottom of the second electrode is installed with two cooling water tubes which are communicated with the plurality of water channels; upper sides of ...

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Номер записи: 2
12-09-2019 дата публикации

VAPOR REDUCTION DEVICE FOR A SEMICONDUCTOR WAFER

Номер: US20190279887A1
Автор: CHEN YI-HSIANG, Cheng Ying Hsien, Chou Wei Chuan, Ho Mu-Chun, Huang Zhi Kai, Ma Kuo Yang, Wang Chun-Fu
Принадлежит:

A vapor reduction device for a semiconductor wafer has a plurality of heat plates which are spaced arranged longitudinally for receiving a plurality of wafers, the heat plates are integrated into a heating frame which is further placed into a casing. The movements of the heat plates within the casing causes that the wafers can be heated rapidly and uniformly so as to evaporated vapor effectively. The heat plates are separable from the heating frame and thus a number of the heat plates is selectable as desired. The heating temperature for the heat plates is controllable independently so that the temperatures of the wafers are controllable so that the temperature differences of the wafers are controllable to be uniformly distributed. 1. A vapor reduction device for a semiconductor wafer , comprising: 'a heater having a heating frame and a plurality of heating plates; the heater being movable upwards and downwards in the casing; the heating plate being spaced arranged;', 'a casing having an opening for transfer of wafers;'}a wafer frame being combined to the heating frame for locating wafers and the wafer frame being movable to a position for locating wafers or a locating for heating; in a locating position, the wafer frame being moved to a position for receiving or taking out of a wafer and in a heating position, the wafer frame being moved to a position on the heating the wafer.2. The vapor reduction device for a semiconductor wafer as claimed in claim 1 , wherein the casing has a cavity and inner upper side of the casing has a plurality of stoppers; the heating frame includes a top plate and a base which is parallel to the top plate; two supporting posts and one heat conductive post are connected between the top plate and the base; a bottom of the base is extended with a driving shaft; a plurality of guiding holes penetrates through the base; each of the supporting post is formed with a plurality of buckling grooves; a heating wire passes through the heat conductive ...

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Номер записи: 3
28-11-2019 дата публикации

PVD REACTOR WITH MAGNETIC ROTATION MECHANISM

Номер: US20190362951A1
Автор: Ho Mu Chun, LI Cheng-Feng
Принадлежит:

A PVD reactor with a magnetic rotation mechanism comprises a base installed to a top of an interior of a reactor; a retaining gear fixedly installed at a bottom surface of the base; a central shaft rotatably passing through the base and the retaining gear; a driver for driving the central shaft to rotate; a rotation arm having a receiving groove for receiving the retaining gear; a rotation gear rotatably installed within the receiving groove and engaged with the retaining gear; a center of the rotation gear having a gear shaft; a magnetic disk installed to a lower end of the gear shaft; the magnetic disk containing a plurality of disk bodies which are parallel and a plurality of magnets; the magnets being formed as two spinal shapes which are alternatively arranged and contains two opposite polarities; and a balance block serving to balance the weight of the magnetic disk. 1. A PVD reactor with a magnetic rotation mechanism , comprising:a base fixedly installed to a top of an interior of a reactor;a retaining gear fixedly installed at a bottom surface of the base;a central shaft rotatably passing through the base and the retaining gear;an upper end of the central shaft being connected to a driver so that the driver could drive the central shaft to rotate, and a lower end of the central shaft protruding to a lower side of the retaining gear;a rotation arm retained to a lower end of the central shaft; and one end of the rotation arm having a receiving groove for receiving the retaining gear;a rotation gear rotatably installed within the receiving groove and engaged with the retaining gear; a center of the rotation gear having a gear shaft which downwards penetrates through rotation arm;a magnetic disk installed to a lower end of the gear shaft; the magnetic disk containing a plurality of disk bodies which are parallel and a plurality of magnets; the magnets being formed as two spinal shapes which are alternatively arranged and contains two opposite polarities; anda ...

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Номер записи: 4