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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Применить Всего найдено 8. Отображено 8.
02-10-2013 дата публикации

Fabrication method of array substrate, array substrate and display apparatus

Номер: CN103337477A
Автор: Ji Xinyou
Принадлежит:

Embodiments of the present invention disclose a fabrication method of an array substrate, the array substrate and a display apparatus. The array substrate comprises a pixel region, an alignment region and a pixel testing region, and is characterized in that the alignment region includes an alignment gate layer, an alignment insulation layer and an alignment pixel electrode layer which are sequentially formed on a substrate, and the pixel testing region includes a testing gate layer, a testing insulation layer and a testing pixel electrode layer which are sequentially formed on the substrate. The alignment gate layer and the testing gate layer are arranged on the same layer as a gate layer in the pixel region. The alignment pixel electrode layer and the testing pixel electrode layer are arranged on the same layer as a pixel electrode layer in the pixel region. The alignment insulation layer and the testing insulation layer are arranged on the same layer as a gate insulation layer in the ...

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Номер записи: 1
19-06-2013 дата публикации

Transparent film, manufacturing method thereof, base plate for displaying and display device

Номер: CN103165680A
Автор: Ji Xinyou, Wang Deshuai
Принадлежит:

The invention provides a transparent film, a manufacturing method thereof, a base plate for displaying and a display device, relates to the technical field of display, and solves the problem of low transmittance of an existing transparent film. The transparent film comprises at least three stacked sub layers, the refractive indexes of the stacked sub layers are different, and the refractive index of any sub layer positioned between the bottommost layer and the topmost layer is between the refractive indexes of two sub layers adjacent to the sub layer. The transparent film is applicable to the field of manufacture of the display device.

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Номер записи: 2
19-03-2015 дата публикации

ARRAY SUBSTRATE, DETECTING METHOD AND DETECTING APPARATUS THEREOF

Номер: US20150077753A1
Автор: GUO Jian, Ji Xinyou
Принадлежит:

The present disclosure provides an array substrate comprising a structure to be detected disposed on a base substrate. An additional layer for detecting the structure to be detected is broken is disposed below the structure to be detected. The additional layer has a color different from that of the structure to be detected and a same pattern shape as that of the structure to be detected. The present disclosure also provides a detecting method and detecting apparatus of the array substrate described above. According to the array substrate, the detecting method and the detecting apparatus of the present disclosure, an early detection of the breakage defect occurred during the fabrication process of the array substrate can be achieved so as to discover and eliminate those defects as early as possible, which improves throughput and yield. 1. An array substrate , comprising a structure to be detected disposed on a base substrate , wherein an additional layer for detecting whether the structure to be detected is broken is disposed below the structure to be detected , wherein the additional layer has a color different from that of the structure to be detected and a same pattern shape as that of the structure to be detected.2. The array substrate according to claim 1 , wherein the structure to be detected is at least one of following structures: a gate claim 1 , a gate scanning line claim 1 , a data signal line claim 1 , an active layer claim 1 , a source claim 1 , and a drain.3. The array substrate according to claim 1 , wherein a transparent protective layer is disposed above the additional layer.4. The array substrate according to claim 1 , wherein the additional layer is one of a copper layer claim 1 , an oxide layer of silicon claim 1 , a nitride layer of silicon claim 1 , and polyimide layer with addition of a colorant.5. The array substrate according to claim 1 , wherein the additional layer has a thickness of no more than 5000 Å.6. A detecting method of an array ...

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Номер записи: 3
21-03-2019 дата публикации

Array substrate and display device

Номер: US20190086753A1
Автор: Xinyou Ji, Yanqiang WANG
Принадлежит: Beijing BOE Optoelectronics Technology Co Ltd, BOE Technology Group Co Ltd

An array substrate includes a base substrate and at least three layers of signal lines insulated from each other and arranged in a non-display region. The signal lines include first signal lines in a first layer and second signal lines in a second layer extending in an identical direction, and third signal lines in a third layer crossing the first and the second signal lines. A distance between each third signal line and the base substrate is larger than a distance between each first/second signal line and the base substrate. An orthogonal projection of each first signal line on the base substrate overlaps that of the corresponding third signal line to form a first overlapping region, an orthogonal projection of each second signal line overlaps that of the corresponding third signal line to form a second overlapping region which partially overlaps, or does not overlap, the first overlapping region.

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Номер записи: 4
06-06-2019 дата публикации

Array Structure, Manufacturing Method Thereof, Array Substrate and Display Device

Номер: US20190172845A1
Автор: GUO Jian, Ji Xinyou, Li Fuqiang, SHI Dawei
Принадлежит:

An array structure and a manufacturing method thereof are disclosed. The method for manufacturing the array structure includes: forming a gate insulating layer on a substrate; and etching the gate insulating layer at a position corresponding to a source/drain signal access terminal to form a through-hole structure provided with an outward-inclined side wall in the gate insulating layer. 1. A method for manufacturing an array structure , comprising:forming a gate insulating layer on a substrate; andetching the gate insulating layer at a position corresponding to a source/drain signal access terminal to form a through-hole structure provided with an outward-inclined side wall in the gate insulating layer.2. The method for manufacturing the array structure according to claim 1 , further comprising: forming a source/drain layer on the gate insulating layer and at a position corresponding to the through-hole structure of the gate insulating layer claim 1 , wherein a concavity provided with an outward-inclined side wall is formed in the source/drain layer at the position corresponding to the through-hole structure of the gate insulating layer.3. The method for manufacturing the array structure according to claim 2 , further comprising:forming a passivation layer on the source/drain layer and etching the passivation layer; andforming a conductive film on the passivation layer, whereinthe passivation layer is provided with a through-hole structure which comprises an outward-inclined side wall at the position corresponding to the through-hole structure of the gate insulating layer.4. The method for manufacturing the array structure according to claim 3 , wherein the conductive film is electrically connected with the source/drain layer at the position corresponding to the through-hole structure of the gate insulating layer.5. The method for manufacturing the array structure according to claim 3 , further comprising: forming another conductive film at a position corresponding ...

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Номер записи: 5
22-09-2016 дата публикации

ARRAY STRUCTURE, MANUFACTURING METHOD THEREOF, ARRAY SUBSTRATE AND DISPLAY DEVICE

Номер: US20160276367A1
Автор: GUO Jian, Ji Xinyou, Li Fuqiang, SHI Dawei
Принадлежит:

An array structure and a manufacturing method thereof are disclosed. The method for manufacturing the array structure includes: forming a gate insulating layer on a glass substrate; and etching the gate insulating layer at a position corresponding to a source/drain signal access terminal, and forming a through-hole structure provided with an outward-inclined side wall in the gate insulating layer. Conductive films in the source/drain signal access terminal and a gate signal access terminal which have wires thereof alternate with each other have a same height, so that the forces applied to conductive balls can be more uniform, and hence the conductivity can be improved. 1. A method for manufacturing an array structure , comprising:forming a gate insulating layer on a glass substrate; andetching the gate insulating layer at a position corresponding to a source/drain signal access terminal, and forming a through-hole structure provided with an outward-inclined side wall in the gate insulating layer.2. The method for manufacturing an array structure according to claim 1 , further comprising: forming a source/drain layer on the gate insulating layer claim 1 , etching the source/drain layer at a position corresponding to the through-hole structure claim 1 , and forming a concavity provided with an outward-inclined side wall in the source/drain layer at the position corresponding to the through-hole structure after etching.3. The method for manufacturing an array structure according to claim 2 , further comprising:forming a passivation layer on the source/drain layer and etching the passivation layer; andforming a conductive film on the passivation layer, whereinthe passivation layer is provided with a concavity which comprises an outward-inclined side wall at a position corresponding to the through-hole structure after etching.4. An array structure claim 2 , comprising:a glass substrate; anda gate insulating layer formed on the glass substrate and provided with a through- ...

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Номер записи: 6
29-09-2016 дата публикации

Fabrication method of array substrate, array substrate and display device

Номер: US20160284742A1
Автор: Xinyou Ji
Принадлежит: Beijing BOE Optoelectronics Technology Co Ltd, BOE Technology Group Co Ltd

A fabrication method of an array substrate ( 10 ), an array substrate ( 10 ), and a display device are provided, the array substrate comprising a pixel region, an alignment region and a pixel test region. The alignment region includes an alignment gate layer ( 62 ), an alignment insulating layer and an alignment pixel electrode layer ( 42 ) sequentially formed on a substrate, the pixel test region includes a test gate layer ( 61 ), a test insulating layer and a test pixel electrode layer sequentially formed on the substrate, the alignment gate layer ( 62 ) and the test gate layer ( 61 ) are disposed on a same layer with the gate layer in the pixel region, the alignment pixel electrode layer ( 61 ) and the test pixel electrode layer ( 42 ) are disposed on a same layer with the pixel electrode layer ( 42 ) in the pixel region, the alignment insulating layer and the test insulating layer are disposed on a same layer with the gate insulating layer in the pixel region or the passivation layer in the pixel region.

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Номер записи: 7
14-08-2018 дата публикации

Fabrication method of array substrate, array substrate and display device

Номер: US10050068B2
Автор: Xinyou Ji
Принадлежит: Beijing BOE Optoelectronics Technology Co Ltd, BOE Technology Group Co Ltd

A fabrication method of an array substrate, an array substrate, and a display device are provided, the array substrate comprising a pixel region, an alignment region and a pixel test region. The alignment region includes an alignment gate layer, an alignment insulating layer and an alignment pixel electrode layer sequentially formed on a substrate, the pixel test region includes a test gate layer, a test insulating layer and a test pixel electrode layer sequentially formed on the substrate, the alignment gate layer and the test gate layer are disposed on a same layer with the gate layer in the pixel region, the alignment pixel electrode layer and the test pixel electrode layer are disposed on a same layer with the pixel electrode layer in the pixel region.

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Номер записи: 8