31-10-2012 дата публикации
Номер: CN102758200A
Принадлежит:
The invention discloses a preparing method for a sol-gel silica film, which includes the following steps: a) weighing and taking ethanol, deionized water, formamide and tetraethyl orthosilicate according to the mass ratio of 2.12: 0.75: 0.43: 1 to be uniformly mixed; b) adjusting the pH of the solution obtained through step a to 1 to 2; c) stirring the solution obtained through the step b for 1.5 hours under 50 DEG C; d) preparing a substrate provided with a silica layer, and coating the solution obtained through the step c on the substrate to form a film; e) drying the substrate provided with the film; and f) placing the substrate obtained through the step 3 in a high temperature furnace, heating till 1000 DEG C and annealing for 3 hours, so as to obtain the sol-gel silica film. The preparing method for the sol-gel silica film is simple and has low requirements for the equipment; and the sol-gel silica film prepared through the preparing method is free from cracking, has a compact structure ...
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