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Применить Всего найдено 4. Отображено 4.
07-03-2012 дата публикации

Electron beam exposure system

Номер: CN0101414124B
Автор: VINCENT VAN VEEN ALEXANDER H, PIETER KRUIT, WIELAND MARCO J, KAMPHERBEEK BERT J, VINCENT VAN VEEN ALEXANDER H., KRUIT PIETER, WIELAND MARCO J., KAMPHERBEEK BERT J.
Принадлежит:

The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target (14), comprising: a beamlet generator for generating a plurality of electron beamlets (5a, 5b); a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected tothe modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses (7) wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

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Номер записи: 1
04-04-2012 дата публикации

Electron beam exposure system

Номер: CN0101414128B
Автор: KAMPHERBEEK BERT J, VINCENT VAN VEEN ALEXANDER H, PIETER KRUIT, WIELAND MARCO J, KAMPHERBEEK BERT J., VINCENT VAN VEEN ALEXANDER H., KRUIT PIETER, WIELAND MARCO J.
Принадлежит:

The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target (14), comprising: a beamlet generator for generating a plurality of electron beamlets (5a, 5b); a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected tothe modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses (7) wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

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Номер записи: 2
19-01-2011 дата публикации

Electron beam exposure system

Номер: CN0101414536B
Автор: VINCENT VAN VEEN ALEXANDER H, WIELAND MARCO J, KAMPHERBEEK BERT J, PIETER KRUIT, VINCENT VAN VEEN ALEXANDER H., WIELAND MARCO J., KAMPHERBEEK BERT J., KRUIT PIETER
Принадлежит:

The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target (14), comprising: a beamlet generator for generating a plurality of electron beamlets (5a, 5b); a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected tothe modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses (7) wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

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Номер записи: 3
29-09-2005 дата публикации

Electron beam exposure system

Номер: US2005211921A1
Автор: WIELAND MARCO J, KAMPHERBEEK BERT J, VINCENT VAN VEEN ALEXANDER H, KRUIT PIETER, WIELAND MARCO J., KAMPHERBEEK BERT J., VINCENT VAN VEEN ALEXANDER H.
Принадлежит:

The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

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Номер записи: 4