SWITCH ARRAY CIRCUIT AND SYSTEM USING PROGRAMMABLE VIA STRUCTURES WITH PHASE CHANGE MATERIALS

The present invention provides at least one programmable via structure that includes at least two phase change material vias that are both directly contacting a heating element, the programmable via structure further including a first terminal in contact with a first portion of the heating element, a second terminal in contact with a second portion of the heating element, a third terminal in contact with one of the at least two programmable vias, and a fourth terminal in contact with another one of the at least two programmable vias; a first circuit block in contact with one of the third and fourth terminals; a second circuit block in contact with the third or fourth terminal not contacting the first circuit block; a source region of a first field effect transistor in contact with one of the first and second terminals; and a drain region of a second field effect transistor in contact with the first or second terminal that is not contacting the source region of the first field effect transistor ...

Bonding method for three-dimensional integrated circuit and three-dimensional integrated circuit thereof

The present invention discloses a bonding method for a three-dimensional integrated circuit and the three-dimensional integrated circuit thereof. The bonding method comprises the steps of: providing a substrate; depositing a film layer on the substrate; providing a light source to light onto the film layer to form a graphic structure; forming a metal co-deposition layer by a first metal and a second metal that are co-deposited on the film layer; providing a first integrated circuit having the substrate, the film layer and the metal co-deposition layer sequentially; providing a second integrated circuit that having the metal co-deposition layer, the film layer and the substrate sequentially; and the first integrated circuit is bonded with the second integrated circuit at a predetermined temperature to form a three-dimensional integrated circuit.

CMOS-Process-Compatible Programmable Via Device

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided comprising a substrate; a dielectric layer on the substrate; a heater on at least a portion of a side of the dielectric layer opposite the substrate; a first oxide layer over the side of the dielectric layer opposite the substrate and surrounding at least a portion of the heater; a first capping layer over a side of the first oxide layer opposite the dielectric layer; at least one programmable via extending through the first capping layer and the first oxide layer and in contact with the heater, the programmable via comprising at least one phase change material; a second capping layer over the programmable via; a second oxide layer over a side of the first capping layer opposite the first oxide layer; a pair of first conductive vias, each extending through the first and second oxide layers and the first capping layer, and in contact with the heater; and a second ...

PROGRAMMABLE VIA STRUCTURE AND METHOD OF FABRICATING SAME

A programmable via structure is provided as well as a method of fabricating the same. The inventive programmable via a semiconductor substrate. An oxide layer such as a thermal oxide is located on a surface of the semiconductor substrate. A patterned heating material is located on a surface of the oxide layer. The inventive structure also includes a patterned dielectric material having a least one via filled with a phase change material (PCM). The patterned dielectric material including the PCM filled via is located on a surface of the patterned heating material. A patterned diffusion barrier is located on an exposed surface of said at least one via filled with the phase change material. The inventive structure also includes contact vias that extend through the patterned dielectric material. The contact vias are filled with a conductive material which also extends onto the upper surface of the patterned dielectric material. A conductive material which serves as the input of the device is ...

CMOS-process-compatible programmable via device

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided comprising a substrate; a dielectric layer on the substrate; a heater on at least a portion of a side of the dielectric layer opposite the substrate; a first oxide layer over the side of the dielectric layer opposite the substrate and surrounding at least a portion of the heater; a first capping layer over a side of the first oxide layer opposite the dielectric layer; at least one programmable via extending through the first capping layer and the first oxide layer and in contact with the heater, the programmable via comprising at least one phase change material; a second capping layer over the programmable via; a second oxide layer over a side of the first capping layer opposite the first oxide layer; a pair of first conductive vias, each extending through the first and second oxide layers and the first capping layer, and in contact with the heater; and a second ...

Graphene channel-based devices and methods for fabrication thereof

Graphene-channel based devices and techniques for the fabrication thereof are provided. In one aspect, a semiconductor device includes a first wafer having at least one graphene channel formed on a first substrate, a first oxide layer surrounding the graphene channel and source and drain contacts to the graphene channel that extend through the first oxide layer; and a second wafer having a CMOS device layer formed in a second substrate, a second oxide layer surrounding the CMOS device layer and a plurality of contacts to the CMOS device layer that extend through the second oxide layer, the wafers being bonded together by way of an oxide-to-oxide bond between the oxide layers. One or more of the contacts to the CMOS device layer are in contact with the source and drain contacts. One or more other of the contacts to the CMOS device layer are gate contacts for the graphene channel.

ESD PROTECTION STRUCTURE FOR 3D IC

An electrostatic discharge (ESD) protection structure for a 3D IC is provided. The ESD protection structure includes a first active layer, a through-silicon via (TSV) device and a second active layer. The TSV is disposed in the first active layer, and the second active layer is stacked with the first active layer. The second active layer includes a substrate and an ESD protection device, wherein the ESD protection device having a doping area embedded in the substrate, and the ESD protection device electrically connects the TSV device. 1. An electrostatic discharge (ESD) protection structure for a three-dimensional (3D) integrated circuit (IC) comprising:a first active layer;a through-silicon via (TSV) device, disposed in the first active layer, and a substrate; and', 'an ESD protection device, having a doping area embedded in the substrate, wherein the ESD protection device is electrically connected to the TSV device., 'a second active layer, stacked with the first active layer, and the second active layer comprising2. The ESD protection structure as claimed in claim 1 , wherein the substrate is a P-type substrate claim 1 , and the doping area is an N-type doping area.3. The ESD protection structure as claimed in claim 1 , wherein the second active layer further comprises:a well, embedded between the substrate and the ESD protection device.4. The ESD protection structure as claimed in claim 3 , wherein the substrate is a P-type substrate claim 3 , the well is an N-type well claim 3 , and the doping area is a P-type doping area.5. The ESD protection structure as claimed in claim 1 , wherein the second active layer further comprises:a wire layer; anda first metal contact layer, located on an upper surface of the second active layer, wherein the ESD protection device is electrically connected to a first end of the TSV device through the wire layer and the first metal contact layer.6. The ESD protection structure as claimed in claim 5 , wherein the first active layer ...

Precise-Aligned Lock-And-Key Bonding Structures

Copper (Cu)-to-Cu bonding techniques are provided. In one aspect, a bonding method is provided. The method includes the following steps. A first bonding structure is provided having at least one copper pad embedded in a first insulator and at least one via in the first insulator over the copper pad, wherein the via has tapered sidewalls. A second bonding structure is provided having at least one copper stud embedded in a second insulator, wherein a portion of the copper stud is exposed for bonding and has a domed shape. The first bonding structure is bonded to the second bonding structure by way of a copper-to-copper bonding between the copper pad and the copper stud, wherein the via and the copper stud fit together like a lock-and-key. A bonded structure is also provided.

Graphene Channel-Based Devices and Methods for Fabrication Thereof

Graphene-channel based devices and techniques for the fabrication thereof are provided. In one aspect, a semiconductor device includes a first wafer having at least one graphene channel formed on a first substrate, a first oxide layer surrounding the graphene channel and source and drain contacts to the graphene channel that extend through the first oxide layer; and a second wafer having a CMOS device layer formed in a second substrate, a second oxide layer surrounding the CMOS device layer and a plurality of contacts to the CMOS device layer that extend through the second oxide layer, the wafers being bonded together by way of an oxide-to-oxide bond between the oxide layers. One or more of the contacts to the CMOS device layer are in contact with the source and drain contacts. One or more other of the contacts to the CMOS device layer are gate contacts for the graphene channel. 1. A transistor device , comprising:a substrate;source and drain contacts formed on the substrate;a graphene channel formed on the substrate connecting the source and drain contacts; anda gate contact over the graphene channel, separated from the graphene channel by a dielectric, wherein the gate contact is in a non-overlapping position with the source and drain contacts leaving exposed sections of the graphene channel between the gate contact and the source and drain contacts, and wherein the exposed sections of the graphene channel are doped with an n-type or p-type dopant.2. The device of claim 1 , further comprising:a capping layer over the source and drain contacts, the gate contact and the exposed sections of the graphene channel.3. The device of claim 1 , wherein the substrate comprises an insulating wafer claim 1 , or a wafer having an insulating overlayer4. The device of claim 1 , wherein the substrate comprises a silicon carbide wafer.5. The device of claim 1 , wherein the exposed sections of the graphene channel are doped with an n-type dopant comprising poly(ethylene imine).6. ...

Programmable via devices

A device comprises a heater, a dielectric layer, a phase-change element, and a capping layer. The dielectric layer is disposed at least partially on the heater and defines an opening having a lower portion and an upper portion. The phase-change element occupies the lower portion of the opening and is in thermal contact with the heater. The capping layer overlies the phase-change element and occupies the upper portion of the opening. At least a fraction of the phase-change element is operative to change between lower and higher electrical resistance states in response to an application of an electrical signal to the heater.

COUPLING PIEZOELECTRIC MATERIAL GENERATED STRESSES TO DEVICES FORMED IN INTEGRATED CIRCUITS

A coupling structure for coupling piezoelectric material generated stresses to an actuated device of an integrated circuit includes a rigid stiffener structure formed around a piezoelectric (PE) material and the actuated device, the actuated device comprising a piezoresistive (PR) material that has an electrical resistance dependent upon an applied pressure thereto; and a soft buffer structure formed around the PE material and PR material, the buffer structure disposed between the PE and PR materials and the stiffener structure, wherein the stiffener structure clamps both the PE and PR materials to a substrate over which the PE and PR materials are formed, and wherein the soft buffer structure permits the PE material freedom to move relative to the PR material, thereby coupling stress generated by an applied voltage to the PE material to the PR material so as change the electrical resistance of the PR material.

Three-Dimensional Integrated Circuits and Techniques for Fabrication Thereof

Integrated circuits having complementary metal-oxide semiconductor (CMOS) and photonics circuitry and techniques for three-dimensional integration thereof are provided. In one aspect, a three-dimensional integrated circuit comprises a bottom device layer and a top device layer. The bottom device layer comprises a substrate; a digital CMOS circuitry layer adjacent to the substrate; and a first bonding oxide layer adjacent to a side of the digital CMOS circuitry layer opposite the substrate. The top device layer comprises an analog CMOS and photonics circuitry layer formed in a silicon-on-insulator (SOI) layer having a buried oxide (BOX) with a thickness of greater than or equal to about 0.5 micrometers; and a second bonding oxide layer adjacent to the analog CMOS and photonics circuitry layer. The bottom device layer is bonded to the top device layer by an oxide-to-oxide bond between the first bonding oxide layer and the second bonding oxide layer.

Graphene Channel-Based Devices and Methods for Fabrication Thereof

Graphene-channel based devices and techniques for the fabrication thereof are provided. In one aspect, a semiconductor device includes a first wafer having at least one graphene channel formed on a first substrate, a first oxide layer surrounding the graphene channel and source and drain contacts to the graphene channel that extend through the first oxide layer; and a second wafer having a CMOS device layer formed in a second substrate, a second oxide layer surrounding the CMOS device layer and a plurality of contacts to the CMOS device layer that extend through the second oxide layer, the wafers being bonded together by way of an oxide-to-oxide bond between the oxide layers. One or more of the contacts to the CMOS device layer are in contact with the source and drain contacts. One or more other of the contacts to the CMOS device layer are gate contacts for the graphene channel. 1. A semiconductor device , comprising:a first wafer having at least one graphene channel formed on a first substrate, a first oxide layer surrounding the graphene channel and source and drain contacts to the graphene channel that extend through the first oxide layer; anda second wafer having a complementary metal oxide semiconductor (CMOS) device layer formed in a second substrate, a second oxide layer surrounding the CMOS device layer and a plurality of contacts to the CMOS device layer that extend through the second oxide layer, the first wafer and the second wafer being bonded together by way of an oxide-to-oxide bond between the first and second oxide layers,wherein one or more of the contacts to the CMOS device layer are in contact with the source and drain contacts to the graphene channel, and wherein one or more other of the contacts to the CMOS device layer are gate contacts for the graphene channel.2. The device of claim 1 , wherein the CMOS device layer comprises one or more CMOS wiring claim 1 , structures and devices.3. The device of claim 1 , wherein the first substrate ...

METHOD TO FABRICATE HIGH PERFORMANCE CARBON NANOTUBE TRANSISTOR INTEGRATED CIRCUITS BY THREE-DIMENSIONAL INTEGRATION TECHNOLOGY

Techniques for fabricating carbon nanotube-based devices are provided. In one aspect, a method for fabricating a carbon nanotube-based integrated circuit is provided. The method comprises the following steps. A first wafer comprising carbon nanotubes is provided. A second wafer comprising one or more device elements is provided. One or more of the carbon nanotubes are connected with one or more of the device elements by bonding the first wafer and the second wafer together. A carbon nanotube-based integrated circuit is also provided. 1. A method for fabricating a carbon nanotube-based integrated circuit , comprising the steps of:providing a first wafer comprising carbon nanotubes which is formed by depositing the carbon nanotubes on a first substrate, depositing a first oxide layer onto the substrate covering the carbon nanotubes, and forming one or more first electrodes that extend at least part way through the first oxide layer and are in contact with one or more of the carbon nanotubes;providing a second wafer comprising one or more device elements which is formed by fabricating the device elements on a second substrate, depositing a second oxide layer over the device elements, and forming one or more second electrodes that extend at least part way through the second oxide layer connected to one or more of the device elements; andconnecting one or more of the carbon nanotubes with one or more of the device elements by bonding the first wafer and the second wafer together.2. (canceled)3. The method of claim 1 , further comprising the step of:forming one or more metal layers in the second oxide layer in contact with the device elements.4. The method of claim 1 , wherein both the first electrodes and the second electrodes comprise copper and wherein the step of connecting the carbon nanotubes with the device elements further comprises the steps of forming an oxide-to-oxide bond between the first oxide layer and the second oxide layer; andforming a copper-to-copper ...

HERMETIC SEAL AND RELIABLE BONDING STRUCTURES FOR 3D APPLICATIONS

A sealed microelectronic structure which provides mechanical stress endurance and includes at least two chips being electrically connected to a semiconductor structure at a plurality of locations. Each chip includes a continuous bonding material along it's perimeter and at least one support column connected to each of the chips positioned within the perimeter of each chip. Each support column extends outwardly such that when the at least two chips are positioned over one another the support columns are in mating relation to each other. A seal between the at least two chips results from the overlapping relation of the chip to one another such that the bonding material and support columns are in mating relation to each other. Thus, the seal is formed when the at least two chips are mated together, and results in a bonded chip structure.

Methods of forming tubular objects

A tubular object is fabricated by a method comprising the steps of providing a first layer, forming a second layer on the first layer, and then patterning the second layer to form a raised feature with one or more sidewalls. Subsequently, the first layer is processed such that components of the first layer deposit on the one or more sidewalls of the raised feature.

CMOS-PROCESS-COMPATIBLE PROGRAMMABLE VIA DEVICE

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided comprising a substrate; a dielectric layer on the substrate; a heater on at least a portion of a side of the dielectric layer opposite the substrate; a first oxide layer over the side of the dielectric layer opposite the substrate and surrounding at least a portion of the heater; a first capping layer over a side of the first oxide layer opposite the dielectric layer; at least one programmable via extending through the first capping layer and the first oxide layer and in contact with the heater, the programmable via comprising at least one phase change material; a second capping layer over the programmable via; a second oxide layer over a side of the first capping layer opposite the first oxide layer; a pair of first conductive vias, each extending through the first and second oxide layers and the first capping layer, and in contact with the heater; and a second ...

Techniques for three-dimensional circuit integration

Integrated circuits having complementary metal-oxide semiconductor (CMOS) and photonics circuitry and techniques for three-dimensional integration thereof are provided. In one aspect, a three-dimensional integrated circuit comprises a bottom device layer and a top device layer. The bottom device layer comprises a digital CMOS circuitry layer; and a first bonding oxide layer adjacent to the digital CMOS circuitry layer. The top device layer comprises a substrate; an analog CMOS and photonics circuitry layer formed in a silicon-on-insulator (SOI) layer adjacent to the substrate, the SOI layer having a buried oxide (BOX) with a thickness of greater than or equal to about one micrometer; and a second bonding oxide layer adjacent to a side of the analog CMOS and photonics circuitry layer opposite the substrate. The bottom device layer is bonded to the top device layer by an oxide-to-oxide bond between the first bonding oxide layer and the second bonding oxide layer.

Graphene Channel-Based Devices and Methods for Fabrication Thereof

Graphene-channel based devices and techniques for the fabrication thereof are provided. In one aspect, a semiconductor device includes a first wafer having at least one graphene channel formed on a first substrate, a first oxide layer surrounding the graphene channel and source and drain contacts to the graphene channel that extend through the first oxide layer; and a second wafer having a CMOS device layer formed in a second substrate, a second oxide layer surrounding the CMOS device layer and a plurality of contacts to the CMOS device layer that extend through the second oxide layer, the wafers being bonded together by way of an oxide-to-oxide bond between the oxide layers. One or more of the contacts to the CMOS device layer are in contact with the source and drain contacts. One or more other of the contacts to the CMOS device layer are gate contacts for the graphene channel. 1. A method of fabricating a semiconductor device , comprising the steps of:forming a first wafer having at least one graphene channel formed on a first substrate, a first oxide layer surrounding the graphene channel and source and drain contacts to the graphene channel that extend through the first oxide layer;forming a second wafer having a CMOS device layer formed in a second substrate, a second oxide layer surrounding the CMOS device layer and a plurality of contacts to the CMOS device layer that extend through the second oxide layer; andbonding the first wafer and the second wafer together by way of an oxide-to-oxide bond between the first and second oxide layers, such that one or more of the contacts to the CMOS device layer are in contact with the source and drain contacts to the graphene channel, and one or more other of the contacts to the CMOS device layer are gate contacts for the graphene channel.2. The method of claim 1 , further comprising the step of:flipping one of the first wafer or the second wafer to permit face-to-face bonding with an other of the first wafer or the ...

Switch array circuit and system using programmable via structures with phase change materials

A programmable via structure that includes at least two phase change material vias each directly contacting a heating element, the via structure further including a first terminal in contact with a first heating element portion, a second terminal in contact with a second heating element portion, a third terminal in contact with one of the vias, and a fourth terminal in contact with another one of the vias; a first circuit block in contact with one of the third and fourth terminals; a second circuit block in contact with the third or fourth terminal not contacting the first circuit block; a source region of a first transistor in contact with one of the first and second terminals; and a drain region of a second transistor in contact with the first or second terminal that is not contacting the source region of the first transistor.

Programmable via devices

A device comprises a heater, a dielectric layer, a phase-change element, and a capping layer. The dielectric layer is disposed at least partially on the heater and defines an opening having a lower portion and an upper portion. The phase-change element occupies the lower portion of the opening and is in thermal contact with the heater. The capping layer overlies the phase-change element and occupies the upper portion of the opening. At least a fraction of the phase-change element is operative to change between lower and higher electrical resistance states in response to an application of an electrical signal to the heater.

Coupling piezoelectric material generated stresses to devices formed in integrated circuits

A coupling structure for coupling piezoelectric material generated stresses to an actuated device of an integrated circuit includes a rigid stiffener structure formed around a piezoelectric (PE) material and the actuated device, the actuated device comprising a piezoresistive (PR) material that has an electrical resistance dependent upon an applied pressure thereto; and a soft buffer structure formed around the PE material and PR material, the buffer structure disposed between the PE and PR materials and the stiffener structure, wherein the stiffener structure clamps both the PE and PR materials to a substrate over which the PE and PR materials are formed, and wherein the soft buffer structure permits the PE material freedom to move relative to the PR material, thereby coupling stress generated by an applied voltage to the PE material to the PR material so as change the electrical resistance of the PR material.

BONDING STRUCTURE AND METHOD OF FABRICATING THE SAME

A bonding structure and a method of fabricating the same are provided. A first substrate having a first bonding element and a second substrate having a second bonding element are provided, wherein at least one of the first bonding element and the second bonding element is formed with an alloy. A bonding process is performed to bond the first bonding element with the second bonding element, wherein a diffusion liner is generated at the exposed, non-bonded surface of the bonding structure.

Programmable via devices with air gap isolation

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided. The programmable via device includes a first dielectric layer; a heater over the first dielectric layer; an air gap separating at least a portion of the heater from the first dielectric layer; an isolation layer over the first dielectric layer covering at least a portion of the heater; a capping layer over a side of the isolation layer opposite the first dielectric layer; at least one programmable via extending through the capping layer and at least a portion of the isolation layer and in contact with the heater, the programmable via including at least one phase change material; a conductive cap over the programmable via; a second dielectric layer over a side of the capping layer opposite the isolation layer; a first conductive via and a second conductive via, each extending through the second dielectric layer, the capping layer and at least a portion of the ...

Techniques for Three-Dimensional Circuit Integration

Integrated circuits having complementary metal-oxide semiconductor (CMOS) and photonics circuitry and techniques for three-dimensional integration thereof are provided. In one aspect, a three-dimensional integrated circuit comprises a bottom device layer and a top device layer. The bottom device layer comprises a digital CMOS circuitry layer; and a first bonding oxide layer adjacent to the digital CMOS circuitry layer. The top device layer comprises a substrate; an analog CMOS and photonics circuitry layer formed in a silicon-on-insulator (SOI) layer adjacent to the substrate, the SOI layer having a buried oxide (BOX) with a thickness of greater than or equal to about one micrometer; and a second bonding oxide layer adjacent to a side of the analog CMOS and photonics circuitry layer opposite the substrate. The bottom device layer is bonded to the top device layer by an oxide-to-oxide bond between the first bonding oxide layer and the second bonding oxide layer.

Four-Terminal Reconfigurable Devices

Reconfigurable devices and methods for the fabrication thereof are provided. In one aspect, a reconfigurable device is provided. The reconfigurable device comprises a substrate; a first dielectric layer on the substrate; a conductive layer recessed into at least a portion of a side of the first dielectric layer opposite the substrate; at least one second dielectric layer over the side of the first dielectric layer opposite the substrate, so as to cover the conductive layer; a heater within the second dielectric layer; at least one programmable via extending through the second dielectric layer, extending through and surrounded by the heater and in contact with the conductive layer, the programmable via comprising at least one phase change material; a capping layer over the programmable via; a first conductive via and a second conductive via, each extending through the second dielectric layer and in contact with the heater; and a third conductive via extending through the second dielectric ...

Integrated Circuit Device

An integrated circuit device includes: a first chip including a first substrate and a main circuit formed on said first chip; a second chip stacked on the first substrate and including a second substrate that is independent from the first substrate, and a protective circuit for protecting the main circuit; and a conductive channel unit extending from the protective circuit and electrically connected to the main circuit.

Graphene channel-based devices and methods for fabrication thereof

Graphene-channel based devices and techniques for the fabrication thereof are provided. In one aspect, a semiconductor device includes a first wafer having at least one graphene channel formed on a first substrate, a first oxide layer surrounding the graphene channel and source and drain contacts to the graphene channel that extend through the first oxide layer; and a second wafer having a CMOS device layer formed in a second substrate, a second oxide layer surrounding the CMOS device layer and a plurality of contacts to the CMOS device layer that extend through the second oxide layer, the wafers being bonded together by way of an oxide-to-oxide bond between the oxide layers. One or more of the contacts to the CMOS device layer are in contact with the source and drain contacts. One or more other of the contacts to the CMOS device layer are gate contacts for the graphene channel.

Techniques for three-dimensional circuit integration

Integrated circuits having complementary metal-oxide semiconductor (CMOS) and photonics circuitry and techniques for three-dimensional integration thereof are provided. In one aspect, a three-dimensional integrated circuit comprises a bottom device layer and a top device layer. The bottom device layer comprises a digital CMOS circuitry layer; and a first bonding oxide layer adjacent to the digital CMOS circuitry layer. The top device layer comprises a substrate; an analog CMOS and photonics circuitry layer formed in a silicon-on-insulator (SOI) layer adjacent to the substrate, the SOI layer having a buried oxide (BOX) with a thickness of greater than or equal to about one micrometer; and a second bonding oxide layer adjacent to a side of the analog CMOS and photonics circuitry layer opposite the substrate. The bottom device layer is bonded to the top device layer by an oxide-to-oxide bond between the first bonding oxide layer and the second bonding oxide layer.

Bonding structure for semiconductor package and method of manufacturing the same

A method of manufacturing a bonding structure includes (a) providing a substrate, wherein the substrate includes a top surface and at least one bonding pad disposed adjacent to the top surface of the substrate, at least one bonding pad having a sloped surface with a first slope; (b) providing a semiconductor element, wherein the semiconductor element includes at least one pillar, and at least one pillar has a sidewall with a second slope, wherein the absolute value of the first slope is smaller than the absolute value of the second slope; and (c) bonding at least one pillar to a portion of the sloped surface of corresponding ones of the at least one bonding pad.

Semiconductor device, manufacturing method and stacking structure thereof

A semiconductor device includes a substrate, a redistribution layer, a plurality of through-silicon vias (TSVs), and a plating seed layer. The substrate has a first surface and a second surface opposite to each other, and a plurality of cavities. The redistribution layer is disposed on the first surface, and the TSVs are respectively disposed in the cavities. The plating seed layer is disposed between the inner wall of each of the cavities and the corresponding TSVs. The anti-oxidation layer is disposed between the plating seed layer and the corresponding TSVs. The buffer layer covers the first surface and exposes the redistribution layers. Furthermore, a manufacturing method and a stacking structure of the semiconductor device are also provided.

BONDING OF SUBSTRATES INCLUDING METAL-DIELECTRIC PATTERNS WITH METAL RAISED ABOVE DIELECTRIC

Bonding of substrates including metal-dielectric patterns on a surface with the metal raised above the dielectric is disclosed. One method includes providing a first substrate having a metal-dielectric pattern on a surface thereof; providing a second substrate having a metal-dielectric pattern on a surface thereof; performing a process resulting in the metal being raised above the dielectric; cleaning the metal; and bonding the first substrate to the second substrate. A related structure is also disclosed. The bonding of raised metal provides a strong bonding medium, and good electrical and thermal connections enabling creation of three dimensional integrated structures with enhanced functionality.

METHOD OF FORMING A MULTI-LAYER SEMICONDUCTOR STRUCTURE INCORPORATING A PROCESSING HANDLE MEMBER

A method of forming a multi-layer semiconductor structure includes attaching a handle-member to a top surface of a first structure using a first interface. At least one region of a bottom surface of the first structure is etched to form at least a first via-hole for exposing a portion of a first conductive member defined on the first structure. A conductive material is disposed in the first via-hole such that a first end of the conductive material is in electrical communication with the first conductive member and a second end of the conductive material is exposed at the bottom surface of the first structure. A second interface is disposed over at least the second end of the conductive material, which serves as a bonding and/or electrical interface between the first conductive member defined on the first structure and a second structure of the multi-layer semiconductor device structure.

COUPLING PIEZOELECTRIC MATERIAL GENERATED STRESSES TO DEVICES FORMED IN INTEGRATED CIRCUITS

A coupling structure for coupling piezoelectric material generated stresses to an actuated device of an integrated circuit includes a rigid stiffener structure formed around a piezoelectric (PE) material and the actuated device, the actuated device comprising a piezoresistive (PR) material that has an electrical resistance dependent upon an applied pressure thereto; and a soft buffer structure formed around the PE material and PR material, the buffer structure disposed between the PE and PR materials and the stiffener structure, wherein the stiffener structure clamps both the PE and PR materials to a substrate over which the PE and PR materials are formed, and wherein the soft buffer structure permits the PE material freedom to move relative to the PR material, thereby coupling stress generated by an applied voltage to the PE material to the PR material so as change the electrical resistance of the PR material.

Precise-Aligned Lock-and-Key Bonding Structures

Copper (Cu)-to-Cu bonding techniques are provided. In one aspect, a bonding method is provided. The method includes the following steps. A first bonding structure is provided having at least one copper pad embedded in a first insulator and at least one via in the first insulator over the copper pad, wherein the via has tapered sidewalls. A second bonding structure is provided having at least one copper stud embedded in a second insulator, wherein a portion of the copper stud is exposed for bonding and has a domed shape. The first bonding structure is bonded to the second bonding structure by way of a copper-to-copper bonding between the copper pad and the copper stud, wherein the via and the copper stud fit together like a lock-and-key. A bonded structure is also provided.

FOUR-TERMINAL PROGRAMMABLE VIA-CONTAINING STRUCTURE AND METHOD OF FABRICATING SAME

A semiconductor structure that includes two programmable vias each of which contains a phase change material that is integrated with a heating material. In particular, the present invention provides a structure in which two programmable vias, each containing a phase change material, are located on opposing surfaces of a heating material. Each end portion of an upper surface of the heating material is connected to a metal terminal. These metal terminals, which are in contact with the end portions of the upper surface of the heating material, can be each connected to an outside component that controls and switches the resistance states of the two programmable vias. The two programmable vias of the inventive structure are each connected to another metal terminal. These metal terminals that are associated with the programmable vias can be also connected to a circuit block that may be present in the structure.

Method of forming a multi-layer semiconductor structure incorporating a processing handle member

A method of forming a multi-layer semiconductor structure includes attaching a handle-member to a top surface of a first structure using a first interface. At least one region of a bottom surface of the first structure is etched to form at least a first via-hole for exposing a portion of a first conductive member defined on the first structure. A conductive material is disposed in the first via-hole such that a first end of the conductive material is in electrical communication with the first conductive member and a second end of the conductive material is exposed at the bottom surface of the first structure. A second interface is disposed over at least the second end of the conductive material, which serves as a bonding and/or electrical interface between the first conductive member defined on the first structure and a second structure of the multi-layer semiconductor device structure.

BONDING OF SUBSTRATES INCLUDING METAL-DIELECTRIC PATTERNS WITH METAL RAISED ABOVE DIELECTRIC AND STRUCTURES SO FORMED

Bonding of substrates including metal-dielectric patterns on a surface with the metal raised above the dielectric, as well as related structures, are disclosed. One method includes providing a first substrate having a metal-dielectric pattern on a surface thereof; providing a second substrate having a metal-dielectric pattern on a surface thereof; performing a process resulting in the metal being raised above the dielectric; cleaning the metal; and bonding the first substrate to the second substrate. A related structure is also disclosed. The bonding of raised metal provides a strong bonding medium, and good electrical and thermal connections enabling creation of three dimensional integrated structures with enhanced functionality.

Methods of Forming Tubular Objects

A tubular object is fabricated by a method comprising the steps of providing a first layer, forming a second layer on the first layer, and then patterning the second layer to form a raised feature with one or more sidewalls. Subsequently, the first layer is processed such that components of the first layer deposit on the one or more sidewalls of the raised feature.

Graphene Channel-Based Devices and Methods for Fabrication Thereof

Graphene-channel based devices and techniques for the fabrication thereof are provided. In one aspect, a semiconductor device includes a first wafer having at least one graphene channel formed on a first substrate, a first oxide layer surrounding the graphene channel and source and drain contacts to the graphene channel that extend through the first oxide layer; and a second wafer having a CMOS device layer formed in a second substrate, a second oxide layer surrounding the CMOS device layer and a plurality of contacts to the CMOS device layer that extend through the second oxide layer, the wafers being bonded together by way of an oxide-to-oxide bond between the oxide layers. One or more of the contacts to the CMOS device layer are in contact with the source and drain contacts. One or more other of the contacts to the CMOS device layer are gate contacts for the graphene channel.

Bonding of substrates including metal-dielectric patterns with metal raised above dielectric

Bonding of substrates including metal-dielectric patterns on a surface with the metal raised above the dielectric is disclosed. One method includes providing a first substrate having a metal-dielectric pattern on a surface thereof; providing a second substrate having a metal-dielectric pattern on a surface thereof; performing a process resulting in the metal being raised above the dielectric; cleaning the metal; and bonding the first substrate to the second substrate. A related structure is also disclosed. The bonding of raised metal provides a strong bonding medium, and good electrical and thermal connections enabling creation of three dimensional integrated structures with enhanced functionality.

HERMETIC SEAL AND RELIABLE BONDING STRUCTURES FOR 3D APPLICATIONS

A sealed microelectronic structure which provides mechanical stress endurance and includes at least two chips being electrically connected to a semiconductor structure at a plurality of locations. Each chip includes a continuous bonding material along it's perimeter and at least one support column connected to each of the chips positioned within the perimeter of each chip. Each support column extends outwardly such that when the at least two chips are positioned over one another the support columns are in mating relation to each other. A seal between the at least two chips results from the overlapping relation of the chip to one another such that the bonding material and support columns are in mating relation to each other. Thus, the seal is formed when the at least two chips are mated together, and results in a bonded chip structure.

THREE-DIMENSIONAL INTEGRATED CIRCUIT

A three-dimensional integrated circuit, including a first adhesive bonding layer, a first chip, a second chip, and an inter-stratum thermal pad, is provided. The first adhesive bonding layer has a first surface and a second surface opposite to each other. The first chip is disposed on the first surface of the first adhesive bonding layer. The first chip includes a hot zone. The second chip is disposed on the second surface of the first adhesive bonding layer. The inter-stratum thermal pad is embedded in the first adhesive bonding layer and faces to the hot zone. 1. A three-dimensional integrated circuit , comprising:a first adhesive bonding layer comprising a first surface and a second surface opposite to each other;a first chip disposed on the first surface of the first adhesive bonding layer and comprising a hot zone;a second chip disposed on the second surface of the first adhesive bonding layer; andan inter-stratum thermal pad embedded in the first adhesive bonding layer and facing to the hot zone.2. The three-dimensional integrated circuit according to claim 1 , wherein a material of the inter-stratum thermal pad comprises a material that has a high coefficient of thermal conductivity claim 1 , which is at least equal to a coefficient of thermal conductivity of a first substrate of the first chip.3. The three-dimensional integrated circuit according to claim 1 , wherein the material of the inter-stratum thermal pad comprises copper.4. The three-dimensional integrated circuit according to claim 1 , further comprising:at least one first thermal via penetrating the first adhesive bonding layer and the second chip and located in a portion of the inter-stratum thermal pad.5. The three-dimensional integrated circuit according to claim 4 , wherein the at least one first thermal via is disposed to face right to the hot zone.6. The three-dimensional integrated circuit according to claim 4 , wherein the first chip comprises:a first substrate penetrated by the at least ...

CMOS-process-compatible programmable via device

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided comprising a substrate; a dielectric layer on the substrate; a heater on at least a portion of a side of the dielectric layer opposite the substrate; a first oxide layer over the side of the dielectric layer opposite the substrate and surrounding at least a portion of the heater; a first capping layer over a side of the first oxide layer opposite the dielectric layer; at least one programmable via extending through the first capping layer and the first oxide layer and in contact with the heater, the programmable via comprising at least one phase change material; a second capping layer over the programmable via; a second oxide layer over a side of the first capping layer opposite the first oxide layer; a pair of first conductive vias, each extending through the first and second oxide layers and the first capping layer, and in contact with the heater; and a second ...

Techniques for Three-Dimensional Circuit Integration

Integrated circuits having complementary metal-oxide semiconductor (CMOS) and photonics circuitry and techniques for three-dimensional integration thereof are provided. In one aspect, a three-dimensional integrated circuit comprises a bottom device layer and a top device layer. The bottom device layer comprises a digital CMOS circuitry layer; and a first bonding oxide layer adjacent to the digital CMOS circuitry layer. The top device layer comprises a substrate; an analog CMOS and photonics circuitry layer formed in a silicon-on-insulator (SOI) layer adjacent to the substrate, the SOI layer having a buried oxide (BOX) with a thickness of greater than or equal to about one micrometer; and a second bonding oxide layer adjacent to a side of the analog CMOS and photonics circuitry layer opposite the substrate. The bottom device layer is bonded to the top device layer by an oxide-to-oxide bond between the first bonding oxide layer and the second bonding oxide layer.

Four-terminal programmable via-containing structure and method of fabricating same

A semiconductor structure that includes two programmable vias each of which contains a phase change material that is integrated with a heating material. In particular, the present invention provides a structure in which two programmable vias, each containing a phase change material, are located on opposing surfaces of a heating material. Each end portion of an upper surface of the heating material is connected to a metal terminal. These metal terminals, which are in contact with the end portions of the upper surface of the heating material, can be each connected to an outside component that controls and switches the resistance states of the two programmable vias. The two programmable vias of the inventive structure are each connected to another metal terminal. These metal terminals that are associated with the programmable vias can be also connected to a circuit block that may be present in the structure.

Four-terminal reconfigurable devices

Reconfigurable devices and methods for the fabrication thereof are provided. In one aspect, a reconfigurable device is provided. The reconfigurable device comprises a substrate; a first dielectric layer on the substrate; a conductive layer recessed into at least a portion of a side of the first dielectric layer opposite the substrate; at least one second dielectric layer over the side of the first dielectric layer opposite the substrate, so as to cover the conductive layer; a heater within the second dielectric layer; at least one programmable via extending through the second dielectric layer, extending through and surrounded by the heater and in contact with the conductive layer, the programmable via comprising at least one phase change material; a capping layer over the programmable via; a first conductive via and a second conductive via, each extending through the second dielectric layer and in contact with the heater; and a third conductive via extending through the second dielectric ...

HERMETIC SEAL AND RELIABLE BONDING STRUCTURES FOR 3D APPLICATIONS

A sealed microelectronic structure which provides mechanical stress endurance and includes at least two chips being electrically connected to a semiconductor structure at a plurality of locations. Each chip includes a continuous bonding material along it's perimeter and at least one support column connected to each of the chips positioned within the perimeter of each chip. Each support column extends outwardly such that when the at least two chips are positioned over one another the support columns are in mating relation to each other. A seal between the at least two chips results from the overlapping relation of the chip to one another such that the bonding material and support columns are in mating relation to each other. Thus, the seal is formed when the at least two chips are mated together, and results in a bonded chip structure.

Programmable via devices in back end of line level

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided. The programmable via device comprises a first dielectric layer; at least one isolation layer over the first dielectric layer; a heater within the isolation layer; a capping layer over a side of the isolation layer opposite the first dielectric layer; at least one programmable via extending through the capping layer and at least a portion of the isolation layer and in contact with the heater, the programmable via comprising at least one phase change material; a conductive cap over the programmable via; a second dielectric layer over a side of the capping layer opposite the isolation layer; a first conductive via and a second conductive via, each extending through the second dielectric layer, the capping layer and at least a portion of the isolation layer and in contact with the heater; and a third conductive via extending through the second dielectric layer and in contact with the conductive cap.

Precise-aligned lock-and-key bonding structures

Copper (Cu)-to-Cu bonding techniques are provided. In one aspect, a bonding method is provided. The method includes the following steps. A first bonding structure is provided having at least one copper pad embedded in a first insulator and at least one via in the first insulator over the copper pad, wherein the via has tapered sidewalls. A second bonding structure is provided having at least one copper stud embedded in a second insulator, wherein a portion of the copper stud is exposed for bonding and has a domed shape. The first bonding structure is bonded to the second bonding structure by way of a copper-to-copper bonding between the copper pad and the copper stud, wherein the via and the copper stud fit together like a lock-and-key. A bonded structure is also provided.

Wafer bonded access device for multi-layer phase change memory using lock-and-key alignment

A method for fabricating a multi-layer phase change memory device includes forming a phase change memory layer including a plurality of phase change memory elements on a word line formed on a plurality of semiconductor devices on a first semiconductor substrate, each phase change element having a notch formed at an upper surface thereof, forming an access device layer including plurality of access devices on a second semiconductor substrate, each access device having a conductive bump formed thereon, and combining the first and second semiconductor substrates and slidably inserting and locking each conductive bump of the plurality of access devices into each notch of the plurality of phase change memory elements to electrically connect the access devices to the phase change memory elements.

Hermetic seal and reliable bonding structures for 3D applications

A sealed microelectronic structure which provides mechanical stress endurance and includes at least two chips being electrically connected to a semiconductor structure at a plurality of locations. Each chip includes a continuous bonding material along it's perimeter and at least one support column connected to each of the chips positioned within the perimeter of each chip. Each support column extends outwardly such that when the at least two chips are positioned over one another the support columns are in mating relation to each other. A seal between the at least two chips results from the overlapping relation of the chip to one another such that the bonding material and support columns are in mating relation to each other. Thus, the seal is formed when the at least two chips are mated together, and results in a bonded chip structure.

Hermetic seal and reliable bonding structures for 3D applications

A sealed microelectronic structure which provides mechanical stress endurance and includes at least two chips being electrically connected to a semiconductor structure at a plurality of locations. Each chip includes a continuous bonding material along it's perimeter and at least one support column connected to each of the chips positioned within the perimeter of each chip. Each support column extends outwardly such that when the at least two chips are positioned over one another the support columns are in mating relation to each other. A seal between the at least two chips results from the overlapping relation of the chip to one another such that the bonding material and support columns are in mating relation to each other. Thus, the seal is formed when the at least two chips are mated together, and results in a bonded chip structure.

Method of forming a multi-layer semiconductor structure incorporating a processing handle member

A method of forming a multi-layer semiconductor structure includes attaching a handle-member to a top surface of a first structure using a first interface. At least one region of a bottom surface of the first structure is etched to form at least a first via-hole for exposing a portion of a first conductive member defined on the first structure. A conductive material is disposed in the first via-hole such that a first end of the conductive material is in electrical communication with the first conductive member and a second end of the conductive material is exposed at the bottom surface of the first structure. A second interface is disposed over at least the second end of the conductive material, which serves as a bonding and/or electrical interface between the first conductive member defined on the first structure and a second structure of the multi-layer semiconductor device structure.

Three-dimensional integrated circuits and techniques for fabrication thereof

Integrated circuits having complementary metal-oxide semiconductor (CMOS) and photonics circuitry and techniques for three-dimensional integration thereof are provided. In one aspect, a three-dimensional integrated circuit comprises a bottom device layer and a top device layer. The bottom device layer comprises a substrate; a digital CMOS circuitry layer adjacent to the substrate; and a first bonding oxide layer adjacent to a side of the digital CMOS circuitry layer opposite the substrate. The top device layer comprises an analog CMOS and photonics circuitry layer formed in a silicon-on-insulator (SOI) layer having a buried oxide (BOX) with a thickness of greater than or equal to about 0.5 micrometers; and a second bonding oxide layer adjacent to the analog CMOS and photonics circuitry layer. The bottom device layer is bonded to the top device layer by an oxide-to-oxide bond between the first bonding oxide layer and the second bonding oxide layer.

PROGRAMMABLE VIA DEVICES IN BACK END OF LINE LEVEL

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided. The programmable via device comprises a first dielectric layer; at least one isolation layer over the first dielectric layer; a heater within the isolation layer; a capping layer over a side of the isolation layer opposite the first dielectric layer; at least one programmable via extending through the capping layer and at least a portion of the isolation layer and in contact with the heater, the programmable via comprising at least one phase change material; a conductive cap over the programmable via; a second dielectric layer over a side of the capping layer opposite the isolation layer; a first conductive via and a second conductive via, each extending through the second dielectric layer, the capping layer and at least a portion of the isolation layer and in contact with the heater; and a third conductive via extending through the second dielectric layer and in contact with the conductive cap.

Programmable Via Devices in Back End of Line Level

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided. The programmable via device comprises a first dielectric layer; at least one isolation layer over the first dielectric layer; a heater within the isolation layer; a capping layer over a side of the isolation layer opposite the first dielectric layer; at least one programmable via extending through the capping layer and at least a portion of the isolation layer and in contact with the heater, the programmable via comprising at least one phase change material; a conductive cap over the programmable via; a second dielectric layer over a side of the capping layer opposite the isolation layer; a first conductive via and a second conductive via, each extending through the second dielectric layer, the capping layer and at least a portion of the isolation layer and in contact with the heater; and a third conductive via extending through the second dielectric layer ...

Graphene channel-based devices and methods for fabrication thereof

Graphene-channel based devices and techniques for the fabrication thereof are provided. In one aspect, a semiconductor device includes a first wafer having at least one graphene channel formed on a first substrate, a first oxide layer surrounding the graphene channel and source and drain contacts to the graphene channel that extend through the first oxide layer; and a second wafer having a CMOS device layer formed in a second substrate, a second oxide layer surrounding the CMOS device layer and a plurality of contacts to the CMOS device layer that extend through the second oxide layer, the wafers being bonded together by way of an oxide-to-oxide bond between the oxide layers. One or more of the contacts to the CMOS device layer are in contact with the source and drain contacts. One or more other of the contacts to the CMOS device layer are gate contacts for the graphene channel.

Programmable Via Devices with Air Gap Isolation

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided. The programmable via device comprises a first dielectric layer; a heater over the first dielectric layer; an air gap separating at least a portion of the heater from the first dielectric layer; an isolation layer over the first dielectric layer covering at least a portion of the heater; a capping layer over a side of the isolation layer opposite the first dielectric layer; at least one programmable via extending through the capping layer and at least a portion of the isolation layer and in contact with the heater, the programmable via comprising at least one phase change material; a conductive cap over the programmable via; a second dielectric layer over a side of the capping layer opposite the isolation layer; a first conductive via and a second conductive via, each extending through the second dielectric layer, the capping layer and at least a portion of the isolation layer and in contact with the heater; and a third conductive via extending through the second dielectric layer and in contact with the conductive cap.

CMOS-Process-Compatible Programmable Via Device

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided comprising a substrate; a dielectric layer on the substrate; a heater on at least a portion of a side of the dielectric layer opposite the substrate; a first oxide layer over the side of the dielectric layer opposite the substrate and surrounding at least a portion of the heater; a first capping layer over a side of the first oxide layer opposite the dielectric layer; at least one programmable via extending through the first capping layer and the first oxide layer and in contact with the heater, the programmable via comprising at least one phase change material; a second capping layer over the programmable via; a second oxide layer over a side of the first capping layer opposite the first oxide layer; a pair of first conductive vias, each extending through the first and second oxide layers and the first capping layer, and in contact with the heater; and a second ...

Programmable via structure and method of fabricating same

A programmable via structure is provided as well as a method of fabricating the same. The inventive programmable via a semiconductor substrate. An oxide layer such as a thermal oxide is located on a surface of the semiconductor substrate. A patterned heating material is located on a surface of the oxide layer. The inventive structure also includes a patterned dielectric material having a least one via filled with a phase change material (PCM). The patterned dielectric material including the PCM filled via is located on a surface of the patterned heating material. A patterned diffusion barrier is located on an exposed surface of said at least one via filled with the phase change material. The inventive structure also includes contact vias that extend through the patterned dielectric material. The contact vias are filled with a conductive material which also extends onto the upper surface of the patterned dielectric material. A conductive material which serves as the input of the device is ...

Semiconductor bonding structure

The disclosure relates to a semiconductor bonding structure and process and a semiconductor chip. The semiconductor bonding structure includes a first pillar, a first interface, an intermediate area, a second interface and a second pillar in sequence. The first pillar, the second pillar and the intermediate area include a first metal. The first interface and the second interface include the first metal and an oxide of a second metal. The content percentage of the first metal in the first interface and the second interface is less than that of the first metal in the intermediate area.

Programmable via devices in back end of line level

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided. The programmable via device comprises a first dielectric layer; at least one isolation layer over the first dielectric layer; a heater within the isolation layer; a capping layer over a side of the isolation layer opposite the first dielectric layer; at least one programmable via extending through the capping layer and at least a portion of the isolation layer and in contact with the heater, the programmable via comprising at least one phase change material; a conductive cap over the programmable via; a second dielectric layer over a side of the capping layer opposite the isolation layer; a first conductive via and a second conductive via, each extending through the second dielectric layer, the capping layer and at least a portion of the isolation layer and in contact with the heater; and a third conductive via extending through the second dielectric layer ...

Methods of Forming Features in Integrated Circuits

A feature is formed in an integrated circuit by providing one or more layers to be patterned, providing a first layer overlying the one or more layers to be patterned, and providing a second layer overlying the first layer. The second layer is patterned to form a raised feature with one or more sidewalls. Subsequently, the first layer is processed such that components of the first layer deposit on the one or more sidewalls of the raised feature to form a mask. The mask is used to pattern the one or more layers to be patterned.

Bonding element and method for manufacturing the same

A bonding element and a method for manufacturing the same thereof are provide, wherein the method comprises the following steps: providing a carrier substrate; forming a first metal layer on the carrier substrate; forming a first insulating layer on the first metal layer, wherein the first insulating layer includes a first through hole; forming a first passivation layer and a first conductive layer in the first through hole, wherein the first passivation layer and the first conductive layer in the first through hole form a first connecting bump; forming a first substrate on the first connection bump and the first insulating layer; removing the carrier substrate and the first metal layer to form a first sub-bonding element; and connecting the first sub-bonding element and a second sub-bonding element with a surface of the first passivation of the first connection bump to form the bonding element.

Programmable Via Devices

A device comprises a heater, a dielectric layer, a phase-change element, and a capping layer. The dielectric layer is disposed at least partially on the heater and defines an opening having a lower portion and an upper portion. The phase-change element occupies the lower portion of the opening and is in thermal contact with the heater. The capping layer overlies the phase-change element and occupies the upper portion of the opening. At least a fraction of the phase-change element is operative to change between lower and higher electrical resistance states in response to an application of an electrical signal to the heater.

Graphene channel-based devices and methods for fabrication thereof

Graphene-channel based devices and techniques for the fabrication thereof are provided. In one aspect, a semiconductor device includes a first wafer having at least one graphene channel formed on a first substrate, a first oxide layer surrounding the graphene channel and source and drain contacts to the graphene channel that extend through the first oxide layer; and a second wafer having a CMOS device layer formed in a second substrate, a second oxide layer surrounding the CMOS device layer and a plurality of contacts to the CMOS device layer that extend through the second oxide layer, the wafers being bonded together by way of an oxide-to-oxide bond between the oxide layers. One or more of the contacts to the CMOS device layer are in contact with the source and drain contacts. One or more other of the contacts to the CMOS device layer are gate contacts for the graphene channel.

Sloped bonding structure for semiconductor package

A bonding structure includes a substrate having a top surface and including at least one bonding pad. Each bonding pad is disposed adjacent to the top surface of the substrate and has a sloped surface. A semiconductor element includes at least one pillar. Each pillar is bonded to a portion of the sloped surface of a corresponding bonding pad, and a gap is formed between a sidewall of the pillar and the sloped surface of the corresponding bonding pad.

SEMICONDCUTOR DEVICE, MANUFACTURING METHOD AND STACKING STRUCTURE THEREOF

A semiconductor device includes a substrate, a redistribution layer, a plurality of through-silicon vias (TSVs), and a plating seed layer. The substrate has a first surface and a second surface opposite to each other, and a plurality of cavities. The redistribution layer is disposed on the first surface, and the TSVs are respectively disposed in the cavities. The plating seed layer is disposed between the inner wall of each of the cavities and the corresponding TSVs. The anti-oxidation layer is disposed between the plating seed layer and the corresponding TSVs. The buffer layer covers the first surface and exposes the redistribution layers. Furthermore, a manufacturing method and a stacking structure of the semiconductor device are also provided. 1. A semiconductor device , comprising:a substrate, comprising a first surface, a second surface opposite to the first surface, and a plurality of cavities, wherein the cavities respectively connect the first surface and the second surface;a redistribution layer, disposed on the first surface;a plurality of through-silicon vias, disposed in the cavities, and each of the through-silicon vias respectively including a first end and a second end opposite to each other, wherein the first end of each through-silicon via is connected to the redistribution layer, and the second end of each through-silicon via protrudes from the second surface;a plating seed layer, disposed between an inner wall of each of the cavities and the corresponding through-silicon vias;an anti-oxidation layer, disposed between the plating seed layer and the corresponding through-silicon vias, and a portion of the anti-oxidation layer covers the second ends of the corresponding through-silicon vias; anda buffer layer, disposed on the substrate, covering the first surface, and exposing the redistribution layer.2. The semiconductor device as claimed in claim 1 , wherein the plating seed layer comprises a titanium copper composite layer claim 1 , and the ...

Programmable Via Devices

A device comprises a heater, a dielectric layer, a phase-change element, and a capping layer. The dielectric layer is disposed at least partially on the heater and defines an opening having a lower portion and an upper portion. The phase-change element occupies the lower portion of the opening and is in thermal contact with the heater. The capping layer overlies the phase-change element and occupies the upper portion of the opening. At least a fraction of the phase-change element is operative to change between lower and higher electrical resistance states in response to an application of an electrical signal to the heater.

Heterostructure containing IC and LED and method for fabricating the same

A heterostructure containing IC and LED and a method of fabricating. An IC and an LED are established with the IC having a first electric-conduction block and a first connection block. The IC electrically connects to the first electric-conduction block. A first face of the LED has a second electric-conduction block and a second connection block. The LED is electrically connected to the second electric-conduction block. The first electric-conduction block and the first connection block are respectively joined to the second electric-conduction block and the second connection block, and the first electric-conduction block are electrically connected with the second electric-conduction block to form a heterostructure. The heterostructure provides functions of heat radiation and electric communication for IC and LED.

PROGRAMMABLE VIA STRUCTURE AND METHOD OF FABRICATING SAME

A programmable via structure is provided as well as a method of fabricating the same. The inventive programmable via a semiconductor substrate. An oxide layer such as a thermal oxide is located on a surface of the semiconductor substrate. A patterned heating material is located on a surface of the oxide layer. The inventive structure also includes a patterned dielectric material having a least one via filled with a phase change material (PCM). The patterned dielectric material including the PCM filled via is located on a surface of the patterned heating material. A patterned diffusion barrier is located on an exposed surface of said at least one via filled with the phase change material. The inventive structure also includes contact vias that extend through the patterned dielectric material. The contact vias are filled with a conductive material which also extends onto the upper surface of the patterned dielectric material. A conductive material which serves as the input of the device is located atop the patterned diffusion barrier that is located directly above the via that is filled with the phase change material.

Three-dimensional integrated circuits and techniques for fabrication thereof

Integrated circuits having complementary metal-oxide semiconductor (CMOS) and photonics circuitry and techniques for three-dimensional integration thereof are provided. In one aspect, a three-dimensional integrated circuit comprises a bottom device layer and a top device layer. The bottom device layer comprises a substrate; a digital CMOS circuitry layer adjacent to the substrate; and a first bonding oxide layer adjacent to a side of the digital CMOS circuitry layer opposite the substrate. The top device layer comprises an analog CMOS and photonics circuitry layer formed in a silicon-on-insulator (SOI) layer having a buried oxide (BOX) with a thickness of greater than or equal to about 0.5 micrometers; and a second bonding oxide layer adjacent to the analog CMOS and photonics circuitry layer. The bottom device layer is bonded to the top device layer by an oxide-to-oxide bond between the first bonding oxide layer and the second bonding oxide layer.

CMOS-process-compatible programmable via device

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided comprising a substrate; a dielectric layer on the substrate; a heater on at least a portion of a side of the dielectric layer opposite the substrate; a first oxide layer over the side of the dielectric layer opposite the substrate and surrounding at least a portion of the heater; a first capping layer over a side of the first oxide layer opposite the dielectric layer; at least one programmable via extending through the first capping layer and the first oxide layer and in contact with the heater, the programmable via comprising at least one phase change material; a second capping layer over the programmable via; a second oxide layer over a side of the first capping layer opposite the first oxide layer; a pair of first conductive vias, each extending through the first and second oxide layers and the first capping layer, and in contact with the heater; and a second ...

Bonding of substrates including metal-dielectric patterns with metal raised above dielectric and structures so formed

Bonding of substrates including metal-dielectric patterns on a surface with the metal raised above the dielectric, as well as related structures, are disclosed. One structure includes: a first substrate having a metal-dielectric pattern on a surface thereof, the metal-dielectric pattern including: a metal having a concave upper surface; and a dielectric having a substantially uniform upper surface, wherein the metal on the first substrate is raised above the dielectric on the first substrate; and a second substrate bonded with the first substrate, the second substrate including: a dielectric; and a metal positioned substantially below the dielectric of the second substrate, wherein the first substrate and the second substrate are bonded only at the metal from the first substrate and the metal from the second substrate.

Method to fabricate high performance carbon nanotube transistor integrated circuits by three-dimensional integration technology

Techniques for fabricating carbon nanotube-based devices are provided. In one aspect, a method for fabricating a carbon nanotube-based integrated circuit is provided. The method comprises the following steps. A first wafer comprising carbon nanotubes is provided. A second wafer comprising one or more device elements is provided. One or more of the carbon nanotubes are connected with one or more of the device elements by bonding the first wafer and the second wafer together. A carbon nanotube-based integrated circuit is also provided.

Coupling piezoelectric material generated stresses to devices formed in integrated circuits

A coupling structure for coupling piezoelectric material generated stresses to an actuated device of an integrated circuit includes a rigid stiffener structure formed around a piezoelectric (PE) material and the actuated device, the actuated device comprising a piezoresistive (PR) material that has an electrical resistance dependent upon an applied pressure thereto; and a soft buffer structure formed around the PE material and PR material, the buffer structure disposed between the PE and PR materials and the stiffener structure, wherein the stiffener structure clamps both the PE and PR materials to a substrate over which the PE and PR materials are formed, and wherein the soft buffer structure permits the PE material freedom to move relative to the PR material, thereby coupling stress generated by an applied voltage to the PE material to the PR material so as change the electrical resistance of the PR material.

Four-terminal reconfigurable devices

Reconfigurable devices and methods for the fabrication thereof are provided. In one aspect, a reconfigurable device is provided. The reconfigurable device comprises a substrate; a first dielectric layer on the substrate; a conductive layer recessed into at least a portion of a side of the first dielectric layer opposite the substrate; at least one second dielectric layer over the side of the first dielectric layer opposite the substrate, so as to cover the conductive layer; a heater within the second dielectric layer; at least one programmable via extending through the second dielectric layer, extending through and surrounded by the heater and in contact with the conductive layer, the programmable via comprising at least one phase change material; a capping layer over the programmable via; a first conductive via and a second conductive via, each extending through the second dielectric layer and in contact with the heater; and a third conductive via extending through the second dielectric ...

Four-terminal reconfigurable devices

Reconfigurable devices and methods for the fabrication thereof are provided. In one aspect, a reconfigurable device is provided. The reconfigurable device comprises a substrate; a first dielectric layer on the substrate; a conductive layer recessed into at least a portion of a side of the first dielectric layer opposite the substrate; at least one second dielectric layer over the side of the first dielectric layer opposite the substrate, so as to cover the conductive layer; a heater within the second dielectric layer; at least one programmable via extending through the second dielectric layer, extending through and surrounded by the heater and in contact with the conductive layer, the programmable via comprising at least one phase change material; a capping layer over the programmable via; a first conductive via and a second conductive via, each extending through the second dielectric layer and in contact with the heater; and a third conductive via extending through the second dielectric ...

Three-Dimensional Integrated Circuits and Techniques for Fabrication Thereof

Integrated circuits having complementary metal-oxide semiconductor (CMOS) and photonics circuitry and techniques for three-dimensional integration thereof are provided. In one aspect, a three-dimensional integrated circuit comprises a bottom device layer and a top device layer. The bottom device layer comprises a substrate; a digital CMOS circuitry layer adjacent to the substrate; and a first bonding oxide layer adjacent to a side of the digital CMOS circuitry layer opposite the substrate. The top device layer comprises an analog CMOS and photonics circuitry layer formed in a silicon-on-insulator (SOI) layer having a buried oxide (BOX) with a thickness of greater than or equal to about 0.5 micrometers; and a second bonding oxide layer adjacent to the analog CMOS and photonics circuitry layer. The bottom device layer is bonded to the top device layer by an oxide-to-oxide bond between the first bonding oxide layer and the second bonding oxide layer.

Methods of forming features in integrated circuits

A feature is formed in an integrated circuit by providing one or more layers to be patterned, providing a first layer overlying the one or more layers to be patterned, and providing a second layer overlying the first layer. The second layer is patterned to form a raised feature with one or more sidewalls. Subsequently, the first layer is processed such that components of the first layer deposit on the one or more sidewalls of the raised feature to form a mask. The mask is used to pattern the one or more layers to be patterned.

Four-Terminal Reconfigurable Devices

Reconfigurable devices and methods for the fabrication thereof are provided. In one aspect, a reconfigurable device is provided. The reconfigurable device comprises a substrate, a first dielectric layer on the substrate; a conductive layer recessed into at least a portion of a side of the first dielectric layer opposite the substrate; at least one second dielectric layer over the side of the first dielectric layer opposite the substrate, so as to cover the conductive layer; a heater within the second dielectric layer; at least one programmable via extending through the second dielectric layer, extending through and surrounded by the heater and in contact with the conductive layer the programmable via comprising at least one phase change material; a capping layer over the programmable via; a first conductive via and a second conductive via, each extending through the second dielectric layer and in contact with the heater; and a third conductive via extending through the second dielectric layer and in contact with the conductive layer.

WAFER BONDED ACCESS DEVICE FOR MULTI-LAYER PHASE CHANGE MEMORY USING LOCK-AND-KEY ALIGNMENT

A method for fabricating a multi-layer phase change memory device includes forming a phase change memory layer including a plurality of phase change memory elements on a word line formed on a plurality of semiconductor devices on a first semiconductor substrate, each phase change element having a notch formed at an upper surface thereof, forming an access device layer including plurality of access devices on a second semiconductor substrate, each access device having a conductive bump formed thereon, and combining the first and second semiconductor substrates and slidably inserting and locking each conductive bump of the plurality of access devices into each notch of the plurality of phase change memory elements to electrically connect the access devices to the phase change memory elements.

Four-Terminal Reconfigurable Devices

Reconfigurable devices and methods for the fabrication thereof are provided. In one aspect, a reconfigurable device is provided. The reconfigurable device comprises a substrate; a first dielectric layer on the substrate; a conductive layer recessed into at least a portion of a side of the first dielectric layer opposite the substrate; at least one second dielectric layer over the side of the first dielectric layer opposite the substrate, so as to cover the conductive layer; a heater within the second dielectric layer; at least one programmable via extending through the second dielectric layer, extending through and surrounded by the heater and in contact with the conductive layer, the programmable via comprising at least one phase change material; a capping layer over the programmable via; a first conductive via and a second conductive via, each extending through the second dielectric layer and in contact with the heater; and a third conductive via extending through the second dielectric layer and in contact with the conductive layer.

Bonding structure and method of fabricating the same

A bonding structure and a method of fabricating the same are provided. A first substrate having a first bonding element and a second substrate having a second bonding element are provided, wherein at least one of the first bonding element and the second bonding element is formed with an alloy. A bonding process is performed to bond the first bonding element with the second bonding element, wherein a diffusion liner is generated at the exposed, non-bonded surface of the bonding structure.

Programmable via structure and method of fabricating same

A method of fabricating a programmable via structure is provided. The method includes providing a patterned heating material on a surface of an oxide layer. The oxide layer is located above a semiconductor substrate. A patterned dielectric material is formed having a least one via on a surface of the patterned heating material. The at least one via is filled with a phase change material such that a lower surface of the phase change material is in direct contact with a portion of the patterned heating material. A patterned diffusion barrier is formed on an exposed surface of the at least one via filled with the phase change material. A method of programmable a programmable via structure made by the method is also disclosed.

ELECTRICAL TEST STRUCTURE APPLYING 3D-ICS BONDING TECHNOLOGY FOR STACKING ERROR MEASUREMENT

A 3D integrated circuit including a first wafer and a second wafer is provided. The first wafer includes a first conduction pattern. The second wafer includes a second conduction pattern which is electrically connected to the first conduction pattern. A displacement between the first wafer and the second wafer is determined by a resistance of the first conduction pattern and the second conduction pattern. 1. A three-dimensional (3D) integrated circuit , comprising:a first wafer comprising a first conductive pattern; anda second wafer comprising a second conductive pattern, and electrically connected to the first conductive pattern,wherein a displacement between the first wafer and the second wafer is determined according to a resistance of the first conductive pattern and the second conductive pattern.2. The 3D integrated circuit as claimed in claim 1 , wherein the first conductive pattern comprises:a plurality of directional conductive patterns, wherein at least one of the directional conductive patterns is electrically connected to the second conductive pattern; anda first central conductive pattern disposed among the directional conductive patterns, and electrically connected to the second conductive pattern;wherein displacements of the first wafer and the second wafer in different directions are determined according to resistances of the first central conductive pattern, the corresponding directional conductive pattern and the second conductive pattern.3. The 3D integrated circuit as claimed in claim 2 , wherein the second conductive pattern comprises:a second central conductive pattern, electrically connected to the first conductive pattern,wherein displacements of the first wafer and the second wafer in the different directions are determined according to resistances of the first central conductive pattern, the corresponding directional conductive pattern and the second central conductive pattern.4. The 3D integrated circuit as claimed in claim 2 , wherein ...

PROGRAMMABLE VIA DEVICES WITH AIR GAP ISOLATION

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided. The programmable via device comprises a first dielectric layer; a heater over the first dielectric layer; an air gap separating at least a portion of the heater from the first dielectric layer; an isolation layer over the first dielectric layer covering at least a portion of the heater; a capping layer over a side of the isolation layer opposite the first dielectric layer; at least one programmable via extending through the capping layer and at least a portion of the isolation layer and in contact with the heater, the programmable via comprising at least one phase change material; a conductive cap over the programmable via; a second dielectric layer over a side of the capping layer opposite the isolation layer; a first conductive via and a second conductive via, each extending through the second dielectric layer, the capping layer and at least a portion of ...

Electrical test structure applying 3D-ICS bonding technology for stacking error measurement

A 3D integrated circuit including a first wafer and a second wafer is provided. The first wafer includes a first conduction pattern. The second wafer includes a second conduction pattern which is electrically connected to the first conduction pattern. A displacement between the first wafer and the second wafer is determined by a resistance of the first conduction pattern and the second conduction pattern.

THREE-DIMENSIONAL COMPLEMENTARY METAL OXIDE SEMICONDUCTOR DEVICE

A three-dimensional complementary metal oxide semiconductor device comprises a bottom wafer having a first-type strained MOS transistor; a top wafer stacked on the bottom wafer face to face or face to back, having a second-type strained MOS transistor arranged opposite to the first-type strained MOS transistor, and having a plurality of metal pads and a plurality of TSVs connected to the metal pads; and a hybrid bonding layer arranged between the bottom wafer and the top wafer, having metallic-bonding areas connecting the first-type and second-type MOS transistors to TSVs and a non-metallic bonding area filled in all space except the metallic bonding areas, so as to bond the bottom and top wafers. 1. A three-dimensional complementary metal oxide semiconductor device comprisinga bottom wafer having a first-type strained metal oxide semiconductor (MOS) transistor;a top wafer stacked over said bottom wafer face-to-face or face-to-back, having a second-type strained MOS transistor arranged opposite to said first-type strained MOS transistor, and having a plurality of metal pads and a plurality of through-silicon vias (TSV) connected with said metal pads; anda hybrid bonding layer arranged between said bottom wafer and said top wafer and having a plurality of metallic bonding areas and a non-metallic bonding area, wherein said metallic bonding areas electrically connect said first-type strained MOS transistor and said second-type strained MOS transistor to said TSVs, and wherein said non-metallic bonding area is filled into a space between said top wafer and said bottom wafer except said metallic bonding areas to connect said top wafer and said bottom wafer.2. The three-dimensional complementary metal oxide semiconductor device according to claim 1 , wherein said top wafer is made of a first-type semiconductor claim 1 , and wherein said bottom wafer is made of a second-type semiconductor claim 1 , and wherein said first-type is N-type claim 1 , and wherein said second- ...

SCALABLE TRANSFER-JOIN BONDING LOCK-AND-KEY STRUCTURES

Scalable transfer-join bonding techniques are provided. In one aspect, a transfer-join bonding method is provided. The method includes the following steps. A first bonding structure is provided having at least one metal pad embedded in an insulator and at least one via in the insulator over the metal pad. The via has tapered sidewalls. A second bonding structure is provided having at least one copper stud tapered to complement the tapered sidewalls of the via, such that the via and the copper stud fit together like a lock-and-key. The first bonding structure is bonded to the second bonding structure by way of a metal-to-metal bonding between the metal pad and the copper stud. A transfer join bonded structure is also provided.

Method of Forming Programmable Via Devices

A device is formed by providing a contact via in a dielectric layer, providing a capping layer overlying at least a portion of the contact via, and forming a conductive element in physical contact with the capping layer. The conductive element is formed using a masked deposition process. This process comprises forming a seed layer overlying the capping layer and at least a portion of an uppermost surface of the dielectric layer, forming a masking layer on the seed layer, the masking layer defining an opening exposing a portion of the seed layer that overlies the capping layer, and selectively depositing a conductive material onto the exposed portion of the seed layer.

Heterostructure containing IC and LED and method for fabricating the same

A heterostructure contains an IC and an LED. An IC and an LED are initially provided. The IC has at least one first electric-conduction block and at least one first connection block. The IC electrically connects with the first electric-conduction block. The first face of the LED has at least one second electric-conduction block and at least one second connection block. The LED electrically connects to the second electric-conduction block. Subsequently, the first electric-conduction block and the first connection block are respectively joined to the second electric-conduction block and the second connection block. The first electric-conduction block is electrically connected with the second electric-conduction block and forms a heterostructure. The system simultaneously provides functions of heat radiation and electric communication for the IC and LED resulting in a high-density, multifunctional heterostructure.

SWITCH ARRAY CIRCUIT AND SYSTEM USING PROGRAMMABLE VIA STRUCTURES WITH PHASE CHANGE MATERIALS

The present invention provides at least one programmable via structure that includes at least two phase change material vias that are both directly contacting a heating element, the programmable via structure further including a first terminal in contact with a first portion of the heating element, a second terminal in contact with a second portion of the heating element, a third terminal in contact with one of the at least two programmable vias, and a fourth terminal in contact with another one of the at least two programmable vias; a first circuit block in contact with one of the third and fourth terminals; a second circuit block in contact with the third or fourth terminal not contacting the first circuit block; a source region of a first field effect transistor in contact with one of the first and second terminals; and a drain region of a second field effect transistor in contact with the first or second terminal that is not contacting the source region of the first field effect transistor ...

Programmable via devices with air gap isolation

Programmable via devices and methods for the fabrication thereof are provided. In one aspect, a programmable via device is provided. The programmable via device includes a first dielectric layer; a heater over the first dielectric layer; an air gap separating at least a portion of the heater from the first dielectric layer; an isolation layer over the first dielectric layer covering at least a portion of the heater; a capping layer over a side of the isolation layer opposite the first dielectric layer; at least one programmable via extending through the capping layer and at least a portion of the isolation layer and in contact with the heater, the programmable via including at least one phase change material; a conductive cap over the programmable via; a second dielectric layer over a side of the capping layer opposite the isolation layer; a first conductive via and a second conductive via, each extending through the second dielectric layer, the capping layer and at least a portion of the ...

BONDING OF SUBSTRATES INCLUDING METAL-DIELECTRIC PATTERNS WITH METAL RAISED ABOVE DIELECTRIC AND STRUCTURES SO FORMED

Bonding of substrates including metal-dielectric patterns on a surface with the metal raised above the dielectric, as well as related structures, are disclosed. One structure includes: a first substrate having a metal-dielectric pattern on a surface thereof, the metal-dielectric pattern including: a metal having a concave upper surface; and a dielectric having a substantially uniform upper surface, wherein the metal on the first substrate is raised above the dielectric on the first substrate; and a second substrate bonded with the first substrate, the second substrate including: a dielectric; and a metal positioned substantially below the dielectric of the second substrate, wherein the first substrate and the second substrate are bonded only at the metal from the first substrate and the metal from the second substrate.

Integrated circuit device

An integrated circuit device includes: a first chip including a first substrate and a main circuit formed on said first chip; a second chip stacked on the first substrate and including a second substrate that is independent from the first substrate, and a protective circuit for protecting the main circuit; and a conductive channel unit extending from the protective circuit and electrically connected to the main circuit.

Scalable transfer-join bonding lock-and-key structures

Scalable transfer-join bonding techniques are provided. In one aspect, a transfer-join bonding method is provided. The method includes the following steps. A first bonding structure is provided having at least one metal pad embedded in an insulator and at least one via in the insulator over the metal pad. The via has tapered sidewalls. A second bonding structure is provided having at least one copper stud adapted to have a taper that complements the tapered sidewalls of the via, such that the via and the copper stud fit together like a lock-and-key. The first bonding structure is bonded to the second bonding structure by way of a metal-to-metal bonding between the metal pad and the copper stud that deforms the copper stud. A transfer-join bonded structure is also provided.

HERMETIC SEAL AND RELIABLE BONDING STRUCTURES FOR 3D APPLICATIONS

A sealed microelectronic structure which provides mechanical stress endurance and includes at least two chips being electrically connected to a semiconductor structure at a plurality of locations. Each chip includes a continuous bonding material along it's perimeter and at least one support column connected to each of the chips positioned within the perimeter of each chip. Each support column extends outwardly such that when the at least two chips are positioned over one another the support columns are in mating relation to each other. A seal between the at least two chips results from the overlapping relation of the chip to one another such that the bonding material and support columns are in mating relation to each other. Thus, the seal is formed when the at least two chips are mated together, and results in a bonded chip structure.

BONDING METHOD FOR THREE-DIMENSIONAL INTEGRATED CIRCUIT AND THREE-DIMENSIONAL INTEGRATED CIRCUIT THEREOF

The present invention discloses a bonding method for a three-dimensional integrated circuit and the three-dimensional integrated circuit thereof. The bonding method comprises the steps of: providing a substrate; depositing a film layer on the substrate; providing a light source to light onto the film layer to form a graphic structure; forming a metal co-deposition layer by a first metal and a second metal that are co-deposited on the film layer; providing a first integrated circuit having the substrate, the film layer and the metal co-deposition layer sequentially; providing a second integrated circuit that having the metal co-deposition layer, the film layer and the substrate sequentially; and the first integrated circuit is bonded with the second integrated circuit at a predetermined temperature to form a three-dimensional integrated circuit. 1. A bonding method for a three-dimensional integrated circuit , applicable for manufacturing the three-dimensional integrated circuit , and the bonding method comprising the steps of:providing a first integrated circuit and a second integrated circuit each sequentially having a substrate, a film layer and a metal co-deposition layer, and each of the integrated circuits being formed by the steps of:providing the substrate;depositing the film layer on the substrate;forming a pattern structure by exposing the film layer to a light source through a mask; andco-depositing a first metal and a second metal onto the film layer to form a metal co-deposition layer; andsuperimposing the first integrated circuit onto the second integrated circuit at a predetermined temperature, such that the co-deposition layers thereof are bonded with each other, and at least a portion of atoms of the first metal diffuse toward a bonding interface between the co-deposition layers and at least a portion of atoms of the second metal diffuse toward the respective film layers of each of the integrated circuits to form adhesion and barrier layers for the ...

THROUGH SILICON VIA-BASED OSCILLATOR WAFER-LEVEL-PACKAGE STRUCTURE AND METHOD FOR FABRICATING THE SAME

The present invention provides a TSV-based oscillator WLP structure and a method for fabricating the same. The method of the present invention comprises steps: providing a silicon base having an oscillator unit disposed thereon; forming on the silicon base at least one package ring surrounding the oscillator unit; and disposing a silicon cap on the package ring to envelop the oscillator unit. The present invention adopts a cap and a base, which are made of the same material, to effectively overcome the problem of thermal stress occurring in a conventional sandwich package structure. Further, the present invention elaborately designs the wiring on the lower surface of the base to reduce the package size and decrease consumption of noble metals. 1. A method for fabricating a through silicon via-based oscillator wafer-level-package structure , comprising steps:providing a silicon base having an oscillator unit disposed thereon;forming on said silicon base at least one package ring surrounding said oscillator unit; anddisposing a silicon cap on said package ring to envelop said oscillator unit.2. The method for fabricating a through silicon via-based oscillator wafer-level-package structure according to claim 1 , wherein said silicon cap is fabricated with a process including steps:providing a first silicon wafer; andetching said first silicon wafer to form in said first silicon wafer a cavity accommodating said oscillator unit.3. The method for fabricating a through silicon via-based oscillator wafer-level-package structure according to claim 2 , wherein said process to fabricate said silicon cap further includes a step before etching said first silicon wafer:forming on a lower surface of said first silicon wafer at least one package ring to be joined with said at least one package ring of said silicon base for enveloping said oscillator unit.4. The method for fabricating a through silicon via-based oscillator wafer-level-package structure according to claim 1 , ...

Heterostructure containing ic and led and method for fabricating the same

A heterostructure containing IC and LED and a method of fabricating. An IC and an LED are established with the IC having a first electric-conduction block and a first connection block. The IC electrically connects to the first electric-conduction block. A first face of the LED has a second electric-conduction block and a second connection block. The LED is electrically connected to the second electric-conduction block. The first electric-conduction block and the first connection block are respectively joined to the second electric-conduction block and the second connection block, and the first electric-conduction block are electrically connected with the second electric-conduction block to form a heterostructure. The heterostructure provides functions of heat radiation and electric communication for IC and LED.

Submicron connection layer and method for using the same to connect wafers

A submicron connection layer and a method for using the same to connect wafers is disclosed. The connection layer comprises a bottom metal layer formed on a connection surface of a wafer, an intermediary diffusion-buffer metal layer formed on the bottom metal layer, and a top metal layer formed on the intermediary diffusion-buffer metal layer. The melting point of the intermediary diffusion-buffer metal layer is higher than the melting points of the top and bottom metal layers. The top and bottom metal layers may form a eutectic phase. During bonding wafers, two top metal layers are joined in a liquid state; next the intermediary diffusion-buffer metal layers are distributed uniformly in the molten top metal layers; then the top and bottom metal layers diffuse to each other to form a low-resistivity eutectic intermetallic compound until the top metal layers are completely exhausted by the bottom metal layers.

Interconnection structure of semiconductor device

An interconnection structure of a semiconductor device is provided, where the interconnection structure is constructed in a semiconductor substrate. The interconnection structure includes a first through silicon via and a second through silicon via both penetrating the semiconductor substrate, and the first through silicon via is spaced from the second through silicon via by a distance ranged from 2 μm to 40 μm.

BONDING STRUCTURE FOR SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME

A method of manufacturing a bonding structure includes (a) providing a substrate, wherein the substrate includes a top surface and at least one bonding pad disposed adjacent to the top surface of the substrate, at least one bonding pad having a sloped surface with a first slope; (b) providing a semiconductor element, wherein the semiconductor element includes at least one pillar, and at least one pillar has a sidewall with a second slope, wherein the absolute value of the first slope is smaller than the absolute value of the second slope; and (c) bonding at least one pillar to a portion of the sloped surface of corresponding ones of the at least one bonding pad. 1. A method of manufacturing a bonding structure , comprising:(a) providing a substrate, wherein the substrate includes a top surface and at least one bonding pad disposed adjacent to the top surface of the substrate, at least one bonding pad having a sloped surface with a first slope;(b) providing a semiconductor element, wherein the semiconductor element includes at least one pillar, and at least one pillar has a sidewall with a second slope, wherein the absolute value of the first slope is smaller than the absolute value of the second slope; and(c) bonding at least one pillar to a portion of the sloped surface of corresponding ones of the at least one bonding pad.2. The method of claim 1 , wherein in (a) claim 1 , a space defined by the sloped surface of at least one bonding pad has a maximum width and a minimum width claim 1 , and in (b) claim 1 , a width of a corresponding one of the at least one pillar is greater than the minimum width of the space and less than the maximum width of the space.3. The method of claim 1 , wherein in (c) claim 1 , a gap is formed between the sidewall of the at least one pillar and the sloped surface of a corresponding bonding pad.4. The method of claim 1 , wherein in (b) claim 1 , at least one pillar further has a top surface and an edge portion claim 1 , wherein the edge ...

Semiconductor package structure and semiconductor process

The disclosure relates to a semiconductor bonding structure and process and a semiconductor chip. The semiconductor bonding structure includes a first pillar, a first interface, an intermediate area, a second interface and a second pillar in sequence. The first pillar, the second pillar and the intermediate area include a first metal. The first interface and the second interface include the first metal and an oxide of a second metal. The content percentage of the first metal in the first interface and the second interface is less than that of the first metal in the intermediate area.

BONDING STRUCTURE FOR SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME

The present disclosure relates to bonding structures useful in semiconductor packages and methods of manufacturing the same. In an embodiment, the bonding structure comprises a substrate, having a top surface and including at least one bonding pad, wherein each bonding pad is disposed adjacent to the top surface of the substrate and has a sloped surface; and a semiconductor element including at least one pillar, wherein each pillar is bonded to a portion of the sloped surface of a corresponding bonding pad, and a gap is formed between a sidewall of the pillar and the sloped surface of the corresponding bonding pad. 1. A bonding structure , comprising:a substrate, having a top surface and comprising at least one bonding pad, wherein the bonding pad is disposed adjacent to the top surface of the substrate and has a sloped surface; anda semiconductor element, comprising at least one pillar;wherein each pillar is bonded to a portion of the sloped surface of a corresponding one of the at least one bonding pad, and a gap is formed between a sidewall of the pillar and the sloped surface of the corresponding bonding pad;wherein the substrate further comprises a first insulation layer disposed on the top surface thereof and between the bonding pads, and the semiconductor element further comprises a second insulation layer between the pillars, wherein the first insulation layer contacts the second insulation layer.2. The bonding structure of claim 1 , wherein the substrate defines at least one cavity claim 1 , and each bonding pad is disposed on a sidewall of a corresponding one of the at least one cavity.3. The bonding structure of claim 2 , wherein a cross section of at least one cavity is in a V shape or a trapezoid shape.4. The bonding structure of claim 2 , wherein an interspace is formed between an end of each pillar and a portion of the corresponding bonding pad.5. The bonding structure of claim 1 , wherein the at least one bonding pad is disposed on the top surface of ...

Partially exposed doped graphene channel based transistor

Graphene-channel based transistor comprising a substrate with a source and a drain contact 2102, and a graphene channel 2502 formed on the substrate 1704 which connects the contacts. A gate contact 2902 over the graphene channel, separated from the channel with a dielectric. The gate contact is positioned in a non-overlapping position with the source and drain contacts; this leaves exposed sections 3102 of the graphene channel, which can then be doped with an n-type or p-type dopant 3302. A capping layer may be provided over the source, drain and gate contacts, as well as the exposed sections of the graphene channel. The substrate may comprise an insulating layer on the channel. The substrate may comprise an insulating wafer or a wafer having an insulating over layer or a silicon carbide layer. The capping layer may comprise an oxide or a nitride material. There may be more than one layer of graphene on the substrate and this may be deposited using exfoliation or by silicon sublimation with epitaxy.

Heterogeneous integration structure having integration circuit (ic) and light-emitting-diode (led) and method for fabricating the same

A method to fabricate high performance carbon nanotube transistor integrated circuits by three-dimensional integration technology

Coupling structure and method for its production

Eine Kopplungsstruktur zur Kopplung von in piezoelektrischem Material erzeugten mechanischen Spannungen mit einer betätigten Einheit eines integrierten Schaltkreises enthält eine starre Versteifungsstruktur, die um ein piezoelektrisches (PE) Material herum ausgebildet ist, und die betätigte Einheit, wobei die betätigte Einheit ein piezoresistives (PR) Material aufweist, die einen elektrischen Widerstand aufweist, der von dem darauf ausgeübten Druck abhängig ist; und eine weiche Pufferstruktur, die um das PE-Material und das PR-Material herum ausgebildet ist, wobei die Pufferstruktur zwischen dem PE- und dem PR-Material und der Versteifungsstruktur angeordnet ist, wobei die Versteifungsstruktur das PE- und das PR-Material an ein Substrat befestigt, über dem das PE- und das PR-Material gebildet werden, und wobei die weiche Pufferstruktur dem PE-Material Bewegungsfreiheit in Bezug auf das PR-Material ermöglicht, wodurch die mechanische Spannung, die durch eine an das PE-Material angelegte elektrische Spannung erzeugt wird, an das PR-Material so gekoppelt wird, dass sich der elektrische Widerstand des PR-Materials ändert. A coupling structure for coupling mechanical stresses generated in piezoelectric material with an actuated unit of an integrated circuit includes a rigid stiffening structure formed around a piezoelectric (PE) material and the actuated unit, the actuated unit being a piezoresistive (PR) material having an electrical resistance that is dependent on the pressure applied thereto; and a soft buffer structure formed around the PE material and the PR material, the buffer structure being disposed between the PE and PR materials and the stiffening structure, the stiffening structure on the PE and PR materials a substrate is attached over which the PE and PR materials are formed, and wherein the soft buffer structure allows the PE material freedom of movement with respect to the PR material, thereby reducing the mechanical stress caused by an applied to the PE ...

晶圓次微米接合方法及其接合層

本發明提供一種晶圓次微米接合方法及其接合層。本發明之接合層包含有一位於晶圓之欲接合表面上的底部金屬層，一位於底部金屬層上的中間擴散緩衝金屬層；一位於中間緩衝金屬層上且可與底部金屬共晶反應的上方金屬層，此中間擴散緩衝金屬層之熔點高於上方金屬層與底部金屬層。兩個表面形成有接合層之晶圓進行接合時，兩上方金屬層先液相接合，至中間擴散緩衝金屬層隨上方金屬層熔融後均勻分佈，底部金屬層與上方金屬層相互擴散，將上方金屬層完全消耗反應成為一具有低電阻之金屬共晶相位之化合物。

三維積體電路之接合方法及其三維積體電路

立體積體電路裝置

一種立體積體電路裝置，包含第一晶粒、第二晶粒、複數導電通道，及焊墊單元。第一晶粒包括主要電路，第二晶粒與第一晶粒堆疊並包括避免主要電路受破壞的保護電路，導電通道自保護電路延伸至與第一晶粒的主要電路連接，焊墊單元包括與導電通道連接而對主要電路及保護電路傳送來自外界電訊號的輸出入焊墊(I/O pad)。本發明以主要電路與保護電路分設相異基板，再堆疊及配合導電通道電連接兩晶粒，而不需如目前所有電路置於同一晶片時，須保留預定距離以防止保護電路產生的脈衝影響主要電路導致過熱或失效，並進而有效減少整體的面積。

ESD structure for 3D IC

Antenna package structure

An antenna package structure is provided. The antenna package structure includes a glass substrate, an interconnect structure, a plurality of semiconductor chips, and an antenna array structure. The glass substrate has a first surface and a second surface opposite to the first surface. The interconnect structure is disposed over the first surface of the glass substrate. The plurality of semiconductor chips are mounted over the interconnect structure. The antenna array structure is formed on the second surface of the glass substrate. Furthermore, the plurality of semiconductor chips are coupled to the antenna array structure through the interconnect structure and the glass substrate.

Semiconductor device and method of manufacturing the same

An embodiment of the present application provides a semiconductor device, including a substrate, a chip, a latch-up protection circuit, and a redistribution layer. The chip is on the substrate. The latch-up protection circuit is separated from the chip in a direction. The redistribution layer transmits a signal between the latch-up protection circuit and the chip.

Magnetic switch and an added contactless activated alarm lock

Three dimensional integrated circuit and fabrication thereof

An IC structure includes a first transistor, a dielectric layer, a plurality of semiconductor pillars, a plurality of semiconductor plugs, a semiconductor structure, and a second transistor. The first transistor is formed on a substrate. The dielectric layer is above the first transistor. The semiconductor pillars extend from the substrate into the dielectric layer. The semiconductor plugs extend from a top surface of the dielectric layer into the dielectric layer to the plurality of semiconductor pillars. The semiconductor structure is disposed over the top surface of the dielectric layer. The second transistor is formed on the semiconductor structure.

アンテナパッケージ構造

【課題】アンテナパッケージ構造を提供する。【解決手段】アンテナパッケージ構造１０は、ガラス基板１００と、相互接続構造１０６と、複数の半導体チップ１０２と、アンテナアレイ構造１０４と、を含む。ガラス基板１００は、第一の表面１００Ａと、第一の表面１００Ａとは反対側の第二の表面１００Ｂとを有する。相互接続構造１０６は、ガラス基板１００の第一の表面１００Ａ上に配置される。複数の半導体チップ１０２は、相互接続構造１０６上に装着される。アンテナアレイ構造１０４は、ガラス基板１００の第二の表面１００Ｂ上に形成される。さらに、複数の半導体チップ１０２は、相互接続構造１０６及びガラス基板１００を介してアンテナアレイ構造１０４に結合される。【選択図】図３

Bonding element and method for manufacturing the same

A bonding element and a method for manufacturing the same thereof are provide, wherein the method comprises the following steps: providing a carrier substrate; forming a first metal layer on the carrier substrate; forming a first insulating layer on the first metal layer, wherein the first insulating layer includes a first through hole; forming a first passivation layer and a first conductive layer in the first through hole, wherein the first passivation layer and the first conductive layer in the first through hole form a first connecting bump; forming a first substrate on the first connection bump and the first insulating layer; removing the carrier substrate and the first metal layer to form a first sub-bonding element; and connecting the first sub-bonding element and a second sub-bonding element with a surface of the first passivation of the first connection bump to form the bonding element.

Antenna package structure

An antenna package structure is provided. The antenna package structure includes a glass substrate, an interconnect structure, a plurality of semiconductor chips, and an antenna array structure. The glass substrate has a first surface and a second surface opposite to the first surface. The interconnect structure is disposed over the first surface of the glass substrate. The plurality of semiconductor chips are mounted over the interconnect structure. The antenna array structure is formed on the second surface of the glass substrate. Furthermore, the plurality of semiconductor chips are coupled to the antenna array structure through the interconnect structure and the glass substrate.

Antenna package structure

An antenna package structure is provided. The antenna package structure includes a glass substrate, an interconnect structure, a plurality of semiconductor chips, and an antenna array structure. The glass substrate has a first surface and a second surface opposite to the first surface. The interconnect structure is disposed over the first surface of the glass substrate. The plurality of semiconductor chips are mounted over the interconnect structure. The antenna array structure is formed on the second surface of the glass substrate. Furthermore, the plurality of semiconductor chips are coupled to the antenna array structure through the interconnect structure and the glass substrate.

三維積體電路之接合方法及其三維積體電路

本發明係揭露一種三維積體電路之接合方法及其三維積體電路，其包含下列步驟：提供一基板；沉積薄膜層於基板上；利用光源照射於薄膜層，以形成圖形結構；藉由第一金屬及第二金屬共鍍於薄膜層上，以形成金屬共鍍層；提供依序具有基板、薄膜層及金屬共鍍層之第一積體電路；提供依序具有金屬共鍍層、薄膜層及基板之第二積體電路；以及透過一設定溫度，第一積體電路接合於第二積體電路上，以形成三維積體電路。

三維積體電路

一種三維積體電路，其包括一第一晶圓及一第二晶圓。第一晶圓包括一第一導電圖樣。第二晶圓包括一第二導電圖樣，且電性連接第一導電圖樣。其中第一晶圓與第二晶圓的位移量係根據第一導電圖樣及第二導電圖樣的電阻值來決定。

Passivation layer for forming semiconductor bonding structure, sputtering target making the same, semiconductor bonding structure and semiconductor bonding process

Provided are a passivation layer for forming a semiconductor bonding structure, a sputtering target making the same, a semiconductor bonding structure and a semiconductor bonding process. The passivation layer is formed on a bonding substrate by sputtering the sputtering target; the passivation layer and the sputtering target comprise a first metal, a second metal or a combination thereof. The bonding substrate comprises a third metal. Based on a total atom number of the surface of the passivation layer, O content of the surface of the passivation layer is less than 30 at %; the third metal content of the surface of the passivation layer is less than or equal to 10 at %. The passivation layer has a polycrystalline structure. The semiconductor bonding structure sequentially comprises a first bonding substrate, a bonding layer and a second bonding substrate: the bonding layer is mainly formed by the passivation layer and the third metal.

封裝載體結構

本發明係關於一種封裝載體結構，該封裝載體結構包括一基材、一第一鈍化層、至少一第一金屬墊以及一保護層。該基材具有一第一表面及至少一穿導孔，該穿導孔具有一第一端面，該第一端面顯露於該第一表面。該第一鈍化層形成於該基材之第一表面，該第一鈍化層具有至少一第一開口，該第一開口顯露該穿導孔之第一端面。該第一金屬墊形成於該第一鈍化層之第一開口，該第一金屬墊具有一中間部及一邊緣部，該中間部形成於該穿導孔之第一端面上，該邊緣部形成於該第一鈍化層上。該保護層覆蓋該第一金屬墊之邊緣部，藉此，可在凸塊與該第一金屬墊發生對位偏移時，防止未與凸塊連接之邊緣部氧化。

Non-contact actuateable alarm lock

Bonding structure and method of fabricating the same

Antenna package and method for manufacturing an antenna package

An antenna package is provided. The antenna package includes a glass substrate, a plurality of antennas, a multi-layer circuit structure, and a plurality of radio frequency chips. The glass substrate has a first surface and a second surface. The plurality of antennas are arranged on the first surface of the glass substrate. The multi-layer circuit structure has a first surface and a second surface. The plurality of radio frequency chips are arranged on the first surface of the multi-layer circuit structure. The second surface of the glass substrate is adhered to the second surface of the multi-layer circuit structure.