Method and arrangement for semiconductor manufacturing

A washing water supply arrangement (50) comprises an ultra-pure water production unit (54), a supply pipe (52), an operation control (53) and an ultrapure water impellent arrangement (55). A first end of the supply pipe (52) is connected to an output from the ultra- pure water production unit (54). A second end of the supply pipe is adapted for being connected to a semiconductor washing apparatus. The operation control (53) is configured for controlling the ultra-pure water production unit (54) to produce a predetermined amount of ultra-pure water upon demand. The ultra-pure water impellent arrangement (55) has access to a source of an inert gas and is configured for rinsing the supply pipe (52) from water with the inert gas after delivery of the pre-determined amount of ultra-pure water. A semiconductor washing system, a semiconductor production system and a method for supplying washing water are also disclosed.

Membrane distiller and operation method therefore

An air channel membrane distiller (1) comprises a hot surface (12), a cooling section (20) and a hydrophobic membrane (30). The hot surface and the hydrophobic membrane define a sealed evaporation channel (40). A surface (22) of the cooling section and the hydrophobic membrane define a sealed condensation channel (50). A water supply tubing (42) is connected to the evaporation channel. A water discharge tubing (46) is connected to the evaporation channel. A purified-water discharge tubing (56) is connected to the condensation channel. The surface of the cooling section is given a temperature lower than a temperature of water in the evaporation channel. A gas supply arrangement (60) for inert gas comprises a heater (62). A gas pipe system (64) is arranged to a gas inlet (55) of the condensation channel for enabling flushing of at least the condensation channel with the inert gas.

Method and arrangement for semiconductor manufacturing

A washing water supply arrangement (50) comprises an ultra-pure water production unit (54), a supply pipe (52), an operation control (53) and an ultrapure water impellent arrangement (55). A first end of the supply pipe (52) is connected to an output from the ultra-pure water production unit (54). A second end of the supply pipe is adapted for being connected to a semiconductor washing apparatus. The operation control (53) is configured for controlling the ultra-pure water production unit (54) to produce a predetermined amount of ultra-pure water upon demand. The ultra-pure water impellent arrangement (55) has access to a source of an inert gas and is configured for rinsing the supply pipe (52) from water with the inert gas after delivery of the pre-determined amount of ultra-pure water. A semiconductor washing system, a semiconductor production system and a method for supplying washing water are also disclosed.

Membrane distiller and operation method therefore

An air channel membrane distiller (1) comprises a hot surface (12), a cooling section (20) and a hydrophobic membrane (30). The hot surface and the hydrophobic membrane define a sealed evaporation channel (40). A surface (22) of the cooling section and the hydrophobic membrane define a sealed condensation channel (50). A water supply tubing (42) is connected to the evaporation channel. A water discharge tubing (46) is connected to the evaporation channel. A purified-water discharge tubing (56) is connected to the condensation channel. The surface of the cooling section is given a temperature lower than a temperature of water in the evaporation channel. A gas supply arrangement (60) for inert gas comprises a heater (62). A gas pipe system (64) is arranged to a gas inlet (55) of the condensation channel for enabling flushing of at least the condensation channel with the inert gas.

Water impurity measurements with dynamic light scattering

Water impurity measurements with dynamic light scattering

A method for determining a degree of impurity of water comprises performing (200) of a dynamic light scattering analysis of a multitude of samples of a water to be tested. Each sample of said multitude of samples comprises added single-size polymer beads of a respective size and in a respective known amount. A smallest size of the single-size polymer beads giving rise to a detectable signal, discernible over a background noise level, in a size distribution curve of the dynamic light scattering analysis is determined (220). A smallest amount of the single-size polymer of the determined smallest size giving rise to a detectable signal is determined (230). A degree of impurity of the water to be tested is assigned (240) in dependence of the determined smallest size and the determined smallest amount of the single-size polymer.