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Применить Всего найдено 5. Отображено 5.
26-09-2019 дата публикации

TRANSPARENT OXIDE FILM, METHOD FOR PRODUCING TRANSPARENT OXIDE FILM, OXIDE SINTERED COMPACT AND TRANSPARENT RESIN SUBSTRATE

Номер: WO2019181191A1
Автор: SHIMOYAMADA Takuya, KUWAHARA Masakazu, NITO Shigeo
Принадлежит:

Provided are: a transparent oxide film that has high transparency, good water vapor barrier performance, excellent chemical resistance and high flexibility; a method for producing the transparent oxide film by direct current sputtering with high mass productivity; an oxide sintered compact for forming a film; and a transparent resin substrate using the transparent oxide film. An amorphous transparent oxide film containing Zn and Sn, wherein the metal atom ratio Sn/(Zn+Sn) is 0.44-0.90 inclusive, and the film thickness is not more than 100 nm. A method for producing a transparent oxide film by sputtering with the use of a target comprising an Sn-Zn-O-based oxide sintered compact, wherein: in the oxide sintered compact containing Zn and Sn to be used in the sputtering, the metal atom ratio Sn/(Zn+Sn) is 0.44-0.90 inclusive; and the thickness of the film formed thereby is not more than 100 nm.

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Номер записи: 1
08-08-2019 дата публикации

OXIDE SPUTTERED FILM, METHOD FOR MANUFACTURING OXIDE SPUTTERED FILM, OXIDE SINTERED COMPACT, AND TRANSPARENT RESIN SUBSTRATE

Номер: WO2019150821A1
Автор: KUWAHARA Masakazu, NITO Shigeo
Принадлежит:

The purpose of the present invention is to provide an oxide sputtered film having excellent transparency and good water vapor barrier performance and oxygen barrier performance in high-mass-productivity direct-current sputtering, a method for manufacturing an oxide sputtered film, an oxide sintered compact, and a transparent resin substrate. An oxide sputtered film which contains Zn and Sn, is amorphous and transparent, and has water vapor barrier performance or oxygen barrier performance, the oxide sputtered film being characterized in that the ratio Sn/(Zn + Sn) of the number of metal atoms of Zn and Sn therein is 0.18 to 0.29.

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Номер записи: 2
15-11-2018 дата публикации

Sn-Zn-O-BASED OXIDE SINTERED BODY AND PRODUCTION METHOD THEREFOR

Номер: WO2018207414A1
Автор: KUWAHARA Masakazu, NITO Shigeo
Принадлежит:

Provided are an Sn-Zn-O-based oxide sintered body of high density and low resistance that can be used in such applications as barrier films and protective films, and a production method therefor. This Sn-Zn-O-based oxide sintered body has zinc (Zn) and tin (Sn) as components, and additionally contains at least germanium (Ge), tantalum (Ta), and gallium (Ga) as components, the metal atom number ratios being between 0.1 and 0.3 inclusive for Sn/(Zn+Sn), between 0.0005 and 0.01 inclusive for Ge/(Zn + Sn + Ge + Ta + Ga), between 0.0005 and 0.01 inclusive for Ta/(Zn + Sn + Ge + Ta + Ga), and between 0.001 and 0.1 inclusive for Ga/(Zn + Sn + Ge + Ta + Ga), the specific resistance thereof being between 5 Ω•cm and 12,000 Ω•cm inclusive, and the relative density thereof being 94% or greater.

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Номер записи: 3
24-10-2019 дата публикации

TRANSPARENT OXIDE LAMINATE FILM, METHOD FOR PRODUCING TRANSPARENT OXIDE LAMINATE FILM, SPUTTERING TARGET, AND TRANSPARENT RESIN SUBSTRATE

Номер: WO2019202819A1
Автор: KUWAHARA Masakazu, NITO Shigeo
Принадлежит:

Provided are: a transparent oxide laminate film which can exhibit excellent transparency and good water vapor barrier performance or oxygen barrier performance in direct-current sputtering that is a technique having high mass productivity; a method for producing a transparent oxide laminate film; a sputtering target; and a transparent resin substrate. A transparent oxide laminate film which comprises multiple transparent oxide films containing Zn and Sn and laminated on each other, and which has at least two amorphous films each having a Zn/Sn metal atom number ratio, i.e., a Sn/(Zn+Sn) ratio, of 0.18 to 0.29 inclusive.

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Номер записи: 4
26-09-2019 дата публикации

TRANSPARENT OXIDE-LAMINATED FILM, METHOD FOR PRODUCING TRANSPARENT OXIDE-LAMINATED FILM, AND TRANSPARENT RESIN SUBSTRATE

Номер: WO2019181190A1
Автор: KUWAHARA Masakazu, NITO Shigeo
Принадлежит:

Provided are: a transparent oxide-laminated film having excellent transparency, good moisture barrier performance, and chemical resistance; a method for producing the transparent oxide-laminated film; and a transparent resin substrate using the transparent oxide-laminated film. The transparent oxide-laminated film is obtained by laminating a plurality of layers of a transparent oxide film containing Zn and Sn, wherein each of the layers is composed of an amorphous transparent oxide film having a different atomic ratio of Zn to Sn. The method for producing the transparent oxide-laminated film uses sputtering targets made of different Sn-Zn-O-based oxide sintered bodies, wherein a first target having an oxide sintered body having an atomic ratio Sn/(Zn+Sn) of 0.18-0.29, and a second target having an oxide sintered body having an atomic ratio Sn/(Zn+Sn) of 0.44-0.90 are used to form the transparent oxide laminated-film.

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Номер записи: 5