20-04-2017 дата публикации
Номер: US20170110291A1
Автор:
Tae-Hwa KIM,
Byungbok KANG,
Chanhoon PARK,
Jaehyun LEE,
SungHyup KIM,
Jaeick HONG,
KIM TAE-HWA,
KANG BYUNGBOK,
PARK CHANHOON,
LEE JAEHYUN,
KIM SUNGHYUP,
HONG JAEICK,
KIM Tae-Hwa,
KANG Byungbok,
PARK Chanhoon,
LEE Jaehyun,
KIM SungHyup,
HONG Jaeick
A substrate treatment apparatus may include one or more of a process chamber, a gas supply assembly that may supply one or more gases into the process chamber, a gas exhaust assembly that may exhaust gases from the process chamber, and a gas injector assembly connected to the gas exhaust assembly independently of the process chamber. The gas injector assembly may supply a control gas into the gas exhaust assembly. The apparatus may include a gas injection control device configured to adjustably control the supply of control gas. The gas inject control device may measure an internal pressure of the process chamber and control the supply of control gas based on the internal pressure. The apparatus may include a diffuser that couples the gas injector assembly to the gas exhaust assembly and is configured to diffuse the control gas supplied from the gas injector assembly into the gas exhaust assembly. 1. A substrate treatment apparatus , comprising:a process chamber; the first gas is supplied into the process chamber at a uniform first flow rate, and', 'the second gas is supplied into the process chamber at a second flow rate, the second flow rate varying according to a first pulse wave, the first pulse wave having a particular time period;, 'a gas supply assembly configured to supply a first gas and a second gas into the process chamber such that,'} an exhausting line coupled to the process chamber, the exhausting line being configured to discharge gas from the process chamber, and', 'a pump coupled to the exhausting line, the pump being configured to induce gas flow from the process chamber through the exhausting line;, 'a gas exhaust assembly configured to exhaust the first and second gases from the process chamber, the gas exhaust assembly including,'}an exhaust valve coupled to the exhausting line, the exhaust valve being configured to control a flow rate of gas into the exhausting line from the process chamber, the exhaust valve including a fixed opening extent; ...
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