26-08-2021 дата публикации
Номер: US20210265136A1
Принадлежит:
An apparatus for providing plasma processing is provided. A plasma processing chamber is provided. A first turbopump with an inlet is in fluid connection with the plasma processing chamber and an exhaust. A gas source provides gas to the plasma processing chamber. At least one gas line is in fluid connection between the gas source and the plasma processing chamber. At least one bleed line is in fluid connection with the at least one gas line. At least one gas line valve is on the at least one gas line located between, where the at least one bleed line is connected to the at least one gas line and the plasma processing chamber. At least one bypass valve is on the at least one bleed line. 1. An apparatus for providing a plasma processing of a substrate , comprising:plasma processing chamber;a first turbopump with an inlet in fluid connection with the plasma processing chamber and an exhaust;a gas source for providing gas to the plasma processing chamber;at least one gas line in fluid connection between the gas source and the plasma processing chamber;at least one bleed line in fluid connection with the at least one gas line;at least one gas line valve on the at least one gas line located between where the at least one bleed line is connected to the at least one gas line and the plasma processing chamber;at least one bypass valve on the at least one bleed line;a dry pump with an inlet in fluid connection to the exhaust of the first turbopump, wherein the at least one bleed line is in fluid connection with the dry pump; andat least one pump out valve connected between the at least one bleed line and the dry pump.2. The apparatus claim 1 , as recited in claim 1 , wherein the at least one bleed line is in fluid connection to the first turbopump through the plasma processing chamber.3. The apparatus claim 2 , as recited in claim 2 , wherein the plasma processing chamber includes a plasma zone; wherein gas from the at least one gas line is provided to the plasma zone; and ...
Подробнее