16-04-2014 дата публикации
Номер: CN103730435A
Принадлежит:
The invention discloses a semiconductor structure and a manufacturing method thereof. The semiconductor structure comprises a stack structure, a plurality of first conductive blocks, a plurality of first conductive layers, a plurality of second conductive layers and a plurality of conductive damascene structures. The stack structure is formed on a substrate and comprises a plurality of conductive strips and a plurality of insulating strips, and the conductive strips and the insulating strips are arranged in an interlaced mode. The first conductive blocks are formed on the stack structure, and the first conductive layers and the second conductive layers are formed on two side walls of the stack structure respectively. The conductive damascene structures are formed on two sides of the stack structure, and each conductive block is electrically connected with the corresponding conductive damascene structure through the corresponding first conductive layer and the corresponding second conductive ...
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