THERMAL CHEMICAL VAPOR DEPOSITION SPLIT-FUNCTIONALIZATION PROCESS, PRODUCT, AND COATING

Thermal chemical vapor deposition split-functionalizing processes, coatings, and products are disclosed. The thermal chemical vapor deposition split-functionalizing process includes positioning an article within an enclosed chamber, functionalizing the article within a first temperature range for a first period of time, and then further functionalizing the article within a second temperature range for a second period of time. The thermal chemical vapor deposition split-functionalized product includes a functionalization formed by functionalizing within a first temperature range for a first period of time and a further functionalization formed by further functionalizing within a second temperature range for a second period of time. 1. A thermal chemical vapor deposition split-functionalizing process , comprising:positioning an article within an enclosed chamber;functionalizing the article within a first temperature range for a first period of time; and thenfurther functionalizing the article within a second temperature range for a second period of time.2. The thermal chemical vapor deposition split-functionalizing process of claim 1 , wherein the first temperature range differs from the second temperature range claim 1 , and the first period of time differs from the second period of time.3. The thermal chemical vapor deposition split-functionalizing process of claim 1 , wherein the first period of time is at least 4 hours.4. The thermal chemical vapor deposition split-functionalizing process of claim 1 , wherein the second period of time is at least 2 hours.5. The thermal chemical vapor deposition split-functionalizing process of claim 1 , wherein the first temperature range and the second temperature range are within a range of 400° C. and 500° C.6. The thermal chemical vapor deposition split-functionalizing process of claim 1 , wherein the functionalizing is within a first pressure range and the further functionalizing is within a second pressure range claim 1 , ...

ARTICLE INCLUDING A COATING AND PROCESS INCLUDING AN ARTICLE WITH A COATING

An article including a coating and a process including an article with a coating are disclosed. The article includes an aluminum-containing substrate including, by weight, at least 95% aluminum, and a coated and stabilized surface on the aluminum-containing substrate, the coated and stabilized surface being applied by thermal chemical vapor deposition at a temperature of less than 600° C. The process includes transporting fluid along a coated and stabilized surface positioned on an aluminum-containing substrate. 1. An article , comprising:an aluminum-containing substrate; anda coated and stabilized surface on the aluminum-containing substrate, the coated and stabilized surface being applied by thermal chemical vapor deposition at a temperature of less than 600° C.;wherein the aluminum-containing substrate includes, by weight, at least 95% aluminum.2. The article of claim 1 , wherein the coated and stabilized surface is formed from the thermal chemical vapor deposition of dimethylsilane.3. The article of claim 2 , wherein the coated and stabilized surface is oxidized.4. The article of claim 3 , wherein the coated and stabilized surface is functionalized.5. The article of claim 2 , wherein the coated and stabilized surface is treated with trimethylsilane.6. The article of claim 5 , wherein the trimethylsilane is functionalized.7. The article of claim 1 , wherein the aluminum-containing substrate comprises pure aluminum.8. The article of claim 1 , wherein the aluminum-containing substrate includes claim 1 , by weight claim 1 , between 95.8% and 98.6% aluminum.9. The article of claim 1 , wherein the aluminum-containing substrate includes claim 1 , by weight claim 1 , between 0.2% and 3.0% magnesium claim 1 , and between 0.2% and 1.8% silicon.10. The article of claim 9 , wherein the aluminum-containing substrate includes at least one element selected from the group consisting of claim 9 , by weight claim 9 , between 0.01% and 0.25% titanium claim 9 , between 0.02% and 1. ...

THERMAL CHEMICAL VAPOR DEPOSITION COATED PRODUCT AND PROCESS OF USING A THERMAL VAPOR DEPOSITION COATED PRODUCT

Thermal chemical vapor deposition coated product and uses of such products are disclosed. A thermal chemical vapor deposition coated product includes a threaded substrate and a lubricious coating on the threaded substrate, the lubricious coating having a coefficient of friction of between 0.05 and 0.58 and being a thermal chemical vapor deposition. A process includes engaging the thermal chemical vapor deposition coated product with a material having mating threads, and applying pressure to the thermal chemical vapor deposition coated product while engaged with the material. 1. A thermal chemical vapor deposition coated product , comprising:a threaded substrate; anda lubricious coating on the threaded substrate, the lubricious coating having a coefficient of friction of between 0.05 and 0.58 and being a thermal chemical vapor deposition.2. The thermal chemical vapor deposition coated product of claim 1 , wherein the threaded substrate comprises a threaded metallic substrate.3. The thermal chemical vapor deposition coated product of claim 2 , wherein the lubricious coating reduces a plastic deformation of the thermal chemical vapor deposition coated product during use as compared to an uncoated threaded substrate.4. The thermal chemical vapor deposition coated product of claim 2 , wherein the lubricious coating reduces a melding of mating thread material of the thermal chemical vapor deposition coated product as compared to the threaded substrate being uncoated.5. The thermal chemical vapor deposition coated product of claim 2 , wherein the lubricious coating prevents galling of the threaded metallic substrate.6. The thermal chemical vapor deposition coated product of claim 1 , wherein the lubricious coating is formed from the thermal chemical vapor deposition of dimethylsilane.7. The thermal chemical vapor deposition coated product of claim 1 , wherein the lubricious coating is formed from the thermal chemical vapor deposition of dimethylsilane at a pressure of ...

THERMAL CHEMICAL VAPOR DEPOSITION PRODUCT AND PROCESS OF USING A THERMAL CHEMICAL VAPOR DEPOSITION PRODUCT

Thermal chemical vapor deposition products and processes are disclosed. The products include a ceramic substrate and a non-porous surface on the ceramic substrate, the non-porous surface including a ceramic material. The process includes transporting fluid along a non-porous surface, the non-porous surface being positioned on a ceramic substrate and being a thermal chemical vapor deposition coating.

DIFFUSION-RATE-LIMITED THERMAL CHEMICAL VAPOR DEPOSITION COATING

Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species. 1. An article , comprising:a substrate; anda thermal chemical vapor deposition coating on the substrate;wherein the thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition.2. The article of claim 1 , wherein the properties include a film density.3. The article of claim 1 , wherein the properties include a thickness range of 1 claim 1 ,000 Angstroms or less.4. The article of claim 1 , wherein the thermal chemical vapor deposition coating has a thickness of greater than 8 claim 1 ,000 Angstroms and does not flake.5. The article of claim 1 , wherein the thermal chemical vapor deposition coating has a thickness of greater than 12 claim 1 ,000 Angstroms and does not flake.6. The article of claim 1 , wherein the thermal chemical vapor deposition coating has a thickness of greater than 16 claim 1 ,000 Angstroms and does not flake. The article of claim 1 , wherein the thermal chemical vapor deposition coating has a thickness of greater than 19 claim 1 ,000 Angstroms and does not flake.8. The article of claim 1 , wherein the properties include a wavelength range of 100 nm or less.9. The article of claim 1 , wherein the properties include impedance measurable by electronic impedance spectroscopy.10. The article of claim 1 , wherein the properties include a predominantly amorphous structure.11. ...

WEAR RESISTANT COATING, ARTICLE, AND METHOD

A wear coating is disclosed that includes a layer treated by a trifunctional organosilane. An article is also disclosed, the article having a surface to which the wear coating is applied. A method of applying the wear coating is also disclosed. In some embodiments, the organosilane is trimethylsilane and the wear coating is applied by chemical vapor deposition, followed by heat treating the wear coating in the presence of the trimethylsilane. 1. A wear coating comprising a layer treated by trimethylsilane.2. The coating of claim 1 , wherein the layer comprises constituents of decomposed dimethylsilane.3. The coating of claim 1 , wherein the layer comprises oxidized constituents of decomposed dimethylsilane.4. The coating of claim 3 , wherein the layer comprises functionalized constituents of decomposed dimethylsilane.5. The coating of claim 1 , wherein the layer has a region of a substantially stable concentration of silicon claim 1 , oxygen and carbon.6. The coating of claim 1 , wherein the coating is formed by a chemical vapor deposition method claim 1 , the method comprising:preparing a substrate in a chemical vapor deposition chamber;thermally decomposing dimethylsilane in the chemical vapor deposition chamber;depositing constituents of the decomposed dimethylsilane on the substrate; and,treating at least a surface of the substrate by heating the substrate in the presence of trimethylsilane.7. The coating of claim 6 , further comprising oxidizing the thermally decomposed constituents with an oxidation reagent.8. The coating of claim 7 , wherein the oxidation reagent includes air.9. The coating of claim 8 , wherein the air is zero air.10. The coating of claim 7 , wherein the oxidation reagent includes nitrogen.11. The coating of claim 7 , wherein the oxidation reagent includes water.12. The coating of claim 7 , wherein the oxidation reagent includes air and water.13. The coating of claim 1 , wherein the coating has a wear resistance between about 13×10mm/Nm and ...

COATED ARTICLE

The present invention relates to a coated article. The coated article includes a first layer, a second layer, and a diffusion region between the first layer and the second layer. The first layer has a first atomic concentration of C, a first atomic concentration of Si, and a first atomic concentration of O. The second layer has a first atomic concentration of Fe, a first atomic concentration of Cr, and a first atomic concentration of Ni. The diffusion region has a second atomic concentration of the C, a second atomic concentration of the Si, a second atomic concentration of the O, a second atomic concentration of the Fe, a second atomic concentration of the Cr, and a second atomic concentration of the Ni. All of the atomic concentrations are based upon Auger Electron Spectroscopy. 1. A coated article , comprising:a first layer having a first atomic concentration of C, a first atomic concentration of Si, and a first atomic concentration of O, wherein the first atomic concentration of the C is greater than the first atomic concentration of the O, and the first atomic concentration of the Si is greater than the first atomic concentration of the C;a second layer having a first atomic concentration of Fe, a first atomic concentration of Cr, and a first atomic concentration of Ni, wherein the first atomic concentration of the Fe is greater than the first atomic concentration of the Cr, and the first atomic concentration of the Cr is greater than the first atomic concentration of the Ni; anda diffusion region between the first layer and the second layer, wherein the diffusion region has a second atomic concentration of the C, a second atomic concentration of the Si, a second atomic concentration of the O, a second atomic concentration of the Fe, a second atomic concentration of the Cr, and a second atomic concentration of the Ni, the second atomic concentration of the O being greater than the second atomic concentration of the C, the second atomic concentration of the Si, ...

Chemical vapor deposition functionalization

Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor de position functionalization is not of a refrigerator shelf or a windshield.

Chemical vapor deposition process and coated article

A chemical vapor deposition process and coated article are disclosed. The chemical vapor deposition process includes positioning an article in a chemical vapor deposition chamber, then introducing a deposition gas to the chemical vapor deposition chamber at a sub-decomposition temperature that is below the thermal decomposition temperature of the deposition gas, and then heating the chamber to a super-decomposition temperature that is equal to or above the thermal decomposition temperature of the deposition gas resulting in a deposited coating on at least a surface of the article from the introducing of the deposition gas. The chemical vapor deposition process remains within a pressure range of 0.01 psia and 200 psia and/or the deposition gas is dimethylsilane. The coated article includes a substrate subject to corrosion and a deposited coating on the substrate, the deposited coating having silicon, and corrosion resistance.

COATED AUTOMOTIVE ARTICLE

According to an embodiment of the present disclosure, a coated automotive article includes a functionalized layer applied to at least one surface of the automotive article by chemical deposition, wherein the functionalized layer is selected from a fluoro functional group. The functionalized layer is a layer selected from the group consisting of an oxidized-then-functionalized layer, an organofluoro treated layer, a fluorosilane treated layer, an organofluorotrialkoxysilanes treated layer, an organofluorosilylhydrides-treated layer, an organofluoro silyl treated layer, a tridecafluoro 1,1,2,2-tetrahydrooctylsilane treated layer, an organofluoro alcohol treated layer, a pentafluoropropanol treated layer, an allylheptafluoroisopropyl ether treated layer, a (perfluorobutyl) ethylene treated layer, a (perfluorooctyl) ethylene treated layer, a (perfluoroalkyl) ethylene treated layer, and combinations thereof. 1. A coated automotive article having a wear coating comprising a functionalized layer applied to at least one surface of the automotive article by chemical vapor deposition , wherein the functionalized layer is selected from a fluoro functional group.2. The coated automotive article of claim 1 , wherein the coated automotive article is a valve claim 1 , piston head claim 1 , piston cylinder claim 1 , piston ring claim 1 , connecting rod claim 1 , fuel injector claim 1 , pump claim 1 , crankshaft claim 1 , camshaft claim 1 , air intake device claim 1 , exhaust device claim 1 , component which has a first surface and a second surface which are in contact and which are moved relative to each other claim 1 , component which has a surface over which a fluid flows claim 1 , or a combination thereof.3. The coated automotive article of claim 2 , wherein the fluid is a gas.4. The coated automotive article of claim 2 , wherein the fluid is a liquid.5. The coated automotive article of claim 1 , wherein the functional layer is a layer selected from the fluoro functional group ...

Coated article

Coated articles are disclosed. One embodiment of a coated article includes a substrate capable of being subjected to corrosion and a deposited coating on the substrate. The deposited coating has silicon with the substrate resisting corrosion with the deposited coating on the substrate when exposed to 15% NaClO by a rate of at least 5% greater than the corrosion rate of a coating applied with the same process but without introducing the deposition gas at the sub-decomposition temperature and/or the substrate with the deposited coating having a 15% NaClO corrosion rate of between 0 and 3 mils per year.

AMORPHOUS COATING

Amorphous coatings and coated articles having amorphous coatings are disclosed. The amorphous coating comprises a first layer and a second layer, the first layer being proximal to a metal substrate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer. The first layer and the second layer comprise carbon, hydrogen, and silicon. The first layer further comprises oxygen. 1. An amorphous coating , comprising:a first layer and a second layer, the first layer being proximal to a metal substrate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer;wherein the first layer and the second layer comprise carbon, hydrogen, and silicon;wherein the first layer further comprises oxygen.2. An article comprising the amorphous coating of and the metal substrate.3. The article of claim 2 , wherein the first layer has a thickness of between 0.1 micrometers and 3 micrometers.4. The article of claim 2 , wherein the first layer has a thickness of about 130 nm.5. The article of claim 2 , wherein the first layer has a thickness of between 5 nanometers and 500 nanometers.6. The article of claim 2 , wherein the first layer has a thickness of about 20 nm.7. The article of claim 2 , wherein the amorphous coating comprises Si—C groups.8. The article of claim 2 , wherein the amorphous coating comprises Si—OH groups.9. The article of claim 2 , wherein the amorphous coating comprises Si—H groups.10. The article of claim 2 , wherein the amorphous coating comprises Si—O—Si groups.11. The article of claim 2 , wherein the amorphous coating has a ratio of the Carbon:the Silicon:the Oxygen of about 1:2.25:1.75.12. The article of claim 2 , wherein the amorphous coating has a greater concentration of the silicon than the oxygen.13. The article of claim 2 , wherein the amorphous coating has a greater concentration of the oxygen than the carbon.14. The article of claim 2 , wherein the first ...

Thermal chemical vapor deposition coating

Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article.

THERMAL CHEMICAL VAPOR DEPOSITION COATED ARTICLE AND PROCESS

A coated article is disclosed. The article includes a coating formed by thermal decomposition, oxidation then functionalization. The article is configured for a marine environment, the marine environment including fouling features. The coating is resistant to the fouling features. Additionally or alternatively, the article is a medical device configured for a protein-containing environment, the protein-containing environment including protein adsorption features. The coating is resistant to the protein adsorption features. 1. A thermal chemical vapor coated article , comprising:a coating formed by thermal decomposition, oxidation then functionalization;wherein the article is a medical device configured for a protein-containing environment, the protein-containing environment including protein adsorption conditions;wherein the coating is resistant to the protein adsorption conditions.2. The thermal chemical vapor coated article of claim 1 , wherein the thermal decomposition is by introduction of dimethylsilane.3. The thermal chemical vapor coated article of claim 1 , wherein the oxidation is by introduction of zero air.4. The thermal chemical vapor coated article of claim 1 , wherein the functionalization is by introduction of trimethylsilane.5. The thermal chemical vapor coated article of claim 1 , wherein the medical device is a biomedical device claim 1 , surgical equipment claim 1 , a portion of a medical diagnostic sampling system claim 1 , a medical implant claim 1 , or a combination thereof.6. The thermal chemical vapor coated article of claim 1 , further comprising a stainless steel surface claim 1 , the coating positioned on the stainless steel surface.7. The thermal chemical vapor coated article of claim 6 , wherein the stainless steel surface includes 316 stainless steel.8. The thermal chemical vapor coated article of claim 1 , further comprising a titanium surface claim 1 , the coating positioned on the titanium surface.9. The thermal chemical vapor coated ...

Coating, article and chemical vapor deposition method

Un método (200) de deposición química de vapor térmica, comprendiendo el método (200): la preparación de (202) un sustrato (100) en una cámara de deposición química de vapor; la descomposición térmica (204) de dimetilsilano en la cámara de deposición química de vapor para formar un recubrimiento (102), realizándose la descomposición térmica en ausencia de energías de deposición adicionales, tales como campos de plasma y microondas, y en las siguientes condiciones: - a una presión de entre 6,8948x10-3 MPa (6,8948x10-2 bar (1,0 l.p.c.a.)) y 0,68948 MPa (6,8948 bar (100 l.p.c.a.)), preferentemente a una presión de entre 3,4474x10-2 MPa (3,4474x10-1 bar (5 l.p.c.a.)) y aproximadamente 0,27579 MPa (2,7579 bar (40 l.p.c.a.)); y - a una temperatura de entre 300 °C y 600 °C; y - durante un tiempo de 30 minutos a 24 horas. A method (200) of thermal chemical vapor deposition, the method (200) comprising: preparing (202) a substrate (100) in a chemical vapor deposition chamber; thermal decomposition (204) of dimethylsilane in the chemical vapor deposition chamber to form a coating (102), thermal decomposition being carried out in the absence of additional deposition energies, such as plasma and microwave fields, and under the following conditions: - at a pressure of between 6.8948x10-3 MPa (6.8948x10-2 bar (1.0 psia)) and 0.68948 MPa (6.8948 bar (100 psia)), preferably at a pressure of between 3, 4474x10-2 MPa (3.4474x10-1 bar (5 psia)) and about 0.27579 MPa (2.7579 bar (40 psia)); and - at a temperature between 300 ° C and 600 ° C; and - for a period of 30 minutes to 24 hours.

Chemical vapor deposition method

Thermal chemical vapor deposition process and coated article

Thermal chemical vapor deposition processes and coated articles are disclosed. The coated article includes a surface having a surface impurity and a coating on the surface formed by thermally reacting a gas. In comparison to a comparable coating without the surface impurity, the coating on the surface has substantially the same level of adhesion, corrosion resistance over 24 hours in 6M HCl, corrosion resistance over 72 hours in NaClO, and electrochemical impedance spectroscopy results. Additionally or alternatively, the surface impurity has properties that reduce or eliminate adhesion of a comparative coating produced by decomposition of silane on a comparative surface following exposure of the surface to a temperature.

Connector for three or more capillary tubes

An easily-assembled, heat resistant connector (11) for releasably joining end portions of three capillary tubes (13,14,15) for use in chromatography without interrupting flow or interfering with chromatographic results comprises a main body (17), and a glass insert (19) which has first (19a), second (19b) and third (19c) hollow legs that are connected together at a central portion (19d), and a connector that connects each leg of the glass insert to a capillary tube. Each leg of the glass insert extends outwardly from the central portion towards an open end portion, and each leg has an inboard bore with a taper that receives and end portion of one of the capillary tubes. The taper is wider near the open end portion of the leg and narrower near the central portion. The connectors are mounted on the main body and a sealing ferrule (29) is provided in each connector for making a seal between the capillary tubes and the legs of the glass insert. An adjusting screw in each connector provides for independently adjusting the pressure against each of the sealing ferrules to insure that an efficient seal is made between each capillary tube and a leg of the glass insert.

Amorphous coating

Amorphous coatings and coated articles having amorphous coatings are disclosed. The amorphous coating comprises a first layer and a second layer, the first layer being proximal to a metal substate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer. The first layer and the second layer comprise carbon, hydrogen, and silicon. The first layer further comprises oxygen.

Amorphous coating

Amorphous coatings and coated articles having amorphous coatings are disclosed. The amorphous coating comprises a first layer and a second layer, the first layer being proximal to a metal substrate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer. The first layer and the second layer comprise carbon, hydrogen, and silicon. The first layer further comprises oxygen.

化学気相蒸着方法と被覆物品

【課題】基材表面の耐腐食性の向上をはかる被膜を形成する化学気相蒸着法の提供。【解決手段】基材１０１を化学気相蒸着チャンバ１０３内に配置して、有機シランやジメチルシラン、シランを含む蒸着ガス１１３を蒸着ガスの熱分解温度を下回る温度で化学気相蒸着チャンバ１０３に装填し、そのうえでチャンバ１０３をそれら蒸着ガス１１３の熱分解温度か、それを上回る温度まで加熱して、0.01〜200psiaの圧力範囲内で化学気相蒸着を行いシリコンを含有する耐腐食性被膜を形成する化学気相蒸着方法。【選択図】図１

熱化学気相成長分割官能化プロセス、製品、およびコーティング

【課題】熱化学気相成長分割官能化プロセス、コーティング及び製品の提供。 【解決手段】密閉されたチャンバの中に物品を配置することと、第一の時間にわたって第一の温度範囲で物品を官能化することと、次いで、第二の時間にわたって第二の温度範囲で物品をさらに官能化することと、を含む熱化学気相成長分割官能化プロセス。好ましくは、物品を配置後、ジメチルシランの分解条件を超える条件下で物品をジメチルシランに曝露して表面を生成し、密閉されたチャンバ内の物品を酸化して、酸化した表面を生成し、酸化した表面をトリメチルシランに曝露する第一の時間に亘って、第一の温度範囲内で官能化し、第二の時間に亘って第二の温度範囲内で更に官能化することで、第一の温度範囲及び第二の温度範囲が４００〜５００℃の範囲内である、熱化学気相成長分割官能化プロセス。 【選択図】なし

拡散律速の熱化学気相成長コーティング

【課題】反応律速の熱化学気相成長（ＣＶＤ）は、多様な材料に付与することが可能な優れた特性を備えたコーティングを生成するために用いることができるが、望ましくない表面上の効果および／または不整合を生み出す場合がある。１つ以上の改善をもたらす拡散律速の熱化学気相成長コーティング及びプロセスの提供【解決手段】物品１０７の表面１０３の上に熱ＣＶＤコーティング１０１を形成するために、容器１０５および／またはチャンバ（室）のうちの一方または両者の中での１つ以上の工程において１種以上のガスを反応させること（工程１０２）を含む。物品１０７は容器１０５としても用いられる管であり、この管の内部は熱ＣＶＤコーティング１０１でコーティングされる表面１０３である熱化学気相成長（ＣＶＤ）プロセス１００でコーティングした物品および熱化学気相成長プロセス。【選択図】図１

Diffusion-rate-limited thermal chemical vapor deposition coating

Chemical vapor deposition functionalization

Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor deposition functionalization is not of a refrigerator shelf or a windshield.

Chemical vapor deposition process and coated article

A chemical vapor deposition process and coated article are disclosed. The chemical vapor deposition process includes positioning an article in a chemical vapor deposition chamber, then introducing a deposition gas to the chemical vapor deposition chamber at a sub-decomposition temperature that is below the thermal decomposition temperature of the deposition gas, and then heating the chamber to a super-decomposition temperature that is equal to or above the thermal decomposition temperature of the deposition gas resulting in a deposited coating on at least a surface of the article from the introducing of the deposition gas. The chemical vapor deposition process remains within a pressure range of 0.01 psia and 200 psia and/or the deposition gas is dimethylsilane. The coated article includes a substrate subject to corrosion and a deposited coating on the substrate, the deposited coating having silicon, and corrosion resistance.

Chemical vapor deposition coating, article, and method

The present invention relates to a chemical vapor deposition coating, a chemical vapor deposition article, and a chemical vapor deposition method. The coating, article, and method involve thermal decomposition of dimethylsilane to achieve desired surface properties.