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Применить Всего найдено 4. Отображено 4.
20-02-2020 дата публикации

METHOD OF DEPOSITING NANOTWINNED NICKEL-MOLYBDENUM-TUNGSTEN ALLOYS

Номер: US20200055725A1
Принадлежит:

The present invention is directed to the synthesis of metallic nickel-molybdenum-tungsten films and coatings with direct current sputter deposition, which results in fully-dense crystallographically textured films that are filled with nano-scale faults and twins. The as-deposited films exhibit linear-elastic mechanical behavior and tensile strengths above 2.5 GPa, which is unprecedented for materials that are compatible with wafer-level device fabrication processes. The ultra-high strength is attributed to a combination of solid solution strengthening and the presence of the dense nano-scale faults and twins. These films also possess excellent thermal and mechanical stability, high density, low CTE, and electrical properties that are attractive for next generation metal MEMS applications. Deposited as coatings these films provide protection against friction and wear. The as-deposited films can also be heat treated to modify the internal microstructure and attendant mechanical properties in a way that provides a desired balance of strength and toughness. 1. A film comprising:an alloy of nickel (Ni), molybdenum (Mo), tungsten (W) (Ni—Mo—W) having very high predetermined tensile strength, thermal and mechanical stability of predetermined levels, predetermined high density, predetermined low CTE, predetermined electrical properties that are similar to the bulk alloy, and a structure of nano-scale stacking faults and twins lying in a plane of the film; andwherein the alloy is deposited as a coating or freestanding thin film or device.2. The film of wherein the deposition of the alloy is achieved with direct current sputter deposition.3. The film of further comprising a crystallographic structure possessing a predetermined strong <111> crystallographic texture and a predetermined high density of nano-scale planar defects (stacking faults and twins) oriented in the plane of the film.4. The film of further comprising a tensile strength of above 2.5 GPa.5. The film of that ...

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26-12-2023 дата публикации

Method of depositing nanotwinned nickel-molybdenum-tungsten alloys

Номер: US11851320B2
Принадлежит: JOHNS HOPKINS UNIVERSITY

The present invention is directed to the synthesis of metallic nickel-molybdenum-tungsten films and coatings with direct current sputter deposition, which results in fully-dense crystallographically textured films that are filled with nano-scale faults and twins. The as-deposited films exhibit linear-elastic mechanical behavior and tensile strengths above 2.5 GPa, which is unprecedented for materials that are compatible with wafer-level device fabrication processes. The ultra-high strength is attributed to a combination of solid solution strengthening and the presence of the dense nano-scale faults and twins. These films also possess excellent thermal and mechanical stability, high density, low CTE, and electrical properties that are attractive for next generation metal MEMS applications. Deposited as coatings these films provide protection against friction and wear. The as-deposited films can also be heat treated to modify the internal microstructure and attendant mechanical properties in a way that provides a desired balance of strength and toughness.

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27-09-2023 дата публикации

ナノ双晶化ニッケル・モリブデン・タングステン合金を析出する方法

Номер: JP2023134467A
Принадлежит: JOHNS HOPKINS UNIVERSITY

【課題】優れた熱的及び機械的な安定性、高密度、低CTE、並びに電気的特性も有する被膜を提供する。【解決手段】薄膜であって、超高引張強度、熱的及び機械的な安定性、高密度、低CTE、バルク合金に類似する所定電気的特性、並びに前記薄膜の平面内に位置するナノスケールの積層断層及び双晶の構造を有する、ニッケル(Ni)、モリブデン(Mo)、タングステン(W)の合金(Ni-Mo-W)を備え、前記合金は独立した薄膜又はデバイスのコーティングとして析出されている、薄膜を提供する。前記薄膜において、前記合金の析出は、直流スパッタ析出によって達成される。【選択図】図14

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