Method for separating volatile substances from material mixtures and device for producing polyarylene sulfides

The present invention relates to a method for separating volatile substances, particularly iodine, diiodized aromatic compounds and/or mixtures thereof, from material mixtures containing said compounds. The invention further relates to a device for producing polyarylene sulphides, by means of which volatile substances, particularly iodine and diiodized aromatic compounds, can be separated from the polymers.

Display device with height adjustment structure and terminal having the same

A display device and a terminal having the same are disclosed. The terminal includes a base including a circuit board provided therein, and upper and lower housings, a support configured with one side combined with at least a portion of the lower housing and the other side having a head part configured for combination with a main body of a display, a first hole located on the upper housing and configured for combination with the support, and a second hole located on the circuit board and configured for combination with the support. The display device and the terminal having the same increase combining force between the support and the base and may use the same support and base in main bodies having various sizes, thus simplifying a manufacturing process and reducing part and assembly costs.

CYLINDER DEVICE HAVING IMPROVED WEAR RESISTANCE THROUGH OPTIMAL ARRANGEMENT OF FINE TEXTURES

There is provided a cylinder device having optimal arrangement of fine textures and optimal surface roughness capable of reducing wear of a cylinder bore side and a piston ring by processing fine textures in an optimal selection region of the cylinder bore side to improve lubrication characteristics between the piston ring and the cylinder bore side while reducing engine oil consumption by processing surface roughness of the cylinder bore side to an optimal status. 18-. (canceled)9. A cylinder device having improved wear resistance through optimal arrangement of fine textures for use with an engine , comprising:a first texture section that is formed on a cylinder bore side (BS or BS′) within a cylinder block, the first texture section having a plurality of fine textures in a region of 5% to 35% from top dead center (TDC) of a piston which is configured to move in a straight-line reciprocating motion along the cylinder bore side (BS or BS′); anda second texture section that is formed on the cylinder bore side (BS or BS′) within the cylinder block, the second texture section having a plurality of fine textures in a range of 100% to 140% from the top dead center of the piston.10. The cylinder device of claim 9 , wherein the second texture section having the plurality of fine textures in a range of 110% to 130% from the top dead center of the piston claim 9 , and the second texture section is formed in a range of 120° to 180° from a central point of a thrust side existing on the cylinder bore side (BS or BS′) claim 9 , is formed in a range of 120° to 180° from a central point of an anti-thrust side existing on the cylinder bore side (BS or BS′) claim 9 , or is formed in both of the range of 120° to 180° from the central point of the thrust side and the range of 120° to 180° from the central point of the anti-thrust side.11. The cylinder device of claim 9 , wherein the fine textures of the first texture section and second texture section are fine grooves having a dimple ...

Composition for depositing silicon-containing thin film and method for producing silicon-containing thin film using the same

Provided are a composition for depositing a silicon-containing thin film, containing a trisilylamine compound and a method for producing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film, containing a trisilylamine compound which is capable of forming a silicon-containing thin film at a very high deposition rate at a low temperature to be usable as a precursor of a silicon-containing thin film and an encapsulant of a display, and a method for producing a silicon-containing thin film by using the same.

Toner cartridge for laser printer

METHOD FOR SEPARATING VOLATILE SUBSTANCES FROM MATERIAL MIXTURES AND DEVICE FOR PRODUCING POLYARYLENE SULFIDES

The present invention relates to a method for separating volatile substances, particularly iodine, diiodised aromatic compounds and/or mixtures thereof, from material mixtures containing said compounds. The invention further relates to a device for producing polyarylene sulphides, by means of which volatile substances, particularly iodine and diiodised aromatic compounds, can be separated from the polymers. 18-. (canceled)9. An apparatus for producing polyarylene sulfides including at least one repeat unit in accordance with the general formula I{'br': None, '\ue8a0A-S\ue8a0\u2003\u2003 Formula I,'} {'br': None, 'I-A-I\u2003\u2003 Formula II'}, '(where A represents a bivalent aromatic radical) produced by condensation polymerization of a di-iodized aromatic compound in accordance with the general formula II'}using a sulfidation agent, comprisinga) a precondensation stage comprising an agitating tub or a cascade of agitating tubs composed of a plurality of agitating tubs connected one after the other, wherein the agitating tub and/or the first agitating tub of the cascade of agitating tubs has at least one input possibility for the reactants, and has an outlet for the prepolymer, and downstream of the agitating tub or the cascade of agitating tubs further comprising;b) a condensation polymerization step comprising at least one condensation polymerization reactor or a cascade of a plurality of condensation polymerization reactors connected one after the other, wherein the condensation polymerization reactor and/or the first condensation polymerization reactor of the cascade of a plurality of condensation polymerization reactors has an input possibility for the prepolymers obtained from the first step and has a output possibility for the polycondensate,wherein the precondensation stage is connected to the condensation polymerization step via a product line,characterized in thatthe agitating tub or at least one agitating tub of the cascade of agitating tubs has at least ...

METHOD FOR SEPARATING VOLATILE SUBSTANCES FROM MATERIAL MIXTURES AND DEVICE FOR PRODUCING POLYARYLENE SULFIDES

The present invention relates to a method for separating volatile substances, particularly iodine, diiodised aromatic compounds and/or mixtures thereof, from material mixtures containing said compounds. The invention further relates to a device for producing polyarylene sulphides, by means of which volatile substances, particularly iodine and diiodised aromatic compounds, can be separated from the polymers. 1. A method for separating iodine of at least one di-iodized aromatic compound in accordance with the general formula II{'br': None, 'I-A-I\u2003\u2003Formula II'}(where A represents a bivalent aromatic radical) and/or mixtures thereof from material mixtures comprising iodine and/or the at least one di-iodized aromatic compound in accordance with the general formula II characterized in thata) a first part of the iodine, the at least one di-iodized aromatic compound in accordance with the general formula II, and/or the mixture thereof is/are separated at a pressure which is equal to or larger than the pressure which is present at the triple point of iodine; andb) a second part of the iodine, the di-iodized aromatic compound in accordance with the general formula II, and/or the mixture thereof is/are separated at a pressure which is smaller than the pressure which is present at the triple point of iodine;wherein in both steps a) and b) the material mixture respectively has temperatures at which at least iodine is present in a gaseous state at the said pressures.2. The method in accordance with claim 1 , wherein the material mixture includes polyarylene sulfides including at least one repeat unit in accordance with the general formula I{'br': None, '\ue8a0A-S\ue8a0\u2003\u2003Formula I'}(where A represents a bivalent aromatic radical) and/or includes prepolymers thereof.3. The method in accordance with claim 1 , wherein the separation is brought about by means of a condensation polymerization reaction in which a compound in accordance with formula II is transformed ...

Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition

Provided are a silylamine compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition, and more particularly, to a silylamine compound capable of being usefully used as a precursor of a silicon-containing thin film, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition.

METHOD FOR SEPARATING VOLATILE SUBSTANCES FROM MATERIAL MIXTURES AND DEVICE FOR PRODUCING POLYARYLENE SULFIDES

The present invention relates to a method for separating volatile substances, particularly iodine, diiodised aromatic compounds and/or mixtures thereof, from material mixtures containing said compounds. The invention further relates to a device for producing polyarylene sulphides, by means of which volatile substances, particularly iodine and diiodised aromatic compounds, can be separated from the polymers. 116-. (canceled)17. A method for producing a polyarylene sulfide including at least one repeat unit of the following general formula I , the method comprising:performing a condensation of a di-iodized aromatic compound of the following general formula II using a sulfidation agent,wherein a material mixture comprising iodine and/or the at least one di-iodized aromatic compound of the general formula II is separated during the condensation step by a method, characterized in thata) a first part of the material mixture is separated at a pressure which is equal to or larger than the pressure which is present at the triple point of iodine; andb) a second part of the material mixture is separated at a pressure which is smaller than the pressure which is present at the triple point of iodine; [{'br': None, '\ue8a0A-S\ue8a0\u2003\u2003formula I'}, {'br': None, 'I-A-I\u2003\u2003Formula II'}], 'wherein in both steps a) and b), the material mixture respectively has temperatures at which at least iodine is present in a gaseous state at the said pressuresIn the Formulae I and II, A represents a bivalent aromatic radical.18. The method in accordance with claim 17 , wherein the condensation step comprises:reacting the compound of the general formula II using the sulfidation agent to produce a prepolymer of the polyarylene sulfide of the general formula I; andcondensation polymerizing the prepolymer.19. The method in accordance with claim 18 , wherein the separation of the material mixture is performed during each of the steps of producing the prepolymer and polymerizing the ...

Trisilyl amine derivative, method for preparing the same and silicon-containing thin film using the same

Provided are a novel trisilyl amine derivative, a method for preparing the same, and a silicon-containing thin film using the same, wherein the trisilyl amine derivative, which is a compound having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under pressure where handling is possible, may form a high purity silicon-containing thin film having excellent physical and electrical properties by various deposition methods.

Method for separating volatile substances from material mixtures and device for producing polyarylene sulfides

The present invention relates to a method for separating volatile substances, particularly iodine, diiodised aromatic compounds and/or mixtures thereof, from material mixtures containing said compounds. The invention further relates to a device for producing polyarylene sulphides, by means of which volatile substances, particularly iodine and diiodised aromatic compounds, can be separated from the polymers.

IMAGE FORMING APPARATUS AND FRAME UNIT THEREOF

An image forming apparatus includes an image carrier, an exposure unit to form a latent image on the image carrier by light, and a particle entering prevention device to prevent particles from entering an optical path between the exposure unit and the image carrier. The particle entering prevention device includes a particle storage unit disposed in a vicinity of the optical path, to store the particles therein.

IMAGE FORMING APPARATUS

An image forming apparatus having a mounting/demounting structure between a main body and an image carrying unit. The image forming apparatus includes a main body provided with a first electrical connecting part, an image carrying unit removably mounted in the main body and provided with a second electrical connecting part, and a guide device to guide the image carrying unit in an insertion direction and a lateral direction so that the second electrical connecting part of the image carrying unit is connected to the first electrical connecting part of the main body. Accordingly, interference between the image carrying unit and an inner side surface of the main body is decreased, and mounting performance is enhanced.

Image forming apparatus having a mounting/demounting structure

An image forming apparatus having a mounting/demounting structure between a main body and an image carrying unit. The image forming apparatus includes a main body provided with a first electrical connecting part, an image carrying unit removably mounted in the main body and provided with a second electrical connecting part, and a guide device to guide the image carrying unit in an insertion direction and a lateral direction so that the second electrical connecting part of the image carrying unit is connected to the first electrical connecting part of the main body.

Capacitor sensor capable of controlling sensitivity

There is provided a capacitor sensor capable of controlling sensitivity, wherein the capacitor sensor measures the magnitude and direction of a shear force applied to the sensor, as well as the magnitude of a normal force applied on the surface of the sensor, and consists of a single cell including a pattern electrode capable of varying its shape to control the sensitivity of the sensor.

Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same

Provided are a novel amino-silyl amine compound, a method for preparing the same, and a silicon-containing thin-film using the same, wherein the amino-silyl amine compound has thermal stability and high volatility and is maintained in a liquid state at room temperature and under a pressure where handling is easy to thereby form a silicon-containing thin-film having high purity and excellent physical and electrical properties by various deposition methods.

Disilylamine compound, method for preparing the same, and composition for depositing silicon-containing thin film including the same

Provided are a novel disilylamine compound, a method for preparing same, and a composition for depositing a silicon-containing thin film including the same. A disilylamine compound of the present invention has excellent reactivity, is thermally stable, and has high volatility, and thus, is used as a silicon-containing precursor, thereby manufacturing a high-quality silicon-containing thin film.

NOVEL CYCLODISILAZANE DERIVATIVE, METHOD FOR PREPARING THE SAME AND SILICON-CONTAINING THIN FILM USING THE SAME

Provided are a novel cyclodisilazane derivative, a method for preparing the same, and a silicon-containing thin film using the same, wherein the cyclodisilazane derivative having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under a pressure where handling is easy, may form a high purity silicon-containing thin film having excellent physical and electrical properties by various deposition methods.

Image forming apparatus and frame unit thereof including a particle management device

An image forming apparatus includes an image carrier, an exposure unit to form a latent image on the image carrier by light, and a particle entering prevention device to prevent particles from entering an optical path between the exposure unit and the image carrier. The particle entering prevention device includes a particle storage unit disposed in a vicinity of the optical path, to store the particles therein.

Hinge device and display apparatus with a hinge device using a sliding position

A display apparatus which enables a display to rotate with a tilting angle across a large range is provided. This allows a user to, conveniently use the display apparatus in order to enable quality of use to be improved during a tilting operation, and slim and elegant appearance to be implemented. The display apparatus includes a display configured to display an image on the front surface, a stand supporting the display, and a hinge device connecting the display to the stand such that the display may be tilted, wherein the hinge device includes a guide member formed on a rear surface of the display, a latch fixed to the stand and to slide along the guide member when the display is tilted, and a fixing member fixing the display not to move when an external force applied to the display is removed.

Novel Amino-Silyl Amine Compound, Method for Preparing the Same and Silicon-Containing Thin-Film Using the Same

Provided are a novel amino-silyl amine compound, a method for preparing the same, and a silicon-containing thin-film using the same, wherein the amino-silyl amine compound has thermal stability and high volatility and is maintained in a liquid state at room temperature and under a pressure where handling is easy to thereby form a silicon-containing thin-film having high purity and excellent physical and electrical properties by various deposition methods. 2. The amino-silyl amine compound of claim 1 , wherein{'sup': 1', '5, 'Rto Rare each independently hydrogen, halogen, (C1-C5)alkyl, (C2-C5)alkenyl, (C2-C5)alkynyl, (C3-C6)cycloalkyl or (C6-C10)aryl; and'}{'sup': 6', '7, 'Rand Rare each independently hydrogen, (C1-C5)alkyl, (C2-C5)alkenyl, (C2-C5)alkynyl, (C3-C5)cycloalkyl or (C6-C10)aryl,'}{'sup': 1', '7, 'provided that a case where all Rto Rare methyl is excluded.'}3. The amino-silyl amine compound of claim 2 , wherein{'sup': 1', '5, 'Rto Rare each independently hydrogen or (C1-C5)alkyl; and'}{'sup': 6', '7', '1', '7, 'Rand Rare each independently hydrogen or (C1-C5)alkyl, provided that a case where all Rto Rare methyl is excluded.'}7. A silicon-containing composition for thin-film deposition comprising the amino-silyl amine compound of .8. A method for manufacturing a silicon-containing thin-film using the amino-silyl amine compound of .9. A silicon-containing thin-film manufactured by using the amino-silyl amine compound of . This application claims priority to Korean Patent Application Nos. 10-2013-0065323 and 10-2013-0159638, filed Jun. 7, 2013 and Dec. 19, 2013, respectively, the disclosures of which are hereby incorporated in their entirety by reference.The present invention relates to a novel amino-silyl amine compound, a method for preparing the same, and a silicon-containing thin-film using the same, and more particularly, to a novel amino-silyl amine compound having thermal stability and high volatility and being maintained in a liquid state at room ...

Rocker Arm Shaft with Improved Abrasion Resistance and Rocker Arm Shaft/Bush Assembly Comprising Same

The present disclosure relates to a rocker arm shaft and a rocker arm shaft/bush assembly including a rocker arm shaft, and a rocker arm bush which encloses the rocker arm shaft, in which the rocker arm shaft has a surface on which minutely processed concave-convex portions are formed, thereby achieving excellent lubricative characteristics and as a result having excellent abrasion resistance. 1. A rocker arm shaft which is accommodated in a rocker arm bush and configured to be relatively moved with respect to the rocker arm bush using lubricant so as to allow a rocker arm to reciprocate , the rocker arm shaft comprising:a plurality of concave-convex portions having groove shapes formed on at least a portion of an outer surface of the rocker arm shaft, which is in contact with the rocker arm bush.2. The rocker arm shaft of claim 1 , wherein the concave-convex portions are formed on both sides based on a corresponding portion of the rocker arm shaft claim 1 , where a maximum line contact load is generated with the rocker arm bush when a valve connected through the rocker arm is opened by 50% claim 1 , and a portion on which the concave-convex portions are formed is formed on a portion corresponding to an arc of a sector of which a central angle is 72° to 180° based on the portion where the maximum line contact load is generated.3. The rocker arm shaft of claim 1 , wherein a ratio of a region of the outer surface of the rocker arm shaft claim 1 , where the concave-convex portions are formed claim 1 , is 20% to 50% of an area of the outer surface of the entire rocker arm shaft.4. The rocker arm shaft of claim 1 , wherein a ratio of a sum of surface areas occupied by the concave-convex portions in a region on which the concave-convex portions are formed is 5% to 30%.5. The rocker arm shaft of claim 1 , wherein the concave-convex portion has a dashed line shape claim 1 , and a long side of the dashed line is disposed in parallel to an axial direction of the rocker arm ...

CAM FOLLOWER WITH IMPROVED STRUCTURE TO INCREASE LIMIT LOAD

Disclosed is a cam follower of which the structure is improved such that the limit load can be increased. The cam follower is one which moves relative to a cam, mediated by a liquid lubricant, wherein a plurality of recesses are provided on the contact surface of the cam follower which makes contact with the cam, and the depth of the plurality of recesses of the contact surface is between 0.005 and 0.03 mm. By providing the plurality of recesses on the contact surface of the cam follower which makes contact with the cam, the present invention makes it possible to improve the state of lubrication between the cam follower and the cam which move relative to each other mediated by the liquid lubricant and to reduce the heat and the wear which occur at the interface between the same. 1. A cam follower that is configured to move relatively to a cam through a liquid lubricant , wherein a plurality of grooves are formed on a contact surface of the cam follower being in contact with the am and the depths of the plurality of grooves of the contact surface are 0.005 to 0.03 mm.2. The cam follower of claim 1 , wherein the depths of the plurality of grooves of the contact surface are 0.01 to 0.03 mm.3. The cam follower of claim 1 , wherein the contact surface includes a plurality of grooves forming a lattice pattern and the widths of the grooves are 0.05 to 0.25 mm.4. The cam follower of claim 1 , wherein the contact surface includes a plurality of grooves forming a lattice pattern and the gaps between the grooves are 0.5 to 2.0 mm.5. The cam follower of claim 1 , wherein the contact surface includes a plurality of grooves forming a lattice pattern and limit load per cam width is 30 kgf/mm or less under an operating condition in which viscosity of the liquid lubricant is 0.02 Pa·s or less.6. The cam follower of claim 1 , wherein the contact surface includes a plurality of circular grooves and the diameters of the grooves are 0.05 to 0.15 mm.7. The cam follower of claim 1 , ...

CYLINDER FORMED WITH UNEVEN PATTERN ON SURFACE OF INNER WALL

The present disclosure relates to a cylinder having an inner wall formed with fine uneven patterns to improve durability. The fine uneven patterns according to the present disclosure increases oil film pressure between a piston ring and an inner wall of the cylinder, and smoothly supplies engine oil to where the engine oil is insufficient, thereby reducing abrasion between the piston ring and the inner wall of the cylinder. 1. A cylinder which is configured to guide movement of a piston , the cylinder comprising:a plurality of uneven patterns formed on the inner wall of the cylinder, wherein the plurality of uneven patterns are formed in at least a part of a region of a length region that is 5 to 50% of a stroke length section of the piston from a top dead center (TDC).2. The cylinder of claim 1 , wherein the plurality of uneven patterns is formed in a region that is at least 30% or more of the length region which is 5 to 50% of the stroke length section of the piston from the top dead center (TDC).3. The cylinder of claim 1 , wherein the plurality of uneven patterns is formed in at least a part of a region of a length region that is 8 to 32% of the stroke length section of the piston from the top dead center (TDC).4. The cylinder of claim 3 , wherein the plurality of uneven patterns is formed in a region that is at least 30% or more of the length region which is 8 to 32% of the stroke length section of the piston from the top dead center (TDC).5. The cylinder of claim 1 , wherein a type of uneven pattern is a fine hole having a concave mirror shape.6. The cylinder of claim 5 , wherein the fine hole having the concave mirror shape has a depth of 0.01 to 0.03 mm claim 5 , and a diameter of 0.07 to 0.17 mm.7. The cylinder of claim 6 , wherein an area purely occupied by fine holes having the concave mirror shape to an overall area where the fine holes having the concave mirror shape are formed is 5 to 15%.8. The cylinder of claim 1 , wherein a type of uneven pattern is ...

Hinge device and display apparatus with a hinge device using a sliding position

A display apparatus which enables a display to rotate with a tilting angle across a large range is provided. This allows a user to, conveniently use the display apparatus in order to enable quality of use to be improved during a tilting operation, and slim and elegant appearance to be implemented. The display apparatus includes a display configured to display an image on the front surface, a stand supporting the display, and a hinge device connecting the display to the stand such that the display may be tilted, wherein the hinge device includes a guide member formed on a rear surface of the display, a latch fixed to the stand and to slide along the guide member when the display is tilted, and a fixing member fixing the display not to move when an external force applied to the display is removed.

Developer storage device and image forming apparatus having the same

A developer storage device and an image forming apparatus having the same include a developer storage part including a first storage part and a second storage part having widths different from each other, and a first developer conveying member to convey a developer stored in the first storage part to the second storage part in a diagonal direction. The first developer conveying member includes conveying elements extended slantingly with respect to a width direction of the developer storage part. An angle between the conveying elements and the width direction of the developer storage part is determined depending on relative positions of the first storage part and the second storage part. Accordingly, the developer storage device can effectively convey a developer by designing the developer conveying member adequately for an overall shape or structure of the developer storage device.

Composition for depositing silicon-containing thin film including disilylamine compound and method for manufacturing silicon-containing thin film using the same

Provided are a novel disilylamine compound, a method for preparing same, and a composition for depositing a silicon-containing thin film including the same. A disilylamine compound of the present invention has excellent reactivity, is thermally stable, and has high volatility, and thus, is used as a silicon-containing precursor, thereby manufacturing a high-quality silicon-containing thin film.

Cylinder formed with uneven pattern on surface of inner wall

The present disclosure relates to a cylinder having an inner wall formed with fine uneven patterns to improve durability. The fine uneven patterns according to the present disclosure increases oil film pressure between a piston ring and an inner wall of the cylinder, and smoothly supplies engine oil to where the engine oil is insufficient, thereby reducing abrasion between the piston ring and the inner wall of the cylinder.

Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same

Provided are a composition for depositing a silicon-containing thin film containing a bis(aminosilyl)alkylamine compound and a method for manufacturing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film, containing the bis(aminosilyl)alkylamine compound capable of being usefully used as a precursor of the silicon-containing thin film, and a method for manufacturing a silicon-containing thin film using the same.

Method for separating volatile substances from material mixtures and device for producing polyarylene sulfides

The present invention relates to a method for separating volatile substances, particularly iodine, diiodised aromatic compounds and/or mixtures thereof, from material mixtures containing said compounds. The invention further relates to a device for producing polyarylene sulphides, by means of which volatile substances, particularly iodine and diiodised aromatic compounds, can be separated from the polymers.

Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same

Provided are a novel amino-silyl amine compound, a method for preparing the same, and a silicon-containing thin-film using the same, wherein the amino-silyl amine compound has thermal stability and high volatility and is maintained in a liquid state at room temperature and under a pressure where handling is easy to thereby form a silicon-containing thin-film having high purity and excellent physical and electrical properties by various deposition methods.

Amino-silyl amine compound and the manufacturing method of dielectric film containing Si—N bond by using atomic layer deposition

Provided are a novel amino-silyl amine compound and a manufacturing method of a dielectric film containing Si—N bond using the same. Since the amino-silyl amine compound according to the present invention, which is a thermally stable and highly volatile compound, may be treated at room temperature and used as a liquid state compound at room temperature and pressure, the present invention provides a manufacturing method of a high purity dielectric film containing a Si—N bond even at a low temperature and plasma condition by using atomic layer deposition (PEALD).

Image forming apparatus, developing device including developer contact member and developer cartridge thereof

An image forming apparatus, a developing device and a developer cartridge are disclosed. The developer cartridge includes a cartridge housing and a developer delivery unit to deliver a developer received in the cartridge housing. The developer delivery unit includes a delivery member and a contact portion to come into contact with the delivery member. The contact between the contact portion and the delivery member form a length longer than a straight line connecting one end of the contact portion to the other end.

Cam follower with improved structure to increase limit load

Disclosed is a cam follower of which the structure is improved such that the limit load can be increased. The cam follower is one which moves relative to a cam, mediated by a liquid lubricant, wherein a plurality of recesses are provided on the contact surface of the cam follower which makes contact with the cam, and the depth of the plurality of recesses of the contact surface is between 0.005 and 0.03 mm. By providing the plurality of recesses on the contact surface of the cam follower which makes contact with the cam, the present invention makes it possible to improve the state of lubrication between the cam follower and the cam which move relative to each other mediated by the liquid lubricant and to reduce the heat and the wear which occur at the interface between the same.

NOVEL TRISILYL AMINE DERIVATIVE, METHOD FOR PREPARING THE SAME AND SILICON-CONTAINING THIN FILM USING THE SAME

Provided are a novel trisilyl amine derivative, a method for preparing the same, and a silicon-containing thin film using the same, wherein the trisilyl amine derivative, which is a compound having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under pressure where handling is possible, may form a high purity silicon-containing thin film having excellent physical and electrical properties by various deposition methods. 2. The trisilyl amine derivative of claim 1 , wherein both of Rand Rare hydrogen claim 1 , halogen claim 1 , or methyl.6. A composition for depositing a silicon-containing thin film claim 1 , comprising the trisilyl amine derivative of .7. A method for manufacturing a silicon-containing thin film by using the composition for depositing a silicon-containing thin film of .8. A silicon-containing thin film manufactured by using the composition for depositing a silicon-containing thin film of . The present invention relates to a novel trisilyl amine derivative, a method for preparing the same, and a silicon-containing thin film using the same, and more particularly, to a novel trisilyl amine derivative having thermal stability and high volatility and being present in a liquid state at room temperature and under a pressure where handling is possible, a method for preparing the same, and a silicon-containing thin film using the same.A silicon-containing thin film is manufactured in various shapes, such as a silicon film, a silicon oxide film, a silicon nitride film, a silicon carbonitride film, a silicon oxynitride film, and the like, by various deposition processes in a semiconductor field, and is variously applied to many fields.In particular, the silicon oxide film and the silicon nitride film may function as an insulating film, a diffusion prevention film, a hard mask, an etching stop layer, a seed layer, a spacer, trench isolation, intermetallic dielectric material and a protective ...

Display apparatus

A display apparatus including a support configured to support a display unit, and a cover formed of a flexible sheet and configured to cover the support, thereby improving the external appearance of the rear side of the display apparatus through the cover.

Cylinder device having improved wear resistance through optimal arrangement of fine textures

There is provided a cylinder device having optimal arrangement of fine textures and optimal surface roughness capable of reducing wear of a cylinder bore side and a piston ring by processing fine textures in an optimal selection region of the cylinder bore side to improve lubrication characteristics between the piston ring and the cylinder bore side while reducing engine oil consumption by processing surface roughness of the cylinder bore side to an optimal status.

Cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the same

Provided are a novel cyclodisilazane derivative, a method for preparing the same, and a silicon-containing thin film using the same, wherein the cyclodisilazane derivative having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under a pressure where handling is easy, may form a high purity silicon-containing thin film having excellent physical and electrical properties by various deposition methods.

RECYCLABLE POLYARYLENE SULFIDE AND PREPARATION METHOD THEREOF

This disclosure relates to recyclable polyarylene sulfide that may exhibit and maintain excellent mechanical properties, particularly does not exhibit decrease in melt viscosity when it is molten, and thus, exhibit little deterioration of mechanical properties, and a method for preparing the same. 1. Polyarylene sulfide having initial melt viscosity measured at 300° C. of 300 to 6000 poise , and melt viscosity after heat treated and molten at 300° C. , equal to or greater than the initial melt viscosity.2. The polyarylene sulfide according to claim 1 , wherein melt viscosity change rate as defined by the following Equation 1 is 0 to 20%:{'br': None, 'sub': f', 'i, 'Melt viscosity change rate(%)=100(MV/MV−1) \u2003\u2003[Equation 1]'}{'sub': i', 'f, 'in the Equation 1, MVdenotes the initial melt viscosity of polyarylene sulfide, and MVis the melt viscosity of polyarylene sulfide after heat treating the polyarylene sulfide at 300° C. and melting it.'}3. The polyarylene sulfide according to claim 2 , wherein the MVis melt viscosity measured under shear rate of 1 rad/s in a plate-plate rheometer claim 2 , 10 minutes after heat treating the polyarylene sulfide under inert gas atmosphere at 300° C. for 3 minutes to melt it.4. The polyarylene sulfide according to claim 1 , wherein the polyarylene sulfide has number average molecular weight of 3 claim 1 ,000 to 1 claim 1 ,000 claim 1 ,000.5. The polyarylene sulfide according to claim 4 , wherein the polyarylene sulfide has number average molecular weight of 3 claim 4 ,000 to 50 claim 4 ,000.6. The polyarylene sulfide according to claim 1 , wherein the polyarylene sulfide has a dispersion degree of 2.0 to 4.0 as defined by the ratio of weight average molecular weight to number average molecular weight.7. The polyarylene sulfide according to claim 1 , wherein the polyarylene sulfide has a melting point of 265 to 320° C.8. The polyarylene sulfide according to claim 1 , wherein the initial tensile strength of compounded resin ...

CAPACITOR SENSOR CAPABLE OF CONTROLLING SENSITIVITY

There is provided a capacitor sensor capable of controlling sensitivity, wherein the capacitor sensor measures the magnitude and direction of a shear force applied to the sensor, as well as the magnitude of a normal force applied on the surface of the sensor, and consists of a single cell including a pattern electrode capable of varying its shape to control the sensitivity of the sensor. 1. A capacitor sensor capable of adjusting sensitivity , comprising:a capacitor made of a dielectric material with a unique permittivity as an incompressible synthetic dielectric elastomer and having two surfaces that are opposite to each other;two electrodes respectively disposed on the two surfaces of the capacitor, each of the two electrodes formed in a 2-dimensional shape whose width tapers off in one direction, the two electrodes tapering in opposite directions, and a degree to which each of the electrodes tapers being variable; anda capacitance measurer connected to each of the two electrodes,wherein the two electrodes partially overlap each other as seen from above, andwhen a shear force is applied to the capacitor sensor, the overlapping area of the electrodes changes, and the capacitance measurer measures the change of the overlapping area.2. The capacitor sensor of claim 1 , wherein each electrode is in the shape of a triangle claim 1 , a trapezoid claim 1 , or a parabola claim 1 , and a part at which in which the electrode tapers off is a vertex part of the triangle claim 1 , a narrow part of the trapezoid claim 1 , or an inflection point part of the parabola.3. The capacitor sensor of claim 2 , wherein if the electrodes are in the shapes of triangles claim 2 , and the top vertices of the triangles face in opposite directions claim 2 , angles of the top vertices of the triangles are adjusted to thereby control sensitivity of the capacitor sensor.4. The capacitor sensor of claim 3 , wherein as the angle of the vertex of each triangle increases claim 3 , the sensitivity of ...

POLYARYLENE SULFIDE HAVING EXCELLENT PROCESSABILITY AND PREPARATION METHOD THEREOF

The present invention relates to polyarylene sulfide, in which a ratio of a peak area of a polymer chain of a second polyarylene sulfide having a lower molecular weight than the maximum peak molecular weight to a peak area of a polymer chain of a first polyarylene sulfide having a higher molecular weight than the maximum peak molecular weight is 1.3 or less in the molecular weight distribution of the polyarylene sulfide, as measured by gel permeation chromatography using polystyrene as a standard, and a preparation method thereof. This polyarylene sulfide exhibits excellent processability and generates no burrs (flashes) or the like, and can satisfactorily mold a product requiring high molding precision. 1. Polyarylene sulfide , wherein a ratio of a peak area of a polymer chain of a second polyarylene sulfide having a lower molecular weight than the maximum peak molecular weight to a peak area of a polymer chain of a first polyarylene sulfide having a higher molecular weight than the maximum peak molecular weight is 1.3 or less in the molecular weight distribution of the polyarylene sulfide , as measured by gel permeation chromatography using polystyrene as a standard.2. The polyarylene sulfide according to claim 1 , wherein the ratio of the peak area of the polymer chain of the second polyarylene sulfide to the peak area of the polymer chain of the first polyarylene sulfide is 1.2 or less.3. The polyarylene sulfide according to claim 1 , wherein the ratio of the peak area of the polymer chain of the second polyarylene sulfide to the peak area of the polymer chain of the first polyarylene sulfide is 1.1 or less.4. The polyarylene sulfide according to claim 1 , wherein the maximum peak molecular weight is 12 claim 1 ,000 to 60 claim 1 ,000.5. the polyarylene sulfide according to claim 1 , wherein the number average molecular weight is 3 claim 1 ,000 to 100 claim 1 ,000.6. The polyarylene sulfide according to claim 1 , wherein the polymer chain of the first ...

DEVELOPING DEVICE AND IMAGE FORMING APPARATUS INCLUDING THE SAME

A developing device that attaches/detaches to/from a main body of an image forming apparatus includes a photosensitive drum, a charging roller to rotate while contacting the photosensitive drum to charge a surface of the photosensitive drum to a uniform potential, and a separating member to rotate between a first position where the charging roller is separated from the photosensitive drum and a second position where the charging roller contacts the photosensitive drum. The separating member includes a body into which a rotary shaft of the charging roller is inserted to be rotatable, and a contact portion extending from the body and contacting the surface of the photosensitive drum when the separating member is located at the first position so as to separate the charging roller from the photosensitive drum, wherein the contact portion includes a friction member including rubber. 1. A developing device usable with a main body of an image forming apparatus , the developing device comprising:a photosensitive drum;a charging roller to rotate while contacting the photosensitive drum to charge a surface of the photosensitive drum to a uniform potential; anda separating member to rotate between a first position where the charging roller is separated from the photosensitive drum and a second position where the charging roller contacts the photosensitive drum, the separating member comprising:a body into which a rotary shaft of the charging roller is rotatably inserted; anda contact portion extending from the body and contacting the surface of the photosensitive drum when the separating member is located at the first position so as to separate the charging roller from the photosensitive drum, the contact portion including a friction member formed of rubber.2. The developing device of claim 1 , wherein a surface of the friction member is a concave surface to contact the surface of the photosensitive drum.3. The developing device of claim 2 , further comprising:a shaft ...

DISPLAY APPARATUS

A display apparatus including a support configured to support a display unit, and a cover formed of a flexible sheet and configured to cover the support, thereby improving the external appearance of the rear side of the display apparatus through the cover. 1. A display apparatus , comprising:a display unit;a support configured to support the display unit; anda cover formed of a flexible sheet and configured to cover the support and a rear side of the display unit,wherein the cover is configured to cover the support in a state of being spaced apart from the support.2. The display apparatus of claim 1 , wherein the cover comprises a material capable of expansion and contraction.3. The display apparatus of claim 1 , wherein the cover comprises a fabric.4. The display apparatus of claim 2 , wherein the cover comprises a rear side cover part to cover the rear side of the display unit claim 2 , and a support cover part integrally extending from the rear side cover part while having a cross section of a ring shape so that the support is disposed at an inside of the support cover part.5. The display apparatus of claim 4 , wherein an inner surface of the support cover part is spaced apart from the support.6. The display apparatus of claim 4 , wherein the support extends while being inclined toward a front upper side claim 4 , and the support cover part extends from the rear side cover part toward a rear lower side of the support.7. The display apparatus of claim 4 , wherein the display unit is installed at an upper end of the support and enables a forward/backward rotation around a horizontal axis.8. The display apparatus of claim 4 , further comprising:a mount which is mountable on a horizontal surface and to which a lower end of the support is connected,wherein a lower end of the support is installed at the mount and enables a forward/backward rotation around a horizontal axis.9. The display apparatus of claim 4 , further comprising:a mount which is mountable on a ...

Display device with height adjustment structure and terminal having the same

A display device and a terminal having the same are disclosed. The terminal includes a base including a circuit board provided therein, and upper and lower housings, a support configured with one side combined with at least a portion of the lower housing and the other side having a head part configured for combination with a main body of a display, a first hole located on the upper housing and configured for combination with the support, and a second hole located on the circuit board and configured for combination with the support. The display device and the terminal having the same increase combining force between the support and the base and may use the same support and base in main bodies having various sizes, thus simplifying a manufacturing process and reducing part and assembly costs.

POLYARYLENE SULFIDE RESIN AND PREPARATION METHOD THEREOF

The present invention relates to a polyarylene sulfide which has more improved compatibility with other polymer materials or fillers, and a method for preparing the same. The polyarylene sulfide is characterized in that at least part of end groups of the main chain of the polyarylene sulfide is hydroxyl group (—OH), the polyarylene sulfide contains iodine bonded to its main chain and free iodine, and the content of iodine bonded to the main chain and free iodine is 10 to 10,000 ppmw. 1. A polyarylene sulfide in which at least part of end groups of a main chain of the polyarylene sulfide is hydroxyl group (—OH) , wherein the polyarylene sulfide contains iodine bonded to the main chain and free iodine , and a content of iodine bonded to the main chain and free iodine is 10 to 10 ,000 ppmw.2. The polyarylene sulfide according to claim 1 , wherein the content of iodine bonded to the main chain and free iodine is 10 to 3000 ppmw.3. The polyarylene sulfide according to claim 1 , showing a peak in the range of 3300 to 3600 cm claim 1 , in a FT-IR spectrum.4. The polyarylene sulfide according to claim 3 , wherein a relative height intensity of the peak in the range of 3300 to 3600 cmis 0.01 to 3% claim 3 , when a height of a ring stretch peak shown in the range of 1400 to 1600 cmis assumed as an intensity of 100% claim 3 , in the FT-IR spectrum.5. The polyarylene sulfide according to claim 1 , wherein a melting temperature is 265 to 290° C.6. The polyarylene sulfide according to claim 1 , wherein a number average molecular weight is 5 claim 1 ,000 to 50 claim 1 ,000.7. The polyarylene sulfide according to claim 1 , wherein a melt viscosity claim 1 , measured with a rotating disk viscometer at 300° C. claim 1 , is 10 to 50 claim 1 ,000 poise.8. The polyarylene sulfide according to claim 1 , wherein a tensile strength claim 1 , measured according to ASTM D 638 claim 1 , is 100 to 900 kgf/cm.9. The polyarylene sulfide according to claim 1 , wherein an elongation measured ...

POLYESTER RESIN

The present invention relates to a polyester resin. The polyester resin is useful for bottles, sheets, multilayer sheets, stretched films and fiber applications due to excellent heat resistance and transparency, and in particular, the polyester resin has little deterioration of physical properties such as yellowing, etc., during processing 1. A manufacturing method for a polyester resin , comprising:(a) performing an esterification reaction or a transesterification reaction on (i) a dicarboxylic acid or a derivative thereof that includes a terephthalic acid or a derivative thereof and (ii) a diol including 0.5 to 25 mol % of isosorbide with respect to a total diol; and(b) performing a polycondensation reaction on a product obtained by the esterification reaction or the transesterification reaction.2. The manufacturing method of claim 1 , wherein:a polycondensation catalyst, a stabilizer, a coloring agent, a crystallizer, an antioxidant or a branching agent is added to a slurry before (a) the esterification reaction or the transesterification reaction starts or to the product after (a) the esterification reaction or the transesterification reaction is completed.3. The manufacturing method of claim 1 , wherein:the dicarboxylic acid or the derivative thereof is a dicarboxylic acid, and an initial mixing molar ratio of the dicarboxylic acid or the derivative thereof and the diol is 1:1.01 to 1.04.4. The manufacturing method of claim 1 , wherein:the dicarboxylic acid or the derivative thereof is a dicarboxylic acid alkyl ester or a dicarboxylic acid anhydride, and an initial mixing molar ratio of the dicarboxylic acid or the derivative thereof and the diol is 1:2.0 to 1:2.1.5. The manufacturing method of claim 1 , further comprising:before (b) the polycondensation reaction, allowing the reaction product obtained by the esterification reaction or the transesterification reaction to stand under a reduced pressure of 400 to 1 mmHg for 0.2 to 3 hours.6. The manufacturing ...

DISPLAY PANEL AND DISPLAY DEVICE HAVING THE SAME

A display panel includes: a substrate; a plurality of pixels on the substrate, the plurality of pixels including an emitting element; a power supply line on the substrate, the power supply line being configured to receive power supplied from a power supply; and a temperature sensor at a peripheral region of the power supply line and for sensing a temperature of the power supply line. 1. A display panel comprising:a substratea plurality of pixels on the substrate, the plurality of pixels comprising an emitting element;a power supply line on the substrate, the power supply line being configured to receive power supplied from a power supply; anda temperature sensor at a peripheral region of the power supply line and configured to sense a temperature of the power supply line.2. The display panel as claimed in claim 1 ,wherein the temperature sensor comprises a p-type-intrinsic-metal (p-i-m) diode or a p-type intrinsic n-type (p-i-n) diode.3. The display panel as claimed in claim 1 ,wherein the temperature sensor is between the substrate and the power supply line.4. The display panel as claimed in claim 1 , wherein the power supply line comprises:a first power supply line configured to receive a first power from the power supply; anda second power supply line configured to receive a second power from the power supply.5. The display panel as claimed in claim 4 , wherein the temperature sensor comprises:a first temperature sensor at a peripheral region of the first power supply line, the first temperature sensor being configured to detect a temperature of the first power supply line; anda second temperature sensor at a peripheral region of the second power supply line, the second temperature sensor being configured to sense a temperature of the second power supply line.6. The display panel as claimed in claim 1 , wherein the temperature sensor comprises:a temperature sensing sensor configured to change a leakage current according to the temperature of the power supply line ...

POLYESTER RESIN

The present invention relates to a polyester resin. The polyester resin is useful for bottles, sheets, multilayer sheets, stretched films and fiber applications due to excellent heat resistance and transparency, and in particular, the polyester resin has little deterioration of physical properties such as yellowing, etc., during processing 1. A polyester resin having a structure in which a dicarboxylic acid or a derivative thereof that includes a terephthalic acid or a derivative thereof , and a diol that includes isosorbide are polymerized so that an acid moiety derived from the dicarboxylic acid or the derivative thereof and a diol moiety derived from the diol are repeated ,wherein the diol moiety derived from the isosorbide has a content of 0.5 to 20 mol % with respect to a total diol moiety derived from the diol, andwhen a standard solution in which isosorbide is dissolved in chloroform at a concentration of 150 μg/mL, and a resin solution obtained by dissolving a component extracted from 0.5 g of the polyester resin in 5 mL of chloroform using a solvent in which cyclohexane and isopropyl alcohol are mixed at a volume ratio of 2.5:97.5, are analyzed by gas chromatography, respectively, a peak area ratio of a peak of the resin solution confirmed at the same retention time to a peak confirmed in the analysis of the standard solution (peak area of the resin solution/peak area of the standard solution) is 1.0 or less.2. The polyester resin of claim 1 , wherein:the dicarboxylic acid or the derivative thereof includes 0 to 50 mol % of at least one selected from the group consisting of a C8-C14 aromatic dicarboxylic acid or a derivative thereof and a C4-C12 aliphatic dicarboxylic acid or a derivative thereof, as a dicarboxylic acid or a derivative thereof other than the terephthalic acid or the derivative thereof, with respect to a total dicarboxylic acid or a derivative thereof.3. The polyester resin of claim 1 , wherein:the diol moiety derived from isosorbide has a ...

POLYARYLENE SULFIDE RESIN COMPOSITION AND FORMED ARTICLE

The present invention relates to a polyarylene sulfide resin composition having good processability and showing excellent properties due to its more improved miscibility with other polymer materials or fillers, and a formed article. Such polyarylene sulfide resin composition includes a polyarylene sulfide including a disulfide repeating unit in the repeating units of the main chain; and at least one component selected from the group consisting of a thermoplastic resin, a thermoplastic elastomer, and a filler. 118-. (canceled)19. A polyarylene sulfide resin composition , including a polyarylene sulfide including a disulfide repeating unit in the repeating units of the main chain and having a target viscosity; and at least one component selected from the group consisting of a thermoplastic resin , a thermoplastic elastomer , and a filler ,wherein the polyarylene sulfide includes carboxyl group (—COOH) bonded to at least part of end groups of the main chain,wherein the polyarylene sulfide is prepared by a method comprising the steps of: (a) melt-polymerizing a reactant comprising a diiodoaromatic compound and elemental sulfur while adding a polymerization, and (b) adding a compound having a carboxyl group group; andwherein an FT-IR spectrum of the polyarylene sulfide shows a first peak between 1400 cm and 1600 cm−1 and a second peak between 1600 cm and 1800 cm−1, wherein a height intensity of the second peak is between about 0.1% and about 10% of a height intensity of the first peak.20. The polyarylene sulfide resin composition according to claim 19 , wherein the disulfide repeating unit is included in the amount of 3 weight % or less claim 19 , based on the whole polyarylene sulfide.21. The polyarylene sulfide resin composition according to claim 19 , wherein the thermoplastic resin is one or more selected from the group consisting of polyvinylalcohol-based resins claim 19 , vinylchloride-based resins claim 19 , polyamide-based resins claim 19 , polyolefin-based ...

POLYARYLENE SULFIDE AND A PREPARATION METHOD THEREOF

The present invention relates to a polyarylene sulfide having more improved miscibility with other polymer materials or fillers, and a method of preparing the same. At least part of end groups of the main chain of the polyarylene sulfide is carboxyl group (—COOH) or amine group (—NH). 1. A polyarylene sulfide of which at least part of end groups of the main chain is carboxyl group (—COOH) , and the remainder of the end groups is iodine group or unsubstituted aryl group , melt-polymerizing a reactant including a diiodoaromatic compound and elemental sulfur; and', 'adding a compound having carboxyl group while carrying out the melt-polymerization step,, 'wherein the polyarylene sulfide is prepared by a method including the steps of{'sup': −1', '−1, 'wherein an FT-IR spectrum of the polyarylene sulfide shows a first peak between 1400 and 1600 cmand a second peak between 1600 and 1800 cm, wherein a height intensity of the second peak is between about 0.001% and about 10% of a height intensity of the first peak, and'}wherein the adding step is carried out when a degree of the melt-polymerization step, determined by a ratio of a present viscosity to a target viscosity, is at least 90%.23-. (canceled)4. The polyarylene sulfide according to claim 1 , wherein the melting temperature is 265 to 290° C.5. The polyarylene sulfide according to claim 1 , wherein the number average molecular weight is 5 claim 1 ,000 to 50 claim 1 ,000.6. The polyarylene sulfide according to claim 1 , wherein the melt viscosity measured with a rotational viscometer at 300° C. is 10 to 50 claim 1 ,000 poise.7. The polyarylene sulfide according to claim 1 , wherein the tensile strength measured according to ASTM D 638 is 100 to 900 kgf/cm2.8. The polyarylene sulfide according to claim 1 , wherein the elongation measured according to ASTM D 638 is 1 to 10%.9. The polyarylene sulfide according to claim 1 , wherein the flexural strength measured according to ASTM D 790 is 100 to 2 claim 1 ,000 kgf/cm2.10 ...

POLYESTER BASED COPOLYMER RESIN AND MOLDED PRODUCT COMPRISING THE SAME

There are provided a polyester based copolymer resin capable of having an excellent shrinkage rate and being heat-shrunk at a low temperature, and a molded product comprising the same. The polyester based copolymer resin includes a dicarboxylic acid-derived residue including a residue derived from an aromatic dicarboxylic acid; and a diol-derived residue including a predetermined residue derived from 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexane carboxylate and a predetermined residue derived from 4,4-(oxybis(methylene)bis)cyclohexane methanol. 2. The polyester based copolymer resin of claim 1 , wherein the diol-derived residue further includes residues derived from 1 claim 1 ,4-cyclohexanedimethanol claim 1 , diethylene glycol claim 1 , and ethylene glycol.3. The polyester based copolymer resin of claim 1 , wherein the aromatic dicarboxylic acid is one or more selected from the group consisting of terephthalic acid claim 1 , dimethyl terephthalate claim 1 , cycloaliphatic dicarboxylic acid claim 1 , isophthalic acid claim 1 , adipic acid claim 1 , azelaic acid claim 1 , naphthalenedicarboxylic acid claim 1 , and succinic acid.5. The method of claim 4 , wherein the diol further includes 1 claim 4 ,4-cyclohexanedimethanol claim 4 , diethylene glycol claim 4 , and ethylene glycol.6. The method of claim 5 , wherein the diol includes 0.1 to 5 mol % of 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexane carboxylate claim 5 , 0.1 to 12 mol % of 4 claim 5 ,4-(oxybis(methylene)bis)cyclohexane methanol claim 5 , 0.1 to 15 mol % of 1 claim 5 ,4-cyclohexanedimethanol claim 5 , 2 to 15 mol % of diethylene glycol claim 5 , and 53 to 97.7 mol % of ethylene glycol based on 100 mol % of the dicarboxylic acid.7. The method of claim 4 , wherein the esterification reaction is performed at a reaction temperature of 230 to 265° C. and a pressure of 1.0 to 3.0 kg/cmfor 100 to 300 minutes after injecting the diol at a molar ratio of 1.2 to 3.0 with respect to ...

MDO THERMORESISTANT HEAT-SHRINKABLE FILM

The present invention relates to an MDO heat-shrinkable film of a copolymer polyester having excellent thermal resistance. In particular, the present invention provides a copolymer polyester MDO (machine direction orientation) thermoresistant heat-shrinkable film that consists of a copolymer polyester resin including isosorbide and 1,4-cyclohexanedimethanol at an optimized content ratio as a diol component copolymerized with an acid component including terephthalic acid, and having a number average molecular weight of 18,000 g/mol or more, and can be used for labels, cap seals, direct packaging, etc. of various containers due to the high shrink initiation temperature. 1. An MDO thermoresistant heat-shrinkable film consisting of a copolymer polyester resin having a number average molecular weight of 18 ,000 g/mol or more , which is formed by copolymerization of an acid component comprising terephthalic acid and a diol component , and has a structure wherein an acid moiety derived from the acid component and a diol moiety derived from the diol component are repeated , wherein the diol component comprises isosorbide and 1 ,4-cyclohexanedimethanol , a content ratio of isosorbide (ISB) and 1 ,4-cyclohexanedimethanol (CHDM) (ISB/CHDM) is 0.1 to 2.5 , and a content of the 1 ,4-cyclohexanedimethanol is 20 mol % to 60 mol % of the total diol component.2. The MDO thermoresistant heat-shrinkable film according to claim 1 , wherein a shrink initiation temperature of the film is 70° C. or more claim 1 , maximum heat shrinkage at 75° C. is less than 5% claim 1 , and maximum heat shrinkage at 95 to 100° C. is 30% to 65%.3. The MDO thermoresistant heat-shrinkable film according to claim 1 , wherein the acid component further comprises one or more selected from the group consisting of a C8-14 aromatic dicarboxylic acid component and a C4-12 aliphatic dicarboxylic acid component.4. The MDO thermoresistant heat-shrinkable film according to claim 1 , wherein the diol component further ...

POLYARYLENE SULFIDE AND A PREPARATION METHOD THEREOF

The present invention relates to a polyarylene sulfide having more improved miscibility with other polymer materials or fillers, and a method of preparing the same. At least part of end groups of the main chain of the polyarylene sulfide is carboxyl group (—COON) or amine group (—NH). 119-. (canceled)20. A method of preparing a polyarylene sulfide , including:melt-polymerizing a reactant including a diiodoaromatic compound and elemental sulfur; andadding a compound having carboxyl group while carrying out the melt-polymerization,wherein the compound having carboxyl group is added thereto when the degree of the polymerization reaction is progressed 90% or more, wherein the degree of polymerization reaction is determined by the ratio of present viscosity to target viscosity.21. The method of claim 20 , wherein in the polyarylene sulfide claim 20 , at least part of end groups of the main chain is carboxyl group (—COOH) claim 20 , and the remainder of the end groups is iodine group or unsubstituted aryl group.22. The method of claim 20 , wherein an FT-IR spectrum of the polyarylene sulfide shows a first peak between 1400 and 1600 cmand a second peak between 1600 and 1800 cm claim 20 , wherein a height intensity of the second peak is between about 0.5% and about 10% of a height intensity of the first peak.23. The method of claim 20 , wherein the compound having carboxyl group includes one or more compounds selected from the group consisting of 2-iodobenzoic acid claim 20 , 3-iodobenzoic acid claim 20 , 4-iodobenzoic acid claim 20 , and 2 claim 20 ,2′-dithiobenzoic acid.24. The method of claim 20 , wherein the compound having carboxyl group is added thereto in the amount of 0.0001 to 5 parts by weight claim 20 , based on 100 parts by weight of the diiodoaromatic compound.25. The method of claim 20 , wherein the diiodoaromatic compound is one more compounds selected from the group consisting of diiodobenzene claim 20 , diiodonaphthalene claim 20 , diiodobiphenyl claim 20 , ...

COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING BIS(AMINOSILYL)ALKYLAMINE COMPOUND AND METHOD FOR MANUFACTURING SILICON CONTAINING THIN FILM USING THE SAME

Provided are a composition for depositing a silicon-containing thin film containing a bis(aminosilyl)alkylamine compound and a method for manufacturing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film, containing the bis(aminosilyl)alkylamine compound capable of being usefully used as a precursor of the silicon-containing thin film, and a method for manufacturing a silicon-containing thin film using the same.

POLYESTER RESIN, METHOD FOR PREPARING SAME, AND RESIN MOLDED PRODUCT FORMED THEREFROM

The present invention relates to a polyester resin. The polyester resin contains a particular content of diol moieties, derived from isosorbide and diethylene glycol, and thus can provide a resin molded product exhibiting high transparency in spite of a large wall thickness thereof. 1. A polyester resin polymerized with a dicarboxylic acid including terephthalic acid or a derivative thereof and a diol including isosorbide and ethylene glycol , thereby having an alternating structure of an acid moiety derived from the dicarboxylic acid or a derivative thereof and a diol moiety derived from the diol ,wherein the polyester resin includes 6 to 12 mol % of a diol moiety derived from isosorbide and 2 to 5 mol % of a diol moiety derived from diethylene glycol based on the total diol moieties derived from the diol,wherein a melting point exists during the first scan through a differential scanning calorimetry (DSC), andwherein a haze is less than 3% as measured according to ASTM D1003-97 for a specimen having a thickness of 6 mm obtained from the polyester resin.2. The polyester resin of claim 1 , wherein the haze is 1.5% or less as measured according to ASTM D1003-97 for a specimen having a thickness of 6 mm obtained from the polyester resin.3. The polyester resin of claim 1 , wherein the dicarboxylic acid or a derivative thereof is a dicarboxylic acid or a derivative thereof other than terephthalic acid or a derivative thereof claim 1 , which includes at least one selected from the group consisting of an aromatic dicarboxylic acid having 8 to 14 carbon atoms or a derivative thereof and an aliphatic dicarboxylic acid having 4 to 12 carbon atoms or a derivative thereof in an amount of 0 to 50 mol % based on the total dicarboxylic acids or derivatives thereof.4. The polyester resin of claim 1 , wherein the polyester resin has a number average molecular weight of 15 claim 1 ,000 to 50 claim 1 ,000 g/mol.5. The polyester resin of claim 1 , wherein the polyester resin has a ...

HINGE DEVICE AND DISPLAY APPARATUS WITH A HINGE DEVICE USING A SLIDING POSITION

A display apparatus which enables a display to rotate with a tilting angle across a large range is provided. This allows a user to, conveniently use the display apparatus in order to enable quality of use to be improved during a tilting operation, and slim and elegant appearance to be implemented. The display apparatus includes a display configured to display an image on the front surface, a stand supporting the display, and a hinge device connecting the display to the stand such that the display may be tilted, wherein the hinge device includes a guide member formed on a rear surface of the display, a latch fixed to the stand and to slide along the guide member when the display is tilted, and a fixing member fixing the display not to move when an external force applied to the display is removed. 1. A display apparatus , comprisinga display configured to display an image on a front surface thereof;a stand configured to support the display; anda hinge device configured to connect the display to the stand such that the display is tilted,wherein the hinge device includes a guide member formed on a rear surface of the display, a latch fixed to the stand and configured to slide along the guide member when the display is tilted, and a fixing member configured to fix the display such that the display is not moved when an external force applied to the display is removed.2. The display apparatus according to claim 1 , wherein the fixing member is a hydraulic hinge in which fluids are received in a cylinder.3. The display apparatus according to claim 2 , wherein the hydraulic hinge includes a piston received in the cylinder claim 2 , and the piston reciprocates in the cylinder when a force greater than the hydraulic power of the hydraulic hinge is applied to the display.4. The display apparatus according to claim 2 , wherein the hydraulic hinge includes a side mounted on the rear surface of the display by an axis of rotation claim 2 , and rotates with respect to the axis of ...

POLYESTER RESIN COMPOSITION AND PREPARATION METHOD THEREOF

The present invention relates to a polyester resin composition capable of having an excellent shrinkage rate, being heat-shrunk at a low temperature, and improving adhesion properties, without impairing insulation properties in a state of heat-shrinkable films, and a method for preparing the same. The present polyester resin composition comprises: a copolymerized polyester resin including a dicarboxylic acid-derived residue including a residue derived from an aromatic dicarboxylic acid; and a diol-derived residue including a residue derived from 4-(hydroxymethyl)cyclohexyl methyl 4′-(hydroxymethyl)cyclohexane carboxylate, and a residue derived from 4,4-(oxybis(methylene)bis) cyclohexane methanol, an alkali metal compound, and an alkaline earth metal compound, wherein the alkali metal compound and the alkaline earth metal compound are contained in an amount that the content ratio of the alkali metal element/the alkaline earth metal element derived therefrom is 0.01 to 1. 1. (canceled)2. (canceled)3. (canceled)4. (canceled)5. (canceled)6. (canceled)7. (canceled)8. (canceled)9. (canceled)10. (canceled)11. (canceled)12. (canceled)13. A method for preparing a polyester resin composition comprising:reacting a dicarboxylic acid including an aromatic dicarboxylic acidwith the diol including 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexane carboxylate and 4,4-(oxybis(methylene)bis)cyclohexane methanol, thus performing esterification and polycondensation reactions,wherein at least one step of the esterification and polycondensation reaction steps is performed in the presence of an alkali metal compound, and an alkaline earth metal compound,wherein the alkali metal compound and the alkaline earth metal compound are used in an amount that the content ratio of the alkali metal element/the alkaline earth metal element derived from therefrom is 0.01 to 1.14. The method for preparing a polyester resin composition according to wherein the esterification reaction is ...

SILICON METAL OXIDE ENCAPSULATION FILM COMPRISING METAL OR METAL OXIDE IN THIN FILM, AND MANUFACTURING METHOD THEREFOR

The present invention relates to a silicon oxide encapsulation film comprising a metal or a metal oxide, and a manufacturing method therefor. The silicon metal oxide encapsulation film according to the present invention has a high thin film growth rate and low moisture and oxygen permeabilities, thereby exhibiting a very excellent sealing effect even at a low thickness, and the stress strength and refractive index thereof can be controlled, thereby enabling a high-quality silicon metal oxide encapsulation film that is applicable to a flexible display to be readily manufactured. 1. A silicon metal oxide encapsulation layer represented by the following Chemical Formula 1:{'br': None, 'sub': x', 'y', 'z, 'SiMO\u2003\u2003[Chemical Formula 1]'}whereinM is a metal,x satisfies 0.1 Подробнее

NOVEL AMINO-SILYL AMINE COMPOUND, METHOD FOR PREPARING THE SAME AND SILICON-CONTAINING THIN-FILM USING THE SAME

Provided are a novel amino-silyl amine compound, a method for preparing the same, and a silicon-containing thin-film using the same, wherein the amino-silyl amine compound has thermal stability and high volatility and is maintained in a liquid state at room temperature and under a pressure where handling is easy to thereby form a silicon-containing thin-film having high purity and excellent physical and electrical properties by various deposition methods. 2. The amino-silyl amine compound of claim 1 , wherein{'sup': 1', '4, 'Rto Rare each independently hydrogen, halogen, (C1-C5)alkyl, (C2-C5)alkenyl, (C2-C5)alkynyl, (C3-C6)cycloalkyl or (C6-C10)aryl, and'}{'sup': 5', '8, 'Rto Rare each independently hydrogen, (C1-C5)alkyl, (C2-C5)alkenyl, (C2-C5)alkynyl, (C3-C5)cycloalkyl or (C6-C10)aryl.'}3. The amino-silyl amine compound of claim 2 , wherein{'sup': 1', '4, 'Rto Rare each independently hydrogen or (C1-C5)alkyl, and'}{'sup': 5', '8, 'Rto Rare each independently hydrogen or (C1-C5)alkyl.'}10. A silicon-containing composition for thin-film deposition comprising the amino-silyl amine compound of .11. A method for manufacturing a silicon-containing thin-film comprising the tri-silyl amine compound of .12. A silicon-containing thin-film manufactured by using the amino-silyl amine compound of . The present invention relates to a novel amino-silyl amine compound, a method for preparing the same, and a silicon-containing thin-film using the same, and more particularly, to a novel amino-silyl amine compound having thermal stability and high volatility and being maintained in a liquid state at room temperature and under a pressure where handling is easy, a method for preparing the same, and a silicon-containing thin-film using the same.A silicon-containing thin-film is manufactured in various shapes, including silicon, silicon oxide, silicon nitride, silicon carbonitride, silicon oxynitride, and the like, by various deposition processes in a semiconductor field, and the ...

HEAT SHRINKABLE FILM COMPOSITION COMPRISING POLYETHYLENETEREPHTALATE RESIN AND POLYESTER BASED COPOLYMER, AND HEAT SHRINKABLE FILM

There is provided a composition for forming a heat shrinkable film capable of providing a heat shrinkable film capable of having an excellent shrinkage rate and being heat-shrunk at a low temperature. The composition for forming a heat shrinkable film includes a polyethylene terephthalate (PET) resin having an inherent viscosity of 0.50 to 1.2 dl/g; and a polyester based copolymer including a dicarboxylic acid-derived residue including a residue derived from an aromatic dicarboxylic acid and a diol-derived residue including a residue derived from 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexane carboxylate represented by the following Chemical Formula 1 and a residue derived from 4,4-(oxybis(methylene)bis)cyclohexane methanol represented by the following Chemical Formula 2. 2. The composition of claim 1 , wherein the polyester based copolymer has an inherent viscosity of 0.60 to 0.90 dl/g.3. The composition of claim 1 , wherein the polyethylene terephthalate (PET) resin is included at a content of 1 to 99 mol % claim 1 , and the polyester based copolymer is included at a content of 1 to 99 mol %.4. The composition of claim 1 , wherein the diol-derived residue further includes a residue derived from one or more other diols selected from a group consisting of 1 claim 1 ,4-cyclohexane dimethanol claim 1 , 1 claim 1 ,2-propanediol claim 1 , 1 claim 1 ,3-propanediol claim 1 , 1 claim 1 ,4-butanediol claim 1 , 2 claim 1 ,2-dimethyl-1 claim 1 ,3-propanediol claim 1 , 1 claim 1 ,6-hexanediol claim 1 , 1 claim 1 ,2-cyclohexanediol claim 1 , 1 claim 1 ,4-cyclohexanediol claim 1 , 1 claim 1 ,2-cyclohexane dimethanol claim 1 , 1 claim 1 ,3-cyclohexane dimethanol claim 1 , 2 claim 1 ,2-dimethylpropane-1 claim 1 ,3-diol (neopentyl glycol) claim 1 , ethylene glycol claim 1 , and diethylene glycol.5. The composition of claim 4 , wherein a content of the diol-derived residues of the residue derived from 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexane ...

Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same

Provided are a composition for depositing a silicon-containing thin film containing a bis(aminosilyl)alkylamine compound and a method for manufacturing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film, containing the bis(aminosilyl)alkylamine compound capable of being usefully used as a precursor of the silicon-containing thin film, and a method for manufacturing a silicon-containing thin film using the same.

COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME

Provided are a composition containing a silylamine compund and a method for manufacturing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film, containing a silylamine compound capable of forming a silicon-containing thin film having a significantly excellent water vapor transmission rate to thereby be usefully used as a precursor of the silicon-containing thin film and an encapsulant of a display, and a method for manufacturing a silicon-containing thin film using the same. 2. The composition of claim 1 , wherein Rand Rare each independently C1-C5alkyl.4. The composition of claim 3 , wherein Rand Rare each independently C1-C5alkyl; andn and m are each independently an integer of 1 to 4.7. The method of claim 6 , wherein deposition is performed by an atomic layer deposition method claim 6 , a chemical vapor deposition method claim 6 , a metal-organic chemical vapor deposition method claim 6 , a low-pressure chemical vapor deposition method claim 6 , a plasma-enhanced chemical vapor deposition method claim 6 , or a plasma-enhanced atomic layer deposition method.8. The method of claim 6 , wherein the silicon-containing thin film is a silicon oxide film claim 6 , a silicon oxy carbide film claim 6 , a silicon nitride film claim 6 , a silicon oxy nitride film claim 6 , a silicon carbonitride film claim 6 , or a silicon carbide film.9. The method of claim 6 , comprising:a) maintaining a temperature of a substrate mounted in a chamber at 30 to 500° C.;{'claim-ref': [{'@idref': 'CLM-00001', 'claims 1'}, {'@idref': 'CLM-00005', '5'}], 'b) contacting the composition of any one of to with the substrate to adsorb the composition in the substrate; and'}c) injecting a reaction gas into the substrate in which the composition is adsorbed to form a silicon-containing thin film.10. The method of claim 9 , wherein the reaction gas is supplied after being activated by generating plasma with a plasma power of ...

DRYER FOR ELECTRODE SUBSTRATE OF RECHARGEABLE BATTERY AND CONTROLLING METHOD OF THE SAME

A dryer for an electrode substrate of a rechargeable battery according to an exemplary embodiment of the present invention includes: a drying oven for drying an electrode substrate by feeding the electrode substrate to an inlet and discharging it through an outlet; fixed guide rolls provided at a distance from each other between the inlet and the outlet to guide the electrode substrate; lifting guide rolls ascended or descended at one side of the respective fixed guide rolls to guide the moving electrode substrate; driving rolls disposed to correspond to locations of the lifting guide rolls; and a shuttle moving toward the outlet from the inlet. 1. A dryer for an electrode substrate of a rechargeable battery , comprising:a drying oven configured to dry a moving electrode substrate by feeding the electrode substrate to an inlet and discharging the electrode substrate through an outlet;fixed guide rolls provided at a distance from each other between the inlet and the outlet to guide the moving electrode substrate;lifting guide rolls ascended at one sides of the respective fixed guide rolls to guide the moving electrode substrate;driving rolls disposed to correspond to locations of the lifting guide rolls; anda shuttle configured to move toward the outlet from the inlet.2. The dryer for the electrode substrate of the rechargeable battery of claim 1 , wherein the lifting guide rolls have an ascended location and a descended location claim 1 , and the driving rolls are disposed corresponding to the descended location of the lifting guide rolls.3. The dryer for the electrode substrate of the rechargeable battery of claim 2 , wherein the shuttle is configured to be moved in a state of being connected with the electrode substrate and supported by the driving rolls and the lifting guide rolls.4. The dryer for the electrode substrate of the rechargeable battery of claim 1 , wherein the fixed guide rolls are provided in plural claim 1 , and the lifting guide rolls are provided ...

NOVEL AMINO-SILYL AMINE COMPOUND AND THE MANUFACTURING METHOD OF DIELECTRIC FILM CONTAINING Si-N BOND BY USING ATOMIC LAYER DEPOSITION

Provided are a novel amino-silyl amine compound and a manufacturing method of a dielectric film containing Si—N bond using the same. Since the amino-silyl amine compound according to the present invention, which is a thermally stable and highly volatile compound, may be treated at room temperature and used as a liquid state compound at room temperature and pressure, the present invention provides a manufacturing method of a high purity dielectric film containing a Si—N bond even at a low temperature and plasma condition by using atomic layer deposition (PEALD). 2. The amino-silyl amine compound of claim 1 , wherein Rto Rare each independently hydrogen claim 1 , methyl claim 1 , or vinyl.6. A manufacturing method of a dielectric film containing a Si—N bond claim 4 , the manufacturing method using the composition for silicon-containing dielectric film deposition of as a precursor.7. The manufacturing method of claim 6 , wherein it comprises:a) contacting the composition for silicon-containing dielectric film deposition with a substrate to adsorb the composition for silicon-containing dielectric film deposition in the substrate;b) purging the remaining composition for silicon-containing dielectric film deposition and by-products;c) forming an atomic layer having a Si—N bond by injecting reaction gas into the substrate containing the adsorbed composition for silicon-containing dielectric film deposition to remove a ligand of the composition for silicon-containing dielectric film deposition; andd) purging the remaining reaction gas and reaction by-products.9. The manufacturing method of claim 7 , wherein the reaction gas is supplied after being activated by generating plasma of 50 to 1000 W.10. The manufacturing method of claim 9 , wherein the reaction gas is supplied after being activated by generating plasma of 100 to 500 W.11. The manufacturing method of claim 10 , wherein a substrate temperature is 100 to 600° C.12. The manufacturing method of claim 10 , wherein the ...

HEAT SHRINKABLE FILM COMPRISING POLYESTER BASED COPOLYMER

There is provided a heat shrinkable film comprising a polyester based copolymer capable of having an excellent shrinkage rate and being heat shrunk at a low temperature. The heat shrinkable film according to an exemplary embodiment of the present invention includes a polyester based copolymer, wherein the polyester based copolymer includes: a dicarboxylic acid-derived residue including a residue derived from an aromatic dicarboxylic acid; and a diol-derived residue including a residue derived from 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexane carboxylate represented by the following Chemical Formula 1 and a residue derived from 4,4-(oxybis(methylene)bis) cyclohexane methanol represented by the following Chemical Formula 2. 2. The heat shrinkable film of claim 1 , wherein the diol-derived residue further includes residues derived from 1 claim 1 ,4-cyclohexane dimethanol claim 1 , diethylene glycol claim 1 , and ethylene glycol.3. The heat shrinkable film of claim 1 , wherein the aromatic dicarboxylic acid is one or more selected from a group consisting of terephthalic acid claim 1 , dimethyl terephthalate claim 1 , cyclic dicarboxylic acid claim 1 , isophthalic acid claim 1 , adipic acid claim 1 , azelaic acid claim 1 , naphthalenedicarboxylic acid claim 1 , and succinic acid.4. The heat shrinkable film of claim 1 , wherein it has a shrinkage initiation temperature of 65 ° C. or less and a maximum heat shrinkage rate of 25% or more at 65° C.5. The heat shrinkable film of claim 1 , wherein it has a maximum heat shrinkage rate of 75% or more at 95° C.7. The method of claim 6 , wherein the diol further includes 1 claim 6 ,4-cyclohexane dimethanol claim 6 , diethylene glycol claim 6 , and ethylene glycol.8. The method of claim 7 , wherein the diol includes 0.1 to 10 mol % of 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexane carboxylate claim 7 , 0.1 to 12 mol % of 4 claim 7 ,4-(oxybis(methylene)bis) cyclohexane methanol claim 7 , 0.1 to 15 ...

NOVEL SILYLCYCLODISILAZANE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME

Provided is a novel silylcyclodisilazane compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing the silicon-containing thin film using the same, and since the silylcyclodisilazane compound of the present invention has high reactivity, thermal stability and high volatility, it can be used as a silicon-containing precursor, thereby manufacturing a high-quality silicon-containing thin film by various deposition methods. 2. The silylcyclodisilazane compound of claim 1 , wherein{'sup': 1', '3, 'sub': 1', '5', '2', '5, 'Rand Rare each independently C-Calkyl or C-Calkenyl;'}{'sup': '2', 'sub': 1', '5', '2', '5, 'Ris hydrogen, C-Calkyl or C-Calkenyl;'}{'sup': '4', 'sub': 1', '5', '2', '5, 'Ris C-Calkyl or C-Calkenyl;'}{'sup': 5', '6, 'sub': 1', '5', '2', '5, 'Rand Rare each independently hydrogen, C-Calkyl or C-Calkenyl; and'}{'sup': '7', 'sub': 1', '5', '2', '5, 'Ris C-Calkyl or C-Calkenyl.'}5. The composition for depositing a silicon-containing thin film of claim 4 , wherein{'sup': 11', '13, 'sub': 1', '7', '2', '7, 'Rand Rare each independently C-Calkyl or C-Calkenyl;'}{'sup': 12', '14, 'sub': 1', '7', '2', '7, 'Rand Rare each independently hydrogen, C-Calkyl or C-Calkenyl;'}{'sup': '15', 'sub': 1', '7', '2', '7, 'Ris C-Calkyl or C-Calkenyl;'}{'sup': 16', '17, 'sub': 1', '7', '2', '7, 'Rand Rare each independently hydrogen, C-Calkyl or C-Calkenyl; and'}{'sup': '18', 'sub': 1', '7', '2', '7, 'Ris C-Calkyl or C-Calkenyl.'}6. The composition for depositing a silicon-containing thin film of claim 4 , wherein{'sup': 11', '13, 'sub': 1', '7', '2', '7, 'Rand Rare each independently C-Calkyl or C-Calkenyl;'}{'sup': '12', 'sub': 1', '7', '2', '7, 'Ris hydrogen, C-Calkyl or C-Calkenyl;'}{'sup': '14', 'Ris hydrogen;'}{'sup': '15', 'sub': 1', '7', '2', '7, 'Ris C-Calkyl or C-Calkenyl;'}{'sup': 16', '17, 'sub': 1', '7', '2', '7, 'Rand Rare each independently hydrogen, C-Calkyl or C-Calkenyl;'}{'sup': 18', 'a', 'b', 'c ...

Polyester copolymer having excellent chemical resistance and transparency

The polyester copolymer according to the present invention is excellent in chemical resistance and transparency and thus can be usefully applied to the production of various containers.

POLYARYLENE SULFIDE RESIN COMPOSITION AND A PREPARATION METHOD THEREOF

The present invention relates to a polyarylene sulfide resin composition having excellent impact resistance in which a polyarylene sulfide resin having a specific end group, an epoxy-containing olefin-based elastomer, and/or an organic or inorganic filler are included, and a preparation method thereof. 1. A polyarylene sulfide resin composition , including:60 to 95 wt % of a polyarylene sulfide resin (A) of which at least part of the end group of the polyarylene sulfide main chain is substituted by a carboxyl group; and5 to 40 wt % of an epoxy-containing olefin-based elastomer (B).2. A polyarylene sulfide resin composition , including: a resin mixture consisting of 60 to 95 wt % of a polyarylene sulfide resin (A) of which at least part of the end group of the polyarylene sulfide main chain is substituted by a carboxyl group, and 5 to 40 wt % of an epoxy-containing olefin-based elastomer (B), or', 'a resin mixture consisting of 70 to 85 wt % of a polyarylene sulfide resin (A) and 15 to 30 wt % of an epoxy-containing olefin-based elastomer (B); and, '100 parts by weight of1 to 50 parts by weight of an organic or inorganic filler (C).3. The polyarylene sulfide resin composition according to claim 1 , wherein the content of the polyarylene sulfide resin (A) is 70 to 85 wt % claim 1 , and the content of the epoxy-containing olefin-based elastomer (B) is 15 to 30 wt %.4. The polyarylene sulfide resin composition according to claim 1 , wherein the polyarylene sulfide resin (A) substituted with carboxyl group includes the structure unit represented by the following General Formula 1 in the amount of 70 mol % or more:{'br': None, 'i': 'n', '—(SAr)-COOH\u2003\u2003[General Formula 1]'}wherein, Ar is an arylene group.5. The polyarylene sulfide resin composition according to claim 4 , wherein the arylene group is at least one selected from the group consisting of p-phenylene group claim 4 , m-phenylene group claim 4 , o-phenylene group claim 4 , and a substituted phenylene ...

COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM INCLUDING DISILYLAMINE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME

Provided are a novel disilylamine compound, a method for preparing same, and a composition for depositing a silicon-containing thin film including the same. A disilylamine compound of the present invention has excellent reactivity, is thermally stable, and has high volatility, and thus, is used as a silicon-containing precursor, thereby manufacturing a high-quality silicon-containing thin film. 2. The composition for depositing a silicon-containing thin film of claim 1 , wherein in Chemical Formula 1 claim 1 ,{'sub': a', 'b', 'a', 'b, 'Rand Rare each independently hydrogen, C1-C5alkyl or C2-C5alkenyl, with a proviso that Rand Rare not hydrogen at the same time;'}{'sub': 1', '3, 'Rto Rare hydrogen; and'}{'sub': 4', '9, 'Rto Rare each independently hydrogen, C1-C5alkyl or C2-C5alkenyl.'}4. The composition for depositing a silicon-containing thin film of claim 3 , wherein in Chemical Formula 2 claim 3 , Rto Rare each independently hydrogen or C1-C5alkyl.7. The method of claim 6 , wherein the method is performed by atomic layer deposition claim 6 , chemical vapor deposition claim 6 , metalorganic chemical vapor deposition claim 6 , low pressure chemical vapor deposition claim 6 , plasma-enhanced chemical vapor deposition or plasma-enhanced atomic layer deposition.8. The method of claim 6 , comprising:a) maintaining a temperature of a substrate mounted in a chamber to 30 to 400° C.;{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'b) injecting carrier gas and the composition for depositing a silicon-containing thin film of ; and'}c) injecting reaction gas to deposit the silicon-containing thin film on the substrate.9. The method of claim 8 , wherein the reaction gas is any one or two or more selected from the group consisting of oxygen claim 8 , ozone claim 8 , distilled water claim 8 , hydrogen peroxide claim 8 , nitrogen monoxide claim 8 , nitrous oxide claim 8 , nitrogen dioxide claim 8 , ammonia claim 8 , nitrogen claim 8 , hydrazine claim 8 , amine claim 8 , ...

Multilayer polyester sheet and molded product made of the same

The present invention relates to a multilayer polyester sheet, comprising: a substrate layer including a thermoplastic resin; and a coating layer formed on at least one surface of the substrate layer and contains a polyester resin including a residue of a diol component including 51 mol % to 85 mol % of isosorbide and a residue of a dicarboxylic acid component, and a molded product of the same.

RECYCLABLE POLYARYLENE SULFIDE AND PREPARATION METHOD THEREOF

This disclosure relates to recyclable polyarylene sulfide that may exhibit and maintain excellent mechanical properties, particularly does not exhibit decrease in melt viscosity when it is molten, and thus, exhibit little deterioration of mechanical properties, and a method for preparing the same. 118.-. (canceled)19. A method for preparing polyarylene sulfide , comprising:polymerizing reactants comprising diiodide aromatic compounds, an initial amount of sulfur compound, and, based on 100 parts by weight of the diiodide aromatic compounds, 0.05 to 10 parts by weight of a polymerization terminator; andadding an additional amount of sulfur compound at a point after the addition of the initial amount of a sulfur compound, wherein the additional amount of sulfur compound is 1 to 10 parts by weight based on 100 parts by weight of the initial amount of sulfur compound;wherein the polyarylene sulfide has an initial melt viscosity of 300 to 6000 poise measured at 300° C., and a melt viscosity after heat treated and molten at 300° C. which is equal to or greater than the initial melt viscosity; and {'br': None, 'sub': f', 'i, 'Melt viscosity change rate(%)=100(MV/MV−1)\u2003\u2003[Equation 1]'}, 'wherein the polyarylene sulfide has a melt viscosity change rate of 0 to 20% as defined by Equation 1{'sub': i', 'f, 'wherein MVdenotes the initial melt viscosity of polyarylene sulfide, and MVis the melt viscosity of polyarylene sulfide after heat treating the polyarylene sulfide at 300° C. and melting it.'}20. The method according to claim 19 , wherein the diiodide aromatic compounds are included in the reactants in the content of 0.9 moles or more based on the sulfur compounds.21. The method according to claim 19 , wherein the polymerization terminator is at least one selected from the group consisting of diphenyl suldife claim 19 , diphenyl ether claim 19 , diphenyl claim 19 , benzophenone claim 19 , monoiodoaryl compounds claim 19 , benzothiazole claim 19 , ...

SERVER, DISPLAY APPARATUS, SYSTEM FOR CONTROLLING IMAGE IN A PLURALITY OF DISPLAY APPARATUSES, AND CONTROLLING METHOD THEREOF

A system for controlling a plurality of display apparatuses which are connected to a server, a controlling method thereof, a server, and a display apparatus are provided. The method for controlling a plurality of display apparatuses includes registering the plurality of display apparatuses by using authentication information, generating playing information and image data based on the authentication information, and transmitting, to the plurality of display apparatuses, the playing information and the image data. 1. A method for controlling , by a server , a plurality of display apparatuses , comprising:registering the plurality of display apparatuses by using authentication information;generating playing information and image data based on the authentication information; andtransmitting, to the plurality of display apparatuses, the playing information and the image data.2. The method as claimed in claim 1 , wherein the authentication information comprises at least one from among a location where the plurality of display apparatuses are positioned claim 1 , an area claim 1 , a feature claim 1 , and a type of the plurality of display apparatuses.3. The method as claimed in claim 1 , wherein the playing information comprises at least one from among information which relates to a type of the image data claim 1 , information which relates to a playing time claim 1 , and information which relates to a playing period.4. The method as claimed in claim 1 , wherein claim 1 , in response to a playing of the image data being stopped in at least one display apparatus from among the plurality of display apparatuses claim 1 , the at least one display apparatus is configured to determine a stoppage interval which relates to the image data claim 1 , andwherein, in response to a restarting of the playing of the image data, the at least one display apparatus is further configured to play the image data in accordance with the determined stoppage interval.5. The method as claimed in ...

POLYESTER FILM AND MANUFACTURING METHOD THEREOF

The present invention relates to a polyester film and a preparation method thereof. The polyester film is formed of a polyester resin having a specific content of isosorbide and diethylene glycol introduced therein, containing a low content of oligomer, and exhibiting a specific intrinsic viscosity, thereby exhibiting excellent mechanical properties, heat resistance and chemical resistance, and good heat sealability. 1. A polyester film comprising a resin layer formed from a polyester resin which has an alternating structure of an acid moiety derived from a dicarboxylic acid or a derivative thereof and a diol moiety derived from a diol , which contains 1 to 30 mol % of a diol moiety derived from isosorbide and 2 to 5 mol % of a diol moiety derived from diethylene glycol based on the total diol moieties derived from the diol , and which has an oligomer content with a molecular weight ranging from 500 to 1000 g/mol of 1.3% by weight or less based on the total weight of the resin ,wherein the polyester film is a polyester film biaxially drawn in the longitudinal and transverse directions, andwherein a haze measured according to ASTM D1003-97 is 2% or less when the thickness of the polyester film is 20 μm, and a haze variation after heat treatment of the polyester film at 150° C. for 1 hour (haze variation (%) haze (%) after heat treatment−haze (%) before heat treatment) is 2% or less.2. The polyester film of claim 1 , wherein the dicarboxylic acid or a derivative thereof includes terephthalic acid or a derivative thereof.3. The polyester film of claim 2 , wherein the dicarboxylic acid or a derivative thereof includes claim 2 , as the dicarboxylic acid or a derivative thereof other than terephthalic acid or a derivative thereof claim 2 , at least one selected from the group consisting of an aromatic dicarboxylic acid having 8 to 14 carbon atoms or a derivative thereof and an aliphatic dicarboxylic acid having 4 to 12 carbon atoms or a derivative thereof in an amount of ...

POLYESTER CONTAINER AND MANUFACTURING METHOD THEREFOR

The present invention relates to a polyester container. The polyester container is formed from a polyester resin containing a particular content of diol moieties derived from isosorbide and diethylene glycol, and thus can show high transparency in spite of a great wall thickness thereof. 1. A polyester container made of a polyester resin that is polymerized with a dicarboxylic acid including terephthalic acid or a derivative thereof and a diol including isosorbide and ethylene glycol , thereby having an alternating structure of an acid moiety derived from the dicarboxylic acid or a derivative thereof and a diol moiety derived from the diol ,wherein the polyester resin includes 6 to 12 mol % of a diol moiety derived from isosorbide and 2 to 5 mol % of a diol moiety derived from diethylene glycol based on the total diol moieties derived from the diol,wherein a melting point exists during the first scan through a differential scanning calorimetry (DSC), andwherein a haze is less than 3% as measured according to ASTM D1003-97 for a specimen having a thickness of 6 mm obtained from the polyester resin.2. The polyester container of wherein the polyester container is made of the polyester resin having a haze of 1.5% or less as measured according to ASTM D1003-97 for a specimen having a thickness of 6 mm obtained from the polyester resin.3. The polyester container of claim 1 , wherein the dicarboxylic acid or a derivative thereof is a dicarboxylic acid or a derivative thereof other than terephthalic acid or a derivative thereof claim 1 , which includes at least one selected from the group consisting of an aromatic dicarboxylic acid having 8 to 14 carbon atoms or a derivative thereof and an aliphatic dicarboxylic acid having 4 to 12 carbon atoms or a derivative thereof in an amount of 0 to 50 mol % based on the total dicarboxylic acids or derivatives thereof.4. The polyester container of claim 1 , wherein the polyester container is made of the polyester resin having a number ...

POLYESTER FIBER, PREPARATION METHOD THEREFOR, AND MOLDED ARTICLE FORMED THEREFROM

The present invention relates to a polyester fiber, a preparation method thereof and a molded article prepared therefrom. The polyester fiber comprises a diol moiety derived from isosorbide in a specific amount and is formed into a polyester resin having a specific oligomer content, thereby providing a molded article having excellent saline water resistance, chemical resistance, light resistance and good knot strength, and capable of maintaining high transparency. 1. A polyester fiber formed from a polyester resin polymerized with a dicarboxylic acid including terephthalic acid or a derivative thereof and a diol including isosorbide , thereby having an alternating structure of an acid moiety derived from the dicarboxylic acid or a derivative thereof and a diol moiety derived from the diol ,wherein the polyester resin includes 1 to 20 mol % of a diol moiety derived from isosorbide and 2 to 5 mol % of a diol moiety derived from diethylene glycol based on the total diol moieties derived from the diol, andwherein the polyester resin has an oligomer content of 1.3% by weight or less, and a haze of less than 3% as measured according to ASTM D1003-97 for a specimen having a thickness of 6 mm obtained from the polyester resin.2. The polyester fiber of claim 1 , wherein the haze is less than 2% as measured according to ASTM D1003-97 for a specimen having a thickness of 6 mm obtained from the polyester resin.3. The polyester fiber of claim 1 , wherein the polyester resin has a number average molecular weight of 12 claim 1 ,000 to 50 claim 1 ,000 g/mol.4. The polyester fiber of claim 1 , wherein the polyester resin has a weight average molecular weight of 45 claim 1 ,000 to 225 claim 1 ,000 g/mol.5. The polyester fiber of claim 1 , wherein the polyester resin has a molecular weight distribution of 2.5 to 4.5.6. The polyester fiber of claim 1 , wherein the polyester resin includes 5 to 12 mol % of a diol moiety derived from isosorbide and 2 to 5 mol % of a diol moiety derived ...

Polyarylene sulfide and a preparation method thereof

The present invention relates to a polyarylene sulfide having more improved miscibility with other polymer materials or fillers, and a method of preparing the same. At least part of end groups of the main chain of the polyarylene sulfide is carboxyl group (—COOH) or amine group (—NH 2 ).

POLYARYLENE SULFIDE RESIN COMPOSITION AND FORMED ARTICLE

The present invention relates to a polyarylene sulfide resin composition having good processability and showing excellent properties due to its more improved miscibility with other polymer materials or fillers, and a formed article. Such polyarylene sulfide resin composition includes a polyarylene sulfide including a disulfide repeating unit in the repeating units of the main chain; and at least one component selected from the group consisting of a thermoplastic resin, a thermoplastic elastomer, and a filler. 1. A polyarylene sulfide resin composition , including a polyarylene sulfide including a disulfide repeating unit in the repeating units of the main chain; and at least one component selected from the group consisting of a thermoplastic resin , a thermoplastic elastomer , and a filler.2. The polyarylene sulfide resin composition according to claim 1 , wherein the disulfide repeating unit is included in the amount of 3 weight % or less claim 1 , based on the whole polyarylene sulfide.3. The polyarylene sulfide resin composition according to claim 1 , wherein the polyarylene sulfide is prepared by melt-polymerizing a reactant including diiodoaromatic compounds and sulfur element while adding the polymerization inhibitor step by step claim 1 , dividedly into 2 times or more.4. The polyarylene sulfide resin composition according to claim 1 , wherein the polyarylene sulfide includes carboxyl group (—COOH) or amine group (—NH) bonded to at least part of end groups of the main chain.5. The polyarylene sulfide resin composition according to claim 4 , wherein the polyarylene sulfide shows the peak of 1600 to 1800 cmor 3300 to 3500 cm.6. The polyarylene sulfide resin composition according to claim 5 , wherein the relative height intensity of the peak of 1600 to 1800 cmor 3300 to 3500 cmis 0.001 to 10% claim 5 , when the height of the ring stretch peak shown at 1400 to 1600 cmis assumed as the intensity of 100% claim 5 , in the FT-IR spectrum of the polyarylene sulfide.7. ...

HEAT SHRINKABLE FILM COMPOSITION COMPRISING POLYETHYLENETEREPHTALATE RESIN AND POLYESTER BASED COPOLYMER, AND HEAT SHRINKABLE FILM

There is provided a composition for forming a heat shrinkable film capable of providing a heat shrinkable film capable of having an excellent shrinkage rate and being heat-shrunk at a low temperature. The composition for forming a heat shrinkable film includes a polyethylene terephthalate (PET) resin having an inherent viscosity of 0.50 to 1.2 dl/g, and a polyester based copolymer including a dicarboxylic acid-derived residue including a residue derived from an aromatic dicarboxylic acid and a diol-derived residue including a residue derived from 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexane carboxylate represented by the following Chemical Formula 1 and a residue derived from 4,4-(oxybis(methylene)bis) cyclohexane methanol represented by the following Chemical Formula 2. 1. (canceled)2. (canceled)3. (canceled)4. (canceled)5. (canceled)6. (canceled)7. (canceled)8. (canceled)9. (canceled)10. (canceled) The present invention relates to a composition for forming a heat shrinkable film including a polyethylene terephthalate resin and a polyester based copolymer, and more particularly, to a composition for forming a heat shrinkable film capable of providing a heat shrinkable film capable of having an excellent shrinkage rate and being heat-shrunk at a low temperature.A heat shrinkable plastic product uses a property of being shrunk by heating and is widely used as a film for a shrinkage package, a shrinkage label, or the like. Among them, polyvinyl chloride (PVC), polystyrene, and polyester based plastic films, and the like, have been used as a label or cap seal of various containers, or the like, or used as a direct package material, or the like.However, a film made of polyvinyl chloride is a regulation object since at the time of burning up the film, materials generating hydrogen chloride gas and dioxin may be generated. In addition, when this product is used as a shrinkage label of a polyethylene terephthalate (PET) container, or the like, at the ...

THERMO-SHRINKABLE POLYESTER FILM

This disclosure relates to a thermo-shrinkable polyester film with excellent UV absorbance and heat resistance. According to one embodiment of the invention, provided is a thermo-shrinkable polyester film comprising a first resin layer comprising polyester resin comprising residues of dicarboxylic acid components comprising aromatic dicarboxylic acid, and residues of diol components comprising 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexanecarboxylate, and 4,4-(oxybis(methylene)bis)cyclohexane methanol; and a second resin layer comprising the polyester resin and a UV absorber, formed on at least one side of the first layer. 1. A thermo-shrinkable polyester film comprisinga first resin layer comprising polyester resin comprising residues of dicarboxylic acid components comprising aromatic dicarboxylic acid, and residues of diol components comprising 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexanecarboxylate, and 4,4-(oxybis(methylene)bis)cyclohexane methanol; anda second resin layer comprising the polyester resin and a UV absorber, formed on at least one side of the first layer.2. The thermo-shrinkable polyester film according to claim 1 , wherein the contents of 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexanecarboxylate claim 1 , and 4 claim 1 ,4-(oxybis(methylene)bis)cyclohexane methanol are respectively 0.1 to 20 mol % claim 1 , based on 100 mol % of the dicarboxylic acid component.3. The thermo-shrinkable polyester film according to claim 1 , wherein the residues of diol components further comprise residues of at least one compound selected from the group consisting of 1 claim 1 ,4-cyclohexanedimethanol claim 1 , diethyleneglycol and ethyleneglycol.4. The thermo-shrinkable polyester film according to claim 3 , wherein based on 100 mol % of the dicarboxylic acid component claim 3 , the content of 1 claim 3 ,4-cyclohexanedimethanol is 0.1 to 15 mol % claim 3 , the content of diethyleneglycol is 1 to 20 mol % claim 3 , ...

METHOD FOR MANUFACTURING SILICON NITRIDE THIN FILM USING PLASMA ATOMIC LAYER DEPOSITION METHOD

The present invention relates to a method for manufacturing a silicon nitride thin film using a plasma atomic layer deposition method and, more particularly, the purpose of the present invention is to provide a method for manufacturing a silicon nitride thin film including a high quality Si—N bond under the condition of lower power and film-forming temperature, by applying an aminosilane derivative having a specific Si—N bond to a plasma atomic layer deposition method. 1. A manufacturing method of a silicon nitride thin film by plasma enhanced atomic layer deposition (PEALD) , the manufacturing method comprising:adsorbing an aminosilane derivative or a silazane derivative on a substrate; andgenerating plasma while injecting reaction gas to the substrate, thereby forming an atomic layer of a Si—N bond,{'sub': p1', 'D, 'claim-text': [{'br': None, 'sub': 'p1', '50 W≤P≤300 W, and'}, {'br': None, 'sup': 2', '2, 'sub': 'D', '1.0 Wsec/cm≤P≤4.0 Wsec/cm.'}], 'wherein power (P) and a dosage (P) of the plasma satisfy the following conditions2. The manufacturing method of claim 1 , wherein the plasma is irradiated for 1 to 20 seconds.3. The manufacturing method of claim 2 , wherein the power (P) in a range of 75 to 150 W claim 2 , and the dosage in a range of 2 to 3.5 Wsec/cmof the plasma are satisfied.4. The manufacturing method of claim 2 , wherein pressure when forming the atomic layer is 0.1 to 100 torr.5. The manufacturing method of claim 1 , wherein temperature of the substrate is 200 to 450° C.8. The manufacturing method of claim 1 , wherein the reaction gas is nitrogen (N) gas claim 1 , hydrogen (H) gas claim 1 , ammonia (NH) gas claim 1 , hydrazine (NH) gas claim 1 , or mixed gas thereof.9. The manufacturing method of claim 1 , wherein the silicon nitride thin film has resistance to hydrogen fluoride (300:1 BOE solution) in a range of 0.01 to 0.20 Å/sec.10. The manufacturing method of claim 1 , wherein the silicon nitride thin film has a carbon content of 0.1 atom % or ...

STACKING DEVICE FOR SECONDARY BATTERY, STACKING METHOD USING SAME, AND SECONDARY BATTERY OBTAINED THEREBY

Various embodiments of the present invention provide a stacking device for a secondary battery configured to stack electrode plates at a high rate, a stacking method using the same, and a secondary battery obtained thereby. As an example, disclosed are a stacking device for a secondary battery, a stacking method using the same, and a secondary battery obtained thereby, the stacking device comprising: a first electrode plate bonded body supply portion for supplying a first electrode plate bonded body comprising a first electrode plate, which comprises a first electrode first coating portion and a first electrode second coating portion positioned to be spaced apart from the first electrode first coating portion, and separators stacked on both surfaces of the first electrode plate; a second electrode plate supply portion for arranging a second electrode first coating portion and a second electrode second coating portion of a second electrode on both surfaces of the first electrode first coating portion of the first electrode plate bonded body, respectively, thereby forming a unit cell; and a folding portion for folding the first electrode plate bonded body, which has the unit cell formed thereon, such that the second electrode first coating portion or the second electrode second coating portion of the second electrode plate faces the first electrode second coating portion of the first electrode plate, thereby forming a stack. 1. A stacking device for a secondary battery , the stacking device comprising:a first electrode plate bonded body supply portion for supplying a first electrode plate bonded body comprising a first electrode plate, which comprises a first electrode first coating portion and a first electrode second coating portion positioned to be spaced apart from the first electrode first coating portion, and separators stacked on both surfaces of the first electrode plate;a second electrode plate supply portion for arranging a second electrode first coating ...

METHOD FOR PREPARING POLYARYLENE SULFIDE HAVING REDUCED IODINE CONTENT

This disclosure relates to a method for preparing polyarylene sulfide having reduced iodine content while having excellent thermal stability, specifically to a method comprising polymerization reacting a composition comprising diiodide aromatic compounds, sulfur compounds, and a polymerization terminator. The preparation method may effectively reduce iodine content of polyarylene sulfide to prevent corrosion of post processing equipment, improve properties of polyarylene sulfide such as thermal stability, and the like, and thus, it may be usefully applied in the industrial field relating to preparation of polyarylene sulfide. 117-. (canceled)191. The polyarylene sulfide according to claim , wherein the polyarylene sulfide has iodine content of 10 ,000 ppm or less.201. The polyarylene sulfide according to claim , wherein the polyarylene sulfide has a melting point of 265 to 320° C.211. The polyarylene sulfide according to claim , wherein the polyarylene sulfide has a melt viscosity of 20 to 40 ,000 Poise. This application is a divisional application of 13/576,229, filed on Jul. 31, 2012; which application is a nationalization under 35 U.S.C. §371 of PCT/KR2011/000667 filed Jan. 31, 2011 and published as WO2011/093685 A2 on Aug. 4, 2011, which application claims priority to and the benefit of Korean Patent Application No. 10-2010-0009115, filed Feb. 1, 2010, which applications and publication are incorporated herein by reference in their entirety.This disclosure relates to a method for preparing polyarylene sulfide, more specifically to a method for preparing polyarylene sulfide having reduced iodine content while having improved properties.Currently, polyarylene sulfide is representative engineering plastic, and is in great demand for high temperature and corrosive environment and electronic products due to high heat resistance, chemical resistance, flame resistance, and electric insulation. The major uses include computer accessories, automobile accessories, coating ...

METHOD FOR MANUFACTURING SILICON NITRIDE THIN FILM USING PLASMA ATOMIC LAYER DEPOSITION

The present invention relates to a method for manufacturing a high-purity silicon nitride thin film using plasma atomic layer deposition. More specifically, the present invention can realize improved thin film efficiency and a step coverage by performing a two-stage plasma excitation step and can provide a high-purity silicon nitride thin film with an improved deposition rate despite a low film-forming temperature. 1. A method for manufacturing a silicon nitride thin film using plasma atomic layer deposition by performing a unit cycle at least once comprising:adsorbing an organic silicon precursor including a silicon-nitrogen bond on a substrate; andexciting a first plasma while injecting a first reaction gas and then exciting a second plasma while injecting a second reaction gas to provide one or more reactive sites.2. The method of claim 1 , wherein the first reaction gas is a mixture of a nitrogen gas and a hydrogenation gas.3. The method of claim 2 , wherein the hydrogenation gas is selected from the group consisting of hydrogen claim 2 , ammonia claim 2 , and hydrazine.4. The method of claim 3 , wherein the first reaction gas is a mixture of the nitrogen gas and the hydrogenation gas at a flow ratio of 300:1 to 1:1.5. The method of claim 1 , wherein the second reaction gas is a nitrogen gas.6. The method of claim 1 , wherein the first plasma and the second plasma are excited with a power of 500 W or less.7. The method of claim 6 , wherein a temperature of the substrate ranges from 50° C. to 400° C.10. The method of claim 1 , wherein the silicon nitride thin film has an oxygen element content of 10 atom % or less.11. The method of claim 10 , wherein the silicon nitride thin film has a silicon-nitrogen/silicon-hydrogen area ratio (Si—N/Si—H) of 90 or more.12. A silicon nitride thin film in which an oxygen element content is 10 atom % or less and a silicon-nitrogen/silicon-hydrogen area ratio (Si—N/Si—H) is 90 or more.13. The silicon nitride thin film of claim 12 ...

HEAT SHRINKABLE FILM COMPOSITION COMPRISING POLYETHYLENETEREPHTALATE RESIN AND COPOLYMER POLYESTER RESIN, AND HEAT SHRINKABLE FILM

There is provided a composition for forming a heat shrinkable film capable of providing a heat shrinkable film capable of having an excellent shrinkage rate and being heat-shrunk at a low temperature. The composition for forming a heat shrinkable film includes a polyethylene terephthalate (PET) resin having an inherent viscosity of 0.50 to 1.2 dl/g, and a polyester based copolymer including a dicarboxylic acid-derived residue including a residue derived from an aromatic dicarboxylic acid and a diol-derived residue including a residue derived from 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexane carboxylate represented by the following Chemical Formula 1 and a residue derived from 4,4-(oxybis(methylene)bis) cyclohexane methanol represented by the following Chemical Formula 2. 1. (canceled)2. (canceled)3. (canceled)4. (canceled)5. (canceled)6. (canceled)7. (canceled)8. (canceled)9. (canceled)10. (canceled)11. (canceled)12. (canceled) The present invention relates to a composition for forming a heat shrinkable film including a polyethylene terephthalate resin and a polyester based copolymer, and more particularly, to a composition for forming a heat shrinkable film capable of providing a heat shrinkable film capable of having an excellent shrinkage rate and being heat-shrunk at a low temperature.A heat shrinkable plastic product uses a property of being shrunk by heating and is widely used as a film for a shrinkage package, a shrinkage label, or the like. Among them, polyvinyl chloride (PVC), polystyrene, and polyester based plastic films, and the like, have been used as a label or cap seal of various containers, or the like, or used as a direct package material, or the like.However, a film made of polyvinyl chloride is a regulation object since at the time of burning up the film, materials generating hydrogen chloride gas and dioxin may be generated. In addition, when this product is used as a shrinkage label of a polyethylene terephthalate (PET) ...

POLYESTER RESIN COMPOSITION AND PREPARATION METHOD THEREOF

The present invention relates to a polyester resin composition capable of having an excellent shrinkage rate, being heat-shrunk at a low temperature, and improving adhesion properties, without impairing insulation properties in a state of heat-shrinkable films, and a method for preparing the same. The present polyester resin composition comprises: a copolymerized polyester resin including a dicarboxylic acid-derived residue including a residue derived from an aromatic dicarboxylic acid; and a diol-derived residue including a residue derived from 4-(hydroxymethyl)cyclohexyl methyl 4′-(hydroxymethyl)cyclohexane carboxylate, and a residue derived from 4,4-(oxybis(methylene)bis) cyclohexane methanol, an alkali metal compound, and an alkaline earth metal compound, wherein the alkali metal compound and the alkaline earth metal compound are contained in an amount that the content ratio of the alkali metal element/the alkaline earth metal element derived therefrom is 0.01 to 1. 2. The polyester resin composition according to wherein the alkali metal compound includes one or more alkaline metal elements selected from the group consisting of lithium claim 1 , sodium and potassium.3. The polyester resin composition according to wherein the alkaline earth metal compound includes one or more alkaline earth metal elements selected from the group consisting of magnesium claim 1 , calcium claim 1 , strontium and barium.4. The polyester resin composition according to wherein the alkali metal compound or the alkaline earth metal compound includes an alkali metal element or an alkaline earth metal element claim 1 , and is a compound in the form of acetates claim 1 , aliphatic carboxylates claim 1 , carbonates or alkoxides.5. The polyester resin composition according to wherein the alkali metal compound is contained in an amount that the content of the alkali metal element derived therefrom is 5 to 500 ppm claim 1 , and the alkaline earth metal compound is contained in an amount that ...

HEAT SHRINKABLE FILM COMPRISING POLYESTER BASED COPOLYMER

There is provided a heat shrinkable film comprising a polyester based copolymer capable of having an excellent shrinkage rate and being heat shrunk at a low temperature. The heat shrinkable film according to an exemplary embodiment of the present invention includes a polyester based copolymer, wherein the polyester based copolymer includes: a dicarboxylic acid-derived residue including a residue derived from an aromatic dicarboxylic acid; and a diol-derived residue including a residue derived from 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexane carboxylate represented by the following Chemical Formula 1 and a residue derived from 4,4-(oxybis(methylene)bis) cyclohexane methanol represented by the following Chemical 2. The heat shrinkable film of claim 1 , wherein the diol-derived residue further includes residues derived from 1 claim 1 ,4-cyclohexane dimethanol claim 1 , diethylene glycol claim 1 , and ethylene glycol.3. The heat shrinkable film of claim 1 , wherein the aromatic dicarboxylic acid is one or more selected from a group consisting of terephthalic acid claim 1 , dimethyl terephthalate claim 1 , cyclic dicarboxylic acid claim 1 , isophthalic acid claim 1 , adipic acid claim 1 , azelaic acid claim 1 , naphthalenedicarboxylic acid claim 1 , and succinic acid.4. The heat shrinkable film of claim 1 , having a shrinkage initiation temperature of 65° C. or less and a maximum heat shrinkage rate of 25% or more at 65° C.5. The heat shrinkable film of claim 1 , having a maximum heat shrinkage rate of 75% or more at 95° C. This application is a divisional of U.S. patent application Ser. No. 14/898,566 filed Dec. 15, 2015, which is a national stage application under 35 U.S.C. 371 and claims the benefit of PCT Application No. PCT/KR2014/005623 having an international filing date of Jun. 16, 2014, which designated the United States, which PCT application claimed the benefit of Korean Patent Application No. 10-2013-0069129 filed Jun. 17, 2013, the ...

HINGE DEVICE AND DISPLAY APPARATUS WITH A HINGE DEVICE USING A SLIDING POSITION

A display apparatus which enables a display to rotate with a tilting angle across a large range is provided. This allows a user to, conveniently use the display apparatus in order to enable quality of use to be improved during a tilting operation, and slim and elegant appearance to be implemented. The display apparatus includes a display configured to display an image on the front surface, a stand supporting the display, and a hinge device connecting the display to the stand such that the display may be tilted, wherein the hinge device includes a guide member formed on a rear surface of the display, a latch fixed to the stand and to slide along the guide member when the display is tilted, and a fixing member fixing the display not to move when an external force applied to the display is removed. 1. A display apparatus , comprisinga display configured to display an image on a front surface thereof;a rear cover to cover a rear surface of the display;a stand configured to support the display; anda hinge device includes a curved guide member formed on the rear surface of the display, a latch connected to a fixing bracket and configured to slide along the curved guide member when the display is tilted, the fixing bracket fixed to the stand, and a fixing member configured to fix the display such that the display is not moved when an external force applied to the display is removed,wherein the fixing member is configured as a leaf spring including one end fixed to the rear surface of the display, and the other end formed at a free end.2. The touch-screen display apparatus according to claim 1 ,wherein both the curved guide member and the fixing member are accommodated within an inner space between the display and the rear cover to prevent the curved guide member and the fixing member from being externally exposed so that the display has a lower portion having a thickness greater than that of an upper portion of the display.3. The touch-screen display apparatus according to ...

POLYESTER BASED COPOLYMER RESIN AND MOLDED PRODUCT COMPRISING THE SAME

There are provided a polyester based copolymer resin capable of having an excellent shrinkage rate and being heat-shrunk at a low temperature, and a molded product comprising the same. The polyester based copolymer resin includes a dicarboxylic acid-derived residue including a residue derived from an aromatic dicarboxylic acid; and a diol-derived residue including a predetermined residue derived from 4-(hydroxymethyl)cyclohexylmethyl 4′-(hydroxymethyl)cyclohexane carboxylate and a predetermined residue derived from 4,4-(oxybis(methylene)bis) cyclohexane methanol. 2. The polyester based copolymer resin of claim 1 , wherein the aromatic dicarboxylic acid is one or more selected from the group consisting of terephthalic acid claim 1 , dimethyl terephthalate claim 1 , cycloaliphatic dicarboxylic acid claim 1 , isophthalic acid claim 1 , adipic acid claim 1 , azelaic acid claim 1 , naphthalenedicarboxylic acid claim 1 , and succinic acid.4. The molded product of claim 3 , wherein the molded product is a heat shrinkable film.5. The molded product of claim 4 , wherein a shrinkage initiation temperature of the heat shrinkable film is 60° C. or less claim 4 , and the maximum heat shrinkage rate thereof at 60° C. is 4% or more.6. The molded product of claim 4 , wherein the maximum heat shrinkage rate of the heat shrinkable film at 90° C. is 80% or more. This application is a divisional application of U.S. patent application Ser. No. 14/888,649 filed Nov. 2, 2015, which is a national stage application under 35 U.S.C. § 371 and claims the benefit of PCT Application No. PCT/KR2014/003820 having an international filing date of Apr. 30, 2014, which designated the United States, which PCT application claimed the benefit of Korean Patent Application No. 10-2013-0049543 filed May 2, 2013. The disclosures of all of the above-referenced applications are incorporated herein by reference.The present invention relates to a polyester based copolymer resin and a molded product comprising ...

POLYARYLENE SULFIDE AND A PREPARATION METHOD THEREOF

[SUMMARY] 1. A polyarylene sulfide comprising carboxyl group (—COOH) or amine group (—NH) , iodo group and aryl group , as an end group of the main chain of the polyarylene sulfide.2. The polyarylene sulfide according to claim 1 , showing the peak of 1600 to 1800 cmor 3300 to 3500 cm claim 1 , in a FT-IR spectrum.3. The polyarylene sulfide according to claim 2 , wherein the relative height intensity of the peak of 1600 to 1800 cmor 3300 to 3500 cmis 0.001 to 10% claim 2 , when the height of the ring stretch peak shown at 1400 to 1600 cmis assumed as the intensity of 100% claim 2 , in the FT-IR spectrum.4. The polyarylene sulfide according to claim 1 , wherein the melting temperature is 265 to 290° C.5. The polyarylene sulfide according to claim 1 , wherein the number average molecular weight is 5 claim 1 ,000 to 50 claim 1 ,000.6. The polyarylene sulfide according to claim 1 , wherein the melt viscosity measured with a rotational viscometer at 300° C. is 10 to 50 claim 1 ,000 poise.7. The polyarylene sulfide according to claim 1 , wherein the tensile strength measured according to ASTM D 638 is 100 to 900 kgf/cm.8. The polyarylene sulfide according to claim 1 , wherein the elongation measured according to ASTM D 638 is 1 to 10%.9. The polyarylene sulfide according to claim 1 , wherein the flexural strength measured according to ASTM D 790 is 100 to 2 claim 1 ,000 kgf/cm.10. The polyarylene sulfide according to claim 1 , wherein the impact strength measured according to ASTM D 256 is 1 to 100 J/m.1119-. (canceled)20. The polyarylene sulfide according to claim 1 , the polyarylene sulfide does not comprise halogen group other than the iodo group claim 1 , as the end group of the main chain.21. The polyarylene sulfide according to claim 1 , the aryl group claim 1 , as the end group of the main chain claim 1 , is an unsubstituted aryl group.22. The polyarylene sulfide according to claim 22 , the unsubstituted aryl group claim 22 , as the end group of the main chain claim ...

POLYARYLENE SULFIDE RESIN AND PREPARATION METHOD THEREOF

The present invention relates to a polyarylene sulfide which has more improved compatibility with other polymer materials or fillers, and a method for preparing the same. The polyarylene sulfide is characterized in that at least part of end groups of the main chain of the polyarylene sulfide is hydroxyl group (—OH), the polyarylene sulfide contains iodine bonded to its main chain and free iodine, and the content of iodine bonded to the main chain and free iodine is 10 to 10,000 ppmw. 1. A polyarylene sulfide in which at least part of end groups of the main chain of the polyarylene sulfide is hydroxyl group (—OH) , wherein the polyarylene sulfide contains iodine bonded to its main chain and free iodine , and the content of iodine bonded to the main chain and free iodine is 10 to 10 ,000 ppmw.2. The polyarylene sulfide according to claim 1 , wherein the content of iodine bonded to the main chain and free iodine is 10 to 3000 ppmw.3. The polyarylene sulfide according to claim 1 , showing a peak in the range of 3300 to 3600 cm claim 1 , in a FT-IR spectrum.4. The polyarylene sulfide according to claim 3 , wherein the relative height intensity of the peak in the range of 3300 to 3600 cmis 0.01 to 3% claim 3 , when the height of the ring stretch peak shown in the range of 1400 to 1600 cmwas assumed as the intensity of 100% claim 3 , in the FT-IR spectrum.5. The polyarylene sulfide according to claim 1 , wherein the melting temperature is 265 to 290° C.6. The polyarylene sulfide according to claim 1 , wherein the number average molecular weight is 5 claim 1 ,000 to 50 claim 1 ,000.7. The polyarylene sulfide according to claim 1 , wherein the melt viscosity measured with a rotating disk viscometer at 300° C. is 10 to 50 claim 1 ,000 poise.8. The polyarylene sulfide according to claim 1 , wherein the tensile strength measured according to ASTM D 638 is 100 to 900 kgf/cm.9. The polyarylene sulfide according to claim 1 , wherein the elongation measured according to ASTM D 638 ...

METHOD FOR PREPARING POLYARYLENE SULFIDE WITH REDUCED FREE IODINE CONTENT

The present invention relates to a method for preparing polyarylene sulfide with a reduced free iodine content. More specifically, the method for preparing polyarylene sulfide includes: (a) polymerizing reactants including a diiodo aromatic compound and a sulfur compound to form a polyarylene sulfide; and (b) maintaining the polyarylene sulfide product at 100 to 260° C. for heat-setting. The preparation method of the present invention effectively reduces the free iodine content of the polyarylene sulfide to prevent potential corrosion of facilities for the subsequent process and improves the properties of the polyarylene sulfide product such as thermal stability, so the method can be usefully applied to industrial fields in regard to the preparation of polyarylene sulfide. 115.-. (canceled)16. A heat-set polyarylene sulfide having a melting temperature of 265 to 320° C. and a free iodine content of at most 20 ppm ,wherein the heat-set polyarylene sulfide is prepared by a method comprising:(a) polymerizing reactants including a diiodo aromatic compound, a polymerization inhibitor, and a sulfur compound at an initial temperature of 180° C. to 250° C. and at a final temperature of 270° C. to 350° C. to form a polyarylene sulfide product; and (b) maintaining the polyarylene sulfide product at 150° C. to 230° C. for heat-setting for 0.5 to 100 hours to give the heat-set polyarylene sulfide;wherein the heat-set polyarylene sulfide has a melting temperature variation of less than 5% before and after the heat-setting step (b), andthe polymerization inhibitor is at least one of N-cyclohexylbenzothiazole-2-sulfenamide, N,N-dicyclohexyl-2-benzothiazole sulfenamide, tetramethylthiuram mono sulfide, tetramethylthiuram disulfide, zinc dimethyldithiocarbamate, and zinc diethyldithiocarbamate.17. The heat-set polyarylene sulfide as claimed in claim 16 , wherein the polyarylene sulfide has a free iodine content of at most 10 ppm.18. The heat-set polyarylene sulfide as claimed in ...

MDO THERMORESISTANT HEAT-SHRINKABLE MULTILAYER FILM

The present invention relates to an MDO thermoresistant heat-shrinkable multilayer film of a copolymer polyester having excellent thermal resistance. In particular, the present invention provides an MDO thermoresistant heat-shrinkable multilayer film that includes multiple skin layers capable of improving thermal resistance formed on a substrate layer capable of providing high shrinkage, and simultaneously has excellent thermal resistance and high shrinkage properties through MD orientation instead of the conventional TD orientation method.

POLYARYLENE SULFIDE RESIN COMPOSITION AND MOLDED ARTICLE

The present invention relates to a polyarylene sulfide resin composition which has excellent processability and exhibit excellent physical properties due to its more improved compatibility with other polymer materials or fillers, and a molded article including the same. Such polyarylene sulfide resin composition comprises: a polyarylene sulfide including a disulfide repeating unit in the repeating units of the main chain, wherein at least part of end groups of the main chain is hydroxyl group (—OH); and one or more components selected from the group consisting of a thermoplastic resin, a thermoplastic elastomer and a filler. 1. A polyarylene sulfide resin composition comprising:a polyarylene sulfide including a disulfide repeating unit in the repeating units of the main chain, wherein at least part of end groups of the main chain is hydroxyl group (—OH); andone or more components selected from the group consisting of a thermoplastic resin, a thermoplastic elastomer and a filler.2. The polyarylene sulfide resin composition according to claim 1 , wherein the disulfide repeating unit is included in an amount of 3 wt. % or less based on the entire polyarylene sulfide.3. The polyarylene sulfide resin composition according to claim 1 , wherein the polyarylene sulfide contains iodine bonded to the main chain and free iodine claim 1 , and the content of the iodine bonded to the main chain and free iodine is 10 to 10 claim 1 ,000 ppmw.4. The polyarylene sulfide resin composition according to claim 1 , showing a peak in the range of 3300 to 3600 cm claim 1 , in a FT-IR spectrum.5. The polyarylene sulfide resin composition according to claim 4 , wherein the relative height intensity of the peak in the range of 3300 to 3600 cmis 0.01 to 3% claim 4 , when the height of the ring stretch peak shown in the range of 1400 to 1600 cmwas assumed as the intensity of 100% claim 4 , in the FT-IR spectrum of the polyarylene sulfide.6. The polyarylene sulfide resin composition according to ...

COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM AND METHOD FOR PRODUCING SILICON-CONTAINING THIN FILM USING THE SAME

Provided are a composition for depositing a silicon-containing thin film containing a trisilylamine compound and a method for producing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film containing a trisilylamine compound which is capable of forming a silicon-containing thin film at a very high deposition rate at a low temperature to be usable as a precursor of a silicon-containing thin film and an encapsulant of a display, and a method for producing a silicon-containing thin film by using the same. 2. The composition of claim 1 , wherein the composition is used for low temperature deposition in which a temperature of a substrate to be deposited is less than 100° C.4. The method of claim 3 , wherein a temperature of the substrate to be deposited is less than 100° C.5. The method of claim 4 , wherein the temperature of the substrate to be deposited is 95° C. or less.6. The method of claim 4 , wherein the silicon-containing thin film is a silicon nitride film claim 4 , and a deposition rate of the silicon-containing thin film is 8 Å/min or more.7. The method of claim 4 , wherein the silicon-containing thin film is a silicon oxide film claim 4 , and a deposition rate of the silicon-containing thin film is 70 Å/min or more.8. The method of claim 3 , wherein before claim 3 , during claim 3 , and/or after the supplying of the trisilylamine compound claim 3 , any one or two or more gases are supplied claim 3 , the gases being selected from oxygen (O) claim 3 , ozone (O) claim 3 , distilled water (HO) claim 3 , hydrogen peroxide (HO) claim 3 , nitrogen monoxide (NO) claim 3 , nitrous oxide (NO) claim 3 , nitrogen dioxide (NO) claim 3 , ammonia (NH) claim 3 , nitrogen (N) claim 3 , hydrazine (NH) claim 3 , hydrazine derivatives claim 3 , diamines claim 3 , carbon monoxide (CO) claim 3 , carbon dioxide (CO) claim 3 , C1-C12 saturated or unsaturated hydrocarbons claim 3 , hydrogen claim 3 , argon ...

SILYLAMINE COMPOUND, COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING THE SAME, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE COMPOSITION

Provided are a silylamine compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition, and more particularly, to a silylamine compound capable of being usefully used as a precursor of a silicon-containing thin film, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition. 2. The silylamine compound of claim 1 , wherein in Chemical Formula 1 claim 1 , Rto Rare each independently C1-C5alkyl or C2-C5alkenyl.4. The silylamine compound of claim 3 , wherein in Chemical Formula 2 or 3 claim 3 , RRare each independently C1-C3alkyl or C2-C3alkenyl; andn and m are each independently an integer of 1 to 4.6. A composition for depositing a silicon-containing thin film claim 1 , the composition comprising the silylamine compound of any one of .7. A method for manufacturing a silicon-containing thin film claim 6 , using the composition for depositing a silicon-containing thin film of .8. The method of claim 7 , wherein deposition is performed by an atomic layer deposition method claim 7 , a chemical vapor deposition method claim 7 , a metal-organic chemical vapor deposition method claim 7 , a low-pressure chemical vapor deposition method claim 7 , a plasma-enhanced chemical vapor deposition method claim 7 , or a plasma-enhanced atomic layer deposition method.9. The method of claim 7 , wherein the silicon-containing thin film is a silicon oxide film claim 7 , a silicon oxy carbide film claim 7 , a silicon nitride film claim 7 , a silicon oxy nitride film claim 7 , a silicon carbonitride film claim 7 , or a silicon carbide film.10. The method of claim 7 , comprising:a) maintaining a temperature of a substrate mounted in a chamber at 30 to 500° C.;{'claim-ref': {'@idref': 'CLM-00006', 'claim 6'}, 'b) contacting the composition of with the substrate to adsorb the ...

Recyclable polyarylene sulfide and preparation method thereof

Novel oligonucleotide conjugates and use thereof

【課題】疾病、特に、ガンの治療に有効に使用されることができる二本鎖オリゴＲＮＡの伝達を向上させる高分子化合物を共有結合で結合した二本鎖オリゴＲＮＡ構造体に標的特異的リガンドが結合した二本鎖オリゴＲＮＡ構造体およびその製造方法と、前記構造による標的特異的二本鎖オリゴＲＮＡ伝達技術の提供。 【解決手段】式（１）で表される構造を有するリガンドが結合した治療薬物−高分子構造体。 （Ａは親水性物質；Ｂは、疎水性物質；ＸとＹは夫々独立に単純共有結合又はリンカー媒介の共有結合；Ｒは治療用薬物；Ｌは受容体を介したエンドサイトーシスにより標的細胞内在化を増進させる受容体と特異的に結合する特性を有するリガンド）前記治療用薬物は、二本鎖オリゴＲＮＡ又は、抗癌剤であるリガンドが結合した治療薬物−高分子構造体。 【選択図】図１

Multi-layer polyester sheet and molded product thereof

Display device usable outdoors

A display device usable outdoors includes a display part to form a picture thereon, a housing to accommodate the display part and having an opening through which the display part is mounted, a protecting member installed in the opening part of the housing to protect the display part, a heat exchanger mounted within the housing to cool down an inside of the housing, and a non-reflecting coating part disposed on the protecting member to prevent a drop in brightness of the display part due to solar light. Accordingly, the display device usable outdoors prevents a drop in the brightness and a rise in temperature of the display part.

Novel amino-silyl amine compound, method for perparing the 'same and silicon-containing thin-film using the same

Provided are a novel amino-silyl amine compound, a method for preparing the same, and a silicon-containing thin-film using the same, wherein the amino-silyl amine compound has thermal stability and high volatility and is maintained in a liquid state at room temperature and under a pressure where handling is easy to thereby form a silicon-containing thin-film haying high purity and excellent physical and electrical properties by various deposition methods.

Method for preparing polyarylene sulfide

Developing cartridge, and electrophotographic image forming apparatus using same

Disclosed is a development cartridge attachable/detachable to/from a main body of an image forming apparatus. The development cartridge includes a photosensitive drum configured to form an electrostatic latent image thereon, a developer roller configured to develop the electrostatic latent image by supplying a developer to the photosensitive drum, a housing configured to support the photosensitive drum and the developer roller, a developer roller gear provided on a rotation shaft of the developer roller and connected to a driving gear of the main body when the development cartridge is attached to the main body, and a driven coupler provided at an end of the photosensitive drum and connected to a driving coupler located coaxially with the driving gear in the main body, based on a shaft connection method when the development cartridge is attached to the main body.

Poly(arylene sulfide) resin and method for preparing the same

Un poli(sulfuro de arileno) en el que al menos parte de los grupos terminales de la cadena principal del poli(sulfuro de arileno) es un grupo hidroxilo (-OH), en el que el poli(sulfuro de arileno) contiene yodo enlazado a su cadena principal y yodo libre, y el contenido de yodo enlazado a la cadena principal y de yodo libre es 10 a 10.000 ppmw, y en el que el poli(sulfuro de arileno) muestra un pico en el intervalo de 3300 a 3600 cm-1, en un espectro FT-IR, y la intensidad de la altura relativa del pico en el intervalo de 3300 a 3600 cm-1 es 0,01 a 3%, cuando la altura del pico de estiramiento del anillo mostrado en el intervalo de 1400 a 1600 cm-1 se asumió como la intensidad del 100%, en el espectro FT-IR. A poly(arylene sulfide) in which at least part of the terminal groups of the main chain of the poly(arylene sulfide) is a hydroxyl group (-OH), in which the poly(arylene sulfide) contains bound iodine to its main chain and free iodine, and the content of main chain-bound iodine and free iodine is 10 to 10,000 ppmw, and in which poly(arylene sulfide) shows a peak in the range of 3300 to 3600 cm -1, in an FT-IR spectrum, and the intensity of the relative height of the peak in the range of 3300 to 3600 cm-1 is 0.01 to 3%, when the height of the peak of ring stretching shown in the range 1400 to 1600 cm-1 was assumed to be 100% intensity, in the FT-IR spectrum.

Method for preparing polyarylene sulfide

Image Forming Apparatus and Frame Unit Thereof

Multilayer polyester sheet and molded product made of the same

The present invention relates to a multi-layer polyester sheet and a molded product thereof, the multi-layer polyester sheet comprising: a base layer comprising a thermoplastic resin; and a coating layer which is formed on at least one surface of the base layer and contains a polyester resin comprising a residue of a dicarboxylic acid component and a residue of a diol component comprising 51 mole% to 85 mole% isosorbide.

Projection optical system, projection television, and method of manufacturing lens included in projection optical system

Provided are a projection optical system, a projection television, and a method of manufacturing a lens included in the projection optical system. The projection optical system includes lenses for projecting color beams onto a screen. A color filter layer, absorbing at least one of the color beams, is coated on the surface of at least one of the lenses.

Extrusion-moldable polyester copolymer

Rear projector

A rear projector that can be made slim and compact and can prevent image reversal. The rear projector includes a cathode ray tube to scan light and generate an image, a projection lens unit to magnify and project the image generated by the cathode ray tube, a screen on which the projected image is formed, and a reflection optical system interposed between the projection lens unit and the screen to change a path of projected light. The cathode ray tube and the reflection optical system are arranged such that a raster direction of the cathode ray tube and a direction along which the image is formed on the screen are parallel or substantially parallel to each other.

Projection TV

A projection TV is provided comprising a reflective mirror including an ultra-thin glass substrate having enhanced strength, a reflective layer formed on a surface of the glass substrate to reflect an image, and a protective layer applied to an upper surface of the reflective layer to prevent the reflective layer from being damaged. The reflective mirror minimizes the occurrences of a double image, and a focus characteristic and contrast are enhanced, thereby improving the image quality. In addition, it is possible to make the product lightweight and thus, reduce transportation charges and other manufacturing costs.

Composition of poly (arylene sulfide) resin and formed article

Composición de resina de poli(sulfuro de arileno), que incluye un poli(sulfuro de arileno) que incluye una unidad repetitiva de disulfuro en las unidades repetitivas de la cadena principal; y por lo menos un componente seleccionado de entre el grupo que consiste en una resina termoplástica, un elastómero termoplástico y un relleno, en la que el poli(sulfuro de arileno) incluye un grupo carboxilo (-COOH) o grupo amina (-NH2) enlazado a por lo menos parte de los grupos terminales de la cadena principal. Poly (arylene sulfide) resin composition, which includes a poly (arylene sulfide) that includes a repeating disulfide unit in the repeating main chain units; and at least one component selected from the group consisting of a thermoplastic resin, a thermoplastic elastomer, and a filler, wherein the poly (arylene sulfide) includes a carboxyl group (-COOH) or amine group (-NH2) linked to at least part of the end groups of the main chain.

Polyester resin composition and method for preparing same

The present invention relates to a polyester resin composition and a method for preparing the same, wherein the polyester resin composition has an excellent shrinkage ratio, can be thermally shrunk at a low temperature, does not damage the insulating property in a state of a thermal shrinkage film or the like, and can improve adhesion. The polyester resin composition comprises a copolymerized polyester resin, an alkali metal compound, and an alkali earth metal compound, the copolymerized polyester resin comprising: dicarboxylic acid-derived residues containing a residue derived from an aromatic dicarboxylic acid; and diol-derived residues including a residue derived from 4-(hydroxymethyl)cyclohexylmethyl 4'-(hydroxymethyl)cyclohexanecarboxylate, and a residue derived from 4,4-(oxybis(methylene)bis)cyclohexane methanol, wherein the alkali metal compound and the alkali earth metal compound are contained at a content at which the content ratio of alkali earth metal atoms/alkali metal atoms derived therefrom is 0.01 to 1.

Display device with height adjustment structure and terminal having the same

A display device and a terminal having the same are disclosed. The terminal includes a base including a circuit board provided therein, and upper and lower housings, a support configured with one side combined with at least a portion of the lower housing and the other side having a head part configured for combination with a main body of a display, a first hole located on the upper housing and configured for combination with the support, and a second hole located on the circuit board and configured for combination with the support. The display device and the terminal having the same increase combining force between the support and the base and may use the same support and base in main bodies having various sizes, thus simplifying a manufacturing process and reducing part and assembly costs.

Polyarylene sulfide resin composition and formed article

本發明關於一種聚芳硫醚樹脂組合物，因為具有與其他聚合物材料或填料改善的相容性，而展現良好加工性與優良的性質，與其形成之物件。此聚芳硫醚樹脂組合物包括聚芳硫醚包括在主鏈的重複單元中含有二硫鍵重複單元的聚芳硫醚，以及至少一種選自熱塑性樹脂、熱塑性彈性體和填料所組成的群組中的成分。

A tumble meter

Stacking device for secondary battery, stacking method using same, and secondary battery obtained thereby

Developing cartridge and electrophotographic image forming apparatus including the same

A developing cartridge includes an agitator including a pair of ribs to effectively force a toner to a center of a flexible agitator film. In the developing cartridge of an electrophotographic image forming apparatus including a housing containing the toner, a developing roller disposed such that a portion thereof is exposed to the housing, and the agitator which is provided in the housing and feeds the toner to the developing roller, the agitator includes a body, the flexible agitating film including a coupling groove and attached to the body, a hook provided on the body and inserted into the coupling groove, and the pair of ribs provided on the body.

POLYESTER-BASED COPOLYMER RESIN, PREPARATION METHOD AND MOLDED PRODUCT COMPRISING THE SAME

RESINA DE COPOLÍMERO À BASE DE POLIÉSTER, MÉTODO DE PREPARAÇÃO E PRODUTO MOLDADO COMPREENDENDO A MESMA. A presente invenção refere-se a uma resina de copolímero à base de poliéster capaz de ter uma taxa de retração excelente e de ser termorretraída em uma baixa temperatura, e a um produto moldado compreendendo a mesma. Resina de copolímero à base de poliéster inclui um resíduo derivado de ácido dicarboxílico incluindo um resíduo derivado a partir de um ácido dicarboxílico aromático; e um resíduo derivado de diol incluindo um resíduo predeterminado derivado a partir de carboxilato de 4-(hidroximetil)ciclo-hexilmetil 4'-(hidroximetil)ciclo-hexano e um resíduo predeterminado derivado a partir de 4,4-(oxibis(metileno)bis) ciclo-hexano metanol. POLYESTER-BASED COPOLYMER RESIN, METHOD OF PREPARATION AND MOLDED PRODUCT COMPRISING IT. The present invention relates to a polyester-based copolymer resin capable of having an excellent shrinkage rate and being heat-shrinkable at a low temperature, and to a molded product comprising the same. Polyester-based copolymer resin includes a residue derived from dicarboxylic acid including a residue derived from an aromatic dicarboxylic acid; and a residue derived from diol including a predetermined residue derived from 4-(hydroxymethyl)cyclohexylmethyl 4'-(hydroxymethyl)cyclohexane carboxylate and a predetermined residue derived from 4,4-(oxybis(methylene) bis) cyclohexane methanol.

Novel amino-silyl amine compound and the manufacturing method of dielectric film containing si-n bond by using atomic layer deposition

Provided are a novel amino-silyl amine compound and a manufacturing method of a dielectric film containing Si-N bond using the same. Since the amino-silyl amine compound according to the present invention, which is a thermally stable and highly volatile compound, may be treated at room temperature and used as a liquid state compound at room temperature and pressure, the present invention provides a manufacturing method of a high purity dielectric film containing a Si-N bond even at a low temperature and plasma condition by using atomic layer deposition (PEALD).

Methods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputtering

Methods of forming half-tone phase-shift masks include the steps of forming a series of layers on a face of a transparent substrate such as quartz. These layers include a phase-shift layer of MoSiON, a layer of opaque material (e.g., chrome) for blocking light on the phase-shift layer and a photoresist layer on the layer of opaque material. The photoresist layer is then patterned to define a mask having openings therein which expose the layer of opaque material. The layer of opaque material is then patterned using a wet etchant, to expose portions of the phase-shift layer. The patterned photoresist layer is then stripped and a cleaning step is then performed to remove residual defects and marks from the patterned layer of opaque material. The patterned layer of opaque material is then used as a mask during the step of anisotropically dry etching the phase-shift layer using a gas containing CF 4 and O 2 , but not CHF 3 . The use of a gas containing CF 4 and O 2 inhibits parasitic sputtering of chrome from the patterned layer of opaque material onto the exposed portions of the face of the transparent substrate, during the dry etching step. In contrast, the use of a gas containing CHF 3 and O 2 during dry etching of the phase-shift layer may cause the formation of parasitic defects containing chrome on the face of the transparent substrate. These parasitic defects typically cause a reduction in yield when the phase-shift mask is used in the formation of integrated circuits.

Developing cartridge, and electrophotographic image forming apparatus using same

Disclosed is a development cartridge attachable/detachable to/from a main body of an image forming apparatus. The development cartridge includes a photosensitive drum configured to form an electrostatic latent image thereon, a developer roller configured to develop the electrostatic latent image by supplying a developer to the photosensitive drum, a housing configured to support the photosensitive drum and the developer roller, a developer roller gear provided on a rotation shaft of the developer roller and connected to a driving gear of the main body when the development cartridge is attached to the main body, and a driven coupler provided at an end of the photosensitive drum and connected to a driving coupler located coaxially with the driving gear in the main body, based on a shaft connection method when the development cartridge is attached to the main body.

Composition for depositing a silicon-containing layer and method of depositing a silicon-containing layer using the same

Provided is a precursor for depositing a silicon-containing layer, the silicon precursor having a heterocyclic group, and a method of depositing a silicon-containing layer using the same. The silicon precursor is represented by Formula 1. In Formula 1, A 1 is a heterocyclic group including one or more nitrogen, and R 1 is hydrogen or an alkyl group of 1˜6 carbon atoms. R 2 may be an alkyl group of 1˜6 carbon atoms. R 3 may be an alkyl group of 1˜6 carbon atoms.

Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the same

Provided is a composition containing a silylamine compound and a method for manufacturing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film, containing a silylamine compound capable of forming a silicon-containing thin film having a significantly excellent water vapor transmission rate to thereby be usefully used as a precursor of the silicon-containing thin film and an encapsulant of a display, and a method for manufacturing a silicon-containing thin film using the same.

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