Pattern verifying method

The present invention provides a pattern verifying method. First, a target pattern is decomposed into a first pattern and a second pattern. A first OPC process is performed for the first pattern to form a first revised pattern, and a second OPC process is performed for the second pattern to form a second revised pattern. An inspection process is performed, wherein the inspection process comprises an after mask inspection (AMI) process, which comprises considering the target pattern, the first pattern and the second pattern.

Double patterning mask set and method of forming thereof

A double patterning mask set includes a first mask having a first set of via patterns, and a second mask having a second set of via patterns. The first set of via patterns includes at least two via patterns arranged along a diagonal direction, each of the at least two via patterns has at least a truncated corner. The first set of via patterns and the second set of via patterns are interlacedly arranged along a horizontal direction and a vertical direction.

MASK PATTERN AND CORRECTING METHOD THEREOF

A mask pattern and a correcting method thereof are provided. The correcting method includes the following steps. An original pattern having a first original contour and a second original contour is provided. The first original contour has a first original corner. The second original contour has a second original corner, which is near the first original corner. The first and second original corners are cut to form a cut pattern. An optical proximity correction (OPC) process is applied to the cut pattern to form the mask pattern. 1. A correcting method of a mask pattern , comprising:providing an original pattern having a first original contour and a second original contour, the first original contour having a first original corner and the second original contour having a second original corner, which is near the first original corner;cutting the first and second original corners to form a cut pattern; andapplying an optical proximity correction (OPC) process to the cut pattern to form the mask pattern.2. The correcting method according to claim 1 , wherein in the step of forming the cut pattern claim 1 , two cutting directions where the first and the second original corners are cut are substantially parallel with each other.3. The correcting method according to claim 1 , wherein in the step of forming the cut pattern claim 1 , the cutting direction of the first original corner is tilted toward an extension direction of the first original contour at 45 degree substantially.4. The correcting method according to claim 1 , wherein the first original contour has an original straight line claim 1 , the original straight line is connected to the first original corner claim 1 , and in the step of forming the cut pattern claim 1 , less than 50 percentage of the original straight line is cut.5. The correcting method according to claim 1 , wherein the first original contour further has a third original corner claim 1 , the original pattern further has a third original contour ...

Wind turbine system

A wind turbine system that can comprise a wind power machine, a compressor, at least one energy accumulator, a dynamo, a pressurized heating system, and a depressurized cooling system; the wind power machine is driven by a wind power to transform wind energy into mechanical energy and to drive a compressor; the compressor pressurizes and stores gas in the energy accumulator; the energy accumulator stores and output the pressurized gas to drive the dynamo; the dynamo can comprise an air motor and an AC generator motor; wherein the air motor is driven by a gas outputted from the energy accumulator, and wherein the air motor drives the AC generator motor to generate electricity; the pressurized heating system can comprise a liquid/gas energy converter transforming hydraulic pressure into a gas pressure; the depressurized cooling system is connected between the energy accumulator and the dynamo.

Mask Set for Double Exposure Process and Method of Using the Mask Set

A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth. 1. A mask set for double exposure process , comprising:a first mask having a first mask pattern, said first mask pattern is provided with a first base and a plurality of first teeth and protruding portions extending from said first base and alternatively aligning along a first direction; anda second mask having a second mask pattern, said second mask pattern is provided with a second base and a plurality of second teeth extending from said second base, wherein said second base may at least partially overlap said first base so that each of said protruding portions at least partially overlaps one of said second teeth.2. The mask set for double exposure process according to claim 1 , wherein the length of the overlapped region of said first base and said second base in a second direction ranges from half of the pitch of said first tooth and said protruding portion to one said pitch.3. The mask set for double exposure process according to claim 2 , wherein said pitch is larger than or equal to 90 nm.4. The mask set for double exposure process according to claim 2 , wherein said length is 60 nm.5. The mask set for double exposure process according to claim 1 , wherein the length of said protruding portion ranges from half of the pitch of said first tooth and said protruding portion to one said pitch.6. The mask set for double exposure process according to claim 5 , wherein said pitch is larger or equal to 90 nm.7. The mask set for double exposure process according to claim 5 , wherein the length of said protruding portion is 60 nm.8. ...

METHOD OF OPTICAL PROXIMITY CORRECTION ACCORDING TO COMPLEXITY OF MASK PATTERN

A method of optical proximity correction (OPC) includes the following steps. At first, a layout pattern is provided to a computer system. Subsequently, the layout pattern is classified into at least a first region and at least a second region. Then, several iterations of OPC calculations are performed to the layout pattern, and a total number of OPC calculations performed in the first region is substantially larger than a total number of OPC calculations performed in the second region. Afterwards, a corrected layout pattern is outputted through the computer system onto a mask. 1. A method of optical proximity correction (OPC) , comprising:providing a layout pattern to a computer system;classifying the layout pattern into at least a first region and at least a second region, wherein a complexity of the layout pattern of the first region is substantially higher than a complexity of the layout pattern of the second region;performing several iterations of OPC calculations to modify the original layout pattern, wherein a total number of OPC calculations performed in the first region is substantially larger than a total number of OPC calculations performed in the second region; andoutputting a corrected layout pattern through the computer system onto a mask.2. The method of OPC according to claim 1 , wherein a method of classifying the layout pattern into the first region and the second region comprising:first selecting a part of the layout pattern to be defined as the layout pattern of the first region; anddefining the remaining layout pattern as the layout pattern of the second region.3. The method of OPC according to claim 1 , wherein the layout pattern comprises a plurality of geometric patterns claim 1 , and each of the geometric patterns has a judgment value.4. The method of OPC according to claim 3 , wherein the judgment value is positively corresponding to a value of mask error enhancement factor (MEEF) claim 3 , negatively corresponding to a value of normalized ...

Binaural hearing aid and method of reducing noise generated by touching hearing aid

A method of reducing a noise generated by touching a hearing aid includes: obtaining a left ear sound received by a left ear hearing aid and a right ear sound received by a right ear hearing aid; determining if a sound energy intensity difference between the left ear sound and the right ear sound is greater than an energy threshold; if so, determining a larger energy intensity between the left ear sound and the right ear sound; if the energy intensity of the left ear sound is larger, replacing the left ear sound with the right ear sound such that the left and right ear hearing aids both output the right ear sound.

Sound adjustment method and sound adjustment device

A sound adjustment method is disclosed. The sound adjustment method includes the following the steps: receiving a sound adjustment command; receiving a right channel sound signal and a left channel sound signal; selecting a corresponding adjustment mode according to the sound adjustment command and processing the right channel sound signal and the left channel sound signal based on the adjustment mode to generate a right channel first sound signal and a left channel first sound signal, wherein different adjustment modes have different intensity adjustment levels; shifting the frequency of the right channel first sound signal by X Hz to generate a right channel second sound signal and shifting the frequency of the left channel first sound signal by Y Hz to generate a left channel second sound signal, wherein 0.5≤|X−Y|≤100; outputting the right channel second sound signal and the left channel second sound signal.

APERTURE FOR PHOTOLITHOGRAPHY

An aperture is configured to be disposed between an illumination source and a semiconductor substrate in a photolithography system. The aperture includes a light-transmission portion with a non-planar thickness profile to compensate the discrepancy of wave-fronts of the light beams of different orders.

METHOD FOR MANUFACTURING SEMICONDUCTOR LAYOUT PATTERN, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE

A method for manufacturing a semiconductor device includes providing a substrate having a mask layer formed thereon, providing a first photomask having a first layout pattern and a second photomask having a second layout pattern, the first layout pattern including a plurality of active area portions and at least a neck portion connecting two adjacent active area portions, transferring the first layout pattern from the first photomask to the mask layer to form a plurality of active area patterns and at least a neck pattern connecting two adjacent active area patterns in the mask layer, and transferring the second layout pattern from the second photomask to the mask layer to remove the neck pattern to form a patterned mask. The patterned mask includes the active area patterns. A slot is at least formed between the two adjacent active area patterns. 1. A method for manufacturing a semiconductor device , comprising:providing a substrate having a mask layer formed thereon;providing a first photomask having a first layout pattern, the first layout pattern comprising a plurality of active area portions and at least a neck portion connecting two adjacent active area portions;providing a second photomask having a second layout pattern;transferring the first layout pattern from the first photomask to the mask layer to form a plurality of active area patterns and at least a neck pattern connecting the two adjacent active area patterns; andtransferring the second layout pattern from the second photomask to the mask layer to remove the neck pattern and to form a patterned mask, the patterned mask comprising the active area patterns, wherein a slot is at least formed between the two adjacent active area patterns.2. The method for manufacturing the semiconductor device according to claim 1 , wherein the active area patterns formed at two opposite sides of the slot respectively comprise at least three obtuse included angles.3. The method for manufacturing the semiconductor device ...

COMMUNICATION DEVICE AND SIDETONE VOLUME ADJUSTING METHOD THEREOF

A communication device and a sidetone volume adjusting method thereof are disclosed. The communication device includes a sound processor, a far-end sound receiver, a near-end sound receiver, a volume adjuster, and a sound player. The far-end sound receiver is configured to receive a far-end sound and transmit it to the sound processor. The near-end sound receiver is configured to receive a near-end sound such that the sound processor receives the near-end sound to form a sidetone. The volume adjustment module is configured to adjust the volume of the far-end sound and the sidetone to form the adjusted far-end sound and the adjusted sidetone, wherein the volume of the adjusted sidetone is based on the near-end sound and the adjusted far-end sound. The sound player is used to play the adjusted sidetone and the adjusted far-end sound.

Communication device and output sidetone adjustment method thereof

A communication device and an output sidetone adjustment method thereof are disclosed. The method includes the steps of: receiving a far-end sound; receiving a near-end sound to form a sidetone and obtaining an average input volume of the near-end sound; detecting ambient noise of the near-end sound; analyzing an average noise volume and a noise frequency band of the ambient noise to determine whether the average noise volume of the ambient noise is higher than the average input volume; if yes, adjusting the volume of the sidetone in a specific frequency band by increasing it by a first gain value to form an adjusted sidetone, wherein the specific frequency band and the noise frequency band of the ambient noise belong to the same frequency band or different frequency bands; and outputting the adjusted sidetone and the far-end sound.

Hearing assistance device and method of adjusting an output sound of the hearing assistance device

A hearing assistance device and method of adjusting an output sound of the hearing assistance device are disclosed. The method comprises the following steps: emitting a test sound, wherein the frequency of the test sound is higher than 15 kHz and lower than 30 kHz; receiving a response sound after the test sound is emitted; determining whether the response sound is higher than a response sound threshold; and, if yes, adjusting an output volume.

METHOD FOR ELIMINATING SOUND AND ELECTRONIC DEVICE PERFORMING THE SAME

A method for eliminating sound is disclosed. The method is applied to an electronic device capable of connecting with a sound playback device and includes a microphone. The method includes the following steps of: receiving a first input sound via the microphone to acquire a first input sound signal; recording the first input sound signal and transmitting the first input sound signal to the sound playback device; receiving a second input sound from the sound playback device to acquire a second input sound signal, wherein the second input sound is generated by the sound playback device according to the first input sound signal; determining a difference in generation times between the first input sound signal and the second input sound signal; and filtering the second input sound signal according to the difference in generation times and the first input sound signal. 1. A method for eliminating sound , which is applied to an electronic device capable of connecting with a sound playback device and comprises a microphone , the method comprising the following steps:receiving a first input sound via the microphone to acquire a first input sound signal;recording the first input sound signal and transmitting the first input sound signal to the sound playback device;receiving a second input sound from the sound playback device via the microphone to acquire a second input sound signal, wherein the second input sound is generated by the sound playback device according to the first input sound signal;determining a difference in generation times between the first input sound signal and the second input sound signal by recording passed time from receiving the first input sound signal to acquiring the second input sound signal; andfiltering the second input sound signal according to the difference in generation times and the first input sound signal.2. The method as claimed in claim 1 , wherein the electronic device is connected with the sound playback device via an internet claim ...

METHOD OF OPTICAL PROXIMITY CORRECTION

A calculation method of optical proximity correction includes providing at least a feature pattern to a computer system. At least a first template and a second template are defined so that portions of the feature pattern are located in the first template and the rest of the feature pattern is located in the second template. The first template and the second template have a common boundary. Afterwards, a first calculation zone is defined to overlap an entire first template and portions of the feature pattern out of the first template. Edges of the feature pattern within the first calculation zone are then fragmented from the common boundary towards two ends of the feature pattern so as to generate at least two first beginning segments respectively at two sides of the common boundary. Finally, positions of the first beginning segments are adjusted so as to generate first adjusted segments. 1. A method of optical proximity correction , comprising:providing a layout pattern, wherein the layout pattern comprises a plurality of separately disposed feature patterns;providing at least one of the feature patterns to a computer system;defining at least a first template and a second template so that portions of the feature pattern are located in the first template and the rest of the feature pattern is located in the second template, wherein the first template and the second template have a common boundary;defining a first calculation zone, wherein the first calculation zone overlaps an entire first template and portions of the feature pattern out of the first template;fragmenting edges of the feature pattern within the first calculation zone from the common boundary towards two ends of the feature pattern so as to generate at least two first beginning segments respectively at two sides of the common boundary; andadjusting positions of the first beginning segments so as to generate first adjusted segments.2. The method according to claim 1 , wherein the feature pattern is ...

Method for correcting layout pattern

A method of correcting a layout pattern is provided in the present invention. The method includes the following steps. A layout pattern including at least two adjacent rectangular sub patterns is provided. The layout pattern is then input into a computer system. An optical proximity correction including a bevel correction is then performed. The bevel correction includes forming a bevel at a corner of at least one of the two adjacent rectangular sub patterns, wherein the bevel is formed by chopping the corner, and moving the bevel toward an interaction of two neighboring segments of the bevel if a distance between the bevel and the other rectangular sub pattern is larger than a minimum value. The angle between a surface of the bevel and a surface of the rectangular sub pattern is not rectangular. The layout pattern is output to a mask after the optical proximity correction.

Pattern verifying method

The present invention provides a pattern verifying method. First, a target pattern is decomposed into a first pattern and a second pattern. A first OPC process is performed for the first pattern to form a first revised pattern, and a second OPC process is performed for the second pattern to form a second revised pattern. An inspection process is performed, wherein the inspection process comprises an after mask inspection (AMI) process, which comprises considering the target pattern, the first pattern and the second pattern.

MASK SET FOR DOUBLE EXPOSURE PROCESS AND METHOD OF USING THE MASK SET

A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth.

Transmission cable and display system

A transmission cable including a signal wire and a shielding layer is provided. The signal wire is configured to transmit a differential signal provided by an eDP interface or a V-by-one interface. The shielding layer is configured to cover the signal wire. An end of the signal wire receives the differential signal provided by the eDP interface or the V-by-one interface, and another end of the signal wire outputs the differential signal provided by the eDP interface or the V-by-one interface. In addition, a display system is also provided.

SOUND PLAYBACK DEVICE AND OUTPUT SOUND ADJUSTING METHOD THEREOF

A sound playback system and an output sound adjusting method thereof are disclosed. The method includes the follow steps: obtaining an input sound signal and knowing an average input volume of the input sound signal; detecting an ambient noise, and analyzing an average noise volume and a noise frequency hand of the ambient noise; determining whether the average noise volume of the ambient noise is louder than the average input volume; if yes, adjusting a specific frequency band of the input sound signal to increase a first gain value to form an output sound signal, wherein the specific frequency band and the noise frequency band of the ambient noise belongs to the same frequency band or different frequency bands; and playing the output sound signal.

Method and apparatus for integrated circuit design

A method for IC design is provided. Firstly, an IC design layout having a main feature with an original margin is received. Then, a first modified margin of the main feature is generated; and a first photolithography simulation procedure of the main feature with the first modified margin is performed to generate a first contour having a plurality of curves. Next, an equation of each of the curves is obtained; each equation of the curves is manipulated to obtain a vertex of each of the curves. After that, a first group of target points are assigned to the original margin. Each of the first group of target points respectively corresponds to one of the vertices. Finally, an optical proximity correction (OPC) procedure is performed by using the first group of target points to generate a second modified margin. An apparatus for IC design is also provided.

METHOD FOR ELIMINATING SOUND AND ELECTRONIC DEVICE PERFORMING THE SAME

A method for eliminating sound is disclosed. The method is applied to an electronic device capable of connecting with a sound playback device and includes a microphone. The method includes the following steps of: receiving a previous input sound via the microphone to generate a previous input sound signal; transmitting the previous input sound signal to the sound playback device; receiving a current input sound via the microphone to generate a current input sound signal; filtering the current input sound signal by removing the previous input sound from the current input sound signal; playing the filtered current input sound signal. 1. A method for eliminating sound , which is applied to an electronic device capable of connecting with a sound playback device and comprises a microphone , the method comprising the following steps:receiving a previous input sound via the microphone to generate a previous input sound signal;transmitting the previous input sound signal to the sound playback device;receiving a current input sound via the microphone to generate a current input sound signal;filtering the current input sound signal by removing the previous input sound signal from the current input sound signal; andplaying the filtered current input sound signal.2. The method as claimed in claim 1 , wherein the electronic device is connected with the sound playback device via an internet claim 1 , such that the previous input sound signal is transmitted to the sound playback device via the internet.3. The method as claimed in claim 1 , wherein a distance between the electronic device and the sound playback device is less than 2 meters.4. The method as claimed in claim 1 , wherein removing the previous input sound signal includes identifying a difference in generation times between the previous input sound signal and the current input sound signal relayed by the sound playback device and received by the electronic device.5. An electronic device claim 1 , which is capable of ...

Mask set for double exposure process and method of using the mask set

A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth.

Protection device of the drive mechanism of a clock

A protection device of a drive mechanism of a clock is provided. The drive mechanism includes a driven member, and a driving member for driving the driven member. The protection device is mounted between the driving member and the driven member, and includes a first magnetic member mounted in the driven member, and a second magnetic member mounted in the driving member and attracted with the first magnetic member by a magnetic force, so that the driven member may be rotated by rotation of the driving member. Thus, when a resistance exerted on the driven member is greater than the magnetic force between the first magnetic member and the second magnetic member, the driving member idles, so as to protect the direct current small motor.

Method of optical proximity correction in combination with double patterning technique

A method of optical proximity correction (OPC) includes the following steps. A layout pattern is provided to a computer system, and the layout pattern is classified into at least a first sub-layout pattern and at least a second sub-layout pattern. Then, at least an OPC calculation is performed respectively on the first sub-layout pattern and the second sub-layout pattern to form a corrected first sub-layout pattern and a corrected second sub-layout pattern. The corrected first sub-layout pattern/the corrected second sub-layout pattern and the layout pattern are compared to select a part of the corrected first sub-layout pattern/the corrected second sub-layout pattern as a first selected pattern/the second selected pattern, and the first selected pattern/the second selected pattern is further altered to modify the corrected first sub-layout pattern/the corrected second sub-layout pattern as a third sub-layout pattern/a fourth sub-layout pattern.

用於雙重曝光製程的光罩組暨使用該光罩組的方法

本發明提出了一種用於雙重曝光製程的光罩組暨其使用方法，該光罩組包含一第一光罩圖案，其具有一第一基部以及多個第一齒部與多個凸起部；以及一第二光罩圖案，其具有一第二基部以及多個第二齒部，其中該第二基部可至少部分重疊該第一基部，使得每一該凸起部至少部分重疊一該第二齒部重疊。

Sound playback device and method for masking interference sound through noise masking signal thereof

A sound playback device and a method for masking interference sound through a noise masking signal thereof are disclosed. The method comprises the steps of: playing an audio signal as a noise masking signal; receiving an ambient sound; analyzing whether the ambient sound has an interference sound in N different frequency bands; if so, finding at least one interference sound frequency band and a time period, and the interference sound conforms to the condition that an instant sound entropy value is greater than a dynamic sound average entropy value, wherein the instant sound entropy value is the calculated sound entropy value in a current sampling time; the dynamic sound average entropy value is an average entropy value of the sum of the previous instant sound entropy values; and increasing an energy of the noise masking signal in the interference sound frequency band and the time period.

Flying dish

A flying dish having a convex center portion surrounded by a concave ring portion. The convex center portion has the form of the pistils of a flower. The concave ring portion supports petals of a flower. The concave ring portion contains respective pivot axles for the flower petals. Each pivot axle is provided with a coiled spring extending between the inner wall of the concave ring portion and a slot on the back of a flower petal. Each flower petal is provided with a small whistle. When the rotational speed of the flying dish reaches a predetermined level, the flower petals open under centrifugal force and begin whistling due to the air stream. When the speed of the flying dish slows, the flower petals gradually close and the whistling disappears.

一種決定製程裕度的方法

Method to determine process window

光罩圖案及其修正方法

一種光罩圖案及其修正方法。光罩圖案之修正方法包括以下步驟。提供一原始圖案。原始圖案具有一第一原始輪廓及一第二原始輪廓。第一原始輪廓具有一第一原始角點。第二原始輪廓具有一第二原始角點。第一原始角點相鄰於第二原始角點。斜削第一原始角點及第二原始角點，以形成一斜削圖案。以斜削圖案進行一光學鄰近校正程序，以形成光罩圖案。