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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Применить Всего найдено 3. Отображено 3.
16-12-2015 дата публикации

Dross is got rid of and washing system

Номер: CN0204866215U
Автор: XUE GUANGHAI, LU YAPING, GU GUOXING, LIU QING, CHEN HONGSHUO, YU YADI, LIU KAI, FU QIU, LI QIANG
Принадлежит:

The utility model relates to a solid waste separates technical field, concretely relates to a dross is got rid of and washing system, including flotation cell and circulation storage tank, loop in through circulation fluid pipeline and parting liquid pipeline between flotation cell and the circulation storage tank, the cleaning solvent is equipped with in the circulation storage tank, be equipped with spray set on the circulation fluid pipeline, the flotation cell is arranged in isolating the dross from pending fatlute, the circulation storage tank passes through spray set will the cleaning solvent spout into the flotation cell, just the cleaning solvent is in in the flotation cell with former oil phase in the dross dissolves and forms the oiliness solvent, the oiliness solvent passes through the parting liquid pipeline flows in extremely in the circulation storage tank. The utility model provides a pair of dross is got rid of and washing system can get rid of the dross in the flotation ...

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Номер записи: 1
22-08-2023 дата публикации

Silicon wafer cleaning method for improving quality of metal and particles on surface of polished silicon wafer

Номер: CN116631848A
Автор: WANG YUE, WANG ZHENGYANG, YU XINGRUI, YU YADI, SUN YANMEI, PAN SHILIN, ZHANG RONGBIN
Принадлежит:

The invention relates to the technical field of semiconductors, in particular to a silicon wafer cleaning method for improving the quality of metal and particles on the surface of a polished silicon wafer. The method at least comprises the following steps of: cleaning a silicon wafer by adopting an SC1 cleaning solution; washing with ultrapure water; cleaning the silicon wafer by using an SC2 cleaning solution; washing with ultrapure water; cleaning the silicon wafer by using an SC1 cleaning solution added with a chelating agent; washing with ultrapure water; and drying. According to the cleaning method, the quality of metal and particles on the surface of the silicon polished wafer can be effectively improved, the surface cleanliness of the silicon polished wafer is improved, and the yield of subsequent process epitaxy and device processing is improved. Moreover, by adopting the cleaning method disclosed by the invention, cleaning equipment does not need to be transformed, and the method ...

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Номер записи: 2
22-08-2023 дата публикации

Silicon wafer cleaning method

Номер: CN116631849A
Автор: WANG YUE, YU YADI, SUN YANMEI, WANG ZHENGYANG, YU XINGRUI, MENG DEQIANG, WANG MINGXIA
Принадлежит:

The invention relates to the technical field of semiconductor silicon wafers, in particular to a silicon wafer cleaning method. Comprising the following steps that under the alkaline cleaning solution spraying condition, a cleaning brush head and an edge brush head are used for brushing twice; under the pure water spraying condition, an edge brush head is used for brushing; and cleaning with an acidic cleaning solution, drying and packaging. According to the silicon wafer cleaning method, the cleanliness of the near-edge area of the silicon wafer can be effectively improved, the overall quality level of the silicon wafer is improved, a good foundation is laid for the machining yield of the next procedure, and the surface roughness of the silicon wafer cannot be deteriorated.

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Номер записи: 3