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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Применить Всего найдено 11. Отображено 11.
17-12-2014 дата публикации

UV-curable low-refraction antistatic hydrophobic coating prepared on basis of advanced carbon material

Номер: CN104212334A
Автор: LIU JINGCHENG, ZHENG XIANGFEI, LIU REN, YUAN YAN, LIU XIAOYA, LI ZHIQUAN
Принадлежит:

The invention discloses a UV-curable low-refraction antistatic hydrophobic coating prepared on the basis of an advanced carbon material. The coating comprises the following components in percentage by mass: 45-55% of photosensitive polyimide, 0-35% of advanced carbon material, 2-5% of a photoinitiator, 10-16% of a diluent, and 0-35% of a solvent. The UV-curable low-refraction antistatic hydrophobic coating is prepared by the following steps: evenly mixing the components according to the ratio, and spinning on a glass slide; and pre-baking and photocuring. A polymer for the coating disclosed by the invention can be applied to UV curing due to introduction of a photosensitive group, and fluorine atoms are introduced into the used reaction monomer, so that the prepared coating has hydrophobicity; the coating has certain anti-static electricity capacity due to introduction of the carbon material; and the fluorine atoms and the carbon material simultaneously play the role of reducing the refractive ...

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Номер записи: 1
10-06-2015 дата публикации

Photoresist composition prepared on basis of PCDL type urethane acrylate

Номер: CN104698754A
Автор: LIU JINGCHENG, LIU QIUHUA, ZHENG XIANGFEI, LIU REN, LI HU, LIU XIAOYA
Принадлежит:

The invention discloses a photoresist composition prepared on the basis of PCDL type urethane acrylate. The composition comprises, by mass, 45-60% of urethane acrylate, 10-15% of reactive diluent, 4-6% of pigment, 3-5% of photoinitiator and 20-37% of solvent; on the dark condition, the urethane acrylate is mixed with the photoinitiator, the solvent, the reactive diluent and the pigment according to the proportion and stirred magnetically at room temperature so as to be fully dissolved to obtain photoresist. In the composition, the glass transition temperature and the rigidity of the PCDL type urethane acrylate are high, an acid value is adjustable, the molecular weight is low, viscosity is low, photoresist membrane sig water prepared by a low polymer can be developed, time for developing is short, and the image resolution ratio is low.

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Номер записи: 2
19-11-2014 дата публикации

Gold nano particles coated with amphiphilic polymer self-assembly micelle with photoresponse

Номер: CN104151563A
Автор: LIU JINGCHENG, LIN LICHENG, LIU XIAOYA, LI HU, LIU REN, ZHENG XIANGFEI
Принадлежит:

The invention discloses gold nano particles coated by an amphiphilic polymer self-assembly micelle with photoresponse. The gold nano particles are prepared through the following steps: the amphiphilic polymer with photoresponse is generated by free radical polymerization of polymeric monomer 7-(4-vinyl benzyloxy)-4-methyl coumarin, styrene and maleic anhydride under the action of an initiator for free radical polymerization; the obtained amphiphilic polymer dissolves in N, N-dimethyl formamide and then the mixture is mixed with gold nano particles, an N, N-dimethyl formamide solution of dodecyl mercaptan; deionized water is dropwise added, so that the amphiphilic polymer is promoted to be self-assembled into micelles to coat the gold nano particles. The amphiphilic polymer self-assembly micelle for coating the gold nano particles has good water solubility, so that the micelles are stabilized through the photodimerization of hydrophobic coumarin groups in the inner part under the irradiation ...

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Номер записи: 3
23-06-2023 дата публикации

Imide sulfonate photoacid generator, resist composition, application of resist composition and electronic component

Номер: CN116283945A
Автор: GONG YAN, XU LIANG, HUANG WEI, ZHENG XIANGFEI
Принадлежит:

The invention provides an imide sulfonate photoacid, a resist composition and an application. The nonionic photoacid has a structure shown in the following general formulas (1) and (2). Due to the introduction of 4H-indenothiophene and R3 and R4 groups, compared with the existing sulfonate photoacid such as NIT, the photoacid provided by the invention has the advantages that the light absorption coefficient is increased, the absorption wavelength is subjected to red shift, and the photoacid has higher light sensitivity and sensitivity and better thermal stability and chemical stability at 300-450 nm, and also has better compatibility with other components in the application process.

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Номер записи: 4
25-10-2019 дата публикации

Novel non-contact extensometer system

Номер: CN0209541689U
Автор: ZHENG XIANGFEI, WANG YADONG
Принадлежит: NANJING NIOU SCIENT INSTRUMENT CO LTD, NANJING NIOU SCIENTIFIC INSTRUMENT CO., LTD.

The utility model discloses a novel non-contact extensometer system. Video extensometer, the video extensometer comprises a camera device. Wherein the camera device is connected with a connecting line, the connecting line is connected with a data processing device, the bottom wall of the camera device is fixedly provided with a connecting rod, the bottom end of the connecting rod is provided withan installation block, the connecting rod is detachably installed on the installation block, the bottom end of the installation block is provided with a support, and the installation block is rotatably installed on the support. According to the utility model, the spherical base is arranged at the top end of the bracket, and the camera device is rotatably connected to the spherical base and the bracket through the mounting block and the steel ball, so that the rotation angle of the camera device can be conveniently adjusted, a specified position of a component can be conveniently photographed and ...

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Номер записи: 5
11-06-2014 дата публикации

Synthesis of N-phenyl maleimide-containing photosensitive acrylic resin and application thereof in negative photoresist

Номер: CN103848930A
Автор: LIU XIAOYA, ZHENG XIANGFEI, LIU JINGCHENG, LIU REN, MU QIDAO, SUN XIAOXIA, GONG YUNHUA, LU YANGBIN
Принадлежит:

The invention relates to synthesis of N-phenyl maleimide-containing photosensitive acrylic resin and an application thereof in a negative photoresist, and belongs to the technical field of ultraviolet curing. Alkaline soluble photosensitive acrylic resin is synthesized by a two-step method, wherein a ring-opening reaction is carried out on a reaction monomer N-phenyl maleimide under the alkaline condition, so that the alkaline solubility of a polymer is increased. A carbon-carbon double bond is introduced into the polymer, so that the photosensitiveness of the polymer is improved. According to the synthesis and the application of the N-phenyl maleimide-containing photosensitive acrylic resin, which is disclosed by the invention, the reaction condition is easy to control, the monomer used is simple in structure, and the polymer is excellent in performance, so that the resin has a good performance in application of the negative photoresist. The structure of the polymer is as shown in the ...

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Номер записи: 6
04-07-2023 дата публикации

Robust trajectory Poisson-Bernoulli hybrid multi-extended target tracking method

Номер: CN116385967A
Автор: XUE QIUTIAO, ZHENG XIANGFEI, WU SUNYONG, HU QINGSHUANG, SUN XIYAN, CAI RUHUA, JI YUANFA, FU QIANG, YAN SUQING, DENG HONGGAO
Принадлежит:

The invention relates to the technical field of trajectory tracking, in particular to a robust trajectory Poisson-Bernoulli hybrid multi-extended target tracking method, which comprises the following steps of: firstly, describing an unknown detection probability through Beta distribution, describing an extended target trajectory state through GGIW distribution, then modeling the trajectory target state and the detection probability into an augmented trajectory state, and finally, carrying out target tracking. Therefore, the tracking problem of multiple extended target trajectories under the unknown detection probability is solved. Simulation results show that no matter where a target appears in a monitoring scene, the method provided by the invention can accurately estimate the position of the target, and the effectiveness and robustness of the method in a plurality of challenging tracking scenes are verified through a large number of experiments.

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Номер записи: 7
10-12-2014 дата публикации

Controllable-acid-value photosensitive alkali-soluble polyurethane acrylate resin and photoresist composition thereof

Номер: CN104193944A
Автор: LIU XIAOYA, LIU QIUHUA, LIU JINGCHENG, LI HU, ZHENG XIANGFEI, LIN LICHENG, MU QIDAO, SUN XIAOXIA
Принадлежит:

The invention provides a controllable-acid-value photosensitive alkali-soluble polyurethane acrylate resin and a photoresist composition thereof, belonging to the technical field of ultraviolet curing. Carboxylic dibasic alcohol reacts with an isocyanate compound to obtain a NCO-terminated prepolymer, and finally, termination is performed by a hydroxy acrylate monomer to obtain the polyurethane acrylate resin. By introducing the carboxylic group, the resin has alkali solubility; and by introducing the acrylate monomer, the resin has photosensitiveness. The method has the advantages of simple process and mild reaction conditions, and can control the molecular weight, acid value, double-bond equivalent weight and the like of the resin by changing the material proportion, thereby obtaining the resin applicable to the field of photoresists.

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Номер записи: 8
03-09-2014 дата публикации

Alkaline-soluble photosensitive resin prepared by use of maleic anhydride ring-opening modified branched oligomer and photoresist composition of resin

Номер: CN104017128A
Автор: LIU XIAOYA, ZHENG XIANGFEI, LIU JINGCHENG, LIU REN, MU QIDAO, SUN XIAOXIA, LU YANGBIN
Принадлежит:

The invention provides an alkaline-soluble photosensitive resin prepared by use of a maleic anhydride ring-opening modified branched oligomer and a photoresist composition of the resin, belonging to the technical field of ultraviolet curing. As p-vinyl benzyl thiol contains either a polymerizable double bond or a branch point sulfydryl, p-vinyl benzyl mercaptane can be copolymerized with other vinyl monomers to form the branched oligomer. The branched alkaline-soluble resin is synthesized through free radical polymerization by use of four monomers, namely p-vinyl benzyl thiol (VBT), methacrylic acid (MAA), benzyl methacrylate (BZMA) and maleic anhydride (MA), and then a ring-opening reaction is carried out between hydroxyl in hydroxyethyl acrylate (HEA) and maleic anhydride on a polymer chain, the double bond is coupled, and a photosensitive group is introduced to improve the light sensitivity of the resin; meanwhile, carboxyl groups are generated by opening the ring of the maleic anhydride ...

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Номер записи: 9
05-08-2015 дата публикации

Urethane-acrylate copolymer and photoresist composition thereof

Номер: CN104817656A
Автор: LIU JINGCHENG, LIU QIUHUA, LIU REN, LIU XIAOYA, MU QIDAO, ZHENG XIANGFEI, LI ZHIQUAN
Принадлежит:

The invention provides a urethane-acrylate copolymer and a photoresist composition thereof and belongs to the field of photoresists. A hydroxyl-containing acrylate monomer and a diisocyanate compound undergo a reaction to produce an NCO-terminiated prepolymer, the NCO-terminiated prepolymer and saturated monobasic alcohol undergo an end-capping reaction to produce a urethane-acrylate polymer monomer containing tail end double bonds, and the urethane-acrylate polymer monomer undergoes a free radical copolymerization reaction to produce the urethane-acrylate copolymer. Through use of annular diisocyanate, photoresist corrosion resistance is improved. Through use of acrylic acid or methacrylic acid, the copolymer has the characteristics of adjustable acid value and dissoluble alkali lye. Through use of other rigid acrylate monomers, copolymer heat resistance and hardness are improved. Through use of the urethane acrylate and acrylic acid monomers, the copolymer has excellent adhesion. The ...

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Номер записи: 10
25-11-2015 дата публикации

Banister limit baffle

Номер: CN0204803793U
Автор: ZHENG XIANGFEI, LIN SHAOCHU, ZHENG HAO
Принадлежит:

The utility model discloses a banister limit baffle solves original structure and has the problem that the assembly is complicated, the cost is higher, life is short and compressive strength is weak, this banister limit baffle, including supporting seat and mount pad, the supporting seat is H -shaped structure, including last horizontal pole, and sheer pole and support column, support connection is on the mount pad, and the mount pad setting is on the brake lever of banister, this banister limit baffle is mould die -casting integrated into one piece, and the material is the plastic material. The utility model discloses banister limit baffle is mould die -casting integrated into one piece, need not to install rubber column again, saves the assemble duration, saves the cost, the material is the plastic material, has obvious promotion in the aspect of compressive strength, utilize H -shaped structure's supporting seat, promote the cushion effect, use this banister limit baffle with obvious ...

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Номер записи: 11