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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Форма поиска

Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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23-01-2017 дата публикации

Центрифуга

Номер: RU0000168186U1

Полезная модель относится к области производства оптических и оптико-электронных элементов и устройств и может быть использована преимущественно для финишной очистки поверхностей оптических деталей, например поверхностей подложек с нанесенными на них зеркалами лазерных гироскопов. Сущность полезной модели - она содержит корпус цилиндрической формы и опорный механизм, выполненный с возможностью установки и удержания оптической детали, а также подачи на ее поверхность моющего раствора и деионизованной воды, причем в верхней части корпуса имеется выемка, в центре которой установлен опорный механизм для удержания оптической детали, выполненный с возможностью вращения вокруг вертикальной оси в виде пружинящей разрезной втулки с упругими вертикально ориентированными пружинящими элементами, предназначенными для закрепления и удержания оптической детали, при этом внутренняя стенка выемки в верхней части корпуса выполнена из капиллярно-пористого материала с V-образным вырезом у верхнего края, а дно выемки выполнено с возможностью слива моющего раствора и деионизованной воды. Технический результат заключается в упрощении устройства и повышении качества очистки. 1 ил. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 168 186 U1 (51) МПК B08B 3/10 (2006.01) B08B 3/02 (2006.01) B08B 11/02 (2006.01) H01L 21/08 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ФОРМУЛА ПОЛЕЗНОЙ МОДЕЛИ К ПАТЕНТУ РОССИЙСКОЙ ФЕДЕРАЦИИ (21)(22) Заявка: 2016127895, 12.07.2016 (24) Дата начала отсчета срока действия патента: 12.07.2016 (72) Автор(ы): Ищенко Петр Иванович (RU) Дата регистрации: 23.01.2017 Приоритет(ы): (22) Дата подачи заявки: 12.07.2016 Адрес для переписки: 117405, Москва, Варшавское ш., 143, корп. 1, кв. 110, Борисову Э.В. 1 6 8 1 8 6 R U (57) Формула полезной модели Центрифуга, содержащая корпус цилиндрической формы и опорный механизм, выполненный с возможностью установки и удержания оптической детали, а также подачи на ее поверхность моющего раствора и деионизованной воды, ...

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03-10-2017 дата публикации

Циркуляционная проточная установка очистки систем водяного отопления от отложений на внутренней поверхности

Номер: RU0000174133U1

Полезная модель относится к энергетике и может быть использована при обслуживании и ремонте систем отопления жилых зданий и производственных помещений. Заявленное устройство включает расширительный бак 1, выход 2 которого соединен трубопроводом с входом 3 проточного нагревателя 4. Выход 5 проточного нагревателя 4 соединен трубопроводом с входом 6 первого насоса 7. Выход 5 проточного нагревателя 4 также соединен через первый вентиль 9 с входом 10 второго насоса 11. Выход 8 первого насоса 7 соединен трубопроводом, в котором установлен второй вентиль 12, с выходной магистралью 13. Выходная магистраль 13 снабжена четвертым вентилем 19 и подключается к входу промываемого объекта 14. Выход 15 второго насоса 11 трубопроводом соединен с выходной магистралью 13. Вход 10 второго насоса 11 соединен трубопроводом, в котором установлен третий вентиль 16, с выходом 8 первого насоса 7, при этом точка соединения расположена перед вторым вентилем 12. Выходная магистраль 17 снабжена пятым вентилем 18 и подключается к выходу промываемого объекта 20 и к входу 21 расширительного бака 1. 174133 Ц 1 ко РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) (0 да да 03) (51) МПК ВОЗВ 9/027 (2006.01) ВОЗВ 3/08 (2006.01) Е28С 9/00 (2006.0Т) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ПОЛЕЗНОЙ МОДЕЛИ К ПАТЕНТУ (21)(22) Заявка: 2016151379, 27.12.2016 (24) Дата начала отсчета срока действия патента: 27.12.2016 Дата регистрации: 03.10.2017 Приоритет(ы): (22) Дата подачи заявки: 27.12.2016 (45) Опубликовано: 03.10.2017 Бюл. № 28 Адрес для переписки: 121096, Москва, а/я 1, Салминой О.Б. (72) Автор(ы): Бакулин Илья Викторович (КО), Калинин Сергей Владимирович (КО), Урин Ефим Альбертович (КО) (73) Патентообладатель(и): Общество с ограниченной ответственностью "Научно-производственная компания "БИОКОМ" (КП) (56) Список документов, цитированных в отчете о поиске: ВО 72885 01, 10.05.2008. ВО 81622 01, 27.03.2009. 05 2010304024 АТ, 02.12.2010. СМ 204107895 01, 21.01.2015. \О 2014170705 АТ, 23.10.2014. (54) ...

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08-02-2018 дата публикации

Стенд для промывки трубчатых теплообменников и трубопроводов

Номер: RU0000177095U1

Полезная модель относится к гидроприводам различных отраслей промышленности, в частности для промывки трубчатых теплообменников и трубопроводов от твердых нерастворимых загрязнений.Стенд для промывки трубчатых теплообменников и трубопроводов содержит бак, насос, манометр, переливной клапан, расходомеры, обратные клапаны, прозрачную вставку, баллон, фильтр, распределитель, регулируемые дроссели, насос с ручной регулировкой производительности и переливной клапан, дополнительно он снабжен автономной системой охлаждения моющей жидкости и блоком фильтрации, содержащим датчик перепада давления и фильтры грубой и тонкой очистки.Технический результат заключается в расширении функциональных возможностей стенда для промывки широкой номенклатуры по внутренним диаметрам. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 177 095 U1 (51) МПК B08B 9/02 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ПОЛЕЗНОЙ МОДЕЛИ К ПАТЕНТУ (52) СПК B08B 9/02 (2006.01); B08B 3/02 (2006.01); B08B 5/02 (2006.01); B08B 3/04 (2006.01) (21)(22) Заявка: 2017126395, 21.07.2017 (24) Дата начала отсчета срока действия патента: 08.02.2018 Приоритет(ы): (22) Дата подачи заявки: 21.07.2017 (56) Список документов, цитированных в отчете о поиске: SU 902878 A1, 07.02.1982. SU (45) Опубликовано: 08.02.2018 Бюл. № 4 (54) Стенд для промывки трубчатых теплообменников и трубопроводов (57) Реферат: Полезная модель относится к гидроприводам регулируемые дроссели, насос с ручной различных отраслей промышленности, в регулировкой производительности и переливной частности для промывки трубчатых клапан, дополнительно он снабжен автономной теплообменников и трубопроводов от твердых системой охлаждения моющей жидкости и блоком нерастворимых загрязнений. фильтрации, содержащим датчик перепада Стенд для промывки трубчатых давления и фильтры грубой и тонкой очистки. теплообменников и трубопроводов содержит бак, Технический результат заключается в насос, манометр, переливной клапан, расширении функциональных ...

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03-07-2018 дата публикации

Устройство для очистки осевого компрессора газотурбинной установки

Номер: RU0000180997U1

Полезная модель относится к газовой промышленности, в частности к компрессорным станциям магистрального газопровода, и может быть использована в межэксплуатационный период для очистки проточной части осевого компрессора газотурбинной установки газоперекачивающего агрегата. Техническим результатом предлагаемой полезной модели является повышение качества очистки проточной части осевого компрессора в динамических условиях, снижение эксплуатационных затрат за счет использования более эффективных и менее затратных отечественных реагентов, оздоровление экологической обстановки вокруг КС за счет использования в рецептуре промывочной жидкости веществ, активно диссоциирующих на ионы и, следовательно, легко утилизируемых после промывки по стандартной действующей в газовой отрасли технологии. Технический результат достигается тем, что в действующей схеме газотурбинной установки осуществляют монтаж циркуляционной промывочной установки, состоящей из бака, в котором производят перемешивание химических реагентов, циркуляционного насоса, индукционного нагревателя, трубопроводов, запорно-регулирующей, предохранительной и трубопроводной арматур, в качестве промывочной жидкости используют водный раствор тетранатриевой соли этилендиаминтетрауксусной кислоты (7% масс.), нашатырного спирта (2% масс.) и гидрооксида натрия (1% масс.). 3 ил. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 180 997 U1 (51) МПК B08B 3/08 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ПОЛЕЗНОЙ МОДЕЛИ К ПАТЕНТУ (52) СПК B08B 3/00 (2006.01); B08B 3/08 (2006.01); F02C 7/30 (2006.01) (21)(22) Заявка: 2017114036, 21.04.2017 (24) Дата начала отсчета срока действия патента: Дата регистрации: 03.07.2018 (45) Опубликовано: 03.07.2018 Бюл. № 19 Адрес для переписки: 450054, г. Уфа, ул. Р. Зорге, 59, Технический отдел ООО "Газпром трансгаз Уфа" (73) Патентообладатель(и): ОБЩЕСТВО С ОГРАНИЧЕННОЙ ОТВЕТСТВЕННОСТЬЮ "ГАЗПРОМ ТРАНСГАЗ УФА" (RU) (56) Список документов, цитированных в отчете о поиске: RU ...

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16-03-2020 дата публикации

Стенд для мойки деталей и промывки масляных каналов коленчатых валов двигателей

Номер: RU0000196799U1

Полезная модель относится к области машиностроения, может быть применена для чистки изделий, в том числе масляных каналов коленчатых валов с использованием энергии давления струи, и предназначена для мойки деталей и узлов машин. Стенд для мойки деталей и промывки масляных каналов коленчатых валов двигателей состоит из рамы стенда, рукава высокого давления для подключения к аппарату высокого давления, накопительной емкости, сливного крана накопительной емкости, подвесной регулируемой рамы накопительной емкости, дыхательного клапана, мойки стенда, устройства для промывки масляных каналов коленчатых валов, защитного экрана, пистолета высокого давления с гибким резиновым насадком высокого давления и опор стенда, кроме того, непосредственно в мойке стенда предусмотрено устройство для промывки масляных каналов коленчатых валов, которое состоит из штуцера для подключения рукава высокого давления, емкости высокого давления; направляющих стоек, передвижных опорных стоек с обрезиненными маслостойкими поверхностями и крепежных опор с отверстиями под крепления. Стенд для мойки деталей и промывки масляных каналов коленчатых валов двигателей внутреннего сгорания тракторов, легковых и грузовых автомобилей, а также мойки различных малогабаритных деталей и узлов предназначен для авторемонтных предприятий, станций технического обслуживания и автосервисов специализирующихся на ремонте машин. 3 ил. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 196 799 U1 (51) МПК B08B 3/04 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ПОЛЕЗНОЙ МОДЕЛИ К ПАТЕНТУ (52) СПК B08B 3/026 (2019.08); B08B 3/04 (2019.08); B08B 13/00 (2019.08) (21)(22) Заявка: 2019138654, 28.11.2019 (24) Дата начала отсчета срока действия патента: Дата регистрации: Приоритет(ы): (22) Дата подачи заявки: 28.11.2019 (45) Опубликовано: 16.03.2020 Бюл. № 8 1 9 6 7 9 9 R U (56) Список документов, цитированных в отчете о поиске: CN 206794239 U, 26.12.2017. SU 1558519 A1, 23.04.1990. RU 2046686 C1, 27.10.1995. CN ...

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22-03-2022 дата публикации

Контейнер для пропарки очистных устройств трубопровода

Номер: RU0000209750U1

Полезная модель относится к области очистки объектов техники и предназначена для пропарки очистных устройств от продуктов поршневания магистральных конденсатопродуктопроводов. Контейнер для пропарки очистных устройств трубопровода включает установленный на опору корпус с крышкой, на внутренних боковых сторонах которого размещены узлы крепления очистного устройства, выполненные с возможностью обеспечения его вращательного движения. По длине контейнера смонтирован коллектор с соплами подачи пара. Причем узел крепления головной части очистного устройства состоит из планшайбы, вала с подшипниковым узлом и ручки прокрутки, а противоположный узел крепления включает прижимной шпиндель, маховик, рычаг блокировки вращения шпинделя, на котором смонтировано конусное фиксирующее устройство. В нижней части корпуса смонтирован патрубок. Техническим результатом является обеспечение безопасных условий выполнения работ с одновременным повышением производительности, исключения загрязнения окружающей среды, обеспечение простоты эксплуатации контейнера. 1 з.п. ф-лы, 1 ил. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 209 750 U1 (51) МПК B08B 3/02 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ПОЛЕЗНОЙ МОДЕЛИ К ПАТЕНТУ (52) СПК B08B 3/02 (2021.08) (21)(22) Заявка: 2021110818, 16.04.2021 (24) Дата начала отсчета срока действия патента: (73) Патентообладатель(и): Общество с ограниченной ответственностью «Газпром добыча Оренбург» (RU) Дата регистрации: 22.03.2022 (56) Список документов, цитированных в отчете о поиске: RU 173821 U1, 13.09.2017. RU 126268 U1, 27.03.2013. RU 2556113 C1, 10.07.2015. JP 2005040773 A, 17.02.2005. (45) Опубликовано: 22.03.2022 Бюл. № 9 2 0 9 7 5 0 R U (54) КОНТЕЙНЕР ДЛЯ ПРОПАРКИ ОЧИСТНЫХ УСТРОЙСТВ ТРУБОПРОВОДА (57) Реферат: Полезная модель относится к области очистки состоит из планшайбы, вала с подшипниковым объектов техники и предназначена для пропарки узлом и ручки прокрутки, а противоположный очистных устройств от продуктов поршневания ...

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26-01-2012 дата публикации

Idle down control for a pressure washer

Номер: US20120020809A1
Автор: Richard J. Gilpatrick
Принадлежит: Individual

A method of controlling the speed of an engine includes positioning a throttle at an operating position between an idle position that reduces the engine speed to an idle speed, and a normal speed position at which the engine runs at a speed greater than the idle speed, collecting a fluid within a manifold, sensing a pressure within the manifold, and adjusting the operating position of the throttle in response to the sensed pressure. When the sensed pressure is low, the throttle is moved toward the idle position and when the pressure is high, the throttle is moved toward the normal speed position. The method further includes positioning an unloader downstream of the manifold, the manifold configured in one of a first position in which the unloader directs fluid from the manifold to the pump, and a second position in which the unloader directs fluid to a point of use.

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01-03-2012 дата публикации

Appliance device with motors responsive to single-phase alternating current input

Номер: US20120048314A1
Принадлежит: Individual

An appliance for washing objects in which is employed a pump system for varying the spray velocity of washing fluid dispensed from spray jets affixed at an angle relative to a spray arm. In one embodiment, the pump system includes a pump having a pump motor such as a synchronous motor responsive to a variable frequency, single-phase alternating current input. The pump system also includes a pump motor control circuit configured to vary the frequency and voltage of the input, which in one example effectuates changes in the rotational speed of the pump motor in accordance with one or more operational cycles. The pump motor control circuit incorporates in one example a rectifier and an inverter that permits operation of the appliance when coupled to supply mains.

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12-04-2012 дата публикации

Automated monitoring and control of cleaning in a production area

Номер: US20120085369A1
Принадлежит: Individual

An automated process for monitoring and controlling cleaning in a production area comprises tracking or identifying an object the production area, monitoring the movement of fluid in the production area, analyzing the interaction between the object and the fluid to determine a level of cleanliness achieved, and triggering an event based on at least one member selected from the group consisting of: (i) the interaction between the object or body part and the fluid or fluid-like medium and (ii) the level of cleanliness achieved. The event comprises at least one member selected from generating a report, activating an alarm, report, activating an alarm, inactivating equipment in the production area, and blocking access to at least a portion of the production area. The system employing a combination of computer(s), computer vision system(s), RFID tag(s), mechanical and electromechanical, chemical, electrical, or photonic device(s) to conduct the tracking, identifying, monitoring, and triggering.

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26-04-2012 дата публикации

Expeditionary vehicle wash system

Номер: US20120097197A1
Принадлежит: Milspray LLC

A standard military transportation container is positioned next to a waste water containment pad. Several connections are provided for on the side of container . One of these connectors is a fluid connection for containment pad relocatable waste water sump pump. Another of the connectors provides a power outlet for the system to be connected to an external source of electrical power. A third connector connects a pressure washer to the wash system. A vacuum cleaner connection, is provided on an opposite side of the container so that equipment may be vacuumed and washed simultaneously on opposite sides of the wash system. All connectors are flush mounted into the walls of container thus eliminating any protrusions which could otherwise interfere with container loading resulting in connector breakage and extra difficulties in container handling. A pressure washer, vacuum cleaner, pumps and electrical controls are located in the container. Several filter stages are provided in the container to enable re-use of wash water collected in the containment pad.

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21-06-2012 дата публикации

Wafer cleaning apparatus and wafer cleaning method using the same

Номер: US20120152276A1
Принадлежит: APET

The object of the present invention is to provide a wafer cleaning apparatus that reduces the amount of dissolved oxygen, without using hydrogen peroxide, to be able to reduce the deformation, etc. of a wafer and to reduce silicon consumption and a wafer cleaning method using the same. The present invention provides a wafer cleaning apparatus comprising: a first thin film contactor that receives drug solution for removing an oxide film or ultra pure water to separate and discharge gas dissolved in the drug solution for removing the oxide film or the ultra pure water; a second thin film contactor that receives the drug solution for removing the oxide film or the ultra pure water discharged from the first thin film contactor; a vacuum pump that discharges gas separated in the first and second thin film contactors to the outside; and a process vessel that stores the drug solution for removing the oxide film or the ultra pure water discharged from the second thin film contactor, and a wafer cleaning method using the same.

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26-07-2012 дата публикации

Centrifugal compressor and washing method

Номер: US20120186605A1
Автор: Akihiro Nakaniwa

The centrifugal compressor is provided with a casing, a rotating shaft which is supported inside the casing, an impeller which is arranged on the rotating shaft and rotates to compress a fluid, and a washing liquid injection device which injects a washing liquid into a flow path formed by the impeller and the casing. The washing liquid injection device is provided with a plurality of nozzles which are arranged along a circumferential direction of the rotating shaft to inject the washing liquid into the flow path and a plurality of chambers which communicate with each corresponding nozzle among the plurality of nozzles and supply the washing liquid to the corresponding nozzle.

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30-08-2012 дата публикации

Method for Washing and Sanitizing Articles for an Infant

Номер: US20120216838A1
Принадлежит: HILLSBOROUGH BAY GROUP LLC

Disclosed is a portable and self contained washing and sanitizing apparatus. The apparatus finds particular application in washing small baby items such as bottles, nipples, teething rings or toys. The apparatus includes three primary components: a container for housing the items to be washed; a water reservoir for storing and collecting wash water; and a housing for interconnecting the container and reservoir.

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01-11-2012 дата публикации

System and Method of Cleaning and Sanitizing a Tea Brewing/Dispensing System

Номер: US20120273012A1
Автор: Barry L. Wilson
Принадлежит: Safe Chem Inc

A technique for cleaning a tea concentrate brewing mechanism including heat exchanger tubing and concentrate receptacles employs a safe and effective aqueous chlorine dioxide solution. A chemical dispensing unit employs a venturi body that mixes a sodium chlorite sanitizer with a weak-acid activator injected into the water flow. Preset water-flow rate metering regulation draws in equal amounts of sanitizer and activator. The chemicals are made up in respective concentrations so that the same volume is required of each one. The cleansing solution may be flowed through the brewing mechanism or sprayed on surfaces to be cleaned.

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06-12-2012 дата публикации

Parallel single substrate processing system

Номер: US20120308344A1
Автор: Arthur Keigler
Принадлежит: Individual

A system for fluid processing substrate surfaces arrayed in a fluid having a process section with a frame having a plurality of process elements to process the substrate surfaces without contacting the substrate surfaces; and a substrate holder assembly having a number of substrate holders and configured for transporting substrates as a unit. The substrate holder assembly and each of the substrate holders are configured for removable coupling to the process section frame, each substrate holder configured to hold at least one of the substrates. The process section frame has alignment features disposed so that, on coupling of the substrate holder assembly with the process section frame, the alignment features interface with each substrate holder of the substrate holder assembly and locate each substrate holder in repeatable alignment, at corresponding coupling of each substrate holder and the process section frame, with respect to a predetermined feature of the process section.

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06-12-2012 дата публикации

Parallel single substrate processing system loader

Номер: US20120308346A1
Принадлежит: Tel Nexx Inc

A substrate unload and load apparatus adapted to unload and load a plurality of processed substrates from a plurality of arrayed substrate holders, the apparatus having a frame and a plurality of processed substrate supports coupled to the frame configured to support the processed substrates. A plurality of unprocessed substrate supports is coupled to the frame configured to support the unprocessed substrates, each of the unprocessed substrate supports alternating and interleaved with each of the processed substrate supports. A holder release is coupled to the frame and configured to engage the arrayed substrate holders having a first state where the arrayed substrate holders releases the processed substrates from the arrayed substrate holders, the holder release having a second state where the arrayed substrate holders captures the unprocessed substrates with arrayed substrate holders.

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20-12-2012 дата публикации

Instrument and Method for Clinical Examinations and Cleaning Method Therefor

Номер: US20120318302A1
Автор: Yoshiyuki Nakayama
Принадлежит: Jeol Ltd

An automated clinical analyzer and method is offered which can clean the nozzles of a reaction cuvette wash unit. A first detergent is put in first reagent containers located on a first reagent turntable. A computer controller drives a first reagent pipette to aspirate the detergent from the first reagent containers and to deliver the detergent into reaction cuvettes. The controller drives a reaction turntable to bring each reaction cuvette holding the detergent therein to the reaction cuvette wash unit. The controller drives the reaction cuvette wash unit to aspirate the detergent from inside the reaction cuvettes using reaction cuvette wash nozzles to thereby clean the wash nozzles. A second detergent is then used to clean the nozzles.

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24-01-2013 дата публикации

Bioremediation device

Номер: US20130019908A1
Автор: Jacques St-Pierre
Принадлежит: Individual

A bioremediation device ( 10 ) for degrading hydrocarbons on components, the bioremediation device having a housing ( 18 ), a basin ( 28 ) partially seating within the housing with the basin ( 28 ) including an upper condensation chamber ( 39 ) to permit vapour from a lower basin portion ( 35 ) to enter and to condense to be returned to the lower basin portion ( 37 ). A control module ( 46 ) is immersed in the lower basin portion ( 37 ) and has a heater ( 52 ), a pump ( 56,76 ), a filter ( 74 ) and a valve ( 58 ) for directing fluid either to the filter ( 74 ) or to an aeration device ( 44 ).

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28-02-2013 дата публикации

Control technique for multistep washing process using a plurality of chemicals

Номер: US20130048024A1
Автор: Tuomas Pahlman
Принадлежит: TAMPEREEN TEOLLISUUSSÄHKÖ OY

Equipment and method for a system implementing a multistep washing process, with a chemical container ( 110 A- 110 D) for each chemical ( 111 A- 111 D) and means for conveying one chemical at a time from the container through a feed channel ( 120 ) to a washing object ( 100 ) and from the washing object through a return channel ( 130 ) back to the container. First and second sensors ( 122, 132 ) monitor a first parameter set in the feed channel ( 120 ) and a second parameter set in the return channel ( 130 ), respectively. Both parameter sets include parameter(s) indicating the purity of the chemical. A control center ( 150 ) includes calculation means ( 153 ) arranged to determine the mutual uniformity of the first and second monitored parameter sets. Action time of the chemical is determined on the basis of the mutual uniformity of the first and the second monitored parameter sets.

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28-02-2013 дата публикации

Liquid processing apparatus, liquid processing method and storage medium

Номер: US20130048609A1
Принадлежит: Tokyo Electron Ltd

Disclosed are a liquid processing apparatus and a liquid processing method. The liquid processing apparatus includes an ejection port ejecting a first liquid to a wafer, a first liquid supply mechanism supplying sulphuric acid to the ejection port, and a second liquid supply mechanism supplying hydrogen peroxide solution to the ejection port. The first liquid supply mechanism includes a first temperature adjustment mechanism maintaining the first liquid heated to a first temperature, a second temperature adjustment mechanism connected to the first temperature adjustment mechanism, and an ejection line connecting the second temperature adjustment mechanism with the ejection port. The second temperature adjustment mechanism includes a second circulation line and a second heater. The ejection line connects the second circulation line through a switching valve at a location further downstream than the second heater.

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14-03-2013 дата публикации

NOVEL CLEANING METHOD

Номер: US20130061404A1
Автор: Jenkins Stephen Derek
Принадлежит: XEROS LIMITED

The invention provides a method for cleaning a soiled substrate, the method comprising the treatment of the moistened substrate with a formulation comprising a multiplicity of polymeric particles, wherein the polymeric particles are applied in combination with a detergent formulation, the method being characterised in that the detergent formulation is divided into its sepcrate chemical constituents and these chemical constituents are added at different times during the wash cycle. The method allows for improved cleaning with reduced overall chemical loading, and facilitates addition of the more expensive parts of the formulations when they are most effective for cleaning performance, thereby providing considerable cost savings in comparison with conventional all-in-one detergent formulations. A method for cleaning the polymeric particles is also provided. 137-. (canceled)38. A method for cleaning a soiled substrate , said method comprising the treatment of the moistened substrate with a formulation comprising a multiplicity of polymeric particles , wherein said polymeric particles are applied in combination with a detergent formulation , characterised in that said detergent formulation is divided into its separate chemical constituents and said chemical constituents are added at different times during the wash cycle.39. A method as claimed in wherein the cleaning parts of the formulation are added before or during the main wash cycle and the remaining parts of the formulation are added as a post-treatment following removal of the polymeric particles from the wash process.40. A method as claimed in wherein the cleaning components comprise at least one component selected from surfactants claim 38 , enzymes claim 38 , oxidising agents and bleaches claim 38 , wherein said surfactants are optionally selected from non-ionic and/or anionic and/or cationic surfactants and/or ampholytic and/or zwitterionic and/or semi-polar nonionic surfactants claim 38 , said enzymes are ...

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14-03-2013 дата публикации

HIGH THROUGHPUT PROCESSING SYSTEM FOR CHEMICAL TREATMENT AND THERMAL TREATMENT AND METHOD OF OPERATING

Номер: US20130061878A1
Принадлежит: TOKYO ELECTRON LIMITED

A high throughput processing system having a chemical treatment system and a thermal treatment system for processing a plurality of substrates is described. The chemical treatment system is configured to chemically treat a plurality of substrates in a dry, non-plasma environment. The thermal treatment system is configured to thermally treat a plurality of substrates chemically treated in the chemical treatment system. 1. A method of operating a processing system to treat a substrate , comprising:transferring two or more substrates into a chemical treatment system comprising a chemical treatment chamber, a temperature controlled substrate holder mounted within said chemical treatment chamber and configured to support two or more substrates on a support surface thereof, a gas injection assembly coupled to said chemical treatment chamber and configured to introduce one or more process gases to a process space in said chemical treatment chamber in order to chemically alter exposed surface layers on said two or more substrates, a heater assembly coupled to said gas injection assembly and configured to elevate a temperature of said gas injection assembly, a vacuum pumping system, and a controller coupled to said thermal treatment system;setting chemical processing parameters for said chemical treatment system using said controller, wherein said one or more chemical processing parameters comprise at least one of a chemical treatment processing pressure, a chemical treatment chamber temperature, a chemical treatment upper assembly temperature, a flow rate of said one or more process gases, a chemical treatment substrate temperature, and a chemical treatment substrate holder temperature; andprocessing said two or more substrates in said chemical treatment system using said chemical processing parameters in order to chemically alter exposed surface layers on said two or more substrates.2. The method according to claim 1 , further comprising:transferring said two or more ...

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14-03-2013 дата публикации

Continual Flow Pin Washer

Номер: US20130061880A1
Принадлежит: Aushon Biosystems

A multi-chambered deposition pin wash station is provided. The wash station includes a lower chamber and an upper drain basin connected by a plurality of wash tubes. Cleaning fluid is provided to the lower chamber and passes through the cleaning tubes into the upper drain basin. The cleaning tubes are adapted to clean a single deposition pin with a single tube per wash cycle. 1. A method of cleaning a plurality of deposition pins in a system with a lower chamber; a drain basin; a plurality of cleaning tubes , each cleaning tube having an inlet end and an outlet end , each tube inlet end being in fluid communication with the lower chamber , each tube outlet end being in fluid communication with the drain basin , and each tube outlet end adapted to receive at least a portion of one of the deposition pins; and a vent tube , the vent tube having an inlet end and an outlet end , the inlet end being disposed in and in fluid communication with the lower chamber , the terminus of the vent tube inlet end being above the level of the cleaning tube inlet ends relative to a substantially horizontal reference plane , and the outlet end being in direct fluid communication with the drain basin , the method comprising:providing a cleaning fluid into the lower chamber to a level above the outlet ends of each cleaning tube so that vapor within the lower chamber is displaced by the cleaning fluid, and continuing to provide the cleaning fluid so that vapor remaining in the lower chamber is compressed and the cleaning fluid flows upward through the cleaning tubes; anddisposing at least a portion of a single one of the deposition pins in the tube outlet end of one of the cleaning tubes while the cleaning fluid flows through the cleaning tubes so that the pin is washed within the tube.2. The method of claim 1 , wherein at least one of the plurality of cleaning tubes includes a flow restriction feature and the disposing the deposition pin in the tube outlet end includes disposing a ...

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21-03-2013 дата публикации

METHOD OF CLEANING ELECTRONIC MATERIAL AND CLEANING SYSTEM

Номер: US20130068260A1
Принадлежит: Kurita Water Industries ltd

An electronic material cleaning system includes a chemical cleaning means, a wet cleaning means and a single-wafer cleaning apparatus. The chemical cleaning means comprises a functional chemical storage tank and an electrolytic reaction apparatus connected to the functional chemical storage tank via a concentrated sulfuric acid electrolysis line. The functional chemical storage tank can supply a functional chemical to the single-wafer cleaning apparatus via a functional chemical supply line. The wet cleaning means comprises a pure water supply line, a nitrogen gas supply line connected to a nitrogen gas source and an internal mixing type two-fluid nozzle connected respectively to the pure water supply line and the nitrogen gas supply line. Droplets generated from a nitrogen gas and ultrapure water can be sprayed from the tip of the two-fluid nozzle. 1. An electronic material cleaning method , comprising:a chemical cleaning step for bringing a functional chemical obtained by electrolyzing sulfuric acid into contact with an electronic material; anda wet cleaning step for bringing a jet flow of droplets generated from a gas and a liquid into contact with the electronic material.2. The electronic material cleaning method according to claim 1 , wherein the functional chemical brought to contact with the electronic material is collected claim 1 , electrolyzed again and reused.3. The electronic material cleaning method according to claim 1 , wherein the functional chemical in a state of being heated to 100 to 200° C. is brought to contact with the electronic material.4. The electronic material cleaning method according to claim 1 , wherein a sulfuric acid concentration in the functional chemical is 80 to 96 wt %.5. The electronic material cleaning method according to claim 1 , wherein:at least an anode of electrodes used for electrolyzing the sulfuric acid is a conductive diamond electrode; andthe functional chemical contains persulfate generated by an oxidation reaction ...

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21-03-2013 дата публикации

Method For The Treatment Of A Semiconductor Wafer

Номер: US20130068262A1
Принадлежит: SILTRONIC AG

Semiconductor wafers are treated in a liquid container filled at least partly with a solution containing hydrogen fluoride, such that surface oxide dissolves, are transported out of the solution along a transport direction and dried, and are then treated with an ozone-containing gas to oxidize the surface of the semiconductor wafer, wherein part of the semiconductor wafer surface comes into contact with the ozone-containing gas while another part of the surface is still in contact with the solution, and wherein the solution and the ozone-containing gas are spatially separated such that they do not come into contact with one another. 2. The method of claim 1 , wherein drying of the wafer is assisted by an inert gas fed via one or more nozzles in a flow directed to the surface of the semiconductor wafer.3. The method of claim 2 , wherein the one or more nozzles comprise a slot nozzle.4. The method of claim 2 , wherein the nozzles create a partition of inert gas which prevents the gas comprising ozone from contacting the solution.5. The method of claim 1 , wherein the container has an entrance slot for receiving a semiconductor wafer and an exit slot through which the semiconductor wafer is transported out of the container claim 1 , wherein the level of the solution within the container is higher than the entrance and exit slots of the container such that the wafer or portions thereof which are within the container are fully immersed in the liquid while the wafer or portions thereof are within the container.6. The method of claim 5 , wherein transporting of the wafer from the container takes place in a transport direction claim 5 , and drying of the wafer is assisted by a flow of inert gas directed at the wafer surface claim 5 , at an angle of from 90° to the surface to 180° from the surface and toward the exit slot.7. The method of claim 5 , wherein the gas comprising ozone is directed toward the wafer at an angle of 90° to 0° relative to the transport direction claim ...

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28-03-2013 дата публикации

INDUSTRIAL CLEANING SYSTEM AND METHODS RELATED THERETO

Номер: US20130074880A1
Принадлежит:

Embodiments of the invention relate to an industrial cleaning system and related methods. The system and methods utilize propelled media to clean equipment and facilities. 1. A method of cleaning , comprising:propelling a sublimable media in a first direction through a discharge wand having an operator held end and a discharge end;inserting the discharge end of the wand into coils of a boiler;impinging on an inner surface and an outer surface of a coil of the boiler with the sublimable media, wherein the sublimable media exits the discharge end of the wand in at least one second direction different from the first direction; andwherein the media subsequently dissipates or is consumed.2. The method of claim 1 , wherein the discharge end of the wand comprises a nozzle with an angle between the first direction and the second direction of about 45 to about 85.3. The method of claim 1 , wherein the media comprises carbon dioxide pellets or liquid nitrogen.4. The method of claim 1 , wherein the object comprises biofuel production equipment.5. The method of claim 1 , wherein the discharge wand is straight and at least three feet long.6. The method of claim 1 , wherein the coils comprise tubes in a biofuel production plant dryer.7. The method of claim 1 , wherein propelling comprises transferring the media with a transfer gas.8. The method of claim 7 , wherein the transfer gas comprises air.9. The method of claim 1 , wherein contacting comprises the sublimable media physically contacting residue or debris in contact with the surfaces.10. The method of claim 1 , wherein contacting comprises the media sublimating upon contact with the surfaces or residue in contact with the surfaces.11. A cleaning system claim 1 , comprising:media source, for storing and providing a media;a discharge wand;a propellant, for moving the media from the source to the discharge wand; and a body;', 'an end, positioned on the distal end of the body; and', 'a discharging orifice;', 'wherein the ...

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28-03-2013 дата публикации

DEVICE FOR CLEANING RESPIRATORS

Номер: US20130074882A1
Принадлежит: Meiko Maschinenbau GmbH & Co. KG

A cleaning device for cleaning respirators, in particular breathing regulators and/or breathing masks, is proposed. The cleaning device comprises at least one cleaning chamber for receiving at least one respirator. The cleaning device also has at least one fluid device for applying at least one cleaning fluid to the respirator. The cleaning device also has at least one pressure application device with at least one pressure connection. The pressure connection can be connected to at least one gas carrying element of the respirator. The pressure application device is set up for applying pressurized gas to the gas carrying element. 1. A cleaning device for cleaning respirators , comprising;a cleaning chamber for receiving a respirator;a fluid device for applying a cleaning fluid to the respirator;a pressure application device with a pressure connection, the pressure connection being connectable to a gas carrying element of the respirator and being configured for applying pressurized gas to the gas carrying element.2. The cleaning device of claim 1 , wherein the pressure connection comprises a positive and/or non-positive connecting element configured to establish a mechanical connection to the respirator.3. The cleaning device of claim 1 , wherein the pressure connection has a plurality of different adapters for connection to different types of gas carrying elements.4. The cleaning device of claim 1 , wherein the pressure application device has an external pressure connection for connection to an external pressurized gas source.5. The cleaning device of claim 1 , wherein the pressure application device has a pressurized gas source integrated into the cleaning device.6. The cleaning device of claim 1 , further comprising a holder for receiving the respirator that can be introduced into the cleaning chamber.7. The cleaning device of claim 6 , wherein the holder is removable.8. The cleaning device of claim 6 , wherein the holder is configured to align the respirator ...

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28-03-2013 дата публикации

HIGH-PRESSURE CLEANING APPLIANCE

Номер: US20130074883A1
Принадлежит: Alfred Kaercher GmbH & Co. KG

The invention relates to a high-pressure cleaning appliance comprising a first functional device required for operation in the form of a heatable heat exchanger for heating a liquid that is dischargeable from the high pressure cleaning appliance, and at least one further, second functional device required for operation which is arranged below the heat exchanger. In order to develop such a high-pressure cleaning appliance such that it is more user friendly to maintain, the invention proposes that the high-pressure cleaning appliance comprise a first appliance unit having a carrying device on which the heat exchanger is held, and a second appliance unit having a support device on which the at least one second functional device is held, and that the carrying device be releasably connectable to the support device in a force-locked and/or positively-locked manner. 1. High-pressure cleaning appliance comprising a first functional device required for operation in the form of a heatable heat exchanger for heating a liquid that is dischargeable from the high pressure cleaning appliance , and at least one further , second functional device required for operation which is arranged below the heat exchanger , wherein the high-pressure cleaning appliance comprises a first appliance unit having a carrying device on which the heat exchanger is held , and a second appliance unit having a support device on which the at least one second functional device is held , and wherein the carrying device is releasably connectable to the support device in at least one of a force-locked and positively-locked manner.2. High-pressure cleaning appliance in accordance with claim 1 , wherein the at least one second functional device is configured as at least one of a pump set for increasing the liquid pressure claim 1 , and a motor for the pump set claim 1 , and claim 1 , where applicable claim 1 , as a fan for generating a flow of air cooling the motor claim 1 , and a blower wheel for generating a ...

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28-03-2013 дата публикации

CLEANING SUBSTRATE FOR A LITHOGRAPHY APPARATUS, A CLEANING METHOD FOR A LITHOGRAPHY APPARATUS AND A LITHOGRAPHY APPARATUS

Номер: US20130077065A1
Принадлежит:

A method and apparatus to clean a cover to seal a gap between an object located in a recess of a table and the upper surface of the table outside of the recess. In-line and off-line arrangements are disclosed. Cleaning can be carried out using abrasion, UV radiation or flushing with a cleaning fluid for example. 1. A cleaning method for a lithography apparatus , wherein the lithography apparatus comprises:a table having an upper surface and a recess in the upper surface that is configured to receive and support an object;a fluid handling structure configured to supply and confine immersion fluid to a space adjacent to the upper surface of the table and/or an object located in the recess; anda cover comprising a planar body that, in use, extends around the object from the upper surface at an edge of the recess to a peripheral section of an upper major face of the object in order to cover a gap between an edge of the recess and the edge of the object, wherein the method comprises:cleaning a surface of the cover.2. The method according to claim 1 , wherein the cleaning substrate comprises a base layer having a structure formed on a surface thereof.3. The method according to claim 2 , wherein the structure comprises an enclosed region formed within the base layer or on top of the base layer claim 2 , and the base layer is in the form of a disk and an outer edge of the enclosed region forms a partially or completely closed path surrounding the disk axis.4. The method according to claim 3 , wherein an outer edge of the enclosed region follows the edge of the cleaning substrate at a substantially constant distance therefrom.5. The method according to claim 1 , wherein the cleaning substrate comprises a base layer having a porous or adhesive film formed on a surface thereof.6. The method according to claim 1 , wherein the cleaning substrate is a plain silicon wafer without added structure or a coating.7. The method according to claim 1 , wherein the cover is configured to ...

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04-04-2013 дата публикации

Portable Pressure Washer System

Номер: US20130082118A1
Автор: Christine Stepflug
Принадлежит: Individual

A portable pressure washer comprising: a tank, where the tank stores water used in conjunction with the pressure washer; a hose, where the hose is connected the tank at a connection end provides the transfer of pressurized water from the tank; a nozzle, where the nozzle attaches to a emission end of the hose; and a convertible power supply, where the power supply provides at least two forms of a power source. The power supply may include a cord and a connector. In one particular embodiment, the connector is an AC/DC converter. The power supply may also include a battery pack.

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18-04-2013 дата публикации

Pressure spray washer and control

Номер: US20130092745A1
Автор: Brian G. Karp
Принадлежит: Champion Power Equipment Inc

A method and apparatus is provided for starting and stopping a high pressure spray washer having a combustion engine driving a pump to provide high pressure fluid to a spray gun activated by a trigger. Pulling the trigger causes water to flow through the nozzle and pump and a sensor by the pump sends a flow start signal to a control module that activates an electric starter when an engine switch is turned on, thus starting the engine when it wasn't running. When the trigger is released flow to the pump stops and the sensor sends a flow stop signal to the control module. If a predetermined time passes before the sensor detects fluid flow to the pump as occurs when the trigger is pulled, then the engine is shut off. The time can be varied to adjust the time between releasing the trigger and shutting off the engine.

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18-04-2013 дата публикации

Fish and Game Washer

Номер: US20130093107A1
Автор: Funderburg Roland
Принадлежит:

It is designed to wash and clean meat. When meat is put in a 5 gallon bucket and water source connected and turned on. Air is sucked in to mix with water. This makes the meat float up from the bottom and begin to toss and tumble, which takes loose scales, feathers, blood and debris over the top of bucket. This leaves the meat clean in 5 to 15 minutes, depending on the load. Therefore you don't have to mess up kitchen sink. It is good for washing other things, including fruits in vegetables. 1. It will wash fish and game more effectively and faster.2. It can be used as a power washer , with or without soap.3. It may also be used as an aerator to keep fish alive.4. It can be used to wash other things like vegetables. Washes and cleans fish and game.When meat is put in bucket, the air bubbles making the meat toss and tumble and swirl in water.My invention takes the loose feathers off of game birds (dove, quail, etc.) and loose hair of off squirrels and rabbits. Removes loose scales off of fish. Also removes some grease plus debris and blood in five to fifteen minutes.Yes, have never seen one.Please refer to the drawings at the end of this example for a key to the reference numbers.It is designed to force water through nozzle. Water/air nozzle can be made up of plastic, iron, brass, aluminum, stainless steel. I am using plastic ½ inch with Number (connector) being a ¾ inch female screwed through a Number (5 gallon bucket or container) with ¾ inch hole in it. With Number (gasket) Number (45 degree connector) ¾ inch male screwed on to Number (connector) ¾ inch female. The length of this is 7 inches long, could be made shorter, longer or of different sizes.It can be made of plastic, stainless steel, brass, nylon. It can be made permanent or changeable. I am using 13/64 inch in first jet and second jet ⅜ inch, could be used bigger smaller.1jet Number (jet and nozzle) is 13/64 inch to reduce jet water flow for Number (fish and game washer). Nozzle Number (air sucking device) ...

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25-04-2013 дата публикации

WASHING METHOD AND APPARATUS FOR USE THEREIN

Номер: US20130098408A1
Принадлежит:

A method of washing an object to be processed, using water containing at least either one selected from a hydrogen radical and a carbon radical, and a novel method capable of exerting sufficient washing effect without using chemicals, by a washing apparatus () having a processing bath () for washing an object to be processed, and a means for supplying the processing bath () with water containing at least either one selected from a hydrogen radical and a carbon radical, and an apparatus for the novel method are provided. 1. A washing apparatus comprising:a processing bath for washing an object to be processed, anda means for supplying said processing bath with water containing at least either one selected from the group consisting of a hydrogen radical and a carbon radical.2. The apparatus according to claim 1 , wherein said means for supplying water containing at least either one selected from the group consisting of a hydrogen radical and a carbon radical has a means for supplying water containing a water-soluble organic substance and a means for causing generation of a hydroxyl radical in the water containing a water-soluble organic substance.3. The apparatus according to claim 1 , wherein said means for supplying water containing at least either one selected from the group consisting of a hydrogen radical and a carbon radical has a means for mixing gas containing at least either one selected from the group consisting of a hydrogen atom and a carbon atom into water claim 1 , and a means for causing generation of a hydroxyl radical in water mixed with the gas.4. The apparatus according to claim 1 , further comprising a shower head having a means for supplying water containing a water-soluble organic substance or water mixed with gas containing at least either one selected from the group consisting of a hydrogen atom and a carbon atom and generating said hydroxyl radical in the water claim 1 , wherein water containing at least either one selected from the group ...

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02-05-2013 дата публикации

Mixed Acid Cleaning Assemblies

Номер: US20130104942A1
Принадлежит: Lam Research Corp

In one embodiment, a cleaning assembly may include a modular electrode sealing housing, an acid injection inlet, and a fluid injection inlet. The modular electrode sealing housing may include a high pressure closure member that contains a first cleaning volume and a low pressure closure member that contains a second cleaning volume. The acid injection inlet can be in fluid communication with the first cleaning volume of the high pressure closure member. The fluid injection inlet can be in fluid communication with the second cleaning volume of the low pressure closure member. During normal operation, a showerhead electrode can be sealed within the modular electrode sealing housing such that the first cleaning volume is located on a first side and the second cleaning volume is located on a second side of the showerhead electrode.

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09-05-2013 дата публикации

Particle Removal Method Using An Aqueous Polyphosphate Solution

Номер: US20130112228A1
Автор: Beck Mark Jonathan
Принадлежит: FONTANA TECHNOLOGY

A method and cleaning solution for cleaning electronic substrates, such as a semiconductor wafers, hard disks, photomasks or imprint molds. The method comprises the steps of contacting a surface of the substrate with a cleaning solution comprised of a polyphosphate, and then removing the cleaning solution from the surface. Additional optional steps include applying acoustic energy to the cleaning solution while the cleaning solution is in contact with the surface, and removing the cleaning solution from the surface by rinsing the surface with a rinsing solution with or without the application of acoustic energy. The cleaning solution comprises a polyphosphate, such as any of the water soluble polyphosphates. Depending on the application, the cleaning solution may also comprise a base and/or a quantity of suspended particles. Complexing agents, amines, biocides, surfactants and/or other substances, may also be added to the cleaning solution. 1. A method for cleaning a hard disk comprising:contacting a surface of a hard disk with a cleaning solution comprised of a polyphosphate, water and a base, with the volume of the water in the cleaning solution exceeding the volume of any other component in the cleaning solution, and the surface of the hard disk having a plurality of submicron particles adhered to the surface; andremoving the cleaning solution from the surface with at least some of the submicron particles being carried away from the surface when the cleaning solution is removed from the surface.2. The method of wherein the concentration of the polyphosphate is in the range of 0.2% to 15% by weight.3. The method of further comprising the steps of:obtaining a concentrated form of the cleaning solution in which the concentration of the polyphosphate is between 0.5% and 200% by weight in the concentrated form; anddiluting the concentrated form of the cleaning solution before contacting the surface of the hard disk substrate with the cleaning solution.4. The method of ...

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09-05-2013 дата публикации

Cleaning System for a Beverage Machine, Preferably a Coffee Machine

Номер: US20130112231A1
Принадлежит: EVERSYS Holding SA

The invention relates to a cleaning system for coffee machines, comprising a cleaning device for periodically cleaning the coffee- and/or milk-carrying components using a cleaning liquid, which contains cleaning agent in the form of balls or tablets dissolved therein, wherein the cleaning device is provided with a time- and/or product-cycle-dependent controller and a metering apparatus () for the cleaning agent () that interacts with the controller. Thus, it is possible to program the cleaning process in a customized manner according to the mode of operation and to carry out the cleaning process fully automatically according to the program. The metering of the cleaning agent () according to the program ensures an always optimal cleaning effect together with sparing use of cleaning agents. Simple and safe handling is achieved by using ball- or tablet-shaped cleaning agents. 11. A cleaning system for a beverage machine , preferably a coffee machine , for producing coffee and drinks containing coffee , milk , milk froth or the like , comprising a cleaning device for periodically cleaning the components coming into contact with the drinks with a cleaning liquid which contains cleaning agent dissolved therein , characterised in that the cleaning device is provided with a time- and/or product-cycle-dependent controller and a metering apparatus () for the cleaning agent that interacts with the controller.2101610. The cleaning system according to claim 1 , characterised in that the cleaning agents () are in the form of balls or tablets claim 1 , and the metering apparatus () is provided with a preferably electronically monitored metering cabinet () which releases the cleaning balls or tablets () by interacting with the time- and/or product-cycle-dependent controller.36818b. The cleaning system according to claim 2 , characterised in that the metering cabinet () is monitored by a light barrier ( claim 2 , ) or a micro-switch.4125799105a,b. The cleaning system according to ...

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16-05-2013 дата публикации

METHOD OF REMOVING OIL FROM A MIXTURE OF TOOL STEEL SWARF GRANULAR MATERIAL AND OIL

Номер: US20130118526A1
Принадлежит:

A method of removing oil from a mixture of tool steel swarf granular material and oil. The abstract of the disclosure is submitted herewith as required by 37 C.F.R. §1.72(b). As stated in 37 C.F.R. §1.72(b): A brief abstract of the technical disclosure in the specification must commence on a separate sheet, preferably following the claims, under the heading “Abstract of the Disclosure.” The purpose of the abstract is to enable the Patent and Trademark Office and the public generally to determine quickly from a cursory inspection the nature and gist of the technical disclosure. The abstract shall not be used for interpreting the scope of the claims. Therefore, any statements made relating to the abstract are not intended to limit the claims in any manner and should not be interpreted as limiting the claims in any manner. 115-. (canceled)16. An industrial method of removing cutting oil from tool steel swarf in an extraction vessel , said method comprising the steps of:(a) opening said extraction vessel and loading said tool steel swarf into said extraction vessel;(b) closing said extraction vessel to seal said tool steel swarf therein;(c) removing at least about 89% by weight of said cutting oil from said tool steel swarf by flowing supercritical carbon dioxide through said tool steel swarf at a pressure of at least about 4300 PSI and at a temperature of at least about 50° C.;(d) separating said tool steel swarf from said supercritical carbon dioxide containing cutting oil; and(e) opening said extraction vessel and removing said tool steel swarf from said extraction vessel.17. The method according to claim 16 , wherein said step (c) comprises removing at least about 89% by weight of said cutting oil from said tool steel swarf essentially solely by flowing supercritical carbon dioxide through said tool steel swarf.18. The method according to claim 16 , wherein said tool steel swarf comprises tungsten carbide.19. The method according to claim 16 , wherein said cutting ...

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16-05-2013 дата публикации

EMULSIONS CONTAINING POLYMERIC CATIONIC EMULSIFIERS, SUBSTANCE AND PROCESS

Номер: US20130118531A1
Принадлежит: The Procter & Gamble Company

The present invention is directed to fabric and/or home care compositions comprising oils and a polymeric cationic emulsifier, the process to obtain said emulsions and the use of said emulsions in fabric and/or home care compositions and the use of said fabric and/or home care compositions. Such fabric and/or home care compositions provide excellent cleaning and/or treatment properties. 2. The composition according to claim 1 , wherein the components of the emulsion independently of each other are present in amounts of:a) oil(s) in an amount of from 5 to 50 weight %,{'sub': x', 'x, 'claim-text': A) one or more monomers A,', 'B) one or more monomers B,', 'C) from 0 to 30 weight % of one or monomers C,, 'b) polymeric cationic emulsifiers Pin an amount of from 0.5 to 30 weight %, wherein Pis the product of the polymerization of'}{'sub': 'x', 'c) surfactant(s) Sin an amount of from 0.1 to 20 weight %,'}{'sub': 'x', 'd) additive(s) Ain an amount of from 0.1 to 15 weight % and'}e) water in an amount of from 30 to 90 weight %,based on the total weight of the emulsion.3. The composition according to claim 1 , wherein the components of the emulsion independently of each other are present in amounts of:a) oil(s) in an amount of from 10 to 40 weight %,{'sub': x', 'x, 'claim-text': A) one or more monomers A,', 'B) one or more monomers B,', 'C) from 0 to 30 weight % of one or more monomers C,, 'b) polymeric cationic emulsifiers Pin an amount of from 0.5 to 15 weight %, wherein Pis the product of the polymerization of'}{'sub': 'x', 'c) surfactant(s) Sin an amount of from 0.1 to 15 weight %,'}{'sub': 'x', 'd) additive(s) Ain an amount of from 1 to 10 weight % and'}e) water in an amount of from 40 to 85 weight %,based on the total weight of the emulsion.4. The composition according to claim 3 , wherein the components of the emulsion independently of each other are present in amounts of:a) oil(s) in an amount of from 15 to 30 weight %,{'sub': x', 'x, 'claim-text': A) one or more ...

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16-05-2013 дата публикации

Two-Soak Wash

Номер: US20130118532A1
Принадлежит: NOVOZYMES A/S

The present invention relates to a method for cleaning an object comprising the steps: (a) distributing to the object a first soak solution comprising at least one surfactant and at least one enzyme followed by a first soak period wherein the concentrations of the at least one surfactant and the at least one enzyme are higher relative to their concentrations in a subsequent wash solution; (b) adding to the object a second soak solution comprising at least one component that is different from any of the components comprised in the soak solution of (a) followed by a second soak period; (c) furthermore adding to the object water to obtain a wash solution followed by a wash period; and (d) rinsing the object; wherein step (b) is conducted either before or after step (c), and wherein said method has a wash performance corresponding to any of (i) a Relative Wash Performance (RWP) of at least 1; (ii) a Process Related Cleaning Index (PRCI) of more than 1; or (iii) a Relative Wash Performance (RWP) of at least 1 and a Process Related Cleaning Index (PRCI) of more than 1. 115-. (canceled)17. The method of claim 16 , wherein the at least one component is selected from the group containing: bleaching system components claim 16 , proteases claim 16 , and polymers.18. The method of claim 17 , wherein bleaching system components include bleaching catalysts claim 17 , photobleaches claim 17 , bleach activators claim 17 , hydrogen peroxide claim 17 , preformed peracids and mixtures thereof.19. The method of claim 16 , wherein no agitation or other mechanical action is applied during the soak period after the initial agitation for the purpose of distributing the soak solution and wetting the object.20. The method of claim 16 , wherein the concentration of the at least one enzyme in the wash solution is obtained by diluting the soak solution with a factor of at least 1 claim 16 , 2 claim 16 , 3 claim 16 , 4 claim 16 , 5 claim 16 , 6 claim 16 , 7 claim 16 , 8 claim 16 , 9 claim 16 , ...

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16-05-2013 дата публикации

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

Номер: US20130118533A1
Принадлежит: TOKYO ELECTRON LIMITED

To provide a liquid processing apparatus capable of processing substrates with a high throughput with the lesser number of nozzles for chemical-liquid, when the substrates that are horizontally held in cup bodies are liquid-processed by supplying a chemical liquid to the substrates. Taking a developing process as an example of a liquid process, two-types of developing nozzles are prepared for two types of developing methods. The developing nozzle, which is used in the method in which the nozzle is engaged with the process for a longer period of time, is individually disposed on each of a first processing module and a second processing module . On the other hand, the developing nozzle, which is used in the method in which the nozzle is engaged with the process for a shorter period of time, is used in common in the first liquid processing module and the second liquid processing module . The common developing nozzle is configured to wait on an intermediate position between the modules and 1. A liquid processing apparatus comprising:a first processing area and a second processing area that are aligned such that substrates that are horizontally placed are respectively processed by a chemical liquid from a nozzle;a first individual nozzle and a second individual nozzle that are provided individually to correspond to the first processing area and the second processing area;a first individual-nozzle transfer mechanism and a second individual-nozzle transfer mechanism that are respectively configured to transfer the first individual nozzle and the second individual nozzle between waiting positions and chemical-liquid discharging positions in the respective processing areas;a common nozzle that is used in common in the first processing area and the second processing area, the common nozzle being configured to supply the chemical liquid onto the substrates;a common-nozzle transfer mechanism configured to transfer the common nozzle among a waiting position, a chemical-liquid ...

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16-05-2013 дата публикации

Wind turbine fluid application apparatus

Номер: US20130122210A1
Принадлежит: Individual

A wind turbine tower cleaning apparatus is provided. The apparatus includes a frame which circumferentially extends at least partially around a wind turbine tower. A separator structure can be attached to the frame and extends between the frame and the wind turbine tower to position the frame at a predetermined distance away from the wind turbine tower. The separator structure can also include an attachment end which is attached to the frame and a slidabe end positionable near the wind turbine tower. A slider can be attached to the slidabe end of the separator structure and can slide on the surface of the wind turbine tower as the frame is raised and lowered on the wind turbine tower. A frame lift device can raise and lower the frame on the wind turbine tower. A sprayer can spray fluid onto the wind turbine tower to clean the wind turbine tower.

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23-05-2013 дата публикации

WASHER WASHING BALL INDUCTIVE DEVICE AND A DRAIN COVER FOR THE WASHING BALLS

Номер: US20130127263A1
Автор: Park Ho Yong
Принадлежит:

Disclosed are a washing unit for washing contaminants within a washing machine, a permanent magnet inducing unit for effectively washing an inner wall of a water tank by using induction of an electric field or providing a motion to an artificial floating body of the water tank, and a drain cover for a washing machine for assisting a washing operation of a washing ball of the washing machine. The washing unit has a body for maintaining a certain shape such as a ball and a plurality of washing projections, and is introduced into spaces between the water container and the washing tub and between the water tank and the pulsator to frictionally remove various filths attached to the washing tank, the washing tub and the pulsator with the washing projections that floats at a predetermined depth of washing water. 1. An induction apparatus for a floating body provided therein with a permanent magnet and located in a water container , the induction apparatus comprising:a plurality of coil windings mounted to an outer surface of the water container; anda pattern forming circuit for applying a pulse signal of a predetermined pattern to the coil windings to generate an electric field for inducing the floating body within the water container.2. The induction apparatus of claim 1 , wherein the induction apparatus is mounted to a washing machine and the pattern forming circuit generates pulse signals having patterns different from each other according to a rotating direction of a washing motor of the washing machine.3. The induction apparatus of claim 2 , wherein claim 2 , if a driving signal in a first rotating direction of the washing motor is applied to the pattern forming circuit claim 2 , a pulse signal having a first pattern where durations of a high (H) signal and a low (L) signal are different from each other is applied to the coil windings.4. The induction apparatus of claim 3 , wherein claim 3 , if a driving signal in a second rotating direction of the washing motor is ...

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30-05-2013 дата публикации

METHOD OF CLEANING TUNGSTEN PLUG SURFACES IN ULTRA LARGE SCALE INTEGRATED CIRCUITS AFTER CHEMICAL-MECHANICAL POLISHING

Номер: US20130133691A1
Принадлежит: HEBEI UNIVERSITY OF TECHNOLOGY

A method of cleaning tungsten plug surfaces in ultra large scale integrated circuits after chemical-mechanical polishing, the method including: a) preparing a cleaning solution by mixing deionized water, between 15 and 30 g/L of an active agent with respect to the deionized water, between 5 and 20 g/L of a chelating agent with respect to the deionized water, and between 1 and 60 g/L of a corrosion inhibitor with respect to the deionized water; b) after alkaline chemical-mechanical polishing, washing the tungsten plug surfaces using the cleaning solution at a flow rate of between 1000 and 4000 g/min for between 30 s and 3 min. 1. A method of cleaning tungsten plug surfaces in ultra large scale integrated circuits after chemical-mechanical polishing , the method comprising:a) preparing a cleaning solution by mixing deionized water, between 15 and 30 g/L of an active agent with respect to the deionized water, between 5 and 20 g/L of a chelating agent with respect to the deionized water, and between 1 and 60 g/L of a corrosion inhibitor with respect to the deionized water; andb) after alkaline chemical-mechanical polishing, washing the tungsten plug surfaces using the cleaning solution at a flow rate of between 1000 and 4000 g/min for between 30 s and 3 min.2. The method of claim 1 , wherein the active agent is an FA/O surfactant claim 1 , O-7 ((CH-CH-O—CHCHO)-H) claim 1 , O-10 ((CH-CH—O—CHCHO)-H) claim 1 , O-20 (CH-CH-O-CHCHO)-H) claim 1 , or JFC.4. The method of claim 1 , wherein the corrosion inhibitor is hexamethylenetetramine or benzotriazole. This application is a continuation-in-part of International Patent Application No. PCT/CN2010/080472 with an international filing date of Dec. 30, 2010, designating the United States, now pending, and further claims priority benefits to Chinese Patent Application No. 201010231680.X filed Jul. 21, 2010. The contents of all of the aforementioned applications, including any intervening amendments thereto, are incorporated herein ...

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30-05-2013 дата публикации

SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM STORING COMPUTER PROGRAM FOR IMPLEMENTING SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Номер: US20130133695A1
Принадлежит: TOKYO ELECTRON LIMITED

A chemical liquid process is performed on a substrate. Then, a rinse process that supplies a rinse liquid to the substrate is performed. Thereafter, a drying process that dries the substrate is performed while rotating the substrate. The drying process includes a first drying process that rotates the substrate at a first rotational speed; a second drying process that decreases the rotational speed of the substrate to a second rotational speed lower than the first rotational speed after the first drying process. In the second drying process, the rinse liquid and a drying solution are agitated and substituted while generating braking effect. In a third drying process, the rotational speed of the substrate is increased from the second rotational speed to a third rotational speed after the second drying process. Thereafter, in a fourth drying process, the drying solution on the substrate is scattered away by rotating the substrate. 1. A substrate processing method comprising:a chemical liquid process that supplies a chemical liquid to a substrate;a rinse process that supplies a rinse liquid to the substrate after the chemical liquid process; anda drying process that dries the substrate after the rinse process,wherein the drying process comprises:a first drying process that rotates the substrate at a first rotational speed;a second drying process that decreases a rotational speed of the substrate to a second rotational speed lower than the first rotational speed after the first drying process; anda third drying process that increases the rotational speed of the substrate from the second rotational speed to a third rotational speed after the second drying process, anda drying solution is supplied to the substrate from a starting time point of the first drying process to a time point falling within the third drying process.2. The substrate processing method of claim 1 ,wherein the drying process further comprises a fourth drying process that scatters away the drying ...

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30-05-2013 дата публикации

CUP AND SUBSTRATE PROCESSING APPARATUS

Номер: US20130133708A1
Принадлежит:

A cup intermediate portion and a cup lower portion surround a substrate. The cup intermediate portion is arranged above an upper surface of the cup lower portion. A sidewall surrounds the cup intermediate portion and the cup lower portion. A spacing between the upper surface of the cup lower portion and a lower surface of the cup intermediate portion gradually decreases outward from an outer peripheral portion of the substrate while a clearance is formed between the lower surface of the cup intermediate portion and the upper surface of the cup lower portion in respective outer peripheral portions of the cup intermediate portion and the cup lower portion. An inner peripheral surface of the sidewall is spaced apart from the clearance outside the clearance and surrounds the clearance. 1. A cup surrounding a substrate held in a substantially horizontal posture when the substrate is processed using a processing liquid , comprising:a first member having an upper surface surrounding said substrate;a second member having a lower surface arranged above said upper surface of said first member to surround said substrate; anda third member surrounding said first and second members,wherein a spacing between said upper surface of said first member and said lower surface of said second member gradually decreases outward from an outer peripheral portion of said substrate while a clearance is formed between said upper surface of said first member and said lower surface of said second member in respective outer peripheral portions of said first and second members, andsaid third member has an inner surface spaced apart from said clearance outside said clearance and surrounding said clearance.2. The cup according to claim 1 , wherein said inner surface of said third member extends from below a lower end of said clearance to above an upper end of said clearance.3. The cup according to claim 1 , further comprising a closing member that closes a gap between said second member and said ...

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13-06-2013 дата публикации

METHOD FOR WASHING REACTOR

Номер: US20130146088A1
Принадлежит:

The method for cleaning a reactor of the present invention comprises passing a solvent through a wax-fraction hydrocracking apparatus which is charged with a catalyst and to which supply of a wax fraction is stopped, wherein the solvent comprising at least one oil selected from a group consisting of hydrocarbon and vegetable oils, and having a sulfur content of less than 5 ppm and being in a liquid state at 15° C. 1. A method for cleaning a reactor comprising passing a solvent through a wax-fraction hydrocracking apparatus which is charged with a catalyst and to which supply of a wax fraction is stopped , wherein the solvent comprising at least one oil selected from a group consisting of hydrocarbon and vegetable oils , and having a sulfur content of less than 5 ppm and being in a liquid state at 15° C.2. The method according to claim 1 , wherein a check-up sample is taken out from the solvent discharged from the wax-fraction hydrocracking apparatus; the presence or absence of deposition of the wax in the check-up sample is checked at a predetermined temperature; and the feed of the solvent is continued if the deposition of the wax is confirmed and the feed of the solvent is terminated if deposition of the wax is not confirmed.3. The method according to claim 1 , wherein the solvent is passed through the wax-fraction hydrocracking apparatus claim 1 , then fractionated in a rectifying tower arranged downstream of the wax-fraction hydrocracking apparatus claim 1 , and again passed through the wax-fraction hydrocracking apparatus.4. The method according to claim 1 , wherein the solvent is a hydrocarbon produced by a GTL process.5. The method according to claim 1 , wherein the solvent is a light oil fraction produced by the GTL process. The present invention relates to a method for cleaning a reactor and more particularly to a method for cleaning a hydrocracking apparatus.Recently, in view of a reduction of an environment load, an environment friendly and clean liquid ...

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13-06-2013 дата публикации

TRANSPORT SCHEDULING FOR LOW MICROBIAL BULK PRODUCTS

Номер: US20130146092A1

Transport scheduling and transport processes for low microbial (“LM”) bulk products are described. The transport scheduling and processes facilitate low microbial activity in a LM bulk product during the transport of the LM bulk product. 1. A process comprising:receiving, on a computing device, an indication that a low microbial (LM) bulk product vessel exceeds a low microbial wash (LMW) timing threshold, the LMW timing threshold being based on a product specification indicating a microbial baseline for a low microbial bulk product and being a maximum amount of time between LM washes for the bulk product vessel;causing the computing device to schedule a time for a LMW process; removing vessel accessibility components from the LM bulk product vessel,', 'subjecting the vessel accessibility components to a sanitary solution bath,', 'subjecting the LM bulk product vessel to a rinse operation in association with a time threshold, wherein the rinse operation includes actuating spinners by forcing hot water through the spinners to cause dispersion of the hot water within the interior of the LM bulk product vessel, and', 'actuating the spinners by forcing sanitary solution through the spinners to cause dispersion of the sanitary solution within the interior of the LM bulk product vessel;, 'at the time for the LMW process, causing the LMW process to be performed, wherein the LMW process includescausing the computing device to update a LMW record for the LM bulk product vessel to indicate a completion date of the LMW process and to qualify the LM bulk product vessel for transporting an LM bulk product; andmaintaining the qualification of the LM bulk product vessel until the LMW timing threshold is surpassed at any time during a scheduled transport period.2. The process of claim 1 , wherein the time threshold is at least 15 consecutive minutes and the hot water is at a temperature from about 140° F. to about 215° F.3. The process of claim 1 , wherein the sanitary solution bath ...

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13-06-2013 дата публикации

CLEANING CARTRIDGE FOR A HEATING APPARATUS FOR COOKING FOOD AND MECHANISM FOR OPENING CARTRIDGE

Номер: US20130146094A1
Принадлежит: Convotherm Elektrogeraete GMBH

A cleaning agent/rinsing agent for cleaning a heating apparatus for cooking food are contained in a cartridge. The cartridge is sealed to prevent premature release of the cleaning/rinsing agents. Inside the cavity of the heating apparatus, a mechanism for opening the cartridge is located in the drain of the cavity of the heating apparatus. By pushing the cartridge onto the mechanism and twisting the cartridge, protruding edges of the mechanism penetrate the seal. Upon lifting the cartridge, the cleaning/rinsing agent drops out and into the cavity drain. The rinsing agent may be retained above the drain and cleaning box via encapsulation or the rinsing agent and configuration of the mechanism. The empty cartridge is removed and the cavity of the heating apparatus is ready for cleaning. 1. A cleaning cartridge for cleaning an apparatus for the heat treatment and/or cooking of substances , said cartridge comprising:at least one cleaning agent and at least one rinsing agent disposed within the same portion of the cartridge, and wherein the cleaning agent and the rinsing agent are separated from one another in the cartridge by a barrier material surrounding or encapsulating the rinsing agent, and wherein the cartridge includes water soluble or heat sensitive seal to prevent premature release of the cleaning agent and rinsing agent from the cartridge.2. The cleaning cartridge of claim 1 , wherein the cleaning agent is selected from powder and liquid.3. The cleaning cartridge of claim 1 , wherein the cleaning agent is comprised of an alkaline cleaning agent.4. The cleaning cartridge of claim 1 , wherein the rinsing agent is selected from powder and liquid.5. The cleaning cartridge of claim 1 , wherein the rinsing agent is comprised of acidic rinsing agent.6. The cleaning cartridge of claim 1 , wherein the barrier material is selected from of water-insoluble polymer claim 1 , rubbery material or wax.7. The cleaning cartridge of claim 8 , wherein the barrier material is ...

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13-06-2013 дата публикации

Water Repellent Protective Film Forming Agent, Liquid Chemical for Forming Water Repellent Protective Film, and Wafer Cleaning Method Using Liquid Chemical

Номер: US20130146100A1
Принадлежит:

A water repellent protective film forming agent is provided for forming a protective film on a wafer that has an uneven pattern at its surface. The protective film is formed at least on surfaces of recessed portions of the wafer at the time of cleaning the wafer. The wafer is a wafer that contains a material including silicon element at least at the surfaces of the recessed portions of the uneven pattern or a wafer that contains at least one kind of material selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride and ruthenium at least at a part of the surfaces of the recessed portions of the uneven pattern. The water repellent protective film forming agent is provided to contain a silicon compound represented by the following general formula [1]: 1. A water repellent protective film forming agent which is able to form a protective film on a wafer that has an uneven pattern at its surface , the protective film being formed at least on surfaces of recessed portions of the wafer at the time of cleaning the wafer , the wafer being a wafer that contains a material including silicon element at least at the surfaces of the recessed portions of the uneven pattern or a wafer that contains at least one kind of material selected from the group consisting of titanium , titanium nitride , tungsten , aluminum , copper , tin , tantalum nitride and ruthenium at least at a part of the surfaces of the recessed portions of the uneven pattern , the agent comprising a silicon compound represented by the following general formula [1]:{'br': None, 'sup': '1', 'sub': a', '4-a, 'RSiX\u2003\u2003[1]'}wherein{'sup': 1', '1, 'sub': 1', '18, 'Rmutually independently represents a hydrogen group or a C-Chydrocarbon group which is unsubstituted or substituted with halogen atom, and the total number of carbons in mutually independent Ris not smaller than 6;'}X mutually independently represents at least one group selected from the group ...

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13-06-2013 дата публикации

Method For Cleaning The Usable Space Of A Climatic Cabinet

Номер: US20130146104A1
Автор: Stahl Hermann
Принадлежит: THERMO ELECTRON LED GMBH

The present invention relates to a method for cleaning a usable space of a climatic cabinet, said usable space being surrounded by walls and optionally being provided with fittings, in which steam is generated by heating a water reservoir while at the same time steam is caused to condense on said walls and on any fittings present in the usable space. 1. A method for cleaning a usable space of a climatic cabinet during a cleaning procedure , said usable space being surrounded by walls , comprising the steps of:generating steam by heating a water reservoir while at the same time condensing steam on said walls of said usable space.2. The method as recited in claim 1 , wherein said usable space is surrounded by walls that are adapted to be heated by means of at least one heating device claim 1 , the method further comprising the step of switching off the heating device during the cleaning procedure.3. The method as recited in claim 1 , further comprising the step of cooling said walls during the cleaning procedure by means of at least one cooling means.4. The method as recited in claim 1 , wherein said water reservoir is disposed in a floor area within said usable space.5. The method as recited in claim 1 , wherein said water reservoir is located outside said climatic cabinet and said steam is passed into said usable space.6. The method as recited in claim 1 , wherein said steam is generated in said usable space at a pressure of maximally 0.5 bar claim 1 , preferably less than 0.2 bar.7. The method as recited in claim 1 , wherein claim 1 , on conclusion of the cleaning procedure claim 1 , condensed water is collected in a floor area of said usable space and then removed from said usable space.8. The method as recited in claim 7 , wherein the condensed water is drained off via an outlet.9. The method as recited in claim 1 , further comprising a sterilization step.10. The method as recited in claim 9 , wherein said sterilization step takes place after said cleaning step. ...

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20-06-2013 дата публикации

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM

Номер: US20130152976A1
Автор: Amano Yoshifumi
Принадлежит: TOKYO ELECTRON LIMITED

Provided is a substrate processing apparatus including a substrate holding unit configured to hold a wafer W horizontally, a rotation driving unit configured to rotate the substrate holding unit, a first chemical liquid nozzle configured to discharge a first chemical liquid to a first chemical liquid supplying position on the peripheral portion of the wafer W, and a second chemical liquid nozzle configured to discharge a second chemical liquid to a second chemical liquid supplying position on the peripheral portion of the wafer W. The rotation driving unit rotates the substrate holding unit in a first rotation direction when the first chemical liquid nozzle discharges the first chemical liquid, and rotates the substrate holding unit in a second rotation direction when the second chemical liquid nozzle discharges the second chemical liquid. 1. A substrate processing apparatus comprising:a substrate holding unit configured to hold a substrate in a horizontal direction to perform a liquid processing for a peripheral portion of the substrate by a chemical liquid;a rotation driving unit configured to rotate the substrate holding unit to perform the liquid processing while rotating the substrate held by the substrate holding unit in a horizontal direction;a first chemical liquid nozzle configured to discharge a first chemical liquid to a first chemical liquid supplying position on the peripheral portion of the substrate; anda second chemical liquid nozzle configured to discharge a second chemical liquid to a second chemical liquid supplying position on the peripheral portion of the substrate,wherein the rotation driving unit rotates the substrate holding unit in a first rotation direction when the first chemical liquid nozzle discharges the first chemical liquid, and rotates the substrate holding unit in a second rotation direction, which is opposite to the first rotation direction, when the second chemical liquid nozzle discharges the second chemical liquid.2. The ...

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20-06-2013 дата публикации

DEVICE TO CLEAN A COMPONENT OF DEPOSITS

Номер: US20130152979A1
Принадлежит:

In a device to clean a component of deposits, at least one first nozzle unit is positioned to spray a fluid at an angle onto a surface of the component that is to be cleaned, the first nozzle unit being provided opposite a border region of the surface of the component that is to be cleaned. At least one second nozzle unit generates a flow of a gaseous medium over the surface to be cleaned and is provided adjacent to edge of the border region of the surface of the component that is to be cleaned. 1. A device to clean a component of deposits , comprising:at least one first nozzle unit positioned to spray a fluid at an angle onto a surface of the component that is to be cleaned and which is provided opposite a border region of the surface of said component that is to be cleaned; andat least one second nozzle unit that generates a flow of a gaseous medium over the surface to be cleaned and which is provided adjacent to an edge of the border region of the surface of the component that is to be cleaned.2. The device according to wherein the flow from the gaseous medium with a mixture of fluid and deposits removed from the surface to be cleaned strikes a capture unit arranged after the surface to be cleaned as viewed in a flow direction of the gaseous medium.3. The device according to in which the capture unit has a perforated plate at which the mixture strikes claim 2 , and the perforated plate having holes of such a size that at least a portion of the mixture passes through the holes.4. The device according to in which the perforated plate is used in a deflection plate with which the perforated plate forms a container at which the mixture portion strikes passing through the perforated plate.5. The device according to in which the container has at at least one end at least one first strip curved at a distance from the perforated plate claim 4 , said first strip being designed such that portions of said mixture rebounding from the perforated plate strike the strips.6. The ...

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04-07-2013 дата публикации

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Номер: US20130167876A1
Принадлежит: DAINIPPON SCREEN MFG. CO., LTD.

A substrate processing apparatus () includes a bath body (), cover members (), processing liquid nozzles () for ejecting an SPM liquid like a shower, and gas nozzles () for ejecting nitrogen gas. The processing liquid nozzles eject a processing liquid () onto substrates () from sidewalls () of the bath body (). By ejecting gas toward lower surfaces of the cover members from the gas nozzles before the substrates are loaded into the bath body, it is possible to remove droplets of the processing liquid deposited on the lower surfaces of the cover members during the previous processing of the substrates or during a temperature control where the processing liquid is ejected from the processing liquid nozzles. It is thereby possible to prevent or reduce deposition of droplets of the processing liquid dropped onto the substrates immediately after being loaded into the bath body. 1. A substrate processing apparatus comprising:a bath body for containing a plurality of substrates which are loaded into said bath body through a carry-in opening provided at an upper portion of said bath body, said plurality of substrates being arranged with respective main surfaces thereof opposed to adjacent ones while standing upright;a cover for opening and closing said carry-in opening of said bath body;a plurality of processing liquid nozzles for ejecting a processing liquid toward said plurality of substrates in said bath body; andat least one gas nozzle for ejecting gas toward a lower surface of said cover.2. The substrate processing apparatus according to claim 1 , whereinsaid at least one gas nozzle is provided on at least one sidewall of said bath body, which is opposed to outer peripheral portions of said plurality of substrates.3. The substrate processing apparatus according to claim 2 , whereinsaid at least one gas nozzle is provided on each of both sidewalls of said bath body, which are opposed to said outer peripheral portions of said plurality of substrates.4. The substrate ...

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04-07-2013 дата публикации

Substrate processing apparatus and substrate processing method

Номер: US20130167877A1
Принадлежит: Dainippon Screen Manufacturing Co Ltd

In a substrate processing apparatus, a liquid film of a supercooled liquid of pure water is formed on the upper surface of a substrate and then cooled with cooling gas into a frozen film. The temperature of the liquid film is lower than the freezing point of pure water, and thus the liquid film is in an easy-to-freeze state. Thus, the time required to freeze the liquid film can be shortened. Even if the temperature of the cooling gas is increased, the liquid film can be speedily frozen as compared with the case in which a liquid film is formed of pure water having a temperature higher than its freezing point. Thus, heat insulating facilities such as piping that supply cooling gas can be simplified. This results in a reduction of the cooling cost required to freeze the liquid film.

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04-07-2013 дата публикации

Methods and systems for cleaning for cyclic nucleation transport (CNX)

Номер: US20130167878A1
Автор: Plavidal Richard W.
Принадлежит: HyperFlo LLC

A dynamic cyclic nucleation transport (D-CNX) process is disclosed, including cyclically changing the volume of a process chamber, for example, through a piston or bellows. A D-CNX process and system can include a dynamic chamber volume that can instantly change from vacuum to pressure conditions and eliminates vacuum pumps. 1. A method comprising wherein the chamber is isolated from outside ambient,', 'wherein the chamber is filled with a liquid;, 'providing an object in a chamber,'}enlarging the chamber volume so that a non-liquid space is formed in the chamber;reducing the chamber volume so that the non-liquid space is reduced;repeating enlarging and reducing the chamber volume.2. A method as in wherein the non-liquid space comprises a vacuum.3. A method as in wherein the non-liquid space comprises gaseous or vapor released from the liquid.4. A method as in wherein the liquid comprises water.5. A method as in wherein the liquid is heated.6. A method as in wherein the level of the liquid is lowered or raised by a mechanical mechanism.7. A method as in wherein enlarging and reducing the chamber volume is performed by a piston.8. A method as in wherein additional liquid or gas flows to the chamber when the chamber volume is enlarged.9. A method as in wherein the additional liquid is heated.10. A method as in wherein the additional liquid comprises a chemical liquid.11. A method as in wherein at least a portion of the non-liquid space is removed from the chamber during the chamber volume reduction.12. A method as in wherein the chamber volume is enlarged as to form bubbles at a surface of the object.13. A method as in wherein the chamber volume is reduced as to terminate the bubbles.14. A method comprising wherein the chamber is isolated from outside ambient,', 'wherein the chamber is filled with a liquid;, 'providing an object in a chamber,'}lowering the level of the liquid in the chamber so that a non-liquid space is formed in the chamber;raising the level of the ...

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04-07-2013 дата публикации

Methods and systems for cleaning for cyclic nucleation transport (CNX)

Номер: US20130167879A1
Автор: Richard W. Plavidal
Принадлежит: HyperFlo LLC

Methods are disclosed to create and employ the use of non-vapor, non-condensable gas bubbles inside a process chamber. These non-vapor gas bubbles may be rapidly expanded and compressed in pressure-controlled cycles and can assist in the transport of fluids, particles, and by-products to and from surfaces. The gas bubbles can be generated from dissolved gas to the liquid medium, by mixing two liquids that can react with each other to generate gaseous by-products, or by using a liquid medium that can react with the surface of the object to generate gaseous by-products. The gaseous generation can be used with cyclic nucleation transport (CNX) process, such as vacuum CNX, hyperbaric CNX, or dynamic CNX.

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04-07-2013 дата публикации

Method and apparatus for showerhead cleaning

Номер: US20130167885A1
Принадлежит: QUANTUM GLOBAL TECHNOLOGIES LLC

Embodiments of the present invention generally relate to a method and apparatus for ex-situ cleaning of a chamber component part. In one embodiment, a system for cleaning component parts in a cleaning chemistry is provided. The system comprises a wet bench set-up comprising a cleaning vessel assembly for holding one or more component parts to be cleaned during a cleaning process and a detachable cleaning cart detachably coupled with the cleaning vessel assembly for supplying one or more cleaning chemistries to the cleaning vessel assembly during the cleaning process.

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11-07-2013 дата публикации

FLUID SUPPLYING APPARATUS AND SYSTEM AND METHOD FOR CLEANING THIN FILM USING THE SAME

Номер: US20130174878A1
Принадлежит: LG CHEM, LTD.

A fluid supplying apparatus includes an inner tube having a plurality of holes for distributing a fluid supplied from a supply unit, and an outer tube arranged coaxially or non-coaxially with the inner tube to surround the inner tube and having a plurality of slots for injecting the fluid distributed therein from the holes to the outside. The outer tube substantially has the same length as the inner tube. The fluid supplying apparatus may be used for a thin film cleaning system or method. 1. A fluid supplying apparatus , comprising:an inner tube having a plurality of holes for distributing a fluid supplied from a supply unit; andan outer tube arranged to surround the inner tube and having a plurality of slots for injecting the fluid distributed therein from the holes to the outside.2. The fluid supplying apparatus according to claim 1 , wherein both ends of the inner tube and the outer tube are closed.3. The fluid supplying apparatus according to claim 1 , wherein the inner tube and the outer tube are coaxially arranged.4. The fluid supplying apparatus according to claim 1 , wherein the inner tube and the outer tube substantially have the same length.5. The fluid supplying apparatus according to claim 1 , wherein the slots include:first side slots arranged in any one side of the outer tube in a length direction; andsecond side slots arranged in the other side of the outer tube to be opposite to the first side slots.6. The fluid supplying apparatus according to claim 5 , wherein the arrangement of the holes is substantially orthogonal to the arrangement of the slots.7. The fluid supplying apparatus according to claim 1 , wherein the inner tube and the outer tube have cross-sections with substantially any one shape selected from the group consisting of circle claim 1 , oval claim 1 , rectangle and hexagon claim 1 , or their combinations.8. The fluid supplying apparatus according to claim 1 , wherein the holes include:first side holes arranged in any one side of the ...

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11-07-2013 дата публикации

HAND-HELD TANK FOR CLEANING CHANDELIERS

Номер: US20130174881A1
Автор: Campbell Keith S.
Принадлежит: INVENTIVE SOLUTIONS, LLC

An apparatus for cleaning chandeliers includes a hand-held tank for holding hot water and a base supporting the hand-held tank. The base has a hollow interior. The tank has sidewalls, at least one of which is transparent. An air and water pump and a battery are mounted in the hollow interior. The battery is in electrical communication with the pump. A first inlet admits ambient air into an inlet of the pump and a second inlet admits water into the inlet. At least one air and water-emitting nozzle is formed in a sidewall of the tank. A pump outlet is in open fluid communication with the at least one water-emitting nozzle. The at least one nozzle discharges agitating water and bubbles into the hot water or above the water line, depending upon the water depth, to help dislodge chemicals and grease from chandelier parts immersed in the hot water. 1. An apparatus for cleaning chandeliers , comprising:a hand-held tank for holding hot water;a base atop which is mounted said hand-held tank, said base having a hollow interior;said tank having sidewalls, at least one of which is transparent;an air and water pump mounted in the hollow interior of said base;a battery mounted in the hollow interior of said base, said battery in electrical communication with said pump;a first inlet that admits ambient air into an inlet of said pump;a second inlet that admits water into said inlet of said pump;at least one air and water-emitting nozzle formed in a sidewall of said tank;a pump outlet in open fluid communication with said at least one water-emitting nozzle;whereby said at least one nozzle discharges agitating water and bubbles into the hot water or above the water line, depending upon the depth of the water, to help dislodge chemicals and grease from the chandelier parts immersed in said hot water.2. The apparatus of claim 1 , further comprising:an interior surface of at least one sidewall being covered with splash-suppressing bristles.3. The apparatus of claim 2 , further ...

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18-07-2013 дата публикации

DISHWASHER

Номер: US20130180553A1
Принадлежит: Meiko Maschinenbau GmbH & Co. KG

The invention relates to an apparatus for the circulation and dehumidification of moist air () within an automatic cleaning machine (), in particular a commercially used program-controlled dishwasher. The inventively proposed apparatus is accommodated within a cleaning chamber () delimited by walls (). At least one of the walls () is cooled from outside by a medium (). In the cleaning chamber () is located a blower (). This imparts to moist air () sucked up from the cleaning rack () a flow () along the at least one wall () cooled by a medium (). 1541012182018202412505452565818205412. An apparatus for the circulation and dehumidification of moist air () within an automatic cleaning machine () , in particular a commercial program-controlled dishwasher accommodated within a cleaning chamber () partially delimited by walls ( , ) , wherein at least one of the walls ( , ) is cooled on the outer side by a medium () and in the cleaning chamber () is arranged a blower () which imparts to moist air () within the cleaning chamber a flow ( , , ) along the at least one wall ( , ) cooled by a medium () and guides this in the circuit within the cleaning chamber ().25012221716. The apparatus as claimed in claim 1 , wherein the radial blower () is arranged within the cleaning chamber () in the ceiling () above the rack () receiving the load () to be cleaned.350122018. The apparatus as claimed in claim 1 , wherein the radial blower () is arranged within the cleaning chamber () in a side wall ( claim 1 , ).430182024. The apparatus as claimed in claim 1 , wherein a medium store () is arranged on the outer side of the at least one wall ( claim 1 , ) cooled by the medium () and is connected to the wall in a heat-conducting manner.530246012. The apparatus as claimed in claim 1 , wherein in the at least one medium store () flowed through by the medium () a meandering channel is arranged such that it covers the wall surface () assigned to the cleaning chamber ().62412. The apparatus as ...

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25-07-2013 дата публикации

Method of cleaning medical instrument and apparatus therefor

Номер: US20130186429A1
Принадлежит: Sharp Corp

A method of cleaning a medical instrument, in which a medical instrument to which a body fluid adheres is subjected to ultrasonic cleaning in a cleaning solution in which chlorine dioxide is dissolved, and a cleaning apparatus including a cleaning tank constructed to be capable of ultrasonic cleaning, a mixing portion for generating the cleaning solution in which chlorine dioxide is dissolved, a first pipe for supplying the cleaning solution to the cleaning tank from the mixing portion, and a second pipe for supplying water to the cleaning tank, and constructed to dilute the cleaning solution supplied from the mixing portion through the first pipe with water supplied through the second pipe such that a prescribed concentration of chlorine dioxide dissolved in the cleaning solution is attained in the cleaning tank are provided.

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08-08-2013 дата публикации

UNIT OF WASHING FOR MACHINE OF CLEANING OF OPHTHALMIC GLASSES OR OTHER SUBSTRATES

Номер: US20130199584A1
Автор: Gehrig Denis, Gehrig Jean

A washing unit for machines that clean ophthalmic glass () or other substrates, it includes, on one hand, two washing lines (), each able to issue a high-pressure jet of washing liquid in a flared shape of a width substantially equal to or greater than the diameter of the glass to be cleaned, said lines () being parallel and mounted opposite each other on each side of the glass () to be cleaned so that the two streams of liquid () are located at the same level and come into contact on the concave () and convex () surfaces respectively of said glass (); and, on the other hand, supports () intended to hold the glass () in a stable position during the washing operation and the means () to allow movement of said lines () or the glass () in order to perform simultaneous bathing of the concave () and convex () surfaces of the glass by the respective strains of washing liquid (). 1. A washing unit for machines that clean ophthalmic glass (l) or other substrates is characterized by:{'b': 22', '23', '3', '30', '22', '23', '1', '30', '10', '11', '1, '(a) two washing lines (, ), each line comprising a plurality of linearly aligned sprayers (), each line able to issue a high-pressure jet of overlapping washing liquid sprays () in a flared shape having a width substantially equal to great r than the diameter of the glass to be clear said lines (, ) being parallel and mounted opposite each other care on each side of the glass () to he cleaned such that the two streams of liquid () are located at the same level and come into contact on the concave () and convex () surfaces, respectively, of said glass (),'}{'b': '4', '(b) supports () for holding the glass in a stable position during the washing operation, the glass being maintained horizontally in a fixed washing position between the two lines;'}{'b': 2', '22', '23', '1', '10', '11', '1', '30, '(c) means (′) for allowing movement of said lines (, ) or the glass () in order to perform simultaneous bathing of the concave () and the ...

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15-08-2013 дата публикации

TREATMENT SYSTEM FOR A GARBAGE DISPOSAL AND SINK DRAIN PIPE

Номер: US20130206187A1
Автор: Dombrowski Thomas K.
Принадлежит: DISPOSAL GUARD INC.

A garbage disposal treatment system, preferably for use with a double basin sink comprising first and second basins, a garage disposal mounted under the first basin and a sink drain pipe mounted under the second basin and having a P-trap is provided. The treatment system comprises a refillable reservoir for holding sanitizing liquid, an electrically powered pump for pumping the liquid into the garbage disposal so that the liquid impinges on the garbage disposal blades and splashguard, and switch for activating the pump. The treatment system may also pump liquid into the sink drain pipe of the second sink. 1. A treatment system for use with a sink having a garbage disposal mounted under the sink , the treatment system comprising:a reservoir for holding a liquid;a pump for pumping the liquid into the garbage disposal;a switch for activating the pump.2. The treatment system of wherein:the reservoir is removably mounted within a mounting bracket.3. The treatment system of further comprising:a first conduit extending between and connecting the reservoir to the pump; anda second conduit extending between the pump and one or more nozzles located inside the garbage disposal.4. The treatment system of wherein:the liquid comprises a sanitizing compound.5. The treatment system of wherein:the liquid further comprises a deodorizing compound and a degreasing compound.6. The treatment system of further comprising:a light indicator to indicate a low level of liquid in the reservoir.7. The treatment system of wherein the sink is a double basin sink having first and second basins claim 1 , the garbage disposal is mounted under the first basin and a drain pipe is mounted under the second basin claim 1 , the system further comprising:a third conduit extending between the pump and the drain pipe.8. The treatment system of wherein a P-trap is located downstream of the drain pipe claim 7 , and wherein the third conduit extends between the pump and one or more nozzles located within the ...

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29-08-2013 дата публикации

METHOD FOR SURFACE DECONTAMINATION

Номер: US20130220366A1
Принадлежит: AREVA NP GMBH

A method for chemical decontamination of an oxide-coated surface of a metal structural part or of a system in a nuclear power plant with several cleaning cycles, involves oxidation steps, in which the oxide layer is treated with an aqueous solution containing an oxidation agent, and a subsequent decontamination step, in which the oxide layer is treated with an aqueous solution of an acid. At least one oxidation step is carried out in an acid solution and at least one oxidation step in an alkaline solution. 1. A process for chemical decontamination of a surface having an oxide layer of a metallic component or of a system of a nuclear power station , which comprises the steps of:performing a plurality of cleaning cycles each containing oxidation steps in which the oxide layer is treated with an aqueous solution having an oxidant and a subsequent decontamination step in which the oxide layer is treated with an aqueous solution of an acid, wherein at least one of the oxidation steps is carried out in an acidic solution and at least one of the oxidation steps is carried out in an alkaline solution; and{'sub': 3', '2', '8, 'sup': '2−', 'selectin the oxidant from the group consisting of O, SO and a cerium(IV) compound for use in the oxidation steps.'}2. The process according to claim 1 , which further comprises setting a pH of the acidic solution to be <6 and a pH of the alkaline solution to be >8.3. The process according to claim 2 , which further comprises setting a pH of the acidic solution to be <4 and a pH of the alkaline solution of >10.4. (canceled)5. The process according to claim 1 , which further comprises selecting the oxidant from the group consisting of HMnO claim 1 , HMnOwith HNO claim 1 , and KMnOwith HNOfor use in an oxidation step in the acidic solution.6. The process according to claim 1 , which further comprises using KMnOtogether with an alkalizing agent for an oxidation step in the alkaline solution.7. The process according to claim 6 , which further ...

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29-08-2013 дата публикации

Substrate cleaning method

Номер: US20130220368A1
Автор: Tomoatsu Ishibashi
Принадлежит: Ebara Corp

A substrate cleaning method can prevent corrosion of copper interconnects even when the cleaning method, which uses two-fluid jet cleaning, is used for cleaning of a surface of a substrate after polishing. The substrate cleaning method includes: carrying out primary cleaning of a surface of a substrate by scrub cleaning using a neutral or alkaline liquid chemical as a cleaning liquid; carrying out finish cleaning of the surface of the substrate by two-fluid jet cleaning which cleans the surface of the substrate in a non-contact manner by jetting carbonated water, comprising pure water or ultrapure water containing dissolved CO 2 gas, from a two-fluid nozzle toward the surface of the substrate; and subsequently carrying out final finish cleaning of the surface of the substrate by scrub cleaning using a neutral or alkaline liquid chemical as a cleaning liquid, and then drying the surface of the substrate.

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29-08-2013 дата публикации

METHOD AND DEVICE FOR CLEANING COKED CAVITIES, IN PARTICULAR INLET CHANNELS AND VALVES OF AN INTERNAL COMBUSTION ENGINE

Номер: US20130220379A1

The invention relates to a method for cleaning coked cavities, in particular inlet, channels () and valves () of an internal combustion engine (), comprising the following steps: introducing an alkaline liquid into a cavity to be cleaned; heating the alkaline liquid; and extracting the alkaline liquid and the dirt particles contained therein by suction from the cavity. Said method can be carried out especially simply and effectively using a device comprising a first probe (), which is provided at the leading end thereof with one or more nozzles () for injecting an alkaline liquid into the cavity to be cleaned and which is connected at the other end thereof to the delivery side () of a pump (), wherein warmed alkaline liquid can be supplied to the intake side () of said pump. A second probe () is provided for extracting the alkaline fluid and the dirt particles contained therein by suction from the cavity. 1101512. A method for cleaning coked cavities , in particular inlet channels () and valves () of an internal combustion engine () , having the following steps:introduction of an alkaline liquid into a cavity to be cleaned,heating of the alkaline liquid, andextraction by suction of the alkaline liquid with the dirt particles contained therein from the cavity,2. The method as claimed in claim 1 , characterized in that a base in solid form and a solvent are mixed with one another and are introduced into the cavity to be cleaned claim 1 , with the result that the alkaline liquid which claim 1 , in particular claim 1 , has a pH value of more than 12 is formed in the cavity to be cleaned by dissolving of the base in the solvent with the development of heat.3. The method as claimed in claim 1 , characterized in thatthe alkaline liquid which, in particular, has a pH value of more than 12 is heated before being introduced, andthe heated alkaline liquid is injected into the cavity.4. The method as claimed in claim 3 , characterized in that the alkaline liquid with the dirt ...

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29-08-2013 дата публикации

SUBSTRATE PROCESSING METHOD

Номер: US20130220382A1
Принадлежит: EBARA CORPORATION

There is provided a substrate processing method which can keep a surface of a substrate, which has hydrophobic properties, completely wet with a processing liquid during liquid processing, thereby preventing the formation of watermarks on the surface of the substrate. The substrate processing method for processing a substrate by supplying a processing liquid to a central portion of a surface of the substrate rotating horizontally, includes: determining the rotational speed of the substrate and the flow rate of the processing liquid when supplied to the surface of the substrate from a relationship between the rotational speed of the substrate and the flow rate of the processing liquid when supplied to the surface of the substrate, said relationship being dependent on the contact angle of the processing liquid with respect to the surface of the substrate and being capable of preventing partial draining of the processing liquid held on the surface of the substrate or partial drying of the surface of the substrate; and supplying the processing liquid to the central portion of the surface of the substrate at the determined flow rate while rotating the substrate at the determined rotational speed. 1. A substrate processing method for processing a substrate by supplying a processing liquid to a central portion of a surface of the substrate rotating horizontally , said method comprising:determining the rotational speed of the substrate and the flow rate of the processing liquid when supplied to the surface of the substrate from a relationship between the rotational speed of the substrate and the flow rate of the processing liquid when supplied to the surface of the substrate, said relationship being dependent on the contact angle of the processing liquid with respect to the surface of the substrate and being capable of preventing partial draining of the processing liquid held on the surface of the substrate or partial drying of the surface of the substrate; andsupplying the ...

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29-08-2013 дата публикации

DEVICE FOR CLEANING A HEARING AID

Номер: US20130220385A1
Автор: Gil José Antonio
Принадлежит: MG DEVELOPPEMENT

The present invention relates to a device () for cleaning at least one medical hearing unit comprising an earpiece (), said device () comprising a space () for receiving said earpiece (), said space () comprising at least one seat () designed in such a way as to receive said earpiece and comprising, in the lower part, an orifice (designed such that the distal end of said earpiece extends inside a cavity () formed underneath, and means () for causing a liquid to circulate within said space () in such a way that said liquid comes into contact with said earpiece, characterized in that said cavity () comprises at least one outlet () for flow or aspiration of said liquid, opening out opposite and below each orifice (), and in that the bottom of said cavity () comprises means () for directing said liquid towards and under said orifice (), as far as said outlet (), in such a way that said liquid flows across said earpiece, in particular its standard or made-to-measure ear mold. 1. Device for cleaning at least one medical hearing aid , said hearing aid being comprised of an earpiece formed by an ear mold and shaped to be inserted into a person's auditory meatus , said device for cleaning comprising; at least one recess shaped so as to receive said ear mold, said at least one recess comprising an orifice in a lower portion of the recess, said orifice being shaped so that a distal end of said ear mold protrudes into a cavity provided for under the recess; and', 'means for putting a liquid into circulation in said space, said liquid contacting with said ear mold, said means for putting said liquid into circulation ending in said cavity being formed of at least one pipe,, 'a space for receiving said earpiece, said space comprisingwherein said cavity comprises at least one outlet for flowing or aspiration of said liquid, ending in front under each orifice, and wherein a bottom of said cavity comprises means for directing said liquid towards and under said orifice, until said ...

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29-08-2013 дата публикации

WATER AND DEBRIS RECOVERY SYSTEM

Номер: US20130220387A1
Автор: Crocker James
Принадлежит:

The present system relates to a water and debris recovery system for a water blasting device or water demolition system suitable for mounting upon the frame of a mobile vehicle for easy transport and use. The system includes a liquid reservoir connected to a high pressure fluid pump for directing ultra-high pressure water through a blast head to remove the coatings or markings from a surface. The blast head includes a shroud which surrounds the blasting area to at least partially contain the water and debris dislodged from the surface. A vacuum pump is secured to the shroud with the vacuum passing through a cyclone type separator allowing the water and debris to settle to the bottom portion of the cyclone. A mud type pump is then utilized to transfer the collected water and debris into an open top tank. 1. A water and debris recovery system comprising:a blast head having at least nozzle therein, said nozzle constructed and arranged to direct high pressure fluid against a surface for impingement thereon, said blast head having a shroud at least partially surrounding said at least one nozzle for substantially containing said high pressure fluid after said impingement,a vacuum system constructed and arranged to provide a negative pressure air flow through said shroud sufficient to draw said fluid into a tubular member, said tubular member fluidly connected to a separator, said separator being constructed and arranged to separate said air flow and said fluid,a mud pump assembly, said mud pump assembly including a reciprocating member for drawing said separated fluid from said separator during movement in a first direction, said fluid directed to an open topped tank during movement of said reciprocating member in a second direction, anda tank for containing said separated fluid.2. The water and debris recovery system of wherein said vacuum system includes a roots type blower for creating said negative air flow.3. The water and debris recovery system of wherein said ...

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05-09-2013 дата публикации

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM HAVING STORED THEREIN A COMPUTER-READABLE PROGRAM

Номер: US20130228200A1
Принадлежит: TOKYO ELECTRON LIMITED

Provided is a liquid processing apparatus that selectively supplies processing liquids with a switching operation to the surface of a substrate to perform a liquid processing. The liquid processing apparatus includes a first processing liquid supply unit including a first nozzle block that selectively supplies an acidic chemical liquid and a rinse liquid, and a second processing liquid supply unit including a second nozzle block that selectively supplies an alkaline chemical liquid and a rinse liquid. When a chemical liquid is supplied to the substrate from one of the first and second nozzle blocks, the other of the first and second nozzle blocks is retreated to a retreat position. When the rinse liquid is supplied to the substrate from one of the first and second nozzle blocks, the other of the first and second nozzle blocks is moved to a processing position. 1. A liquid processing apparatus comprising:a first processing liquid supply unit including a first nozzle block provided with a nozzle configured to selectively supply an acidic chemical liquid and a rinse liquid with a switching operation to a substrate horizontally held and being rotated, and a first moving mechanism configured to move the first nozzle block between a processing position above the substrate and a retreat position next to the substrate;a second processing liquid supply unit including a second nozzle block provided with a nozzle configured to selectively supply an alkaline chemical liquid and the rinse liquid with a switching operation to the substrate, and a second moving mechanism configured to move the second nozzle block between a processing position above the substrate and a retreat position next to the substrate; anda control unit configured to output a control signal to set one of the first nozzle block and the second nozzle block to a retreat position when a chemical liquid is supplied to the substrate from the other of the first nozzle block and the second nozzle block, and to move ...

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12-09-2013 дата публикации

APPARATUS AND METHOD FOR MONITORING CLEANING

Номер: US20130233352A1
Принадлежит:

An apparatus and a method for monitoring the cleaning of the apparatus for at least one process container and/or at least one process line, and where the process container and/or process line can be cleaned by means of introducing a detergent solution, and with a measuring device for determining a first physical characteristic of the detergent solution, a measuring device for determining a second physical characteristic of the detergent solution, a measuring device for determining the temperature of the detergent solution, an evaluation unit which determines the detergent concentration in the detergent solution via the first and second physical characteristics and via the temperature of the detergent solution, and determines the continuance or termination of the cleaning and/or the re-concentration and/or replacement of the detergent as a function of the detergent concentration that is determined. 1. An apparatus , comprising:at least one process container and/or at least one process line,a cleaning device by means of which the process container and/or the process line can be cleaned by introducing a cleaning agent solution,a first measuring device for determining a first physical substance quantity of the cleaning agent solution,a second measuring device for determining a second physical substance quantity of the cleaning agent solution, anda third measuring device for determining the temperature of the cleaning agent solution,an evaluation unit which determines the cleaning agent concentration in the cleaning agent solution on the basis of the first and second physical substance quantities and on the basis of the temperature of the cleaning agent solution, and determines the continuation or discontinuation of the cleaning, and/or the re-concentration and/or the replacement of the cleaning agent depending on the determined cleaning agent concentration.2. The apparatus according to claim 1 , wherein the refractive index is measured as the first physical substance ...

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12-09-2013 дата публикации

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

Номер: US20130233354A1
Автор: MIURA Takemitsu
Принадлежит: DAINIPPON SCREEN MFG. CO., LTD.

A substrate treating apparatus for treating substrates by immersing the substrates in a treating solution includes the following elements. A treating tank for storing the treating solution; a lifter capable of supporting a plurality of substrates, and vertically movable between an upper withdrawn position above the treating tank and a treating position inside the treating tank; a treating solution supply device for supplying the treating solution to the treating tank; a dripping device for dripping a surfactant to a surface of the treating solution stored in the treating tank; and a control device for causing the treating solution supply device to supply the treating solution to the treating tank, causing the lifter to place the substrates in the treating position, and causing the dripping device to drip the surfactant when raising the lifter to the upper withdrawn position after treatment of the substrates with the treating solution. 1. A substrate treating apparatus for treating substrates by immersing the substrates in a treating solution , comprising:a treating tank for storing the treating solution;a lifter capable of supporting a plurality of substrates, and vertically movable between an upper withdrawn position above the treating tank and a treating position inside the treating tank;a treating solution supply device for supplying the treating solution to the treating tank;a dripping device for dripping a surfactant to a surface of the treating solution stored in the treating tank; anda control device for causing the treating solution supply device to supply the treating solution to the treating tank, causing the lifter to place the substrates in the treating position, and causing the dripping device to drip the surfactant when raising the lifter to the upper withdrawn position after treatment of the substrates with the treating solution.2. The substrate treating apparatus according to wherein the control device is arranged claim 1 , after beginning to raise ...

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12-09-2013 дата публикации

System and Method for Cleaning Jewelry and Other Items

Номер: US20130233358A1
Автор: Thadine Clifton
Принадлежит: Colle&#39; Products LLC

Disclosed herein are various cleaning systems based on the assemblage of a container, a nozzle, an actuator, and one or more releasable cover members configured to receive an item to be cleaned. Also disclosed is a method for cleaning an item based on the steps of obtaining one of the various cleaning systems, detaching a cover member from the assembly, placing the item in the cover member, dispensing cleaning product into the cover member and waiting a sufficient time for the cleaning product to clean the item. Further disclosed is a cleaning product based on a liquid carrier and a foaming product.

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12-09-2013 дата публикации

INDUSTRIAL CLEANING SYSTEM

Номер: US20130233359A1
Автор: Meissner Golo
Принадлежит:

The invention relates to an apparatus for an industrial cleaning plant for the treatment of items to be cleaned “G” in cleaning chambers (), and a transport device () that can be driven, rotated or pivoted for loading and unloading, whereby the transport device () has a lifting device ()* with a gripping tool ()** for the items to be cleaned “G”, with which a vertical transport lift can be carried out into the cleaning chamber (). The cleaning chambers () can be closed with a cover (). The object of the invention consists of achieving an improvement of the adjustment of the items to be cleaned “G” in the cleaning chamber (). The object is achieved in that the cover () is held moveably in a guide () parallel to a lifting arm (), in an aperture () along the shaft () of this lifting arm () of the lifting device (), in that an entrainment mechanism () is provided, which forms a stop for the cover () in upward movement of the lifting arm () for opening the cleaning chamber (), and for closing the cleaning chamber () in downward movement of the lifting arm (), the cover () is placed on the cleaning chamber (), whereby in closed position of the cover (), an up-or-down movement of the gripping tool () in the cleaning chamber () can be controlled with the lifting arm (). *sic; lifting device ()?—Translator's note.**sic; gripping tool ()?—Translator's note. 1. An industrial cleaning plant having one or more cleaning chambers and a transport device that can be driven , rotated or pivoted for loading or unloading , whereby the transport device has a lifting device with a gripping tool for items to be cleaned “G” , with which a transport lift is produced into the cleaning chamber and the gripping tool is guided through openings of the cleaning chambers , which can be closed by a cover , whereby the lifting device and the cover form one structural unit , is hereby characterized in that the cover is held moveably in a guide in an aperture along the shaft of a lifting arm of the ...

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19-09-2013 дата публикации

INTEGRATED PROCESSING AND CRITICAL POINT DRYING SYSTEMS FOR SEMICONDUCTOR AND MEMS DEVICES

Номер: US20130239996A1
Принадлежит:

Processing and drying of a sample, such as a semiconductor or MEMS device, is achieved using a single pressure chamber. The pressure chamber holds the sample in a sealed interior volume throughout various process steps, such as, but not limited to, photoresist removal, sacrificial layer etching, flushing or rinsing, dehydration, and critical point drying. The pressure chamber is constructed of a chemically-resistant and pressure-resistant material to withstand the various chemicals and pressures that are encountered in the various process and drying steps. For example, the pressure chamber is constructed from a nickel-copper alloy. Automated release etching and critical point drying of a MEMS or semiconductor device is provided without removing the device from the sealed pressure chamber. 1. A method for processing a sample , the method comprising:(a) sealing the sample in an interior volume of a pressure chamber, surfaces of the pressure chamber that define the interior volume being formed of a nickel-copper alloy;(b) flowing hydrofluoric acid into the sealed pressure chamber so as to fill the interior volume with the hydrofluoric acid, the hydrofluoric acid being in contact with the sample;(c) removing the hydrofluoric acid from the sealed pressure chamber;(d) after (c), cooling the interior volume of the pressure chamber to a temperature less than 10° C.;(e) flowing liquid carbon dioxide into the sealed pressure chamber so as to fill the interior volume with the liquid carbon dioxide, the liquid carbon dioxide being in contact with the sample;(f) after (e), heating the interior volume of the pressure chamber to a temperature greater than 31° C. and a pressure greater than 1072 psi;(g) after (f), exhausting gaseous carbon dioxide from the sealed pressure chamber until the pressure therein is substantially equal to atmospheric pressure.2. The method of claim 1 , wherein the sample is a MEMS device or a semiconductor device.3. The method of claim 2 , wherein the ...

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19-09-2013 дата публикации

FLOW TANK

Номер: US20130240003A1
Автор: Zhao Liang
Принадлежит: JCS-Echigo Pte Ltd

A cleaning system comprising a tank having a wash area arranged to receive an article for cleaning; an inlet assembly mounted to a first end of the tank, through which a cleaning medium flows into the wash area; an outlet assembly having a flow control plate mounted to a second end of the tank; said flow control plate having a plurality of apertures and arranged such that the cleaning medium flows from the wash area through said apertures; said flow control plate arranged such that a total outlet area of said tank is equal to a sum of areas of the apertures; wherein the proportion of the total outlet area about the flow control plate is inversely proportional to a depth of said tank. 1. A cleaning system comprisinga tank having a wash area arranged to receive an article for cleaning;an inlet assembly mounted to a first end of the tank, through which a cleaning medium flows into the wash area;an outlet assembly having a flow control plate mounted to a second end of the tank;said flow control plate having a plurality of apertures and arranged such that the cleaning medium flows from the wash area through said apertures;said flow control plate arranged such that a total outlet area of said tank is equal to a sum of areas of the apertures;wherein the proportion of the total outlet area about the flow control plate is inversely proportional to a depth of said tank.2. The cleaning system according to claim 1 , wherein the proportion of the total outlet area is a function of a flow rate at a specific depth of the flow control plate.3. The cleaning system according to or claim 1 , wherein the apertures are arranged in pre-determined number of horizontal rows at discreet depths along the flow control plate.4. The cleaning system according to claim 3 , wherein the cumulative flow rate of each row is within ±20% of an average cumulative flow rate.5. The cleaning system according to claim 4 , wherein the cumulative flow rate of each row is within ±10% of an average cumulative ...

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26-09-2013 дата публикации

ACIDIC CLEANING COMPOSITIONS COMPRISING A POLYMER

Номер: US20130247936A1
Принадлежит: Colgate-Palmolive Company

The present invention is directed, in certain embodiments, to compositions useful for the removal of grease, lime scale, soap scum, feces, rust or other soils from surfaces such as those found in bathrooms, toilets and kitchens. Methods of removing soils and preventing soil adhesion are also contemplated. 1. A cleaning composition comprising:(a) lactic acid and phosphoric acid;(b) a nonionic surfactant comprising an ethoxylated alcohol; and(c) a polybetaine.2. The composition of claim 1 , wherein the lactic acid and phosphoric acid are in a weight ratio of about 1:3 to about 3:1.3. The cleaning composition of claim 1 , wherein claim 1 , the nonionic surfactant comprises a C-Calcohol with a degree of ethoxylation of about 7 to about 9.4. The composition of claim 1 , wherein the nonionic surfactant is a C-Calcohol with a degree of ethoxylation of about 7.5 to about 8.1.5. The composition of claim 1 , wherein the lactic acid is present in an amount of about 2 to about 6 weight %.6. The composition of claim 1 , wherein a total amount of acid present is between about 4 and about 7.5% of the composition.7. The composition of claim 6 , wherein the total amount of acid present is between about 4.5 and about 7% of the composition.8. The composition of claim 1 , further comprising a thickener selected from the group consisting of xanthan gum claim 1 , gellan gum claim 1 , carrageenan gum claim 1 , hydroxyethylcellulose and mixtures thereof.9. The composition of claim 1 , wherein(a) lactic acid and phosphoric acid are present in a weight ratio of about 1:3 to about 3:1;{'sub': 9', '11, '(b) the nonionic surfactant comprises a C-Calcohol with a degree of ethoxylation of about 7.5 to about 8.1;'}(c) the polybetaine is present in an amount of about 0.1 to about 1 weight %;(d) water is present in an amount of about 85 to about 95 weight %;(e) optionally further comprising a thickener selected from the group consisting of xanthan gum, gellan gum, carrageenan gum, ...

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26-09-2013 дата публикации

NOVEL HYDROTROPIC AGENT, USE THEREOF TO MAKE NON-IONIC SURFACTANTS SOLUBLE, AND COMPOSITIONS CONTAINING SAME

Номер: US20130247942A1

A compound having Formula (I), nC—H—O-(G)-H, where G is a reducing sugar residue, and p is a decimal number≧1.05 and ≦5. The method for preparing the compound and its use as a hydrotropic surfactant by making soluble, in an aqueous alkaline composition, at least one non-ionic surfactant having Formula (II), R—(O—CH(R′)—CH2)n—(0-CH2-CH2)m-0-H, where R is a straight, branched, saturated or unsaturated aliphatic hydrocarbon radical including 8-14 carbon atoms, R′ is a methyl or ethyl radical, n and m are whole numbers≧0 and ≦15, assuming that n+m≧0. Cleaning compositions containing 0.5% to 20% of compounds of Formula (I), 0.5% to 80% of compounds of Formula (II), 10-50 wt % of at least one alkaline agent, 15-89 wt % of water, and optionally, 10-50 wt % of at least one anti-limescale agent are useful for cleaning hard surfaces. 1. A compound of formula (I):{'br': None, 'i': 'n', 'sub': 7', '15', 'p, 'CH—O-(G)-H\u2003\u2003(I)'}in which G represents the residue of a reducing sugar and p represents a decimal number greater than or equal to 1.05 and less than or equal to 5, or a mixture of said compounds of formula (I).2. The compound of formula (I) or a mixture of said compounds of formula (I) as defined in claim 1 , in which the residue G of a reducing sugar is chosen from glucose claim 1 , xylose and arabinose residues claim 1 , and p represents a decimal number greater than or equal to 1.05 and less than or equal to 2.5.3. A process for preparing the compound of formula (I) or the mixture of said compounds of formula (I) as defined in claim 1 , comprising the following successive steps: {'br': None, 'sub': 'p', 'HO-(G)-H\u2003\u2003(III)'}, 'a step A) of reacting a reducing sugar of formula (III){'sub': 7', '15, 'in which G represents the residue of a reducing sugar, with a molar excess of n-heptanol of formula CH—OH, so as to form a mixture of compounds of formula (I) and of n-heptanol;'}a step B) of removing the n-heptanol from said mixture obtained in step A).4. A ...

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26-09-2013 дата публикации

REACTOR DECONTAMINATION PROCESS AND REAGENT

Номер: US20130251086A1
Принадлежит: ATOMIC ENERGY OF CANADA LIMITED

The present application is related to a concentrated decontaminating reagent composition and related method useful for decontamination of nuclear reactors, or components thereof. The concentrated reagent composition is injected into the nuclear reactor, or component thereof, to form a dilute reagent that comprises from about 0.6 to about 3.0 g/L (2.1-10.3 mM) EDTA and from about 0.4 to about 2.2 g/L (2.1-11.5 mM) citric acid. The composition and method of this application can be used effectively in a regenerative process to decontaminate a nuclear reactor, or a component of thereof, with high efficiency without causing significant corrosion to the components of the cooling systems. 1. A concentrated decontamination reagent for injection , in an injection volume V , into a nuclear reactor , or a component thereof , said nuclear reactor , or component thereof having a volume V , wherein said concentrated decontamination reagent is an aqueous slurry comprising EDTA at a concentration of ((about 0.6 to about 3.0 g/L)×V)÷Vand citric acid at a concentration of ((about 0.4 to about 2.2 g/L)×V)÷V.2. The decontamination reagent according to wherein the ratio of EDTA:citric acid is between 1.5: 1 and 3: 1 by weight.3. The decontamination reagent according to claim 1 , further comprising a corrosion inhibitor.431. The decontamination reagent according to claim 3 , wherein the corrosion inhibitor is Rodine™b A.5. The decontamination reagent according to claim 3 , wherein the corrosion inhibitor is a sulphur and halide free corrosion inhibitor mixture.6. The decontamination reagent according to claim 1 , further comprising an oxygen scavenger.7. The decontamination reagent according to claim 6 , wherein the oxygen scavenger is hydrazine.8. The decontamination reagent according to claim 1 , further comprising a reducing reagent.9. The decontamination reagent according to claim 1 , wherein the concentration of EDTA is ((about 1.8 g/L)×V)÷Vand the concentration of citric acid is (( ...

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03-10-2013 дата публикации

METHOD FOR OPERATING A DIRT STOP SURFACE, DIRT STOP SURFACE UNIT AND DIRT STOP SURFACE ASSEMBLED THEREFROM

Номер: US20130255727A1
Автор: Magony Richard
Принадлежит:

The invention relates to a method for cleaning of indoor or outdoor areas by operating a dirt stop surface, comprising the steps of dividing the dirt stop surface () into surface units (), dispensing a fluid flow on the surface to be cleaned, while the proximity of the surface to be cleaned is sensed separately for each surface unit (), and the fluid is dispensed from the surface units () of the dirt stop surface in a selective manner such that only the surface units () in the proximity of which the presence of the surface to be cleaned has been sensed are applied for dispensing the fluid. The invention relates further to a dirt stop surface unit and a dirt stop surface assembled therefrom that is capable of carrying out the method. 1. Method for operating a dirt stop surface , comprising the steps of:dividing the dirt stop surface into surface units,dispensing a fluid to flow on a surface to be cleaned, where the fluid is adapted for removing contamination from the surface to be cleaned, anddraining off the fluid from the surface to be cleaned, the proximity of the surface to be cleaned is sensed separately for each surface unit, and', 'the fluid is dispensed from the surface units of the dirt stop surface in a selective manner such that', 'only the surface units in the proximity of which the presence of the surface to be cleaned has been sensed are dispensing the fluid., 'characterised by that'}2. The method according to claim 1 , at least three sensors are applied for each surface unit,', 'one or more openings are arranged in the surface unit in an area bounded by straight lines connecting adjacent sensors located closest to an edge of the surface unit, and', 'fluid is dispensed from an outlet opening when the proximity of the surface to be cleaned is indicated simultaneously by all sensors of the given surface unit., 'characterised by that'}3. The method according to claim 2 , the sensors are implemented as mechanical sensor means, and', 'the flow of the fluid ...

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03-10-2013 дата публикации

DEVELOPMENT OF EXTENSIONAL VISCOSITY FOR REDUCED ATOMIZATION FOR DILUTED CONCENTRATE SPRAYER APPLICATIONS

Номер: US20130255729A1
Принадлежит: ECOLAB USA INC.

A non-Newtonian concentrate composition includes a sensitizer or irritant, a surfactant, an anti-mist component and optionally a stability component. Example sensitizers and irritants include, but are not limited to, acids, quaternary compounds, and amines, and example anti-mist components include, but are not limited to, polyethylene oxide and polyacrylamide. 1. A non-Newtonian aqueous concentrate composition comprising:at least one acid;at least one surfactant; andat least one anti-mist component selected from the group consisting of polyethylene oxide, polyacrylamide and polyacrylate, wherein the composition is a non-Newtonian having a viscosity of less than about 40 centipoise.2. The non-Newtonian aqueous concentrate composition of claim 1 , wherein the polyethylene oxide has a molecular weight between about 3 claim 1 ,000 claim 1 ,000 and about 7 claim 1 ,000 claim 1 ,000.3. The non-Newtonian aqueous concentrate composition of claim 1 , further comprising at least one stability component selected from the group consisting of antioxidants claim 1 , chelants claim 1 , and solvents.4. The non-Newtonian aqueous concentrate composition of claim 3 , wherein the solvent is selected from the group consisting of propylene glycol and glycerine.5. The non-Newtonian aqueous concentrate composition of claim 1 , further comprising at least two stability components selected from the group consisting of antioxidants claim 1 , chelants claim 1 , and solvents.6. The non-Newtonian aqueous concentrate composition of claim 1 , wherein the acid includes at least one of phosphoric acid claim 1 , citric acid claim 1 , lactic acid claim 1 , and methane sulfonic acid.7. The non-Newtonian aqueous concentrate composition of claim 1 , wherein the concentrate composition has a pH of 4.5 or lower.8. The non-Newtonian aqueous concentrate composition of claim 1 , further comprising water claim 1 , and wherein water constitutes between about 45% and about 75% by weight of the aqueous ...

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03-10-2013 дата публикации

SUBSTRATE CLEANING APPARATUS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SUBSTRATE CLEANING APPARATUS

Номер: US20130258300A1
Автор: NISHIYAMA Koji
Принадлежит:

A rotating shaft is provided to extend downward from the inside of a spin motor. A plate supporting member is attached to the lower end of the rotating shaft. A spin plate is supported in a horizontal attitude by the plate supporting member. A substrate holding mechanism is provided at the periphery on the spin plate. The lower end of an annular member is formed to be opposite to an annular region extending along the periphery on the upper surface of the substrate held by a spin chuck. A distance between the upper surface of the substrate and the lower surface of the spin plate is larger than a distance between the upper surface of the substrate and the lower end of the annular member. 1. A substrate cleaning apparatus that cleans a lower surface of a substrate , comprising:a rotating member that is provided to be rotatable around a rotation axis extending in a vertical direction;a rotation-driving device that rotates said rotating member;a holding member that is configured to be rotatable together with said rotating member and holds the substrate by abutting against an outer peripheral edge of the substrate at a position below said rotating member;a shield member that is provided at said rotating member so as to cover a space above an upper surface of the substrate held by said holding member and has an opening at a position in which said rotation axis is included;a fluid supply mechanism that supplies a fluid through said opening to the upper surface of the substrate held by said holding member; anda cleaning mechanism that cleans the lower surface of the substrate held by said holding member; whereinsaid shield member hasan opposite lower surface that is opposite to the upper surface of the substrate held by said holding member around said opening, andan annular lower end that is formed around said opposite lower surface so as to be opposite to an annular region extending along a periphery in the upper surface of the substrate held by said holding member, anda ...

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10-10-2013 дата публикации

PROCESS FOR THE REMOVAL OF POLYMER THERMOSETS FROM A SUBSTRATE

Номер: US20130263888A1

The present invention relates to a process for the removal of polymer thermosets from the substrates without damaging the substrates. The present invention relates to a process for the removal of polymer thermoset from the substrate retaining the physical and chemical properties of the substrates. The present invention more particularly relates to the use of bio molecules for cleaving polymer thermosets and the process to perform the cleaving. 1. A process for the removal of polymer thermoset from a substrate by using cleaving agent without damaging the substrate and the said process comprising the steps of:i. providing a polymer thermoset coated substrate, wherein polymer thermoset is an epoxy resin containing cross linker having at least one S-S bond,ii. preparing 10 to 50% cleaving agent solution in a solvent,iii. removing the polymer thermoset by dipping the substrate as provided in step (i) in cleaving agent solution as prepared in step (ii) for a period in the range of 2 to 6 h at a temperature in the range of 20° C. to 100° C. to obtain the undamaged substrate on the removal of polymer thermoset.2. (canceled)3. The process as claimed in claim 1 , wherein the cross linker is cystamine.4. The process as claimed in claim 1 , wherein cleaving agent used in step (ii) comprises oxidizing or reducing molecules particularly bio molecules.5. The process as claimed in claim 4 , wherein bio molecules comprises peptides claim 4 , proteins or enzymes or combination thereof.6. The process as claimed in claim 4 , wherein biomolecules are selected from the group consisting of glutathione claim 4 , thioredoxin claim 4 , peroxiredoxin or dithiothreitol (DTT) or combination thereof.7. The process as claimed in claim 1 , wherein substrate used in step (i) are made of material consisting of glass claim 1 , silicon claim 1 , ITO (Indium-doped Tin Oxide) coated glass claim 1 , metal claim 1 , metal alloy claim 1 , semi conductor and polymers.8. The process as claimed in claim 1 , ...

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10-10-2013 дата публикации

Rotating drum type work washing apparatus

Номер: US20130263898A1
Принадлежит: HIRAIDE PRECISION CO Ltd

In a rotating drum ( 4 ) of a rotating drum type workpiece washing apparatus ( 1 ), a first cylindrical body section ( 21 ), in which a liquid impassable part ( 21 a ) that follows the circumferential orientation and does not allow a washing solution to pass and a liquid passing part ( 21 b ) that allows the washing solution to pass are formed, is provided. With the rotation of a rotating drum ( 4 ), workpiece (w) is transported in the direction of the line of the central axis along the inner circumferential surface part on the lower side inside the rotating drum by spiral workpiece transport fins ( 8 ) formed along the inner circumferential surface inside the rotating drum. During transport with the rotation of the rotating drum ( 4 ), the washing configuration for the workpiece is switched from immersion washing to flowing water washing and shower washing in that order. The workpiece can be washed indifferent configurations; therefore, the washing effect on the workpiece can be increased by the rotating drum with the spiral workpiece transport fins.

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10-10-2013 дата публикации

MOTOR PUMP UNIT FOR A HIGH-PRESSURE CLEANING APPLIANCE, AND HIGH-PRESSURE CLEANING APPLIANCE

Номер: US20130263899A1
Принадлежит:

A motor pump unit for a high-pressure cleaning appliance is provided, in which the cleaning liquid conveyed by the pump assembly is used for cooling the motor, comprising a motor housing which surrounds the motor, and a cooling channel which surrounds the motor and through which the cleaning liquid can flow for heat dissipation. To provide a motor pump unit having a level of electrical safety which is higher than that of a conventional motor pump unit, the cooling channel surround the motor housing, and the motor pump unit comprise at least one thermally conductive spacer element by way of which the cooling channel is spaced from the motor housing. A high-pressure cleaning appliance is also provided. 1. A motor pump unit for a high-pressure cleaning appliance , the motor pump unit comprising a motor and a pump driven by the motor , in which motor pump unit the cleaning liquid conveyed by the pump assembly is used for cooling the motor , comprising a motor housing which surrounds the motor , and a cooling channel which surrounds the motor and through which the cleaning liquid flows for heat dissipation , the cooling channel surrounding the motor housing , and the motor pump unit comprising at least one thermally conductive spacer element by way of which the cooling channel is spaced from the motor housing.2. The motor pump unit in accordance with claim 1 , wherein the interspace formed between the motor housing and the cooling channel and bridged by the at least one spacer element is filled with gas.3. The motor pump unit in accordance with claim 1 , wherein the at least one spacer element is formed in one piece with the motor housing.4. The motor pump unit in accordance with claim 3 , wherein the at least one spacer element together with the motor housing is made of aluminum or an aluminum alloy.5. The motor pump unit in accordance with claim 3 , wherein the at least one spacer element together with the motor housing is produced as a die-cast part.6. The motor pump ...

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17-10-2013 дата публикации

SYSTEM FOR DELIVERY OF PURIFIED MULTIPLE PHASES OF CARBON DIOXIDE TO A PROCESS TOOL

Номер: US20130269732A1
Принадлежит:

A carbon dioxide supply method and system for supplying supercritical and subcritical phases of carbon dioxide on-demand to a substrate to create a novel and improved cleaning sequence for removal of contaminants contained in the substrate. The ability for the supply system to deliver vapor, liquid and supercritical phases of carbon dioxide in a specific sequence at predetermined times during a process cleaning sequence produces an improved removal of contaminants from the substrate compared to conventional carbon dioxide cleaning processes. 1. A method for delivering supercritical and non-supercritical phases of carbon dioxide to create a customized cleaning sequence for the removal of contaminants from a surface of a substrate , comprising the steps of:introducing a solvent fluid comprising carbon dioxide in a supercritical phase into a chamber containing the substrate, wherein the supercritical phase is mixed with co-solvent additives;transferring contaminants from the substrate surface into the supercritical carbon dioxide phase to form at least a partially spent supercritical phase of carbon dioxide;removing the at least partially spent supercritical carbon dioxide phase from the chamber and simultaneously introducing fresh carbon dioxide in the supercritical phase into the chamber so as to dilute the spent supercritical carbon dioxide and substantially inhibit the contaminants from precipitating onto the substrate surface, wherein the fresh carbon dioxide optionally includes additional co-solvents dissolved therein;subsequently introducing carbon dioxide in a liquid phase into a chamber; andflowing the carbon dioxide liquid phase over the substrate surface to flush and rinse the substrate surface and thereby remove the contaminants, and the co-solvents and the additional co-solvents that may have remained on the substrate surface after the cleaning sequence.2. The method of claim 1 , wherein the dilution step occurs at constant pressure.3. The method of claim ...

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17-10-2013 дата публикации

MOULD DRUM AND CLEANING APPARATUS FOR A MOULD DRUM

Номер: US20130273192A1
Принадлежит: CFS Bakel B.V.

The present invention relates to a mould drum for moulding products from a mass of food starting material. The mould drum comprises one or more cavities with a mould cavity wall having at least partially a porous structure, whereas each cavity is connected to a passage. The present invention further relates to a cleaning apparatus for the inventive mould drum with supporting means for supporting the axis of the drum. Additionally, the present invention relates to a process for cleaning the inventive drum. 1. Mould drum for moulding products from a mass of food starting material , comprising one or more cavities with a mould cavity wall having at least partially a porous structure , whereas each cavity is connected to a passage , characterized in that the passage extends from the first front end to the second front end of the mould drum.227-. (canceled)28. Mould drum preferably according to claim 1 , characterized in claim 1 , that the first front end comprises distribution means claim 1 , preferably a ring claim 1 , for a cleaning fluid.29. Mould drum according to claim 1 , characterized in claim 1 , that the passage is connected to the distribution means.30. Mould drum according to claim 1 , characterized in claim 1 , that one front end comprises form-fit-means to rotate the mould drum.31. Mould drum according to claim 1 , characterized in claim 1 , that it comprises an axis of rotation claim 1 , that extends from both ends.32. Mould drum preferably according to claim 1 , characterized in claim 1 , that it comprises a hollow axis of rotation and/or a hollow journal.33. Mould drum according to claim 1 , characterized in claim 1 , that it comprises a bearing.34. Mold drum according to claim 1 , characterized in claim 1 , that it comprises recognition means.35. Apparatus for a mould drum preferably according to with supporting means for the drum claim 1 , wherein the supporting means covers one or both front ends of the mould drum claim 1 , characterized in that the ...

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24-10-2013 дата публикации

Hyperbaric methods and systems for rinsing and drying granular materials

Номер: US20130276822A1
Автор: Plavidal Richard W.
Принадлежит: Advanced Wet Technologies GmbH

Polysilicon granules can be cleaned, rinsed and dried by hyperbaric superheated liquid and superheated steam. The superheated liquid can be used to rinse and heating the polysilicon granules. A slow drain can be open to remove the superheated liquid. A fast drain then can be open, preferably to atmosphere, to allow steam to vent through bottom. The fast drain can function as a drying process, vaporizing water droplets down the drain with the escaping steam. 1. A method for cleaning granular silicon-containing materials , the method comprisingproviding silicon-containing granules into a first chamber;supplying a superheated liquid to the first chamber to at least partially submerge the silicon-containing granules;draining the superheated liquid to a second chamber, wherein the pressure of the second chamber is similar to that of the first chamber when draining;reducing the pressure in the first chamber to evaporate liquids on the silicon-containing granules.2. A method as in wherein the silicon-containing granules are provided in a V-shape tray.3. A method as in further comprisingestablishing a first pressure in the first chamber after providing the silicon-containing granules in the first chamber,wherein the first pressure is similar to the pressure of the superheated liquid.4. A method as in further comprisingsupplying a superheated steam to the first chamber after providing the silicon-containing granules in the first chamber.5. A method as in further comprisingadding a chemical to the superheated steam,wherein the chemical comprises HF or an oxygen-gettering chemical.6. A method as in further comprisingestablishing an oxygen-inactive ambient in the first chamber after providing the silicon-containing granules in the first chamber.7. A method as in further comprisingrepeating supplying and draining the superheated liquid.8. A method as in further comprisingcyclically releasing and stopping releasing pressure in the chamber before draining the superheated liquid.9. ...

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24-10-2013 дата публикации

HYDRODYNAMIC MULTIPURPOSE WASHING DEVICE INCLUDING DETERGENT

Номер: US20130276839A1
Автор: Yoo Wan Ki
Принадлежит:

The present invention relates to a hydrodynamic multipurpose washing device including a detergent, wherein the spray pressure is increased by even a small flux to maximize cleaning power using only the hydraulic pressure of tap water without a separate pressurization device such as a pressure pump, a detergent is combined and is diluted with water to be sprayed to facilitate the washing of an oil components and protein components which are difficult to be washed off with pure water, and a brush for removing solidified foreign matter and reducing washing time is provided to facilitate washing selections according to a need. 1. A hydrodynamic multipurpose washing device comprising a detergent , mounted in an end portion of a water valve and for adjusting and ejecting a detergent ejection amount and a water amount in a high pressure while increasing an ejection pressure and reducing a water amount area flowing through a water pressure of water discharged from a water tap , the hydrodynamic multipurpose washing device comprising:{'b': '10', 'an I-shape body ;'}{'b': '20', 'an ejecting nozzle positioned at a head portion of the body to perform bubble washing and rinse washing of a washing object by ejecting a detergent and water in a high pressure through an internal orifice pipe;'}{'b': '30', 'a flow channel pipe positioned at the rear end of the ejection nozzle to integrally connect between the ejection nozzle and a water pressure adjusting unit and for supplying a detergent and water toward the ejection nozzle;'}{'b': '40', 'the water pressure adjusting unit positioned at the rear end of the flow channel pipe to adjust an amount of water in order to inject water together with the detergent into the ejection nozzle by adjusting a water pressure of water discharged from the water tap; and'}{'b': '50', 'a water supply valve connected to the rear end of the water pressure adjusting unit and the end portion of the water valve to supply water discharged from the water tap ...

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31-10-2013 дата публикации

PLASMA SPRAY APPARATUS INTEGRATING WATER CLEANING

Номер: US20130284203A1
Автор: VanEvery Kent
Принадлежит: PROGRESSIVE SURFACE, INC.

An integrated apparatus and method comprises a plasma gun with a water supply, treatment fluid supply, and controls, the combination of which is adapted for directing a plume onto a surface of a three-dimensional part to treat the surface; and for controlling injection of water into the plume with the plume directed onto an adjacent surface to clean debris and undesired material from the adjacent surface; and for subsequently directing the plume (without water) onto the adjacent surface to treat the adjacent surface. The apparatus and method are particularly useful in suspension plasma spray systems, but are not believed to be limited to that. 1. A plasma spray surface treatment apparatus comprising:a plasma gun constructed to generate a plume for treating a surface of a three-dimensional part;a liquid supply including water;a water line for transferring the water from the liquid supply into the plume;a treatment fluid supply;a treatment fluid line for transferring the treatment fluid from the treatment fluid supply into the plume; andat least one control for controlling flow of the water and of the treatment fluid into the plume.2. The apparatus of claim 1 , wherein the treatment fluid includes a suspension.3. An integrated method of plasma surface treating process comprising:injecting water into a plume of a plasma gun and directing the plume onto a surface to clean debris and undesirable particles from the surface.4. The method defined in claim 3 , including directing the plume with water onto a three-dimensional part to clean the surface claim 3 , and thereafter treating the surface with the plume without the water.5. The method defined in claim 3 , including treating a portion of the surface with the plume before injecting the water claim 3 , and thereafter directing the plume with the injected water onto an adjacent portion of the surface to clean the adjacent surface.6. The method of claim 3 , wherein the treatment fluid includes a suspension. This ...

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07-11-2013 дата публикации

Hyperbaric Methods and Systems for Surface Treatment, Cleaning, and Drying

Номер: US20130291901A1
Автор: Plavidal Richard W.
Принадлежит:

Objects with complex surface profiles can be cleaned effectively using hyperbaric pressure. After partially submerging an object in a superheated liquid, the pressure of the vapor portion of the superheated liquid can be cycled. For example, a valve connected to the vapor portion of the superheated liquid can be opened to an ambient, such as atmospheric ambient to release the chamber pressure. The chamber pressure then can increased, for example, by re-equilibrium or by introducing superheated vapor or heated vapor or gas. During the release of pressure, bubbles can formed on the surface of the object. During the increase of the pressure, the bubbles can be collapsed. The cycling of the bubbles can clean the object surface. 1. A cleaning method using hyperbaric pressure , the method comprising providing an object in a chamber; wherein the superheated liquid has a temperature above the boiling temperature at atmospheric pressure,', 'wherein the superheated liquid partially fills the chamber so that the chamber comprises a liquid portion and a vapor portion;, 'flowing a superheated liquid to the chamber to at least partially submerge the object,'} 'wherein the ambient has lower vapor pressure than the chamber;', 'connecting the vapor portion of the chamber to an ambient,'}, 'repeatedly'}disconnecting the connection.2. A method as in wherein connecting the vapor portion of the chamber to the ambient reduces the pressure of the chamber claim 1 , wherein the reduced pressure is configured to generate bubbles at a surface of the object.3. A method as in wherein disconnecting the connection of the vapor portion of the chamber to the ambient increases the vapor pressure of the chamber due to the vaporization of the liquid portion of the chamber claim 1 , wherein the increased pressure is configured to terminate generated bubbles.4. A method as in wherein the superheated liquid comprises water at temperature above 100 C.5. A method as in wherein the temperature of the ...

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07-11-2013 дата публикации

Hyperbaric Methods and Systems for Surface Treatment, Cleaning, and Drying

Номер: US20130291902A1
Автор: Plavidal Richard W.
Принадлежит:

Objects can be dried by a quick release of superheated vapor. After providing a superheated vapor to a chamber, the superheated vapor can be released. During the release of pressure, liquid droplets can be evaporated, drying the object. 1. A method comprisingproviding an object in a chamber; 'wherein the superheated vapor has a temperature above the boiling temperature at atmospheric pressure;', 'flowing a superheated vapor to the chamber,'}draining the superheated vapor.2. A method as in wherein the superheated vapor comprises superheated steam.3. A method as in wherein the superheated vapor is drained at a rate configured to evaporate liquid droplets adhering to the object.4. A method as in wherein the temperature of the superheated vapor is between 110 and 200 C claim 1 , wherein the pressure of the superheated vapor is between 1 and 20 bars.5. A method as in further comprisingadding a new superheated vapor to the chamber;draining the new superheated vapor.6. A method comprisingproviding an object in a chamber; wherein the superheated liquid has a temperature above the boiling temperature at atmospheric pressure,', 'wherein the superheated liquid partially fills the chamber so that the chamber comprises a liquid portion and a vapor portion;, 'flowing a superheated liquid to the chamber,'}draining the liquid portion of the superheated liquid;draining the vapor portion of the superheated vapor.7. A method as in wherein the superheated liquid is drained to a second chamber claim 6 , wherein the pressure of the second chamber is similar to that of the first chamber.8. A method as in wherein the superheated vapor is drained at a rate configured to evaporate liquid droplets adhering to the object.9. A method as in wherein the temperature of the superheated vapor is between 110 and 200 C claim 6 , wherein the pressure of the superheated vapor is between 1 and 20 bars.10. A method as in wherein the temperature of the superheated liquid is between 110 and 200 C claim 6 , ...

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21-11-2013 дата публикации

Jewelry washing machine and method

Номер: US20130306111A1
Автор: Bryan K. MYERS
Принадлежит: SHADE SAVER Inc

A machine is presented for the cleaning of jewelry. The machine allows the manual or automatic cleaning of jewelry. Under both modes of operation, the jewelry is secured by a user to a support bracket inside a transparent, water-tight cylindrical wash chamber. When in manual mode, the user can direct the spray of wash fluid onto the jewelry by rotating the jewelry using a trackball. When used in automatic mode, the machine washes the jewelry during a preset washing cycle. For both modes, the washing cycle is followed by the drying cycle where a blower directs air onto the jewelry for a set time period to blow off excess moisture. The drying cycle concludes with a blower venting the cylindrical wash chamber to remove residual moisture from the wash chamber and the jewelry. After the cleaning, the user removes the jewelry from the machine.

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21-11-2013 дата публикации

CLEANING APPARATUS AND METHOD

Номер: US20130306113A1
Принадлежит: Carts & Parts, Inc.

An apparatus and method for cleaning a surface comprising a gas dispensing conduit having a first end connectable to a source of pressurized gas and an open second end such that a stream of pressurized gas may be dispensed from the open second end of the gas dispensing conduit. A liquid dispensing conduit is connectable to a source of liquid and associated with the gas dispensing conduit in such a way that liquid is introduced into the stream of pressurized gas wherein the liquid dispensing conduit allows liquid to be introduced into the stream of pressurized gas at a rate that causes the liquid to contact the surface to be cleaned while substantially preventing the liquid from running off the surface. 1. An apparatus for cleaning a surface , comprising:a gas dispensing conduit having a first end connectable to a source of pressurized gas and an open second end such that a stream of pressurized gas may be dispensed from the open second end of the gas dispensing conduit; anda liquid dispensing conduit having a first end and a second end, the first end connectable to a source of liquid and the second end associated with the gas dispensing conduit in such a way that liquid is introduced into the stream of pressurized gas,wherein the liquid dispensing conduit allows liquid to be introduced into the stream of pressurized gas at a rate that causes the liquid to contact the surface to be cleaned while substantially preventing the liquid from running off the surface.2. The apparatus of claim 1 , wherein the liquid dispensing conduit is configured to introduce liquid into the stream of pressurized gas at a liquid-to-gas ratio in a range from about 0.5 ml to about 2 ml per one cubic foot of pressurized gas when the stream of pressurized gas is dispensed from the open second end of the gas dispensing conduit at a pressure in a range from about 80 psi to about 150 psi and at a flow rate in a range from about 125 cfm to about 400 cfm.3. The apparatus of claim 3 , wherein the ...

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28-11-2013 дата публикации

APPARATUS AND METHODS FOR CLEANING MATS

Номер: US20130312795A1
Автор: Camarano Dino Anthony
Принадлежит:

A mat caddy allows a person to wheel the caddy to the location of heavy rubber bar and kitchen mats to load or unload the mats into or from the caddy at the point of use of the mats. The mat caddy can be filled with water, cleanser, and/or disinfectant to allow the mats to soak, clean and disinfect. The mat caddy has a drain to allow the liquid to easily drain from the mat caddy. The mat caddy resolves the issue of having to drag heavy rubber bar and kitchen mats outside to clean them while saving time and preventing injury to employees. 1. A mat caddy comprising:a tank having a plurality of walls;a door disposed as one of the plurality of the walls of the tank, the door sealingly engagable with adjacent walls, the door permitting access into the tank;a drainage basin disposed as a bottom member of the tank;a plurality of dividers disposed inside the tank, the dividers providing mat stations inside the tank; anda drain hole in the drainage basin.2. The mat caddy of claim 1 , further comprising a frame supporting the tank.3. The mat caddy of claim 2 , further comprising a plurality of casters supporting the frame on a surface.4. The mat caddy of claim 1 , wherein the drainage basin slopes toward the drain hole.5. The mat caddy of claim 1 , further comprising:a drain pipe extending from the drain hole; anda valve disposed to control fluid flow through the drain pipe.6. The mat caddy of claim 1 , further comprising a plurality of seals and locks to retain the door in a sealing engagement with the adjacent walls of the tank.7. A mat caddy comprising:a tank having a plurality of walls;a door disposed as one of the plurality of the walls of the tank, the door sealingly engagable with adjacent walls, the door permitting access into the tank;a drainage basin disposed as a bottom member of the tank;a plurality of dividers disposed inside the tank, the dividers providing mat stations inside the tank;a drain hole in the drainage basin;a frame supporting the tank;a plurality of ...

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05-12-2013 дата публикации

Washing method and apparatus for removing contaminations from article

Номер: US20130319468A1
Автор: Keita Yanagawa
Принадлежит: Denso Corp

A method for washing an article to remove contaminations such as oils and fats, foreign substances and the like from a surface of the article is provided. The washing method comprises the steps of: cooling a washing solution to obtain a super-cooled washing solution; heating an article to increase its surface temperature to the temperature which is not lower than the boiling point of the washing solution; and washing and drying the article concurrently, while spraying the super-cooled washing solution to the heated article. The washing apparatus for carrying out this washing method is also provided. Using these washing method and apparatus, it becomes possible to downsize a scale of the washing apparatus, and to operate the washing apparatus under the energy-saving conditions as a result of reduction in an amount of the consumed energies, and the washing process at an accelerated speed.

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05-12-2013 дата публикации

PERFECTED WASHING PLANT

Номер: US20130319475A1
Автор: Zardini Fabio
Принадлежит: STEELCO SPA

A washing plant () comprises a battery () of washing and heat-disinfection machines () disposed along an alignment axis (X), able to operate in parallel with respect to each other in order to effect the washing and heat-disinfection, at least a translator slider () mobile in an automatic manner parallel to the alignment axis (X) in a front position to said battery (), which receives the objects to be washed and both transports them in correspondence to the entrance of one of the machines () selected on each occasion depending on the washing program set or depending on availability, and moves them inside the desired machine () in a direction of feed (F) substantially perpendicular to said alignment axis (X), transport means () being provided to direct the objects to be washed toward the translator slider () operating in a direction of transport (Y) substantially parallel to said alignment axis (X). The translator slider () comprises a lower frame () associated slidably to the battery () of machines (), in order to allow the movement parallel to the alignment axis (X), and a rotating upper frame () suitable to support the objects to be washed and which comprises movement means () to move the objects inside the desired machine () in said direction of feed (F), said rotating upper frame () being rotatably coupled to the lower frame () by means of rotation means (), so as to be able to be rotated between a first position, aligned to said direction of transport (Y) of the transport means () and in which it is configured to receive the objects from said transport means (), and a second position, aligned to said direction of feed (F) to direct the objects inside the desired machine (). 1. Translator slider for a washing plant to carry out at least a washing cycle on objects , which provides at least a washing and heat-disinfection operation , said translator slider being mobile in an automatic manner parallel to an alignment axis of a battery of washing and heat- ...

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12-12-2013 дата публикации

Dual cleaning apparatus

Номер: US20130327357A1
Автор: Audrey Muhr-Sweeney
Принадлежит: Individual

The present disclosure relates to a cleaning apparatus providing a user with the ability to perform two cleaning functions with the same apparatus. According to one aspect of the present disclosure the cleaning apparatus includes an elongated body portion having first and second ends, a first tip integral with the first operative end, the first tip including a first solution for performing a first cleaning function, and a second tip integral with the second operative end, the second tip including a second solution to the second operative end for performing a second cleaning function.

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12-12-2013 дата публикации

Foam Control Composition

Номер: US20130327364A1
Принадлежит: Dow Corning Corporation

A process for washing a substrate. The process involves providing a detergent composition that includes a surfactant and an antifoam. The antifoam comprises a hydrophobic fluid having a surface tension of at least 27 mN/m and less than 40 mN/m and a finely divided solid hydrophobic filler dispersed in the hydrophobic fluid. The process further involves washing the substrate in an aqueous medium with the detergent composition. The antifoam does not affect foaming during the washing step. During the washing step, the detergent composition is applied to the substrate. The process further involves rinsing the substrate with the applied detergent composition with water, whereby foaming during the rinsing step is inhibited. 1. A process for washing a substrate comprising:(a) providing a detergent composition including a surfactant and an antifoam, wherein the antifoam comprises (A) a hydrophobic fluid having a surface tension of at least 27 mN/m and less than 40 mN/m, and (B) a finely divided solid hydrophobic filler dispersed in the hydrophobic fluid;(b) washing the substrate in an aqueous medium with the detergent composition, whereby the antifoam does not affect foaming during the washing step and whereby the detergent composition is applied to the substrate during the washing step; and(c) rinsing the substrate with the applied detergent composition with water, whereby foaming during the rinsing step is inhibited.2. A process for washing a substrate according to wherein the concentration of the surfactant in the aqueous medium during the (b) washing is above a critical micelle concentration and the concentration of the surfactant in the rinse water in the (c) rinsing is below the critical micelle concentration.3. A process for washing a substrate according to wherein the substrate comprises fabric and the detergent composition is a laundry detergent composition.4. A process for washing a substrate according to in which the laundry detergent composition is in powder ...

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19-12-2013 дата публикации

METHOD OF MANUFACTURING HARD DISK DRIVE DEVICE AND HARD DISK DRIVE DEVICE

Номер: US20130333204A1

An embodiment of the present invention is a method of manufacturing a hard disk drive device including a hub member on which a recording disk is to be mounted and a base member configured to rotatably support the hub member via a bearing part. When constituent members including the base member, the hub member, and the bearing part are referred to as works, the manufacturing method includes: cleaning at least one of the works with a cleaning agent containing at least one of an ester and an ether, and a surfactant; and assembling the hard disk drive device by using the work having been subjected to the cleaning. 1. A method of manufacturing a hard disk drive device including: a hub member on which a recording disk is to be mounted; and a base member configured to rotatably support the hub member via a bearing part , the method comprising:when constituent members including the base member, the hub member, and the bearing part are referred to as works,cleaning at least one of the works by using a cleaning agent containing at least one of an ester and an ether, and a surfactant in a mass ratio of the total of the ester and the ether to the surfactant of 1:1 to 1:4, in which at least one of a fatty acid and a fatty acid ester, and a hydrocarbon, which are attached to the at least one of the works, are removed; andassembling the hard disk drive device by using the work having been subjected to the cleaning.2. The method of manufacturing a hard disk drive device according to claim 1 , whereineach of the ester and the ether contained in the cleaning agent has a molecular weight of 118 to 188.3. The method of manufacturing a hard disk drive device according to claim 1 , whereinthe cleaning includes contacting the work with an aqueous solution containing the cleaning agent and having a temperature of 70° C. or lower.4. The method of manufacturing a hard disk drive device according to claim 1 , whereinthe ester contains a fatty acid diester.5. The method of manufacturing a hard ...

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