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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 2338. Отображено 100.
08-03-2012 дата публикации

Titania-doped quartz glass and making method

Номер: US20120058419A1
Автор: Hisatoshi Otsuka, Naoki Yanagisawa, Osamu Sekizawa, Shigeru Maida
Принадлежит: Shin Etsu Chemical Co Ltd

A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip.

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Номер записи: 1
22-11-2012 дата публикации

Copper-contaning silica glass, method for producing the same, and xenon flash lamp using the same

Номер: US20120291488A1
Автор: Akira Fujinoki, Hidetsugu Yoshida, Hiroyuki Nishimura, Masahiro Nakatsuka, Michinari Ohuchi, Tetsuji Ueda
Принадлежит: OPTO ELECTRONICS Labs Inc, Shin Etsu Quartz Products Co Ltd

It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

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Номер записи: 2
20-12-2012 дата публикации

Glass composition and optical device

Номер: US20120319015A1
Автор: Taihei Mukaide, Tomohiro Watanabe
Принадлежит: Canon Inc

There is provided a glass composition containing an oxide containing Lu, Si, and Al, in which the composition of the glass composition lies within a compositional region of a ternary composition diagram of Lu, Si, and Al in terms of cation percent, the compositional region being defined by the following six points: (32.3% Lu0 3/2 , 30.0% SiO 2 , 37.7% AlO 3/2 ), (32.3% Lu0 3/2 , 37.7% SiO 2 , 30.0% AlO 3/2 ), (20.8% Lu0 3/2 , 55.0% SiO 2 , 24.2% AlO 3/2 ), (10.0% Lu0 3/2 , 45.0% SiO 2 , 45.0% AlO 3/2 ), (20.8% Lu0 3/2 , 24.2% SiO 2 , 55.0% AlO 3/2 ), and (30.0% Lu0 3/2 , 25.0% SiO 2 , 45.0% AlO 3/2 ). For the glass composition, a glassy state having low or no intrinsic birefringence in the ultraviolet region is stably obtained.

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Номер записи: 3
20-12-2012 дата публикации

Synthetic amorphous silica powder and method for producing same

Номер: US20120321894A1
Автор: Toshiaki Ueda
Принадлежит: Mitsubishi Materials Corp

The synthetic amorphous silica powder of the present invention is characterized in that it comprises a synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D 50 of 10 to 2,000 μm; wherein the synthetic amorphous silica powder has: a quotient of 1.00 to 1.35 obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D 50 ; a real density of 2.10 to 2.20 g/cm 3 ; an intra-particulate porosity of 0 to 0.05; a circularity of 0.75 to 1.00; and a spheroidization ratio of 0.55 to 1.00.

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Номер записи: 4
28-02-2013 дата публикации

Compositions for low k, low temperature co-fired composite (ltcc) tapes and low shrinkage, multi-layer ltcc structures formed therefrom

Номер: US20130052433A1
Автор: Kumaran Manikantan Nair, Mark Frederick Mccombs, Stephen C. Beers
Принадлежит: EI Du Pont de Nemours and Co

Novel compositions for LTCC green tapes having low K values and low shrinkage and composite laminates of ten to twenty layers or more of green tapes together with conventional LTCC green tapes.

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Номер записи: 5
04-04-2013 дата публикации

Quartz glass body and a method and gel body for producing a quartz glass body

Номер: US20130085056A1
Автор: Thomas Kreuzberger
Принадлежит: QSIL GMBH QUARZSCHMELZE ILMENAU

A method for producing a quartz glass body from a get body is provided, wherein the gel body generated from a colloidal suspension is at least formed and compressed into the quartz glass body Displacement bodies are added to the colloidal suspension prior to gelating into the gel body, and are completely removed from the gel body after gelating, wherein hollow spaces are generated at the positions of the removed displacement bodies, so that a translucent or opaque quartz glass body is generated. Further, a gel body for producing a quartz glass body is provided, wherein displacement bodies are introduced into the gel body that can be completely removed from the gel body, so that hollow spaces arise at the positions of the displacement bodies. A quartz glass body is also provided that includes vacuoles or hollow spaces filled with gas.

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Номер записи: 6
09-05-2013 дата публикации

Silica glass having improved properties

Номер: US20130116108A1
Автор: Ben Matthew Gauthier, Konstantin S. Zuyev, Martin Panchula, Nathan J. Cassingham, Robert Stephen Pavlik, Yan Zhou
Принадлежит: Momentive Performance Materials Inc

The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.

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Номер записи: 7
30-05-2013 дата публикации

Method for producing synthetic quartz glass

Номер: US20130133377A1
Автор: Heinz Fabian, Juergen Roeper
Принадлежит: Heraeus Quarzglas GmbH and Co KG

A known method for producing synthetic quartz glass comprises the method steps of: forming a stream of a SiO 2 feedstock material which contains octamethylcyclotetrasiloxane (D4) as the main component which has a reference molecular mass assigned to it, feeding the stream to a reaction zone in which the feedstock material is converted under formation of amorphous SiO 2 particles by pyrolysis or hydrolysis into SiO 2 , depositing the amorphous SiO 2 particles on a deposition surface while forming a porous SiO 2 soot body, and vitrifying the SiO 2 soot body while forming the synthetic quartz glass. Starting therefrom, to enable the production of large-volume cylindrical soot bodies with outer diameters of more than 300 mm of improved material homogeneity, it is suggested according to the invention that the feedstock material contains additional components in the form of further polyalkylsiloxanes, wherein light polyalkylsiloxanes with a relative molecular mass of less than the reference molecular mass are contained with a weight fraction of at least 50 ppm, and heavy polyalkylsiloxanes with a relative molecular mass of more than the reference molecular mass are contained with a weight fraction of at least 30 ppm.

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Номер записи: 8
30-05-2013 дата публикации

METHOD FOR FORMING FUNCTIONAL PART IN MINUTE SPACE

Номер: US20130136645A1
Автор: Sekine Shigenobu, Sekine Yurina
Принадлежит: NAPRA CO., LTD.

A method for forming a functional part in a minute space includes the steps of; filling a minute space with a dispersion functional material in which a thermally-meltable functional powder is dispersed in a liquid dispersion medium; evaporating the liquid dispersion medium present in the minute space; and heating the functional powder and hardening it under pressure. 1. A method for forming a functional part in a minute space , comprising the steps of:filling a minute space with a dispersion functional material in which a thermally-meltable functional powder is dispersed in a liquid dispersion medium;evaporating the liquid dispersion medium present in the minute space; andheating the functional powder and hardening it under pressure.2. The method of claim 1 , wherein the functional powder is a low-melting metallic powder.3. A method for forming a functional part in a minute space claim 1 , comprising the steps of:filling a minute space with a dispersion functional material in which a functional powder and a binder powder are dispersed in a liquid dispersion medium;evaporating the liquid dispersion medium present in the minute space; andheating the functional powder and the binder powder and hardening them under pressure.4. The method of claim 3 , wherein the functional powder and the binder powder comprise a high-melting metallic powder and a low-melting metallic powder.5. A method for forming a functional part in a minute space claim 3 , comprising the steps of:filling a minute space with a dispersion functional material in which a functional powder is dispersed in a liquid dispersion medium;evaporating the liquid dispersion medium present in the minute space;filling a liquid binder into a gap between particles of the functional powder present in the minute space; andhardening the functional powder and the liquid binder under pressure after the liquid binder is reacted with the functional powder by a heat treatment.6. The method of claim 5 , wherein the functional ...

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Номер записи: 9
29-08-2013 дата публикации

HOLEY OPTICAL FIBER WITH RANDOM PATTERN OF HOLES AND METHOD FOR MAKING SAME

Номер: US20130223804A1
Автор: KIM Jeong I., KOMINSKY Daniel, PICKRELL Gary, SAFAAI-JAZI Ahmad, STOLEN Roger H., WANG Anbo
Принадлежит: Virginia Tech Intellectual Properties, Inc.

A random array of holes is created in an optical fiber by gas generated during fiber drawing. The gas forms bubbles which are drawn into long, microscopic holes. The gas is created by a gas generating material such as silicon nitride. Silicon nitride oxidizes to produce nitrogen oxides when heated. The gas generating material can alternatively be silicon carbide or other nitrides or carbides. The random holes can provide cladding for optical confinement when located around a fiber core. The random holes can also be present in the fiber core. The fibers can be made of silica. The present random hole fibers are particularly useful as pressure sensors since they experience a large wavelength dependant increase in optical loss when pressure or force is applied. 121-. (canceled)22. A method for making a random hole optical fiber , comprising the steps of:heating a fiber preform containing a gas generating material that generates gas bubbles when heated; anddrawing the heated fiber preform so that the bubbles are drawn into tubes.23. The method of wherein the gas generating material is silicon nitride.24. The method of wherein the gas generating material is provided in the preform in the form of a liquid precursor.25. The method of wherein the gas generating material is a nitride claim 22 , carbide claim 22 , metal nitrate or metal carbonate.26. The method of further comprising the step of supplying oxygen to the interior of the preform.27. The method of wherein the preform comprises a glass powder combined with the gas generating material.28. The method of wherein the gas bubbles are generated by oxidation of the gas generating material.2932-. (canceled)33. An optical fiber comprising:a core composed of a glass of a refractive index; anda cladding region composed of the same glass of the same refractive index, wherein the cladding region contains tubes which are random in diameter, length and radial position within the cladding region, and wherein the tubes taper on the ...

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Номер записи: 10
28-11-2013 дата публикации

METHOD FOR PRODUCING SILICA GLASS BODY CONTAINING TITANIA, AND SILICA GLASS BODY CONTAINING TITANIA

Номер: US20130316890A1
Автор: Kawagishi Masahiro, MIYASAKA Junko, Ogawa Tomonori, TAKATA Masaaki
Принадлежит: Asahi Glass Company, Limited

The present invention relates to a method for producing a silica glass body containing titania, containing: a flame hydrolysis step of feeding a silica (SiO) precursor and a titania (TiO) precursor into an oxyhydrogen flame and causing a hydrolysis reaction in the flame to form silica glass fine particles containing titania, in which in the flame hydrolysis step, a reaction rate of the hydrolysis reaction of the silica precursor is 80% or more. 1. A method for producing a silica glass body containing titania , comprising:{'sub': 2', '2, 'a flame hydrolysis step of feeding a silica (SiO) precursor and a titania (TiO) precursor into an oxyhydrogen flame and causing a hydrolysis reaction in the flame to form silica glass fine particles containing titania; and'}a glass fine particle deposition step of depositing the silica glass fine particles containing titania formed in the flame hydrolysis step, whereinin the flame hydrolysis step, a reaction rate of the hydrolysis reaction of the silica precursor is 80% or more.2. The method for producing a silica glass body containing titania according to claim 1 , whereinthe glass fine particle deposition step is a step of depositing the silica glass fine particles containing titania formed in the flame hydrolysis step on a base material to form a porous glass body; andthe production method further comprises a step of heating the porous glass body to cause transparent vitrification.3. The method for producing a silica glass body containing titania according to claim 1 , whereinthe glass fine particle deposition step is a step of depositing the silica glass fine particles containing titania formed in the flame hydrolysis step in a fire-resistant vessel and simultaneously with the deposition, fusing them to form a silica glass body containing titania.4. The method for producing a silica glass body containing titania according to claim 1 , whereinin the flame hydrolysis step, a reaction calorie of oxyhydrogen to be fed into the ...

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Номер записи: 11
13-02-2014 дата публикации

Luminophore composition for uv-visible light conversion and light converter obtained therefrom

Номер: US20140042477A1
Автор: Alain Ibanez, Antonio Carlos Hernandes, Lauro June Queiroz Maia, Vinicius Ferraz Guimaraes
Принадлежит: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE CNRS

A luminophore composition comprising amorphous aluminoborate powders is disclosed. The composition is obtainable by preparing an aluminoborate resin by a wet chemical route based on precursors solutions substantially free from monovalent and divalent cations; drying the resin to obtain a solid; grinding the solid to obtain a powder; pyrolyzing the powder at a pyrolysis temperature lower than the crystallization temperature of the composition; and calcinating the powder so pyrolyzed at a calcination temperature lower than the crystallization temperature of the composition. Furthermore, a process for the preparation of said composition is disclosed. The composition is particularly suitable for use in solid-state lighting, and for example for converting UV light into warm white visible light.

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Номер записи: 12
06-03-2014 дата публикации

NIOBIUM DOPED SILICA TITANIA GLASS AND METHOD OF PREPARATION

Номер: US20140066286A1
Автор: Annamalai Sezhian, Dawes Steven Bruce, Hrdina Kenneth Edward
Принадлежит: CORNING INCORPORATED

This disclosure is directed to a silica-titania-niobia glass and to a method for making the glass. The composition of the silica-titania-niobia (SiO—TiO—NbO) glass, determined as the oxides, is NbOin an amount in the range of 0.005 wt. % to 1.2 wt. %, TiOin an amount in the range of 5 wt. % to 10 wt. %, and the remainder of glass is SiO. In the method, the STN glass precursor is consolidated into a glass by heating to a temperature of 1600° C. to 1700° C. in flowing helium for 6 hours to 10 hours. When this temperature is reached, the helium flow can be replaced by argon for the remainder of the time. Subsequently the glass is cooled to approximately 1050° C., and then from 1050° C. to 700° C. followed by turning off the furnace and cooling the glass to room temperature at the natural cooling rate of the furnace. 1. A silica-titania-niobia glass comprising , in wt. % measured as the oxides , niobia in an amount in the range of 0.005 wt. % to 1.2 wt. % , titania in an amount in the range of 5 wt. % to 10 wt. % , and the remainder of the glass is silica , SiO.2. The silica-titania-niobia glass according to claim 1 , wherein the titania content is in the range of 6 wt. % to 9 wt. %.3. The silica-titania-niobia glass according to claim 1 , wherein the silica-titania-niobia has a lower expansivity slope than that of a silica-titania glass having a substantially equivalent titania content.4. The silica-titania-niobia glass according to claim 1 , wherein the OH content of the glass is less than 200 ppm.5. The silica-titania-niobia glass according to claim 1 , wherein the OH content of the glass is less than 100 ppm.6. The silica-titania-niobia glass according to claim 1 , wherein the OH content of the glass is in the range of 10-70 ppm.7. A method for making a silica-titania-niobia glass having a composition comprising niobia in an amount in the range of 0.005 wt. % to 1.2 wt. % claim 1 , titania in an amount in the range of 5 wt. % to 10 wt. % claim 1 , and the remainder ...

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Номер записи: 13
13-03-2014 дата публикации

High-purity silicon dioxide granules for quartz glass applications and method for producing said granules

Номер: US20140072803A1
Автор: Bodo Frings, Christian Panz, Guido Titz, Hartwig Rauleder, Jürgen Behnisch, Markus RUF, Sven Müller
Принадлежит: EVONIK DEGUSSA GmbH

It has been found that conventional cheap waterglass qualities in a strongly acidic medium react to give high-purity silica grades, the treatment of which with a base leads to products which can be processed further to give glass bodies with low silanol group contents.

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Номер записи: 14
07-01-2016 дата публикации

OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ArF EXCIMER LASER LITHOGRAPHY AND METHOD FOR PRODUCING THE COMPONENT

Номер: US20160002092A1
Автор: Kuehn Bodo
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×10to 1.0×10molecules/cm, an SiH group content of less than 2×10molecules/cm, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×10pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cmat a pulse repetition frequency of 2000 Hz. The change totals a first measured value Mwhen measured using the applied wavelength of 193 nm and a second measured value Mwhen measured using a measured wavelength of 633 nm. The ratio M/Mis less than 1.7. 111-. (canceled)12. An optical component made of synthetic quartz glass for use in ArF excimer laser lithography with an applied wavelength of 193 nm , the optical component comprising:{'sup': 16', '3', '18', '3', '17', '3, 'a glass structure which is substantially free of oxygen defect sites, the glass structure having a hydrogen content in the range of 0.1×10molecules/cmto 1.0×10molecules/cm, a content of SiH groups of less than 2×10molecules/cm, a content of hydroxyl groups in the range between 0.1 and 100 wt. ppm, and a fictive temperature of less than 1070° C.,'}{'sub': '193nm', 'sup': '633nm', 'wherein the glass structure reacts to irradiation with radiation of an applied wavelength of 193 nm with 5×109 pulses with a pulse width of 125 ns and an energy density of 500 μJ/cm2 each time and a pulse repetition frequency of 2000 Hz with a laser-induced refractive-index change, the amount of which upon measurement with the applied wavelength of 193 nm yields a first measured value Mand upon measurement with a measurement wavelength of 633 nm yields a second measured value M, and'}{'sub': 193nm', '633nm, 'wherein M/M<1.7.'}13. The optical component according to ...

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Номер записи: 15
03-01-2019 дата публикации

CONTINUOUS SOL-GEL METHOD FOR PRODUCING QUARTZ GLASS

Номер: US20190002325A1
Автор: Czermak Georg, Gabl Christian, Gander Matthias, Lipp Christian, Streiter Christina
Принадлежит:

The invention relates to a continuous sol-gel method for producing quartz glass, comprising the following steps: 1. Continuous sol-gel method for producing quartz glass , comprising the following steps:(a) continuously metering a silicon alkoxide into a first reactor (R1) and carrying out an at least partial hydrolysis process by adding an aqueous mineral acid, thereby obtaining a first product flow (A);(b) continuously producing an aqueous silicic acid dispersion by continuously mixing water and silicic acid in a second reactor, thereby obtaining a second product flow (B);(c) continuously mixing the product flows (A) and (B) from steps (a) and (b) in a third reactor (R3) in order to produce a pre-sol, thereby obtaining a third product flow (C);(d) continuously adding an aqueous base to the product flow (C), thereby obtaining a sol;(e) continuously filling the exiting sol from step (d) into moulds, thereby obtaining an aquagel;(f) drying the aquagels from step (e), thereby obtaining xerogels;(g) sintering the xerogels from step (f), thereby obtaining quartz glass, wherein at least one of the steps (a) to (e) additionally includes a degassing process of at least one feed material used in the step.2. Method according to claim 1 , characterised in that the degassing process is carried out by ultrasound claim 1 , vacuum degassing claim 1 , distillation claim 1 , vacuum/freezing cycles claim 1 , thermal degassing claim 1 , chemical methods claim 1 , removing gas by means of inert gas; adding deaerating additives and centrifugation or a combination of two or more of these measures.4. Method according to claim 1 , characterised in that in step (a) claim 1 , tetraethyl orthosilicate (TEOS) is used as the silicon alkoxide.5. Method according to claim 1 , characterised in that in step (a) claim 1 , from approximately 1 to approximately 60 wt. % mineral acid is used based on the silicon alkoxides.6. Method according to claim 1 , characterised in that in step (a) claim 1 , the ...

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Номер записи: 16
08-01-2015 дата публикации

METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS

Номер: US20150007611A1
Автор: Badeke Klaus-Uwe, Brueckel Andreas, Laudahn Hilmar, Otto Norbert, Trommer Martin
Принадлежит:

The invention relates to a method for producing synthetic quartz glass by vaporizing a polyalkylsiloxane as a liquid SiOfeedstock (), converting the vaporized SiOfeedstock () into SiOparticles, separating the SiOparticles, forming a soot body () and vitrifying the soot body (). According to the invention, the vaporizing of the heated SiOfeedstock () comprises an injection phase in an expansion chamber (), in which the SiOfeedstock () is atomized into fine droplets, wherein the droplets have an average diameter of less than 5 pm, and wherein the atomizing of the droplets takes place in a preheated carrier gas stream which has a temperature of more than 180° C. 1. A method for producing synthetic quartz glass , said method comprising:{'sub': '2', '(A) providing a liquid SiOfeedstock having more than 70% by wt. of polyalkylsiloxane D4,'}{'sub': 2', '2, '(B) vaporizing the liquid SiOfeedstock into a gaseous SiOfeedstock vapor,'}{'sub': 2', '2, '(C) converting the SiOfeedstock vapor into SiOparticles,'}{'sub': 2', '2, '(D) depositing the SiOparticles on a deposition surface so as to form a SiOsoot body,'}{'sub': '2', 'claim-text': [{'sub': 2', '2, 'wherein the vaporizing of the SiOfeedstock comprises an injection phase in an expansion chamber in which the SiOfeedstock is atomized into fine droplets, wherein the droplets have a mean diameter of less than 5 μm, and'}, 'wherein the atomization of the droplets takes place in a preheated carrier gas stream that has a temperature of more than 180° C., '(E) vitrifying the SiOsoot body so as to form the synthetic quartz glass,'}2. The method according to claim 1 , wherein the droplets have a mean diameter of less than 2 μm. The present invention relates to a method for producing synthetic quartz glass.Chlorine-free feedstocks are tested for the production of synthetic quartz glass for commercial applications. Monosilanes, alkoxysilanes and siloxanes should be mentioned as examples. A particularly interesting group of chlorine- ...

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Номер записи: 17
21-01-2016 дата публикации

METHOD FOR THE MANUFACTURE OF DOPED QUARTZ GLASS

Номер: US20160016839A1
Автор: Schwerin Malte, Trommer Martin, Zwarg Steffen
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

One aspect relates to a method for the manufacture of doped quartz glass. Moreover, one aspect relates to quartz glass obtainable according to the method including providing a soot body, treating the soot body with a gas, heating an intermediate product and vitrifying an intermediate product.

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Номер записи: 18
18-01-2018 дата публикации

DEVICE FOR MANUFACTURING SiO2-TiO2 BASED GLASS

Номер: US20180016176A1
Автор: SAITO Tadahiko, YOSHINARI Toshio
Принадлежит: NIKON CORPORATION

A device for manufacturing SiO—TiObased glass by growing a glass ingot upon a target by a direct method. The device includes the target, comprising a thermal storage portion that accumulates heat by being preheated, and a heat insulating portion that suppresses conduction of heat from the thermal storage portion in a direction opposite to the glass ingot. 1. A device for manufacturing SiO—TiObased glass by growing a glass ingot upon a target by a direct method , comprising: a thermal storage portion that accumulates heat by being preheated, and', 'a heat insulating portion that suppresses conduction of heat from the thermal storage portion in a direction opposite to the glass ingot., 'the target, comprising'}2. The device according to claim 1 , wherein:the thermal storage portion and the heat insulating portion comprise a plate-shaped first member and a plate-shaped second member, respectively;the first member has a larger thermal capacity than the second member; andthe second member has a lower thermal conductivity than the first member.3. The device according to claim 1 , wherein:the thermal storage portion comprises a plate-shaped first member, and has convex portions upon a surface of the first member that is opposite to the glass ingot.4. The device according to claim 3 , wherein:the heat insulating portion comprises a plate-shaped second member, and the first member and the second member are in mutual thermal contact via the convex portions. This is a divisional application filed under Rule 1.53(b) as U.S. application Ser. No. 14/582,237 filed Dec. 24, 2014 which is a continuation application filed under 35 U.S.C. §111(a), which claims the benefit of PCT International Patent Application No. PCT/JP2013/067678, filed Jun. 27, 2013, which claims the foreign priority benefit under 35 U.S.C. §119, of Japanese Patent Application No. 2012-144149, filed Jun. 27, 2012, the disclosures of which are herein incorporated by reference.The present invention relates to a ...

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Номер записи: 19
10-02-2022 дата публикации

PROCESS FOR THE PREPARATION OF FLUORINATED QUARTZ GLASS

Номер: US20220041488A1
Автор: Hünermann Michael, Kayser Thomas, Langner Andreas, Ochs Stefan, Pihan Sascha, Schuster Kay, Trommer Martin
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

A process for the production of a fluorinated quartz glass including the steps of generating SiOparticles in a synthesis burner; depositing the resulting SiOparticles into a body; and vitrifying the resulting body, wherein a fluorinating agent having a boiling point greater than or equal to −10° C. is supplied to the synthesis burner. 1. A process for the production of fluorinated quartz glass , characterized by:{'sub': '2', 'a. generation of SiOparticles in a synthesis burner;'}{'sub': '2', 'b. deposition of the SiOparticles resulting from process a. to form a body; and'}c. vitrification of the body resulting from process b,characterized in that a fluorinating agent having a boiling point of greater than or equal to −10° C. is introduced to the synthesis burner during process a.2. The process according to claim 1 , characterized in that the fluorinating agent is selected from the group consisting of:i. oxygen-containing fluorinating agents;ii. nitrile-containing fluorinating agents;iii. mixtures of the oxygen-containing and nitrile-containing fluorinating agents.3. The process according to claim 2 , characterized in that the oxygen-containing fluorinating agents are selected from the group consisting of: [{'br': None, 'sub': F1', 'F2, 'R—CO—R\u2003\u2003(I),'}, {'sub': F1', 'F2, 'wherein Ris selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms and fluorine; and Ris selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms;'}], 'i. Perfluoroketones of the general formula (I)'} [{'br': None, 'sub': F1', '1', '2', 'F2, 'R—C(X)(X)O—R\u2003\u2003(II),'}, {'sub': F1', 'F2', '1', '2', '3, 'wherein Ris selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms and fluorine; Ris selected from the group consisting of perfluorinated carbon groups having 1 to 7 carbon atoms; and Xand Xare F or CF.'}], 'ii. Perfluoroethers of the general formula (II)'} [{'br': None, ' ...

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Номер записи: 20
01-02-2018 дата публикации

METHOD FOR PRODUCING GLASS PREFORM FOR OPTICAL FIBER

Номер: US20180029921A1
Автор: URATA Yuhei
Принадлежит:

Provided is a method for producing a glass preform for optical fiber which suppresses occurrences of cracks, coloring and foaming in a surface layer when sintering a glass fine particle deposit to allow a production yield to be improved. A method for producing a glass preform for optical fiber comprising the steps of: spraying glass fine particles containing silicon dioxide and germanium dioxide to a starting material moving upward while rotating to produce a glass fine particle deposit; and sintering the glass fine particle deposit while relatively varying a positional relationship between a heating source and the glass fine particle deposit in a sintering apparatus to produce a transparent glass preform, wherein a germanium dioxide reducing gas is contained in an atmosphere gas in the sintering apparatus. 1. A method for producing a glass preform for optical fiber comprising the steps of:spraying glass fine particles containing silicon dioxide and germanium dioxide to a starting material moving upward while rotating to produce a glass fine particle deposit; andsintering the glass fine particle deposit while relatively varying a positional relationship between a heating source and the glass fine particle deposit in a sintering apparatus to produce a transparent glass preform,wherein a germanium dioxide reducing gas is contained in an atmosphere gas in the sintering apparatus.2. The method according to claim 1 , wherein the germanium dioxide reducing gas is carbon monoxide gas and/or chlorine gas.3. The method according to claim 1 , wherein a surface of the produced transparent glass preform is etched with hydrofluoric acid. This non-provisional application claims priority under 35 U.S.C. §119(a) from Japanese Patent Application No. 2016-150465, filed on Jul. 29, 2016, the entire contents of which are incorporated herein by reference.The present invention relates to a method for producing a glass preform for optical fiber which contributes to an improvement in a ...

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Номер записи: 21
31-01-2019 дата публикации

Diffuser material of synthetically produced quartz glass and method for the manufacture of a molded body consisting fully or in part thereof

Номер: US20190031555A1
Автор: Andreas Goetzendorfer, Bernhard Franz, Frank Nuernberg, Gerrit Scheich, Matthew Donelon, Nadine TSCHOLITSCH, Ursula Klett
Принадлежит: Heraeus Quarzglas GmbH and Co KG

A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO2, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm3. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 μm.

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Номер записи: 22
09-02-2017 дата публикации

TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD

Номер: US20170038672A1
Автор: Ezaki Masanobu, Maida Shigeru, Otsuka Hisatoshi, Ueda Tetsuji
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography. 1. A titania-doped quartz glass having a surface where EUV light is reflected , wherein an angle (•) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees.2. The titania-doped quartz glass of wherein on the EUV light-reflecting surface claim 1 , a standard deviation of birefringence is less than or equal to 5 nm/cm.3. The titania-doped quartz glass of wherein on the EUV light-reflecting surface claim 1 , a maximum of birefringence is less than or equal to 10 nm/cm.4. The titania-doped quartz glass of claim 1 , having a fictive temperature distribution of less than or equal to 20° C.5. The titania-doped quartz glass of claim 1 , having a fictive temperature of lower than or equal to 850° C.6. An EUV lithographic member comprising the titania-doped quartz glass of .7. The EUV lithographic member of which is an EUV lithographic photomask substrate.8. The EUV lithographic photomask substrate of wherein the substrate has front and back surfaces claim 7 , either one of which has a flatness of less than or equal to 50 nm in a central region of 142 mm×142 mm squares.9. The EUV lithographic photomask substrate of wherein both the front and back surfaces have a flatness of less than or equal to 50 nm in a central region of 142 mm×142 mm squares. This application is a ...

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Номер записи: 23
18-02-2021 дата публикации

METHOD FOR FABRICATION OF GLASS PREFORM

Номер: US20210047223A1
Автор: Gaikwad Sandeep, Gomatam Badri, Pandey Anand
Принадлежит:

The present disclosure provides a method for fabrication of a glass preform. The method includes production of soot particles in a combustion chamber using a precursor material. The heating of the precursor material produces the soot particles along with one or more impurities. In addition, the method includes agglomeration of the soot particles. Further, the method includes separation of the soot particles from the one or more impurities. Also, the separation of the soot particles is performed in a cyclone separator. Furthermore, the method includes collection of the soot particles. Also, the soot particles are compacted with facilitation of a preform compaction chamber. Also, the compacted preform is sintered with facilitation of a sintering furnace. The compaction of the soot particles followed by sintering results in formation of the glass preform. 1. A method for fabrication of a glass preform , the method comprising:production of soot particles in a combustion chamber using a precursor material, wherein the soot particles are produced by heating the precursor material with facilitation of a plurality of burners, wherein the heating of the precursor material produces the soot particles along with one or more impurities;agglomeration of the soot particles, wherein the agglomeration is performed using a plurality of agglomerator tubes, wherein the soot particles are agglomerated based on size of the plurality of agglomerator tubes;separation of the soot particles from the one or more impurities, wherein the separation of the soot particles is performed in a cyclone separator;collection of the soot particles, wherein the collection of the soot particles is performed in a soot collection chamber; andcompaction of the soot particles, wherein the soot particles are compacted with facilitation of a preform compaction chamber, wherein the compaction of the soot particles followed by sintering results in formation of the glass preform.2. The method as recited in claim 1 ...

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Номер записи: 24
18-02-2021 дата публикации

GAS DETECTION MATERIAL

Номер: US20210047229A1
Автор: MARUO Yasuko, TSUJIGUCHI Masato
Принадлежит:

Provided is a small-size, inexpensive gas detection material capable of detecting aldehyde-based gas. The gas detection material includes: a porous body having pores; an alkaline compound carried inside the pores; and a gas sensing agent carried inside the pores. 1. A gas detection material comprising: a porous body having pores; an alkaline compound carried inside the pores; and a gas sensing agent carried inside the pores.2. The gas detection material according to claim 1 , wherein the porous body is a porous glass containing claim 1 , in terms of % by mass claim 1 , 85 to 100% SiO.3. The gas detection material according to claim 1 , wherein the alkaline compound is sodium hydroxide.4. The gas detection material according to claim 1 , wherein the gas sensing agent is vanillin and/or a vanillin derivative.5. The gas detection material according to claim 1 , being for use in detecting aldehyde-based gas. The present invention relates to gas detection materials.Lung cancer is a type of cancer with highest mortality. The reason for this is that it is difficult to detect lung cancer early by chest roentgenography which is currently a major testing method for lung cancer. To cope with this, consideration is being given to a method for diagnosing lung cancer early by analyzing the expired breath of a subject for a component increasing specifically in the breaths of lung cancer patients.For example, there is disclosed a result report that when the expired breaths of lung cancer patients were analyzed with a gas chromatography mass spectroscopy analyzer (GC-MS), their expired breaths contained high concentrations of aldehyde-based gas, such as nonanal, as compared to the expired breaths of healthy subjects (see, for example, Non-Patent Literature 1).HANDA and MIYAZAWA, Detection of lung cancer using exhaled breath analysis, Journal of Clinical and Experimental Medicine, Vol. 240, No. 11, 933-935 (2012)However, the GC-MS has a large size, is very expensive, and has a ...

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Номер записи: 25
15-02-2018 дата публикации

CONTINUOUS SOL-GEL PROCESS FOR PRODUCING SILICATE-CONTAINING GLASSES OR GLASS CERAMICS

Номер: US20180044222A1
Автор: Czermak Georg, Gabl Christian, Gander Matthias, Howell Roy Layne, Lipp Christian, Stepanik Nina, Streiter Christina
Принадлежит:

A continuous sol-gel process for producing silicate-containing glasses and glass ceramics is proposed, comprising the following steps: 1. A continuous sol-gel process for producing silicate-containing glasses and glass ceramics , comprising the following steps:(a) continuously feeding a silicon tetraalkoxide, a silicon alkoxide with at least one non-alcoholic functional group and an alcohol into a first reactor (R1), and at least partially hydrolyzing by the addition of a mineral acid to obtain a first product stream (A);(b) continuously providing a second product stream (B) in a second reactor (R2) by feeding a metal alkoxide component or continuously mixing an alcohol and a metal alkoxide component;(c) continuously mixing product streams (A) and (B) in a third reactor (R3) for producing a presol to obtain a third product stream (C);(d) continuously adding water or a diluted acid to the product stream (C) to obtain a sol (gelation);(e) continuously filling the emerging sol into molds to obtain an aquagel;(f) drying the aquagels to obtain xerogels;(g) sintering the xerogels to obtain silicate-containing glasses and glass ceramics.2. The process according to claim 1 , characterized in that silicon alkoxides are employed in step (a) that comply with formula (I){'br': None, 'Si(OR)4\u2003\u2003(I),'}in which R represents an alkyl radical with 1 to 6 carbon atoms.3. The process according to claim 1 , characterized in that tetraethyl orthosilicate (TEOS) is employed as the silicon alkoxide in step (a).4. The process according to claim 1 , characterized in that nitric acid is employed as the mineral acid in step (a).5. The process according to claim 1 , characterized in that 1 to 60% by weight of mineral acid claim 1 , based on the silicon alkoxides claim 1 , is employed in step (a).6. The process according to claim 1 , characterized in that the hydrolysis of the silicon alkoxides is performed at a temperature within a range of from 1 to 100° C. in step (a).7. The process ...

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Номер записи: 26
13-02-2020 дата публикации

HALOGEN-DOPED SILICA PREFORMS FOR OPTICAL FIBERS

Номер: US20200048136A1
Автор: Bookbinder Dana Craig, Dawes Steven Bruce, Fiacco Richard Michael, Harper Brian Lee, Tandon Pushkar
Принадлежит:

Preparation of halogen-doped silica is described. The preparation includes doping silica with high halogen concentration and sintering halogen-doped silica to a closed-pore state in a gas-phase environment that has a low partial pressure of impermeable gases. Impermeable gases are difficult to remove from halogen-doped fiber preforms and lead to defects in optical fibers drawn from the preforms. A low partial pressure of impermeable gases in the sintering environment leads to a low concentration of impermeable gases and a low density of gas-phase voids in densified halogen-doped silica. Preforms with fewer defects result. 1. A method of processing a silica soot body comprising:sintering a silica soot body at a temperature greater than 1100° C. in a first gas environment, said first gas environment comprising a gas-phase halogen doping precursor and a first impermeable gas, said gas-phase halogen doping precursor having a partial pressure greater than 2.0 atm and said first impermeable gas having a partial pressure less than 0.2 atm.2. The method of claim 1 , wherein said sintering transforms said silica soot body from a first state having a density in the range from 0.25 g/cm-1.00 g/cmto a second state having a density in the range from 1.05 g/cm-1.89 g/cm.3. The method of claim 1 , wherein said sintering transforms said silica soot body to a closed-pore state.4. The method of claim 1 , wherein said gas-phase halogen doping precursor is SiClor SiBr.5. The method of claim 1 , wherein said first impermeable gas is selected from the group consisting of He claim 1 , Ne claim 1 , Ar claim 1 , Kr claim 1 , H claim 1 , D claim 1 , N claim 1 , O claim 1 , CO claim 1 , CO claim 1 , and HCl.6. The method of claim 1 , wherein said gas-phase halogen doping precursor has a partial pressure greater than 10.0 atm.7. The method of claim 1 , wherein said first impermeable gas has a partial pressure less than 0.05 atm.8. The method of claim 1 , wherein said first gas-phase ...

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Номер записи: 27
10-03-2022 дата публикации

TRANSPARENT SOLID SPHERES AND METHOD FOR PRODUCING SAME

Номер: US20220073417A1
Автор: Budd Kenton D., Frederick, Jr. Billy J., Kasai Toshihiro, Tangeman Jean A.
Принадлежит:

To provide transparent solid spheres with high refractive index and large particle size. The transparent solid spheres of one aspect of the present disclosure include barium oxide, zirconium dioxide, and titanium dioxide on a theoretical oxide basis, and has a refractive index of at least 2.0 and a particle size of 600 micrometers or greater. 1. (canceled)2. The method according to claim 13 , wherein the weight ratio of the barium oxide is from 35 to 47% on a theoretical oxide basis relative to the total weight of the transparent solid spheres claim 13 , and the weight ratio of the zirconium dioxide is from 2 to 11.5% on a theoretical oxide basis relative to the total weight of the transparent solid spheres.3. The method according to claim 2 , wherein the weight ratio of the titanium dioxide is from 37 to 54% on a theoretical oxide basis relative to the total weight of the transparent solid spheres.4. The method according to claim 13 , wherein the transparent solid spheres further comprise aluminum oxide.5. The method according to claim 4 , wherein the weight ratio of the aluminum oxide is from 1.5 to 11% on a theoretical oxide basis relative to the total weight of the transparent solid spheres.6. The method according to claim 13 , wherein the particle size of the transparent solid spheres is 850 micrometers or greater.7. The method according to claim 13 , wherein the particle size of the transparent solid spheres is 1 millimeter or greater.8. The method according to claim 13 , wherein the refractive index of the transparent solid spheres is 2.1 or greater.9. The method according to claim 13 , wherein the transparent solid spheres have a crushing strength of 150 MPa or greater.10. The method according to claim 13 , wherein the weight ratio of silicon dioxide is 5% or less on a theoretical oxide basis relative to the total weight of the transparent solid spheres.11. (canceled)12. (canceled)13. A method for producing transparent solid spheres comprising barium oxide ...

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Номер записи: 28
05-03-2015 дата публикации

Composite particle, method of producing same, resin composition containing the particle, reflector formed from the composition, and light-emitting semiconductor device using the reflector

Номер: US20150060918A1
Автор: Toshio Shiobara, Yoshihiro Tsutsumi
Принадлежит: Shin Etsu Chemical Co Ltd

A composite oxide particle prepared from raw materials comprising: (1) a finely powdered silica having a BET specific surface area of 50 m 2 /g or greater or an alkoxysilane, and (2) a liquid metal alkoxide other than an alkoxysilane or a nano order metal oxide powder other than finely powdered silica, one of components (1) and (2) being a solid oxide and the other being a liquid alkoxide, wherein the composite oxide particle is prepared by mixing or kneading the raw materials to obtain a sol or gel-like substance, sintering the sol or gel-like substance at a temperature of 300° C. or higher to form a glass-like substance, and then crushing the glass-like substance is provided. Also, a resin composition containing the composite oxide particle, and a reflector for a light-emitting semiconductor device formed using the resin composition are provided. The invention is able to provide a resin composition which is ideal as a reflector material for a light-emitting semiconductor device that exhibits high light reflectance and minimal light transmission, and a composite oxide particle that is added to the resin composition.

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Номер записи: 29
21-02-2019 дата публикации

HOMOGENEOUS QUARTZ GLASS FROM PYROGENIC SILICON DIOXIDE GRANULATE

Номер: US20190055150A1
Автор: Fabian Heinz, Hofmann Achim, Hünermann Michael, Kayser Thomas, Otter Matthias
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate composed of a pyrogenic silicon dioxide powder, making a glass melt out of the silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt. The quartz glass body has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm and an aluminium content of less than 200 ppb. One aspect also relates to a quartz glass body which is obtainable by this process. Furthermore, one aspect relates to a formed body and a structure, each of which is obtainable by further processing of the quartz glass body. 121-. (canceled)22. A process for the preparation of a quartz glass body comprising pyrogenic silicon dioxide , comprising: providing a pyrogenic silicon dioxide powder; and', 'processing the silicon dioxide powder to obtain a silicon dioxide granulate, wherein the silicon dioxide granulate has a greater particle diameter than the silicon dioxide powder;, 'providing a silicon dioxide granulate comprisingmaking a glass melt out of the silicon dioxide granulate in an oven; [ an OH content of less than 10 ppm;', 'a chlorine content of less than 60 ppm; and', 'an aluminium content of less than 200 ppb;, 'wherein the quartz glass body comprises, 'wherein the ppb and ppm are each based on the total weight of the quartz glass body., 'making a quartz glass body out of at least part of the glass melt;'}23. The process according to claim 22 , wherein the pyrogenic silicon dioxide powder is present in the form of amorphous silicon dioxide particles claim 22 , wherein the silicon dioxide powder comprises:a chlorine content of less than 200 ppm; andan aluminium content of less than 200 ppb;wherein the silicon dioxide granulate is treated with a reactant.24. The process according to claim 22 , wherein the warming of the silicon dioxide granulate takes place to obtain a glass melt by a mould melting process.25. The ...

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Номер записи: 30
08-03-2018 дата публикации

METHOD AND APPARATUS FOR PRODUCING FUSED QUARTZ FROM A POLYMERIZABLE POLYALKYLSILOXANE COMPOUND WITH MEMBRANE FILTER AS CLEANING DEVICE

Номер: US20180065879A1
Автор: Otto Norbert, Trommer Martin
Принадлежит:

A method for producing synthetic fused quartz is provided. The method includes evaporating a feedstock material which contains at least one polymerizable polyalkylsiloxane compound, and supplying the feedstock material vapor to a reaction zone, wherein the feedstock material vapor is converted by oxidation and/or by hydrolysis into SiOparticles. The feedstock material vapor is passed through a membrane filter as a cleaning device to reduce the formation of gel, which is typically associated with the production of synthetic fused quartz. 114-. (canceled)15. A method for the production of synthetic quartz glass , comprising the following process steps:(a) evaporating a production material containing at least one polymerizable polyalkylsiloxane compound while forming a production material vapor;(b) passing the production material vapor resulting from process step (a) through at least one cleaning device to clean the production material vapor;{'sub': '2', '(c) supplying the purified production material vapor resulting from process step (b) to a reaction zone, in which the production material vapor is converted to SiOparticles through oxidation and/or through hydrolysis;'}{'sub': '2', '(d) depositing the SiOparticles resulting from process step (c) on a deposition surface; and'}{'sub': '2', '(e) optionally, drying and vitrifying the SiOparticles resulting from process step (d) to form synthetic quartz glass,'}wherein the at least one polyalkylsiloxane compound is conducted, after evaporation in process step (a) and before pyrolysis or hydrolysis in process step (b), through a membrane filter which is heated to a temperature of 130 to 210° C.16. The method according to claim 15 , wherein the membrane filter is heated to a temperature of 140 to 190° C.17. The method according to claim 15 , wherein the membrane filter is heated to a working temperature which is 3 to 60° C. higher than a dew point of the polyalkylsiloxane compound used claim 15 , which is established in the ...

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Номер записи: 31
07-03-2019 дата публикации

PREPARATION AND POST-TREATMENT OF A QUARTZ GLASS BODY

Номер: US20190071342A1
Автор: Gromann Boris, Hünermann Michael, KPEBANE Abdoul-Gafar, LEHMANN Walter, NIELSEN Nils Christian, Otter Matthias, Whippey Nigel Robert
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

One aspect relates to a process for preparing a quartz glass body, including providing a silicon dioxide granulate, making a glass melt from the silicon dioxide granulate in a melting crucible, making a quartz glass body from at least a part of the glass melt, and treating the quartz glass body with at least one procedure selected from the group consisting of chemical, thermal or mechanical treatment to obtain a treated quartz glass body. One aspect also relates to a quartz glass body which is obtainable by this process. One aspect also concerns a light guide, an illuminant and a formed body each obtainable by processing the quartz glass body further. 117-. (canceled)18. A process for the preparation of a quartz glass body comprising:providing a silicon dioxide granulate,wherein the silicon dioxide granulate is prepared from pyrogenically produced silicon dioxide powder;making a glass melt from the silicon dioxide granulate in a melting crucible,wherein the melting crucible is arranged in an oven,wherein the melting crucible has at least one inlet and one outlet;making a quartz glass body from at least a part of the glass melt; andtreating the quartz glass body with at least one procedure selected from the group consisting of chemical, thermal or mechanical treatment to obtain a treated quartz glass body.19. The process according to claim 18 , wherein the silicon dioxide powder has a particle size distribution Din the range from 6 to 15 μm.20. The process according to claim 18 , wherein the quartz glass body is treated thermally and wherein the thermal treatment is at least one procedure selected from the group consisting of tempering claim 18 , compressing claim 18 , inflating claim 18 , drawing claim 18 , welding and a combination of two or more thereof.21. The process according to claim 18 , wherein the quartz glass body is treated chemically and wherein the chemical treatment comprises at least one procedure selected from the group consisting of HF acidification ...

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Номер записи: 32
07-03-2019 дата публикации

LAYERED GLASS STRUCTURES

Номер: US20190072714A1
Автор: Butler Douglas Llewellyn, Dejneka Matthew John, Hawtof Daniel Warren, Powers Dale Robert, Tandon Pushkar
Принадлежит:

Layered glass structures and fabrication methods are described. The methods include depositing soot on a dense glass substrate to form a composite structure and sintering the composite structure to form a layered glass structure. The dense glass substrate may be derived from an optical fiber preform that has been modified to include a planar surface. The composite structure may include one or more soot layers. The layered glass structure may be formed by combining multiple composite structures to form a stack, followed by sintering and fusing the stack. The layered glass structure may further be heated to softening and drawn to control linear dimensions. The layered glass structure or drawn layered glass structure may be configured as a planar waveguide. 1. A method of making a layered glass structure comprising:stacking a first dense glass layer on a composite structure, said composite structure including a first soot layer on a second dense glass layer, said first soot layer having a thickness of at least 100 μm.2. The method of claim 1 , wherein said second dense glass layer comprises silica glass.3. The method of claim 2 , wherein said first dense glass layer comprises silica glass.4. The method of claim 1 , wherein said first soot layer has a density in the range from 0.30 g/cmto 1.50 g/cm.5. The method of claim 1 , wherein said first soot layer comprises silica glass.6. The method of claim 5 , wherein said silica glass comprises a luminescent dopant.7. The method of claim 5 , wherein said silica glass comprises AlO claim 5 , GeO claim 5 , TiO claim 5 , or GaO.8. The method of claim 7 , wherein said silica glass further comprises a rare earth dopant.9. The method of claim 1 , wherein said thickness of said first soot layer is at least 1 mm.10. The method of claim 1 , wherein said first soot layer is formed on a planar surface of said first dense glass substrate.11. The method of claim 10 , wherein said planar surface has a length of at least 0.1 m.12. The ...

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Номер записи: 33
26-03-2015 дата публикации

METHOD FOR MANUFACTURING OPTICAL FIBER BASE MATERIAL AND OPTICAL FIBER BASE MATERIAL

Номер: US20150086784A1
Автор: Imoto Katsuyuki, ISHII FUTOSHI
Принадлежит: KOHOKU KOGYO CO., LTD.

The present invention provides a method for manufacturing an optical fiber base material and an optical fiber base material, the method including: arranging a rod containing SiOfamily glass for core, in a container; pouring a SiOglass raw material solution for cladding layer and a hardener into the container, the glass raw material solution containing a hardening resin; solidifying the glass raw material solution through a self-hardening reaction; and then drying the solidified material and heating the solidified material in chlorine gas, to manufacture an optical fiber base material in which a SiOcladding layer is formed in an outer periphery of the rod containing SiOfamily glass for core. 1. A method for manufacturing an optical fiber base material , comprising:{'sub': '2', 'arranging a rod containing SiOfamily glass for core in a center of a container;'}{'sub': '2', 'pouring a SiOglass raw material solution for cladding layer and a hardener into the container;'}solidifying the glass raw material solution through a self-hardening reaction;then removing the container from the solidified material; and{'sub': 2', '2, 'drying the solidified material and heating the solidified material in chlorine gas, to manufacture an optical fiber base material in which a SiOcladding layer is formed in an outer periphery of the rod containing SiOfamily glass for core.'}2. The method for manufacturing the optical fiber base material according to claim 1 , further comprising:{'sub': '2', 'arranging a plurality of metal rods in the container such that the metal rods surround the outer periphery of the rod containing SiOfamily glass for core placed in the container;'}{'sub': '2', 'then pouring the hardening-resin-containing SiOglass raw material solution for cladding layer and the hardener into the container; and'}{'sub': '2', 'removing the container and the metal rods from the solidified material, to form a plurality of empty holes in the SiOcladding layer.'}3. A method for ...

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Номер записи: 34
24-03-2016 дата публикации

Multilayer Wiring Substrate

Номер: US20160088729A1
Автор: Emi Ninomiya, Hisashi Kobuke, Yousuke Futamata
Принадлежит: EPCOS AG

A multilayer wiring substrate includes a number of insulating layers, each insulating layer including a glass ceramic. A number of internal conductor layers are formed between the insulating layers. Via conductors penetrate through the insulating layers and mutually connect the internal conductor layers in different layer locations. Surface conductor layers are formed on an outer surfaces in a lamination direction of the insulating layers. The insulating layers include outside insulating layers and inside insulating layers. A first aspect ratio representing an oblateness and sphericity of an external filler contained in the outside insulating layers is larger than a second aspect ratio representing an oblateness and sphericity of an internal filler contained in the inside insulating layers. A thermal expansion coefficient of the outside insulating layers is smaller than a thermal expansion coefficient of the inside insulating layers.

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Номер записи: 35
31-03-2016 дата публикации

METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS OF SIO2 GRANULATE AND SIO2 GRANULATE SUITED THEREFOR

Номер: US20160090319A1
Автор: Hofmann Achim, Kayser Thomas, KÜHN Bodo, Otter Matthias
Принадлежит:

A method for producing synthetic quartz glass by fusion of SiOgranulate involves synthesizing amorphous SiOprimary particles, granulating the amorphous SiOprimary particles to form an open-pore SiOgranulate, sintering the open-pore SiOgranulate by heating in a sintering atmosphere at a sintering temperature and for a sintering period to form a densified SiOgranulate, and melting the densified SiOgranulate at a melting temperature to form the synthetic quartz glass. To provide an inexpensive production of low-bubble transparent components of quartz glass despite the use of still open-pore SiOgranulate, the sintering atmosphere, sintering temperature and sintering duration are adjusted such that the densified SiOgranulate still comprises open pores but manifests a material-specific infrared transmission Tat a wavelength of 1700 nm. This transmission is in the range of 50-95% of the infrared transmission Tof quartz glass granules of the same material. 2. The method according to claim 1 , wherein the infrared transmission Tis in a range of 60-90% of the infrared transmission Tof quartz glass granules of the same material.3. The method according to claim 1 , wherein the sintering atmosphere claim 1 , the sintering temperature claim 1 , and the sintering duration are adjusted during sintering in step (c) such that the densified SiOgranulate manifests a material-specific infrared transmission Tat a wavelength of 500 nm claim 1 , and wherein a ratio T/Tis 0.8 or less.4. The method according to claim 1 , wherein the melting in step (d) comprises heating a bulk material of SiOgranulate or a compact comprising the SiOgranulate under negative pressure at the melting temperature.5. The method according to claim 1 , wherein the densified SiOgranulate has a bulk density in a range of 0.9 kg/l to 1.3 kg/l.6. The method according to claim 1 , wherein the densified SiOgranulate has a specific BET surface area in a range of 1 m/g to 25 m/g.7. The method according to claim 1 , wherein ...

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Номер записи: 36
21-03-2019 дата публикации

SOLID ELECTROLYTE FOR RERAM

Номер: US20190084867A1
Автор: Neumann Christian
Принадлежит: Heraeus Deutschland GmbH & Co. KG

A composition comprising 2. The composition according to claim 1 , wherein the ratio of the diffusion coefficient of M3 in the composition to the diffusion coefficient of M2 in the composition is at least 1000:1.3. The composition according to claim 1 , wherein the total concentration of alkaline metals and alkaline-earth metals is below 100 ppm claim 1 , based on the total weight of the composition.4. The composition according to claim 3 , wherein the total concentration of metals different from M1 claim 3 , M2 and M3 is below 100 ppm claim 3 , based on the total weight of the composition.5. The composition according to claim 1 , wherein the valence state of M1 is +III claim 1 , +IV or +V.6. The composition according to claim 1 , wherein M1 is selected from Si claim 1 , Hf claim 1 , Ta claim 1 , Zr claim 1 , Ti claim 1 , Al claim 1 , W or Ge.7. The composition according to claim 1 , wherein M2 is selected from the group consisting of B claim 1 , Al claim 1 , Ga claim 1 , In claim 1 , Tl claim 1 , Sc claim 1 , Y claim 1 , La claim 1 , Ac or mixtures thereof.8. The composition according to claim 1 , wherein M3 is selected from the group consisting of Ag or Cu.9. The composition according to claim 1 , whereinthe amount of M2 is 0.01 to 25 atom % based on the entirety of metals present in the composition; andthe amount of M3 is 0.01 to 10 atom % based on the entirety of metals present in the composition.11. A process for the production of the composition according to claim 1 , wherein the composition is prepared by atomic layer deposition (ALD) or chemical vapor deposition (CVD).12. The process of wherein the composition is prepared by ALD and the thickness of the layer is 1 to 100 nm.13. A method of using the product obtained by the process according to as a sputtering target for physical vapor deposition (PVD) processes.14. A method of using the composition according to as a resistive switching element.15. The composition according to wherein the atomic ratio of M1 ...

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Номер записи: 37
07-04-2016 дата публикации

Method for the manufacture of synthetic quartz glass

Номер: US20160096765A1
Автор: Ian George Sayce, Martin Trommer
Принадлежит: Heraeus Quarzglas GmbH and Co KG

One aspect relates to a method for the production of synthetic quartz glass. Moreover, one aspect relates to a polyalkylsiloxane compound, which includes certain specifications with respect to chlorine content, metallic impurities content, and residual moisture, as well as the use thereof for the production of synthetic quartz glass. One aspect also relates to a synthetic quartz glass that can be obtained according to the method of one embodiment.

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Номер записи: 38
28-03-2019 дата публикации

PREPARATION OF AN OPAQUE QUARTZ GLASS BODY

Номер: US20190092674A1
Автор: Hünermann Michael, NIELSEN Nils Christian, Otter Matthias, Roos Björn, SCHEICH Gerrit, SCHREIBER ANDREAS, WESSELY Frank
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate from a pyrogenically produced silicon dioxide powder, making a glass melt out of silicon dioxide granulate, and making a quartz glass body out of at least part of the glass melt. The size of the quartz glass body is reduced to obtain a quartz glass grain. The quartz glass body is processed to make a preform and an opaque quartz glass body is made from the preform. One aspect further relates to an opaque quartz glass body which is obtainable by this process. One aspect further relates to a reactor and an arrangement, which are each obtainable by further processing of the opaque quartz glass body. 118-. (canceled)19. A process for the preparation of an opaque quartz glass body comprising:providing a silicon dioxide granulate, wherein the silicon dioxide granulate has been prepared from pyrogenically produced silicon dioxide powder;making a glass melt out of the silicon dioxide granulate in a melting crucible;making a quartz glass body out of at least part of the glass melt;reducing the size of the quartz glass body to obtain a quartz glass grain.processing the quartz glass grain into a preform; andmaking the opaque quartz glass body from the preform.20. The process according to claim 19 , wherein the melting crucible has at least one inlet and an outlet and wherein the inlet is arranged above the outlet.21. The process according to claim 19 , wherein the reduction in size takes place by high voltage discharge pulses.22. The process according to claim 19 , wherein the quartz glass grain comprises at least one of the following:an OH content of less than 500 ppm;a chlorine content of less than 60 ppm;an aluminium content of less than 200 ppb;{'sup': '2', 'a BET surface area of less than 1 m/g;'}{'sup': '3', 'a bulk density in a range from 1.1 to 1.4 g/cm;'}{'sub': '50', 'a particle size Dfor the melting in a range from 50 to 500 μm;'}{' ...

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Номер записи: 39
28-03-2019 дата публикации

PREPARATION OF QUARTZ GLASS BODIES WITH DEW POINT MONITORING IN THE MELTING OVEN

Номер: US20190092675A1
Автор: Gromann Boris, Sohn Matthias, Whippey Nigel Robert
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing silicon dioxide particles, ii.) Making a glass melt out of the silicon dioxide particles in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has a gas outlet through which gas is removed from the oven, wherein the dew point of the gas on exiting the oven through the gas outlet is less than 0° C. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body. 124-. (canceled)25. A process for the preparation of a quartz glass body comprising:providing silicon dioxide particles;making a glass melt out of the silicon dioxide particles in an oven; andmaking a quartz glass body out of at least part of the glass melt;wherein the oven has a gas outlet through which gas is removed from the oven,wherein the dew point of the gas on exiting the oven through the gas outlet is less than 0° C.26. The process according to claim 25 , wherein the dew point is less than −10° C.27. The process according to claim 25 , wherein the dew point of the gas before entering the oven is at least 50° C. lower than the dew point on exiting the oven through the gas outlet.28. The process according to claim 25 , wherein the silicon dioxide particles are warmed in a melting crucible made of a material comprising one or more metals selected from molybdenum claim 25 , tungsten claim 25 , rhenium claim 25 , iridium claim 25 , osmium.29. The process according to claim 25 , wherein the quartz glass body comprises a total amount of less than 1000 ppb of one or more metals selected from molybdenum claim 25 , tungsten claim 25 , rhenium claim 25 , iridium claim 25 , osmium claim 25 , the total amount being based on the total weight of the quartz glass body.30 ...

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Номер записи: 40
28-03-2019 дата публикации

PREPARATION OF A QUARTZ GLASS BODY IN A HANGING SINTER CRUCIBLE

Номер: US20190092676A1
Автор: Gromann Boris, Hünermann Michael, KPEBANE Abdoul-Gafar, LEHMANN Walter, NIELSEN Nils Christian, Otter Matthias, Whippey Nigel Robert
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt from the silicon dioxide granulate in an oven, and iii.) Making a quartz glass body from at least a part of the glass melt, wherein the oven comprises a hanging sinter crucible. The invention also relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body which are each obtainable by further processing the quartz glass body. 1. A process for the preparation of a quartz glass body , comprising the process steps: wherein the silicon dioxide granulate was prepared from pyrogenic silicon dioxide, wherein the silicon dioxide granulate has the following features:', {'sup': '2', 'A) a BET surface area in a range of from more than 20 to 50 m/g;'}, 'B) a mean particle size in a range from 50 to 500 μm;, 'i.) Providing a silicon dioxide granulate,'}ii.) Making a glass melt from the silicon dioxide granulate in an oven;iii.) Making a quartz glass body from the glass melt,wherein the oven comprises a hanging sinter crucible.2. The process as in claim 1 , wherein the sinter crucible is made of a sinter material which comprises a sinter metal selected from the group consisting of molybdenum claim 1 , tungsten and a combination thereof.3. The process according to the preceding claim claim 1 , wherein the sinter metal of the sinter crucible has a density of 85% or more of the theoretical density of the sinter metal.4. The process according to one of the preceding claims claim 1 , wherein the BET surface area before step ii.) is not reduced to less than 5 m/g.5. The process according to one of the preceding claims claim 1 , wherein the hanging sinter crucible has at least one of the following features:{a} a hanger assembly;{b} at least two sealed rings as side parts;{c} a nozzle;{d} a mandrel;{e} at least one gas inlet;{f} ...

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Номер записи: 41
23-04-2015 дата публикации

Barbell Optical Fiber And Method Of Making The Same

Номер: US20150110452A1
Автор: DiGiovanni David J., ROCKWELL David A., Shkunov Vladimir, Trevor Dennis J.
Принадлежит:

High aspect ratio core optical fiber designs, which could be semi-guiding, including a core region having a first refractive index and a high aspect ratio elongated cross-section along a slow axis direction, are described. An internal cladding having a second refractive index sandwiches the core and acts as a fast-axis signal cladding. The core has an edge region at both of its short edges that is in contract with edge-cladding regions having a barbell shape. The refractive index of the core regions, the refractive index of the internal claddings, and the refractive index of the edge-cladding regions, are selected so as to maximize the optical power of a lowest-order mode propagating in the fiber core, and to minimize the optical power of the next-order modes in the fiber core. A process to fabricate such a high aspect ratio core fiber is also provided. 1. A method of making a high aspect ratio core optical fiber preform , comprising:forming a near-net rectangular shape core region of a first composition and having an elongated cross-section with a wide slow-axis dimension and a narrow fast-axis direction;forming a pair of near-net shape cladding elements having a second composition;disposing the pair of near-net shape cladding elements adjacent to each slow-axis edge of the core region to form a pair of edge-cladding regions, the combination exhibiting a barbell configuration; andsurrounding the combination of the near-net rectangular shape core region and the pair of near-net shape cladding elements with an outer cladding of a third composition.2. The method of wherein the second composition is different from the first composition.3. The method of wherein the second composition is the same as the first composition claim 1 , forming a semi-guiding high aspect ratio core optical fiber preform.4. The method of wherein at least one of the pair of near-net shape cladding elements comprises a solid rod.5. The method of wherein at least one of the pair of near-net shape ...

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Номер записи: 42
23-04-2015 дата публикации

Locally-sintered porous soot parts and methods of forming

Номер: US20150111007A1
Автор: Daniel Warren Hawtof, Eric John Mozdy
Принадлежит: Corning Inc

A porous soot sheet is formed using a roll-to-roll glass soot deposition and sintering process. The soot sheet formation involves depositing glass soot particles on a deposition surface to form a supported soot layer, removing the soot layer from the deposition surface to form a soot sheet, and heating a portion of the soot sheet to locally-sinter the glass soot particles and form a porous soot part having a sintered peripheral edge.

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Номер записи: 43
30-04-2015 дата публикации

MANUFACTURING METHOD FOR Si02-Ti02 BASED GLASS, MANUFACTURING METHOD FOR PLATE-SHAPED MEMBER MADE OF Si02-Ti02 BASED GLASS, MANUFACTURING DEVICE, AND MANUFACTURING DEVICE FOR Si02-Ti02 BASED GLASS

Номер: US20150114040A1
Автор: SAITO Tadahiko, YOSHINARI Toshio
Принадлежит: NIKON CORPORATION

A method for manufacturing an SiO—TiObased glass upon a target by a direct method, includes a first process of preheating the target and a second process of growing an SiO—TiObased glass ingot to a predetermined length upon the target which has been preheated, wherein the target is heated in the first process such that, in the second process, the temperature of growing surface of the glass ingot is maintained at or above a predetermined lower limit temperature. 1. A method for manufacturing an SiO—TiObased glass upon a target by a direct method , comprising:a first process of preheating the target; and{'sub': 2', '2, 'a second process of growing an SiO—TiObased glass ingot to a predetermined length upon the target which has been preheated, wherein'}the target is heated in the first process such that, in the second process, the temperature of growing surface of the glass ingot is maintained at or above a predetermined lower limit temperature.2. The method for manufacturing an SiO—TiObased glass according to claim 1 , wherein:the thermal dose for heating the target is set so that the temperature of growing surface of the glass ingot is maintained at 1600° C. or higher.3. The method for manufacturing an SiO—TiObased glass according to claim 1 , wherein:a condition for the second process to start is that, in the first process, the temperature of the target should have reached a predetermined temperature.4. The method for manufacturing an SiO—TiObased glass according to claim 1 , wherein:{'sub': '2', 'the target comprises a circular plate-shaped target member and an SiOglass layer formed upon the target member.'}5. The method for manufacturing an SiO—TiObased glass according to claim 1 , wherein:the target includes a thermal storage portion that accumulates heat during the first process, and a heat insulating portion that suppresses conduction of heat from the thermal storage portion in the direction opposite to that of the glass ingot.6. The method for manufacturing an ...

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Номер записи: 44
03-05-2018 дата публикации

DOPED NANOPOROUS SILICA

Номер: US20180118604A1
Автор: Nachlas William Orion
Принадлежит:

Techniques for precise and accurate doping of nanoporous silica gel or silica glass that include forming a silica gel slurry that includes an activated silica gel and a solvent, adding a metal dopant to the silica gel slurry to form a mixture, mixing the mixture of the metal dopant and the silica gel slurry, and removing the solvent from the mixture to form a doped silica gel. 1. A method comprising:adding a metal dopant to a silica gel slurry to form a mixture, wherein the silica gel slurry comprises an activated silica gel and a solvent;mixing the mixture of the metal dopant and the silica gel slurry; andremoving the solvent from the mixture to form a doped silica gel.2. The method of claim 1 , further comprising hot-pressing the doped silica gel to form a doped silica glass.3. The method of claim 1 , wherein the metal dopant comprises a metal plasma standard solution of a transition metal.4. The method of claim 1 , wherein adding the metal dopant comprises adding a dopant mixture comprising the metal dopant and a second solvent to the silica gel slurry.5. The method of claim 1 , wherein adding the metal dopant to the silica gel slurry comprises adding about 30 μg to about 3000 μg of the metal dopant per gram of silica to the silica gel slurry.6. The method of claim 5 , wherein the metal dopant is substantially homogeneously dispersed within the doped silica gel.7. The method of claim 1 , further comprising washing a silica gel with an acid to form the activated silica gel.8. The method of claim 7 , wherein claim 7 , prior to adding the metal dopant to the silica gel slurry claim 7 , the activated silica gel comprises less than 100 μg/g of the metal dopant.9. The method of claim 1 , further comprising titrating the mixture to a pH between about 7 and about 10.10. The method of claim 9 , wherein titrating the mixture comprises titrating the mixture to a pH of about 8.11. The method of claim 1 , wherein the solvent comprises a carbon chain of 7 carbon atoms or less. ...

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Номер записи: 45
16-04-2020 дата публикации

Ultraviolet-Resistant Quartz Glass and Method of Producing the Same

Номер: US20200115266A1
Автор: Horikoshi Hideharu
Принадлежит: TOSOH SGM CORPORATION

The present invention pertains to: a method for manufacturing an ultraviolet-resistant quartz glass, said method including melting a synthetic silica powder; and a method for manufacturing an ultraviolet-resistant quartz glass, said method including performing arc plasma melting of a silica powder. Provided is an ultraviolet-resistant quartz glass having an ultraviolet-resistance of 2500 seconds, wherein, taking the initial transmittance during irradiation of a quadruple higher harmonic (266 nm) of a YAG laser (irradiation performed at a YAG laser output of 180 mW, pulse width of 20 nsec, and frequency of 80 kHz) at an optical path length of 30 mm to be 100%, the irradiation period until the transmittance falls to 3% is defined as resistance to ultraviolet rays (referred to as ultraviolet-resistance). Also provided is an optical member for YAG-laser higher harmonics, said optical member comprising this quartz glass. 13-. (canceled)4. A method of producing an ultraviolet-resistant quartz glass used for a fourth harmonic or a fifth harmonic of an YAG laser , comprisingarc plasma melting of a silica powder to obtain the quartz glass having an ultraviolet-resistance of 5,000 seconds or longer,wherein the ultraviolet-resistance is an emission time until the transmittance falls to 3% when the initial transmittance at a light path length of 30 mm is set as 100% and a YAG laser is emitted using the four harmonic,the YAG laser emission conditions are a YAG laser output of 180 mW, a pulse width of 20 nsec, and a frequency of 80 kHz, andthe fourth harmonic has a wavelength of 266 nm.5. The production method according to claim 4 , wherein the silica powder is a synthetic silica powder or a natural quartz powder.6. (canceled)7. The production method according to claim 4 , wherein the —OH group concentration of the quartz glass is less than 100 ppm.89-. (canceled)10. An optical member for a fourth harmonic or a fifth harmonic of a YAG laser claim 4 , consisting of an ultraviolet- ...

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Номер записи: 46
27-05-2021 дата публикации

PROCESS FOR MANUFACTURING AN ARRAY WITH MICROCHANNELS

Номер: US20210154674A1
Автор: Ellouze Sami, Reichen Marcel, Reitz Arnaud, Shen Bingqing
Принадлежит:

The invention relates to a process for manufacturing a microfluidic chip comprising a solid material obtained from a sol-gel solution, the process comprising successively: a) casting a sol-gel solution made with tetraethyl orthosilicate onto a mold presenting a relief pattern and having a different thickness over the whole of the mold; b) gelling the sol-gel solution; c) unmolding and drying the gel obtained in b), so as to obtain a solid glass; and d) bonding said solid glass to a support, so as to obtain the microfluidic chip. 1. A process for manufacturing a microfluidic chip comprising a solid material obtained from a sol-gel solution , the process comprising successively:a) casting a sol-gel solution made with tetraethyl orthosilicate onto a mold presenting a relief pattern and having a different thickness over the whole of the mold;b) gelling the sol-gel solution;c) unmolding and drying the gel obtained in b), so as to obtain a solid glass; andd) bonding said solid glass to a support, so as to obtain the microfluidic chip.2. The process according to claim 1 , wherein the mold comprises a material of the family of epoxy-type negative near-UV photoresists or a polydimethylsiloxane material.3. The process according to any one of to claim 1 , further comprising claim 1 , before step a) claim 1 , a step of preparing the mold.4. The process according to any one of to claim 1 , wherein the relief pattern of the mold comprises protrusions claim 1 , so that the gelled sol-gel solution of step b) comprises microchannels or nanochannels.5. The process according to any one of to claim 1 , wherein the support used in step d) is a glass slide or a substrate made up of a material which is coated with a SiO2 layer using a sputtering technique.6. The process according to any one of to claim 1 , wherein step d) comprises anodic bonding for glass or SiO2 coated substrates claim 1 , or plasma bonding or thermal bonding.7. The process according to claim 6 , wherein anodic bonding ...

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Номер записи: 47
12-05-2016 дата публикации

Optical fiber glass base material manufacturing apparatus and sintering method

Номер: US20160130173A1
Автор: Kazuya Uchida
Принадлежит: Shin Etsu Chemical Co Ltd

Provided is an optical fiber glass base material manufacturing apparatus, including a furnace core tube that houses a porous glass base material; a movement mechanism that moves the porous glass base material in a longitudinal direction thereof in the furnace core tube; a first heating section that heats and dehydrates the porous glass base material in the furnace core tube; and a second heating section that is arranged downstream from the first heating section in a movement direction of the porous glass base material, and sinters the porous glass base material by heating a portion of the porous glass base material in the longitudinal direction.

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Номер записи: 48
02-05-2019 дата публикации

HALOGEN-DOPED SILICA FOR OPTICAL FIBER PREFORMS

Номер: US20190127264A1
Автор: Bookbinder Dana Craig, Dawes Steven Bruce, Fiacco Richard Michael, Harper Brian Lee, Li Ming-Jun, Tandon Pushkar
Принадлежит:

Preparation of halogen-doped silica is described. The preparation includes doping silica with high halogen concentration and sintering halogen-doped silica to a closed-pore state. The sintering includes a high pressure sintering treatment and a low pressure sintering treatment. The high pressure sintering treatment is conducted in the presence of a high partial pressure of a gas-phase halogen doping precursor and densifies a silica soot body to a partially consolidated state. The low pressure sintering treatment is conducted in the presence of a low partial pressure of gas-phase halogen doping precursor and transforms a partially consolidated silica body to a closed-pore state. The product halogen-doped silica glass exhibits little foaming when heated to form fibers in a draw process or core canes in a redraw process. 1. A method of producing halogen-doped silica comprising:{'sup': 3', '3, 'doping a silica soot body with a gas-phase doping precursor to form a doped silica soot body, the doped silica soot body having a density in the range from 0.25 g/cmand 1.00 g/cm, the gas-phase doping precursor comprising a halogen and having a partial pressure of at least 2.0 atm; and'} [{'sup': 3', '3, 'a first sintering treatment, the first sintering treatment transforming the doped silica soot body to a partially consolidated silica soot body in the presence of the gas-phase doping precursor, the gas-phase doping precursor having a partial pressure of at least 2.0 atm during the first sintering treatment, the partially consolidated silica soot body having a density less than 1.90 g/cmand at least 0.15 g/cmgreater than the density of the doped silica soot body; and'}, {'sup': 3', '3, 'a second sintering treatment, the second sintering treatment transforming the partially consolidated silica soot body to a closed-pore silica body, the closed-pore silica body having a density of at least 1.90 g/cmand at least 0.05 g/cmgreater than the density of the partially consolidated silica ...

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Номер записи: 49
21-05-2015 дата публикации

BLANK OF TITANIUM-DOPED GLASS WITH A HIGH SILICA CONTENT FOR A MIRROR SUBSTRATE FOR USE IN EUV LITHOGRAPHY AND METHOD FOR THE PRODUCTION THEREOF

Номер: US20150140257A1
Автор: Kuehn Bodo
Принадлежит:

On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body. 111.-. (canceled)12. A blank consisting essentially of titanium-doped , highly siliceous glass configured for use as a mirror substrate for use in extreme ultra violet lithography , said blank having a surface area which has an outer contour and which is predetermined to be metalized and which is a highly stressed zone during the intended use of the mirror substrate , wherein the blank is a melt composite body having a front body portion of titanium-doped glass of high homogeneity with a first volume and with dimensions enclosing the outer contour with an oversize , and a support body portion of titanium-doped quartz glass with a second volume , the support body portion being a monolithic glass block of lower ...

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Номер записи: 50
19-05-2016 дата публикации

HIGH HYDROXYL TIO2-SIO2 GLASS

Номер: US20160137545A1
Автор: Annamalai Sezhian, Duran Carlos Alberto, Hrdina Kenneth Edward
Принадлежит:

Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (T), and low expansivity slope. 1. A glass comprising:{'sub': '2', '9.0 wt % to 16.0 wt % TiO;'}{'sub': '2', '84.0 wt % to 91.0 wt % SiO; and'}900 ppm to 3000 ppm OH.2. The glass of claim 1 , wherein the glass comprises 9.5 wt % to 16.0 wt % TiOand 84.0 wt % to 90.5 wt % SiO.3. The glass of claim 2 , wherein the glass comprises 1000 ppm to 2000 ppm OH.4. The glass of claim 2 , wherein the glass comprises 1150 ppm to 1700 ppm OH.5. The glass of claim 1 , wherein the glass has a fictive temperature of less than 825° C. claim 1 , a crossover temperature between 0° C. and 100° C. claim 1 , an expansivity slope equal to zero at a temperature between 10° C. and 95° C. claim 1 , and an expansivity slope at 20° C. less than 1.2 ppb/K.6. The glass of claim 1 , wherein the glass has a fictive temperature of less than 750° C. claim 1 , a crossover temperature between 0° C. and 80° C. claim 1 , an expansivity slope equal to zero at a temperature between 10° C. and 60° C. claim 1 , and an expansivity slope at 20° C. less than 0.7 ppb/K.7. The glass of claim 1 , wherein the glass has a fictive temperature of less than 700° C. claim 1 , a crossover temperature between 0° C. and 60° C. claim 1 , an expansivity slope equal to zero at a temperature between 10° C. and 45° C. claim 1 , and an expansivity slope at 20° C. less than 0.4 ppb/K.8. The glass of claim 1 , wherein the glass comprises 10.0 wt % to 15.0 ...

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Номер записи: 51
03-06-2021 дата публикации

CHALCOGENIDE GLASS BASED INKS OBTAINED BY DISSOLUTION OR NANOPARTICLES MILLING

Номер: US20210163766A1
Автор: Estrada David, Mitkova Maria, Rahmot Ullah Shah Mohammad, Simon Al Amin Ahmed
Принадлежит:

An additive manufacturing ink composition may include a fluid medium. The ink may further include a chalcogenide glass suspended within the fluid medium to form a chalcogenide glass mixture. The ink may also include a surfactant. A method for forming an additive manufacturing ink may include wet milling a chalcogenide glass in a fluid medium and a surfactant to produce a chalcogenide glass mixture. The method may also include, after wet milling the chalcogenide glass, processing the chalcogenide glass mixture to reduce an average particle size of the chalcogenide glass. 1. An additive manufacturing ink composition comprising:a fluid medium;chalcogenide glass suspended within the fluid medium to form a chalcogenide glass mixture; anda surfactant.2. The composition of claim 1 , wherein the fluid medium includes cyclohexanone.3. The composition of claim 1 , wherein the chalcogenide glass includes materials from germanium-sulfide claim 1 , a germanium-selenide claim 1 , a germanium-tin-sulfide claim 1 , a germanium-tin-selenide claim 1 , a germanium-antimony-telluride claim 1 , or a germanium-lead-sulfide glass systems.4. The composition of claim 1 , wherein the surfactant includes ethyl cellulose.5. The composition of claim 1 , wherein the chalcogenide glass mixture includes between 0.15 grams of chalcogenide glass per milliliter of the fluid medium and 0.3 grams of chalcogenide glass per milliliter of the fluid medium.6. The composition of claim 1 , wherein the chalcogenide glass mixture includes 0.12 grams of the surfactant per milliliter of the fluid medium.7. The composition of claim 1 , wherein an average particle size of the chalcogenide glass is less than or equal to 100 nm.8. A method for forming an additive manufacturing ink comprising:wet milling a chalcogenide glass in a fluid medium and a surfactant to produce a chalcogenide glass mixture; andafter wet milling the chalcogenide glass, processing the chalcogenide glass mixture to reduce an average particle ...

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Номер записи: 52
17-05-2018 дата публикации

GLASS SUBSTRATES COMPRISING RANDOM VOIDS AND DISPLAY DEVICES COMPRISING THE SAME

Номер: US20180138454A1
Автор: Chen Minghan, Li Ming-Jun
Принадлежит:

Disclosed herein are organic light-emitting diodes (OLEDs) comprising an anode, a hole transporting layer, an emitting layer, an electron transporting layer, a cathode, and at least one glass substrate, wherein the at least one glass substrate comprises a first surface, an opposing second surface, and a plurality of voids disposed therebetween, wherein the void fill fraction of the glass substrate is at least about 0.1% by volume. Display devices comprises such OLEDs are also disclosed herein. Methods for making glass substrates are further disclosed herein. 1. An organic light-emitting diode comprising:(a) a cathode;(b) an electron transporting layer;(c) an emitting layer;(d) a hole transporting layer;(e) an anode; and(f) at least one glass substrate comprising a first surface, a second opposing surface, and a plurality of voids disposed therebetween, wherein a void fill fraction of the at least one glass substrate is at least about 0.1% by volume.2. The organic light-emitting diode of claim 1 , wherein each of the plurality of voids comprises a diameter independently ranging from about 0.01 μm to about 100 μm.3. The organic light-emitting diode of claim 1 , wherein the average diameter of the plurality of voids ranges from about 0.1 μm to about 10 μm.4. The organic light-emitting diode of claim 1 , wherein the at least one glass sheet comprises a plurality of elongated voids.5. The organic light-emitting diode of claim 4 , wherein each of the elongated voids comprises a length independently ranging from about 0.01 μm to about 2000 μm.6. The organic light-emitting diode of claim 4 , wherein the average length of the elongated voids ranges from about 0.1 μm to about 200 μm.7. The organic light-emitting diode of claim 1 , wherein the fill fraction of the plurality of voids ranges from about 0.1 to about 10%.8. The organic light-emitting diode of claim 1 , wherein the at least one glass substrate has a haze value of at least about 40%.9. The organic light-emitting ...

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Номер записи: 53
30-04-2020 дата публикации

METHOD AND DEVICE FOR HOMOGENIZING GLASS

Номер: US20200131069A1
Автор: Becker Klaus, Hengster Stefan, Huenermann Michael, Langner Andreas, LEHMANN Walter, Thomas Stephan, Trommer Martin, Vydra Jan
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

A known method for homogenizing glass includes the following steps: providing a cylindrical blank composed of the glass, having a cylindrical outer surface which extends between a first end face and a second end face, forming a shear zone in the blank by softening a longitudinal section of the blank and subjecting it to a thermal-mechanical intermixing treatment, and moving the shear zone along the longitudinal axis of the blank. To reduce the risk of cracks and fractures during homogenizing, it is proposed that a thermal radiation dissipator is used that at least partially surrounds the shear zone, the lateral dimension of which in the direction of the longitudinal axis of the blank is greater than the shear zone and smaller than the length of the blank, the thermal radiation dissipator being moved synchronously with the shear zone along the longitudinal axis of the blank. 2. The method according to claim 1 , wherein between the thermal radiation dissipator and the cylindrical outer surface of the blank a clearance in the range of 15% to 80% of the diameter of the blank is established.3. The method according to claim 1 , wherein the thermal radiation dissipator comprises a wall with a glass layer claim 1 , facing the shear zone claim 1 , composed of a quartz glass that is transparent to infrared radiation from the NIR wavelength range.4. The method according to claim 1 , wherein the thermal radiation dissipator comprises a layer composed of opaque quartz glass.5. The method according to claim 4 , wherein the layer composed of opaque quartz glass borders the glass layer or merges into the glass layer.6. The method according to claim 4 , wherein the opacity of the layer composed of opaque quartz glass is caused by a porosity of the quartz glass in the range of 2 to 8%.7. A device for homogenizing a cylindrical blank composed of glass having a cylindrical outer surface which extends along a longitudinal axis of the blank over a length of the blank between a first end ...

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Номер записи: 54
25-05-2017 дата публикации

METHOD FOR PRODUCING A COMPOSITE BODY OF A MATERIAL WITH A HIGH SILICIC ACID CONTENT

Номер: US20170144916A1
Автор: SCHEICH Gerrit, SCHENK Christian, WESSELY Frank
Принадлежит:

A low cost method for producing a mechanically and thermally stable composite body containing a first layer of a material with a high silicic acid content and an additional component connected to a second layer of a material with a high silicic acid content and an additional component in a second concentration differina from the first concentration is provided. The method involves (a) preparing a first slurry layer having a free surface using a first shirt mass containing SiOparticles and an additional component dispersed in a first dispersing agent, (b) providing a second slurry mass containing SiOparticles and an additional component in a second concentration dispersed in a second dispersing agent, (c) forming a composite-body intermediate product by applying the second slurry mass to the free surface of the first slurry layer, and (d) heating the composite-body intermediate product while forming the composite body. 1. A method for producing a composite body comprising a first layer of a material having a high silicic acid content and a first additional component in a first concentration connected to a second layer of a material having a high silicic acid content and a second additional component in a second concentration that differs from the first concentration , wherein the first and the second concentrations are greater than or equal to zero , the method comprising the following steps:{'sub': '2', '(a) preparing a first slurry layer having a free surface from a first slurry mass containing first SiOparticles and the first additional component in the first concentration dispersed in a first dispersing agent,'}{'sub': '2', '(b) providing a second slurry mass containing second SiOparticles and the second additional component in a second concentration that differs from the first concentration dispersed in a second dispersing agent,'}(c) forming a composite-body intermediate product by applying the second slurry mass to the free surface of the first slurry layer, ...

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Номер записи: 55
21-08-2014 дата публикации

Process for manufacturing an object from a sol-gel solution

Номер: US20140232046A1
Автор: Gilles Marchand, Tarek Fathallah
Принадлежит: Commissariat a lEnergie Atomique et aux Energies Alternatives CEA

A process for manufacturing an object made of a constituent material obtained from a sol-gel solution, the process including, successively: a) introducing the sol-gel solution into a mold of the object to be manufactured; b) gelling the sol-gel solution; c) drying the gel obtained in b) in the mold, by which the gel is converted into the constituent material of the object, wherein the mold includes a closed chamber and includes a material configured to allow evacuation of gases formed during b) and/or c).

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Номер записи: 56
31-05-2018 дата публикации

BASIC ADDITIVES FOR SILICA SOOT COMPACTS AND METHODS FOR FORMING OPTICAL QUALITY GLASS

Номер: US20180148366A1
Автор: Dawes Steven Bruce, Hogue Lisa Ann, Hrdina Kenneth Edward, Vemury Srinivas
Принадлежит:

A method for forming an optical quality glass is provided. The method includes contacting silica soot particles with a basic additive, forming a silica soot compact, and removing the basic additive from the silica soot compact. A method of forming a cladding portion of an optical fiber preform is also provided. 1. A method of forming optical quality glass , the method comprising:contacting silica soot particles with a basic additive;forming a silica soot compact; andremoving the basic additive from the silica soot compact.2. The method of claim 1 , wherein contacting silica soot particles with a basic additive increases the pH of the silica soot particles to between about 7.0 and about 10.3. The method of claim 1 , wherein contacting silica soot particles with a basic additive increases the pH of the silica soot particles to between about 7.5 and about 9.5.4. The method of claim 1 , wherein contacting silica soot particles with a basic additive increases the pH of the silica soot particles to between about 8.0 and about 9.0.5. The method of claim 1 , wherein contacting silica soot particles with a basic additive comprises adding between about 1 ppm and about 2500 ppm of the basic additive to the silica soot particles.6. The method of claim 1 , wherein contacting silica soot particles with a basic additive comprises adding between about 10 ppm and about 2000 ppm of the basic additive to the silica soot particles.7. The method of claim 1 , wherein contacting silica soot particles with a basic additive comprises adding between about 50 ppm and about 1500 ppm of the basic additive to the silica soot particles.8. The method of claim 1 , wherein contacting silica soot particles with a basic additive comprises adding between about 100 ppm and about 1000 ppm of the basic additive to the silica soot particles.9. The method of claim 1 , wherein the density of the silica soot compact is less than about 1.00 g/cm.10. The method of claim 1 , wherein the density of the silica ...

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Номер записи: 57
14-05-2020 дата публикации

TRANSPARENT SEALING MEMBER

Номер: US20200149691A1
Автор: HISHIKI Tatsuya, KIKUCHI Yoshio, Shibata Hiroyuki
Принадлежит: NGK Insulators, Ltd.

A transparent sealing member is provided with minute recesses at least in the surface of the member from which light from an optical element is emitted. The average width of the minute recesses is 0.1 μm to 2.0 μm, the average depth of the minute recesses is 5 nm to 50 nm, and the average frequency of occurrence of the minute recesses is 100000 to 3000000 recesses per 1 mm. 1. A transparent sealing member adapted to be used with an optical component having at least one optical element , and a mounting substrate on which the optical element is mounted , and constituting , together with the mounting substrate , a package in which the optical element is accommodated;wherein the transparent sealing member includes minute recesses on a least a surface from which light from the optical element is emitted;an average width of the respective minute recesses is greater than or equal to 0.1 μm and less than or equal to 2.0 μm, and an average depth of the respective minute recesses is greater than or equal to 5 nm and less than or equal to 50 nm; and{'sup': '2', 'an average existence frequency of the minute recesses is greater than or equal to 100,000 and less than or equal to 3 million per 1 mm.'}2. The transparent sealing member according to claim 1 , wherein a material of the transparent sealing member is quartz glass.3. The transparent sealing member according to claim 1 , wherein a surface roughness Ra of at least a surface from which light from the optical element is emitted is 0.01 to 0.05 μm.4. The transparent sealing member according to claim 2 , wherein a surface roughness Ra of at least a surface from which light from the optical element is emitted is 0.01 to 0.05 μm. This application is a Continuation of International Application No. PCT/JP2018/011898 filed on Mar. 23, 2018, which is based upon and claims the benefit of priority from International Application No. PCT/JP2017/025305 filed on Jul. 11, 2017, the contents all of which are incorporated herein by reference ...

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Номер записи: 58
02-07-2015 дата публикации

METHOD FOR PRODUCING CYLINDERS OF QUARTZ GLASS

Номер: US20150183676A1
Автор: Badeke Klaus-Uwe, Trommer Martin
Принадлежит:

A method for producing quartz glass cylinders includes producing soot bodies using depositing burners to deposit SiOparticles for mass deposition on a rotating substrate and vitrifying the soot bodies to form quartz glass cylinders. Prior to producing the soot bodies, the following steps are carried out: producing first and second test soot bodies, determining the density distribution of the first test soot body in the axial direction; vitrifying the second test soot body to generate a test quartz glass cylinder; determining the mass distribution of the test quartz glass cylinder in the axial direction; and setting the mass deposition of SiOparticles to be deposited as a function of the axial mass distribution of the test quartz glass cylinder. As such, the mass distribution of the produced and vitrified soot bodies is improved and/or made more homogeneous relative to the axial mass distribution of the test quartz glass cylinder. 117-. (canceled)18. A method for producing cylinders made of quartz glass comprising the steps of:{'sub': '2', '(i) producing soot bodies by using at least two depositing burners to deposit SiOparticles for mass deposition on a substrate that rotates about its longitudinal axis;'}(ii) vitrifying the soot bodies to form quartz glass cylinders; and [{'sub': '2', 'a) producing a first test soot body using the at least two depositing burners to deposit SiOparticles for mass deposition on the substrate that rotates about its longitudinal axis;'}, 'b) determining a density distribution of the first test soot body in an axial direction;', 'c) producing a second test soot body, an axial density distribution of the second test soot body being set as a function of the axial density distribution of the first test soot body;', 'd) vitrifying the second test soot body such that a test quartz glass cylinder is generated;', 'e) determining a mass distribution of the test quartz glass cylinder in an axial direction; and', {'sub': '2', 'f) setting the mass ...

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Номер записи: 59
02-07-2015 дата публикации

MANUFACTURING METHOD FOR SiO2-TiO2 BASED GLASS AND MANUFACTURING METHOD FOR PHOTOMASK SUBSTRATE MADE OF SiO2-TiO2 BASED GLASS

Номер: US20150183677A1
Автор: YOSHINARI Toshio
Принадлежит: NIKON CORPORATION

A method for manufacturing an SiO—TiObased glass upon a target by a direct method, includes: an ingot growing step of growing an SiO—TiObased glass ingot having a predetermined length on the target by flame hydrolysis by feeding a silicon compound and a titanium compound into an oxyhydrogen flame, wherein the ingot growing step includes: a first step of increasing a ratio of a feed rate of the titanium compound to a feed rate of the silicon compound as the SiO—TiObased glass ingot grows until the ratio reaches a predetermined value; and a second step of gradually growing the SiO—TiObased glass ingot after the ratio has reached the predetermined value in the first stage with keeping the ratio within a predetermined range. 1. A method for manufacturing an SiO—TiObased glass upon a target by a direct method , comprising:{'sub': 2', '2, 'an ingot growing step of growing an SiO—TiObased glass ingot having a predetermined length on the target by flame hydrolysis by feeding a silicon compound and a titanium compound into an oxyhydrogen flame, wherein'} [{'sub': 2', '2, 'a first step of increasing a ratio of a feed rate of the titanium compound to a feed rate of the silicon compound as the SiO—TiObased glass ingot grows until the ratio reaches a predetermined value; and'}, {'sub': 2', '2, 'a second step of gradually growing the SiO—TiObased glass ingot after the ratio has reached the predetermined value in the first stage with keeping the ratio within a predetermined range.'}], 'the ingot growing step includes2. The method for manufacturing an SiO—TiObased glass according to claim 1 , wherein claim 1 ,{'sub': 2', '2', '2, 'in the first step, an increment of the ratio per stage upon increasing the ratio in stages is adjusted such that an increment of TiOconcentration of the SiO—TiObased glass upon increasing the ratio is equal to or less than 1 mass %.'}3. The method for manufacturing an SiO—TiObased glass according to claim 1 , wherein{'sub': 2', '2', '2, 'the ratio is ...

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Номер записи: 60
30-06-2016 дата публикации

METHOD FOR PRODUCING TITANIUM-DOPED SILICA GLASS FOR USE IN EUV LITHOGRAPHY AND BLANK PRODUCED IN ACCORDANCE THEREWITH

Номер: US20160185645A1
Автор: Becker Klaus, Ochs Stefan, Thomas Stephan
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

The Ti ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti ions in favor of Ti ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO—SiOsoot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti/Ti5×10. 112.-. (canceled)14. The method according to claim 13 , wherein the conditioning treatment is carried out with nitrous oxide (NO) as the nitrogen oxide.15. The method according to claim 13 , wherein the conditioning treatment is carried out with nitrogen dioxide (NO) as the nitrogen oxide.16. The method according to claim 13 , wherein the conditioning treatment is carried out with the nitrogen oxide at a treatment temperature in the range of 20° C. to 600° C. for a period of at least one hour.17. The method according to claim 13 , further comprising performing a thermal treatment at a temperature range of 600° C. to 1000° C. after the conditioning treatment and before step (c) for expulsion of reaction gases from the soot body.18. The method according to claim 13 , wherein the conditioning treatment comprises a treatment with an inert gas comprising between 0.1 and 20% by vol nitrogen oxide.19. The method according to claim 13 , further comprising performing a doping treatment of the TiO—SiOsoot body in a fluorine-containing atmosphere.20. The method according to claim 19 , wherein step (b) is performed fully or partially during the doping treatment.21. The method ...

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Номер записи: 61
28-06-2018 дата публикации

METHOD FOR PRODUCING OPAQUE QUARTZ GLASS, AND BLANK MADE FROM THE OPAQUE QUARTZ GLASS

Номер: US20180179098A1
Автор: SCHEICH Gerrit, SCHENK Christian, TSCHOLITSCH Nadine
Принадлежит: Heraeus Quarzglas GmbH & Co. KG

In one method for producing opaque quartz glass, a green body is produced from a slip containing fine, amorphous SiOparticles and coarse SiOreinforcement bodies and the green body is sintered by way of a sintering treatment into a blank made from the opaque quartz glass. The reinforcement bodies with a specific density Dare here embedded in a SiOmatrix with a specific glass density D. Starting from this, in order to provide a blank of opaque quartz glass that is less susceptible to cracking and illustrates homogeneous transmission even in the case of small wall thicknesses, in one aspect sinterable reinforcement bodies are used, the specific density Dof which prior to the sintering treatment is lower than the specific glass density D, and which due to the sintering treatment reach the specific density Dwhich differs from the specific glass density Dby less than 10%. 1. A method for producing opaque quartz glass in that a green body is produced from a slip containing fine , amorphous SiOparticles and coarse SiOreinforcement bodies and the green body is sintered by way of a sintering treatment into a blank made from the opaque quartz glass , in which reinforcement bodies with a specific density Dare embedded in a SiOmatrix with a specific glass density D , characterized in that sinterable reinforcement bodies are used , the specific density Dof which prior to the sintering treatment is lower than the specific glass density D , and which due to the sintering treatment reach the specific density Dwhich differs from the specific glass density Dby less than 10% , and which have a mean particle size (Dvalue) of at least 500 μm.2. The method according to claim 1 , characterized in that reinforcement bodies are used that due to the sintering treatment reach a specific density Dthat differs from the specific glass density Dby less than 5%.3. The method according to claim 1 , characterized in that opaque quartz glass is produced that at a measurement wavelength of 1700 nm and ...

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Номер записи: 62
15-07-2021 дата публикации

CARBON-DOPED SILICON DIOXIDE GLASS AND METHODS OF MANUFACTURING THEREOF

Номер: US20210214267A1
Автор: Gu Yunfeng, LeBlond Nicolas, Li Ming-Jun, Stone Jeffery Scott, ZHANG Haitao
Принадлежит:

A silica-based substrate includes a glass phase and a dispersed phase having carbon, such that the silica-based substrate has a thickness of at least 10 gm. Also disclosed is a method of forming a silica-based substrate, the method including contacting a porous silica soot preform with an organic solution having at least one hydrocarbon precursor to form a doped silica soot preform and heating the doped silica soot preform in an inert atmosphere to form the silica-based substrate. 1. A silica-based substrate comprising:a glass phase;a dispersed phase comprising carbon,wherein the silica-based substrate has a thickness of at least 10 μm.210-. (canceled)11. The substrate of claim 1 , wherein the carbon is a nanostructure comprising at least one of nanoparticles claim 1 , nanorods claim 1 , nanowires claim 1 , nanocylinders claim 1 , or nanoribbons.1218-. (canceled)19. The substrate of claim 1 , wherein the electrical resistivity is in a range of 3000 Ω·cm to 5000 Ω·cm.20. An optical fiber claim 1 , optical attenuator claim 1 , fiber laser claim 1 , or sensor comprising the substrate of .21. A method of forming a silica-based substrate claim 1 , the method comprising:contacting a porous silica soot preform with an organic solution comprising at least one hydrocarbon precursor to form a doped silica soot preform;heating the doped silica soot preform in an inert atmosphere to form the silica-based substrate.22. The method of claim 21 , wherein the porous silica soot preform has a porosity in a range of 25% to 75% and pore sizes in a range of 100 nm to 500 nm.23. The method of claim 22 , wherein the porosity is in a range of 55% to 65% and pore sizes in a range of 100 nm to 300 nm.24. The method of claim 21 , wherein the hydrocarbon precursor comprises at least one of:{'sub': n', '2n+2, '(a) alkanes of the form CH;'}{'sub': n', '2n, '(b) alkenes of the form CH;'}(c) carboxylic acids, amines, or alcohols with an aliphatic group of at least 6 carbon atoms;(d) metal ...

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Номер записи: 63
14-07-2016 дата публикации

LIQUID GLASS APPLICATION

Номер: US20160205774A1
Автор: Chang Yu-Chun
Принадлежит:

A liquid glass application is provided, which uses liquid glass to prepare a substrate having conductive posts, a substrate embedded with a circuit and a glass membrane. The liquid glass possesses a large number of usage convenience features. Therefore, a preparation cost can be greatly reduced. Besides, a traditional glass configuration limit is broken and a glass thickness can be reduced remarkably, thereby meeting nowadays requirements of lightness, thinness, shortness and smallness on electronic products. 1. A method for fabricating a substrate , comprising:forming a plurality of conductive posts on a carrier board;coating a liquid glass layer on the carrier board to encapsulate the conductive posts, wherein a top surface of the liquid glass layer is flush with top ends of the conductive posts;baking at a baking temperature between 50 and 100° C.;irradiating with UV light; andremoving the carrier board.2. The method of claim 1 , wherein the baking temperature is preferably between 70 and 95° C.3. The method of claim 1 , wherein the baking takes 3 to 55 minutes.4. The method of claim 1 , wherein the liquid glass layer has a thickness of 2 to 25 μm.5. The method of claim 1 , wherein the conductive posts are formed by electroplating or deposition.6. The method of claim 1 , wherein forming the conductive posts comprises the steps of:forming on the carrier board a resist layer having a plurality of openings;forming the conductive posts in the openings of the resist layer; andremoving the resist layer.7. The method of claim 1 , wherein an angle of 85 to 90° is formed between side walls of the conductive posts and the carrier board around the conductive posts.8. A substrate claim 1 , comprising:a glass base having a thickness of 2 to 25 μm; anda plurality of conductive posts penetrating two surfaces of the glass base.9. The substrate of claim 8 , wherein an angle of 85 to 95° is formed between side walls of the conductive posts and the surfaces of the glass base.10. A ...

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Номер записи: 64
21-07-2016 дата публикации

Fluid permeable and vacuumed insulating microspheres and methods of producing the same

Номер: US20160207817A1
Автор: Hojaji Hamid, Kocs Laura Gabriela
Принадлежит:

Microsphere comprising an outer shell enclosing a substantially hollow inner space, the outer shell comprising a fluid permeable porous structure, the fluid permeable porous structure comprising interconnected pores, the microsphere being capable of maintaining a vacuum in its substantially hollow inner space when its outer shell is sealed. 1. A fluid permeable glass microsphere , comprising:an outer shell enclosing a substantially hollow inner space;said outer shell comprising a fluid permeable porous structure;said fluid permeable porous structure comprising interconnected pores;{'sup': '3', 'wherein said fluid permeable glass microsphere having an average particle density of less than 1 g/cm.'}2. The microsphere of claim 1 , wherein said interconnected pores comprising a plurality of pores with an average pore diameter from about 10 angstroms to about 0.1 microns.3. The microsphere of claim 1 , wherein said fluid permeable glass microsphere having an average particle density of about 0.08 g/cmto about 0.9 g/cm.4. The microsphere of claim 1 , wherein said fluid is at least one of a gas claim 1 , a vapor claim 1 , a liquid and a combination thereof.5. The microsphere of claim 1 , wherein said substantially hollow inner space comprising vacuum.6. The microsphere of claim 5 , wherein said outer shell being capable of maintaining the vacuum comprised by said substantially hollow inner space when the fluid permeable glass microsphere is sealed.7. The microsphere of claim 1 , wherein said outer shell comprising about 10% to about 50% pores per a total volume of the outer shell.8. The microsphere of claim 1 , wherein a volume of the interconnected pores in the outer shell ranging from about 1% to about 40% of a total volume of pores in the outer shell and pores in said substantially hollow inner space.9. The microsphere of claim 1 , wherein a volume of said substantially hollow inner space ranging from about 35% to about 90% of a total volume of said fluid permeable ...

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Номер записи: 65
18-06-2020 дата публикации

TRANSPARENT SEALING MEMBER

Номер: US20200189961A1
Автор: KIKUCHI Yoshio, Shibata Hiroyuki
Принадлежит: NGK Insulators, Ltd.

The present invention relates to a transparent sealing member. A quartz glass transparent sealing member is used in an optical component having at least one optical element, and a mounting board on which the optical element is mounted, and constitutes, with the mounting board, a package that houses the optical element. The concentration of aluminum in a surface portion is higher than the concentration of aluminum in an inner portion. 1. A transparent sealing member made of quartz glass , the transparent sealing member being used in an optical component having at least one optical element and a mounting substrate on which the optical element is mounted , and constituting , together with the mounting substrate , a package in which the optical element is accommodated;wherein an aluminum concentration of a surface portion of the transparent sealing member is higher than an aluminum concentration of an interior portion thereof.2. The transparent sealing member according to claim 1 , wherein assuming that the aluminum concentration of the surface portion is represented by A (ppm) claim 1 , and the aluminum concentration of the interior portion is represented by B (ppm) claim 1 , then 10≤A/B≤200.3. The transparent sealing member according to claim 1 , wherein assuming that the aluminum concentration of the surface portion is represented by A (ppm) claim 1 , and the aluminum concentration of the interior portion is represented by B (ppm) claim 1 , then 15≤A/B≤60.4. The transparent sealing member according to claim 1 , wherein the aluminum concentration of the surface portion is 500 to 2000 ppm claim 1 , and the aluminum concentration of the interior portion is 10 to 100 ppm.5. The transparent sealing member according to claim 1 , wherein:the surface portion indicates a region having a depth of 0.05 to 0.20 μm from a surface; andthe interior portion indicates a region having a depth This application is a Continuation of International Application No. PCT/JP2017/031212 filed ...

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Номер записи: 66
25-06-2020 дата публикации

Method for Manufacturing Optical Fiber Base Material and Optical Fiber Base Material

Номер: US20200199008A1
Автор: Imoto Katsuyuki, ISHII FUTOSHI
Принадлежит: Kohoku Kyogo Co. Ltd.

The present invention provides a method for manufacturing an optical fiber base material and an optical fiber base material, the method including: arranging a rod containing SiOfamily glass for core, in a container; pouring a SiOglass raw material solution for cladding layer and a hardener into the container, the glass raw material solution containing a hardening resin; solidifying the glass raw material solution through a self-hardening reaction; and then drying the solidified material and heating the solidified material in chlorine gas, to manufacture an optical fiber base material in which a SiOcladding layer is formed in an outer periphery of the rod containing SiOfamily glass for core. 1. An optical fiber base material comprising:{'sub': '2', 'a rod containing SiOfamily glass for core; and'}{'sub': 2', '2, 'a SiOcladding layer that covers an outer periphery of the rod containing SiOfamily glass for core,'}{'sub': 2', '2', '2', '2', '2, 'wherein the SiOcladding layer is a layer formed by solidifying a material in the form of liquid, an outer peripheral surface of the rod containing SiOfamily glass for core and the SiOcladding layer are in tight contact with each other, and surface roughness of an interface between the rod containing SiOfamily glass for core and the SiOcladding layer is less than 0.2 μm.'}2. The optical fiber base material according to claim 1 , further comprising a plurality of empty holes formed by molding and arranged in the SiOcladding layer so as to surround the outer periphery of the rod containing SiOfamily glass for core.3. An optical fiber base material comprising:{'sub': '2', 'a SiOcladding layer; and'}{'sub': '2', 'a plurality of empty holes that are arranged at preset intervals in a center of the SiOcladding layer and around the center,'}wherein the empty holes are formed by molding.4. An optical fiber base material comprising:{'sub': '2', 'a SiOcladding layer; and'}{'sub': '2', 'a plurality of empty holes that are arranged at preset ...

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Номер записи: 67
03-08-2017 дата публикации

METHOD FOR PRODUCING A BLANK FROM TITANIUM- AND FLUORINE-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT

Номер: US20170217814A2
Автор: Becker Klaus, Ochs Stefan
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO—SiOsoot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO—SiO-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO—SiO-soot particles. 113.-. (canceled)14. A method for producing a blank from titanium-doped glass having a high silicic-acid content with a predetermined fluorine content for use in EUV lithography , the method comprising forming TiO—SiOsoot particles by flame hydrolysis of silicon-and titanium-containing precursor substances , and exposing the TiO—SiOsoot particles in a moved powder bed to a fluorine-containing reagent to convert the TiO—SiOsoot particles into fluorine-doped TiO—SiOsoot particles , wherein the fluorine-doped TiO—SiOsoot particles are consolidated and verified vitrified into the blank.15. The method according to claim 14 , wherein the silicon-containing precursor substance is octamethylcyclotetrasiloxane (OMCTS) and the titanium-containing precursor substance is titanium isopropoxide [Ti(OPri)].16. The method according to claim 14 , wherein the TiO—SiOsoot particles have a mean particle size in a range of 20 nm to 500 nm and a BET specific surface area in a range of 50 m/g to 300 m/g.17. The method according to claim 14 , wherein a ...

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Номер записи: 68
02-08-2018 дата публикации

LASER SYSTEM AND METHOD FORMING AN EDGE SECTION OF A HIGH PURITY FUSED SILICA GLASS SHEET

Номер: US20180215645A1
Автор: Bhagavatula Venkata Adiseshaiah, Hawtof Daniel Warren, III John, Li Xinghua, Merz Gary Edward, Stone
Принадлежит:

A system and method for making an edge section of a thin, high purity fused silica glass sheet. The method includes a step of directing a laser to melt through the glass sheet with localized heating of a narrow portion of the glass sheet to form an edge section of the glass sheet, and continuing the edge section to form a closed loop defining a perimeter of the glass sheet. The method further includes rapidly cooling the glass sheet through the glass transition temperature as the melted glass of the edge section contracts and/or solidifies to form an unrefined-bullnose shape extending between first and second major surfaces of the glass sheet. 1. A high purity fused silica glass sheet comprising:a first major surface;a second major surface opposite the first major surface;an edge section surrounding the first and second major surfaces and defining an outer perimeter of the silica glass sheet;at least 99.9 mole % silica, wherein the silica is at least generally amorphous, having less than 1% crystalline content by weight; andan average thickness between the first major surface and the second major surface of less than 500 μm;wherein the edge section, in cross section, has an unrefined-bullnose shape such that the edge section has a surface that is outwardly rounded between the first and second major surfaces and curvature of the surface of the edge section smoothly transitions, free of sharp edges and/or discontinuities in curvature that extend around the perimeter, between the first and second major surfaces but in neither a geometric circular arc nor with radiused corners directly connected by a straight portion that is orthogonal to the first and second major surfaces;{'sup': '2', 'wherein a roughness (Ra) of the first major surface is between 0.025 nm and 1 nm over at least one 0.023 mmarea of the first major surface.'}2. The high purity fused silica glass sheet of claim 1 , wherein the unrefined-bullnose shape is skewed such that claim 1 , in cross section claim ...

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Номер записи: 69
04-08-2016 дата публикации

Wavelength converting member, light-emitting device, and method for producing wavelength converting member

Номер: US20160225963A1
Автор: Hiroshi Fukunaga, Hiroyo Segawa, Kazunori Annen, Kenichi Yoshimura, Makoto Izumi, Masamichi Harada, Naoto Hirosaki
Принадлежит: NATIONAL INSTITUTE FOR MATERIALS SCIENCE, Sharp Corp

A wavelength converting member includes silica glass and a plurality of fluorescent material particles including an oxynitride or nitride fluorescent material and dispersed in the silica glass. The plurality of fluorescent material particles include at least two kinds of fluorescent material particles including (i) first fluorescent material particles that emit a fluorescence having a first peak wavelength and (ii) second fluorescent material particles that emit a fluorescence having a second peak wavelength. The wavelength converting member has a density within a range from 0.8 g/cm 3 to 1.2 g/cm 3 .

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Номер записи: 70
03-08-2017 дата публикации

LOW ATTENUATION FIBER WITH VISCOSITY MATCHED CORE AND INNER CLAD

Номер: US20170219770A1
Автор: Bookbinder Dana Craig, III Hazel Benton, Li Ming-Jun, Matthews, Tandon Pushkar
Принадлежит:

A single mode optical fiber having a core made from silica and less than or equal to about 6.5 weight % germania and having a maximum relative refractive index Δ. The optical fiber also has an inner cladding surrounding the core and having a minimum relative refractive index Δ. A difference between a softening point of the core and a softening point of the inner cladding is less than or equal to about 20° C., and Δ>Δ. The single mode optical fiber may also have an outer cladding surrounding the inner cladding made from silica or SiON. The outer cladding has a maximum relative refractive index Δ, and Δ>Δ. A method for manufacturing an optical fiber includes providing a preform to a first furnace, the preform, drawing the optical fiber from the preform, and cooling the drawn optical fiber in a second furnace. 1. A method of manufacturing a single mode optical fiber , the method comprising: a core comprising silica and less than or equal to 6.5 weight % germania, and', 'an inner cladding that surrounds the core;, 'providing a preform to a first furnace, the preform comprisingdrawing the single mode optical fiber from the preform; andcooling the drawn single mode optical fiber in a second furnace, whereina difference between a softening point of the core and a softening point of the inner cladding is less than or equal to 50° C.2. The method of claim 1 , wherein the cooling comprises cooling the drawn single mode optical fiber from a temperature of 1600° C. to a temperature of 1250° C. at a cooling rate of less than or equal to 5000° C./s.3. The method of claim 2 , wherein the cooling further comprises cooling the drawn single mode optical fiber from a temperature of 1250° C. to a temperature of 1050° C. at a cooling rate of less than or equal to 12000° C./s.4. The method of claim 1 , wherein the cooling comprises cooling the drawn single mode optical fiber from a temperature of 1400° C. to a temperature of 1050° C. at a cooling rate of less than or equal to 5000° C./s. ...

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Номер записи: 71
09-07-2020 дата публикации

METHOD FOR PRODUCING A MICROFLUIDIC DEVICE

Номер: US20200215539A1
Автор: Bartolo Denis, Chateau Denis, LEVANT Michael, PAROLA Stephane
Принадлежит:

The present invention relates to a method for producing a microfluidic device, in particular, a sol-gel method for producing a microfluidic device in hybrid silica glass. The invention also relates to a microfluidic device obtainable by the method as described above and to microfluidic device in hybrid silica glass comprising at least one microchannel having a depth of at least 1 μm, preferably between 1 μm and 1 mm, and more preferably between 10 and 100 μm. 1. A sol-gel method for producing a microfluidic device with a given pattern comprising the following steps: {'br': None, 'sub': n', '4−n, 'RSi(OR′)\u2003\u2003(I)'}, 'hydrolysis of at least one alkoxysilane of formula (I)'}, 'i. the preparation of said sol A comprising, 'a) implementing or preparing a sol A having a condensation ratio greater than or equal to 75%, preferably between 75 and 90%,'}wherein n is 1, 2 or 3, preferably 1 or 2;R is a hydrocarbyl radical having 1-12 carbon atoms;{'sub': 1', '6, 'R′ is a C-Calkyl group;'} condensation of the so-obtained hydrolysate;', 'ii. at least partially removing one or more side product of the hydrolysis reaction;', 'iii. using an organic solvent to collect the condensate obtained in i.;, 'using at least one aqueous solution of at least one water soluble organic acid catalyst,'}b) optionally, evaporating an excess of solvent of said sol A;c) patterning a volume of said sol A, preferably with flexible stamps;d) curing the pattern of sol A issued from step c) to get at least one microfluidic gel pattern;e) sealing at least one face of the microfluidic gel pattern with at least an element.2. The method according to claim 1 , wherein the alkoxysilane of formula (I) is selected from the group consisting of is selected from the group consisting of TMOS (tetramethyl orthosilicate) claim 1 , TEOS (tetraethyl orthosilicate) claim 1 , MTEOS (methyltriethoxysilane) claim 1 , MTMOS (methyltrimethoxysilane) claim 1 , ETEOS (ethyltriethoxysilane) claim 1 , ETMOS ( ...

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Номер записи: 72
18-08-2016 дата публикации

SILICA-CONTAINING SHEET AND RELATED SYSTEM AND METHODS

Номер: US20160236961A1
Автор: Hawtof Daniel Warren
Принадлежит:

A system and process for making a thin, soot particle or glass sheet is provided. The system includes a soot deposition plate having a deposition surface and a glass soot generating device spaced from the deposition surface along a first axis. The glass soot generating device is configured to generate glass soot particles and to deliver the glass soot particles through an outlet and on to the deposition surface in a layer having a thickness of less than 5 mm. At least one of the soot deposition plate and the glass soot generating device is movable to cause relative movement between the deposition surface of the soot deposition plate and the glass soot generating device. A thin soot or sintered soot sheet is also provided. The soot sheet has a variable surface topography that varies along at least two axes. 1. A system for making a thin silica-containing sheet comprising:a soot deposition plate having a deposition surface; anda glass soot generating device spaced from the deposition surface along a first axis, the glass soot generating device is configured to generate glass soot particles and to deliver the glass soot particles through an outlet and on to the deposition surface in a layer having a thickness of less than 5 mm, wherein the outlet of the glass soot generating device faces the deposition surface of the soot deposition plate;wherein at least one of the soot deposition plate and the glass soot generating device is movable to cause relative movement between the deposition surface of the soot deposition plate and the glass soot generating device.2. The system for making a silica-containing sheet of further comprising a sintering station configured to sinter the glass soot particles wherein the layer of glass soot particles is released from the soot deposition plate and passed into the sintering station prior to sintering.3. The system for making a silica-containing sheet of wherein the relative movement includes movement in a plane perpendicular to the first ...

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Номер записи: 73
15-09-2016 дата публикации

METHOD FOR PRODUCING A BLANK FROM TITANIUM- AND FLUORINE-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT

Номер: US20160264447A1
Автор: Becker Klaus, Ochs Stefan
Принадлежит:

A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO—SiOsoot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO—SiO-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO—SiO-soot particles. 113-. (canceled)14. A method for producing a blank from titanium-doped glass having a high silicic-acid content with a predetermined fluorine content for use in EUV lithography , the method comprising forming TiO—SiOsoot particles by flame hydrolysis of silicon- and titanium-containing precursor substances , and exposing the TiO—SiOsoot particles in a moved powder bed to a fluorine-containing reagent to convert the TiO—SiOsoot particles into fluorine-doped TiO—SiOsoot particles , wherein the fluorine-doped TiO—SiOsoot particles are consolidated and verified into the blank.15. The method according to claim 14 , wherein the silicon-containing precursor substance is octamethylcyclotetrasiloxane (OMCTS) and the titanium-containing precursor substance is titanium isopropoxide [Ti(OPri)].16. The method according to claim 14 , wherein the TiO—SiOsoot particles have a mean particle size in a range of 20 nm to 500 nm and a BET specific surface area in a range of 50 m/g to 300 m+/g.17. The method according to claim 14 , wherein a ...

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Номер записи: 74
15-08-2019 дата публикации

ULTRALOW EXPANSION TITANIA-SILICA GLASS

Номер: US20190248696A1
Автор: Annamalai Sezhian, Duran Carlos Alberto, Hrdina Kenneth Edward, Rosch William Rogers
Принадлежит:

Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier. 1. A method of annealing glass comprising:heating a modified titania-silica glass to a first temperature, said modified titania-silica glass including a non-uniform concentration of a modifier, said first temperature exceeding 850° C.;cooling said modified titania-silica glass at a first cooling rate from said first temperature to a second temperature, said second temperature being in the range from 650° C. to 800° C.;cooling said modified titania-silica glass at a second cooling rate from said second temperature to a third temperature, said second cooling rate being less than 1° C./hr, said cooling at said second cooling rate occurring for at least 10 hours.2. The method of claim 1 , wherein said third temperature is no more than 10° C. less than said second temperature.3. The method of claim 2 , further comprising heating said modified titania-silica glass from said third temperature to a fourth temperature claim 2 , said fourth temperature being in the range from 5° C. to 25° C. greater than said third temperature. This application is a divisional of U.S. application Ser. No. 15/686,313, filed Aug. 25, 2017; which is a divisional of U.S. application Ser. No. 15/003,115, filed Jan. 21, 2016, now U.S. Pat. No. 9,822,030; which claims the benefit of priority under 35 U.S.C. § 119 of U.S. ...

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Номер записи: 75
13-08-2020 дата публикации

SILICA GLASS FOR RADIO-FREQUENCY DEVICE AND RADIO-FREQUENCY DEVICE TECHNICAL FIELD

Номер: US20200255324A1
Автор: IWAHASHI Yasutomi, KIDERA Nobutaka, SASAKI Kazuya
Принадлежит: AGC Inc.

A silica glass for a radio-frequency device has an OH group concentration being less than or equal to 300 wtppm; an FQ value being higher than or equal to 90,000 GHz at a frequency of higher than or equal to 25 GHz and lower than or equal to 30 GHz; and a slope being greater than or equal to 1,000 in a case where the FQ value is approximated as a linear function of the frequency in a frequency band of higher than or equal to 20 GHz and lower than or equal to 100 GHz. 1. A silica glass for a radio-frequency device , the silica glass having an OH group concentration being less than or equal to 300 wtppm; an FQ value being higher than or equal to 90 ,000 GHz at a frequency of higher than or equal to 25 GHz and lower than or equal to 30 GHz; and a slope being greater than or equal to 1 ,000 in a case where the FQ value is approximated as a linear function of the frequency in a frequency band of higher than or equal to 20 GHz and lower than or equal to 100 GHz.2. A silica glass for a radio-frequency device , the silica glass having an OH group concentration being less than or equal to 100 wtppm; an FQ value being higher than or equal to 100 ,000 GHz at a frequency of higher than or equal to 25 GHz and lower than or equal to 30 GHz; and a slope being greater than or equal to 1 ,000 in a case where the FQ value is approximated as a linear function of the frequency in a frequency band of higher than or equal to 20 GHz and lower than or equal to 100 GHz.3. A silica glass for a radio-frequency device , the silica glass having an OH group concentration being less than or equal to 40 wtppm; an FQ value being higher than or equal to 160 ,000 GHz at a frequency of higher than or equal to 25 GHz and lower than or equal to 30 GHz; and a slope being greater than or equal to 1 ,000 in a case where the FQ value is approximated as a linear function of the frequency in a frequency band of higher than or equal to 20 GHz and lower than or equal to 100 GHz.4. A silica glass for a radio- ...

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Номер записи: 76
06-10-2016 дата публикации

Glass Precursor Gel

Номер: US20160289114A1
Автор: Bhaduri Sutapa, Cooper Scott P., Gullinkala Tilak, Remington Michael P., Weil Scott
Принадлежит:

A glass precursor gel and a method of making a glass product from the glass precursor gel are disclosed. The glass precursor gel includes a bulk amorphous oxide-based matrix that is homogeneously chemically mixed and includes 30 mol % to 90 wt. % silica and at least one of the following: (A) 0.1 mol % to 25 mol % of one or more alkali oxides in sum total, (B) 0.1 mol % to 25 mol % of one or more alkaline earth oxides in sum total, (C) 1 mol % to 20 mol % boric oxide, (D) 5 mol % to 80 mol % lead oxide, or (E) 0.1 mol % to 10 mol % aluminum oxide. A method of making a glass product from the glass precursor gel involves obtaining the glass precursor gel, melting the glass precursor gel into molten glass, and forming the molten glass into a glass product. 1. A glass precursor gel comprising:{'sup': '3', 'a bulk amorphous oxide-based matrix having an inorganic network of primary constituent oxides, the primary constituent oxides comprising 30 mol % to 90 mol % silica and one or more of the following: (A) 0.1 mol % to 25 mol % of one or more alkali oxides in sum total, (B) 0.1 mol % to 25 mol % of one or more alkaline earth oxides in sum total, (C) 1 mol % to 20 mol % boric oxide, (D) 5 mol % to 80 mol % lead oxide, or (E) 0.1 mol % to 10 mol % aluminum oxide; wherein the bulk amorphous oxide-based matrix is homogenously chemically to mixed and, further, wherein the glass precursor gel has a density of less than 2.0 g/cm.'}2. The glass precursor gel set forth in claim 1 , wherein the primary constituent oxides are silica claim 1 , sodium oxide claim 1 , and calcium oxide.3. The glass precursor material set forth in claim 2 , wherein the amorphous oxide-based matrix comprises 60 mol % to 85% silica claim 2 , 8 mol % to 18 mol % sodium oxide claim 2 , and 5 mol % to 15 mol % calcium oxide.4. The glass precursor gel set forth in claim 3 , wherein the amorphous oxide-based matrix further comprises aluminum oxide.5. The glass precursor gel set forth in claim 1 , wherein the ...

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Номер записи: 77
06-10-2016 дата публикации

METHOD FOR FLUORINATING DOPED QUARTZ GLASS

Номер: US20160289116A1
Автор: Grimm Stephan, JUST Florian, KALIDE Andre, Langner Andreas, LEICH Martin, Schoetz Gerhard, Schwerin Malte, Such Mario, Trommer Martin
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

The invention describes a method for the manufacture of quartz glass that comprises not only doping with rare earth elements and/or transition metals, but also fluorination of the quartz glass. The method described presently allows the diffusion of the dopants during fluorination to be prevented. Moreover, the invention relates to the quartz glass that can be obtained according to the method according to the invention and the use thereof as laser-active quartz glass, for generating light-guiding structures, and in optical applications. 132-. (canceled)33. A method of manufacturing doped quartz glass , comprising: [{'sub': '2', '1) SiOparticles and'}, '2) a component selected from the group consisting of a doping agent and a precursor substance of a doping agent and any mixture thereof, in a liquid;, 'a) providing a dispersion containing'}b) generating a precipitate of at least a part of the doping agent and/or precursor substance of a doping agent in the dispersion;c) reducing the amount of the liquid phase of the dispersion while forming a doped intermediate product;d) treating the doped intermediate product with a gas or a gas mixture that contains one or more gaseous fluorine source(s) while generating a fluorinated intermediate product; ande) sintering the fluorinated intermediate product while forming the doped quartz glass.34. The method of claim 33 , wherein the gaseous fluorine source is selected from the group consisting of organic fluorine-containing gases claim 33 , inorganic fluorine-containing gases and fluorine-containing compounds that are liquid at 25° C. claim 33 , but can be evaporated at process conditions claim 33 , specifically selected from the group consisting of silicon-fluorine compounds claim 33 , fluorocarbons claim 33 , hydrogen fluoride claim 33 , nitrogen fluorides claim 33 , sulphur fluorides claim 33 , metal fluorides claim 33 , fluoro-hydrocarbons claim 33 , and chlorofluorohydrocarbons.35. The method of claim 33 , wherein the ...

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Номер записи: 78
27-08-2020 дата публикации

METHOD FOR PRODUCING HOLLOW POROUS QUARTZ GLASS BASE MATERIAL

Номер: US20200270162A1
Автор: KUWAHARA Hikari, SUMI Kotaro
Принадлежит:

One aspect is a method for producing a hollow porous quartz glass base material, and a method for producing a synthetic quartz glass cylinder, wherein even when the hollow porous quartz glass base material (soot body) is produced in large weight and high bulk density, the ease of target extraction is maintained and target extraction is performed stably, and a large weight soot body can be produced. The method for producing a hollow porous quartz glass base material comprises: preparing a heat resistant substrate, which has a columnar or cylindrical shape and has an outer surface on which SiOparticles are deposited, the outer surface having a surface roughness in which the maximum height Rz is less than 9 μm and the arithmetic average roughness Ra is less than 1 μm; rotating the heat resistant substrate and depositing SiOparticles on the outer surface of the heat resistant substrate to form a glass particulate deposit; and extracting the heat resistant substrate from the glass particulate deposit to produce a hollow porous quartz glass base material. 16-. (canceled)7. A manufacturing method for hollow porous quartz glass preform comprising:{'sub': '2', 'preparing a columnar or cylindrical heat-resistant substrate with surface roughness of the outer surface on which SiOparticles are deposited with maximum height of less than 9 μm and arithmetic mean roughness of less than 1 μm;'}{'sub': '2', 'forming fine glass particle deposits by rotating said heat-resistant substrate and making SiOparticles deposit on the outer surface of said heat-resistant substrate; and'}manufacturing hollow porous quartz glass preform by removing said heat-resistant substrate from said glass particle deposits.8. The manufacturing method for porous quartz glass preform of claim 7 , wherein the heat-resistant substrate maximum height is 6.0 μm or lower and arithmetic mean roughness is 0.6 μm or lower.9. A heat-resistant substrate used in the method of claim 7 , wherein the surface roughness of ...

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Номер записи: 79
27-08-2020 дата публикации

GLASS OR GLASS CERAMIC ARTICLES WITH COPPER-METALLIZED THROUGH HOLES AND PROCESSES FOR MAKING THE SAME

Номер: US20200270163A1
Автор: Okoro Chukwudi Azubuike
Принадлежит:

A process for heating a glass or glass ceramic article with copper-metallized through holes includes heating the article from a first temperature to a second temperature. The first temperature is greater than or equal to 200° C. and less than or equal to 300° C., and the second temperature is greater than or equal to 350° C. and less than or equal to 450° C. An average heating rate during the heating of the article from the first temperature to the second temperature is greater than 0.0° C./min and less than 8.7° C./min. An article includes a glass or glass ceramic substrate having at least one through hole penetrating the substrate in a thickness direction; and copper present in the at least one through hole. The article does not comprise radial cracks. 1. A process comprising:heating a glass or glass ceramic article comprising copper-metallized through holes from a first temperature to a second temperature, wherein the first temperature is greater than or equal to 200° C. and less than or equal to 300° C., and wherein the second temperature is greater than or equal to 350° C. and less than or equal to 450° C.,wherein an average heating rate during the heating of the glass or glass ceramic article comprising copper-metallized through holes from the first temperature to the second temperature is greater than 0.0° C./min and less than 8.7° C./min.2. The process of claim 1 , wherein the heating of the glass or glass ceramic article comprising copper-metallized through holes from the first temperature to the second temperature does not cause radial cracks in the glass or glass ceramic article comprising copper-metallized through holes.3. The process of claim 1 , further comprising heating the glass or glass ceramic article comprising copper-metallized through holes from room temperature to the first temperature.4. The process of claim 3 , wherein an average heating rate during the heating of the glass or glass ceramic article comprising copper-metallized through holes ...

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Номер записи: 80
19-09-2019 дата публикации

Feedstock Gel and Method of Making Glass-Ceramic Articles from the Feedstock Gel

Номер: US20190284083A1
Автор: Cooper Scott P.
Принадлежит:

A method of making a glass-ceramic article includes synthesizing a feedstock gel that includes a base oxide network comprising NaO, CaO, and SiO, in which a molar ratio of NaO:CaO:SiOin the gel is 1:2:3, and then converting the feedstock gel into a glass-ceramic article such as a container or a partially-formed container. The conversion of the feedstock gel into a glass-ceramic container may be performed at a temperature that does not exceed 900° C. and may include the steps of pressing the feedstock gel into a compressed solid green-body, sintering the green-body into a solid monolithic body of a glass-ceramic material, deforming the solid monolithic glass-ceramic body into a glass-ceramic preform, and cooling the preform. A glass-ceramic article having a glass-ceramic material that has a molar ratio of NaO:CaO:SiOthat is 1:2:3 is also disclosed. 1. A method of making a glass-ceramic article , the method comprising:providing a liquid precursor medium that includes a reactive silicon-containing precursor compound;{'sub': 2', '2', '2', '2, 'adding at least one soluble salt to the liquid precursor medium and forming a precipitate from the liquid precursor medium that comprises NaO, CaO, and SiOwith a molar ratio of NaO:CaO:SiObeing 1:2:3; the at least one soluble salt being a soluble sodium salt, a soluble calcium salt, or both a soluble sodium salt and a soluble calcium salt;'}{'sub': 2', '2', '2', '2, 'extracting liquid solvent from the precipitate to produce a feedstock gel having a molar ratio of NaO:CaO:SiOthat is the same as the molar ratio of NaO:CaO:SiOin the precipitate; and'}converting the feedstock gel into a glass-ceramic article at a temperature that does not exceed 900° C.2. The method set forth in claim 1 , wherein the step of providing the liquid precursor medium comprises providing an aqueous solution that includes sodium silicate having a NaO:SiOmolar ratio claim 1 , and wherein the step of adding at least one soluble salt to the liquid precursor ...

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Номер записи: 81
19-10-2017 дата публикации

METHOD FOR THE PRODUCTION OF AN OPTICAL GLASS ELEMENT

Номер: US20170297943A1
Автор: Chouiki Mustapha, KREINDL Gerald
Принадлежит: EV Group E. Thallner GmbH

A method for the production of an optical glass element, with the following process sequence: a) applying a liquid embossing material on an embossing die, b) embossing the embossing material at a temperature of less than 500° C., c) hardening the embossing material, d) sintering the embossing material and thus executing the primary forming of the optical glass element. In addition, an optical glass element that is produced with the method, a device for implementing the method, and a use of this device are disclosed. 114-. (canceled)15. A method for the production of an optical glass element , comprising:a) applying a liquid embossing material on an embossing die,embossing the embossing material at a temperature of less than 500° C.,c) hardening the embossing material,d) sintering the embossing material and thus executing the primary forming of the optical glass element, whereby a reduction of the surface roughness of the optical glass element take place during the sintering, ande) removing gases and/or additives generated before and/or during the sintering such that a final concentration of the gases and/or additives is lower than 100 ppm.16. The method according to claim 15 , wherein the embossing is carried out in step b) at a temperature of less than 400° C.17. The method according to claim 15 , wherein after step a) claim 15 , a degree of coverage of the liquid embossing material on an embossing die surface of the embossing die is more than 20%.18. The method according to claim 15 , wherein the embossing material is applied in the form of multiple small claim 15 , distributed drops on an embossing die surface of the embossing die.19. The method according to claim 15 , wherein the embossing of the embossing material is carried out in step b) by converging said embossing die and a second embossing die.20. The method according to claim 19 , wherein said embossing die is a lower embossing die and the second embossing die is an upper embossing die.21. The method ...

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Номер записи: 82
19-10-2017 дата публикации

METHODS AND GLASS MANUFACTURING SYSTEM FOR IMPACTING COMPACTION IN A GLASS SHEET

Номер: US20170297948A1
Автор: Bowden Bradley Frederick, Rapp Douglas Benjamin
Принадлежит: CORNING INCORPORATED

Methods and a glass manufacturing system are described herein that impact compaction in a glass sheet. For instance, a method is described herein for impacting compaction in a glass sheet made by a glass manufacturing system. In addition, a glass manufacturing system is described herein which manufactures a glass sheet that meets a compaction target. Plus, a method is described herein for maintaining an uniform compaction between glass sheets made by different glass manufacturing systems. 1. A method for impacting compaction in a glass sheet made by a glass manufacturing system , the method comprising a step of:selecting batch materials used to make the glass sheet to control a beta-OH of the glass sheet to meet a compaction target in the glass sheet.2. The method of claim 1 , wherein the selecting step further comprises:{'sub': 2', '3', '2', '3', '2', '3', '2', '3, 'selecting a BOsource for use in the batch materials, wherein the BOsource comprises: (1) a predetermined amount, if any, of a first BOmaterial having a dry physical characteristic which decreases the beta-OH of the glass sheet; and (2) a predetermined amount, if any, of a second BOmaterial having a wet physical characteristic which increases the beta-OH of the glass sheet.'}3. The method of claim 2 , wherein the first BOmaterial is anhydrous boric acid and the second BOmaterial is boric acid.4. The method of claim 1 , wherein the selecting step further comprises:{'sub': 2', '2', '2, 'selecting a SiOsource for use in the batch materials to control the beta-OH of the glass sheet, wherein the SiOsource comprises one or more types of SiO.'}5. The method of claim 1 , wherein the selecting step further comprises:selecting a hydrated mineral for use in the batch materials to control the beta-OH of the glass sheet.6. The method of claim 1 , wherein the selecting step further comprises:adding, removing or changing an amount of a halide to or from the batch materials to control the beta-OH of the glass sheet.7. ...

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Номер записи: 83
20-10-2016 дата публикации

TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD

Номер: US20160306271A1
Автор: Maida Shigeru, Otsuka Hisatoshi
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nmin an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography. 14-. (canceled)5. A titania-doped quartz glass having a surface where EUV light is reflected , the glass being free of concave defects having a volume of at least 30 ,000 nmand an aspect ratio of up to 10 in an effective region of the EUV light-reflecting surface.6. The titania-doped quartz glass of which is free of inclusions.7. An EUV lithographic member comprising the titania-doped quartz glass of .8. The EUV lithographic member of which is an EUV lithographic photomask substrate. This application is a divisional of non-provisional application Ser. No. 13/569,429, filed on Aug. 8, 2012, now U.S. Pat. No. 9,346,700 issued on May 24, 2016, which is based upon and claims priority under 35 U.S.C. §119(a) on Patent Application No. 2011-178758 filed in Japan on Aug. 18, 2011, the entire contents of which are hereby incorporated by reference.This invention relates to titania-doped quartz glass suited for use in the EUV lithography, and a method for manufacturing the glass.The advanced lithography process for the fabrication of semiconductor devices favors a light source of shorter wavelength for exposure. A subsequent transition to lithography using extreme ultraviolet (EUV) is regarded promising.The EUV lithography uses a reflecting optical system. While EUV light has a short wavelength of 13.5 nm, there are available no materials having high transmittance at that wavelength. EUV light is reflected by a Si/Mo multilayer film sputtered on a surface of a substrate of low coefficient of thermal expansion (CTE) material.Fabrication of defect-free ...

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Номер записи: 84
26-10-2017 дата публикации

METHOD FOR FORMING FUNCTIONAL PART IN MINUTE SPACE

Номер: US20170305743A1
Автор: Sekine Shigenobu, Sekine Yurina
Принадлежит: NAPRA CO., LTD.

A method for forming a functional part in a minute space includes the steps of: filling a minute space with a dispersion functional material in which a thermally-meltable functional powder is dispersed in a liquid dispersion medium; evaporating the liquid dispersion medium present in the minute space; and heating the functional powder and hardening it under pressure. 1. A method for preparing a structure comprising a substrate with a functional part , comprising the steps of:providing a substrate having a through-hole or non-through-hole, or stacked substrates having a gap; a liquid dispersion medium; and', 'a thermally-meltable functional powder and a binder powder which are dispersed in the liquid dispersion medium;, 'filling the through-hole, the non-through-hole or the gap with a dispersion functional material consisting ofevaporating and removing the liquid dispersion medium present in the through-hole, the non-through-hole or the gap;heating the functional material to be made into a molten metal; andhardening the molten metal under pressure to obtain a functional part made from the molten metal in the substrate or the stacked substrates such that the through-hole, the non-through-hole or the gap is filled with the functional part.2. The method according to claim 1 , wherein the thermally-meltable functional powder is a mixture of a low-melting metallic powder and a high-melting metallic powder.3. The method according to claim 2 , wherein the high-melting metallic powder is formed in nanoparticles or particles having a nanocomposite structure.4. The method according to claim 2 , wherein the low-melting metallic powder is a metallic powder comprising Sn claim 2 , which is formed in nanoparticles or particles having a nanocomposite structure.5. The method according to claim 2 , wherein the high-melting metallic powder is a metallic powder comprising at least one element selected from the group consisting of Ag claim 2 , Cu claim 2 , Au claim 2 , Pt claim 2 , Ti ...

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Номер записи: 85
03-11-2016 дата публикации

MIRROR BLANK FOR EUV LITHOGRAPHY WITHOUT EXPANSION UNDER EUV RADIATION

Номер: US20160320715A1
Автор: Becker Klaus, Thomas Stephan
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

A substrate for an EUV mirror which contains a zero crossing temperature profile that departs from the statistical distribution is provided. A method for producing a substrate for an EUV mirror is also provided, in which the zero crossing temperature profile in the substrate is adapted to the operating temperature of the mirror. A lithography method using the substrate is also described. 122.-. (canceled)23. A substrate for an EUV mirror , wherein the substrate comprises a surface , wherein the substrate comprises zero crossing temperatures at the surface which depart from a statistical distribution , and wherein the substrate comprises a minimal zero crossing temperature (T) and a maximal zero crossing temperature (T) at the surface which differ from each other by more than 1.5 K.24. The substrate according to claim 23 , wherein the substrate comprises titanium oxide-doped quartz glass.25. The substrate according to claim 23 , wherein the substrate comprises 5% by weight to 12% by weight titanium dioxide relative to a total weight of the substrate.26. The substrate according to claim 23 , wherein the substrate comprises multiple layers.27. The substrate according to claim 23 , wherein the substrate comprises a zero crossing temperature Tin regions far from an edge and a zero crossing temperature Tat the edge claim 23 , wherein Tis at least 1.5° C. higher than T.28. The substrate according to claim 23 , wherein the difference between Tand Tis at least 2 K.29. The substrate according to claim 28 , wherein the difference between Tand Tis in a range of from 2 to 10 K.30. The substrate according to claim 23 , wherein the distribution of the zero crossing temperatures at the surface has at least one local peak.31. The substrate according to claim 23 , wherein the distribution of the zero crossing temperature comprises claim 23 , at least partly claim 23 , an essentially steady profile.32. A method for producing a substrate for an EUV mirror claim 23 , comprising the ...

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Номер записи: 86
17-11-2016 дата публикации

METHOD FOR MANUFACTURING COMPOSITE POROUS FILM FOR FLUID SEPARATION

Номер: US20160332122A1
Автор: KOJIMA Osamu, Sakamoto Kazuyuki, Yamaguchi Osamu
Принадлежит:

A method for manufacturing a composite porous film for fluid separation is provided. In such method, a coating film of a silica precursor is formed at least on one side of a microporous film including a fluoropolymer resin, and then applying at least one of treatment selected from heat treatment and steam treatment to convert the silica precursor into a SiOglass, and thus a SiOglass layer is formed at least on one side of the microporous film, and a composite porous film coated with the SiOglass is obtained. The composite porous film has both a sufficient chemical resistance and strength allowing suppression of heat deflection under a liquid at a high temperature. 1. A method for manufacturing a composite porous film for fluid separation , wherein a coating film of a silica precursor is formed at least on one side of a microporous film including a fluoropolymer resin , and then applying at least one of treatment selected from heat treatment and steam treatment to convert the silica precursor into a SiOglass , and thus a SiOglass layer is formed at least on one side of the microporous film , and a composite porous film coated with the SiOglass is obtained.2. The method for manufacturing the composite porous film for fluid separation according to claim 1 , wherein the silica precursor is at least one kind selected from polysilazane and organic silazane. This is a divisional application of and claims the priority benefit of U.S. application Ser. No. 13/698,979, filed on Nov. 19, 2012. The prior application Ser. No. 13/698,979 is a 371 application of the international PCT application serial no. PCT/JP2011/063884, filed on Jun. 17, 2011, which claims the priority benefit of Japan application no. 2010-139688, filed on Jun. 18, 2010. The entirety of each of the above-mentioned patent applications is hereby incorporated by reference herein and made a part of this specification.The present invention relates to a composite porous film for fluid separation. More specifically, ...

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Номер записи: 87
30-11-2017 дата публикации

PROCESS FOR PRODUCING SYNTHETIC QUARTZ GLASS USING A CLEANING DEVICE

Номер: US20170341967A1
Автор: Badeke Klaus-Uwe, Laudahn Hilmar, Trommer Martin
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resulting from step (a) through a cleaning device to purify the production material vapor, (c) supplying the purified production material vapor resulting from step (b) to a reaction zone in which the purified production material vapor is converted to SiOparticles through oxidation and/or through hydrolysis, (d) depositing the SiOparticles resulting from step (c) on a deposition surface, and optionally drying and vitrifying the deposited SiOparticles resulting from step (d) to form synthetic quartz glass. The cleaning device includes a bulk of porous silica particles which have a BET specific surface area of at least 2 m/g. A device for carrying out the method is also provided. 115-. (canceled)16. Method for the production of synthetic quartz glass , comprising the following process steps:(a) evaporating a production material containing at least one polymerizable polyalkylsiloxane compound while forming a production material vapor;(b) passing the production material vapor resulting from process step (a) through at least one cleaning device to purify the production material vapor;{'sub': '2', '(c) supplying the purified production material vapor resulting from process step (b) to a reaction zone in which the purified production material vapor is converted to SiOparticles through oxidation and/or through hydrolysis;'}{'sub': '2', '(d) depositing the SiOparticles resulting from process step (c) on a deposition surface; and'}{'sub': '2', '(e) optionally, drying and vitrifying the deposited SiOparticles resulting from process step (d) to form synthetic quartz glass,'}{'sup': '2', 'wherein the at least one cleaning device of process step (b) comprises a bulk of porous silica ...

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Номер записи: 88
31-10-2019 дата публикации

CONTINUOUS SOL-GEL PROCESS FOR PRODUCING SILICATE-CONTAINING GLASSES OR GLASS CERAMICS

Номер: US20190330098A1
Автор: Czermak Georg, Gabl Christian, Gander Matthias, Howell Roy Layne, Lipp Christian, Stepanik Nina, Streiter Christina
Принадлежит:

A continuous sol-gel process for producing silicate-containing glasses and glass ceramics is proposed, comprising the following steps:

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Номер записи: 89
21-12-2017 дата публикации

METHOD OF MAKING HALOGEN DOPED OPTICAL ELEMENT

Номер: US20170362115A1
Автор: Dawes Steven Bruce, Jennings Douglas Hull, Tandon Pushkar
Принадлежит:

A method of forming an optical element is provided. The method includes producing silica-based soot particles using chemical vapor deposition, the silica-based soot particles having an average particle size of between about 0.05 μm and about 0.25 μm. The method also includes forming a soot compact from the silica-based soot particles and doping the soot compact with a halogen in a closed system by contacting the silica-based soot compact with a halogencontaining gas in the closed system at a temperature of less than about 1200° C. 1. A method of forming an optical element , the method comprising:producing silica-based soot particles using chemical vapor deposition, the silica-based soot particles having an average particle size of between about 0.05 μm and about 0.25 μm;forming a soot compact from the silica-based soot particles; anddoping the soot compact with a halogen in a closed system by contacting the silica-based soot compact with a halogen-containing gas in the closed system at a temperature of less than about 1200° C.2. The method of claim 1 , wherein forming a soot compact comprises depositing the silica-based soot particles onto a bait rod.3. The method of claim 1 , wherein forming a soot compact comprises pressing the silica-based soot particles at a pressure of between about 100 psi and about 1000 psi.4. The method of claim 3 , wherein pressing the silica-based soot particles comprises axially pressing the silica-based soot particles to form a disc shaped soot compact.5. The method of claim 1 , further comprising maintaining a predetermined halogen-containing gas composition in the closed system.6. The method of claim 5 , wherein maintaining a predetermined halogen-containing gas composition in the closed system comprises bleeding halogen-containing gas into the closed system.7. The method of claim 1 , wherein doping the soot compact comprises maintaining a halogen composition in the closed system of greater than about 90% of the total gas composition ...

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Номер записи: 90
31-12-2015 дата публикации

Method for producing titanium-doped synthetic quartz glass

Номер: US20150376047A1
Автор: Heinz Fabian, Stephan Thomas
Принадлежит: Heraeus Quarzglas GmbH and Co KG

A method for producing titanium-doped synthetic quartz glass includes: (A) providing a liquid SiO 2 feedstock material that comprises more than 60% by weight of the polyalkylsiloxane D4; (B) evaporating the liquid SiO 2 feedstock material to produce a gaseous SiO 2 feedstock vapor; (C) evaporating a liquid TiO2 feedstock material to produce a gaseous TiO2 feedstock vapor; (D) converting the SiO 2 feedstock vapor and the TiO2 feedstock vapor into SiO2 particles and TiO2 particles, respectively; (E) depositing the SiO2 particles and the TiO2 particles on a deposition surface while forming a titanium-doped SiO 2 soot body; (F) vitrifying the titanium-doped SiO 2 soot body while forming the synthetic quartz glass, whereby the TiO2 concentration of the synthetic quartz glass is between 5% by weight and 11% by weight. The liquid SiO 2 feedstock material comprises at least one additional component made of the polyalkylsiloxane D3 having a weight fraction of mD3 and one additional component made of the polyalkylsiloxane D5 having a weight fraction of mD5 at a weight ratio of mD3/mD5 in a range of 0.01 to 1, and the liquid SiO 2 feedstock material provided is evaporated while maintaining the weight ratio of mD3/mD5 and at least 99% by weight thereof are evaporated to form the gaseous SiO 2 feedstock vapor.

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Номер записи: 91
31-12-2015 дата публикации

BLANK MADE OF TITANIUM-DOPED SILICA GLASS AND METHOD FOR THE PRODUCTION THEREOF

Номер: US20150376048A1
Автор: Becker Klaus, Ochs Stefan, Thomas Stephan
Принадлежит:

A blank made of titanium-doped silica glass for a mirror substrate for use in EUV lithography is provided. The blank includes a surface portion to be provided with a reflective film and having an optically used area (CA) over which a coefficient of thermal expansion (CTE) has a two-dimensional inhomogeneity (dCTE) distribution profile averaged over a thickness of the blank. A maximum inhomogeneity (dCTE) of less than 5 ppb/K is defined as a difference between a CTE maximum value and a CTE minimum value. The dCTEis at least 0.5 ppb/K. The CA forms a non-circular area having a centroid. The dCTE distribution profile is not rotation-symmetrical and is defined over the CA, such that straight profile sections normalized to a unit length and extending through the centroid of the area yield a dCTE family of curves forming a curve band with a bandwidth of less than 0.5×dCTE. 1. A blank made of titanium-doped silica glass for a mirror substrate for use in EUV lithography , the blank comprising a surface portion configured to be provided with a reflective film and having an optically used area (CA) over which a coefficient of thermal expansion (CTE) has a two-dimensional inhomogeneity (dCTE) distribution profile averaged over a thickness of the blank , a maximum inhomogeneity (dCTE) of less than 5 ppb/K being defined as a difference between a CTE maximum value and a CTE minimum value ,{'sub': 'max', 'wherein the dCTEis at least 0.5 ppb/K,'}wherein the CA forms a non-circular area having a centroid,{'sub': 'max', 'wherein the dCTE distribution profile is not rotation-symmetrical and is defined over the CA such that straight profile sections normalized to a unit length and extending through the centroid of the non-circular area yield a dCTE family of curves forming a curve band with a bandwidth of less than 0.5×dCTE.'}2. The blank according to claim 1 , wherein the bandwidth is less than 0.3×dCTE.3. The blank according to claim 1 , wherein the dCTE distribution profile ...

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Номер записи: 92
31-12-2015 дата публикации

BLANK OF TIO2-SIO2 GLASS FOR A MIRROR SUBSTRATE FOR USE IN EUV LITHOGRAPHY AND METHOD FOR THE PRODUCTION THEREOF

Номер: US20150376049A1
Автор: Becker Klaus, Ochs Stefan, Thomas Stephan
Принадлежит:

A blank of TiO—SiOglass for a mirror substrate for use in EUV lithography has a low need for adaptation to optimize the progression of the coefficient of thermal expansion, and consequently also the progression of the zero crossing temperature T. The TiO—SiOglass has at a mean value of the fictive temperature Tin the range between 920° C. and 970° C. a dependence expressed as the differential quotient dT/dTof its zero crossing temperature Ton the fictive temperature Tof less than 0.3. 110.-. (canceled)11. A blank comprising TiO—SiOglass for a mirror substrate for use in EUV lithography , wherein the TiO—SiOglass has a differential quotient dT/dTof the dependence of its zero crossing temperature Ton the fictive temperature Tof less than 0.3 at a mean value of Tin a range between 920° C. and 970° C.12. The blank according to claim 11 , wherein the differential quotient dT/dTis less than 0.25.13. The blank according to claim 11 , wherein the TiO—SiOglass has a mean hydroxyl group content in the range of 200-300 wt. ppm.14. The blank according to claim 11 , wherein the TiO—SiOglass has a mean hydrogen concentration of less than 5×10molecules/cm.15. The blank according to claim 11 , wherein the blank has an upper side and a bottom side claim 11 , and wherein the TiO—SiOglass between the upper side and the bottom side has an inhomogeneous titanium oxide concentration profile.16. The blank according to claim 15 , wherein the blank is a composite body comprising a first shaped body comprising TiO—SiOglass having a first titanium oxide concentration and a second shaped body comprising TiO—SiOglass having a second titanium oxide concentration that is connected to the first shaped body.17. The blank according to claim 16 , wherein the first shaped body has a first mean fictive temperature and the second shaped body has a second mean fictive temperature claim 16 , and wherein the first and the second fictive temperatures are different.18. The blank according to claim 15 , ...

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Номер записи: 93
28-12-2017 дата публикации

RARE EARTH METAL-DOPED QUARTZ GLASS AND METHOD FOR PRODUCING THE SAME

Номер: US20170369359A1
Автор: BAIERL Hardy, DELLITH Jan, Grimm Stephan, Kayser Thomas, Langner Andreas, LEHMANN Walter, Schoetz Gerhard, Schuster Kay
Принадлежит:

A method for producing rare earth metal-doped quartz glass includes the steps of (a) providing a blank of the rare earth metal-doped quartz glass, and (b) homogenizing the blank by softening the blank zone by zone in a heating zone and by twisting the softened zone along a rotation axis. Some rare earth metals, however, show a discoloration of the quartz glass, which hints at an unforeseeable and undesired change in the chemical composition or possibly at an inhomogeneous distribution of the dopants. To avoid this drawback and to provide a modified method which ensures the production of rare earth metal-doped quartz glass with reproducible properties, during homogenization according to method step (b), the blank is softened under the action of an oxidizingly acting or a neutral plasma. 1. Method for producing rare earth metal-doped quartz glass , the method comprising the steps of:(a) providing a blank of the rare earth metal-doped quartz glass; and 'wherein during homogenization according to method step (b), the blank is softened under the action of an oxidizingly acting or neutral plasma.', '(b) homogenizing the blank by softening the blank zone by zone in a heating zone and by twisting the softened zone along a rotation axis,'}2. Method according to claim 1 , wherein an oxygen-containing gas is supplied to the plasma.3. Method according to claim 1 , wherein a microwave atmospheric pressure plasma or an inductively coupled plasma is generated.4. Method according to claim 1 , wherein a plasma gas which is free of hydrogen or hydrogenous compounds is supplied to the plasma.5. Method according to claim 1 , wherein the homogenization of the blank includes two homogenization steps in which the blank is twisted in two directions that are perpendicular to each other.6. Method according to claim 1 , wherein a rare earth metal-doped quartz glass is generated that contains rare earth metal oxide in a concentration of 0.002 to 10 mole % and has a fluctuation in the ...

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Номер записи: 94
27-12-2018 дата публикации

AMMONIA TREATMENT OF SILICON DIOXIDE POWDER IN THE PREPARATION OF QUARTZ GLASS

Номер: US20180370838A1
Автор: Gromann Boris, Hünermann Michael, Kayser Thomas, KPEBANE Abdoul-Gafar, LEHMANN Walter, NIELSEN Nils Christian, Otter Matthias, Whippey Nigel Robert
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG

One aspect relates to a process for the preparation of a quartz glass body, including provision of a silicon dioxide granulate, making a glass melt from the silicon dioxide granulate and making a quartz glass body from at least part of the glass melt. The provision includes making a silicon dioxide powder with at least two particles prepared from a silicon-chlorine compound, bringing the silicon dioxide powder into contact with ammonia to obtain a treated silicon dioxide powder, and granulating the treated silicon dioxide powder to obtain a silicon dioxide granulate. The chlorine content of the silicon dioxide powder is greater than the chlorine content of the silicon dioxide granulate. One aspect relates further to a quartz glass body which is obtainable by this process. One aspect also relates to a process for the preparation of a silicon dioxide granulate. 122-. (canceled)23. A process for the preparation of a quartz glass body comprising: making a silicon dioxide powder with a chlorine content woo based on the total weight of the silicon dioxide powder;', 'wherein the silicon dioxide powder comprises at least two particles,', 'wherein the silicon dioxide powder was prepared from a silicon-chlorine compound;', 'bringing the silicon dioxide powder into contact with ammonia to obtain a treated silicon dioxide powder; and', {'sub': 'Cl(2)', 'granulating the treated silicon dioxide powder to obtain a silicon dioxide granulate with a chlorine content w;'}], 'providing a pyrogenic silicon dioxide granulate, wherein the provision comprisesmaking a glass melt from the silicon dioxide granulate in an oven; andmaking a quartz glass body from at least a part of the glass melt;{'sub': 'Cl(2)', 'wherein the chlorine content wow of the silicon dioxide powder from making a silicon dioxide powder is greater than the chlorine content wof the silicon dioxide granulate from granulating the treated silicon dioxide powder.'}24. The process according to claim 23 , wherein the ammonia ...

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Номер записи: 95
09-11-2006 дата публикации

Quartz glass blank for an optical component for transmitting extremely short-wave ultraviolet radiation

Номер: DE102004024808B4
Автор: Bodo KÜHN, Bruno Dr. Uebbing, Rainer Dr. Köppler, Ralf Dr. Takke, Wolfgang Dr. Englisch
Принадлежит: Heraeus Quarzglas GmbH and Co KG

Quarzglasrohling für ein optisches Bauteil zur Übertragung von Strahlung einer Wellenlänge von 15 nm und kürzer aus einem hochreinen, mit Titan und/oder Fluor dotiertem Quarzglas, das durch folgende Merkmale gekennzeichnet ist: a) Mikroinhomogenitäten durch lokale Varianz der TiO 2 -Verteilung von weniger als 0,05% TiO 2 , gemittelt über ein Volumenelement von (5μm) 3 gegenüber dem Mittelwert des TiO 2 -Gehalts im Quarzglasrohling, b) eine absolute, maximale Inhomogenität im thermischen Ausdehnungskoeffizienten Δα in Hauptfunktionsrichtung auf der optischen genutzten Fläche CA des Quarzglasrohlings von weniger als 5 ppb/K, c) ein Verlauf des nach (b) gemittelten Δα auf der optischen Fläche, der sich im wesentlichen durch die Formel (1) beschreiben läßt: und dessen Restinhomogenität der thermischen Ausdehnung nach Abzug von (1) nicht mehr als 0,5 ppb/K beträgt, wobei C 0 α ≤ 5ppb/K; d) eine radiale Varianz des thermischen Ausdehnungskoeffizienten über die nutzbare Fläche des Quarzglasrohlings von maximal 0,4 ppb/(K·cm) und e) eine Spannungsdoppelbrechung (SDB) bei... Quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter from a high-purity, titanium and / or fluorine-doped quartz glass, characterized by the following features: a) microinhomogeneities due to local variance of the TiO 2 distribution of less than 0.05% TiO 2 , averaged over a volume element of (5 μm) 3 with respect to the mean value of the TiO 2 content in the quartz glass blank, b) an absolute, maximum inhomogeneity in the coefficient of thermal expansion Δα in the main operating direction on the optical surface CA of the quartz glass blank of less than 5 ppb / K, c) a profile of the Δα averaged on the optical surface according to (b), which can be essentially described by the formula (1): and its residual inhomogeneity of thermal expansion after deduction of (1) is not more than 0.5 ppb / K, wherein C 0 α ≤ 5ppb / K; d) a radial variance of the ...

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Номер записи: 96
19-02-2015 дата публикации

Method for producing titanium-doped silica glass for use in euv lithography and blank produced in accordance therewith

Номер: WO2015022152A1
Автор: Klaus Becker, Stefan Ochs, Stephan Thomas
Принадлежит: HERAEUS QUARZGLAS GMBH & CO. KG, SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

The Ti 3+ ions present in Ti-doped silica glass cause a brown staining of the glass, as a result of which an inspection of the lens becomes more difficult. It is known to ensure the reduction of Ti 3+ ions in favor of Ti 4+ ions in Ti-doped silica glass either by way of a sufficiently high proportion of OH-groups, which causes an internal oxidation with out-diffusion of hydrogen, or in the event of a low proportion of OH-groups, by carrying out an oxygen treatment prior to vitrification, which requires a high treatment temperature and special corrosion-resistant furnaces, and is therefore expensive. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, based on the flame hydrolytic soot deposition method, it is proposed according to the invention that prior to vitrification, to subject the TiO 2 - SiO 2 soot body to a conditioning treatment, which comprises a treatment with a nitrogen oxide. The blank produced in this way from Ti-doped silica glass is characterized in that the ratio is Ti 3+ /Ti 4+ ≤ 5 x 10 -4 .

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Номер записи: 97
14-03-2012 дата публикации

Low expansivity, high transmission titania doped silica glass

Номер: EP2428488A1
Автор: Carlos Duran, Kenneth Edward Hrdina, Michael A Mueller
Принадлежит: Corning Inc

In one embodiment the present disclosure is directed to a silica-titania glass with an internal transmission of > 90%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the internal transmission is >93%/cm at wavelengths from 340 nm to 840 nm. In a further embodiment the internal transmission is > 95%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the disclosure is directed to a silica-titania glass with an overall transmission through an optic made of the glass is > 84% at wavelengths from 340 nm to 840 nm. In another embodiment overall transmission through an optic made of the glass is >86% at wavelengths from 340 nm to 840 nm. In a further embodiment the overall transmission through an optic made of the glass is > 88% at wavelengths from 330 nm to 840 nm. In a further embodiment the silica-titania glass has a Ti +3 concentration level [Ti 3+ ] less than 3 ppm by weight.

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Номер записи: 98
21-10-2004 дата публикации

Silica glass containing tio2 and process for its production

Номер: WO2004089836A1
Автор: Akio Koike, Yasutomi Iwahashi
Принадлежит: ASAHI GLASS COMPANY LIMITED

A silica glass containing TiO2, which has a fictive temperature of at most 1, 200 C, a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0 ± 200 ppb/°c from 0 to 100°c. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

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Номер записи: 99
12-01-2006 дата публикации

Silica glass containing tio2 and process for its production

Номер: WO2006004169A1
Автор: Akio Koike, Shinya Kikugawa, Yasutomi Iwahashi, Yasuyuki Takimoto
Принадлежит: Asahi Glass Company, Limited

It is to provide a silica glass containing TiO2, having a wide temperature range where wherein the coefficient of thermal expansion becomes is substantially zero. A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass%, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200°C, a coefficient of thermal expansion from 0 to 100°C of 0±150 ppb/°C , and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.

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Номер записи: 100