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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 15894. Отображено 100.
01-03-2012 дата публикации

Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process

Номер: US20120052441A1
Автор: Masayoshi Sagehashi, Takeru Watanabe, Tomohiro Kobayashi
Принадлежит: Shin Etsu Chemical Co Ltd

An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a pattern profile with advantages including high resolution, rectangular shape, and minimized dark-bright difference.

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Номер записи: 1
22-03-2012 дата публикации

Resin, resist composition and method for producing resist pattern

Номер: US20120070778A1
Автор: Koji Ichikawa, Masahiko Shimada, Takashi Nishimura
Принадлежит: Sumitomo Chemical Co Ltd

A resin having a structural unit derived from a compound represented by the following formula (I), wherein R 1 , A 1 and ring X 1 are as defined in the instant specification:

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Номер записи: 2
03-05-2012 дата публикации

Pattern forming process

Номер: US20120108043A1
Автор: Jun Hatakeyama, Kenji Funatsu
Принадлежит: Shin Etsu Chemical Co Ltd

A resist pattern is formed by coating a first positive resist composition comprising a polymer comprising 20-100 mol % of aromatic group-containing recurring units and adapted to turn alkali soluble under the action of an acid onto a substrate to form a first resist film, coating a second positive resist composition comprising a C 3 -C 8 alkyl alcohol solvent which does not dissolve the first resist film on the first resist film to form a second resist film, exposing, baking, and developing the first and second resist films simultaneously with a developer.

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Номер записи: 3
03-05-2012 дата публикации

Disubstituted-aminodifluorosulfinium salts, process for preparing same and method of use as deoxofluorination reagents

Номер: US20120108801A1
Автор: Alexandre L'heureux, Michel A. Couturier
Принадлежит: OMEGACHEM INC

The invention relates to disubstituted-aminodifluorosulfinium salts represented by the formula (I). Processes for preparing same and methods of use as deoxofluorinating reagent is also provided.

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Номер записи: 4
24-05-2012 дата публикации

Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method

Номер: US20120129103A1
Автор: Jun Hatakeyama, Masaki Ohashi, Seiichiro Tachibana, Youichi Ohsawa
Принадлежит: Shin Etsu Chemical Co Ltd

A sulfonium salt having a 4-fluorophenyl group is introduced as recurring units into a polymer comprising hydroxyphenyl (meth)acrylate units and acid labile group-containing (meth)acrylate units to form a polymer which is useful as a base resin in a resist composition. The resist composition has a high sensitivity, high resolution and minimized LER.

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Номер записи: 5
28-06-2012 дата публикации

Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern

Номер: US20120164576A1
Автор: Dai Oguro, Hiromi Hayashi, Masatoshi Echigo
Принадлежит: Mitsubishi Gas Chemical Co Inc

A cyclic compound represented by formula (1): wherein L, R 1 , R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

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Номер записи: 6
05-07-2012 дата публикации

Durable Antimicrobial Composition

Номер: US20120171155A1
Автор: Corey T. Cunningham, David W. Koenig, Douglas R. Hoffman, Rebecca Ann Vongsa, Stacy A. Mundschau
Принадлежит: Kimberly Clark Worldwide Inc

The present invention relates to compositions having durable antimicrobial activity. The compositions include a carbonate/bicarbonate salt of a quaternary ammonium cation, an organic acid, hydrogen peroxide and a polymer. The polymer is selected from cationic amine polymer-epichlorohydrin adduct, cationic amine polymer-epichlorohydrin resin, poly(methacrylamidopropyltrimethylammonium)chloride, poly(bis(2-chloroethyl)ether-alt-1,3-bis(dimethylamino)propyl)urea, poly(diallyldimethylammonium)chloride, poly(t-butyl acrylate co-ethyl acrylate co-methacrylic acid), polyethylene oxide, polyquaternium-16, polyquaternium-22, polyquaternium-67 and mixtures thereof.

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Номер записи: 7
19-07-2012 дата публикации

Colored curable composition, color filter, and method for producing color filter

Номер: US20120182638A1
Автор: Hideki Takakuwa
Принадлежит: Fujifilm Corp

A colored curable composition for a solid-state image sensor comprises a polyhalogenated zinc phthalocyanine pigment, and a compound having at least a structure represented by the following Formula (A). In Formula (A), X 1 , X 2 , X 3 , X 4 , X 5 , and X 6 each independently represent a substituent selected from —OH, —OR, or —NHCOCH═CH 2 , R represents a monovalent organic group. When the compound is an oligomer, the oligomer has a configuration in which at least one of X 1 , X 2 , X 3 , X 4 , X 5 , and X 6 in a structure represented by Formula (A) is eliminated to form a single bond, which is then linked, via —O—, to another structure represented by Formula (A).

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Номер записи: 8
02-08-2012 дата публикации

Resist pattern forming process

Номер: US20120196211A1
Автор: Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe, Takeru Watanabe
Принадлежит: Shin Etsu Chemical Co Ltd

A resist pattern is formed by coating a chemically amplified positive resist composition onto a substrate and prebaking to form a resist film, exposing to high-energy radiation, baking and developing with a developer to form a resist pattern, and heating the pattern for profile correction to such an extent that the line width may not undergo a change of at least 10%. An amount of a softening accelerator having a molecular weight of up to 800 is added to the resist composition comprising (A) a base resin, (B) an acid generator, (C) a nitrogen-containing compound, and (D) an organic solvent.

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Номер записи: 9
02-08-2012 дата публикации

Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound

Номер: US20120196227A1
Автор: Jun Hatakeyama, Katsuya Takemura, Takeru Watanabe, Tomohiro Kobayashi
Принадлежит: Shin Etsu Chemical Co Ltd

A chemically amplified positive resist composition comprises an acid-decomposable keto ester compound of steroid skeleton which is insoluble in alkaline developer, but turns soluble in alkaline developer under the action of acid. The composition is exposed to EB, deep-UV or EUV and developed to form a pattern with a high resolution and improved LER.

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Номер записи: 10
23-08-2012 дата публикации

Plant biochemical systems and uses thereof

Номер: US20120214239A1
Автор: Katherine Warpeha, Lon Kaufman
Принадлежит: University of Illinois

Plants and plant cells including an isolated nucleic acid encoding for prephenate dehydratase, wherein the nucleic acid is operably linked to a promoter such that prephenate dehydratase is expressed at sufficient levels to protect the plant cell from damage from an abiotic or biotic stressor. The abiotic or biotic stressor may include UV radiation, cold, drought, heat, salt, hormones, fungi, bacteria, arthropods, worms and products of biotic organisms.

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Номер записи: 11
13-09-2012 дата публикации

Salt, resist composition and method for producing resist pattern

Номер: US20120231392A1
Автор: Koji Ichikawa, Satoshi Yamaguchi
Принадлежит: Sumitomo Chemical Co Ltd

A salt represented by the formula (I) and a resist composition containing the salt are provided, wherein Q 1 , Q 2 , L 1 , ring W 1 , R e1 , R e2 , R e3 , R e4 , R e5 , R e6 , R e7 , R e8 , R e9 , R e10 , R e11 , R e12 , R e13 and Z are defined in the specification.

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Номер записи: 12
27-09-2012 дата публикации

Photoresist resin composition and method of forming patterns by using the same

Номер: US20120244471A1
Автор: Jeong Won KIM, Jin Ho JU, Jong Kwang Lee, Min Kang, Tae Gyun Kim
Принадлежит: Samsung Display Co Ltd

A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.

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Номер записи: 13
18-10-2012 дата публикации

Patterning process and photoresist with a photodegradable base

Номер: US20120264057A1
Автор: Burn Jen Lin, Chien-Wei Wang, Ching-Yu Chang, Tsai-Sheng Gau
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

A resist material and methods using the resist material are disclosed herein. An exemplary method includes forming a resist layer over a substrate, wherein the resist layer includes a polymer, a photoacid generator, an electron acceptor, and a photodegradable base; performing an exposure process that exposes portions of the resist layer with radiation, wherein the photodegradable base is depleted in the exposed portions of the resist layer during the exposure process; and performing an developing process on the resist layer.

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Номер записи: 14
18-10-2012 дата публикации

Resist composition and method for producing resist pattern

Номер: US20120264059A1
Автор: Koji Ichikawa, Takahiro YASUE, Tatsuro MASUYAMA
Принадлежит: Sumitomo Chemical Co Ltd

A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R 1 and R 2 in each occurrence independently represent a C 1 to C 12 hydrocarbon group, a C 1 to C 6 alkoxyl group, a C 2 to C 7 acyl group, a C 2 to C 7 acyloxy group, a C 2 to C 7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.

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Номер записи: 15
22-11-2012 дата публикации

Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition

Номер: US20120292286A1
Автор: Hideyoshi Yanagisawa, Yoshinori Hirano
Принадлежит: Shin Etsu Chemical Co Ltd

A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.

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Номер записи: 16
06-12-2012 дата публикации

Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process

Номер: US20120308920A1
Автор: Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe
Принадлежит: Shin Etsu Chemical Co Ltd

There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.

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Номер записи: 17
13-12-2012 дата публикации

Plant disease controlling composition and method for controlling plant disease

Номер: US20120316206A1
Автор: Atsushi Iwata, Mayuko Ozawa, So Kiguchi, Soichi Tanaka
Принадлежит: Sumitomo Chemical Co Ltd

The present invention provides a composition having an excellent controlling activity on plant disease. The composition comprising the compound represented by the formula (1) and one or more carbamate fungicidal compound selected from the group (A) shows an excellent controlling activity on a plant disease. group (A): a group consisting of benthiavalicarb, iprovalicarb, propamocarb, and metam

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Номер записи: 18
03-01-2013 дата публикации

Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same

Номер: US20130001751A1
Автор: Naoki Inoue
Принадлежит: Fujifilm Corp

An actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) which includes a repeating unit (A) having an ionic structural moiety which generates an acid anion by being decomposed due to irradiation with actinic rays or radiation, a repeating unit (B) having a proton acceptor moiety, and a repeating unit (C) having a group which generates an alkali soluble group by being decomposed by the action of an acid, and the resin (P) has at least one repeating unit which is represented by the general formulae (I) to (III) below as the repeating unit (A) (the reference numerals in the general formulae represent the meaning of the description in the scope of the claims and the specifications).

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Номер записи: 19
03-01-2013 дата публикации

Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom

Номер: US20130005997A1
Автор: Koji Hasegawa, Masaki Ohashi, Masayoshi Sagehashi, Takeru Watanabe, Youichi Ohsawa
Принадлежит: Shin Etsu Chemical Co Ltd

A 2,2-bis(fluoroalkyl)oxirane (A) is prepared by reacting a fluorinated alcohol (1) with a chlorinating, brominating or sulfonylating agent under basic conditions to form an oxirane precursor (2) and subjecting the oxirane precursor to ring closure under basic conditions. R 1 and R 2 are fluoroalkyl groups, R 3 and R 4 are hydrogen or monovalent hydrocarbon groups, X is chlorine, bromine or —OSO 2 R 5 group, and R 5 is alkyl or aryl.

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Номер записи: 20
10-01-2013 дата публикации

Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns

Номер: US20130011783A1
Автор: Jong Keun Park, Matthias S. Ober, Seung-Hyun Lee, Yi Liu, Young Cheol Bae
Принадлежит: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC

Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

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Номер записи: 21
24-01-2013 дата публикации

Resist composition and method for producing resist pattern

Номер: US20130022924A1
Автор: Koji Ichikawa, Takahiro YASUE
Принадлежит: Sumitomo Chemical Co Ltd

A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R 1 , A 1 , A 13 , A 14 , X 12 , R 3 , R 4 , m′ and n′ are defined in the specification.

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Номер записи: 22
24-01-2013 дата публикации

Radiation-sensitive resin composition

Номер: US20130022926A1
Автор: Akimasa Soyano, Hiroshi Tomioka, Noboru Otsuka
Принадлежит: JSR Corp

A radiation-sensitive resin composition includes a polymer and a photoacid generator. The polymer includes a first structural unit shown by a formula (a1), a second structural unit shown by a formula (a2), and a third structural unit having a lactone structure. A content of the first structural unit in the polymer being 50 mol % or more based on total structural units included in the polymer. The first structural unit is preferably a structural unit shown by a formula (a1-1).

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Номер записи: 23
24-01-2013 дата публикации

Resist composition and method for producing resist pattern

Номер: US20130022928A1
Автор: Koji Ichikawa, Satoshi Yamaguchi, Yuki Suzuki
Принадлежит: Sumitomo Chemical Co Ltd

A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator having an acid labile group, wherein R 1 , A 1 , A 13 , A 14 , X 12 are defined in the specification.

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Номер записи: 24
14-03-2013 дата публикации

Positive resist composition and patterning process

Номер: US20130065179A1
Автор: Kazunori Maeda, Ryosuke Taniguchi, Seiichiro Tachibana
Принадлежит: Shin Etsu Chemical Co Ltd

There is disclosed a positive resist composition comprising (A) a specific resin (B) a photo acid generator, (C) a basic compound, and (D) a solvent. There can be a positive resist composition having, in a photolithography using a high energy beam such as an ArF excimer laser beam as a light source, an excellent resolution, especially excellent depth of focus (DOF) characteristics with an excellent pattern profile, and in addition, in formation of a contact hole pattern, giving a pattern having excellent circularity and high rectangularity; and a patterning process using this positive resist composition.

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Номер записи: 25
21-03-2013 дата публикации

METHODS EMPLOYING ANHYDROUS DISINFECTANT

Номер: US20130071461A1
Автор: Gumienny, Jonte Dolana, JR. Richard, Krall Michael L.
Принадлежит: Pure Bioscience

Use of dried compositions of silver dihydrogen citrate along with citric acid in antimicrobial amounts directly as disinfectants is described. 1. A method to provide antimicrobial protection to a surface or to a formulation , which method comprises applying to said surface or including in said formulation an antimicrobially effective amount of an anhydrous composition of silver dihydrogen citrate (SDC) and citric acid without reconstitution of said composition in solvent.2. The method of wherein said formulation is selected from the group consisting of plastics; fiberglass materials; woven or nonwoven fabrics; polymers; vinyls; paint; latex; architectural finishes; caulks; conforming sealants; hardening foams; paper/cardboard packaging; coatings for packaging; cementitious coatings; drywall; drywall finishing compounds; plaster; tile; and tile grout; andthe surface is selected from the group consisting of the surfaces of plant; ornamental and cut flowers; carpeting; wounds; bandages; and upholstery.3. The method of wherein the citric acid in said anhydrous composition is in molar excess of the SDC.4. The method of wherein said anhydrous composition is incorporated into the manufacture of the formulation.5. The method of wherein the citric acid in said anhydrous composition or formulation is in molar excess of the SDC.6. The method of wherein the formulation is selected from the group consisting of plastics; fiberglass materials; woven or nonwoven fabrics; polymers; vinyls; paint; latex; architectural finishes; caulks; conforming sealants; hardening foams; paper/cardboard packaging or coating therefor; cementitious coating; drywall; drywall finishing compounds; plaster; tile; and tile grout.7. A method to prepare an emulsion or lotion which method comprises providing non-aqueous components of said lotion or emulsion or said lotion or emulsion itself with an antimicrobially effective amount of an anhydrous composition of silver dihydrogen citrate (SDC) and citric acid ...

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Номер записи: 26
21-03-2013 дата публикации

Patterning process and resist composition

Номер: US20130071788A1
Автор: Jun Hatakeyama, Kazuhiro Katayama, Koji Hasegawa
Принадлежит: Shin Etsu Chemical Co Ltd

A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units of acid labile group-substituted vinyl alcohol and maleic anhydride and/or maleimide, an acid generator, and an organic solvent onto a substrate, prebaking, exposing to high-energy radiation, and developing in an organic solvent developer such that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. In image formation via positive/negative reversal by organic solvent development, the resist film is characterized by a high dissolution contrast between the unexposed and exposed regions.

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Номер записи: 27
28-03-2013 дата публикации

PERACID AND 2-HYDROXY ORGANIC ACID COMPOSITIONS AND METHODS FOR TREATING ITEMS

Номер: US20130079408A1
Автор: Ho Kai Lai Grace
Принадлежит: Fresh Express Incorporated

Methods and compositions for treating items to control microorganisms are provided. The method treats produce by contacting the surface of the item with an aqueous composition comprising i) an organic peracid of the formula RC(O)OOH wherein R is methyl, ethyl, n-propyl, or s-propyl; ii) a 2-hydroxy organic acid selected from tartaric acid, citric acid, malic acid, mandelic acid, and lactic acid; and iii) water; wherein the aqueous composition has a pH from 2.5 to 6.0. 1. A method of sanitizing a non-food article item , comprising contacting the surface of the article with an aqueous solution which comprises:i) an organic peracid of the formula RC(O)OOH wherein R is methyl, ethyl, n-propyl, or s-propyl;ii) a 2-hydroxy organic acid selected from tartaric acid, citric acid, malic acid, mandelic acid, and lactic acid;wherein the aqueous solution has a pH from 2.5 to 6.0, inclusive and the concentration of peracid is from 40 to 250 ppm (w/w) inclusive, and the concentration of the 2-hydroxy organic acid is from 0.1 to 1% (w/w), inclusive.2. The method of claim 1 , wherein the composition further comprises iii) an anionic surfactant.3. The method of claim 1 , wherein the peracid is peroxyacetic acid and the 2-hydroxy organic acid is L-(+)-lactic acid.4. The method of claim 3 , wherein the concentration of the peroxyacetic acid in the composition is from 50 to 100 ppm (w/w) claim 3 , the concentration of the lactic acid in the composition is from 0.1% to 0.6% (w/w).5. The method of claim 3 , wherein concentration of peroxyacetic acid in the composition is from 60 to 80 ppm (w/w) claim 3 , the concentration of lactic acid in the composition is from 0.1% to 0.4% (w/w).6. The method of claim 3 , wherein the pH is between 2.5 and 4.5.7. The method of claim 1 , wherein the pH is from 2.8 to 3.2.8. The method of claim 1 , wherein the pH is about 3.0.9. The method of claim 1 , wherein the composition is at a temperature of 35° F. to 45° F.10. The method of claim 1 , wherein the ...

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Номер записи: 28
18-04-2013 дата публикации

Thiosulfonate compound, reversible cationization agent for protein and/or peptide, and method for solubilization

Номер: US20130096278A1
Автор: Go Kyuragi, Hidenori Yamada, Junichiro Futami, Keiichiro Yagi
Принадлежит: Okayama University NUC

The object of the present invention is to provide a novel thiosulfonate compound, a reversible cationization agent for protein and/or peptide, which can reversibly cationize a wider range of proteins and peptides with high stability of quality and accuracy and which are useful for a high degree of purification and recovery, as well as, a method for solubilization for protein and/or peptide using the agent. The present invention is a thiosulfonate compound having three or more cations derived from a quaternary ammonium group within one molecule.

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Номер записи: 29
09-05-2013 дата публикации

Topcoat compositions and photolithographic methods

Номер: US20130115553A1
Автор: Deyan Wang
Принадлежит: Rohm and Haas Electronic Materials LLC

Topcoat compositions are provided that can be used in immersion lithography to form photoresist patterns. The topcoat compositions include a polymer system that includes a matrix polymer and a surface active polymer. The matrix polymer is present in the composition in a larger proportion by weight than the surface active polymer, and the surface active polymer has a lower surface energy than a surface energy of the matrix polymer. A solvent system includes a first organic solvent chosen from gamma-butyrolactone and/or gamma-valerolactone, and a second organic solvent. The first organic solvent has a higher surface energy than a surface energy of the surface active polymer, and a higher boiling point than a boiling point of the second organic solvent.

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Номер записи: 30
09-05-2013 дата публикации

HEXENONE COMPOUNDS AND MEDICAL USE THEREOF

Номер: US20130116256A1
Автор: He Kunlun, Hu Guoliang, Li Song, Li Wei, Li Xin, Liu Juan, Long Long, Wang Lili, Xiao Junhai, Zheng Zhibing, Zhong Wu
Принадлежит: INSTITUTE OF PHARMACOLOGY AND TOXICOLOGY ACADEMY OF MILITARY MEDICAL SCIENCES P.L.A. CHINA

The present invention relates to a compound of Formula I, or an isomer, pharmaceutically acceptable salt and solvate thereof; to a composition comprising a compound of Formula I, or an isomer, pharmaceutically acceptable salt and solvate thereof, and a pharmaceutically acceptable carrier, excipient or diluent; and also to use of a compound of Formula I, or an isomer, pharmaceutically acceptable salt and solvate thereof for combating apoptosis, or preventing or treating a disease or disorder associated with apoptosis; and especially use for protecting cardiomyocyte, or preventing or treating a disease or disorder associated with cardiomyocyte apoptosis. 4. The compound according to having the following structure claim 1 , or its isomers claim 1 , pharmaceutically acceptable salts and solvates:(1) (1E)-1-phenyl-5-(1-morpholinylthiocarboxamido)-6,6,6-trichloro-1-ene-3-hexanone.5. A pharmaceutical composition comprising a compound or an isomer claim 1 , pharmaceutically acceptable salt and solvate thereof according to claim 1 , and a pharmaceutically acceptable carrier claim 1 , excipient or diluent.6. Use of the compound or an isomer claim 1 , pharmaceutically acceptable salt and solvate thereof according to in manufacture of a medicament for combating apoptosis claim 1 , or preventing or treating a disease or disorder associated with apoptosis.7. Use of the compound or an isomer claim 1 , pharmaceutically acceptable salt and solvate thereof according to in manufacture of a medicament for protecting cardiomyocyte claim 1 , or preventing or treating a disease or disorder associated with cardiomyocyte apoptosis.8. A method for combating apoptosis claim 1 , or preventing or treating a disease or disorder associated with apoptosis comprising administering a subject in such need a therapeutically effective amount of a compound or an isomer claim 1 , pharmaceutically acceptable salt and solvate thereof according to .9. A method for protecting cardiomyocyte claim 1 , or ...

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Номер записи: 31
09-05-2013 дата публикации

ANTIPARASITIC FORMULATIONS

Номер: US20130116295A1
Автор: PRESTON JOHN
Принадлежит: VELCERA INC.

Fipronil formulations and fipronil/S-methoprene co-formulations are provided herein. These formulations optionally contain one or more additional active ingredient(s). The formulations comprise an organic solvent, an alcohol co-solvent, and one or more antioxidants and without any crystallization inhibitor. The formulations provided herein are antiparasitic, and can be used, for example, to combat dog and cat parasites, such as, fleas and ticks. 1. A parasiticidal spot-on formulation comprisingfipronil or a veterinary acceptable salt thereof, which is present from about 9% to about 11% by weight of the formulation;{'sub': 1', '6', '1', '6, 'at least one C-Calcohol co-solvent, wherein the total amount of the at least one C-Calcohol co-solvent is up to about 5% by weight of the formulation;'}one or more antioxidants, wherein the total amount of the one or more antioxidants is about 0.005% to about 1.0% by weight of the formulation;at least one organic solvent which is one or more glycol ethers selected from the group consisting of diethylene glycol monoethyl ether, ethylene glycol monoethyl ether, dipropylene glycol n-butyl ether, dipropylene glycol monomethyl ether, and combinations thereof, wherein the total amount of the at least one organic solvent makes up the balance of the formulation; andthe formulation does not contain a surfactant or a crystallization inhibitor.2. The formulation of claim 1 , wherein fipronil or a veterinary acceptable salt thereof is present at about 9.8% w/w of the formulation.3. The formulation of claim 1 , wherein the at least one C-Calcohol co-solvent is selected from the group consisting of ethanol claim 1 , propanol claim 1 , isopropanol claim 1 , and a combination thereof.4. The formulation of claim 1 , wherein the at least one C-Calcohol co-solvent is present from about 3% to about 5% w/w of the formulation.5. The formulation of claim 1 , wherein the at least one C-Calcohol co-solvent is present at about 5% w/w of the formulation.6. ...

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Номер записи: 32
09-05-2013 дата публикации

PROCESS FOR PRODUCING AMINOALKYLTHIOSULFURIC ACID COMPOUND

Номер: US20130116468A1
Автор: Ozturk Orhan
Принадлежит: Sumitomo Chemical Company, Limited

An aminoalkylthiosulfuric acid compound represented by formula (1): 2. The process according to claim 1 , wherein the amount of the water in step (A1) is from 2.5 parts by weight to 4 parts by weight with respect to 1 part by weight of the hydrochloride of the chloroalkylamine compound represented by formula (2).3. The process according to claim 1 , wherein the used amount of the alkali metal salt of thiosulfuric acid in step (A1) is from 0.9 mole to 1.5 moles with respect to 1.0 mole of the hydrochloride of the chloroalkylamine compound represented by formula (2).4. The process according to claim 1 , wherein step (B1) is a step of obtaining a mixture of a solid containing the aminoalkylthiosulfuric acid compound represented by formula (1) and a liquid containing an alkali metal chloride by adjusting the temperature of the reaction mixture obtained in step (A1) to not lower than −15° C. and not higher than 30° C.6. The process according to claim 5 , wherein the used amount of the alkali metal salt of thiosulfuric acid in step (A2) is from 0.9 mole to 1.5 moles with respect to 1.0 mole of the hydrochloride of the chloroalkylamine compound represented by formula (2).7. The process according to claim 5 , wherein step (C2) is a step of obtaining a mixture of a solid containing the aminoalkylthiosulfuric acid compound represented by formula (1) and a liquid containing water by adjusting the temperature of the liquid containing the aminoalkylthiosulfuric acid compound represented by formula (1) and obtained in step (B2) to not lower than −15° C. and not higher than 30° C. The present invention relates to a process for producing an aminoalkylthiosulfuric acid compound.U.S. Pat. No. 4,581,297 A describes a method comprising reacting 25 g of hydrobromide of 6-bromohexylamine with 24.2 g of sodium thiosulfate in 580 ml of water, concentrating the obtained reaction solution until its volume was reduced by half, then cooling and isolating the resulting precipitation of S-(6- ...

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Номер записи: 33
16-05-2013 дата публикации

Pattern forming method and manufacturing method of semiconductor device

Номер: US20130122429A1
Автор: Eiichi Nishimura, Masato Kushibiki
Принадлежит: Tokyo Electron Ltd

A disclosed manufacturing method of a semiconductor device includes laminating a substrate, an etched film, an anti-reflective coating film, and a resist film; forming a pattern made of the resist film using a photolithographic technique; forming the third mask pattern array by a mask pattern forming method; and a seventh step of forming a fourth mask pattern array by processing the etched film using the third mask pattern array.

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Номер записи: 34
06-06-2013 дата публикации

PHOTOSENSITIVE RESIN COMPOSITION

Номер: US20130143011A1
Автор: Minegishi Tomonori, Sasaki Mamoru, Suzuki Keiko, Yamazaki Noriyuki
Принадлежит: HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.

A photosensitive resin composition including: (a) a polyamide acid; (b) a compound (b1) having 4 or more of a methylol group, a methoxymethyl group and the both thereof, or a compound (b2) represented by the following formula (2); and (c) a photopolymerization initiator. 3. The photosensitive resin composition according to wherein the component (b) is contained in an amount of 2 to 10 parts by mass relative to 100 parts by mass of the component (a).4. The photosensitive resin composition according to which is used for forming a protective layer or an insulating layer of a circuit formation substrate of a suspension of a hard disc drive.5. A cured film obtained by curing the photosensitive resin composition according to .6. A method for producing a cured film comprising the steps of:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'applying the photosensitive resin composition according to to a substrate, followed by drying to obtain a photosensitive resin film;'}exposing the photosensitive resin film to light, followed by developing, to obtain a patterned resin film; andheating the patterned resin film.7. A circuit formation substrate having the cured film obtained by the method according to as an insulating layer or a protective layer.8. The circuit formation substrate according to having a substrate claim 7 , an insulating layer claim 7 , a conductive layer and a protective layer in this sequence.9. A suspension of a hard disc drive having the circuit formation substrate according to . The invention relates to a photosensitive resin composition, a method for producing a cured film using the photosensitive resin composition and a circuit formation substrate having a cured film comprising the photosensitive resin composition.In recent years, in respect of an increase in memory capacity or an increase in processing speed or the like of a hard disc drive, as the magnetic head (hereinafter referred to as the “head”), a MR (magnet-resistive) thin film composite head in ...

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Номер записи: 35
13-06-2013 дата публикации

NEMATICIDES

Номер: US20130150439A1
Автор: Khan Naseem
Принадлежит: Sciessent LLC

A method of treating soils to eradicate or reduce the proliferation of nematodes said method comprising the application of select metal ion-acid compositions to the soil. 1. A method of treating soils to eradicate or reduce the number and/or proliferation of nematodes , said method comprising applying a nematicide to the soil to be treated , said nematicide comprising i) at least one traditional antimicrobial metal ion or ion source which releases the antimicrobial metal ion in the presence of an acidic solutions and ii) at least one acid wherein the acid is selected from mineral acids and organic acids , and optionally , iii) at least one surfactant which a) enhances penetration of the nematicide actives into the soil , b) enhances the bioefficacy of the nematicide actives as compared to the same nematicide actives without the surfactant , or c) both or d) a combination of such surfactants , wherein the at least one acid is present in an amount of at least 20 weight percent based on the combined weight of the acid and metal ion source and the mole ratio of acid to metal ion is at least 0.3:1 , said nematicide having a pH of from about 1.5 to about 12 , inclusive; provided that when the nematicide is to be applied to soils in which planting has already taken place , the pH is from about 5 about 12 , inclusive , or the acid is sufficiently weak as not to cause phytotoxicity.2. The method of wherein the antimicrobial metal ion is selected from silver ions claim 1 , copper ions claim 1 , zinc ions claim 1 , a combination of copper and zinc ions claim 1 , a combination of copper and silver ions claim 1 , a combination of silver and zinc ions claim 1 , a combination of copper claim 1 , silver and zinc ions claim 1 , and a combination of any of the foregoing and at least one other antimicrobial metal ions.3. The method of wherein the acid is an organic acid.4. The method of wherein the acid is a carboxylic acid.5. The method of wherein the acid is present in an amount of ...

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Номер записи: 36
20-06-2013 дата публикации

Photoresist composition for forming a color filter and display substrate

Номер: US20130155536A1
Автор: Chul Huh, Sang-Hun Lee, Sun-Young Chang, Yui-Ku Lee
Принадлежит: Samsung Display Co Ltd

A photoresist composition for manufacturing a color filter, the photoresist composition includes a first red colorant and a yellow colorant represented by Chemical Formula 1, wherein R 1 and R 2 each independently represent a C1 to C10 alkyl group, wherein A 1 , A 2 , A 3 , and A 4 each independently represent a C1 to C10 alkyl group, —CN, —PO 3 H 2 , —C(O)OH, or a hydrogen atom, m is an integer of 1 to 10, and optionally wherein at least one —CH 2 — of R 1 and R 2 if present is independently replaced with —O—, —C(O)—, —C(O)O—, or —OC(O)—.

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Номер записи: 37
20-06-2013 дата публикации

Resist composition, method of forming resist pattern, and polymeric compound

Номер: US20130157201A1
Автор: Daichi Takaki, Daiju Shiono, Jun Iwashita, Yoshiyuki Utsumi
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A resist composition containing a base component (A) which generates acid upon exposure, and exhibits changed solubility in a developing solution under the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below and a structural unit (a6) that generates acid upon exposure. In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R 1 represents a sulfur atom or an oxygen atom, R 2 represents a single bond or a divalent linking group, and Y represents a hydrocarbon group in which a carbon atom or a hydrogen atom may be substituted with a substituent.

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Номер записи: 38
27-06-2013 дата публикации

Positive photosensitive resin composition and uses thereof

Номер: US20130164461A1
Автор: Chun-An Shih, kai-min Chen
Принадлежит: Chi Mei Corp

The invention relates to a positive photosensitive resin composition with good temporal stability. The invention also provides a method for manufacturing a thin-film transistor array substrate, a thin-film transistor array substrate and a liquid crystal display device.

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Номер записи: 39
04-07-2013 дата публикации

Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition

Номер: US20130171569A1
Автор: Daisuke Kori, Kazumi Noda, Seiichiro Tachibana, Takeshi Kinsho, Tsutomu Ogihara
Принадлежит: Shin Etsu Chemical Co Ltd

A resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of a condensed body, the body being obtained by condensation of one or more kinds of a compound shown by the following general formula (1-1) with one or more kinds of a compound shown by the following general formula (2-3) and an equivalent body thereof, with one or more kinds of a compound shown by the following general formula (2-1), a compound shown by the following general formula (2-2), and an equivalent body thereof; a method for producing a polymer for a resist underlayer film; and a patterning process using the same.

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Номер записи: 40
11-07-2013 дата публикации

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME

Номер: US20130177850A1
Автор: INABE Haruki, KANDA Hiromi
Принадлежит: FUJIFILM Corporation

A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent. 1. A positive type resist composition for use in liquid immersion exposure comprising:(A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid;(B) a compound generating acid upon irradiation with one of an actinic ray and a radiation;(C) an alkali soluble resin having one or more fluorine atoms; and(D) a solvent, andwherein a structure of resin (A) and a structure of resin (C) are not the same.5. The positive type resist composition for use in liquid immersion exposure according to claim 1 ,wherein the resin (A) contains a lactone group.7. The positive type resist composition for use in liquid immersion exposure according to claim 1 ,wherein the resin (A) has no aromatic group.8. The positive type resist composition for use in liquid immersion exposure according to claim 1 ,wherein a blending amount of the resin (A) is 40 to 99.99 mass % based on a total solid content of the resist.10. The positive type resist composition for use in liquid immersion exposure according to claim 9 ,{'sup': '−', 'the non-nucleophilic anion for Xis an aliphatic sulfonic acid anion substituted at α-position of sulfonic acid with a fluorine atom.'}11. The positive type resist composition for use in liquid immersion exposure according to claim 1 ,wherein the positive type resist composition contains two or more compounds as the compound (B).12. The positive type resist composition for use in liquid immersion exposure according to claim 1 ,wherein the ...

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Номер записи: 41
18-07-2013 дата публикации

Modulation of plant biology

Номер: US20130184151A1
Автор: Johan Peter Stromberg, Kenneth Scott Day, Terry J. Hanson
Принадлежит: FBSciences Holdings Inc

A method of effecting at least one biological process in a plant is disclosed. The method comprises contacting a part of a seed, a plant, or the locus thereof with a mixture comprising an agriculturally acceptable mixture of (i) complex polymeric polyhydroxy acids and (ii) a phytotoxic amount of one or more alkali (earth) salts and/or a synergistic amount of at least one source of an agriculturally acceptable transition metal ions.

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Номер записи: 42
25-07-2013 дата публикации

Method of forming resist pattern

Номер: US20130189618A1
Автор: Hideto Nito, Hiroaki Shimizu, Jiro Yokoya, Tsuyoshi Nakamura
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A method of forming a resist pattern, including: step (1) in which a resist composition including a base component, a photobase generator component and an acid supply component is applied to a substrate to form a resist film; step (2) in which the resist film is subjected to exposure without being subjected to prebaking; step (3) in which baking is conducted after step (2), such that, at an exposed portion of the resist film, the base generated from the photobase generator component upon the exposure and an acid derived from the acid supply component are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of the acid derived from the acid supply component; and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern.

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Номер записи: 43
25-07-2013 дата публикации

PEST CONTROLLING COMPOSITION AND METHOD FOR CONTROLLING PEST

Номер: US20130190364A1
Автор: Kiguchi So, Tanaka Soichi
Принадлежит: Sumitomo Chemical Company, Limited

The present invention provides a composition having an excellent controlling activity on a pest. The composition comprising a compound represented by Formula (1) and one or more diamide compound(s) selected from Group (A) shows an excellent controlling activity on a pest. Group (A): a group consisting of a compound of Formula (2): wherein a combination of R, Rand Ris a combination whose Ris bromine atom, Ris chlorine atom and Ris 1-cyclopropylethyl group, a combination whose Ris chlorine atom, and Rand Rare both methyl group, or a combination whose Rand Rare both methyl group and Ris cyano group, and a compound of Formula (3): 2. The pest controlling composition according to claim 1 , wherein the weight ratio of the compound represented by Formula (1) to the diamide compound(s) is from 0.0125/1 to 500/1.3. The pest controlling composition according to or claim 1 , wherein the compound represented by Formula (1) has R-absolute configuration.5. The method according to claim 4 , wherein the compound of Formula (1) and the diamide compound(s) are applied to a seed.6. The method according to or claim 4 , wherein the weight ratio of the compound represented by Formula (1) to the diamide compound(s) is from 0.0125/1 to 500/1.7. The method according to claim 4 , wherein the compound represented by Formula (1) has R-absolute configuration. The present invention relates to a pest controlling composition and a method for controlling a pest.Hitherto, there has been provided compounds as an active ingredient for a composition for controlling a pest (see e.g., The Pesticide Manual—15th edition (BCPC published) ISBN 1901396188). Also there has been provided a compound of Formula (1):as well as a diamide compound of Formula (2):whereina combination of R, Rand Ris a combination whose Ris bromine atom, Ris chlorine atom and Ris 1-cyclopropylethyl group, a combination whose Ris chlorine atom, and Rand Rare both methyl group, or a combination whose Rand Rare both methyl group and Ris ...

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Номер записи: 44
25-07-2013 дата публикации

Pest controlling composition and method for controlling pest

Номер: US20130190406A1
Автор: So Kiguchi, Soichi Tanaka
Принадлежит: Sumitomo Chemical Co Ltd

The present invention provides a composition having an excellent controlling activity on a pest. The composition comprising a compound represented by Formula (1) and the cyanamide compound represented by Formula (2) shows an excellent controlling activity on a pest.

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Номер записи: 45
08-08-2013 дата публикации

COMPOSITION AND SYSTEM FOR TURF MAINTENANCE

Номер: US20130203600A1
Автор: Hanrahan Richard K., Rees Richard, Vandenberg Ed
Принадлежит:

The present invention provides an agricultural composition comprising a plant growth regulator and a pigment that provides reduced phytotoxicity as compared to an equivalent application of the plant growth regulator alone. The composition can further include a fungicide. A system for turf management as well as methods for enhancing turf are also provided. 1. An agricultural composition comprising:at least one plant growth regulator; andat least one pigment,wherein the composition provides phytoregulation.2. The agricultural composition of claim 1 , further comprising:at least one fungicide.3. The agricultural composition of or wherein the at least one plant growth regulator is ethephon claim 1 , trinexapac ethyl claim 1 , paclobutrazole claim 1 , flurprimidol or a combination thereof.4. The agricultural composition of or wherein the at least one fungicide is fosetyl aluminum claim 1 , trifloxystrobin claim 1 , triadimefon claim 1 , triticonazole claim 1 , iprodione or a combination thereof.54. The agricultural composition of - wherein the at least one pigment is a phthalocyanine compound.6. The agricultural composition of wherein the phthalocyanine compound is Pigment Blue 16 claim 5 , Vat Blue 29 claim 5 , Pigment Blue 15 claim 5 , Heliogen Green GG claim 5 , Ingrain Blue 14 claim 5 , Ingrain Blue 5 claim 5 , Ingrain Blue 1 claim 5 , Pigment Green 37 claim 5 , Pigment Green 7 claim 5 , or a combination thereof.76. The agricultural composition of - wherein the at least one pigment is present in an amount of between about 1 to about 900 parts by weight of total composition.87. The agricultural composition of - wherein the composition is an aqueous suspension or a wettable powder.9. A method for enhancing turf comprising:applying an effective amount of a composition comprising at least one plant growth regulator in combination with a phytoregulating amount of at least one pigment.10. The method of wherein a first plant growth regulator is present in an approximate ...

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Номер записи: 46
08-08-2013 дата публикации

Method for preparing 2-hydroxybutyrolactone

Номер: US20130204016A1
Автор: Jerome Monbrun, Vivien Henryon
Принадлежит: Adisseo France SAS

The invention relates to a method for preparing 2-hydroxybutyrolactone (2HBL) from a compound or its salt or its oligomers, said compound fitting formula (I) CH 3 —S—CH 2 CH 2 CR1R2R3 Wherein R1 represents H R2 represents a group selected from OH; OR4 and OCOR4 wherein R4 represents a group selected from linear, cyclic, alicyclic or branches alkyl groups having from 1 to 10 carbon atoms, and aryl groups having from 6 to 10 carbon atoms, optionally substituted with substituent(s) selected from linear or branched alkyl groups having from 1 to 10 carbon atoms, halogens and hydroxyl, amino, nitro and alkoxy groups having from 1 to 10 carbon atoms; and OSiRR′R″ wherein R, R′ and R″ are selected independently of each other from linear, cyclic, alicyclic or branched alkyl groups having from 1 to 10 carbon atoms, aryl groups having from 6 to 10 carbon atoms, optionally substituted with substituent(s) selected from linear or branched alkyl groups having from 1 to 10 carbon atoms, or R1 and R2 represent together ═O, R3 represents COOH or a COOR5 group wherein R5 represents a group selected from linear, cyclic, alicyclic or branched alkyl groups having from 1 to 10 carbon atoms, benzyl groups and benzyl groups substituted with one or two substituents selected from linear or branched alkyl groups having from 1 to 10 carbon atoms, halogens and hydroxyl, amino, nitro and alkoxy groups having from 1 to 10 carbon atoms, or R3 represents a cyano group, method according to which a sulfonium of said compound is obtained, said sulfonium fitting the formula (II) [CH 3 ][CH 2 CH 2 CR1R2CR3][CR6R7R8]S + X − wherein R1, R2 and R3 have the above definition, and R6 and R7 are selected independently of each other from H, linear, cyclic, alicyclic or branched alkyl groups having from 1 to 10 carbon atoms, and aryl groups having from 6 to 10 carbon atoms, optionally substituted with substituent(s) selected from linear or branched alkyl groups having from 1 to 10 carbon atoms, halides and ...

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Номер записи: 47
15-08-2013 дата публикации

Chemically amplified negative resist composition and pattern forming process

Номер: US20130209922A1
Автор: Keiichi Masunaga, Luisa Bozano, Ratnam Sooriyakumaran, Satoshi Watanabe, Yoshio Kawai
Принадлежит: International Business Machines Corp, Shin Etsu Chemical Co Ltd

A polymer comprising recurring units having an acid-eliminatable group on a side chain and aromatic ring-bearing cyclic olefin units is used to formulate a chemically amplified negative resist composition. Any size shift between the irradiated pattern and the formed resist which can arise in forming a pattern including isolated feature and isolated space portions is reduced, and a high resolution is obtained.

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Номер записи: 48
15-08-2013 дата публикации

Clothianidin, Metofluthrin, and Piperonyl Butoxide Mixture for Bed Bug Control

Номер: US20130210871A1
Автор: Branscome Deanna, Jeffries David
Принадлежит: Valent BioSciences Corporation

The invention relates to a mixture comprising clothianidin, metofluthrin, and piperonyl butoxide which provides superior insect knockdown and mortality rates, and is especially effective against bed bugs. This mixture of actives may be formulated with adjuvants, such as solvents, anti-caking agents, stabilizers, defoamers, slip agents, humectants, dispersants, wetting agents, thickening agents, emulsifiers, and/or preservatives which increase the activity of the mixture. Mixtures of the present invention have long lasting residual control. 1. A pesticidal mixture comprising an effective amount of clothianidin , metofluthrin , and piperonyl butoxide.2. The mixture of wherein the ratio of clothianidin:metofluthrin:piperonyl butoxide is from 1.0:0.001:0.25 to 20:0.4;40.3. The mixture of wherein the ratio of clothianidin:metofluthrin:piperonyl butoxide is 4:0.1:10.4. A method of insect control comprising administering to an environment in need of insect control an effective amount of the mixture of .5. The method of wherein the environment is a residential or commercial building or structure.6. The method of wherein the mixture is applied by spraying or brushing a formulation containing said mixture onto a surface.7. The method of wherein the insects controlled are bed bugs.8. The method of wherein the mixture provides residual insect control. The present invention is directed to a combination of clothianidin, metofluthrin, and piperonyl butoxide that provides superior insect knockdown and mortality rates, and is especially effective against bed bugs. This mixture of actives may be formulated with adjuvants, such as solvents, anti-caking agents, stabilizers, defoamers, slip agents, humectants, dispersants, wetting agents, thickening agents, emulsifiers, and/or preservatives which increase the long lasting activity of the actives.The present mixture is generally directed to a safe and significantly more effective treatment for insect control. Additionally, the present ...

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Номер записи: 49
29-08-2013 дата публикации

Acid generator, chemically amplified resist composition, and patterning process

Номер: US20130224657A1
Автор: Masaki Ohashi, Masayoshi Sagehashi, Tomohiro Kobayashi
Принадлежит: Shin Etsu Chemical Co Ltd

The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: To provide a novel acid generator which is suitably used as an acid generator for a resist composition, which solves the problems of LER and a depth of focus and can be effectively and widely used particularly without degradation of a resolution, a chemically amplified resist composition using the same, and a patterning process.

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Номер записи: 50
29-08-2013 дата публикации

Resist composition and method of forming resist pattern

Номер: US20130224658A1
Автор: Toshiaki HATO, Yoshitaka Komuro
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A resist composition including: a base component (A) that exhibits changed solubility in a developing solution by the action of acid; a photoreactive quencher (C); and an acid generator component (B) that generates acid upon exposure, wherein the photoreactive quencher (C) contains a compound (C) represented by general formula (c1) shown below. In the formula, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent; R 1 represents a divalent linking group; R 2 represents an arylene group which may have a substituent, and each of R 3 and R 4 independently represents an aryl group which may have a substituent; R 3 and R 4 may be mutually bonded with the sulfur atom to form a ring; R 5 represents a hydroxy group, a halogen atom, an alkyl group of 1 to 5 carbon atoms, an alkoxy group or a fluorinated alkyl group; p represents an integer of 0 to 2; and q represents an integer of 0 to 3.

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Номер записи: 51
05-09-2013 дата публикации

POSITIVE-TYPE PHOTORESIST COMPOSITION, PHOTORESIST LAMINATE, METHOD FOR PRODUCING PHOTORESIST PATTERN, AND METHOD FOR PRODUCING CONNECTING TERMINAL

Номер: US20130230801A1
Автор: Kuroiwa Yasushi, MORI Takayoshi, Shimizu Takahiro, Utsumi Yoshiyuki, Washio Yasushi
Принадлежит: TOKYO OHKA KOGYO CO., LTD.

What is provided is a positive-type photoresist composition containing an acid generator (A) capable of generating an acid when irradiated with an active ray or radiation, a resin (B) whose solubility in alkali increases under the action of acid, and an organic solvent (S), the photoresist composition further containing an alkali-metal salt (C). 2. The positive-type photoresist composition according to claim 1 , wherein the content of the alkali-metal salt (C) is 1 claim 1 ,000 ppm to 100 claim 1 ,000 ppm by mass relative to the mass of the acid generator (A).3. The positive-type photoresist composition according to claim 1 , further comprising an alkali-soluble resin (D).4. The positive-type photoresist composition according to claim 3 , wherein the alkali-soluble resin (D) includes at least one resin selected from the group consisting of a novolac resin (D1) claim 3 , a polyhydroxystyrene resin (D2) claim 3 , and an acrylic resin (D3).5. The positive-type photoresist composition according to claim 1 , further comprising an acid-diffusion control agent (E).6. A photoresist laminate comprising a support claim 1 , and laminated thereon a photoresist layer formed from the positive-type photoresist composition according to .7. A method for producing a photoresist pattern claim 1 , the method comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'laminating on a support, a photoresist layer formed from the positive-type photoresist composition according to ;'}exposing the photoresist layer with an active ray or radiation; anddeveloping the photoresist layer after exposure, and thereby obtaining the photoresist pattern.8. A method for producing a connecting terminal claim 7 , the method comprising forming a connecting terminal formed of a conductor claim 7 , in a nonresist section of the photoresist pattern obtainable by the method for producing the photoresist pattern according to . This application is based on and claims the benefit of priority from Japanese ...

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Номер записи: 52
05-09-2013 дата публикации

Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process

Номер: US20130231491A1
Автор: Jun Hatakeyama, Kazunori Maeda, Koji Hasegawa, Satoshi SHINACHI, Takeru Watanabe, Takeshi Kinsho, Tomohiro Kobayashi, Yuji Harada
Принадлежит: Shin Etsu Chemical Co Ltd

A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C 1 -C 20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.

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Номер записи: 53
19-09-2013 дата публикации

Radiation-sensitive resin composition, method for forming resist pattern, organic acid and acid generating agent

Номер: US20130244185A9
Автор: Takanori Kawakami, Yasuhiko Matsuda
Принадлежит: JSR Corp

A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R 1 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R 1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO 3 or SO 2 . R 2 represents a cyclic hydrocarbon group. R 3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R 1 —X—R 2 —(R 3 ) n   (I) —R 31 -G-R 13   (x)

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Номер записи: 54
19-09-2013 дата публикации

Pesticidal Compositions

Номер: US20130245053A1
Автор: Steven R. Sims
Принадлежит: BASF CORPORATION

The present disclosure relates to pesticidal compositions and to methods for controlling pests such as insects and other arthropods. More particularly, the disclosure relates to a pesticidal compositions containing mineral oil and one or more additional components which, when used in combination, act synergistically to control insect and pest populations.

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Номер записи: 55
19-09-2013 дата публикации

PROCESS FOR PREPARING PAN-CDK INHIBITORS OF THE FORMULA (I), AND INTERMEDIATES IN THE PREPARATION

Номер: US20130245261A1
Автор: Gries Jörg, Hassfeld Jorma, Krüger Joachim, Lovis Kai
Принадлежит: Bayer Intellectual Property GmbH

The invention relates to a novel process for the preparation of pan-CDK inhibitors of the formula (I), and intermediates of the preparation. 2. Process according to claim 1 ,where, in step I.b) 1,3-dibromo-5,5-dimethylhydantoin is used as oxidizing agent and trifluoroacetamide is used as reagent.3. Process according to claim 1 ,where, in step I.c), the oxidation takes place with potassium peroxomonosulphate (Oxone®).4. Process according to claim 1 ,where, in step I.d), the nitrophenyl-sulphoximine of the formula (I-11) is crystallized with (+)-di-O-p-toluoyl-D-tartaric acid in acetonitrile or propionitrile.5. Process according to claim 1 ,where, in step I.g), the lithium base used is lithium hexamethyldisilazide and the ethereal solvent used is tetrahydrofuran. The invention relates to a novel process for the preparation of pan-CDK inhibitors of the formula (I), and to intermediates of the preparation.The novel process relates to compounds of the formula (I), in particular the compound (2R,3R)-3-{[2-{[4-(S-cyclopropylsulphonimidoyl)phenyl]amino}-5-(trifluoromethyl)pyrimidin-4-yl]oxy}butan-2-ol (compound A), which develop their anti-tumour activity via a cytotoxic mechanism.A preparation process for a compound of the general formula (I) has now been found,in which Ris a C-C-alkyl group or a C-C-cycloalkyl ring, which is suitable for a scale-up and overcomes the disadvantages of the preparation processes of the prior art for this substance class.This preparation process is particularly suitable for the compound AThe application is based on the following definitions:C-C-alkylA C-C-alkyl group is to be understood in each case as meaning a straight-chain or branched alkyl radical, such as, for example, a methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, isopentyl or a hexyl radical.C-C-cycloalkylA C-C-cycloalkyl ring is to be understood as meaning a cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl or a cycloheptyl ring.Compounds of the ...

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Номер записи: 56
26-09-2013 дата публикации

Resist composition, method of forming resist pattern and polymeric compound

Номер: US20130252180A1
Автор: Jun Iwashita, Kenri KONNO, Kensuke Matsuzawa, Takahiro Dazai, Yoshiyuki Utsumi
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the base component (A) containing a polymeric compound (A1) including a structural unit (a0) represented by general formula (a0-1) shown below, a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a structural unit (a6) which generates acid upon exposure (wherein R 1 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; W represents —COO—, —CONH— or a divalent aromatic hydrocarbon group; Y 1 and Y 2 represents a divalent linking group or a single bond; represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R′ 2 represents a monovalent aliphatic hydrocarbon group; and R 2 represents an —SO 2 — containing cyclic group).

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Номер записи: 57
26-09-2013 дата публикации

CONTROLLED CHEMICAL RELEASE OF HYDROGEN SULFIDE

Номер: US20130253051A1
Автор: Xian Ming, Zhao Yu
Принадлежит: WASHINGTON STATE UNIVERSITY

Agents of formula: where R1 and R2 vary independently and are acyl, sulfonyl, phosphoryl, alkyl, substituted alkyl, halogen, aryl, arylalkyl, substituted aryl, heteroaryl, alkenyl, substituted alkenyl, alkynyl, substituted alkynyl, cycloalkyl, heterocycle, or heteroatoms; and R3 is H or a member of a ring structure which includes R2, are provided; as are agents of formula: where R1, R2 and R3 vary independently and: R1=OH, OR′, NHR′, NR′R″ (with R′ R″=alkyl, aryl, heteroaryl, etc); R=acyl, alkyl, aryl, sulfonyl, etc; R3=alkyl, aryl, substituted aryl, heteroaryl, etc; and R4 and R5 are (independently) H, methyl or alkyl, substituted alkyl, aryl, substituted aryl, etc. Methods of using the agents to treat e.g. cardiovascular disease, stroke, shock, injuries caused by hypoxia, male erectile dysfunction, and Alzheimer's are provided. 3. The agent of claim 1 , wherein R3 is a member of a ring structure which includes R2 claim 1 , andR1 and R2 are independently varied and are acyl, sulfonyl, phosphoryl, alkyl, substituted alkyl, halogen, aryl, substituted aryl, heteroaryl, alkenyl, substituted alkenyl, alkynyl, substituted alkynyl, cycloalkyl, heterocyclic, or are heteroatoms6. The method of claim 4 , wherein R3 is a member of a ring structure which includes R2 claim 4 , andR1 and R2 are independently varied and are acyl, sulfonyl, phosphoryl, alkyl, substituted alkyl, halogen, aryl, substituted aryl, heteroaryl, alkenyl, substituted alkenyl, alkynyl, substituted alkynyl, cycloalkyl, heterocyclic, or are heteroatoms.7. The method of claim 4 , wherein said patient is suffering from a disease or condition selected from the group consisting of: cardiovascular disease claim 4 , Alzheimer's claim 4 , and male erectile dysfunction.14. The method of claim 11 , wherein said patient is suffering from a disease or condition selected from the group consisting of: cardiovascular disease claim 11 , Alzheimer's claim 11 , and male erectile dysfunction. The invention generally relates ...

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Номер записи: 58
26-09-2013 дата публикации

PARTIALLY FLUORINATED SULFINIC ACID MONOMERS AND THEIR SALTS

Номер: US20130253220A1
Автор: Dahlke Gregg D., Fukushi Tatsuo, Grootaert Werner M., Guerra Miguel A., Qiu Zai-Ming
Принадлежит:

Described herein is a composition according to formula I or its precursor, formula II: CXX═CX—(R)—CZ1Z2-SOM (I) wherein X, X, and Xare independently selected from H, F, Cl, Br, I, CFand CH, and wherein at least one of X, X, or Xis a H; Ris a linking group; Z1 and Z2 are independently selected from F, Cl, Br, I, CF, and a perfluoroalkyl group; p is 0 or 1; and M is a cation; and CXXX—CXX—(R)—CZ1Z2-SOM (II) wherein X, X, and Xare independently selected from H, F, Cl, Br, I, CFand CH, wherein at least one of X, X, or Xis a H, and Xand Xare independently selected from H, F, Cl, Br and I; Ris a linking group; Z1 and Z2 are independently selected from F, Cl, Br, I, CF, and a perfluoroalkyl group, p is 0 or 1; and M is selected from F, and a cation. 2. The monomer according to claim 1 , wherein X claim 1 , X claim 1 , and Xare all H and Ris a perfluorinated group.3. The monomer according to claim 1 , wherein Ris selected from: —(CH)— claim 1 , —(CF)— claim 1 , —(CF)—O—(CF)— claim 1 , —(CF)—[O—(CF)]— claim 1 , and —[(CF)—O—]—[(CF)—O—] claim 1 , and combinations thereof claim 1 , wherein a claim 1 , b claim 1 , c claim 1 , and d are independently at least 1 claim 1 , 2 claim 1 , 3 claim 1 , 4 claim 1 , 10 claim 1 , 20 claim 1 , etc.5. A method comprising:(a) reacting a terminal alkene compound with a halofluorosulfonylfluoride to produce a halohydrofluorosulfonylfluoride;(b) dehalohydrogenating the halohydrofluorosulfonylfluoride to produce an alkenefluorosulfonylfluoride; and(c) reducing of the alkenefluorosulfonylfluoride to produce an alkenefluorosulfinic acid or salt.6. The method of wherein halogen of the halofluorosulfonylfluoride is selected from Br claim 5 , or I.7. The method of claim 5 , wherein the terminal alkene compound is at least one of ethylene claim 5 , CH═CCl claim 5 , CH═CF claim 5 , CH═CHF claim 5 , CH═CHCl claim 5 , and propylene.8. The method of claim 5 , wherein the halofluorosulfonylfluoride is at least one of ICFCF—O—CFCFSOF claim 5 , BrCFCF—O— ...

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Номер записи: 59
26-09-2013 дата публикации

FLUORINATED OLIGOMERS HAVING PENDANT BROMINE-CONTAINING MOIETIES

Номер: US20130253221A1
Автор: Qiu Zai-Ming
Принадлежит:

Described herein is an oligomer having a pendant bromine-containing moiety according to formula II and/or formula III; and combinations thereof; wherein X, X, and Xare each independently selected from F, Cl, H, and CF; R is a linear or branched linking group, which may be saturated or unsaturated, substituted or unsubstituted, and may comprise a heteroatom; each Zand Zis independently selected from F and CF; n is 0 or 1; q is 0 or 1; and m is at least 2. 4. The composition according to claim 3 , wherein the monomer is selected from:{'sub': 3', '2', '4', '9', '2', '3', '2', '3', '7', '2', '2', '2', '3', '2', '2', '3', '2', '2', '2', '2', '2', '2', '2', '2', '2', '3', '2', '2', '3', '2', '2', '2', '3', '2', '2', '2', '2', '2', '2', '2', '2', '2', '3, 'ethylene, tetrafluoroethylene, propylene, hexafluoropropylene, vinyl chloride, vinyl fluoride, a fluoroalkyl substituted ethylene, vinylidene fluoride, allyl iodide, fluorinated alkyl vinyl ethers, fluorinated alkoxy vinyl ethers, bromotrifluoroethylene, chlorotrifluoroethylene, CFCH═CH, CFCH═CH, CFOCF═CF, CFOCF═CF, CF═CFOCFCF(CF)OCFCFCF, CF═CFOCFCFCFCN, CF═CFOCFCFCFCOCH, CF═CFOCFCF(CF)OCFCFCOCH, CF═CFOCFCFCFCHOH, and CF═CFOCFCFCFOCF.'}5. The composition according to claim 1 , wherein the X claim 1 , X claim 1 , and Xare all F claim 1 , n is 1 claim 1 , and R is a perfluorinated alkylene.6. The composition according to claim 1 , wherein R is selected from: —(CH)— claim 1 , —(CF)— claim 1 , —(CF)—O—(CF)— claim 1 , —(CFCF(CF)O)— and —(CF)—[O—(CF)]— claim 1 , —[(CF)—O]—[(CF)—O]— claim 1 , —[(CF)—O—]—[(CFCF(CF)O)—]— claim 1 , and combinations thereof claim 1 , wherein a claim 1 , b claim 1 , c claim 1 , and d are each independently at least 1.9. The method according to claim 8 , wherein the energy source is added during the step of brominating the polysulfinate oligomer.10. The method according to claim 7 , wherein the brominating step is conducted in the presence of water.11. The method according to claim 8 , wherein the ...

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Номер записи: 60
03-10-2013 дата публикации

Photocurable resin composition, dry film, cured product and printed wiring board

Номер: US20130260109A1
Автор: Manabu Akiyama, Shoji Minegishi, Yoko Shibasaki
Принадлежит: Taiyo Ink Mfg Co Ltd

[Problems] The present invention provides a photocurable resin composition having excellent adhesion with a substrate and excellent resolution; a film obtained by using the photocurable resin composition; a cured product obtained by curing the photocurable resin composition; and a printed wiring board comprising the cured product. [Means for Solution] The photocurable resin composition according to the present invention is characterized by comprising (A) a carboxyl group-containing resin, (B) an acylphosphine oxide-based photopolymerization initiator, (C) a titanocene-based photopolymerization initiator, (D) a photosensitive monomer and (E) a polymerization inhibitor.

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Номер записи: 61
10-10-2013 дата публикации

ACTIVE AND INTELLIGENT ADDITIVE, POLYMER AND ARTICLE

Номер: US20130266626A1
Автор: Capeletti Larissa Brentano, dos Santos João Henrique Zimnoch, Moncada Edwin
Принадлежит:

The present invention relates to active and intelligent additives having hybrid characteristics, that are compatible with polymers, are thermally and mechanically stable, are capable of releasing electrons and/or photons in the presence of chemical compounds, specifically amino compounds, amide compounds, oxygen reducing compounds, water or vapors thereof. The active and intelligent additives incorporate themselves into polymer matrices allowing the obtainment of active and intelligent polymeric articles. These active and intelligent polymeric articles may act as inhibitors of growth of microorganisms and fungi, as well as indicators of the presence of gasses, either in the atmosphere or caused by the decomposition of foodstuffs, for example. 1. An active and intelligent additive , characterized by being formed of a sensitive compound encapsulated in an inorganic matrix with hybrid characteristics , constituted by an alkoxide substituted with alkyl groups , wherein said sensitive compound comprises any compound capable of releasing electrons and/or photons in the presence of a reactive chemical compound by means of a chemical reaction of corrosion of the encapsulated sensitive compound , said reactive chemical compound comprising any compound present in the medium that activates said sensitive compound.2. An active and intelligent additive claim 1 , as claimed in claim 1 , characterized in that said sensitive compound is selected from the group consisting of copper (I) claim 1 , sulfur claim 1 , ascorbic acid and citric acid.3. An active and intelligent additive claim 1 , as claimed in claim 1 , characterized in that said reactive chemical compound is selected from the group consisting of amino compounds claim 1 , amide compounds claim 1 , oxygen-reducing compounds and/or vapors thereof.4. An active and intelligent additive claim 1 , as claimed in claim 1 , characterized in that said inorganic matrix with hybrid characteristics is comprised of a silicon alkoxide.5. ...

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Номер записи: 62
17-10-2013 дата публикации

OPHTHALMIC COMPOSITION FOR CONTACT LENS

Номер: US20130274332A1
Автор: Furumiya Chinatsu, NAKATA Atsuko
Принадлежит: ROHTO PHARMACEUTICAL CO., LTD.

An object of the present invention is to provide an ophthalmic composition for contact lens that can inhibit bacterial adhesion to a contact lens. 1. An ophthalmic composition for contact lens , comprising (A) polyoxyethylene castor oil and (B) terpenoid.2. The ophthalmic composition for contact lens according to claim 1 , wherein the total content of component (B) is contained in a total amount of 0.01 to 1 claim 1 ,000 parts by weight per 100 parts by weight of the total amount of component (A).3. The ophthalmic composition for contact lens according to claim 1 , which further comprises a buffer.4. The ophthalmic composition for contact lens according to claim 1 , which further comprises a nonionic surfactant other than polyoxyethylene castor oil.5. A method for inhibiting bacterial adhesion to a contact lens claim 1 , comprising bringing an ophthalmic composition for contact lens containing (A) polyoxyethylene castor oil and (B) terpenoid into contact with the contact lens.6. The ophthalmic composition for contact lens according to claim 2 , which further comprises a buffer.7. The ophthalmic composition for contact lens according to claim 2 , which further comprises a nonionic surfactant other than polyoxyethylene castor oil.8. The ophthalmic composition for contact lens according to claim 3 , which further comprises a nonionic surfactant other than polyoxyethylene castor oil.9. The ophthalmic composition for contact lens according to claim 6 , which further comprises a nonionic surfactant other than polyoxyethylene castor oil. The present invention relates to a contact lens composition that can inhibit bacterial adhesion to a contact lens.The present invention also relates to a method for inhibiting bacterial adhesion to a contact lens. The present invention further relates to a method for inhibiting lipid adhesion to a contact lens.The number of people wearing contact lenses has increased in recent years. The clean state of contact lenses, which are used in ...

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Номер записи: 63
17-10-2013 дата публикации

Electrophilic Reagents for Monohalomethylation, Their Preparation and Their Uses

Номер: US20130274460A1
Автор: Leitao Emilia Perpetua Tavares
Принадлежит: HOVIONE INTER LIMITED

The invention provides electrophilic monohalomethylating reagents, methods for their preparation and methods for preparation of monohalomethylated biologically active compounds using such reagents. Typical monohalomethyl groups transferred are FH2C—, CIH2C— and others. The reagents used for transferal of the groups are described by Formulae A-D: wherein: X═F, CI, Br, I, sulfonate esters, phosphate esters or another leaving group; R11=tetrafluoroborates, inflates, halogen, perchlorate, sulfates, phosphates or carbonates The other variables are as defined in the claims. 2. A compound according to wherein for any of compounds A claim 1 , B claim 1 , C or D the said leaving group is the conjugated base of a strong acid or is a weak base.3. A compound of formula A according to claim 1 , wherein:X═F, Cl or Br; and{'sub': 1', '10, 'R1, R2, R3, R4, R5, R6, R7, R8, R9, R10=H or alkyl or C-Calkyl; and'}R11=tetrafluoroborate or triflato.4. A compound of formula A according to claim 3 , wherein:R1, R2, R3, R4, R5, R6, R7, R8, R9, R10=H or methyl.5. A compound of formula B according to claim 1 , wherein:X═F, Cl or Br; and{'sub': 1', '10, 'R1, R2, R3, R4, R5=H or alkyl or C-Calkyl; and'}R11=tetrafluoroborate or triflato; andR12=resin or naphthalene.6. A compound of formula B according to claim 5 , wherein:R1, R2, R3, R4, R5=H or methyl.7. A compound of formula C according to claim 1 , whereinX═F, Cl or Br; andR13=naphthalene; and{'sub': 1', '10, 'R6, R7, R8, R9, R10=H or alkyl or C-Calkyl; and'}R11=tetrafluoroborate or triflato.8. A compound of formula C according to claim 7 , whereinR6, R7, R8, R9, R10=H or methyl.9. A process for making an organic biologically active compound containing a “CHX” moiety claim 7 , or an intermediate therefor claim 7 , which process comprises the step of monohalomethylation claim 7 , wherein the monohalomethylating reagent used is a compound of formula A claim 7 , B claim 7 , C or D according to any one of to .10. A process according to wherein the ...

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Номер записи: 64
17-10-2013 дата публикации

PREPARATION OF OLIGOMERS AND CO-OLIGOMERS OF HIGHLY FLUORINATED SULFINIC ACIDS AND SALTS THEREOF

Номер: US20130274498A1
Автор: Dahlke Gregg D., Duchesne Denis, Fukushi Tatsuo, Grootaert Werner M.A., Guerra Miquel A., Qiu Zai-Ming
Принадлежит: 3M INNOVATIVE PROPERTIES COMPANY

There is provided a method for preparing oligomers and co-oligomers of highly fluorinated sulfuric acids and salts thereof. 2. The method of further comprising (d) acidifying the highly fluorinated sulfinate oligomer from step (c) and extracting a highly fluorinated sulfinic acid oligomer therefrom.3. The method of further comprising (e) converting the highly fluorinated sulfinic acid oligomer from step (d) to form a salt thereof.4. The method of wherein the highly fluorinated sulfinic acid oligomer is converted to the salt thereof using an organic or inorganic base.5. The method of wherein the highly fluorinated sulfinic acid oligomer is converted to the salt thereof using ammonium hydroxide.6. The method of wherein the highly fluorinated sulfinic acid oligomer is converted to the salt thereof using sodium or potassium hydroxide.8. The method of wherein when G is a functional group claim 7 , the functional group is selected from carboxylic acids and derivatives thereof claim 7 , nitriles claim 7 , sulfonyl halides claim 7 , sulphonates claim 7 , imidates claim 7 , amidines claim 7 , alcohols claim 7 , mercaptans claim 7 , iodine claim 7 , bromine and combinations thereof.10. The method of wherein the ethylenically-unsaturated monomer is selected from CH═CH claim 9 , CF═CH claim 9 , CF═CF claim 9 , CH═CHCHI claim 9 , CF═CFCFI claim 9 , CH═CHCFCFI claim 9 , CH═CHCFCFCHCHI claim 9 , CH═CH(CF)I claim 9 , CH═CH(CF)CHCHI claim 9 , CH═CH(CF)I claim 9 , CH═CH(CF)CHCHI claim 9 , CF═CFCHCHI claim 9 , CF═CFCFCFI claim 9 , CF═CFOCFCFI claim 9 , CF═CFOCFCFCHCHI claim 9 , CF═CFOCFCFCFI claim 9 , CF═CFOCFCFCFCFI claim 9 , CF═CFOCFCFCFCHCHI claim 9 , CF═CFOCFCFCHI claim 9 , CF═CFOCFCFCFCHI claim 9 , CF═CFCFOCHCHI claim 9 , CF═CFO(CF)OCFCFI claim 9 , CH═CHBr claim 9 , CF═CHBr claim 9 , CF═CFBr claim 9 , CH═CHCHBr claim 9 , CF═CFCFBr claim 9 , CH═CHCFCFBr claim 9 , CF═CFOCFCFBr claim 9 , CF═CFCl claim 9 , CF═CFCFCl claim 9 , and combinations thereof.12. The method of wherein R1 and ...

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Номер записи: 65
24-10-2013 дата публикации

Photoresist composition and resist pattern-forming method

Номер: US20130280657A1
Автор: Kazuki Kasahara, Norihiko Ikeda
Принадлежит: JSR Corp

A photoresist composition includes a polymer component that includes a first structural unit represented by the formula (1) and a second structural unit represented by the formula (2), an acid generator, and a compound represented by the formula (3). The first structural unit and the second structural unit are included in an identical polymer, or different polymers. R 1 is hydrogen atom, fluorine atom, etc., R 2 and R 3 are independently hydrogen atom, fluorine atom, etc., a is an integer from 1 to 6, R 4 and R 5 independently hydrogen atom, fluorine atom, etc., R 6 is hydrogen atom, fluorine atom, etc., R 7 and R 8 are each independently alkyl group having 1 to 4 carbon atoms, etc., R 9 is alkyl group having 1 to 4 carbon atoms, etc., R 10 is hydrogen atom, etc., A − is —N − —SO 2 —R a , etc., and X + is onium cation.

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Номер записи: 66
31-10-2013 дата публикации

Methods and Compositions for Pest Control

Номер: US20130289125A1
Автор: Robert Kenneth Vander Meer, Tappey H. Jones
Принадлежит: US Department of Agriculture USDA, VMI Foundation Inc

Methods and compositions for pest control, and more particularly for control of ants, e.g., of the subfamily Myrmicinae, using tyramides.

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Номер записи: 67
07-11-2013 дата публикации

RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT

Номер: US20130295505A1
Автор: MARUYAMA Ken
Принадлежит:

A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. In the formula (1), Ris a group represented by a formula (a1), and M represents a radiation-degradable monovalent cation. In the formula (a1), Rrepresents a substituted or unsubstituted chain hydrocarbon group having 1 to 30 carbon atoms, or the like. Rrepresents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like. Rrepresents —CO—, or the like. Rrepresents —CO—, or the like. m is an integer of 0 to 2. n is an integer of 0 to 1. A site denoted by * is a binding site with —O— in the formula (1). 2. The radiation-sensitive resin composition according to claim 1 , wherein M in the formula (1) represents a sulfonium cation or an iodonium cation. The present application is a continuation application of International Application No. PCT/JP2012/050290, filed Jan. 10, 2012, which claims priority to Japanese Patent Application No. 2011-002627, filed Jan. 11, 2011, and to Japanese Patent Application No. 2011-213584, filed Sep. 28, 2011. The contents of these applications are incorporated herein by reference in their entirety.1. Field of the InventionThe present invention relates to a radiation-sensitive resin composition, and a radiation-sensitive acid generating agent.2. Discussion of the BackgroundIn the field of microfabrication, etc., typified by manufacturing of integrated circuit elements, lithography techniques have been recently required that enable microfabrication at a level of no greater than about 100 nm in order to achieve higher integrity. Examples of radioactive rays which may be used in such microfabrication include far ultraviolet rays such as a KrF excimer laser, an ArF excimer laser, an Fexcimer laser and an EUV (extreme ultraviolet) ray, X-rays such as a synchrotron radioactive ray, charged particle rays such as an electron beam, and the like. As radiation-sensitive resin compositions suited for such a ...

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Номер записи: 68
14-11-2013 дата публикации

USE OF SINGLE AMINO ACIDS AT LOW CONCENTRATIONS FOR INFLUENCING THE LIFE PROCESSES OF CROPS

Номер: US20130303377A1
Автор: Quaghebeur Koen
Принадлежит: GLOBACHEM

This invention relates to the use of a composition in low doses containing single L-amino acids, including their precursors and biologically still active metabolites, to influence the life processes of plants, such as their growth, whereby the total amount of single L-amino acids when applying the composition is at least 0.5 g/ha and at most 250 g/ha, and wherein the L-amino acids are selected from the group of glutamine, asparagine, aspartic acid, histidine, lysine, and combinations thereof with each other and/or with arginine and/or with glutamic acid. 126.-. (canceled)27. A method for treating crops using a composition containing single L-amino acids for influencing the life processes of plants , whereby the single L-amino acids are selected from the group consisting of glutamine , asparagine , histidine and combinations thereof with at least one other of glutamine , asparagine , histidine , arginine , glutamic acid , aspartic acid and lysine , and whereby the total amount: of the selected single L-amino acids when applying the composition to the crops is at least 0.5 g/ha and at most 250 g/ha , ‘whereby the influencing of the life processes of plants is selected from the group consisting of the increasing of crop yields , the increasing of the fruit set of plants , the increasing of the number of fruits of plants , the increasing of the number of seeds of plants , the increasing of the fruit size of crops , the increasing of the grain size of crops , the increasing of the fruit size of seeds , the increasing of the diameter of fruits , the increasing of the diameter of seeds , the enhancing of the color of the fruit , the enhancing of the coloring of the fruit , the influencing of the maturation of crops , the increasing , of the protein content of fruits , the increasing of the protein content of seeds , the increasing of the total yield , the increasing of the proceeds of a first pick , the increasing of the yield of colored fruit at a first pick , the ...

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Номер записи: 69
21-11-2013 дата публикации

BIOCIDAL MATERIALS

Номер: US20130309336A1
Автор: Auberger Stephan
Принадлежит: SALVECO

A novel generation of biocidal materials is provided that do not pose any specific risks to the environment or health. The active substances and additives that make up the biocidal materials according to the invention originate from plants, agricultural products, and renewable resources, and are furthermore completely biodegradable. The various uses of said novel biocidal materials are also described. 1. A concentrated biocidal formulation of plant origin , characterized in that it contains:between 0.01% and 20% of chelating agent;between 0.03% and 25% of nonionic surfactants of glycoside, plyglycerol ester or sorbitan ester type;between 0.03% and 25% of anionic surfactants;between 0.1% and 75% of at least one organic acid;between 0.001% and 8% of natural fragrance;and in that it is completely biodegradable and completely derived from renewable natural agricultural resources.2. The concentrated biocidal formulation of plant origin as claimed in claim 1 , characterized in that the organic acids are selected from acetic acid claim 1 , formic acid claim 1 , citric acid claim 1 , sorbic acid claim 1 , lactic acid claim 1 , succinic acid claim 1 , tartaric acid claim 1 , malic acid and pyruvic acid.3. The concentrated biocidal formulation of plant origin as claimed in claim 1 , characterized in that the organic acid is lactic acid of renewable agricultural origin.4. The concentrated biocidal formulation of plant origin as claimed in claim 1 , characterized in that the nonionic surfactants are selected from alkyl polyglycosides claim 1 , polyglycerol esters and sorbitan esters of renewable agricultural origin.5. The concentrated biocidal formulation of plant origin as claimed in claim 1 , characterized in that the anionic surfactants are selected from alkali or alkaline-earth metal carboxylic acid salts of alkyl polyethoxylates/propoxylates and/or of polyols of the polyglycoside and/or polyglycerol type and are combined with acid chemical structures so as to form ...

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Номер записи: 70
21-11-2013 дата публикации

PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION

Номер: US20130309607A1
Автор: FUKUDA Shunji, Katayama Mami, SAKAYORI Katsuya
Принадлежит: Dai Nippon Printing Co., Ltd.

A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance. 2. The photosensitive resin composition according to claim 1 , wherein the base thus generated is a secondary amine which has one NH group that is able to form an amide bond and/or a heterocyclic compound.3. The photosensitive resin composition according to claim 1 , wherein at least one of R claim 1 , R claim 1 , Rand Ris halogen claim 1 , a hydroxyl group claim 1 , a nitro group claim 1 , a nitroso group claim 1 , a mercapto group claim 1 , a silyl group claim 1 , a silanol group or a monovalent organic group claim 1 , or two or more of R claim 1 , R claim 1 , Rand Rare bound to form a condensed ring together with a benzene ring to which R claim 1 , R claim 1 , Rand Rare bound.4. The photosensitive resin composition according to claim 1 , wherein the base thus generated has a boiling point of 25° C. or more and a weight loss of 80% or more at 350° C.6. The photosensitive resin composition according to claim 1 , wherein the base generator has absorption at at least one of electromagnetic wavelengths of 365 nm claim 1 , 405 nm and 436 nm.7. The photosensitive resin composition according to claim 1 , wherein the polymer precursor comprises one or more selected from the group consisting of a compound and polymer having an epoxy group claim 1 , isocyanate group claim 1 , oxetane group or thiirane group claim 1 , a polysiloxane precursor claim 1 , a polyimide precursor and a ...

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Номер записи: 71
19-12-2013 дата публикации

Herbicidal compositions containing benzoylpyrazole compounds

Номер: US20130338004A1
Автор: Hiroshi Kikugawa, Makiko Sano, Souichiro Nagayama
Принадлежит: Ishihara Sangyo Kaisha Ltd

[OBJECT] To provide a novel pesticide. [MEANS OF ACCOMPLISHING THE OBJECT] The present invention provides a herbicidal composition which comprises as active ingredients (a) a herbicidal benzoylpyrazole compound represented by the formula (I) or its salt: wherein R 1 is alkyl or cycloalkyl, R 2 is a hydrogen atom or alkyl, R 3 is alkyl, R 4 is alkyl, haloalkyl or the like, R 5 is a hydrogen atom, alkyl or the like, R 6 is haloalkyl, halogen or the like, and A is alkylene substituted by alkyl, and (b) other herbicidal compound.

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Номер записи: 72
26-12-2013 дата публикации

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

Номер: US20130344438A1
Автор: Cheng-Bai Xu, Cong Liu, Emad Aqad, Gregory P. Prokopowicz, Irvinder Kaur, Mingqi Li
Принадлежит: Rohm and Haas Electronic Materials LLC

A photoacid generator has the formula (I): wherein R 1 , R 2 , R 3 , L 1 , L 2 , L 3 X, Z + , a, b, c, d, p, q, and r, are defined herein. A photoresist comprises the photoacid generator, and a coated article comprises the photoresist. The photoresist can be used to form an electronic device.

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Номер записи: 73
26-12-2013 дата публикации

Polymer, positive resist composition and patterning process

Номер: US20130344442A1
Автор: Jun Hatakeyama, Koji Hasegawa, Masayoshi Sagehashi
Принадлежит: Shin Etsu Chemical Co Ltd

A polymer comprising recurring units of butyrolactone (meth)acrylate, recurring units having a carboxyl or phenolic group which is substituted with an acid labile group, and recurring units having a phenol group or an adhesive group in the form of 2,2,2-trifluoro-1-hydroxyethyl is quite effective as a base resin for resist. A positive resist composition comprising the polymer is improved in such properties as a contrast of alkali dissolution rate before and after exposure, acid diffusion suppressing effect, resolution, and profile and edge roughness of a pattern after exposure.

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Номер записи: 74
16-01-2014 дата публикации

Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern

Номер: US20140017617A1
Автор: Masatoshi Arai, Yoshiyuki Utsumi
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A method of producing an ammonium salt compound, including reacting a first ammonium salt compound containing a first ammonium cation which is a primary, secondary or tertiary ammonium cation with a nitrogen-containing compound having a lone pair to obtain a second ammonium salt compound which contains a conjugated acid of the nitrogen-containing compound, the conjugated acid of the nitrogen-containing compound having a larger pKa than the pKa of the first ammonium cation; and a method of producing a compound, including a step of salt exchange between the ammonium salt compound obtained by the aforementioned production method and a sulfonium cation or iodonium cation which has a higher hydrophobicity than the hydrophobicity of the conjugated acid of the nitrogen-containing compound.

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Номер записи: 75
23-01-2014 дата публикации

PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

Номер: US20140023971A1
Автор: MASUYAMA Tatsuro, YAMAGUCHI Satoshi
Принадлежит:

A photoresist composition comprising 6. The photoresist composition according to claim 1 , which further comprises a solvent.7. A process for producing a photoresist pattern comprising the following steps (1) to (5):{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) a step of applying the photoresist composition according to on a substrate,'}(2) a step of forming a composition film by drying the composition,(3) a step of exposing the composition film to radiation,(4) a step of baking the exposed composition film, and(5) a step of developing the baked composition film, thereby forming a photoresist pattern.11. The photoresist composition according to claim 2 , which further comprises a solvent.12. A process for producing a photoresist pattern comprising the following steps (1) to (5):{'claim-ref': {'@idref': 'CLM-00002', 'claim 2'}, '(1) a step of applying the photoresist composition according to on a substrate,'}(2) a step of forming a composition film by drying the composition,(3) a step of exposing the composition film to radiation,(4) a step of baking the exposed composition film, and(5) a step of developing the baked composition film, thereby forming a photoresist pattern. This nonprovisional application claims priority under 35 U.S.C. §119(a) on Patent Application No. 2012-159646 filed in JAPAN on Jul. 18, 2012, the entire contents of which are hereby incorporated by reference.The present invention relates to a photoresist composition and a method for producing a photoresist pattern.As a method for forming a negative photoresist pattern, JP2008-309879A1 mentions a photoresist composition comprising: a resin which increases in its polarity by action of an acid and which shows increased solubility in positive developer and decreased solubility in negative developer by irritation of active light or radiant lay,a compound which generates an acid by irritation of active light or radiant lay, solvent, and a resin which comprises at least one of a fluorine atom ...

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Номер записи: 76
30-01-2014 дата публикации

ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION

Номер: US20140030643A1
Автор: HIRANO Shuji, TAKAHASHI Toshiya, Takizawa Hiroo, TSUBAKI Hideaki, Tsuchimura Tomotaka
Принадлежит: FUJIFILM Corporation

Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) containing an acid-decomposable repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula () or () below. 2. The composition according to claim 1 , wherein the organic group is an alkyl group or an aryl group.3. The composition according to claim 1 , wherein the compound (R) is expressed by general formula (1) claim 1 , and wherein at least one of Rand Ris a hydrogen atom.4. The composition according to claim 3 , wherein both of Rand Rare hydrogen atoms.5. The composition according to claim 1 , wherein the compound (R) is expressed by general formula (2) claim 1 , and wherein Ris a hydrogen atom.8. The composition according to claim 7 , wherein the repeating unit (B) has a hydroxystyrene structure.9. The composition according to claim 1 , further comprising a basic compound other than the compound (R).10. The composition according to claim 9 , wherein the basic compound contains no hydroxyl group.11. The composition according to for use in a pattern formation including exposure by EUV.12. An actinic-ray- or radiation-sensitive resin film formed from the composition according to .13. A method of forming a pattern claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00012', 'claim 12'}, 'exposing the film according to to light, and'}developing the exposed film.14. The method according to claim 13 , wherein the exposure is carried out by EUV light.15. A process for manufacturing an electronic device claim 13 , comprising the pattern forming method according to .16. An electronic device manufactured by the process according to . This application is a Continuation Application of PCT Application No. PCT/JP2012/059300, filed Mar. 29, 2012 and based upon and claiming the benefit of priority from prior Japanese ...

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Номер записи: 77
30-01-2014 дата публикации

PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

Номер: US20140030654A1
Автор: ICHIKAWA Koji, MASUYAMA Tatsuro, YAMAGUCHI Satoshi
Принадлежит: Sumitomo Chemical Company, Limited

A photoresist composition comprising 2. The photoresist composition according to claim 1 , wherein Rrepresents a C3-C18 unsubstituted alicyclic hydrocarbon group.5. A process for producing a photoresist pattern comprising the following steps (1) to (5):{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) a step of applying the photoresist composition according to on a substrate,'}(2) a step of forming a composition film by drying the composition,(3) a step of exposing the composition film to radiation,(4) a step of baking the exposed composition film, and(5) a step of developing the baked composition film, thereby forming a photoresist pattern.7. A process for producing a photoresist pattern comprising the following steps (1) to (5):{'claim-ref': {'@idref': 'CLM-00002', 'claim 2'}, '(1) a step of applying the photoresist composition according to on a substrate,'}(2) a step of forming a composition film by drying the composition,(3) a step of exposing the composition film to radiation,(4) a step of baking the exposed composition film, and(5) a step of developing the baked composition film, thereby forming a photoresist pattern. This nonprovisional application claims priority under 35 U.S.C. §119(a) on Patent Application No. 2012-166681 filed in JAPAN on Jul. 27, 2012, the entire contents of which are hereby incorporated by reference.The present invention relates to a photoresist composition and a method for producing a photoresist pattern.As a method for forming a negative photoresist pattern, JP2010-197413A1 mentions a positive type photoresist composition for immersion exposure, which comprises:a fluorine-containing macromolecular compound (F1) which comprises a structural unit having a base-dissociable group and a structural unit represented by the following general formula (f2-1);where R represents a hydrogen atom, a C1-C5 alkyl group, or a C1-C5 halogenated alkyl group, and W represents a polycyclic hydrocarbon-containing group, a base component (A) which ...

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Номер записи: 78
06-02-2014 дата публикации

LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR

Номер: US20140038103A1
Автор: Miller Seth Adrian
Принадлежит: Empire Technology Development, LLC

Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a photoinitiator and a photoinhibitor. The photoinitiator may be effective to generate a first reactant upon the absorption of at least one photon of a particular wavelength of light. The first reactant may be effective to render the resin soluble or insoluble in a photoresist developer. The photoinhibitor may be effective to generate a second reactant upon the absorption of at least one photon of the particular wavelength of light. The second reactant may be effective to inhibit the first reactant. 1. A photoresist comprising:at least one resin;at least one photoinitiator effective to generate a first reactant upon the absorption of at least two photons of a particular wavelength of light from incident light, wherein the first reactant is effective to render the resin soluble or insoluble in a photoresist developer; andat least one photoinhibitor effective to generate a second reactant upon the absorption of at least one photon of the particular wavelength of light from the incident light, wherein the second reactant is effective to inhibit the first reactant.2. The photoresist of claim 1 , wherein the particular wavelength of light is greater than 193 nm.3. The photoresist of claim 1 , wherein the particular wavelength of light is about 300 nm to about 400 nm.4. The photoresist of claim 1 , wherein the first reactant is an acidic compound and the second reactant is a basic compound.5. The photoresist of claim 1 , wherein:the first reactant is an acidic compound;the second reactant is a basic compound; andthe acidic compound is effective to depolymerize the resin.6. The photoresist of claim 1 , wherein the photoinitiator includes caged benzophenone and diphenyliodonium hexafluorophosphate.7. The photoresist of claim 4 , wherein the acidic compound is hexafluorophosphoric acid. ...

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Номер записи: 79
06-02-2014 дата публикации

N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION

Номер: US20140038106A1
Автор: Fukumoto Takashi, MATSUNAGA Shuji, Tsuruta Miki
Принадлежит: KURARAY CO., LTD.

Provided are N-acyl-β-lactam derivatives represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-β-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer, 16-. (canceled)9. The N-acyl-β-lactam derivative of claim 7 , wherein n is 1.10. The N-acyl-β-lactam derivative of claim 8 , wherein n is 1.11. The N-acyl-β-lactam derivative of claim 7 , wherein n is 0 claim 7 , and the Rand Rare connected to each other to form a substituted or unsubstituted ring 2) having a ring forming atom number of 10 claim 7 , said ring 2) optionally comprising an oxygen atom.12. The N-acyl-β-lactam derivative of claim 8 , wherein n is 0 claim 8 , and Zrepresents a ring formed together with the two carbon atoms on the β-lactam claim 8 , with a number of atoms forming the ring being 10.13. A polymer obtained by polymerizing the N-acyl-β-lactam derivative of .14. A photoresist composition claim 12 , comprising the polymer of claim 12 , a photo acid generator claim 12 , and a solvent.17. The method of or claim 12 , wherein n is 1.18. The method of or claim 12 , wherein n is 0. The present invention relates to an N-acyl-β-lactam derivative, a polymer obtained by polymerizing at least the N-acyl-β-lactam derivative as one of starting materials, and a photoresist composition having a short acid diffusion length, in which a line width roughness (LWR) is improved and from which a resist pattern having a high resolution is formed.In recent years, in the field of manufacture of electronic devices represented by the manufacture of integrated circuit devices, requirements for high integration of devices are increasing, and it is known that the structure of a polymer in a photoresist composition influences the formation of a fine pattern.In the photoresist composition, ...

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Номер записи: 80
13-02-2014 дата публикации

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

Номер: US20140045122A1
Автор: Hasegawa Koji, Hatakeyama Jun
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

A positive resist composition comprises a polymer having a carboxyl group substituted with an acid labile group having formula (1) wherein Rand Rare alkyl or alkenyl, Rand Rare a single bond, methylene, ethylene or propylene, Rand Rare hydrogen or alkyl. The composition has a high dissolution contrast, high resolution, and suppressed acid diffusion rate, and forms a pattern of good profile and minimal edge roughness. 3. The resist composition of wherein the polymer comprising recurring units (a) represented by formula (2) has further copolymerized therein recurring units (b) having an adhesive group selected from the class consisting of hydroxyl claim 2 , lactone ring claim 2 , ether claim 2 , ester claim 2 , carbonyl claim 2 , cyano claim 2 , sulfonic acid ester claim 2 , sulfonamide claim 2 , —O—C(═O)—S— and —O—C(═O)—NH— wherein 0 Подробнее

Номер записи: 81
20-02-2014 дата публикации

MAINTENANCE LIQUID

Номер: US20140048754A1
Автор: Kodama Kenichi, Kodama Kunihiko
Принадлежит: FUJIFILM Corporation

Disclosed is a maintenance liquid for property carrying out imprints excellent in patternability. The maintenance liquid for imprints of an ink-jet discharging device comprises a compound comprising an ester group and/or an ether group. 2. The maintenance liquid according to claim 1 , wherein the compound having an ester group and/or an ether group is a polymerizable monomer.3. The maintenance liquid according to claim 1 , having a viscosity at 25° C. of 50 mPa·s or less.4. The maintenance liquid according to claim 1 , containing a compound having both of an ester functional group and an ether group claim 1 , or containing both of a compound having an ester functional group and a compound having an ether group.5. The maintenance liquid according to claim 1 , having a boiling point at 1 atm of 150° C. or higher.6. The maintenance liquid according to claim 1 , wherein 50% by mass or more of the maintenance liquid is the compound having an ester group and/or an ether group.7. The maintenance liquid according to claim 1 , which consists essentially of the compound having an ester group and/or an ether group and the polymerizable monomer.8. The maintenance liquid according to claim 1 , which consists essentially of the compound having an ester group and/or an ether group and a (meth)acrylate monomer.9. A method of manufacturing the maintenance liquid according to claim 1 , the method including a process of mixing components for composing the maintenance liquid claim 1 , followed by filtration.10. The maintenance liquid according to claim 1 , wherein the compound having an ester group and/or an ether group is different from the polymerizable monomer.11. The maintenance liquid according to claim 1 , wherein the compound having an ester group and/or an ether group is non-polymerizable.12. The maintenance liquid according to claim 1 , wherein the compound having an ester group and/or an ether group is non-polymerizable.13. The maintenance liquid according to claim 1 , ...

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Номер записи: 82
27-02-2014 дата публикации

Photoresist Film and Manufacturing Method for Organic Light Emitting Display Device Using the Same

Номер: US20140057379A1
Автор: Hye Li Min, Jae Hyun Park, Jin Wuk Kim, Min Jee Kim, Wy-Yong Kim, Young sub Shin, Young Tae Son
Принадлежит: LG Display Co Ltd

Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.

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Номер записи: 83
06-03-2014 дата публикации

Photoresist and coated substrate comprising same

Номер: US20140065540A1
Автор: Cheng-Bai Xu, Chunyi Wu, Cong Liu, Deyan Wang, George G. Barclay, Gerhard Pohlers
Принадлежит: Rohm and Haas Electronic Materials LLC

A polymer includes the polymerized product of monomers including a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a, L 1 , LN, R a , R b , R c , and X are defined herein. The polymer is a useful component of a photoresist composition.

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Номер записи: 84
06-03-2014 дата публикации

Method of Stabilizing Fluorine-Containing Acid Amplifier

Номер: US20140065541A1
Автор: AKIBA Shinya, NADANO Ryo
Принадлежит: CENTRAL GLASS COMPANY, LIMITED

A method of stabilizing a fluorine-containing acid amplifier. The method is provided to include the step of dissolving a fluorine-containing acid amplifier in an organic solvent thereby producing a solution of the fluorine-containing acid amplifier, the fluorine-containing acid amplifier being represented by general formula (1): 4. A method of stabilizing a fluorine-containing acid amplifier claim 1 , as claimed in claim 1 , wherein the organic solvent is at least one kind selected from the group consisting of aliphatic hydrocarbons claim 1 , aromatic hydrocarbons claim 1 , halogenated hydrocarbons claim 1 , alcohols claim 1 , ketones claim 1 , cyclic ketones claim 1 , polyalcohols claim 1 , polyalcohol derivatives claim 1 , cyclic ethers claim 1 , chain ethers claim 1 , esters claim 1 , sulfonyl esters claim 1 , amides claim 1 , aromatic solvents and fluorine-based solvents.5. A method of stabilizing a fluorine-containing acid amplifier claim 1 , as claimed in claim 1 , wherein the fluorine-containing acid amplifier contained in the solution of the fluorine-containing acid amplifier has a concentration of 0.05 to 90 mass %.6. A method of stabilizing a fluorine-containing acid amplifier claim 1 , as claimed in claim 1 , further comprising the step of:adding an additive to the solution of the fluorine-containing acid amplifier.7. A method of stabilizing a fluorine-containing acid amplifier claim 6 , as claimed in claim 6 , wherein the additive is a basic compound or an antioxidant.8. A method of stabilizing a fluorine-containing acid amplifier claim 7 , as claimed in claim 7 , wherein the basic compound is at least one kind selected from the group consisting of primary claim 7 , secondary or tertiary aliphatic amines claim 7 , aromatic amines claim 7 , heterocyclic amines claim 7 , nitrogen-containing compounds having hydroxyphenyl group claim 7 , alcoholic nitrogen-containing compounds and amide derivatives.9. A method of stabilizing a fluorine-containing acid ...

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Номер записи: 85
06-03-2014 дата публикации

RESIST COMPOSITION AND PATTERNING PROCESS

Номер: US20140065544A1
Автор: Funatsu Kenji, Hatakeyama Jun, Katayama Kazuhiro
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

A polymer capable of increasing alkali solubility under the action of acid, as a base resin is blended with a copolymer comprising recurring units derived from acenaphthylene, indene, benzofuran or benzothiophene and fluorine-containing recurring units, as a polymeric additive to formulate a resist composition. The photoresist film formed using the resist composition is effective for minimizing outgassing therefrom during the EUV lithography. The resist film has a hydrophilic surface and is effective for suppressing formation of blob defects after development. 1. A resist composition comprisinga polymer capable of increasing alkali solubility under the action of acid, as a base resin anda copolymer comprising recurring units derived from at least one monomer selected from the group consisting of acenaphthylene, indene, benzofuran, and benzothiophene, and recurring units having at least one fluorine atom, as a polymeric additive.3. The resist composition of which is a chemically amplified positive resist composition.4. The resist composition of wherein the polymer serving as a base resin comprises recurring units having an acid labile group and recurring units having a hydroxyl group and/or lactone ring as an adhesive group.7. The resist composition of claim 1 , further comprising at least one of an organic solvent claim 1 , basic compound claim 1 , dissolution regulator claim 1 , and surfactant.8. A pattern forming process comprising the steps of applying the resist composition of onto a substrate to form a coating claim 1 , baking claim 1 , exposing the coating to high-energy radiation claim 1 , and developing the exposed coating in a developer.9. The process of wherein the high-energy radiation is KrF excimer laser of wavelength 248 nm claim 8 , ArF excimer laser of wavelength 193 nm claim 8 , electron beam or soft x-ray of wavelength 3 to 15 nm. This non-provisional application claims priority under 35 U.S.C. §119(a) on Patent Application No. 2012-194741 filed in ...

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Номер записи: 86
06-03-2014 дата публикации

RESIST COMPOSITION AND PATTERNING PROCESS

Номер: US20140065545A1
Автор: Funatsu Kenji, Hatakeyama Jun, Katayama Kazuhiro
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

A polymer capable of increasing alkali solubility under the action of acid, as a base resin is blended with a copolymer comprising recurring units derived from (meth)acrylate, vinyl ether, vinylfluorene, vinylanthracene, vinylpyrene, vinylbiphenyl, stilbene, styrylnaphthalene or dinaphthylethylene, and fluorine-containing recurring units, as a polymeric additive to formulate a resist composition. The photoresist film formed using the resist composition is effective for minimizing outgassing therefrom during the EUV lithography. The resist film has a hydrophilic surface and is effective for suppressing formation of blob defects after development. 1. A resist composition comprisinga polymer capable of increasing alkali solubility under the action of acid, as a base resin and{'sub': 12', '20, 'a copolymer comprising recurring units derived from at least one monomer selected from the group consisting of a (meth)acrylate and vinyl ether each having a C-Caromatic group exclusive of acenaphthyl, vinylfluorene, vinylanthracene, vinylpyrene, vinylbiphenyl, stilbene, styrylnaphthalene, and dinaphthylethylene, and recurring units having at least one fluorine atom, as a polymeric additive.'}3. The resist composition of which is a chemically amplified positive resist composition.4. The resist composition of wherein the polymer serving as a base resin comprises recurring units having an acid labile group and recurring units having a hydroxyl group and/or lactone ring as an adhesive group7. The resist composition of claim 1 , further comprising at least one of an organic solvent claim 1 , basic compound claim 1 , dissolution regulator claim 1 , and surfactant.8. A pattern forming process comprising the steps of applying the resist composition of onto a substrate to form a coating claim 1 , baking claim 1 , exposing the coating to high-energy radiation claim 1 , and developing the exposed coating in a developer.9. The process of wherein the high-energy radiation is KrF excimer ...

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Номер записи: 87
06-03-2014 дата публикации

RESIST COMPOSITION AND PATTERNING PROCESS

Номер: US20140065546A1
Автор: Hatakeyama Jun
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

A polymer capable of increasing alkali solubility under the action of acid, as a base resin is blended with a polymer comprising recurring units derived from a styrene having 1,1,1,3,3,3-hexafluoro-2-propanol as a polymeric additive to formulate a resist composition. The photoresist film formed using the resist composition is effective for minimizing outgassing therefrom during the EUV lithography, reducing LWR after development, and suppressing formation of blob defects after development because of its hydrophilic surface. 1. A resist composition comprisinga polymer capable of increasing alkali solubility under the action of acid, as a base resin anda polymer comprising recurring units derived from a styrene having 1,1,1,3,3,3-hexafluoro-2-propanol, as a polymeric additive.4. The resist composition of which is a chemically amplified positive resist composition.5. The resist composition of wherein the polymer serving as a base resin comprises recurring units having an acid labile group and recurring units having a hydroxyl group and/or lactone ring as an adhesive group8. The resist composition of claim 1 , further comprising at least one of an organic solvent claim 1 , basic compound claim 1 , dissolution regulator claim 1 , and surfactant.9. A pattern forming process comprising the steps of applying the resist composition of onto a substrate to form a coating claim 1 , baking claim 1 , exposing the coating to high-energy radiation claim 1 , and developing the exposed coating in a developer.10. The process of wherein the high-energy radiation is KrF excimer laser of wavelength 248 nm claim 9 , ArF excimer laser of wavelength 193 nm claim 9 , electron beam or soft x-ray of wavelength 3 to 15 nm. This non-provisional application claims priority under 35 U.S.C. §119(a) on Patent Application No. 2012-194753 filed in Japan on Sep. 5, 2012, the entire contents of which are hereby incorporated by reference.This invention relates to a resist composition, especially ...

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Номер записи: 88
20-03-2014 дата публикации

SILOXANE-BASED COMPOUND, PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME AND PHOTOSENSITIVE MATERIAL

Номер: US20140080043A1
Автор: Kim Hyehyeon, Kim Saehee, KWAK Sang Kyu, Lee Changsoon, Lee Keon Woo
Принадлежит:

The present application relates to a siloxane-based compound, a photosensitive composition including the same, and a photosensitive material. 2. The compound according to claim 1 , wherein R5 claim 1 , R6 claim 1 , R7 claim 1 , and R8 in Formula 1 are the same as or different from each other claim 1 , and each independently an alkylene group having 1 to 3 carbon atoms.3. The compound according to claim 1 , wherein R1 claim 1 , R1′ claim 1 , R1″ claim 1 , R2 claim 1 , R2′ claim 1 , and R2″ in Formula 1 are the same as or different from each other claim 1 , and each independently a methoxy group or an ethoxy group.4. The compound according to claim 1 , wherein R3 and R4 in Formula 1 are the same as or different from each other claim 1 , and each independently an alkyl group having 1 to 3 carbon atoms.5. The compound according to claim 1 , wherein R and R′ in Formula 1 are hydrogen.6. The compound according to claim 1 , wherein n in Formula 1 is an integer from 1 to 3.7. A photosensitive composition comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a) the compound represented by Formula 1 according to ;'}b) a crosslinkable compound comprising two or more unsaturated acrylic bonds;c) an alkali soluble binder resin;d) a photopolymerization initiator; ande) a solvent.8. The photosensitive composition according to claim 7 , wherein R5 claim 7 , R6 claim 7 , R7 claim 7 , and R8 in Formula 1 are the same as or different from each other claim 7 , and each independently an alkylene group having 1 to 3 carbon atoms.9. The photosensitive composition according to claim 7 , wherein R1 claim 7 , R1′ claim 7 , R1″ claim 7 , R2 claim 7 , R2′ claim 7 , and R2″ in Formula 1 are the same as or different from each other claim 7 , and each independently a methoxy group or an ethoxy group.10. The photosensitive composition according to claim 7 , wherein R3 and R4 in Formula 1 are the same as or different from each other claim 7 , and each independently an alkyl group having 1 ...

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Номер записи: 89
20-03-2014 дата публикации

ONIUM COMPOUNDS AND METHODS OF SYNTHESIS THEREOF

Номер: US20140080056A1
Автор: LaBeaume Paul J.
Принадлежит:

New onium salt compounds and methods for synthesis of such compounds are provided. Preferred methods of the invention include (a) providing an onium salt compound comprising a sulfonate component having an electron withdrawing group; and (b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound. The present onium compounds are useful as an acid generator component of a photoresist composition. 1. A method for preparing an onium salt compound , comprising:(a) providing an onium salt compound comprising a sulfonate component, wherein the sulfonate component comprises an electron withdrawing group; and(b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound.2. The method of wherein the one or more electron withdrawing groups comprise one or more halogen atoms.3. The method of wherein the sulfonate component is a triflate.5. The method of wherein one or more of R claim 6 , Rand Rare halogen or halogenated alkyl.6. The method of wherein (i) the onium salt compound is treated with a halide salt to form a halide salt of the onium compound and (ii) the halide salt of the onium compound is further treated to provide the distinct salt of the onium compound.7. A method of preparing a photoresist composition claim 6 , comprising admixing the distinct salt of the onium compound of with a polymer to provide a photoresist composition.8. A photolithographic method comprising: (i) applying a coating layer of a photoresist composition prepared in accordance with on a substrate surface; (ii) exposing the photoresist composition layer to activating radiation; and (iii) developing the exposed photoresist composition layer to provide a resist relief image.9. An onium salt compound claim 7 , obtainable by a method comprising:(a) providing an onium salt comprising a sulfonate component, wherein the sulfonate component an electron withdrawing group;(b) treating the sulfonate salt with a halide salt to ...

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Номер записи: 90
20-03-2014 дата публикации

ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME

Номер: US20140080059A1
Автор: Jain Vipul, LaBeaume Paul J., Rachford Aaron A.
Принадлежит:

Acid generator compounds are provided that are particularly useful as a photoresist composition component. Acid generator compounds of the invention comprise 1) a cyclic sulfonium salt and 2) a covalently linked photoacid-labile group. In one aspect, thioxanthone acid generator compounds are particularly preferred, including acid generator compounds that comprise (i) a thioxanthone moiety; and (ii) one or more covalently linked acid labile-groups. 1. A photoresist composition comprising:(a) a polymer; and (i) a thioxanthone moiety; and', '(ii) one or more covalently linked acid labile-groups., '(b) an acid generator comprising6. The photoresist composition of wherein the acid generator compound comprises an acid-labile group of the following Formula (III):{'br': None, 'sub': 'n', 'sup': '3', '—O (CXY)R\u2003\u2003(III)'}{'sup': '3', 'wherein X and Y are independently hydrogen or a non-hydrogen substituent; Ris a non-hydrogen substituent that provides an acid-labile moiety; and n is a positive integer.'}7. The photoresist composition of wherein the acid generator compound exhibits a reduction potential of −0.9 to 0 V (vs. Ag/AgCl claim 1 , cathodic peak potential) in a standard reduction potential assay.8. The photoresist composition of wherein the acid generator compound is covalently bound to a polymer.9. A method for providing a photoresist relief image claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a) applying a coating layer of a photoresist composition of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer.10. The method of wherein the photoresist composition layer is exposed to EUV or e-beam radiation.11. An acid generator compound as described in . The present invention relates to new acid generator compounds that comprise a cyclic sulfonium salt with a covalently linked acid-labile moiety and photoresist compositions that comprise ...

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Номер записи: 91
20-03-2014 дата публикации

PHOTORESISTS COMPRISING MULTIPLE ACID GENERATOR COMPOUNDS

Номер: US20140080062A1
Автор: Jain Vipul, LaBeaume Paul J., SUNG Jin Wuk, Thackeray James W.
Принадлежит:

The present invention relates to new photoresist compositions that comprise (a) a polymer comprising an acid generator bonded thereto; and (b) an acid generator compound that is not bonded to the polymer and that comprises one or more acid-labile groups. 1. A photoresist composition comprising:(a) a polymer comprising an acid generator bonded thereto; and(b) an acid generator compound that is not bonded to the polymer and that comprises one or more acid-labile groups.2. The photoresist composition of wherein the (a) bonded acid generator and/or the (b) acid generator compound comprise a sulfonium moiety and/or an iodonium moiety.3. The photoresist composition of or wherein the (a) bonded acid generator and/or the (b) acid generator compound comprise a thioxanthone moiety.43. The photoresist composition of any one of through wherein the (a) bonded acid generator and/or the (b) acid generator compound comprise a dibenzothiophene moiety.53. The photoresist composition of any one of through wherein the (a) bonded acid generator comprises an anion component covalently bonded to the polymer.65. The photoresist composition of any one of through wherein the (a) bonded acid generator comprises an acid-labile group.76. The photoresist composition of any one of through wherein the acid-labile group of the (b) acid generator compound is on a cation component of the acid generator compound.87. The photoresist composition of any one of through wherein the (b) acid generator compound is present in an amount of from 10 to 50 weight.percent relative to the (a) polymer with bonded acid generator.9. A method for providing a photoresist relief image claims 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claims 1'}, 'b': '8', 'a) applying a coating layer of a photoresist composition of any one of through on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer.10. The method of ...

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Номер записи: 92
20-03-2014 дата публикации

METHODS FOR PROMOTING PLANT HEALTH

Номер: US20140080709A1
Автор: Bais Harsh, Kumar Amutha Sampath, Lakshmanan Venkatachalam, Rudrappa Thimmaraju
Принадлежит: University of Delaware

A method for promoting the health of a plant comprises administering malic acid to the plant or the soil in an amount effective to recruit plant growth promoting rhizobacteria (PGPR) to the plant. Administration of malic acid promotes biofilm formation of PGPR on the plant's roots, thereby restricting entry of a foliar pathogen through stomatal pores present in the leaves. Another method for promoting the health of a plant comprises administering acetoin to the plant or the soil in an amount effective to increase pathogen resistance in aerial parts of the plant. 1. A method for promoting the health of a plant growing in a soil portion , comprising administering a malate to the plant or the soil portion in an amount effective to recruit PGPR to the plant.2. The method according to claim 1 , wherein the recruitment of PGPR induces biofilm formation on the plant's roots and increases pathogen resistance in aerial parts of the plant.3. The method according to claim 1 , wherein the administration step comprises administering L-malic acid in substantially pure isomeric form.4Bacillus subtilis. The method according to claim 1 , wherein the PGPR comprise FB17.5. The method according to claim 2 , wherein the pathogen resistance in aerial parts of the plant comprises foliar resistance to pathogens.6Pseudomonas syringae. The method according to claim 5 , wherein the pathogens comprise pv tomato.7. The method according to claim 1 , wherein the PGPR cause guard cells of the plant to close claim 1 , thereby restricting pathogen entry into aerial parts of the plant.8. The method of claim 1 , wherein the administration step comprises administering a precursor of malic acid.9. The method according to claim 1 , wherein the plant comprises a crop plant selected from the group consisting of corn claim 1 , tomato plants claim 1 , and cucumber plants.10. A method for promoting the health of a plant growing in a soil portion claim 1 , comprising administering acetoin to the plant or the ...

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Номер записи: 93
27-03-2014 дата публикации

Chemically amplified positive resist composition and pattern forming process

Номер: US20140087294A1
Автор: Hideyoshi Yanagisawa, Katsuya Takemura, Masashi Iio, Takashi Miyazaki
Принадлежит: Shin Etsu Chemical Co Ltd

In a chemically amplified positive resist composition comprising (A) a base resin, (B) a photoacid generator, (C) a thermal crosslinker, and (D) an organic solvent, the base resin is a specific polymer and the crosslinker is a siloxane compound. A coating of the composition is readily developable in aqueous alkaline solution. On heat treatment, it forms a cured resist pattern film of satisfactory profile.

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Номер записи: 94
27-03-2014 дата публикации

PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATIONS THEREOF

Номер: US20140087307A1
Автор: CHEN Kai-Min, Shih Chun-An
Принадлежит: CHI MEI CORPORATION

A photosensitive resin composition includes: an alkali-soluble resin; an o-naphthoquinonediazidesulfonic acid ester; a urethane(meth)acrylate compound having at least six (meth)acryloyl groups in a molecule; and a solvent. A protective film which is formed from the photosensitive resin composition and an element which includes the protective film are also provided. 1. A photosensitive resin composition comprising:an alkali-soluble resin;an o-naphthoquinonediazidesulfonic acid ester;a urethane(meth)acrylate compound having at least six (meth)acryloyl groups in a molecule; anda solvent.2. The photosensitive resin composition as claimed in claim 1 , wherein said alkali-soluble resin is obtained by subjecting a mixture to copolymerization claim 1 , said mixture containing at least one carboxyl group-containing compound selected from the group consisting of an unsaturated carboxylic acid compound and an unsaturated carboxylic anhydride compound claim 1 , a first unsaturated compound having an epoxy group claim 1 , and a second unsaturated compound different from said at least one carboxyl group-containing compound and said first unsaturated compound having the epoxy group.3. The photosensitive resin composition as claimed in claim 1 , wherein said o-naphthoquinonediazidesulfonic acid ester is in an amount ranging from 10 to 50 parts by weight claim 1 , said urethane(meth)acrylate compound is in an amount ranging from 1 to 30 parts by weight claim 1 , and said solvent is in an amount ranging from 100 to 800 parts by weight based on 100 parts by weight of said alkali-soluble resin.4. A protective film formed from the photosensitive resin composition as claimed in .5. An element comprising the protective film as claimed in . This application claims priority of Taiwanese Patent Application No. 101135626, filed on Sep. 27, 2012.1. Field of the InventionThe invention relates to a photosensitive resin composition, more particularly to a photosensitive resin composition for ...

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Номер записи: 95
27-03-2014 дата публикации

PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATIONS THEREOF

Номер: US20140087308A1
Автор: CHEN Kai-Min, Shih Chun-An
Принадлежит: CHI MEI CORPORATION

A photosensitive resin composition includes: an alkali-soluble resin; an o-naphthoquinonediazidesulfonic acid ester; a silsesquioxane having at least two thiol groups in a molecule; and a solvent. The silsesquioxane is obtained by subjecting to condensation a silane material which includes a thiol-group-containing silane represented by RSi(OR). Rrepresents a C-Corganic group that contains a thiol group and that is free from an aromatic group, or an organic group that contains a thiol group and an aromatic group. Rindependently represents hydrogen, a C-Calkyl group, a C-Cacyl group, or a C-Caromatic group. 1. A photosensitive resin composition comprising:(A) an alkali-soluble resin;(B) an o-naphthoquinonediazidesulfonic acid ester;(c) a silsesquioxane having at least two thiol groups in a molecule; and(D) a solvent; {'br': None, 'sup': a', 'b, 'sub': '3', 'RSi(OR)\u2003\u2003(I),'}, 'wherein said silsesquioxane is obtained by subjecting to condensation a silane material which includes a thiol-group-containing silane represented by formula (I){'sup': a', 'b, 'sub': 1', '8', '1', '6', '1', '6', '6', '15, 'wherein Rrepresents a C-Corganic group that contains a thiol group and that is free from an aromatic group, or an organic group that contains a thiol group and an aromatic group, and Rindependently represents hydrogen, a C-Calkyl group, a C-Cacyl group, or a C-Caromatic group.'}2. The photosensitive resin composition as claimed in claim 1 , wherein said alkali-soluble resin (A) is obtained by subjecting a mixture to copolymerization claim 1 , said mixture containing (a1) at least one of an unsaturated carboxylic acid compound or an unsaturated carboxylic anhydride compound claim 1 , (a2) an unsaturated compound having an epoxy group claim 1 , and (a3) an unsaturated compound different from said unsaturated carboxylic acid compound claim 1 , said unsaturated carboxylic anhydride compound claim 1 , and said unsaturated compound having an epoxy group.3. The ...

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Номер записи: 96
27-03-2014 дата публикации

ALLYL ETHER-TERMINATED FLUOROALKANESULFINIC ACIDS, SALTS THEREOF, AND A METHOD OF MAKING THE SAME

Номер: US20140088322A1
Автор: Qiu Zai-Ming
Принадлежит: 3M INNOVATIVE PROPERTIES COMPANY

Described herein are allyl ether-terminated fluoroalkylsulfinic acids and salts thereof and methods of making. 1. A method comprising:(a) reacting an allylation compound in the presence of a fluoride salt with a second compound selected from the group consisting of (i) a fluorinated fluoroacyl sulfonyl fluoride; (ii) a fluorinated sultone to produce an allyl ether-terminated sulfonyl fluoride; and (iii) combinations thereof; and(b) reducing the allyl ether-terminated sulfonyl fluoride to produce an allyl ether-terminated fluoroalkanesulfinic acid.2. The method of wherein the second compound is perfluorinated or highly-fluorinated.3. The method of claim 1 , wherein the second compound comprises a halogen selected from of the group consisting of Cl claim 1 , Br claim 1 , and combinations thereof.4. The method of claim 1 , wherein the reacting takes place in the presence of a phase transfer catalyst.5. The method of claim 4 , wherein the phase transfer catalyst is selected from of the group consisting of (CHCH)NCl claim 4 , (propyl)NCl claim 4 , (butyl)NCl claim 4 , (butyl)NBr claim 4 , (butyl)PBr claim 4 , CHN(butyl)Br claim 4 , (butyl)NCHSO claim 4 , (butyl)NCFSO claim 4 , methyltrialkyl (C-C)ammonium chloride claim 4 , and combinations thereof.6. The method of claim 1 , wherein the allylation compound is represented by the general formula CHX═CX—CHX-L claim 1 , wherein X claim 1 , X claim 1 , and Xare each independently selected from the group consisting of H claim 1 , Cl claim 1 , F claim 1 , Br claim 1 , an aryl claim 1 , and a C1 to C4 alkyl group claim 1 , and L is selected from the group consisting of I claim 1 , Br claim 1 , Cl claim 1 , F claim 1 , RC(O)O— claim 1 , RS(O)O— claim 1 , RP(O)O— claim 1 , and combinations thereof claim 1 , and where each R is independently selected from the group consisting of an alkyl group claim 1 , an aryl group claim 1 , a fluorinated alkyl group claim 1 , a fluorinated aryl group.8. The method of claim 1 , wherein the ...

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Номер записи: 97
10-04-2014 дата публикации

PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING BIOCHIP, AND BIOCHIP

Номер: US20140099243A1
Автор: Kotera Hidetoshi, MARUO Katsuya, Ohoka Masataka, Okonogi Atsuhito
Принадлежит:

It is intended to obtain a photosensitive resin composition that is capable of forming a highly fine pattern with a high aspect ratio while attaining the high adhesion of the pattern to a substrate, having low autofluorescence, and being exceedingly suitable for producing a biochip that causes exceedingly low damage on cultured cells. The photosensitive resin composition for forming a biochip of the present invention contains: an epoxy compound (A1) of a particular structure having an oxycyclohexane skeleton having an epoxy group; an epoxy compound (A2) of a particular structure which is a polyvalent carboxylic acid derivative having an epoxidized cyclohexenyl group; a cationic photoinitiator (B); and a solvent (C). 2. The photosensitive resin composition for forming a biochip according to claim 1 , wherein the ratio between the epoxy compound (A1) and the epoxy compound (A2) contained therein is the former/the latter (weight ratio)=1/99 to 99/1.3. The photosensitive resin composition for forming a biochip according to claim 1 , wherein the cationic photoinitiator (B) is a triarylsulfonium salt.4. The photosensitive resin composition for forming a biochip according to claim 1 , wherein the solvent (C) is at least one solvent selected from the group consisting of ketone-based solvents claim 1 , ester-based solvents claim 1 , and glycol ether-based solvents.5. A dry film resist comprising a base film and a photosensitive resin layer claim 1 , wherein the photosensitive resin layer is formed by applying a photosensitive resin composition for forming a biochip according to on the base film claim 1 , or wherein the photosensitive resin layer is formed by applying a photosensitive resin composition for forming said biochip on the base film and a cover film is layered on the photosensitive resin layer.6. A biochip comprising a first substrate claim 1 , a photosensitive resin layer having a pattern claim 1 , and a second substrate claim 1 ,{'claim-ref': {'@idref': 'CLM- ...

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Номер записи: 98
10-04-2014 дата публикации

Solutions and methods of making solutions to kill or deactivate spores, microorganisms, bacteria and fungus

Номер: US20140100277A1
Автор: Chris FRICKER, James Bingham, Keith A. Pelfrey, Robert Gray
Принадлежит: EP Technologies LLC

Exemplary embodiments of solutions of plasma activated water and peroxyacetic acid are disclosed herein. In addition, exemplary embodiments of methods for making solutions are disclosed herein. Some methods include exposing water to a plasma gas to activate the water, adding acetic acid to the activated water; and mixing the acetic acid and activated water to form a solution. Additional exemplary methods include adding acetic acid to water to form a solution, mixing solution of acetic acid and water together; and exposing the solution to a plasma gas to activate the solution. Another exemplary embodiment includes exposing water to a plasma gas to activate the water; adding an acetyl group donor to the activated water; and mixing the acetyl group donor and activated water to form a solution.

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Номер записи: 99
04-01-2018 дата публикации

Biopesticide Compositions Comprising Water Soluble Polyols

Номер: US20180000086A1
Автор: HETHERINGTON Mark Andrew, ROBINSON JAMES
Принадлежит:

Provided are liquid compositions comprising inactive biopesticide precursors comprising a glucosinolate concentrate, a plant material comprising a myrosinase enzyme complex, and a water soluble polyol. Further provided are methods of making and using such compositions. 120-. (canceled)21: A pesticide application kit containing a liquid formulation comprising:(a) a glucosinolate concentrate;(b) an active myrosinase complex in a concentration sufficient to release an effective amount of glucosinolate breakdown products upon the addition of water; and(c) a water soluble polyol,together with instructions regarding (1) the addition of water to the liquid formulation to form a diluted liquid formulation and (2) application of the diluted liquid formulation to a pest.22: A pesticide application kit according to wherein either or both of the glucosinolate concentrate or the active myrosinase complex are dissolved in the water soluble polyol; and further comprising instructions regarding mixing of the glucosinolate concentrate and the myrosinase complex.23: The pesticide application kit according to wherein the water soluble polyol is at least 80% pure.24: The pesticide application kit according to wherein the water soluble polyol is at least 80% pure.25: The pesticide application kit according to wherein the liquid formulation comprises at least about 1% water and up to 20% water.26: The pesticide application kit according to wherein the liquid formulation comprises at least about 1% water and up to 20% water.27: The pesticide application kit according to wherein the active myrosinase complex is present in a concentration of from about 1 unit to about 10 units per gram in the liquid formulation and the glucosinolate is present from about 25 mg to about 500 mg per gram in the liquid formulation.28: The pesticide application kit according to wherein the active myrosinase complex is present in a concentration of from about 1 unit to about 10 units per gram in the liquid ...

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Номер записи: 100