СПОСОБ ПОЛУЧЕНИЯ НЕСИММЕТРИЧНЫХ ЦИКЛОТЕТРАСИЛОКСАНОВ

Изобретение относится к области химической технологии кремнийорганических соединений. Предложен способ получения несимметричных органоциклотетрасилоксанов общей формулы [(CH3)2SiO]3[R1R2SiO], где R1 = R2 и обозначают С2Н5 или С6Н5, или если R1 обозначает СН3, R2 обозначает СН2=СН, Н или С6Н5, включающий (а) реакцию диметилсилоксанов линейного или циклического строения с гидроксидом натрия с образованием гексаметилтрисилоксандиолята натрия и (б) последующее его взаимодействие с диорганодихлорсиланом соответствующего строения в органическом растворителе. В качестве органического растворителя используют растворитель, выбранный из ряда диэтиловый эфир, метил-трет-бутиловый эфир, тетрагидрофуран, диоксан, диметоксиэтан, пиридин. Содержание гексаметилтрисилоксандиолята натрия в органическом растворителе составляет от 5 до 15 мас.%. Технический результат - предложенный способ получения несимметричных органоциклотетрасилоксанов обеспечивает селективное образование целевого продукта с высоким выходом ...

НОВЫЕ ДИОРГАНОСИЛОКСАНЫ ИЛИ ТРИОРГАНОСИЛАНЫ, СВЕТОЗАЩИТНАЯ КОСМЕТИЧЕСКАЯ КОМПОЗИЦИЯ И СПОСОБ ЗАЩИТЫ КОЖИ И/ИЛИ ВОЛОС ОТ УЛЬТРАФИОЛЕТОВОГО ИЗЛУЧЕНИЯ

Ди- или триорганосилоксаны с короткими, линейными или циклическими цепями содержат по крайней мере одно фильтрующее звено, происходящее от оксанилида с алкиленовой или алкиленоксифункцией, причем эти соединения преимущественно используют в качестве органических солнечных фильтров в косметических композициях, предназначенных для защиты кожи и волос от ультрафиолетового излучения. Органосилоксаны обладают хорошей растворимостью в жировых веществах и превосходной фотостабильностью. 3 с. и 20 з.п.ф-лы.

СПОСОБ ПОЛУЧЕНИЯ ОКТАФЕНИЛЦИКЛОТЕТРАСИЛОКСАНА И СИМТЕТРАМЕТИЛТЕТРАФЕНИЛЦИКЛОТЕТРАСИЛОКСАНА

... 1. Способ получения октафенилциклотетрасилоксана, включающий реакцию дигалогендифенилсилана со спиртом, отличающийся тем, что осуществляют: (а) взаимодействие дигалогендифенилсилана, имеющего формулу (C6H5)2Si(X)2, где Х представляет галоген, выбранный из группы, состоящей из хлора, брома и йода, со спиртом, имеющим формулу ROH, где R является одновалентным углеводородным радикалом, имеющим от одного до десяти атомов углерода, дающее, таким образом, диалкоксидифенилсилан, имеющий формулу (C6 H5)2Si(OR)2, где R имеет значения, определенные ранее: (b) смешение диалкоксидифенилсилана с растворителем, в котором октафенилциклотетрасилоксан плохо растворим, с образованием смеси; (с) добавление к ней основания в качестве катализатора в количестве, обеспечивающем концентрацию основания примерно 1 - 5000 ч/млн., и воды для гидролиза диалкоксидифенилсилана, и (d) нагревание смеси с обратным холодильником, с помощью чего октафенилциклотетрасилоксан выпадает в осадок из растворителя. 2. Способ по п ...

СПОСОБ ПОЛУЧЕНИЯ ПОЛИОРГАНОСИЛОКСАНОВ

... 1. Способ селективного получения циклических [RRSiO]и линейных X[RRSiO]RRSiX полиорганосилоксанов гидролизом кремнийорганических мономеров, отличающийся тем, что в качестве мономеров берут соединения общей формулы RRSiX, где Rи Rвыбирают из атома водорода и органических заместителей: алкила CHпри n=1-4; CH=CH-, CFCHCH-, ClCH, CHи ClCH-; Х=Hal, OR, OCOR(R=алкил CHс числом атомов углерода 1÷4) и процесс проводят непрерывно путем одновременного смешения реагентов при скорости потока 0.1÷5 м/с в смесителях и их комбинациях: инжектор или последовательность инжекторов, и/или центробежный экстрактор, и/или ультразвуковое устройство при молярном отношении воды к мономеру в интервале 0,6÷1,5 с последующим разделением продуктов синтеза известными способами: экстракция, перегонка (ректификация), десорбция, кристаллизация.2. Способ по п.1, отличающийся тем, что как циклические, так и линейные продукты получают с высокой селективностью 90-100%.3. Способ по п.1, отличающийся тем, что он характеризуется ...

СПОСОБ СТАБИЛИЗАЦИИ СИЛОКСАНОВЫХ СОЕДИНЕНИЙ

... 1. Способ стабилизации силиконовых растворителей для сухой химической чистки, которые могут содержать нежелательные кислотные примеси, способные вызывать образование циклических силоксанов, включающий контактирование силиконового растворителя для сухой химической чистки с адсорбентом, нейтрализующим агентом или их комбинацией, и отделение силиконового растворителя от адсорбента. 2. Способ по п.1, согласно которому количество используемых адсорбента, нейтрализующего агента или их комбинации составляет вплоть до 100 мас.ч. на 100 мас.ч. силиконового растворителя. 3. Способ по п.1, согласно которому растворитель контактирует с адсорбентом, нейтрализующим агентом или их комбинацией в течение от приблизительно 0, 0025 до приблизительно 6 ч. 4. Способ по п.1, согласно которому растворитель контактирует с адсорбентом, нейтрализующим агентом или их комбинацией при температуре от приблизительно 10 до приблизительно 80°С. 5. Способ по п.1, согласно которому адсорбент выбирают из группы, включающей ...

ГИДРОФИЛЬНЫЕ, СИЛИКОНОВЫЕ МОНОМЕРЫ, СПОСОБ ИХ ПОЛУЧЕНИЯ И ТОНКИЕ ПЛЕНКИ, СОДЕРЖАЩИЕ ИХ

... 1. Монофункциональный, содержащий силикон мономер, имеющий общую формулу: ! ! или ! ! в которой а представляет собой от 1 до приблизительно 50; ! b представляет собой от 0 до приблизительно 100; ! каждый R независимо выбран из группы, состоящей из одновалентных алифатических, циклоалифатических или ароматических углеводородных групп от 1 до приблизительно 10 углеродов и галогенированных углеводородных групп от 1 до приблизительно 10 углеродов; ! Z представляет собой полиэфир, имеющий общую формулу: ! ! в которой n представляет собой от 1 до приблизительно 20; ! p и q - каждый в отдельности представляют собой от 0 до приблизительно 100; ! Rb представляет собой алкильную группу, содержащую от 1 приблизительно до 4 атомов углерода; ! r представляет собой от 0 до приблизительно 50, и сумма p+q+r представляет собой более чем 0; и ! X представляет собой полиэфир-блокирующую группу, имеющую общую формулу: ! ! в которой R3 и R4 независимо представляют собой или водород, или замещенную или незамещенную ...

1,3,5-ТРИМЕТИЛ-1,3,5-ТРИС(ГЕКСАФТОРАЛКИЛ)ЦИКЛОТРИСИЛОКСАНЫ ДЛЯ ПОЛУЧЕНИЯ ТЕРМО- И МАСЛОБЕНЗОСТОЙКИХ ФТОРСОДЕРЖАЩИХ СИЛОКСАНОВЫХ ПОЛИМЕРОВ

Изобретение может быть использовано в промышленности синтетического каучука при производстве фторсодержащих силоксановых полимеров. Цель: создание доступных фторсодержащих алкилметилциклотрисилоксанов, способных использоваться для получения термо- и маслобензостойких силоксановых полимеров. Сущность изобретения: предлагаются 1,3,5-триметил-1,3,5-трис(гексафторалкил)циклотрисилоксаны общей формулы [RSi(CH)O], гдеполученные гидрозилом соответствующих метил(гексафторалкил)дихлорсиланов двууглекислым натрием в присутствии пиридина в среде ацетона при 20 - 25С. Положительный эффект: предлагаемые соединения позволяют получить фторсодержащие силоксановые полимеры, обладающие сочетанием высокой термо- и маслобензостойкости.

Органополиспироциклосилоксаны и способ их получения

Способ получения органохлорсиланов с циклосилоксановыми группами

Способ получения органоциклотетрасилоксанов

Способ получения бифункциональных бис (силил)м-карборанов

Способ получения органохлорсиланов с циклосилоксановыми группами

Способ получения алкоксисодержащих циклотрисилоксанов

Способ получения гетероциклических кремнийорганических соединений

Способ получения 1,1,3,3-тетразамещенных-1,3-дисиликациклобутанов

Октавинилсилсесквиоксан в качестве мате-РиАлА,чуВСТВиТЕльНОгО K дЕйСТВию элЕКТРОН-НОгО ОблучЕНия и СпОСОб ЕгО пОлучЕНия

Способ получения алкилсилсесквиоксанов

Способ получения 1-силил-7-литийкарборана, функциональную группу у атома кремния

Способ получения органоциклосилтиазанов

Способ получения органополисилоксанов и алкилгалогенидов

Sonnenfilter, diese enthaltende kosmetischen Sonnenschutzzusammensetzungen und deren Verwendung

Vollständig substituierte cyclopholysiloxane und ihre Verwendung zur Herstellung von Organosilziumpolymeren

Verfahren zur Herstellung von cyclischen Organohydrosiloxanen

Siloxygruppen aufweisende Cyclopolysiloxane

Verfahren zur Herstellung von Hexaaethylcyclotrisiloxan

Neue Siliciumhaltige Salicylsäurederivate mit abschuppenden Eigenschaften

Neue Siliciumhaltige Salicylsäurederivate mit abschuppenden Eigenschaften

Verfahren zur Herstellung von Cycloorganotrisiloxanen

VERFAHREN ZUM HERSTELLEN VON ORGANOSILOXANEN

VERZWEIGTE POLYMERE AUS ORGANOHYDROGENSILIZIUM-VERBINDUNGEN

Fluorkohlenwasserstoffsilicone

VERFAHREN ZUM HERSTELLEN VON OCTAPHENYLTETRACYCLOSILOXAN

Preparation of oligomeric silsesquioxane compounds, useful for the modification of polymers, by direct base catalysis of the corresponding silicon compound using a specific initial ratio of compound to base

Oligomeric silsesquioxane compounds are prepared directly by base catalysis of the corresponding silicon compound, using an initial ratio of compound to base of 500:1-3:1. Oligomeric silsesquioxane compounds of formula R<1>aR<2>bR<3>cR<4>dR<5>eR<6>fR<7>gR<8>hO12 and structure (I) are prepared directly by base catalysis of RSiX3 , where the ratio of RSiX3 to base at the beginning of the reaction is 500:1-3:1. R, R<1>-R<8> = optionally substituted (cyclo)alkyl, (cyclo)alkenyl, (cyclo)alkynyl, (hetero)aryl or H; X = a hydrolyzable or condensable group; and a+b+c+d+e+f+g+h = 8.

Aryl substituted silicone fluids having high refractive indices and method for making

ORGANOSILICON COMPOUNDS

... 1,240,660. Silazane compounds. MIDLAND SILICONES Ltd. 4 Dec., 1968 [6 Dec., 1967], No. 55485/67. Headings C3S and C3T. Nitrogen containing organosilicon compounds are prepared by reaction of (i) an organic or organosilicon compound having at least one SiOH and/or COH group with (ii) a cyclodisilazane of formula wherein each R and R1 is a C 1-5 alkyl or C 1-6 alkenyl radical or a monocyclic aryl radical and R11 is H or a C 1-11 alkyl radical. The reaction is usually conducted at 10-80‹ C., optionally in a solvent, e.g. benzene, hexane, or tetrahydrofuran. Suitable compounds (i) include phenol, p-nitrophenol, p-aminophenol, cresol, catechol, resorcinol, bisphenol A; methanol, isopropanol, n-butanol, cyclohexanol, allyl alcohol, benzylalcohol, ethylene or propylene or tetramethylethylene glycol, glycerol, erythritol, mannitol, arabinose, fructose; acetic, propionic, trifluoroacetic, lactic, oxalic, tartaric, benzoic, salicylic, isophthalic and terephthalic acids; triphenylsilanol ...

SURFACE PROTECTANT COMPOSITIONS

Process for the preparation of 1,3,5,7-tetramethyl-1,3,5,7-tetraphenylcyclotetrasiloxane

... 1,3,5,7 - Tetramethyl - 1,3,5,7 - tetraphenyl-cyclotetrasiloxan is prepared by heating the polymeric hydrolysis product of PhMeSiCl2 with, as catalyst, an alkali metal carbonate, under reduced pressure with the continuous removal of the product by distillation. Aqueous hydrolysis of PhMeSiCl2 in known manner yields a polymer which is heated with preferably 0.05-6% of sodium, potassium, lithium or sodium-potassium carbonate, by weight of the said polymer, at a pressure of, for example, less than 1 cm. Hg., and on rectification the desired cyclotetra siloxane is obtained with, as a by-product, the crystalline cyclotrisiloxane.ALSO:1,3,5,7 - Tetramethyl - 1,3,5,7 - tetraphenyl -cyclotetrasiloxane may be employed in the treatment of fillers based upon silica and various metal oxides, such as titanium oxide and alumina.

Metal-containing side chain liquid crystal polymers

A group of liquid crystalline compounds defined by Formulas (1) and (2) including polymers, monomers, oligomers and intermediates for their preparation. Also included are symmetric and non-symmetric poly(dimethylsiloxy) compounds having end groups derived from Formulas (1) and (2).

Improved siloxane cracking process

Nitrile-containing polysiloxanes

The invention comprises compounds of the formula where n and a are each 0 or 1, R is a monovalent hydrocarbon or halogenated hydrocarbon radical, and R1 is an alkylene or arylene group. They are prepared by the reaction of tetraphenyl disiloxane diol-1,3 or hexaphenyl trisiloxane diol-1,5 with the appropriate nitrile-containing organo dihalosilane Ra(R1CN)2-aSiX2, where X is halogen in an inert solvent in the presence of a hydrogen halide acceptor, e.g. a tertiary amine, in particular pyridine. The hydrohalide precipitate is removed, then the solvent, and the product is recrystallized. Polymers containing the recurrent unit where n, a, R and R1 are as defined above, are prepared by heating the compounds (I) alone at 300-375 DEG C., or, preferably, with a catalyst at 110-170 DEG C. A suitable catalyst is a 0.01-1% solution of KOH in octamethyl cyclotetrasiloxane, amounting to 10-100 p.p.m. of KOH in the monomer. The polymers have M.W.'s of 10,000 to ...

Organosilicon compounds

Organosilicon compounds of the general formula where R is a divalent hydrocarbon radical free from aliphatic unsaturation, Y is hydrogen or a monovalent hydrocarbon radical free from aliphatic unsaturation, R11 is a monovalent hydrocarbon radical and a has a value from 0 to 3, are obtained by hydrolysing, under alkaline conditions, a silane of the general formula where R, Y, R11 and a are as above and R1 is an alkyl radical containing 1 to 4 carbon atoms. Copolymers containing siloxane units of the general formula and siloxane units of the general formula where R, Y and R11 are as above, b has a value from 0 to 2, R111 is a monovalent hydrocarbon radical or a substituted monovalent hydrocarbon radical and c has a value from 0 to 3 are obtained by co-hydrolysis and co-condensation, under alkaline conditions, of silanes of the general formula where R, Y, R11 and b are as above and a compound ...

FORMING COMPOUNDS

Flourine-containing organosilicon compounds

... 863,722. Fluoro-organosilanes and siloxanes. MIDLAND SILICONES Ltd. June 15, 1959 [July 16, 1958], No. 20434/59. Class 2(7). The invention comprises silanes of the formula:- where R is a monovalent hydrocarbon radical free from aliphatic unsaturation, Y is chlorine or bromine or an OR1 radical where R1 is alkyl or aryl, x is I or 2, y is 0, 1, 2 or 3, and x+y is not greater than 4, and also homo- or co-polymeric siloxanes containing units of the formula:- where z is 0, 1 or 2 and x+ z is not greater than 3, any other units being:- where R11 is a monovalent hydrocarbon radical or a chlorinated or brominated derivative thereof and n is 1, 2 or 3. The silanes wherein Y is Cl or Br are prepared by reacting the olefin with a silane RyHx Si X 4 -x-y where X is Cl or Br. A catalyst such as chloroplatinic acid or platinum on charcoal may be used. The compounds wherein Y is OR1 may be prepared reacting the halosilane with a sodium alcoholate or phenolate. The ...

IMIDYL COMPOUNDS

PREPARATION OF CYCLIC SILOXANES

... 1476457 Preparing sym-tetramethyl tetravinyl cyclotetrasiloxane GENERAL ELECTRIC CO 2 Aug 1974 [27 Nov 1973] 34250/74 Heading C3S Symmetrical tetravinyl tetramethyl cyclotetrasiloxane is prepared by heating 1 pbw of a hydrolysate of methyl vinyl dichlorosilane, optionally containing up to 5 wt per cent of vinyl trichlorosilane, with at least 2 pbw of a high-boiling hydrocarbon solvent (i.e. one which loses less than 0À5% of its weight after 3 hours at 325‹ F. under atmospheric pressure), in the presence of a catalytic amount of KOH. Preferably 3-5 pbw of solvent are used, and 0À5-5 wt per cent (of the hydrolysate) of KOH. Heating is preferably at 125-175‹ C. and 5-20 mm Hg, and the reflux ratio is preferably adjusted to give a tetramer : trimer ratio in the product of 2-8 : 1 by weight. Other cyclic products may be returned to the reaction, which may be continuous. In Example 1 100 pbw of hydrolysate of MeViSiCl 2 and ViSiCl 3 in 98 : 2 wt ratio is heated with 300 pbw of a hydrocarbon process ...

Organosiloxanes

The invention comprises organosiloxanes consisting essentially of units of the general formula: in which R is a monovalent hydrocarbon radical free from aliphatic unsaturation and x is 1 or 2, copolymers thereof and rubbers therefrom. The other siloxane units of the co-polymers have the general formula: in which each R1 is an aryl, alkyl, alkenyl, haloaryl or haloalkyl radical, m is 0, 1, 2 or 3 and n is 0 or 1. The siloxanes may be linear or cyclic homo-polymers or linear, cyclic or cross-linked co-polymers, and include the dimers and cyclic trimers, tetramers, pentamers and hexamers. The polymers can be made (1) by hydrolysing one or more silanes of the formula: [CH3CH(C6H5)CH2]RxSiCl3-x, which in turn can be made by reacting a -methylstyrene either with RxHSiCl3-x in the presence of chloroplatinic acid as catalyst, or with HSiCl3 and reacting the resulting adduct with RMgCl or RMgBr, or (2) by reacting a -methylstyrene directly with an ...

METHOD OF PREPARING METHYLSILOXANES AND METHYLCHLORIDE

SILANES AND POLYSILOXANES

... 1319244 Fluorine-containing amines DEFENCE SECRETARY OF STATE FOR 5 Nov 1970 [12 Nov 1969] 55381/69 Heading C2C [Also in Divisions C3 and C5] N,N - Bis - (trifluoromethyl) - prop - 2 - enylamine is prepared by treating N-bromo-bis- (trifluoromethyl)-amine with allyl chloride to yield intermediate 2-bromo-3-chloro-N,N-bis- (trifluoromethyl)-propylamine and further treating this latter compound with activated zinc dust.

PREPARATION OF NITROGEN-CONTAINING ORGANOSILICON COMPOUNDS

... 1330134 Tris-(dimethylsilyl) amine DOW CORNING Ltd 8 Jan 1971 [13 Jan 1970] 1612/70 Heading C3S Tris-(dimethylsilyl) amine is prepared by heating 1,1,3,3-tetramethyldisilazane in the presence of an acid catalyst. Suitable catalysts are sulphuric acid, boron trichloride, ammonium sulphate, ammonium chloride and ammonium nitrate. Inert diluents may also be employed. 1 - Dimethylsilyl - 2,2,4,4,6,6 - hexamethylcyclotrisilazane and 1,3 - bis - (dimethylsilyl)- 2,2,4,4,6,6 - hexamethylcyclotrisilazane are formed as by-products. Uses.-The main product may be used as a polymer intermediate.

ALKOXYSILOXANHALTIGES MEANS AS WASSERFÄNGER, DESICCATORS OR VORVERNETZUNGSVERHINDERER FOR INTERLACE-CASH POLYMER MASSES

PROCEDURE FOR THE PRODUCTION OF SILANOLTERMINIERTEN OLIGOMEREN

VERFAHREN ZUR HERSTELLUNG VON ORGANOCHLOR- SILICIUMVERBINDUNGEN

VERFAHREN ZUR HERSTELLUNG NEUER 1-OXA-4-AZA-2,6- DISILACYCLOHEXANE

PROCEDURE FOR ERHOHUNG THE DOPAMINE CONTENT OF THE BRAIN FABRIC OF ANIMALS

SILANE COMPOSITION, PROCEDURE FOR MANUFACTURING A SILICON FILM AND A SOLAR CELL

HIGH-BREAKING PREPOLYMERVORLÄUFER ON AROMATIC BASIS

VOLATILE SILICONES

FLUORINE SILANES AND PROCEDURES FOR THEIR PRODUCTION.

SILICON-CONTAINING SUN GUARD FILTERS, THESE CONTAINING SUN PROTECTION COMPOSITIONS AND THEIR USE

MEANS FOR THE DISINFECTION OF THE SKIN AND PROCEDURE FOR ITS PRODUCTION.

PROCEDURE FOR THE PRODUCTION OF SILIZIUMHALTIGEN CERAMIC COATINGS OF A CHEMICAL REACTOR BY THERMAL DECOMPOSITION OF SILAZANEN

PROCEDURE FOR THE PRODUCTION OF HEXAMETHYLCYCLOTRISILAZAN.

PROCEDURE FOR THE PRODUCTION OF O-SILYLIERTE OF KETENE ACETALS AND ENOLETHER.

NEW SILICIUMHALTIGE SALICYLSÄUREDERIVATE WITH ABSCHUPPENDEN CHARACTERISTICS

SUN FILTER, THESE CONTAINING COSMETIC LIGHT PROTECTION COMPOSITIONS AS WELL AS THEIR USE

PROCEDURE FOR THE PRODUCTION OF POLYHEDRI OLIGOMERER SILSESQUIOXANE

PROCEDURE FOR THE ODOR REMOVAL WITH SILICONES

SILOXAN OLIGOMERE ONE, PROCEDURE FOR THEIR PRODUCTION AND THEIR USE

WITH DOUBLE METAL CYANIDE CATALYST MANUFACTURE POLYETHERSILOXANCOPOLYMERE

SEPARATION OF LAYERS USING ORGANOSILSESQUIOXAN PRELIMINARY STAGES

FLUORINE-ALKYL-SUBSTITUTED TRICYCLOSILOXANE, YOUR APPLICATION FOR THE PRODUCTION OF NEW OF POLYMERS AND NEW ONES OF POLYMERS

Method for purifying polyalkylsiloxanes and the resulting products

PHARMACEUTICAL COMPOSITIONS

Cross-coupling reaction of organosilicon nucleophiles

Novel sunscreens, photoprotective cosmetic compositions containing them and uses thereof

New sunscreen agents, photoprotective cosmetic compositions containing them and uses

CONVERSION OF ORGANOSILOXANES

Novel sunscreens, photoprotective cosmetic compositions containing them and uses thereof

Polymerizable substances based on epoxides

NCO COMPOUNDS WITH COVALENTLY BONDED POLYHEDRAL OLIGOMERIC SILICON-OXYGEN CLUSTER UNITS

The present invention relates to new NCO compounds with covalently bonded polyhedral oligomeric silicon-oxygen cluster units, suitable as crosslinkers in coating systems which lead to improved properties, such as good leveling of cured baking varnishes, and/or have good solubility.

PERFLUORINATED ORGANO SUBSTITUTED CYCLOSILOXANES AND COPOLYMERS PREPARED FROM THESE CYCLOSILOXANES

Compositions of unstrained perfluorinated organo substituted cyclosiloxanes of formula (I) wherein m is an integer of 1 to 12; n is an integer of 1 to 4; X is a divalent radical which may include O, NH, N(CH3), OC(O), NHC(O), N(CH3)C(O)CH2; and RF is a perfluorinated straight chain or branched chain monovalent alkyl radical of 1 to 25 carbon atoms; or RF is a perfluorinated ether radical of general formula (II) wherein p is an integer of 1 to 10 are described, along with copolymer compositions prepared from these cyclopolysiloxanes and from mixtures of these cyclosiloxanes and other siloxanes.

PREPARATION OF POLYSILOXANES FROM HALOSILANES

THE PREPARATION OF POLYSILOXANES FROM HALOSILANES This invention relates to a process for the preparation of polysiloxanes by reacting halosilanes in the presence of metal oxides and sulfolane. Preferred metal oxides include antimony (III) oxide, antimony (V) oxide, cadmium oxide, calcium oxide, copper (II) oxide, indium oxide, iron (II) oxide, iron (III) oxide, magnesium oxide, manganese (II) oxide, mercury (II) oxide, nickel (II) oxide, thallium (III) oxide, tin (II) oxide, and zinc oxide. Improved yields and rates of reaction can be observed with the process of this invention.

PRODUCTION OF MUSCLE RELAXANT 4-BENZYL-AZA-1-OXA -2,6-DISILACYCLOHEXANES

Case 600-6811 1-Oxa-4-Aza-2,6-Disilacyclohexanes, their Production and Use as Muscle Relaxants Compounds of formula I, their production and their use as muscle relaxants.

PREPARATION OF CYCLOPOLYDIORGANOSILOXANES VIA VAPOR PHASE REARRANGEMENT

PREPARATION OF CYCLOPOLYDIORGANOSILOXANES VIA VAPOR PHASE REARRANGEMENT A process for preparing a product cyclopolydiorganosiloxane, (R2SiO)c. The process comprises (A) vaporizing a feed cyclopolydiorganosiloxane material, (R2SiO)x; (B) passing the vapors from (A) through a heated bed of a solid catalyst, the catalyst comprising an alkali metal compound; (C) controlling pressure and temperature in the heated catalyst bed to favor formation of (R2SiO)c in an equilibrating mixture with other cyclopolydiorganosiloxanes; and (D) recovering an amount of the product cyclopolydiorganosiloxane, (R2SiO)c, which is substantially increased from the amount present in the feed cyclopolydiorganosiloxane material.

METHOD FOR MAKING CYCLOPOLYDIMETHYLSILOXANES

CYCLOTRISILOXANES CONTAINING SILICON-BONDED FLUOROALKOXYALKYL GROUPS

ACTIVE INGREDIENT-RELEASING CYCLIC SILOXANES

Cyclic siloxanes that contain releasable active ingredients are described. The active ingredient can be an alcohol or enolizable carbonyl-containing compound such as a ketone, aldehyde, or ester. The product siloxanes are useful in a variety of personal and household care products where slow or controlled release of active ingredient is desired. A preferred embodiment utilizes substituents that when released as active ingredients are fragrant.

ICE ADHESION REDUCING PREPOLYMERS AND POLYMERS

The present disclosure relates to an FPOSS prepolymer which may be reacted with a reactive coating or a polyisocyanate and/ or one or more of a polysiloxane, a polyol, a polyamine and a reactive coating; an FPOSS polyisocyanate prepolymer which may be reacted with one or more of a polysiloxane, a polyol, a polyamine or a reactive coating; and an FPOSS siloxane prepolymer which may be reacted with a polyisocyanate and/or one or more of a polyol, a polyamine or a reactive coating to form cross-linked polymers capable of reducing the ability of ice to adhere to the surface of an object, in particular aircraft or other vehicles, methods of producing the prepolymers and polymers and their use in coating surfaces.

ORGANOCYCLOSILOXANE AND METHOD FOR ITS PREPARATION

ORGANOCYCLOSILOXANE AND METHOD FOR ITS PREPARATION

An organocyclosiloxane is disclosed which has both silicon-bonded alkoxy groups and organofunctional groups within each molecule. This cyclic siloxane finds utility as a coupling agent and has the general formula wherein R1 is independently selected from the group consisting of a monovalent hydrocarbon group having 1 to 8 carbon atoms and a monovalent halogen-substituted hydrocarbon group having 1 to 8 carbon atoms, R2 is selected from the group consisting of an alkoxy group and an alkoxysilylalkyl group, R3 is an organofunctional group selected from the group consisting of glycidoxyalkyl groups, methacryloxyalkyl groups, N-(trialkylsilyl)aminoalkyl groups, (hydroxyphenyl)alkyl groups, and haloalkyl groups and n and m each represent an integer having a value of 1 to 6 with the proviso that n + m is an integer with a value of 3 to 8.

PIPERIDINE-TRIAZINE COMPOUNDS CONTAINING SILANE GROUPS, FOR USE AS STABILIZERS FOR ORGANIC MATERIALS

A-18111/A/CHM 54 Piperidine-triazine compounds containing silane groups, or use as stabilizers for organic materials of the disclosure The present invention relates to novel piperidine-triazine compounds containing silane groups of the formula (I) (I) in which R1 is a group of the formula R7 is e.g. hydrogen, X is e.g. >N-R10 with R10 being C1-C4alkyl, R8 is e.g. a group of the formula , with R11 being hydrogen and Z being as defined for X; Y is e.g. >NII, R9 is e.g.trimethylene, R2 is e.g. methyl, ethoxy or OH, R3 and R4 are e.g. C1-C6alkyl or phenyl, m + n is a number from 1 to 100, n is zero or a number from 1 to 90 and can vary from zero to 90 % of the sum of m + n, R5 is e.g. ethyl and R6 is e.g. ethoxy, and, when m + n is a number from 3 to 10, R5 and R6 together can also form a direct bond. These compounds are effective as stabilizers for organic materials.

ORGANOSILSESQUIOXANES HAVING AT LEAST ONE MESOGENIC SIDE GROUP

SUN FILTERS; SOLAR PROTECTION COSMETIC COMPOSITIONS CONT AINING THE SAME AND THEIR USE

L'invention concerne de nouveaux composés du type diorganosiloxanes à chaines courtes, linéaires ou cycliques, ou du type triorganosilanes, présentantpour caractéristique commune d'avoir tous au moins une fonction alcoxybenzotriazole, ces composés étant plus particulièrement utilisables à titre de filtres organiques solaires dans des compositions cosmétiques destinées à la protection de la peau et des cheveux contre le rayonnement ultraviolet. L'invention concerne également l'utilisation desdits composés dans l'applicationcosmétique susmentionnée, ainsi que les compositions cosmétiques à propriétés améliorées les contenant. Elle concerne enfin également, à titre de produits industriels nouveaux et utiles en soi, notamment comme filtres pour compositionscosmétiques photoprotectrices de la peau et des cheveux, des alcoxybenzotriazoles à insaturation éthylénique utilisables dans la synthèse desnouveaux composés mentionnés ci-dessus.

PROCESS FOR FORMING SILOXANE BONDS

The present invention relates to a novel method of preparing siloxane bonds. The method comprises reacting less than or equal to 1 equivalent of a carboxylic acid with 2 equivalents of alkoxy groups on an alkoxysilane in the presence of a strong acid.

MIXTURES OF CHAIN AND CYCLIC SILOXANES OR SILOXANE OLIGOMERS, PROCESS FOR THEIR PREPARATION AND THEIR USE

... 23443-483 Mixtures of siloxane oligomers are disclosed having a degree of oligomerisation of 0 to 8 and carrying at most one vinyl substituent per silicon atom, as well as methoxy and/or ethoxy groups, the molar ratio of vinyl groups to alkoxy groups being 1:1 to 1:8. Optional alkyl substituents having 1 to 18 C atoms may also be present, the molar ratio of vinyl groups to alkyl groups being 1:0 to 1:8. The mixtures are prepared by hydrolysis or cohydrolysis of vinyltrialkoxysilanes and optionally tetraalkoxysilanes and alkyltrialkoxysilanes in alcoholic solution in the presence of acid catalysts with an amount of water calculated for the degree of oligomerisation and subsequent removal of the catalyst and of the free alcohols, The mixtures are used as crosslinking agents for thermoplastic polyolefins. They are free of many disadvantages of known crosslinking agents, such as high volatility and toxicity.

HYDROSILYLATION METHOD AND PROCESS FOR PRODUCING CURING AGENT MAKING USE OF THE SAME

A hydrosilylation method for introducing a hydrosilyl group into an olefin molecule by an addition reaction using a metal catalyst in the presence of a compound selected from among thiazoles and phosphines added to control the reaction, and a process for producing a hydrosilylated organic curing agent according to the above method. This method facilitates the control of the hydrosilylation reaction and the production of an organic-modified silicon compound having two or more hydrosilyl groups in its molecule. As a concomitant effect, the storage stability of the formed curing agent when both the catalyst and the additives of the invention remain therein is improved as compared with the case where only the catalyst remains therein.

LIQUID-CRYSTALLINE ORGANOSILOXANES CONTAINING CHIRAL DIANHYDROHEXITOL DERIVATIVES

The liquid-crystalline organosiloxanes which contain dianhydrohexitol derivatives as chiral groups can be used in optical elements, for decorative purposes and as polarizing colored filters, in particular notch filters.

CARBOSILOXANE DENDRIMERS

To provide a novel branched siloxane-silalkylene copolymer whose molecule contains a plural number of silicon-bonded hydrogen atoms or siliconbonded alkoxy groups. Carbosiloxane dendrimer that contains at least one siloxane unit with the general formula X1R1 aSiO(3-a)/2 {R1 is C1 to C10 alkyl or aryl, a is an integer from 0 to 2, and X1 is the silylalkyl group with the following formula at i = 1 (R1 is C1 to C10 alkyl or aryl, R2 is C2 to C10 alkylene, R3 is C1 to C10 alkyl, Xi + 1 is the hydrogen atom or the above-defined silylalkyl group at i = i + 1, i is an integer with a value from 1 to 10 that specifies the generation of the said silylalkyl group, and b1 is an integer from 0 to 3 with the proviso that b1 in at least one X1 in each molecule is an integer from 0 to 2)} wherein when more than 1 is present these siloxane units may be the same or different, and whose core is a polysiloxane structure that contains at least 2 silicon atoms and the aforesaid siloxane unit(s).

PREPARATION OF ORGANOSILICON COMPOUNDS CONTAINING .ALPHA.,.BETA.-UNSATURATED CARBOXYLIC ACIDS

Organosilicon compounds (P) containing .alpha.,.beta.-unsaturated carboxylic acid radicals, of the general formula (1) -A-O-C(O)-CR=CH2 (1), are prepared by a process in which, in a first step, organosilicon compounds (H) containing hydrogen atoms bonded directly to silicon are reacted with olefinically unsaturated compounds (U) containing a terminal double or triple bond, of the general formula (2) S2-O-C(O)-CRH-CH2-Z (2), in the presence of metals or compounds from the platinum group as catalyst, to give organosilicon compounds (E) containing radicals of the general formula (3) -A-O-C(O)-CRH-CH2-Z (3), and, in a second step, H-Z compounds are eliminated from organosilicon compounds (E), where A is a divalent organic radical, .OMEGA. is a monovalent organic radical containing a terminal double or triple bond, R is an H atom or a methyl radical, and Z is Cl, I, Br or 4-methyltoluenesulfonyl.

Preparation of 1,3,5-triethyl-2,4,6-trihydrido-2,4,6-triethylamino-1,3,5-triaza-2,4,6-trisilacyclohexane

A process for preparing 1,3,5-triethyl-2,4,6-trihydrido-2,4,6-triethylamino-1,3,5-triaza-2,4,6-trisilacyclohexane, wherein trichlorosilane is reacted with ethylamine in a solvent.

Flexible underfill compositions for enhanced reliability

Underfill materials for fabricating electronic devices are described. One embodiment includes an underfill composition including an epoxy mixture, an amine hardener component, and a filler. The epoxy mixture may include a first epoxy comprising a bisphenol epoxy, a second epoxy comprising a multifunctional epoxy, and a third epoxy comprising an aliphatic epoxy, the aliphatic epoxy comprising a silicone epoxy. The first, second, and third epoxies each have a different chemical structure. Other embodiments are described and claimed.

Antiglare and antiseptic coating material and touchscreen coated with the same

An antiglare and antiseptic coating material comprises a nanometric spherical polymer molecule having the formula (I): wherein R1 could be halogens, hydrogen, alkyl groups, alkoxy groups, the hydroxyl group, alkenyl groups, alkynyl groups, acyl groups, aryl groups, carboxyl groups, alkoxycarbonyl groups, or aryloxycarboxyl groups, and wherein R2 could be amino groups, thiol groups, phosphino groups, acid radicals, basic groups, alcohol groups, or alkyl groups, and wherein M's are identical metal atoms or different metal atoms which could be zirconium, copper, titanium, gold, platinum, or zinc. The antiglare and antiseptic coating material is spread on a conductive layer or an outer cover layer of a touchscreen to provide a durable, weather-resistant antiglare and antiseptic coating for the touchscreen. Further, the coating can dim fingerprints on the touchscreen.

Sythesis of functional fluorinated polyhedral oligomeric silsesquioxane (f-poss)

A functional fluorinated polyhedral oligomeric silsesquioxane (“F-POSS”). The F-POSS, has a chemical structure: where R f represents a nonreactive organic group and at least one of R 1 and R 2 represents a chain comprising at least three carbon atoms.

NEW ORGANOSILICON COMPOUND, THERMOSETTING RESIN COMPOSITION CONTAINING THE ORGANOSILICON COMPOUND, HARDENING RESIN AND ENCAPSULATION MATERIAL FOR OPTICAL SEMICONDUCTOR

A solution is a liquid organosilicon compound represented by general formula (1) as described below: 3. A thermosetting resin composition containing the liquid organosilicon compound according to .5. The thermosetting resin composition according to claim 3 , further containing a platinum catalyst.6. The thermosetting resin composition according to claim 3 , further allowing dispersion of silica and/or a phosphor.7. A hardened material claim 3 , formed by thermally hardening the thermosetting resin composition according to .8. A molded object obtained by molding the hardened material according to .9. A coating film claim 3 , formed by applying the thermosetting resin composition according to .10. An encapsulation material for an optical semiconductor claim 3 , composed of the thermosetting resin composition according to . The present invention relates to a new organosilicon compound, a thermosetting resin composition that contains the compound and is useful for an application such as an optical material and an electrically insulating material, a hardened material obtained by thermally hardening the composition, and an encapsulation material that uses the hardened material and is for an optical semiconductor.A light emitting device such as a light emitting diode (LED) has been put into practical use for various display boards, a light source for reading an image, a traffic light, a unit for a large size display, a backlight of a cellular phone, and so forth in recent years. The light emitting devices are generally encapsulated with a hardening resin obtained by hardening an aromatic epoxy resin with alicyclic acid anhydride being a hardening agent. However, according to the aromatic epoxy resin base, the alicyclic acid anhydride is easily discolored with an acid, or a long period of time is needed until the resin base is hardened, which is known as a problem. Moreover, when the light emitting device is left outdoors or exposed to a light source emitting ultraviolet ...

NEW FUNCTIONALIZED POLYHEDRAL OCTAVINYLSILSESQUIOXANES AND A METHOD TO OBTAIN THE FUNCTIONALIZED POLYHEDRAL OCTAVINYLSILSESQUIOXANES

A new functionalized polyhedral octavinylsilsesquioxanes having the general formula 1, in which Rdenotes: (1) any aryl group other than a non-substituted phenyl or a phenyl substituted in position four with a halogen or the groups-trimethylsilylethynyl, 4,4,5,5-tetramethyl-1,3-dioxaborolane-2-yl, 3 ,4-dimethoxyphenyl, 3′, 5′-bis(methoxycarbonyl)phenyl or benzo[d][1,3]-dioxol-5-yl; (2) any heteroaryl group; or (3) groups including coupled aromatic rings. Additionally, a method to obtain new and known functionalized polyhedral octavinylsilsesquioxanes having the general formula 1, by the silylating coupling of octavinylsilsesquioxane with olefins in the presence of a ruthenium complex catalyst. 4. A method as claimed in wherein the catalyst is used in an amount from 1×10to 1×10mole of Ru per 1 mole of vinyl groups in silsesquioxane.5. A method as claimed in wherein the catalyst is used in the amount of 0.5×10to 2×10.6. A method as claimed in wherein the catalyst is used in the amount of 1×10mole.7. A method as claimed in or or or or wherein claim 5 , additionally claim 5 , a copper compound is used as co-catalyst.8. A method as claimed in wherein the co-catalyst is used in the amount of 10-10 moles of Cu per mole of Ru.9. A method as claimed in wherein the co-catalyst is used in the amount of 5 moles of Cu per mole of Ru.10. A method as claimed in or wherein copper(I) salts are used as co-catalyst.11. A method as claimed in wherein copper(I) chloride is used as co-catalyst. This invention relates to new functionalized polyhedral octavinylsilsesquioxanes and a method to obtain the new and known functionalized polyhedral octavinylsilsesquioxanes.Functionalized polyhedral octavinylsilsesquioxanes containing an inorganic siloxane skeleton connected with a wide range of functional groups are a convenient starting material for obtaining hybrid materials and are applicable as nano-fillers in new-generation composite materials.Feher (1) described functionalization by means of ...

Mobile Self-Spreading Biocides

A compound having the formula: Each R 1 is C 1 -C 3 alkyl group or fluoridated C 1 -C 3 alkyl group. The value n is a positive integer. Each R 2 is alkylene group or polyethylene glycol group. Y 1 is hydrogen, quaternary ammonium containing group, or phenol-containing group. Y 2 is quaternary ammonium-containing group or phenol-containing group. The quaternary ammonium-containing group is non-aromatic and contains no more than one quaternary ammonium.

POLYHEDRAL POLYSILOXANE MODIFIED PRODUCT AND COMPOSITION USING THE MODIFIED PRODUCT

The present invention has its object to provide a liquid-form modified product of polyhedral polysiloxane which is excellent in moldability and transparency, and a composition produced using the modified product. In addition, the present invention can provide an easy-to-handle modified product and composition. The present invention provides a modified product of polyhedral polysiloxane which is obtainable by modifying a polyhedral polysiloxane compound (a) with a compound (b), and a composition containing the modified product. The polyhedral polysiloxane compound (a) has an alkenyl group and/or a hydrosilyl group, and the compound (b) has a hydrosilyl group and/or an alkenyl group each capable of hydrosilylation with the component (a). 147-. (canceled)48. A modified polyhedral polysiloxane ,which is obtained by modifying a polyhedral polysiloxane compound (a) having an alkenyl group with a cyclic siloxane compound (b) having a hydrosilyl group capable of hydrosilylation with the compound (a),wherein the modified polyhedral polysiloxane is obtained by:adding the cyclic siloxane compound (b) to the polyhedral polysiloxane compound (a) to allow the compound (a) to be modified by the compound (b), wherein the number of a hydrogen atom directly bonded to a Si atom of the compound (b) is 2.5 to 20 per an alkenyl group of the compound (a); anddistilling off an unreacted portion of the compound (b), andwherein the modified polyhedral polysiloxane is in a liquid state at 20° C.49. The modified polyhedral polysiloxane according to claim 48 ,wherein a molecule of the modified polyhedral polysiloxane contains at least three hydrosilyl groups or alkenyl groups.50. The modified polyhedral polysiloxane according to claim 48 ,wherein the cyclic siloxane compound (b) further has a reactive functional group other than a hydrosilyl group.51. The modified polyhedral polysiloxane according to claim 48 , comprising a siloxane unit represented by the formula:{'br': None, 'sup': 1', '2, ' ...

MODIFIED PRODUCT OF POLYHEDRAL STRUCTURE POLYSILOXANE, POLYHEDRAL STRUCTURE POLYSILOXANE COMPOSITION, CURED PRODUCT, AND OPTICAL SEMICONDUCTOR DEVICE

An object of the present invention is to provide a polyhedral polysiloxane composition that has high heat resistance and high light resistance, is excellent in gas-barrier properties and thermal shock resistance, and exhibits good handleability when used to encapsulate an optical semiconductor device. The polyhedral polysiloxane composition of the present invention is characterized by including a modified polyhedral polysiloxane which is obtained by hydrosilylation of an alkenyl group-containing polyhedral polysiloxane compound (a) and a hydrosilyl group-containing compound (b) and has a structure derived from an organic silicon compound (a′) having one alkenyl group per molecule. 1. A modified polyhedral polysiloxane , which is obtained by hydrosilylation of an alkenyl group-containing polyhedral polysiloxane compound (a) and a hydrosilyl group-containing compound (b) , and has a structure derived from an organic silicon compound (a′) having one alkenyl group per molecule.2. The modified polyhedral polysiloxane according to claim 1 ,wherein the modified polyhedral polysiloxane is in liquid form at 20° C.3. The modified polyhedral polysiloxane according to claim 1 ,wherein the organic silicon compound (a′) having one alkenyl group per molecule has at least one aryl group.4. The modified polyhedral polysiloxane according to claim 3 ,wherein the aryl group is directly bonded to a silicon atom.5. The modified polyhedral polysiloxane according to claim 1 ,wherein the hydrosilyl group-containing compound (b) is at least one of a hydrosilyl group-containing cyclic siloxane and a hydrosilyl group-containing linear siloxane.6. The modified polyhedral polysiloxane according to claim 1 ,wherein the hydrosilyl group-containing compound (b) is a hydrosilyl group-containing cyclic siloxane.7. The modified polyhedral polysiloxane according to claim 6 ,wherein the hydrosilyl group-containing compound (b) is 1,3,5,7-tetrahydrogen-1,3,5,7-tetramethylcyclotetrasiloxane.10. The ...

Method of Selectively Forming a Reaction Product in the Presence of a Metal Silicide

A reaction product is formed utilizing a method that includes the step of combining a metal silicide and an aliphatic hydrocarbyl halide at a temperature of from 200° C. to 600° C. The aliphatic hydrocarbyl halide has the formula HCX, wherein a is 0 or more, b is 1 or more, c is one or more, and X is halo. The method allows the reaction product to be formed in a predictable and controlled manner. Moreover, the components used in this method can be easily recycled and/or re-used in other processes. 1. A method of forming a reaction product , said method comprising a step of combining a metal silicide and an aliphatic hydrocarbyl halide in a reactor at a temperature of from 200° C. to 600° C. to form the reaction product wherein the metal silicide comprises a Group I or Group II metal.2. A method as set forth in wherein the metal silicide is further defined as MgSi.3. A method as set forth in wherein the aliphatic hydrocarbyl halide is further defined as an alkyl halide of formula RX claim 1 , wherein R is C-Calkyl and wherein X is halo.4. A method as set forth in wherein X is chloro.5. A method as set forth in or wherein R is further defined as methyl.6. A method as set forth in wherein the reaction product comprises at least one polysilane having the formula RSi(RSi)SiRwherein each R is independently C-Calkyl claim 1 , halo claim 1 , or —H claim 1 , and m has an average value of from 1 to 5.7. A method as set forth in wherein the at least one polysilane is linear.8. A method as set forth in wherein the reaction product comprises at least two polysilanes and at least one of the polysilanes is branched.9. A method as set forth in wherein the reaction product comprises at least two polysilanes and at least one of the polysilanes is cyclic.10. A method as set forth in wherein the reaction product comprises at least one polycarbosilane having the formula RSi—CH(RSi—CH)SiRwherein each Ris independently C-Calkyl claim 1 , halo claim 1 , or —H claim 1 , and n has an average ...

METHOD FOR PRODUCING CYCLOHEXASILANE

Provided is a method for efficiently obtaining cyclohexasilane using a cyclic silane dianion salt as a raw material without a by-product such as silane gas by a simple device. The method for producing cyclohexasilane has a feature that a cyclic silane dianion salt represented by the following general formula (i) or general formula (ii) is reacted with an aluminum-based reducing agent or a boron-based reducing agent: 3. The method for producing cyclohexasilane according to claim 2 , wherein the solvent represented by the formula (iii) is at least one solvent selected from the group consisting of cyclopentyl methyl ether claim 2 , diisopropyl ether and methyl tertiary butyl ether.4. The method for producing cyclohexasilane according to claim 2 , wherein the obtained reaction solution is separated into solid and liquid after the reduction.5. The method for producing cyclohexasilane according to claim 1 , wherein the reduction is carried out by bringing the cyclic silane dianion salt into contact with the reducing agent in the presence of a solvent.6. The method for producing cyclohexasilane according to claim 1 , wherein at least one of the cyclic silane dianion salt and the reducing agent is added dropwise to a reaction system in which the reduction is carried out.9. The method for producing cyclohexasilane according to claim 3 , wherein the obtained reaction solution is separated into solid and liquid after the reduction.10. The method for producing cyclohexasilane according to claim 2 , wherein the reduction is carried out by bringing the cyclic silane dianion salt into contact with the reducing agent in the presence of a solvent.11. The method for producing cyclohexasilane according to claim 2 , wherein at least one of the cyclic silane dianion salt and the reducing agent is added dropwise to a reaction system in which the reduction is carried out. (1) Field of the InventionThe present invention relates to a method for efficiently obtaining cyclohexasilane using a ...

PROCESS FOR PREPARING POLYDIMETHYLSILOXANES ON SULPHONIC ACID CATION EXCHANGE RESINS

The invention relates to a process for the targeted reorganization of polydimethylsiloxanes over sulphonic acid-containing cation exchange resins which have water contents of 8 to 25% by weight, and polydimethylsiloxanes thus prepared and the use thereof. 2. The composition according to claim 1 , wherein a proportion of the polydimethylsiloxane with N=6 to N=12 is 20 to 58% by weight claim 1 , based on the mass of the polydimethylsiloxane.3. The composition according to claim 1 , wherein a proportion of the polydimethylsiloxane with N≧13 is <7% by weight claim 1 , based on the mass of the polydimethylsiloxane.4. The composition according to claim 1 , wherein the composition contains 20 to 58% by weight of a polydimethylsiloxane having a chain length N of 6 to 12 claim 1 , ≦7% by weight of a polydimethylsiloxane having a chain length N of ≧13 and 35 to 73% by weight of a polydimethylsiloxane having chain lengths of N=2 to 5 and cyclic siloxanes having 4 or 5 silicon atoms.5. The composition according to claim 1 , wherein the composition contains 20 to 35% by weight of a polydimethylsiloxane having a chain length N of 6 and 7 claim 1 , 3 to 23% by weight of a polydimethylsiloxane having a chain length N of 8 to 12 claim 1 , ≦7% by weight of a polydimethylsiloxane having a chain length N of ≧13 and 35 to 73% by weight of a polydimethylsiloxane having chain lengths of N=2 to 5 and cyclic siloxanes having 4 or 5 silicon atoms.6. The composition according to claim 1 , wherein a mass ratio Q of the polydimethylsiloxane with N=6 or 7 to the polydimethylsiloxane with N=13 to 18 is from 4 to 60.7. The composition according to claim 1 , wherein a sum of the proportions of the polydimethylsiloxane with N<6 and of the proportions of cyclic siloxanes having 4 or 5 silicon atoms is 40 to 70% by weight claim 1 , based on the mass of the polydimethylsiloxane.8. The composition according to claim 1 , wherein the composition contains less than 1% of compounds which have a boiling ...

SURFACE FUNCTIONALIZED POROUS SILICON MATERIAL AND METHOD OF MAKING THEREOF

The present invention relates generally to a surface functionalized porous containing material and method of making thereof. 1. A silicon containing material having a plurality of pores , the material comprising: a) an exterior surface region comprising a first terminal group; and b) an interior pore surface region comprising a second terminal group , wherein the first terminal group and the second terminal group are different from each other and are chemically linked to the material.2. The material of claim 1 , wherein one of the first and second terminal groups comprises a hydride terminal group.3. The material of claim 2 , wherein the hydride terminal group comprises silicon hydride.4. The material of claim 3 , wherein the hydride terminal group is modified to an organosilane.5. The material of claim 4 , wherein the organosilane comprises an alkyl claim 4 , a carboxylic acid claim 4 , an ester claim 4 , an amine claim 4 , a protein claim 4 , an oligonucleotide claim 4 , a short chain peptide claim 4 , a sugar claim 4 , a polysaccharide claim 4 , a fatty acid claim 4 , or mixtures thereof.6. The material of claim 5 , wherein the organosilane comprises an alkyl.7. The material of claim 2 , wherein the other one of the first and second terminal groups comprises carbon claim 2 , silicon oxide claim 2 , silicon dioxide or mixtures thereof.8. The material of claim 7 , wherein the other one of the first and second terminal groups comprises silicon oxide.9. The material of claim 1 , wherein the plurality of pores have an average diameter of from about 1 nm to about 300 nm.10. The material of claim 1 , wherein the material is a film.11. The material of claim 10 , wherein the film has a thickness of from about 5 nm to 500 microns.12. The material of claim 1 , wherein the plurality of pores has an open porosity of from about 5% to about 95% based on the total volume of the material.13. The material of claim 1 , wherein the interior pore surface region further comprises a ...

POLYSILSESQUIOXANE-DENDRON LIQUID CRYSTALS AND METHOD FOR PREPARING THE SAME

Due to excellent processability of the POSS-dendron-structured liquid crystal compound according to the present invention, it is possible to coat and print on the compound and, also, to manufacture large size flexible devices. 3. The liquid crystal compound of claim 1 , wherein Rand Rare independently C-Clinear or branched alkyl claim 1 , or C-Calkenyl.4. The liquid crystal compound of claim 1 , wherein Rand Rare independently C-Clinear or branched alkyl claim 1 , or C-Calkenyl claim 1 , of which at least one carbon atom is substituted by O claim 1 , S claim 1 , N or F.5. The liquid crystal compound of claim 1 , wherein Rand Rare independently C-Calkylene claim 1 , C-Calkoxy claim 1 , C-Cfluoroalkylene claim 1 , C-Cether claim 1 , C-Cfluoroether claim 1 , or —ORO— claim 1 , where Ris C-Calkylene or C-Cfluoroalkylene.8. The liquid crystal compound of claim 1 , wherein the liquid crystal compound of the POSS-dendron structure has a weight average molecular weight of 500-3 claim 1 ,000 g/mol.9. A liquid crystal display device comprising the liquid crystal compound of claim 1 , wherein the liquid crystal compound is used as an additive to a liquid crystal layer so as to improve alignment of liquid crystal molecules claim 1 , or to enhance orientation of the liquid crystal by being located at either or both of the upper or lower side of the liquid crystal surface.11. The method of claim 10 , wherein the R-M-R—Ar is reacted with the polysilsesquioxane after introducing —NCO to the end group of the polysilsesquioxane at the step (iv).12. A liquid crystal display device comprising the liquid crystal compound of claim 2 , wherein the liquid crystal compound is used as an additive to a liquid crystal layer so as to improve alignment of liquid crystal molecules claim 2 , or to enhance orientation of the liquid crystal by being located at either or both of the upper or lower side of the liquid crystal surface.13. A liquid crystal display device comprising the liquid crystal ...

Synthesis of functional fluorinated polyhedral oligomeric silsesquioxane ("f-poss")

A method of forming a hydrophobic and oleophobic surface. The method including spin coating an F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane onto an inert surface. The F-POSS has a structure: Each R f represents a nonreactive, fluorinated organic group, R 1 represents a first monovalent organic group comprising at least two carbon atoms, and R 2 represents hydrogen or a second monovalent organic group comprising at least two carbon atoms. The F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane are then dried on the inert surface.

Organic light-emitting device, display apparatus, image information-processing apparatus, and image-forming apparatus

Provided is an organic light-emitting device having high efficiency and capable of being driven at a low voltage. An organic light-emitting device includes an anode, a cathode, and an organic compound layer including at least an emission layer between the anode and the cathode. The organic light-emitting device includes, between the anode and the emission layer, a first layer including a first organic semiconductor material and a transition metal oxide, and a second layer in contact with the first layer at an interface on a side closer to the anode and including a second organic semiconductor material. The refractive index of the first organic semiconductor material is less than 1.6. The ionization potential of the first organic semiconductor material is equal to or larger than the ionization potential of the second organic semiconductor material.

ALUMINUM-MODIFIED POLYSILAZANES FOR POLYMER-DERIVED CERAMIC NANOCOMPOSITES

Methods for synthesizing aluminum-modified silazanes, their use as polymer-derived ceramic precursors, and polymer-derived ceramics and carbon nanotube core/shell nanocomposites formed therefrom are disclosed. 1. A ceramic nanocomposite comprising:a plurality of carbon nanotubes having respective sidewalls; anda layer of a polymer-derived ceramic adjacent said sidewalls, said polymer-derived ceramic being bonded to said sidewalls forming a protective shell thereon, wherein said polymer-derived ceramic is formed from an aluminum-modified silazane that is a room temperature liquid-phase polymer.2. The ceramic nanocomposite of claim 1 , wherein said carbon nanotubes chemically interface with said aluminum-modified silazane.3. The ceramic nanocomposite of claim 1 , wherein said silazane is poly(ureamethylvinyl)silazane.4. The ceramic nanocomposite of claim 1 , wherein said ceramic nanocomposite is resistant to oxidation in flowing air at a temperature of up to about 1000° C.5. The ceramic nanocomposite of claim 1 , wherein said ceramic nanocomposite is selected from the group consisting of nanowires claim 1 , nanorods claim 1 , nanosheets claim 1 , and combinations thereof.6. The ceramic nanocomposite of claim 1 , wherein said carbon nanotubes are selected from the group consisting of single-wall carbon nanotubes claim 1 , double-wall carbon nanotubes claim 1 , multi-wall carbon nanotubes claim 1 , and mixtures thereof.7. A structure comprising:a substrate having a surface; and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a layer of a polymer-derived ceramic nanocomposite according to adjacent said substrate surface.'}8. The structure of claim 7 , wherein said layer is resistant to:{'sup': '−2', 'oxidation in flowing air at a temperature of up to about 1000° C.; or laser irradiation up to about 8 kWcmat a wavelength of about 1 μm at 10 kW average power, for about 10 seconds without burning, delamination, or deformation of said layer.'}9. The structure of claim 7 , ...

ORGANO-MODIFIED SILICONE POLYMERS

A linear silicone polymer suitable for use in producing homopolymers, copolymers, polymerized emulsions, latex compositions, and hydrogel polymer films. In one aspect, a hydrophilic silicone monomer is of the Formula 1: 2. The polymer of claim 1 , wherein L is a hydrophilic residue chosen from a polyalkyleneoxide.3. The polymer of claim 1 , wherein L is a polyalkyleneoxide chosen from —CHCHO— claim 1 , —CHCH(CH)O— claim 1 , —CHCHCHO— claim 1 , and their analogues with up to 6 carbon atoms.5. The polymer of claim 1 , wherein R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , and Rin the unit G of group E are independently selected from a hydrocarbon radical chosen from methyl claim 1 , ethyl claim 1 , propyl claim 1 , iso-propyl claim 1 , butyl claim 1 , isobutyl claim 1 , phenyl claim 1 , naphthyl claim 1 , and aralkyl radical with 8 to 20 carbon atoms claim 1 , trifluoromethylpropyl claim 1 , and combinations of two or more thereof.7. The polymer of claim 1 , where Rand Rare hydrogen claim 1 , Ris chosen from hydrogen or a methyl radical claim 1 , and Ris a part of an ethylenically-unsaturated hydrophilic monomer or a hydrophobic monomer.8. The polymer of having at least W group chosen from an X group to yield a pre-polymer.9. The polymer of claim 1 , wherein both the W groups are chosen from a Y group as a chain stopper to yield a non-reactive polymer.10. A homo or co-polymer comprising at least one pre-polymer of .11. The copolymer of claim 10 , wherein the polymer is a copolymer further comprising a free-radical polymerizable organic monomer chosen from a vinylic monomer claim 10 , an acrylide monomer claim 10 , an acrylic monomer claim 10 , or a combination of two or more thereof.12. The copolymer of claim 11 , wherein the vinylic monomer is chosen from N-vinyl-pyrrolidone claim 11 , N-vinyl-caprolactam claim 11 , N-vinyl-acetamide claim 11 , N-vinyl-formamide and N-vinyl-isopropylamide claim 11 , vinyl benzene claim ...

OCTAMETHYLCYCLOTETRASILOXANE INTERACTS WITH LITHIUM IONS

Provided is a method of extracting a metal ion, which comprises contacting a compound of formula (RSiO)with a source of the metal ion, whereby the compound and the metal ion form a complex, wherein each R is independently Calkyl, and n is 3-10. 1. A method of extracting a metal ion from a source , the method comprising:{'sub': 2', 'n, 'contacting a compound of formula (RSiO)with the metal ion in the source, whereby the compound and the metal ion form a complex;'}{'sub': '1-10', 'wherein each R is independently selected from Calkyl, and n is 3-10.'}2. The method of claim 1 , wherein the metal ion is a lithium ion.3. The method of claim 1 , wherein the source comprises the metal ion and a counterion selected from the group consisting of F claim 1 , Cl claim 1 , Br claim 1 , I claim 1 , HSO4 claim 1 , SO claim 1 , HCO claim 1 , CO claim 1 , B(OH) claim 1 , BO claim 1 , BO claim 1 , BO claim 1 , NO claim 1 , HPO claim 1 , HPO claim 1 , PO claim 1 , and combinations thereof.5. The method of claim 1 , wherein the Rgroups are the same.7. The method of claim 1 , wherein the source of the metal ion comprises an aqueous solution.8. The method of claim 1 , wherein the source of the metal ion comprises seawater.9. The method of claim 1 , wherein the pH of the source of the metal ion is 1 to 12.10. The method of claim 1 , wherein the pH of the source of the metal ion is 2 to 4.11. The method of claim 1 , further comprising pre-treating the source of the metal ion before contacting the compound of formula (I) with the source.13. The method of claim 1 , further comprising isolating the metal ion from the complex.14. The method of claim 1 , further comprising distilling the compound.15. The method of claim 1 , wherein the concentration of the metal ion in the source is about 1×10M to about 1×10M.16. The method of claim 1 , wherein the concentration of the metal ion in the source is about 1×10M to about 1×10M.17. The method of claim 1 , wherein the concentration of the metal ion in ...

DITERMINALLY SILANOL-MODIFIED PERFLUOROPOLYETHER COMPOUND AND PREPARATION THEREOF

Diterminally silanol-modified perfluoropolyether compounds of the general formula (1) This non-provisional application claims priority under 35 U.S.C. § 119(a) on Patent Application No. 2020-131626 filed in Japan on Aug. 3, 2020, the entire contents of which are hereby incorporated by reference.The present invention relates to a diterminally silanol-modified perfluoropolyether compound and to a method for preparing the same.Perfluoropolyether groups are building blocks containing a large number of fluorine atoms. Compounds having such a perfluoropolyether group (which compounds are referred to below as “perfluoropolyether compounds”), and coating films and articles obtained from compositions containing such compounds, have a very small surface free energy due to the effect of the many fluorine atoms included on the perfluoropolyether group, and thus exhibit, for example, water and oil repellency, lubricity, releasability and stain-blocking properties. Because of this quality, perfluoropolyether compounds are employed in a broad range of fields, including water and oil repellent finishes, lubricants, oil proofing agents, cosmetics and protective films.Perfluoropolyether compounds having functional groups at the ends of the main chain can be used to derive polymers having a perfluoropolyether skeleton by way of copolymerization with a reactive monomer or via reaction with a reactive resin. This makes it possible to impart, in addition to the properties of the polymer itself, the foregoing properties of perfluoropolyether groups. Perfluoropolyether compounds having functional groups such as (meth)acrylate, amine, alcohol, isocyanate, epoxy, thiol and vinyl groups and halogen atoms have been developed to date as such perfluoropolyether compounds.For example, JP-A 2005-200304 teaches the preparation of a perfluoropolyether compound having a functional group from a silane coupling agent by carrying out transesterification between, as the starting materials, a ...

PROCESS AND COMPOSITION FOR THE PRODUCTION OF FLEXIBLE POLYURETHANE FOAM

Disclosed are a process of producing a polyurethane foam product, a polyurethane foam product pre-mix, polyurethane foam product formulation, and a polyurethane foam product. The process of producing the polyurethane foam product includes contacting a halogen containing composition with a polyurethane foam product pre-mix. The polyurethane foam product pre-mix includes the halogen containing composition. The polyurethane foam product formulation includes a polyol component, an isocyanate component, and a halogen containing compound component. The polyurethane foam product is formed by the pre-mix having the halogen containing composition. 1. A polyurethane foam additive composition comprising at least one halogen containing compound.2. The polyurethane foam additive composition of claim 1 , wherein the at least one halogen containing compound is an acyl compound with a general formula [Cl—(CH)—CO]-A selected from the group consisting of:{'sub': 1', '36', '2', '1', '18, 'i) esters wherein A is a RO— group and where R=C-Calkyl group linear or branched, saturated or unsaturated, substituted or unsubstituted, and where the substituents are OH, a halogen, NH═, an ether moiety —OR′, an ester moiety —COOR″, or a urea moiety —NHCONH, and wherein R′ and R″ are C-Calkyl groups and x=1 and y=1;'}{'sub': 2', '2', 'n', '2', '2', 'n', '2', '3', 'n', '2', '3', 'n', '2', '2', 'n', '2', '3', 'm', '2', '2', 'n', '2', '3', 'm', '2', '3', 'n', '2', '2', 'm, 'ii) esters and ester-alcohols where A is a chemical group of general formula —O—[CH—CH—O]—H and x=1 and y=1 and n=1 to 700, or —O—[CH—CH—O]— and x=2 and y=1 and n=1 to 700, or —O—[CH—CH(CH)—O]—H and x=1 and y=1 and n=1 to 700, or —O—[CH—CH(CH)—O]— and x=2 and y=1 and n=1 to 700, or —O—[CH—CH—O]—[CH—CH(CH)—O]—H and x=1 and y=1 and n and m are independently from 1 to 700, or —O—[CH—CH—O]—[CH—CH(CH)—O]— and x=2 and y=1 and n and m are independently from 1 to 700, or —O—[CH—CH(CH)—O]—O—[CH—CH—O]—H and x=1 and y=1 and n and m are ...

NOVEL LIQUID CRYSTAL COMPOUND AND USE THEREOF

The present application relates to a novel liquid crystal compound and a use thereof. The novel liquid crystal compounds of the present application can exhibit a smectic A phase over a wide temperature range. The novel liquid crystal compounds of the present application can be usefully used in the technical fields to which smectic A liquid crystals can be applied, for example, bistable devices. 2. The liquid crystal compound according to claim 1 , wherein{'sub': 1', '4, 'in said Formula 1, Rto Rare a methyl group.'}3. The liquid crystal compound according to claim 1 , wherein{'sub': '5', 'in said Formula 1, Ris —CN.'}4. The liquid crystal compound according to claim 1 , whereinin said Formula 1, k is an integer of 0 to 3.5. The liquid crystal compound according to claim 1 , whereinin said Formula 1, l is 0 or 1.6. The liquid crystal compound according to claim 1 , whereinin said Formula 1, m is an integer of 7 to 9.7. The liquid crystal compound according to claim 1 , wherein{'sub': 1', '8, 'in said Formula 1, A is a single bond, any one of Yto Yis N and the remainder are CH.'}8. The liquid crystal compound according to claim 1 , wherein{'sub': 1', '2', '1', '8, 'in said Formula 1, A is Formula 2, Zand Zare CH, any one of Yto Yis N and the remainder are CH.'}9. The liquid crystal compound according to claim 1 , wherein{'sub': 1', '2', '1', '8, 'in said Formula 1, A is Formula 2, Zand Zare N, and Yto Yare each CH.'}11. The liquid crystal compound according to claim 1 , whereinthe liquid crystal compound exhibits a smectic A phase in a temperature range of −20° C. to 100° C.12. The liquid crystal compound according to claim 1 , whereinthe liquid crystal compound has a dielectric anisotropy of −1.0 to 20.13. A bistable device comprising the liquid crystal compound of .14. The bistable device according to claim 1 , comprising two electrode substrates disposed opposite to each other and a liquid crystal layer containing the liquid crystal compound of and a charging ...

Organoamino-Functionalized Linear And Cyclic Oligosiloxanes For Deposition Of Silicon-Containing Films

Amino-functionalized linear and cyclic oligosiloxanes, which have at least two silicon and two oxygen atoms as well as an organoamino group and methods for making the oligosiloxanes are disclosed. Methods for depositing silicon and oxygen containing films using the organoamino-functionalized linear and cyclic oligosiloxanes are also disclosed. 2. The method of wherein each of Ris independently selected from hydrogen and a Cto Calkyl group.4. The method of wherein each of Ris independently selected from hydrogen and a Cto Calkyl group.7. The method of wherein each of Ris independently selected from hydrogen and a Cto Calkyl group.8. The method of claim 6 , wherein the at least one silicon precursor compound is selected from the group consisting of 2-dimethylamino-2 claim 6 ,4 claim 6 ,4 claim 6 ,6 claim 6 ,6-pentamethylcyclotrisiloxane claim 6 , 2-diethylamino-2 claim 6 ,4 claim 6 ,4 claim 6 ,6 claim 6 ,6-pentamethylcyclotrisiloxane claim 6 , 2-ethylmethylamino-2 claim 6 ,4 claim 6 ,4 claim 6 ,6 claim 6 ,6-pentamethylcyclotrisiloxane claim 6 , 2-iso-propylamino-2 claim 6 ,4 claim 6 ,4 claim 6 ,6 claim 6 ,6-pentamethylcyclotrisiloxane claim 6 , 2-dimethylamino-2 claim 6 ,4 claim 6 ,4 claim 6 ,6 claim 6 ,6 claim 6 ,8 claim 6 ,8-heptamethylcyclotetrasiloxane claim 6 , 2-diethylamino-2 claim 6 ,4 claim 6 ,4 claim 6 ,6 claim 6 ,6 claim 6 ,8 claim 6 ,8-heptamethylcyclotetrasiloxane claim 6 , 2-ethylmethylamino-2 claim 6 ,4 claim 6 ,4 claim 6 ,6 claim 6 ,6 claim 6 ,8 claim 6 ,8-heptamethylcyclotetrasiloxane claim 6 , 2-iso-propylamino-2 claim 6 ,4 claim 6 ,4 claim 6 ,6 claim 6 ,6 claim 6 ,8 claim 6 ,8-heptamethylcyclotetrasiloxane claim 6 , 2-dimethylamino-2 claim 6 ,4 claim 6 ,6-trimethylcyclotrisiloxane claim 6 , 2-diethylamino-2 claim 6 ,4 claim 6 ,6-trimethylcyclotrisiloxane claim 6 , 2-ethylmethylamino-2 claim 6 ,4 claim 6 ,6-trimethylcyclotrisiloxane claim 6 , 2-iso-propylamino-2 claim 6 ,4 claim 6 ,6-trimethylcyclotrisiloxane claim 6 , 2-dimethylamino-2 claim 6 ,4 ...

Method Of Stabilizing Siloxanes Having Terminal Hydroxy Groups

Siloxanes having terminal hydroxy groups, and which have a content of cyclic siloxanes of not more than 5% by weight, are stabilized by addition of ammonia in gaseous form or as a solution in a protic or aprotic solvent or in the form of an ammonia-releasing compound in amounts of at least 0.01 ppm by weight and not more than 100 ppm by weight, calculated as ammonia and based on the total weight of the siloxanes having terminal hydroxy groups. Ammonia in gaseous form is preferably used.

POLYHEDRAL OLIGOMERIC SILSESQUIOXANE AND PREPARATION METHOD THEREOF

Provided are a polyhedral oligomeric silsesquioxane and a preparation method thereof, more particularly, a polyhedral oligomeric silsesquioxane itself which has a low refractive property and enables formation of a coating layer with excellent chemical and mechanical properties, and provides excellent adhesive strength for the surfaces of various substrates, and a preparation method thereof. 1. A polyhedral oligomeric silsesquioxane represented by the following Chemical Formula 1:{'br': None, 'sup': 1', '2', '3, 'sub': 1.5', 'x', '1.5', 'y', '1.5', 'z, '(RSiO)(RSiO)(RSiO)\u2003\u2003[Chemical Formula 1]'}{'sup': 1', '2', '1', '2, 'wherein Rand Rare hydrocarbyl groups having 1 to 10 carbon atoms, in which at least one hydrogen atom is substituted with a halogen atom, and Rand Rare different from each other,'}{'sup': '3', 'Ris an unsaturated functional group;'}x and y are each independently an integer of 1 to 12, and z is an integer of 2 to 12.2. The polyhedral oligomeric silsesquioxane of claim 1 , wherein Rand Rare each independently a trifluoromethyl group claim 1 , a trifluoroethyl group claim 1 , a trifluoropropyl group claim 1 , a trifluorobutyl group claim 1 , a pentafluorobutyl group claim 1 , a trifluoropentyl group claim 1 , a pentafluoropentyl group claim 1 , a heptafluoropentyl group claim 1 , a trifluorohexyl group claim 1 , a pentafluorohexyl group claim 1 , a heptafluorohexyl group claim 1 , a nonafluorohexyl group claim 1 , a trifluoroheptyl group claim 1 , a pentafluoroheptyl group claim 1 , a heptafluoroheptyl group claim 1 , a nonafluoroheptyl group claim 1 , a dodecafluoroheptyl group claim 1 , a chloropropyl group claim 1 , or a dibromoethyl group.3. The polyhedral oligomeric silsesquioxane of claim 1 , wherein Rhas a substitution ratio of the halogen atom in the hydrocarbyl group of less than 50%; and{'sup': '2', 'Rhas a substitution ratio of the halogen atom in the hydrocarbyl group of 50% or more.'}4. The polyhedral oligomeric silsesquioxane of ...

FLUORINE-CONTAINING AND SILICON-CONTAINING COMPOUND

The present invention provides a fluorine-containing, silicon-containing compound of formula (I): 1. A fluorine-containing and silicon-containing compound of formula (I):{'br': None, 'sup': 1', '2, 'sub': 'n', 'T-(A-B)-T'}wherein:{'sup': 3', '2', '1', '2', '4, 'A is each independently at each occurrence —R—R—R—R—R—;'}{'sup': 1', '7', '8', '7', '8, 'sub': 'p', 'Ris —(SiRR—O)—SiRR—;'}{'sup': '7', 'Ris independently at each occurrence a hydrogen atom, an optionally substituted alkyl group having 1-8 carbon atoms, an optionally substituted alkenyl group having 1-8 carbon atoms, an optionally substituted aryl group, a vinyl group, a vinyloxy group, or a vinylalkyl group having 3-8 carbon atoms;'}{'sup': 8', '11', '12', '1, 'Ris independently at each occurrence a hydrogen atom, an optionally substituted alkyl group having 1-8 carbon atoms, an optionally substituted alkenyl group having 1-8 carbon atoms, an optionally substituted aryl group, a vinyl group, a vinyloxy group, a vinylalkyl group having 3-8 carbon atoms, or —R—R-Rf;'}{'sup': 11', '25, 'sub': 'x', 'Ris a single bond or —(R)—;'}{'sup': '25', 'Ris each independently alkylene having 1-6 carbon atoms, arylene having 6-10 carbon atoms, or —O—;'}x is an integer of 1 to 3;{'sup': 12', '13', '14', '13', '2', '14, 'Ris —CR═CR— or —CRXCHR—;'}{'sup': '13', 'Ris each independently a hydrogen atom, an alkyl group having 1-3 carbon atoms, an ester group, a nitrile group, a nitro group, an alkoxy group having 1-3 carbon atoms, or an aryloxy group;'}{'sup': '14', 'Ris each independently a hydrogen atom, an alkyl group having 1-3 carbon atoms, an ester group, a nitrile group, a nitro group, an alkoxy group having 1-3 carbon atoms, or an aryloxy group;'}{'sup': '2', 'Xis each independently a hydrogen atom, an iodine atom, a bromine atom, or a chlorine atom;'}{'sup': '1', 'Rfis each independently a fluorine-containing alkyl group;'}p is an integer of 1 to 50;{'sup': 2', '26, 'sub': 'y', 'Ris each independently a single bond or —( ...

Organopolysiloxane, Method for Producing the Same, and Curable Resin Composition Containing the Organopolysiloxane

The present invention provides organopolysiloxane comprising one or more unsaturated bond-containing group(s) in one molecule and having constitutional units F1, M1, and T in any combination of 2. The organopolysiloxane according to claim 1 , wherein a claim 1 , b claim 1 , and c in the general formulas (1) to (3) satisfy formula (I):{'br': None, 'i': ≦a', 'b+c, '0.1/()≦5\u2003\u2003(I).'}3. The organopolysiloxane according to claim 1 , wherein Rin the constitutional unit F1 represented by the general formula (1) is an acryloxy group or a methacryloxy group.5. The organopolysiloxane according to claim 1 , wherein the organopolysiloxane comprises a constitutional unit S represented by general formula (7) claim 1 , wherein the content of the constitutional unit represented by the general formula (7) satisfies formula (II) with respect to the content of the constitutional unit F1 represented by the general formula (1):{'br': None, 'i': 'd/a≦', '0.1\u2003\u2003(II)'}{'br': None, 'sup': '1', 'sub': 2/2', 'd, 'S:(RHSiO)\u2003\u2003(7)'}{'sup': '1', 'wherein Rrepresents any selected from the group consisting of a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 10 carbon atoms, a substituted or unsubstituted aryl group, and a substituted or unsubstituted aralkyl group, wherein the constitutional unit S represents a unit constituting cyclic or chain organopolysiloxane.'}6. The organopolysiloxane according to claim 1 , wherein the organopolysiloxane comprises only the constitutional unit F1 represented by the general formula (1) as a constitutional unit containing the Rmoiety.11. The organopolysiloxane according to claim 1 , wherein Ris an alkyl group having 1 to 10 carbon atoms.12. The organopolysiloxane according to claim 11 , wherein Ris a methyl group.13. The organopolysiloxane according to claim 1 , wherein Rcomprises an acryloxy group or a methacryloxy group claim 1 , wherein the acryloxy ...

HYDROXIDE-CATALYZED FORMATION OF SILICON-OXYGEN BONDS BY DEHYDROGENATIVE COUPLING OF HYDROSILANES AND ALCOHOLS

The present disclosure is directed to methods for dehydrogenatively coupled hydrosilanes and alcohols, the methods comprising contacting an organic substrate having at least one organic alcohol moiety with a mixture of at least one hydrosilane and sodium and/or potassium hydroxide, the contacting resulting in the formation of a dehydrogenatively coupled silyl ether. The disclosure further described associated compositions and methods of using the formed products. 1. A method comprising contacting an organic substrate having at least one alcohol moiety with a mixture of at least one hydrosilane and sodium and/or potassium hydroxide , the contacting resulting in the formation of a dehydrogenatively coupled silyl ether , wherein the contacting is done in the absence of a crown ether.2. The method of claim 1 , wherein the hydrosilane has a structure of Formula (I) or of Formula (II):{'br': None, 'sub': 3−m', 'm+1, '(R)Si(H)\u2003\u2003(I)'}{'br': None, 'sub': 2−m', 'm+1', '3−m', 'm, '(R)(H)Si—Si(R)(H)\u2003\u2003(II)'}{'sub': 1-24', '2-24', '2-24', '1-24', '1', '20', '5', '20', '1', '20', '5', '20', '1', '20', '1', '20', '5', '20', '2', '20', '5', '20', '1', '20, 'where: m is independently 0, 1, or 2; and each R is independently optionally substituted Calkyl or heteroalkyl, optionally substituted Calkenyl or heteroalkenyl, optionally substituted Calkynyl or heteroalkynyl, optionally substituted 6 to 18 ring membered aryl or 5 to 18 ring membered heteroaryl, optionally substituted 6 to 18 ring-membered alkaryl or 5 to 18 ring-membered heteroalkaryl, optionally substituted 6 to 18 ring-membered aralkyl or 5 to 18 ring-membered heteroaralkyl, optionally substituted —O—Calkyl or heteroalkyl, optionally substituted 6 to 18 ring-membered aryloxy or 5 to 18 ring-membered heteroaryloxy, optionally substituted 6 to 18 ring-membered alkaryloxy or 5 to 18 ring-membered heteroalkaryloxy, or optionally substituted 6 to 18 ring-membered aralkoxy or 5 to 18 ring-membered ...

PROCESS FOR PRODUCING SPERHICAL POLYSILSESQUIOXANE PARTICLES

Spherical organopolysiloxane resin particles with improved flow properties can be reproducibly obtained employing trialkoxysilanes having different hydrolysable chlorine contents by regulating pH in a first, acid hydrolysis step, and then adjusting pH in a second step to a desired value between 1 and 6. Particles are allowed to grow without agitation in a subsequent basic condensation step. 111.-. (canceled)12. A process for producing spherical polysilsesquioxane particles , wherein in a first step trialkoxysilane T which contains trialkoxysilanes of formula (I){'br': None, 'sup': '1', 'sub': '3', 'RSi(OR)\u2003\u2003(I),'}in whichR represents a hydrocarbon radical having 1 to 16 carbon atoms whose carbon chain may be interrupted by nonadjacent groups —O—,{'sup': '1', 'sub': 1', '4, 'Rrepresents a Cto C-alkyl radical,'} is reacted by mixing with acidified water having a pH of at most 6 to afford a hydrolyzate, in a second step the pH of the hydrolyzate is adjusted to a value of 1 to 6,', {'sub': 1', '4, 'in a third step the hydrolyzate is mixed with a solution of a base in water or C- to C-alkanol,'}, 'and in a fourth step the mixture is stored for at least 2 h before the polysilsesquioxane particles are isolated., 'and contains chlorine compounds,'}13. The process of claim 12 , wherein each R independently represents an ethyl radical or a methyl radical.14. The process of claim 12 , wherein each Rindependently represents an ethyl radical or methyl radical.15. The process of claim 12 , wherein in the first step claim 12 , the reaction to afford the hydrolyzate is carried out at a pH of 4.5 to 2.16. The process of claim 12 , wherein the temperature of the reaction in the first step is 0° C. to 60° C.17. The process of claim 12 , wherein in the first step claim 12 , per 100 parts by weight of water 5 to 43 parts by weight of trialkoxysilane are added.18. The process of claim 12 , wherein in the second step the deviation in the adjusted pH is less than ±0.5.19. The ...

SYNTHESIS AND PROCESSING OF NEW SILSESQUIOXANE/SILOXANE SYSTEMS

A method of forming a silsesquioxane/Q/siloxane polymer or oligomer system used to form coatings or monoliths, includes the step of mixing silsesquioxane, siloxane and alkoxysilane components having structures as presented below in ratios as presented below with a soluble F catalyst and water in a suitable solvent so that on stirring at temperatures of −20° to approximately 100° C. all of the components dissolve producing a solution. A soluble oligomer is formed in equilibribum with single molecules with specific structures including [RSiO][R′MeSiO][R′MeSiOSiO](where R═R′ or R″ or Ror Ras denoted below) and where x, y and z are mole fractions whose sum is equal to one. 2. The method of claim 1 , further comprising the step of adding a component including nanoparticles to modify functional groups to optimize specific properties including ability to photolytically or thermally crosslink claim 1 , adhesive and mechanical strength claim 1 , fracture toughness claim 1 , refractive indices claim 1 , surface hydrophobicity or hydrophilicity or to introduce components that will phase separate in a coating or monolith so that the system can then be cast or coated and cured to form coatings claim 1 , films claim 1 , monoliths or used as an additive.3. The method of claim 1 , wherein the silsesquioxane can be a T claim 1 , T claim 1 , Tor Tsingle cage or mixed cages or a random resin where R claim 1 , R claim 1 , Rare chosen from those listed above.4. The method of claim 1 , wherein the Q species can be a Qor Qsingle cage or mixed cages or a random Q resin where R′ is chosen from those listed above.5. The method of claim 1 , wherein the siloxane unit —[RSiR′O]n- can be a cyclomer where n=3-8 or a linear or branched oligomer or polymer where R claim 1 ,R″ can be the same or different and can be chosen from those listed above.6. The method of claim 1 , wherein the alkoxy silane component(s) R″ can be chosen from those listed above claim 1 , and the alkoxy group can be Et as ...

SILANOL COMPOUND AND METHOD FOR PRODUCING SILANOL COMPOUND

The present invention provides a method for producing a silanol compound capable of efficiently producing a silanol compound. The method for producing a silanol compound includes a proton exchange step of forming a silanol compound having a structure represented by following formula (c) by reacting a silicate having a structure represented by following formula (a) with an acidic compound having an acid dissociation constant pKof −1 to 20 in dimethyl sulfoxide (DMSO). 110.-. (canceled)12. A solid composition comprising the silanol composition according to .13. A composition comprising 30% by mass or more of the silanol composition according to .14. A composition comprising 65% by mass or more of the silanol composition according to .15. A composition having a crystal structure formed with the silanol composition according to and an amide compound.16. A dehydrated condensation product of the silanol composition according to . This application is a divisional of application Ser. No. 16/606,487, filed Oct. 18, 2019, which is the U.S. national phase application filed under 35 U.S.C. § 371 of International Application Number PCT/JP2018/008434, filed Mar. 5, 2018, designating the United States, which claims priority from Japanese Application Number 2017-083845, filed Apr. 20, 2017.The present invention relates to a silanol compound and a method for producing a silanol compound, and more specifically, to a method for producing a silanol compound, wherein the silanol compound is formed from a silicate.Siloxane is a very important compound that, because of its specific nature, is used in a wide range of fields, such as automobiles, construction, electronics, and medicine. In recent years, siloxane is essential even in the field of environment and energy, such as in sealing materials for LEDs and silane coupling agents for eco-friendly tires. It is no exaggeration to say that there are no fields that do not use siloxane compounds. The market size of siloxane compounds in 2009 ...

THICKENING STABILIZER AND THICKENING STABILIZER COMPOSITION INCLUDING SAME

The present invention provides a compound that thickens or gels a fluid organic substance to a desired viscosity, or uniformly stabilizes a composition containing a fluid organic substance. The compound of the present invention is a compound represented by Formula (1) below: wherein, Rrepresents a monovalent aliphatic hydrocarbon group having 4 or more carbons; Rrepresents a divalent aliphatic hydrocarbon group having from 1 to 12 carbons; Rrepresents a monovalent aliphatic hydrocarbon group having from 1 to 12 carbons; m represents an integer from 0 to 10; and n represents an integer from 1 to 4; in a case where n is 1 or 2, (4−n) Rs may be the same or different; and in a case where n is from 2 to 4, n Rs, n Rs, and n m's each may be the same or different. 2. A thickening stabilizer comprising the compound described in .3. A thickening stabilizer composition comprising a miscible material of the thickening stabilizer described in and a fluid organic substance.4. A method for manufacturing a thickening stabilizer composition claim 2 , the method comprising blending the thickening stabilizer described in and a fluid organic substance to make a miscible material to produce a thickening stabilizer composition. The present invention relates to a novel compound having an action of thickening and stabilizing fluid organic substances, such as oils; a thickening stabilizer including such a compound; and a composition including a fluid organic substance thickened and stabilized by the thickening stabilizer. The present application claims priority to JP 2017-045780 filed to Japan on Mar. 10, 2017, whose content is incorporated herein.Methods of thickening and stabilizing liquids are industrially very important techniques. For example, mayonnaise and salad dressing, which are emulsions in metastable states, can stably maintain their emulsified state for a long period of time. This is because aqueous components therein are thickened and stabilized. Accordingly, various ...

FUNCTIONALIZED F-POSS MONOMER COMPOSITIONS AND USES THEREOF

Functionalized F-POSS compounds comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures and/or functional groups. 119.-. (canceled)21. The article of claim 20 , wherein Ris C-Calkyl claim 20 , wherein each hydrogen atom in Ris independently optionally substituted by an R.22. The article of claim 20 , wherein Ris —NCO claim 20 , —OR claim 20 , —OC(O)R claim 20 , —C(O)OR claim 20 , —C(O)Ror —OC(O)OR.23. The article of claim 20 , wherein Ris C-Calkyl and wherein each hydrogen atom in Ris independently optionally substituted by an R.24. The article of claim 20 , wherein Ris C-Calkenyl claim 20 , wherein each hydrogen atom in Ris independently optionally substituted by an R.25. The article of claim 20 , wherein Ris C-Calkyl claim 20 , —NCO claim 20 , —OR claim 20 , —NRR claim 20 , —OC(O)R claim 20 , C(O)OR claim 20 , —C(O)Ror —OC(O)OR.26. The article of claim 20 , wherein Ris C-Calkyl claim 20 , C-Calkenyl claim 20 , C-Calkynyl claim 20 , CCaryl or 5-7 membered heteroaryl claim 20 , wherein each hydrogen atom in Ris independently optionally substituted by one or more R.27. The article of claim 20 , wherein Ris hydrogen or C-Calkyl claim 20 , and when Ris C-Calkyl claim 20 , Ris optionally substituted by a —OC(O)R.28. The article of claim 20 , wherein Ris H or C-Calkyl claim 20 , and when Ris C-Calkyl claim 20 , each hydrogen atom in Ris independently optionally substituted by a fluorine atom.29. The article of claim 20 , wherein Ris n-propyl claim 20 , wherein each hydrogen atom in Ris independently optionally substituted by an R.30. The article of claim 20 , wherein Ris —OC(O)Ror —OC(O)OR.31. The article of claim 30 , wherein Ris methyl.32. The article of claim 30 , wherein Ris CH═CH claim 30 , wherein each hydrogen atom in Ris independently optionally substituted by methyl.33. The article of claim 20 , wherein Ris —NH.34. The article of claim 33 , wherein the base is ...

FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-ACID GENERATORS

Non-ionic photo-acid generating (PAG) compounds were prepared that contain an aryl ketone group having a perfluorinated substituent alpha to the ketone carbonyl. The non-polymeric PAGs release a sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development. At higher temperatures, the PAGs can also undergo a thermal reaction to form a sulfonic acid. The perfluorinated substituent provides improved thermal stability and hydrolytic/nucleophilic stability. 3. The compound of claim 1 , wherein n is 1.4. The compound of claim 1 , wherein Ris selected from the group consisting of trifluoromethyl (*—CF) claim 1 , perfluoroethyl (*—CFCF) claim 1 , perfluoro-n-propyl (*—CFCFCF) claim 1 , and perfluoro-n-butyl (*—CFCFCFCF).6. The compound of claim 1 , wherein Rcomprises an adamantyl group.8. The compound of claim 7 , wherein the Z is isobutyl.10. The compound of claim 1 , wherein n is 2.11. The compound of claim 10 , wherein Ris 1 claim 10 ,3-phenylene.12. The compound of claim 10 , wherein Ris hexan-1 claim 10 ,6-diyl (*—CH(CH)CH—*).15. The resist formulation of claim 14 , wherein the resist formulation is positive-tone.16. The resist formulation of claim 14 , wherein the resist formulation is negative-tone.17. The resist formulation of claim 14 , wherein the compound is capable of forming an acid when exposed to radiation.18. The resist formulation of claim 17 , wherein the radiation is selected from the group consisting of electron beam claim 17 , deep ultraviolet light claim 17 , and extreme ultraviolet light.19. The resist formulation of claim 14 , wherein the compound is capable of forming an acid when heated to a temperature of about 150° C. or higher.20. A method claim 14 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, ...

IODINE-CONTAINING COMPOUND

An iodine compound represented by formula (3) and a polymerization inhibitor including the iodine compound, wherein Rto Rare as defined herein, Xis an n1-valent group, and n1 is an integer of 1 to 10: 3. The compound according to claim 1 , which is represented by formula (3) claim 1 , wherein Xis a linear or branched n1-valent hydrocarbon group or an n1-valent aromatic group.4. A polymerization initiator comprising the compound according to .5. A polymerization initiator comprising the compound according to .6. A polymerization initiator comprising the compound according to . This is a Continuation application under 37 C.F.R. § 1.53(b) of International Application No. PCT/JP2019/018114 filed Apr. 26, 2019, which claims priority from Japanese Patent Application No. 2018-089484 filed May 7, 2018. The above noted applications are incorporated herein by reference in their respective entireties.The present disclosure relates to an iodine-containing compound.Conventionally, living radical polymerization using an iodine-containing compound has been known (Patent Literature 1).Patent Literature 1: International Publication No. WO 2013/027419Living radical polymerization as described in Patent Literature 1 is advantageous in that the molecular weight can be controlled and a polymer can be obtained without using a metal or a compound containing a metal as a catalyst. However, in the polymerization using such an iodine-containing compound, there are few kinds of polymerization initiator species as a starting material, and a new polymerization initiator species is desired.Accordingly, it is an object of the present disclosure to provide an iodine-containing compound that can be used as a polymerization initiator species for living radical polymerization.The present disclosure includes the following embodiments [1] to [10].[1] A compound represented by any of the following formulae (1) to (4):whereinRis H, F, Cl, CH, CF, or O(CF)F;Ris —COOR, —PO(OR), —SO—R, —SO—R, —SO—R, - ...

NANOSIZED DENDRIMERIC EPOXY RESIN TO PREVENT CASING-CASING ANNULUS PRESSURE ISSUES

A method includes introducing an epoxy resin system to a wellbore defect in a wellbore. The epoxy resin system comprises a polyhedral oligomeric silsesquioxane (POSS) epoxy resin with at least one reactive group and a curing agent. The method includes maintaining the epoxy resin system in the wellbore such that a cured epoxy resin system product forms in the wellbore defect. 1. A method , comprising:introducing an epoxy resin system to a wellbore defect in a wellbore, andmaintaining the epoxy resin system in the wellbore such that a cured epoxy resin system product forms in the wellbore defect,where the epoxy resin system comprises a polyhedral oligomeric silsesquioxane (POSS) epoxy resin with at least one reactive group and a curing agent.2. The method of where the POSS epoxy resin is poly(glycidyl silsesquioxane).3. The method of where the curing agent is selected from the group consisting trimethyl hexamethylene diamine (TMD) claim 1 , diethylenetriamine (DETA) claim 1 , triethylenetetramine (TETA) claim 1 , meta-xylenediamine (MXDA) claim 1 , aminoethylpiperazine (AEP) claim 1 , tetraethylenepentamine (TEPA) claim 1 , polyetheramine claim 1 , isophoronediamine (IPDA) claim 1 , diethyltoluenediamine (DETDA) claim 1 , polyoxypropylene diamine claim 1 , and combinations thereof.4. The method of where the epoxy resin system further comprises an additional epoxy resin.5. The method of where the additional epoxy resin comprises a mixture of bisphenol-A-(epichlorohydrin) epoxy resin and oxirane claim 4 , mono[C12-14-alkyloxy)methyl] derivatives.6. The method of where the epoxy resin system is introduced into the wellbore defect.7. The method of further comprising detecting the wellbore defect.8. The method of further comprising introducing into the annular space a flushing fluid.9. The method of further comprising introducing into the annular space a cleaning fluid.10. The method of where the cleaning fluid is an acidic fluid.11. The method of further comprising ...

SILANOL COMPOUND AND METHOD FOR PRODUCING SILANOL COMPOUND

The present invention provides a method for producing a silanol compound capable of efficiently producing a silanol compound. The method for producing a silanol compound includes a proton exchange step of forming a silanol compound having a structure represented by following formula (c) by reacting a silicate having a structure represented by following formula (a) with an acidic compound having an acid dissociation constant pKof −1 to 20 in dimethyl sulfoxide (DMSO). 2. The method for producing a silanol compound according to claim 1 , wherein the acid dissociation constant pKin dimethyl sulfoxide (DMSO) of the acidic compound is 12.6 or less.3. The method for producing a silanol compound according to claim 1 , wherein the acidic compound is an inorganic acid.4. The method for producing a silanol compound according to claim 3 , wherein the inorganic acid is nitric acid or sulfuric acid.6. The method for producing a silanol compound according to claim 5 , wherein the acidic compound is a resin having at least one structure selected from the group consisting of the structures represented by formulas (b-2) to (b-5).7. The method for producing a silanol compound according to claim 1 , wherein the proton exchange step is performed in at least one liquid selected from the group consisting of water claim 1 , an ether liquid claim 1 , an alcohol liquid claim 1 , an amide liquid claim 1 , an ester liquid claim 1 , a halogen liquid claim 1 , and an aprotic polar liquid.8. The method for producing a silanol compound according to claim 1 , further comprising an ammonium salt addition step of adding an ammonium salt to a product obtained in the proton exchange step.9. The method for producing a silanol compound according to claim 1 , further comprising a freeze-drying step of freezing a product obtained in the proton exchange step or a product obtained in the ammonium salt addition step and exposing the product to reduced pressure.10. The method for producing a silanol compound ...

METHOD FOR MANUFACTURING SILSESQUIOXANE COMPOUND

Provided is a method for manufacturing a silsesquioxane compound represented by general formula (III) shown below, the method having a step of reacting a compound represented by general formula (I) shown below and a compound represented by general formula (II) shown below. In general formulas (I) to (III): each of Rand Rindependently represents a hydrogen atom, an alkyl group of 1 to 8 carbon atoms, an aryl group of 6 to 14 carbon atoms, an aminoalkyl group, an amino group-containing group, a nitrile group-containing group, a vinyl group-containing group, a (meth)acryloyl group-containing group, a chloro group-containing group, a bromo group-containing group, or a functional group containing a boron trifluoride-complexed amino group, each of Rto Rindependently represents an alkyl group of 1 to 8 carbon atoms or an aryl group of 6 to 14 carbon atoms, and M represents at least one element selected from the group consisting of hydrogen, lithium, sodium and potassium. 3: The method for manufacturing a silsesquioxane according to claim 1 , wherein in the general formula (II) claim 1 , M represents at least one element selected from the group consisting of lithium claim 1 , sodium and potassium.4: The method for manufacturing a silsesquioxane according to claim 1 , wherein in the general formula (I) claim 1 , each of Rand Rindependently represents an alkyl group of 1 to 8 carbon atoms claim 1 , an aminoalkyl group claim 1 , or a functional group containing a boron trifluoride-complexed amino group claim 1 , and at least one of R and Ris an aminoalkyl group or a functional group containing a boron trifluoride-complexed amino group.5: The method for manufacturing a silsesquioxane according to claim 4 , wherein in the general formula (I) claim 4 , at least one of Rand Ris a 3-aminopropyl group claim 4 , an N-2-(aminoethyl)-3-aminopropyl group claim 4 , an N-phenyl-3-aminopropyl group claim 4 , or a functional group containing a boron trifluoride-complexed amino group.6: The ...

NEW ORGANOSILICON COMPOUND, THERMOSETTING RESIN COMPOSITION CONTAINING THE ORGANOSILICON COMPOUND, HARDENING RESIN AND ENCAPSULATION MATERIAL FOR OPTICAL SEMICONDUCTOR

A solution is a liquid organosilicon compound represented by general formula (1) as described below: 2. A thermosetting resin composition containing the liquid organosilicon compound according to .4. The thermosetting resin composition according to claim 2 , further containing a platinum catalyst.5. The thermosetting resin composition according to claim 2 , further allowing dispersion of silica and/or a phosphor.6. A hardened material claim 2 , formed by thermally hardening the thermosetting resin composition according to .7. A molded object obtained by molding the hardened material according to .8. A coating film claim 2 , formed by applying the thermosetting resin composition according to .9. An encapsulation material for an optical semiconductor claim 2 , composed of the thermosetting resin composition according to . This application is a continuation in part application of and claims the priority benefit of U.S. application Ser. No. 13/698,279, filed on Dec. 17, 2012, now pending, which is a 371 of international application of PCT application serial no. PCT/JP2011/061359, filed on May 18, 2011. The PCT application claims the priority benefit of Japan application no. 2010-114049, filed on May 18, 2010. The entirety of each of the above-mentioned patent applications is hereby incorporated by reference herein and made a part of this specification.The present invention relates to a new organosilicon compound, a thermosetting resin composition that contains the compound and is useful for an application such as an optical material and an electrically insulating material, a hardened material obtained by thermally hardening the composition, and an encapsulation material that uses the hardened material and is for an optical semiconductor.A light emitting device such as a light emitting diode (LED) has been put into practical use for various display boards, a light source for reading an image, a traffic light, a unit for a large size display, a backlight of a cellular ...

ORGANOAMINO-FUNCTIONALIZED CYCLIC OLIGOSILOXANES FOR DEPOSITION OF SILICON-CONTAINING FILMS

Organoamino-functionalized cyclic oligosiloxanes, which have at least two silicon and two oxygen atoms as well as an organoamino group and methods for making the organoamino-functionalized cyclic oligosiloxanes are disclosed. Methods for depositing silicon and oxygen containing films using the organoamino-functionalized cyclic oligosiloxanes are also disclosed. 2. The method of claim 1 , wherein each of Ris independently selected from the group consisting of hydrogen and a Cto Calkyl group.3. The method of claim 1 , wherein in Formulae A and B claim 1 , Ris selected from the group consisting of a Cto Ccyclic alkyl group claim 1 , and a Cto Caryl group claim 1 , Ris selected from the group consisting of hydrogen and a Cto Calkyl group claim 1 , and Rare each independently selected from hydrogen and a Cto Calkyl group.4. The method of claim 1 , wherein in Formulae A and B claim 1 , wherein Rand Rare linked to form a Cto Cheterocyclic structure or a Cto Cheterocyclic aryl structure claim 1 , either of which may be substituted by one claim 1 , two claim 1 , or more methyl groups s.6. The method of claim 5 , wherein Ris selected from the group consisting of a Cto Ccyclic alkyl group claim 5 , and a Cto Caryl group; Ris selected from the group consisting of hydrogen and a Cto Calkyl group; and Rare each independently selected from hydrogen and a Cto Calkyl group.7. The method of claim 5 , wherein Rand Rare linked to form a Cto Cheterocyclic structure or a Cto Cheterocyclic aryl structure claim 5 , either of which may be substituted by one claim 5 , two claim 5 , or more methyl groups.8. The method of claim 5 , wherein the at least one silicon precursor compound is selected from the group consisting of: 2-pyrrolidino-2 claim 5 ,4 claim 5 ,4 claim 5 ,6 claim 5 ,6-pentamethylcyclotrisiloxane claim 5 , 2-pyrrolyl-2 claim 5 ,4 claim 5 ,4 claim 5 ,6 claim 5 ,6-pentamethylcyclotrisiloxane claim 5 , 2-piperidino-2 claim 5 ,4 claim 5 ,4 claim 5 ,6 claim 5 ,6- ...

USE OF ALKYL-TRICHLOROSILANES AND/OR SILSESQUIOXANES FOR THE REMOVAL OF MICROPLASTIC PARTICLES FROM WATER AND/OR A BODY OF WATER

Use of an alkyltrichlorosilane of the following formula I: R—SiCl, wherein: R represents an alkyl group, Si represents a silicon atom and Cl represents a chlorine atom, and/or of a silsesquioxane of the following formula II: [RSiO], wherein: R represents an alkyl group, Si represents a silicon atom, O represents an oxygen atom and n represents an integer, for the removal of microplastic particles from water and/or for the treatment of water. Further, a method for the removal of microplastic particles from water and/or for the purification of water is provided, as well as an inclusion and/or intercalation compound, a kit for the removal of microplastic particles from water and/or for the purification of water as well as a water treatment system. 1. A method for the removal of microplastic particles from water and/or a body of water and/or for treatment of water and/or a body of water , the method having the following steps: [{'br': None, 'sub': '3', 'R—SiCl\u2003\u2003(formula I),'}, 'wherein', 'R represents an alkyl group, Si represents a silicon atom and Cl represents a chlorine atom,', 'and/or', {'br': None, 'sub': 3/2', 'n, '[RSiO]\u2003\u2003(formula II),'}, 'dosing or adding a silsesquioxane of the following formula II'}, 'wherein', 'R represents an alkyl group, Si represents a silicon atom,', 'O represents an oxygen atom and n represents an integer,', 'to a microplastic particle-containing water and/or a microplastic particle-containing body of water, and, '(a) dosing or adding an alkyltrichlorosilane of the following formula I'}(b) removing, from the water and/or the body of water, inclusion compounds formed after addition of the alkyltrichlorosilane and/or the silsesquioxane, wherein the inclusion compounds each comprise a hybrid silica gel and microplastic particles, wherein the hybrid silica gel is formed by reaction of the alkyltrichlorosilane and/or of the silsesquioxane in the water and/or body of water and encloses the microplastic particles at least ...

ORGANIC LIGHT EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

An organic light emitting diode (OLED) display includes a first substrate, a second substrate facing the first substrate, a sealing member interposed between the first substrate and the second substrate, the sealing member including a siloxane material, a semiconductor layer on the first substrate, a planarization layer on the semiconductor layer, and a barrier rib on the planarization layer. The planarization layer or the barrier rib may also include the siloxane material. 1. An organic light emitting diode (OLED) display , comprising:a first substrate;a second substrate facing the first substrate;a sealing member interposed between the first substrate and the second substrate, the sealing member including a siloxane material;a semiconductor layer on the first substrate;a planarization layer on the semiconductor layer; anda barrier rib on the planarization layer,wherein the planarization layer or the barrier rib also includes the siloxane material.2. The OLED display as claimed in claim 1 , wherein the first substrate is divided into a display area and a non-display area claim 1 , and the sealing member is in the non-display area.3. The OLED display as claimed in claim 1 , wherein the sealing member includes a first sealing member that is on a same layer as the planarization layer and a second sealing member that is on a same layer as the barrier rib.4. The OLED display as claimed in claim 3 , wherein the first sealing member has a thickness such that a top surface thereof is at about a same height as a top surface of the planarization layer.5. The OLED display as claimed in claim 3 , wherein the second sealing member has a thickness such that a top surface thereof is higher than a top surface of the barrier rib.6. The OLED display as claimed in claim 1 , wherein a width of the sealing member is about 5 μm to about 300 μm claim 1 , and a thickness of the sealing member is about 3 μm to about 8 μm.8. The OLED display as claimed in claim 1 , wherein the first ...

Colored charged silsesquioxanes

The present invention provides salts of a cation and an anion, wherein the cation comprises (i) a silsesquioxane moiety of formula (ii) a chromophoric moiety D, which may which may be substituted with one or more substituents selected from the group consisting of C 1-10 -alkyl, phenyl, halogen, OC 1-6 -alkyl, OH, NH 2 and NO 2 , and (iii) a moiety of formula wherein L 4 is C 1-20 -alkylene, phenylene-C 1-20 -alkylene or C 1-20 -alkylene-phenylene-C 1-20 alkylene, R 11 , R 12 , R 13 and R 14 are independently from each other hydrogen or C 1-4 -alkyl, R 15 , R 16 , R 17 and R 18 are independently from each other C 1-4 -alkyl, R 19 is C 1-20 -alkyl, which may be substituted with phenyl, O—C 1-6 -alkyl or NO 2 , and d is an integer from 1 to 25, and electrophoretic devices comprising the salts.

DENDRITIC POLYMERS FOR USE AS SURFACE MODIFICATION AGENTS

Methods and compositions for treating proppant and/or formation sand to enhance proppant pack conductivity, control fines migration, and stabilize formation sand during the well production are provided. In one embodiment, the method comprises: introducing a fines migration control agent into a fluid comprising a base fluid and a plurality of proppants, wherein the fines migration control agent comprises a core group capable of attaching to the proppant and at least one end group connected to the core group capable of capturing fines; mixing the fines migration control agent with the fluid to form a proppant slurry; and injecting the proppant slurry into a wellbore penetrating at least a portion of a subterranean formation. 1. A method comprising: 'wherein the fines migration control agent comprises a core group capable of attaching to the proppant and at least one end group connected to the core group capable of capturing fines;', 'introducing a fines migration control agent into a fluid comprising a base fluid and a plurality of proppants,'}mixing the fines migration control agent with the fluid to form a proppant slurry; andinjecting the proppant slurry into a wellbore penetrating at least a portion of a subterranean formation.2. The method of wherein the core group comprises a polysiloxane cage.3. The method of wherein the core group comprises a compound selected from the group consisting of: a carboxylic acid; a quaternary ammonium; a silanol; 3 claim 1 ,4-dihydroxyphenyl; and any combination thereof.4. The method of wherein the fines migration control agent further comprises an intermediary group and wherein the core group and the end group are connected indirectly through the intermediary group.5. The method of wherein the fines migration control agent comprises one or more additional end groups.6. The method of wherein the fines migration control agent is mixed with the fluid in a blender tub.7. The method of wherein the proppant slurry is injected in the ...

SEPARATING CYCLIC SILOXANES FROM SHORT-CHAIN SILOXANES HAVING TERMINAL HYDROXYL GROUPS

Cyclic siloxanes are separated from short chain hydroxyl-terminated siloxanes by contact with steam at at least 650 hPa absolute. The cyclic siloxanes and other components which are separated by use of steam can be recovered by phase separation, and preferably used in other processes. 14-. (canceled)5. A method for removing cyclic siloxanes from a mixture which contains cyclic siloxanes of the formula (I){'br': None, 'sup': 1', '2, 'sub': 'm', '(RRSiO)\u2003\u2003(I),'}where{'sup': '1', 'Rare alkyl groups having 1 to 12 carbon atoms,'}{'sup': 2', '1, 'Rhave the meanings of R, or are aryl groups having 5 to 30 carbon atoms or alkenyl groups having 2 to 12 carbon atoms, and'}m is an integer of from 3 to 20,and which contains short-chain siloxanes having terminal hydroxyl groups, comprising separating the cyclic siloxanes using a steam stream at at least 650 hPa absolute, where the remaining fraction of cyclic siloxanes in the mixture, based on the sum of cyclic siloxanes of the formula (I) in which m =4 to 6, is in a range of 0-20,000 ppm by weight.6. The method of claim 5 , wherein the short-chain siloxanes having terminal hydroxyl groups have the formula (II){'br': None, 'sup': 3', '4, 'sub': 'n', 'HO(RRSiO)H \u2003\u2003(II),'}where{'sup': '3', 'Rare alkyl group having 1 to 12 carbon atoms,'}{'sup': 4', '3, 'Rhave the meanings of R, or are aryl groups having 5 to 30 carbon atoms or alkenyl groups having 2 to 12 carbon atoms, and'}n is an integer from 2 to 100.7. The method of claim 5 , wherein the pressure is 800 hPa to 5000 hPa absolute.8. The method of claim 6 , wherein the pressure is 800 hPa to 5000 hPa absolute.9. The method of claim 5 , wherein the temperature is from 100° C. to 200° C.10. The method of claim 6 , wherein the temperature is from 100° C. to 200° C.11. The method of claim 7 , wherein the temperature is from 100° C. to 200° C.12. The method of claim 8 , wherein the temperature is from 100° C. to 200° C. The invention relates to a method for ...

MULTIFUNCTIONAL ORGANOSILICON COMPOUND AND RELATED METHODS, COMPOUNDS, AND COMPOSITIONS

A multifunctional organosilicon compound is provided which has the general formula XSi([OSiR]p-0-SiRY)a(R)— ln the formula, X is selected from H and ethylenically un saturated moieties; each Y independently comprises a functional moiety selected from alkoxysilyl moieties, acryloxy moieties, and epoxide moieties; each R is an independently selected hydrocarbyl group; each R1 is an independently selected hydrocarbyl group; subscript a is 1, 2, or 3; and each subscript b is independently 0, 1, or 2. A method of preparing the multifunctional organosilicon compound is also provided. The method comprises reacting (A) an organosilanol compound and (B) a silane compound having at least two hydrolysable groups. A functionalized siloxane compound prepared from the multifunctional organosilicon compound, a method of preparing the functionalized siloxane compound, and an adhesive comprising the functionalized siloxane compound are also provided. 2. The multifunctional organosilicon compound of claim 1 , wherein X is selected from H and alkenyl moieties having the formula —(CH)CHCH claim 1 , where subscript n is from 0 to 4.3. The multifunctional organosilicon compound of claim 1 , wherein each Y is independently of formula -D-R claim 1 , where each D is an independently selected divalent linking group and each Rindependently comprises an alkoxysilyl group claim 1 , an acryloxy group claim 1 , or an epoxide group.4. The multifunctional organosilicon compound of claim 3 , wherein in at least one moiety Y: (i) divalent linking group D comprises a hydrocarbon group of formula —(CH)— claim 3 , where subscript m is from 1 to 6; (ii) divalent linking group D comprises an ether moiety; or (iii) both (i) and (ii).6. The multifunctional organosilicon compound of claim 1 , wherein: (i) each R is methyl; (ii) subscript a is 2 and Ris methyl; (iii) subscript b is independently 0 or 1 in each moiety designated by subscript a; or (iv) any combination of (i) to (iii).7. A method of preparing a ...

SEQUENCE-CONTROLLED OLIGOSILOXANE AND MANUFACTURING METHOD AND OLIGOSILOXANE SYNTHESIZER THEREFOR

The purpose of the present invention is to provide a method for producing an oligosiloxane and an oligosiloxane synthesizer, by which an oligosiloxane can be efficiently produced. An oligosiloxane can be efficiently produced by the method for producing an oligosiloxane, which includes a condensation step for generating a hydrosiloxane having a structure represented by the following Formula (d) by reacting an alkoxysilane having a structure represented by the following Formula (b) with a hydrosilane having a structure represented by the following Formula (c) in the presence of a boron compound having Lewis acidity, and a hydrosilylation step for generating an alkoxysiloxane having a structure represented by the following Formula (f) by reacting the hydrosiloxane having the structure represented by Formula (d) generated in the condensation step with a carbonyl compound represented by the following Formula (E) in the presence of a boron compound having Lewis acidity. Moreover, an oligosiloxane having arbitrary substituent sequences can be produced. 4. The method for producing an oligosiloxane according to claim 1 , wherein the condensation step and the hydrosilylation step are performed within one reactor.5. The method for producing an oligosiloxane according to claim 1 , wherein the boron compound having Lewis acidity used in the condensation step is used in the hydrosilylation step.6. The method for producing an oligosiloxane according to claim 4 , wherein the boron compound having Lewis acidity used in the hydrosilylation step is used in the condensation step.8. The method for producing an oligosiloxane according to claim 1 , comprising the two or more condensation steps and the two or more hydrosilylation steps claim 1 , wherein the condensation step and the hydrosilylation step are performed alternately.12. The method for producing an oligosiloxane according to claim 2 , wherein the condensation step and the hydrosilylation step are performed within one reactor.13 ...

Method of synthesizing siloxane monomers and use thereof

A method for preparation and polymerization of siloxane monomers of Formula I is presented. The synthesis includes the selective reaction between silanol containing unit and alkoxy containing units in the presence of basic catalyst. The siloxane monomers of the invention can be used for preparation of siloxane polymers with good flexibility and cracking threshold, and functional sites, useful for applications requiring low metal content in semiconductor industry. 2. The method according to claim 1 , wherein the basic catalyst has a pKb of 2 to 8.3. (canceled)4. The method according to claim 1 , wherein the silanol containing silane of Formula II is selected from the group consisting of diethylsilanediol claim 1 , dimethylsilanediol claim 1 , dipropylsilanediol claim 1 , diisopropylsilanediol claim 1 , dibutylsilanediol claim 1 , di-tert-butylsilanediol claim 1 , di-iso-butylsilanediol claim 1 ,di-sec-butyl-silanediol claim 1 , diphenylsilanediol claim 1 , dicyclohexylsilanediol claim 1 , cyclohexylmethylsilanediol claim 1 , cyclohexylethylsilanediol claim 1 , 1 claim 1 ,1 claim 1 ,3 claim 1 ,3-tetramethyldisiloxane-1 claim 1 ,3-diol or 1 claim 1 ,1 claim 1 ,3 claim 1 ,3-tetraphenyldisiloxane-1 claim 1 ,3-diol claim 1 , 1 claim 1 ,1 claim 1 ,3 claim 1 ,3 claim 1 ,5 claim 1 ,5-hexaphenyltrisiloxane-1 claim 1 ,5-diol claim 1 , bis(p-vinylphenyl)silanediol claim 1 , (p-vinylphenyl)phenylsilanediol claim 1 , phenylvinylsilanediol claim 1 , or 1-adamantylsilanetriol.5. The method according to claim 1 , wherein the alkoxysilane of Formula III is selected from the group consisting of tetramethoxysilane claim 1 , tetraethoxysilane claim 1 , trimethoxysilane claim 1 , triethoxysilane claim 1 , methyltrimethoxysilane claim 1 , methyltriethoxysilane claim 1 , ethyltrimethoxysilane claim 1 , ethyltriethoxysilane claim 1 , propyltrimethoxysilane claim 1 , propyltriethoxysilane claim 1 , vinyltrimethoxysilane claim 1 , vinyltriethoxysilane claim 1 , vinylmethyldimethoxysilane ...

METHOD FOR PREPARING A POLYORGANOSILOXANE AND A POLYORGANOSILOXANE

A polyorganosiloxane resin represented by the following general formula (5): (RSiO)(RSiO)(RSiO)(SiO) (5) wherein R is, independently of each other, a hydrogen atom or a monovalent hydrocarbon group having 1 to 18 carbon atoms, and optionally having an oxygen, halogen, nitrogen or sulfur atom; 1′, m′ and o′ are, independently of each other, an integer of from 0 to 10,000; n′ is an integer of from 1 to 10,000; a total of 1′, m′ and n′ is from 2 to 30,000; and at least one R is a hydrogen atom and at least one R is an —OX group in the molecule, wherein X is an alkyl group having 1 to 10 carbon atoms or an alkoxyalkyl group having 2 to 10 carbon atoms; and at least one hydrogen atom and at least one —OX group bond to one and the same silicon atom. 3. The polyorganosiloxane according to claim 1 , wherein p and p′ are 1 in said formulas (7) and (8).4. The polyorganosiloxane according to claim 2 , wherein t is 0 and q is 1 in said formula (9). This application is a Division of application Ser. No. 15/041,793, filed Feb. 11, 2016, which is a Division of application Ser. No. 14/790,549 filed Jul. 2, 2015, which is a Division of application Ser. No. 14/163,215 filed Jan. 24, 2014, now abandoned, which claims the benefit of Japanese Patent Application No. 2013-014750 filed on Jan. 29, 2013 and Japanese Patent Application No. 2013-253999 filed on Dec. 9, 2013. The disclosure of the prior applications is hereby incorporated by reference in its entirety.The present invention relates to a method for preparing a polyorganosiloxane, specifically a polyorganosiloxane having one or more hydrosilyl groups, i.e., SiH group and, one or more alkoxysilyl groups, i.e., SiOR group, in a molecule by subjecting one or more organic silicon compounds having a silanol group, i.e., —SiOH, and/or an alkoxysilyl group, i.e., —SiOR, to a condensation reaction with each other. Further, the present invention relates to a polyorganosiloxane thus obtained.Recently, polyorganosiloxanes are attracting ...

FORMULATION OF AN ORGANIC FUNCTIONAL MATERIAL COMPRISING A SILOXANE SOLVENT

The present invention relates to a formulation containing at least one organic functional material and at least a first and a second solvent, characterized in that the first solvent is a siloxane. 120.-. (canceled)21. Formulation containing at least one organic functional material and at least a first and a second solvent , wherein the first solvent is a siloxane.22. Formulation according to claim 21 , wherein the first solvent is a cyclosiloxane.25. Formulation according to claim 21 , wherein the content of the first solvent is in the range from 1 to 50 vol.-% claim 21 , based on the total amount of solvents in the formulation.26. Formulation according to claim 21 , wherein the content of the second solvent is in the range from 50 to 99 vol.-% claim 21 , based on the total amount of solvents in the formulation.27. Formulation according to claim 21 , wherein the first solvent has a boiling point in the range from 100 to 400° C.28. Formulation according to claim 21 , wherein the second solvent has a boiling point in the range from 100 to 400° C.29. Formulation according to claim 21 , wherein the at least one organic functional material has a solubility in the second solvent in the range from 1 to 250 g/l.30. Formulation according to claim 21 , wherein the formulation has a surface tension in the range from 1 to 70 mN/m.31. Formulation according to claim 21 , wherein the formulation has a viscosity in the range from 1 to 50 mPas.32. Formulation according to claim 21 , wherein the content of the at least one organic functional material in the formulation is in the range from 0.001 to 20 weight-% claim 21 , based on the total weight of the formulation.33. Formulation according to claim 21 , wherein the at least one organic functional material is selected from the group consisting of organic conductors claim 21 , organic semiconductors claim 21 , organic fluorescent compounds claim 21 , organic phosphorescent compounds claim 21 , organic light-absorbent compounds claim ...

SYNTHETIC BLEND F-POSS COMPOSITIONS FORMED FROM MULTIPLE FEEDSTOCK MATERIALS

The present disclosure relates, in exemplary embodiments, to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures. The present disclosure also relates, in exemplary embodiments, to methods of making such synthetic blends. 2. The F-POSS compound of claim 1 , wherein each long-chain fluorinated alkyl is independently from 5 to 12 carbon atoms in the longest continuous chain of carbon atoms.3. The F-POSS compound of claim 1 , wherein each long-chain fluorinated alkyl is independently selected from the group consisting of 4/2 fluorinated alkyl claim 1 , 3/3 fluorinated alkyl claim 1 , 6/2 fluorinated alkyl claim 1 , 4/4 fluorinated alkyl claim 1 , 8/2 fluorinated alkyl and 6/4 fluorinated alkyl.4. The F-POSS compound of claim 1 , wherein Ris 4/2 fluorinated alkyl and Ris 6/2 fluorinated alkyl.6. The F-POSS composition of claim 5 , wherein each long-chain fluorinated alkyl is independently from 5 to 12 carbon atoms in the longest continuous chain of carbon atoms.7. The F-POSS composition of claim 5 , wherein each long-chain fluorinated alkyl is independently selected from the group consisting of 4/2 fluorinated alkyl claim 5 , 3/3 fluorinated alkyl claim 5 , 6/2 fluorinated alkyl claim 5 , 4/4 fluorinated alkyl claim 5 , 8/2 fluorinated alkyl and 6/4 fluorinated alkyl.8. The F-POSS composition of claim 7 , wherein Ris 4/2 fluorinated alkyl and Ris 6/2 fluorinated alkyl.9. The F-POSS composition of claim 5 , wherein the mixture of compounds comprises a distribution of compounds having a ratio of Rto Rbetween 0:8 to 8:0.10. The F-POSS composition of claim 9 , wherein the distribution is a Gaussian distribution.11. An F-POSS composition produced by a process comprising:contacting a first feedstock comprising a first fluorinated trialkoxysilane with a second feedstock comprising a second fluorinated trialkoxysilane, wherein the first fluorinated ...

METHOD OF FORMING CYCLIC SILOXANE COMPOUNDS FROM ORGANODIHALOSILANES

A method is useful for forming a product including a cyclic siloxane compound. The method includes combining an organodihalosilane and a transition metal on cerium (IV) oxide catalyst, in a reactor at a temperature of to form the product. 1. A method for forming a product comprising a cyclic siloxane compound , where the method comprises:{'b': '1', 'claim-text': [{'sup': 1', '1, 'sub': 2', '2, '(a) an organodihalosilane of formula RSiX, where each Ris independently a hydrogen atom, a halogenated hydrocarbyl group or a hydrocarbyl group; and each X is independently a halogen atom; and'}, '(c) a transition metal on cerium (IV) oxide catalyst, where the transition metal is selected from Rhenium, Iron, Nickel, and Copper;, ') combining, at a temperature of at least 200° C.,'}thereby producing the product comprising the cyclic siloxane compound.2. The method of claim 1 , further comprising treating (c) the transition metal on cerium (IV) oxide catalyst with hydrogen before step 1).3. The method of claim 1 , further comprising adding (b) hydrogen gas during step 1).4. The method of claim 1 , where the cyclic siloxane compound has formula (RSiO)where subscript n is 3 to 6.5. The method of claim 1 , where each Ris independently hydrogen claim 1 , alkyl claim 1 , fluoroalkyl claim 1 , alkenyl claim 1 , or aryl; and n is 3 or 4.6. The method of claim 1 , where one instance of Ris methyl; and another instance of Ris hydrogen claim 1 , trifluoropropyl claim 1 , methyl claim 1 , vinyl claim 1 , or phenyl; and n is 3.7. The method of claim 1 , where the temperature is 200° C. to 500° C.8. The method of claim 1 , further comprising:reactivating the catalyst after step 1) is completed.9. The method of claim 8 , where reactivating occurs in a different reactor than a reactor for performing step 1).10. The method of claim 1 , further comprising:adding an additional amount of the rhenium on cerium (IV) oxide after step 1).11. The method of claim 1 , where step 1) is performed ...

FUNCTIONALIZED F-POSS MONOMER COMPOSITIONS AND USES THEREOF

Functionalized F-POSS compounds comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures and/or functional groups. 2. The process of claim 1 , wherein Ris C-Calkyl claim 1 , wherein each hydrogen atom in Ris independently optionally substituted by an R.3. The process of claim 1 , wherein Ris —NCO claim 1 , —OR claim 1 , —OC(O)R claim 1 , —C(O)OR claim 1 , —C(O)Ror —OC(O)OR.4. The process of claim 1 , wherein Ris C-Calkyl and wherein each hydrogen atom in Ris independently optionally substituted by an R.5. The process of claim 1 , wherein Ris C-Calkenyl claim 1 , wherein each hydrogen atom in Ris independently optionally substituted by an R.6. The process of claim 1 , wherein Ris C-Calkyl claim 1 , —NCO claim 1 , —OR claim 1 , —NRR claim 1 , —OC(O)R claim 1 , —C(O)OR claim 1 , —C(O)Ror —OC(O)OR.7. The process of claim 1 , wherein Ris C-Calkyl claim 1 , C-Calkenyl claim 1 , C-Calkynyl claim 1 , C-Caryl or 5-7 membered heteroaryl claim 1 , wherein each hydrogen atom in Ris independently optionally substituted by one or more R.8. The process of claim 1 , wherein Ris hydrogen or C-Calkyl claim 1 , and when Ris C-Calkyl claim 1 , Ris optionally substituted by a —OC(O)R.9. The process of claim 1 , wherein Ris H or C-Calkyl claim 1 , and when Ris C-Calkyl claim 1 , each hydrogen atom in Ris independently optionally substituted by a fluorine atom.10. The process of claim 1 , wherein Ris n-propyl claim 1 , wherein each hydrogen atom in Ris independently optionally substituted by an R.11. The process of claim 10 , wherein Ris —OC(O)Ror —OC(O)OR.12. The process of claim 10 , wherein Ris methyl.13. The process of claim 10 , wherein Ris —CH═CH claim 10 , wherein each hydrogen atom in Ris independently optionally substituted by an R.14. The process of claim 13 , wherein Ris C-Calkyl.15. The process of claim 14 , wherein Ris methyl.16. The process claim 1 , wherein the long chain ...

Method for the Preparation of Functionalized Cyclosiloxanes

The present invention relates to a method for preparing functionalized cyclosiloxanes of Formula I, 2. The method according to claim 1 , wherein in Formula II m+n=3 claim 1 , 4 claim 1 , 5 or 6.3. The method according to claim 1 , wherein in Formula II n is 1 and m is 3.4. The method according to claim 1 , wherein R is selected from the group consisting of H claim 1 , unsubstituted or substituted phenyl claim 1 , hydroxyalkyl and R′ being unsubstituted Calkyl.5. The method according to claim 1 , wherein R is selected from the group consisting of H claim 1 , unsubstituted or substituted phenyl claim 1 , —(CH)—OH claim 1 , —(CR′OH)—CH claim 1 , —(CH)—COOH and —COO(CH)CH claim 1 , with p being 0 or an integer from 1 to 10 claim 1 , and R′ being unsubstituted Calkyl.6. The method according to claim 1 , wherein the cyclosiloxane of Formula I is(i) 2,2,4,4,6,6,8-heptamethyl-8-(1-phenylvinyl)-cyclotetrasiloxane (3B);(ii) 2,2,4,4,6,6,8-heptamethyl-8-(2-phenylvinyl)-cyclotetrasiloxane (3A);(iii) ethyl 2-(2,4,4,6,6,8,8-heptamethyl-cyclotetrasiloxan-2-yl)acrylate (4B);(iv) ethyl 3-(2,4,4,6,6,8,8-heptamethyl-cyclotetrasiloxan-2-yl)prop-2-enoate (4A);(v) 4-(2,4,4,6,6,8,8-heptamethyl-cyclotetrasiloxan-2-yl)pent-4-en-1-ol (5B);(vi) 5-(2,4,4,6,6,8,8-heptamethyl-cyclotetrasiloxan-2-yl)pent-4-en-1-ol (5A);(vii) 3-(2,4,4,6,6,8,8-heptamethyl-cyclotetrasiloxan-2-yl)-2-methylbut-3-en-2-ol (6B);(viii) 4-(2,4,4,6,6,8,8-heptamethyl-cyclotetrasiloxan-2-yl)-2-methylbut-3-en-2-ol (6A);(ix) 4-(2,4,4,6,6,8,8-heptamethyl-cyclotetrasiloxan-2-yl)pent-4-enoic acid (7B);(x) 5-(2,4,4,6,6,8,8-heptamethyl-cyclotetrasiloxan-2-yl)pent-4-enoic acid (7A);(xi) 2,2,4,4,6,6,8-heptamethyl-8-(1-(4-(trifluoromethyl)phenyl)vinyl)-cyclotetrasiloxane (8B);(xii) 2,2,4,4,6,6,8-heptamethyl-8-(2-(4-(trifluoromethyl)phenyl)vinyl)-cyclotetrasiloxane (8A);(xiii) 2,4,6,8-tetramethyl-2,4,6,8-tetrakis(1-phenylvinyl)-cyclotetrasiloxane (9a);(xiv) (E/Z)-2,4,6,8-tetramethyl-2,4,6-tris(1-phenylvinyl)-8-styryl-cyclotetrasiloxane ( ...

Item Having Improved Thermomechanical Properties, Comprising an Organic-Inorganic Layer

The invention relates to an item comprising a substrate having at least one main surface coated with a multilayer interferential coating comprising at least one layer with a refractive index higher than 1.65 and at least one layer with a refractive index lower than, or equal to, 1.65, at least one of the layers of the interferential coating being an organic-inorganic layer that has been deposited in a vacuum environment and has a thickness of at least 30 nm, said interferential coating having a thickness of at least 450 nm and/or at least 8 layers. 115.-. (canceled)16. An article comprising a substrate having at least one main surface coated with a multilayer interference coating comprising at least one layer having a refractive index higher than 1.65 and at least one layer having a refractive index lower than or equal to 1.65 , at least one of the layers of the interference coating being a layer of organic-inorganic nature that was deposited under vacuum and that has a thickness larger than or equal to 30 nm , said interference coating having a thickness larger than or equal to 450 nm and/or a number of layers higher than or equal to 8.17. The article as claimed in claim 16 , wherein the layer of organic-inorganic nature comprises atoms of carbon claim 16 , of oxygen and of a metal or metalloid.18. The article as claimed in claim 16 , wherein the layer of organic-inorganic nature is deposited under the assistance of a source of ions.19. The article as claimed in claim 16 , wherein the layer of organic-inorganic nature is obtained by depositing at least one organosilicon compound.21. The article as claimed in claim 20 , wherein R′ claim 20 , R′ claim 20 , R′and R′independently denote hydroxyl groups or OR hydrolysable groups claim 20 , in which R is an alkyl group.22. The article as claimed in claim 19 , wherein the organosilicon compound is chosen from octamethylcyclotetrasiloxane claim 19 , 2 claim 19 ,4 claim 19 ,6 claim 19 ,8-tetramethylcyclotetrasiloxane claim ...

MIXTURES OF CYCLIC BRANCHED SILOXANES OF THE D/T TYPE AND CONVERSION PRODUCTS THEREOF

Mixtures of cyclic branched siloxanes having exclusively D and T units and having no functional groups, with the proviso that the cumulative proportion of the D and T units having Si-alkoxy and/or SiOH groups that are present in the siloxane matrix, determinable by Si NMR spectroscopy, is ≤2 mole per cent, are described, as are branched organo-modified siloxanes obtainable therefrom. 1. A mixture of cyclic branched siloxanes having exclusively D and T units and having no functional groups , wherein the cumulative proportion of the D and T units having Si-alkoxy and/or SiOH groups that are present in the siloxane matrix; determinable by Si NMR spectroscopy , is ≤2 mole per cent.2. The mixture of cyclic branched siloxanes having exclusively D and T units according to claim 1 , wherein the ratio of D to T units is between 10:1 and 3:1.3. The mixture of cyclic branched siloxanes having exclusively D and T units according to claim 1 , wherein the molar mass ratio of the mixture M/Mis in the range of 2 Подробнее

Process and Manufacture of Low-Dimensional Materials Supporting Both Self-Thermalization and Self-Localization

Various articles and devices can be manufactured to take advantage of a what is believed to be a novel thermodynamic cycle in which spontaneity is due to an intrinsic entropy equilibration. The novel thermodynamic cycle exploits the quantum phase transition between quantum thermalization and quantum localization. Preferred devices include a phonovoltaic cell, a rectifier and a conductor for use in an integrated circuit. 1. A phonovoltaic cell , useful as part of a phonovoltaic pile of one or more contiguous phonovoltaic cells , comprising:a first conductor layer;a first boron layer in contact with the first conductor layer, the first boron layer comprising icosahedral boron and hydrogen and having a higher relative atomic concentration of boron than any other atom;a second boron layer in contact with the first boron layer, the second boron layer comprising icosahedral boron, hydrogen and oxygen and having a higher relative atomic concentration of boron than any other atom;a second conductor layer in contact with the second boron layer; andwherein an electrical potential is generated between the first conductor layer and the second conductor layer.2. The phonovoltaic cell of wherein the first boron layer further comprises silicon.3. The phonovoltaic cell of claim 2 , wherein the first boron layer is a silaborane.4. The phonovoltaic cell of claim 3 , wherein the first boron layer is a picocrystalline silaborane.5. The phonovoltaic cell of wherein the silaborane layer is silaborane having a formula of (BH)Si claim 3 , wherein 3≤w≤5 claim 3 , 2≤x≤4 claim 3 , and 3≤y≤5.6. The phonovoltaic cell of wherein the silaborane layer is picocrystalline silaborane having a formula of (BH)SiO claim 5 , wherein 2≤x≤4 and 3≤y≤5.7. The phonovoltaic cell of wherein the silaborane layer is picocrystalline silaborane having the formula (BH)Si.8. The phonovoltaic cell of claim 1 , wherein the second boron layer further comprises silicon.9. The phonovoltaic cell of claim 8 , wherein the ...

SILOXANE COMPOUND AND A METHOD FOR PREPARING THE SAME

An object of the present invention is to provide a monomer having a polysiloxane structure and capable of providing a polymer having sufficient compatibility and hydrolysis resistance while having high oxygen permeability useful for an ophthalmic device, and a method for producing the monomer. The present invention provides a compound represented by the formula (1) which has a radical-polymerizable group at one terminal, one to three alkylsiloxy groups having a hydrophilic and bulky group represented by formula (3-A) or formula (3-B), and has a divalent hydrocarbon group L which has 2 to 20 carbon atoms and may contain one or more selected from an ether bond and a urethane bond, a part of hydrogen atoms bonded to the carbon atoms may be substituted with a hydroxyl group. 3. The compound according to claim 2 , wherein n is 0 or 1.4. The compound according to claim 3 , wherein m is 3 and n is 1.5. The compound according to claim 3 , wherein m is 3 and n is 0.6. The compound according claim 1 , wherein a is 1 or 2 claim 1 , b is an integer of from 0 to 12 claim 1 , and Ris an alkyl group having 1 to 3 carbon atoms.7. The compound according to claim 1 , wherein a is 1 or 2 claim 1 , b is an integer of from 0 to 5 claim 1 , Ris a hydrogen atom claim 1 , and Ris an alkyl group having 1 to 3 carbon atoms.8. The compound according to claim 1 , wherein Rand Rare each a methyl group.9. The compound according to claim 1 , wherein M is a radical having an acryloyl or methacryloyl group.10. The compound according to claim 9 , wherein M is an acryloyloxy group claim 9 , a methacryloyloxy group claim 9 , an acrylamide group or a methacrylamide group.11. The compound according claim 1 , wherein x is 2 or 3.12. A polymer comprising repeating units derived from addition polymerization of the radical-polymerizable group claim 1 , M claim 1 , in the compound according to .13. A copolymer comprising repeating units derived from copolymerization of the radical-polymerizable group claim 1 ...

Mixtures Of Cyclic Branched Siloxanes Of The D/T Type And Conversion Products Thereof

Mixtures of cyclic branched siloxanes having exclusively D and T units, with the proviso that the cumulative proportion of the D and T units having Si-alkoxy and/or SiOH groups that are present in the siloxane matrix, determinable by Si NMR spectroscopy, is less than 2.0 and preferably less than 1.0 mole per cent, are described, as are branched organomodified siloxanes obtainable therefrom. 1. A mixture of cyclic branched siloxanes having exclusively D and T units , wherein the cumulative proportion of the D and T units having Si-alkoxy and/or SiOH groups that are present in the siloxane matrix , determinable by Si NMR spectroscopy , is less than 2 mole per cent , and further comprising at least 5% by weight of siloxane cycles selected from the group consisting of octamethylcyclotetrasiloxane (D) , decamethylcyclopentasiloxane (D) , dodecamethylcyclohexasiloxane (D) and mixtures thereof.2. The mixture according to claim 1 , wherein the ratio of D to T units is between 10:1 and 3:1.3. The mixture according to claim 1 , wherein the molar mass ratio of the mixture M/Mis in the range of 2 Подробнее

SILSESQUIOXANE COMPOUND, ORGANIC LIGHT EMITTING ELEMENT, DISPLAY APPARATUS, IMAGE INFORMATION PROCESSING APPARATUS, AND IMAGE FORMING APPARATUS

Provided is an organic light emitting element having high light emitting efficiency. The organic light emitting element includes: an anode; a cathode; an emission layer placed between the anode and the cathode; and a hole transport layer formed between the anode and the emission layer, in which the hole transport layer contains a siloxane compound and a compound having a tertiary arylamine structure; and number of SPcarbon atoms in the hole transport layer is ten times or less number of silicon atoms in the hole transport layer. 1. An organic light emitting element comprising:an anode;a cathode;an emission layer placed between the anode and the cathode; anda hole transport layer formed between the anode and the emission layer,wherein the hole transport layer comprises a siloxane compound and a compound having a tertiary arylamine structure; and{'sup': '2', 'wherein a number of SPcarbon atoms in the hole transport layer is ten times or less a number of silicon atoms in the hole transport layer.'}2. The organic light emitting element according to claim 1 , wherein the number of the SPcarbon atoms in the hole transport layer is 6.67 times or less the number of the silicon atoms in the hole transport layer.4. The organic light emitting element according to claim 3 , wherein the siloxane compound comprises a compound represented by the general formula [1];{'sub': '1', 'the Zrepresents an alkyl group having 1 or more and 8 or less carbon atoms, or a unit represented by the general formula [4A]; and'}{'sub': 1a', '3a, 'the Arto the Areach represent a substituent selected from a phenyl group, a biphenyl group, a terphenyl group, a naphthyl group, and a fluorenyl group.'}5. The organic light emitting element according to claim 3 , wherein the Zin the formula [1] represents an aromatic amino group selected from the general formulae [5] to [9];{'sub': '2', 'the Zin the formula [2] represents an aromatic amino group selected from the general formulae [5] to [9];'}{'sub': '3', ' ...

CARBINOL FUNCTIONAL TRISILOXANE AND METHOD OF FORMING THE SAME

A trisiloxane having at least one carbinol functional group comprises the reaction product of (A) an initial trisiloxane and (B) an organic compound. Component (A) has a pendant silicon-bonded functional group selected from a hydrogen atom, an epoxy-containing group, an ethylenically unsaturated group, and an amine group. Typically, component (A) is free of certain terminal silicon-bonded functional groups and is free of polyoxyalkylene groups. Component (B) has a functional group reactive with the pendant silicon-bonded functional group of component (A), and has at least one hydroxyl functional group. The trisiloxane is useful for a number of applications including use as a detergent additive. The trisiloxane may be of the following general formula (I): (R13SiO1/2) (R1R3Si2/2)(R13SiO1/2) (I). In formula (I), each R1 is an independently selected hydrocarbyl group. R3 may be selected from the groups (i) to (iv) described herein. Typically, the trisiloxane has 1-6 carbinol groups. 3. The trisiloxane as set forth in claim 1 , having one to six carbinol functional groups claim 1 , alternatively three to four carbinol functional groups.4. The trisiloxane as set forth in claim 1 , wherein the pendant silicon-bonded functional group of component (A) is a hydrogen atom.5. (canceled)6. The trisiloxane as set forth in claim 1 , wherein the pendant silicon-bonded functional group of component (A) is an epoxy-containing group.9. The trisiloxane as set forth in claim 8 , wherein each Ris an independently selected C-Calkyl group claim 8 , alternatively each Ris a methyl group.10. A composition comprising the trisiloxane as set forth in .11. The composition as set forth in claim 10 , further comprising at least one dispersant claim 10 , alternatively further comprising propylene glycol.12. The composition as set forth in claim 10 , further defined as a cleaning composition claim 10 , a coating composition claim 10 , an agricultural composition claim 10 , or an ink composition ...

SYNTHESIS OF FUNCTIONAL FLUORINATED POLYHEDRAL OLIGOMERIC SILSESQUIOXANE ("F-POSS")

A method of manufacturing a fluorinated polyhedral oligomeric silsesquioxane. The method for manufacture includes opening a single edge of a closed-cage F-POSS and bridging the opened, single edge with a sulfate group. The sulfate group is converted to a disilanol, which is then reacted with a functional dichlorosilane having an organic functional group comprising at least three carbon atoms. 2. The method of claim 1 , wherein the method of manufacturing is performed in CFat for approximately 12 hours.3. The method of claim 1 , wherein opening the single edge of the closed-cage F-POSS includes reacting the closed-cage F-POSS with triflic acid.3. The method of claim 1 , wherein bridging the opened claim 1 , single edge includes reacting the opened claim 1 , single edge with NButHSO.4. The method of claim 1 , wherein converting the sulfate group to a disilanol includes reacting the sulfate group with an excess solution of fluorinated solvent and water.5. The method of claim 1 , wherein Rrepresents —CHCH(CF)CF.6. The method of claim 1 , wherein Ris selected from the group consisting of —(CH)CH claim 1 , —(CH)OC(O)CH═CH claim 1 , and —(CH)O C(O)C(CH)—CH.7. The method of claim 1 , wherein the first monovalent organic group claim 1 , the second monovalent organic group claim 1 , or both comprises at least three carbon atoms.8. The method of claim 1 , wherein Rrepresents a fluorinated alkyl group.9. The method of claim 1 , wherein each Ris separately selected from the group consisting of fluorotetradecyl claim 1 , fluorododecyl claim 1 , fluorodecyl claim 1 , fluorooctyl claim 1 , fluorohexyl claim 1 , and hexafluoro-i-butyl.10. A method of forming a hydrophobic and oleophobic surface claim 1 , the method comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'spin coating the F-POSS of with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane onto an inert surface; and'}drying the F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane ...

NOVEL SILYLCYCLODISILAZANE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME

Provided is a novel silylcyclodisilazane compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing the silicon-containing thin film using the same, and since the silylcyclodisilazane compound of the present invention has high reactivity, thermal stability and high volatility, it can be used as a silicon-containing precursor, thereby manufacturing a high-quality silicon-containing thin film by various deposition methods. 2. The silylcyclodisilazane compound of claim 1 , wherein{'sup': 1', '3, 'sub': 1', '5', '2', '5, 'Rand Rare each independently C-Calkyl or C-Calkenyl;'}{'sup': '2', 'sub': 1', '5', '2', '5, 'Ris hydrogen, C-Calkyl or C-Calkenyl;'}{'sup': '4', 'sub': 1', '5', '2', '5, 'Ris C-Calkyl or C-Calkenyl;'}{'sup': 5', '6, 'sub': 1', '5', '2', '5, 'Rand Rare each independently hydrogen, C-Calkyl or C-Calkenyl; and'}{'sup': '7', 'sub': 1', '5', '2', '5, 'Ris C-Calkyl or C-Calkenyl.'}5. The composition for depositing a silicon-containing thin film of claim 4 , wherein{'sup': 11', '13, 'sub': 1', '7', '2', '7, 'Rand Rare each independently C-Calkyl or C-Calkenyl;'}{'sup': 12', '14, 'sub': 1', '7', '2', '7, 'Rand Rare each independently hydrogen, C-Calkyl or C-Calkenyl;'}{'sup': '15', 'sub': 1', '7', '2', '7, 'Ris C-Calkyl or C-Calkenyl;'}{'sup': 16', '17, 'sub': 1', '7', '2', '7, 'Rand Rare each independently hydrogen, C-Calkyl or C-Calkenyl; and'}{'sup': '18', 'sub': 1', '7', '2', '7, 'Ris C-Calkyl or C-Calkenyl.'}6. The composition for depositing a silicon-containing thin film of claim 4 , wherein{'sup': 11', '13, 'sub': 1', '7', '2', '7, 'Rand Rare each independently C-Calkyl or C-Calkenyl;'}{'sup': '12', 'sub': 1', '7', '2', '7, 'Ris hydrogen, C-Calkyl or C-Calkenyl;'}{'sup': '14', 'Ris hydrogen;'}{'sup': '15', 'sub': 1', '7', '2', '7, 'Ris C-Calkyl or C-Calkenyl;'}{'sup': 16', '17, 'sub': 1', '7', '2', '7, 'Rand Rare each independently hydrogen, C-Calkyl or C-Calkenyl;'}{'sup': 18', 'a', 'b', 'c ...

Highly dispersible antimicrobial and adhesion agents

Compositions of matter that have antimicrobial properties and adhesion properties and are highly dispersible in aqueous solutions. The presence of a large number of silanols on the molecules of this invention creates a solubility or disperseability of these molecules in aqueous solutions that is not obtainable from prior art antimicrobial monomers.

MIXTURES OF CYCLIC BRANCHED SILOXANES OF THE D/T TYPE AND CONVERSION PRODUCTS THEREOF

Mixtures of cyclic branched siloxanes having exclusively D and T units and having no functional groups, with the proviso that the cumulative proportion of the D and T units having Si-alkoxy and/or SiOH groups that are present in the siloxane matrix, determinable by Si NMR spectroscopy, is ≤2 mole per cent, are described, as are branched organomodified siloxanes obtainable therefrom. 1. A mixture of cyclic branched siloxanes having exclusively D and T units and having no functional groups , with the proviso that the cumulative proportion of the D and T units having Si-alkoxy and/or SiOH groups that are present in the siloxane matrix; determinable by Si NMR spectroscopy , is <2 mole per cent.2. The mixture of cyclic branched siloxanes having exclusively D and T units according to claim 1 , wherein the ratio of D to T units is between 10:1 and 3:1.3. The mixture of cyclic branched siloxanes having exclusively D and T units according to claim 1 , wherein the molar mass ratio of the mixture M/Mis in the range of 2 Подробнее

AZA-POLYSILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPRISING SAME

Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is provided an aza-polysilane precursor comprising at least two Si—N bonds, at least one Si—Si bond, and at least two SiHgroups represented by the following Formula IA, IB and IC: 2. The aza-polysilane precursor of selected from the group consisting of 3-iso-propyl-3-aza-pentasilane claim 1 , 3-tert-butyl-3-aza-pentasilane claim 1 , 3-tert-pentyl-3-aza-pentasilane claim 1 , 3-cyclopentyl-3-aza-pentasilane claim 1 , 3-cyclohexyl-3-aza-pentasilane claim 1 , 3-(2 claim 1 ,6-dim ethylcyclohexyl-3-aza-pentasilane claim 1 , 3-(tetrahydropyran-4-yl)-3-aza-pentasilane claim 1 , 3-(1-methylpiperidin-4-yl)-3-aza-pentasilane claim 1 , 3-phenyl-3-aza-pentasilane claim 1 , 3-(2-methyl-tolyl)-3-aza-pentasilane claim 1 , 3-(2 claim 1 ,6-dimethyl-tolyl)-3-aza-pentasilane claim 1 , 3-(pyridin-3-yl)-3-aza-pentasilane claim 1 , 3-(4-methylpyridin-3-yl)-3-aza-pentasilane 1 claim 1 ,4-bis(cyclopentyl)-1 claim 1 ,4-diaza-2 claim 1 ,3 claim 1 ,5 claim 1 ,6-tetrasilacyclohexane claim 1 , 1 claim 1 ,4-bis(cyclohexyl)-1 claim 1 ,4-diaza-2 claim 1 ,3 claim 1 ,5 claim 1 ,6-tetrasilacyclohexane claim 1 , and 1 claim 1 ,4-bis(2 claim 1 ,6-dimethylcyclohexyl)-1 claim 1 ,4-Diaza-2 claim 1 ,3 claim 1 ,5 claim 1 ,6-tetrasilacyclohexane.4. The aza-polysilane precursor of comprising at least one selected from the group consisting of 3-iso-propyl-3-aza-pentasilane claim 3 , 3-tert-butyl-3-aza-pentasilane claim 3 , 3-tert-pentyl-3-aza-pentasilane claim 3 , 3-cyclopentyl-3-aza-pentasilane claim 3 , 3-cyclohexyl-3-aza-pentasilane claim 3 , 3-(2 claim 3 ,6-dim ethylcyclohexyl-3-aza-pentasilane claim 3 , 3-(tetrahydropyran-4-yl)-3-aza-pentasilane claim 3 , 3-(1-methylpiperidin-4-yl)-3-aza-pentasilane claim 3 , 3-phenyl-3-aza-pentasilane claim 3 , 3-(2-methyl-tolyl)-3-aza-pentasilane claim 3 , 3-(2 claim 3 ,6-dimethyl-tolyl)-3-aza-pentasilane claim 3 , 3-(pyridin-3-yl)-3-aza-pentasilane claim 3 , 3-(4- ...

Telomerisation Of Cyclic Polyorganosiloxanes

A telomerisation process is used to prepare a reaction product containing a noncyclic hydrocarbonoxy-functional polyorganosiloxane. The process includes heating a composition including (A) a cyclic polyorganosiloxane, (B) a silane, and (C) a Lewis Acid telomerisation catalyst. The cyclic polyorganosiloxane has formula [(RSiO)], where subscript n is an integer of 4 or more, and each Ris independently H, a hydrocarbyl group, or a halogenated hydrocarbyl group. The silane has formula RSi(OR), where subscript m is an integer from 1 to 4, each Ris independently H, a hydrocarbyl group, or a halogenated hydrocarbyl group, and each Ris independently a hydrocarbyl group. The telomerisation catalyst is a Lewis Acid of formula [M]+[RS0]where M is a metal atom selected from Aluminum (Al), Bismuth (Bi), Cerium (Ce), Chromium (Cr), Iron (Fe), Gallium (Ga), Indium (In), Lanthanum (La), Scandium (Sc), Samarium (Sm), and Ytterbium (Yb); Ris selected from an oxygen atom (O) and CF; and x represents a number up to a maximum valence of the metal atom selected for M. 1. A process for preparing a reaction product comprising a noncyclic hydrocarbonoxy-functional polyorganosiloxane comprises: [{'sup': 1', '1, 'sub': 2', '2/2', 'n, '(A) a cyclic polyorganosiloxane of formula [(RSiO)], where subscript n is an integer of 4 or more, and each Ris independently H, a hydrocarbyl group, or a halogenated hydrocarbyl group;'}, {'sup': 2', '3', '2', '3, 'sub': (4-m)', 'm, '(B) a silane of formula RSi(OR), where subscript m is an integer from 1 to 4, each Ris independently H, a hydrocarbyl group, or a halogenated hydrocarbyl group, and each Ris independently a hydrocarbyl group; and'}, {'sup': x+', '4', '−', '4, 'sub': 3', 'x', '3, '(C) a Lewis Acid telomerisation catalyst of formula [M][RSO]where M is a metal atom selected from Aluminum (Al), Bismuth (Bi), Cerium (Ce), Chromium (Cr), Iron (Fe), Gallium (Ga), Indium (In), Lanthanum (La), Scandium (Sc), Samarium (Sm), and Ytterbium (Yb); Ris O or CF; ...

Peripherally aromatic silsesquioxanes featuring reactive functionality: synthesis and application thereof

Methods of synthesis and application thereof for peripherally aromatic silsesquioxanes featuring reactive functionality. A method, according to one embodiment of the invention, includes reacting a polyhedral oligomeric silsesquioxane with an anhydride. The polyhedral oligomeric silsesquioxane has an inorganic core, a phenyl moiety or an anlyine moiety covalently coupled to the at least one T-type silicon atom; and a metal-aniline group or a para-aniline group covalently coupled to the at least one D-type or M-type silicon atom. The inorganic core includes 6-14 silicon atoms, at least one of the silicon atoms being an M-type silicon atom or a D-type silicon atom, and at least one of the silicon atoms being a T-type silicon atom, and 9-20 oxygen atoms

ADDUCT OF AN AMINE AND A CYCLIC SILOXANE COMPOUND

A composition comprises an adduct produced by reacting an amine compound and a cyclic siloxane compound. The amine compound comprises two or more amine groups independently selected from the group consisting of primary amine groups and secondary amine groups. The cyclic siloxane compound comprises two or more first siloxane moieties that contain cyclic ether moieties. An epoxy composition is made by reacting an epoxy resin and the composition comprising the adduct. 2. The composition of claim 1 , wherein Rcomprises an epoxide moiety.3. The composition of claim 2 , wherein Ris selected from the group consisting of 5 claim 2 ,6-epoxyhexyl and 2-(3 claim 2 ,4-epoxycyclohexyl)ethyl.4. The composition of claim 2 , wherein Ris a group conforming to the structure —R—O—R claim 2 , where Ris an alkanediyl group and Ris a group comprising an epoxide moiety.5. The composition of claim 4 , wherein Ris a propane-1 claim 4 ,3-diyl group claim 4 , and Ris a glycidyl group.6. The composition of claim 1 , wherein Ris selected from the group consisting of alkyl groups.7. The composition of claim 6 , wherein Ris a methyl group.9. The composition of claim 8 , wherein Ris an alkyl group claim 8 , Ris an alkanediyl group claim 8 , and Ris an aryl group.10. The composition of claim 9 , wherein Ris a methyl group claim 9 , Ris a 2-methylethane-1 claim 9 ,2-diyl group claim 9 , and Ris a phenyl group.11. The composition of claim 8 , wherein the cyclic siloxane compound comprises two or more second siloxane moieties.12. The composition of claim 1 , wherein the cyclic siloxane compound comprises four to eight siloxane moieties.13. An epoxy composition produced by reacting an epoxy resin and the composition of . This application claims, pursuant to 35 U.S.C. §119(e)(1), priority to and the benefit of the filing date of U.S. Patent Application No. 62/257,471 filed on Nov. 19, 2015 which application is hereby incorporated by reference in its entirety.This application relates to compounds, ...

ULTRALOW DIELECTRIC MESOPOROUS ORGANOSILICON FILM AND PREPARATION METHOD THEREOF

The present invention relates to the field of chemical industry, and discloses organosilicone micro-mesoporous ultra-low dielectric thin films and preparation methods therefor. A structural formula of a POSS-based organosilane precursor in the thin film is as follows: 2. A preparation method for the organosilicone micro-mesoporous ultra-low dielectric thin film according to claim 1 , comprising the following steps:dissolving a POSS-based precursor in an organic solvent at a room temperature; adding an appropriate amount of a photoacid generator; after uniformly stirring, spraying a mixed liquid to form a film on a substrate; placing the substrate under a light-emitting diode lamp for irradiating for a preset time after the organic solvent is completely evaporated; then placing the substrate in N,N-dimethylformamide for undergoing a transesterification reaction with short-chain fluoroalkyl alcohol for 24-72 h; and washing and drying to obtain the organosilicone micro-mesoporous ultra-low dielectric thin film.3. The preparation method for the organosilicone micro-mesoporous ultra-low dielectric thin film according to claim 2 , wherein a mass ratio of the POSS-based precursor to the photoacid generator is 10:0.05-1.4. The preparation method for the organosilicone micro-mesoporous ultra-low dielectric thin film according to claim 2 , wherein a molar concentration of the short-chain fluoroalkyl alcohol is 0.01-0.05 mol/L.5. The organosilicone micro-mesoporous ultra-low dielectric thin film and the preparation method therefor according to claim 2 , wherein a specific wavelength of the light-emitting diode lamp is 320 nm claim 2 , 365 nm claim 2 , or 405 nm.6. The organosilicone micro-mesoporous ultra-low dielectric thin film and the preparation method therefor according to claim 2 , wherein power of the light-emitting diode lamp is 0.1-20 mW/cm.7. The organosilicone micro-mesoporous ultra-low dielectric thin film and the preparation method therefor according to claim 2 , ...

SILICON COMPOUND AND HARD COATING FILM AND DISPLAY DEVICE INCLUDING THE SAME

A liquid crystal display device includes a liquid crystal panel; and a backlight unit disposed at one side of the liquid crystal panel. The backlight unit includes a prism sheet, which comprises a base and a plurality of prism patterns arranged on the base and a binder and a silicon compound having adjacent siloxane moieties linked via a diselenide group, and a light source disposed at a lower portion of the prism sheet. In the liquid crystal display device, the prism sheet is disposed between the light source and the liquid crystal panel. 1. A silicon compound having adjacent siloxane moieties linked via a diselenide group.2. The silicon compound of claim 1 , wherein the silicon compound has a unit structure represented by Chemical Formula 1:{'br': None, 'sub': 1', 'm', '2', 'n, 'A-(L)-Se—Se-(L)-B\u2003\u2003Chemical Formula 1'}{'sub': 1', '2, 'wherein A and B each independently represent a siloxane moiety, Land Leach independently represent a C1-C10 alkylene group, a C3-C20 cycloalkylene group, or a C5-C30 arylene group, and m and n are each independently 0 or 1.'}3. The silicon compound of claim 1 , wherein the siloxane moieties are silsesquioxane moieties.4. The silicon compound of claim 2 , wherein at least one of A and B is a silsesquioxane moiety having a cage structure.5. The silicon compound of claim 4 , wherein A is a silsesquioxane moiety having a random structure or a cage structure claim 4 , and B is a silsesquioxane moiety having a cage structure.6. A hard coating film comprising:a binder, anda silicon compound dispersed in the binder and having adjacent siloxane moieties linked via a diselenide group.7. A display device comprising:a display panel; and{'claim-ref': {'@idref': 'CLM-00006', 'claim 6'}, 'the hard coating film according to and disposed at one side of the display panel.'}8. The display device of claim 7 , further comprising a touch panel disposed between the hard coating film and the display panel or disposed at another side of the display ...

UV Absorbing Compounds, Compositions Comprising Same and Uses Thereof

There is provided a range of novel compounds which have been demonstrated to have useful electromagnetic radiation absorbing properties. These compounds will find use in a range of applications such as active components in sunscreen formulations, paints, plastics, fabrics, glass and UV protective coatings. 2. The compound of wherein the atom which is double bonded to the carbon attached directly to the ring is selected from the group consisting of a carbon atom and an oxygen atom.3. The compound of claim 1 , wherein Rand Rare independently selected from Cto Calkyl which groups may be substituted or unsubstituted.6. The compound of wherein Ris selected from the group consisting of hydrogen claim 1 , Cto Calkyl claim 1 , Cto Calkenyl claim 1 , phenyl claim 1 , heteroaryl claim 1 , Ccycloalkyl claim 1 , Cto Calkanoyl claim 1 , Cto Calkanoyloxy claim 1 , Cto Ccarboalkoxy and Cto Calkanone all of which groups may be substituted or unsubstituted.7. The compound of wherein Ris selected from the group consisting of hydrogen claim 1 , phenyl claim 1 , butan-2-one and but-1-ene-2-yl propionate.8. The compound of wherein Ris selected from the group consisting of ethyl claim 1 , propyl claim 1 , isopropyl claim 1 , n-butyl claim 1 , sec-butyl claim 1 , isobutyl claim 1 , tert-butyl claim 1 , naphtyl claim 1 , Ccycloalkyl phenyl and phenyl substituted with Cto Calkoxy claim 1 , all of which groups may be substituted or unsubstituted.10. The compound of wherein Ris selected from the group consisting of hydrogen claim 1 , oxo and substituted or unsubstituted Cto Calkyl.11. The compound of wherein Rand Rare independently selected from the group consisting of hydrogen and Cto Calkyl claim 1 , each of which groups may be substituted or unsubstituted.19. A composition comprising a compound of claim 1 , or a salt thereof claim 1 , and a suitable carrier.20. The composition of claim 19 , wherein the composition is selected from the group consisting of a sunscreen composition claim 19 , ...

Etching Composition And Method For Selectively Removing Silicon Nitride During Manufacture Of A Semiconductor Device

The disclosed and claimed subject matter is directed to an etching composition that includes (A) phosphoric acid and (B) a mixture that includes (i) a silicon-containing compound and (ii) an aqueous solvent. In some embodiments, the etching compositions include additional ingredients. The etching compositions are useful for the selective removal of silicon nitride over silicon oxide from a microelectronic device having such material(s) thereon during its manufacture. 24-. (canceled)5. The composition of claim 1 , wherein the mixture further comprises at least one additional acid other than neat phosphoric acid selected from HNO claim 1 , HSO claim 1 , HCl and methane sulfuric acid.69-. (canceled)10. The composition of claim 1 , wherein (i) the mixture further comprises neat sulfuric acid and (ii) a combined content of the neat phosphoric acid and the neat sulfuric acid is between approximately 80% and approximately 85% by weight of the composition.11. The composition of claim 1 , wherein (i) the mixture further comprises sulfuric acid and (ii) a combined content of the neat phosphoric acid and the neat sulfuric acid is approximately 83.5% by weight of the composition.1224-. (canceled)25. The composition of claim 1 , wherein the mixture further comprises one or more additional silicon-containing compound selected from alkylsilsesquioxanes claim 1 , vinylsilsesquioxane claim 1 , carboxylic acid alkylsilsesquioxane and alkyleneglycol alkylsilsesquioxane.2630-. (canceled)31. The composition of claim 1 , wherein the mixture comprises a compound of Formula I.32. The composition of claim 1 , wherein the mixture comprises a compound of Formula II.3335-. (canceled)36. The composition of claim 1 , wherein m in one or both of Formula I and Formula II is 0.37. The composition of claim 1 , wherein a content of the compound of Formula I is approximately 5% or less by weight.3847-. (canceled)49. (canceled)5255-. (canceled)57. (canceled)6065-. (canceled)66. The composition of claim ...

Method for producing siloxanes from alkali salts of silanols

Cyclic siloxanes are prepared economically by reaction of an alkali metal siliconate having a mol ratio of alkali metal cation to silicon of less than one or their hydrolysis/condensation products or mixture thereof, with a halosilane. 17.-. (canceled)8. A process for preparing cyclic siloxanes of the formula (1){'br': None, 'sup': 1', '2', '3, 'sub': 'n', '[RSi(OSiRRR)O]\u2003\u2003(1)'} {'br': None, 'sub': 3-m', 'm, 'R—Si(OH)(OM)\u2003\u2003(2),'}, 'by reaction of alkali metal salts of silanols consisting of units of the general formula (2)'}of their hydrolysis/condensation products, or of alkali metal salts of silanols of the formula (2) together with their hydrolysis/condensation products, wherein the molar ratio of cation M to silicon is <1, {'br': None, 'sup': 1', '2', '3, 'RRRSi-Hal\u2003\u2003(3)'}, 'with halosilanes of the formula (3)'}wherem is 0, 1, 2 or 3 and on average is a number from 0.1 to <1,n is 3, 4, 5, 6, 7 or 8,R is an organic radical bonded via carbon to silicon,M is an alkali metal cation,Hal is a halogen radical, and{'sup': 1', '2', '3, 'sub': 1-10', '1-20, 'R, R, and Rare hydrogen, Calkoxy radicals, Caryloxy radicals or monovalent hydrocarbon radicals having 1 to 18 carbon atoms which are unsubstituted or substituted by halogen atoms or alkoxy groups.'}9. The process of claim 8 , wherein R is a monovalent claim 8 , Si—C-bonded hydrocarbon radical having 1 to 30 carbon atoms claim 8 , which is unsubstituted or substituted by halogen atoms claim 8 , Calkyl or Calkoxy groups or silyl groups claim 8 , and in which one or more mutually nonadjacent —CH— units are optionally replaced by —O— or —S— groups.10. The process of claim 8 , wherein M is selected from sodium and potassium.11. The process of claim 9 , wherein M is selected from sodium and potassium.12. The process of claim 8 , wherein the molar ratio M:Si in the formula (2) is from 0.4 to 0.85.13. The process of claim 9 , wherein the molar ratio M:Si in the formula (2) is from 0.4 to 0.85.14 ...

SILSESQUIOXANE RESIN AND SILYL-ANHYDRIDE COMPOSITION

A silsesquioxane-containing composition comprising a silsesquioxane resin and a silyl-anhydride of formula (II) (see description), products prepared therefrom, photoresist compositions comprising the silsesquioxane-containing composition and a photoacid generator, products prepared therefrom, methods of making and using same, and manufactured articles and semiconductor devices containing same. 1. A silsesquioxane-containing composition comprising (A) a silsesquioxane resin and (B) a silyl-anhydride , wherein: {'br': None, 'sub': 3/2', 't1', '3/2', 't2', '2/2', 'd', 'x', '(4-x)/2', 'y', '3/2', 't3, 'sup': 1', '1', '2, '[HSiO][Z-L-SiO][H(RO)SiO][(RO)SiO][RSiO]\u2003\u2003(I),'}, 'the (A) silsesquioxane resin is of formula (I) subscript t1 is a mole fraction of from 0.4 to 0.9;', 'subscript t2 is a mole fraction of from 0.1 to 0.6;', 'subscript d is a mole fraction from 0 to 0.45;', 'subscript x is an integer of 1, 2, or 3;', 'subscript y is a mole fraction from 0 to 0.25;', 'subscript t3 is a mole fraction from 0 to 0.15;', 'the sum of t1+t2=from ≥0.9 to ≤1 and the sum of t1+t2+d+y+t3=1;', {'sup': '1', 'sub': 1', '6, 'each Ris independently H or (C-C)alkyl;'}, {'sup': '2', 'each Ris independently HO-L- or HOOC-L-;'}, {'sub': 1', '20', '1', '3, 'each L is independently a divalent (C-C)hydrocarbon group that is unsubstituted or substituted with at least 1 substituent independently selected from (C-C)alkyl, —OH, and a fluorine atom up to and including perfluoro-substitution; and'}, {'sup': 3a', '3b', '3a', '3b', '3a', '3b, 'sub': 2', '3', '2', '3', '2', '3, 'each Z is —OH, —COOH, —O-THP, —OCH(R), —OC(R), —COOCH(R), —COOC(R), —OCOOCH(R), or —OCOOC(R),'}, 'wherein THP is tetrahydropyran-2-yl;', {'sup': 3a', '3a, 'sub': 1', '6', '3', '12', '6', '10', '1', '6', '3', '12', '6', '12, 'wherein each Ris independently a (C-C)alkyl, (C-C)cycloalkyl, (C-C)aralkyl, ((C-C)alkyl)3SiCH2CH2-, or 2 Rtogether with the carbon atom to which they are both bonded are a (C-C)cycloalkyl or a (C ...

Novel isocyanide compound and hydrosilylation reaction catalyst

A hydrosilylation reaction catalyst prepared from a catalyst precursor comprising a transition metal compound of groups 8, 9, or 10 of the periodic table, excluding platinum, such as an iron carboxylate, cobalt carboxylate, or nickel carboxylate, and a ligand comprising an isocyanide compound having an organosiloxane group.

N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM

Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition. 2. The N-alkyl substituted perhydridocyclic silazane according to claim 1 , wherein each R is independently a branched alkyl group having three to about four carbon atoms.3. The N-alkyl substituted perhydridocyclic silazane according to claim 2 , wherein each R is independently selected from the group consisting of isopropyl and t-butyl groups. This application is a divisional of co-pending U.S. application Ser. No. 15/070,693, filed Mar. 15, 2016, which claims priority to U.S. Provisional Patent Application No. 62/136,916, filed Mar. 23, 2015, the disclosures of which are herein incorporated by reference.The low coefficient of thermal expansion and relatively low dielectric constant of silicon nitride (SiN) in its various forms has led to a wide range of thin films applications in semiconductor, display, photovoltaic and structural composite applications. The silicon nitride may range from amorphous to various crystalline forms and can include carbon doped materials or “silicon carbonitrides.” The most widely used manufacturing technologies for producing these films use the reaction of silicon precursors of silane (SiH) or dichlorosilane (HSiCl) with ammonia (NH) under thermal- or plasma-assisted low-pressure chemical vapor deposition (LPCVD), sub-atmospheric pressure CVD (SACVD), or atmospheric pressure CVD (APCVD). Unfortunately, plasma assistance necessitates temperatures in excess of 750° C. and thermal deposition processes require temperatures in excess of 1000° C. Plasma use also leads, in many cases, to the incorporation of excessive concentrations of hydrogen species, thus limiting the quality of the resulting SiN thin films.The use of these inorganic ...

SYNTHETIC BLEND F-POSS COMPOSITIONS FORMED FROM MULTIPLE FEEDSTOCK MATERIALS

The present disclosure relates, in exemplary embodiments, to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures. The present disclosure also relates, in exemplary embodiments, to methods of making such synthetic blends. 2. The F-POSS compound of claim 1 , wherein each long-chain fluorinated alkyl is independently from 5 to 12 carbon atoms in the longest continuous chain of carbon atoms.3. The F-POSS compound of claim 1 , wherein each long-chain fluorinated alkyl is independently selected from the group consisting of 4/2 fluorinated alkyl claim 1 , 3/3 fluorinated alkyl claim 1 , 6/2 fluorinated alkyl claim 1 , 4/4 fluorinated alkyl claim 1 , 8/2 fluorinated alkyl and 6/4 fluorinated alkyl.4. The F-POSS compound of claim 1 , wherein Ris 4/2 fluorinated alkyl and Ris 6/2 fluorinated alkyl.6. The F-POSS composition of claim 5 , wherein each long-chain fluorinated alkyl is independently from 5 to 12 carbon atoms in the longest continuous chain of carbon atoms.7. The F-POSS composition of claim 5 , wherein each long-chain fluorinated alkyl is independently selected from the group consisting of 4/2 fluorinated alkyl claim 5 , 3/3 fluorinated alkyl claim 5 , 6/2 fluorinated alkyl claim 5 , 4/4 fluorinated alkyl claim 5 , 8/2 fluorinated alkyl and 6/4 fluorinated alkyl.8. The F-POSS composition of claim 7 , wherein Ris 4/2 fluorinated alkyl and Ris 6/2 fluorinated alkyl.9. The F-POSS composition of claim 5 , wherein the mixture of compounds comprises a distribution of compounds having a ratio of Rto Rbetween 0:8 to 8:0.10. The F-POSS composition of claim 9 , wherein the distribution is a Gaussian distribution.11. An F-POSS composition produced by a process comprising:contacting a first feedstock comprising a first fluorinated trialkoxysilane with a second feedstock comprising a second fluorinated trialkoxysilane, wherein the first fluorinated ...

Synthetic blend f-poss compositions formed from multiple feedstock materials

The present disclosure relates, in exemplary embodiments, to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures. The present disclosure also relates, in exemplary embodiments, to methods of making such synthetic blends.

ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME

The present invention provides a novel organosilicon compound and polysiloxane which are useful as electronic materials, optical materials, coating materials, sealing materials and catalyst carriers and which can be used as additives for improving various physical properties such as flame retardancy, heat resistance, weatherability, light resistance, electric insulating property, a surface characteristic, hardness, a mechanical strength and a chemical resistance of a polymer material. That is, the present invention relates to an organosilicon compound represented by Formula (1) and polysiloxane comprising the above organosilicon compound as a monomer: 2. The organosilicon compound according to claim 1 , wherein each Ris a group selected independently from hydrogen and alkyl having 1 to 30 carbon atoms claim 1 , in which in the alkyl optional hydrogen may be replaced by fluorine and optional —CH— may be replaced by —O— or cycloalkylene.3. The organosilicon compound according to claim 1 , wherein each Ris a group selected independently from hydrogen claim 1 , alkenyl having 2 to 20 carbon atoms and alkyl having 1 to 20 carbon atoms; in which in the alkenyl optional hydrogen may be replaced by fluorine and optional —CH— may be replaced by —O— or cycloalkylene claim 1 , and in the alkyl optional hydrogen may be replaced by fluorine and at least one —CH— is replaced by cycloalkenylene.4. The organosilicon compound according to claim 1 , wherein each Ris a group selected independently from hydrogen claim 1 , phenyl and naphthyl; in which in the phenyl optional hydrogen may be replaced by halogen or alkyl having 1 to 10 carbon atoms claim 1 , in the alkyl which is a substituent of the phenyl optional hydrogen may be replaced by fluorine and optional —CH— may be replaced by —O— claim 1 , —CH═CH— claim 1 , cycloalkylene or phenylene; and when the phenyl or the naphthyl has plural substituents claim 1 , the substituents may be the same group or different groups.5. The ...

Symmetric hyperbranched silicone-modified polymerizable compound and modularized manufacturing method thereof

The invention provides a symmetric hyperbranched silicone-modified polymerizable compound comprises a compound represented by the general formula (1). There can be provided a symmetric hyperbranched silicone-modified polymerizable compound having a structure with chemically high flexibility at the branched chain, having good reactivity of the polymerizable functional group, and having a branched structure which is positionally and sterically symmetric and pure than the conventional ones. (R A R B ) 2 CHOR C c R D   (1) wherein R A represents a monovalent linear, branched or cyclic siloxane chain; R B represents —CH 2 CR b1 R b2 (CR b3 R b4 ) n1 OCH 2 —; R C represents a divalent linking group; “c” represents 0 or 1; and R D represents an unsaturated polymerizable functional group.

ICE ADHESION REDUCING PREPOLYMERS AND POLYMERS

The present disclosure relates to an FPOSS prepolymer which may be reacted with a reactive coating or a polyisocyanate and/or one or more of a polysiloxane, a polyol, a polyamine and a reactive coating; an FPOSS polyisocyanate prepolymer which may be reacted with one or more of a polysiloxane, a polyol, a polyamine or a reactive coating; and an FPOSS siloxane prepolymer which may be reacted with a polyisocyanate and/or one or more of a polyol, a polyamine or a reactive coating to form cross-linked polymers capable of reducing the ability of ice to adhere to the surface of an object, in particular aircraft or other vehicles, methods of producing the prepolymers and polymers and their use in coating surfaces. 2. The FPOSS prepolymer according to in which X is (CH)OC(0)NH(CH)OC(0)CH (NCO) (CH)NCO (lysine triisocyanate FPOSS) claim 1 , (CH)OH claim 1 , (CH)NH claim 1 , (CH)COCH(CH)CON((CH)OH) claim 1 , (CH)OCHCH(OH)CHOH claim 1 , or optionally substituted Calkyl which may be optionally interrupted by O claim 1 , CHO claim 1 , Si claim 1 , NH claim 1 , NR claim 1 , C═O claim 1 , CH(OH) claim 1 , NH claim 1 , CR(NCO) claim 1 , CH)or CO.3. An FPOSS prepolymer of the formula (I) according to in which X is (CH)OL claim 1 , (CH)NHL or optionally substituted (CH)L which may be optionally interrupted with O claim 1 , CHO claim 1 , Si claim 1 , NH claim 1 , NR claim 1 , C═O claim 1 , CH(OH) claim 1 , NH claim 1 , CR(NCO) claim 1 , (CH)or COin which L denotes the position at which a polyisocyanate is attached and R claim 1 , m claim 1 , n and Rare as defined in formula (I).6. The polymer according to in which the polyisocyanate is a diisocyanate claim 5 , triisocyanate claim 5 , higher functionality isocyanate or a combination thereof.7. (canceled)8. The polymer according to in which the polyisocyanate is present in an amount of 0.1-70% by weight based on the total weight of the polymer.9. The polymer according to in which the polyol or polyamine is a polyester polyol/polyamine ...

METHOD FOR PREPARING POLYHEDRAL OLIGOMERIC SILSESQUIOXANE

The present invention relates to a method for preparing a polyhedral oligomer silsesquioxane. The preparation method includes the step of reacting a reaction mixture containing at least two types of silane compounds and a tetraalkylammonium hydroxide having 2 to 5 carbon atoms at a temperature of 5° C. or below. 1. A method for preparing a polyhedral oligomer silsesquioxane comprising the step of: reacting a reaction mixture containing a first silane compound represented by Chemical Formula 1 below , a second silane compound represented by Chemical Formula 2 below , and a tetraalkylammonium hydroxide having 2 to 5 carbon atoms at a temperature of 5° C. or below:{'br': None, 'sup': 1', '1, 'sub': '3', 'R—SiX\u2003\u2003[Chemical Formula 1]'}{'br': None, 'sup': 2', '2, 'sub': '3', 'R-A-SiX\u2003\u2003[Chemical Formula 2]'}{'sup': 3', '4', '3', '4', '5, 'wherein, in Chemical Formulae 1 and 2, A is a single bond, an alkylene group having 1 to 10 carbon atoms, an arylene group having 6 to 30 carbon atoms, —O—Si(R)(R)—, or —O—Si(R)(R)—R—,'}{'sup': '1', 'Ris a monovalent moiety derived from a hydrocarbon having 1 to 30 carbon atoms substituted with a halogen,'}{'sup': 2', '6', '3, 'sub': 2', '3', '2, 'Ris a functional group selected from the group consisting of a (meth)acryloyl group, a (meth)acryloyloxy group, a hydroxy group, a mercapto group, a carboxyl group, an amino group, a cyano group, a glycidyl group, a glycidyloxy group, an epoxyalkyl group having 2 to 30 carbon atoms, an epoxyalkoxy group having 2 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, and an alkenyloxy group having 2 to 30 carbon atoms, or a monovalent moiety derived from a hydrocarbon having 1 to 30 carbon atoms substituted with at least one substituent selected from the group consisting of —OH, —NH, —NH—R, —NHX, —COON, —CONH, —CN, —SH, a glycidyl group, a glycidyloxy group, and maleimide,'}{'sup': 1', '2, 'Xand Xare each independently an alkoxy group having 1 to 5 carbon atoms, Cl, ...

HYDROLYSIS-RESISTANT SILICONE COMPOUNDS

In one aspect, the invention relates to hydrolysis-resistant silicone compounds. In particular, disclosed are sterically hindered hydrolysis-resistant silicone compounds and improved purity hydrolysis-resistant silicone compounds. Also disclosed are processes for making hydrolysis-resistant silicone compounds; the products of the disclosed processes; compositions and polymers comprising the disclosed compounds and products of the disclosed processes; and ophthalmic lenses, for example contact lenses, intraocular lenses, artificial cornea, and spectacle lenses, comprising the disclosed compositions, disclosed polymers, disclosed compounds, and products of the disclosed processes. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention. 2. The process of claim 1 , wherein M is an acryloyloxy group claim 1 , a methacryloyloxy group claim 1 , acrylamide group claim 1 , methacrylamide group claim 1 , N-vinylamide group claim 1 , or styryl group.3. The process of claim 2 , wherein M is an acryloyloxy group or a methacryloyloxy group5. The process of claim 4 , wherein 1≦3k+m≦20.7. The process of claim 6 , wherein M is an acryloyloxy group claim 6 , a methacryloyloxy group claim 6 , acrylamide group claim 6 , methacrylamide group claim 6 , N-vinylamide group claim 6 , or styryl group.8. The process of claim 7 , wherein M is an acryloyloxy group or a methacryloyloxy group10. The process of claim 9 , wherein 1≦3k+m≦20. This application is a divisional of U.S. Nonprovisional application Ser. No. 13/746,265 filed Jan. 21, 2013, which was a divisional of U.S. Nonprovisional application Ser. No. 12/901,191, filed Oct. 8, 2010, which application claimed the benefit of U.S. Nonprovisional application Ser. No. 11/561,456, filed Nov. 20, 2006, which application claimed the benefit of U.S. Provisional Application No. 60/848,317, filed Sep. 29, 2006, all of which are hereby incorporated ...

COMPOSITIONS FOR, SOLUTIONS FOR, AND METHODS OF USE OF SILOXANE BASED AROMATIC TRISUREAS AS VISCOSIFIERS

A compound represented by the following formula is provided: 2. The compound of claim 1 , wherein Z is selected from an aromatic ring claim 1 , a heteroaromatic ring claim 1 , a polycyclic aromatic ring system claim 1 , and a polycyclic heteroaromatic ring system.3. The compound of claim 1 , wherein Z is a (C) aromatic ring or a polycyclic aromatic ring.9. A solution comprising a volume of dense CO claim 1 , a compound of claim 1 , and a co-solvent claim 1 , wherein the solution has a viscosity greater than the viscosity of dense CO.10. The solution of claim 9 , wherein the co-solvent is a C-Chydrocarbon solvent.11. A method of increasing viscosity of dense COcomprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'dissolving a compound in accordance with in a co-solvent to form a solution; and'}{'sub': '2', 'mixing the solution with a volume of dense CO.'}12. The method of claim 11 , wherein the compound is an amount between 0.01 and 5 wt. % based on the weight of the resultant mixed solution.13. The method of claim 12 , wherein the compound is an amount between 0.1 and 1 wt. % based on the weight of the resultant mixed solution.14. The method of claim 11 , wherein the co-solvent used to dissolve the compound is an amount between 1 and 50 wt. % based on the weight of the resultant mixed solution.15. The method of claim 11 , wherein the mixing of the solution with a volume of dense COis performed at a temperature between 20° C. and 100° C. claim 11 , and under pressure within the range of 800 psi and 9000 psi.16. A method of increasing viscosity of natural gas liquids (NGLs) comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'dissolving a compound in accordance with in a volume of an NGL to form a solution.'}17. The method of claim 16 , wherein the NGL comprises one or more gases selected from a group consisting of propane claim 16 , butane claim 16 , iso-butane claim 16 , pentane claim 16 , and pentane plus.18. The method of claim 16 , wherein the ...

METHOD FOR PREPARING A SILICA GRAFTED WITH AN ORGANOSILICON COMPOUND

The present invention relates to a method for preparing a silica grafted with an organosilicon compound, to a grafted silica obtained according to said method and to the use thereof in compositions of silicone crosslinkable into an elastomer. 1. Method for preparing a silica grafted with at least one organosilicon compound chosen from the group consisting of:a cyclosiloxane,{'sub': 2', '2', '1', '10', '1', '3, 'a bi-silanol compound having the formula RSi(OH), the groups R, identical or different, representing a C-Calkyl group, preferably C-C, advantageously a methyl, an alkenyl group, preferably vinyl, an aryl group, preferably phenyl,'} {'br': None, 'sub': 3', '2', 'a', '2, '(R′SiO)(R′SiO)(R′SiOH)'}, 'a polyorganosiloxane having the following formula (I) [{'sub': 1', '10', '1', '3, 'the groups R′, identical or different, represent a C-Calkyl group, preferably C-C, advantageously a methyl, an alkenyl group, preferably vinyl, an aryl group, preferably phenyl or an —OH group,'}, 'and the symbol a is an integer between 1 and 30 and preferably between 3 and 30,, 'whereinand mixtures thereof;said method comprising the following steps:a) the preparation of an aqueous mixture having a pH between 6 and 11, preferably between 6.5 and 9.5 and more preferentially of approximately 7, by adding in an aqueous medium (preferably water) a silica and optionally a base,b) the said organosilicon compound is added to the mixture,c) the mixture is refluxed for a time greater than or equal to 1 hour, preferably greater than or equal to 20 hours, and at a temperature between 50° C. and 100° C., preferably between 70° C. and 100° C., andd) the grafted silica is separated from the mixture.2. Method according to comprising a further step a′) performed between steps a) and b) consisting of adding to the mixture:a water-miscible solvent compatible with said organosilicon compound so as to facilitate contact between the organosilicon compound and the silica, preferably chosen from the group ...

SURFACTANTS FOR ELECTRONICS

Pre-texturing agents, etchants, and photoresist stripping agents may be formulated to include one or more surfactants, from one or more surfactant classes, such as siloxane derivatives of amino acids that have surface-active properties. 2. The formulation of claim 1 , further comprising one or more acids.3. The formulation of claim 1 , further comprising one or more bases.4. The formulation of claim 1 , further comprising one or more chelating agents.6. The formulation of claim 5 , further comprising one or more oxidizing agents.7. The formulation of claim 5 , further comprising one or more complexing agents.9. The formulation of claim 8 , further comprising a sulfoxide.10. The formulation of claim 8 , further comprising a sulfone.11. The formulation of claim 8 , further comprising a glycol ether. This application claims priority to U.S. Provisional Application No. 62/970,356, filed Feb. 5, 2020, the disclosure of which is herein incorporated by reference in its entirety.The present disclosure pertains to surfactants for use in electronics. More specifically, the present disclosure pertains to surfactants in preparing circuit boards through etching and removing photoresist coatings. Such surfactants may include siloxane derivatives of amino acids wherein the siloxane derivatives have surface-active properties.Surfactants (molecules with surface-active properties) are widely used in manufacturing circuit boards in cleaners, etchants, and photoresist strippers. The surfactants may be included as emulsifiers, wetting agents, foaming agents, dispersants, and/or agents to improve spreadability.The surfactants may be uncharged, zwitterionic, cationic, or anionic.Although in principle any surfactant class (e.g., cationic, anionic, nonionic, amphoteric) is suitable, it is possible that a formulation may include a combination of two or more surfactants from two or more surfactant classes.Often, surfactants are amphiphilic molecules with a relatively water-insoluble ...

SILOXANE COMPOUND AND PROCESS FOR PRODUCING THE SAME

A siloxane compound comprises a plurality of siloxane repeating units and at least a portion of the siloxane repeating units are cyclosiloxane repeating units conforming to a specified structure. A process for producing such siloxane compounds is also provided. A process and kit for producing a cross-linked silicone polymer using the described siloxane compounds is also provided. A light emitting diode (LED) comprises an encapsulant, and the encapsulant comprises a cross-linked silicone polymer produced from the described siloxane compounds. 2. The siloxane compound of claim 1 , wherein Rand Rare independently selected from the group consisting of alkyl groups claim 1 , haloalkyl groups claim 1 , and aryl groups.3. The siloxane compound of claim 2 , wherein Rand Rare independently selected from the group consisting of aryl groups.4. The siloxane compound of claim 3 , wherein Rand Rare each phenyl groups.7. The siloxane compound of claim 1 , wherein Rand Rare independently selected from the group consisting of alkyl groups and aryl groups.8. The siloxane compound of claim 7 , wherein Rand Rare independently selected from the group consisting of alkyl groups.9. The siloxane compound of claim 8 , wherein Rand Rare methyl groups.10. The siloxane compound of claim 1 , wherein the siloxane compound further comprises silyl terminating groups.12. The process of claim 11 , wherein the first siloxane compound comprises a plurality of groups conforming to the structure of Formula (XX) and the second siloxane compound comprises a plurality of groups conforming to the structure of Formula (XL).13. The process of claim 11 , wherein x is 0 and y is 1.14. The process of claim 11 , wherein Rand Rare independently selected from the group consisting of alkyl groups claim 11 , haloalkyl groups claim 11 , and aryl groups.15. The process of claim 14 , wherein Rand Rare independently selected from the group consisting of aryl groups.16. The process of claim 15 , wherein Rand Rare phenyl ...

SILOXANE COMPOUND AND PROCESS FOR PRODUCING THE SAME

A siloxane compound comprises a plurality of siloxane repeating units and at least a portion of the siloxane repeating units are cyclosiloxane repeating units conforming to a specified structure. A process for producing such siloxane compounds is also provided. A process and kit for producing a cross-linked silicone polymer using the described siloxane compounds is also provided. A light emitting diode (LED) comprises an encapsulant, and the encapsulant comprises a cross-linked silicone polymer produced from the described siloxane compounds. 2. The siloxane compound of claim 1 , wherein the Rand Rare independently selected from the group consisting of haloalkyl groups claim 1 , and aryl groups.3. The siloxane compound of claim 2 , wherein Rand Rare independently selected form the group consisting of aryl groups.4. The siloxane compound of claim 3 , wherein Rand Rare phenyl groups.5. The siloxane compound of claim 2 , wherein Rand Rare independently selected from the group consisting of haloalkyl groups.6. The siloxane compound of claim 5 , wherein Rand Rare independently selected from the group consisting of fluoroalkyl groups8. The siloxane compound of claim 1 , wherein Rand Rare independently selected from the group consisting of alkyl groups and aryl groups.9. The siloxane compound of claim 8 , wherein Rand Rare independently selected from the group consisting of alkyl groups.10. The siloxane compound of claim 9 , wherein Rand Rare methyl groups.11. The siloxane compound of claim 1 , wherein the siloxane compound further comprises silyl terminating groups.12. The siloxane compound of claim 1 , wherein x is 0 claim 1 , 1 claim 1 , or 2.13. The siloxane compound of claim 12 , wherein x is 0.14. The siloxane compound of claim 1 , wherein y is 1 claim 1 , 2 claim 1 , or 3.15. The siloxane compound of claim 14 , wherein y is 1.16. The siloxane compound of claim 1 , wherein x is 0 and y is 1. This application claims, pursuant to 35 U.S.C. §119(e), the benefit of the ...

SILOXANE COMPOUND AND PROCESS FOR PRODUCING THE SAME

A siloxane compound comprises a plurality of siloxane repeating units and at least a portion of the siloxane repeating units are cyclosiloxane repeating units conforming to a specified structure. A process for producing such siloxane compounds is also provided. A process and kit for producing a cross-linked silicone polymer using the described siloxane compounds is also provided. A light emitting diode (LED) comprises an encapsulant, and the encapsulant comprises a cross-linked silicone polymer produced from the described siloxane compounds. 2. The compound of claim 1 , wherein Rand Rare independently selected from the group consisting of aryl groups.3. The compound of claim 2 , wherein Rand Rare each phenyl groups.4. The compound of claim 1 , wherein R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , and Rare independently selected from the group consisting of alkyl groups and aryl groups.5. The compound of claim 4 , wherein R claim 4 , R claim 4 , R claim 4 , R claim 4 , R claim 4 , R claim 4 , R claim 4 , R claim 4 , R claim 4 , R claim 4 , R claim 4 , and Rare independently selected from the group consisting of alkyl groups; and Rand Rare independently selected from the group consisting of aryl groups.6. The compound of claim 5 , wherein R claim 5 , R claim 5 , R claim 5 , R claim 5 , R claim 5 , R claim 5 , R claim 5 , R claim 5 , R claim 5 , R claim 5 , R claim 5 , and Rare methyl groups; and Rand Rare phenyl groups.7. The compound of claim 1 , wherein c is 1.8. The compound of claim 7 , wherein R claim 7 , R claim 7 , R claim 7 , R claim 7 , R claim 7 , R claim 7 , R claim 7 , R claim 7 , R claim 7 , R claim 7 , R claim 7 , and Rare methyl groups; and Rand Rare phenyl groups.9. The compound of claim 1 , wherein c is 0; R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , and ...

Multifunctional Sorbent Materials and Uses Thereof

The invention relates to a method for producing a sorbent material, comprising firstly providing a porous silica substrate, said substrate comprising a plurality of silanol groups on a surface thereof then reacting said silanol groups with either a silicon compound of formula RSi(OR′), where R is an alkyl group and n is 0 or 1, or an aminoalkyl silane of formula R″RSi(OR′)having at least two hydrolysable groups attached to silicon, where R″ is an aminoalkyl group, m is 1 or 2 and n is 0 or 1s or a compound of formula M(OR′), or a mixture of any two or more of the preceding compounds, hydrolysing the product, men reacting hydroxyl groups formed with one or more reagents, wherein each reagent is independently selected from the group consisting of an aminoalkyl silane having at least two hydrolysable groups attached to the silicon and a compound of formula M(OR′), and finally hydrolysing the product, wherein each OR′ independently is a hydrolysable group and each M independently is Zr, Ti, Hf, Sn, Th, Pb or Ge. There is also described a sorbent material and use of a sorbent material for purifying, separating and concentrating processes. 1. A method for producing a sorbent material , comprising:a) providing a porous silica substrate, said substrate comprising a plurality of silanol groups on a surface thereof, [{'sub': n', '4-n, 'i) a silicon compound of formula RSi(OR′), where R is an alkyl group and n is 0 or 1; or'}, {'sub': m', 'n', '4-n-m, 'ii) an aminoalkyl silane of formula R″RSi(OR′)having at least two hydrolysable groups attached to silicon, where R″ is an aminoalkyl group, m is 1 or 2 and n is 0 or 1; or,'}, {'sub': '4', 'iii) a compound of formula M(OR′); or'}, 'iv) a mixture of any two or more of i) to iii);, 'b) reacting said silanol groups with'}c) hydrolysing the product of b) to generate hydroxyl groups;{'sub': '4', 'd) reacting the hydroxyl groups generated in step c) with one or more reagents, wherein each reagent is independently selected from the ...

FLUORINATED CYCLOALKENE FUNCTIONALIZED SILICAS

Fluorinated cyclopentene moieties and fluorinated cyclopentene functionalized silica materials are provided. The fluorinated cyclopentene functionalized silica materials include a silica material having the fluorinated cyclopentene moiety covalently bonded thereto. Exemplary silica materials include a polysilsesquioxane, a nanosilica, a microsilica, a silica gel, a silica aerogel, or combinations thereof. The fluorinated cyclopentene moieties are based on a modification of perfluorocyclopentene (i.e., 1,2,3,3,4,4,5,5-octafluoro-1-cyclopentene) by nucleophilic substitution with an appropriate nucleophile having a reactive functional group. Methods for preparing fluorinated cyclopentene moieties and the corresponding fluorinated cyclopentene functionalized silica materials are also provided. 1. A fluorinated cyclopentene functionalized silica material comprising , a silica material having a fluorinated cyclopentene moiety covalently bonded thereto.2. The fluorinated silica material of claim 1 , wherein the silica material is selected from the group consisting of a polysilsesquioxane claim 1 , a nanosilica claim 1 , a microsilica claim 1 , a silica gel claim 1 , a silica aerogel claim 1 , and combinations thereof.4. The fluorinated silica material of claim 3 , wherein Y is F.5. The fluorinated silica material of claim 3 , wherein the linking group Lcomprises a substituted or unsubstituted alkyl claim 3 , cycloalkyl claim 3 , alkenyl claim 3 , cycloalkenyl claim 3 , alkynyl claim 3 , aryl claim 3 , heteroaryl claim 3 , or heterocyclic group.6. The fluorinated silica material of claim 3 , wherein Y is selected from the group consisting of ORand SR.7. The fluorinated silica material of claim 6 , wherein Ris selected from the group consisting of a substituted or unsubstituted alkyl or aryl group having at least a terminal OH claim 6 , alkene claim 6 , and alkyne.9. The fluorinated cyclopentene moiety of claim 8 , wherein Y is F.10. The fluorinated cyclopentene moiety of ...

PHOTOINITIATORS FUNCTIONED AS BOTH INITIATORS AND NANOFILLERS

This invention relates to a photoinitiator compound comprising: a polyhedral oligomeric silsesquioxane (POSS) moiety and a photoinitiator moiety, wherein the photoinitiator compound having the structure according to formula (I): [R—SiO](I), wherein n is 6, 8, 10 or 12 and R is independently selected from the group consisting of H, linear or branched (hetero)alkyl, linear or branched (hetero)alkenyl, (hetero)aryl, (hetero)alkyl aryl, (hetero)aryl alkyl and a photoinitiator moiety, wherein at least one R is a photoinitiator moiety and the photoinitiator compound is a nanoparticle. The present invention also relates to a method for the production of the photoinitiator compound of the invention, a photopolymerizable composition comprising the photoinitiator compound of the invention, the use of the photoinitiator compound of the invention for photopolymerization. The present invention is further related to a coated substrate comprising the photopolymerizable composition of the invention. 1. A photoinitiator compound comprising:{'sub': 1.5', 'n, 'a polyhedral oligomeric silsesquioxane (POSS) moiety and a photoinitiator moiety, wherein the photoinitiator compound has a having the structure according to formula (I): [R—SiO](I), wherein n is 6, 8, 10 or 12 and R is independently selected from the group consisting of H, linear or branched (hetero)alkyl, linear or branched (hetero)alkenyl, (hetero)aryl, (hetero)alkyl aryl, (hetero)aryl alkyl and a photoinitiator moiety, wherein at least one R is a photoinitiator and the photoinitiator compound is a nanoparticle.'}4. The photoinitiator compound according to claim 3 , wherein m is 3.5. The photoinitiator compound according to claim 3 , wherein R-Rare H.8. The method according to claim 7 , wherein{'sub': '6', 'Ris Br.'}9. A photopolymerizable composition comprising(a) at least one photopolymerizable compound and {'sub': 1.5', 'n, 'a polyhedral oligomeric silsesquioxane (POSS) moiety and a photoinitiator moiety, wherein the ...

SYNTHESIS AND APPLICATIONS OF PERIPHERALLY ASYMMETRIC ARYL POSS COMPOUNDS

A method of synthesizing peripherally asymmetric aryl polyhedral oligomeric silsesquioxane (ArPOSS) compounds. The method comprises: 7. A method of improving solubility of a functionalized polyhedral oligomeric silsesquioxane compound , the method comprising:corner-capping an uncondensed phenyl polyhedral oligomeric silsesquioxane with a chlorosilane having a terminal aryl group or a chlorosilane having a polycyclic aromatic functional group.8. The method of claim 7 , further comprising:preparing the chlorosilane having the terminal aryl group by reacting an aryl Grignard or a lithium reagent with silicon tetrachloride.9. The method of claim 7 , wherein the method is carried out under basic conditions.10. A soluble claim 7 , functionalized polyhedral oligomeric silsesquioxane compound synthesized in accordance with the method of .11. A method of synthesizing a peripherally asymmetric aryl polyhedral oligomeric silsesquioxane (ArPOSS) compound claim 7 , the method comprising:corner-capping an uncondensed phenyl-POSS alcohol using a chlorosilane having a terminal aryl group or a chlorosilane having a polycyclic aromatic functional group, the terminal aryl group or the polycyclic aromatic functional group being geometrically larger than the phenyl groups of the phenyl-POSS alcohol.12. The method of claim 11 , further comprising:preparing the chlorosilane having the terminal aryl group by reacting an aryl Grignard or a lithium reagent with silicon tetrachloride.13. The method of claim 11 , wherein the method is carried out under basic conditions.14. The method of claim 11 , wherein the terminal aryl group is selected from the group consisting of 1-Naphthyl claim 11 , 2-Naphthyl claim 11 , 9-Anthracenyl claim 11 , 9-Phenanthrenyl claim 11 , and 1-Pyrenyl.15. A peripherally asymmetric aryl polyhedral oligomeric silsesquioxane (ArPOSS) compound synthesized in accordance with the method of . This application claims the benefit of and priority to U.S. Provisional Application ...

Hydrosilylation reaction catalyst

A hydrosilylation reaction catalyst prepared from: a catalyst precursor comprising a transition metal compound, excluding platinum, belonging to group 8-10 of the periodic table, e.g., iron acetate, cobalt acetate, nickel acetate, etc.; and a ligand comprising an isocyanide compound such as t-butyl isocyanide. The hydrosilylation reaction catalyst has excellent handling and storage properties. As a result of using this catalyst, a hydrosilylation reaction can be promoted under gentle conditions.

UV Absorbing Compounds, Compositions Comprising Same and Uses Thereof

There is provided a range of novel compounds which have been demonstrated to have useful UV absorbing properties. These compounds will find use in a range of applications such as active components in sunscreen formulations, paints, plastics, fabrics, glass and UV protective coatings. 2: The compound of wherein the atom which is double bonded to the carbon attached directly to the ring is selected from the group consisting of a carbon atom claim 1 , an oxygen atom claim 1 , a nitrogen atom and a sulphur atom.7: The compound of wherein Ris directly attached to the nitrogen of the ring via a tertiary carbon.8: The compound of wherein when Ris alkyl it is tert-butyl.9: The compound of wherein Rand Rare independently selected from the group consisting of Cto Calkyl claim 1 , Cto Calkenyl and Cto Calkoxy claim 1 , each of which groups may be substituted with a group selected from alkyl claim 1 , alkenyl claim 1 , heteroaryl claim 1 , heterocyclyl claim 1 , alkynyl claim 1 , aroyl claim 1 , alkanone claim 1 , cycloalkyl claim 1 , cycloalkanone claim 1 , cycloalkenyl claim 1 , alkanoyl claim 1 , alkanoyloxy claim 1 , alkoxycarbonyl claim 1 , carbamoyl claim 1 , carboxyl claim 1 , haloalkyl claim 1 , N-alkyl claim 1 , N-aryl and N-heterocyclyl.10: The compound of wherein Ris selected from the group consisting of hydrogen claim 1 , substituted or unsubstituted Cto Calkyl claim 1 , substituted or unsubstituted Cto Calkenyl and substituted or unsubstituted Cto Calkanoyl.11: The compound of wherein X is 1 or two carbon atoms forming part of the ring structure.13: The compound of wherein the compound is a compound of formula IIb and Y is selected from C claim 12 , C claim 12 , C claim 12 , Cor Calkyl optionally substituted with oxo claim 12 , hydroxyl claim 12 , alkoxy and halo.14: The compound of wherein Y is Calkyl substituted with oxo.15: The compound of wherein Ris t-butyl.17: A composition comprising a compound of claim 1 , or a salt thereof claim 1 , and a suitable carrier. ...

ORGANOSILICON COMPOUND AND CURABLE COMPOSITION

A cyclic organosilicon compound having a (meth)acrylic group and a urea structure on a silicon atom cures into a product having improved flexibility, surface hardness, and evaporation amenability. 2. The organosilicon compound of wherein Ris a C-Calkyl group claim 1 , Ris hydrogen claim 1 , and Yand Yare each independently a C-Clinear alkylene group.3. An actinic radiation-curable composition comprising the organosilicon compound of .4. The composition of wherein the organosilicon compound is present in an amount of at least 10% by weight. This non-provisional application claims priority under 35 U.S.C. §119(a) on Patent Application No. 2016-031818 filed in Japan on Feb. 23, 2016, the entire contents of which are hereby incorporated by reference.This invention relates to an organosilicon compound and a curable composition comprising the same. More particularly, it relates to a cyclic organosilicon compound having a multi-functional (meth)acrylic group and a urea structure and an actinic radiation-curable composition comprising the same.Polymerizable vinyl monomers are known in the art as photo-reactive compounds. Photo-cured products of polymerizable vinyl monomers, however, lack weather resistance and chemical properties since they consist solely of organics. Many attempts were made to convert photo-reactive organosilicon compounds into organic-inorganic hybrid compounds which can overcome the problems.For example, Patent Document 1 discloses a method for polycondensation of an acrylic functional silane to form a polyhedral oligomeric silsesquioxane (known as POSS) which meets both photo-reactivity and receptivity to inorganic evaporation (e.g., CVD). The inventor's experimentation reveals that the POSS having a multi-functional acrylic moiety exhibits insufficient flexibility.Various attempts were made to impart flexibility to photo-reactive organosilicon compounds. For example, Patent Document 2 proposes a long-chain linker between an acrylic moiety and a silicon ...

NEW FUNCTIONALIZED UNSATURATED DOUBLE-DECKER DERIVATIVES OF DIVINYLSILSESQUIOXANES

The subject of the invention are new functionalized unsaturated double-decker derivatives of divinylsilsesquioxanes of the general formula 1. In the formula, Rare the same and stand for an aryl group containing from 1 to 2 rings, Rare the same and stand for an alkyl group containing carbon atoms from Cto C, substituted or unsubstituted aryl group containing from 1 to 2 rings, Rare the same and stand for a substituted or unsubstituted aryl group containing from 1 to 2 rings or a group of the formula —R-R—, where Rstands for an alkyl group containing carbon atoms from Cto C, while Rstands for aryl group containing from 1 to 2 rings. 1. New functionalized unsaturated double-decker derivatives of divinylsilsesquioxanes of the general formula 1, [{'sup': '1', 'Rare the same and stand for an aryl group containing from 1 to 2 rings,'}, {'sup': '2', 'claim-text': [{'sub': 1', '2, 'Alkyl group containing carbon atoms from Cto C,'}, 'Unsubstituted aryl group containing from 1 to 2 rings, or', {'sub': 1', '3, 'Monosubstituted aryl group containing from 1 to 2 rings and substituted at any site of the ring with an alkoxyl group comprising an alkyl group with carbon atoms from Cto C,'}], 'Rare the same and stand for, {'sup': '3', 'claim-text': [ [{'br': None, 'sup': 4', '5, '—R-R—\u2003\u2003(2)'}, {'sup': 4', '5, 'sub': 1', '3, 'where Rstands for an alkyl group containing carbon atoms from Cto C, and Rstands for an aryl group containing from 1 to 2 rings,'}], 'Group of formula 2'}, 'Unsubstituted aryl group containing from 1 to 2 rings, or', [{'sub': 1', '2, 'An alkyl group containing carbon atoms from Cto C,'}, {'sub': 1', '2, 'An alkoxyl group comprising an alkyl group containing carbon atoms from Cto C,'}, 'halogen that is F, or Br, or', {'sub': 1', '2, 'fully substituted halogenalkyl containing carbon atoms from Cto Cand F or Cl.'}], 'Aryl group containing from 1 to 2 rings and substituted at any site with], 'Rare the same and stand for'}], 'in which'} The subject of ...

Organoamino-Functionalized Cyclic Oligosiloxanes for Deposition of Silicon-Containing Films

Organoamino-functionalized cyclic oligosiloxanes, which have at least two silicon and two oxygen atoms as well as an organoamino group and methods for making the organoamino-functionalized cyclic oligosiloxanes are disclosed. Methods for depositing silicon and oxygen containing films using the organoamino-functionalized cyclic oligosiloxanes are also disclosed. 2. The composition of further comprising at least one selected from the group consisting of a solvent and a purge gas.3. The composition of claim 1 , wherein the composition is substantially free of one or more impurities selected from the group consisting of a halide claim 1 , metal ions claim 1 , metal claim 1 , and combinations thereof.4. The composition of claim 1 , wherein Ris selected from the group consisting of a Cto Ccyclic alkyl group claim 1 , and a Cto Caryl group claim 1 , Ris selected from the group consisting of hydrogen and a Cto Calkyl group claim 1 , and Rare each independently selected from hydrogen and a Cto Calkyl group.5. The composition of claim 1 , wherein Rand Rare linked to form a Cto Cheterocyclic structure or a Cto Cheterocyclic aryl structure claim 1 , either of which may be substituted by one claim 1 , two claim 1 , or more methyl groups claim 1 , and Rare each independently selected from hydrogen and a Cto Calkyl group.6. The composition of claim 1 , wherein the organoamino-functionalized cyclic oligosiloxane compound is selected from the group consisting of: 2-pyrrolidino-2 claim 1 ,4 claim 1 ,4 claim 1 ,6 claim 1 ,6-pentamethylcyclotrisiloxane claim 1 , 2-pyrrolyl-2 claim 1 ,4 claim 1 ,4 claim 1 ,6 claim 1 ,6-pentamethylcyclotrisiloxane claim 1 , 2-piperidino-2 claim 1 ,4 claim 1 ,4 claim 1 ,6 claim 1 ,6-pentamethylcyclotrisiloxane claim 1 , 2-(2-methylpiperidino)-2 claim 1 ,4 claim 1 ,4 claim 1 ,6 claim 1 ,6-pentamethylcyclotrisiloxane claim 1 , 2-(2 claim 1 ,6-dimethylpiperidino)-2 claim 1 ,4 claim 1 ,4 claim 1 ,6 claim 1 ,6-pentamethylcyclotrisiloxane claim 1 , 2- ...

METHOD FOR PRODUCING CYCLIC POLYSILANE COMPOUND

Provided is a method for producing a cyclic polysilane compound simply and easily in a higher yield. The method for producing a cyclic polysilane compound according to an embodiment of the present invention comprising a reaction step of adding a silane monomer compound represented by Formula (I) below into a liquid mixture containing metallic sodium and a lithium salt and allowing them to react: 2. The method for producing a cyclic polysilane compound according to claim 1 , wherein the silane monomer compound is added batchwise.3. The method for producing a cyclic polysilane compound according to claim 1 , wherein a temperature condition in the reaction step is −10° C. or higher and lower than a boiling point of a reaction solution.4. The method for producing a cyclic polysilane compound according to claim 3 , wherein the temperature condition for addition of the silane monomer compound is −10° C. or higher and not higher than room temperature.5. The method for producing a cyclic polysilane compound according to claim 3 , wherein a temperature of the reaction solution after addition of the silane monomer compound is 20° C. or higher.6. (canceled)7. The method for producing a cyclic polysilane compound according to claim 1 , wherein an amount of substance of lithium contained in the liquid mixture is from 0.01 times to 5 times an amount of substance of the metallic sodium. The present invention relates to a method for producing a cyclic polysilane compound.Silicon carbide fibers are fibers having excellent heat resistance and oxidation resistance even in high temperature atmosphere at a thousand and several hundreds degrees. This property is expected to be applied in the nuclear and aerospace fields.The silicon carbide fibers can be obtained by subjecting an organosilicon polymer compound such as polycarbosilane, which is a precursor, to spinning, infusibilization, and firing. To obtain silicon carbide fibers having extreme heat resistance, introduction of oxygen ...