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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 1391. Отображено 100.
19-04-2012 дата публикации

Embedded vertical optical grating for heterogeneous integration

Номер: US20120092771A1
Автор: Fei Liu, Keith Kwong Hon Wong, Qiqing (Christine) Ouyang
Принадлежит: International Business Machines Corp

An embedded vertical optical grating, a semiconductor device including the embedded vertical optical grating and a method for forming the same. The method for forming the embedded optical grating within a substrate includes depositing a hard mask layer on the substrate, patterning at least one opening within the hard mask layer, vertically etching a plurality of scallops within the substrate corresponding to the at least one opening within the hard mask layer, removing the hard mask layer, and forming an oxide layer within the plurality of scallops to form the embedded vertical optical grating.

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Номер записи: 1
21-06-2012 дата публикации

Method of manufacturing blazed diffractive grating and method of manufacturing mold for manufacturing blazed diffractive grating

Номер: US20120152080A1
Автор: Takashi Sukegawa, Yukinobu OKURA
Принадлежит: Canon Inc

A method of manufacturing a blazed diffractive grating includes a first step of forming a first groove having a first surface and a second surface by moving, in the first direction at a first position in the second direction, a cutting tool having a first cutting blade and a second cutting blade to cut the object; a second step of forming a second groove by moving, in the first direction at a second position separated from the first position in the second direction by a grating pitch, the cutting tool to cut the object; and a third step of forming a blazed surface of the first groove using the first cutting blade by moving, in the first direction at a third position between the first position and the second position, the cutting tool to cut the first surface of the first groove.

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Номер записи: 2
21-02-2013 дата публикации

Projection-type photolithography system using composite photon sieve

Номер: US20130044299A1
Автор: Changqing Xie, Dongmei Li, Hailiang Li, Lina Shi, Ming Liu, Nan GAO, Xiaoli Zhu, Yilei Hua
Принадлежит: Institute of Microelectronics of CAS

The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve. According to the present disclosure, because the composite photon sieve is used instead of a projection objective lens in a conventional projection-type photolithography system, the advantage of high efficiency in the conventional projection-type photolithography system can be reserved, and also photolithography can be performed in batches rapidly, so that photolithography efficiency can be improved. Meanwhile, costs can be effectively cut down and the system can be reduced in size.

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Номер записи: 3
14-03-2013 дата публикации

Up -conversion of electromagnetic radiation within a wavelength range

Номер: US20130063807A1
Автор: Jeppe Seidelin Dam
Принадлежит: Danmarks Tekniskie Universitet

Prior art techniques for converting the wavelength of electromagnetic radiation by non-linear interactions such as sum frequency generation SFG produces blurred images when applied to polychromatic images. The invention provides an improved arrangement ( 15 ) for up-converting incoming electromagnetic radiation with dissimilar first wavelengths (λ,) distributed in a first wavelength interval (Δλ,) into up-converted electromagnetic radiation comprising corresponding dissimilar up-converted wavelengths (λ 3 ), smaller than the first wavelengths (Δ 1 ). The arrangement applies a nonlinear crystal ( 5 ) and a laser ( 16 ) for providing a laser beam ( 10 ) of second wavelength, different from the first wavelengths (λ 1 ) inside the nonlinear crystal, and a Fresnel zone plate ( 17 ) for focusing or converging the incoming radiation inside the nonlinear crystal in spatial overlap with the laser beam. The up-converted radiation is produced inside the non-linear crystal by sum frequency generation between the incoming radiation and the laser beam. The arrangement ( 15 ) can comprise an image forming lens arrangement ( 20 ) for forming an object image ( 2 ), a second zone plate ( 18 ) for forming an up-converted image ( 3 ) and an image sensor ( 19 ) on which the up-converted image ( 3 ) is formed.

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Номер записи: 4
06-06-2013 дата публикации

METHOD OF FABRICATING AN OPTICAL GRATING

Номер: US20130140723A1
Автор: Murakowski Janusz, Prather Dennis W., Shi Shouyuan
Принадлежит: Lumilant, Inc.

According to embodiments of the invention, the design and fabrication of a binary superimposed grating (BSG) results in better performing devices that may be fabricated using existing technology. The fabrication process includes forming grating features based upon repeating features of the desired superposition function. The design process also relaxes the processing requirement for equivalently performing devices. 1. A method comprising:determining placement for grating features according to a position of repeating features in a desired superposition function; andfabricating the grating using a fabrication tool to form the grating features on or as part of a substrate according to the determined placement, wherein the grating features have a uniform width.2. The method of claim 1 , wherein the fabrication tool comprises an electron-beam lithography system.3. The method of claim 1 , wherein the uniform width is about 100 nm.4. The method of claim 1 , wherein the uniform width is as small as the fabrication tool can create.5. The method of claim 1 , wherein fabricating the grating includes having placement accuracy for the grating features to less than 1 nanometer.6. The method of claim 1 , wherein fabricating the grating includes having placement accuracy for the grating features to within about 0.1 nm.7. The method of claim 1 , wherein the repeating features are local minima.8. The method of claim 1 , wherein the repeating features are local maxima.9. A method comprising:determining placement for grating features according to a position of repeating features in a desired superposition function; and fabricating the grating using a fabrication tool to form the grating features on or as part of a substrate according to the determined placement, wherein the grating features have a uniform depth.10. The method of claim 9 , wherein the fabrication tool comprises an electron-beam lithography system.11. The method of claim 9 , wherein the grating features also have a ...

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Номер записи: 5
01-08-2013 дата публикации

DIFFRACTION-TYPE 3D DISPLAY ELEMENT AND METHOD FOR FABRICATING THE SAME

Номер: US20130193106A1
Автор: Chang Yao-Ru, CHEN Chien-Yue, Hung Wen-Chen
Принадлежит: National Yunlin University of Science and Technology

A diffraction-type 3D display element is arranged on an image output face of a 3D display device and comprises a first diffraction area and a second diffraction area. The first diffraction area has a plurality of first stepped gratings spaced apart from each other. The second diffraction area has a plurality of second stepped gratings spaced apart from each other. The second diffraction area is adjacent to the first diffraction area and is arranged symmetrically to the first diffraction area with a central line being the symmetric axis. The diffraction-type 3D display element of the invention diffracts the images output by the 3D display device and projects the diffracted images to two different viewing areas to provide 3D images for users. 14-. (canceled)5. A method for fabricating a diffraction-type 3D display element , comprising steps:cleaning a substrate;undertaking a first etching process, wherein the first etching process employs a first mask to form a plurality of first flattened areas and a plurality of first recessed areas on the substrate;aligning a second mask, wherein the second mask is aligned to borders of the first flattened areas and the first recessed areas; andundertaking a second etching process, wherein the second etching process employs the second mask to form second recessed areas on the first flattened areas and the first recessed areas respectively, and wherein each second recessed area is formed at a depth smaller than that of the first recessed area to form a four-step structure.6. The method for fabricating a diffraction-type 3D display element according to claim 5 , wherein the depth of the second recessed area is half the depth of the first recessed area.7. The method for fabricating a diffraction-type 3D display element according to further comprising steps:aligning a third mask, wherein the third mask is aligned to borders of the first flattened areas, the first recessed areas and the second recessed areas; andundertaking a third ...

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Номер записи: 6
31-10-2013 дата публикации

Variable Focal Length Achromatic Lens System

Номер: US20130286309A1
Автор: Peyghambarian Nasser N., Peyman Gholam, Savidis Nickolaos, Schwiegerling James T., Valley Pouria
Принадлежит:

A variable focal length achromatic lens includes a flat liquid crystal diffractive lens and a pressure-controlled fluidic refractive lens. The diffractive lens is composed of a flat binary Fresnel zone structure and a thin liquid crystal layer, producing high efficiency and millisecond switching times while applying a low ac voltage input. The focusing power of the diffractive lens is adjusted by electrically modifying the sub-zones and re-establishing phase wrapping points. The refractive lens includes a fluid chamber with a flat glass surface and an opposing elastic polydimethylsiloxane (PDMS) membrane surface. Inserting fluid volume through a pump system into the clear aperture region alters the membrane curvature and adjusts the refractive lens' focal position. Primary chromatic aberration is remarkably reduced through the coupling of the fluidic and diffractive lenses at a number of selected focal lengths. Potential applications include miniature color imaging systems, medical and ophthalmic devices, or any design that utilizes variable focal length achromats. 1. An optical system comprising:two lenses wherein a focal length of each of the two lenses is adjustable to alter a focal length of the system, so that the system is substantially achromatic over a range of values of focal length of the system; andat least one device for adjusting the focal length of each of the two lenses.2. The system of claim 1 , wherein the two lenses include a diffractive lens and a refractive lens.3. The system of claim 2 , wherein the diffractive lens comprises a Fresnel zone plate having portions that form a pattern and a liquid crystal material claim 2 , and the at least one device alters a refractive index of the liquid crystal material and electrically modifies subzones of the Fresnel zone plate and re-establishes phase wrapping points of the Fresnel zone plate in order to adjust the focal length of the diffractive lens.4. The system of claim 3 , wherein the at least one ...

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Номер записи: 7
03-04-2014 дата публикации

DIFFRACTION GRATING MANUFACTURING METHOD, SPECTROPHOTOMETER, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Номер: US20140092384A1
Автор: Ebata Yoshisada, Hasegawa Norio, Kakuta Kazuyuki, MATSUI Shigeru, Onozuka Toshihiko
Принадлежит: HITACHI HIGH-TECHNOLOGIES CORPORATION

The present invention has been made in view of the above, and an object thereof is to provide a manufacturing technique capable of manufacturing a diffraction grating which is suitable for use in a spectrophotometer and has an apex angle of a convex portion of about 90° and can satisfy high diffraction efficiency and a low stray light amount. A method of manufacturing a diffraction grating, the method including: setting an exposure condition such that a sectional shape of a convex portion of a resist on a substrate, which has been formed by exposure, is an asymmetric triangle with respect to an opening portion shape of a mask having an opening portion with a periodic structure and an angle formed by a long side and a short side of the triangle is about 90°; and performing exposure. 1. A method of manufacturing a diffraction grating , comprising: setting an exposure condition such that , with respect to an opening portion shape of a mask having an opening portion with a periodic structure , a sectional shape of a convex portion of a resist on a substrate , the convex having been formed by exposure , is an asymmetric triangle and an angle formed by a long side and a short side of the triangle is about 90°; and performing exposure.2. The method of manufacturing a diffraction grating according to claim 1 , wherein at least one of the opening portion shape of the mask claim 1 , an exposure focus claim 1 , an exposure amount claim 1 , a numerical aperture of an exposure lens claim 1 , and a σ value of illumination is changed and comparison of sectional shapes of the convex portions of the resists on the substrate formed by exposure is performed.3. The method of manufacturing a diffraction grating according to claim 1 , wherein the mask has a periodic structure in a perpendicular direction or a parallel direction to with respect to a direction of grooves of the diffraction grating.4. The method of manufacturing a diffraction grating according to claim 1 , wherein the mask ...

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Номер записи: 8
07-01-2021 дата публикации

DEVICE AND METHOD FOR PRODUCING MASTER DIFFRACTION GRATING

Номер: US20210003752A1
Автор: OUE Yuki
Принадлежит: SHIMADZU CORPORATION

A device for producing a master diffraction grating includes a light source unit and a reflecting member . The light source unit forms a first interference fringe by irradiating a substrate surface of a master substrate with light. The reflecting member reflects the light from the light source unit reflected on the substrate surface of the master substrate and guides the light again to the substrate surface side to form a second interference fringe. A resist pattern based on the first interference fringe and the second interference fringe is formed on the substrate surface of the master substrate 1. A device for producing a master diffraction grating serving as a matrix for producing a replica diffraction grating , the device comprising:a light source unit for forming a first interference fringe by irradiating a substrate surface of a master substrate with light; anda reflecting member for reflecting light from the light source unit reflected on the substrate surface of the master substrate and guiding the light again to the substrate surface, so that a second interference fringe is formed, whereina resist pattern based on the first interference fringe and the second interference fringe is formed on the substrate surface of the master substrate.2. The device for producing a master diffraction grating according to claim 1 , whereinthe reflecting member is disposed at a position displaced along a direction parallel to a direction in which the first interference fringe extends, with respect to an optical axis of light from the light source unit.3. The device for producing a master diffraction grating according to claim 2 , whereinthe light source unit includes a condenser lens, a pinhole through which light condensed by the condenser lens passes, and a concave mirror for making light that has passed through the pinhole parallel, andthe reflecting member is disposed between the concave mirror and the substrate surface of the master substrate.4. A method for producing a ...

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Номер записи: 9
07-01-2021 дата публикации

DIFFRACTIVE OPTICAL ELEMENT AND METHOD FOR MANUFACTURING THE SAME

Номер: US20210003855A1
Автор: QIAN Pengxiang, SHAN Yanquan, WIEGEL Thomas, Zhang Guangjun
Принадлежит: SCHOTT GLASS TECHNOLOGIES (SUZHOU) CO. LTD.

A diffractive optical element is provided that includes at least two layers with different etching speeds for dry etching process. The diffractive optical element has a substrate of glass and a microstructure layer arranged on the substrate. The ratio of dry etching speed in thickness direction of the substrate to that of the microstructure layer is no more than 1:2 so that the substrate functions as an etching stop layer. The ratio of dry etching speed in horizontal direction of the substrate is substantially equal to that of the microstructure layer. The composition of glass includes, but is not limited to, AlO3, alkaline material (MO) and alkaline earth material (MO), where the weight percentage of AlO+MO+MO>=5%. 1. A diffractive optical element , comprising:{'sub': 2', '3', '2', '2', '3', '2, 'a substrate of glass, the glass comprising AlO, alkaline metal oxides MO, and alkaline earth metal oxides MO with a sum of content ΣAlO+MO+MO greater than 5 wt %, the substrate of glass exhibiting a refractive index in a range from 1.40 to 2.2;'}a microstructure layer arranged on the substrate of glass;a ratio of dry etching speed in thickness direction of the substrate of glass to that of the microstructure layer is no more than 1:2 so that the substrate of glass is an etching stop layer; anda ratio of dry etching speed in a horizontal direction of the substrate of glass is substantially equal to that of the microstructure layer.2. The diffractive optical element of claim 1 , wherein the ratio of dry etching speed in thickness direction is no more than 1:20.3. The diffractive optical element of claim 1 , wherein the sum of content ΣAlO+MO+MO is greater than or equal to 10 wt %.4. The diffractive optical element of claim 1 , wherein the microstructure layer has a feature dimension with an etched width less than 2000 μm.5. The diffractive optical element of claim 1 , wherein the microstructure layer has a step with an etched depth less than 1000 μm.6. The diffractive ...

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Номер записи: 10
03-02-2022 дата публикации

MULTIFOCAL INTRAOCULAR LENS

Номер: US20220031447A1
Автор: ATTIA Mickael, BRODSKY Alexander, GROSSINGER Israel, KAPLAN Natan
Принадлежит:

A multifocal IOL including at least one diffractive surface including a plurality of discrete, adjacent, diffractive, concentric rings, having a radial phase profile cross-section with a near-symmetrical diffractive surface topography, and an odd number, greater than three, of diffractive orders and an asymmetrical distribution of energy flux over the diffractive orders. 1. A multifocal IOL comprising a radial phase profile cross-section with a symmetrical or near-symmetrical local diffractive surface topography; and', 'an odd number, greater than three, of diffractive orders., 'at least one diffractive surface including a plurality of discrete, adjacent, diffractive, concentric rings, having'}2. The IOL according to claim 1 , wherein said IOL comprises an asymmetrical distribution of energy flux over said diffractive orders.3. The IOL according to claim 1 , wherein said IOL comprises 5 diffractive orders.4. The IOL according to claim 1 , wherein said diffractive surface comprises diffractive steps designed to maintain the diffractive profile unchanged in between said steps.5. The IOL according to claim 4 , wherein said diffractive steps are partially inside and partially outside the base curvature of the IOL.6. The IOL according to claim 1 , wherein said diffractive claim 1 , concentric rings comprise a repetitive pattern of diffractive profiles.7. The IOL according to claim 6 , wherein said profiles are asymmetrical.89-. (canceled)10. The IOL according to claim 1 , wherein said diffractive rings comprise a single transition from a first zone having a repetitive pattern of one diffractive profile to a second peripheral zone having a repetitive pattern of a second diffractive profile.11. The IOL according to claim 10 , wherein height of the diffractive surface topography of said second peripheral zone is maintained constant when advancing radially outwards in respect to the center height of the IOL.12. The IOL according to claim 1 , wherein said radial phase profile ...

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Номер записи: 11
21-01-2016 дата публикации

AUTOSTEREOSCOPIC DISPLAY DEVICE

Номер: US20160021361A1
Автор: JOHNSON Mark Thomas, KROON BART
Принадлежит: KONINKLIJKE CAMPUS 5

A stacked display has the different colour layers (), (), () ordered with respect to the wavelength-dependency of the lens focus so that there is better focus of the colours on the display layers that modulate those colours. The optical system (), () can be designed to have a wavelength-dependent focus that matches the position of each of the light modulating layers.

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Номер записи: 12
16-01-2020 дата публикации

SYSTEM AND METHOD FOR OPTIMALLY FORMING GRATINGS OF DIFFRACTED OPTICAL ELEMENTS

Номер: US20200018985A1
Автор: Evans Morgan, Kurunczi Peter, Olson Joseph, Thijssen Rutger Meyer Timmerman
Принадлежит: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optically transparent substrate, and forming an optical grating layer on the substrate. The method includes forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled components, disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate. A first sidewall of the optical grating may have a first angle, and a second sidewall of the grating has a second angle different than the first angle. Modifying process parameters, including selectivity and beam angle spread, has an effect of changing a shape or dimension of the plurality of angled components. 1. A method of forming an optical grating component , comprising:providing an optical grating layer atop a substrate;providing a patterned hardmask atop the optical grating layer; andetching the optical grating layer and the hardmask to form an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled components disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate, and wherein the etching results in a width of the patterned hardmask being reduced faster than a height to form first and second sidewalls of the optical grating having different angles.2. The method of claim 1 , wherein forming the optical grating comprises etching into the optical grating layer.3. The method of claim 1 , wherein the etching comprises an angled reactive ion etch.4. The method of claim 3 , wherein the angled reactive ion etch is performed by a ribbon reactive ion beam claim 3 , wherein the substrate is scanned along a scan direction with respect to the ribbon reactive ion beam using a processing recipe claim 3 , and wherein the ribbon reactive ion beam has a beam angle mean and a beam spread claim 3 , the beam spread being one of: ...

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Номер записи: 13
17-04-2014 дата публикации

STRUCTURE, STRUCTURE-FORMING METHOD, AND STRUCTURE-FORMING DEVICE

Номер: US20140104686A1
Автор: Washizaki Toshirou, Yuasa Yoshiyuki
Принадлежит: TOYO SEIKAN GROUP HOLDINGS, LTD.

A structure has a processed part formed by the occurrence of photodisintegration attributed to the application of pulsed laser light. A fine periodic composition in which a plurality of processed parts are arranged in the form of grid cross points is formed in one region of the structure. A large number of regions are arranged in the structure. Each of a plurality of ranges obtained by the division of a surface in which the regions are arranged is a region-forming range. One or more regions are arranged in one region-forming range, and the arrangement directions of the processed parts formed in each of the large number of regions vary according to the region-forming ranges. 1. A structure comprising:a fine periodic structure formed in one of a plurality of regions; anda plurality of processed parts arranged in the fine periodic structure in a form of grid cross points,wherein each of the processed parts is formed by occurrence of photodisintegration caused by application of pulsed laser lightwherein each of a plurality of ranges obtained by a division of a surface in which the regions are arranged is a region-forming range,wherein at least one of the regions is arranged in one of the region-forming ranges, andwherein arrangement directions of the processed parts formed in each of the regions vary according to the region-forming ranges.2. The structure according to claim 1 ,wherein a sub-plurality of the regions is arranged in one of the region-forming ranges, and the processed parts in a same arrangement direction are formed in each of the sub-plurality of regions, andwherein, when the sub-plurality of regions constitute a region group, an arrangement direction of the processed parts formed in each of the sub-plurality of regions constituting the region group is different from an arrangement direction of the processed parts formed in each of another sub-plurality of the regions constituting another region group.3. The structure according to claim 1 ,wherein a shape ...

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Номер записи: 14
22-01-2015 дата публикации

Method of Producing a Fresnel Zone Plate for Applications in High Energy Radiation

Номер: US20150022892A1
Автор: Grevent Corinne, Hirscher Michael, KESKINBORA Kahraman, Schuetz Gisela
Принадлежит: Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.

The invention concerns to a method of producing a Fresnel Zone Plate () for applications in high energy radiation including the following steps: supply of a substrate () transparent for high energy radiation, deposition of a layer () of a metal, a metal alloy or a metal compound on a planar surface () of the substrate (), calculating a three dimensional geometrical profile () with a mathematical model, setting up a dosage profile () for an ion beam of the ion beam lithography inverse to the calculated three dimensional geometrical profile () and milling a three dimensional geometrical profile () with concentric zones into the layer () with ion beam lithography by means of focused ion beam. 1. A method of producing a Fresnel zone plate for applications in high energy radiation comprising the steps:a) supplying of a substrate transparent for high energy radiation,b) depositing a layer of a metal, a metal alloy or a metal compound on a planar surface of the substrate,c) milling a three dimensional geometrical profile with concentric zones into the layer with ion beam lithography by means of a focused ion beam,characterized in thatthe three dimensional geometrical profile is calculated with a mathematical model anda dosage profile for an ion beam of the ion beam lithography is set up inverse to the calculated three dimensional geometrical profile.2. The method according to claim 1 , characterized in that the deposition of the layer on the substrate is performed until the layer has reached a thickness (T) between 50 nm and 4000 nm.4. The method according to claim 3 , characterized in that the constant B has a value between 45 and 55.6. The method according to claim 5 , characterized in that the dwell time t is at least 100 ns and of at most 5 ms.7. The method according to claim 5 , characterized in that the ion beam current is between 1 pA and 100 pA.8. The method according to claim 1 , characterized in that an ion beam energy between 5 kV and 100 kV is used.9. The ...

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Номер записи: 15
23-01-2020 дата публикации

Methods of Diffractive Lens and Mirror Fabrication

Номер: US20200025987A1
Автор: Kimball Brian, Roberts David E., Serak Svetlana, Steeves Diane, Tabirian Nelson V.
Принадлежит:

Methods of fabricating optical lenses and mirrors, systems and composite structures based on diffractive waveplates, and fields of application of said lenses and mirrors that include imaging systems, astronomy, displays, polarizers, optical communication and other areas of laser and photonics technology. Diffractive lenses and mirrors of shorter focal length and larger size, with more closely spaced grating lines, and with more exacting tolerances on the optical characteristics, can be fabricated than could be fabricated by previous methods. 1. A method for creating an alignment layer usable for fabricating a diffractive waveplate lens , the method comprising the steps of:generating a monochromatic, linearly-polarized incident beam of radiation;converting the linearly-polarized radiation to circular polarization with a first quarter wave plate;providing a refractive lens assembly containing a birefringent layer;producing a selected nonlinear dependence of optical retardation on radial distance from the center of said assembly, with the circularly polarized light from the first quarter-wave plate incident on said assembly;producing discontinuities of an integral number of waves in the optical path difference with said birefringent layer;converting beam output of the assembly from circular polarization to linear polarization with a second quarter wave plate; andproviding a thin film of material that is photoaligned by the linearly polarized output of the second quarter-wave plate.2. The method of claim 1 , in which the birefringent layer consists of a layer of liquid crystal between two solid substrates claim 1 , one of which is flat claim 1 , and the other of which has physical discontinuities that result in optical path difference discontinuities of an integer multiple of wavelengths; with a liquid crystal layer aligned in the same direction throughout said birefringent layer.3. The method of claim 1 , in which the birefringent layer consists of a thin solid ...

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Номер записи: 16
28-01-2021 дата публикации

DIFFRACTION DEVICE, SPECTROSCOPIC APPARATUS, AND MANUFACTURING METHOD OF DIFFRACTION DEVICE

Номер: US20210026052A1
Автор: Sukegawa Takashi
Принадлежит:

A diffraction device includes a ZnS member and a ZnSe member coupled to the ZnS member, and a diffraction grating is provided on the ZnSe member. 1. A diffraction device comprising a ZnS member and a ZnSe member coupled to the ZnS member , wherein a diffraction grating is provided on the ZnSe member.2. The device according to claim 1 , wherein the device is configured as an immersion diffraction device.3. The device according to claim 1 , wherein the diffraction grating is a blazed diffraction grating.4. The device according to claim 1 , wherein a maximum thickness of the ZnSe member is within a range of not less than 150 μm and not more than 1 claim 1 ,000 μm.5. The device according to claim 1 , wherein the ZnS member includes a first face and a second face claim 1 , the ZnSe member is coupled to the first face claim 1 , a second ZnSe member is coupled to the second face claim 1 , and a second diffraction grating is provided on the second ZnSe member.6. The device according to claim 5 , wherein a periodic direction of the diffraction grating and a periodic direction of the second diffraction grating are orthogonal to each other.7. The device according to claim 5 , wherein a grating interval of the diffraction grating is larger than a grating interval of the second diffraction grating.8. The device according to claim 1 , wherein the diffraction grating is configured to be capable of spectrally dispersing light in an infrared region.9. A spectroscopic apparatus comprising an optical system that includes a diffraction device claim 1 ,wherein the diffraction device comprises a ZnS member and a ZnSe member coupled to the ZnS member, a diffraction grating being provided on the ZnSe member.10. A manufacturing method of manufacturing a diffraction device claim 1 , comprising:forming a structure in which a ZnS member and a ZnSe member are coupled to each other; andprocessing to form a diffraction grating on the ZnSe member in the structure.11. The method according to claim ...

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Номер записи: 17
04-02-2016 дата публикации

MICROFABRICATION

Номер: US20160033697A1
Автор: Levola Tapani, Saarikko Pasi, Sainiemi Lauri
Принадлежит:

Microfabrication processes and apparatuses for fabricating microstructures on a substrate are disclosed. The substrate has a current diffraction grating pattern formed by current surface modulations over at least a portion of the substrate's surface that exhibit a substantially uniform grating linewidth over the surface portion. An immersion depth of the substrate in a fluid for patterning the substrate is gradually changed so that different points on the surface portion are immersed for different immersion times. The fluid changes the linewidth of the surface modulations at each immersed point on the surface portion by an amount determined by the immersion time of that point, thereby changing the current diffraction grating pattern to a new diffraction grating pattern formed by new surface modulations over the surface portion that exhibit a spatially varying grating linewidth that varies over the surface portion. 1. A microfabrication process for fabricating microstructures on a substrate , the substrate having a current diffraction grating pattern formed by current surface modulations over at least a portion of the substrate's surface that exhibit a substantially uniform grating linewidth over the surface portion , the process comprising:gradually changing an immersion depth of the substrate in a fluid, the fluid for patterning the substrate, so that different points on the surface portion are immersed in the fluid for different immersion times;wherein the fluid changes the linewidth of the surface modulations at each immersed point on the surface portion by an amount determined by the immersion time of that point, thereby changing the current diffraction grating pattern to a new diffraction grating pattern formed by new surface modulations over the surface portion that exhibit a spatially varying grating linewidth that varies over the surface portion.2. A microfabrication process according to wherein the current surface modulations are formed by modulations of ...

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Номер записи: 18
01-02-2018 дата публикации

THIN FILM TOTAL INTERNAL REFLECTION DIFFRACTION GRATING FOR SINGLE POLARIZATION OR DUAL POLARIZATION

Номер: US20180031744A1
Автор: "OLeary Michael", Miller John Michael, Tian Lu, WILLS Gonzalo
Принадлежит:

A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer. 1. A diffraction grating , comprising:a substrate; 'the etch stop layer being deposited on the substrate;', 'an etch stop layer to prevent etching of the substrate,'} 'the marker layer being deposited on a portion of the etch stop layer; and', 'a marker layer to indicate an etch end-point associated with etching of a dielectric layer,'} 'the dielectric layer being deposited on at least the marker layer.', 'the dielectric layer to form a grating layer after being etched,'}2. The diffraction grating of claim 1 , further comprising: 'the encapsulation layer being deposited on at least the grating layer.', 'an encapsulation layer to protect the grating layer after etching of the dielectric layer,'}3. The diffraction grating of claim 1 , where the marker layer is formed of tantala claim 1 , silica or silicon nitride.4. The diffraction grating of claim 1 , where a thickness of the marker layer is less than or equal to approximately 50 nanometers.5. The diffraction grating of claim 1 , where a first diffraction efficiency (DE) of the diffraction grating is greater than 96 percent and a second DE of the diffraction grating is less than approximately 2 percent claim 1 ,the first DE corresponding to a transverse-magnetic polarization, andthe second DE corresponding to a transverse-electric polarization.6. The diffraction grating of claim 1 , where a first diffraction efficiency (DE) of the diffraction grating and a second DE ...

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Номер записи: 19
17-02-2022 дата публикации

APPARATUS AND TECHNIQUES FOR ANGLED ETCHING USING MULTIELECTRODE EXTRACTION SOURCE

Номер: US20220051880A1
Автор: Evans Morgan, Kurunczi Peter F., Olson Joseph C.
Принадлежит: Applied Materials, Inc.

A plasma source may include a plasma chamber, where the plasma chamber has a first side, defining a first plane and an extraction assembly, disposed adjacent to the side of the plasma chamber, where the extraction assembly includes at least two electrodes. A first electrode may be disposed immediately adjacent the side of the plasma chamber, wherein a second electrode defines a vertical displacement from the first electrode along a first direction, perpendicular to the first plane, wherein the first electrode comprises a first aperture, and the second electrode comprises a second aperture. The first aperture may define a lateral displacement from the second aperture along a second direction, parallel to the first plane, wherein the vertical displacement and the lateral displacement define a non-zero angle of inclination with respect to a perpendicular to the first plane. 1. A method of patterning a substrate , comprising:providing the substrate, wherein a main surface of the substrate defines a substrate plane, wherein the substrate comprises a grating layer and a base layer, subjacent the grating layer;generating a plasma in a plasma chamber, adjacent to the substrate; andapplying an extraction voltage to an extraction assembly, adjacent the plasma chamber, the extraction assembly comprising at least two electrodes, wherein a first electrode is disposed immediately adjacent a side of the plasma chamber, the side of the plasma chamber defining a first plane, wherein a second electrode defines a vertical displacement from the first electrode along a first direction, perpendicular to the first plane, wherein the at least two electrodes define an angled extraction tunnel, disposed at a non-zero angle of inclination with respect to a perpendicular to the substrate plane,wherein an angled ion beam is extracted from the extraction assembly, the angled ion beam defining a non-zero angle of incidence with respect to the substrate plane,wherein the angled ion beam etches the ...

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Номер записи: 20
30-01-2020 дата публикации

Adaptive harmonic diffractive liquid crystal lens and method of making and use thereof

Номер: US20200033666A1
Автор: Li Guoqiang
Принадлежит:

Disclosed herein, in accordance with some aspects of the present disclosure, are adaptive harmonic diffractive liquid crystal lenses and methods of making and use thereof. 21. A system for correction of vision of a subject , comprising:a lens having a nonlinear phase profile which is achieved by sectors of linearly modulated phase profile and a plurality of zones, wherein each of the zones comprises contact ring electrodes and control electrodes or resistors, and wherein the lens is configured as a diffractive liquid crystal lens or harmonic diffractive liquid crystal lens.221. The system of claim , wherein the lens comprises inner zones with a plurality of linear sectors and outer zones with a plurality of the same number of linear sectors or fewer linear sectors.23. The system of any one of claim 21 , wherein two contact ring electrodes are located at the boundary of each zone.24. The system of any one of claim 21 , wherein each contact ring electrode is located proximate the boundaries of neighboring subzones of respective zones.25. The system of any one of claim 21 , wherein the contact ring electrodes are configured to have low resistance.26. The system of any one of claim 21 , wherein the contact ring electrodes are covered by a high-resistance material to create a sheet resistance and generate linear voltage drops.27. The system of any one of claim 21 , wherein the control electrodes are configured to have a high-resistance.28. The system of any one of claim 21 , wherein the contact ring electrodes are covered by a high-resistance Indium Tin Oxide (ITO) claim 21 , ZnO claim 21 , TiO claim 21 , etc. claim 21 , or other transparent thin film claim 21 , including polymers.29. The system of any one of claim 21 , wherein the total phase change in each zone is a multiple of a radians.30. The system of any one of claim 21 , wherein a plurality of voltages are applied to the contact ring electrodes to tune the optical power of the lens.31. The system of claim 21 , ...

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Номер записи: 21
19-02-2015 дата публикации

Method for Manufacturing Holographic Bi-Blazed Grating

Номер: US20150048047A1
Автор: Chen Minghui, Liu Quan, Wu Jianhong
Принадлежит:

A method for manufacturing a holographic bi-blazed grating. Two blaze angles of the holographic bi-blazed grating are respectively a blaze angle A and a blaze angle B, and oblique-ion beam etching is performed on two grating areas A and B respectively by using a photoresist grating () and a homogeneous grating () as masks, thereby implementing different controls on the two blaze angles, and avoiding a secondary photoresist lithography process. Because when manufacturing the homogeneous grating (), the time of positive ion beam etching can be controlled, so that the groove depth of the homogeneous grating () is controlled accurately. In addition, because the homogeneous grating mask and a substrate () are made of the same material, etching rates of the two are consistent, so that the accurate control of blaze angles can be implemented. 1. A method for fabricating a holographic bi-blazed grating , wherein: two blaze angles of the holographic bi-blazed grating are respectively a blaze angle A and a blaze B , and the bi-blazed grating is divided into two regions with a grating region A corresponding to the blaze angle A and a grating region B corresponding to the blaze angle B; the fabricating method comprises the following steps:1) coating a photoresist layer on a substrate, wherein a thickness of the photoresist layer depends on the blaze angle A;2) performing lithography on the photoresist layer to form a photoresist grating for fabricating the blaze angle A;3) shielding the grating region B, performing tilted-Ar ion beam etching on the substrate by using the photoresist grating as a mask to etch different portions of the substrate in the grating region A with an obscuring effect of the photoresist grating mask on the ion beam, to form a blazed grating with the blaze angle A;4) shielding the grating region A, and performing vertical ion beam etching on the substrate in the grating region B by using the photoresist grating as a mask, to form a homogeneous grating in ...

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Номер записи: 22
18-02-2016 дата публикации

MANUFACTURING METHOD OF GRATING

Номер: US20160047957A1
Автор: CHEN MO, LI QUN-QING, ZHANG LI-HUI, ZHU ZHEN-DONG
Принадлежит:

A method for making a grating includes the following steps. A first photoresist film is formed on a substrate. A second photoresist film is applied on the first photoresist film. A number of first cavities are formed in the second photoresist film, wherein part of the first photoresist film is exposed to form a first exposed part. A number of second cavities are formed, wherein part of the surface of the substrate is exposed to form an exposed surface. A mask layer is deposited on the second photoresist film and the exposed surface of the substrate. A patterned mask layer is formed, and part of the substrate is exposed to form a second exposed part. The second exposed part of the substrate is etched through the patterned mask layer. The patterned mask layer is removed. 1. A manufacturing method of a grating , the method comprising:forming a first photoresist film on a surface of a substrate;applying a second photoresist film on a surface of the first photoresist film away from the substrate;forming a plurality of first cavities in the second photoresist film by nanoimprinting the second photoresist film, wherein part of the first photoresist film is exposed through the plurality of first cavities to form a first exposed part;forming a plurality of second cavities by etching the first exposed part of the first photoresist film, wherein part of the surface of the substrate is exposed through the plurality of second cavities to form an exposed surface;depositing a mask layer on the second photoresist film and the exposed surface of the substrate;forming a patterned mask layer by removing the first photoresist film, the second photoresist film, and a portion of the mask layer deposited on the second photoresist film, wherein the patterned mask layer defines a plurality of third cavities, and part of the substrate is exposed through the plurality of third cavities to form a second exposed part;etching the second exposed part of the substrate through the patterned mask ...

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Номер записи: 23
25-02-2016 дата публикации

OPTICAL FILM, OPTICAL FILM MANUFACTURING METHOD AND SURFACE LIGHT-EMITTING BODY

Номер: US20160054489A1
Автор: HANAFUSA Akihiro, KOSHITOUGE Haruki, Kurita Yusuke
Принадлежит: MITSUBISHI RAYON CO., LTD.

This optical film includes a diffraction grating layer made of a transparent material, and a concavo convex surface structure layer made of a transparent material. The surface light-emitting body includes the aforementioned optical film. This optical film manufacturing method involves supplying a second active energy ray curable composition between a substrate and a mold having a diffractive grating transfer part, irradiating second active energy rays to obtain a laminate having a diffractive grating layer on convex structure transfer part, and irradiating first active energy rays. 1. An optical film comprising:a surface relief structure layer that is composed of a first transparent material and has a relief structure; anda diffraction grating layer composed of a second transparent material.2. The optical film according to claim 1 , wherein the second transparent material is a resin.3. The optical film according to claim 1 , wherein a refractive index of the second transparent material is from 1.30 to 1.80.4. The optical film according to claim 1 , wherein a pitch of a diffraction grating of the diffraction grating layer is from 0.2 to 5 μm.5. The optical film according to claim 1 , wherein a height of a diffraction grating of the diffraction grating layer is from 0.4 to 5 μm.6. The optical film according to claim 1 , wherein the first transparent material is a resin.7. The optical film according to claim 1 , wherein the relief structure of the surface relief structure layer is spherical.8. The optical film according to claim 1 , wherein the surface relief structure layer further contains light-diffusing fine particles.9. The optical film according to claim 8 , wherein a volume average particle size of the light-diffusing fine particles is from 1 to 10 μm.10. The optical film according to claim 8 , wherein a content of the light-diffusing fine particles in the surface relief structure layer is from 1 to 50% by mass.11. The optical film according to claim 1 , wherein ...

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Номер записи: 24
13-02-2020 дата публикации

DIFFRACTIVE OPTICAL ELEMENT, OPTICAL APPARATUS USING THE SAME, AND METHOD FOR MANUFACTURING DIFFRACTIVE OPTICAL ELEMENT

Номер: US20200049870A1
Автор: Kubo Kazuto
Принадлежит:

A diffractive optical element includes a substrate, a first resin layer formed on the substrate and having a diffraction grating shape including a plurality of wall surfaces and a plurality of slopes, a second resin layer formed in close contact with the first resin layer, a high refractive-index portion formed on the plurality of wall surfaces of the first resin layer and having a higher refractive index than the first and the second resin layers, and a close contact portion discontinuous with the high refractive-index portion, wherein the close contact portion is formed on the plurality of slopes of the first resin layer, and wherein a thickness of the close contact portion is smaller than a height of the plurality of wall surfaces. 1. A diffractive optical element comprising:a substrate;a first resin layer formed on the substrate and having a diffraction grating shape including a plurality of wall surfaces and a plurality of slopes;a second resin layer formed in close contact with the first resin layer;a high refractive-index portion formed on the plurality of wall surfaces of the first resin layer and having a higher refractive index than the first and the second resin layers; anda close contact portion discontinuous with the high refractive-index portion,wherein the close contact portion is formed on the plurality of slopes of the first resin layer, andwherein a thickness of the close contact portion is smaller than a height of the plurality of wall surfaces.2. The diffractive optical element according to claim 1 , wherein the thickness of the close contact portion is 1/400 or more and 1/50 or less times the height of the plurality of wall surfaces.3. The diffractive optical element according to claim 1 , wherein the thickness of the close contact portion is 10 nm or more and 200 nm or less.4. The diffractive optical element according to claim 1 , further comprising a center and an outer edge claim 1 , wherein the thickness of the close contact portion ...

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Номер записи: 25
21-02-2019 дата публикации

MULTI-LEVEL DIFFRACTIVE OPTICAL ELEMENT THIN FILM COATING

Номер: US20190056542A1
Автор: Miller John Michael, WILLS Gonzalo
Принадлежит:

A transmissive optical element may include a substrate. The transmissive optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The transmissive optical element may include a second anti-reflectance structure for the particular wavelength range formed on the first anti-reflectance structure. The transmissive optical element may include a third anti-reflectance structure for the particular wavelength range formed on the second anti-reflectance structure. The transmissive optical element may include at least one layer disposed between the first anti-reflectance structure and the second anti-reflectance structure or between the second anti-reflectance structure and the third anti-reflectance structure. 1. A transmissive optical element , comprising:a substrate;a first anti-reflectance structure for a particular wavelength range formed on the substrate;a second anti-reflectance structure for the particular wavelength range formed on the first anti-reflectance structure;a third anti-reflectance structure for the particular wavelength range formed on the second anti-reflectance structure; and 'wherein a first relief depth between a first surface of the first anti-reflectance structure and a second surface of the second anti-reflectance structure and a second relief depth between the first surface and a third surface of the third anti-reflectance structure are configured to form a diffractive optical element associated with a first phase delay and a second phase delay, respectively, for the particular wavelength range.', 'at least one layer disposed between the first anti-reflectance structure and the second anti-reflectance structure or between the second anti-reflectance structure and the third anti-reflectance structure,'}2. The transmissive optical element of claim 1 , wherein the first phase delay is a π/2 phase delay and the second phase delay is a π phase delay.3. The transmissive optical element of ...

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Номер записи: 26
20-02-2020 дата публикации

LOW-CONTRAST METASURFACES

Номер: US20200057182A1
Автор: COLBURN Shane, Majumdar Arka, ZHAN Alan
Принадлежит: UNIVERSITY OF WASHINGTON

Disclosed herein are metasurfaces formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active at one or more wavelengths and in certain embodiments are configured to form lenses having unexpectedly strong focusing power. In particular, the metasurfaces are formed from “low-contrast” materials, including CMOS-compatible materials such as silicon dioxide or silicon nitride. Accordingly, the disclosed metasurfaces are generally CMOS compatible and therefore embody a new paradigm in metasurface design and manufacturing. 1a plurality of cylindrical posts formed from a first material and arranged on a substrate in a square pattern, wherein the plurality of cylindrical post are formed from a material having a first refractive index of 2.1 or less;interstices between individual posts of the plurality of cylindrical post comprising an interstitial substance with a second refractive index that is 0.6 to 1.1 less than the first refractive index;wherein the individual posts of the plurality of cylindrical posts have a diameter in a range of ⅛ of the first wavelength to ⅔ of the first wavelength;wherein the plurality of cylindrical posts have a periodicity in a range of 0.4 times the first wavelength to 1.0 times the first wavelength; andwherein the plurality of cylindrical posts have a thickness in a range of 0.5 times the first wavelength to 1.0 times the first wavelength.. A low-contrast metasurface having optical activity at a first wavelength, comprising: This application is a continuation of U.S. patent application Ser. No. 15/758,686, filed Mar. 8, 2018, which is a National Stage of International Application No. PCT/US2016/050793, filed Sep. 8, 2016, which claims the benefit of U.S. Patent Application No. 62/215,518, filed Sep. 8, 2015, and of U.S. Patent Application No. 62/342,121, filed May 26, 2016, the disclosures of which are hereby incorporated by reference in their entirety.Conventional transmissive macroscopic optical ...

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Номер записи: 27
27-02-2020 дата публикации

FACETED GEMSTONE WITH ENHANCED COLOR DISPERSION AND DIMINISHED HAZE

Номер: US20200060394A1
Автор: Benderly David
Принадлежит:

Incident light enters a faceted gemstone and is routed along optical paths to exit the gemstone as emergent light. At least one diffraction grating is patterned on the gemstone in an asymmetrical manner relative to an axis of symmetry. The diffraction grating has a diffractive structure positioned on at least one facet for diffracting the light being routed along at least one of the optical paths to enhance color dispersion of the emergent light. The diffraction grating is the only diffraction grating to diffract the light being routed along the at least one optical path to diminish haze of the emergent light. 1. A gemstone constituted of a light-transmissive material having a refractive index greater than air , an axis of symmetry , and a plurality of cut facets on which incident light entering the material is routed along optical paths through the material to exit the material as emergent light , the gemstone comprising:at least one diffraction grating patterned on the material in an asymmetrical manner relative to the axis of symmetry, the at least one diffraction grating having a diffractive structure positioned on at least one of the facets for diffracting the light being routed along at least one of the optical paths to enhance color dispersion of the emergent light, and the at least one diffraction grating being the only diffraction grating to diffract the light being routed along the at least one optical path to diminish haze of the emergent light.2. The gemstone of claim 1 , wherein the material has an upper faceted portion and a lower faceted portion; and wherein the cut facets are symmetrically arranged about the axis of symmetry on the lower faceted portion claim 1 , and wherein the cut facets are inclined relative to the axis to reflect the light incident thereon by total internal reflection.3. The gemstone of claim 1 , wherein the at least one diffraction grating has periodic diffractive features.4. The gemstone of claim 1 , wherein there is a ...

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Номер записи: 28
29-05-2014 дата публикации

GRATING STRUCTURE FOR DIVIDING LIGHT

Номер: US20140144506A1
Автор: ENGHETA NADER, IIZUKA Hideo, TAKEDA Yasuhiko
Принадлежит:

A grating structure and a solar cell assembly. In one aspect, the grating structure suppresses the zero order transmission to near 0%. In another aspect, the solar cell assembly has improved absorption due to coupling with a grating structure. 118-. (canceled)19. A solar cell assembly comprisingan absorption layer for absorbing light and converting the light into electrical energy;a first grating layer disposed on a first side of the absorption layer; anda second grating layer disposed on a second side of the absorption layer, the second side being opposite the first side.20. The solar cell assembly according to claim 19 , wherein the first grating layer claim 19 , the second grating layer claim 19 , and the absorption layer form a sandwich structure claim 19 , the absorption layer being located between the first layer and the second layer.21. The solar cell assembly according to claim 19 , wherein the first grating layer and the second grating layer comprise lossless dielectrics.22. The solar cell assembly according to claim 19 , wherein the first grating layer is formed by alternating portions of a first lossless dielectric and a second lossless dielectric.23. The solar cell assembly according to claim 22 , wherein the first lossless dielectric has a different permittivity than the second lossless dielectric.24. The solar cell assembly according to claim 23 , wherein the first lossless dielectric has a permittivity of about 2.25 and the second lossless dielectric has a permittivity of about 6.25.25. A method of splitting a light beam comprising:providing a grating with rectangular grooves and ridges;providing an light beam substantially normal to the grating;splitting the unpolarized light beam such that the zero order transmission is suppress to near 0%.26. The method according to claim 25 , wherein the angle of the first order transmission is at least 40 degrees.27. The method according to claim 25 , wherein the angle of the first order transmission is about 50 ...

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Номер записи: 29
08-03-2018 дата публикации

AUTOMATED SYSTEM FOR TRANS-JACKET FIBRE BRAGG GRATING INSCRIPTION AND MANUFACTURING

Номер: US20180067254A1
Автор: COULAS David, Ding Huimin, GROBNIC Dan, HNATOVSKY Cyril, LAUSTEN Rune, LU Ping, MIHAILOV Stephen, Walker Robert
Принадлежит:

There is provided an alignment system and method for use in an ultrashort pulse duration laser-based Fiber Bragg Grating (FBG) writing system, the alignment system comprising: clamps configured to hold a coated optical fiber in a position perpendicular to a beam path of an ultrashort pulse duration laser-based FBG writing station; an optical detector; and a control system with an input from the optical detector and an output to adjust parameters of an optical source and the FBG writing station adjust a distance between the optical fiber and an optical source of the writing station based on luminescence generated in a core of the optical fiber as indicated in a signal received at the input from the optical detector. 1. An alignment system for use in an ultrashort pulse duration laser-based Fiber Bragg Grating (FBG) writing system , the electromagnetic radiation having a pulse duration of less than or equal to 5 picoseconds , and the wavelength of the electromagnetic radiation having a characteristic wavelength in the wavelength range from 150 nm to 3.0 microns , the alignment system comprising:a holder configured to hold an optical fiber in a position perpendicular to a beam path of an ultrashort pulse duration laser-based FBG writing station;an optical detector; anda control system with an input from the optical detector and an output to adjust parameters of an optical writing source and the FBG writing station based on photoluminescence generated in the optical fiber as indicated in a signal received at the input from the optical detector.2. The alignment system of claim 1 , wherein the optical fiber is coated.3. The alignment system of claim 1 , wherein an external light source is coupled into the core of the optical fiber.4. The alignment system of claim 3 , wherein the optical detector is positioned to visualize/image ultrashort pulse duration laser induced modification in the optical fiber based on collecting a scattered component of external light source that ...

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Номер записи: 30
15-03-2018 дата публикации

Diffractive optical element and method of manufacturing the same

Номер: US20180074239A1
Автор: Maiko Niwa
Принадлежит: Canon Inc

A diffractive optical element prevents degradation of the optical performance of the element due to moisture absorption of the resin layers from taking place and also can prevent cracks of the resin layers and peeling of the resin layers along the interface thereof from taking place in a hot environment or in a cold environment. The diffractive optical element comprises a first layer and a second layer sequentially laid on a substrate, a diffraction grating being formed at the interface of the first layer and the second layer, the height d of the diffraction grating, the average film thickness t1 of the first layer and the average film thickness t2 of the second layer satisfying the relationship requirements expressed by the expressions of 1.1×d≦t 1 ≦50 μm and 30 μm≦t 2 ≦(400 μm−t 1 −d).

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Номер записи: 31
24-03-2022 дата публикации

Fabrication of diffractive optic element having a variable refractive index profile by inkjet printing deposition

Номер: US20220091314A1
Автор: Daihua Zhang, Kang LUO, Ludovic Godet, Xiaopei Deng
Принадлежит: Applied Materials Inc

Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to optical devices and methods of manufacturing optical devices having optical device structures with at least one of varying depths or refractive indices across the surface of a substrate. According to certain embodiments, an inkjet process is used to deposit a volumetrically variable optical device that is etched to form a diffractive optic element (DOE). Volumetrically variable can relate to the thickness of the optical device, or the relative volume of two or more diffractive materials deposited in combination. According to other embodiments, a single-profile DOE is deposited on a substrate and an inkjet process deposits a volumetrically variable organic material over the DOE. The DOE and organic material are etched to modify the profile of the structure, after which the organic material is removed, leaving the modified-profile DOE.

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Номер записи: 32
26-03-2015 дата публикации

HOWLLOW-STRUCTURE METAL GRATING

Номер: US20150085364A1
Автор: BAI BEN-FENG, FAN SHOU-SHAN, LI QUN-QING, ZHU ZHEN-DONG
Принадлежит:

A hollow-structure metal grating is provided. The hollow-structure metal grating includes a substrate, a number of connecting metal layers, and a number of hollow metal protrusions spaced and located on a surface of the substrate. A space is defined between each of the number of hollow metal protrusions and the substrate. 1. A hollow-structure metal grating comprising:a substrate;a plurality of connecting metal layers and a plurality of hollow metal protrusions spaced and located on a surface of the substrate, wherein a space is defined between each of the plurality of hollow metal protrusions and the substrate.2. The metal grating of claim 1 , wherein each two adjacent hollow metal protrusions are connected to each other by one connecting metal layer.3. The metal grating of claim 2 , wherein the plurality of hollow metal protrusions and the plurality of connecting metal layers are integrated to form a single solid structure.4. The metal grating of claim 3 , wherein a width between the adjacent hollow metal protrusions is in a range from about 80 nanometers to about 500 nanometers.5. The metal grating of claim 4 , wherein a width of the plurality of hollow metal protrusions is in a range from about 70 nanometers to about 400 nanometers.6. The metal grating of claim 4 , wherein a thickness of the plurality of metal connecting layers is in a range from 20 nanometers to about 200 nanometers.7. The metal grating of claim 1 , wherein the plurality of connecting metal layers and the plurality of hollow metal protrusions are made of gold claim 1 , silver claim 1 , copper claim 1 , or aluminum.8. The metal grating of claim 1 , wherein each of the hollow metal protrusions has opposite sidewalls substantially perpendicular to the surface of the substrate.9. The metal grating of claim 1 , wherein the plurality of hollow metal protrusions and the connecting metal layers are strip shaped structures claim 1 , and are arranged at regular intervals.10. The metal grating of claim 1 ...

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Номер записи: 33
12-06-2014 дата публикации

DIFFRACTIVE OPTICAL ELEMENT AND MANUFACTURING METHOD FOR THE SAME

Номер: US20140160567A1
Автор: Iwata Kenichi
Принадлежит: CANON KABUSHIKI KAISHA

An Al film is formed so that film forming particles are incident at normal incidence to grating wall surfaces of a diffraction grating having multiple grating portions and are incident at oblique incidence to optical effective surfaces. After that, oxidation treatment is performed from a direction to be incident at normal incidence to the optical effective surface so that the Al layer on the optical effective surface is changed to AlOlayer. Hence, in the diffraction grating having the multiple grating portions, the AlOlayer is formed on the optical effective surface for transmitting light, and the Al layer is formed on the grating wall surfaces as a light shielding layer. Thus, flare of the diffractive optical element can be suppressed. 13-. (canceled)4. A diffractive optical element comprising:multiple grating portions including grating optical effective surface and grating wall surfaces continuously formed on a surface thereof,{'sub': 2', '3, 'wherein the grating optical effective surfaces of the multiple grating portions include an AlOlayer formed thereon, and'}wherein the grating wall surfaces of the multiple grating portions include an Al layer formed thereon.5. The diffractive optical element according to claim 4 , wherein the Al layer has a film density higher than that of the AlOlayer claim 4 , and the Al layer has a film thickness thicker than that of the AlOlayer.6. The diffractive optical element according to claim 4 , wherein the Al layer has a film density of 2.0 g/cmor more and 2.7 g/cmor less and a film thickness of 50 nm or more and 1 μm or less claim 4 , and the AlOlayer has a film density of 0.4 g/cmor more and 1.0 g/cmor less and a film thickness of 5 nm or more and 30 nm or less.7. A diffractive optical lens comprising:multiple grating portions including grating optical effective surface and grating wall surfaces continuously formed on a surface thereof,{'sub': 2', '3, 'wherein the grating optical effective surfaces of the multiple grating ...

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Номер записи: 34
24-03-2016 дата публикации

POSITIVE MICROCONTACT PRINTING

Номер: US20160085000A1
Автор: Chen Shih-Chi, Xu Huihua, ZHAO NI, Zhou Xi
Принадлежит:

A process for positive microcontact printing, including inking a patterned mold with a thiol; contacting the mold with a metal surface of a substrate; backfilling the metal surface with a solution containing an aromatic amine to form a backfilling layer; etching the metal surface of the substrate; and rinsing the substrate to remove the backfilling layer. 1. A process for positive microcontact printing , comprising:inking a patterned mold with a thiol;contacting the mold with a metal surface of a substrate;backfilling the metal surface with a solution containing an aromatic amine to form a backfilling layer;etching the metal surface of the substrate; andrinsing the substrate to remove the backfilling layer.2. The process of claim 1 , wherein the aromatic amine is represented by formula (I){'br': None, 'sub': 'n', 'sup': 'm+', '[Ar—(NRR′)]\u2003\u2003(I)'}wherein Ar represents an aryl group having 6 to 18 carbon atoms or a heteroaromatic group having 4 to 17 carbon atoms; each of R and R′ independently represents a hydrogen atom, a methyl group, or a ethyl group; n is 1, 2, or 3; and m is 0, 1, 2, or 3.3. The process of claim 2 , wherein n is 2.4. The process of claim 2 , wherein the aromatic amine is selected from the group consisting of 2 claim 2 ,4 claim 2 ,6-trimethyl-benzene-1 claim 2 ,3 claim 2 ,5-triamine claim 2 , tri-hydrochloride; 3 claim 2 ,6-diaminoacridine hydrochloride claim 2 , 3 claim 2 ,7-bis(Dimethylamino)phenazathionium chloride claim 2 , 9-aminoacridine dydrochloride and 2-(4-dimethylaminophenylazo)benzoic acid.5. The process of claim 1 , wherein the surface is backfilled with a solution containing an aromatic amine to form a backfilling layer through dewetting.6. The process of claim 1 , wherein the aromatic amine is dissolved in a mixture of at least one monohydroxyl alcohol and one or more glycol ethers to obtain the solution containing the aromatic amine.7. The process of claim 5 , wherein the monohydroxyl alcohol is selected from the group ...

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Номер записи: 35
25-03-2021 дата публикации

Method of Manufacturing a Multilayer Optical Element

Номер: US20210088704A1
Автор: HALBRITTER Hubert, Rossbach Georg
Принадлежит:

A method for manufacturing a multilayer optical element is disclosed. In an embodiment the method includes providing a substrate, applying a first optical layer by applying a first layer having a dielectric first material having a first refractive index, structuring the first layer by sectionally removing the first material and filling first interspaces with a dielectric second material having a second refractive index different from the first refractive index so that the second material has at least the same height as the first material, and applying at least a second optical layer by applying a second layer having the first material, structuring the second layer by sectionally removing the first material so that the first optical layer is exposed in second interspaces between second areas with the first material and filling the second interspaces with the second material so that the second material has at least the same height as the first material. 119-. (canceled)20. A method for manufacturing a multilayer optical element , the method comprising:providing a substrate; applying a first layer comprising a dielectric first material having a first refractive index;', 'structuring the first layer by sectionally removing the first material; and', 'filling first interspaces with a dielectric second material having a second refractive index different from the first refractive index so that the second material has at least the same height as the first material; and, 'applying a first optical layer by applying a second layer comprising the first material;', 'structuring the second layer by sectionally removing the first material so that the first optical layer is exposed in second interspaces between second areas with the first material; and', 'filling the second interspaces with the second material so that the second material has at least the same height as the first material., 'applying at least a second optical layer by21. The method according claim 20 , wherein the ...

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Номер записи: 36
12-03-2020 дата публикации

IMAGING APPARATUS, IMAGE PROCESSING APPARATUS, IMAGING SYSTEM, IMAGE PROCESSING METHOD, AND RECORDING MEDIUM

Номер: US20200084376A1
Автор: KISHINE YASUNOBU, NARUSE Yosuke
Принадлежит: FUJIFILM Corporation

Provided an imaging system, an imaging apparatus and an image processing apparatus constituting the imaging system, an image processing method used in the image processing apparatus, and a non-transitory recording medium for causing a computer to implement the image processing method. According to the imaging apparatus according to one aspect of the present invention, an image of high image quality can be acquired (reconstructed) in the imaging system configured to include the imaging apparatus by acquiring first and second projected images using Fresnel zone plates having different phases of local spatial frequencies. In addition, the design parameters (pitches and the areas of the Fresnel zone plates, the number of pixels of image sensors, a distance between the Fresnel zone plates and the image sensors, and the like) can be selected without considering an effect of a noise component, and the number of restrictions on the design parameters is small. 1. An imaging apparatus used in an imaging system that reconstructs an image of a spatial domain by performing two-dimensional complex Fourier transformation on a complex image consisting of an image of a real part and an image of an imaginary part , the imaging apparatus comprising:a first imaging unit that includes a first Fresnel zone plate on which light from a subject is incident, and a first image sensor on which a first projected image transmitted through the first Fresnel zone plate is incident, and that acquires the first projected image from the first image sensor; anda second imaging unit that includes a second Fresnel zone plate on which the light from the subject is incident and which has a different phase of a local spatial frequency in each region from the first Fresnel zone plate, and a second image sensor on which a second projected image transmitted through the second Fresnel zone plate is incident, and that acquires the second projected image from the second image sensor,wherein the first projected ...

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Номер записи: 37
05-04-2018 дата публикации

Trifocal Intraocular Lens with Extended Range of Vision and Correction of Longitudinal Chromatic Aberration

Номер: US20180092739A1
Автор: Gatinel Damien, Loicq Jerome Jean D., PAGNOULLE Christophe Robert Marie Armand, Redzovic Suad, Voisin Laure
Принадлежит:

Disclosed is an intraocular lens (IOL) including an anterior surface, a posterior surface and an optical axis. At least one of the anterior or posterior surfaces has a diffractive profile formed thereon. The diffractive profile has diffractive focal points for far vision, intermediate vision, and near vision. The diffractive profile corresponds to a superposition of a first partial diffractive profile and a second partial diffractive profile, the first partial diffractive profile has a focal point of order +n that coincides with the diffractive focal point for intermediate vision or with the diffractive focal point for near vision, the second partial diffractive profile has a focal point of order +n that coincides with the diffractive focal point for far vision and a focal point of higher order than +n that coincides with the diffractive focal point for near vision. 2. The intraocular lens of claim 1 , wherein n=1 claim 1 , and wherein the second partial diffractive profile has:a focal point of order +2 that coincides with the diffractive focal point for intermediate vision; anda focal point of order +3 that coincides with the diffractive focal point for near vision.3. The intraocular lens of claim 1 , wherein the step heights of the first and second partial diffractive profiles fulfill the following condition in at least the portion of the diffractive profile: a>a.4. The intraocular lens of claim 1 , wherein n=1 claim 1 , and wherein the step heights of the first and second partial diffractive profiles fulfill the following conditions in at least the portion of the diffractive profile: 0.5 Подробнее

Номер записи: 38
26-06-2014 дата публикации

METHOD FOR MAKING GRATING

Номер: US20140175045A1
Автор: CHEN MO, FAN SHOU-SHAN, LI QUN-QING, ZHANG LI-HUI, ZHU ZHEN-DONG
Принадлежит:

A method for making grating is provided. The method includes following steps. A substrate is provided. A mask layer is located on the substrate. The mask layer is patterned, and a number of bar-shaped protruding structures are formed on a surface of the mask layer, a slot is defined between each of two adjacent protruding structures of the number of protruding structures to expose a portion of the substrate. The protruding structures are etched so that each of two adjacent protruding structures begin to slant face to face until they are contacting each other. The exposed portion of the substrate is etched through the slot. The mask layer is removed. 1. A method for making a grating , comprising:applying a mask layer on a surface of a substrate;forming a plurality of bar-shaped protruding structures to expose a portion of the substrate by patterning the mask layer, wherein the plurality of bar-shaped protruding structures extend along a direction substantially parallel with the surface of the substrate;etching the plurality of protruding structures so that each of two adjacent protruding structures begin to slant face to face until they contact each other;patterning exposed portion of the substrate to form a plurality of three-dimensional nano-structure preforms, wherein a cross section of each of the plurality of three-dimensional nano-structure preforms is triangular; andremoving the mask layer.2. The method of claim 1 , wherein the each of two adjacent protruding structures gradually slant and tops of the each of two adjacent protruding structures gradually approach each other to form a protruding pair.3. The method of claim 2 , wherein the plurality of protruding structures is etched by an inert gas selected from the group consisting of argon claim 2 , helium claim 2 , and nitrogen.4. The method of claim 2 , wherein a portion of the top of each protruding structure is etched off claim 2 , and a cross section of each protruding pair is triangular.5. The method of ...

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Номер записи: 39
01-04-2021 дата публикации

PICOMETER OPTICAL COMB, AND DEVICE AND METHOD FOR GENERATING THE SAME

Номер: US20210096287A1
Автор: ZHOU Changhe
Принадлежит:

A picometer optical comb and a device and a method for generating the same, wherein the picometer optical comb is a special grating with continuously variable groove widths of adjacent grating lines, wherein the width of each grating groove is different from that of the adjacent grating groove by a fixed difference, such as Δd, which ranges from the magnitude of picometer to nanometer. The picometer optical comb provided by the present invention provides a reference for picometer measurement. The picometer optical comb can generate a diffraction optical field distribution different from that of a traditional grating, which brings a new diffraction effect, achieves new diffraction optical functions, and provides tools such as picometer photolithography, picometer measurement, picometer imaging and the like. The picometer optical comb plays an important role in the fields of semiconductor photolithography, life science, interaction of light and substances in picometer scale. 1. A picometer optical comb , wherein the picometer optical comb has a period d and width of adjacent grating lines difference Δd , and values of Δd in the widths of adjacent grating lines range from a picometer to a nanometer magnitude.2. A device for generating the picometer optical comb of claim 1 , comprisingan interference optical field generating module,an interference optical field modulating module, anda grating pitch measuring module,wherein the interference optical field modulating module is a tunable part of the interference optical field generating module, andthe grating pitch measuring module comprises an interference coherent measuring apparatus, a laser interferometer, and a computer.3. The device of claim 2 , wherein the interference optical field generating module is a laser holographic exposure device claim 2 , and the interference optical field modulating module is a tunable part of the laser holographic exposure device.4. The device of claim 2 , wherein the interference optical ...

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Номер записи: 40
26-06-2014 дата публикации

SUB-WAVELENGTH EXTREME ULTRAVIOLET METAL TRANSMISSION GRATING AND MANUFACTURING METHOD THEREOF

Номер: US20140177039A1
Автор: Li Dongmei, Li Hailiang, Liu Ming, Shi Lina, Xie Changqing, Zhu Xiaoli
Принадлежит: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES

A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition. Lastly, removing the gold material on the chrome material outside the ring pattern as well as on and between the grating line patterns, thereby only retaining the gold material on sidewalls of the grating line patterns. 1. A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating , comprising:forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished;spin-coating a silicon nitride film on a front surface of the silicon-based substrate with an electron beam resist (HSQ);performing electron beam direct writing exposure on the HSQ, and then performing developing and fixing to form a plurality of grating line patterns having a duty cycle of 1:3 and a ring pattern surrounding the grating line patterns;depositing a chrome material on the front surface of the silicon-based substrate through magnetron sputtering as a light-blocking layer for the grating line patterns and the ring pattern;removing the chrome material inside the ring pattern so that only the chrome material outside the ring pattern is retained as a absorber of scattering light;growing ...

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Номер записи: 41
12-04-2018 дата публикации

OPTISCH WIRKSAMES ELEMENT, VERFAHREN ZUR HERSTELLUNG EINES OPTISCH WIRKSAMEN ELEMENTS UND OPTOELEKTRONISCHES BAUELEMENT

Номер: US20180101016A1
Автор: Arzberger Markus, Boehm Bernd, Enzmann Roland, HALBRITTER Hubert, Ploessl Andreas, Rossbach Georg, Sabathil Matthias, SCHULZ ROLAND, Singer Frank
Принадлежит:

An optically effective element includes a carrier, a first optically effective structure arranged on a top side of the carrier, and a cover arranged above the first optically effective structure. A method of producing an optically effective element includes providing a carrier, forming a first optically effective structure on a top side of the carrier, and arranging a cover above the top side of the carrier and the first optically effective structure. 157-. (canceled)58. An optically effective element comprising a carrier ,a first optically effective structure arranged on a top side of the carrier, andand a cover arranged above the first optically effective structure.59. The optically effective element according to claim 58 , wherein the carrier comprises sapphire or a glass.60. The optically effective element according to claim 58 , wherein the first optically effective structure is a multi-lens structure.61. The optically effective element according to claim 60 ,wherein a material layer is arranged on the top side of the carrier, andthe multi-lens structure is formed in the material layer.62. The optically effective element according to claim 61 , wherein the material layer comprises an epoxy claim 61 , SiNand TiO.63. The optically effective element according to claim 60 , wherein the top side of the carrier is structured such that the multi-lens structure is formed.64. The optically effective element according to claim 63 , wherein the carrier comprises GaAs claim 63 , GaP or GaN.65. The optically effective element according to claim 58 , wherein the first optically effective structure is a diffractive structure.66. The optically effective element according to claim 65 , wherein the diffractive structure comprises GaN claim 65 , Si claim 65 , GaP claim 65 , SiNor TiO.67. The optically effective element according to claim 65 , wherein the diffractive structure comprises an inner dielectric layer arranged on the top side of the carrier claim 65 , said inner ...

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Номер записи: 42
23-04-2015 дата публикации

Reflective Diffraction Grating and Method for the Production Thereof

Номер: US20150109672A1
Автор: Fuchs Frank, Zeitner Uwe D.
Принадлежит:

A reflective diffraction grating includes a substrate and a reflection-enhancing interference layer system. The reflection-enhancing interference layer system has alternating low refractive index dielectric layers having a refractive index n1 and high refractive index dielectric layers having a refractive index n2>n1. The reflective diffraction grating also includes a grating containing a grating structure, which is formed in the topmost low refractive index layer on a side of the interference layer system facing away from the substrate, and a cover layer, which conformally covers the grating structure. The cover layer has a refractive index n3>n1. 115-. (canceled)16. A reflective diffraction grating , comprising:a substrate;{'b': 1', '2', '2', '1, 'a reflection-enhancing interference layer system, which has alternating low refractive index dielectric layers having a refractive index n and high refractive index dielectric layers having a refractive index n, where n>n; and'}{'b': 3', '3', '1, 'a grating, comprising a grating structure, which is formed in a topmost low refractive index layer on a side of the interference layer system facing away from the substrate, and a cover layer, which conformally covers the grating structure, wherein the cover layer has a refractive index n, where n>n.'}173. The reflective diffraction grating according to claim 16 , wherein n>1.6.18. The reflective diffraction grating according to claim 16 , wherein the cover layer comprises a dielectric layer.19. The reflective diffraction grating according to claim 16 , wherein the cover layer is formed from the same material as the high refractive index layers of the interference layer system.2031. The reflective diffraction grating according to claim 16 , wherein n−n>0.4.2121. The reflective diffraction grating according to claim 16 , wherein n−n>0.4.22. The reflective diffraction grating according to claim 16 , wherein the low refractive index layers comprise silicon dioxide.23. The ...

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Номер записи: 43
29-04-2021 дата публикации

JEWELRY IMAGE PROJECTION AND METHOD

Номер: US20210120922A1
Автор: Lansdorp Bob Michael
Принадлежит:

An article of jewelry comprising; a frame; and a decorative element secured within the frame, wherein two-dimensional array of optical phase shifting structures is embedded in the decorative element; wherein the two-dimensional array of optical phase shifting structures project an image when illuminated with a light source. 1. An article of jewelry comprising:a frame;a decorative element having at least one surface, wherein the decorative element is secured within the frame; anda phase mask is embedded in the decorative element on the at least one surface, wherein the phase mask is a two-dimensional array of optical phase shifting structures.2. The article of jewelry of claim 1 , wherein the decorative element is transparent.3. The article of jewelry of claim 1 , wherein the phase mask is comprised of a plurality of altered sections and unaltered sections of the decorative element.4. The article of jewelry of claim 3 , wherein the altered sections are of all substantially the same depth.5. The article of jewelry of claim 1 , wherein the at least one surface of the decorative element is a reflective surface. This application is a continuation of U.S. application Ser. No. 16/409,794 filed May 11, 2019 and 62/670,836 filed May 13, 2018. The disclosure of the prior applications is considered part of (and is incorporated by reference in) the disclosure of this application.The present invention relates to device for image projection, and more particularly to an article of jewelry with an image embedded in the article of jewelry which when illuminated projects an image.Precious stones have been used as gifts and stores of value. Diamonds are commonly used in engagement rings due to the high hardness and stability. Furthermore, each diamond is thought to be unique and therefore has symbolic value, for example for couples that are preparing for marriage.However, the environmental impact of diamond mining, and the social conflicts caused by the pursuit of the stones has led ...

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Номер записи: 44
10-07-2014 дата публикации

MULTI-AXIS DIFFRACTION GRATING

Номер: US20140191428A1
Автор: Deschner Matthew J., Randazzo Dean J., Spoto Louis M.
Принадлежит: ILLINOIS TOOL WORKS INC.

An enhanced optical interference pattern, such as a diffraction grating, is incorporated into a photodefineable surface by shining three or more beams of coherent light from a single source at a photodefinable surface, such as a photosensitive emulsion/photoresist covered glass or an ablatable substrate and mapping the diffraction grating pattern to the photodefinable surface. Mapping of the optical interference pattern is created by interference of three or more light beams, such as laser light or other light sources producing a suitable spectrum of light. The mapped photodefinable surface can be used to create embossing shims. The embossing shim can then be used to emboss film or paper. The embossed film/paper can be metalized and laminated onto a substrate to create a product that has shifting patterns at a variety of viewing angles when exposed to white light. 1. A method of making an enhanced optical interference pattern for an embossing shim , the method comprising:directing at least three light beams from a coherent light source onto a photodefinable surface;mapping the optical interference pattern onto the photodefinable surface by interference of the at least three beams; andproducing the embossing shim from the photodefinable surface.2. The method of wherein the optical interference pattern is a diffraction cross-grating produced by one exposure to the at least three beams.3. The method of wherein the photodefinable surface is a plastic film.4. The method of wherein the photodefinable surface is a photoresist surface.5. The method of wherein the at least three light beams create at least three low energy spots on the photodefinable surface.6. The method of wherein the photodefinable surface is electroplated to form a metal master shim.7. The method of wherein the metal master shim is nickel-plated for use as an embossing shim.8. The method of wherein the at least three beams are configured to focus in an area ranging from approximately 25 microns to ...

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Номер записи: 45
02-04-2020 дата публикации

Diffractive optical element and method of manufacturing the same

Номер: US20200103566A1
Автор: Maiko Niwa
Принадлежит: Canon Inc

A diffractive optical element prevents degradation of the optical performance of the element due to moisture absorption of the resin layers from taking place and also can prevent cracks of the resin layers and peeling of the resin layers along the interface thereof from taking place in a hot environment or in a cold environment. The diffractive optical element comprises a first layer and a second layer sequentially laid on a substrate, a diffraction grating being formed at the interface of the first layer and the second layer, the height d of the diffraction grating, the average film thickness t1 of the first layer and the average film thickness t2 of the second layer satisfying the relationship requirements expressed by the expressions of 1.1×d≤t1≤50 μm and 30 μm≤t2≤(400 μm−t1−d).

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Номер записи: 46
13-05-2021 дата публикации

METHODS OF PRODUCING SLANTED GRATINGS WITH VARIABLE ETCH DEPTHS

Номер: US20210141131A1
Автор: Evans Morgan, MEYER TIMMERMAN THIJSSEN Rutger, Olson Joseph C.
Принадлежит: Applied Materials, Inc.

Methods of producing gratings with trenches having variable height are provided. In one example, a method of forming a diffracted optical element may include providing an optical grating layer over a substrate, patterning a hardmask over the optical grating layer, and forming a sacrificial layer over the hardmask, the sacrificial layer having a non-uniform height measured from a top surface of the optical grating layer. The method may further include etching a plurality of angled trenches into the optical grating layer to form an optical grating, wherein a first depth of a first trench of the plurality of trenches is different than a second depth of a second trench of the plurality of trenches. 1. A method of forming a diffracted optical element , comprising:providing an optical grating layer; andetching a plurality of angled trenches into the optical grating layer to form an optical grating, wherein a first depth of a first trench of the plurality of trenches is different than a second depth of a second trench of the plurality of angled trenches, and wherein the etching comprises performing an angled ion etch at a non-zero angle with respect to a perpendicular to a plane defined by a top surface of the optical grating layer.2. The method of claim 1 , further comprising:providing the optical grating layer over a substrate;patterning a hardmask over the optical grating layer; andforming a sacrificial layer over the hardmask, the sacrificial layer having a non-uniform height measured from the top surface of the optical grating layer.3. The method of claim 2 , wherein forming the sacrificial layer comprises:depositing the sacrificial layer atop the hardmask; andetching the sacrificial layer to create a trench with a sloped bottom surface.4. The method of claim 3 , further comprising performing a vertical etch to form the trench.5. The method of claim 3 , further comprising:etching the optical grating layer to recess the trench into the optical grating layer;forming a ...

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Номер записи: 47
05-05-2016 дата публикации

IMAGE DISPLAY DEVICE USING DIFFRACTIVE ELEMENT

Номер: US20160124237A1
Автор: Jeong Seung-Jun, KIM Jin-Hwan, Lee Seung-hoon, Yoon Il-Yong, Yun Hae-Young
Принадлежит:

An image display device includes a display panel displaying an image, and a diffractive element formed to operate in a 2D mode or a 3D mode so that the image of the display panel is perceived as a 2D image or a 3D image after passing through the diffractive element. In the image display device, the diffractive element includes a first substrate and a second substrate facing each other, a first electrode layer formed on the first substrate that includes a plurality of zones, a second electrode layer formed on the second substrate, and a liquid crystal layer interposed between the first substrate and the second substrate. Further, when the diffractive element operates in the 3D mode, a common voltage is applied to the second electrode layer, and polarity of voltages applied to the first electrode layer with respect to the common voltage is inverted every zone. 1. A method of driving an image display device , the image display device comprising:a display panel to display an image; and a first zone; and', 'a second zone adjacent to the first zone,', 'wherein each of the first and the second zones includes a plurality of subzones, wherein each of the subzones includes an electrode structure, an electrode layer, and a liquid crystal layer between the electrode structure and the electrode layer;, 'a diffractive element to operate in a 2D mode or a 3D mode, the diffractive element includingthe method comprising:operating the diffractive element in the 3D mode including applying a common voltage to the electrode layers and applying voltages to the electrode structures,wherein a polarity of the voltage applied to the electrode structure of at least one of the plurality of subzones of the first zone with respect to the common voltage is different from a polarity of the voltage applied to the electrode structure of at least one of the plurality of subzones of the second zone with respect to the common voltage.2. The method of claim 1 , wherein:the voltage applied to the ...

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Номер записи: 48
24-07-2014 дата публикации

ZONE PLATE

Номер: US20140204463A1
Автор: HARADA Ken, Kohashi Teruo
Принадлежит:

Although, conventionally, there were two methods, (1) a wave was transmitted through a spiral phase plate and (2) a diffraction grating containing an edge dislocation was used, they incurred complication of a configuration and securement of a larger amount of space and were not efficient because each of the spiral wave generation methods needed an incident wave to be a plane wave and at least one time of imaging is necessary at the time of wave irradiation on an observation object. In order to efficiently generate the spiral wave having a sufficient intensity, a structure of edge dislocation is taken in into a pattern of the zone plate and a spiral pattern containing a discontinuous zone is formed. Moreover, a thickness and a quality of material that change the phase of the wave by an odd multiple of π are selected for a material of the wave-blocking section in the pattern. 1. A zone plate having a function of converging or diverging a wave ,wherein in zones that form an annular zone grating of the zone plate, at least a part thereof has a discontinuity that is discontinuous, andwherein the discontinuity forms an edge dislocation in the grating that the zones form.2. The zone plate according to claim 1 ,wherein the zones having the discontinuity form a spiral shape that has the discontinuity as its end part and has a center of an annulus of the annular zone grating as a spiral center.3. The zone plate according to claim 1 ,wherein an amplitude transmissivity of a blocking section of the wave in the zone plate modulates a phase of the wave by an odd multiple of +π or an odd multiple of −π.4. A zone plate for converging or diverging a wave using a diffraction phenomenon claim 1 ,wherein the zone plate forms a spiral shape that is defined by a combination of an annular zone grating and a diffraction grating containing an edge dislocation.5. The zone plate according to claim 4 ,wherein the spiral shape has an end part that forms the edge dislocation and the end part is ...

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Номер записи: 49
27-05-2021 дата публикации

OPTICAL ELEMENT WITH DIFFRACTIVE FOCUSING FEATURES AND DIFFRACTIVE ANTI-REFLECTION FEATURES

Номер: US20210157162A1
Автор: Kryskowski David, Parameswaran Krishnan Ramaswamy
Принадлежит:

In an optical element, diffractive focusing features and diffractive anti-reflection features can extend into a first surface of a body, such as by etching. The diffractive focusing features can have a same first depth that is greater than a wavelength, and can be located in a first area to have a duty cycle that varies over the first area. The diffractive anti-reflection features can have a same second depth that is less than the wavelength. In some examples, an effective refractive index of the diffractive focusing features and the diffractive anti-reflection features, together, can be less than or equal to a specified value, such as 120% of a square root of a refractive index of a material of the body. In other examples, the diffractive anti-reflection features can be located in the first area to have a duty cycle that is constant over the first area. 1. An optical element , comprising:a body formed from at least one material that is transparent at a wavelength,the body including a first surface that extends laterally over a first area,the first surface including diffractive focusing features that extend into the body,the diffractive focusing features having a same first depth that is greater than the wavelength,the diffractive focusing features located in the first area to have a duty cycle that varies over the first area,the first surface further including diffractive anti-reflection features that extend into the body,the diffractive anti-reflection features having a same second depth that is less than the wavelength,the diffractive anti-reflection features located in the first area such that an effective refractive index of the diffractive focusing features and the diffractive anti-reflection features, together, is less than or equal to a specified value.2. The optical element of claim 1 , wherein the specified value equals 120% of a square root of a refractive index of the at least one material at the wavelength.3. The optical element of claim 1 , wherein:the ...

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Номер записи: 50
12-05-2016 дата публикации

MANUFACTURE METHOD FOR BLAZED CONCAVE GRATING

Номер: US20160131807A1
Автор: Dong Hao, LI YANG, Ni Kai, PANG Jinchao, TIAN Rui, Xu Mingfei, ZHANG Jinchao, ZHOU Qian
Принадлежит:

A manufacture method for a blazed concave grating is provided, including: replicating a blazed concave grating by means of a replication process, after the replication is completed, conducting heat preservation and cooling, then separating two gratings (G G) by using different pulling manners respectively, and finally splicing the replicated and separated concave grating blanks, to obtain a required blazed concave grating. This manufacture method can solve the problem of a big error in an existing replication method for a blazed concave grating. 1. A manufacture method for a blazed concave grating , comprising the following steps:A, preparing a convex blazed master grating;B, preparing a concave grating substrate, and preparing a segmentation sheet;C, replicating a concave grating, wherein during replication, the segmentation sheet is vertically placed in the middle of the convex blazed master grating, so as to replicate two independent gratings on the convex blazed master grating;D, separating blazed concave gratings: separately pulling the two independent gratings along two different directions, so as to separate the two independent gratings from the convex blazed master grating; andE, splicing the concave gratings: splicing the separated gratings.2. The manufacture method for a blazed concave grating according to claim 1 , wherein in step A claim 1 , the convex blazed master grating is formed by conducting sensitization claim 1 , developing and ion beam etching on a convex blazed master grating substrate claim 1 , wherein a working surface of the convex blazed master grating substrate is an optical surface and has been polished; in a preparation process claim 1 , a working surface of the convex blazed master grating substrate is coated with a photosensitive material claim 1 , namely claim 1 , photoresist claim 1 , in a rotating manner; the convex blazed master grating substrate is first subjected to holographic exposure claim 1 , to obtain a convex photoresist ...

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Номер записи: 51
30-04-2020 дата публикации

COSMETIC HOLOGRAPHIC WEARABLE OCULAR DEVICES AND METHODS OF PRODUCTION THEREOF

Номер: US20200132897A1
Автор: Odhner Jefferson, Sears Robin
Принадлежит:

Wearable ocular devices (such as ocular prostheses or contact lenses) utilizing diffraction gratings to produce color, as well as methods for producing such devices, are provided. A diffraction grating on the device may diffract the incident light to the observer. The result may be colored light that appears to originate from the wearer's eyes. The diffraction grating may achieve a look or feeling that is qualitatively or quantitatively different from the look or feeling achieved by previous devices that use dyes or inks. 1. A method of imparting a representation to a wearable ocular device , the method comprising:a. applying an optically absorptive material to a surface of the device;b. directing a first laser light along a first optical path to the surface of the device;c. directing a second laser light along a second optical path to the surface of the device; andd. creating an interference pattern between the first and second laser light at the surface of the device such that the optically absorptive material absorbs light at areas of constructive interference in the interference pattern and ablates nearby portions of the surface of the device, thereby imparting a diffraction grating to the surface of the device.2. The method of claim 1 , wherein the first and second laser light are emitted by a single laser.3. The method of claim 2 , wherein the first and second laser light are directed along the first and second optical paths claim 2 , respectively claim 2 , by a spatial filter.4. The method of claim 3 , wherein the first optical path comprises a reference mirror and the second optical path comprises an objective mirror.5. The method of claim 4 , wherein the first laser light is directed from the reference mirror to a first portion of the surface of the device and the second laser light is directed from the objective mirror to a second portion of the surface of the device.6. The method of claim 5 , wherein the first and second portions of the surface of the ...

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Номер записи: 52
09-05-2019 дата публикации

WRITING OF HIGH MECHANICAL STRENGTH FIBER BRAGG GRATINGS USING ULTRAFAST PULSES AND A PHASE MASK

Номер: US20190137685A1
Автор: Bernier Martin, Carrier Julien, TRÉPANIER François, Vallee Real
Принадлежит:

An optical fiber having a Bragg grating along a non-photosensitized grating region thereof and a pristine polymer coating around the grating region with the Bragg grating having been written through the polymer coating has a mechanical resistance that is greater than 20% of the mechanical resistance of an identical grating-free optical fiber.” 124-. (canceled)25. A manufacture comprising an optical fiber , wherein said optical fiber comprises a Bragg grating along a non-photosensitized grating region thereof , wherein said optical fiber has a pristine polymer coating around said grating region , wherein said Bragg grating has been written through said polymer coating , wherein said optical fiber is characterized by a mechanical resistance that is greater than 20% of a mechanical resistance of an identical grating-free optical fiber.26. The manufacture of claim 25 , wherein said Bragg grating is characterized by a fundamental Bragg resonance.27. The manufacture of claim 25 , wherein said optical fiber comprises a core and a cladding claim 25 , wherein said non-photosensitized grating region is provided within said core claim 25 , wherein said cladding surrounds said core claim 25 , and wherein said polymer coating extends around said cladding.28. The manufacture of claim 26 , wherein said core and said cladding are made of a glass material or of a crystalline material.29. The manufacture of claim 25 , wherein said Bragg grating defines a refractive index modulation greater than 5.10.30. The manufacture of claim 25 , wherein said optical fiber has a mechanical resistance of at least 99% of said mechanical resistance of an identical grating-free optical fiber.31. The manufacture of claim 25 , further comprising a wavelength-division-multiplexing light filter claim 25 , wherein said optical fiber is a constituent of said wavelength-division-multiplexing light filter.32. The manufacture of claim 25 , further comprising a laser having a laser cavity claim 25 , wherein ...

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Номер записи: 53
04-06-2015 дата публикации

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Номер: US20150153654A1
Автор: Dittmann Olaf, Fiolka Damian, Maul Manfred, Schwab Markus, Seitz Wolfgang
Принадлежит:

The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%. 119.-. (canceled)20. An illumination system , comprising:a depolarizer;a light mixing system disposed downstream of the depolarizer in a light propagation direction of the illumination system; anda member upstream of the light mixing system in the light propagation direction, the member comprising a plurality of elements arranged with a periodicity, the illumination system is a microlithographic illumination system;', 'the depolarizer and the light mixing system are configured so that, during use of the illumination system, the depolarizer and the light mixing system in conjunction at least partially cause effective depolarization of polarized light that impinges on the depolarizer;', 'the depolarizer is configured so that, during use of the illumination system, the depolarizer produces mutually orthogonal polarization states in a plane perpendicular to an optical axis of the illumination system;', 'the mutually orthogonal polarization states have a distribution within an optically effective region that does not have any periodicity;', 'during ...

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Номер записи: 54
15-09-2022 дата публикации

HOLOGRAPHIC PLASMA LENSES

Номер: US20220291429A1
Автор: Edwards Matthew Reid, Michel Pierre
Принадлежит:

A diffractive optical element, such as a holographic plasma lens, can be made by direction two laser beams so that they overlap in a nonlinear material, to form an interference pattern in the nonlinear material. The interference pattern can modify the index of refraction in the nonlinear material to produce the diffractive optical element. The interference pattern can modify the distribution of plasma for the nonlinear material, which can adjust the index of refraction. A third laser beam can be directed through the diffractive optical element to modify the third laser beam, such as to focus, defocus, or collimate the third laser beam. 1. A system for making a diffractive lens , the system comprising:at least one laser configured to provide first and second laser beams, anda nonlinear medium, or a supply configured to provide a nonlinear medium, or a support configured to hold a nonlinear medium, said first and second laser beams disposed with respect to each other and with respect to said nonlinear medium so that the first and second laser beams are configured to interfere and form an interference pattern on the nonlinear medium;wherein the interference pattern is configured to form a distribution of plasma from the nonlinear medium so as to produce a diffractive lens that is configured to modify the propagation of a third laser beam transmitted therethrough.2. The system of claim 1 , wherein the nonlinear medium comprises a gas jet.3. The system of claim 1 , wherein the first and second laser beams are collinear.4. The system of claim 3 , wherein the third laser beam is not collinear with the first and second laser beams.5. The system of claim 1 , wherein the first laser beam claim 1 , the second laser beam claim 1 , and the third laser beam are collinear.6. The system of claim 1 , wherein the first claim 1 , second and third laser beams are disposed at angles with respect to each other such that they are not collinear.7. The system claim 1 , wherein the first and ...

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Номер записи: 55
07-05-2020 дата публикации

Metal-Overcoated Grating and Method

Номер: US20200142107A1
Автор: Britten Jerald A., Nguyen Hoang T.
Принадлежит: Lawrence Livermore National Security, LLC

Metallic overcoated diffraction gratings are particularly useful for high average power laser pulse compression. A dielectric oxide layer is attached to an etch-stop layer, where the dielectric oxide layer comprises a grating pattern including grating lines. Sidewalls of the grating lines taper together toward an upper surface of the dielectric oxide layer. A metallic overcoat is attached to the etch-stop layer and the dielectric oxide layer. 1. A method , comprising:providing a substrate;depositing an etch-stop layer above said substrate;depositing a dielectric oxide layer onto said etch-stop layer;depositing an absorbing layer onto said dielectric oxide layer;depositing a photoresist layer onto said absorbing layer;patterning said photoresist layer to form a mask;etching unmasked portions of said dielectric oxide layer to form a grating pattern including grating lines, wherein sidewalls of said grating lines taper together toward an upper surface of said dielectric oxide layer, thereby forming tapered sidewalls;removing said absorbing layer and said photoresist layer; anddepositing a conformal metallic overcoat onto said etch-stop layer and said dielectric oxide layer.2. The method of claim 1 , wherein said substrate is polished prior to the step of depositing an etch-stop layer.3. The method of claim 1 , wherein said etch-stop layer is etch-resistant in a reactive ion beam etcher claim 1 , but soluble in wet chemical solution for liftoff from said substrate.4. The method of claim 1 , wherein said etch-stop layer comprises a non-oxide material.5. The method of claim 1 , wherein said etch-stop layer comprises metal.6. The method of claim 1 , wherein said etch-stop layer comprises nitride material.7. The method of claim 6 , wherein said nitride material comprises boron nitride.8. The method of claim 1 , wherein said etch-stop layer comprise chrome.9. The method of claim 1 , wherein said etch-stop layer is deposited onto said substrate by a deposition selected from ...

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Номер записи: 56
07-05-2020 дата публикации

GRATING STRUCTURE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE

Номер: US20200142108A1
Автор: LI Wusheng, YAO Qi
Принадлежит: BOE Technology Group Co., Ltd.

A grating structure, a manufacturing method thereof and a display device are provided. The method of manufacturing the grating structure includes: forming a photosensitive material layer on a substrate; patterning the photosensitive material layer to form a grating transition pattern, where the grating transition pattern includes multiple grating units, the multiple grating units each include a first portion and a second portion which are symmetric, and at least one of the first portion and the second portion includes multiple subunits to have a stepped structure; and curing the grating transition pattern to form the grating structure. 1. A method of manufacturing a grating structure , comprising:forming a photosensitive material layer on a substrate;patterning the photosensitive material layer to form a grating transition pattern, wherein the grating transition pattern comprises a plurality of grating units, the plurality of grating units each comprises a first portion and a second portion, the first portion and the second portion are symmetric, and at least one of the first portion and the second portion comprises a plurality of subunits to have a stepped structure; andcuring the grating transition pattern to form the grating structure.2. The method of manufacturing the grating structure according to claim 1 , wherein thicknesses of the plurality of subunits are successively reduced in a direction perpendicular to and away from the substrate.3. The method of manufacturing the grating structure according to claim 1 , wherein patterning the photosensitive material layer to form the grating transition pattern comprises:manufacturing the plurality of subunits of the grating unit with a digital photolithography technology.4. The method of manufacturing the grating structure according to claim 3 , wherein in a case that the photosensitive material layer is formed by a positive photosensitive material claim 3 , manufacturing the plurality of subunits with the digital ...

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Номер записи: 57
09-06-2016 дата публикации

METHOD OF FABRICATING LARGE AREA BIREFRINGENT GRATING FILMS

Номер: US20160161648A1
Автор: Gu Dong-Feng, MAHAJAN MILIND
Принадлежит:

A method of fabricating large area birefringent grating films requires directing a UV beam through a large-scale LC polymer film alignment template on which a predetermined periodic alignment pattern has been imprinted and onto a photo-alignment layer such that the pattern is transferred thereon. The alignment template is fabricated by directing a collimated linearly polarized UV beam through a birefringent prism to produce two UV beams, which are directed onto a photo-alignment layer through a uniform quarter-wave plate to create a UV hologram which imprints the desired pattern onto the photo-alignment layer. These steps are repeated on different portions of the photo-alignment layer to create a large-scale photo-alignment layer. The photo-alignment layer, with a desired alignment pattern transferred with UV exposure through an alignment template, is then coated with a polymerizable LC material such that the desired pattern is followed by the liquid crystal molecules in the coating, which is then exposed with a UV beam so as to photo-polymerize the polymerizable LC material, and the coating is continued till the total coating thickness reaches either quarter-wave or half-wave retardation values at the wavelength of the UV source passing through the alignment template. Alternatively, a new alignment template can also be fabricated using a pre-existing alignment template with a half-wave retardation at the exposing UV wavelengths, and the alignment periodicity of the new alignment template is about half as the periodicity in the pre-existing alignment template. 1. A method of fabricating a birefringent grating film , comprising:creating a liquid crystal (LC) polymer film alignment template on which a desired periodic alignment pattern has been imprinted;providing an ultraviolet (UV) beam;providing a photo-alignment layer on a substrate; anddirecting said UV beam through said alignment template such that a periodic alignment pattern based on the pattern imprinted on ...

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Номер записи: 58
14-05-2020 дата публикации

SYSTEM AND METHOD FOR FORMING SURFACE RELIEF GRATINGS

Номер: US20200150325A1
Автор: Biloiu Costel, Godet Ludovic, Olson Joseph C.
Принадлежит: Applied Materials, Inc.

Optical grating components and methods of forming are provided. In some embodiments, a method includes providing a substrate, and etching a plurality of trenches into the substrate to form an optical grating. The optical grating may include a plurality of angled trenches, wherein a depth of a first trench of the plurality of trenches varies between at least one of the following: a first lengthwise end of the first trench and a second lengthwise end of the first trench, and between a first side of the first trench and a second side of the first trench. 1. A method of forming an optical grating component , comprising:providing a substrate; andetching a plurality of trenches into the substrate to form an optical grating, and wherein a depth of a first trench of the plurality of trenches varies between at least one of the following: a first lengthwise end of the first trench and a second lengthwise end of the first trench, and between a first side of the first trench and a second side of the first trench.2. The method of claim 1 , further comprising etching the plurality of trenches to form a second trench having a different depth than the depth of the first trench.3. The method of claim 2 , wherein the second trench is positioned transverse to a lengthwise axis extending between the first and second lengthwise ends of the first trench.4. The method of claim 1 , wherein the etching comprises performing an angled reactive ion etch.5. The method of claim 4 , wherein the angled reactive ion etch is performed by a reactive ion beam claim 4 , wherein the substrate is scanned along a scan direction with respect to the reactive ion beam.6. The method of claim 5 , further comprising varying the scanning of the reactive ion beam to vary the depth of the first trench of the plurality of trenches between the first lengthwise end of the first trench and the second lengthwise end of the first trench.7. The method of claim 5 , further comprising varying at least one of: a duty cycle ...

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Номер записи: 59
23-05-2019 дата публикации

METHOD OF MANUFACTURING A MEMBER, OPTICAL MEMBER AND OPTICAL ELEMENT

Номер: US20190154890A1
Автор: Kojima Makoto, Nakayasu Tomonao, Okura Yukinobu, Tanaka Masato
Принадлежит:

An optical member having a concentric diffraction surface facing the outside, wherein the projection having a inclined surface concentric to the diffraction surface having an angle of inclination θ smaller than the angle of inclination ϕ is provided outside the diffraction surface having the largest ϕ, so that an interference of a cutting tool is avoided, and simultaneously, deterioration of a surface roughness may be restrained. 1. (canceled)2. An optical member comprising:a plurality of concentric diffraction surfaces inclined at predetermined angles of inclination to a virtual plane orthogonal to an optical axis; anda circular projection provided outside the plurality of diffraction surfaces and having a same center as that of the plurality of diffraction surfaces, the projection including an inclination surface inclined to the virtual plane orthogonal to the optical axis at an angle of inclination greater than 0 degrees and less than 4 degrees.3. The optical member according to claim 2 , wherein an outermost diffraction surface of the plurality of diffraction surfaces has the largest angle of inclination among the plurality of diffraction surfaces.4. The optical member according to claim 3 , further comprising a plane that is provided outside of the projection and is orthogonal to the optical axis.5. The optical member according to claim 4 , wherein surface roughnesses of the plurality of diffraction surfaces claim 4 , the inclination surface of the projection claim 4 , and the plane orthogonal to the optical axis are PV 20 nm or less.6. The optical member according to claim 5 , wherein a variation of each of the surface roughnesses of the plurality of diffraction surfaces claim 5 , the inclination surface of the projection claim 5 , and the plane orthogonal to the optical axis is ±5 nm or less.7. An optical apparatus comprising the optical member according to .8. An optical apparatus comprising:{'claim-ref': {'@idref': 'CLM-00002', 'claim 2'}, 'the optical ...

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Номер записи: 60
04-09-2014 дата публикации

OBJECTIVE LENS ELEMENT

Номер: US20140247493A1
Автор: Hayashi Katsuhiko, ISHIMARU Kazuhiko, Komma Yoshiaki, Tanaka Yasuhiro, Yamagata Michihiro
Принадлежит: Panasonic Corporation

An objective lens element which has excellent compatibility with optical discs having different base material thicknesses is provided. An objective lens element has optically functional surfaces on an incident side and an exit side. Either one of the optically functional surfaces is divided into an inner part B including a rotational symmetry axis and an outer part F which is a ring-shaped region surrounding the inner part B. On the inner part B, a plurality of discontinuous steps are provided. The plurality of steps change in height in the same direction from the optical axis toward the outer part, and each of the steps causes a constant optical path difference longer than the wavelength λto the first incident light beam and causes a constant optical path difference shorter than the wavelength λto the second incident light beam 1. An objective lens element which has optically functional surfaces on an incident side and an exit side , which converges a first incident light beam of a wavelength λthrough a base plate having a thickness tto form a spot , and which converges a second incident light beam of a wavelength λlonger than the wavelength λthrough a base plate having a thickness tlarger than the thickness tto form a spot , whereinat least either one of the optical function surfaces is a refractive surface which deflects the first and second incident light beams by refractive power all over the surface, the at least either one of the optical function surfaces being divided into an inner part which includes a rotational symmetry axis and through which the first and second incident light beams that substantially contribute to spot formation pass, and an outer part which is a ring-shaped region surrounding the inner part and through which only the first incident light beam that substantially contributes to spot formation passes, and the at least either one of the optical function surfaces having a plurality of discontinuous steps on the inner part, and{'sub': 1', '2 ...

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Номер записи: 61
16-06-2016 дата публикации

Ultra-Miniature Wide-Angle Lensless CMOS Visual Edge Localizer

Номер: US20160169667A1
Автор: Gill Patrick R., Monjur Mehjabin Sultana, Spinoulas Leonidas, Stork David Geoffrey
Принадлежит:

Described are imaging systems that employ diffractive structures as focusing optics optimized to detect visual edges (e.g., slits or bars). The diffractive structures produce edge responses that are relatively insensitive to wavelength, and can thus be used to precisely measure edge position for panchromatic sources over a wide angle of view. Simple image processing can improve measurement precision. Field-angle measurements can be made without the aid of lenses, or the concomitant cost, bulk, and complexity. 1. An imaging system comprising:an array of photosensitive pixels having pixel centers separated by a pixel pitch; andoptical grating structures defining a surface overlying the array and shining slit responses on the array for a line source of light having a wavelength band encompassing a first wavelength and a second wavelength at least 150% the first wavelength, the slit responses including a first multi-peak response to the light of the first wavelength and a second multi-peak response to the light of the second wavelength, the first multi-peak response including a first main peak and the second multi-peak response including a second main peak;wherein, for the light incident the grating structures at an angle of thirty degrees from an axis normal to the surface, the first main peak is separated from the second main peak by less than three times the pixel pitch.2. The imaging system of claim 1 , the array to capture the slit responses claim 1 , the imaging system further comprising a processor to process the captured first multi-peak response and the captured second multi-peak response to locate at least one of the first main peak and the second main peak.3. The imaging system of claim 2 , wherein the processor is integrated with the array of photosensitive pixels.4. The imaging system of claim 2 , the processor to calculate an incident angle of the light from at least one of the first multi-peak response and the second multi-peak response.5. The imaging ...

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Номер записи: 62
30-05-2019 дата публикации

Optical Wavelength Dispersion

Номер: US20190162883A1
Автор: Ko Cheng-Hao
Принадлежит:

An optical wavelength dispersion device is disclosed, which includes a waveguide unit and an adjustable reflecting unit, wherein the waveguide unit has a first substrate, an input unit, a grating, a reflector and a second substrate. The input unit is formed on the first substrate and having a slit for receiving an optical signal, a grating is formed on the first substrate for producing an output beam once the optical signal is dispersed, the reflector is formed on the first substrate for reflecting the output beam, the second substrate is located on the input unit, the grating and the reflector, and forms a waveguide space with the first substrate; the adjustable reflecting unit is located outside of the waveguide unit, and is used for changing emitting angle and adjusting focus of the output beam. 1. An optical wavelength dispersion device , which is characterized by comprising:a waveguide unit, wherein the waveguide unit includes:a first substrate;an input unit, which is formed on the first substrate and having a slit for receiving an optical signal;a grating, which is formed on the first substrate, capable of producing an output beam once the optical signal has been dispersed;a reflector, which is formed on the first substrate, being used for reflecting the output beam;a second substrate, which is located on the input unit, the grating and the reflector, forming a waveguide space with the first substrate; andan adjustable reflecting unit, which is located outside of the waveguide unit, being used for changing emitting angle and adjusting focus of the output beam.2. The optical wavelength dispersion device of claim 1 , wherein the input unit claim 1 , the grating and the reflector are formed by exposing a photoresist layer under a high energy light source claim 1 , which the high energy light source has its wavelength ranging from 0.01 nm to 100 nm.3. The optical wavelength dispersion device of claim 1 , wherein the grating has a concave claim 1 , convex or planar ...

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Номер записи: 63
22-06-2017 дата публикации

DIRECTIONAL BACKLIGHT, 3D IMAGE DISPLAY APPARATUS HAVING THE SAME, AND METHOD OF MANUFACTURING THE SAME

Номер: US20170176669A1
Автор: BAE Jihyun, CHUNG Jaeseung, HONG Seogwoo, KIM Dongouk, Kim Hyunjoon, Lee Hongseok, LEE Sunghoon, PARK Joonyong, SHIM Dongsik, SHIN Bongsu, SONG Hoon
Принадлежит: SAMSUNG ELECTRONICS CO., LTD.

A directional backlight and a 3D image display apparatus including the directional backlight are provided. The directional backlight includes a light guide plate guiding light emitted from a light source; a diffractive device configured to adjust the direction of light exiting the light guide plate; and an aperture adjusting layer including a plurality of apertures. The aperture adjusting layer may adjust the optical output efficiency of the diffractive device. 1. A directional backlight comprising:a light source;a light guide plate comprising an entrance surface receiving light emitted from the light source, the light guide plate guiding the light emitted from the light source;a diffractive device comprising a plurality of grating units configured to adjust a direction of light exiting the light guide plate; andan aperture adjusting layer arranged on the diffractive device and comprising a plurality of apertures.2. The directional backlight of claim 1 , wherein each of the grating units comprises a plurality of sub-grating units claim 1 , wherein the sub-grating units are dependent on different wavelength bands of light claim 1 , and the apertures of the aperture adjusting layer respectively correspond to the sub-grating units.3. The directional backlight of claim 2 , wherein the apertures of the aperture adjusting layer have different sizes so as to adjust aperture ratios of the corresponding sub-grating units.4. The directional backlight of claim 1 , wherein the light source comprises a light source configured to emit light of a plurality of colors in different directions claim 1 , the aperture adjusting layer comprises aperture units corresponding to the grating units claim 1 , and each of the aperture units comprises a plurality of sub-apertures transmitting the light of the colors.5. The directional backlight of claim 4 , wherein sizes of the sub-apertures increase in the directions in which the light of the colors propagates.6. The directional backlight of ...

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Номер записи: 64
02-07-2015 дата публикации

ON-CHIP DIFFRACTION GRATING PREPARED BY CRYSTALLOGRAPHIC WET-ETCH

Номер: US20150185377A1
Автор: HECK John, Na Yun-Chung, Rong Haisheng
Принадлежит:

Methods of forming microelectronic structures are described. Embodiments of those methods may include forming a photomask on a (110) silicon wafer substrate, wherein the photomask comprises a periodic array of parallelogram openings, and then performing a timed wet etch on the (110) silicon wafer substrate to form a diffraction grating structure that is etched into the (110) silicon wafer substrate. 1. A method comprising:applying a wet etchant to a (110) silicon substrate, wherein the (110) silicon substrate comprises a photo mask comprising a periodic array of parallelograms; andforming a diffraction grating structure into the (110) silicon substrate, wherein the {111} planes of the (110) silicon substrate form an etch stop during the etching of the (110) silicon substrate.2. The method of further comprising wherein the diffraction grating structure comprises smooth claim 1 , vertical sidewalls claim 1 , wherein the sidewalls are substantially 90 degree sidewalls.3. The method of further comprising wherein forming the diffractiongrating structure further comprises forming an angle between arms of the diffraction grating structure.4. The method of further comprising wherein the angle between the arms of the diffraction grating structure comprises one of about a 70.6 degree angle and about a 109.4 degree angle.5. The method of further comprising wherein the diffraction grating structure comprises an Echelle diffraction grating structure.6. The method of further comprising wherein the diffraction grating structure comprises a portion of a coarse-wave length division multiplexing (CWDM) optical system.710. The method of further comprising wherein the diffraction grating comprises a to a 30 micron large core waveguide.8. The method of further comprising wherein the CWDM optical system further comprises on-chip collimators.9. The method of further comprising wherein the wet etchant comprises one of KOH claim 1 , TMAH claim 1 , and NH4OH.10. The method of further ...

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Номер записи: 65
08-07-2021 дата публикации

MASK ORIENTATION

Номер: US20210208317A1
Автор: Godet Ludovic, Guo Jinrui, MEYER TIMMERMAN THIJSSEN Rutger, Xu Yongan
Принадлежит:

A method of forming patterned features on a substrate is provided. The method includes positioning a plurality of masks arranged in a mask layout over a substrate. The substrate is positioned in a first plane and the plurality of masks are positioned in a second plane, the plurality of masks in the mask layout have edges that each extend parallel to the first plane and parallel or perpendicular to an alignment feature on the substrate, the substrate includes a plurality of areas configured to be patterned by energy directed through the masks arranged in the mask layout. The method further includes directing energy towards the plurality of areas through the plurality of masks arranged in the mask layout over the substrate to form a plurality of patterned features in each of the plurality of areas. 1. A method of forming patterned features on a substrate comprising: the substrate is positioned in a first plane and the plurality of masks are positioned in a second plane,', 'the plurality of masks in the mask layout have edges that each extend parallel to the first plane and parallel or perpendicular to an alignment feature on the substrate,', 'the substrate includes a plurality of areas configured to be patterned by energy directed through the masks arranged in the mask layout,', 'the plurality of areas configured to be patterned are spaced apart from each other by one or more areas not configured to be patterned by the energy directed through the masks, and', 'each area of the plurality of areas configured to be patterned is spaced apart from a closest area of the plurality of areas configured to be patterned by a shortest distance along a direction offset by at least 5 degrees from directions in the first plane that extend parallel or perpendicular to the alignment feature on the substrate; and, 'positioning a plurality of masks arranged in a mask layout over a substrate, wherein'} 'a number of the formed plurality of patterned features extending along directions in ...

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Номер записи: 66
28-06-2018 дата публикации

COLOR SEPARATION IN WAVEGUIDES USING DICHROIC FILTERS

Номер: US20180180817A1
Автор: Cheng Hui-Chuan, EDWIN Lionel Ernest, YEOH Ivan Li Chuen
Принадлежит: Magic Leap, Inc.

An eyepiece for projecting an image to an eye of a viewer includes a first planar waveguide positioned in a first lateral plane, a second planar waveguide positioned in a second lateral plane adjacent the first lateral plane, and a third planar waveguide positioned in a third lateral plane adjacent the second lateral plane. The first waveguide includes a first diffractive optical element (DOE) coupled thereto and disposed at a lateral position. The second waveguide includes a second DOE coupled thereto and disposed at the lateral position. The third waveguide includes a third DOE coupled thereto and disposed at the lateral position. The eyepiece further includes a first optical filter disposed between the first waveguide and the second waveguide at the lateral position, and a second optical filter positioned between the second waveguide and the third waveguide at the lateral position. 1. An eyepiece for projecting an image to an eye of a viewer , the eyepiece comprising:a first planar waveguide positioned in a first lateral plane, wherein the first waveguide comprises a first diffractive optical element (DOE) coupled thereto and disposed at a lateral position, the first DOE configured to diffract image light in a first wavelength range centered at a first wavelength;a second planar waveguide positioned in a second lateral plane adjacent the first lateral plane, wherein the second waveguide comprises a second DOE coupled thereto and disposed at the lateral position, the second DOE configured to diffract image light in a second wavelength range centered at a second wavelength longer than the first wavelength;a third planar waveguide positioned in a third lateral plane adjacent the second lateral plane, wherein the third waveguide comprises a third DOE coupled thereto and disposed at the lateral position, the third DOE configured to diffract image light in a third wavelength range centered at a third wavelength longer than the second wavelength; a first transmittance ...

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Номер записи: 67
09-07-2015 дата публикации

Fresnel Zone Plate

Номер: US20150192712A1
Автор: Jiang Hongrui, Liu Hewei, Lu Yen-Sheng
Принадлежит: WISCONSIN ALUMNI RESEARCH FOUNDATION

A Fresnel zone plate is provided for encountering incident light having a wavelength. The Fresnel zone plate has a focal length and a wafer including alternating transparent and opaque zones, and a mounting surface. A plurality of silicon nanowires extend into opaque zone of the wafer. A mechanically stretchable turning structure is mounted to the mounting surface such that stretching of the tuning structure varies the focal length of the Fresnel zone plate. 1. A Fresnel zone plate for encountering incident light having a wavelength. comprising:a first set of rings radially spaced about a central axis, the first set of rings being transparent;a second set of rings radially spaced about the central axis, each ring of the second set of rings including a surface lying in a plane perpendicular to the central axis and being opaque; anda plurality of silicon nanowires extending into at least one of the surfaces of the second set of rings.2. The Fresnel zone plate of wherein each of the plurality of silicon nanowires is spaced from an adjacent one of the plurality of silicon nanowires by a distance claim 1 , the distance being less than the wavelength of the incident light.3. The Fresnel zone plate of further comprising a mounting surface spaced from and generally parallel to the surfaces of the second set of rings and a tuning structure mounted to the mounting surface.4. The Fresnel zone plate of wherein the tuning structure includes a plate wherein mechanically stretching of the plate adjusts a focal length of the Fresnel zone plate.5. The Fresnel zone plate of wherein the plate is fabricated from an elastomer.6. The Fresnel zone plate of wherein the plate is transparent.7. The Fresnel zone plate of wherein the plurality of silicon nanowires have lengths claim 1 , the lengths of the plurality of silicon nanowires are in the range of 1 micrometer to 6 micrometers.8. A Fresnel zone plate for encountering incident light having a wavelength claim 1 , the Fresnel zone plate ...

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Номер записи: 68
29-06-2017 дата публикации

Electro-optic device with grating period variation and related methods

Номер: US20170184797A1
Автор: Charles Baudot
Принадлежит: STMicroelectronics Crolles 2 SAS

An electro-optic device may include a photonic chip including an insulator layer, and a semiconductor layer over the insulator layer and defining an optical grating coupler. The optical grating coupler may have a series of alternating curved ridges and valleys. The optical grating coupler has first and second sides and a medial portion. The medial portion has a medial grating period T based upon a targeting wavelength. One or more of the first and second sides have a side grating period different than T.

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Номер записи: 69
16-07-2015 дата публикации

Optical Wavelength Dispersion Device and Method of Manufacturing the Same

Номер: US20150198754A1
Автор: Ko Cheng-Hao
Принадлежит:

An optical wavelength dispersion device includes a first substrate, an input unit formed on the first substrate having a slit for receiving an optical signal, a grating formed on the first substrate for producing a diffracted light beams from the optical signal, a first optical reflector formed on the first substrate for reflecting the diffracted light beams from the grating for outputting, and a second substrate covered on the top of the input unit and the grating;, wherein the input unit, the grating and the first optical reflector are formed from a photo-resist layer by high energy light source exposure. 1. A method of manufacturing an optical wavelength dispersion device , comprising the steps of:(a) providing a first substrate;(b) forming a photo-resist layer on said first substrate;(c) exposing said photo-resist layer by high energy light source through a high-energy-light-source mask, wherein a wavelength of said high energy light source is from 0.01 to 100 nm;(d) developing said photo-resist layer for forming an input unit with a slit, a grating and a first optical reflector;(e) coating a reflective layer on a surface of said first substrate, said input unit, said grating and said first optical reflector; and(f) covering a second substrate on said first substrate.2. The method claim 1 , as recited in claim 1 , wherein said high energy light source is selected from a group consisting of X-ray claim 1 , soft X-ray and EUV.3. The method claim 1 , as recited in claim 1 , wherein a width of said slit is from 5 to 500 μm.4. The method claim 1 , as recited in claim 1 , wherein said grating has a concave claim 1 , convex or planar profile with pitches selected from a group consisting of laminar type claim 1 , saw-tooth type claim 1 , blaze type claim 1 , sinusoidal type claim 1 , and a combination of said laminar claim 1 , saw-tooth claim 1 , blaze claim 1 , and sinusoidal types.5. The method claim 1 , as recited in claim 1 , wherein said first substrate and said ...

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Номер записи: 70
25-09-2014 дата публикации

METHOD FOR PRODUCING A REFRACTIVE OR DIFFRACTIVE OPTICAL DEVICE

Номер: US20140285891A1
Автор: Heitzmann Michel
Принадлежит: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENE ALT

A method producing a refractive or diffractive optical device, including: production, in a first layer, of at least one inclined general profile approximated by a staircase profile including plural stairsteps; production of the profile including: forming buffer patterns on the first layer and at least one sequence including: forming masking patterns, so each masking pattern includes at least one edge situated above a buffer pattern and covers at least one area of the first layer not masked by the buffer patterns, the forming the masking patterns also defining, for the first layer, plural free areas not masked by the masking patterns or by the buffer patterns; etching the free areas to form trenches in the first layer. The production of the profile also includes: removing the masking patterns, removing the buffer patterns revealing walls previously covered by the buffer patterns, and then an isotropic etching to remove the walls. 121-. (canceled)22. A method for producing , in a first layer , at least one inclined general profile approximated by a staircase profile including a plurality of stairsteps; production of the profile comprising: forming buffer patterns on the first layer , and at least one sequence comprising:forming masking patterns, performed so that each masking pattern includes at least one edge situated above a buffer pattern and covers at least one area of the first layer not masked by the buffer patterns, the forming the masking patterns also being performed to define, for the first layer, a plurality of free areas not masked by the masking patterns or by the buffer patterns;etching the free areas to form trenches in the first layer;wherein the production of the profile further comprises: removing the masking patterns, removing the buffer patterns to reveal walls covered by the buffer patterns, and having sidewalls uncovered, and then an isotropic etching to remove the walls, the isotropic etching having to laterally attack the walls.23. A method ...

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Номер записи: 71
23-07-2015 дата публикации

GRATING LENS, LENS-TYPE GRATING, AND DISPLAY DEVICE

Номер: US20150205018A1
Автор: WEI Wei
Принадлежит:

A grating lens is disclosed. The grating lens is of a uniform columnar body, both shapes and sizes of respective cross sections perpendicular to an axis of the grating lens are the same, the grating lens includes sides formed of a plane and a cambered surface, an intersecting line between an oblique section of the grating lens and the cambered surface is a circular arc, and the oblique section is any section which forms a predetermined angle A with the axis of the grating lens and is perpendicular to the plane, where 0° Подробнее

Номер записи: 72
22-07-2021 дата публикации

OPTICALLY EFFECTIVE ELEMENT, METHOD OF PRODUCING AN OPTICALLY EFFECTIVE ELEMENT, AND OPTOELECTRONIC COMPONENT

Номер: US20210223559A1
Автор: Arzberger Markus, Boehm Bernd, Enzmann Roland, HALBRITTER Hubert, Ploessl Andreas, Rossbach Georg, Sabathil Matthias, SCHULZ ROLAND, Singer Frank
Принадлежит:

An optoelectronic component includes an optoelectronic semiconductor chip configured to emit electromagnetic radiation; an optically effective element arranged such that electromagnetic radiation emitted by the optoelectronic semiconductor chip passes through the optically effective element; and a housing, wherein the optoelectronic semiconductor chip is arranged in a cavity of the housing, the optically effective element includes a carrier, a first optically effective structure arranged on a top side of the carrier, and a cover arranged above the first optically effective structure. 1. An optoelectronic component comprising:an optoelectronic semiconductor chip configured to emit electromagnetic radiation;an optically effective element arranged such that electromagnetic radiation emitted by the optoelectronic semiconductor chip passes through the optically effective element; anda housing,wherein the optoelectronic semiconductor chip is arranged in a cavity of the housing,the optically effective element comprises a carrier,a first optically effective structure arranged on a top side of the carrier, anda cover arranged above the first optically effective structure.2. The optoelectronic component according to claim 1 , wherein the optoelectronic semiconductor chip is formed as a vertically emitting laser chip.3. The optoelectronic component according to claim 1 , wherein the optoelectronic semiconductor chip is formed as a light emitting diode chip.4. The optoelectronic component according to claim 1 , wherein the optically effective element is arranged in the cavity of the housing.5. The optoelectronic component according to claim 1 , wherein the optically effective element is arranged directly adjacent to the optoelectronic semiconductor chip.6. The optoelectronic component according to claim 4 , wherein a potting material is arranged in the cavity.7. The optoelectronic component according to claim 6 , wherein the optoelectronic semiconductor chip and the optically ...

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Номер записи: 73
14-07-2016 дата публикации

OPTICAL MODULATION DEVICE INCLUDING LIQUID CRYSTALS, DRIVING METHOD THEREOF, AND OPTICAL DISPLAY DEVICE USING THE SAME

Номер: US20160202510A1
Автор: Jung Kyung Ho, YI Jung Hwan
Принадлежит:

An optical modulation device includes a first electrode layer in which a plurality of electrodes are arranged and a second electrode layer, where the optical modulation device configures a Fresnel zone plate wherein groups of adjacent electrodes of the plurality of electrodes define zones of the Fresnel zone plate. A method of driving the optical modulation device includes applying a common voltage to the second electrode layer, applying starting voltages to the first electrode layer in a first step, applying lens voltages to the first electrode layer in a second step, where polarities of the lens voltages with respect to the common voltage are inverted for every zone, and an absolute difference between starting voltages applied to electrodes adjacent to a zone boundary in the first step is less than an absolute difference of the lens voltages applied to electrodes adjacent to a zone boundary in the second step. 1. A method of driving an optical modulation device , the optical modulation device comprising a first electrode layer in which a plurality of electrodes are arranged and a second electrode layer , wherein the optical modulation device configures a Fresnel zone plate wherein groups of adjacent electrodes of the plurality of electrodes define zones of the Fresnel zone plate , the method comprising:applying a common voltage to the second electrode layer;applying starting voltages to the first electrode layer in a first step; andapplying lens voltages to the first electrode layer in a second step, whereinpolarities of the lens voltages with respect to the common voltage are inverted for every zone, andan absolute value of a difference between starting voltages applied to electrodes adjacent to a zone boundary in the first step is less than an absolute value of a difference between lens voltages applied to electrodes adjacent to a zone boundary in the second step.2. The driving method of claim 1 , whereindifferences between lens voltages applied to the plurality ...

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Номер записи: 74
11-06-2020 дата публикации

APPARATUS AND TECHNIQUES FOR ANGLED ETCHING USING MULTIELECTRODE EXTRACTION SOURCE

Номер: US20200185201A1
Автор: Evans Morgan, Kurunczi Peter F., Olson Joseph C.
Принадлежит: Applied Materials, Inc.

A plasma source may include a plasma chamber, where the plasma chamber has a first side, defining a first plane and an extraction assembly, disposed adjacent to the side of the plasma chamber, where the extraction assembly includes at least two electrodes. A first electrode may be disposed immediately adjacent the side of the plasma chamber, wherein a second electrode defines a vertical displacement from the first electrode along a first direction, perpendicular to the first plane, wherein the first electrode comprises a first aperture, and the second electrode comprises a second aperture. The first aperture may define a lateral displacement from the second aperture along a second direction, parallel to the first plane, wherein the vertical displacement and the lateral displacement define a non-zero angle of inclination with respect to a perpendicular to the first plane. 1. A plasma source , comprising:a plasma chamber, the plasma chamber comprising a first side, defining a first plane; andan extraction assembly, disposed adjacent to the first side of the plasma chamber, the extraction assembly comprising at least two electrodes,wherein a first electrode is disposed immediately adjacent the side of the plasma chamber,wherein a second electrode defines a vertical displacement from the first electrode along a first direction, perpendicular to the first plane,wherein the first electrode comprises a first aperture, and the second electrode comprises a second aperture,wherein the first aperture defines a lateral displacement from the second aperture along a second direction, parallel to the first plane,wherein the vertical displacement and the lateral displacement define a non-zero angle of inclination with respect to a perpendicular to the first plane.2. The plasma source of claim 1 , the extraction assembly comprising three electrodes claim 1 ,wherein a third electrode defines a second vertical displacement from the second electrode along the first direction,wherein ...

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Номер записи: 75
18-06-2020 дата публикации

METHODS OF PRODUCING SLANTED GRATINGS

Номер: US20200192009A1
Автор: Clark Megan, Evans Morgan, MEYER TIMMERMAN THIJSSEN Rutger
Принадлежит: Applied Materials, Inc.

Methods of producing gratings with trenches having variable height and width are provided. In one example, a method includes providing an optical grating layer atop a substrate, and providing a patterned hardmask over the optical grating layer. The method may include forming a mask over just a portion of the optical grating layer and the patterned hardmask, and etching a plurality of trenches into the optical grating layer to form an optical grating. After trench formation, at least one of the following grating characteristics varies between one or more trenches of the plurality of trenches: a trench depth and a trench width. 1. A method of forming a diffracted optical element , comprising:providing an optical grating layer atop a substrate;providing a patterned hardmask over the optical grating layer;forming a mask over just a portion of the optical grating layer and the patterned hardmask, wherein the mask is formed directly atop a top surface of the optical grating layer; andetching a plurality of trenches into the optical grating layer to form an optical grating, wherein a first depth of a first trench of the plurality of trenches is different than a second depth of a second trench of the plurality of trenches.2. The method of claim 1 , wherein a first width of the first trench of the plurality of trenches is different than a second width of the second trench of the plurality of trenches.3. The method of claim 1 , further comprising patterning the mask prior to etching the plurality of trenches into the optical grating layer.4. The method of claim 1 , wherein the etching comprises performing an angled ion etch.5. The method of claim 4 , wherein the angled ion etch is performed by a reactive ion beam claim 4 , and wherein the substrate is scanned along a scan direction with respect to the reactive ion beam.6. The method of claim 1 , further comprising forming the patterned hardmask as a plurality of hardmask elements each separated from one another by a gap claim ...

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Номер записи: 76
18-06-2020 дата публикации

METHOD OF FORMING GRATINGS

Номер: US20200192010A1
Автор: Evans Morgan, FU Jinxin, Godet Ludovic, MEYER TIMMERMAN THIJSSEN Rutger, Olson Joseph C.
Принадлежит: Applied Materials, Inc.

Embodiments of the disclosure generally relate to methods of forming gratings. The method includes depositing a resist material on a grating material disposed over a substrate, patterning the resist material into a resist layer, projecting a first ion beam to the first device area to form a first plurality of gratings, and projecting a second ion beam to the second device area to form a second plurality of gratings. Using a patterned resist layer allows for projecting an ion beam over a large area, which is often easier than focusing the ion beam in a specific area. 1. A method of forming gratings , comprising:depositing a resist material on a grating material disposed over a substrate, the resist material having a first and second device area;patterning the resist material into a resist layer;projecting a first ion beam to the first device area for a first period of time to form a first plurality of gratings in the grating material, the first ion beam having a first angle to a surface of the substrate, the first ion beam having a first ion beam profile; andprojecting a second ion beam to the second device area for a second period of time to form a second plurality of gratings in the grating material, the second ion beam having a second angle to the surface of the substrate, the second ion beam having a second ion beam profile,wherein at least one of the first ion beam profile and the second ion beam profile is not uniform.2. The method of claim 1 , whereinthe first plurality of gratings has a first profile,the second plurality of gratings has a second profile, andthe first profile is different than the second profile.3. The method of claim 2 , wherein the first profile is a stepped profile.4. The method of claim 2 , wherein the first profile is a sloped profile.5. The method of claim 1 , wherein the resist material comprises a photoresist material.6. The method of claim 1 , whereinthe first angle is from about 5° to about 85°, andthe second angle is from about 95° ...

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Номер записи: 77
27-06-2019 дата публикации

MOBILE TERMINAL AND METHOD FOR CONTROLLING THE SAME

Номер: US20190196215A1
Автор: CHO Ayoung, LEE Changhwan, SHIN Yunsup
Принадлежит: LG ELECTRONICS INC.

A mobile terminal having a lighting device including a light emitting element, a diffractive optical element (DOE) to diffract a part of light output from the light emitting element, and a driving unit to move the diffractive optical element so as to vary a distance between the light emitting element and the diffractive optical element. 1. A mobile terminal , comprising:a camera;a lighting device; anda controller to control the camera and the lighting device,wherein the lighting device comprises:a printed circuit board;a light emitting element provided on the printed circuit board to emit light of a specific pattern;a diffractive optical element to diffract a part of light emitted from the light emitting element;a lens through which light diffracted by the diffractive optical element is incident on a subject; anda driving unit to:move the diffractive optical element a first distance from the light emitting element such that the light incident through the lens is irradiated as a first light pattern to the subject, and move the diffractive optical element a second distance from the light emitting element such that the light incident through the lens is irradiated as a second light pattern to the subject, andwherein the controller extracts depth information related to an image received through the camera using the first light pattern and the second light pattern irradiated on the subject.2. The terminal of claim 1 , wherein the first light pattern and the second light pattern are different from each other.3. The terminal of claim 1 , wherein the light incident through the lens is irradiated on a first position of the subject when the diffractive optical element is the first distance from the light emitting element claim 1 ,wherein the light incident through the lens is irradiated on a second position of the subject when the diffractive optical element is the second distance from the light emitting element different from the first distance, andwherein the first position ...

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Номер записи: 78
25-06-2020 дата публикации

Optical Wavelength Device

Номер: US20200200952A1
Автор: Ko Cheng-Hao
Принадлежит:

An optical wavelength dispersion device is disclosed, which includes a waveguide unit and an adjustable reflecting unit, wherein the waveguide unit has a first substrate, an input unit, a grating, a reflector and a second substrate. The input unit is formed on the first substrate and having a slit for receiving an optical signal, a grating is formed on the first substrate for producing an output beam once the optical signal is dispersed, the reflector is formed on the first substrate for reflecting the output beam, the second substrate is located on the input unit, the grating and the reflector, and forms a waveguide space with the first substrate; the adjustable reflecting unit is located outside of the waveguide unit, and is used for changing emitting angle and adjusting focus of the output beam. 1. An optical wavelength dispersion device , comprising:a waveguide unit, which includes:a first substrate;an input unit, which is formed on the first substrate and has a slit for receiving an optical signal;a grating, which is formed on the first substrate and capable of producing an output beam once the optical signal has been dispersed;a reflector, which is located outside of the waveguide unit, being used for reflecting the output beam;a second substrate, which is located on the input unit, the grating and the reflector, forming a waveguide space with the first substrate; andan adjustable reflecting unit, which is located outside of the waveguide unit, being used for changing emitting angle and adjusting focus of the output beam.2. The optical wavelength dispersion device of claim 1 , wherein the input unit and the grating are formed by exposing a photoresist layer under a high energy light source claim 1 , which the high energy light source has a wavelength thereof ranging from 0.01 nm to 100 nm.3. The optical wavelength dispersion device of claim 1 , wherein the grating has a concave claim 1 , convex or planar profile claim 1 , and a surface appearing in a ...

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Номер записи: 79
04-07-2019 дата публикации

THIN FILM TOTAL INTERNAL REFLECTION DIFFRACTION GRATING FOR SINGLE POLARIZATION OR DUAL POLARIZATION

Номер: US20190204483A1
Автор: "OLeary Michael", Miller John Michael, Tian Lu, WILLS Gonzalo
Принадлежит:

A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer. 120-. (canceled)21. A diffraction grating , comprising: 'the etchable layer being between the dielectric layer and a substrate; and', 'an etchable layer that signals an end-point during etching of a dielectric layer,'} 'the dielectric layer being on at least the etchable layer.', 'the dielectric layer that forms a periodic grating layer after being etched,'}22. The diffraction grating of claim 21 , further comprising; 'the etch stop layer being between the etchable layer and the substrate.', 'an etch stop layer to prevent etching of the substrate,'}23. The diffraction grating of claim 21 , further comprising:a protective layer on at least the periodic grating layer.24. The diffraction grating of claim 21 , where the etchable layer comprises tantala claim 21 , silica or silicon nitride.25. The diffraction grating of claim 21 , where a thickness of the etchable layer is less than approximately 0.1 microns.26. The diffraction grating of claim 21 , where the dielectric layer comprises silicon or tantala.27. The diffraction grating of claim 21 , where the etchable layer signals the end-point by producing a detectable reactant when the etching penetrates the etchable layer.28. The diffraction grating of claim 27 , where the detectable reactant comprises silicon fluoride.29. A diffraction grating claim 27 , to operate based on total internal reflection claim 27 , comprising: 'the dielectric grating layer being a periodic ...

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Номер записи: 80
23-10-2014 дата публикации

DIFFRACTIVE OPTICAL ELEMENT AND IMAGING DEVICE AND ILLUMINATING DEVICE USING SAME

Номер: US20140313584A1
Автор: HANADA Yasuyuki, Korenaga Tsuguhiro, Okada Yuka
Принадлежит: Panasonic Corporation

To provide a highly workable diffractive optical element which realizes a high refractive index and a low wavelength dispersiveness well balanced with each other and which exhibits high heat resistance and high endurance against temperature changes, a diffractive optical element includes a base member including a diffraction grating formed on a surface thereof and a protective film provided on the surface of the base member where the diffraction grating is formed, wherein the base member is composed of a silsesquioxane resin material or a dendrimer material which has a first refractive index and a first Abbe number and wherein the protective film is composed of a silicone resin material which has a second refractive index smaller than the first refractive index and a second Abbe number smaller than the first Abbe number. 1. A diffractive optical element , comprising:a base member including a diffraction grating formed on a surface thereof; anda protective film provided on the surface of the base member where the diffraction grating is formed;wherein the base member is composed of a silsesquioxane resin material or a dendrimer material which has a first refractive index and a first Abbe number; andwherein the protective film is composed of a silicone resin material which has a second refractive index smaller than the first refractive index and a second Abbe number smaller than the first Abbe number.2. A diffractive optical element , comprising:a base member including a diffraction grating formed on a surface thereof; anda protective film provided on the surface of the base member where the diffraction grating is formed;wherein the protective film is composed of a silsesquioxane resin material or a dendrimer material which has a first refractive index and a first Abbe number; andwherein the base member is composed of a silicone resin material which has a second refractive index smaller than the first refractive index and a second Abbe number smaller than the first ...

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Номер записи: 81
11-08-2016 дата публикации

Display System

Номер: US20160231478A1
Автор: KOSTAMO Pasi
Принадлежит:

In making an optical component, one or more portions of a substrate's surface are patterned. At least a region of the substrate's surface is coated in negative photoresist, the region encompassing said portions. The negative photoresist becomes undevelopable when exposed to light. Light which forms a grating structure is projected over each of the portions. Light of substantially uniform intensity over the entirety of the region but for the portions, thereby leaving the negative photoresist outside of the portions undevelopable. The negative photoresist is developed so as to embody the grating structure in the photoresist covering the portions. The substrate's surface is patterned to impose the grating structure on the substrate's surface from the developed photoresist; the undevelopable photoresist inhibits patterning of the surface region outside of the portions. The optical component comprises the patterned substrate. 1. A microfabrication process for making an optical component , the process comprising a patterning stage in which one or more portions of a substrate's surface are patterned by at least:coating at least a region of the substrate's surface in negative photoresist, said region encompassing said portions, whereby the negative photoresist becomes undevelopable when exposed to light;projecting light which forms a grating structure over each of said portions;projecting light of substantially uniform intensity over the entirety of said region but for said portions, thereby leaving the negative photoresist outside of said portions undevelopable;developing the negative photoresist so as to embody the grating structure in the photoresist covering said portions; andpatterning the substrate's surface to impose the grating structure on the substrate's surface from the developed photoresist, the undevelopable photoresist inhibiting patterning of the surface region outside of said portions, wherein the optical component comprises the patterned substrate.2. A ...

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Номер записи: 82
30-10-2014 дата публикации

Middle-infrared volumetric bragg grating based on alkali halide or alkili-earth flouride color center crystals

Номер: US20140321494A1
Автор: Anitha Arumugam, David J. Hilton, Dmitry V. Martyshkin, Sergey B. Mirov, Vladimir V. Fedorov
Принадлежит: UAB RESEARCH FOUNDATION

Volumetric Bragg grating devices that operate in middle-infrared region of the spectrum and methods for producing such devices are described. Such a Volumetric Bragg grating device can be produced by forming a plurality of color centers within an alkali-halide or an alkali-earth fluoride crystal and selectively removing a subset of the plurality of color centers to produce variations in refractive index of the alkali-halide or alkali-earth fluoride crystal in the middle-infrared spectral region and to thereby produce a volumetric Bragg grating that operates in middle-infrared spectral range.

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Номер записи: 83
30-10-2014 дата публикации

INTEGRATED SUB-WAVELENGTH GRATING ELEMENT

Номер: US20140321495A1
Автор: Beausoleil Raymond G., Fattal David A., Fiorentino Marco, Morris Terrel, Rosenberg Paul Kessler
Принадлежит: Hewlett-Packard Development Company, L.P.

An integrated sub-wavelength grating element includes a transparent layer formed over an optoelectronic substrate layer and a sub-wavelength grating element formed into a grating layer disposed on said transparent layer. The sub-wavelength grating element is formed in alignment with an active region of an optoelectronic component within the optoelectronic substrate layer. The sub-wavelength grating element affects light passing between said grating element and said active region. A method for forming an integrated sub-wavelength grating element is also provided. 1. An integrated sub-wavelength grating element comprising:a transparent layer formed over an optoelectronic substrate layer;a sub-wavelength grating element formed into a grating layer disposed on said transparent layer in alignment with an active region of an optoelectronic component within said optoelectronic substrate layer, said sub-wavelength grating element affecting light passing between said active region and said sub-wavelength grating element.2. The integrated grating element of claim 1 , wherein said grating pattern comprises a two-dimensional claim 1 , non-periodic variation of grating feature parameters to affect light in a predetermined manner.3. The integrated grating element of claim 1 , wherein said grating pattern is to cause said grating element to one of: collimate said light claim 1 , focus said light claim 1 , split said light claim 1 , bend said light claim 1 , and transmit said light.4. The integrated grating element of claim 1 , wherein said transparent layer comprises an oxide layer.5. The integrated grating element of claim 1 , further comprising:multiple optoelectronic components formed in said optoelectronic substrate layer; andmultiple sub-wavelength grating elements formed into said grating layer, said multiple sub-wavelength grating elements in alignment with active regions of said optoelectronic components.6. The integrated grating element of claim 1 , further comprising ...

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Номер записи: 84
24-08-2017 дата публикации

MANUFACTURING METHOD OF DIFFRACTION GRATING

Номер: US20170242166A1
Автор: Sugiyama Shigeru, Sukegawa Takashi
Принадлежит:

A manufacturing method of a Blazed diffraction grating configured to diffract incident light and made of a CdTe or CdZnTe crystal material includes the step of forming a plurality of grating grooves in a processed surface of a work through machining using a processing machine for the Blazed diffraction grating. The forming step forms the grating grooves so that among surfaces of gratings formed by the forming step, a surface that receives the incident light most is set to a (110) plane as a crystal orientation of the crystal material. 17-. (canceled)8. A manufacturing method of a Blazed diffraction grating configured to diffract incident light and made of a crystal material , the manufacturing method comprising the step of:forming a plurality of grooves by moving relatively a work and a cutting tool in a first direction at a plurality of positions in a Blazed direction,wherein the plurality of grooves is formed so that each groove has a first surface and a second surface extending along the first direction and one of the short side surface or the long side surface is a (110) plane of the crystal material.9. The manufacturing method according to claim 8 , wherein the plurality of grooves is formed so that the first surface and the second surface both are the (110) plane of the crystal material.10. The manufacturing method according to claim 8 , wherein the plurality of grooves is formed so that the first surface has a short side of a triangular sectional shape on a section that contains the Blazed direction claim 8 ,wherein the second surface has a long side, which is longer than the short side, of the triangular sectional shape on the section.11. The manufacturing method according to claim 8 , wherein the Blazed diffraction grating is made of a CdTe or CdZnTe crystal material.12. The manufacturing method according to claim 8 , wherein the Blazed diffraction grating is an immersed diffraction grating. Field of the InventionThe present invention relates to a ...

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Номер записи: 85
10-09-2015 дата публикации

COUNTERFEIT PREVENTION STRUCTURE AND MANUFACTURING METHOD THEREFOR

Номер: US20150253729A1
Автор: YASHIKI Kazuhiro
Принадлежит: TOPPAN PRINTING CO., LTD.

A counterfeit prevention structure including a concave/convex formation layer having a surface and including a first concave/convex structure in a first portion of the surface and a second concave/convex structure in a second portion of the surface, and a reflective layer formed on the second concave/convex structure in the second portion. The first and second concave/convex structures are formed such that the first concave/convex structure has a depth-to-width ratio greater than a depth-to-width ratio of the second concave/convex structure, and that a light transmittance is higher in the first portion than in the second portion. 1. A counterfeit prevention structure , comprising:a concave/convex formation layer having a surface and including a first concave/convex structure in a first portion of the surface and a second concave/convex structure in a second portion of the surface; anda reflective layer formed on the second concave/convex structure in the second portion,wherein the first and second concave/convex structures are formed such that the first concave/convex structure has a depth-to-width ratio greater than a depth-to-width ratio of the second concave/convex structure, and that a light transmittance is higher in the first portion than in the second portion.2. The counterfeit prevention structure according to claim 1 , further comprising:a plurality of fine particles included in each of a plurality of recess portions formed in the first concave/convex structure.3. The counterfeit prevention structure according to claim 2 , wherein a depth-to-width ratio of the first concave/convex structure and a width of each of the recess portions in the first concave/convex structure are set such that the fine particles are filled in the recess portions of the first concave/convex structure claim 2 , and a depth-to-width ratio of the second concave/convex structure and a width of each of recess portions in the second concave/convex structure are set such that the fine ...

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Номер записи: 86
01-09-2016 дата публикации

DIFFRACTION GRATING LENS, DESIGN METHOD FOR OPTICAL SYSTEM HAVING SAME, IMAGE COMPUTATION PROGRAM, AND PRODUCTION METHOD FOR DIFFRACTION GRATING LENS

Номер: US20160252743A1
Автор: Ando Takamasa
Принадлежит:

A method for designing an optical system having a stepped diffraction grating surface includes a flare computation step of defining a temporary shape of the diffraction grating surface and computing a flare amount, and a determination step of determining whether or not the flare amount is within a permissible range, and setting the temporary shape as a shape of the diffraction grating surface if the flare amount is within the permissible range, and returning to the flare computation step if the flare amount is out of the permissible range. The flare computation step includes a temporary shape definition step of defining the temporary shape, a phase computation step of conducting ray tracing from an object surface to an image surface of the optical system at a predetermined field angle, using the temporary shape to find phase information, a pupil distribution computation step of finding pupil distribution on an exit pupil, based on the phase information, and a point image distribution computation step of finding point image distribution on the image surface from the pupil distribution, using a wave propagation analysis method to compute the flare amount. 1. A method for designing an optical system having a stepped diffraction grating surface in one surface of a lens , the method comprising:a flare computation step of defining a temporary shape of the diffraction grating surface and computing a flare amount by the temporary shape; anda determination step of determining whether or not the flare amount is within a permissible range, and setting the temporary shape as a shape of the diffraction grating surface when the flare amount is within the permissible range, and returning to the flare computation step when the flare amount is out of the permissible range, a temporary shape definition step of defining the temporary shape of the diffraction grating surface;', 'a phase computation step of conducting ray tracing from an object surface to an image surface of the optical ...

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Номер записи: 87
08-09-2016 дата публикации

BLAZED DIFFRACTION GRATING AND METHOD FOR PRODUCING BLAZED DIFFRACTION GRATING

Номер: US20160259098A1
Автор: SASAI Hiroyuki
Принадлежит:

An object is to provide a blazed diffraction grating having a smaller blaze angle than an existing blaze angle, and a method for producing the same. A method for producing a blazed diffraction grating includes the steps of forming a resin layer on a support having a saw-tooth sectional shape and having a surface on which a basic blaze surface and a basic riser surface are arranged alternately and repeatedly in a direction, such that the thickness of the resin layer contacting with the surface monotonically changes in the direction, and forming a metal coating film covering the resin layer surface. The method for monotonically changes the thickness comes in a formation method by difference in volatilization volume after applying a solvent resin on the support, and a formation method by a centrifugal force. 1. A blazed diffraction grating comprising:a) a support having a saw-tooth sectional shape and having a basic blaze surface and a basic riser surface arranged alternately and repeatedly in a direction;b) a resin layer covering the basic blaze surface and the basic riser surface of the support and having monotonically changing thickness on the basic blaze surface in the direction; andc) a metal coating film covering a surface of the resin layer.2. The blazed diffraction grating according to claim 1 , wherein a blaze angle of the resin layer on the basic blaze surface is smaller than a blaze angle of the basic blaze surface.3. A method for producing a blazed diffraction grating comprising the steps of:a) preparing a support having a saw-tooth sectional shape and having a basic blaze surface and a basic riser surface arranged alternately and repeatedly in a direction;b) forming a resin layer covering the basic blaze surface and the basic riser surface, on the support, such that a thickness of the resin layer monotonically changes on the basic blaze surface in the direction; andc) forming a metal coating film covering a surface of the resin layer.4. The method for ...

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Номер записи: 88
30-07-2020 дата публикации

LOW-CONTRAST METASURFACES

Номер: US20200241182A1
Автор: COLBURN Shane, Majumdar Arka, ZHAN Alan
Принадлежит: UNIVERSITY OF WASHINGTON

Disclosed herein are metasurfaces formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active at one or more wavelengths and in certain embodiments are configured to form lenses having unexpectedly strong focusing power. In particular, the metasurfaces are formed from “low-contrast” materials, including CMOS-compatible materials such as silicon dioxide or silicon nitride. Accordingly, the disclosed metasurfaces are generally CMOS compatible and therefore embody a new paradigm in metasurface design and manufacturing. 1. A low-contrast metasurface having optical activity at a first wavelength , comprising:a plurality of cylindrical posts formed from a first material and arranged on a substrate in a square pattern, wherein the plurality of cylindrical post are formed of a material having a first refractive index of 2.1 or less;interstices between individual posts of the plurality of cylindrical post comprising an interstitial substance with a second refractive index that is 0.6 to 1.1 less than the first refractive index;wherein the individual posts of the plurality of cylindrical posts have a diameter in a range of ⅛ of the first wavelength to ⅔ of the first wavelength;wherein the plurality of cylindrical posts have a periodicity in a range of 0.4 times the first wavelength to 1.0 times the first wavelength; andwherein the plurality of cylindrical posts have a thickness in a range of 0.5 times the first wavelength to 1.0 times the first wavelength.2. A method of focusing electromagnetic radiation at a first wavelength , comprising passing the electromagnetic radiation through a low-contrast metasurface having optical activity at the first wavelength , comprising:a plurality of cylindrical posts formed from a first material and arranged on a substrate in a square pattern, wherein the plurality of cylindrical post are formed of a material having a first refractive index of 2.1 or less;interstices between individual posts of ...

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Номер записи: 89
27-11-2014 дата публикации

MIDDLE-INFRARED VOLUMETRIC BRAGG GRATING BASED ON ALKALI HALIDE COLOR CENTER CRYSTALS

Номер: US20140348200A1
Автор: Arumugam Anitha, Fedorov Vladimir V., Hilton David J., Martyshkin Dmitry V., Mirov Sergey B.
Принадлежит:

Volumetric Bragg grating devices that operate in middle-infrared region of the spectrum and methods for producing such devices are described. Such a Volumetric Bragg grating device can be produced by forming a plurality of color centers within an alkali-halide crystal and selectively removing a subset of the plurality of color centers to produce variations in refractive index of the alkali-halide crystal in the middle-infrared spectral region and to thereby produce a volumetric Bragg grating that operates in middle-infrared spectral range. 1. A volumetric Bragg grating device for operating in a mid-infrared spectral range , comprising:an alkali-halide crystal including a plurality of color centers with wide spectral transparency in a mid-infrared spectral range, the alkali-halide crystal structured to exhibit variations in a refractive index of the alkali-halide crystal in the mid-infrared spectral range through selective removal of at least a subset of the plurality of color centers to form a volumetric Bragg grating that operates in the mid-infrared spectral range.2. The device of claim 1 , wherein the alkali-halide crystal is a lithium fluoride (LiF) crystal.3. The device of claim 1 , wherein the alkali-halide crystal is structured by photo-induced bleaching of the subset of color centers.4. The device of claim 1 , wherein the variation in refractive index is at least 10in a spectral range spanning approximately 1 to 6 micrometers.5. The device of claim 1 , wherein the volumetric Bragg grating exhibits an efficiency in the range of approximately 10 to 100 percent within a spectral range spanning approximately 1 to 6 micrometers.6. The device of claim 1 , wherein the volumetric Bragg grating includes grooves that are formed as spatial variations in the refractive index as a result of selective removal of the plurality of color centers.7. The device of claim 1 , wherein the selective removal includes photo-induced bleaching of the subset of the plurality of color ...

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Номер записи: 90
07-10-2021 дата публикации

PLASMA ETCHING METHOD USING FARADAY CAGE

Номер: US20210311229A1
Автор: HAN Sang Choll, Her Eun Kyu, PARK Jeong Ho, Park Seong Min, SHIN BU Gon
Принадлежит:

A plasma etching method using a Faraday cage, which effectively produces a blazed grating pattern. 1. A plasma etching method using a Faraday cage , the method comprising the steps of:forming a metal mask on a surface of a substrate, wherein the metal mask comprises a pattern exposing a portion of the surface of the substrate;performing a first plasma etching on the surface of the substrate to form a first pattern on the portion of the surface of the substrate exposed through the metal mask; andremoving the metal mask from the surface of the substrate,placing the substrate in the Faraday cage, wherein the Faraday case has a mesh portion at a top thereof in such a manner that the surface of the substrate is inclined with respect to a bottom of the Faraday cage, andperforming a second plasma etching to convert the first pattern into a second pattern to form a blazed grating.2. The plasma etching method of claim 1 , wherein a shape of the second pattern is controlled by controlling at least one of a depth of the first pattern and a time for performing the second plasma etching.3. The plasma etching method of claim 1 , wherein the first pattern portion has a depth of 50 nm to 350 nm.4. The plasma etching method of claim 1 , wherein the first pattern portion has a pitch of 300 nm to 550 nm.5. The plasma etching method of claim 1 , wherein a time for performing the second plasma etching is 30 seconds to 180 seconds at an etching rate of 30 nm/min or more.6. The plasma etching method of claim 1 , wherein the mesh portion has a sheet resistance of 0.5 Ω/sq or higher.7. The plasma etching method of claim 1 , wherein an output of a plasma etching system during the first plasma etching and the second plasma etching is from 0.75 kW to 4 kW.8. The plasma etching method of claim 1 , wherein the first plasma etching and the second plasma etching comprise supplying a mixed gas comprising a reactive gas and oxygen gas to a plasma etching system at a flow rate of 10 sccm to 100 sccm. ...

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Номер записи: 91
14-10-2021 дата публикации

Method and Device for Manufacturing Concave Diffraction Grating, and Concave Diffraction Grating

Номер: US20210318473A1
Автор: Aono Takanori, Ebata Yoshisada, YAEGASHI Kenta
Принадлежит:

A method for manufacturing a concave diffraction grating is provided. The method includes the steps of: positioning a flat mold and a concave substrate such that a pressing surface, having a groove pattern of a diffraction grating, of the flat mold faces a concave surface, coated with a resin, of the concave substrate; pressing the pressing surface against the resin coated over the concave surface by pressurizing the flat mold using a fluid; and curing the resin having the groove pattern transferred thereto by being pressed by the pressing surface. This makes it possible to improve load non-uniformity and manufacture a concave diffraction grating with high surface accuracy. 19.-. (canceled)10. A method for manufacturing a concave diffraction grating , comprising the steps of:positioning a flat mold and a concave substrate such that a pressing surface, having a groove pattern of a diffraction grating, of the flat mold faces a concave surface, coated with a resin, of the concave substrate, the concave surface being a spherical surface or a toroidal surface;pressing the pressing surface against the resin coated over the concave surface by pressurizing and deforming the flat mold using a fluid; andcuring the resin having the groove pattern transferred thereto by being pressed by the pressing surface.11. The method for manufacturing a concave diffraction grating according to claim 10 ,wherein, in the step of pressing, the pressing surface is pressed against the resin using a pressure difference between a pressing surface side of the flat mold and a reverse side of the pressing surface.12. The method for manufacturing a concave diffraction grating according to claim 11 ,wherein, in the step of pressing, the pressing surface side is exhausted, and the pressing surface is pressed against the resin using the atmospheric pressure on the reverse side.13. The method for manufacturing a concave diffraction grating according to claim 10 ,wherein the resin is a UV-curing resin, ...

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Номер записи: 92
21-10-2021 дата публикации

METHOD AND APPARATUS FOR PREPARING FEMTOSECOND OPTICAL FILAMENT INTERFERENCE DIRECT WRITING VOLUME GRATING/CHIRPED VOLUME GRATING

Номер: US20210325581A1
Автор: Hu Mengyun, NAN Junyi, Yan Ming, ZENG Heping
Принадлежит:

The present disclosure discloses a method and apparatus for preparing a femtosecond optical filament interference direct writing volume grating/chirped volume grating. The method is characterized in that optical filaments are formed in glass by using femtosecond pulse laser, and plasma is controlled to quickly scan in the glass and etch a volume grating or chirped volume grating structure by adjusting the focal length of convex lens, laser energy and movement of motor machine. The apparatus includes a femtosecond pulse laser module, a pulse chirp management module, a pulse time domain shaping module, a laser separation and interference module, a glass volume grating processing platform module and a camera online imaging module. 1. A method for preparing a femtosecond optical filament interference direct writing volume grating and a chirped volume grating , wherein femtosecond pulse laser is configured to interfere in glass to form a section of optical filament that is several times a Rayleigh length of a light spot; plasma is controlled to rapidly scan in the glass and etch out a structure of the volume grating or the chirped volume grating by adjusting a focal length and laser energy of a focusing lens; and the femtosecond pulse laser has two or more beams.2. An apparatus for preparing a femtosecond optical filament interference direct writing volume grating and a chirped volume grating , wherein the apparatus comprises a femtosecond pulse laser module , a pulse chirp management module , a pulse time domain shaping module , a laser separation and interference module , a glass volume grating processing platform module and a camera online imaging module; the femtosecond pulse laser module comprises: a femtosecond laser or a picosecond laser , and an adjustable power attenuator; the pulse chirp management module comprises: a first diffraction grating , a second diffraction grating , a mirror with high reflectivity at incident angle of 0° , a first planar mirror , and ...

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Номер записи: 93
01-10-2015 дата публикации

REFLECTIVE DIFFRACTION GRATING AND FABRICATION METHOD

Номер: US20150276998A1
Автор: CHIU Eddie, DJIE Hery, DU Qinghong, Guo Xiaowei, Lu Patrick, Miller John Michael, MURLEY Chester
Принадлежит:

A reflective diffraction grating and a fabrication method are provided. The reflective diffraction grating includes a substrate, a UV-absorbing layer, a grating layer having a binary surface-relief pattern formed therein, and a conforming reflective layer. Advantageously, the UV-absorbing layer absorbs light at a UV recording wavelength to minimize reflection thereof by the substrate during holographic patterning at the UV recording wavelength. 1. A reflective diffraction grating comprising:a substrate;an ultraviolet (UV)-absorbing layer disposed over the substrate for absorbing light at a UV recording wavelength to minimize reflection thereof by the substrate;a grating layer disposed over the absorber layer, having a binary surface-relief pattern formed therein, wherein the binary surface-relief pattern includes ridges having rectangular or trapezoidal cross-sections, separated by grooves; anda conforming reflective layer disposed over the binary surface-relief pattern, forming a grating profile.2. The reflective diffraction grating of claim 1 , wherein the UV-absorbing layer has a thickness of greater than about 1.2 μm.3. The reflective diffraction grating of claim 1 , wherein the UV-absorbing layer is continuous and unpatterned.4. The reflective diffraction grating of claim 1 , wherein the UV-absorbing layer is formed of brown tantala.5. The reflective diffraction grating of claim 1 , wherein the UV-absorbing layer is formed of a UV-absorbing dielectric material having an extinction coefficient of greater than about 0.025 at the UV recording wavelength.6. The reflective diffraction grating of claim 1 , wherein the reflective diffraction grating was fabricated by holographic lithography at the UV recording wavelength claim 1 , and wherein the UV recording wavelength is in a wavelength range of about 10 nm to about 450 nm.7. The reflective diffraction grating of claim 1 , wherein the binary surface-relief pattern has a base air-groove width (AGW) about 1.5 times ...

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Номер записи: 94
01-10-2015 дата публикации

HIGH-ASPECT-RATIO IMPRINTED STRUCTURE METHOD

Номер: US20150279688A1
Автор: Cok Ronald Steven, Lebens John Andrew
Принадлежит:

A method of making a high-aspect-ratio imprinted structure includes providing a substrate, forming a first layer on the substrate, imprinting a plurality of micro-channels in the first layer, and curing the first layer. Each micro-channel has a bottom and walls, the micro-channel bottom having distinct first and second portions. A material is deposited on the first layer and in each micro-channel and anisotropically etched to remove the deposited material from the first layer and the second portion of the micro-channel bottom, leaving the deposited material on the micro-channel walls. A filler material is located in the micro-channels between the deposited materials and on only the second portion of the micro-channel bottom and cured. 1. A method of making a high-aspect-ratio imprinted structure , comprising:providing a substrate having a surface;forming a curable first layer on the surface, imprinting a plurality of micro-channels in the curable first layer, and curing the curable first layer to form a cured first layer having imprinted micro-channels, each with a micro-channel bottom and micro-channel walls, the micro-channel bottom having distinct first and second portions;depositing a material on the cured first layer and in each micro-channel on the micro-channel walls and on both the first and second portions of the micro-channel bottom;anisotropically etching the material to remove the deposited material from the cured first layer and the second portion of the micro-channel bottom, leaving the deposited material on the micro-channel walls;locating a curable filler material in the micro-channels between the deposited materials and on only the second portion of the micro-channel bottom and curing the curable filler material; andcuring the curable filler material.2. The method of claim 1 , further including coating the deposited material in the micro-channels with an oxide.3. The method of claim 2 , further including anisotropically etching the oxide to remove ...

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Номер записи: 95
29-08-2019 дата публикации

MOVABLE DIFFRACTION GRATING, EXTERNAL-RESONATOR LASER MODULE, AND MANUFACTURING METHOD FOR MOVABLE DIFFRACTION GRATING

Номер: US20190265396A1
Автор: Dougakiuchi Tatsuo, EDAMURA Tadataka, SUGIYAMA Atsushi
Принадлежит: HAMAMATSU PHOTONICS K.K.

A movable diffraction grating includes; a supporting portion; a movable portion which includes a first surface and is swingably connected with the supporting portion; a resin layer which is provided on the first surface and includes a diffraction grating pattern formed therein; a reflection layer which is provided on the resin layer an along the diffraction grating pattern and is formed of metal; and a stress regulation portion inducing stress on the movable portion, and the first surface is caused to bend concavely by stress. 1. A movable diffraction grating comprising:a supporting portion;a movable portion including a first surface and swingably connected with the supporting portion;a resin layer in which a diffraction grating pattern is formed, the resin layer being provided on the first surface;a reflection layer provided on the resin layer and along the diffraction grating pattern, the reflection layer being farmed of metal; anda stress regulation portion inducing stress on the movable portion, whereinthe first surface is caused to bend concavely by the stress.2. The movable diffraction grating according to claim 1 , whereinthe stress regulation portion is provided in a form of layer on a second surface that is opposed to the first surface.3. The movable diffraction grating according to claim 1 , whereinthe stress regulation portion includes a first layer provided on a second surface that is opposed to the first surface, and a second layer provided on the first layer.4. The movable diffraction grating according to claim 3 , whereineach of the first layer and the second layer is an oxide film.5. The movable diffraction grating according to claim 3 , whereinstress per unit thickness that is induced on the movable portion by the first layer is larger than stress per unit thickness that is induced on the movable portion by the second layer.6. The movable diffraction grating according to claim 1 , whereinthe diffraction grating pattern is a blazed grating pattern ...

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Номер записи: 96
15-10-2015 дата публикации

Producing microstructured spectacle lenses by means of transfer layer

Номер: US20150293376A1
Автор: Erich Koell, Ferdinand Schreder, Herber Schuster, Herbert Zinner, Karl Huber, Reiner Beck, Stephan Trumm, Werner Mueller
Принадлежит: Rodenstock GmbH

A method for producing a spectacle lens having in particular a diffractive microstructure on at least one lens surface. To this end, a thin structural support layer is initially made available, which on a surface has a microstructure. A lens main body is then cast to the microstructure of the structural support layer.

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Номер записи: 97
06-10-2016 дата публикации

GRATING SUBSTRATE AND FABRICATION METHOD THEREOF, DISPLAY DEVICE

Номер: US20160291742A1
Автор: Li Fan, LI Hongwei
Принадлежит: BOE Technology Group Co., Ltd.

A fabrication method of a grating substrate, a grating substrate and a display device are provided. The fabrication method of the grating substrate, comprises: forming an array of comb-shaped, opaque touch electrodes and a plurality of first conductive bridges () on a base substrate, wherein the array of touch electrodes includes a plurality of first touch electrodes () and a plurality of second touch electrodes () which are disconnected from each other, and the plurality of first touch electrodes () in the array are connected together via the first conductive bridges (); forming an insulating spacing layer () on the base substrate on which the array of touch electrodes and the plurality of first touch electrodes () are formed, the insulating spacing layer () covering the first conductive bridges (); forming second conductive bridges () on the insulating spacing layer (), the plurality of second touch electrodes () in the array being connected together via the second conductive bridges (). In embodiments of the present invention, the touch electrode can be used as not only a touch electrode of a touch screen but also an electrode of a 3D grating, to achieve both a touch function and a 3D light-splitting function at the same time. 1. A fabrication method of a grating substrate , comprising:forming an array of comb-shaped, opaque touch electrodes and a plurality of first conductive bridges on a base substrate, wherein the array of touch electrodes comprises a plurality of first touch electrodes and a plurality of second touch electrodes which are disconnected from each other, and the plurality of first touch electrodes in the array are connected to each other by the first conductive bridges;forming an insulating spacing layer on the base substrate on which the array of the touch electrodes and the plurality of first conductive bridges are formed, the insulating spacing layer covering the first conductive bridges; andforming second conductive bridges on the insulating ...

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Номер записи: 98
27-08-2020 дата публикации

SYSTEM AND METHOD FOR OPTIMALLY FORMING GRATINGS OF DIFFRACTED OPTICAL ELEMENTS

Номер: US20200271944A1
Автор: Evans Morgan, Kurunczi Peter, MEYER TIMMERMAN THIJSSEN Rutger, Olson Joseph
Принадлежит: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optically transparent substrate, and forming an optical grating layer on the substrate. The method includes forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled components, disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate. A first sidewall of the optical grating may have a first angle, and a second sidewall of the grating has a second angle different than the first angle. Modifying process parameters, including selectivity and beam angle spread, has an effect of changing a shape or dimension of the plurality of angled components. 1. A method of forming an optical grating component , comprising:providing a patterned hardmask atop an optical grating layer; andetching the optical grating layer and the patterned hardmask to form an optical grating in the optical grating layer, wherein first and second sidewalls of the optical grating have different angles.2. The method of claim 1 , further comprising etching the optical grating layer and the patterned hardmask to form an optical grating in the optical grating layer claim 1 , wherein the optical grating comprises a plurality of angled components disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of a substrate.3. The method of claim 2 , further comprising forming first and second sidewalls of one or more of the plurality of angled components of the optical grating at different angles.4. The method of claim 2 , wherein the etching comprises etching the optical grating layer using an angled reactive ion etch.5. The method of claim 4 , wherein the angled reactive ion etch is performed by a ribbon reactive ion beam claim 4 , wherein the substrate is scanned along a scan direction with respect to the ribbon reactive ion beam using a processing recipe claim 4 , ...

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Номер записи: 99
12-09-2019 дата публикации

METHOD OF BUILDING A 3D FUNCTIONAL OPTICAL MATERIAL LAYER STACKING STRUCTURE

Номер: US20190278005A1
Автор: ARGAMAN Naamah, BENCHER Christopher Dennis, Godet Ludovic, MCMILLAN Wayne, Visser Robert Jan, YOUNG Michael Yu-tak
Принадлежит:

Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a substrate without planarization. The method includes depositing a material stack to be patterned on a substrate, depositing and patterning a thick mask material on a portion of the material stack, etching the material stack down one level, trimming a side portion of the thick mask material, etching the material stack down one more level, repeating trim and etch steps above ‘n’ times, and stripping the thick mask material from the material stack. 1. A method for forming a sub-micron 3D optical material structure on a diffractive optics element without planarization , the method comprising:A) depositing a material stack to be patterned on a substrate;B) depositing and patterning a mask material on a portion of the material stack;C) etching the material stack down one level;D) trimming a side portion of the mask material;E) etching the material stack down one more level;F) repeating D and E ‘N’ times; andG) stripping the mask material from the material stack.2. The method of further comprising:depositing and patterning with lithography a blocking layer configured to resist an etch of the material stack.3. The method of wherein response to the patterning of the blocking material claim 2 , the method further comprises:developing the blocking layer and removing un-patterned material.4. The method of further comprising:striping the blocking layer.5. The method of further comprising:using the etched material stack as a master for imprinting an inverse shape of the etched material stack in an optical material or stack.6. The method of claim 1 , wherein the depth of the etch is about 200 nm.7. The method of claim 1 , wherein trimming a side portion of the mask material comprises:trimming a desired distance corresponding to a lateral ...

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Номер записи: 100