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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Применить Всего найдено 10151. Отображено 100.

12-01-2012 дата публикации

Exposure apparatus and device fabrication method

Номер: US20120008122A1

Автор: Ryo Sasaki, Toshiki Iwai

Принадлежит: Canon Inc

The present invention provides an exposure apparatus including an obtaining unit configured to obtain data of a first imaging position at which light from a first pattern having, as a longitudinal direction thereof, a first direction perpendicular to an optical axis of a projection optical system forms an image via the projection optical system, and data of a second imaging position at which light from a second pattern having, as a longitudinal direction thereof, a second direction which is not parallel to the first direction and is perpendicular to the optical axis forms an image via the projection optical system, when the first pattern and the second pattern are respectively placed on an object plane of the projection optical system, and a control unit configured to control a stage so that a substrate is positioned at a target position of the substrate along the optical axis.

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Номер записи: 1

19-01-2012 дата публикации

Apparatus and method for providing fluid for immersion lithography

Номер: US20120013861A1

Автор: Alex Ka Tim Poon, Leonard Wai Fung Kho

Принадлежит: Nikon Corp

An apparatus and method provide fluid for immersion lithography. A nozzle member that can move in a direction, is arranged to encircle a space under the optical element. The nozzle member can have an input to supply the immersion liquid to the space under the optical element during the exposure, and an output to remove the immersion liquid from a gap between the nozzle member and the wafer during the exposure. Immersion liquid can be supplied at a first rate to the space from a first portion of the nozzle member and at a second rate to the space from a second portion during the exposure. A wafer substrate is exposed by light through the immersion liquid.

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Номер записи: 2

19-01-2012 дата публикации

Lithographic apparatus and device manufacturing method

Номер: US20120013872A1

Автор: Joannes Theodoor De Smit, Marcel Mathijs Theodore Marie Dierichs, Theodorus Hubertus Josephus Bisschops, Theodorus Marinus Modderman, Vadim Yevgenyevich Banine

Принадлежит: ASML Netherlands BV

A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

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Номер записи: 3

09-02-2012 дата публикации

Exposure apparatus, exposure method, and device producing method

Номер: US20120033192A1

Автор: Hiroyuki Nagasaka

Принадлежит: Nikon Corp

An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism ( 10 ). The exposure apparatus (EX) has a pressure adjustment mechanism ( 90 ) for adjusting pressure of the liquid (LQ) supplied from the liquid supply mechanism ( 10 ). A liquid immersion area is satisfactorily formed to obtain high exposure accuracy and measurement accuracy.

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Номер записи: 4

23-02-2012 дата публикации

System and method for improving immersion scanner overlay performance

Номер: US20120045192A1

Автор: Chien-Hsun Lin, Chin-Hsiang Lin, Chun-Hung Lin, Heng-Hsin Liu, Jui-Cheng PENG, Shy-Jay Lin, Tzung-Chi Fu, Yao-Wen Guo

Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner comprising a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method comprises providing a water tank at at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.

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Номер записи: 5

01-03-2012 дата публикации

Method of measuring mark position and measuring apparatus

Номер: US20120050710A1

Автор: Satoru Oishi

Принадлежит: Canon Inc

A method and an apparatus are provided to measure a position of a mark with a less measurement error caused by a variation in a wafer process condition. The mark is illuminated with light and an image of the mark is formed, via an optical system, in a light receiving surface of a sensor. The image of the mark is sensed and image data thereof is acquired by the sensor. Correction data of a fundamental harmonic and a high harmonic of the image data is set based on information associated with a shape of the mark, an imaging magnification of the optical system, and an area of the sensor. The image data is corrected using the correction data, and the position of the mark is calculated using the corrected image data.

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Номер записи: 6

17-05-2012 дата публикации

Fluid handling structure, a lithographic apparatus and a device manufacturing method

Номер: US20120120376A1

Автор: Cornelius Maria Rops, David Bessems, Erik Henricus Egidius Catharina EUMMELEN, Jimmy Matheus Wilhelmus Van De Winkel, Marcus Johannes VAN DER ZANDEN, Paul Willems, Rogier Hendrikus Magdalena Cortie

Принадлежит: ASML Netherlands BV

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

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Номер записи: 7

04-10-2012 дата публикации

Lithographic apparatus and a device manufacturing method

Номер: US20120249994A1

Автор: Alexander Nikolov Zdravkov, Emilius Willem Adriaan Visser, Nina Vladimirovna DZIOMKINA

Принадлежит: ASML Netherlands BV

An immersion lithographic apparatus includes a surface having at least one active group (e.g., lyophobic group) which, during use, comes into contact with immersion liquid, and an immersion liquid supply system configured to provide immersion liquid comprising a protection component which is more reactive with a product of photoionization of the immersion liquid than the active group of the surface, the protection component being present in an amount of between 1 ppm and 0.1 ppm.

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Номер записи: 8

01-11-2012 дата публикации

Lithographic apparatus and device manufacturing method

Номер: US20120274912A1

Автор: Franciscus Johannes Joseph Janssen, Ivo Adam Johannes Thomas, Jeroen Peter Johannes Bruijstens, Marcel Beckers, Marcus Adrianus Van De Kerkhof, Siebe Landheer

Принадлежит: ASML Netherlands BV

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

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Номер записи: 9

08-11-2012 дата публикации

Multi-Method and Device with an Advanced Acousto-Optic Deflector (AOD) and a Dense Brush of Flying Spots

Номер: US20120281195A1

Автор: Torbjörn Sandström

Принадлежит: MICRONIC MYDATA AB

The technology disclosed relates to improved acousto-optic deflectors (AODs). In particular, it relates to compensation for subtle effects not previously addressed by AOD designers. A shifting center of gravity is described and addressed using advanced power equalisation strategies. Denser writing brushes are provided by using a two-dimensional array of beams with corrections for factors such as angle of incidence at the AOD interface.

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Номер записи: 10

10-01-2013 дата публикации

Lithographic apparatus and device manufacturing method

Номер: US20130010270A1

Автор: Anthonie Kuijper, Arjan Hubrecht Josef Anna MARTENS, Franciscus Joannes Anthonius Evers, Frank Johannes Jacobus Van Boxtel, Jaap Wilhelmus Petrus Van Empel, Jean-Philippe Xavier Van Damme, Jeroen Gerard Gosen, Justin Johannes Hermanus Gerritzen, Léon Hubert Joseph Coumans, Peter Schoenmakers

Принадлежит: ASML Netherlands BV

A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.

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Номер записи: 11

07-02-2013 дата публикации

Method and apparatus for driving a stage using angled actuators for pushpoint matching

Номер: US20130033122A1

Автор: Michael B. Binnard

Принадлежит: Nikon Corp

According to one aspect, an apparatus includes a stage and a first actuator. The stage has a stage center of gravity, and a first axis passes, e.g., horizontally, though the stage center of gravity. The first actuator is offset from the stage center of gravity relative to a second axis and arranged to generate a first force. The second axis is perpendicular to the first axis, and the first actuator is oriented to allow the first force to act through the stage center of gravity to drive the stage.

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Номер записи: 12

14-02-2013 дата публикации

Liquid immersion member, method for manufacturing liquid immersion member, exposure apparatus, and device manufacturing method

Номер: US20130040247A1

Автор: Yusuke Taki

Принадлежит: Nikon Corp

A liquid immersion member holds liquid between the liquid immersion member and an object such that an optical path of exposure light applied to the object is filled with the liquid, thereby forming a liquid immersion space. In the liquid immersion member, an amorphous carbon film is formed on at least a part of a region coming into contact with the liquid.

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Номер записи: 13

11-04-2013 дата публикации

Ultra-Large Size Flat Panel Display Maskless Photolithography System and Method

Номер: US20130088704A1

Автор: Lujie QU, Weichong Du, Wenhui Mei

Принадлежит: Zhongshan Aiscent Tech Inc

A maskless exposure system that has multiple maskless optical engines arranged in an (N×M) matrix that form and project a pattern onto a substrate. A first stage system is capable of driving the maskless optical engines in a first direction, a second stage system capable of holding and moving the substrate in a second direction perpendicular to the first direction. A control system that processes data and synchronizing movement of the first and second stage systems and a vision system that detects the positions of the second stage system to synchronize movements with the multiple optical engines.

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Номер записи: 14

18-04-2013 дата публикации

SUBSTRATE CONVEYANCE DEVICE AND SUBSTRATE CONVEYANCE METHOD, EXPOSURE APPARATUS AND EXPOSURE METHOD, DEVICE MANUFACTURING METHOD

Номер: US20130094006A1

Автор: HORIUCHI Takashi, OHTA Atsushi

Принадлежит:

A substrate conveyance device that conveys a substrate having been exposed with a pattern image via a projection optical system and a liquid, the substrate conveyance device comprising: a liquid detector that detects the liquid adhering on the substrate. 1. An exposure apparatus which exposes a substrate via a projection optical system and an immersion liquid , comprising:a substrate table which moves under the projection optical system while holding the substrate;an immersion system which has a liquid supply port and a liquid recovery port, the immersion liquid being supplied onto a part of the substrate via the liquid supply port and being recovered via the liquid recovery port to form a liquid immersion region onto the part of the substrate; anda liquid detecting device which detects a remaining immersion liquid onto the substrate after the substrate has been exposed via the immersion region, the remaining immersion liquid being a liquid which is not recovered via the liquid recovery port.2. The exposure apparatus according to claim 1 ,wherein the remaining immersion liquid is detected by the liquid detecting device after the substrate is unloaded from the substrate table.3. The exposure apparatus according to claim 2 ,wherein the remaining immersion liquid is detected by the liquid detecting device before the substrate is developed.4. The exposure apparatus according to claim 1 ,wherein the liquid detecting device has a detection light unit which emits a detection light, andwherein the substrate passes in a detection are of the detection light after the substrate is exposed.5. The exposure apparatus according to claim 4 ,wherein the liquid detecting device has a light receiving unit which receives the detection light.6. The exposure apparatus according to claim 1 , further comprising;a removal device which removes the remaining immersion liquid based on the detection of the liquid detecting device. This is a Continuation Application of U.S. patent application ...

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Номер записи: 15

18-04-2013 дата публикации

SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER

Номер: US20130094009A1

Автор: DZIOMKINA Nina Vladimirovna, Karade Yogesh Pramod, LAFARRE Raymond Wilhelmus Louis, RODENBURG Elisabeth Corinne, VAN DELFT PETER

Принадлежит: ASML Netherlands B.V.

A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material. 1. A substrate holder for use in a lithographic apparatus , the substrate holder comprising:a main body having a surface;a plurality of burls projecting from the surface and having end surfaces to support a substrate;a planarization layer provided on at least part of the main body surface, the planarization layer having an outer surface having a peak to valley distance of less than about 10 μm; anda thin film stack provided on the planarization layer and forming an electric component.2. The substrate holder according to claim 1 , wherein the burls have an outer surface that has been treated to repel a solvent or precursor of the planarization layer.3. The substrate holder according to claim 2 , wherein the outer surface of the burls is treated by application of a repellent substance.4. The substrate holder according to claim 3 , wherein the repellent substance is one or more selected from the group consisting of: polysilazane solution; octadecyltrichlorosilane; a methyl-terminated polymer; a siloxane; a silazane; a fluorinated material; a hydrophobic monolayer material; a silane claim 3 , a flourinated silane and/or fluoro-octyl-trichloro-silane.5. The substrate holder according to claim 1 , wherein the planarization layer comprises a first sub-layer formed on the main body and a second sub-layer formed on the first sub-layer that have been applied by applying first and second solutions of a solvate in a solvent ...

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Номер записи: 16

25-04-2013 дата публикации

FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

Номер: US20130100425A1

Автор: Riepen Michel

Принадлежит: ASML Netherlands B.V.

A fluid handling structure for a lithographic apparatus, the fluid handling structure to confine liquid to a space, the fluid handling structure having, on an undersurface surrounding the space, a liquid supply opening to supply liquid onto an undersurface of the fluid handling structure and, radially inward with respect to the space of the liquid supply opening, a two dimensional array of liquid extraction openings to extract a liquid from the space and to extract liquid on the undersurface from the liquid supply opening. 1. A fluid handling structure for a lithographic apparatus , the fluid handling structure to confine liquid to a space , the fluid handling structure having , on an undersurface surrounding the space , a liquid supply opening to supply a liquid onto an undersurface of the fluid handling structure and , radially inward with respect to the space of the liquid supply opening , a two dimensional array of liquid extraction openings to extract a liquid from the space and to extract liquid on the undersurface from the liquid supply opening.2. The fluid handling structure of claim 1 , wherein the liquid supply opening and two dimensional array of liquid extraction openings are arranged such that claim 1 , in use claim 1 , a gas gap is present between the liquid supplied on and removed from the undersurface and a surface facing the undersurface.3. The fluid handling structure of claim 1 , wherein a meniscus of the liquid provided on the undersurface is in contact with a meniscus of the liquid from the space extending between the undersurface and a surface facing the undersurface.4. The fluid handling structure of claim 1 , wherein the two dimensional array of liquid extraction openings is next to the liquid supply opening.5. The fluid handling structure of claim 1 , wherein any openings of the two dimensional array of liquid extraction openings are adjacent one another.6. The fluid handling structure of claim 1 , wherein the two dimensional array of liquid ...

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Номер записи: 17

25-04-2013 дата публикации

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Номер: US20130100430A1

Автор: HARROLD Hilary, KOCHERSPERGER Peter C., LANSBERGEN Robert Gabriël Maria, RAMIREZ David, SINHAROY Arindam, XIONG Xugang

Принадлежит: ASML Holding N.V.

An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device. 1. An apparatus , comprising:a base configured to support a patterning device configured to impart a beam of radiation with a pattern in its cross-section; andan inner cover couplable to the base, the inner cover comprising a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device.2. The apparatus of claim 1 , further comprising an outer cover couplable to the inner cover to apply the force external to the inner cover at at least one point on the inner cover.3. The apparatus of claim 1 , wherein the restraining mechanism comprises a leaf spring mechanism to convert the external force into the in-plane force.4. The apparatus of claim 3 , wherein the leaf spring mechanism comprises:a first leaf spring coupled to a first block; anda second leaf spring coupled to a second block and coupled to the first leaf spring, wherein the first block is arranged to receive the external force.5. The apparatus of claim 4 , wherein upon application of the external force claim 4 , the first block moves towards the base in a plane substantially perpendicular to the patterning surface to cause the second block to move in a plane substantially parallel to the patterning surface.6. The ...

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Номер записи: 18

09-05-2013 дата публикации

METHOD FOR IMPROVING AN OPTICAL IMAGING PROPERTY OF A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Номер: US20130114056A1

Автор: Graeupner Paul

Принадлежит: CARL ZEISS SMT GMBH

A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property. 1. (canceled)2. An exposure apparatus which exposes a substrate with an exposure light beam , comprising:a liquid immersion mechanism which forms a liquid immersion area of the liquid in an optical path of the exposure light beam; anda measuring device which measures a pattern formation state of a pattern formed through the liquid forming the liquid immersion area.3. The exposure apparatus according to claim 2 , wherein the measuring device measures an aerial image of the pattern.4. The exposure apparatus according to claim 2 , further comprising a controller which determines an exposure condition for exposing the substrate based on the pattern formation state of the pattern measured by the measuring device.5. The exposure apparatus according to claim 4 , wherein the exposure condition includes a liquid condition of the liquid.6. The exposure apparatus according to claim 2 , further comprising a controller which performs control to expose under an exposure condition determined based on a result of a measurement of a pattern formation state of a pattern formed through the liquid forming the liquid immersion area.7. The exposure apparatus of according to claim 2 , further comprising a controller which sets a liquid condition of the liquid forming ...

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Номер записи: 19

09-05-2013 дата публикации

OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION

Номер: US20130114057A1

Автор: Gellrich Bernhard, Hembacher Stefan, Holderer Hubert, Ittner Thomas, Kugler Jens, Schimitzek Karl-Heinz, Tayebati Payam

Принадлежит: CARL ZEISS SMT GMBH

An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium. 1a mask device for receiving a mask comprising a pattern;a substrate device for receiving a substrate;an immersion zone; anda projection device comprising a plurality of optical elements and a thermal attenuation device, the optical imaging device being configured so that during operation the immersion zone is at least partially filled with an immersion medium and the plurality of optical elements projects the pattern onto the substrate and the thermal attenuation device reduces fluctuations in a temperature distribution of the immersion element induced by the immersion medium,wherein the plurality of optical elements comprises an immersion element, the immersion element being the optical element closest to the substrate and adjacent to the immersion zone so that the immersion medium is located between the immersion element and the substrate, the immersion element comprising a first area and a second area where the first area is optically used during operation of the optical imaging device and the second area is optically unused during operation of the optical imaging device, the second area comprising a first ...

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Номер записи: 20

16-05-2013 дата публикации

EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS

Номер: US20130120723A1

Автор: EHRMANN Albrecht, Geuppert Bernhard, Gruner Toralf, Hoch Rainer, Kneer Bernhard, Kugler Jens, Loering Ulrich, Mallmann Joerg, Schuster Karl-Heinz, Sorg Franz, Wabra Norbert, WEGMANN Ulrich

Принадлежит: CARL ZEISS SMT GMBH

A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid. 1. An apparatus , comprising:an illumination system; a housing; and', 'a plurality of optical elements, one of the optical elements being a last optical element on an image side of the projection lens; and, 'a projection lens configured to image an object in an object plane into image plane, the projection lens comprisingan immersion liquid between the projection lens and the image plane, the immersion liquid defining an interface between the immersion liquid and a surrounding gas, the interface extending between a bottom surface of the housing and the image plane, the immersion liquid contacts the last optical element in a contact area which is planar and through which light passes during use of the apparatus;', 'the bottom surface of the housing portion surrounds the last optical element and is coplanar with the contact area; and', 'the apparatus is a microlithographic projection exposure apparatus., 'wherein2. The apparatus of claim 1 , wherein the last optical element is a plane parallel plate.3. The apparatus of claim 1 , wherein the object is reticle.4. The apparatus of claim 3 , further comprising a stage configured to hold a photosensitive material in the image plane.5. The apparatus of claim 1 , wherein the immersion liquid comprises high purity deionized ...

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Номер записи: 21

16-05-2013 дата публикации

STAGE UNIT, EXPOSURE APPARATUS, AND EXPOSURE METHOD

Номер: US20130120731A1

Автор: Shibazaki Yuichi

Принадлежит: NIKON CORPORATION

A power usage supply unit that supplies power usage to a stage which moves on a movement surface has a first axis section, first support section, a second axis section, and a second support section. The first axis section is movably supported by the first support section in a direction of the first axis and around the first axis, and the second axis section is movably supported by the second support section in a direction of the second axis and around the second axis. Using a mechanism in which the power usage supply unit has at least four degrees of freedom, the power usage supply unit does not interfere with the movement of a stage even when the stage moves in the first and second axis directions and in the rotational direction of each axis, thereby completely avoiding decrease in position controllability of the stage caused by dragging a tube. 1. A stage device comprising:a stage movably supported on a movement surface;a first drive unit that drives the stage;a counter mass that moves in an opposite direction of the stage by the reaction force caused when the first drive unit drives the stage; anda power usage supply unit that supplies power usage to the stage via the counter mass.2. The stage device of whereinthe movement surface is formed on the counter mass.3. The stage device of claim 1 , further comprising:a second drive unit that drives the counter mass.4. The stage device of whereinthe power usage supply unit comprises a movement section that moves corresponding to the movement of the stage.5. An exposure apparatus that transfers a pattern of a mask mounted on a stage device onto a substrate wherein{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a stage device according to is used as the stage device.'}6. An exposure apparatus that forms a pattern by exposing a substrate mounted on a stage device wherein{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a stage device according to is used as the stage device.'}7. A device manufacturing method that ...

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Номер записи: 22

16-05-2013 дата публикации

CYLINDRICAL MAGNETIC LEVITATION STAGE AND LITHOGRAPHY

Номер: US20130120732A1

Автор: Caraiani Mitica, Chung Sung Il, Jeon Jeong Woo, Kim Hyeon Taeg, Kim Jong Moon, Lee Chang Rin, Oh Hyeon Seok

Принадлежит: Korea Electrotechnology Research Institute

The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time. Moreover, the present invention provides an exposure apparatus, which includes a differential vacuum means combined with the cylindrical magnetic levitation stage to create a partial vacuum environment between the light source and the surface of the cylinder, and thus it is possible to employ light sources such as X-rays, electron beams, extreme ultraviolet (EUV) rays, etc. 1. A cylindrical magnetic levitation stage comprising:a cylinder operating unit for rotation and a cylinder operating unit for linear movement, which support both sides of a cylindrical mold and is rotated and linearly moved by magnetic levitation force and magnetic moving force generated by the interaction between permanent magnets and electromagnets; anda cylinder fixing unit for rotation and a cylinder fixing unit for linear movement, which are disposed at the bottom of the cylinder operating unit for rotation and the cylinder operating unit for linear movement, respectively, to support the cylindrical operating units in a non-contact manner,wherein the cylindrical mold is precisely levitated, rotated and moved in the axial direction in a non-contact manner by magnetic levitation force and magnetic rotational force generated by the interaction between an ...

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Номер записи: 23

23-05-2013 дата публикации

Exposure Apparatus and Device Manufacturing Method Having Lower Scanning Speed to Expose Peripheral Shot Area

Номер: US20130128244A1

Автор: Nagasaka Hiroyuki

Принадлежит: NIKON CORPORATION

An exposure apparatus includes a substrate stage having a substrate holder to hold a substrate, a gap being formed between an edge of the held substrate and a surface surrounding the held substrate, and a controller that controls an exposure operation in which shot areas of the substrate are exposed sequentially and respectively with an image through liquid of a liquid immersion area which covers a portion of an upper surface of the substrate. The controller moves the substrate stage at a first speed to expose one of the shot areas to the image through the liquid, moves the substrate stage at a second speed, that is lower than the first speed, to expose another one of the shot areas to the image through the liquid, and during the exposing of the another one of the shot areas, the liquid immersion area is formed over a portion of the gap. 1. An exposure apparatus comprising:a projection optical system having an optical element:a substrate stage having a substrate holder on which a substrate is held, a gap being formed between an edge of the substrate held on the substrate holder and a surface that surrounds the held substrate;a retaining member having a flow path through which a liquid flows and having an opening through which an image is projected from the projection optical system, the retaining member forming a liquid immersion area of the liquid under the projection optical system; anda controller that controls an exposure operation in which a plurality of shot areas of the substrate are exposed sequentially and respectively with the image through the liquid of the liquid immersion area which covers a portion of an upper surface of the substrate,whereinthe controller moves the substrate stage at a first speed to expose one of the shot areas of the substrate to the image through the liquid of the liquid immersion area,the controller moves the substrate stage at a second speed, that is lower than the first speed, to expose another one of the shot areas of the ...

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Номер записи: 24

23-05-2013 дата публикации

Exposure Apparatus and Device Manufacturing Method

Номер: US20130128245A1

Автор: Shibuta Makoto

Принадлежит: NIKON CORPORATION

An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member () having an upper surface (A) that guides the movement of the table (PT), and a detecting device () that detects whether there is a liquid on the upper surface (A) of the base member (). 137-. (canceled)38. An exposure apparatus that exposes a substrate via a liquid , comprising: a movable member; anda detecting device that is supported by the movable member and is configured to detect whether there is a liquid on and in contact with a predetermined member, which is other than the movable member.39. The exposure apparatus according to claim 38 , wherein the detecting device is configured to optically detect the presence of the liquid.40. The exposure apparatus according to claim 39 , wherein the detecting device is configured to detect the presence of the liquid while the movable member moves and while emitting a detecting light.41. The exposure apparatus according to claim 38 , wherein the predetermined member comprises a driving mechanism configured to move a table that is movable while holding the substrate.42. The exposure apparatus according to claim 38 , wherein the predetermined member comprises a base member having a guide surface that guides a movement of a table claim 38 , which is movable while holding the substrate.43. The exposure apparatus according to claim 38 , further comprising a first movable member and a second movable member claim 38 ,wherein the detecting device has a light projecting portion that emits a detecting light and a light receiving portion that is disposed at a predetermined position with respect to the detecting light and detects the detecting light;wherein the first movable member supports the light projecting portion and the second movable member supports ...

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Номер записи: 25

23-05-2013 дата публикации

RETICLE ASSEMBLY, A LITHOGRAPHIC APPARATUS, THE USE IN A LITHOGRAPHIC PROCESS, AND A METHOD TO PROJECT TWO OR MORE IMAGE FIELDS IN A SINGLE SCANNING MOVEMENT OF A LITHOGRAPHIC PROCESS

Номер: US20130128250A1

Автор: VAN DER VEEN Paul

Принадлежит: ASML Netherlands B.V.

A reticle assembly for use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second target portion on a substrate, the reticle assembly being arranged to hold a first reticle having the first image field and a second reticle having the second image field such that a distance between the first and second image fields substantially corresponds to a distance between the first and the second target portions. Embodiments also relate to a lithographic apparatus including the reticle assembly, the use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second portion on a substrate, of a first reticle having the first image field and a second reticle having the second image field, wherein a distance between the first and second image fields substantially corresponds to a distance between the first and second target portions. 1. A reticle assembly for use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second target portion on a substrate , the reticle assembly being arranged to hold a first reticle having the first image field and a second reticle having the second image field such that a distance between the first and second image fields substantially corresponds to a distance between the first and the second target portions.2. The reticle assembly according to claim 1 , wherein the reticle assembly is arranged such that the reticle assembly can be used in a single scanning movement of the lithographic process to project subsequently the first image field and the second image field on the first and second target portions.3. The reticle assembly according to claim 1 , wherein the distance between the first image field and the second image field is configured to project during a single scanning movement the first image field on the first target ...

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Номер записи: 26

30-05-2013 дата публикации

LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM

Номер: US20130135594A1

Автор: SATO Shinji

Принадлежит: NIKON CORPORATION

A liquid immersion member including: a first member provided in at least a portion of the surrounding of an optical member, including a first lower surface which can face an object facing the emission surface, and that forms a first immersion space of a first liquid in an optical path space on an emission surface side and at least a portion of a first space on a first lower surface side; a second member provided outside the first member with respect to the optical path, including a second lower surface which can face the object, and that forms a second immersion space of a second liquid in at least a portion of a second space on a second lower surface side; and a third member that restricts the movement of the first liquid from the first to the second space. 1. A liquid immersion member that is provided in at least a portion of a surrounding of an optical member including an emission surface from which exposure light is emitted in an immersion exposure apparatus , the member comprising:a first member that is provided in at least a portion of the surrounding of the optical member, that includes a first lower surface which can face an object facing the emission surface, and that forms a first immersion space of a first liquid in an optical path space on an emission surface side and at least a portion of a first space on a first lower surface side;a second member that is provided outside the first member with respect to the optical path, that includes a second lower surface which can face the object, and that forms a second immersion space of a second liquid in at least a portion of a second space on a second lower surface side; anda third member that restricts the movement of the first liquid from the first space to the second immersion space.2. The liquid immersion member according to claim 1 ,wherein the first liquid moved from the first space to the second immersion space is divided.3. A liquid immersion member that is provided in at least a portion of a ...

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Номер записи: 27

30-05-2013 дата публикации

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Номер: US20130135595A1

Автор: BASELMANS Johannes Jacobus Matheus, Donders Sjoerd Nicolaas Lambertus, Hoogendam Christiaan Alexander, Mertens Jeroen Johannes Sophia Maria, MULKENS Johannes Catharinus Hubertus, Streefkerk Bob

Принадлежит: ASML Netherlands B.V.

In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table. 120.-. (canceled)21. A lithographic projection apparatus comprising:a substrate table configured to hold a substrate;a projection system arranged to project a patterned beam of radiation onto the substrate;a liquid supply system configured to supply a liquid to a space between the projection system and the substrate table; anda residual liquid detector configured to detect liquid on i) the substrate when held by the substrate table, ii) the substrate table, iii) a further movable table of the lithographic apparatus, or iv) any combination selected from i) to iii), wherein the residual liquid detector comprises an alignment sensor or level sensor configured to detect the liquid.22. The apparatus of claim 21 , wherein the residual liquid detector comprises the level sensor claim 21 , the level sensor configured to measure the position of a surface in a direction substantially parallel to an optical axis of the projection system claim 21 , a tilt of a surface about an axis substantially perpendicular to the optical axis of the projection system claim 21 , or both.23. The apparatus of claim 22 , wherein detection of the liquid is effected by the level sensor giving a measurement outside a normal operating range or varying significantly from a previous measurement or reference value.24. The apparatus of claim 21 , wherein the residual liquid detector comprises the alignment sensor claim 21 , the alignment sensor configured to measure the position of a marker in a direction substantially perpendicular to an optical axis of the projection system.25. The apparatus of claim 24 , wherein detection of the liquid is effected by the alignment sensor giving a measurement outside a normal operating range or varying significantly from a previous measurement or reference value.26. The apparatus of claim 21 , wherein ...

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Номер записи: 28

30-05-2013 дата публикации

EXPOSURE APPARATUS, METHOD FOR PRODUCING DEVICE, AND METHOD FOR CONTROLLING EXPOSURE APPARATUS

Номер: US20130135597A1

Автор: KADOTA Hisatsune, Kobayashi Naoyuki, MAGOME Nobutaka, SAKAKIBARA Yasuyuki, Takaiwa Hiroaki

Принадлежит: NIKON CORPORATION

A liquid immersion exposure apparatus includes a movable member having a substrate holder and a surface disposed adjacent to the substrate holder, the surface capable of positioning under a projection optical system. A liquid immersion system has a supply path and a recovery path. The liquid immersion system supplies the liquid to a space between the projection optical system and the surface via the supply path and recovers the supplied liquid of a liquid immersion area formed under the projection optical system via the recovery path. A controller stops a supply of the liquid to the space under the projection optical system by the liquid immersion system on receipt of a signal indicating the occurrence of an abnormality. The abnormality causes a possibility of leakage due to at least a part of the supplied liquid not being recovered via the recovery path and outflowing from the liquid immersion area. 1. A liquid immersion exposure apparatus which exposes a substrate via a projection optical system and liquid , the apparatus comprising:a movable member which has a substrate holder and a surface disposed adjacent to the substrate holder, the surface capable of positioning under the projection optical system;a liquid immersion system which has a supply path and a recovery path, the liquid immersion system supplying the liquid to a space between the projection optical system and the surface via the supply path and recovering the supplied liquid of a liquid immersion area formed under the projection optical system via the recovery path; anda controller that stops a supply of the liquid to the space under the projection optical system by the liquid immersion system on receipt of a signal indicating the occurrence of an abnormality, wherein the abnormality causes a possibility of leakage due to at least a part of the supplied liquid not being recovered via the recovery path and outflowing from the liquid immersion area.2. The liquid immersion exposure apparatus according ...

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Номер записи: 29

30-05-2013 дата публикации

Two-beam interference apparatus and two-beam interference exposure system

Номер: US20130135601A1

Автор: Hakaru Mizoguchi, Junichi Fujimoto, Kouji Kakizaki, Osamu Wakabayashi, Shinji Okazaki, Takashi Matsunaga

Принадлежит: GIGAPHOTON INC

A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.

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Номер записи: 30

30-05-2013 дата публикации

METHOD OF CALCULATING AMOUNT OF FLUCTUATION OF IMAGING CHARACTERISTIC OF PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF FABRICATING DEVICE

Номер: US20130137050A1

Автор: Shigenobu Atsushi, Takahashi Rika

Принадлежит: CANON KABUSHIKI KAISHA

In a case where a substrate is exposed to exposure light of a first wavelength band, an exposure coefficient, which is defined as an amount of fluctuation of an imaging characteristic of a projection optical system per unit of exposure energy, for the first wavelength band is calculated using data of the amount of fluctuation of the optical characteristic of the projection optical system. An exposure coefficient for a second wavelength band that is different from the first wavelength band is calculated using the exposure coefficient for the first wavelength band. In a case where the substrate is exposed to exposure light of the second wavelength band, the amount of fluctuation of the imaging characteristic of the projection optical system is calculated using the exposure coefficient for the second wavelength band. 1. A method of calculating an amount of fluctuation of an imaging characteristic of a projection optical system of an exposure apparatus , the exposure apparatus irradiating a mask using light from a light source and projecting an image of a pattern of the mask onto a substrate using the projection optical system , the method comprising the steps of:calculating an exposure coefficient for a first wavelength band by using data of the amount of fluctuation of the optical characteristic of the projection optical system in a case where exposure light to which the substrate is exposed is light of the first wavelength band, the exposure coefficient being defined as the amount of fluctuation of the imaging characteristic of the projection optical system per unit of exposure energy;calculating an exposure coefficient for a second wavelength band that is different from the first wavelength band using the exposure coefficient for the first wavelength band; andcalculating the amount of fluctuation of the imaging characteristic of the projection optical system using the exposure coefficient for the second wavelength band in a case where the substrate is exposed to the ...

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Номер записи: 31

06-06-2013 дата публикации

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

Номер: US20130141701A1

Автор: HIRUKAWA Shigeru, IMAI Motokatsu, Inoue Jiro, KOHNO Hirotaka, KUDO Yoshihiko, MAGOME Nobutaka, Nagasaka Hiroyuki, Nei Masahiro, NISHII Yasufumi, OWA Soichi, SHIRAISHI Kenichi, Takaiwa Hiroaki

Принадлежит: NIKON CORPORATION

An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. 1a stage that supports the substrate on the side of the image plane of the projection optical system and that is movable relative to the projection optical system;the stage includinga support that supports a rear surface of the substrate;a peripheral wall that is disposed around the support, and that faces the rear surface of the substrate supported by the support;an upper surface that is disposed outside the peripheral wall, and that is contactable with the liquid immersion region; anda flow channel connected to an outside space of the peripheral wall so that the liquid, which is flowed into the outside space through a gap between the substrate supported by the support and the upper surface, is discharged from the outside space,the outside space is located outside of the peripheral wall relative to the support.. An exposure apparatus that exposes a substrate through a projection optical system and a liquid immersion region formed by a liquid supplied on a side of an image plane of the projection optical system, the exposure apparatus comprising: This is a continuation of U.S. patent application Ser. No. 12/232,064, filed Sep. 10, 2008, which is a division of U.S. patent application Ser. No. 11/297,324 filed Dec. 9, 2005, which in turn is a Continuation of International Application No. PCT/JP2004/008578, filed Jun. 11, 2004, which claims priority to Japanese Patent Application Nos. 2003-169904 (filed on Jun. 13, 2003), 2003-383887 (filed on Nov. 13, 2003), and 2004- ...

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Номер записи: 32

06-06-2013 дата публикации

Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine

Номер: US20130141702A1

Автор: Alex Ka Tim Poon, Daishi Tanaka, Derek Coon, Gaurav Keswani, Leonard Wai Fung Kho

Принадлежит: Nikon Corp

A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, a confinement member which encircles a portion of a path of the exposure beam, and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, the space being divided by the movable member into a first portion between the confinement member and the movable member and a second portion between the movable member and the substrate, the substrate table, or both. The movable member has a recovery outlet from which the immersion liquid in the second portion is removed.

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Номер записи: 33

06-06-2013 дата публикации

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

Номер: US20130141703A1

Автор: HIRUKAWA Shigeru, IMAI Motokatsu, Inoue Jiro, KOHNO Hirotaka, KUDO Yoshihiko, MAGOME Nobutaka, Nagasaka Hiroyuki, Nei Masahiro, NISHII Yasufumi, OWA Soichi, SHIRAISHI Kenichi, Takaiwa Hiroaki

Принадлежит: NIKON CORPORATION

An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. 1a stage that supports the substrate on the side of the image plane of the projection optical system and that is movable relative to the projection optical system;the stage includinga support that supports a rear surface of the substrate;a peripheral wall that is disposed around the support, and that faces the rear surface of the substrate supported by the support;an upper surface that is contactable with the liquid immersion region, and that is formed an opening in which the substrate supported by the support id disposed; anda flow channel connected to an outside space of the peripheral wall so that the liquid, which is flowed into the outside space through the opening, is discharged from the outside space,the outside space is located outside of the peripheral wall relative to the support.. An exposure apparatus that exposes a substrate through a projection optical system and a liquid immersion region formed by a liquid supplied on a side of an image plane of the projection optical system, the exposure apparatus comprising: This is a continuation of U.S. patent application Ser. No. 12/232,064, filed Sep. 10, 2008, which is a division of U.S. patent application Ser. No. 11/297,324 filed Dec. 9, 2005, which in turn is a Continuation of International Application No. PCT/JP2004/008578, filed Jun. 11, 2004, which claims priority to Japanese Patent Application Nos. 2003-169904 (filed on Jun. 13, 2003), 2003-383887 (filed on Nov. 13, 2003), and 2004-039654 (filed on Feb. 17, ...

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Номер записи: 34

13-06-2013 дата публикации

EXPOSURE APPARATUS

Номер: US20130148090A1

Автор: Shibuta Makoto

Принадлежит: NIKON CORPORATION

An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes a substrate holder that includes a peripheral wall portion and supporting portions located on an inside of the peripheral wall portion and that supports a substrate with the supporting portions by negatively pressurizing a space surrounded by the peripheral wall portion, and a recovery mechanism that includes a collection inlets provided on the inside of the peripheral wall portion and a vacuum system connected to the collection inlets, in which a liquid penetrated from an outer periphery of the substrate is sucked and recovered, in the state with an upper surface of the peripheral wall portion and a back surface of the substrate being spaced at a first distance. 1. An exposure apparatus which exposes a substrate via a projection optical system and a liquid , comprising:a supply port through which a liquid is supplied, the supply port supplying the liquid onto the substrate during exposure of the substrate; anda first collection port through which a part of the supplied liquid is recovered,wherein the recovered liquid flows in a channel a part of which is formed by a liquid-repellent material and is provided between the first collection port and a vacuum system.2. The exposure apparatus according to claim 1 ,wherein a liquid-repellent layer of the liquid-repellent material is provided along the channel.3. An exposure apparatus which exposes a substrate via a projection optical system and a liquid claim 1 , comprising:a substrate stage which holds the substrate;a supply port through which a liquid is supplied, the supply port supplying the liquid onto the substrate held by the substrate stage during exposure of the substrate; anda first collection port provided to the substrate stage and through which a part of the supplied liquid is recovered,wherein the recovered liquid flows in a channel provided to the substrate stage between the first ...

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Номер записи: 35

13-06-2013 дата публикации

STAGE UNIT, EXPOSURE APPARATUS, AND EXPOSURE METHOD

Номер: US20130148094A1

Автор: Shibazaki Yuichi

Принадлежит: NIKON CORPORATION

A power usage supply unit-that supplies power usage to a stage which moves on a movement surface has a first axis section, first support sections, a second axis section, and a second support section. The first axis section is movably supported by the first support section in a direction of the first axis and around the first axis, and the second axis section is movably supported by the second support section in a direction of the second axis and around the second axis. And, by employing a mechanism in which the power usage supply unit has at least four degrees of freedom, the power usage supply unit does not interfere with the movement of a stage even when the stage moves in the first and second axis directions and in the rotational direction of each axis, therefore, decrease in position controllability of the stage caused by dragging a tube can be completely avoided. 1. A stage apparatus comprising;a base member that has a flat surface;a moving member that moves above the flat surface;a power usage supply device that has a first member, which moves above the flat surface along with the movement of the moving member, and a second member, which is arranged between the first member and the moving member and is used for supplying power usage to the moving member,wherein the base member supports the first member in a non-contact manner with respect to the flat surface, andwherein the second member allows a change of a positional relationship between the moving member and the first member.2. The stage apparatus according to claim 1 ,wherein the base member supports the moving member in a non-contact manner with respect to the flat surface.3. The stage apparatus according to claim 2 ,wherein the moving member is supported with an air bearing that is formed between the moving member and the flat surface.4. The stage apparatus according to claim 3 ,wherein the power usage supply device is supported with the air bearing in a non-contact manner with respect to the flat ...

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Номер записи: 36

13-06-2013 дата публикации

METHOD OF MANUFACTURING DEVICE, AND SUBSTRATE

Номер: US20130148122A1

Автор: Ina Hideki, OGAWA Shigeki, Sentoku Koichi

Принадлежит: CANON KABUSHIKI KAISHA

A method includes a first step of forming a circuit pattern and an alignment mark on a substrate and a second step of measuring a position of the alignment mark and positioning the substrate. The alignment mark includes a first linear pattern arranged on one side of a first straight line, a second linear pattern arranged on the other side of the first straight line, a third linear pattern arranged on one side of a second straight line, and a fourth linear pattern arranged on the other side of the second straight line. The first step includes determining total number of the third and fourth linear patterns to be formed and total number of the first and second linear patterns to be formed based on required precisions in directions along the first and second straight lines. 1. A method of manufacturing a device , the method comprising:a first step of forming a circuit pattern and an alignment mark on a substrate; anda second step of measuring a position of the alignment mark, positioning the substrate based on the measured position, and forming a circuit pattern on the positioned substrate,wherein the alignment mark includes a first linear pattern arranged on one side of and parallel to a first straight line, a second linear pattern arranged on the other side of and parallel to the first straight line, a third linear pattern arranged on one side of and parallel to a second straight of which a direction is different from a direction of the first straight line, and a fourth linear pattern arranged on the other side of and parallel to the second straight line,the first step includes a determination step of determining total number of the third linear patterns and the fourth linear patterns to be formed, and total number of the first linear patterns and the second linear patterns to be formed, in accordance with a first required alignment precision in a direction along the first straight line, and a second required alignment precision in a direction along the second ...

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Номер записи: 37

20-06-2013 дата публикации

WORK STAGE OF EXPOSING APPARATUS, EXPOSING METHOD AND METHOD OF MANUFACTURING A STRUCTURE

Номер: US20130155382A1

Автор: INOUE Eriko

Принадлежит:

At a time of aligning a thin plate-shaped work of which both front and rear surfaces are subjected to work, a deflection caused at a central portion of the thin plate-shaped work is corrected and the thin plate-shaped work is controlled to be parallel state with respect to a photomask. 1. An exposing method comprising the steps of:supporting a peripheral portion of a thin plate-shaped workpiece of which both front and rear surfaces are subjected to work is supported by a supporting portion of a workpiece stage provided to an exposing apparatus;facing the thin plate-shaped work, supported by the supporting portion, closely to a photomask through an alignment gap;correcting a deflection of a plate-shaped work, caused at a central portion of the thin plate-shaped work supported by the supporting portion, by a flowing fluid into a hollow portion formed at an inside the supporting portion between inside and outside of the hollow portion;adjusting a position of the thin plate-shaped work having a peripheral portion supported by the supporting portion and a position of the photomask so as to align both the position;blasting the fluid to a peripheral surface of the work from the supporting portion side to thereby separate the workpiece from the supporting portion and closely contact the peripheral portion of the work to the photomask, and introducing a pressure of the fluid higher that in an alignment operation to urge the central portion of the work against the photomask to thereby correct deflection for the workpiece; andexposing the thin plate-shaped workpiece with light irradiated from upper side of the photomask.2. The exposing method according to claim 1 , wherein the supporting step is performed such that the peripheral portion of the thin plate-shaped work is sucked to the supporting portion by a vacuum-sucking device thereby to support the peripheral portion.3. A method of manufacturing a structure in which the structure is manufactured by using the thin plate- ...

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Номер записи: 38

20-06-2013 дата публикации

Diffraction Based Overlay Metrology Tool and Method of Diffraction Based Overlay Metrology

Номер: US20130155406A1

Автор: Den Boef Arie Jeffrey

Принадлежит: ASML Netherlands B.V.

Systems, methods, and apparatus are provided for determining overlay of a pattern on a substrate with a mask pattern defined in a resist layer on top of the pattern on the substrate. A first grating is provided under a second grating, each having substantially identical pitch to the other, together forming a composite grating. A first illumination beam is provided under an angle of incidence along a first horizontal direction. The intensity of a diffracted beam from the composite grating is measured. A second illumination beam is provided under the angle of incidence along a second horizontal direction. The second horizontal direction is opposite to the first horizontal direction. The intensity of the diffracted beam from the composite grating is measured. The difference between the diffracted beam from the first illumination beam and the diffracted beam from the second illumination beam, linearly scaled, results in the overlay error. 1. A method comprising:providing a first illumination beam having a first asymmetrical illumination mode for illuminating a composite grating under a first angle of incidence, the composite grating comprising first and second superimposed gratings with similar pitch on a surface of a substrate, and the substrate being in a fixed position;measuring, at an image plane, a first intensity of a diffracted beam from the composite grating;providing a second illumination beam having a second asymmetrical illumination mode for illuminating the composite grating under a second angle of incidence, wherein a horizontal directional component of the second illumination beam is opposite to a horizontal directional component of the first illumination beam along the surface of the substrate, the substrate being in the fixed position; andmeasuring a second intensity of a diffracted beam from the composite grating at the image plane.2. The method according to claim 1 , further comprising:determining an intensity difference between the first intensity and ...

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Номер записи: 39

27-06-2013 дата публикации

Inspection Method and Apparatus, and Lithographic Apparatus

Номер: US20130162996A1

Автор: BLEEKER Arno Jan, Straaijer Alexander

Принадлежит: ASML Netherlands B.V.

An inspection method reflects radiation with a known polarization beam off a periodic structure, such as a grating. The reflected radiation beam is split into first and second orthogonally polarized sub-beams. The phase of the first sub-beams is shifted with respect to the second sub-beam. A first image resultant from the first sub-beam and a second image resultant from the second sub-beam are simultaneously detected. A difference in intensity values is used to derived from the detected first and second images together to determine an overlay error in the periodic structure. 1. An inspection method comprising:reflecting a radiation beam with a known polarization off a periodic structure on a substrate, the periodic structure having been formed by a lithographic process;splitting the reflected radiation beam into first and second orthogonally polarized sub-beams;shifting the phase of the first sub-beams with respect to the second sub-beam;substantially simultaneously detecting a first image resultant from the first sub-beam and a second image resultant from the second sub-beam;using a difference in intensity values derived from the detected first and second images together to determine an overlay error in the periodic structure.2. The method of claim 1 , wherein the at least one periodic structure has been formed with a predetermined alignment bias between successive layers in addition to the overlay error claim 1 , and images are determined for at least two of the periodic structures claim 1 , each having a predetermined alignment bias that is equal in magnitude but opposite in direction to the other.3. The method of claim 2 , wherein the overlay error is determined by measuring the asymmetry in the images determined from the periodic structures.4. The method of claim 1 , wherein the images are pupil plane images.5. The method of claim 1 , wherein the images are image-plane images.6. The method of claim 1 , wherein:the first image is formed using a first part of non ...

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Номер записи: 40

04-07-2013 дата публикации

EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM

Номер: US20130169944A1

Автор: Nagasaka Hiroyuki, NISHII Yasufumi, ONDA Minoru, SATO Shinji

Принадлежит: NIKON CORPORATION

An exposure apparatus that exposes a substrate with exposure light through a first liquid. The exposure apparatus includes: an optical member that has an emission surface which emits the exposure light; a first member that forms a first liquid immersion space of the first liquid in at least a part of a first space under the first lower surface and an optical path space including an optical path of the exposure light from the emission surface; and a second member that forms a second liquid immersion space of a second liquid, the second member being capable of moving in a state where the second liquid immersion space is formed separated from the first liquid immersion space. 1. An exposure apparatus that exposes a substrate with exposure light through a first liquid , the exposure apparatus comprising:an optical member that has an emission surface which emits the exposure light;a first member that is disposed at at least a part of a surrounding of the optical member and forms a first liquid immersion space of the first liquid, the first member having a first lower surface to which an object can be opposed, the object being capable of moving to a position opposed to the emission surface, the first liquid immersion space being formed in at least a part of a first space under the first lower surface and an optical path space including an optical path of the exposure light from the emission surface; anda second member that is disposed outside the first member with respect to the optical path and forms a second liquid immersion space of a second liquid, the second member having a second lower surface to which the object can be opposed, the second liquid immersion space being formed in at least a second space under the second lower surface, the second member being capable of moving in a state where the second liquid immersion space is formed separated from the first liquid immersion space.2. The exposure apparatus according to claim 1 , wherein the second member is moved ...

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Номер записи: 41

04-07-2013 дата публикации

LITHOGRAPHY MACHINE AND SCANNING AND EXPOSING METHOD THEREOF

Номер: US20130169946A1

Автор: "HAO Jingan", GU YIMING, Li Tianhui, Liu Chang, SHU Qiang, Wu Qiang, YAO Xin

Принадлежит: SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORP.

The present disclosure provides a lithography machine and a scanning and exposing method thereof. According to the scanning and exposing method, the scanning and exposing process for a whole wafer includes two alternately circulated motions: a scanning and exposing motion and a stepping motion; and the scanning and exposing motion is a sinusoidal motion rather than a rapid-acceleration uniform-speed rapid-deceleration scanning and exposing motion in the conventional techniques. During the scanning of a single exposure shot, it may begin to scan the exposure shot once a wafer stage and a reticle stage begin to accelerate from zero speed. And the scanning and exposing may not end until the speeds of the wafer stage and the reticle decrease to zero. Therefore, the effective time of the scanning and exposing in the scanning and exposing motion is greatly increased and the production efficiency of the wafer is improved. 1. A scanning and exposing method for a lithography machine containing a wafer stage carrying a wafer to be exposed and a reticle stage carrying a reticle mask , a region on the wafer to be exposed being divided into two or more exposure shots , the method comprising:stepping the wafer stage to a first exposure shot;moving the wafer stage and the reticle stage synchronously in opposite directions respectively for scanning and exposing the first exposure shot,wherein, during the scanning and exposing of the first exposure shot, the speed curves of the wafer stage and the reticle stage are sinusoidal curves, and magnitudes of the speeds of the wafer stage and the reticle stage gradually increase from zero to maximum values and then decrease to zero respectively, and the ratio of the magnitude of the speed of the wafer stage to the magnitude of the speed of the reticle stage is equal to a ratio of a size of a pattern finally is formed on the wafer to a size of a pattern of the reticle mask.2. The scanning and exposing method according to claim 1 , wherein ...

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Номер записи: 42

11-07-2013 дата публикации

OPTOFLUIDIC LITHOGRAPHY SYSTEM, METHOD OF MANUFACTURING TWO-LAYERED MICROFLUID CHANNEL, AND METHOD OF MANUFACTURING THREE-DIMENSIONAL MICROSTRUCTURES

Номер: US20130176543A1

Автор: CHUNG Su Eun, Kwon Sunghoon, Lee Seungah, PARK Wook

Принадлежит: SNU R&DB FOUNDATION

An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof. 123-. (canceled)24. An optofluidic lithography system comprising:a membrane;a pneumatic chamber, the pneumatic chamber configured to induce the displacement of the membrane depending on an internal atmospheric pressure thereof; anda microfluidic channel adjacent the membrane and outside the pneumatic chamber, the microfluidic channel having a height corresponding to a displacement of the membrane and having a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure.25. The optofluidic lithography system according to claim 24 , wherein the membrane is formed of polydimethylsiloxane.26. The optofluidic lithography system according to claim 24 , wherein the fluid is photocurable.27. The optofluidic lithography system according to claim 24 , wherein the pneumatic chamber is connected to an air injection pump capable of introducing air to and discharging air from the pneumatic chamber.28. The optofluidic lithography system according to further comprising:an injection tube through which the fluid is injected into the microfluidic channel; anda discharge tube through which the fluid is discharged from the microfluidic channel.29. The optofluidic lithography system according to claim 24 , further comprising:a light source configured to generate light capable of curing the fluid flowing in the microfluidic channel; anda spatial light modulator configured to modulate the light provided from the light ...

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Номер записи: 43

18-07-2013 дата публикации

EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE

Номер: US20130182232A1

Автор: HIRUKAWA Shigeru

Принадлежит: NIKON CORPORATION

An exposure apparatus and method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid. A projection optical system projects the image of the pattern onto the substrate. A recovery port recovers the liquid supplied onto the substrate. A temperature sensor measures a temperature of the liquid recovered via the recovery port. 1. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid , the exposure apparatus comprising:a projection optical system which projects the image of the pattern onto the substrate;a recovery port which recovers the liquid supplied onto the substrate; anda temperature sensor which measures a temperature of the liquid recovered via the recovery port.2. The exposure apparatus according to claim 1 , further comprising a recovery tube which is connected to the recovery port and in which the temperature sensor is arranged.3. The exposure apparatus according to claim 1 , further comprising a supply port which supplies the liquid onto the substrate claim 1 , wherein a temperature of the liquid to be supplied from the supply port is adjusted on the basis of a result of a measurement performed by the temperature sensor.4. The exposure apparatus according to claim 1 , further comprising a supply port which supplies the liquid onto the substrate claim 1 , wherein a supply amount of the liquid supplied from the supply port per a unit of time is adjusted on the basis of a result of a measurement performed by the temperature sensor.5. The exposure apparatus according to claim 1 , wherein a projection state of the projection optical system is adjusted on the basis of a result of a measurement performed by the temperature sensor.6. The exposure apparatus according to claim 5 , further comprising a substrate stage which is movable while holding the substrate claim 5 , wherein the adjustment of the projection state includes controlling a movement of the substrate ...

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Номер записи: 44

18-07-2013 дата публикации

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

Номер: US20130182233A1

Автор: HARA Hideaki

Принадлежит: NIKON CORPORATION

An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure apparatus is provided with a nozzle member having a supply outlet that supplies a liquid and a collection inlet that collects a liquid, and a vibration isolating mechanism that supports the nozzle member and vibrationally isolates the nozzle member from a lower side step part of a main column . 1. An exposure apparatus comprising:a projection system having an optical element via which an exposure beam is projected, the exposure beam from the projection system being projected onto a substrate;a nozzle member having an opening through which the exposure beam is projected, the nozzle member having a liquid supply outlet, or a liquid collection inlet or both of the liquid supply outlet and the liquid collection inlet, the nozzle member being supported with 6 degree of freedom; anda drive apparatus having a motor, that moves the nozzle member.2. The exposure apparatus according to claim 1 , wherein the drive apparatus moves the nozzle member in a direction parallel to an optical axis direction of the projection system.3. The exposure apparatus according to claim 1 , wherein the drive apparatus moves the nozzle member in a rotation direction around an axis which is vertical to the optical axis of the projection system.4. The exposure apparatus according to claim 1 , wherein the drive apparatus moves the nozzle member in a direction vertical to the optical axis of the projection system.5. The exposure apparatus according to claim 1 , wherein the drive apparatus rotates the nozzle member around an axis parallel to the optical axis of the projection system.6. The exposure apparatus according to claim 1 , wherein the drive apparatus moves the nozzle member by a Lorentz force. This is a Continuation of Application No. Ser. 12/382,229 filed Mar. 11, 2009, which in turn is a Division of ...

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Номер записи: 45

18-07-2013 дата публикации

MEASUREMENT SYSTEM THAT INCLUDES AN ENCODER AND AN INTERFEROMETER

Номер: US20130182235A1

Автор: Chang Ping-Wei, Chau Henry Kwok Pang, Okutomi Akira, Yuan Bausan

Принадлежит: NIKON CORPORATION

A stage assembly () for positioning a device () along a first axis includes (i) a stage () that retains the device (); (ii) a mover assembly () that moves the stage () along the first axis; (iii) an interferometer (), (iv) an encoder (), and (v) a control system (). The interferometer () monitors the movement of the stage () along the first axis, the interferometer () generating an interferometer signal that relates to the movement of the stage () along the first axis. The encoder () monitors the movement of the stage () along the first axis, the encoder () generating an encoder signal that relates to the movement of the stage () along the first axis. The control system () utilizes both the encoder signal and the interferometer signal to control the mover assembly (). 1. A stage assembly for positioning a device along a first axis , the stage assembly comprising:a stage that is adapted to retain the device;a mover assembly that moves the stage along the first axis;an interferometer that monitors the movement of the stage along the first axis, the interferometer generating an interferometer signal that relates to the movement of the stage along the first axis;an encoder that monitors the movement of the stage along the first axis, the encoder generating an encoder signal that relates to the movement of the stage along the first axis; anda control system that utilizes both the encoder signal and the interferometer signal in the control of the mover assembly to move the stage along the first axis.2. The stage assembly of wherein the control system utilizes the interferometer signal to determine a non-linearity offset in encoder signal during operation of the stage assembly.3. The stage assembly of wherein the control system utilizes the encoder signal corrected with the non-linearity offset to control the mover assembly.4. An exposure apparatus including an illumination source claim 2 , a reticle stage assembly claim 2 , and the stage assembly of that moves the stage ...

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Номер записи: 46

25-07-2013 дата публикации

RESIST COATING AND DEVELOPING APPARATUS, RESIST COATING AND DEVELOPING METHOD, RESIST-FILM PROCESSING APPARATUS, AND RESIST-FILM PROCESSING METHOD

Номер: US20130188158A1

Автор: INATOMI Yuichiro

Принадлежит: TOKYO ELECTRON LIMITED

The present invention provides a resist coating and developing apparatus, a resist coating and developing method, a resist-film processing apparatus, and a resist-film processing method, capable of reducing a line width roughness by planarizing a resist pattern. The resist coating and developing apparatus comprises: a resist-film forming part configured to coat a resist onto a substrate to form a resist film thereon; a resist developing part configured to develop the exposed resist film to obtain a patterned resist film; and a solvent-gas supply part configured to expose the resist film, which has been developed and patterned by the resist developing part, to a first solvent of a gaseous atmosphere having a solubility to the resist film. A solvent supply part supplies, to the resist film which has been exposed to the first solvent, a second solvent in a liquid state having a solubility to the resist film. 1. A resist coating and developing apparatus comprising:a resist-film forming part configured to coat a resist onto a substrate to form a resist film thereon;a resist developing part configured to develop the exposed resist film to obtain a patterned resist film;a solvent-gas supply part configured to expose the resist film, which has been developed and patterned by the resist developing part, to a first solvent of a gaseous atmosphere having a solubility to the resist film; anda solvent supply part configured to supply to the resist film which has been exposed to the first solvent, a second solvent in a liquid state having a solubility to the resist film,wherein a solubility of the second solvent to a part of the resist film which has absorbed the first solvent so that the part is dissolved by the first solvent and becomes swollen, is higher than a solubility of the second solvent to a part which does not absorb the first solvent.2. The resist coating and developing apparatus according to claim 1 , further comprising a housing in which the solvent-gas supply part ...

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Номер записи: 47

25-07-2013 дата публикации

LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

Номер: US20130188159A1

Автор: Shibazaki Yuichi

Принадлежит: NIKON CORPORATION

A liquid immersion member forms a liquid immersion space between the member and a movable object such that an optical path of exposure light is filled with liquid. The liquid immersion member includes: a first plate that is disposed at least partially around the optical path; a second plate that is disposed at least partially around the optical path, and has an upper surface, opposed to at least a part of a lower surface of the first plate, and a lower surface which can be opposed to the object; and a collection port that is disposed outside the first plate with respect to the optical path, can be at least partially opposed to the object, and collects at least some of the liquid from a first space, which the upper surface of the second plate faces, and a second space which the lower surface of the second plate faces. 1. A liquid immersion member that forms a liquid immersion space between said member and a movable object such that an optical path of exposure light is filled with liquid , the liquid immersion member comprising:a first plate that is disposed at least partially around the optical path;a second plate that is disposed at least partially around the optical path, and has an upper surface, which is opposed to at least a part of a lower surface of the first plate, and a lower surface, which can be opposed to the object; anda collection port that is disposed outside the first plate with respect to the optical path, can be at least partially opposed to the object, and collects at least some of the liquid from a first space, which the upper surface of the second plate faces, and a second space which the lower surface of the second plate faces.2. The liquid immersion member according to claim 1 , wherein at least a part of the collection port is disposed outside the second plate in a radiation direction of the optical path.3. The liquid immersion member according to claim 1 , wherein the collection port collects at least a part of the liquid from the second ...

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Номер записи: 48

25-07-2013 дата публикации

LIQUID CRYSTAL DISPLAY DEVICE TREATED BY UV IRRADIATION

Номер: US20130189626A1

Автор: Chida Hideo, Tasaka Yasutoshi, Yoshida Hidefumi

Принадлежит: SHARP KABUSHIKI KAISHA

A liquid crystal display device includes a pair of substrates, a liquid crystal between substrates and alignment layers disposed on the inner surface sides of the substrates. The alignment layer is made from a material including polyamic acid containing a diamine component and polyimide containing a diamine component different from the diamine component of the polyamic acid. The alignment layer is subjected to alignment treatment by irradiation of light. UV light can be irradiated in the oblique direction onto the alignment layer through a mask having openings. A reflecting plate can be arranged between a UV light source and the mask. Also, bank structures having a thickness from 0.1 to 0.15 μm can be provided on the alignment layer of the TFT substrate. 1disposing a photomask above said alignment layer;positioning said photomask so that a center portion of a first opening of said photomask is aligned with a center portion of a first pixel region of said alignment layer;disposing an ultraviolet light source obliquely above said photomask at a first position;conducting a first exposure by irradiating ultraviolet light from said ultraviolet light source at said first position;disposing, at a second position, said ultraviolet light source obliquely and symmetrically to said ultraviolet light source at said first position above said photomask; andconducting a second exposure by irradiating ultraviolet light from said ultraviolet light source at said second position;wherein a width of a non-exposed region between two regions exposed by said first exposure and said second exposure is not greater than 20 μm or a width of an overlapping exposed region of two regions exposed by said first exposure and said second exposure is not greater than 20 μm.. A method of treating an alignment layer, on which a plurality of pixel regions are defined, for conducting an alignment treatment of said alignment layer by irradiating ultraviolet light onto said alignment layer, said method ...

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Номер записи: 49

08-08-2013 дата публикации

EXPOSURE METHOD, EXPOSURE APPARATUS AND CLEANING METHOD

Номер: US20130201460A1

Автор: TANI Yasuhisa

Принадлежит: NIKON CORPORATION

There is provided an exposure method for exposing a substrate by using an immersion exposure apparatus provided with a water-repellent area which has a water repellent film and which is at least a part of an area configured to make contact with a liquid so as to irradiate an exposure light onto the substrate via the liquid, the exposure method including: a measuring step of performing a measurement via the liquid with respect to at least a part of the water-repellent area having the water repellent film; and an exposure step of irradiating the exposure light onto the substrate via the liquid. In the measuring step and/or the exposure step, oxidation-reduction potential of the liquid is controlled to a predetermined value. 1. An exposure method for exposing a substrate by using an immersion exposure apparatus provided with a water-repellent area which has a water repellent film therein and which is at least a part of an area configured to make contact with a liquid so as to irradiate an exposure light onto the substrate via the liquid , the exposure method comprising:a measuring step of performing a measurement via the liquid with respect to at least a part of the water-repellent area having the water repellent film; andan exposure step of irradiating the exposure light onto the substrate via the liquid,wherein in the measuring step and/or the exposure step, oxidation-reduction potential of the liquid is controlled to a predetermined value.2. The exposure method according to claim 1 , further comprising a cleaning step of cleaning the water-repellent area having the water repellent film by using the liquid.3. The exposure method according to claim 1 , wherein the oxidation-reduction potential of the liquid used in the measuring step is controlled to be lower than the oxidation-reduction potential of the liquid used in the exposure step.4. The exposure method according to claim 2 , wherein the oxidation-reduction potential of the liquid used in the measuring step is ...

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Номер записи: 50

05-09-2013 дата публикации

EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

Номер: US20130229637A1

Автор: EBIHARA Akimitsu

Принадлежит: NIKON CORPORATION

An exposure apparatus and method exposes a substrate via a projection optical system and a liquid. A liquid immersion system supplies liquid to form a liquid immersion region below the projection optical system. First and second tables each can mount a substrate. A drive system drives the first and second tables, which are positionable below the projection optical system. The drive system is controlled to move the first and second tables below the projection optical system relative to the liquid immersion region to replace one of the first and second tables positioned below the projection optical system with the other of the first and second tables such that the liquid immersion region is transferred from the one of the first and second tables to the other of the first and second tables while the liquid immersion region is maintained below and in contact with the projection optical system. 1. An exposure apparatus that exposes a substrate via a projection optical system and a liquid , the apparatus comprising:a liquid immersion system that supplies the liquid to form a liquid immersion region below the projection optical system;a first table on which a substrate is mountable;a second table on which a substrate is mountable;a drive system that drives the first and second tables, the first and second tables each being positionable below the projection optical system by the drive system; anda controller configured to control the drive system to move the first and second tables below the projection optical system relative to the liquid immersion region to replace one of the first and second tables positioned below the projection optical system with the other of the first and second tables such that the liquid immersion region is transferred from the one of the first and second tables to the other of the first and second tables while the liquid immersion region is maintained below and in contact with the projection optical system.2. The exposure apparatus according to ...

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Номер записи: 51

12-09-2013 дата публикации

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Номер: US20130235358A1

Автор: Derksen Antonius Theodorus Anna Maria, Donders Sjoerd Nicolaas Lambertus, Hoogendam Christiaan Alexander, JANSEN Hans, LOF Joeri, Loopstra Erik Roelof, MULKENS Johannes Catharinus Hubertus, Straaijer Alexander, Streefkerk Bob, Verspay Jacobus Johannus Leonardus Hendricus

Принадлежит: ASML Netherlands B.V.

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate. 1. A lithographic projection apparatus comprising:a substrate table by which a substrate is held;a projection system by which a patterned beam is projected onto a target portion of the substrate, liquid being provided to a space between the projection system and the substrate; anda member having a first side and a second side opposite from the first side, the member being removably positionable adjacent to the projection system between the projection system and the substrate table so that the first side faces the projection system and the second side faces the substrate table to isolate the space provided with the liquid which contacts the first side of the member from a second space located on the second side of the member, wherein the member is separable from the substrate table and the projection system.2. The apparatus according to claim 1 , wherein the member is positionable opposite the projection system such that liquid can be confined between the projection system and the member.3. The apparatus according to claim 1 , wherein the member is releasably connectable to an object in the apparatus.4. The apparatus according to claim 3 , further comprising a vacuum-clamp by which the member is releasably connectable to the object.5. A lithographic projection apparatus comprising:a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation ...

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Номер записи: 52

12-09-2013 дата публикации

MAINTENANCE METHOD, MAINTENANCE DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

Номер: US20130235359A1

Автор: FUJIWARA Tomoharu, NISHII Yasufumi, SHIRAISHI Kenichi

Принадлежит: NIKON CORPORATION

An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned. 1. A maintenance method for a liquid immersion exposure apparatus in which a substrate is exposed through water during an exposure operation , the method comprising:cleaning a nozzle member with a cleaning liquid during a cleaning operation;after cleaning the nozzle member with the cleaning liquid, supplying water from a supply opening of the nozzle member and collecting the supplied water via a collection opening of the nozzle member; andmeasuring at least either a property or a constituent of the water collected via the collection opening of the nozzle member.2. The method of claim 1 , wherein a result of the cleaning operation is judged based on the measurement result.3. The method of claim 1 , wherein the at least either the property or the constituent of the collected water includes total organic carbon.4. The method of claim 1 , wherein the at least either the property or the constituent of the collected water is measured by a measuring instrument which includes a particle counter.5. The method of claim 1 , wherein the nozzle member is cleaned with the cleaning liquid while the nozzle member is supported by the liquid immersion exposure apparatus.6. The method of claim 1 , wherein the nozzle member is cleaned with the cleaning liquid while the nozzle member is detached from the liquid immersion exposure apparatus.7. The method according to claim 5 , whereinthe liquid immersion exposure apparatus has a supporting system that supports the nozzle member, andthe nozzle member is cleaned in a state such that the nozzle member is supported by the supporting system.8. The method of further comprising placing a container under the nozzle member claim 1 , wherein the cleaning liquid is disposed in ...

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Номер записи: 53

26-09-2013 дата публикации

EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

Номер: US20130250257A1

Автор: EBIHARA Akimitsu

Принадлежит: NIKON CORPORATION

Exposure apparatus and methods expose a substrate with an energy beam via a projection optical system and has first and second tables on each of which a substrate is mountable. A mark detection system is arranged in a second area different from a first area in which the projection optical system is arranged. A substrate mounted on one of the first and second tables is moved in the first area while the one table is held by a first movable member. A substrate mounted on another of the first and second tables is moved in the second area while the another table is held by a second movable member. The tables held by the first and second movable members are driven so that the another table is moved from the second to the first movable member to be held in place of the one table. 1. An exposure apparatus that exposes a substrate with an energy beam via a projection optical system , the apparatus comprising:first and second tables on each of which a substrate is mountable;a mark detection system that is arranged in a second area, which is different from a first area in which the projection optical system is arranged, and that is configured to detect a mark on the substrate held by either of the first and second tables;a drive system that has a first movable member that moves in the first area, and a second movable member that moves in the second area, and that moves a substrate mounted on one table of the first and second tables in the first area while the one table is held by the first movable member, and that moves a substrate mounted on another table of the first and second tables in the second area while the another table is held by the second movable member; anda controller that controls the drive system to drive the one table held by the first movable member and to drive the another table held by the second movable member so that the another table is moved from the second movable member to the first movable member so that the another table is held by the first movable ...

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Номер записи: 54

26-09-2013 дата публикации

EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE

Номер: US20130250258A1

Автор: Nagasaka Hiroyuki

Принадлежит: NIKON CORPORATION

A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space. 1. A liquid immersion exposure apparatus that exposes a substrate via a projection optical system and a liquid , the apparatus comprising:a liquid immersion member provided surrounding an optical element of the projection optical system and configured to form, with the liquid, a liquid immersion area below the projection optical system, the optical element being arranged to be in contact with the liquid;a substrate stage having a holder to hold the substrate, the substrate stage being configured to move below the projection optical system such that the substrate is relatively moved with respect to the liquid immersion area that is maintained between the projection optical system and a portion of the substrate; anda driving system having an electromagnetic motor of which a portion is provided in the substrate stage, the driving system being configured to drive the substrate stage, in the relative movement, at least one of a velocity and an acceleration that are determined based on information about a contact angle between the substrate and the liquid of the liquid immersion area.2. The liquid immersion exposure apparatus according to claim 1 , further comprising:a controller configured to control the driving system to drive the substrate stage based on at least the one of the velocity and the acceleration that are determined.3. The liquid immersion exposure apparatus according to claim 2 , whereinthe substrate stage is ...

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Номер записи: 55

26-09-2013 дата публикации

EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE

Номер: US20130250259A1

Автор: Nagasaka Hiroyuki

Принадлежит: NIKON CORPORATION

A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space. 1determining a liquid immersion condition for the substrate depending on a film formed as a liquid contact surface of the substrate; andexposing the substrate under the determined liquid immersion condition.. An exposure method for exposing a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure method comprising: This application is a Continuation of U.S. patent application Ser. No. 12/222,029 filed Jul. 31, 2008, which in turn is a Division of U.S. patent application Ser. No. 11/283,724 filed Nov. 22, 2005 and issued as U.S. Pat. No. 7,495,744, which in turn is a Continuation of International Application No. PCT/JP2004/007415 filed May 24, 2004 claiming the conventional priority of Japanese patent Application No. 2003-146424 filed on May 23, 2003. The disclosure of each of these prior applications is incorporated herein by reference in its entirety.1. Field of the InventionThe present invention relates to an exposure method, an exposure apparatus, and a method for producing a device in which a substrate is exposed by projecting an image of a pattern onto the substrate via a projection optical system and a liquid.2. Description of the Related ArtSemiconductor devices and liquid crystal display devices are produced by means of the so-called photolithography technique in which a pattern formed on a mask is transferred onto a photosensitive substrate. The exposure apparatus, which ...

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Номер записи: 56

26-09-2013 дата публикации

Stage assembly with secure device holder

Номер: US20130250271A1

Автор: Alton H. Phillips, Fardad Hashemi, Takeshi Matsuda

Принадлежит: Nikon Corp

A stage assembly ( 10 ) that moves a device ( 22 ) includes a device holder ( 20 ) that selectively retains the device ( 22 ). The device holder ( 20 ) includes a pivot ( 330 ) that engages the device ( 22 ), and a pressure source ( 326 ) that creates (i) a pressure controlled, distal zone ( 336 A) that is at a distal pressure, and (ii) a pressure controlled, proximal zone ( 338 A) that is at a proximal pressure. The distal zone ( 336 A) generates a distal moment ( 344 A) and the proximal zone ( 336 B) generates a proximal moment ( 346 A) that can be used to control the shape of the device ( 22 ).

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Номер записи: 57

03-10-2013 дата публикации

Apparatus And Methods For Reticle Handling In An EUV Reticle Inspection Tool

Номер: US20130255407A1

Автор: Chilese Francis Charles, Pohlmann Ulrich, Walsh Joseph Fleming, Wolter Detlef

Принадлежит:

Systems and methods to control particle generation in a reticle inspection system are presented. The number of particles added to a reticle during an entire load-inspect-unload sequence of a reticle inspection system is reduced by performing all reticle contact events in a controlled, flowing air environment. In one embodiment, the reticle is fixed to a carrier by clamping outside of the vacuum environment, and the carrier, rather than the reticle, is coupled to the reticle stage of the inspection system. In this manner, the high levels of back-side particulation associated with electrostatic chucking are avoided. In addition, the carrier is configured to be coupled to the reticle stage in any of four different orientations separated by ninety degrees. 1. A method of handling a reticle in a reticle inspection system comprising:opening an EUV Inner Pod (EIP) in a clean, dry air environment with flow control by separating an EIP base from an EIP cover of the EIP;locating a reticle carrier over the reticle, wherein the reticle carrier is stored in the reticle inspection system;clamping the reticle to the reticle carrier;pumping down a chamber that includes the reticle carrier and the reticle; andlocating the reticle carrier onto a reticle stage leaving a patterned surface of the reticle exposed for inspection.2. The method of claim 1 , wherein the reticle carrier is attached to the reticle stage by a kinematic mount in any of four different orientations separated by ninety degrees.3. The method of claim 1 , further comprising:locating a reticle carrier base under the reticle, the reticle carrier base including features to transport the reticle in any of four different orientations separated by ninety degrees, wherein the reticle carrier base is stored in the reticle inspection system.4. The method of claim 1 , further comprising:measuring an orientation of the reticle with respect to the reticle carrier; andreorienting the reticle with respect to the reticle carrier ...

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Номер записи: 58

03-10-2013 дата публикации

PHOTOMASK, AND PATTERN FORMATION METHOD AND EXPOSURE APPARATUS USING THE PHOTOMASK

Номер: US20130260293A1

Автор: MISAKA Akio, SASAGO Masaru

Принадлежит: Panasonic Corporation

A photomask includes a translucent substrate; and a light-shielding film formed on the translucent substrate, and including a light-shielding portion and an opening which serves as a translucent region. A plurality of recesses are formed in a region of the translucent substrate, which is exposed from the opening. Widths of the plurality of recesses gradually increase with an increase in distances from a focal point so that light transmitted by the plurality of recesses is focused in a predetermined position. 1. A photomask comprising:a translucent substrate; anda light-shielding film formed on the substrate, and including a light-shielding portion and an opening which serves as a translucent region, whereina plurality of recesses are formed in a region of the substrate, which is exposed from the opening,widths of the plurality of recesses gradually increase with an increase in distances from a focal point so that light transmitted by the plurality of recesses is focused in a predetermined position.2. The photomask of claim 1 , whereinthe plurality of recesses are linearly patterned along two facing sides of the opening, anda first recess of an adjacent pair of the recesses, which is closer to a boundary between the light-shielding portion and the opening has a greater width than a second recess, which is farther from the boundary.3. The photomask of claim 2 , whereinthe width of the second recess is 0.9 times or less the width of the first recess.4. The photomask of claim 2 , whereinthe width of the first recess is twice or less an exposure wavelength.5. The photomask of claim 2 , whereinthe width of the second recess is smaller than or equal to an exposure wavelength.6. The photomask of claim 2 , whereinthe width of the first recess and the width of the second recess are smaller than or equal to an exposure wavelength.7. The photomask of claim 2 , whereina distance between the first and the second recesses is smaller than or equal to an exposure wavelength.8. The ...

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Номер записи: 59

03-10-2013 дата публикации

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND EXPOSURE DEVICE

Номер: US20130260294A1

Автор: Yoshimochi Kazuyuki

Принадлежит: RENESAS ELECTRONICS CORPORATION

A method of manufacturing a semiconductor device in which the alignment accuracy of an immersion exposure device is maintained even when exposure steps are carried out intermittently. In the method, a substrate is placed on a stage of an exposure device (substrate placing step). Then, a first liquid is supplied to between the substrate and the optics system of the exposure device to expose the substrate through the first liquid (exposure step). A second liquid is supplied from a different place from the first liquid to a drainage groove provided around the stage at least in a period other than when the first liquid is supplied onto the stage, in order to suppress change in the temperature of the exposure device. 1. A method of manufacturing a semiconductor device comprising the steps of:placing a substrate over a stage of an exposure device (substrate placing step); andsupplying a first liquid to between the substrate and an optics system of the exposure device and exposing the substrate through the first liquid (exposure step),wherein at least in a period other than when the first liquid is supplied onto the stage, a second liquid is supplied from a different place from the first liquid to a drainage groove provided around the stage to suppress change in the temperature of the exposure device.2. The method of manufacturing a semiconductor device according to claim 1 ,wherein the second liquid has the same heat of evaporation as the first liquid.3. The method of manufacturing a semiconductor device according to claim 1 ,wherein a total liquid amount of the first liquid and the second liquid remaining in the drainage groove is kept constant.4. The method of manufacturing a semiconductor device according to claim 1 ,wherein the liquid remaining in the drainage groove is kept from overflowing from the drainage groove.5. The method of manufacturing a semiconductor device according to claim 1 ,wherein the exposure device further includes a temperature sensor which is ...

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Номер записи: 60

10-10-2013 дата публикации

LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND RECORDING MEDIUM

Номер: US20130265555A1

Автор: Shibazaki Yuichi

Принадлежит: NIKON CORPORATION

A liquid immersion member forms a liquid immersion space on an object movable below an optical member so that the light path of exposure light emitted from an emission surface of an optical member is filled with liquid. The liquid immersion member includes a first member disposed in at least a portion of the periphery of the optical member, and a second member which is movable at the outside of at least a portion of the first member and which includes a recovery port that recovers at least a portion of the liquid in the liquid immersion space. 1. A liquid immersion member in which a liquid immersion space is formed on an object movable below an optical member so that a light path of exposure light emitted from an emission surface of the optical member is filled with liquid , comprising:a first member which is disposed in at least a portion of the periphery of the optical member; anda second member which is movable below the first member to interpose a gap therebetween and which includes a recovery port that recovers at least a portion of the liquid in the liquid immersion space.2. The liquid immersion member according to claim 1 , wherein the second member is movable substantially parallel to a predetermined surface which is perpendicular to an optical axis of the optical member.3. The liquid immersion member according to claim 1 , wherein the second member is movable between the first member and the object.4. The liquid immersion member according to claim 1 , wherein the second member moves concurrently with at least a portion of the movement of the object in a state where the liquid is present in at least a portion of a space between the second member and the object.5. The liquid immersion member according to claim 1 , wherein the second member is movable while recovering the liquid from the recovery port.6. The liquid immersion member according to claim 1 , wherein the recovery port is disposed so as to face the object.7. The liquid immersion member according to ...

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Номер записи: 61

17-10-2013 дата публикации

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Номер: US20130271739A1

Автор: KOHNO Hirotaka, Nagasaka Hiroyuki, NISHII Yasufumi

Принадлежит: NIKON CORPORATION

An exposure apparatus where liquid supply operation and liquid recovery operation for forming a liquid immersion region are excellently performed to form the liquid immersion region in a desired condition, enabling high exposure accuracy and measurement accuracy to be achieved. An exposure apparatus (EX) is an apparatus that exposes a substrate (P) by emitting exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus has a liquid supply mechanism () having a supply opening () capable of supplying the liquid (LQ) in the direction substantially parallel to the surface of the substrate (P). 1. An exposure apparatus that exposes a substrate by irradiating exposure light onto the substrate via a liquid , comprising:a projection optical system having a final optical element; anda nozzle member having a liquid supply port from which the liquid is supplied and a liquid recovery port via which the supplied liquid is collected, wherein:the liquid is supplied from the liquid supply port perpendicularly to an optical axis of the final optical element of the projection optical system,the nozzle member has a first surface that comes into contact with the liquid and a second surface that comes into contact with the liquid,the first surface is provided such that a surface of the substrate faces the first surface during the exposure of the substrate,the second surface is provided such that the surface of the substrate faces the second surface during the exposure of the substrate,the second surface is arranged such that the second surface surrounds the first surface and an optical path of the exposure light, andthe second surface is arranged below the first surface and the final optical element of the projection optical system.2. The exposure apparatus according to claim 1 , wherein:the nozzle member has an inner side surface facing the optical path of the exposure light, andthe liquid supply port is formed in the inner side surface.3. The exposure ...

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Номер записи: 62

24-10-2013 дата публикации

EXPOSURE APPARATUS AND EXPOSURE METHOD, MAINTENANCE METHOD, AND DEVICE MANUFACTURING METHOD

Номер: US20130278908A1

Автор: NAGAHASHI Yoshitomo, Nakano Katsushi

Принадлежит:

An exposure apparatus includes; a supply outlet that supplies a liquid to an optical path space of exposure light, and a liquid supply system that supplies an ionized ionic liquid to the supply outlet. 1. An exposure apparatus that exposes a substrate via a projection optical system and liquid , comprising:a substrate stage configured to move below the projection optical system while holding the substrate; anda nozzle member having a first flow path through which a first liquid for exposure flows and a second flow path through which a second liquid different from the first liquid flows.2. The exposure apparatus according to claim 1 ,wherein, in exposure process for the substrate, the first liquid is supplied via the first flow path,and wherein, in non-exposure process for the substrate, the second liquid is supplied via the second flow path.3. The exposure apparatus according to claim 1 ,wherein a first supply port is provided at a lower surface of the nozzle member to supply the first liquid.4. The exposure apparatus according to claim 3 ,wherein a second supply port, which is arranged to supply the second liquid, is identical with the first supply port, which is arranged to supply the first liquid.5. The exposure apparatus according to claim 3 ,wherein a second supply port, which is different from the first supply port, is provided at the lower surface to supply the second liquid.6. The exposure apparatus according to claim 1 ,wherein the nozzle member is cleaned by using the second liquid.7. The exposure apparatus according to claim 6 ,wherein the first liquid and the second liquid are supplied to below an optical element, which is arranged at a front portion of the projection optical system.8. The exposure apparatus according to claim 6 ,wherein, when the second liquid is supplied, a dummy substrate, which is different from the substrate, is placed on the substrate stage.9. The exposure apparatus according to claim 6 ,wherein the second liquid comprises an ion ...

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Номер записи: 63

31-10-2013 дата публикации

APPARATUS AND METHOD TO CONTROL VACUUM AT POROUS MATERIAL USING MULTIPLE POROUS MATERIALS

Номер: US20130286366A1

Автор: COON Derek, KHO Leonard Wai Fung, POON Alex Ka Tim

Принадлежит:

An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes an aperture through which a patterned image is projected, an outlet, a first chamber into which the immersion liquid is recovered through the outlet, and a second chamber into which the immersion liquid is recovered through a porous member from the first chamber. The porous member has a first surface contacting the first chamber and a second surface contacting the second chamber. A vertical position of a first portion of the first surface is different from a vertical position of a second portion of the first surface. 1. An immersion liquid confinement apparatus for confining an immersion liquid in an immersion area that includes a gap between a projection system and an object in an immersion lithography system , the apparatus also recovering the immersion liquid from the immersion area , the apparatus comprising:an aperture through which a patterned image is projected;an outlet;a first chamber into which the immersion liquid is recovered through the outlet; anda second chamber into which the immersion liquid is recovered through a porous member from the first chamber,wherein:the porous member has a first surface contacting the first chamber and a second surface contacting the second chamber, anda vertical position of a first portion of the first surface is different from a vertical position of a second portion of the first surface.2. The apparatus of claim 1 , wherein the first surface of the porous member is convex.3. The apparatus of claim 1 , wherein the first surface of the porous member is slanted.4. The apparatus of claim 1 , wherein the porous member is a mesh.5. The apparatus of claim 1 , wherein the porous member is a sponge.6. The apparatus of claim 1 , wherein ...

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Номер записи: 64

07-11-2013 дата публикации

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

Номер: US20130293854A1

Автор: Chibana Takahito, Kobayashi Kenichi, Nakano Hitoshi

Принадлежит: CANON KABUSHIKI KAISHA

The present invention provides an exposure apparatus which includes a projection optical system that projects a pattern of a reticle onto a substrate, and exposes the substrate through the projection optical system and a liquid, the apparatus including a recovery unit which includes a recovery path connected to a recovery port, and is configured to reduce a pressure in the recovery path to recover the liquid, supplied to a space between the projection optical system and the substrate, through the recovery port and the recovery path, and a heating unit which is disposed in the recovery path, and configured to heat the liquid recovered through the recovery port and the recovery path. 1. An exposure apparatus which includes a projection optical system that projects a pattern of a reticle onto a substrate , and exposes the substrate through the projection optical system and a liquid , the apparatus comprising:a recovery unit which includes a recovery path connected to a recovery port, and is configured to reduce a pressure in the recovery path to recover the liquid, supplied to a space between the projection optical system and the substrate, through the recovery port and the recovery path; anda heating unit which is disposed in the recovery path, and configured to heat the liquid recovered through the recovery port and the recovery path.2. The apparatus according to claim 1 , further comprising:a storage unit configured to store a time-series heating profile representing a change in amount of heat, applied to the liquid, over time,wherein the heating unit heats the liquid in accordance with the heating profile stored in the storage unit.3. The apparatus according to claim 1 , further comprising:a detection unit configured to detect at least one of a temperature of the liquid recovered by the recovery unit, a temperature of an inner portion of the projection optical system on a side of the substrate, and a temperature of a stage space in which a substrate stage that ...

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Номер записи: 65

07-11-2013 дата публикации

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Номер: US20130293855A1

Автор: HORIUCHI Takashi, Takaiwa Hiroaki

Принадлежит: NIKON CORPORATION

An exposure apparatus exposes a substrate via a projection optical system and a liquid. The exposure apparatus includes a stage that is movable below the projection optical system while holding the substrate and a detector that is capable of detecting a liquid adhered to a rear surface of the substrate. As an alternative, or in addition, the apparatus can include a detector that is capable of detecting a liquid adhered to an optical member disposed at the stage. 1. An exposure apparatus that exposes a substrate via a projection optical system and a liquid , the exposure apparatus comprising:a stage that is movable below the projection optical system while holding the substrate; anda detector that is capable of detecting a liquid adhered to a rear surface of the substrate.2. The exposure apparatus according to claim 1 , wherein the liquid adhered to the rear surface of the substrate is detected after exposure of the substrate.3. The exposure apparatus according to claim 2 , wherein the liquid adhered to the rear surface of the substrate is detected after the substrate is unloaded from the stage.4. The exposure apparatus according to claim 2 , whereinthe stage includes a lift apparatus that moves the substrate up and down, andthe liquid adhered to the rear surface of the substrate is detected after the exposed substrate is moved away with respect to the stage by the lift apparatus.5. The exposure apparatus according to claim 2 , wherein the detector comprises an imaging apparatus that is capable of imaging the rear surface of the substrate.6. An exposure apparatus that exposes a substrate by irradiating an exposure light on the substrate via a projection optical system and a liquid claim 2 , the exposure apparatus comprising:a stage that is movable below the projection optical system; anda detector that is capable of detecting a liquid adhered to an optical member disposed at the stage.7. The exposure apparatus according to claim 6 , wherein the optical member ...

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Номер записи: 66

07-11-2013 дата публикации

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE

Номер: US20130293860A1

Автор: Nagasaka Hiroyuki, Okuyama Takeshi

Принадлежит:

Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

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Номер записи: 67

07-11-2013 дата публикации

MOVABLE BODY APPARATUS, MOVABLE BODY DRIVE METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

Номер: US20130293863A1

Автор: Shibazaki Yuichi

Принадлежит:

A drive system drives a movable body, based on measurement results of a first measurement system which measures the position of the movable body in an XY plane by irradiating a measurement beam from an arm member on a grating placed on a surface parallel to the XY plane of the movable body and measurement results of a second measurement system which measures a variance of the arm member using a laser interferometer. In this case, the drive system corrects measurement errors caused due to a variance of the arm member included in the measurement results of the first measurement system, using the measurement results of the second measurement system. 1. An exposure apparatus that exposes a substrate with illumination light via a projection optical system , the apparatus comprising:a base member placed under the projection optical system and having a surface placed substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system;a substrate stage that is placed above the base member and holds the substrate, the substrate stage having a holding member and a main body section, the holding member having a mounting area of the substrate provided on an upper surface side and a measurement surface having a grating provided on a lower surface side, and the main body section supporting the holding member so that a space is formed between the measurement surface and the surface of the base member;a drive system having an electromagnetic motor that drives the substrate stage;a first measurement system that has a head section placed lower than the measurement surface under the projection optical system, and measures positional information of the substrate stage by irradiating the measurement surface with a measurement beam from below via the head section that is placed in the space as the substrate stage is positioned facing the projection optical system;a second measurement system that is different from the first measurement system and ...

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Номер записи: 68

07-11-2013 дата публикации

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

Номер: US20130293864A1

Автор: Hirano Shinichi

Принадлежит:

The present invention provides an exposure apparatus which transfers a pattern of a reticle onto a substrate, the apparatus including a convey unit configured to convey the substrate while chucking and holding a lower surface of the substrate, and a control unit configured to control a conveyance condition of the convey unit so that a conveyance acceleration is lower when the convey unit conveys the substrate in a vertical direction with downward acceleration than when the convey unit conveys the substrate in the vertical direction with upward acceleration. 1. A convey method for conveying a substrate , the method comprising the steps of:conveying the substrate, a lower surface of the substrate being chucked and held, downward while accelerating; andconveying the substrate, the lower surface of the substrate being chucked and held, upward while accelerating,wherein an acceleration in conveying the substrate downward while accelerating is lower than an acceleration in conveying the substrate upward while accelerating.2. The method according to claim 1 , further comprising the steps of:determining whether a warp of the substrate is greater than or equal to a predetermined amount or is smaller than the predetermined amount,wherein the acceleration in conveying the substrate downward while accelerating in a case where the warp of the substrate is greater than or equal to the predetermined amount is lower than the acceleration in conveying the substrate downward while accelerating in a case where the warp of the substrate is smaller than the predetermined amount.3. A convey method for conveying a substrate claim 1 , the method comprising the steps of:conveying the substrate, a lower surface of the substrate being chucked and held, upward while decelerating; andconveying the substrate, the lower surface of the substrate being chucked and held, downward while decelerating,wherein an acceleration in conveying the substrate upward while decelerating is lower than an ...

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Номер записи: 69

07-11-2013 дата публикации

Linear Stage for Reflective Electron Beam Lithography

Номер: US20130293865A1

Автор: Clyne Joshua, Di Regolo Joseph A., Hale Layton, Nayfeh Samir, Ummethala Upendra, Williams Mark, Wilson Andrew

Принадлежит: KLA-TENCOR CORPORATION

A linear stacked stage suitable for REBL may include a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast stage configured to secure a first plurality of wafers; a second upper fast stage configured to translate a second plurality of wafers in a second direction along the first axis, the second upper fast stage configured to secure the second plurality of wafers, the second direction opposite to the first direction, wherein the translation of the first upper fast stage and the translation of the second upper fast stage are configured to substantially eliminate inertial reaction forces generated by motion of the first upper fast stage and the second upper fast stage; and a carrier stage configured to translate the first and second upper fast stages along a second axis. 1. A linear stacked stage suitable for reflective electron beam lithography (REBL) , comprising:a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast stage configured to secure a first plurality of wafers;a second upper fast stage configured to translate a second plurality of wafers in a second direction along the first axis, the second upper fast stage configured to secure the second plurality of wafers, the second direction opposite to the first direction, wherein the translation of the first upper fast stage and the translation of the second upper fast stage are configured to substantially eliminate inertial reaction forces generated by motion of the first upper fast stage and the second upper fast stage; anda carrier stage configured to translate the first upper fast stage and the second upper fast stage along a second axis substantially orthogonal to the first axis, the first upper fast stage and the second upper fast stage disposed on the surface of the carrier stage.2. The stacked stage of claim 1 , further comprising:a counter ...

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Номер записи: 70

14-11-2013 дата публикации

Wafer table having sensor for immersion lithography

Номер: US20130301016A1

Автор: Andrew J. Hazelton, Hiroaki Takaiwa

Принадлежит: Nikon Corp

A liquid immersion lithography apparatus and method exposes a substrate with light via a projection system and a liquid. A table assembly has a top surface and is movable relative to the projection system while supporting the substrate. The table assembly top surface has a first opening portion, and a top surface of a sensor is arranged inside of the first opening portion. The sensor top surface is positionable opposite the projection system by the table assembly such that a gap, in which the liquid can be maintained, is formed between the projection system and the sensor top surface. The table assembly and sensor top surfaces are apposed on a substantially same plane, or are substantially co-planar.

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Номер записи: 71

14-11-2013 дата публикации

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Номер: US20130301017A1

Автор: De Smit Joannes Theodoor, Derksen Antonius Theodorus Anna Maria, Hoogendam Christiaan Alexander, Kolesnychenko Aleksey Yurievich, LOF Joeri, Loopstra Erik Roelof, Modderman Theodorus Marinus, MULKENS Johannes Catharinus Hubertus, Ritsema Roelof Aeilko Siebrand, Simon Klaus, Straaijer Alexander, Streefkerk Bob, VAN SANTEN Helmar

Принадлежит: ASML Netherlands B.V.

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space. 1112.-. (canceled)113. A lithographic projection method comprising:filling a space between a projection system and a surface of a substrate with a liquid during exposure of the substrate using a liquid confinement member which is positioned adjacent a final surface of the projection system;projecting an image onto the substrate by the projection system during the exposure;supplying a gas from an inlet of the liquid confinement member, the inlet being arranged to oppose the surface of the substrate during the exposure; andremoving fluid via an outlet of the liquid confinement member, that is located further outward from the space than is the inlet, the outlet being arranged to oppose the surface of the substrate during the exposure.114. The method according to claim 113 , wherein the inlet is formed in a face of the liquid confinement member claim 113 , the face of the liquid confinement member is arranged to oppose the surface of the substrate during the exposure claim 113 , and the inlet comprises a groove in the face of the liquid confinement member.115. The method according to claim 114 , wherein the groove extends around the space.116. The method according to claim 113 , wherein the outlet is formed in a face of the liquid confinement member claim 113 , the face of the liquid confinement member is arranged to oppose the surface of the substrate during the exposure claim 113 , and the outlet comprises a groove in the face of the liquid confinement member.117. The method according to claim 116 , wherein the groove extends around the space.118. The method according to claim 113 , wherein a fluid bearing is formed between the liquid confinement member and the substrate during the exposure.119. The ...

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Номер записи: 72

14-11-2013 дата публикации

Wafer table having sensor for immersion lithography

Номер: US20130301018A1

Автор: Andrew J. Hazelton, Hiroaki Takaiwa

Принадлежит: Nikon Corp

A liquid immersion lithography apparatus and method exposes a substrate with light via a projection system and liquid. A table assembly has a top surface and is movable relative to the projection system while supporting the substrate. The top surface and the substrate are positionable opposite to the projection system such that the liquid is maintained between the projection system and a portion of one or both of the top surface and a surface of the substrate. A sensor has a top surface arranged at the top surface of the table assembly and is positionable opposite to the projection system such that a gap, in which the liquid can be maintained, is formed between the projection system and the top surface of the sensor. The top surfaces of the table assembly and of the sensor are apposed on a substantially same plane, or are substantially co-planar.

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Номер записи: 73

14-11-2013 дата публикации

EXPOSURE METHOD AND APPARATUS, MAINTENANCE METHOD AND DEVICE MANUFACTURING METHOD

Номер: US20130301019A1

Автор: Nakano Katsushi

Принадлежит: NIKON CORPORATION

An exposure apparatus exposes a substrate with an exposure light via a projection optical system and a liquid, and includes a flow channel forming member and a substrate stage. The flow channel forming member forms an immersion area of the liquid at an image surface side of the projection optical system. The substrate stage has a wall portion provided so as to surround a support portion which supports the substrate, and a recovery port capable of recovering the liquid in a recess formed at an outside of the wall portion with respect to an optical axis of the projection optical system. When a cleaning is performed, a cleaning liquid is recovered via the recovery port. 1. An exposure apparatus which exposes a substrate with an exposure light via a projection optical system and a liquid , the exposure apparatus comprising:a flow passage-forming member which forms an immersion area of the liquid on an image plane side of the projection optical system; anda substrate stage having a wall portion provided so as to surround a support portion which supports the substrate, and a recovery port capable of recovering the liquid in a recess formed at an outside of the wall portion with respect to an optical axis of the projection optical system,wherein a cleaning liquid is recovered via the recovery port during a cleaning.2. The exposure apparatus according to claim 1 , further comprising a controller which moves the substrate stage relative to the immersion area so as to clean the substrate stage.3. The exposure apparatus according to claim 2 , wherein claim 2 , during the cleaning claim 2 , the controller moves the substrate stage relative to the immersion area such that a locus of the immersion area during the cleaning is different from a locus of the immersion area during exposure of the substrate.4. The exposure apparatus according to claim 1 , wherein the cleaning is performed during a cleaning period claim 1 , and the cleaning period includes a period in which exposure of ...

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Номер записи: 74

14-11-2013 дата публикации

APPARATUS AND METHOD FOR MAINTAINING IMMERSION FLUID IN THE GAP UNDER THE PROJECTION LENS DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE

Номер: US20130301020A1

Автор: BINNARD Michael

Принадлежит:

An immersion exposure apparatus and method exposes a substrate with an exposure beam via an optical element and immersion liquid. A table mounts the substrate. A member is positionable under the optical element. A holding member is arranged to hold the member such that the member is located opposed to the optical element. Each of the table and the member are configured to maintain the immersion liquid below the optical element when located opposed to the optical element. The member is positionable to be away from a position below the optical element when the substrate, mounted on the table, is located opposed to the optical element. The table is movable to be away from below the optical element while the member is held opposed to the optical element. 1. An immersion exposure apparatus for exposing a substrate with an exposure beam via an optical element and immersion liquid , the apparatus comprising:a table for mounting the substrate;a member which is positionable under the optical element; anda holding member arranged to hold the member such that the member is located opposed to the optical element, whereineach of the table and the member are configured to maintain the immersion liquid below the optical element when located opposed to the optical element,the member is positionable to be away from a position below the optical element when the substrate, mounted on the table, is located opposed to the optical element, andthe table is movable to be away from below the optical element while the member is held opposed to the optical element.2. The immersion exposure apparatus according to claim 1 , wherein the table and the member are movable for a transition from a first state to a second state claim 1 , the first state being a state in which the immersion liquid is maintained in a space between the optical element and the table claim 1 , the second state being a state in which the immersion liquid is maintained in a space between the optical element and the member ...

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Номер записи: 75

14-11-2013 дата публикации

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Номер: US20130301021A1

Автор: Michael Binnard

Принадлежит: Nikon Corp

An immersion exposure apparatus and method exposes a substrate with an exposure beam via an optical element and immersion liquid. The apparatus includes a substrate stage having a table and a member. The table mounts the substrate and is configured to maintain the immersion liquid below the optical element when located opposed to the optical element. The member is configured to maintain the immersion liquid below the optical element when, located opposed to the optical element. The substrate stage is configured such that, when the table is located opposed to the optical element, the table and the member are movable relative to the optical element in a state in which a surface of the table and a surface of the member are arranged adjacent to each other so that the immersion liquid below the optical element is thereby transferred from the table to the member.

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Номер записи: 76

14-11-2013 дата публикации

APPARATUS AND METHOD FOR MAINTAINING IMMERSION FLUID IN THE GAP UNDER THE PROJECTION LENS DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE

Номер: US20130301022A1

Автор: BINNARD Michael

Принадлежит: NIKON CORPORATION

An immersion exposure apparatus and method expose a substrate with an exposure beam via an optical assembly and via immersion liquid. A first stage on which a substrate is mounted is positioned below the optical assembly so that the immersion liquid is maintained in a space between the optical assembly and the substrate. The first stage is replaced below the optical assembly with a second stage while maintaining the immersion liquid below the optical assembly. The replacing includes arranging a movable member, which is independently movable relative to the first and second stages and away from below the optical assembly, to face the optical assembly so as to substantially maintain the immersion liquid below the optical assembly while the first and second substrate stages are away from below the optical assembly. A control system controls a drive system to move the first and second stages. 1. An immersion exposure apparatus for exposing a substrate with an exposure beam via an optical assembly and immersion liquid , the apparatus comprising:a liquid immersion member that is arranged to surround part of the optical assembly to supply the immersion liquid to below the optical assembly and to recover the immersion liquid from below the optical assembly;first and second stages, each of which is configured to hold a substrate and each of which is positionable below the optical assembly;a movable member that is independently movable relative to the first and second stages and away from below the optical assembly;a drive system arranged to drive the first stage, the second stage and the movable member; anda control system configured to control the drive system to arrange the movable member to face the optical assembly in a process in which one of the first and second stages, which is arranged facing the optical assembly, is replaced with the other of the first and second stages to substantially maintain the immersion liquid below the optical assembly while the first and ...

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Номер записи: 77

14-11-2013 дата публикации

Substrate Table, Lithographic Apparatus and Device Manufacturing Method

Номер: US20130301028A1

Автор: Bensely Albert, Petrus Compen Rene Theodorus

Принадлежит: ASML Netherlands BV

A substrate table comprising a base and a plurality of burls that project from the base, wherein an upper surface of the burls is provided with a multilayer coating.

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Номер записи: 78

21-11-2013 дата публикации

APPARATUS AND METHOD FOR MAINTAINING IMMERSION FLUID IN THE GAP UNDER THE PROJECTION LENS DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE

Номер: US20130308107A1

Автор: BINNARD Michael

Принадлежит:

An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A first stage mounts the substrate and is movable relative to the optical element. A second stage is independently movable relative to the first stage and is positionable away from below the optical element. While the first stage is positioned below the optical element, the second stage is movable relative to the first stage so that the second stage is positioned adjacent to the first stage, and when the second stage is positioned adjacent to the first stage, the adjacent first and second stages are movable to locate the second stage opposed to the optical element in place of the first stage such that the immersion liquid is maintained below the optical element during the movement. 1. An immersion exposure apparatus for exposing a substrate with a light beam via an optical element and immersion liquid , the apparatus comprising:a first stage for mounting the substrate and that is movable relative to the optical element; anda second stage that is independently movable relative to the first stage and that is positionable away from below the optical element,wherein while the first stage is positioned below the optical element, the second stage is movable relative to the first stage so that the second stage is positioned adjacent to the first stage, and when the second stage is positioned adjacent to the first stage, the adjacent first and second stages are movable to locate the second stage opposed to the optical element in place of the first stage such that the immersion liquid is maintained below the optical element during the movement.2. The immersion exposure apparatus according to claim 1 , wherein the adjacent first and second stages are movable for a transition from a first state to a second state claim 1 , the first state being a state in which the immersion liquid is maintained in a space between the optical element and the first stage ...

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Номер записи: 79

21-11-2013 дата публикации

MEASURING METHOD, STAGE APPARATUS, AND EXPOSURE APPARATUS

Номер: US20130308108A1

Автор: ARAI Dai

Принадлежит: NIKON CORPORATION

An exposure apparatus can mitigate the impact of fluctuations in the refractive index of ambient gas, and improve, for example, stage positioning accuracy. An exposure apparatus radiates an exposure illumination light to a wafer on a wafer stage through a projection optical system, and forms a prescribed pattern on the wafer, and comprises: a scale, which is provided to the wafer stage; a plurality of X heads, which detect information related to the position of the scale; a measurement frame that integrally supports the plurality of X heads and has a coefficient of linear thermal expansion that is smaller than that of the main body of the wafer stage (portions excepting a plate wherein the scale is formed); and a control apparatus that derives information related to the displacement of the wafer stage based on the detection results of the plurality of X heads. 1. An exposure apparatus that exposes a substrate with illumination light via a projection optical system , the apparatus comprising:a frame structure that supports the projection optical system;a plurality of grating members each of which has a reflecting-type grating portion, and that are suspended and supported by the frame structure such that the grating portion is arranged in substantially parallel with a predetermined face perpendicular to an optical axis of the projection optical system;a stage having a holder to hold the substrate and being movable below the grating members, the holder being provided within a concave portion formed in an upper surface of the stage; andan encoder system provided at the stage and having a plurality of heads each of which is configured to radiate beam to the grating portions from below the grating portions, so as to obtain position information of the stage,wherein each of the heads is provided at the stage and located at a more outward position than the upper surface.2. The exposure apparatus according to claim 1 ,wherein the stage has a frame member to which the heads ...

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Номер записи: 80

21-11-2013 дата публикации

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Номер: US20130308110A1

Автор: MULKENS Johannes Catharinus Hubertus, Streefkerk Bob

Принадлежит: ASML Netherlands B.V.

In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens. 120.-. (canceled)21. A lithographic projection apparatus , comprising:a projection system configured to project a patterned beam of radiation into an image field that is positioned off an optical axis of the projection system and to expose a radiation-sensitive target portion of a substrate using the patterned beam, the projection system having a final optical element with an outer edge, the edge having a first portion closest to the optical axis and a different second portion furthest from the optical axis; anda liquid supply system configured to supply a liquid to a space between the final optical element and the substrate, the optical axis extending through the space.22. The lithographic projection apparatus of claim 21 , wherein the image field is between the optical axis and the different second portion.23. The lithographic projection apparatus of claim 21 , wherein the first portion opposes the different second portion across the optical axis.24. The lithographic projection apparatus of claim 21 , wherein the liquid supply system comprises a member positioned below and around the final optical element to at least partially form the space claim 21 , the member shaped to match a bottom of the projection system.25. The lithographic projection apparatus of claim 21 , wherein the projection system is catadioptric.26. The lithographic projection apparatus of claim 21 , wherein the final optical element has a generally flat bottom-most surface to define at least part of the boundary of the space.27. The lithographic projection apparatus of claim 21 , wherein the final optical element has a curved bottom-most surface to define at least part of the boundary of the space.28. The lithographic ...

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Номер записи: 81

28-11-2013 дата публикации

Lithographic Apparatus and Device Manufacturing Method

Номер: US20130314684A1

Автор: Cadee Theodorus Petrus Maria, HUANG Yang-Shan

Принадлежит: ASML Netherlands B.V.

A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure. 1. A substrate stage for use in a lithographic apparatus , the substrate stage comprising:a substrate table constructed to hold a substrate;a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus, the positioning device comprising:a first positioning member mounted to the substrate table;a second positioning member co-operating with the first positioning member to position the substrate table; the second positioning member being mounted to a support structure; and wherein the substrate stage further comprises an actuator, the actuator being arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.2. The substrate stage according to claim 1 , wherein the actuator is mounted on the support structure.3. The substrate stage according to claim 1 , wherein the actuator is mounted on the second positioning member or the first positioning member.4. The substrate stage according to claim 1 , wherein the actuator is displaceably mounted on the second positioning member such that it maintains a substantially fixed horizontal position relative to the support structure.5. The ...

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Номер записи: 82

28-11-2013 дата публикации

MASK

Номер: US20130314685A1

Автор: SHIN BU Gon

Принадлежит: LG CHEM LTD.

Provided are a mask, a method of manufacturing the same, a light irradiation device, a method of radiating light, and a method of manufacturing an orientationally ordered photo-alignment layer. By the mask, collimated light or nearly collimated light may be irradiated with uniform illumination to a surface of an object to be irradiated. Further, by the mask, light may be effectively incident even on the object to be irradiated in the curved shape. 1. A mask , comprising:a transparent supporting structure; anda metal layer which is on one surface of the transparent supporting structure and, in which at least one opening configured to guide light to an object to be irradiated.2. The mask according to claim 1 , wherein the transparent supporting structure is a transparent ceramic structure.3. The mask according to claim 1 , wherein the metal layer is a metal deposition layer or a metal film layer.4. The mask according to claim 1 , wherein the metal layer comprises gold claim 1 , silver claim 1 , chromium claim 1 , aluminum claim 1 , copper claim 1 , titanium claim 1 , nickel claim 1 , molybdenum or tungsten.5. The mask according to claim 1 , wherein the surface of the transparent supporting structure claim 1 , on which the metal layer is formed claim 1 , is a curved surface claim 1 , and the metal layer is formed in a curved shape on the curved surface of the transparent supporting structure.6. The mask according to claim 4 , wherein the metal layer in the curved shape has the radius of curvature in the range from 10 mm to 500 mm.7. A method of manufacturing a mask claim 4 , comprising:forming a metal layer having at least one opening configured to guide light to an object to be irradiated on one surface of a transparent supporting structure.8. The method according to claim 7 , wherein the surface of the structure on which the metal layer is formed is a curved surface claim 7 , and the metal layer is formed in a curved shape according to the curved surface of the ...

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Номер записи: 83

05-12-2013 дата публикации

EXPOSURE APPARATUS AND DEVICE FABRICATING METHOD

Номер: US20130321785A1

Автор: FUJIWARA Tomoharu, Shibazaki Yuichi

Принадлежит: NIKON CORPORATION

An exposure apparatus can suppress the occurrence of residual liquid. An exposure apparatus includes: a first stage that holds the substrate and is movable; a second stage that is movable independently of the first stage; and a liquid immersion mechanism that forms a liquid immersion region of a liquid on an upper surface of at least one stage of the first stage and the second stage; wherein, a recovery port that is capable of recovering the liquid is provided to the upper surface of the second stage. 1. A lithographic apparatus comprising:a substrate stage configured to support a substrate and a second stage;a liquid confinement system configured to at least partly confine liquid in a space between a projection system and the substrate stage, a substrate supported by the substrate stage, or both;the substrate stage and the second stage constructed and arranged for mutual cooperation to perform a joint movement wherein the liquid in the liquid confinement structure is transferred from being confined by the substrate or the substrate stage or both to being confined by the second stage, the liquid crossing an edge of the substrate stage and an opposing edge of the second stage,wherein the substrate stage, the second stage, or both, comprises a channel system in fluid communication with an opening defined by the edge of the stage, the channel system constructed and arranged to generate a fluid flow along the edge during the joint movement, the fluid flow including liquid from the liquid confinement structure.2. A lithographic apparatus comprising:a substrate stage configured to support a substrate and a second stage;a liquid confinement system configured to at least partly confine liquid in a space between a projection system and the substrate stage, a substrate supported by the substrate stage, or both;the substrate stage and the second stage constructed and arranged for mutual cooperation to perform a joint movement wherein the liquid in the liquid confinement ...

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Номер записи: 84

05-12-2013 дата публикации

Optical Projection Array Exposure System

Номер: US20130321786A1

Автор: Chen Jang Fung, KASKEY Jeffrey, LAIDIG Thomas, MARKLE David

Принадлежит:

A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other. 1. A spatial light modulator imaging system , comprising:an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system;a projection module configured to project the illumination light to a substrate; andan illumination-projection beam separator coupled between the illumination module and the projection module, wherein the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, wherein the illumination optical axis and the projection optical axis are substantially parallel to each other.2. The spatial light modulator imaging system of claim 1 ,wherein the illumination module is configured to be telecentric with respect to the illumination light, and the projection module is configured to be telecentric with respect to the substrate.3. The spatial light modulator imaging system of claim 1 , wherein the illumination module comprises:a plurality of laser diodes configured to generate the illumination light;a plurality of fiber bundles configured to transmit the ...

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Номер записи: 85

12-12-2013 дата публикации

Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method

Номер: US20130329201A1

Автор: Masahiko Yasuda, Taro Sugihara

Принадлежит: Nikon Corp

A loading method and apparatus loads an object via a carrier system in an exposure apparatus that exposes the object with an exposure beam via a projection optical system and a liquid. Position information of the depressed section is obtained by detecting a part of a stage that mounts the object in a depressed section placed at a part of an upper surface of the stage. The carrier system carries the object to above the stage placed at an exchange position of the object, the exchange position being distanced from the projection optical system. The object is loaded on the stage based on the position information of the depressed section so that the carried object is mounted in the depressed section.

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Номер записи: 86

12-12-2013 дата публикации

Mask, exposure apparatus and device manufacturing method

Номер: US20130329209A1

Автор: Yuichi Shibazaki

Принадлежит: Nikon Corp

A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β, and circumference ratio is taken as π, then the conditions for D≧(β×L)/π are satisfied.

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Номер записи: 87

12-12-2013 дата публикации

ROLL-PRINTING APPARATUS AND ROLL-PRINTING METHOD USING THE SAME

Номер: US20130329210A1

Автор: Hwang In-Seok, HWANG Ji-Young

Принадлежит: LG CHEM, LTD.

Provided are a roll printing apparatus and a roll printing method using the same. The roll printing apparatus according to the present invention comprises 1) a first cliché stage, 2) a second cliché stage, 3) a pattern transfer unit provided between the first cliché stage and the second cliché stage and comprising a roll type printed film support unit, 4) a first printing unit comprising a first printing roll moving to the pattern transfer unit on the first cliché stage, and 5) a second printing unit comprising a second printing roll moving the pattern transfer unit on the second cliché stage, in which the first cliché stage and the second cliché stage are disposed on the same line and a film substrate is comprised in the roll type printed film support unit. The roll printing apparatus according to the present invention can perform a continuous roll printing, thereby reducing a tack time and as a result, improving productivity. 1. A roll printing apparatus , comprising:1) a first cliché stage;2) a second cliché stage;3) a pattern transfer unit provided between the first cliché stage and the second cliché stage and comprising a roll type printed film support unit;4) a first printing unit comprising a first printing roll moving to the pattern transfer unit on the first cliché stage; and5) a second printing unit comprising a second printing roll moving the pattern transfer unit on the second cliché stage,wherein the first cliché stage and the second cliché stage are disposed on the same line and a film substrate is comprised in the roll type printed film support unit.2. The roll printing apparatus of claim 1 , wherein the pattern transfer unit comprises a printed film supplying unit continuously supplying the film substrates and a printed film collecting unit continuously collecting the film substrates.3. The roll printing apparatus of claim 2 , wherein the roll type printed film support unit is disposed between the printed film supplying unit and the printed film ...

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Номер записи: 88

19-12-2013 дата публикации

IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD WITH MEASURING DEVICE

Номер: US20130335717A1

Автор: SHIRAISHI Kenichi

Принадлежит: NIKON CORPORATION

An exposure apparatus is capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus, which forms a liquid immersion area of a liquid on an image surface side of a projection optical system, and exposes a substrate via the projection optical system and the liquid of the immersion area, includes a measuring device which measures at least one of a property and composition of the liquid for forming the liquid immersion area. 1. An exposure apparatus in which a substrate is exposed to an exposure beam through an immersion liquid , the apparatus comprising:a projection system having an optical element; and a TOC meter that measures total organic carbon,', 'a particle counter that measures an amount of a foreign matter,', 'a DO meter that measures a dissolved oxygen concentration,', 'a DN meter that measures a dissolved nitrogen concentration,', 'a silica meter that measures a silica concentration, and', 'an analyzer that analyzes a type and an amount of a live bacteria., 'a measuring device that measures at least one of a property and a composition of the immersion liquid, the measuring device including at least one of2. The exposure apparatus according to claim 1 , wherein the foreign matter includes fine particles.3. The exposure apparatus according to claim 1 , wherein the measuring device further includes a resistivity meter that measures a specific resistance value.4. The exposure apparatus according to claim 1 , further comprising a substrate stage claim 1 ,wherein the measuring device is provided on the substrate stage.5. The exposure apparatus according to claim 1 , wherein the measuring device measures the immersion liquid concurrently with an exposure operation.6. The exposure apparatus according to claim 1 , further comprising a storage device that stores a measurement result of the measuring device.7. The exposure apparatus according to claim 6 , wherein the storage device stores ...

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Номер записи: 89

19-12-2013 дата публикации

MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

Номер: US20130335723A1

Автор: Shibazaki Yuichi

Принадлежит: NIKON CORPORATION

A fine movement stage is driven by a controller, based on positional information of the fine movement stage in a measurement direction measured by a measurement system and correction information of a measurement error caused by a tilt of the fine movement stage included in the positional information. Accordingly, driving the fine movement stage with high precision becomes possible, which is not affected by a measurement error included in the positional information in a measurement direction of the measurement system that occurs due to a tilt of the fine movement stage. 1. An exposure apparatus that exposes a substrate with illumination light via a projection optical system , the apparatus comprising:a base member placed under the projection optical system and having a surface placed substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system;a substrate stage that is placed above the base member and holds the substrate, the substrate stage having a holding member and a main body section, the holding member having a mounting area of the substrate provided on an upper surface side and a measurement surface having a grating provided on a lower surface side, and the main body section supporting the holding member so that a space is formed between the measurement surface and the surface of the base member;a drive system having an electromagnetic motor that drives the substrate stage;a measurement system that has a head section placed lower than the measurement surface under the projection optical system, and measures positional information of the substrate stage by irradiating the measurement surface with a measurement beam from below via the head section that is placed in the space as the substrate stage is positioned facing the projection optical system; anda controller that is coupled to the drive system and controls drive of the substrate stage by the drive system based on the positional information measured by the ...

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Номер записи: 90

23-01-2014 дата публикации

LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD FOR MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM

Номер: US20140022522A1

Автор: SATO Shinji

Принадлежит:

A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate via liquid by exposure light, and forms a liquid immersion space above an object which is movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member, and a second member that is disposed at at least a portion of surrounding of an optical path of the exposure light, that includes a second upper surface which is opposite to the first lower surface of the first member via a gap, a second lower surface which is capable of being opposite to the object, and a fluid recovery part which is disposed at at least a portion of surrounding of the second lower surface, and that is relatively movable with respect to the first member. 1. A liquid immersion member that is used in a liquid immersion exposure apparatus which exposes a substrate via liquid between an emitting surface of an optical member and the substrate by exposure light , and that forms a liquid immersion space above an object which is movable below the optical member , the liquid immersion member comprising:a first member that is disposed at at least a portion of surrounding of the optical member; anda second member that is disposed at at least a portion of surrounding of an optical path of the exposure light below the first member, that comprises a second upper surface which is opposite to the first lower surface of the first member via a gap, a second lower surface which is capable of being opposite to the object, and a fluid recovery part which is disposed at at least a portion of surrounding of the second lower surface, and that is relatively movable with respect to the first member.2. The liquid immersion member according to claim 1 , comprising:a support member that is connected to the second member outside the first member with respect to the optical path,wherein the second member moves according to a ...

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Номер записи: 91

23-01-2014 дата публикации

EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND OPTICAL PART

Номер: US20140022523A1

Автор: HIRUKAWA Shigeru, HOSHIKA Ryuichi, ISHIZAWA Hitoshi, Nagasaka Hiroyuki, Takaiwa Hiroaki

Принадлежит: NIKON CORPORATION

An exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid. The exposure apparatus has a stage which includes a substrate holder for holding the substrate, a detachable member detachably disposed on the stage so that its upper surface contacts an immersion region, and a sensor having a light transmissive member. The detachable member, on which an opening is formed in the upper surface, is disposed on the stage so that the light transmissive member is arranged within the opening. 1. An exposure apparatus that exposes a substrate with exposure light from a projection optical system via an immersion region formed with liquid below the projection optical system , the exposure apparatus comprising:a stage which includes a substrate holder to hold the substrate, and which is movable relative to the projection optical system;a detachable member which is detachably disposed on the stage so that an upper surface of the detachable member comes into contact with the immersion region; anda sensor which includes a light transmissive member disposed on the stage so as to transmit the exposure light from the immersion region, and which detects the exposure light from the light transmissive member,wherein the detachable member, on which an opening is formed in the upper surface, is disposed on the stage so that the light transmissive member is arranged within the opening.2. The exposure apparatus according to claim 1 , whereinthe substrate holder comprises a support which supports a back surface of the substrate; a wall which is arranged around the support so as to face the back surface of the substrate supported by the support; and a flow channel which is connected to a space surrounded by the wall so as to suck a gas within the space, and holds the substrate in a state where the space is made to have a negative pressure by sucking the gas within the space through the flow channel.3. The exposure ...

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Номер записи: 92

23-01-2014 дата публикации

LITHOGRAPHIC APPARATUS

Номер: US20140022527A1

Автор: BOGAART Erik Willem, Eussen Emiel Jozef Melanie, Jacobs Johannes Henricus Wilhelmus, Macht Lukasz Jerzy, Ottens Joost Jeroen, Staals Frank, Van Der Pasch Engelbertus Antonius Fransiscus, Van Drent William Peter

Принадлежит: ASML Netherlands B.V.

A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame. 120-. (canceled)21. A lithographic apparatus , comprising:a substrate table comprising a holding device to hold a substrate;a substrate table position measurement system comprising a sensor head and a substrate table reference element; anda further position measurement system,wherein the substrate table reference element is arranged at a bottom side of the substrate table,wherein the sensor head is configured to cooperate with the substrate table reference element to determine a position of the substrate table, andwherein the further position measurement system is configured to measure at a top side of the substrate the position of the substrate table.22. The lithographic apparatus of claim 21 , comprising a substantially stationary frame and a sensor frame claim 21 ,wherein the sensor head is arranged on the sensor frame, andwherein the sensor frame is mounted on the substantially stationary frame.23. The lithographic apparatus of claim 22 , comprising a projection system configured to project a pattern imparted to a radiation beam by a patterning device ...

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Номер записи: 93

30-01-2014 дата публикации

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

Номер: US20140028987A1

Автор: KAMEYAMA Masaomi

Принадлежит: NIKON CORPORATION

An immersion lithography system includes a wafer stage, a lens for projecting an image onto a wafer located on the wafer stage, an immersion fluid supply for supplying immersion fluid between the lens and the wafer, and a purge fluid conveying device for conveying about the supplied immersion fluid a purge fluid saturated with a component of the immersion fluid. 1. An exposure apparatus comprising:a projection optical system having a plurality of optical elements, by which an exposure light is projected;a liquid immersion system having a supply inlet via which an immersion liquid is supplied and a recovery outlet via which the supplied immersion liquid is collected, the liquid immersion system forming a liquid immersion space by supplying the immersion liquid via the supply inlet and by collecting the immersion liquid via the recovery outlet; andan environmental control system having a conduit through which a fluid is supplied to an area adjacent to the liquid immersion space to control a vapor pressure in the area,wherein a substrate is exposed to the exposure light from the projection optical system through the immersion liquid in the liquid immersion space covering a portion of a surface of the substrate.2. The apparatus of claim 1 , wherein the environmental control system has a humidifier claim 1 , the fluid supplied by the environmental control system includes a gas humidified by the humidifier.3. The exposure apparatus of claim 1 , wherein the environmental control system is configured such that the vapor pressure in the area is controlled to be greater than a predetermined value.4. The exposure apparatus of claim 1 , wherein the environmental control system is configured such that the vapor pressure in the area is controlled to be a saturated vapor pressure.5. The exposure apparatus of claim 1 , wherein the environmental control system is configured such that a humidity in the area is controlled to be greater than a humidity in an external area with respect ...

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Номер записи: 94

06-02-2014 дата публикации

STAGE APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

Номер: US20140036249A1

Автор: Kii Hiroshi, Korenaga Nobushige

Принадлежит: CANON KABUSHIKI KAISHA

The preset invention provides a stage apparatus which holds a substrate, the apparatus including a driving unit which includes a first coil arranged on a fixed portion, and a first magnet which is arranged on a movable portion and opposed to the first coil, and is configured to move the movable portion by a magnetic field generated by supplying a current to the first coil, and an attracting unit which includes a first yoke arranged on the fixed portion, and a second coil wound around the first yoke, and is configured to attract the movable portion to a side of the fixed portion by a magnetic field generated by supplying a current to the second coil. 1. A stage apparatus which holds a substrate , the apparatus comprising:a fixed portion;a movable portion which is arranged on the fixed portion, and on which a substrate holder that holds the substrate is mounted;a driving unit which includes a first coil arranged on the fixed portion, and a first magnet which is arranged on the movable portion and opposed to the first coil, and is configured to move the movable portion by a magnetic field generated by supplying a current to the first coil;a spring element configured to support the movable portion to set the movable portion at a reference position while the substrate holder that holds the substrate is mounted on the movable portion; andan attracting unit which includes a first yoke arranged on the fixed portion, and a second coil wound around the first yoke, and is configured to attract the movable portion to a side of the fixed portion by a magnetic field generated by supplying a current to the second coil,wherein the attracting unit attracts the movable portion to the side of the fixed portion to set the movable portion at the reference position after at least one of the substrate and the substrate holder is removed from the movable portion.2. The apparatus according to claim 1 , further comprising:a measuring unit configured to measure a position of the movable ...

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Номер записи: 95

20-02-2014 дата публикации

MOVABLE BODY DRIVE METHOD AND MOVABLE BODY DRIVE SYSTEM, PATTERN FORMATION METHOD AND APPARATUS, EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD

Номер: US20140049759A1

Автор: Shibazaki Yuichi

Принадлежит: NIKON CORPORATION

During the drive of a stage, positional information in a movement plane of a stage is measured by three encoders that include at least one each of an X encoder and a Y encoder of an encoder system, and a controller switches an encoder used for a measurement of positional information of a stage in the movement plane from an encoder to an encoder so that the position of the stage in the movement plane is maintained before and after the switching. Therefore, although the switching of the encoder used for controlling the position of the stage is performed, the position of the stage in the movement plane is maintained before and after the switching, and a correct linkage becomes possible. 1. An exposure apparatus that exposes a substrate via a projection optical system , the apparatus comprising:a stage having a holder that holds the substrate;an encoder system that measures positional information of the stage, by irradiating a grating section placed substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system, with a beam from a direction intersecting the predetermined plane, via each of a plurality of heads;a drive system having a motor that drives the stage; anda controller that controls driving of the stage by the drive system based on the measured positional information, whereinof the plurality of heads, a head used in measurement of the positional information is switched to a different head, as the stage is moved, and the positional information to be measured by the different head to be used after the switching is determined based on the positional information measured by the head used before the switching.2. The exposure apparatus according to claim 1 , whereinthe positional information to be measured by the different head is determined in a state where a head used before the switching and a head to be used after the switching both face the grating section.3. The exposure apparatus according to claim 2 , whereinthe ...

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Номер записи: 96

20-02-2014 дата публикации

HOLDING APPARATUS, EXPOSURE APPARATUS AND MANUFACTURING METHOD OF DEVICE

Номер: US20140049763A1

Автор: MIYAKAWA Tomoki

Принадлежит: NIKON CORPORATION

A holding apparatus includes a holding portion that includes a first member which contacts a portion of an object, a second member which at least a portion thereof is fixed to a base, and a connection member which is configured to connect the first and second members, and a driving unit which drives the holding portion to change at least a posture of the first member, wherein a relative positional relationship between the first member and the second member is changed via the connection member. 1. A holding apparatus configured to hold an object , the holding apparatus comprising:a holding portion that comprises a first member which contacts a portion of the object, a second member which at least a portion thereof is fixed to a base, and a connection member which is configured to connect the first and second members; anda driving unit which is configured to drive the holding portion to change at least a posture of the first member,wherein a relative positional relationship between the first member and the second member is changed via the connection member.2. The holding apparatus according to claim 1 ,wherein the connection member is configured to change a position of the first member with respect to the second member more largely as a change of the posture of the first member is larger.3. The holding apparatus according to claim 1 ,wherein the connection member is configured to change a relative distance between the first member and the second member according to a change of the posture of the first member.4. The holding apparatus according to claim 1 ,wherein the holding portion comprises a plurality of the first members which contact different portions of the object.5. The holding apparatus according to claim 1 ,wherein the object is a plate-like object, andwherein the holding portion comprises a first holding portion which is configured to hold one end portion of the plate-like object and a second holding portion which is configured to hold another end portion of ...

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Номер записи: 97

27-02-2014 дата публикации

LIQUID IMMERSION EXPOSURE APPARATUS

Номер: US20140055761A1

Автор: Furusho Kenji

Принадлежит: KABUSHIKI KAISHA TOSHIBA

Provided is a liquid immersion exposure apparatus which is configured to include a table, a plate, an illumination unit, an exposure position movement unit, and relative position change units. A substrate is mounted on the table. An opening portion surrounding a circumferential edge portion of the substrate mounted on the table is installed in the plate. The illumination unit forms a liquid immersion area filled with liquid immersion water at an exposure position of the substrate mounted on the table, and the illumination unit illuminates an exposure light beam on the exposure position through the liquid immersion area. The exposure position movement unit moves the exposure position. The relative position change units change a relative position between the table and the plate. 1. A liquid immersion exposure apparatus comprising:a table which is mounted on a to-be-exposed substrate;a plate where an opening portion surrounding a circumferential edge portion of the substrate mounted on the table is installed;an illumination unit which forms a liquid immersion area filled with liquid immersion water at an exposure position of the substrate mounted on the table and illuminates an exposure light beam on the exposure position through the liquid immersion area;an exposure position movement unit which moves the exposure position; anda relative position change unit which changes a relative position between the table and the plate.2. The liquid immersion exposure apparatus according to claim 1 , wherein the relative position change unit changes the relative position in a direction parallel to a normal line of the substrate mounted on the table.3. The liquid immersion exposure apparatus according to claim 1 , wherein the relative position change unit changes the relative position in a direction perpendicular to a normal line of the substrate mounted on the table.4. The liquid immersion exposure apparatus according to claim 1 , comprising:a position detection unit which detects ...

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Номер записи: 98

27-02-2014 дата публикации

OPTICAL ARRANGEMENT OF AUTOFOCUS ELEMENTS FOR USE WITH IMMERSION LITHOGRAPHY

Номер: US20140055762A1

Автор: NOVAK W. Thomas

Принадлежит: NIKON CORPORATION

A lithographic projection apparatus includes a projection system having a last element from which an exposure light is projected onto a wafer through liquid in a space under the last element. A light incident surface of the last element has a convex shape. A liquid retaining member is disposed adjacent to a surface of the last element through which the exposure light does not pass. The liquid retaining member has an undersurface under which liquid is retained. A gap is formed between the liquid retaining member and the surface of the last element, the gap being in fluidic communication with the space. The liquid is retained between the last element and the undersurface of the liquid retaining member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer. 1. A lithographic projection apparatus comprising:a projection system having a last element from which an exposure light is projected through liquid in a space under the last element, a light incident surface of the last element having a convex shape;a liquid retaining member disposed adjacent to a surface of the last element through which the exposure light does not pass, the liquid retaining member having an undersurface under which liquid is retained; anda gap formed between the liquid retaining member and the surface of the last element, the gap being in fluidic communication with the space, the gap including a lower portion and an upper portion between which the gap extends,whereina wafer moves below and relative to the last element and the liquid retaining member;the liquid is retained between the last element and the undersurface of the liquid retaining member on one side and an upper surface of the wafer on the other side; andthe liquid locally covers a portion of the upper surface of the wafer to expose the wafer by projecting the exposure light onto the wafer through the liquid in the space.2. The apparatus according to claim 1 ...

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Номер записи: 99

27-02-2014 дата публикации

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE

Номер: US20140055763A1

Автор: HIRUKAWA Shigeru, Kobayashi Naoyuki, Omura Yasuhiro, OWA Soichi

Принадлежит: NIKON CORPORATION

An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid. 1a projection system;an immersion area forming member having a liquid supply inlet and a liquid recovery outlet, the immersion area forming member having an opening through which an exposure beam is projected, the immersion area forming member forming a liquid immersion area on a portion of a surface of a substrate during exposure of the substrate;a substrate stage system having a first substrate holding member by which the substrate is held, the substrate stage system moving the substrate held by the first substrate holding member below and relative to the projection system and the immersion area forming member;a first temperature sensor provided at the first substrate holding member of the substrate stage system;a first temperature adjustment system which performs temperature adjustment for the first substrate holding member, a part of the first temperature adjustment system being provided at the first substrate holding member;a second temperature adjustment system connected to a liquid supply apparatus, the second temperature adjustment system performing temperature adjustment for liquid delivered from the liquid supply apparatus, the temperature-adjusted liquid being supplied from the liquid supply inlet of the immersion area forming member; anda controller which controls the first and second temperature adjustment systems,wherein the controller controls a temperature adjustment ...

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Номер записи: 100