КАМЕРА ПЛАЗМЕННОЙ ОБРАБОТКИ И СПОСОБ ОБРАБОТКИ ПОЛУПРОВОДНИКОВОЙ ПОДЛОЖКИ В ТАКОЙ КАМЕРЕ

Изобретение относится к области электротехники, в частности к травильным камерам с плазмой высокой плотности. Камера содержит электростатический держатель, предназначенный для удержания пластины, и расходуемые части, которые являются в высокой степени устойчивыми к травлению и в меньшей степени восприимчивы к образованию загрязнений и температуру которых можно регулировать, что является техническим результатом изобретения. Расходуемые части содержат вкладыш камеры, имеющий нижнюю секцию крепления, и стенку, которая сконфигурирована таким образом, что она окружает электростатический держатель. Расходуемые части также включают держатель вкладыша, имеющий нижний выступ, гибкую стенку и верхний выступ. Гибкая стенка сконфигурирована таким образом, что она окружает внешнюю поверхность стенки вкладыша камеры, при этом гибкая стенка держателя вкладыша расположена на некотором расстоянии от стенки вкладыша камеры. Нижний выступ держателя вкладыша сконфигурирован так, что он находится в прямом тепловом ...

ИСТОЧНИК БЫСТРЫХ НЕЙТРАЛЬНЫХ ЧАСТИЦ

Изобретение относится к технике получения пучков быстрых нейтральных частиц, в частности пучков нейтральных атомов, радикалов и молекул, и может быть использовано для распыления, травления и осаждения тонких пленок различных материалов. Источник быстрых нейтральных частиц имеет базовую конструкцию, которая содержит ионный источник с холодным катодом и замкнутым дрейфом электронов и нейтрализатор, выполненный в виде внешних и внутренних коаксиальных поверхностей, образующих в совокупности щелевой канал определенной длины, сопряженный с замкнутой выходной щелью источника. Технический результат - увеличение степени нейтрализации выходного пучка и его интенсивности. 12 з.п. ф-лы, 19 ил.

УСТРОЙСТВО ДЛЯ ИЗМЕРЕНИЯ УГЛОВЫХ РАСПРЕДЕЛЕНИЙ ПУЧКА ИОНОВ

Устройство для измерения угловых распределений пучка ионов используется для исследований в области физики ион-атомных столкновений, преимущественно в исследованиях взаимодействия пучка ионов с монокристаллической или газовой мишенью, а также может использоваться при легировании поверхностей ионным пучком. Устройство содержит восьмиразрядный двоичный реверсивный счетчик, к выходам которого подключен восьмиразрядный сумматор. К второму входу сумматора подключено программируемое запоминающее устройство (ЗУ), позволяющее сдвигать выходной код сумматора. Адресные входы ЗУ подсоединены к мультиплексору, через который подключаются либо к реверсивному счетчику, либо к микропроцессорному контроллеру (МПК). К ЗУ подключена также схема управления реверсивным счетчиком. Девятиразрядный код сумматора поступает на внешнее накопительное устройство и на цифроаналоговый преобразователь (ЦАП), сигнал с которого подается на отклоняющие пластины посредством усилителя с парафазными выходами. Ионы, пролетая ...

ИСТОЧНИК ИОНОВ С ЭЛЕКТРОННОЙ ИОНИЗАЦИЕЙ ДЛЯ МАСС-СПЕКТРОМЕТРА

Источник ионов с электронной ионизацией для масс-спектрометра, включающий источник питания, соосно размещенные в вакуумной камере камеру ионизации, нить накала кольцевой формы и четыре плоских последовательно установленных электрода, выполненных с круглым осесимметричным отверстием каждый, расположенных на расстояниях от 3 до 5 мм друг от друга, причем первый, третий и четвертый относительно камеры ионизации электроды выполнены в виде пластин, диаметры отверстий в которых D1, D3 и D4 соответственно удовлетворяют соотношениям D1=1,0÷2,0 мм, D3=(1,0÷1,25)D1, D4=0,1÷0,3 мм, а второй электрод выполнен толщиной d=2,0÷4,0 мм с отверстием диаметром D2=3,5÷6,0 мм, перекрытым со стороны третьего электрода диафрагмой с отверстием диаметром D3, причем нить накала расположена внутри отверстия второго электрода в параллельной ему плоскости, электрически с ним соединена и имеет диаметр кольца D0=(D3+0,5)÷(D2-0,5), камера ионизации содержит узел десорбции исследуемого вещества, находится на расстоянии ...

ДВУХСТУПЕНЧАТЫЙ ИСТОЧНИК МНОГОЗАРЯДНЫХ ИОНОВ С ЭЛЕКТРОННЫМ ЦИКЛОТРОННЫМ РЕЗОНАНСОМ

Двухступенчатый источник многозарядных ионов с электронным циклотронным резонансом, состоящий из корпуса и вакуумного насоса, удаляющего из корпуса балластный (фоновый) газ, мишени, которая установлена в первой ступени данного источника ионов и лазера, установленного вне корпуса таким образом, что его излучение, проходя через диэлектрическое окно в корпусе, попадает на мишень в области центральной продольной оси и генерирует лазерную плазму с высокой плотностью частиц. Эта плазма, содержащая многозарядные ионы материала мишени, дрейфуя в продольном направлении с кинетической энергией ионов порядка нескольких кэВ, попадает во вторую ступень. В которой осуществляется дополнительное увеличение зарядового состояния ее ионов в результате многократной ударной ионизации их электронами, энергия (температура) которых повышена в результате электронного циклотронного резонанса. Нагрев электронов и удержание заряженных частиц плазмы во второй ступени реализуются подачей в нее СВЧ-электромагнитных колебаний ...

ИСТОЧНИК, ФОРМИРУЮЩИЙ ПРОТОННЫЙ ПУЧОК

Изобретение относится к области вакуумной электроники и может найти применение в технологических процессах, использующих протонные пучки, а также для сканирующей и просвечивающей протонной микроскопии. Устройство включает в себя вакуумную камеру, катод, сетку, анод из палладия, протоновод, аккумулятор протонов и нагреватель, при этом протоновод изготовлен из материала с высокой электропроводностью по ионам водорода и соединяет аккумулятор протонов с анодом, на который подан отрицательный потенциал по отношению к аккумулятору протонов. Аккумулятор протонов, в частности, может быть изготовлен из электролита, в котором присутствуют ионы водорода, или из композитного материала, содержащего соединение, адсорбирующее водород, а протоновод может дополнительно содержать нагреватель. Технический результат заключается в том, что в предложенном устройстве источника протонного пучка формируется пучок протонов с высокой плотностью, при высоком вакууме. 2 з.п. ф-лы, 2 ил.

ЛАЗЕРНЫЙ ИСТОЧНИК ИОНОВ ВЫСОКОЙ ЗАРЯДНОСТИ

Изобретение относится к источникам ионов, предназначенных для ускорителей заряженных частиц. Лазерный источник ионов высокой зарядности состоит из мишени, лазера, пролетного канала, выполненного в виде металлической трубы, центральная продольная ось которого совпадает с первоначальным направлением гидродинамического движения плазменного потока от мишени, на поверхности которого установлены магниты таким образом, что они формируют внутри пролетного канала мультипольное магнитное поле, силовые линии которого перпендикулярны продольной оси пролетного канала, а напряженность этого поля, приближаясь к нулю на его центральной продольной оси, резко нарастает в области стенок пролетного канала и системы отбора ионов, установленной на центральной продольной оси в конце пролетного канала, причем магниты установлены в зоне между началом пролетного канала и точками, в которых лазерная плазма начинает касаться стенок пролетного канала таким образом, что пары магнитов находящиеся на диаметрально противоположных ...

ЛАЗЕРНЫЙ ИСТОЧНИК ИОНОВ

Использование: в ускорительной технике, технологиях ионной имплантации и других отраслях народного хозяйства, где требуются источники заряженных частиц. Техническим результатом изобретения является повышение эффективности удержания плазмы в пролетном канале лазерного источника ионов и уменьшение разброса значений скоростей и углов ионного пучка, извлекаемого из такого источника. Сущность изобретения: в лазерном источнике ионов, состоящем из мишени, лазера, пролетного канала, выполненного в виде металлической трубы, центральная продольная ось которого совпадает с первоначальным направлением гидродинамического движения плазменного потока от мишени, системы отбора ионов, установленной на центральной продольной оси пролетного канала, магниты установлены на пролетном канале таким образом, что они формируют внутри него по всей длине между мишенью и системой отбора ионов мультипольное магнитное поле, силовые линии которого перпендикулярны продольной оси пролетного канала, а напряженность этого ...

ИСТОЧНИК ИОНОВ

Использование: в технологии электромагнитного разделения изотопов. Сущность изобретения: в источнике ионов, содержащем электронно-оптическую систему, термокатод, газоразрядную камеру, тигель с рабочим веществом, нагреватель выполнен из графитовой ленты, уложенной в виде полого прямоугольного параллелепипеда с пазами, размещенной вокруг блока тигель-газоразрядная камера. 1 з.п. ф-лы, 4 ил., 1 табл.

ИСТОЧНИК ИОНОВ

Изобретение относится к технологии электромагнитного разделения изотопов. Техническим результатом является увеличение сроков службы источников ионов и повышение качества изотопной продукции. В источнике ионов, содержащем ионооптическую систему, термокатод, газоразрядную камеру, тигель с рабочим веществом, нагреватель, внутренние защитные тепловые экраны, наружный тепловой экран выполнен из стали, а передний тепловой экран - из графита. 1 з. п. ф-лы, 1 ил., 1 табл.

ИМПУЛЬСНЫЙ ИСТОЧНИК ИОНОВ ГЕЛИЯ

Изобретение относится к области ускорительной техники. Импульсный источник ионов гелия с холодными катодом и антикатодом состоит из соленоидальной катушки, надетой на немагнитную вакуумную камеру, внутри которой помещены катодный магнитный полюс с центральным углублением, катод из нержавеющей стали в виде плоского диска с центральным углублением в виде стакана, примыкающий к катодному магнитному полюсу, кольцевой анодный изолятор, анод в виде пустотелого цилиндра с кольцевой перемычкой в середине, выполненный из нержавеющей стали, антикатод в виде диска, выполненный из нержавеющей стали, по оси которого выполнено углубление с отверстием эмиссии в центре, своей выступающей частью вставленный в отверстие антикатодного магнитного полюса. На антикатоде выполнен кольцевой выступ, соосный с анодом и расположенный по направлению к аноду, диаметр выступа больше, чем диаметр стакана в катоде, но меньше, чем внутренний диаметр анода. Технический результат - стабилизации плотности разряда по оси отверстия ...

Источник пучков ионов с высоким током на основе плазмы ЭЦР разряда, удерживаемой в открытой магнитной ловушке

Изобретение относится к области формирования непрерывных сильноточных пучков ионов путем их экстракции из плотной плазмы ЭЦР разряда, создаваемой в открытой магнитной ловушке мощным излучением миллиметрового диапазона длин волн. Устройство содержит магнитную систему для создания магнитного поля пробочной конфигурации с напряженностью, достаточной для возникновения внутри разрядной вакуумной камеры ЭЦР зон, систему формирования и экстракции пучка ионов из плазмы, содержащую плазменный электрод и ускоряющий электрод и, по крайней мере, два дополнительных электрода, расположенных после ускоряющего электрода один за другим: фокусирующий электрод, находящийся под тем же потенциалом, что и плазменный электрод, а затем выходной электрод, находящийся, также как и ускоряющий электрод, под земляным потенциалом. Технический результат - возможность формировать качественный сильноточный пучок ионов с малой величиной эмиттанса и минимальным углом расхождения в условиях непрерывной работы источника. 2 ...

ИСТОЧНИК БЫСТРЫХ НЕЙТРАЛЬНЫХ ЧАСТИЦ

... 1. Источник быстрых нейтральных частиц, содержащий источник ионов с холодным катодом и замкнутым дрейфом электронов и нейтрализатор, выполненный в виде внешних и внутренних коаксиальных поверхностей, образующих в совокупности щелевой канал нейтрализации определенной длины, сопряженный с замкнутой выходной щелью источника, отличающийся тем, что на нейтрализатор установлены электроды сепаратора, выполненные в виде поверхностей, образующих в совокупности щелевой канал сепарации определенной длины и ширины, сопряженный с замкнутой выходной щелью нейтрализатора, что обеспечивает полную нейтрализацию выходного потока частиц за счет изменения отношения длины щелевого канала сепарации к ширине его замкнутой выходной щели и регулирования напряжения, подаваемого на электроды сепаратора для отклонения ионов из пучка быстрых частиц. ! 2. Источник по п.1, отличающийся тем, что содержит несколько щелевых источников быстрых нейтральных частиц, снабженных электродами сепаратора, что улучшает равномерность ...

УСТРОЙСТВО ДЛЯ ИЗМЕРЕНИЯ УГЛОВЫХ РАСПРЕДЕЛЕНИЙ ПУЧКА ИОНОВ

Устройство для измерения угловых распределений пучка ионов, содержащее восьмиразрядный двоичный реверсивный счетчик, восьмиразрядный сумматор, входы которого подключены к выходам счетчика, два ЦАП (входы первого подключены к выходам сумматора, выход второго подключен к выводу опорного напряжения первого), высоковольтный усилитель с парафазными выходами, к которым подключены отклоняющие пластины, отличающееся тем, что в устройство введены ОЗУ, выходные линии данных которого подключены к сумматору, схема управления, входы которой подключены к выходным линиям данных ОЗУ, а выход подключен к выводу управления направлением счета счетчика, мультиплексор, выход которого подключены к линиям адреса и управления ОЗУ, вторые входы подключены к счетчику, а первые входы подключены к МП контроллеру, к которому также подключаются линии данных ОЗУ, второй ЦАП и тактовый вход счетчика.

Ионный источник

ИОННЫЙ ИСТОЧНИК масс-спектрометра, содержащий анод, катод прямого канала и вытягивающий электрод, отличающийся тем, что, с целью повышения эффективности и улучшения аналитических характеристик, анод выполнен в виде двухзаход- ной конической спирали, по оси которой расположено входное отверстие вытягивающего электрода, выполненного в виде полого цилиндра и снабженного устройством углового поворота. . ^ .••.'•.•сло>& qD ел li^ >&^ 0)\/\>&' /^/^1/./ ^^\ч ...

Ионный источник масс-спектрометра

ИОННЫЙ ИСТОЧНИК МАСС-СПЕКТРОМЕТРА для одновременного анализа .л по крайней мере двух образцов твердой фазы, содержащий ленточный ионизатор поверхностного типа, вытягивающий электрод и испаритель в виде поворотного устройства с лентами для нанесения пробы, отличающийся тем, что, с целью упрощения конструкции источника и повышения его яркости поворотное устройство вьтолнено содержащим держатели лент по числу образцов , при этом поворотное устройство расположено так, что плоскость, проходящая через ленты, находится между плоскостями, в которых размещены ионизатор и вытягивающий электрод .

Способ получения отрицательных ионов

Источник ионов на основе скользящего разряда для масс-спектрометрии

... 1. ИСТОЧНИК ИОНОВ НА ОСНО СКОЛЪЗЯВ1ЕГО РАЗРЯДА ДЛЯ МАСС-СПЕКТ МЕТРИИ, содержащий источник импуль ного электрического питания, соеди ненный с электродами, один из кото gajas iisgBi t ggggg«s «g88Si8: рых выполнен цилиндрическим и расположен на внешней поверхности цилиндрического разделительного диэлектри-, ка, пробу анализируемого вещества, размещенную на цилиндрическом разделительном диэлектрике между электродами , отличающи тем, что, с целью повышения информативности анализа путем повьш1ения выхода ионов и формирования пространственнолокализованного пакета ионов, в него введен заземленный токопроводящий элемент, электрически соединенный с цилиндрическим электродом и расположенный на внутренней поверхности диэлектрика , другой электрод расположен по касательной к внешней поверхности цилиндрического диэлектрика, являющейся его образующей, а расстояние между электродами в 5-10 раз превышает толщину стенки диэлектрика. S J-.

Дуоплазматрон

ДУЦПЛАЗтТРОН, содержащий систему электродов, состоящую из анода , промежуточного э-лектрода, катода и экстрактора, соединенных с основной системой откачки, о т л и ч cf ющ и и с я тем, что, с целью повышения эффективности работы дуоплазматрона за счет исключения перевода твердых веществ в газовые химические соединения, испаритель и заключенный в него катод расположены во внутренней полости промежуточного электрода, при этом полость промежуточного электрода снабжена дополнительной системой откачки.

Коллиматор для пучков заряженных частиц

Источник ионов с поверхностной ионизацией

Изобретение относится к источникам ионов, основанных на принципе поверхностной ионизации, и может быть использовано в электронной технологии. Целью изобретения является повышение яркости источника. Источник содержит систему подачи паров ионизируемого вещества и ионизатор. Ионизатор выполнен в виде набора элементов. В одном из элементов выполнена центральная часть 11, являющаяся эмиттером ионов. Эмиттер ионов расположен напротив эмиссионного отверстия. 4 з.п. ф-лы, 7 ил.

LIQUID METAL ION GUN

LIQUID METAL ION GUN

VORRICHTUNG ZUR ERZEUGUNG EINES KORPUSKULARSTRAHLS

ION PROJECTION MECHANISM FOR SHADE PROJECTION

MECHANISM FOR THE TREATMENT OF ION BEAMS OF SOLID SAMPLES.

SOURCE OF PARTICLE FOR A REACTIVE ION BEAM CORRODING OR PLASMA DEPOSITION PLANT.

HIGH FREQUENCY ION GUN.

UNIVERSAL COLD CATHODE ION PRODUCTION AND - ACCELERATOR.

ION BEAM PRODUCTION DEVICE

ION GUN FOR THE PRODUCTION OF IONS FROM GAS OR STEAM

IMPROVEMENTS IN PLASMA GENERATORS

Fabrication of chopper for particle beam instrument

ION SOURCE PROVIDING RIBBON BEAM WITH CONTROLLABLE DENSITY PROFILE

Ion source and coaxial inductive coupler for ion implantation system

A probe assembly for detecting an ion in a plasma generated in an ion source

Method and apparatus for mass analysis using slow monochromatic electrons

RADIATION HEATED ACCELERATION

PULSED ION SOURCE FOR ION TRAP MASS SPECTROMETER

METHOD OF OPERATING A THREE-DIMENSIONAL ION TRAP WITH ENHANCED SENSITIVITY

The method of isolating ions of single mass or narrow range of masses in a three-dimensional ion trap comprising ionizing a sample in the trap at a low RF voltage, increasing the RF voltage and applying a DC voltage whereby to eject unwanted ions while isolating ions of said single mass or narrow range of masses.

NEGATIVE ION EXTRACTOR

NEGATIVE ION EXTRACTOR Process and apparatus for use in extracting negative ions from a plasma which is particularly useful in reactive ion etching of metals, silicon and oxides and nitrides of silicon in the manufacture of semiconductor devices. A magnetic field is employed in the apparatus and, herein, is created by a novel grid, through which negative ions pass to a surface, such as one to be etched, while free electrons are prevented from passing through the grid and out of the plasma. The novel process utilizes negative ions which have a large fraction in the atomic state.

PROCESS AND APPARATUS FOR CHANGING THE ENERGY OF CHARGED PARTICLES CONTAINED IN A GASEOUS MEDIUM

PROCESS AND APPARATUS FOR CHANGING THE ENERGY OF CHARGED PARTICLES CONTAINED IN A GASEOUS MEDIUM The invention consists of a method of changing the energy of charged particles contained in a gas comprising allowing the gas to flow into a region of reduced pressure (7) through a tube-like member (5) so that viscous forces exerted on the charged particles by the flowing gas molecules determine the kinetic energy of the charged particles. A potential gradient is maintained along the length of the tube-like member (5) so that the potential energy of the charged particles is changed as they pass through it. At the end of the tubelike member (5) a free jet expansion occurs into the region of reduced pressure (7), where the kinetic energy of the charged particles is no longer determined by the flowing gas, and they can be accelerated to any desired kinetic energy by means of another potential gradient. The invention can be used to interface any high pressure ion source to a magnetic sector mass ...

ION-PLASMA GUN FOR ION-MILLING MACHINE

An ion gun includes an elongated electrode with a hollow end portion closed by a perforated end plate. The end plate is positioned parallel to a perforated flat electrode of opposite electrical polarity. An insulated sleeve encompasses the elongated electrode and extends outwardly from the perforated end towards the flat electrode. The sleeve length is separated into two portions of different materials. The first is formed of a high-temperature material that extends over the hollow portion of the elongated electrode where the arc is initiated by a point source electrode. The second sleeve portion extending over the remainder of the elongated electrode is of a resilient material for enhanced seal-forming ability and retention of plasma gas. Perforations are arranged in the flat electrode in a mutually opposing triangular pattern to project a plasma beam having a generally flat current profile towards a target requiring precision milling.

RADIO FREQUENCY ION SOURCE

An rf ion source suitable for low power operation over a range of pressures in air which comprises discharge electrode, a cathode and an anode, the cathode being connected to an rf signal supply through an associated coupling means and the anode adapted to provide a surface area over which a plasma discharge may occur no greater than substantially that of the cathodal area over which the discharge may occur. The anode and cathode are arranged to be manoeuvrable with respect to one another in order to reduce the power requirements of the system and provide a means of controlling the rf discharge and ionisation. An extended rf ion source, comprising a series of electrode pairs, provides flexibility for use in a variety of circumstances.

CHARGED PARTICLE RADIATION THERAPY

Among other things, an accelerator (502) is mounted on a gantry (504) to enable the accelerator to move through a range of positions around a patient (506) on a patient support. The accelerator is configured to produce a proton or ion beam having an energy level sufficient to reach any arbitrary target in the patient from positions within the range. The proton or ion beam passes essentially directly from the accelerator to the patient. In some examples, the synchrocyclotron has a superconducting electromagnetic structure that generates a field strength of at least 6 Tesla, produces a beam of particles having an energy level of at least 150 MeV, has a volume no larger than 4.5 cubic meters, and has a weight less than 30 Tons.

PLASMA ENHANCEMENT APPARATUS AND METHOD FOR PHYSICAL VAPOR DEPOSITION

The present invention provides a plasma enhancement method and apparatus for electric arc vapor deposition. The plasma enhancement apparatus is positioned to act upon plasma generated from a plasma source before the plasma reaches a substrate to be coated by the plasma. The plasma enhancement apparatus includes a magnet disposed about a magnet axis and defining a first aperture, and a core member disposed about a core member axis and at least partially nested within the first aperture. The core member defines a second aperture, and the plasma enhancement apparatus is arranged and configured in such a manner that the evaporated cathode source material passes from the cathode source and through the second aperture toward the substrate to be coated by the evaporated cathode source material. The plasma is favorably conditioned as it passes through the plasma enhancement apparatus.

ION SOURCE BLOCK FILAMENT WITH LABYRINTH CONDUCTIVE PATH

A filament plate for an ion beam source assembly of an ion implantation apparatus is disclosed. The filament plate is comprised of tungsten and includes two spaced apart spiral slits through a width of the plate. A gap width of the slits in not substantially greater than ten times a plasma Debye length of ions generated by electrons emitted into an arc chamber. The plate filament is disposed in an arc chamber into which ionizable source materials are injected. The plate includes t wo conductive posts press fit into openings of the plate for heating the plate to t he thermionic emission temperature. The conductive posts extend through insulated openings in a side wall of the arc chamber.

Verfahren und Vorrichtung zur Erzielung trägheitslos zu steuernder, auf scharf begrenzte Raumbereiche lokalisierter Energieumsetzungen sowie Anwendung des Verfahrens

Verfahren zum Aufbringen von Schichten auf Träger, insbesondere für die elektronenmikroskopische Präparation

Zerstäubungs-Ionenquelle

Mehrstrahl-Ionenzerstäubungsvorrichtung zur Herstellung dünner einheitlicher oder legierter Schichten

Vorrichtung zur wahlweisen Zerstäubung fester Substanzen durch Ionenbeschuss nach der Plasma- oder Ionenstrahlmethode

Kraftspannfutter zum Einspannen von Werkstücken an Arbeitsmaschinen

Ionenquelle für die Zerstäubung mit langsamen Ionen

WITH BOMBARDMENT BY ELECTRONS WORKING ION GUN.

Cold cathode low generating and accelerating device

The cold cathode, ion generating and ion accelerating universal device is used to generate an ion beam of any material to be ionized. The material may be electrically conductive, semiconductive or insulating and solid, liquid or gas. The appts. includes a gasifying unit (1,2) which is able to transform the material to be ionized into gaseous form. An ionizing unit (6, 7, 13) which transforms the atoms or molecules of the material, which is now in gaseous form, into ions. The ionizing unit provides ionization energy and so produces plasma. The appts. includes an accelerating unit (13-13", 12-12') which accelerates ions present in the plama produced by the ionization unit and produces an ion beam.

Cold cathode low generating and accelerating device

The cold cathode, ion generating and ion accelerating universal device is used to generate an ion beam of any material to be ionized. The material may be electrically conductive, semiconductive or insulating and solid, liquid or gas. The appts. includes a gasifying unit (1,2) which is able to transform the material to be ionized into gaseous form. An ionizing unit (6, 7, 13) which transforms the atoms or molecules of the material, which is now in gaseous form, into ions. The ionizing unit provides ionization energy and so produces plasma. The appts. includes an accelerating unit (13-13", 12-12') which accelerates ions present in the plama produced by the ionization unit and produces an ion beam.

RFQ LINE ACCELERATOR WITH VARIABLE FREQUENCY FOR ACCELERATION, TO FOCUSING OR BUNDLES OF A JET.

ИСТОЧНИК ПУЧКА ИОНОВ С ЗАМКНУТЫМ ДРЕЙФОМ ЭЛЕКТРОНОВ

Изобретение относится к ионно-плазменной техники и предназначено для создания точечного источника ионов высокой интенсивности. Источник пучка ионов может также быть использован в технологических процессах, предназначенных для очистки, травления и активации поверхностей изделий и нанесения на них покрытий, распыление материалов из нескольких источников одновременно, для очистки поверхности деталей в технологии сварки в вакууме, создания точечных источников вторичных ионов в системах ионной имплантации. Источник ионов содержит магнитопроводящий корпус, являющийся катодом, в торце которого расположена эмиссионная щель для выпуска пучка ионов, и в полости которого расположен анод симметрично отмеченной щели и изолированный от корпуса. При этом источник магнитодвижущей силы и источник электропитания соединен с катодом и анодом. Также источник ионов содержит вакуумную систему откачки с камерой, которая содержит анод, катод и источник магнитодвижущей силы. Анод и эмиссионная щель установлены под ...

ВАКУУМНО-ДУГОВОЙ ИСТОЧНИК ПЛАЗМЫ

Изобретение относится к области металлургии, а именно к конструкции вакуумно-дугового источника плазмы. Вакуумно-дуговой источник плазмы включает генератор плазмы и фильтр для ее очистки от макрочастиц. В состав генератора плазмы входит катод, анод и стабилизирующая и фокусирующая электромагнитные катушки, соответственно. Фильтр содержит прямолинейный плазмовод, внешнюю транспортную электромагнитную катушку и внутреннюю отклоняющую электромагнитную катушку. Внутри осевого канала этой катушки размещена перегородка. Расстояние от входящего отверстия осевого канала этой катушки до указанной перегородки не меньше половины диаметра ее канала, а диаметр указанного канала не меньше трети внешнего диаметра этой катушки. Изобретение обеспечивает уменьшение затрат плазмы при транспортировании ее через фильтр.

ПРИСТРІЙ ДЛЯ ІОННО-ПЛАЗМОВОЇ ОБРОБКИ ВИРОБІВ

Пристрій для іонно-плазмової обробки виробів містить два електроди, вакуумну камеру, вузол підпалювання дуги, електрично зв'язаний з пристроєм підпалювання, механічний пристрій гасіння дуги, відкачувальну вакуумну систему з блоком управління і джерело опорної напруги, силовий випрямляч, зв'язаний з пристроєм управління, арматуру з нагрівачами для виробів, які піддають напиленню, і пристрій іонної очистки. Пристрій додатково оснащено датчиком-формувачем імпульсів скидання і запуску, першим реле часу з блоком задання та індикації, а також блоком збіжностей, релаксатором і другим реле часу.

A DEVICE FOR THE ARTICLES ION-PLASMA TREATMENT

Ионный источник

Ионный источник, содержащий полый катод, закрытый сверху фланцем с выполненным в последнем осевым контрагирующим отверстием, в котором размещен анод с осевым отверстием для напуска рабочего газа; эмиссионный и ускоряющий электроды с отверстиями для отбора ионов в пучок и откачки рабочего газа, дополнительный электрод, выполненный в виде цилиндра из сетки из немагнитной стали и расположенный внутри полого катода с зазором между их боковыми поверхностями, составляющим от 2 до 6 мм; внутреннюю магнитную систему, размещенную в корпусе и осесимметрично расположенную внутри полого катода напротив фланца, первую и вторую внешние магнитные системы, размещенные по наружной боковой поверхности полого катода и ориентированные одноименными полюсами к центру последнего, причем одноименные полюса первой Фиг. 1 внешней магнитной системы и внутренней магнитной системы ориентированы навстречу друг другу, отличающийся тем, что в зазор контрагирующего отверстия, образованный фланцем полого катода и анодом ...

ПРИСТРІЙ ДЛЯ ІОННО-ПЛАЗМОВОЇ ОБРОБКИ ВИРОБІВ

Пристрій для іонно-плазмової обробки виробів містить два електроди, вакуумну камеру, вузол підпалення дуги, електрично зв'язаний з пристроєм підпалення, механічний пристрій гасіння дуги, відкачувальну вакуумну систему з блоком управління і джерело опорної напруги, силовий випрямляч, зв'язаний з пристроєм управління, арматуру з нагрівачами для виробів, що напилюються і пристрій іонної очистки. Пристрій додатково оснащено датчиком-формувачем імпульсів скидання і запуску, першим реле часу з блоком завдання та індикації, а також блоком збіжностей, релаксатором і другим реле часу.

Ion source

Multi directional mechanical scanning in an ion implanter

Apparatus and method for ion production enhancement

Image correcting method , system and program. mask, semiconductor producing method and design pattern

Particle source and manufacturing method thereof

匹配箱、使用匹配箱的真空装置及真空处理方法

... 提供一种较容易地再生成等离子体的真空装置。使用于本发明的真空装置(1)中的匹配箱(2)，通过改变可变电感元件(31)、(35)的电感值，就能改变阻抗。由于可变电感元件(31)、(35)的电感值可以通过控制直流电源的大小来进行控制，因此能高速地进行匹配工作。 ...

Mesh grid device used for ion source

Method and apparatus for ion formation in ion implanter

Atmospheric pressure on-site ion source device and working method thereof

The invention provides an atmospheric pressure on-site ion source device and a working method thereof. The ion source device comprises a first cavity, a discharging device and a second cavity. The first cavity is provided with an inlet and is internally hollow. The discharging device is arranged in the first cavity. The second cavity is internally hollow and communicated with the first cavity. The inner diameter ratio of R1 of the first cavity to R2 of the second cavity is larger than or equal to 1.5 and smaller than or equal to 20. An outlet of the second cavity serves as an ion outlet. The inner diameter is the diameter of the smallest circle of the section which covers the cavity and is perpendicular to the axial direction. A product d*P of the depth d in the first cavity and the pressure intensity P of gas is larger than or equal to 1m Pa and smaller than or equal to 20m Pa. The ion source device has the advantages of being stable in discharging, good in repeatability, high in spatial ...

Grill and the ion source

Electron beam exposure system

The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target (14), comprising: a beamlet generator for generating a plurality of electron beamlets (5a, 5b); a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected tothe modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses (7) wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

A solar cell sheet ion implantation machine

Particle source

Resistance trigger type vacuum arc ion source device

For the ion source of the filament holding device

Implanteur d'ions metalliques

Implanteur metallurgique d'ions metalliques a grande surface emissive, a flux important et a profondeur d'implantation reglable comportant a l'interieur d'une chambre d'implantation maintenue sous vide au moins une source d'ions a arc sous vide 1, 2, 3, 4 dont les ions 5 sont extraits et projetes sur une cible 9 au moyen d'une electrode d'extraction et de focalisation 6, 7 et d'une electrode d'acceleration 8 polarisees respectivement a tres haute et a basse tension. La cible 9 bombardee par la projection ionique emet un flux d'electrons secondaires qui sont repousses par une electrode suppresseuse 10 polarisee negativement par rapport a la cible mise a la masse. Application en metallurgie.

CHARGED PARTICLE GUN

GAS GENERATOR IONIZES VERY HAS HIGH PRESSURE AND VERY HIGH TEMPERATURE

Ion optics system to three gates.

SOURCE Of IONS HAS ELECTRONIC CYCLOTRONIC RESONANCE HAS COAXIAL INJECTION Of ELECTROMAGNETIC WAVES

ELECTRON SOURCES HAVING HIGH FREQUENCY INDUCTIVE COUPLED POWER DEMAND REDUCED BY INCLUDING ELECTROSTATIC ELECTRON

ELECTRODE D'EXTRACTION MOBILE POUR SOURCE D'IONS

ELECTRODE D'EXTRACTION MOBILE POUR SOURCE D'IONS. L'ELECTRODE EST MUNIE DE MOYENS MECANIQUE POUR COMMANDER DE L'EXTERIEUR DE L'ENCEINTE SON DEPLACEMENT, CES MOYENS COMPRENANT DEUX SYSTEMES APTES A DEPLACER INDEPENDAMMENT LES DEUX COTES LATERAUX DE L'ECRAN, CHACUN DE CES SYSTEMES COMPORTANT UN PARALLELOGRAMME DEFORMABLE ET UN MOYEN APTE A COMMANDER LA DEFORMATION DUDIT PARALLELOGRAMME. APPLICATION AUX IMPLANTEURS IONIQUES.

DEVICE HAS BEAM IONIC

Process for the realization of energy conversions ordered without inertia and located in areas of space strictly delimited

PARTICLE GUN FOR THE PULSED ELECTRICAL ENERGY PARTICLE DETERMINED

Ion bombardment apparatus

SOURCE Of IONS INCLUDING/UNDERSTANDING an IONIZATION CHAMBER HAS GAS WITH OSCILLATIONS Of ELECTRONS

GUN HAS PLASMA IMPROVES FOR A MACHINE HAS EROSION IONIC

Electric particle gun allowing pulsed emission of particles of specified energy

SOURCE Of IONS IN PARTICULAR FOR IONIC IMPLANTEUR

ION BEAM APPARATUS WITH SEPARATELY REPLACEABLE ELEMENTS

Permanent ion source

Точечный твердотельный источник ионов серебра

1. Точечный твердотельный источник ионов серебра, отличающийся тем, что содержит твердотельный резервуар, выполненный из серебра высокой степени чистоты в виде цилиндра с заостренным окончанием, на поверхность которого нанесена тонкая пленка кристаллического твердого электролита с мобильными ионами серебра, и бесконтактный омический нагреватель, выполненный в виде керамического полого цилиндра с нагревательными элементами, расположенными на внешней поверхности цилиндра, внутри которого размещен точечный твердотельный источник ионов серебра, нагреваемый до температуры ниже температуры плавления твердого электролита.2. Точечный твердотельный источник ионов серебра по п. 1, отличающийся тем, что твердый кристаллический электролит изготовлен методом механохимического синтеза из мелкодисперсных порошков исходных материалов в планетарной мельнице при комнатной температуре.3. Точечный твердотельный источник ионов серебра по любому из пп. 1 и 2, отличающийся тем, что в качестве метода нанесения тонкой пленки кристаллического твердого электролита использован метод импульсного лазерного напыления, гарантирующий сохранение стехиометрического состава нанесенной пленки. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (51) МПК H01J 27/26 (11) (13) 165 683 U1 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ТИТУЛЬНЫЙ (21)(22) Заявка: ЛИСТ ОПИСАНИЯ ПОЛЕЗНОЙ МОДЕЛИ К ПАТЕНТУ 2016115245/07, 19.04.2016 (24) Дата начала отсчета срока действия патента: 19.04.2016 (72) Автор(ы): Толстогузов Александр Борисович (RU), Дягилев Александр Александрович (RU) (45) Опубликовано: 27.10.2016 Бюл. № 30 1 6 5 6 8 3 R U (57) Формула полезной модели 1. Точечный твердотельный источник ионов серебра, отличающийся тем, что содержит твердотельный резервуар, выполненный из серебра высокой степени чистоты в виде цилиндра с заостренным окончанием, на поверхность которого нанесена тонкая пленка кристаллического твердого электролита с мобильными ионами серебра, и бесконтактный омический нагреватель, ...

SHIELDED CAPACITIVE ELECTRODE

A device is described, which is sensitive to electric fields, but is insensitive to stray electrons/ions and unlike a bare, exposed conductor, it measures capacitively coupled current while rejecting currents due to charged particle collected or emitted. A charged particle beam establishes an electric field inside the beam pipe. A grounded metallic box with an aperture is placed in a drift region near the beam tube radius. The produced electric field that crosses the aperture generates a fringe field that terminates in the back surface of the front of the box and induces an image charge. An electrode is placed inside the grounded box and near the aperture, where the fringe fields terminate, in order to couple with the beam. The electrode is negatively biased to suppress collection of electrons and is protected behind the front of the box, so the beam halo cannot directly hit the electrode and produce electrons. The measured signal shows the net potential (positive ion beam plus negative electrons) variation with time, as it shall be observed from the beam pipe wall. 1. A sensor for the measurement of a potential of an ion beam including:a faceplate having a front wall and back wall, the faceplate defining an aperture; andan electrode mounted to the back wall of the faceplate, concentric to the aperture defined by the faceplate, wherein the electrode is configured to capacitively couple to fringe fields associated with the ion beam.2. The sensor of wherein the sensor includes a box claim 1 , and wherein the faceplate comprises a side of the box.3. The sensor of wherein the faceplate is configured to be grounded.4. The sensor of wherein the aperture of the sensor is in the form of a rectangle.5. The sensor of wherein the width-to-length aspect ratio of the rectangle is about 2/1 to 5/1.6. The sensor of wherein the electrode is mounted to an insulating layer claim 1 , and wherein the insulating layer is mounted to the back wall of the faceplate.7. The sensor of wherein ...

METHODS AND APPARATUS FOR DETECTING NEUTRAL CHEMICAL UNITS VIA NANOSTRUCTURES

Suspended nanotubes are used to capture and ionize neutral chemical units, such as individual atoms, molecules, and condensates, with excellent efficiency and sensitivity. Applying a voltage to the nanotube(s) (with respect to a grounding surface) creates an attractive potential between a polarizable neutral chemical unit and the nanotube that varies as 1/r2, where r is the unit's distance from the nanotube. An atom approaching the nanotube with a sub-threshold angular momentum is captured by the potential and eventually spirals towards the nanotube. The atom ionizes as in comes into close proximity with a sidewall of the nanotube, creating an ion whose polarity matches the polarity of the electric potential of the nanotube. Repulsive forces eject the ion, which can be detected more easily than a neutral chemical unit. Suspended nanotubes can be used to detect small numbers of neutral chemical units (e.g., single atoms) for applications in sensing and interferometry. 1. A method of ionizing a neutral chemical unit , the method comprising: A1) capture a neutral chemical unit at a position along a length of the nanostructure within the electric field;', 'A2) ionize the neutral chemical unit at the position along the length of the nanostructure to generate a charged chemical unit; and', 'A3) eject the charged chemical unit from the vicinity of the nanostructure., 'A) applying a charging voltage between a substantially one-dimensional nanostructure and a reference potential to create an electric field in a vicinity of the nanostructure, so as to2. The method of claim 1 , wherein A) comprises applying a charging voltage greater than about 200 V.3. The method of claim 1 , wherein A) comprises selecting the charging voltage such that the electric field is at least about 3 V/nm.4. The method of claim 1 , wherein A) comprises varying the charging voltage as a function of time.5. The method of claim 4 , further comprising detecting the charged chemical unit ejected in A3) as ...

AIR CONDITIONER AND ION GENERATION DEVICE

An ion generator is provided with a casing configured to form a flow path for air and an ion generation unit detachably disposed in the casing and configured to discharge ions into the air. The ion generation unit is provided with a front face-side ion generation section and a rear face-side ion generation section which are disposed with a spacing there between, and a connection cover section configured to connect the front face-side ion generation section and the rear face-side ion generation section. One end of the front face-side ion generation section and one end of the rear face-side ion generation section are positioned to be separated from each other in the flow path. The other end of the front face-side ion generation section and the other end of the rear face-side ion generation section are connected to each other by the connection cover section. 1. An air conditioner comprising:a main body section configured to form a flow path for air; andan ion generation device detachably disposed in said main body section and configured to discharge ions into the air circulating in said flow path, whereinsaid ion generation device is provided with a first ion generation section and a second ion generation section which are disposed with a spacing therebetween and are configured to generate ions, and a connection section configured to connect said first ion generation section and said second ion generation section; andsaid first ion generation section and said second ion generation section include one ends which are positioned to be separated from each other in said flow path and the other ends which are connected to each other by said connection section.2. The air conditioner according to claim 1 , whereinsaid main body section includes an inner wall configured to define said flow path, andsaid main body section is formed with a recess section recessed from said inner wall for housing said connection section.3. The air conditioner according to claim 2 , wherein said ...

Methods and apparatuses for cleaning at least one surface of an ion source

The present invention is concerned with methods and apparatus for cleaning the surface of an ion source in a mass spectrometer, for example an electrode of a MALDI ion source. The method includes directing UV light onto the surface to desorb contaminant material. The UV light source can be a laser and a moving reflecting surface can be used to direct the light on to the surface.

Ion Wind Generator and Ion Wind Generating Device

Provided is an ion wind generator capable of diversifying either or both of the amount of wind or wind direction. An ion wind generator is provided with a first electrode, a second electrode having a downstream area which is arranged at a position in a plan view shifted from first electrode towards the positive side in the x direction, and a dielectric between the first electrode and the second electrode. In a plane view, the distance (d) in the x-direction from a downstream side edge of the first electrode to the downstream side edge of the downstream area differs in the y-direction which is perpendicular to the x-direction. 19-. (canceled)10. An ion wind generator comprising:a first electrode,a second electrode having a downstream area which is arranged at a position in a plan view shifted from the first electrode in a first direction, anda dielectric between the first electrode and the second electrode, wherein,in the plan view, a distance in the first direction from a downstream side edge of the first electrode to the downstream side edge of the downstream area differs in a second direction which is perpendicular to the first direction.11. The ion wind generator as set forth in claim 10 , wherein claim 10 , a length in the first direction of the downstream area is different in the second direction.12. The ion wind generator as set forth in claim 11 , wherein claim 11 , across the downstream side edge of the first electrode or the upstream side edge of the second electrode claim 11 , the downstream side part of the first electrode and the upstream side part of the second electrode overlap or are adjacent in the first direction or the distance between the two in the first direction is constant.13. The ion wind generator as set forth in claim 11 , wherein the downstream area is formed so that its length in the first direction becomes large at the center in the second direction.14. The ion wind generator as set forth in claim 12 , wherein the downstream area is ...

MASS SPECTROMETER WITH SOFT IONIZING GLOW DISCHARGE AND CONDITIONER

An ion source () for a mass spectrometer comprising an ionizer () receiving an ionizer gas from an ionizer gas supply (), a conditioner () in communication with the ionizer (), a reactor () in communication with the conditioner () and adapted for communication with the mass spectrometer, the reactor () adapted to receive a sample from a sample supply in communication with the reactor (), wherein the conditioner () is sized to remove fast diffusing electrons from a flow of the ionizer gas from the glow discharge ionizer () to the reactor (). 112102. An ion source ( , ) for a mass spectrometer comprising:{'b': 18', '106', '16, 'an ionizer (, ) formatted to receive an ionizer gas from an ionizer gas supply ();'}{'b': 20', '18', '106, 'a conditioner () in communication with the at least one ionizer (, ); and'}{'b': 22', '110', '20', '22', '110', '24', '20', '18', '106', '22', '110, 'a reactor (, ) in communication with the conditioner () and formatted for communication with the mass spectrometer, the reactor (, ) formatted to receive a sample from a sample supply (), wherein the conditioner () is sized to remove fast diffusing electrons from a flow of the ionizer gas between the glow discharge ionizer (, ) and the reactor (, ).'}212102201810622110. The ion source ( claim 1 , ) of claim 1 , wherein the conditioner () is sized to provide a transfer time of the gas flow from the at least one ionizer ( claim 1 , ) to the reactor ( claim 1 , ) of between about 5 ms and about 10 ms.31210220. The ion source ( claim 1 , ) of claim 1 , wherein the conditioner () comprises a tube having a length of about 15 mm and an inner diameter of about 2 mm.412102202018106. The ion source ( claim 1 , ) of claim 1 , wherein the conditioner () comprises a tube and a product of an inner diameter of the conditioner () and a pressure of the at least one ionizer ( claim 1 , ) is at least 50 mm*mbar.512102181062842. The ion source ( claim 1 , ) of claim 1 , wherein the at least one ionizer ( claim ...

Automatic Control System for Selection and Optimization of Co-Gas Flow Levels

An ion implantation system for improving performance and extending lifetime of an ion source is disclosed whereby the selection, delivery, optimization and control of the flow rate of a co-gas into an ion source chamber is automatically controlled.

ION GENERATING DEVICE AND ELECTRICAL APPARATUS

An arrangement area of a transformer drive circuit, an arrangement area of a high-voltage transformer, and an arrangement area of an ion generating unit are two-dimensionally divided from each other in a casing. A connection terminal is electrically connected to the transformer drive circuit and is formed of a conductive film arranged to be exposed to the outside of the casing. Accordingly, an ion generating device whose size and thickness can be easily reduced and an electrical apparatus including the ion generating device can be provided. 1. An ion generating device comprising:a transformer drive circuit;a transformer driven by the transformer drive circuit to boost a voltage;an ion generating unit that generates either or both of positive ions and negative ions by receiving the voltage boosted by the transformer; anda casing that houses the transformer drive circuit, the transformer, and the ion generating unit,wherein an arrangement area of the transformer drive circuit, an arrangement area of the transformer, and an arrangement area of the ion generating unit are two-dimensionally divided from each other in the casing, andwherein the ion generating device further comprises a connection terminal that is electrically connected to the transformer drive circuit and formed of a conductive film arranged to be exposed to the outside of the casing.2. The ion generating device according to claim 1 , further comprising:a contact board on which the connection terminal is formed,wherein both ends of the contact board are supported by the casing so that the contact board is attached to the casing.3. The ion generating device according to claim 2 , further comprising:a drive circuit board that supports the transformer drive circuit; andan ion generating unit board that supports the ion generating unit,wherein at least one of the drive circuit board and the ion generating unit board is configured so as to support an inner surface of the contact board at a side opposite an ...

NANOPOROUS VACUUM PUMP

The invention provides an element (), comprising: a nanoporous insulating film () (such as a thin nanoporous diamond film) and first and second conducting layers () on first and second opposed sides respectively of the film (). Also provided are a vacuum pump (), an ion source () and an ion trap (), each comprising such an element (). 1. A pump , comprising:a pumping element comprising: a nanoporous insulating film comprising a plurality of nanopores, and first and second conducting layers on first and second opposed sides respectively of said film; anda power supply configured to maintain a potential difference between said first and second conducting layers that produces a field ionizing electric field;wherein said pumping element supports a difference in gas pressure on said first and second conducting layers and supports field ionization by the electric field, and said electric field ionizes gas atoms or molecules in a proximity of said first conducting layer, transports said gas atoms or molecules once ionised through said first conducting layer into said nanopores, along said nanopores and through said second conducting layer.2. A pump as claimed in claim 1 , wherein the difference in gas pressure is one atmosphere.3. A pump as claimed in claim 1 , wherein said electric field is approximately 10 MV/cm.4. A pump as claimed in claim 1 , wherein the insulating film comprises a thin nanoporous diamond film or a thin nanoporous silicon nitride film.5. (canceled)6. A pump as claimed in claim 1 , wherein the first and second conducting layers comprise metallic layers or evaporatively deposited layers metallic layers.7. (canceled)8. An element as claimed in claim 1 , wherein said first and second conducting layers comprise molybdenum or gold.9. A pump as claimed in claim 1 , wherein the power supply is configured to maintain the first conducting layer at a negative potential relative to the second conducting layer.10. A pump as claimed in claim 1 , wherein the ...

SWITCHING MICRO-RESONANT STRUCTURES BY MODULATING A BEAM OF CHARGED PARTICLES

When using micro-resonant structures, a resonant structure may be turned on or off (e.g., when a display element is turned on or off in response to a changing image or when a communications switch is turned on or off to send data different data bits). Rather than turning the charged particle beam on and off, the beam may be moved to a position that does not excite the resonant structure, thereby turning off the resonant structure without having to turn off the charged particle beam. In one such embodiment, at least one deflector is placed between a source of charged particles and the resonant structure(s) to be excited. When the resonant structure is to be turned on (i.e., excited), the at least one deflector allows the beam to pass by undeflected. When the resonant structure is to be turned off, the at least one deflector deflects the beam away from the resonant structure by an amount sufficient to prevent the resonant structure from becoming excited. 1. A modulated electromagnetic radiation emitter , comprising:a charged particle generator configured to generate a beam of charged particles;at least one resonant structure configured to resonate at at least one resonant frequency higher than a microwave frequency when exposed to the beam of charged particles, anda director for directing the beam of charged particles away from the at least one resonant structure when the resonant structure is not to resonate.2. The emitter according to claim 1 , wherein the director is one from the group consisting of: a deflector claim 1 , a diffractor claim 1 , or an optical structure.3. The emitter according to claim 1 , wherein the director comprises at least one deflection plate between the charged particle generator and the at least one resonant structure.4. The emitter according to claim 1 , wherein the generator comprises a plurality of charged particle sources.5. The emitter according to claim 1 , wherein the at least one resonant structure comprises at least one silver- ...

LASER ION SOURCE

According to one embodiment, a laser ion source is configured to generate ions by application of a laser beam, the laser ion source including a case to be evacuated, an irradiation box disposed in the case and including a target which generates ions by irradiation of laser light, an ion beam extraction mechanism which electrostatically extracts ions from the irradiation box and guides the ions outside the case as an ion beam, a valve provided to an ion beam outlet of the case, the valve being opened at ion beam emission and being closed at other times, and a shutter provided between the valve and the irradiation box, the shutter being intermittently opened at ion beam emission and being closed at other times. 1. A laser ion source , comprising:a case to be evacuated;an irradiation box disposed in the case and comprising a target which generates ions by irradiation of laser light;an ion beam extraction mechanism which electrostatically extracts ions from the irradiation box and guides the ions outside the case as an ion beam;a valve provided to an ion beam outlet of the case, the valve being opened at ion beam emission and being closed at other times; anda shutter provided between the valve and the irradiation box, the shutter being intermittently opened at ion beam emission and being closed at other times.2. The laser ion source of claim 1 , wherein the ion beam extraction mechanism is an extraction electrode opposed to an ion ejection window of the irradiation box.3. The laser ion source of claim 1 , whereinthe laser light is intermittently emitted by pulse driving, andthe shutter is open for a predetermined period of time in synchronization with a drive pulse of the laser light.4. The laser ion source of claim 1 , whereinan exhaust outlet for vacuum evacuation of the case is provided in an upper surface of the case.5. The laser ion source of claim 4 , whereina blocking plate which covers the exhaust outlet when viewed from the irradiation box is provided at a ...

ALL-OPTICAL METHOD AND SYSTEM FOR GENERATING ULTRASHORT CHARGED PARTICLE BEAM

A method for generating an ultrashort charged particle beam, comprising creating a high intensity longitudinal E-field by shaping and tightly focusing, in an on-axis geometry, a substantially radially polarized laser beam, and using the high intensity longitudinal E-field for interaction with a medium to accelerate charged particles. 1. A method for generating an ultrashort charged particle beam , comprising creating a high intensity longitudinal E-field by shaping and tightly focusing in an on-axis geometry a substantially radially polarized laser beam , and using the high intensity longitudinal E-field for interaction with a medium to accelerate charged particles.2. The method of claim 1 , comprising a) converting the polarization of a beam from a high peak power laser to a substantially radial polarization claim 1 , b) shaping and optimizing the intensity profile and wavefront of the beam; c) tight focusing the radially polarized laser beam in an on-axis geometry with a high numerical aperture optic; and d) accelerating charged particles from the medium by the resulting high intensity longitudinal E-field; in an interaction chamber.4. A system for generating ultrashort charged particle beam claim 1 , in an interaction chamber claim 1 , comprising:a laser system delivering an ultrashort pulse;a polarization converter unit converting a beam from said laser system into a substantially radially polarized laser beam;amplitude beam shaping and transport optics, shaping the substantially radially polarized laser beam;focusing optics tight-focusing the beam received from said transport optics in an on-axis geometry; anda first medium from which charged particles are accelerated by the tight-focused beam.5. The system of claim 4 , wherein said laser system provides ultrashort laser pulses.6. The system of claim 4 , wherein said polarization converter comprises one of: achromatic half wave plates; electro optical modulators claim 4 , Z-polarization plates claim 4 , mode ...

TARGETS FOR GENERATING IONS AND TREATMENT APPARATUSES USING THE TARGETS

Provided is an ion beam treatment apparatus including the target. The ion beam treatment apparatus includes a substrate having a first surface and a second surface opposed to the first surface, and including a cone type hole decreasing in width from the first surface to the second surface to pass through the substrate, wherein an inner wall of the substrate defining the cone type hole is formed of a metal, an ion generation thin film attached to the second surface to generate ions by a laser beam incident into the cone type hole through the first surface and strengthen, and a laser that emits a laser beam to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam incident into the cone type hole is focused by the cone type hole and is strengthened. 1. An ion generation target comprising:a substrate having a first surface and a second surface opposed to the first surface, and comprising a cone type hole decreasing in width from the first surface to the second surface to pass through the substrate, wherein an inner wall of the substrate defining the cone type hole is formed of a metal; andan ion generation thin film attached to the second surface of the substrate to generate ions by means of a laser beam incident into the cone type hole through the first surface and strengthen.2. The ion generation target of claim 1 , wherein the substrate comprises a metal material.3. The ion generation target of claim 2 , wherein the metal material comprises silver claim 2 , copper claim 2 , gold claim 2 , or aluminum.4. The ion generation target of claim 1 , wherein the substrate comprises an insulating material.5. The ion generation target of claim 4 , further comprising a cone type metal thin film on an inner surface of the substrate exposed by the cone type hole.6. The ion generation target of claim 5 , wherein the cone type metal thin film comprises silver claim 5 , copper claim 5 , gold claim 5 , or aluminum.7. The ...

Laser-Ablation Ion Source with Ion Funnel

A laser-ablation ion source for generating a low energy ion beam having low longitudinal and transverse emittance, including a supersonic nozzle, followed by an RF ion funnel. A laser source generates a laser beam which is focused by a lens to an ablation site. The ablation site is located upstream of the nozzle, at a distance of less than 10 mm from the nozzle aperture. The laser irradiates the ablation site through the nozzle aperture to generate the ions.

ION GENERATING DEVICE

To prevent a reduction in an amount of an ion emission while preventing generation of electromagnetic noise. A high-voltage generating circuit section that supplies a high voltage to an ion generating element that generates ions is housed in a housing, and sealed with filled resin. An emission port for emitting the generated ions is formed in the housing, and an outer surface of the housing except the emission port is covered with a shield case. A passage port communicating with the emission port is formed in the shield case. A periphery of the passage port of the shield case is covered with an electrically insulating covering sheet so that emitted ions do not adhere to the shield case. The ions emitted from the emission port do not adhere to the shield case covered with the covering sheet. 17-. (canceled)8. An ion generating device , wherein a high-voltage generating circuit section that supplies a high voltage to an ion generating element that generates ions is housed in a housing , an emission port for emitting the generated ions is formed in the housing , an outer surface of the housing except the emission port is covered with a shield case , and the shield case is covered with an insulating section so that the emitted ions do not adhere to the shield case.9. The ion generating device according to claim 8 , wherein a passage port communicating with the emission port is formed in the shield case claim 8 , and the insulating section covers a periphery of the passage port.10. The ion generating device according to claim 8 , wherein a passage port communicating with the emission port is formed in the shield case claim 8 , and an end surface of the passage port is covered with the insulating section so as not to be exposed to the emission port.11. The ion generating device according to claim 10 , wherein a rib protruding outward is formed on a peripheral edge of the emission port in the housing claim 10 , and the rib is the insulating section that covers the end ...

CHARGED PARTICLE EMISSION GUN AND CHARGED PARTICLE RAY APPARATUS

Provided is a charged particle emission gun with which cleaning of a tip is possible without stopping the operation of the charged particle emission gun for a long time and without heating the tip. The charged particle emission gun includes a cleaning photo-irradiation apparatus that generates ultraviolet light or infrared light to irradiate a tip, and an optical fiber for guiding the ultraviolet light or the infrared light toward the tip. The cleaning photo-irradiation apparatus generates ultraviolet light or an infrared light with a predetermined wavelength and intensity to desorb a molecule adsorbed on the tip through photon stimulated desorption, or to desorb a molecule adsorbed on the tip through photon stimulated desorption and ionize the desorbed molecule. 1. A charged particle emission gun comprising:a tip;an extracting electrode having a central hole that is coaxial with the tip;an ion collector arranged between the tip and the extracting electrode, the ion collector having a central hole that is coaxial with the tip;a vacuum chamber that accommodates therein the tip, the extracting electrode, and the ion collector;a cooling apparatus for cooling the tip; anda cleaning photo-irradiation apparatus that generates ultraviolet light or infrared light to irradiate the tip.2. The charged particle emission gun according to claim 1 , wherein the cleaning photo-irradiation apparatus has an infrared laser source that generates an infrared laser ray with a peak output on the order of MW/cmand a wavelength of 1 μm or greater.3. The charged particle emission gun according to claim 1 , wherein the cleaning photo-irradiation apparatus has an ultraviolet lamp that generates ultraviolet light with a continuous spectrum of a wavelength of 400 nm or less.4. The charged particle emission gun according to claim 1 , wherein the cleaning photo-irradiation apparatus has an ultraviolet laser source that generates an ultraviolet laser ray with a pulse width on the order of ...

TARGETS FOR GENERATING IONS AND TREATMENT APPARATUSES INCLUDING THE TARGETS

Provided are an ion generation target and a treatment apparatus including the target. The treatment apparatus includes a grid having a net shape of nano wires, an ion generation thin film attached to a side of the grid and generating ions by means of an incident laser beam, and a laser for emitting a laser beam into the nano wire of the grid to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam emitted into the nano wire forms a near field, the intensity of which is higher than that of the laser beam through a nanoplasmonics phenomenon, and the near field emits the ions from the ion generation thin film. 1. An ion generation target comprising;a grid having a net shape of nano wires; andan ion generation thin film attached to a side of the grid and generating ions by means of an incident laser beam.2. The ion generation target of claim 1 , wherein the ion is a proton or a carbon ion.3. The ion generation target of claim 2 , wherein the ion is the proton claim 2 , and the ion generation thin film is formed of a material comprising hydrogen.4. The ion generation target of claim 3 , wherein the material comprising hydrogen is a silicon nitride claim 3 , a silicon oxide claim 3 , or a metal.5. The ion generation target of claim 2 , wherein the ion is the carbon ion claim 2 , and the ion generation thin film comprises graphene.6. The ion generation target of claim 1 , wherein the grid comprises silver claim 1 , copper claim 1 , gold claim 1 , or aluminum.7. The ion generation target of claim 1 , wherein the grid has a line width ranging from tens to hundreds nanometers.8. The ion generation target of claim 1 , further comprising a peripheral frame surrounding a periphery of the grid claim 1 ,wherein the ion generation thin film is attached to the peripheral frame.9. An ion beam treatment apparatus comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the ion generation target of ; and'}a laser for ...

ION GENERATOR

In an ion generator, a flexible discharge electrode composed of one wire is provided to a base , and a turning motion of a free end of the discharge electrode about a fixed end of the discharge electrode is performed by repulsive force of a corona discharge generated by supplying a high voltage to the fixed end . Therefore, in comparison with a discharge electrode composed of a bundle of thin wires, it is possible to significantly reduce dust emission from the free end of the discharge electrode , and to further improve the ion generator in maintenance interval. Since the discharge electrode is compose of one wire, it is possible to reduce the discharge electrode in size, easily observe the state of the discharge electrode , and simplify its maintenance. Since the discharge electrode performs a turning motion, it is possible to transport the generated air ions EI to a wide area of a packaging film , and to enhance ionizing efficiency. 1. An ion generator comprising a flexible discharge electrode which is composed of one wire , and which has a fixed end and a free end ,wherein a turning motion of the free end about the fixed end is performed by repulsive force of a corona discharge generated by supplying a high voltage to the fixed end.2. The ion generator according to claim 1 , further comprising a turning-motion control member for controlling a turning motion of the discharge electrode.3. The ion generator according to claim 1 , wherein the discharge electrode is set to 100 micrometers or less in diameter size.4. The ion generator according to claim 1 , wherein the discharge electrode is formed of titanium alloy. The present invention relates to an ion generator for generating air ions which are used for neutralizing and eliminating static electricity from an electrically-charged object such as for example a jig for assembling electronic parts, and a packaging film made of plastic material.When a packaging film made of plastic material, a jig for assembling ...

EXCITED GAS INJECTION FOR ION IMPLANT CONTROL

An ion source includes an ion chamber housing defining an ion source chamber, the ion chamber housing having a side with a plurality of apertures. The ion source also includes an antechamber housing defining an antechamber. The antechamber housing shares the side with the plurality of apertures with the ion chamber housing. The antechamber housing has an opening to receive a gas from a gas source. The antechamber is configured to transform the gas into an altered state having excited neutrals that is provided through the plurality of apertures into the ion source chamber. 1. An ion source comprising:an ion chamber housing defining an ion source chamber, the ion chamber housing having a side with a plurality of apertures; andan antechamber housing defining an antechamber, the antechamber housing sharing the side with the plurality of apertures with the ion chamber housing, the antechamber housing having an opening to receive a gas from a gas source, wherein the antechamber is configured to transform the gas into an altered state comprising excited neutrals that is provided through the plurality of apertures into the ion source chamber.2. The ion source of claim 1 , further comprising a source magnet positioned proximate the ion source chamber housing and the antechamber housing claim 1 , the source magnet configured to provide a magnetic field for both the ion source chamber and the antechamber.3. The ion source of claim 1 , wherein the ion source chamber comprises a first cathode configured to emit electrons into the ion source chamber that interacts with the gas in the altered state to generate plasma in the ion source chamber.4. The ion source of claim 3 , wherein the antechamber comprises a second cathode configured to emit electrons into the antechamber that interact with the gas to transform the gas into the altered state.5. The ion source of claim 1 , wherein the plurality of apertures has a quantity and dimension to enable the antechamber to operate over an ...

ALIGNMENT OF AN ATOM BEAM WITH AN ELECTRIC FIELD IN THE PRODUCTION OF A CHARGED PARTICLE SOURCE

A method for aligning the axis of an atom beam with the orientation of an electric field at a particular location within an enclosure for use in creating a charged particle source by photoionizing a cold atom beam. The method includes providing an atom beam in the enclosure, providing a plurality of electrically conductive devices in said enclosure, evacuating the enclosure to a pressure below about 10millibar, and aligning the axis of the atom beam with the orientation of the electric field, relative to each other, within less than about two degrees. Alignment may be facilitated by applying at least one voltage to the electrically conductive devices, mechanically tilting the atom beam's axis orientation of the electric field relative to each other and/or causing a deflection of the atom beam. 1. A method for aligning the axis of an atom beam with the orientation of an electric field at a particular location within an enclosure for use in a system for creating a charged particle source by photoionizing a cold atom beam , the method comprising:providing, by an atom beam creation device, an atom beam in the enclosure;providing a plurality of electrically conductive devices in said enclosure;providing an electric field;{'sup': '−6', 'evacuating the enclosure to a pressure below about 10millibar; and'}aligning the axis of the atom beam and the orientation of the electric field, at an angle relative to each other, within less than about two degrees.2. The method of claim 1 , wherein the electric field is generated by applying at least one voltage to the plurality of electrically conductive devices.3. The method of claim 2 , wherein the aligning step includes:adjusting the mechanical tilt of the plurality of electrically conductive devices until the atom beam axis and electric field are substantially aligned.4. The method of claim 2 , wherein the aligning step includes:adjusting the mechanical tilt of all or a portion of the atom beam creation device until the atom beam ...

ION GENERATION DEVICE

The present invention provides methods and systems for an ion generation device that includes an elongate housing having a back portion and a pair of side portions extending from the back portion and forming a cavity therein. A conductive portion is disposed within the cavity and connected to a power supply for providing power to the conductive portion. A plurality of tines are engaged to the conductive portion. 1. An ion generation device , comprising:an elongate housing having a back portion and a pair of side portions extending from the back portion and forming a cavity therein;a conductive portion disposed within the cavity and connected to a power supply for providing voltage to the conductive portion; anda plurality of tines engaged to the conductive portion.2. The ion generation device of claim 1 , further comprising an extrusion disposed within the cavity of the housing.3. The ion generation device of claim 1 , wherein the plurality of tines are composed of a polypropylene impregnated with carbon.4. The ion generation device of claim 1 , wherein the tines are composed of a homopolypropylene impregnated with carbon.5. The ion generation device of claim 1 , further comprising an extrusion composed of UL V0 rated plastic having a hollow interior portion for receiving the power supply and conductive portion.6. The ion generation device of claim 1 , further comprising a shelf positioned on the inner portion of each side portion of the housing for receiving a first rib of the extrusion.7. The ion generation device of claim 1 , wherein the tines are spaced an equal distance apart along the length of the conductive portion.8. An ion generation device claim 1 , comprising:an elongate housing having a back portion and a pair of side portions having an interior portion and exterior portion and extending generally perpendicularly from the back portion and forming a cavity therein;an extrusion disposed within the cavity of the housing and having a hollow for receiving a ...

Multi Species Ion Source

A high brightness ion source with a gas chamber includes multiple channels, wherein the multiple channels each have a different gas. An electron beam is passed through one of the channels to provide ions of a certain species for processing a sample. The ion species can be rapidly changed by directing the electrons into another channel with a different gas species and processing a sample with ions of a second species. Deflection plates are used to align the electron beam into the gas chamber, thereby allowing the gas species in the focused ion beam to be switched quickly. 1. A charged particle beam system , comprising:an electron source for providing a beam of electrons along an optical axis within a vacuum chamber;multiple channels, at least one of the multiple channels having a gas inlet and adapted for containing gas to interact with the electrons to produce ions;a first deflector for selectively deflecting the electron beam into different ones of the multiple channels;one or more extractor electrodes for extracting ions from the multiple channels; anda second deflector for aligning the extracted ions with the optical axis.2. The charged particle beam system of further comprising a focusing lens for focusing the extracted ions onto a work piece.3. The charged particle beam system of in which each of the multiple channels includes an inlet for connecting to a gas source.4. The charged particle beam system of in which the first deflector includes two parts claim 1 , a first part to deflect the electron beam away from the optical axis and a second part to deflect the electrons onto a second optical axis claim 1 , parallel to the first optical axis and concentric with one of the multiple channels.5. The charged particle beam system of in which the second deflector includes two parts claim 4 , a first part to deflect the ion beam away from the second axis and a second part to deflect the ions onto the first optical axis.6. The charged particle beam system of further ...

LOW TEMPERATURE PLASMA PROBE AND METHODS OF USE THEREOF

The present invention generally relates to a low temperature plasma probe for desorbing and ionizing at least one analyte in a sample material and methods of use thereof. In one embodiment, the invention generally relates to a low temperature plasma probe including: a housing having a discharge gas inlet port, a probe tip, two electrodes, and a dielectric barrier, in which the two electrodes are separated by the dielectric barrier, in which application of voltage from a power supply generates a low temperature plasma, and in which the low temperature plasma is propelled out of the discharge region by the electric field and/or the discharge gas flow. 160-. (canceled)61. A low temperature plasma probe , the probe comprising:a hollow body having an open distal end;a discharge gas inlet port coupled to the body such that gas may be injected through the port and into the body; andan electrode at least partially disposed within the body; wherein the probe is configured such that injected gas interacts with the electrode to form a low temperature plasma that is ejected from the distal end of the body.62. The probe according to claim 61 , wherein the electrode is axially centered within the distal end of the body.63. The probe according to claim 61 , further comprising a power supply.64. The probe according to claim 61 , wherein a discharge gas is supplied to the probe through the discharge gas inlet port.65. The probe according to claim 61 , wherein the discharge gas assists in propelling the low temperature plasma out of the probe tip.66. The probe according to claim 61 , wherein the discharge gas is nitrogen.67. The probe according to claim 61 , wherein the probe is operably coupled to a sample stage such that low temperature plasma generated by the probe is directed from the probe to interact with a sample on the sample stage.68. The probe according to claim 66 , wherein a mass analyzer is located distal the sample stage to receive ions generated by the interaction of ...

ION GENERATION APPARATUS AND ELECTRIC EQUIPMENT USING THE SAME

In this ion generation apparatus, an induction electrode is formed on a surface of a first printed substrate, a hole is opened on the inside of the induction electrode, a needle electrode is mounted on a second printed substrate, and a tip end portion of the needle electrode is inserted in the hole. Therefore, even if the ion generation apparatus is placed in a high-humidity environment with dust accumulating on the first and the second printed substrates, the ion generation apparatus can prevent a current from leaking between the needle electrode and the induction electrode. 1. An ion generation apparatus generating ions including an induction electrode and a needle electrode , comprising:a first substrate having a hole opened therein; anda second substrate provided to face one surface of said first substrate,said induction electrode being provided around said hole in said first substrate,said needle electrode having a base end portion provided in said second substrate, and a tip end portion inserted in said hole.2. The ion generation apparatus according to claim 1 , further comprising a lid member provided to cover another surface of said first substrate and having a cylindrical boss at a position corresponding to said hole claim 1 , whereinsaid boss is inserted in said hole, and said needle electrode is inserted in said boss.3. The ion generation apparatus according to claim 2 , wherein the tip end portion of said needle electrode penetrates through said boss and protrudes from said lid member.4. The ion generation apparatus according to claim 1 , wherein said induction electrode is annularly formed around said hole in said first substrate.5. The ion generation apparatus according to claim 1 , whereinsaid first substrate is a printed substrate, andsaid induction electrode is formed of a wiring layer of said printed substrate.6. Electric equipment claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the ion generation apparatus according to ; ...

Apparatus For Dynamic Temperature Control Of An Ion Source

An apparatus for controlling the temperature of an ion source is disclosed. The ion source includes a plurality of walls defining a chamber in which ions are generated. To control the temperature of the ion source, one or more heat shields is disposed exterior to the chamber. The heat shields are made of high temperature and/or refractory material designed to reflect heat back toward the ion source. In a first position, these heat shields are disposed to reflect a first amount of heat back toward the ion source. In a second position, these heat shields are disposed to reflect a lesser second amount of heat back toward the ion source. In some embodiments, the heat shields may be disposed in one or more intermediate positions, located between the first and second positions. 1. An apparatus comprising:an ion source having a plurality of walls defining a chamber; anda movable heat shield disposed outside the chamber and proximate at least one of the walls, where the movable heat shield has a first position where a first amount of heat is reflected back toward the chamber and a second position where a second amount of heat is reflected back toward the chamber, the second amount of heat being less than the first amount of heat.2. The apparatus of claim 1 , wherein the plurality of walls comprises a bottom wall claim 1 , a top wall with an aperture claim 1 , two end walls and two side walls claim 1 , where a cathode is disposed proximate one of the two end walls claim 1 , and wherein the movable heat shield is disposed proximate one of the two end walls.3. The apparatus of claim 2 , wherein the movable heat shield moves in a direction parallel to a plane of a first of the two end walls and in the first position claim 2 , the movable heat shield overlaps a portion of a first end wall claim 2 , and in the second position claim 2 , the movable heat shield overlaps a smaller portion of the first end wall.4. The apparatus of claim 2 , wherein the movable heat shield rotates ...

Vaporizer For Ion Source

A vaporizer with several novel features to prevent vapor condensation and the clogging of the nozzle is disclosed. The vaporizer is designed such that there is an increase in temperature along the path that the vapor travels as it flows from the crucible to the arc chamber. The vaporizer uses a nested architecture, where the crucible is installed within an outer housing. Vapor leaving the crucible exits through an aperture and travels along the volume between the crucible and the outer housing to the nozzle, where it flows to the arc chamber. In certain embodiments, the aperture in the crucible is disposed at a location where liquid in the crucible cannot reach the aperture. 1. A vaporizer , comprising:a crucible in which a dopant material may be disposed, having an aperture passing through a sidewall of the crucible;an outer housing surrounding the crucible;a vapor channel disposed between the outer housing and the crucible, wherein the aperture is in communication with the vapor channel; anda gas nozzle attached to one end of the outer housing in communication with the vapor channel.2. The vaporizer of claim 1 , wherein the crucible and the outer housing are concentric cylinders.3. The vaporizer of claim 1 , comprising a heat source disposed outside of the outer housing.4. The vaporizer of claim 1 , comprising a heat source embedded in the outer housing.5. The vaporizer of claim 1 , wherein a temperature in the vapor channel is greater than a temperature in the crucible.6. The vaporizer of claim 1 , wherein the aperture is disposed in a location so that liquid in the crucible cannot reach the aperture.7. The vaporizer of claim 1 , wherein vapor travels in a path from the crucible through the aperture into the vapor channel and to the gas nozzle claim 1 , and wherein a temperature is increasing as the vapor flows along the path from the aperture to the gas nozzle.8. The vaporizer of claim 1 , comprising a spacer disposed between the crucible and the outer housing ...

IONIZATION PROBE ASSEMBLIES

The invention relates generally to sample ionization, and provides ionization probe assemblies, systems, computer program products, and methods useful for this purpose. 140.-. (canceled)41. An ionization probe assembly , comprising:at least one ion source housing back plate that comprises one or more surfaces that define at least one spray orifice, which ion source housing back plate is configured to operably connect to an ion source housing;at least one probe support structure coupled to the ion source housing back plate via at least one linear slide;at least one probe substantially fixedly mounted on the probe support structure; and,at least one probe conveyance mechanism operably connected to the probe support structure, which probe conveyance mechanism is configured to convey the probe between at least a first position and a second position, wherein the first position is substantially electrically isolated from the second position.42. (canceled)43. An ionization probe assembly , comprising:at least one ion source housing back plate that comprises one or more surfaces that define at least one spray orifice, which ion source housing back plate is configured to operably connect to an ion source housing;at least one probe movably coupled to the ion source housing back plate via at least one pivot mechanism; and,at least one probe conveyance mechanism that comprises at least one motor operably connected to the pivot mechanism via a pulley and belt drive assembly, which probe conveyance mechanism is configured to selectively convey the probe between at least a first position and a second position, wherein the first position is substantially electrically isolated from the second position.4449.-. (canceled)50. A method of spraying sample aliquots into an ion source housing of a molecular mass measurement system , the method comprising:(a) conveying a first probe from a first rinse position to a first spray position of the molecular mass measurement system, wherein the ...

Ionizing Electrode with Integral Cleaning Mechanism

Ionizing electrode with a cleaning mechanism including a solenoid with a bushing, a magnetic conductor, a coil housing a core having first and second ends, a return spring and a terminal for high voltage supply mounted on its body. The ionizing electrode is mounted inside the bushing and is configured so that an ionizing end and a non-ionizing end of the electrode protrude from the bushing, the non-ionizing end being fastened to the first end of the solenoid core. 1. Ionizing electrode with a cleaning mechanism which comprises:a solenoid with a bushing, a magnetic conductor, a coil housing a core having first and second ends, a return spring and a terminal for high voltage supply mounted on its body; andan ionizing electrode mounted inside the bushing and configured so that an ionizing end and a non-ionizing end of the electrode protrude from the bushing, the non-ionizing end of the electrode being fastened to the first end of the solenoid core.2. The ionizing electrode according to wherein the return spring is located between the terminal for high voltage supply and the second end of the solenoid core.3. The ionizing electrode according to where the terminal for high voltage supply is connected to the ionizing electrode via the return spring and the solenoid core.4. Ionizing electrode with a cleaning mechanism which comprises:a solenoid with a bushing, a magnetic conductor, a coil housing a core having first and second ends, a return spring and a terminal for high voltage supply mounted on its body; andan ionizing electrode mounted inside the bushing and configured so that an ionizing edge and a non-ionizing end of the electrode protrude from the bushing, and whereina length of the ionizing edge of the electrode protruding from the bushing is smaller than a maximum amplitude of back-and-forth motion of the solenoid core.5. The ionizing electrode according to wherein the length of the bushing is bigger than the maximum amplitude of back-and-forth motion of the ...

CHARGER, ION GENERATOR, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE

A charger to apply a charge to an object is provided. The charger includes an electron emitter including an electroconductive substrate; and a layer of n-type hexagonal boron nitride codoped with magnesium and oxygen atoms, which is located on the electroconductive substrate, wherein the concentration of oxygen atoms in the layer of n-type hexagonal boron nitride codoped with magnesium and oxygen atoms is higher than the concentration of magnesium atoms in the layer. 1. A charger to apply a charge to an object , comprising: an electroconductive substrate; and', 'a layer of n-type hexagonal boron nitride codoped with magnesium and oxygen atoms, which is located on the electroconductive substrate,, 'an electron emitter includingwherein a concentration of oxygen atoms in the layer of n-type hexagonal boron nitride codoped with magnesium and oxygen atoms is higher than a concentration of magnesium atoms in the layer.2. The charger according to claim 1 , wherein the electroconductive substrate has projections on a surface thereof claim 1 , and the layer of n-type hexagonal boron nitride codoped with magnesium and oxygen atoms is located on the surface of the electroconductive substrate while having projections.3. The charger according to claim 2 , wherein the electron emitter further includes:an insulator layer located on a surface of the layer of n-type hexagonal boron nitride codoped with magnesium and oxygen atoms in such a manner as to surround the projections of the layer of n-type hexagonal boron nitride codoped with magnesium and oxygen atoms; anda gate electrode located on the insulator layer.4. The charger according to claim 1 , further comprising:a support to support the electron emitter; anda power source to apply a voltage to the electroconductive substrate of the electron emitter.5. The charger according to claim 3 , further comprising:a support to support the electron emitter; anda power source to apply a voltage to each of the electroconductive substrate ...

ION GENERATING DEVICE WITH ELECTRON CYCLOTRON RESONANCE

An electron cyclotron resonance ion generator device includes a metal tube subjected to a first potential and pierced by a first cavity forming a plasma chamber intended to contain a plasma; a second cavity forming a waveguide configured to inject a high frequency wave into the plasma chamber, an extraction system including an upstream end connected to the plasma chamber and a downstream end configured to be connected to an ion transport line, the connecting flange being subjected to a second potential, a magnetic field generator, and a ceramic tube in contact with the metal tube, the ceramic tube surrounding the metal tube and at least a part of the extraction system. 1. An electron cyclotron resonance ion generator device comprising: a first cavity forming a plasma chamber configured to contain a plasma;', 'a second cavity connected to the first cavity, the second cavity forming a waveguide configured to inject a high frequency wave into the plasma chamber,, 'a metal tube, the metal tube being intended configured to be placed at a first potential the metal tube being pierced byan extraction system configured to extract ions from the plasma chamber, the extraction system comprising an upstream end connected to the plasma chamber and a downstream end provided with a connecting flange configured to be connected to an ion transport line, the connecting flange being configured to be placed at a second potential different to the first potential,a magnetic field generator configured to generate a magnetic field in the plasma chamber, andan insulating structure configured to insulate electrically the metal tube from the downstream end of the extraction system, the insulating structure comprising a ceramic tube in contact with the metal tube, the ceramic tube surrounding the metal tube and at least a part of the extraction system.2. The device according to claim 1 , wherein the extraction system comprises:a first electrode integral with the metal tube, the first electrode ...

Filament for mass spectrometric electron impact ion source

The invention provides a cathode system for an Electron Ionization (EI) source comprising a filament and current supply posts, the current supply posts dividing the filament into segments and each current supply post supplying or returning the current for at least two segments of the filament. Each filament segment is connected, for instance by spot welding, to the supply posts delivering the heating current. The filament segments may be arranged in a row, or substantially parallel to each other. Filament segments arranged in a row may form a closed loop, for instance, a ring. Other embodiments encompass the filament shape of a helical coil.

Planar ion sources for spectrometers

An apparatus for separating and analyzing ions includes a detector, a planar ion drift tube coupled to the detector and having a width, and a planar ion source. The planar ion source is coupled to the ion drift tube on an end of the ion drift tube opposite the detector and has a span greater than or equal to the width of the ion drift tube to ionize an analyte gas and fragment the analyte gas ions prior to admittance to the ion drift tube. Chemical detectors and methods of chemical detection are also described.

Lifetime ion source

An ion source includes an ion source chamber, a gas source to provide a fluorine-containing gas species to the ion source chamber and a cathode disposed in the ion source chamber configured to emit electrons to generate a plasma within the ion source chamber. The ion source chamber and cathode are comprised of a refractory metal. A phosphide insert is disposed within the ion source chamber and presents an exposed surface area that is configured to generate gas phase phosphorous species when the plasma is present in the ion source chamber, wherein the phosphide component is one of boron phosphide, tungsten phosphide, aluminum phosphide, nickel phosphide, calcium phosphide and indium phosphide.

AIR BLOWER, ION TRANSMITTING DEVICE, ELECTRICAL APPLIANCE, AND REMOTE CONTROL HOLDING STRUCTURE

An inlet port and an outlet port which are open in a body housing , an air-blowing pathway disposed inside the body housing , making the inlet port and the outlet port communicate with each other, and also having a plurality of divisional pathways obtained by division with partition plates , an air-blowing fan disposed upstream from the divisional pathways inside the air-blowing pathway , a removable inner cover covering the divisional pathways and having an inner surface which forms a side wall of the air-blowing pathway , and a removable exterior cover covering the inner cover to form an outer surface of the body housing are provided, and the inner cover has marking portions formed on an outer surface along the partition plates 1. An air blower comprising a body housing having an inlet port and an outlet port which are open; an air-blowing duct disposed inside the body housing , making the inlet port and the outlet port communicate with each other , and also having a plurality of divisional pathways obtained by division with partition plates; an air-blowing fan disposed upstream from the divisional pathways inside the air-blowing duct; a removable inner cover covering the divisional pathways and having an inner surface which forms a side wall of the air-blowing duct; and a removable exterior cover covering the inner cover to form an outer surface of the body housing;wherein the inner cover has marking portions formed on an outer surface along the partition plates.2. The air blower according to claim 1 ,wherein the inlet port is provided in a lower part of the body housing and the outlet port is provided in a front surface of the body housing above the inlet port, and the partition plates have a lower part extending in a vertical direction and an upper part curved toward the outlet port.3. The air blower according to or claim 1 ,wherein fitting grooves fitting in the partition plates are provided in the inner surface of the inner cover, and rear surfaces of the ...

Gas Coupled Arc Chamber Cooling

An ion implantation system, having a temperature controlled ion source chamber is disclosed. The temperature of the ion source chamber is regulated by disposing a heat sink in proximity to the ion source chamber. A gas fillable chamber is disposed between and in physical communication with both the ion source chamber and the heat sink. By controlling the amount of gas, i.e. the gas pressure, within the gas fillable chamber, the coefficient of heat transfer can be manipulated. This allows the temperature of the ion source chamber to be controlled through the application or removal of gas from the gas fillable chamber. This independent temperature control decouples the power used to heat the ion generator from the ion species that are ultimately generated. 1. A method of producing an ion beam having a desired beam current and a desired ion composition , comprising:introducing a feed gas to an ion source chamber;applying power to an ion generator disposed in said ion source chamber to create a plasma having said desired beam current; andindependently controlling a temperature of said ion source chamber by transferring a variable amount of heat away from said ion source chamber to create said ion beam of said desired ion composition.2. The method of claim 1 , further comprising a heat sink and a gas fillable chamber disposed between and in thermal communication with said ion source and said heat sink claim 1 , wherein said controlling said temperature is performed by regulating a pressure of gas within said gas fillable chamber.3. The method of claim 1 , wherein a parameter of said ion beam is monitored claim 1 , and said temperature is regulated based on said monitored parameter.4. The method of claim 3 , wherein said parameter comprises one or more selected from the group consisting of ion beam composition claim 3 , ion beam current claim 3 , ion beam current density claim 3 , ion beam angle and angle distribution.5. The method of claim 1 , wherein a parameter of said ...

TARGET FOR GENERATING POSITIVE IONS, METHOD OF FABRICATING THE SAME, AND TREATMENT APPARATUS USING THE TARGET

Provided is an ion beam treatment apparatus. The treatment apparatus includes a target for generating positive ions including a thin film for generating positive ions and nanowires disposed on at least one side of the thin film for generating positive ions, and a laser for emitting a laser beam incident on nanowires to project positive ions to a tumor region of a patient by generating the positive ions from the thin film for generating positive ions. Each of the nanowires may include a metal nanocore and a polymer shell surrounding the metal nanocore. The laser beam incident on the nanowires forms surface plasmon resonance, a near field having an intensity enhanced more than an intensity of the laser beam is formed by the surface plasmon resonance, and the positive ions are emitted from the thin film for generating positive ions by the near field. 1. A target for generating positive ions comprising:a thin film for generating positive ions; andnanowires provided on at least one side of the thin film for generating positive ions,wherein each of the nanowires comprise a metal nanocore and a polymer shell surrounding the metal nanocore, andthe thin film for generating positive ions generates positive ions by a laser beam incident on the nanowires.2. The target for generating positive ions of claim 1 , wherein the metal nanocore is composed of metal nanoparticles.3. The target for generating positive ions of claim 2 , wherein the metal nanoparticles comprise gold claim 2 , silver claim 2 , copper claim 2 , or aluminum.4. The target for generating positive ions of claim 2 , wherein the nanowires are formed by electrospinning a polymer solution including the metal nanoparticles.5. The target for generating positive ions of claim 1 , wherein the metal nanocore has a linewidth ranging from a few tens to a few hundreds of nanometers.6. The target for generating positive ions of claim 1 , wherein the positive ions are protons claim 1 , carbon ions claim 1 , oxygen ions claim 1 ...

System And Method For Improved Beam Current From An Ion Source

An IHC ion source that employs a negatively biased cathode and one or more side electrodes is disclosed. The one or more side electrodes are left electrically unconnected in certain embodiments and are grounded in other embodiments. The floating side electrodes may be beneficial in the formation of certain species. In certain embodiments, a relay is used to allow the side electrodes to be easily switched between these two modes. By changing the configuration of the side electrodes, beam current can be optimized for different species. For example, certain species, such as arsenic, may be optimized when the side electrodes are at the same voltage as the chamber. Other species, such as boron, may be optimized when the side electrodes are left floating relative to the chamber. In certain embodiments, a controller is in communication with the relay so as to control which mode is used, based on the desired feed gas. 1. An ion source , comprising:a chamber, comprising at least one electrically conductive wall, wherein the chamber comprises two ends and side walls connecting the two ends;a cathode disposed on one end of the chamber;a first side electrode disposed on one side wall; andan arc power supply to bias the cathode at a negative voltage relative to the electrically conductive wall;wherein the first side electrode is electrically floating.2. The ion source of claim 1 , further comprising a second side electrode disposed on a second side wall claim 1 , wherein the second side electrode is electrically floating.3. The ion source of claim 1 , further comprising a repeller disposed on an opposite end of the chamber.4. An ion source claim 1 , comprising:a chamber, comprising at least one electrically conductive wall;a cathode disposed on one end of the chamber;a first side electrode disposed on one side wall; anda switch having two terminals, wherein a first terminal is in communication with the electrically conductive wall and a second terminal is in communication with ...

ION SOURCE

A method of ionizing a sample is disclosed that comprises heating a sample so that analyte is released from the sample, producing charged particles such as charged droplets downstream of the sample, and using the charged particles to ionize at least some of the analyte released from the sample so as to produce analyte ions. 1. A method of ionizing a sample comprising:heating a sample so that analyte is released from the sample;producing charged particles downstream of the sample; andusing the charged particles to ionize at least some of the analyte released from the sample so as to produce analyte ions.2. The method of claim 1 , wherein the charged particles comprise charged droplets.3. The method of claim 2 , wherein the charged droplets comprise charged solvent droplets.4. The method of claim 2 , wherein the charged droplets comprise (i) water; (ii) formic acid and/or another organic acid; (iii) acetonitrile; and/or (iv) methanol.5. The method of claim 2 , wherein:producing charged particles downstream of the sample comprises causing droplets to impact upon an impactor target; andthe impactor target is located downstream of the sample.6. The method of claim 5 , wherein:the droplets are emitted from a sprayer outlet; andthe sprayer outlet is located downstream of the sample.7. The method of claim 6 , further comprising passing the analyte ions to an analytical instrument via an ion inlet; wherein:{'sub': '1', 'the sprayer outlet is located at a first distance xin a first direction from the ion inlet;'}{'sub': '2', 'the sample is located at a second distance xin the first direction from the ion inlet; and'}{'sub': 2', '1, 'the second distance xis larger than the first distance x.'}8. The method of claim 2 , wherein:producing charged particles downstream of the sample comprises emitting the charged droplets from a sprayer outlet; andthe sprayer outlet is located downstream of the sample.9. The method of claim 8 , further comprising passing the analyte ions to an ...

Apparatus and Method for Operating a Heaterless Hollow Cathode, and an Electric Space Propulsion System Employing such a Cathode

A heaterless hollow cathode provides electron emission current in an electric space propulsion system. A mechanical, thermal, and electromagnetic design of the cathode apparatus is presented, and a method of operation for rapid ignition and stabilization of the cathode is provided. The keeper of the cathode apparatus has a thickness change which reduces the flow of heat away from the cathode's emitter assembly. The method for heating the emitter assembly includes controlling applied voltages so that the current flowing from the emitter assembly to the keeper is maintained at a predetermined fixed value. By this method, damage to the electron emitting surfaces of the emitter assembly by electric arcing and/or by depletion of dopant materials is avoided. 1. A heaterless hollow cathode apparatus comprising:(a) an emitter assembly comprising an electron emitter and an emitter holder, said emitter assembly defining a gas flow path passing through an emitter orifice;(b) a keeper surrounding said emitter assembly, said keeper having a keeper orifice;(c) a gas flow regulator for supplying a regulated flow of gas through said gas flow path;(d) an electrical power supply; and (i) apply an emitter-keeper voltage between said emitter assembly and said keeper while gas is supplied to a volume between said emitter assembly and said keeper to initiate a discharge between said emitter assembly and said keeper;', '(ii) monitor the value of an emitter-keeper current, flowing between said emitter assembly and said keeper, and adjust said emitter-keeper voltage so as to maintain said emitter-keeper current at a predetermined current value;', '(iii) monitor said emitter-keeper voltage so as to detect a drop in said emitter-keeper voltage to values which remain below a predetermined voltage threshold for a predetermined minimum time duration;', '(iv) actuate a main discharge circuit in which current flows from an anode to the heaterless hollow cathode; and', '(v) set said emitter-keeper ...

SYSTEM AND METHOD FOR POWER CONVERSION

A polarity-selectable high voltage direct current power supply including a first drive assembly that transforms a first low voltage DC input into a first medium voltage alternating current output; a first HV output assembly that transforms the first LV AC output into a first HV DC output, wherein the first HV output assembly defines a first input stage; a polarity selector coupled between the second output junction of the first drive assembly and the first and second input stages of the first HV output assembly, the polarity selector operable between a first configuration and a second configuration; wherein in the first configuration the first HV DC output has a positive polarity; and wherein in the second configuration the first HV DC output has a negative polarity. 1. An output-polarity-selectable power supply comprising:a first drive assembly that receives a first voltage and outputs a second voltage, wherein the first drive assembly defines a first output junction pair;a first output assembly that receives the second voltage and outputs a third voltage, wherein the first output assembly defines a first input stage electrically connectable to the first output junction pair, a second input stage electrically connectable to the first output junction pair, and a second output junction pair; wherein in the first configuration: the set of switches directly electrically connects the first output junction pair to the first input stage and electrically isolates the first output junction pair from the second input stage, and the second output junction pair defines a positive polarity; and', 'wherein in the second configuration: the set of switches directly electrically connects the first output junction pair to the second input stage and electrically isolates the first output junction pair from the first input stage, and the second output junction pair defines a negative polarity., 'a polarity selector coupled between the first output junction pair and the first and ...

Thermally Isolated Repeller And Electrodes

An ion source having a thermally isolated repeller is disclosed. The repeller comprises a repeller disk and a plurality of spokes originating at the back surface of the repeller disk and terminating in a post. In certain embodiments, the post may be hollow through at least a portion of its length. The use of spokes rather than a central stem may reduce the thermal conduction from the repeller disk to the post. By incorporating a hollow post, the thermal conduction is further reduced. This configuration may increase the temperature of the repeller disk by more than 100° C. In certain embodiments, radiation shields are provided on the back surface of the repeller disk to reduce the amount of radiation emitted from the sides of the repeller disk. This may also help increase the temperature of the repeller. A similar design may be utilized for other electrodes in the ion source.

GAS MIXTURE METHOD AND APPARATUS FOR GENERATING ION BEAM

A gas mixture method and apparatus of prolonging lifetime of an ion source for generating an ion beam particularly an ion beam containing carbon is proposed here. By mixing the dopant gas and the minor gas together to generate an ion beam, undesired reaction between the gas species and the ion source can be mitigated and thus lifetime of the ion source can be prolonged. Accordingly, quality of ion beam can be maintained. 1. A gas mixture method of prolonging lifetime of an ion source for generating an ion beam comprising:supplying a dopant gas into a container, wherein the dopant gas is a carbon-containing gas used for generating carbon-containing ions; and{'sub': 2', '4', '3', '3', '4, 'supplying a minor gas into the container to dilute the dopant gas for prolonging lifetime of the ion source, wherein the minor gas can be H, CF, Xe, Kr, Ar, PH, AsH, CHor any combination thereof; and'}providing a gas mixture in the ion source chamber to generate the ion beam after mixing the dopant gas and the minor gas at a mixture ratio in the container, wherein the mixture ratio is volume ratio.2. The gas mixture method according to claim 1 , wherein the container is a gas bottle and the dopant gas and minor gas are already pre-mixed at the fixed mixture ratio in the gas bottle.3. (canceled)4. The gas mixture method according to claim 1 , wherein the dopant gas can be CO claim 1 , CO2 claim 1 , CH4 claim 1 , CF4 claim 1 , C2H2O4 or any combination thereof.5. The gas mixture method according to claim 1 , wherein the gas mixture comprises CO2 claim 1 , CO and H2.6. The gas mixture method according to claim 5 , wherein the mixture ratio of CO2 claim 5 , CO and H2 is 10:A:X claim 5 , wherein A ranges from 0.1 to 2 and X ranges from 1 to 6.7. The gas mixture method according to claim 5 , wherein the mixture ratio of CO2 claim 5 , CO and H2 is 10:0.5:3.8. The gas mixture method according to claim 1 , wherein the gas mixture comprises CO2 claim 1 , CO claim 1 , H2 and Xe.9. The gas ...

INTEGRATED NANOSPRAY SYSTEM

Integrated nanospray ionization package, comprising a nanospray emitter, a push button carriage with button element projecting through a bore in said package, an integral high voltage contact pin, a bore in said package for reversible protrusion of the nanospray emitter, a push-and-retract spring mechanism in which the range of forward motion of the emitter is not dependent on range of travel of the said button, and then upon actuation of said button element and spring element for retraction of said nanospray emitter, said nanospray emitter is pushed forward to establish electrical contact, and upon release of said button retracts and breaks the electrical contact. 1. An integrated package for nanospray ionization , comprisinga top assembly cover and a bottom assembly cover, which engage each other to form a package, said package having a front face a rear face, and a bottom face and containinga hollow tube nanospray emitter, coaxially contained in a secondary tube, having a tapered proximal end facing the front face of said package, and a distal end facing the rear face of said package,an electrically conductive, fluid-coupling union having proximal and distal ends connected by a through bore, using compression ferrules in fluid communication and sealing to the distal end of said nanospray emitter,an electrically conductive union carrier, having front, rear, right side and left side faces a bore through the front and rear faces, parallel to the left- and right-side faces, adapted to receive the coupling union and electrospray emitter,an electrical contact pin protruding from the front face of said carrier,a set-screw to hold the coupling union inside the bore of the union carrier,a push-button carriage with button element, having a cavity element facing the union carrier with protruding finger elements adjacent to the side faces of said union carrier,One or more indentation elements on said button carrier facing the bottom part of the package cover,a limiting ...

ION GENERATING APPARATUS

A discharge electrode for generating ions and a high-voltage generating circuit unit that supplies the discharge electrode with a high voltage are housed in a housing . A discharge opening for discharging the generated ions is formed in the housing . The housing is covered by an exterior case . The exterior case is connected to the high-voltage generating circuit unit and functions as an induction electrode. A passage opening leading to the discharge opening is formed in the exterior case . An insulating sheet covers the periphery of the passage opening in the exterior case facing a space into which the ions are discharged so that the discharged ions do not attach to the exterior case . Decrease in the amount of discharged ions can be prevented while using a peripheral component of the discharge electrode as the induction electrode. 1. An ion generating apparatuswherein a discharge electrode for generating ions and a high-voltage generating circuit unit that supplies the discharge electrode with a high voltage are housed in a housing,wherein a discharge opening for discharging the generated ions is formed in the housing,wherein the housing is covered by a shield case,wherein the shield case is connected to the high-voltage generating circuit unit and functions as an induction electrode, andwherein the outer surface of the shield case facing a space into which the ions are discharged is covered by an insulating section so that the discharged ions do not attach to the shield case.2. The ion generating apparatus according to claim 1 ,wherein the high-voltage generating circuit unit has a high-voltage transformer, andwherein the shield case is connected to a secondary side of the high-voltage transformer.3. The ion generating apparatus according to claim 1 ,wherein the shield case is ground-connected by a capacitor.4. The ion generating apparatus according to claim 3 ,wherein the capacitor is interposed between a primary side and the secondary side of the high-voltage ...

End-hall ion source with enhanced radiation cooling

In accordance with one embodiment of the present invention, an end-Hall ion source has an electron emitting cathode, an anode, a reflector, an internal pole piece, an external pole piece, a magnetically permeable path, and a magnetic-field generating means located in the permeable path between the two pole pieces. The anode and reflector are enclosed without contact by a thermally conductive cup that has internal passages through which a cooling fluid can flow. The closed end of the cup is located between the reflector and the internal pole piece and the opposite end of the cup is in direct contact with the external pole piece, and wherein the cup is made of a material having a low microhardness, such as copper or aluminum. 1. An end-Hall ion-source apparatus comprising: (i) a discharge region having a first end, a second end, and a side, wherein said first end is open;', '(ii) an electron emitting means located outside of said discharge region;', '(iii) an anode which encloses said discharge region at said side;', '(iv) a reflector, which encloses said discharge region at said second end;', '(v) means for introducing an ionizable working gas into said discharge region;, '(a) an ion generating means comprising;'} (i) a magnetically permeable internal pole piece located outside of said second end of said discharge region and near said reflector;', '(ii) an magnetically permeable and thermally conductive external pole piece located around said first end of said discharge region and between said anode and said electron emitting means;', '(iii) a magnetically permeable path between said internal pole piece and said external pole piece;', '(iv) a magnetic-field generating means located in said magnetically permeable path;, '(b) magnetic-circuit means comprising;'}(c) a cooling means comprising a thermally conductive cup having a closed end, a side wall, an open end, and internal passages through which fluid can flow; wherein said cup encloses said anode and said ...

CHARGED PARTICLE GENERATION DEVICE AND TARGET UNIT

Provided is a charged particle generation device. The charged particle generation device includes a light source unit configured to emit a laser, a target layer that receives the laser and emits charged particles, and a focusing structure disposed on the target layer to focus the laser. The focusing structure includes solid films extending on an upper surface of the target layer in a direction away from the target layer, and a pore section disposed between the solid films and having a porous structure. The focusing structure includes a material having a higher atomic number than carbon. 1. A charged particle generation device comprising:a light source unit configured to emit a laser;a target layer that receives the laser and emits charged particles; anda focusing structure disposed on the target layer to focus the laser,wherein the focusing structure comprises:solid films extending on an upper surface of the target layer in a direction away from the target layer; anda pore section disposed between the solid films and having a porous structure,wherein the focusing structure comprises a material having a higher atomic number than carbon.2. The charged particle generation device of claim 1 , wherein the focusing structure comprises aluminum (Al) or zinc (Zn).3. The charged particle generation device of claim 1 , wherein the focusing structure further comprises a metal film surrounding the solid films and the pore section claim 1 , wherein the metal film comprises a material having a higher atomic number than carbon.4. The charged particle generation device of claim 1 , wherein the solid films are arranged along a first direction parallel to the upper surface of the target layer and each of the solid films extends in a second direction intersecting with the first direction.5. The charged particle generation device of claim 1 , wherein the pore section comprises a plurality of pores and a boundary layer surrounding the pores claim 1 , and the boundary layer has a mesh ...

Plasma Generator With at Least One Non-Metallic Component

A plasma generator for an ion implanter is provided. The plasma generator includes an ionization chamber for forming a plasma that is adapted to generate a plurality of ions and a plurality of electrons. An interior surface of the ionization chamber is exposed to the plasma and constructed from a first non-metallic material. The plasma generator also includes a thermionic emitter including at least one surface exposed to the plasma. The thermionic emitter is constructed from a second non-metallic material. The plasma generator further includes an exit aperture for extracting at least one of the plurality of ions or the plurality of electrons from the ionization chamber to form at least one of an ion beam or an electron flux. The ion beam or the electron flux comprises substantially no metal. The first and second non-metallic materials can be the same or different from each other. 1. A plasma generator for an ion implanter , the plasma generator comprising:an ionization chamber for forming a plasma that is adapted to generate a plurality of ions and a plurality of electrons, an interior surface of the ionization chamber being exposed to the plasma and constructed from a first non-metallic material;a thermionic emitter including at least one surface exposed to the plasma, the thermionic emitter being constructed from a second non-metallic material; andan exit aperture for extracting at least one of the plurality of ions or the plurality of electrons from the ionization chamber to form at least one of an ion beam or an electron flux, wherein the ion beam or the electron flux comprises substantially no metal.2. The plasma generator of claim 1 , wherein the thermionic emitter comprises one of an indirectly-heated cathode (IHC) or a filament.3. The plasma generator of claim 1 , wherein the interior surface of the ionization chamber comprises a liner of the ionization chamber.4. The plasma generator of claim 1 , further comprising at least one of a repeller electrode or a ...

Ion Source Having Increased Electron Path Length

An ion source includes a cathode to emit electrons, a cathode grid downstream of the cathode, a reflector electrode downstream of the cathode grid, reflector grid radially inward of the reflector electrode, and an extractor electrode downstream of the reflector electrode, the extractor electrode and cathode grid defining an ionization region therebetween. The cathode and the cathode grid have a first voltage difference such the electrons are accelerated through the cathode grid and into the ionization region on a trajectory toward the extractor electrode. The reflector grid and the extractor electrode have a second voltage difference less than the first voltage difference such that the electrons slow as they near the extractor electrode and are repelled on a trajectory toward the reflector electrode. The reflector electrode has a negative potential such that the electrons are repelled away from the reflector electrode and into the ionization region.

Ion Source Employing Secondary Electron Generation

An ion source includes a cathode emitting primary electrons, a cathode grid downstream of the cathode, a reflector electrode downstream of the cathode grid, a reflector grid radially inward of the reflector electrode, and an extractor electrode downstream of the reflector electrode. The cathode and the cathode grid have a voltage difference such that the electric field accelerates the primary electrons on a trajectory toward the extractor electrode. The reflector grid and the extractor electrode have a voltage difference such that the electric field repels the primary electrons on a trajectory away from the extractor electrode and toward the reflector electrode. The cathode and reflector electrode have a voltage difference such that some primary electrons strike the reflector electrode, creating secondary electrons. The reflector grid has a positive potential such that the electric field attracts the primary and secondary electrons into the ionization region where they interact with ionizable gas. 1. An ion source for use in a radiation generator comprising:a cathode to emit primary electrons;a cathode grid downstream of the cathode;a reflector electrode downstream of the cathode grid;a reflector grid radially inward of the reflector electrode; andan extractor electrode downstream of the reflector electrode, the extractor electrode and cathode grid defining an ionization region therebetween;the cathode and the cathode grid having a first voltage difference such that a resultant electric field in the ion source accelerates the primary electrons through the cathode grid and into the ionization region on a trajectory toward the extractor electrode;the reflector grid and the extractor electrode having a second voltage difference less than the first voltage difference such that the electric field slows the primary electrons as they near the extractor electrode and repels the primary electrons on a trajectory away from the extractor electrode and toward the reflector ...

Purifier

Described is an ion air purifier. The ion air purifier includes a collector module () and a repeller module () which are connected in an openable and closable manner, wherein several collector plates () are uniformly distributed on the collector module (), and several repeller plates () are uniformly distributed on the repeller module (); and each collector plate () and each repeller plate () are alternately arranged when the two plates are in a closed state. Thus, an optimized distance between adjacent collector plates () and repeller plates () is ensured; and when the collector module () and the repeller module () are in an opened state, the collector plates () are separated from the repeller plates (), and the distance between two adjacent collector plates () and the distance between two adjacent repeller plates () are both increased, thereby facilitating cleaning of the collector module. Further described is a network air purifier. 1121112121121. An ion air purifier , comprising a collector module () and a repeller module () , which are connected in an openable and closable manner; several collector plates () parallel to each other are uniformly distributed on the collector module () , and several repeller plates () parallel to each other are uniformly distributed on the repeller module (); the collector module and the repeller module are isolated electrically , and each collector plate () and each repeller plate () are alternately arranged when the two plates are in a closed state.231213. The ion air purifier according to claim 1 , wherein a rotating shaft () is provided on one end of the collector module () claim 1 , and the repeller module () is opened relative to the collector module () around the rotating shaft ().334124. The ion air purifier according to claim 2 , wherein one end of the collector module away from the rotating shaft () is provided with a fixing member () claim 2 , and the collector module () and the repeller module () are fixedly connected ...

Method Of Cleaning An Extraction Electrode Assembly Using Pulsed Biasing

A system and method of improving the performance and extending the lifetime of an ion source is disclosed. The ion source includes an ion source chamber, a suppression electrode and a ground electrode. In the processing mode, the ion source chamber may be biased to a first positive voltage, while the suppression electrode is biased to a negative voltage to attract positive ions from within the chamber through an aperture and toward the workpiece. In the cleaning mode, the ion beam is defocused so that it strikes the suppression electrode and the ground electrode. The voltages applied to the ion source chamber and the electrodes are pulsed to minimize the possibility of glitches during this cleaning mode. 1. An ion source comprising:an ion source chamber for generation of a process plasma during a processing mode and a cleaning plasma during a cleaning mode, said ion source chamber having an extraction aperture;a suppression electrode having a suppression electrode aperture, said suppression electrode disposed proximate said extraction aperture, wherein an ion beam extracted from said extraction aperture during said cleaning mode is defocused so as to strike said suppression electrode; anda biasing system configured to periodically stop said ion beam from striking said suppression electrode during said cleaning mode and to ground said suppression electrode and said ion source chamber when said ion beam is periodically stopped.2. The ion source of claim 1 , comprising a glitch detector claim 1 , wherein claim 1 , in said processing mode claim 1 , said biasing system grounds said suppression electrode and said ion source chamber when a glitch is detected.3. The ion source of claim 1 , wherein a source gas is used to generate said process plasma in said processing mode claim 1 , and a cleaning gas claim 1 , different than said source gas claim 1 , is used to generate said cleaning plasma in said cleaning mode.4. The ion source of claim 1 , wherein said ion beam is ...

ION GENERATION APPARATUS AND ELECTRIC EQUIPMENT INCLUDING THE SAME

A housing, a substrate accommodated in the housing, a needle electrode for generating ions through discharging, which is held by the substrate such that a tip end portion protrudes outside the housing, an insulating sealing portion insulating and sealing the substrate in the housing, and an electrode protection portion for protecting the needle electrode outside the housing are included. The housing is provided with an opening portion through which a side of the tip end portion of the needle electrode is inserted and which is sealed with the insulating sealing portion. The electrode protection portion has a first protection portion and a second protection portion which are provided to protrude from the housing relative to the tip end portion of the needle electrode and opposed to each other at a distance from each other on opposing sides of the needle electrode. 1. An ion generation apparatus , comprising:a housing;a substrate accommodated in said housing;a needle electrode for generating ions through discharging, which is held by said substrate such that a tip end portion protrudes outside said housing;an insulating sealing portion insulating and sealing said substrate in said housing; andan electrode protection portion for protecting said needle electrode outside said housing,said housing being provided with an opening portion through which a side of the tip end portion of said needle electrode is inserted and which is sealed with said insulating sealing portion, andsaid electrode protection portion having a first protection portion and a second protection portion provided to protrude from said housing relative to the tip end portion of said needle electrode and opposed to each other at a distance from each other on opposing sides of said needle electrode.2. The ion generation apparatus according to claim 1 , wherein a hole through which air toward said needle electrode passes is provided in at least one of said first protection portion and said second protection ...

Ion source with cathode having an array of nano-sized projections

An ion source for use in a particle accelerator includes at least one cathode. The at least one cathode has an array of nano-sized projections and an array of gates adjacent the array of nano-sized projections. The array of nano-sized projections and the array of gates have a first voltage difference such that an electric field in the cathode causes electrons to be emitted from the array of nano-sized projections and accelerated downstream. There is a ion source electrode downstream of the at least one cathode, and the at least one cathode and the ion source electrode have the same voltage applied such that the electrons enter the space encompassed by the ion source electrode, some of the electrons as they travel within the ion source electrode striking an ionizable gas to create ions.

ION SOURCE USING SPINDT CATHODE AND ELECTROMAGNETIC CONFINEMENT

An ion source for use in a radiation generator tube includes a back passive cathode electrode, a passive anode electrode downstream of the back passive cathode electrode, a magnet adjacent the passive anode electrode, and a front passive cathode electrode downstream of the passive anode electrode. The front passive cathode electrode and the back passive cathode electrode define an ionization region therebetween. At least one Spindt cathode is configured to emit electrons into the ionization region. The back passive electrode electrode and the passive anode electrode, and the front passive cathode electrode and the passive anode electrode, have respective voltage differences therebetween, and the magnet generates a magnetic field, such that a Penning-type trap is produced to confine the electrons to the ionization region. At least some of the electrons in the ionization region interact with an ionizable gas to create ions. 1. An ion source for use in a radiation generator tube comprising:a back passive cathode electrode;a passive anode electrode downstream of the back passive cathode electrode;a magnet adjacent the passive anode electrode;a front passive cathode electrode downstream of the passive anode electrode, the front passive cathode electrode and the back passive cathode electrode defining an ionization region therebetween; andat least one Spindt cathode configured to emit electrons into the ionization region;the back passive electrode electrode and the passive anode electrode, and the front passive cathode electrode and the passive anode electrode, having respective voltage differences therebetween, and the magnet generating a magnetic field, such that a Penning-type trap is produced to confine the electrons to the ionization region;at least some of the electrons in the ionization region interacting with an ionizable gas to create ions.2. The ion source of claim 1 , wherein the at least one Spindt cathode comprises a ring.3. The ion source of claim 1 , ...

Ion source using heated cathode and electromagnetic confinement

An ion source for use in a radiation generator tube includes a back passive cathode electrode, a passive anode electrode downstream of the back passive cathode electrode, a magnet adjacent the passive anode electrode, and a front passive cathode electrode downstream of the passive anode electrode. The front passive cathode electrode and the back passive cathode electrode define an ionization region therebetween. At least one ohmically heated cathode is configured to emit electrons into the ionization region. The back passive cathode electrode and the passive anode electrode, and the front passive cathode electrode and the passive anode electrode, have respective voltage differences therebetween, and the magnet generating a magnetic field, such that a Penning-type trap is produced to confine the electrons to the ionization region. At least some of the electrons in the ionization region interact with an ionizable gas to create ions.

CHARGE STRIPPING FILM FOR CHARGE STRIPPING DEVICE OF ION BEAM

A charge stripping film for a charge stripping device of ion beam is a carbon film produced by annealing a polymer film, and has a film thickness of 10 μm to 150 μm, an area of at least 4 cm, and an atomic concentration of carbon of at least 97%. A charge stripping film for a charge stripping device of ion beam is a carbon film having a thermal conductivity in a film surface direction at 25° C. of at least 300 W/mK, and has a film thickness of 10 μm to 150 μm, an area of at least 4 cm, and an atomic concentration of carbon of at least 97%. 1. A charge stripping film for a charge stripping device of ion beam , whereinthe charge stripping film is a carbon film produced by annealing a polymer film, and{'sup': '2', 'the charge stripping film has a film thickness of 10 μm to 150 μm, an area of at least 4 cm, and an atomic concentration of carbon of at least 97%.'}2. A charge stripping film for a charge stripping device of ion beam , whereinthe charge stripping film is a carbon film having a thermal conductivity in a film surface direction at 25° C. of at least 300 W/mK, and{'sup': '2', 'the charge stripping film has a film thickness of 10 μm to 150 μm, an area of at least 4 cm, and an atomic concentration of carbon of at least 97%.'}3. The charge stripping film according to claim 1 , wherein the charge stripping film has a density of 0.90 g/cmto 2.26 g/cm.4. The charge stripping film according to claim 1 , wherein the charge stripping film has a weight per unit area of 1.5 mg/cmto 30 mg/cm.5. The charge stripping film according to claim 1 ,wherein the carbon film is produced by annealing the polymer film at a temperature of at least 2400° C. in an inert gas atmosphere, andwherein the polymer film comprises at least one selected from the group consisting of polyamide, polyimide, polyquinoxaline, polyparaphenylene vinylene, polyoxadiazole, polybenzimidazole, polybenzoxazole, polybenzothiazole, polyquinazolinedione, polybenzoxazinone, polyquinazolone, ...

DC DISTRIBUTION CONNECTION DEVICE

The respective proportionality constants of magnetic force by magnetic field producing portion for biasing the plug in the direction of insertion and resilient force by a spring mechanism for biasing the plug in the direction of extraction are adjusted in such a manner that the resilient force is greater than the magnetic force until the plug pin reaches an intermediate insertion position at which the plug pin comes into proximity to or separates from the socket contact, whereas the magnetic force is greater than the resilient force at a position at which the plug pin is inserted into a complete insertion position for a hot-line connection to the socket contact. The plug pin in the vicinity of the intermediate insertion position, at which there is a possibility of occurrence of an arc discharge, is ejected by the resilient force. 1. A DC distribution connection device comprising:a plug having plug pins to be connected to a DC load;a socket having socket contacts which are connected to a DC power supply and located in plug insertion holes that guide the plug pins so as to be freely inserted therein and extracted therefrom, wherein the plug pins and the socket contacts are brought into contact with each other between an intermediate insertion position of the plug pins at which the socket contacts come into proximity thereto or separate therefrom and a complete insertion position at which the plug pins have been inserted from the intermediate insertion position in a direction of insertion, and at the complete insertion position, the plug pins make a hot-line connection to the socket contacts;magnetic field producing portion that is formed between the plug and the socket in a direction of insertion and extraction of the plug pins, the magnetic field producing portion attracting the plug by a magnetic force in a direction of insertion of the plug pins; anda spring mechanism that is disposed between the plug and the socket in the direction of insertion and extraction of ...

SYSTEMS AND METHODS FOR PROVIDING AN ION BEAM

Systems for generating a proton beam include an electromagnetic radiation beam (e.g., a laser) that is directed onto an ion-generating target by optics to form the proton beam. A detector is configured to measure a laser-target interaction property, which a processor uses to produce a feedback signal that can be used to alter the proton beam by adjusting the source of the electromagnetic radiation beam, the optics, or a relative position or orientation of the electromagnetic radiation beam to the ion-generating target. By adjusting the laser-target interaction, the feedback can be used to control properties of the proton beam, such as the proton beam energy or flux. Such systems have certain advantages, including reducing the size, complexity, and cost of machines used to generate proton beams, while also improving their speed, precision, and configurability. 1. A system for generating a proton beam , the system comprising:an interaction chamber configured to support an ion-generating target;an electromagnetic radiation source configured to provide an electromagnetic radiation beam;one or more optics components configured to direct the electromagnetic radiation beam at the ion-generating target to thereby cause a resultant proton beam;a detector configured to measure at least one laser-target interaction property; and receive a feedback signal based on the at least one laser-target interaction property measured by the detector, wherein the feedback signal is indicative of a relationship between the proton beam and the electromagnetic radiation beam; and', 'based on the received feedback signal, alter the proton beam by adjusting an item among at least one of the following: (A) the electromagnetic radiation source, (B) the one or more optics components, (C) at least one of a relative position and orientation of the electromagnetic radiation beam to the ion-generating target', 'wherein altering the proton beam includes altering a temporal profile of the ...

Ion Source For Multiple Charged Species

An indirectly heated cathode (IHC) ion source having improved life is disclosed. The IHC ion source comprises a chamber having a cathode and a repeller on opposite ends of the ion source. Biased electrodes are disposed on one or more sides of the ion source. The bias voltage applied to at least one of the cathode, the repeller and the electrodes, relative to the chamber, is varied over time. In certain embodiments, the voltage applied to the electrodes may begin at an initial positive voltage. Over time, this voltage may be reduced, while still maintaining the target ion beam current. Advantageously, the life of the cathode is improved using this technique. 1. An indirectly heated cathode ion source , comprising:a chamber into which a gas is introduced;a cathode disposed on one end of the chamber;a repeller disposed at an opposite end of the chamber; andat least one electrode disposed along a side of the chamber;wherein a voltage applied to at least one of the cathode, the repeller and the at least one electrode relative to the chamber varies over time.2. The indirectly heated cathode ion source of claim 1 , wherein the voltage decreases over time.3. The indirectly heated cathode ion source of claim 1 , further comprising a controller claim 1 , wherein the controller monitors hours of operation of the indirectly heated cathode ion source and determines the voltage to be applied based on hours of.4. The indirectly heated cathode ion source of claim 1 , further comprising a controller in communication with a current measurement system claim 1 , wherein the measurement system measures current of an ion beam extracted from the indirectly heated cathode ion source through an extraction aperture claim 1 , and the controller adjusts the voltage to be applied based on measured current of the ion beam.5. The indirectly heated cathode ion source of claim 1 , wherein the voltage is applied to the at least one electrode.6. The indirectly heated cathode ion source of claim 1 , ...

APPARATUS FOR CHARGING OR ADJUSTING THE CHARGE OF AEROSOL PARTICLES

The invention provides an apparatus for charging or altering the charge of gas-entrained particles in an aerosol, the apparatus comprising: 1. An apparatus for charging or altering the charge of gas-entrained particles in an aerosol , the apparatus comprising:(a) an ion generating chamber containing a first electrode for generating a corona discharge, the first electrode being connected to a power supply of sufficiently high voltage to create the corona discharge; the ion generating chamber having an ion outlet through which ions generated by the corona discharge can leave the chamber;(b) a particle charging chamber in which charging or altering the charge of gas-entrained particles in an aerosol takes place, the particle charging chamber being in fluid communication with the ion generation chamber and having an inlet and an aerosol outlet; and(c) an electrically non-conductive interface body positioned between the aerosol particle charging chamber and the ion generating chamber, the interface body having a hollow interior which is in fluid communication with the ion generating chamber and the aerosol particle charging chamber, and having a gas inlet through which a stream of gas can be introduced into the hollow interior of the interface body.2. An apparatus according to wherein the gas entering the gas inlet of the interface body contains the gas-entrained particles in an aerosol.3. An apparatus according to wherein the gas entering the gas inlet of the interface body is clean gas and functions as a carrier gas to carry ions into the aerosol particle charging chamber where they will collide with gas-entrained particles introduced through a further inlet in the aerosol particle charging chamber.4. An apparatus according to wherein the first electrode is electrically insulated from a wall or walls defining the ion generating chamber.5. An apparatus according to wherein a second electrode is positioned between the ion generating chamber and the particle charging ...

Ion Source For Enhanced Ionization

An ion source having improved life is disclosed. In certain embodiments, the ion source is an IHC ion source comprising a chamber, having a plurality of electrically conductive walls, having a cathode which is electrically connected to the walls of the ion source. Electrodes are disposed on one or more walls of the ion source. A bias voltage is applied to at least one of the electrodes, relative to the walls of the chamber. In certain embodiments, fewer positive ions are attracted to the cathode, reducing the amount of sputtering experienced by the cathode. Advantageously, the life of the cathode is improved using this technique. In another embodiment, the ion source comprises a Bernas ion source comprising a chamber having a filament with one lead of the filament connected to the walls of the ion source.

ION GENERATION DEVICE HAVING ATTACHMENT DEVICES

The present invention provides methods and systems for an ion generator device that includes a base, a generally circular sidewall projecting from the base forming an interior storage compartment and defining an upper edge, a top portion engaged to the upper edge, at least one high voltage wire extending from the device, and a power supply for providing a voltage to the high voltage wire for producing ions. 1. An ion generator device , comprising:a generally circular base,a sidewall having a first end and a second end, the first end adjacent to the base, forming an interior storage compartment and to define an upper edge;a top portion engaged to the upper edge;at least one high voltage wire extending from the device;a power supply for providing a voltage to the high voltage wire for producing ions.2. The ion generator device of claim 1 , wherein the sidewall is generally circular in shape.3. The ion generator device of claim 1 , further comprising a transformer housed within the interior storage compartment and engaged to the power supply and the at least one high voltage wire.4. The ion generator device of claim 1 , further comprising two high voltage wires extending from the device claim 1 , wherein one of the high voltage wires produces negative ions and the second high voltage wire produces positive ions.5. The ion generator device of claim 1 , further comprising at least one bore within the top portion claim 1 , whereby the at least one high voltage wire extends therethrough.6. The ion generator device of claim 1 , further comprising an upper retention flange disposed on the sidewall and extending therefrom.7. The ion generator device of claim 1 , further comprising an LED light disposed on the top portion.8. The ion generator device of claim 1 , further comprising at least one magnet disposed on the bottom side of the base.9. An ion generator device claim 1 , comprising:a base that extends to an outer edge having a bottom side, a top side, an upper portion, ...

ION GENERATION DEVICE AND ION DETECTION DEVICE

An ion generation device is provided, which includes: a heater; a counter electrode arranged on one side of the heater; at least one electric member arranged between the heater and the counter electrode, the electric member being made of a pyroelectric element or a piezoelectric element; an electrode arranged between the heater and the electric member to be in contact with the electric member; and a temperature control circuit to control a temperature of the heater. An ion detection device is provided, which includes the above-described ion generation device, an ion filter to sort ions generated at the ion generation device, and a detector to detect the ions sorted in the ion filter. 1. An ion generation device comprising:a heater,a counter electrode arranged on one side of the heater;at least one electric member arranged between the heater and the counter electrode, the electric member being made of a pyroelectric element or a piezoelectric element;an electrode arranged between the heater and the electric member to be in contact with the electric member; anda temperature control circuit to control a temperature of the heater.2. The ion generation device according to claim 1 , whereinthe temperature control circuit controls the temperature of the heater such that a temperature change of the electric member by a heat generated by the heater becomes a predetermined value.3. The ion generation device according to claim 1 , whereinthe temperature control circuit controls the temperature of the heater to a target value corresponding to the predetermined value.4. The ion generation device according to claim 1 , wherein the temperature control circuit includes:a power supply device including a power supply, to supply a first current to the heater;a reference resistance circuit having a variable electric resistance, and supplied with a second current from the power supply device;a current control circuit that controls a ratio of the first current supplied to the heater and ...

Methods of forming layers

A method of forming a layer, the method including providing a substrate having at least one surface adapted for deposition thereon; and directing a particle beam towards the surface of the substrate, the particle beam including small molecule molecular species, wherein the small molecule molecular species break apart upon interaction with atoms at the substrate into atomic components, each of the atomic components having implant energies from about 20 eV to about 100 eV to form a layer.

Means of Introducing an Analyte into Liquid Sampling Atmospheric Pressure Glow Discharge

A liquid sampling, atmospheric pressure, glow discharge (LS-APGD) device as well as systems that incorporate the device and methods for using the device and systems are described. The LS-APGD includes a hollow capillary for delivering an electrolyte solution to a glow discharge space. The device also includes a counter electrode in the form of a second hollow capillary that can deliver the analyte into the glow discharge space. A voltage across the electrolyte solution and the counter electrode creates the microplasma within the glow discharge space that interacts with the analyte to move it to a higher energy state (vaporization, excitation, and/or ionization of the analyte). 1. A liquid sampling , atmospheric pressure , glow discharge (LS-APGD) device comprising:a first hollow capillary including discharge end and comprising a conductive element;a counter electrode disposed at a distance from the discharge end of the first hollow capillary, the counter electrode being the terminal portion of a second hollow capillary, the second hollow capillary comprising a discharge end;a power source in electrical communication with the conductive element of the first hollow capillary and with the counter electrode;a glow discharge space comprising a space in which a flow that exits the discharge end of the first hollow capillary intersects with a flow that exits the discharge end of the second hollow capillary.2. The LS-APGD device of claim 1 , wherein the distance from the first hollow capillary to the second hollow capillary is from about 0.1 millimeter to about 5 millimeters.3. The LS-APGD device of claim 1 , wherein one or both of the discharge end of the first hollow capillary and the discharge end of the second hollow capillary is selectively moveable.4. The LS-APGD device of claim 1 , wherein the power source is a direct current source claim 1 , a radio frequency power source claim 1 , or a microwave frequency power source.5. The LS-APGD device of claim 1 , wherein the ...

ION GENERATION UNIT

An ion generation unit () provided with an ion generation element () for generating ions through application of voltage, and a casing () housing the ion generation element. The casing is constituted by a casing body () and a rear cover (). To the inside face of the casing are attached suppressing members () for suppressing the radiation noise associated with ion generation. Openings () through which the ions generated by the ion generation element are emitted to the outside are formed in the casing body, and the suppressing members are attached at locations other than the openings. 14-. (canceled)5. An ion generation unit comprising:an ion generation device that generates ions by voltage application;a resin casing that houses the ion generation device; and the casing is provided with a first and a second opening portions that are arranged away from each other in a left-right direction, the ions generated from the ion generation device are discharged through the first and the second opening portions;', 'the curbing member is composed of a metal plate or includes a metal foil; and', 'the curbing member is mounted on an inner surface of a portion between the first and second opening portions of the casing., 'a curbing member that curbs a radiant noise caused by ion generation; wherein'}6. The ion generation unit according to claim 5 , whereinthe curbing member is composed of an adhesive sheet that contains the metal foil as a component. The present invention relates to an ion generation unit.In recent years, there are many electric apparatuses that generate one or both of positive ions and negative ions to obtain effects of germ eradication, deodorization, refreshing and the like. An air conditioner, an air cleaner, a dehumidifier and the like are typical electric apparatuses with which an ion generation apparatus is combined. Some are put in the market as stand-alone ion generation apparatuses.A traditional method to generate ions is corona discharge. In this method, ...

Varied Component Density For Thermal Isolation

A system that utilizes a component that controls thermal gradients and the flow of thermal energy by variation in density is disclosed. Methods of fabricating the component are also disclosed. The component is manufactured using additive manufacturing. In this way, the density of different regions of the component can be customized as desired. For example, a lattice pattern may be created in the interior of a region of the component to reduce the amount of material used. This reduces weight and also decreases the thermal conduction of that region. By using low density regions and high density regions, the flow of thermal energy can be controlled to accommodate the design constraints. 1. An ion implantation system , comprising at least one component that includes a high density region and a low density region configured to control a thermal gradient and flow of thermal energy.2. The ion implantation system of claim 1 , wherein the at least one component is an extraction plate.3. The ion implantation system of claim 1 , wherein an interior portion of the low density region comprises a lattice pattern.4. The ion implantation system of claim 1 , wherein an interior portion of the low density region comprises voids created by varying at least one operating parameter used to create the at least one component.5. An apparatus claim 1 , comprising:a plurality of walls defining a chamber;an ion source to create ions within the chamber; andan extraction plate, disposed on one end of the chamber, having an extraction aperture, wherein the extraction plate comprises a low density region and a high density region.6. The apparatus of claim 5 , wherein the ion source comprises an indirectly heated cathode disposed within the chamber.7. The apparatus of claim 5 , wherein the ion source comprises an RF antenna.8. The apparatus of claim 5 , wherein a region surrounding the extraction aperture comprises the high density region.9. The apparatus of claim 8 , wherein a remainder of the ...

CARBON NANOTUBE-BASED ION SOURCE FOR PARTICLE GENERATOR

A neutron generator includes carbon nanotubes that function as the anode and provide deuterium storage. The ionization source includes a layer of carbon nanotubes that provides a pulse of deuterium ions through field-induced desorption and ionization of deuterium atoms on the surface or retained in the bore of the nanotubes. A high-yield (>10n/s) neutron generation is achieved by employing a field desorption ion source and applying an electric field of 10-40 V/nm. Such high fields may be achieved with carbon nanotubes having high aspect ratios with field enhancement factors on the order of 1000. By operating the ion source in a background pressure of deuterium or hydrogen, the gas adsorption on the nanotubes may be regenerated after each pulse.

CARBON ION BEAM INJECTOR APPARATUS AND METHOD OF USE THEREOF

A charged particle cancer therapy system is used to accelerate an anion, such a C, and to convert the anion to a cation, such as C, through use of one or more electron extraction subsystems. A first example of an electron extraction subsystem is a hydrogen gas electron stripping system. A second example of an electron extraction subsystem is a carbon foil electron stripping system. The resultant cation is accelerated in a synchrotron, transported along a beam-line, and targeted to a tumor resulting in ablation of the tumor. 1. An apparatus configured to strip electrons from charged particles , the apparatus comprising: a beam path;', 'a vacuum tube circumferentially surrounding a portion of a longitudinal axis of the beam path;', 'a carbon stripping foil axially crossing the beam path, during use the charged particles comprising positively charged particles traversing said carbon stripping foil, said carbon stripping foil configured to strip electrons from the positively charged particles traversing through said carbon stripping foil; and', 'a first electron extraction subsystem, comprising, 'means for forming a vacuum seal between said carbon stripping foil and said vacuum tube., 'a tandem accelerator comprising2. The apparatus of claim 1 , said carbon film comprising a thickness of thirty to two hundred angstroms.3. The apparatus of claim 2 , further comprising:a semi-rigid support grid having a first side, said first side of said support grid uniformly contacting a dorsal side of said carbon stripping foil.4. The apparatus of claim 3 , said tandem accelerator further comprising a second electron extraction subsystem claim 3 , said second electron extraction subsystem comprising:a hydrogen gas source; anda gas port switch, said gas port switch configured to open a port between said hydrogen gas source and a first interior section of said vacuum tube, said first interior section in the beam path prior to a second interior section of said vacuum tube housing said ...

SELF-DETECTION METHOD UTILIZING AN ION GENERATING DEVICE TO DISSIPATE ELECTROSTATIC CAPACITY

An ion generating device includes a controller, positive and negative ion generating circuits, an airflow generator, and a detecting element. The controller is preinstalled with a constant of proportionality, controls the positive and the negative ion generating circuits, and the airflow generator directs the ions to a destination. The detecting element detects the balanced voltage of the positive and negative ions at the destination, and responds with the detecting result to the controller. The controller increases or decreases the ion numbers. The variation of the ion numbers is x, and the balanced voltage at the destination is y. The controller compares the function of x and y with the constant of proportionality to determine whether they are similar. If the comparison result is similar, then the electrostatic dissipation capability of the ion generating device is normal. 1. A self-testing method of an electrostatic dissipation capability for an ion generating device , the method comprising:(a) an ion generating device including a controller, a positive and a negative ion generating circuit electrically connected to the controller, an airflow generator, and a detecting element;(b) the controller is preinstalled with a constant of proportionality k=y/x, controlling plural positive and negative ions discharged by the positive and the negative ion generating circuits, and the airflow generator directing the plural positive and negative ions to a destination;(c) the detecting element detecting a voltage of positive and negative ions at the destination, and responding with a detecting result to the controller;(d) the controller controlling the positive and the negative ion generating circuits to increase or decrease a respective number of ions, a variation of the number of ions being x, and the voltage at the destination detected by the detecting element being y;(e) the controller comparing a function of the variables x and y with the constant of proportionality to ...

FOCUSED ION BEAM APPARATUS

A focused ion beam apparatus has an ion source chamber in which is disposed an emitter for emitting ions. The surface of the emitter is formed of a precious metal, such as platinum, palladium, iridium, rhodium or gold. A gas supply unit supplies nitrogen gas to the ion source chamber so that the nitrogen gas adsorbs on the surface of the emitter. An extracting electrode is spaced from the emitter, and a voltage is applied to the extracting electrode to ionize the adsorbed nitrogen gas and extract nitrogen ions in the form of an ion beam. A temperature control unit controls the temperature of the emitter. 1. A focused ion beam apparatus comprising a gas field ion source , the gas field ion source comprising:an emitter for emitting an ion beam, the surface of the emitter being formed of a precious metal;an ion source chamber containing the emitter;a gas supply unit for supplying nitrogen to the ion source chamber;an extracting electrode to which a voltage for ionizing the nitrogen and for extracting nitrogen ions is applied; anda temperature control unit for cooling the emitter.2. A focused ion beam apparatus according to claim 1 , wherein the gas supply unit controls supply of the nitrogen so that the pressure in the ion source chamber is 1.0×10Pa to 1.0×10Pa.3. A focused ion beam apparatus according to claim 1 , wherein the gas supply unit controls supply of the nitrogen so that the pressure in the ion source chamber is 1.0×10Pa to 1.0×10Pa.4. A focused ion beam apparatus according to claim 1 , wherein the ion beam emitted from the gas field ion source is used to repair a defect in a mask.5. A focused ion beam apparatus according to claim 1 , wherein the precious metal is platinum.6. A focused ion beam apparatus according to claim 1 , wherein the precious metal is palladium.7. A focused ion beam apparatus according to claim 1 , wherein the precious metal is iridium.8. A focused ion beam apparatus according to claim 1 , wherein the precious metal is rhodium.9. A ...

ION GENERATION DEVICE AND ELECTRICAL APPARATUS

An ion generation device includes: a high voltage generation circuit; and an ion generation element. The high voltage generation circuit includes: a capacitor; a high voltage transformer; a switching element; and a pulse signal generation portion which generates a pulse signal for controlling the turning on and off of the switching element. The pulse signal generation portion adjusts a pulse width of an on-period such that the pulse width of the on-period of the pulse signal is substantially equal to a time obtained by multiplying the reciprocal of an output voltage frequency at the time of a forward operation of the high voltage transformer by one-fourth. 1. An ion generation device comprising:a high voltage generation circuit; andan ion generation element to which a high voltage output from the high voltage generation circuit or a voltage generated based on the high voltage output from the high voltage generation circuit is applied, a capacitor which stores an input direct-current voltage or a voltage obtained by performing DC/DC conversion on the input direct-current voltage;', 'a high voltage transformer which steps up a voltage output from the capacitor connected to a primary side to output a high voltage to a secondary side;', 'a switching element which is connected to the primary side of the high voltage transformer and which intermittently passes a current on the primary side of the high voltage transformer by being turned on and off; and', 'a pulse signal generation portion which generates a pulse signal for controlling the turning on and off of the switching element, and, 'wherein the high voltage generation circuit includesthe pulse signal generation portion adjusts a pulse width of an on-period such that the pulse width of the on-period during which the switching element is kept on by the pulse signal is substantially equal to a time obtained by multiplying a reciprocal of an output voltage frequency at a time of a forward operation of the high voltage ...

ION GENERATION DEVICE

The present invention provides methods and systems for an ion generator device that includes a base, a first and second pair of spaced-apart, opposed sidewalls projecting from the base to collectively form an interior storage compartment and to define an upper edge, a top portion engaged to the upper edge, at least one high voltage wire extending from the device, and a power supply for providing a voltage to the high voltage wire for producing ions. 1. An ion generator device , comprising:a base,a first and second pair of spaced-apart, opposed sidewalls projecting from the base to collectively form an interior storage compartment and to define an upper edge;a top portion engaged to the upper edge;at least one high voltage wire extending from the device;a power supply for providing a voltage to the high voltage wire for producing ions.2. The ion generator device of claim 1 , further comprising a base having an outer edge and the first and second pair of spaced-apart claim 1 , opposed sidewalls projecting therefrom.3. The ion generator device of claim 1 , further comprising a transformer housed within the interior storage compartment and is engaged to the power supply and the at least one high voltage wire.4. The ion generator device of claim 1 , further comprising two high voltage wires extending from the device claim 1 , wherein one of the high voltage wires produces negative ions and the second high voltage wire produces positive ions.5. The ion generator device of claim 1 , further comprising at least one bore within the top portion claim 1 , whereby the at least one high voltage wire extends therethrough.6. The ion generator device of claim 1 , further comprising a retention flange disposed on one of the sidewalls and extending therefrom.7. The ion generator device of claim 1 , further comprising an LED light disposed on the top portion.8. An ion generator device claim 1 , comprising:a base that extends to an outer edge,a first and second pair of spaced-apart, ...

Means of Introducing an Analyte into Liquid Sampling Atmospheric Pressure Glow Discharge

A liquid sampling, atmospheric pressure, glow discharge (LS-APGD) device as well as systems that incorporate the device and methods for using the device and systems are described. The LS-APGD includes a hollow capillary for delivering an electrolyte solution to a glow discharge space. The device also includes a counter electrode in the form of a second hollow capillary that can deliver the analyte into the glow discharge space. A voltage across the electrolyte solution and the counter electrode creates the microplasma within the glow discharge space that interacts with the analyte to move it to a higher energy state (vaporization, excitation, and/or ionization of the analyte). 1. A liquid sampling , atmospheric pressure , glow discharge (LS-APGD) device comprising:a first hollow tube comprising a first inlet, a first discharge and a conductive element;a second hollow tube comprising a second inlet and a second discharge;a glow discharge space in fluid communication with and downstream of the first discharge and in fluid communication with and downstream of the second discharge, the glow discharge space being external to the first hollow tube and the second hollow tube; anda counter electrode disposed at a distance from the first discharge, a terminal portion of the second hollow tube comprising the counter electrode, the counter electrode being in electrical communication with the conductive element.2. The LS-APGD device of claim 1 , further comprising a liquid source claim 1 , the first inlet being in fluid communication with and downstream of the liquid source.3. The LS-APGD device of claim 2 , further comprising a pump in fluid communication with the liquid source.4. The LS-APGD device of claim 1 , further comprising a gas source claim 1 , the second inlet being in fluid communication with and downstream of the gas source.5. The LS-APGD device of claim 1 , wherein the first discharge comprises the conductive element.6. The LS-APGD device of claim 1 , wherein the ...

METHOD FOR FABRICATING EMITTER

A method for fabricating a sharpened needle-like emitter, the method including: electrolytically polishing an end portion of an electrically conductive emitter material so as to be tapered toward a tip portion thereof; performing a first etching in which the electrolytically polished part of the emitter material is irradiated with a charged-particle beam to form a pyramid-like sharpened part having a vertex including the tip portion; performing a second etching in which the tip portion is further sharpened through field-assisted gas etching, while observing a crystal structure at the tip portion by a field ion microscope and keeping the number of atoms at a leading edge of the tip portion at a predetermined number or less; and heating the emitter material to arrange the atoms at the leading edge of the tip portion of the sharpened part in a pyramid shape. 1. A method for fabricating a sharpened needle-like emitter , the method comprising:electrolytically polishing an end portion of an electrically conductive emitter material so as to be tapered toward a tip portion thereof;performing a first etching in which the electrolytically polished part of the emitter material is irradiated with a charged-particle beam to form a pyramid-like sharpened part having a vertex including the tip portion; andperforming a second etching in which the tip portion of the sharpened part is further sharpened through field-assisted gas etching, while observing a crystal structure at the tip portion of the sharpened part by a field ion microscope and keeping the number of atoms at a leading edge of the tip portion of the sharpened part at a predetermined number or less.2. The method for fabricating an emitter according to claim 1 ,wherein in the first etching, etching is performed such that a vertex angle of the sharpened part becomes 10° or less through irradiation of a focused ion beam.3. The method for fabricating an emitter according to claim 1 ,wherein tungsten is employed as the ...

ION SOURCE FOR SOFT ELECTRON IONIZATION AND RELATED SYSTEMS AND METHODS

An ion source is configured for soft electron ionization and produces a low electron-energy, yet high-intensity, electron beam. The ion source includes an electron source that produces the electron beam and transmits it into an ionization chamber. The electron beam interacts with sample material in the ionization chamber to produce an ion beam that may be transmitted to a downstream device. The electron source is configured for generating a virtual cathode upstream of the ionization chamber, which enhances the intensity of the electron beam. 1. An ion source , comprising:a body surrounding an ionization chamber;an electron extractor configured for accelerating electrons into the ionization chamber;an electron source outside the ionization chamber and comprising an electron repeller, a thermionic cathode, and an electron lens between the thermionic cathode and the electron extractor; anda voltage source configured for applying respective voltages to the electron repeller, the thermionic cathode, the electron lens, and the electron extractor effective for:emitting electrons from the thermionic cathode;accelerating the electrons toward the ionization chamber; andgenerating a potential valley at the electron lens effective for decelerating the electrons and forming at the electron lens a virtual cathode comprising the decelerated electrons.2. The ion source of claim 1 , comprising a sample inlet leading into the ionization chamber.3. The ion source of claim 1 , comprising a magnet assembly surrounding the body and configured for generating an axial magnetic field in the ionization chamber.4. The ion source of claim 1 , wherein the ionization chamber comprises an ion outlet oriented orthogonally to the electron extractor claim 1 , or aligned with the electron extractor along an axis.5. The ion source of claim 1 , wherein the ionization chamber comprises an ion extractor configured for directing an ion beam out from the ionization chamber.6. The ion source of claim 1 , ...

SUPPORTING STRUCTURE AND ION GENERATOR USING THE SAME

An ion generator includes: an arc chamber; a repeller that includes a repeller plate provided within the arc chamber and a repeller extension portion inserted through a through hole communicating the inside and the outside of the arc chamber; and a supporting structure that is provided outside the arc chamber and that supports the repeller so that a gap is ensured between the repeller extension portion and an inner wall of the through hole. The supporting structure includes a cover member that forms, outside the arc chamber, a small chamber communicating with the gap, and an insulation member that electrically insulates the arc chamber and the repeller from each other. 1. An ion generator , comprising:an arc chamber;a repeller that includes a repeller plate provided within the arc chamber and a repeller extension portion inserted through a through hole communicating the inside and the outside of the arc chamber; anda supporting structure that is provided outside the arc chamber and that supports the repeller so that a gap is ensured between the repeller extension portion and an inner wall of the through hole, the supporting structure including a cover member that forms, outside the arc chamber, a small chamber communicating with the gap, and an insulation member that electrically insulates the arc chamber and the repeller from each other.2. The ion generator of claim 1 , wherein the small chamber is hermetically closed outside the arc chamber.3. The ion generator of claim 1 , wherein the insulation member is provided within the small chamber and connects the repeller extension portion and the cover member.4. The ion generator of claim 3 , wherein the supporting structure further includes a shield member that is provided between the repeller extension portion and the insulation member and provided so as to cover an outer surface of the insulation member.5. The ion generator of claim 1 , wherein the cover member is attached to the outside of the arc chamber through ...

Ion Source

An ion source is provided that includes at least one electron gun. The electron gun includes an electron source for generating a beam of electrons and an inlet for receiving a gas. The electron gun also includes a plasma region defined by at least an anode and a ground element, where the plasma region can form a plasma from the gas received via the inlet. The plasma can be sustained by at least a portion of the beam of electrons. The electron gun further includes an outlet for delivering at least one of (i) ions generated by the plasma or (ii) at least a portion of the beam of electrons generated by the electron source. 1. An ion source comprising: an electron source for generating a beam of electrons;', 'an inlet for receiving a gas;', 'a plasma region defined by at least an anode and a ground element, the plasma region adapted to form a plasma from the gas received via the inlet, wherein the plasma is sustained by at least a portion of the beam of electrons; and', 'an outlet for delivering at least one of (i) ions generated by the plasma or (ii) at least a portion of the beam of electrons., 'at least one electron gun, the electron gun including2. The ion source of claim 1 , further comprising a control circuit for adjusting a voltage of the anode to substantially turn off the plasma in the plasma region claim 1 , wherein the outlet is configured to deliver the at least a portion of the beam of electrons without the ions.3. The ion source of claim 1 , wherein the ground element comprises at least one lens for decelerating the at least a portion of the beam of electrons prior to the beam of electrons leaving the at least one electron gun via the outlet.4. The ion source of claim 1 , wherein the inlet and the outlet of the at least one electron gun comprise a single aperture.5. The ion source of claim 4 , further comprising an ionization chamber having two ends disposed along a longitudinal axis claim 4 , wherein one of the two ends is coupled to the aperture of the ...

Magnetic Field Sources For An Ion Source

An ion source is provided that includes an ionization chamber and two magnetic field sources. The ionization chamber has a longitudinal axis extending therethrough and includes two opposing chamber walls, each chamber wall being parallel to the longitudinal axis. The two magnetic field sources each comprises (i) a core and (ii) a coil wound substantially around the core. Each magnetic field source is aligned with and adjacent to an external surface of respective one of the opposing chamber walls and oriented substantially parallel to the longitudinal axis. The cores of the magnetic field sources are physically separated and electrically isolated from each other. 1. An ion source comprising:an ionization chamber having a longitudinal axis extending therethrough and including two opposing chamber walls, each chamber wall being parallel to the longitudinal axis; andtwo magnetic field sources each comprising (i) a core and (ii) a coil wound substantially around the core, wherein each magnetic field source is aligned with and adjacent to an external surface of respective one of the opposing chamber walls and oriented substantially parallel to the longitudinal axis, andwherein the cores of the magnetic field sources are physically separated and electrically isolated from each other.2. The ion source of claim 1 , wherein the coil of each magnetic field source comprises a plurality coil segments.3. The ion source of claim 2 , further comprising a control circuit for separately adjusting a current supplied to each coil segment.4. The ion source of claim 3 , wherein the control circuit is adapted to adjust the current of each coil segment independently to produce a uniform density profile of ions extracted from the ionization chamber.5. The ion source of claim 2 , further comprising three coil segments associated with the coil of each magnetic field source.6. The ion source of claim 5 , wherein the current of a center coil segment of a magnetic field source comprises about ...

Film target for laser-induced particle acceleration and method of manufacturing the same

A film target for laser-induced particle acceleration includes a first target layer on which a laser is incident; an intermediate layer located behind the first target layer along a propagating direction of the laser, and in which an intended ion beam is generated; and a second target layer located opposite to the first target layer with the intermediate layer interposed therebetween.

Ion source and method for making same

An articles includes: an ion source configured to provide a first ion beam that has a first brightness; and a cooler configured to receive the first ion beam and to produce a second ion beam from the first ion beam, the second ion beam including a second brightness that is greater than the first brightness. A process for cooling includes receiving a first ion beam that includes a first brightness in a cooler, and the cooler includes a first mirror and a second mirror disposed opposingly to the first mirror; receiving a first laser beam in the cooler; receiving a second laser beam in the cooler; transmitting the first laser beam and the second laser beam through the first ion beam to decrease an emittance of the first ion beam; reflecting the first laser beam from the first mirror and the second laser beam from the second mirror; and transmitting, after being reflected, the first laser beam and the second laser beam through the first ion beam to cool the first ion beam and to decrease the emittance of the first ion beam to produce a second ion beam that includes a second brightness that is greater than the first brightness

PRESSURE GRADIENT PUMP

An apparatus includes a first pump module, a second pump module and a sealing disc. The first pump module includes a first flange having a first opening, a second flange having a second opening and at least one first pump. The second pump module includes a third flange having a third opening, a fourth flange having a fourth opening, and at least one second pump. The sealing disc is positioned between and in sealing contact with the second flange and the third flange and has a disc opening with a cross-sectional area that is less than a cross-sectional area of the second opening in the second flange and that is less than a cross-sectional area of the third opening in the third flange, where the disc opening is aligned with the first, second, third and fourth openings. 1. An apparatus comprising:a first pump module comprising a first flange having a first opening, a second flange having a second opening, and at least one first pumping unit;a second pump module comprising a third flange having a third opening, a fourth flange having a fourth opening, and at least one second pumping unit; anda sealing disc positioned between and in sealing contact with the second flange and the third flange and having a disc opening with a cross-sectional area that is less than a cross-sectional area of the second opening in the second flange and that is less than a cross-sectional area of the third opening in the third flange, where the disc opening is aligned with the first, second, third and fourth openings.2. The apparatus of wherein the second flange and the third flange are connected together by fasteners exterior to the sealing disc.3. The apparatus of wherein the fasteners are releasable such that when the fasteners are released claim 2 , the sealing disc is free to be removed from between the second flange and the third flange.4. The apparatus of wherein the first pump module further comprises a first conduit connecting the first flange to the second flange and having at least ...

ATMOSPHERIC IONIZER INCLUDING A SOURCE THAT SUPPLIES ELECTRICAL ENERGY TO AN ION-GENERATING STRUCTURE WITHOUT WIRES

An atmospheric ionizer includes a source that supplies electrical energy to an ion-generating structure without the use of wires or other connecting structures that penetrate an intervening wall or other structure. A tool a plurality of panels that define an enclosure. An atmospheric ionizer includes a source of energy disposed on one side of one of the panels of the tool. A capacitive coupling is connected to the source of energy. An ion-generating structure is disposed on an opposite side of the panel of the tool and is connected to the capacitive coupling. As a result, energy from the source of energy is supplied by the capacitive coupling through the panel of the tool to the ion-generating structure. 1. An atmospheric ionizer comprising:a source of energy;a capacitive coupling connected to the source of energy; andan ion-generating structure connected to the capacitive coupling such that energy from the source of energy is supplied by the capacitive coupling to the ion-generating structure.2. The atmospheric ionizer defined in wherein the source of energy is a source of electrical energy.3. The atmospheric ionizer defined in wherein the capacitive coupling includes a first electrode connected to the source of energy and a second electrode connected to the ion-generating structure.4. The atmospheric ionizer defined in wherein a resistor is connected between the source of energy and the first electrode.5. The atmospheric ionizer defined in wherein the first and second electrodes are formed from the same material.6. The atmospheric ionizer defined in wherein the first and second electrodes are formed having the same shape and size.7. The atmospheric ionizer defined in wherein the first and second electrodes are directly aligned with one another.8. A combined tool and atmospheric ionizer comprising:a tool including a panel; andan atmospheric ionizer including a source of energy disposed on one side of the panel of the tool, a capacitive coupling connected to the ...

CHARGED PARTICLE TRANSLATION SLIDE CONTROL APPARATUS AND METHOD OF USE THEREOF

The invention comprises a system for patient specific control of charged particles in a charged particle beam path using one or more trays inserted into the charged particle beam path, such as at the exit port of a gantry nozzle in close proximity to a tumor of a patient. Each tray holds an insert, such as a patient specific insert for controlling the energy, focus depth, and/or shape of the charged particle beam. Examples of inserts include a range shifter, a compensator, an aperture, a ridge filter, and a blank. Trays in a tray assembly are optionally retracted into an output nozzle of a charged particle cancer treatment system. Optionally and preferably, each tray communicates a held and positioned insert to a main controller of the charged particle cancer therapy system. 1. A method for adjusting a charged particle beam traversing along a charged particle beam path , comprising the steps of: an accelerator;', 'a beamline from said accelerator to an output nozzle; and', 'a tray assembly;, 'providing a charged particle system, comprisinginserting a first tray into a first slot of said tray assembly, said first tray configured with a first insert comprising a patient specific charged particle beam adjustment material; andafter said step of inserting, longitudinally retracting said tray assembly along the charged particle beam path into said output nozzle.2. The method of claim 1 , said step of inserting further comprising the steps of:inserting a second tray into a second slot of said tray assembly; andinserting a third tray into a third slot of said tray assembly.3. The method of claim 2 , said step of inserting further comprising the steps of:establishing a first electromechanical connection between a first identifier element, affixed to said first tray, and a first receiver, affixed to said tray assembly; andsaid first identifier element communicating at least one property of said first insert to said charged particle system via said first electromechanical ...

FOCUSED ION BEAM SYSTEM

A focused ion beam system includes a gas field ion source which generates gas ions, an ion gun unit which accelerates the gas ions and radiates the gas ions as an ion beam, a beam optical system which includes at least a focusing lens electrode and radiates the ion beam onto a sample, and an image acquiring mechanism which acquires an FIM image of a tip of an emitter based on the ion beam. The image acquiring mechanism includes an alignment electrode which is disposed between the ion gun unit and the focusing lens electrode and adjusts a radiation direction of the ion beam, an alignment control unit which applies an alignment voltage to the alignment electrode, and an image processing unit which combines a plurality of FIM images acquired when applying different alignment voltages to generate one composite FIM image. 1. A focused ion beam system comprising:a gas field ion source which includes an emitter with a sharp tip, and is configured to ionize a gas at the tip of the emitter to generate gas ions;an ion gun unit which is configured to accelerate the gas ions and radiate the gas ions as an ion beam while extracting the gas ions toward a sample;a beam optical system which includes at least a focusing lens electrode, and is configured to radiate the ion beam onto the sample while focusing the ion beam; andan image acquiring mechanism which is configured to acquire an FIM image of the tip of the emitter based on the ion beam, an alignment electrode which is disposed between the ion gun unit and the focusing lens electrode, and is configured to adjust a radiation direction of the ion beam;', 'an alignment control unit which is configured to apply an alignment voltage to the alignment electrode;', 'a storage unit which is configured to store the acquired FIM image; and', 'an image processing unit which is configured to perform image processing to combine a plurality of FIM images to generate one composite FIM image, wherein the plurality of FIM images are acquired ...

LOW TEMPERATURE PLASMA PROBE AND METHODS OF USE THEREOF

The present invention generally relates to a low temperature plasma probe for desorbing and ionizing at least one analyte in a sample material and methods of use thereof. In one embodiment, the invention generally relates to a low temperature plasma probe including: a housing having a discharge gas inlet port, a probe tip, two electrodes, and a dielectric barrier, in which the two electrodes are separated by the dielectric barrier, in which application of voltage from a power supply generates a low temperature plasma, and in which the low temperature plasma is propelled out of the discharge region by the electric field and/or the discharge gas flow. 160-. (canceled)61. A low temperature plasma probe , the probe comprising:a hollow body having an open distal end;a discharge gas inlet port coupled to the body such that gas may be injected through the port and into the body; andan electrode at least partially disposed within the body; wherein the probe is configured such that injected gas interacts with the electrode to form a low temperature plasma that is ejected from the distal end of the body.62. The probe according to claim 61 , wherein the electrode is axially centered within the distal end of the body.63. The probe according to claim 61 , further comprising a power supply.64. The probe according to claim 61 , further comprising a source of discharge gas operably coupled to the probe via the discharge gas inlet port.65. The probe according to claim 64 , wherein a discharge gas is supplied to the probe through the discharge gas inlet port.66. The probe according to claim 65 , wherein the discharge gas assists in propelling the low temperature plasma out of the probe tip.67. The probe according to claim 64 , wherein the discharge gas is nitrogen.68. The probe according to claim 61 , further comprising a second electrode and a dielectric barrier claim 61 , wherein the two electrodes are separated by the dielectric barrier.69. The probe according to claim 68 , ...

ION SOURCE AND ION BEAM DEVICE USING SAME

Provided is a charged particle beam microscope which has a small mechanical vibration amplitude of a distal end of an emitter tip, is capable of obtaining an ultra-high resolution sample observation image and removing shaking or the like of the sample observation image. A gas field ion source includes: an emitter tip configured to generate ions; an emitter-base mount configured to support the emitter tip; a mechanism configured to heat the emitter tip; an extraction electrode installed to face the emitter tip; and a mechanism configured to supply a gas to the vicinity of the emitter tip, wherein the emitter tip heating mechanism is a mechanism of heating the emitter tip by electrically conducting a filament connecting at least two terminals, the terminals are connected by a V-shaped filament, an angle of the V shape is an obtuse angle, and the emitter tip is connected to a substantial center of the filament. 1. A gas field ion source comprising:an emitter tip configured to generate ions;an emitter-base mount configured to support the emitter tip;a mechanism configured to heat the emitter tip;an extraction electrode installed to face the emitter tip and configured to include an opening allowing the ions to pass therethrough; anda mechanism configured to supply a gas to the vicinity of the emitter tip,wherein the emitter tip heating mechanism is a mechanism of heating the emitter tip by electrically conducting a filament connecting at least two protrusion terminals, the terminals are connected by a V-shaped filament, an angle of the V shape is an obtuse angle, and the emitter tip is connected to a substantial center of the filament.2. A gas field ion source comprising:an emitter tip configured to generate ions;an emitter-base mount configured to support the emitter tip;a mechanism configured to heat the emitter tip;an extraction electrode installed to face the emitter tip and configured to include an opening allowing the ions to pass therethrough; anda mechanism ...

Efficiently Ionizing Atoms Based on Electron Excitation

Systems and methods exposing a sample of atoms to an electromagnetic (EM) field. The EM includes one or more frequencies. The EM field is configured to promote at least a subset of the sample of atoms to one or more excited states based at least upon the one or more frequencies. The one or more excited states are low-lying, metastable states. Furthermore, the subset of the sample of atoms is ionized based at least upon the subset of the sample of atoms being at the one or more excited states. 1. A method comprising:exposing a sample of atoms to an electromagnetic (EM) field, wherein the EM field comprises one or more frequencies, wherein the EM field is configured to promote at least a subset of the sample of atoms to one or more excited states based at least upon the one or more frequencies, wherein the one or more excited states are metastable states; andionizing the subset of the sample of atoms based at least upon the subset of the sample of atoms being at the one or more excited states.2. The method of claim 1 , wherein the sample of atoms comprises two or more isotopes of an element claim 1 , wherein at least one of the isotopes is promoted to the one or more excited states based at least upon the EM field being selective to excite the at least one of the isotopes claim 1 , wherein the one or more excited states are low-lying states.3. The method of claim 2 , wherein the ionizing comprises ionizing the at least one of the isotopes based at least upon the at least one of the isotopes being at the one or more excited states.4. The method of claim 3 , separating the at least one of the isotopes from the two or more isotopes based at least upon the ionizing of the at least one of the isotopes.5. The method of claim 1 , wherein the ionizing comprises applying an ionizing electric field to the sample of atoms.6. The method of claim 1 , wherein the ionizing comprises guiding the subset of the sample of atoms in the proximity of a surface of an ionizing material claim ...

Dual Material Repeller

The IHC ion source comprises an ion source chamber having a cathode and a repeller on opposite ends. The repeller is made of two discrete parts, each comprising a different material. The repeller includes a repeller head, which may be a disc shaped component, and a stem to support the head. The repeller head is made from a conductive material having a higher thermal conductivity than the stem. In this way, the temperature of the repeller head is maintained at a higher temperature than would otherwise be possible. The higher temperature limits the build-up of material on the repeller head, which improves the performance of the IHC ion source. In certain embodiments, the repeller head and the stem are connected using a press fit. Differences in the coefficient of thermal expansion of the repeller head and the stem may cause the press fit to become tighter at higher temperatures. 1. An indirectly heated cathode ion source , comprising:an ion source chamber into which a gas is introduced;a cathode disposed on one end of the ion source chamber; anda repeller disposed at an opposite end of the ion source chamber, the repeller comprising a repeller head disposed within the ion source chamber and a stem that supports the repeller head and exits the ion source chamber through an opening;wherein the repeller head is made of a first material and the stem is made from a second material, different than the first material, andwherein the first material has a first thermal conductivity and the second material has a second thermal conductivity and the second thermal conductivity is less than half of the first thermal conductivity.23-. (canceled)4. The indirectly heated cathode ion source of claim 1 , wherein the second thermal conductivity is less than a third of the first thermal conductivity.5. The indirectly heated cathode ion source of claim 1 , wherein the repeller head and the stem are connected using a press fit.6. The indirectly heated cathode ion source of claim 5 , ...

COLLISION IONIZATION SOURCE

A collision ionization source is disclosed herein. An example source includes an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas, and a supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region. 1. An apparatus comprising:an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas; anda supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region.2. The apparatus of claim 1 , further comprising:a first plate forming a top of the supply duct and having a first aperture; anda second plate forming a bottom of the supply duct and having a second aperture,wherein the first and second apertures are aligned.3. The apparatus of claim 2 , wherein the ionization region is defined by a region between the first and second plates and coincident with the first and second apertures claim 2 , and wherein the charged particle beam enters the ionization region through the first aperture.4. The apparatus of claim 2 , wherein the charged particle beam enters the ionization region through the first aperture.5. The apparatus of claim 2 , wherein ionized gas exits the ionization region through the second aperture.6. The apparatus of claim 1 , wherein the supply duct is defined by a first height region claim 1 , a second height region claim 1 , and a transition region arranged between the first and second height regions.7. The apparatus of claim 6 , wherein the first height region is adjacent to the input orifice and the second height region is adjacent to the output orifice.8. The apparatus of claim ...

Dual Cathode Ion Source

An ion source having dual indirectly heated cathodes is disclosed. Each of the cathodes may be independently biased relative to its respective filament so as to vary the profile of the beam current that is extracted from the ion source. In certain embodiments, the ion source is used in conjunction with an ion implanter. The ion implanter comprises a beam profiler to measure the current of the ribbon ion beam as a function of beam position. A controller uses this information to independently control the bias voltages of the two indirectly heated cathodes so as to vary the uniformity of the ribbon ion beam. In certain embodiments, the current passing through each filament may also be independently controlled by the controller. 1. An ion source , comprising:a first end wall and a second end wall;chamber walls connected to the first end wall and the second end wall to define an ion source chamber, wherein one of the chamber walls comprises an extraction aperture, wherein a ribbon ion beam is extracted through the extraction aperture;a first cathode disposed proximate the first end wall;a first filament disposed between the first end wall and the first cathode;a first bias power supply to bias the first cathode relative to the first filament;a first filament power supply to supply a first current to the first filament;a second cathode disposed proximate the second end wall;a second filament disposed between the second end wall and the second cathode;a second bias power supply, different from the first bias power supply, to bias the second cathode relative to the second filament; anda second filament power supply to supply a second current to the second filament.2. The ion source of claim 1 , wherein an output of the first bias power supply is different from an output of the second bias power supply claim 1 , so as to change a uniformity of the ribbon ion beam extracted through the extraction aperture.3. The ion source of claim 1 , further comprising a controller to ...

ION GENERATING ELEMENT AND ION GENERATING APPARATUS PROVIDED THEREWITH

An ion generating element () is provided with: a needle-shaped ion discharge unit () that generates ions in the air by means of discharge; a voltage generating unit () that generates voltage to be applied to the ion discharge unit (); and a rectifier element () that is connected between the ion discharge unit () and the voltage generating unit (), and applies either the positive or negative portion of the voltage generated by the voltage generating unit () to the ion discharge unit (). The rectifier element () is longitudinal in shape, and is disposed at the opposite side of the tip side of the ion discharge unit () such that the longitudinal direction of the rectifier element () intersects with the axial direction of the needle-shaped ion discharge unit (). 1. An ion generating element comprising:an ion discharger having a needle-like shape for generating ions in air by electric discharge;a voltage generator for generating a voltage to be applied to the ion discharger; anda rectifier connected between the ion discharger and the voltage generator for applying either a positive or a negative voltage generated by the voltage generator to the ion discharger,whereinthe rectifier has an elongate shape, andthe rectifier is arranged at a side of the ion discharger opposite from a pointed-end side thereof such that a longitudinal direction of the rectifier crosses an axial-line direction of the ion discharger.2. The ion generating element according to claim 1 ,wherein the rectifier is arranged such that the longitudinal direction thereof is substantially perpendicular to the axial-line direction of the ion discharger.3. The ion generating element according to claim 1 , further comprising a base plate on which the ion discharger is mounted claim 1 ,wherein an axial line of the ion discharger is perpendicular to a normal line to the base plate.4. The ion generating element according to claim 1 , further comprising a base plate on which the ion discharger is mounted claim 1 , ...

Cleaning of corona discharge ion source

Systems and techniques for cleaning a corona discharge point are described. A controller ( 150 ) can be operatively coupled to a corona discharge point ( 108 ) to control the operation of the corona discharge point ( 1089. The controller ( 150 ) and the corona discharge point ( 108 ) can be included with, for example, an ion mobility spectrometry (IMS) system ( 100 ). The controller ( 150 ) can be used to operate the corona discharge point ( 108 ) at an operating voltage for a first time interval, with or without an additional higher pulse voltage, to produce a corona discharge, and to operate the corona discharge point ( 108 ) at a cleaning voltage greater than the operating voltage for a second time interval subsequent to the first time interval to produce a corona discharge. The effectiveness of the corona discharge point ( 108 ) can be monitored by, for instance, measuring a voltage necessary to produce a corona discharge at the corona discharge point ( 108 ), measuring a current produced at the corona discharge point ( 108 ) from a corona discharge, and so forth.

Ceramic Ion Source Chamber

The IHC ion source comprises an ion source chamber having a cathode and a repeller on opposite ends. The ion source chamber is constructed of a ceramic material having very low electrical conductivity. An electrically conductive liner may be inserted into the ion source chamber and may cover three sides of the ion source chamber. The liner may be electrically connected to the faceplate, which contains the extraction aperture. The electrical connections for the cathode and repeller pass through apertures in the ceramic material. In this way, the apertures may be made smaller than otherwise possible as there is no risk of arcing. In certain embodiments, the electrical connections are molded into the ion source chamber or are press fit in the apertures. Further, the ceramic material used for the ion source chamber is more durable and introduces less contaminants to the extracted ion beam. 1. An indirectly heated cathode ion source , comprising:an ion source chamber into which a gas is introduced, the ion source chamber constructed of an electrically insulating material and having a bottom, two opposite ends, and two sides;a cathode disposed on one of the two opposite ends of the ion source chamber;a repeller disposed at a second of the two opposite ends of the ion source chamber;an electrically conductive liner covering at least one of the bottom and the two sides of the ion source chamber; anda faceplate having an extraction aperture disposed opposite the bottom of the ion source chamber.2. The indirectly heated cathode ion source of claim 1 , wherein the faceplate is electrically conductive claim 1 , and the electrically conductive liner is in electrical contact with the faceplate.3. The indirectly heated cathode ion source of claim 1 , wherein the electrically conductive liner is in electrical contact with the cathode.4. The indirectly heated cathode ion source of claim 1 , wherein the electrically conductive liner is in electrical contact with the repeller.5. The ...

CONTROLLABLE ELECTROSTATIC ION AND FLUID FLOW GENERATOR

One example embodiment includes one or more current-controlled electrodes exposed to a fluid and configured to generate ions in the fluid within an electric field, one or more current-controlling elements having one or more current-limiting elements configured to limit an amount of current permitted in the one or more current-controlled electrodes, and one or more current-changing elements configured to change a limit on the amount of current permitted in the one or more current-controlled electrodes, and an amount of ions generated in the fluid is based on the amount of current permitted in the one or more current-controlled electrodes as regulated by the one or more current-limiting elements and the one or more current-changing elements. 1. An apparatus comprisingone or more current-controlled electrodes exposed to a fluid and configured to generate ions in the fluid within an electric field; one or more current-limiting elements configured to limit an amount of current permitted in the one or more current-controlled electrodes; and', 'one or more current-changing elements configured to change a limit on the amount of current permitted in the one or more current-controlled electrodes;, 'one or more current-controlling elements comprising'}wherein an amount of ions generated in the fluid is based on the amount of current permitted in the one or more current-controlled electrodes as regulated by the one or more current-limiting elements and the one or more current-changing elements.2. The apparatus of claim 1 , further comprising one or more ancillary electrodes which are configured to receive ions in the fluid within an electric field claim 1 , and which are disposed opposite to or overlapping with the one or more current-controlled electrodes claim 1 , and separated from the one or more current-controlled electrodes by an interstitial gap of fluid.3. The apparatus of claim 1 , further comprising:one or more ancillary electrodes which are configured to receive ions ...

ION BEAM DEVICE

An ion beam device according to the present invention includes a gas field ion source () including an emitter tip () supported by an emitter base mount (), a ionization chamber () including an extraction electrode () and being configured to surround the emitter tip (), and a gas supply tube (). A center axis line of the extraction electrode () overlaps or is parallel to a center axis line (A) of the ion irradiation light system, and a center axis line () passing the emitter tip () and the emitter base mount () is inclinable with respect to a center axis line of the ionization chamber (). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided. 1. An ion beam device comprising:a gas field ion source, including a vacuum chamber, a vacuum exhaust mechanism, an emitter tip that composes a needle-shaped anode, an extraction electrode that composes a cathode in the vacuum chamber, and a cooling mechanism of the emitter tip, for supplying gas molecules to a vicinity of a distal end of the emitter tip and ionizing the gas molecules with an electric field at the distal end of the emitter tip;an ion beam device main body including a lens system which focuses an ion beam extracted from the emitter tip, a sample chamber incorporating a sample, and a secondary particle detector which detects secondary particles released from the sample; anda mount which supports the ion beam device main body,wherein a vibration proofing mechanism is arranged in a heat transmission path for transmitting heat generated in the cooling mechanism from the cooling mechanism to the emitter tip in the vacuum chamber.2. The ion beam device according to claim 1 , wherein the cooling mechanism comprises a coldness generation means configured to generate coldness by expanding a high pressure gas generated in a compressor unit claim 1 , and a heat transmission means configured to cool a target to be cooled with a gas cooled by the ...

High Electric Field Fabrication of Oriented Nanostructures

A method of growing carbon nanostructures on a conductive substrate without the need for a vacuum or low-pressure environment provides high electrical field strengths to generate the necessary carbon ions from a feedstock gas and to promote alignment and separation of the resulting structures. In one embodiment, substantially uniform “vertical” nanostructures may be formed around the periphery of an extended wire for use in corona discharge applications or the like. Growth on a planar substrate may provide use with a variety of apparatus requiring a high specific surface conductor such as capacitors, batteries, and solar cells. 1. A method of growing oriented nanostructures comprising the steps of:(a) providing a conductive substrate for receiving the nanostructures;(b) introducing a carbon feedstock gas to flow at substantially atmospheric pressure in a space proximate to the conductive substrate; and(c) imposing an electrical field between the conductive substrate and at least one proximate electrode to break down the carbon feedstock gas for reconstitution as carbon nanostructures on the substrate.2. The method of wherein the electrical field is in excess of 100 volts per millimeter.3. The method of wherein structures of the electrodes have substantially different facing areas to present an asymmetric electrical field.4. The method of including the step of preheating the carbon feedstock gas.5. The method of further including the step of introducing oxygen radicals to the carbon feedstock gas.6. The method of wherein the oxygen radicals are OH radicals derived from water vapor.7. The method of further including the step of thermally annealing the substrate in a reducing environment after formation of the carbon nanostructures.8. The method of wherein the carbon nanostructures are carbon nanowalls.9. The method of wherein the proximate electrode is at least one sharpened and conductive tip facing the conductive substrate and the conductive substrate is a ...

Ion thruster

An ion thruster, comprising: a discharge chamber for accelerating ions towards one direction; an inflow opening for intake of a propellant into the discharge chamber; a discharge cathode, shaped in a form of a propeller, for releasing electrons in the discharge chamber, thereby ionizing the propellant in the discharge chamber, wherein the discharge cathode is rotatable around an axis, thereby propelling inward to the discharge chamber the propellant thereof; an outflow opening for exhausting the ions from the discharge chamber; and an accelerator electrode, shaped in a form of a propeller, for accelerating the ions towards the one direction of the outflow opening, wherein the accelerator electrode is rotatable around an axis, thereby propelling outward from the discharge chamber the ions and neutral atoms thereof; wherein the ion thruster comprises electromagnetic coils for generating a magnetic field inside the discharge chamber.

METHODS FOR USING ISOTOPICALLY ENRICHED LEVELS OF DOPANT GAS COMPOSITIONS IN AN ION IMPLANTATION PROCESS

A novel process for using enriched and highly enriched dopant gases is provided herein that eliminates the problems currently encountered by end-users from being able to realize the process benefits associated with ion implanting such dopant gases. For a given flow rate within a prescribed range, operating at a reduced total power level of the ion source is designed to reduce the ionization efficiency of the enriched dopant gas compared to that of its corresponding non-enriched or lesser enriched dopant gas. The temperature of the source filament is also reduced, thereby mitigating the adverse effects of fluorine etching and ion source shorting when a fluorine-containing enriched dopant gas is utilized. The reduced levels of total power in combination with a lower ionization efficiency and lower ion source temperature can interact synergistically to improve and extend ion source life, while beneficially maintaining a beam current that does not unacceptably deviate from previously qualified levels. 1. A method of using an enriched dopant gas , comprising:introducing the enriched dopant gas at a flow rate sufficient to maintain stability of the ion source, wherein the enriched dopant gas has an enrichment level in an isotope therein of 90% or greater than natural abundance levels;operating at a reduced total power level of the ion source in comparison to a total power level utilized for a correspondingly lesser enriched or non-enriched dopant gas; andionizing the enriched dopant gas to generate and maintain a beam current as produced using the correspondingly lesser enriched or non-enriched dopant gas at the flow rate.2. The method of claim 1 , further comprising:operating the ion source at a reduced temperature in comparison to the correspondingly lesser enriched or non-enriched dopant gas at the flow rate; andoperating at the reduced total power level by reducing arc voltage, arc bias, filament power or a combination thereof.3. The method of claim 1 , further ...