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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 8561. Отображено 100.
19-04-2012 дата публикации

Microwave plasma source and plasma processing apparatus

Номер: US20120090782A1
Автор: Taro Ikeda, Yuki Osada
Принадлежит: Tokyo Electron Ltd

There are provided a microwave plasma source and a plasma processing apparatus capable of improving uniformity of a plasma density distribution within a processing chamber by controlling positions of nodes and antinodes of a standing wave of microwave within the processing chamber not to be fixed. The microwave plasma source 2 includes a microwave supply unit 40. The microwave supply unit 40 includes multiple microwave introducing devices 43 each introducing microwave into the processing chamber; and multiple phase controllers 46 for adjusting phases of the microwaves inputted to the microwave introducing devices 43. Here, the phases of the microwaves inputted to the microwave introducing devices 43 are adjusted by fixing an input phase of the microwave inputted to one of two adjacent microwave introducing devices 43 while varying an input phase of the microwave inputted to the other microwave introducing device 43 according to a periodic waveform.

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Номер записи: 1
19-04-2012 дата публикации

Antenna unit for generating plasma and substrate processing apparatus including the same

Номер: US20120090785A1
Автор: Yong-Jun Jang
Принадлежит: Jusung Engineering Co Ltd

An antenna unit for generating a plasma includes: a first antenna including a first incoming portion and a plurality of first sub-antennas divided from the first incoming portion; and a second antenna including a second incoming portion and a plurality of second sub-antennas divided from the second incoming portion, the first and second incoming portions constituting a coaxial line.

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Номер записи: 2
21-06-2012 дата публикации

System for causing temperature rise in battery

Номер: US20120153877A1
Автор: Hiroyasu Baba, Kunio Iritani, Masao Tokunaga
Принадлежит: Denso Corp, Nippon Soken Inc

A battery temperature rise causing system has a converting unit for converting voltage of electric power held in one of a rechargeable battery and a capacitor and applies the converted voltage to the other one, and a control unit controlling the converting unit to alternately perform first transfer of electric power from the battery to the capacitor and second transfer of electric power from the capacitor to the battery while changing the first transfer for the second transfer each time the battery voltage reaches a lower limit and changing the second transfer for the first transfer each time the battery voltage reaches an upper limit, and to increase temperature of the battery due to heat generated by electric current flowing through the battery during the electric power transfer.

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Номер записи: 3
13-09-2012 дата публикации

Plasma generating apparatus and plasma etching method using the same

Номер: US20120231631A1
Автор: Hongseub KIM
Принадлежит: JEHARA CORPARATION

A plasma generating apparatus and a plasma etching method are provided. The apparatus includes a chamber, a barrier, a susceptor, and a Radio Frequency (RF) power. The chamber forms a reaction space isolated from the external. The barrier divides the chamber into an upper chamber and a lower chamber. The barrier has a plurality of through-holes through formed to communicate the upper chamber and the lower chamber. The susceptor is installed in the lower chamber. The RF power supplies a bias power to the susceptor.

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Номер записи: 4
27-09-2012 дата публикации

Remote plasma source generating a disc-shaped plasma

Номер: US20120242229A1
Автор: Daniel Carter, Daniel J. Hoffman, Karen Peterson, Randy Grilley
Принадлежит: Advanced Energy Industries Inc

Disclosed herein are systems, methods and apparatuses for dissociating a non-activated gas through a disc-shaped plasma in a remote plasma source. Two inductive elements, one on either side of the disc-shaped plasma, generate a magnetic field that induces electric fields that sustain the disc-shaped plasma. The inductive elements can be coiled conductors having any number of loops and can be arranged in planar or vertical coils or a combination of planar and vertical coils. Additionally, the ratio of inductive element radius to gap distance between the two inductive elements can be configured to achieve a desired vertical plasma confinement.

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Номер записи: 5
04-10-2012 дата публикации

Plasma processing apparatus and microwave introduction device

Номер: US20120247676A1
Автор: Atsushi Ueda, Junichi Kitagawa, Shigenori Ozaki, Yutaka Fujino
Принадлежит: Tokyo Electron Ltd

A plasma processing apparatus includes a microwave introduction device which introduces a microwave into a process chamber. The microwave introduction device includes a plurality of microwave transmitting plates which is fitted into a plurality of openings of a ceiling. The microwave transmitting plates are arranged on one virtual plane parallel to a mounting surface of a mounting table, with the microwave transmitting plates fitted into the respective openings. The microwave transmitting plates includes first to third microwave transmitting plates. The first to third microwave transmitting plates are arranged in such a manner that a distance between the center point of the first microwave transmitting window and the center point of the second microwave transmitting window becomes equal or approximately equal to a distance between the center point of the first microwave transmitting window and the center point of the third microwave transmitting window.

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Номер записи: 6
08-11-2012 дата публикации

Battery production device

Номер: US20120280568A1
Автор: Andreas Gutsch, Tim Schaefer
Принадлежит: Li Tec Battery GmbH

A battery production device, in particular a forming device formation device ( 1 ) for forming the formation of electrochemical cells ( 4 ), comprising a production unit, in particular a receiving device ( 3 ) for receiving at least one electrochemical cell ( 4 ), in particular a plurality of electrochemical cells ( 4 ), a power network connecting device ( 5 ), by means of which the battery production device can draw electrical energy from a power network ( 2 ), in particular a public power network, and can emit electrical energy to the power network, a control device ( 7 ) for controlling at least parts of the battery production, characterised in that the control device ( 7 ) is constructed in such a way that the electric power drawn from the power network ( 2 ) and/or the electrical power emitted to the power network ( 2 ) can be controlled as a function of the services power offered in the power network, in particular can be controlled as a function of the temporary services power offered in the power network.

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Номер записи: 7
13-12-2012 дата публикации

Miniaturizable plasma source

Номер: US20120313524A1
Автор: Horia-Eugen Porteanu, Roland Gesche, Silvio Kuehn
Принадлежит: Forschungsverbund Berlin FVB eV

The invention relates to a plasma source with an oscillator having an active element and a resonator connected to the active element. The resonator has a hollow body, a gas inlet, a gas outlet arranged at a distal end of the hollow body about a longitudinal axis of the hollow body, and a coil arranged along the longitudinal axis of the hollow body, said coil having an effective length of one quarter of a wavelength at a resonant frequency of the resonator. A distal end of the coil is arranged relative to the gas outlet such that a plasma section can form between the distal end of the coil serving as a first plasma electrode and the gas outlet of the hollow body serving as a second plasma electrode. At a proximal end of the hollow body, the coil is lead out of the interior of the hollow body through an electrically contact-free feed-through, and a proximal end of the coil contacts the hollow body at its external side. At a first contact region located between the proximal end of the coil and the feed-through, the coil is coupled to a first gate of the active element, and at a second contact region located between the proximal end of the coil and the feed-through, the coil is coupled to a second gate of the active element.

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Номер записи: 8
03-01-2013 дата публикации

Starter supply network

Номер: US20130000585A1
Автор: Falco Sengebusch, Matthias Cwik
Принадлежит: ROBERT BOSCH GMBH

A starter supply network having a first energy source for the primary energy supply of a starter motor, the first energy source being coupled to a network terminal of the starter supply network; a second energy source; and a coupler, which is configured to couple the second energy source to the network terminal as a function of a starter motor current delivered by the first energy source, in order to counteract a reduction in the starter motor current.

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Номер записи: 9
21-03-2013 дата публикации

PLASMA MONITORING AND MINIMIZING STRAY CAPACITANCE

Номер: US20130071581A1
Автор: Baek Jonghoon, Kim Sam H., Kunita Shinichi, PARK Beom Soo, WHITE John M., Yang Hsiao-Lin
Принадлежит:

The present invention generally relates to a capacitively coupled plasma (CCP) processing chamber, a manner to reduce or prevent stray capacitance, and a manner to measure plasma conditions within the processing chamber. As CCP processing chambers increase in size, there is a tendency for stray capacitance to negatively impact the process. Additionally, RF ground straps may break. By increasing the spacing between the chamber backing plate and the chamber wall, stray capacitance may be minimized. Additionally, the plasma may be monitored by measuring the conditions of the plasma at the backing plate rather than at the match network. In so measuring, the plasma harmonic data may be analyzed to reveal plasma processing conditions within the chamber. 1. A method , comprising:delivering RF power from an RF power source through a match network to a backing plate of a capacitively coupled plasma chamber;igniting a plasma within the capacitively coupled plasma chamber; andmeasuring one or more of second and third harmonics of the plasma at a location spaced from the match network.2. The method of claim 1 , further comprising replacing a broken RF return strap in response to the measuring.3. The method of claim 1 , further comprising removing a broken substrate from the capacitively coupled plasma chamber in response to the measuring.4. The method of claim 1 , wherein the location is a center of an electrode of the capacitively coupled plasma chamber.5. The method of claim 1 , wherein the location is an edge of an electrode of the capacitively coupled plasma chamber.6. A method claim 1 , comprising:delivering RF power from an RF power source through a match network to a backing plate of a capacitively coupled plasma chamber;igniting a plasma within the capacitively coupled plasma chamber; anddetecting a condition of the plasma by measuring a plasma parameter at a location spaced from the match network.7. The method of claim 6 , wherein detecting comprises detecting a second ...

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Номер записи: 10
11-04-2013 дата публикации

SYMMETRIC PLASMA PROCESS CHAMBER

Номер: US20130087286A1
Автор: BALAKRISHNA AJIT, BUCHBERGER, Carducci James D., Chen Zhigang, Collins Kenneth S., JR. DOUGLAS A., NGUYEN ANDREW, Ramaswamy Kartik, Rauf Shahid, TAVASSOLI Hamid
Принадлежит: Applied Materials, Inc.

Embodiments of the present invention provide a plasma chamber design that allows extremely symmetrical electrical, thermal, and gas flow conductance through the chamber. By providing such symmetry, plasma formed within the chamber naturally has improved uniformity across the surface of a substrate disposed in a processing region of the chamber. Further, other chamber additions, such as providing the ability to manipulate the gap between upper and lower electrodes as well as between a gas inlet and a substrate being processed, allows better control of plasma processing and uniformity as compared to conventional systems. 1. A plasma processing apparatus , comprising:a lid assembly and a chamber body enclosing a processing region;a substrate support assembly disposed in the chamber body;an exhaust assembly defining an evacuation region within the chamber body, wherein the chamber body includes a plurality of passages symmetrically disposed about a central axis of the substrate support assembly fluidly connecting the processing region with the evacuation region, wherein the substrate support assembly comprises a lower electrode and a support pedestal disposed in a central region fluidly sealed from the processing and evacuation regions; anda plurality of access tubes positioned through the chamber body to provide access to the central region and arranged symmetrically about the central axis of the substrate support assembly.2. The apparatus of claim 1 , wherein the chamber body has an exhaust port formed therethrough that is symmetric about the central axis of the substrate support pedestal.3. The apparatus of claim 1 , wherein the lid assembly comprises an upper electrode having a central manifold configured to distribute processing gas into the processing region and one or more outer manifolds configured to distribute processing gas into the processing region.4. The apparatus of claim 3 , wherein the lid assembly further comprises a ring manifold coupled to the one or ...

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Номер записи: 11
23-05-2013 дата публикации

Guided Wave Applicator with Non-Gaseous Dielectric for Plasma Chamber

Номер: US20130126331A1
Автор: ANWAR Suhail, KUDELA Jozef, SORENSEN Carl A., Tanaka Tsutomu, WHITE John M.
Принадлежит:

A guided wave applicator comprising two electrically conductive waveguide walls and a waveguide dielectric. The volume of the waveguide dielectric is composed of non-gaseous dielectric material and is positioned between the two waveguide walls. The waveguide dielectric includes first and second longitudinal ends and includes first, second, third and fourth sides extending longitudinally between the two longitudinal ends. The first waveguide wall is positioned so that it covers the first side of the waveguide dielectric, and the second waveguide wall is positioned so that it covers the second side of the waveguide dielectric. In operation, electrical power can be supplied to one or both longitudinal ends of the waveguide dielectric, whereby the power can be coupled to a plasma through the exposed sides of the waveguide dielectric. 1. A guided wave applicator for coupling electrical power to a plasma , comprising:first and second waveguide walls, wherein each waveguide wall is electrically conductive; and (i) first and second longitudinal ends, and', '(ii) first, second, third and fourth sides that extend longitudinally between the two longitudinal ends;, 'a waveguide dielectric whose volume is composed of non-gaseous dielectric material, wherein the waveguide dielectric includeswherein:the waveguide dielectric is positioned between the two waveguide walls;the first waveguide wall is positioned so that it covers the first side of the waveguide dielectric;the second waveguide wall is positioned so that it covers the second side of the waveguide dielectric; anda portion of each of the third and fourth sides of the waveguide dielectric is not covered by the waveguide walls.2. The guided wave applicator of claim 1 , wherein:at least half the surface area of each of the third and fourth sides of the waveguide dielectric is not covered by the waveguide walls.3. The guided wave applicator of claim 1 , wherein:at least half the surface area of each of the third and fourth ...

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Номер записи: 12
23-05-2013 дата публикации

Power Supply System, Controller of Power Supply System, Method of Operating Power Supply System, and Method of Controlling Power Supply System

Номер: US20130127249A1
Автор: Hiroaki Kaneko, Kunihiro Ukai
Принадлежит: Panasonic Corp

A power supply system of the present invention includes: a power generation system ( 101 ); a power storage unit ( 107 ) configured to supply electric power to the power generation system ( 101 ) and an external electric power load ( 105 ); and a controller ( 110 ) configured to, in a case where it is predicted that at least one of the sum of activation electric power of the power generation system ( 101 ) and power consumption of the external electric power load ( 105 ) when activating the power generation system ( 101 ) and the sum of stop electric power of the power generation system ( 101 ) and the power consumption of the external electric power load ( 105 ) when stopping the power generation of the power generation system ( 101 ) exceeds the upper limit electric power receivable from an electric power system ( 104 ), supply the electric power of the power storage unit ( 107 ) to at least one of the power generation system ( 101 ) and the external electric power load ( 105 ) such that the electric power amount supplied from the electric power system ( 104 ) does not exceed the upper limit electric power.

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Номер записи: 13
30-05-2013 дата публикации

RF POWER DISTRIBUTION DEVICE AND RF POWER DISTRIBUTION METHOD

Номер: US20130134877A1
Автор: KIM Jaehyun, LEE SANG WON, LEE Yong Gwan
Принадлежит: PLASMART, INC.

Provided are an RF power distribution device and an RF power distribution method. The RF power distribution device includes an impedance matching network for transferring power from an RF power source and a power distribution unit for distributing the output power from the impedance matching network to at least one electrode generating capacitively-coupled plasma. The power distribution unit includes a first reactive element connected in series to a first electrode, a variable capacitor having one end connected in parallel to the first reactive element and the first electrode and the other end grounded, and a second reactive element having one end connected to a first node where the one end of the variable capacitor and one end of the first reactance device are in contact with each other and the other end connected to a second node where a second electrode and an output terminal of the impedance matching network are connected. 1. A power distribution device comprising:an impedance matching network configured to deliver power from an RF power source; anda power distribution unit configured to distribute the output power from the impedance matching network to at least one electrode generating capacitively-coupled plasma,wherein the power distribution unit comprises:a first reactive element connected in series to a first electrode;a variable capacitor having one end connected in parallel to the first reactive element and the first electrode and the other end grounded; anda second reactive element having one end connected to a first node where the one end of the variable capacitor and one end of the first reactive element are in contact with each other and the other end connected to a second node where a second electrode and an output terminal of the impedance matching network are connected.2. The power distribution device as set forth in claim 1 , wherein the power distribution unit supplies power at a plurality of positions of the first electrode and the second ...

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Номер записи: 14
30-05-2013 дата публикации

Large area, atmospheric pressure plasma for downstream processing

Номер: US20130134878A1
Автор: Gary S. Selwyn
Принадлежит: APJet Inc

An arcless, atmospheric-pressure plasma generating apparatus capable of producing a large-area, temperature-controlled, stable discharge at power densities between about 0.1 W/cm 3 and about 200 W/cm 3 , while having an operating gas temperature of less than 50° C., for processing materials outside of the discharge, is described. The apparatus produces active chemical species, including gaseous metastables and radicals which may be used for polymerization (either free radical-induced or through dehydrogenation-based polymerization), surface cleaning and modification, etching, adhesion promotion, and sterilization, as examples. The invention may include either a cooled rf-driven electrode or a cooled ground electrode, or two cooled electrodes, wherein active components of the plasma may be directed out of the plasma and onto an external workpiece without simultaneously exposing a material to the electrical influence or ionic components of the plasma.

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Номер записи: 15
06-06-2013 дата публикации

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Номер: US20130140984A1
Автор: Hirayama Masaki, Ohmi Tadahiro
Принадлежит:

A plasma processing apparatus can excite uniform plasma on a large substrate. The plasma processing apparatus includes a vacuum chamber having therein a mounting table configured to mount a substrate G, and a plasma space, formed above the mounting table, in which plasma is generated; a first coaxial waveguide through which a high frequency power for exciting plasma is supplied into the vacuum chamber ; a waveguide path , connected to the first coaxial waveguide , having a slit-shaped opening toward the plasma space; and an adjusting unit configured to adjust a wavelength of the high frequency power propagating in the waveguide path in a lengthwise direction of the slit-shaped opening. By adjusting the wavelength of the high frequency power propagating in the waveguide path to be sufficiently lengthened, uniform plasma can be excited on the large substrate. 1. A plasma processing apparatus comprising:a vacuum chamber that includes therein a mounting table configured to mount a processing target object thereon; and a plasma space in which plasma is generated, the plasma space being formed above the mounting table;a transmission path through which a high frequency power for exciting plasma is supplied into the vacuum chamber;a waveguide path, connected to the transmission path, having a slit-shaped opening toward the plasma space; andan adjusting unit configured to adjust a wavelength of a high frequency power propagating in the waveguide path in a lengthwise direction of the slit-shaped opening,wherein both ends of the waveguide path in the lengthwise direction of the slit-shaped opening are not short-circuited.2. The plasma processing apparatus of claim 1 ,wherein the adjusting unit is configured to adjust the wavelength of the high frequency power propagating in the waveguide path such that the wavelength of the high frequency power propagating in the waveguide path becomes equal to or larger than about seven times the length of the slit-shaped opening in the ...

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Номер записи: 16
20-06-2013 дата публикации

Hybrid plasma reactor

Номер: US20130154480A1
Автор: Dae-Kyu Choi
Принадлежит: Dae-Kyu Choi

A hybrid plasma reactor includes a reactor body having a plasma discharge space, a gas inlet, and a gas outlet; a hybrid plasma source including a first hybrid electrode and a second hybrid electrode, which face each other while the reactor body is positioned therebetween and provide a current path having one or more turns, to be inductively and capacitively coupled to plasma formed in the plasma discharge space; and an alternating switching power supply for supplying plasma generation power to the first hybrid electrode and the second hybrid electrode. The hybrid plasma reactor can complexly generate capacitively coupled plasma and inductively coupled plasma, thereby achieving a wide operation area from a low-pressure area to a high-pressure area.

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Номер записи: 17
27-06-2013 дата публикации

PLASMA PROCESSING APPARATUS

Номер: US20130160950A1
Автор: Jeon Sang Jean, Jeon Yunkwang, Kim Hyungjoon, LEE Ji Myoung, Lee Sangheon
Принадлежит: SAMSUNG ELECTRONICS CO., LTD.

A plasma processing apparatus capable of adjusting a processing rate (e.g., etching or deposition rate) of a sample locally by adjusting a plasma density may be provided. For example, the plasma processing apparatus may include a processing chamber, an antenna coil inside the processing chamber to generate magnetic field, and a magnetic field blocking member configured to block the magnetic field generated at the antenna coil such that an intensity of the magnetic field is controlled by adjusting a gap distance between the magnetic field blocking member and the antenna coil. According to the plasma processing apparatus, an asymmetric etching of the sample can be minimized. 1. A plasma processing apparatus comprising:a processing chamber;an antenna coil inside the processing chamber, the antenna coil configured to generate a magnetic field; anda magnetic field blocking member configured to block the magnetic field generated at the antenna coil such that an intensity of the magnetic field is controlled by adjusting a gap distance between the magnetic field blocking member and the antenna coil.2. The plasma processing apparatus of claim 1 , wherein the magnetic field blocking member is installed at an inner side of the processing chamber by a coupling pin claim 1 , the coupling pin is rotatable claim 1 , and the magnetic field blocking member is configured to move at least one of toward an inner side direction of the processing chamber and toward an outer side direction of the processing chamber by rotating the coupling pin.3. The plasma processing apparatus of claim 2 , wherein the magnetic field blocking member is configured in a way that claim 2 , as the magnetic field blocking member moves toward the inner side direction of the processing chamber to be nearer to the antenna coil claim 2 , the amount of the magnetic field blocked by the magnetic field blocking member is increased.4. The plasma processing apparatus of claim 2 , wherein the magnetic field blocking ...

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Номер записи: 18
27-06-2013 дата публикации

PLASMA PROCESSING APPARATUS AND METHOD

Номер: US20130162142A1
Автор: HANDA Tatsuya, KOBAYASHI Keigo, MAKABE Masatsugu, MIDORIKAWA Ryotaro, NAGAYAMA Nobuyuki, NISHINO Masaru, NIYA Tetsuya
Принадлежит:

A plasma processing apparatus includes a processing chamber; a lower electrode serving as a mounting table for mounting thereon a target object; and an upper electrode or an antenna electrode provided to be opposite to the lower electrode. The apparatus further includes a gas supply source for introducing a gas including a halogen-containing gas and an oxygen gas into the processing chamber and a high frequency power supply for applying a high frequency power for generating plasma to at least one of the upper electrode, the antenna electrode, or the lower electrode. Among inner surfaces of the processing chamber which are exposed to the plasma, at least a part of or all of the surfaces between a mounting position of the target object and the upper electrode, or the antenna electrode; or at least a part of or all of the surfaces of the upper electrode or the antenna electrode are coated with a fluorinated compound. 1. A plasma processing apparatus for generating a plasma of a gas by applying a high frequency power and performing a plasma processing on a target object to be processed by an action of the plasma , comprising:a depressurizable processing chamber;a lower electrode, provided in the processing chamber, serving as a mounting table for mounting thereon the target object;an upper electrode or an antenna electrode provided at the processing chamber so as to be opposite to the lower electrode;a gas supply source for introducing a gas including a halogen-containing gas and an oxygen gas into the processing chamber; anda high frequency power supply for applying a high frequency power for generating plasma to at least one of the upper electrode, the antenna electrode, or the lower electrode,wherein, among inner surfaces of the processing chamber which are exposed to the plasma, at least a part of or all of the surfaces between a mounting position of the target object and the upper electrode or the antenna electrode; or at least a part of or all of the surfaces of ...

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Номер записи: 19
04-07-2013 дата публикации

COOLING BLOCK FORMING ELECTRODE

Номер: US20130168369A1
Автор: Hayashi Daisuke, Ishida Toshifumi
Принадлежит: TOKYO ELECTRON LIMITED

The present invention is a cooling block that forms an electrode for generating a plasma for use in a plasma process, and includes a channel for a cooling liquid, the cooling block comprising: a first base material and a second base material respectively made of aluminum, at least one of the first and second base materials having a recess for forming a channel for a cooling liquid; and a diffusion bonding layer, in which zinc is diffused in aluminum, and an anti-corrosion layer of a zinc oxide film, the layers being formed by interposing zinc between the first and second base materials, and by bonding the first and second base materials with zinc interposed therebetween in a heating atmosphere containing oxygen. 110-. (canceled)11. A cooling block that forms an electrode for generating a plasma for use in a plasma process , the cooling block comprising:a first base material on which a first brazing material is applied;a second base material on which a second brazing material is applied; anda groove for introduction of cooling medium for cooling the electrode, the groove being arranged between the first base material and the second base material,wherein the first brazing material on the first base material and the second brazing material on the second base material are bonded to each other, and a diffusion bonding layer consists of a bonding layer including the first base material, the second base material, the first brazing material and the second brazing material.12. The cooling block according to claim 11 , whereinthe first base material and the second base material are aluminum.13. The cooling block according to claim 11 , whereinthe first brazing material is a zinc coated film.14. The cooling block according to claim 11 , whereinthe second brazing material is a nickel coated film.15. The cooling block according to claim 11 , whereinthe diffusion bonding layer is a bonding layer consisting of Al—Zn—Ni.16. The cooling block according to claim 11 , whereinthe ...

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Номер записи: 20
11-07-2013 дата публикации

System and method for plasma generation

Номер: US20130175245A1
Автор: Jack Hunt
Принадлежит: Jack Hunt

A system and method for generating a plasma. An embodiment of the system for generating a plasma may include a first electrode; a second electrode disposed adjacent the first electrode; a first power supply for supplying power at the second electrode; a second power supply for generating a magnetic field; and a sequencer for coordinating a discharge of power from the first power supply and a discharge of power from the second power supply. The first power supply may be configured such that the discharge of power from the first power supply generates a plasma between the first electrode and the second electrode. The second power supply may be configured such that the magnetic field generated by the discharge of power from the second power supply rotates the plasma.

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Номер записи: 21
11-07-2013 дата публикации

HYBRID PLASMA REACTOR

Номер: US20130175928A1
Автор: CHOI Dae-Kyu
Принадлежит:

A hybrid plasma reactor includes a first plasma chamber for providing a first ring-shaped plasma discharge space, second plasma chambers providing a second plasma discharge space connected to the first plasma discharge space and coupled to magnetic flux channels, a hybrid plasma source including magnetic cores, which partially surround the first plasma chamber and have magnetic entrances forming the magnetic flux channels, and primary winding coils wound in the magnetic cores and complexly generating ring-shaped transformer-coupled plasma in the first plasma discharge space and magnetic flux channel coupled plasma in the second plasma discharge space, and an AC switching power supply for supplying plasma generation power to the primary winding coils. The hybrid plasma reactor can complexly generate magnetic flux channel coupled plasma and transformer coupled plasma so that it has a high control capability for plasma ion energy and a wide operation region from a low-pressure region to a high-pressure region. 1. A hybrid plasma reactor comprising:a first plasma chamber for providing a first ring-shaped plasma discharge space;second plasma chambers configured to provide a second plasma discharge space connected to the first plasma discharge space and coupled to magnetic flux channels;a hybrid plasma source including magnetic cores, which partially surround the first plasma chamber and have magnetic entrances forming the magnetic flux channels, and primary winding coils wound in the magnetic cores and complexly generating ring-shaped transformer-coupled plasma in the first plasma discharge space and magnetic flux channel coupled plasma in the second plasma discharge space; andan AC switching power supply for supplying plasma generation power to the primary winding coils.2. The hybrid plasma source as claimed in claim 1 , wherein the first plasma chamber includes a conductive material or an insulation material.3. The hybrid plasma source as claimed in claim 1 , wherein ...

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Номер записи: 22
25-07-2013 дата публикации

METHOD AND APPARATUS FOR GENERATING PLASMA PULSES

Номер: US20130187544A1
Автор: Gesche Roland
Принадлежит: FORSCHUNGSVERBUND BERLIN E.V.

A method for generating plasma pulses in which at least two sources are furnished with at least one time function, wherein each of the at least two sources radiates an electromagnetic field generated by one of the time functions, and the at least one time function and the at least two sources cooperate in such a manner that at least one predetermined field strength is realized sequentially in a temporal succession in at least two predetermined space-time points. An alternative method provides at least one source and at least one reflection element for realizing the predetermined field strength. The apparatus for generating plasma pulses comprises at least two sources and at least one data processing device or at least one source, at least one reflection element and at least one data processing device and is configured in such a manner that a method for generating plasma pulses can be executed. 1. A method for generating plasma pulses , whereinat least two sources are furnished with at least one time function, wherein each of the at least two sources radiates an electromagnetic field generated by one of the time functions, and the at least one time function and the at least two sources cooperate in such a manner that at least one predetermined field strength is realized sequentially in a temporal succession in at least two predetermined space-time points.2. The method according to claim 1 , whereinthe at least one predetermined space-time point is reached by at least one of the time functions on at least two different propagation paths.3. The method according to claim 1 , whereinthe predetermined space-time points form a one-, two- or three-dimensional structure.4. The method according to claim 1 , whereinat least one time function is determined by outputting a predetermined pulse in a space point and recording said pulse as a pulse response in the places of the at least two sources.5. The method according to claim 1 , whereinat least one source is furnished with the ...

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Номер записи: 23
01-08-2013 дата публикации

MICROWAVE EMITTING DEVICE AND SURFACE WAVE PLASMA PROCESSING APPARATUS

Номер: US20130192760A1
Автор: IKEDA Taro, Osada Yuki
Принадлежит: TOKYO ELECTRON LIMITED

A microwave emitting device emits a microwave generated by a microwave generation unit into a chamber in a plasma processing apparatus for performing plasma processing by generating a surface wave plasma in the chamber. The device includes: a transmission line having a tubular outer conductor and an inner conductor disposed in the outer conductor to transmit the microwave; an antenna to emit the microwave transmitted through the microwave transmission line into the chamber through slots; a dielectric member to transmit the microwave emitted from the antenna to generate a surface wave; and a DC voltage application member to apply a positive DC voltage to a plasma generation region where a surface wave plasma is generated by the surface wave. 1. A microwave emitting device for emitting a microwave generated by a microwave generation unit into a chamber in a plasma processing apparatus for performing plasma processing by generating a surface wave plasma in the chamber , the device comprising:a transmission line having a tubular outer conductor and an inner conductor coaxially disposed in the outer conductor to transmit the microwave;an antenna configured to emit the microwave transmitted through the microwave transmission line into the chamber through slots;a dielectric member configured to transmit the microwave emitted from the antenna to thereby generate a surface wave on a surface thereof; anda DC voltage application member configured to apply a positive DC voltage to a plasma generation region where a surface wave plasma is generated by the surface wave,wherein the DC voltage application member applies the positive DC voltage to the plasma generation region so that the surface wave plasma is expanded.2. The microwave emitting device of claim 1 , wherein the DC voltage application member is a DC voltage application probe inserted into the plasma generation region.3. The microwave emitting device of claim 1 , wherein an area of the surface wave plasma is controlled ...

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Номер записи: 24
08-08-2013 дата публикации

PLASMA PROCESSING APPARATUS

Номер: US20130199727A1
Автор: Endo Hiroki, IWATA Manabu, UMEHARA Naoyuki
Принадлежит: TOKYO ELECTRON LIMITED

Provided is a capacitively coupled plasma processing apparatus which improves a controllability of the RF bias function and reliably prevents unwanted resonance from being generated on a RF transmission line between a counter electrode and ground potential to enhance reliability of the plasma process. In the capacitive coupled type plasma processing apparatus, three kinds of RF powers from a first, second and third RF power supplies () are superimposed and applied to susceptor (lower electrode) (). In such a three-frequency superimposing and applying application scheme, the frequency-impedance characteristic around upper electrode () is considered to prevent a serial resonance from occurring on an RF transmission line around upper electrode () in consideration of all the low order frequencies of the IMD relevant to and affecting the plasma process. Since the fluorocarbon layer by itself functions as an antireflective film and a harm mask, the reliability of processing can be improved, while reducing the cost. 1. A plasma processing apparatus comprising:a vacuum exhaustible processing container that accommodates a target substrate to be able to be carried in and out in relation to the processing container;first and second electrodes disposed to be opposed to each other within the processing container to form a processing space therebetween where plasma is generated so that a desired processing is performed on the substrate held on the first electrode under the plasma;{'sub': '1', 'a first RF power supply that applies a first RF power having a first frequency (f) to the first electrode;'}{'sub': '2', 'a second RF power supply that applies a second RF power having a second frequency (f) to the first electrode;'}{'sub': '3', 'a third RF power supply that applies a third RF power having a third frequency (f) to the first electrode; and'}a filter circuit connected between the second electrode and a member having a ground potential,{'sub': 1', '2', '3', '1', '2', '2', '3, ...

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Номер записи: 25
08-08-2013 дата публикации

ANTENNA UNIT FOR INDUCTIVELY COUPLED PLASMA, INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS AND METHOD THEREFOR

Номер: US20130200043A1
Автор: Sato Ryo, TOJO Toshihiro
Принадлежит: TOKYO ELECTRON LIMITED

An antenna unit for inductively coupled plasma includes an antenna configured to generate an inductively coupled plasma used in processing a substrate within a processing chamber of a plasma processing apparatus, wherein the antenna includes planar sections which are formed to face the substrate and generate an induction electric field that contributes to generate the inductively coupled plasma, wherein a plurality of antenna segments having planar portions which form a portion of the planar sections are arranged to constitute the planar sections, wherein the antenna segments are constituted by winding an antenna line in a direction intersecting with the substrate in a longitudinal and spiral pattern. 1. An antenna unit for inductively coupled plasma , comprising:an antenna configured to generate an inductively coupled plasma used in processing a substrate within a processing chamber of a plasma processing apparatus,wherein the antenna includes planar sections which are formed to face the substrate and generate an induction electric field that contributes to generate the inductively coupled plasma,wherein a plurality of antenna segments having planar portions which form a portion of the planar sections are arranged to constitute the planar sections, andwherein the antenna segments are constituted by winding an antenna line in a direction intersecting with the substrate in a longitudinal and spiral pattern.2. The antenna unit of claim 1 , wherein the plurality of antenna segments are arranged so that the planar portions form the planar sections in a ring-like pattern claim 1 , and the plurality of antenna segments constitute a multi-divisional ring-like antenna in which the antenna line has the ring-like shape.3. The antenna unit of claim 2 , wherein a high frequency power is supplied to the antenna so that a current is individually flown to each of the plurality of antenna segments claim 2 , and the current flows to the planar sections as a whole in the ring-like ...

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Номер записи: 26
15-08-2013 дата публикации

DEVICE AND METHOD FOR GENERATING A PLASMA DISCHARGE FOR PATTERNING THE SURFACE OF A SUBSTRATE

Номер: US20130206720A1
Автор: Blom Paulus Petrus Maria, De Haan Hugo Anton Marie, Huijbregts Laurentia Johanna, Huiskamp Tom, Stevens Alquin Alphons Elisabeth, te Sligte Edwin, Van Hijningen Nicolaas Cornelis Josephus, Van Schijndel Antonius Hubertus
Принадлежит: VISION DYNAMICS HOLDING B.V.

Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate. 1. Device for generating a plasma discharge near a substrate for patterning a surface of the substrate , comprisinga first electrode having a first discharge portion and a second electrode having a second discharge portion,a high voltage source for generating a high voltage difference between the first and the second electrode, andpositioning means for positioning the first electrode with respect to the substrate,wherein the device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate.2. Device according to claim 1 , wherein the intermediate structure is formed as a sheet provided with at least one aperture claim 1 , preferably a plurality of apertures claim 1 , for providing therethrough the plasma.3. Device according to claim 1 , wherein the intermediate structure comprises claim 1 , and preferably essentially consists of claim 1 , an electrically non-conductive material.4. Device according to claim 1 , wherein the intermediate structure comprises claim 1 , and preferably essentially consists of claim 1 , an electrically conductive material.5. Device according to claim 2 , wherein the first electrode is elongatedly shaped along an axis that extends through the at least one aperture.6. Device according to claim 1 , wherein the intermediate structure is formed as a ...

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Номер записи: 27
22-08-2013 дата публикации

Atmospheric Pressure Plasma Generating Apparatus

Номер: US20130213575A1
Автор: Choi Chang Duek, Kim Il Wook
Принадлежит:

One embodiment of the present disclosure provides an atmospheric pressure plasma generating apparatus. The apparatus includes an upper electrode having an air permeable inner structure, a lower electrode separated from the upper electrode, and a power source applying voltage to the upper electrode or the lower electrode. The apparatus further includes a plasma generating region placed in a space between the upper electrode and the lower electrode. The upper electrode serves as a passageway using the air permeable inner structure, through which reaction gas is supplied to the plasma generating region from outside. 1. An atmospheric pressure plasma generating apparatus comprising:an upper electrode having an air permeable inner structure;a lower electrode separated from the upper electrode;a power source applying voltage to the upper electrode or the lower electrode; anda plasma generating region placed in a space between the upper electrode and the lower electrode,wherein the upper electrode serves as a passageway using the air permeable inner structure thereof, through which reaction gas is supplied to the plasma generating region from outside.2. The atmospheric pressure plasma generating apparatus of claim 1 , wherein the upper electrode comprises an electric conductor formed of a porous material and the reaction gas is supplied to the plasma generating region after passing through the upper electrode.3. The atmospheric pressure plasma generating apparatus of claim 2 , wherein the upper electrode comprises at least one selected from among carbon claim 2 , graphite claim 2 , copper claim 2 , and aluminum.4. The atmospheric pressure plasma generating apparatus of claim 2 , wherein the upper electrode comprises a surface coating layer of an insulation material on the electric conductor.5. The atmospheric pressure plasma generating apparatus of claim 1 , wherein the upper electrode has a thickness ranging from 0.01 mm to 100 mm and comprises an air permeable inner ...

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Номер записи: 28
22-08-2013 дата публикации

PLASMA LIGHT SOURCE

Номер: US20130214679A1
Автор: Preston Barry
Принадлежит:

A High Frequency light source () has a central body () of fused quartz, with a central void (), filled with a fill () in the void of material excitable by High Frequency energy to form a light emitting plasma. An inner sleeve () of perforate metal shim extends along the length of the central body to within 2.5 mm of its void end to provide a launching gap (). The sleeve has a transverse end portion () extending across the other, inner end of the central body. An outer cylinder of fused quartz () with an internal bore () such as to be a sliding fit with the inner sleeve, itself a sliding fit on the central body. An outer sleeve () of perforate metal, enclosing the outer cylinder and having an end portion () extending across the flush, void ends of the quartz body and cylinder (). The outer sleeve has a skirt () extending past the flush other ends of the quartz elements over an aluminium carrier (), where it is clamped, holding the quartz elements against the carrier. Thus the sleeve forms with, with its end () and the carrier (), a Faraday cage around the quartz and the plasma void (). An antenna () insulated from the carrier extends from it into a bore () in the quartz cylinder () for introducing HF radiation into the coaxial wave guide formed by the inner and outer sleeves (). Their perforation is such as to make them opaque and enclosing to the HF radiation yet light transmissive, whereby light from the plasma can pass through them. The portion of the antenna in the carrier provides a connection to an non-shown source of HF energy. The inner sleeve (), at its end portion (), is earthed to the carrier, in the same way as the outer sleeve and its end portion (). Thus the gap () between the end of the inner sleeve and the end portion of the Faraday cage forms a launching gap for the HF energy to radiate to the plasma void and establish and maintain the plasma there. Light from the plasma passes through the quartz and through the perforations in the sleeves and the ...

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Номер записи: 29
29-08-2013 дата публикации

RADICAL GENERATOR AND MOLECULAR BEAM EPITAXY APPARATUS

Номер: US20130220223A1
Автор: Amano Hiroshi, DEN Shoji, Hori Masaru, Kano Hiroyuki, YAMAKAWA Koji
Принадлежит:

[Object] To provide a radical generator which can produce radicals at higher density. 1. A radical generator comprising:a supply tube for supplying a gas;a plasma-generating tube made of a dielectric material, the plasma-generating tube being connected to the supply tube at the downstream end thereof;a coil winding about the outer circumference of the plasma-generating tube, for generating an inductively coupled plasma in the plasma-generating tube;an electrode which covers the outer wall of the plasma-generating tube and which is disposed between the coil and the supply tube, for generating a capacitively coupled plasma in the plasma-generating tube and adding the capacitively coupled plasma to the inductively coupled plasma; anda parasitic-plasma-preventing tube which is made of a dielectric material, which is connected to the opening of the supply tube proximal to the connection site between the supply tube and the plasma-generating tube, and which covers the inner wall of the supply tube.2. A radical generator according claim 1 , further comprising:a parasitic-plasma-preventing tube which comprising a dielectric material, which is connected to the opening of the supply tube proximal to the connection site between the supply tube and the plasma-generating tube, and which covers the inner wall of the supply tube,wherein the supply tube comprising a conductive material.3. A radical generator according claim 2 , further comprising a plurality of permanent magnets which are disposed along the outer circumference of the zone of the plasma-generating tube where a capacitively coupled plasma is generated and which localize the capacitively coupled plasma to the center of the plasma-generating tube.4. A radical generator according to claim 2 , further comprising a plurality of permanent magnets which are disposed along the outer circumference of the zone of the plasma-generating tube where a capacitively coupled plasma is generated and which localize the capacitively ...

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Номер записи: 30
29-08-2013 дата публикации

Plasma processing device

Номер: US20130220548A1
Автор: Akinori Ebe, Yuichi Setsuhara
Принадлежит: EMD Corp

A plasma processing device has: a metallic vacuum chamber; an antenna-placing section in which a radio-frequency antenna is placed inside a through-hole (hollow space) provided in an upper wall of the vacuum chamber; and a dielectric separating plate covering the entire inner surface of the upper wall. In this plasma processing device, the entire inner surface side of the upper wall is covered with the separating plate so that surfaces in different level otherwise formed when a smaller separating plate is used is not formed between the inner surface and the separating plate. Therefore, the generation of particles caused by the formation of adhered materials on the surfaces in different level is prevented.

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Номер записи: 31
29-08-2013 дата публикации

METHOD AND APPARATUS FOR DETECTING ARC IN PLASMA CHAMBER

Номер: US20130221847A1
Автор: CHOI Sang-Don
Принадлежит: NEW POWER PLASMA CO., LTD.

An apparatus for detecting an arc in a plasma chamber is designed to detect the respective voltage and current values of RF power supplied to the plasma chamber and calculate the ratio of the voltage and current values to accomplish a required control of the supplying of the power. When it is determined that the arc is generated, the apparatus rapidly controls the supplying of the power to prevent damages on the plasma chamber and contaminations on the materials to be processed due to the generation of the arc. 1. An apparatus for detecting an arc in a plasma chamber , comprising:a voltage sensor for detecting a voltage value or a radio frequency (RF) power supplied from a power supply to the plasma chamber;a current sensor for detecting a current value of the RF power;a voltage and current ratio detection circuit for receiving the voltage and current values detected by the voltage sensor and the current sensor to calculate the voltage and current ratio; anda controller for determining whether the arc is generated or not based on the voltage and current ratio calculated in the voltage and current ratio detection circuit.2. The apparatus of claim 1 , wherein claim 1 , when the controller determines that the arc is generated in the plasma chamber claim 1 , it controls to reduce the supplying of the RF power from the power supply.3. The apparatus of claim 1 , wherein claim 1 , when the controller determines that the arc is generated in the plasma chamber claim 1 , it controls to block the supplying of the RF power from the power supply.4. The apparatus of claim 1 , wherein claim 1 , when the controller determines that the arc is generated in the plasma chamber claim 1 , it controls first to reduce the supplying of the RF power from the power supply claim 1 , and then block the supplying of the power.5. The apparatus of claim 1 , which further comprises:a reflected power detector for detecting a reflected power of the RF power supplied from the power supply to the ...

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Номер записи: 32
12-09-2013 дата публикации

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Номер: US20130233828A1
Автор: Kojio Teppei, MATSUMORI Masashi, Nakatsuka Shigeki
Принадлежит:

An atmospheric plasma irradiation unit has a discharge tube for ejecting a primary plasma formed of an inductively coupled plasma of an inert gas and a mixer for generating a secondary plasma formed of a mixed gas plasmanized by collisions of the primary plasma with a mixed gas region of a second inert gas and a reactive gas. The discharge tube and the mixer are included in a plasma head. A moving unit moves the plasma head so that an irradiation area of the secondary plasma to an object is moved on a circular or other-shaped locus. 19-. (canceled)10. A plasma processing apparatus comprising:a holding section for holding an object subject to removal of a copper oxide film;an atmospheric plasma irradiation unit including, an inductively coupled plasma generation section for ejecting a primary plasma formed of an inductively coupled plasma of a first inert gas, and a plasma development section for generating a secondary plasma formed of a mixed gas plasmanized by collisions of the primary plasma with a mixed gas region of a second inert gas and a reactive gas, the atmospheric plasma irradiation unit irradiating the secondary plasma to the object; anda moving section for relatively moving the holding section and the atmospheric plasma irradiation unit so that an irradiation area of the secondary plasma to the object is moved{'sub': '2', 'wherein the first and second inert gases are Ar gas and the reactive gas is Hgas, and'}{'sub': 2', '2, 'wherein an Hconcentration of the mixed gas including the Ar gas, which is the second inert gas, and the Hgas, which is the reactive gas, is not less than 0.5% and not more than 3.0%.'}11. The plasma processing apparatus according to claim 10 , wherein the Hconcentration of the mixed gas is 2.5%.12. The plasma processing apparatus according to claim 10 , wherein the moving section relatively moves the holding section and the atmospheric plasma irradiation unit so that the irradiation area is moved at a constant speed.13. The plasma ...

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Номер записи: 33
26-09-2013 дата публикации

DEVICE AND METHOD FOR GENERATING A PLASMA

Номер: US20130249398A1
Автор: Kühn Silvio
Принадлежит: FORSCHUNGSVERBUND BERLIN E.V.

A device () for generating a plasma that comprises a plasma source () designed as a hollow space and a resonator () that includes a waveguide () and the plasma source (), wherein the waveguide () is operatively connected with the plasma source (); the device further comprising a first coupling means () for energy introduction () and a second coupling means () for energy extraction (), wherein each coupling means () is in an energy- and signal-carrying () operative connection with the waveguide; the device further comprising an active element () for energy supply to the resonator (), operatively connected with the first () and the second () coupling means, wherein the plasma source () is at least partially integrated into a section of the waveguide () that extends between the first coupling means () and the second coupling means (). 2. The device according to claim 1 , wherein:the plasma source is completely integrated into a section of the waveguide that extends between the first coupling means and the second coupling means.3. The device according to claim 1 , wherein:the waveguide extends continuously between the first coupling means and the second coupling means and that the plasma source is positioned in this continuously extending section of the waveguide.4. The device according to claim 1 , wherein:the resonator is a microwave resonator.5200. The device () according to claim 1 , wherein:the plasma source is designed as a hollow space with an opening for gas inlet and gas outlet.6. The device according to claim 4 , wherein:the plasma source comprises a waveguide tube with a longitudinal axis that extends perpendicular to the direction of propagation of the microwaves inside the microwave resonator.7. The device according to claim 1 , wherein:the active element includes a transistor.8. The device according to claim 1 , wherein:the waveguide includes an electrical conductor, and the electrical conductor directly contacts the first coupling means and/or directly ...

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Номер записи: 34
26-09-2013 дата публикации

Plasma Processing Apparatus

Номер: US20130249399A1
Автор: Chen Jinyuan, Dong Jiawei, Song Xiaohong, Yang Feiyun, Yu Lei
Принадлежит:

The present invention provides a plasma processing apparatus. The apparatus includes a vacuum chamber, a plasma reactor arranged in the vacuum chamber for plasma processing, an RF power source for providing RF signals to the plasma reactor and an RF power transmission unit for transmitting RF signals from the RF power source to the plasma reactor inside the vacuum chamber. The RF power transmission unit includes a transmission line for transmitting RF signals and an outer conductor for shielding the electromagnetic field around the transmission line. The invention can effectively avoid the problem of electric discharge when RF signals transmit in a vacuum chamber, resulting in more security and less transmission power loss. 1. A plasma processing apparatus , comprising:a vacuum chamber;a plasma reactor arranged in the vacuum chamber for plasma processing;a radio-frequency (RF) power source for providing RF signals for the plasma reactor; andan RF power transmission unit for transmitting the RF signals from the RF power source to the plasma reactor inside the vacuum chamber, wherein the RF power transmission unit comprises a transmission line for transmitting the RF signals and an outer conductor for shielding the electromagnetic field around the transmission line.2. The plasma processing apparatus as claimed in claim 1 , wherein the outer conductor is a conduit claim 1 , a conductive foil or a metal cover.3. The plasma processing apparatus as claimed in claim 2 , wherein the vacuum chamber is provided with an inner wall claim 2 , the plasma reactor is provided with an outer wall claim 2 , and one end of the outer conductor is connected to the inner wall of the vacuum chamber claim 2 , while the other end of the outer conductor is connected to the outer wall of the plasma reactor.4. The plasma processing apparatus as claimed in claim 3 , wherein both the outer wall of the plasma reactor and the inner wall of the vacuum chamber are conductive claim 3 , and the outer ...

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Номер записи: 35
03-10-2013 дата публикации

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Номер: US20130256270A1
Автор: AZUMANO Hidehito, Demura Kensuke, KARYU Makoto, KASE Yoshihisa, MOTOKAWA TAKEHARU, OOIWA Tokuhisa, YOSHIMORI Tomoaki
Принадлежит:

According to one embodiment, a plasma processing apparatus includes: a processing chamber; a decompression section configured to decompress inside of the processing chamber; a member including a control section to be inserted into a depression provided on mounting side of a workpiece, the control section being configured to thereby control at least one of in-plane distribution of capacitance of a region including the workpiece and in-plane distribution of temperature of the workpiece; a mounting section provided inside the processing chamber; a plasma generating section configured to supply electromagnetic energy to a region for generating a plasma for performing plasma processing on the workpiece; and a gas supply section configured to supply a process gas to the region for generating a plasma. The control section performs control so that at least one of the in-plane distribution of capacitance and the in-plane distribution of temperature is made uniform. 1. A plasma processing apparatus comprising:a processing chamber capable of maintaining an atmosphere decompressed to a pressure lower than atmospheric pressure;a decompression section configured to decompress inside of the processing chamber to a prescribed pressure;a member including a control section to be inserted into a depression provided on mounting side of a workpiece, the control section being configured to thereby control at least one of in-plane distribution of capacitance of a region including the workpiece and in-plane distribution of temperature of the workpiece;a mounting section provided inside the processing chamber and configured to mount or fix the member on an upper surface thereof;a plasma generating section configured to supply electromagnetic energy to a region for generating a plasma for performing plasma processing on the workpiece; anda gas supply section configured to supply a process gas to the region for generating a plasma,the control section performing control so that at least one of ...

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Номер записи: 36
03-10-2013 дата публикации

HYBRID ENERGY CONVERSION DEVICE

Номер: US20130257156A1
Автор: Hadimani Magundappa L. (Ravi), Prekas Kleanthis, Siores Elias, Vatansever Derman
Принадлежит: UNIVERSITY OF BOLTON

A piezoelectric-photovoltaic hybrid structure is described, having a plurality of superposed layers including a photo voltaic layer and a piezoelectric substrate. A method of forming such a structure is also described, including the steps of providing a piezoelectric substrate and superposing a photovoltaic layer over the substrate. A power conversion system is described, comprising such a hybrid structure with a first circuit connected to the piezoelectric substrate and a second circuit connected to the photovoltaic layer. Also discussed is a method of generating, storing, distributing, or consuming electrical energy, involving the use of such a system in connection with a distribution circuit or network, electrical load, or energy storage device. A further power conversion system is described where the piezoelectric and photovoltaic circuits are connected to a single, or a respective, DC-DC converter. A set of such power conversion systems may be connected in series at their output terminals. 1. A piezoelectric-photovoltaic structure for converting solar and mechanical energy into electrical energy , the structure having a plurality of superposed layers including a photovoltaic layer and a piezoelectric substrate comprising a polymer.2. A piezoelectric-photovoltaic structure according to wherein the piezoelectric substrate is interposed between a top electrode and a bottom electrode.3. A piezoelectric-photovoltaic structure according to claim 1 , wherein the photovoltaic layer is interposed between an outer anode layer and an inner cathode layer.4. A piezoelectric-photovoltaic structure according to wherein the anode and cathode layers are metallic claim 3 , the anode layer having a higher work function than the cathode layer.56-. (canceled)7. A piezoelectric-photovoltaic structure according to wherein an insulating layer separates the piezoelectric substrate from the photovoltaic layer claim 3 , cathode and anode.8. A piezoelectric-photovoltaic structure ...

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Номер записи: 37
10-10-2013 дата публикации

Plasma processing apparatus

Номер: US20130264014A1
Автор: Hachishiro Iizuka
Принадлежит: Tokyo Electron Ltd

A plasma processing apparatus includes an ICP antenna, provided outside a processing chamber opposite to a mounting table, for supplying a high frequency power supply into the processing chamber, and a window member made of a conductor, disposed between the mounting table and the ICP antenna, forming a part of a wall of the processing chamber. The window member includes transmission units for transmitting the high frequency power in a thickness direction of the window member. Each of transmission units has a slit, which extends through the window member in the thickness direction and is configured such that its width is changeable.

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Номер записи: 38
17-10-2013 дата публикации

HIGH DENSITY MICROWAVE PLASMA GENERATION APPARATUS, AND MAGNETRON SPUTTERING DEPOSITION SYSTEM USING THE SAME

Номер: US20130270110A1
Автор: Sasai Kensuke, TOYODA Hirotaka
Принадлежит:

A microwave plasma generation apparatus () includes: a rectangular waveguide () that transmits a microwave; a slot antenna () that has a slot () through Which the microwave passes; and a dielectric portion () that is arranged so as to cover the slot () and of which a plasma generating region-side front face is parallel to an incident direction in which the microwave enters from the slot (). The microwave plasma generation :apparatus () is able to generate microwave plasma (P) under a low pressure of lower than or equal to 1 Pa. A magnetron sputtering deposition system () includes the microwave plasma generation apparatus (), and carries out film deposition using magnetron plasma. (P) while radiating microwave plasma (P) between a base material () and a target (). With the magnetron sputtering deposition system (), it is possible to form a thin film having small asperities on its surface. 1. A microwave plasma generation apparatus that generates microwave plasma in a vacuum casing , characterized by comprising:a rectangular waveguide that transmits a microwave;a slot antenna that is arranged at one face of the rectangular waveguide and that has a slot through which the microwave passes; anda dielectric portion that is arranged so as to cover the slot of the slot antenna and of which a plasma generating region-side front face is parallel to an incident direction in which the microwave enters from the slot.2. The microwave plasma generation apparatus according to claim 1 , wherein the microwave plasma generation apparatus is able to generate the microwave plasma under a pressure of higher than or equal to 0.5 Pa and lower than or equal to 100 Pa.3. The microwave plasma generation apparatus according to claim 1 , further comprising:a support plate that is arranged on a back face of the dielectric portion and that supports the dielectric portion; anda permanent magnet that is arranged on a back face of the support plate and that forms a magnetic field in the plasma ...

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Номер записи: 39
17-10-2013 дата публикации

LOW ELECTRON TEMPERATURE, EDGE-DENSITY ENHANCED, SURFACE WAVE PLASMA (SWP) PROCESSING METHOD AND APPARATUS

Номер: US20130270997A1
Автор: CHEN Lee, FUNK Merritt, Sundararajan Radha, Zhao Jianping
Принадлежит:

A surface wave plasma (SWP) source couples microwave (MW) energy into a processing chamber through, for example, a radial line slot antenna, to result in a low mean electron energy (T). An ICP source, is provided between the SWP source and the substrate and is energized at a low power, less than 100 watts for 300 mm wafers, for example, at about 25 watts. The ICP source couples energy through a peripheral electric dipole coil to reduce capacitive coupling. 1. A method of enhancing plasma uniformity at a wafer surface without increasing electron temperature plasma in the vacuum processing of a substrate with a plasma source having a tendency to produce a center-dense plasma over the substrate , comprising:supporting a substrate for processing at one end of a vacuum processing chamber with a surface thereof facing a processing volume in the chamber;coupling energy into the processing space within the chamber from a primary plasma source at an end of the chamber opposite the substrate;inductively coupling RF energy from an antenna around the perimeter of the chamber at a low power level of less than 100 watts where the substrate has a diameter of 300 millimeters or less and of less than 300 watts where the substrate has a diameter of more than 300 millimeters.2. The method of wherein:the primary source is a surface wave plasma source;the coupled energy is microwave energy coupled into the processing space from a radial line slotted antenna of the surface wave launcher or from any microwave surface wave coupling mechanism.3. The method of wherein:the primary source is a surface wave plasma source;the coupled energy is microwave energy coupled into the processing space from a surface wave launcher.4. The method of wherein:the antenna around the perimeter from which the RF energy is inductively coupled is a multiple winding coil, and the RF energy is inductively coupled therefrom and through a Faraday shield into the chamber at the periphery thereof.5. The method of ...

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Номер записи: 40
24-10-2013 дата публикации

Multi discharging tube plasma reactor

Номер: US20130278135A1
Автор: Dai-Kyu CHOI
Принадлежит: Dai-Kyu CHOI

A plasma reactor having multi discharging tubes is disclosed, through which activated gas containing ion, free radical, atom and molecule is generated through plasma discharging, and different process gases are injected into multi discharging tubes in which solid, power and gas, etc., are plasma-treated with the activated gas to perform processes including cleaning process for semiconductor, and a plasma state can be maintained even at low power.

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Номер записи: 41
24-10-2013 дата публикации

ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE

Номер: US20130278136A1
Автор: Lee Yong Kwan
Принадлежит: SEMES CO., LTD.

An antenna structure includes four induction antennas which have the same structure, are connected in parallel and are disposed to be overlapped. The induction antennas include an external upper section arranged on a first quadrant of a first layer, an internal upper section connected to the external upper section and arranged on a second quadrant of the first layer, an internal lower section connected to the internal upper section and arranged on a third quadrant of a second layer arranged on a lower part of the first layer, and an external lower section connected to the internal lower section and arranged on a fourth quadrant of the second layer. An RF power is supplied to one end of the external upper section, and the other end of the external lower section is grounded. 1. An antenna structure for plasma generation , comprising:four induction antennas which have the same structure, are connected in parallel with one another, and are disposed to be overlapped,wherein the induction antennas comprises:an external upper section disposed on a first quadrant of a first layer;an internal upper section connected to the external upper section and disposed on a second quadrant of the first layer;an internal lower section connected to the internal upper section and disposed on a third quadrant of a second layer disposed at a lower part of the first layer; andan external lower section connected to the internal lower section and disposed on a fourth quadrant of the second layer,wherein one ends of the external upper sections are supplied with an RF power and the other ends of the external lower sections are grounded.2. The antenna structure of claim 1 , further comprising:an upper branch connecting the other end of the external upper section and one end of the internal upper section;a vertical branch connecting the other end of the internal upper section and one end of the internal lower section; anda lower branch connecting the other end of the internal lower section and one ...

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Номер записи: 42
24-10-2013 дата публикации

ELECTRODELESS PLASMA LAMP UTILIZING ACOUSTIC MODULATION

Номер: US20130278140A1
Автор: DeVincentis Marc, Hafidi Abdeslam, Lapatovich Walter P., Mudunuri Sandeep
Принадлежит: Luxim Corporation

An electrodeless plasma lamp is described that employs acoustic resonance. The plasma lamp includes a metal enclosure having a conductive boundary forming a resonant structure, and a radio frequency (RF) feed to couple RF power from an RF power source into the resonant cavity. A bulb is received at least partially within an opening in the metal enclosure. The bulb contains a fill that forms a light emitting plasma when the power is coupled to the fill. The RF power source includes a controller to modulate the RF power to induce acoustic resonance in the plasma. 1. An electrodeless plasma lamp comprising:a metal enclosure having a conductive boundary forming a resonant structure;a radio frequency (RF) feed to couple RF power from an RF power source into the resonant cavity;a bulb containing a fill that forms a light emitting plasma when the power is coupled to the fill, the bulb being received at least partially within an opening in the metal enclosure; anda controller to modulate the RF power to induce acoustic resonance in the plasma.2. The plasma lamp of claim 1 , wherein the controller modulates the power to excite at least one acoustic resonance mode in a plasma arc formed by the plasma.3. The plasma lamp of claim 2 , wherein the acoustic resonance modifies a position of the plasma arc claim 2 , the plasma arc being position closer to an exposed bulb wall when the RF power is modulated than when the RF is not modulated.4. The plasma lamp of claim 2 , wherein the acoustic resonance modifies a temperature profile of the plasma arc.5. The plasma lamp of claim 1 , wherein the fill includes metallic mercury in combination with one or more metal halide salts selected from the group consisting of TmX claim 1 , HoX claim 1 , DyX claim 1 , CeX claim 1 , and InX claim 1 , where the X=chlorine claim 1 , bromine or iodine.6. The plasma lamp of claim 1 , wherein the fill includes an inert starting gas selected from the group consisting of Ar claim 1 , Kr and Xe.7. The plasma ...

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Номер записи: 43
31-10-2013 дата публикации

INDEPENDENT CONTROL OF RF PHASES OF SEPARATE COILS OF AN INDUCTIVELY COUPLED PLASMA REACTOR

Номер: US20130284370A1
Автор: Collins Kenneth S., Kobayashi Satoru, Liu Jonathan, Ramaswamy Kartik, Rauf Shahid, Wong Lawrence, Yang Yang
Принадлежит:

Plasma distribution is controlled in a plasma reactor by controlling the phase differences between different RF coil antennas, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop. 1. A plasma reactor for processing a workpiece/ comprising:a vacuum chamber comprising a ceiling and a side wall, a workpiece support pedestal in said chamber having a workpiece support surface, and plural coil antennas;plural impedance matches and plural RF power amplifiers coupled to respective ones of said plural coil antennas through respective ones of said plural impedance matches, one of said plural RF amplifiers being a reference RF amplifier;a clock signal source coupled to said reference RF power amplifier, and respective phase shifters coupled between said clock signal source and at least respective ones of the RF power amplifiers other than said reference RF amplifier, each said phase shifter having a phase shifter control input;plural RF sensor probes coupled or adjacent respective ones of said plural RF coil antennas, one of said RF sensor probes being a reference RF sensor probe;respective phase detectors each having a phase detector output and a respective pair of phase detector inputs, one of said phase detector inputs being coupled to a respective ones of said plural RF sensor probes other than the reference RF sensor probe, the other one of said phase detector inputs of each of said plural RF sensor probes being coupled to said reference RE sensor probe;a user interface having respective user interface outputs defining a user-selected phase difference between said reference RF sensor probe and a respective one of the remaining RF sensor probes; anda feedback controller stage coupled to (a) respective ones of said phase detector outputs and (b) respective ones of said user interface outputs, said feedback controller further comprising respective controller outputs coupled to respective ones of said phase shifter control ...

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Номер записи: 44
07-11-2013 дата публикации

Capacitively coupled plasma source with rf coupled grounded electrode

Номер: US20130292057A1
Автор: Kartik Ramaswamy, Steven Lane
Принадлежит: Applied Materials Inc

An overhead RF coupling chamber couples RF power to a ceiling electrode of a plasma reactor chamber, the RF coupling chamber having a resonant annular volume defined by coaxial cylindrical conductors, one of which is coupled to an RF power source, the chamber ceiling having an annular gap around the electrode, and the resonant annular volume being aligned with the annular gap so that the resonant annular volume opens into the interior of the main chamber, thereby enhancing the electrical length of the RF coupling chamber.

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Номер записи: 45
14-11-2013 дата публикации

APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT

Номер: US20130302992A1
Автор: Matsumoto Naoki, Mihara Naoki, Moyama Kazuki, NOZAWA Toshihisa, Sasaki Masaru, TIAN Caizhong, Yoshikawa Jun
Принадлежит: TOKYO ELECTRON LIMITED

An apparatus for plasma treatment contains a process vessel provided with a mounting table for mounting a substrate, a first gas supplying unit configured to supply a first gas into the process vessel, a first plasma generating unit configured to convert at least a part of the first gas to a first plasma, a second gas supplying unit configured to supply a second gas into the process vessel, and a second plasma generating unit configured to convert at least a part of the second gas to a second plasma. A height of ea an inlet of the second gas from the mounting table is lower than a height of an inlet of the first gas from the mounting table. 1. An apparatus for plasma treatment comprising:a process vessel provided with a mounting table for mounting a substrate;a first gas supplying unit configured to supply a first gas into the process vessel;a first plasma generating unit configured to convert at least a part of the first gas to a first plasma;a second gas supplying unit configured to supply a second gas into the process vessel; anda second plasma generating unit configured to convert at least a part of the second gas to a second plasma;wherein a height of an inlet of the second gas from the mounting table is lower than a height of an inlet of the first gas from the mounting table.2. The apparatus of claim 1 , wherein the second plasma generating unit converts at least a part of the second gas to the second plasma immediately after the second gas enters the process vessel.3. The apparatus of claim 1 , wherein the inlet of the second gas is located on a side wall of the process vessel.4. The apparatus of claim 1 , wherein the first plasma generating unit and the second plasma generating unit are separated from each other.5. The apparatus of claim 1 , wherein the first plasma generating unit comprises a first mechanism configured to generate a first microwave claim 1 , the second plasma generating unit comprises a second mechanism configured to generate a second ...

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Номер записи: 46
28-11-2013 дата публикации

Electrical charger for charging rechargeable power tools

Номер: US20130314055A1
Автор: Benjamin Luke Van Der Linde, David Leigh Scrimshaw, Paul Davies, Paul Francis Connor, Paul Miller
Принадлежит: DEMAIN TECHNOLOGY PTY LTD

A capacitor-based (supercapacitor, ultracapacitor or pseudocapacitor) electrical charger, rechargeable device and energy storage pack for use with a rechargeable power tool. The rechargeable device includes a storage capacitor. The electrical charger includes a supply capacitor electrically connected to an electrical contact, the supply capacitor being charged when the electrical charger is connected to a power source. While in use, any charge in the supply capacitor is rapidly distributed between the supply capacitor and the storage capacitor when the rechargeable device is mounted in the receiver of the electrical charger. The electrical charger includes a safety interlock switch which only supplies power to the electrical contact of the charger after electrical terminal of the rechargeable device have engaged the electrical contact.

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Номер записи: 47
05-12-2013 дата публикации

Mobile Starting Device

Номер: US20130320764A1
Автор: Zeller Armin
Принадлежит:

A mobile energy supply device for an electric starter for starting an internal combustion engine has an internal battery and at least one capacitor that is connectible in parallel to the internal battery. 110-. (canceled)11. A mobile energy supply device for an electric starter for starting an internal combustion engine , comprising:a battery; andat least one capacitor connectible in parallel to the battery.12. The mobile energy supply device of claim 11 , wherein at least one capacitor is configured as a multilayer capacitor or an ultracap capacitor.13. The mobile energy supply device of claim 11 , wherein the energy supply device has multiple capacitors claim 11 , which are arranged in multiple capacitor blocks.14. The mobile energy supply device of claim 13 , wherein the individual capacitor blocks are connectable and disconnectable in a targeted manner.15. The mobile energy supply device of claim 11 , wherein the energy supply device has a charger claim 11 , which is configured for charging the battery.16. The mobile energy supply device of claim 11 , further comprising:a resistor, which is connectible to the capacitors so that the capacitors are discharged via the resistor.17. The mobile energy supply device of claim 11 , further comprising:a protection against polarity reversal, which is configured so as to at least one of interrupt a current flow and output an acoustic/visual warning signal if the mobile energy supply device is connected to the electric starter in reverse polarity.18. The mobile energy supply device of claim 11 , further comprising:an electronic control circuit configured to control and monitor the operation of the energy supply device.19. A method for operating an electric starter for starting an internal combustion engine claim 11 , the method comprising:connecting a battery to the electric starter;connecting at least one capacitor to the battery to charge the capacitor; andconnecting the capacitor and the battery to the electric starter to ...

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Номер записи: 48
05-12-2013 дата публикации

ELECTRIC STORAGE SYSTEM

Номер: US20130320766A1
Автор: Ishishita Teruo, Kaita Keiji
Принадлежит: TOYOTA JIDOSHA KABUSHIKI KAISHA

An electric storage system includes an electric storage apparatus, relays, a plurality of smoothing capacitors, and a current limiting resistance. The electric storage apparatus has a plurality of electric storage elements connected in series. Each of the electric storage elements includes a current breaker breaking an electric current path inside the electric storage element. The plurality of smoothing capacitors are connected in series between a positive electrode line and a negative electrode line which connect the electric storage apparatus to a load. Each of the relays is placed on the positive electrode line, the negative electrode line, and an intermediate line. The intermediate line connects a connecting point of two of the electric storage elements included in the electric storage apparatus and a connecting point of the plurality of smoothing capacitors. The current limiting resistance is also placed on the intermediate line. 1. An electric storage system comprising:an electric storage apparatus having a plurality of electric storage elements connected in series, each of the electric storage elements including a current breaker breaking an internal electric current path;a relay placed on each of a positive electrode line and a negative electrode line, the lines connecting the electric storage apparatus to a load;a plurality of smoothing capacitors connected in series between the positive electrode line and the negative electrode line; anda relay and a current limiting resistance each placed on an intermediate line connecting a connecting point of two of the electric storage elements included in the electric storage apparatus and a connecting point of the plurality of smoothing capacitors.2. The electric storage system according to claim 1 , wherein the electric storage apparatus is divided into a first group and a second group claim 1 , the groups including substantially equal numbers of electric storage elements claim 1 , andthe intermediate line is ...

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Номер записи: 49
05-12-2013 дата публикации

PHASE DIFFERENCE DETECTOR, PHASE DIFFERENCE DETECTION PROGRAM, AND PLASMA PROCESSING SYSTEM USING THE PHASE DIFFERENCE DETECTOR

Номер: US20130320852A1
Автор: KASAI Yoshinobu, KITANO Toyokazu, YOSHIZAKO Yuji
Принадлежит:

A phase difference detector detects the phase difference between two AC signals at a high speed and with high accuracy. A phase difference computation unit computes the phase difference φ(=φ−φ) between two detected voltages v(phase angle: φ) and v(phase angle: φ). The phase difference computation unit uses a sine wave vand a cosine wave vgenerated separately and having the same frequency as the fundamental frequency of the voltages vand v, to perform computation of v=v×v, v=v×v, v=v×v, v=v×v, and then extracts DC components I=(−A/2)·sin(φ), R=(A/2)·cos(φ), I=(−A/2)·sin(φ), R=(A/2)·cos(φ) at low-pass filters. The phase difference computation unit computes R=R×R+I×Iat a complex multiplying unit to obtain R=(A·A/4)·cos(φ), computes I=R×I−R×Ito obtain I=(A·A/4)·sin(φ), and computes φ=tan(I/R) at the arctangent calculation unit, thereby obtaining the phase difference φ. 1. A phase difference detector for detecting a phase difference between a first AC signal and a second AC signal having a same frequency as a fundamental frequency of the first AC signal , the detector comprising:a sine wave generator that generates a sine wave signal having the same frequency as the fundamental frequency;a cosine wave generator that generates a cosine wave signal having the same frequency as the fundamental frequency;a first signal multiplier that multiplies the first AC signal and the sine wave signal;a second signal multiplier that multiplies the first AC signal and the cosine wave signal;a third signal multiplier that multiplies the second AC signal and the sine wave signal;a fourth signal multiplier that multiplies the second AC signal and the cosine wave signal;a DC component extraction unit that extracts four DC components by removing an AC component from a result of multiplication in each of the first through the fourth signal multipliers;a trigonometric function computation unit that obtains a sine value and a cosine value of the phase difference by a computation using the four ...

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Номер записи: 50
12-12-2013 дата публикации

MICROWAVE ICP RESONATOR

Номер: US20130328483A1
Автор: Gesche Roland, Kühn Silvio, Porteanu Horia-Eugen
Принадлежит: FORSCHUNGSVERBUND BERLIN E.V.

A microwave resonator for inductively generating a plasma () is introduced. The microwave resonator comprises a first tube () and a conductive, preferably metal, plate (). The tube () is designed for connection to a supply device for a process gas and for conveying the process gas and comprises a dielectric material. The conductive plate () has a first, preferably cylindrical, hole (), which extends from a first opening on a first side of the conductive plate () to a second opening on a second side, opposite the first side, of the conductive plate (). The first tube () is arranged in the first hole (). The conductive plate () also has a first slit (), which is open towards the first and the second side of the conductive plate () and towards the first hole (). 1. A microwave resonator for inductively generating a plasma , which microwave resonator comprises a first tube , which is designed for connection to a supply device for a process gas and for conveying the process gas and comprises a dielectric material , wherein a conductive , preferably metal , plate , which has a first , preferably cylindrical , hole , which extends from a first opening on a first side of the conductive plate to a second opening on a second side , opposite the first side , of the conductive plate and in which the first tube is arranged , and a first slit , wherein the first slit is open towards the first and the second side of the conductive plate and towards the first hole.2. The microwave resonator according to claim 1 , wherein the first slit is also open towards a first edge surface of the conductive plate.3. The microwave resonator according to claim 1 , including a second claim 1 , preferably cylindrical claim 1 , hole claim 1 , which extends from a third opening on the first side of the conductive plate to a fourth opening on the second side of the conductive plate claim 1 , wherein the first slit is open towards the second hole.4. The microwave resonator according to claim 3 , ...

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Номер записи: 51
19-12-2013 дата публикации

INTEGRATED STEERABILITY ARRAY ARRANGEMENT FOR MINIMIZING NON-UNIFORMITY AND METHODS THEREOF

Номер: US20130334171A1
Автор: Benjamin Neil
Принадлежит:

A method for providing steerability in a plasma processing environment during substrate processing is provided. The method includes managing power distribution by controlling power being delivered into the plasma processing environment through an array of electrical elements. The method also includes directing gas flow during substrate processing by controlling the amount of gas flowing through an array of gas injectors into the plasma processing environment, wherein individual ones of the array of gas injectors are interspersed between the array of electrical elements. The method further includes controlling gas exhausting during substrate processing by managing amount of gas exhaust being removed by an array of pumps, wherein the array of electrical elements, the array of gas injectors, and the array of pumps are arranged to create a plurality of plasma regions, each plasma region being substantially similar, thereby creating a uniform plasma region across the substrate. 113-. (canceled)14. A method for providing steerability in a plasma processing environment during processing of a substrate , comprising:managing power distribution during said processing of said substrate by controlling power being delivered, into said plasma processing environment through an array of electrical elements;directing gas flow during said processing of said substrate, said directing including controlling amount of gas flowing through an array of gas injectors into said plasma processing environment, individual ones of said array of gas injectors being interspersed between said array of electrical elements; andcontrolling gas exhausting during said processing of said substrate by managing amount of gas exhaust being removed by an array of pumps, wherein said array of electrical elements, said array of gas injectors, and said array of pumps are arranged to create a plurality of plasma regions, each plasma region of said plurality of plasma regions being substantially similar, thereby ...

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Номер записи: 52
09-01-2014 дата публикации

PLASMA GENERATION DEVICE, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Номер: US20140008326A1
Автор: Hori Masaru, Itoh Hitoshi, Kubota Yusuke, Miyoshi Hidenori, Sekine Makoto, Takeda Keigo, TOYODA Hirotaka
Принадлежит:

A plasma generation device has a microwave generation device which generates microwave, a waveguide tube having hollow interior and connected to the microwave device such that the tube has longitudinal direction in transmission direction of microwave and rectangular cross section in direction orthogonal to the transmission direction, a phase-shifting device which cyclically shifts phase of standing wave generated in the tube by microwave, and a gas supply device which supplies processing gas into the tube. The tube has antenna portion having one or more slot holes which release plasma generated by microwave to the outside, the slot hole is formed on wall forming short or long side of the antenna portion, and the tube plasmatizes the gas in atmospheric pressure state supplied into the tube by the microwave in the slot hole and releases the plasma to the outside from the slot hole. 1. A plasma generation device , comprising:a microwave generation device configured to generate a microwave;a waveguide tube having a hollow interior space and connected to the microwave generation device such that the waveguide tube has a longitudinal direction in a transmission direction of the microwave and a rectangular cross section in a direction orthogonal to the transmission direction;a phase-shifting device configured to cyclically shift a phase of a standing wave generated in the interior space of the waveguide tube by the microwave; anda gas supply device connected to the waveguide tube and configured to supply a processing gas into the interior space of the waveguide tube,wherein the waveguide tube has an antenna portion having at least one slot hole configured to release plasma generated by the microwave to outside the waveguide tube, the slot hole is formed on a wall forming a short side or a long side of the antenna portion, and the waveguide tube is configured to plasmatize the processing gas in an atmospheric pressure state supplied into the interior space of the waveguide ...

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Номер записи: 53
09-01-2014 дата публикации

Adjustment of Power and Frequency Based on Three or More States

Номер: US20140009073A1
Автор: JR. John C., Lyndaker Bradford J., Valcore
Принадлежит: LAM RESEARCH CORPORATION

Systems and methods for adjusting power and frequency based on three or more states are described. One of the methods includes receiving a pulsed signal having multiple states. The pulsed signal is received by multiple radio frequency (RF) generators. When the pulsed signal having a first state is received, an RF signal having a pre-set power level is generated by a first RF generator and an RF signal having a pre-set power level is generated by a second RF generator. Moreover, when the pulsed signal having a second state is received, RF signals having pre-set power levels are generated by the first and second RF generators. Furthermore, when the pulsed signal having a third state is received, RF signals having pre-set power levels are generated by the first and second RF generators. 1. A plasma processing system , comprising ,a primary generator including three primary power controllers, each of the primary power controllers configured with a predefined power setting;a secondary generator including three secondary power controllers, each of the secondary power controllers configured with a predefined power setting; anda control circuit interfaced as an input to each of the primary and secondary generators, the control circuit configured to generate a pulsed signal, the pulsed signal defined to include three states that define a cycle that repeats during operation for a plurality of cycles, each state defined to select a first, or a second, or a third of the three primary power controllers while also selecting a first, or a second, or a third of the three secondary power controllers.2. The plasma processing system of claim 1 , wherein the primary generator includes three primary auto frequency tuners (AFTs) claim 1 , each of the primary AFTs configured with a predefined frequency setting claim 1 , wherein the secondary generator includes three secondary AFTs claim 1 , each of the secondary AFTs configured with a predefined frequency setting claim 1 , each state ...

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Номер записи: 54
23-01-2014 дата публикации

SUBSTRATE PROCESSING APPARATUS

Номер: US20140020833A1
Автор: Hasegawa Masami, Osada Tomoaki, Yoshida Tatsuhiko
Принадлежит: CANON ANELVA CORPORATION

A substrate processing apparatus for processing a substrate with plasma including: a container including a first container member that forms a processing space in which the substrate is processed, and a second container member that forms a plasma generation space in which plasma is generated a gas introduction unit for introducing gas into the container; a plasma generation unit including an antenna that is provided in an external space of the container and configured to excite the gas in the plasma generation space with an electric field that is generated by a high-frequency voltage fed from a power supply; and a substrate holding unit that is capable of holding the substrate. A coating film that contains a semiconductor material is formed on a surface of the second container member that is arranged close to the antenna. 1. A substrate processing apparatus for processing a substrate with plasma , comprising:a container including a first container member that forms a processing space in which the substrate is processed, and a second container member that forms a plasma generation space in which plasma is generated and that is in communication with the processing space in a state in which the second container member is mounted on the first container member;a gas introduction unit for introducing gas into the container;a plasma generation unit including an antenna that is configured to excite the gas in the plasma generation space with an electric field that is generated by a high-frequency voltage fed from a power supply; anda substrate holding unit that is capable of holding the substrate in the processing space;wherein the container separates the processing space and the plasma generation space from an external space having an atmospheric pressure,the antenna is arranged in the external space so as to be close to the second container member, anda coating film that contains a semiconductor material and is exposed to the external space is formed on a surface of the ...

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Номер записи: 55
23-01-2014 дата публикации

INDUCTIVELY COUPLED PLASMA SOURCE WITH PLURAL TOP COILS OVER A CEILING AND AN INDEPENDENT SIDE COIL

Номер: US20140020836A1
Автор: Agarwal Ankur, BALAKRISHNA AJIT, BUCHBERGER, Carducci James D., Collins Kenneth S., Dorf Leonid, FOVELL RICHARD, JR. DOUGLAS A., KENNEY JASON A., NGUYEN ANDREW, Ramaswamy Kartik, Rauf Shahid
Принадлежит:

A plasma reactor for processing a workplace includes a reactor chamber having a ceiling and a sidewali and a workplace support facing the ceiling and defining a processing region, and a pair of concentric independently excited RF coil antennas overlying the ceiling and a side RF coil concentric with the side wall and facing the side wall below the ceiling, and being excited independently. 1. A plasma reactor comprising:an axially symmetrical side wall, a ceiling overlying said side wall and a workplace support, said side wall, said ceiling and said workpiece support defining a processing region;an inner coil antenna disposed on an external side of said ceiling and overlying a first radial zone of said processing region;a middle coil antenna surrounding said inner coil antenna and disposed on said external side of said ceiling and overlying a second radial zone of said processing region surrounding said first radial zone; andan outer coil antenna below a plane of said ceiling and surrounding said side wall.2. The plasma reactor of wherein said inner claim 1 , middle and outer coil antennas are coupled to receive RF power.3. The plasma reactor of wherein said side wall claim 1 , said inner coil antenna claim 1 , said middle coil antenna and said outer coil antenna are coaxial.4. The plasma reactor of further comprising an exhaust chamber assembly claim 3 , said exhaust chamber assembly comprising:an exhaust chamber wall defining an evacuation region at a side of said workpiece support opposite said processing region, said exhaust chamber assembly having an exhaust pump port symmetrically located relative to said axis of symmetry;plural axial exhaust passages between said processing region and said evacuation region, and symmetrically distributed with respect to said axis of symmetry.5. The plasma reactor of further comprising a lift mechanism coupled to said workpiece support.6. The plasma reactor of wherein:said ceiling comprises a disk-shaped dielectric window ...

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Номер записи: 56
23-01-2014 дата публикации

ASSEMBLED CELL CONTROL SYSTEM AND POWER SUPPLY SYSTEM COMPRISING SAME

Номер: US20140021924A1
Автор: Abe Takayoshi, Iwasaki Toshiya, YAMAGUCHI Masao
Принадлежит: SANYO ELECTRIC CO., LTD.

An assembled battery control system is provided with an assembled battery composed of a plurality of rechargeable battery packs connected in series, and a control unit for controlling the assembled battery. Each battery pack has a discharge unit. The control unit confirms the open-circuit voltage of each battery pack in the assembled battery after the assembled battery has been fully charged, determines a target voltage on the basis of the open-circuit voltage confirmation results for each battery pack in the assembled battery, causes the discharge unit to discharge each battery pack in the assembled battery that has an open-circuit voltage greater than the target voltage until the open-circuit voltage of each of said battery packs reaches the target voltage, fully charges the assembled battery again, discharges the assembled battery until a first predetermined level has been reached, and learns the capacity of each battery pack in the assembled battery. 1. A control system for an assembled battery provided with an assembled battery having a plurality of rechargeable battery packs connected in series , and a control unit for controlling the assembled battery ,the control system for an assembled battery characterized in thatthe battery packs have a discharge unit, andthe control unitconfirms the open-circuit voltage of each battery pack in the assembled battery after the assembled battery has been fully charged,determines a target voltage on the basis of the open-circuit voltage confirmation results for each battery pack in the assembled battery,causes the discharge unit to discharge each battery pack in the assembled battery that has an open-circuit voltage greater than the target voltage, until each of said open-circuit voltages has reached the target voltage,fully charges the assembled battery once again discharges the assembled battery until a first predetermined level has been reached, and learns the capacity of each battery pack in the assembled battery.2. The ...

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Номер записи: 57
30-01-2014 дата публикации

CONTROL OF UNIFORMITY IN A SURFACE WAVE PLASMA SOURCE

Номер: US20140028184A1
Автор: RANJAN ALOK, VORONIN Sergey A.
Принадлежит: TOKYO ELECTRON LIMITED

A surface wave plasma source (SWPS) is disclosed, having an electromagnetic (EM) wave launcher including a slot antenna configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the SWPS adjacent the plasma. The SWPS also includes a dielectric window positioned below the slot antenna, having a lower surface and the plasma surface. The SWPS further includes an attenuation assembly disposed between the slot antenna and the plasma surface. The attenuation assembly includes a first fluid channel substantially aligned with a first arrangement of slots in the slot antenna, and is configured to receive a first flow of a first fluid at a first fluid temperature. The SWPS finally includes a power coupling system coupled to the EM wave launcher and configured to provide EM energy to the EM wave launcher for forming the plasma. 1. A surface wave plasma source (SWPS) , comprising:an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface located adjacent said plasma, said EM wave launcher comprising a slot antenna having a plurality of slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna;a dielectric window positioned in said second region and having a lower surface of said dielectric window including said plasma surface;an attenuation assembly disposed between said slot antenna and said plasma surface, wherein said attenuation assembly includes a first fluid channel substantially aligned with a first arrangement of slots in said plurality of slots and configured to receive a first flow of a first fluid at a first fluid temperature; anda power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma.2. The surface wave plasma source of claim 1 , ...

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Номер записи: 58
30-01-2014 дата публикации

Adjustable slot antenna for control of uniformity in a surface wave plasma source

Номер: US20140028190A1
Автор: Alok Ranjan, Sergey A. Voronin
Принадлежит: Tokyo Electron Ltd

The present invention provides a surface wave plasma source including an electromagnetic (EM) wave launcher comprising a slot antenna having a plurality of antenna slots configured to couple the EM energy from a first region above the slot antenna to a second region below the slot antenna, and a power coupling system is coupled to the EM wave launcher. A dielectric window is positioned in the second region and has a lower surface including the plasma surface. A slotted gate plate is arranged parallel with the slot antenna and is configured to be movable relative to the slot antenna between variable opacity positions including a first opaque position to prevent the EM energy from passing through the first arrangements of antenna slots, and a first transparent position to allow a full intensity of the EM energy to pass through the first arrangement of antenna slots.

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Номер записи: 59
13-02-2014 дата публикации

PLASMA PROCESSING APPARATUS AND MICROWAVE OUTPUT DEVICE

Номер: US20140042155A1
Автор: Itou Atsushi, YAMAMOTO Koichi
Принадлежит: HITACHI HIGH-TECHNOLOGIES CORPORATION

A plasma processing apparatus includes: a high voltage power supply for supplying a high voltage power to a magnetron; and a detector for detecting a microwave output from the magnetron, wherein based on a result of comparing a signal, which is obtained by adding an output from the detector to an AC component of a current detected from an output of the high voltage power supply, with a setting value of the output of the high voltage power supply, the output of the high voltage power supply is adjusted. 1. A plasma processing apparatus that forms plasma inside a processing chamber using microwave formed by a magnetron and processes a wafer arranged inside the processing chamber , the plasma processing apparatus comprising:a high voltage power supply for supplying a high voltage power to the magnetron; anda detector for detecting a microwave output from the magnetron, whereinbased on a result of comparing a signal, which is obtained by adding an output from the detector to an AC component of a current detected from an output of the high voltage power supply, with a setting value of the output of the high voltage power supply, the output of the high voltage power supply is adjusted.2. The plasma processing apparatus according to claim 1 , wherein based on a result of comparing a signal claim 1 , which is obtained by adding an output from the detector to an AC component of an anode current output from the high voltage power supply claim 1 , with a setting value of an output of the high voltage power supply claim 1 , the output of the high voltage power supply is adjusted.3. A plasma processing apparatus that forms plasma inside a processing chamber using microwave formed by a magnetron and processes a wafer arranged inside the processing chamber claim 1 , the plasma processing apparatus comprising:a high voltage power supply for supplying a high voltage power to the magnetron: anda detector for detecting a microwave output from the magnetron, whereinbased on a result of ...

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Номер записи: 60
13-02-2014 дата публикации

PLASMA GENERATOR

Номер: US20140042902A1
Автор: FUJITA Hideki, IGO Tetsuya
Принадлежит: NISSIN ION EQUIPMENT CO., LTD

A plasma generator generates a plasma by ionizing a gas with a high-frequency discharge in a plasma generating chamber so that electrons from the plasma are emitted outside the plasma generator through an electron emitting hole. The plasma generator includes an antenna that is provided in the plasma generating chamber and that emits a high-frequency wave, and an antenna cover that is made of an insulating material and that covers an entire body of the antenna. A plasma electrode having the electron emitting hole is made of a conductive material. A frame cover with a protrusion ensures conductivity by preventing an insulating material from accumulating on a surface of the plasma electrode on a plasma side in sputtering by the plasma. 1. A plasma generator that ionizes a gas using high-frequency discharge within a plasma generating chamber to generate plasma and discharges electrons externally using that plasma through an electron discharge hole , wherein the plasma generator is equipped with an antenna installed in the plasma generating chamber that radiates high-frequency waves and an antenna cover that covers the entire antenna and is comprised of an insulating material , in a plasma generator in which the plasma electrode material that has the electron discharge hole is comprised of conductive material , between the plasma electrode and the antenna , in the cylindrical frame region , a frame cover is provided that has protrusions of different thicknesses that are on the inner side or the inner and outer sides of the frame , the material of the frame cover being an insulating material , the ones of the protrusions near a top surface of the plasma electrode and near the frame cover forming shadows near the top surface of the plasma electrode , the formed shadows configured to prevent accumulation of the insulating material on the plasma electrode , the accumulation being associated with sputtering by the plasma.2. The plasma generator recited in claim 1 , wherein ...

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Номер записи: 61
06-03-2014 дата публикации

Plasma processing apparatus, plasma generating apparatus, antenna structure and plasma generating method

Номер: US20140062296A1
Автор: Chishio Koshimizu, Takafumi Kimura, Yohei Yamazawa
Принадлежит: Tokyo Electron Ltd

A plasma processing apparatus includes: a mounting table, disposed in a processing chamber, configured to mount thereon the substrate; an inductively coupled antenna disposed outside the processing chamber to be opposite to the mounting table, the inductively coupled antenna being connected to a high frequency power supply; and a window member forming a wall of the processing chamber which faces the inductively coupled antenna. The window member includes a plurality of conductive windows made of a conductive material, and dielectric portions disposed between the conductive windows. The inductively coupled antenna is extended in a predetermined direction on the window member and electrically connected to one of the conductive windows, and electrical connection by conductors is sequentially performed from the one of the conductive windows to the other conductive windows in the same direction as an extension direction of the inductively coupled antenna.

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Номер записи: 62
06-03-2014 дата публикации

SYSTEMS AND METHODS FOR CALIBRATING A SWITCHED MODE ION ENERGY DISTRIBUTION SYSTEM

Номер: US20140062303A1
Автор: Brouk Victor, Carter Daniel, Hattel William J., HOFFMAN DANIEL J.
Принадлежит: ADVANCED ENERGY INDUSTRIES, INC.

Systems, methods and apparatus for regulating ion energies and ion energy distributions along with calibrating a bias source and a plasma processing chamber are disclosed. An exemplary method includes applying a periodic voltage function to a load emulator, which emulates electrical characteristics of a plasma load and associated electronics such as an e-chuck. The load emulator can be measured for various electrical parameters and compared to expected parameters generated by the bias source. Differences between measured and expected values can be used to identify and correct faults and abnormalities in the bias supply, the chamber, or a power source used to ignite and sustain the plasma. Once the bias supply is calibrated, the chamber can be calibrated by measuring and calculating an effective capacitance comprising a series and parallel capacitance of the substrate support and optionally the substrate. 1. A method of calibrating a bias supply configured to generate a potential on a top surface of a substrate during plasma processing of the substrate , the method comprising:receiving a modified periodic voltage function comprising pulses and a portion between the pulses;receiving an expected ion energy;receiving an expected ion current;delivering the modified periodic voltage function to a plasma load emulator;measuring a voltage across a sheath capacitance component of the plasma load emulator;applying a known current from a current source of the plasma load emulator to the sheath capacitance component;comparing the voltage across the sheath capacitance component to the expected ion energy and determining an ion energy error from this comparing;comparing the current to the expected ion current and determining an ion current error from this comparing; andreporting the ion energy error and the ion current error.2. The method of claim 1 , further comprising receiving an expected sheath capacitance claim 1 , accessing a sheath capacitance of the sheath capacitance ...

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Номер записи: 63
06-03-2014 дата публикации

Method for Stabilizing Plasma Ignition

Номер: US20140062304A1
Автор: Hisashi Takamizawa, Ryu Nakano, Tsutomu Makino
Принадлежит: ASM IP Holding BV

A method for stabilizing plasma ignition in a continuous process conducted on a substrate, includes: applying a spike of RF power between an upper electrode and a lower electrode on which the substrate is placed, wherein the spike starts from zero power, jumps to a spike power, and then drops to a base power which is so low as to cause plasma ignition failure; and continuously applying RF power at the base power between the upper and lower electrode for a duration substantially longer than a duration of the spike to process the substrate. The spike is such that ignition failure is reduced.

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Номер записи: 64
20-03-2014 дата публикации

Edge Ramping

Номер: US20140076713A1
Автор: Fong Andrew S., JR. John C., Lyndaker Bradford J., Valcore
Принадлежит:

Systems and methods for performing edge ramping are described. A system includes a base RF generator for generating a first RF signal. The first RF signal transitions from one state to another. The transition from one state to another of the first RF signal results in a change in plasma impedance. The system further includes a secondary RF generator for generating a second RF signal. The second RF signal transitions from one state to another to stabilize the change in the plasma impedance. The system includes a controller coupled to the secondary RF generator. The controller is used for providing parameter values to the secondary RF generator to perform edge ramping of the second RF signal when the second RF signal transitions from one state to another. 1. A system comprising:a base RF generator for generating a first RF signal, wherein the first RF signal transitions from one state to another, the transition from one state to another of the first RF signal resulting in a change in plasma impedance;a secondary RF generator for generating a second RF signal, wherein the second RF signal transitions from one state to another to stabilize the change in the plasma impedance;a controller coupled to the secondary RF generator, the controller for providing parameter values to the secondary RF generator to perform edge ramping of the second RF signal when the second RF signal transitions from one state to another.2. The system of claim 1 , wherein the edge ramping has a positive or a negative slope.3. The system of claim 1 , wherein the parameter values include frequency values claim 1 , power values claim 1 , or a combination thereof.4. A system for reducing an effect of a change in power level of a radio frequency (RF) signal on plasma impedance claim 1 , comprising: a primary driver and amplifier for generating a primary RF signal;', 'a primary digital signal processor (DSP) for identifying states of a digital pulsed signal, the states including a first state and a ...

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Номер записи: 65
10-04-2014 дата публикации

ELECTRICAL CIRCUIT FOR CONTROLLING ELECTRICALPOWER TO DRIVE AN INDUCTIVE LOAD

Номер: US20140097785A1
Автор: HENNESS MARC
Принадлежит:

A method and system are disclosed for controlling electrical current through an inductive load. The electrical current is supplied by one of at least three selectable dual capacitor bank electrical circuits. The method includes storing electrical energy during a charge operating state in first and second capacitor banks of a first dual capacitor bank circuit. The stored electrical energy is then used to drive the inductive load when operating the first dual capacitor bank circuit in a drive operating state. After depleting the stored electrical energy from the first and second capacitor banks, the first dual capacitor bank transitions to a collection operating state that includes collecting electrical energy from the inductive load. A second and third dual capacitor circuits simultaneously transition among the charge operating state, the drive operating state, and the collection operating state during operation. 1. An electrical circuit comprising:a first dual bank electrical circuit having a grounded first bank of capacitors selectively electrically connected in series and selectively electrically connected in parallel with a second bank of capacitors, the first and second bank of capacitors selectively electrically connected in series to a load, selectively connected in parallel to a power source, and selectively electrically connected in parallel when collecting electrical energy; anda second dual bank electrical circuit having a grounded third bank of capacitors selectively electrically connected in series and selectively electrically connected in parallel with a fourth bank of capacitors, the third and fourth bank of capacitors selectively electrically connected in series to the load, selectively connected in parallel to the power source, and selectively electrically connected in parallel when collecting electrical energy.2. The electrical circuit of claim 1 , wherein the load comprises a first end configured to selectively electrically connect to one of the ...

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Номер записи: 66
04-01-2018 дата публикации

POWER TRANSFORMATION SELF CHARACTERIZATION MODE

Номер: US20180003744A1
Автор: Diedrich Devin, Juntunen Robert D., Klein Aaron J.
Принадлежит:

A system and approach for a self-calculating test of a heating, ventilation and air conditioning load. The test may be run upon meeting predetermined conditions. Thermostatic control of the load may be disabled when the load test starts. If a call for heat or cool is made at the thermostat, response to the call may be delayed until the load test is completed, and if AC power is lost during the test, the test may finish and allow detection of the phantom AC detection device with a loss of AC power. If a voltage of a storage capacitor falls below a battery boost threshold, the test may be cancelled to allow the phantom circuit charge the storage capacitor. The system and approach may incorporate load test states that include an initialize state, start test state, get baseline state, test measure state, stabilize measurement state, calculation state, and finalize results state. 1. A method for performing a power transformation self characterization mode for an HVAC comprising:obtaining a baseline of a reference voltage;determining whether the baseline obtained is equal to or greater than a predetermined or needed baseline;repeating obtaining the baseline until the baseline obtained is equal to or greater than the predetermined or needed baseline;taking a measurement of a charge rate or a measurement of a voltage across an HVAC load;determining whether the charge rate is equal to or greater than a predetermined charging threshold or determining whether the voltage across the HVAC load is equal to or greater than a predetermined voltage threshold;determining whether the charge rate is zero, if neither the charge rate is equal to or greater than the predetermined charging threshold, nor the voltage across the HVAC load is equal to or greater than the pre-determined voltage threshold;stabilizing the measurements, if the charge rate is equal to or greater than the predetermined charging threshold, or if the voltage across the HVAC load is equal to or greater than the ...

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Номер записи: 67
07-01-2016 дата публикации

MEASUREMENT PROBE WITH HEAT CYCLE EVENT COUNTER

Номер: US20160004956A1
Автор: Broadley Scott T., Fish Robert, Garrahy Robert J., Hayward Andrew W., Nathanson Jared H., Reynolds William E., Sargent Bradley Joseph
Принадлежит:

A system comprising a measurement device and a handheld device is disclosed, the system adapted to withstand, detect, record, and display heat cycle event counts. The measurement device comprises a sensor for measuring and a heat cycle detection unit. The heat cycle detection unit comprises a temperature or pressure responsive element, a detection module, data interface, and data memory. The handheld device comprises a screen, a button, a communication circuit, and a processing system. The communication circuit is configured to communicate with the measurement device and a computing device and the processing system is configured to receive non-measurement information from the measurement device, display the received information on the screen, and cycle the received information displayed on the screen based on an actuation of the button, wherein the handheld device is used to display a heat sterilization cycle count of the measurement device. 1. A system , comprising: a measurement probe comprising a sensor configured to detect a characteristic of a medium and generate a measurement signal;', 'a condition responsive element comprising either a temperature responsive element or a pressure responsive element; and', detect a heat cycle event using the condition responsive element, and', 'record detection of the heat cycle event in the data memory,, 'a heat cycle detection unit comprising a detection module, a data interface, and a data memory; wherein the detection module is configured to], 'a measurement device adapted to withstand and automatically count a heat sterilization or cleaning cycle, comprisingwherein the measurement device is configured to automatically power off the heat cycle detection unit after detection of the heat cycle; and a screen;', 'a button;', 'a communication circuit configured to communicate with the measurement device and a computing device; and', 'a processing system configured to receive non-measurement information from the measurement ...

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Номер записи: 68
05-01-2017 дата публикации

TRANSFORMERLESS POWER CONVERSION

Номер: US20170005471A1
Автор: Aldous Scott, Kim Sangsun, Ramesh Anand, Zipfel John
Принадлежит:

Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for non-isolated power conversion. In one aspect, a method includes generating first and second rectified outputs using a rectifier with a first input and a second input connected respectively to a first and second output of a power source, capacitively coupling the first and second rectified outputs to a neutral, generating first and second AC outputs from the first and second rectified outputs, and capacitively coupling the first and second AC outputs to the neutral. Other embodiments of this aspect include corresponding systems, apparatus, and computer programs, configured to perform the actions of the methods, encoded on computer storage devices. 1. A system , comprising: a first phase input terminal to receive a first phase output of a power source;', 'a second phase input terminal to receive a second phase output of the power source;', 'a first rectifier output terminal and a second rectifier output terminal; and', 'rectifier circuity that rectifies the first phase output and the second phase output of the power source to generate respective first and second rectified outputs on the first and second rectifier output terminals;', 'a rectifier neutral to receive a power source neutral;, 'a rectifier includinga first capacitor connected between the rectifier neutral and the first rectifier output terminal;a second capacitor connected between the rectifier neutral and the second rectifier output terminal; a first inverter input terminal connected to the first rectifier output terminal;', 'a second inverter input terminal connected to the second rectifier output terminal;', 'a first inverter output terminal and a second inverter output terminal; and', 'inverter circuity that inverts the first and second rectified output to generate respective first and second AC outputs on the first and second inverter output terminals wherein the first and second AC outputs are ...

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Номер записи: 69
07-01-2016 дата публикации

ENERGY MANAGEMENT SYSTEM AND ENERGY MANAGEMENT METHOD

Номер: US20160006246A1
Автор: HASHIMOTO Ryo, IWASAKI Yuma, Kudo Koji, Sakuma Hisato, SANEYOSHI Eisuke, Yano Hitoshi
Принадлежит: NEC Corporation

An energy management system and an energy management method enable an improvement of the balance between power supply and demand. A storage battery () is connected to a power line () that transmits outside power. A storage battery controller () receives a control signal indicating a reduced use period during which the consumption of the outside power by a consumer apparatus () connected to the power line () is to be reduced, acquires an index value that has a correlation with the demand for outside power, and on the basis of the control signal and the index value, adjusts the amount of charging/discharging of the storage battery (). 1. An energy management system comprising:a storage battery that is connected to a power line that transmits outside electric power; anda control unit that receives a control signal that indicates reduced use periods in which the amount of consumption of said outside electric power by a load that is connected to said power line is reduced, further, acquires an index value that has a correlation with the demand for said outside electric power, and adjusts an amount of charging/discharging that is to be charged or discharged in said storage battery on the basis of said control signal and said index value.2. The energy management system as set forth in claim 1 , wherein:said control unit causes said storage battery to charge during use periods other than said reduced use periods and causes said storage battery to discharge at a discharging amount that is based on said index value during said reduced use periods.3. The energy management system as set forth in claim 2 , wherein:said control unit increases said discharging amount according to the degree that said demand increases based on said index value during said reduced use periods.4. The energy management system as set forth in claim 1 , wherein:said control unit acquires, as said index value, outside air temperature or an amount of power consumption that is consumed in a prescribed ...

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Номер записи: 70
07-01-2021 дата публикации

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND MEMORY MEDIUM

Номер: US20210005429A1
Автор: Inoue Tadashi, SASAMOTO Hiroshi, Sato Tatsunori, SEKIYA Kazunari, Takeda Atsushi, TANABE Masaharu, TSUCHIYA Nobuaki
Принадлежит: CANON ANELVA CORPORATION

A plasma processing apparatus includes an impedance matching circuit, a balun having a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode, a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit, and a controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance. 1. A plasma processing apparatus comprising:an impedance matching circuit;a balun including a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal, and a second balanced terminal;a grounded vacuum container;a first electrode electrically connected to the first balanced terminal;a second electrode electrically connected to the second balanced terminal;an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode;a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit; anda controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance,wherein the first electrode is configured to hold a first target, the second electrode is configured to hold a second target, the first electrode faces a space on a side of a ...

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Номер записи: 71
07-01-2021 дата публикации

INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, STORAGE MEDIUM, PORTABLE ELECTRIC GENERATOR, AND RENTAL SYSTEM

Номер: US20210006070A1
Автор: Ito Mitsuhiro, Matsunaga Yoshihiro, Oshima Mio, OSHIMA Ryo, SASAKI NOBUYUKI, Takada Sho
Принадлежит:

An information processing apparatus comprises an acquisition unit configured to acquire information according to the usage circumstances of the portable electric generator; an estimation unit configured to estimate a type of an electrical device that is connected, based on a measurement result with respect to a voltage and a current when the portable electric generator supplied electric power that is included in the information according to the usage circumstances; and a calculation unit configured to calculate a rental fee associated with an electric power amount supplied by the portable electric generator at the rental destination, using a billing coefficient corresponding to an electrical device estimated by the estimation unit, and the measurement result. 1. An information processing apparatus managing usage circumstances at a rental destination of a portable electric generator configured to supply electric power to a detachably connected electrical device , the apparatus comprising:an acquisition unit configured to acquire information according to the usage circumstances of the portable electric generator;an estimation unit configured to estimate a type of an electrical device that is connected, based on a measurement result with respect to a voltage and a current when the portable electric generator supplied electric power that is included in the information according to the usage circumstances; anda calculation unit configured to calculate a rental fee associated with an electric power amount supplied by the portable electric generator at the rental destination, using a billing coefficient corresponding to an electrical device estimated by the estimation unit, and the measurement result.2. The information processing apparatus according to claim 1 , whereinthe portable electric generator includes a communication unit configured to perform a radio communication with the information processing apparatus; andthe acquisition unit receives the information according ...

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Номер записи: 72
07-01-2021 дата публикации

CHARGING SYSTEM FOR A BARCODE READER THAT USES DIFFERENT TYPES OF RECHARGEABLE POWER SOURCES

Номер: US20210006090A1
Автор: Alldredge Eric, Hoobler Ryan
Принадлежит:

A system includes a barcode reader that is configured to use different types of rechargeable power sources and charging circuitry that is configured to provide a charging current and a charging voltage for a rechargeable power source that is being used by the barcode reader. The charging circuitry is configured to adjust the charging current and the charging voltage for the different types of rechargeable power sources that are used by the barcode reader. 1. A system , comprising:a barcode reader that is configured to use different types of rechargeable power sources; andcharging circuitry that is configured to provide a charging current and a charging voltage for a rechargeable power source that is being used by the barcode reader, wherein the charging circuitry is configured to adjust at least one of the charging current or the charging voltage for the different types of rechargeable power sources that are used by the barcode reader.2. The system of claim 1 , wherein:the charging circuitry is configured to provide a first charging current and a first charging voltage when the rechargeable power source comprises a first type of rechargeable power source; andthe charging circuitry is configured to adjust at least one of the first charging current or the first charging voltage when the rechargeable power source comprises a second type of rechargeable power source.3. The system of claim 2 , wherein:the first type of rechargeable power source comprises a rechargeable battery; andthe second type of rechargeable power source comprises a supercapacitor.4. The system of claim 1 , wherein the charging circuitry is additionally configured to:detect a type of rechargeable power source that is being used by the barcode reader; andprovide the charging current and the charging voltage that are appropriate for that type of rechargeable power source.5. The system of claim 1 , wherein the charging circuitry is additionally configured to receive notification from the rechargeable ...

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Номер записи: 73
03-01-2019 дата публикации

Balancing Circuit For An Ultracapacitor Module

Номер: US20190006858A1
Автор: Hock Joseph
Принадлежит:

Balancing circuits for an ultracapacitor module are provided. In some implementations, the balancing circuit can include a comparator. The comparator can have a sensing input. The comparator can be configured to compare an input voltage associated with the ultracapacitor received at the sensing input to a reference voltage and to provide an output via an output node of the comparator. The balancing circuit can include a switching circuit coupled to the ultracapacitor. The switching circuit can be controlled to discharge the ultracapacitor based at least in part on the output of the comparator circuit. The balancing circuit can further include a feedback element coupled between the switching circuit and the sensing input of the comparator. 1. A balancing circuit for an ultracapacitor , comprising:a comparator comprising a sensing input, the comparator configured to compare an input voltage associated with the ultracapacitor received at the sensing input to a reference voltage and to provide an output via an output node of the comparator;a switching circuit coupled to the ultracapacitor, wherein the switching circuit is configured to discharge the ultracapacitor based at least in part on the output of the comparator; anda feedback element coupled between the switching circuit and the sensing input of the comparator.2. The balancing circuit of claim 1 , wherein the comparator is configured to provide a first output when the input voltage associated with the ultracapacitor is greater than the reference voltage and to provide a second output when the voltage associated with the ultracapacitor is not greater than the reference voltage.3. The balancing circuit of claim 2 , wherein the switching circuit comprises one or more switching elements claim 2 , wherein the one or more switching elements are configured to be in a conducting state when the comparator provides the first output and wherein the one or more switching elements are configured to be in a non-conducting ...

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Номер записи: 74
02-01-2020 дата публикации

MANAGING CONSUMER ENERGY DEMAND

Номер: US20200006943A1
Автор: Arar Raphael I., Asthana Shubhi, Butler Eric K., Chowdhary Pawan R., Gopisetty Sandeep, Hernandez Manuel, JR. Hovey R., Kieliszewski Cheryl A., Roche Kevin P., Strong
Принадлежит:

A computer-implemented method, according to one embodiment, includes: receiving an energy consumption profile which spans multiple intervals in a period of time, and predicting a net energy demand of a consumer system over the period of time. Moreover, a first multiple is determined which, when applied to the received energy consumption profile, produces an updated energy consumption profile which corresponds to an amount of energy that is capable of satisfying the predicted net energy demand of the consumer system. A greatest amount of underprediction is estimated. A greatest amount of overprediction is also estimated. Furthermore, an initial state of an energy storage device electrically coupled to the consumer system is computed according to the updated energy consumption profile. The initial state of the energy storage device is also based on a second multiple applied to each of the greatest amount of underprediction, and the greatest amount of overprediction. 1. A computer-implemented method , comprising:receiving an energy consumption profile which spans multiple intervals in a period of time;predicting a net energy demand of a consumer system over the period of time;determining a first multiple which, when applied to the received energy consumption profile, produces an updated energy consumption profile which corresponds to an amount of energy that is capable of satisfying the predicted net energy demand of the consumer system;estimating a greatest amount of underprediction by which the predicted net energy demand of the consumer system underpredicts an actual net energy demand of the consumer system over the period of time;estimating a greatest amount of overprediction by which the predicted net energy demand of the consumer system overpredicts the actual net energy demand of the consumer system over the period of time; andcomputing an initial state of an energy storage device electrically coupled to the consumer system which is able to satisfy the actual ...

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Номер записи: 75
08-01-2015 дата публикации

Autonomous Power Supply System

Номер: US20150008872A1
Автор: FUJIMORI Tsukasa, GOTO Yasushi, Kurata Hideaki, TAKANO Hideaki
Принадлежит:

An autonomous power supply system includes a generation control circuit which controls power generation efficiency of a power generation element, a group of storage elements for charging electric power generated by the power generation element, and a charging control circuit which controls a charging operation and a discharging operation of the storage element group. The storage element group includes a primary storage element for supplying electric power to the generation control circuit and the charging control circuit, and secondary storage elements for supplying electric power to a loading device. The electric power generated by the power generation element charges the primary storage element preferentially, and the secondary storage elements subsequent to the primary storage element. A capacity value of the primary storage element is set to be smaller than a capacity value of the secondary storage elements.

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Номер записи: 76
08-01-2015 дата публикации

Plasma generating device

Номер: US20150010439A1
Автор: Yuji Ikeda
Принадлежит: Imagineering Inc

The present invention aims to provide a plasma generation device including: a plasma generation part which generates plasma; diluent gas supply means which supplies a diluent gas for diluting the plasma generated by the plasma generation part; and a spray port through which a plasma gas resulting from the dilution of the plasma with the diluent gas is sprayed, in which the characteristics of the plasma gas are changed and controlled so as to enlarge the plasma gas and enhance the activity of the plasma gas, without controlling the power input from a power source to the plasma generation part. The plasma generation device of the present invention includes an electromagnetic wave production device which irradiates at least one of a region where the plasma is generated and a region where the plasma gas passes with an electromagnetic wave from an antenna.

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Номер записи: 77
11-01-2018 дата публикации

SYSTEM SHARING BATTERY WITH EXTERNAL DEVICE

Номер: US20180009468A1
Автор: FUJITA Toshihiro
Принадлежит:

In a system that shares a battery with an external device, the system includes a power storage device connected to the battery via a power supply line. The system includes a switch provided on the power supply line, and a control unit. The control unit controls on-off switching operations of the switch to selectively establish an electrical conduction between the battery and the power storage device or interrupt the electrical conduction therebetween. The battery has a battery voltage thereacross, and the power storage device has a power-storage voltage thereacross. The battery charges the power storage device while the electrical conduction is established so that the power-storage voltage follows the battery voltage. The control unit turns off the switch when the battery voltage is in a predetermined insufficient voltage state to prevent electrical power charged in the power storage device from being discharged to the battery. 1. A system that shares a battery with an external device , the system comprising:a power storage device connected to the battery via a power supply line;a switch provided on the power supply line; anda control unit configured to control on-off switching operations of the switch to selectively establish an electrical conduction between the battery and the power storage device or interrupt the electrical conduction therebetween, the battery having a battery voltage thereacross, the power storage having a power-storage voltage thereacross, the battery charging the power storage device while the electrical conduction is established so that the power-storage voltage follows the battery voltage,the control unit being configured to turn off the switch when the battery voltage is in a predetermined insufficient voltage state to prevent electrical power charged in the power storage device from being discharged to the battery.2. The system according to claim 1 , wherein: determine whether the power-storage voltage is lower than a predetermined ...

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Номер записи: 78
14-01-2021 дата публикации

Power Supply for Movable Barrier Opener with Brushless DC Motor

Номер: US20210010314A1
Автор: Buescher, JR. Brent, Matias Greg, Punchak Dan
Принадлежит:

A movable barrier opener system having a brushless DC motor is provided. The movable barrier opener system may have a power supply unit with a drive circuit power module and a storage bank. The storage bank may be chargeable by the drive circuit power module and may be connectable to the drive assembly to provide electrical power to the drive assembly to move the movable barrier. The drive circuit power module may be selectably turned on and off to improve efficiency of power consumption by turning off during periods of lowered demand. 1. A movable barrier opener system comprising:a drive assembly to move a movable barrier, the drive assembly comprising a multiphase brushless motor connectable to the movable barrier to move the movable barrier;a barrier operator connected to the drive assembly and comprising a controller configured to instruct the drive assembly to move the movable barrier; anda power supply unit comprising:a controller power module configured to provide electrical power to the controller;a drive circuit power module configured to provide electrical power to the drive assembly and further configured to charge a storage bank; andthe storage bank connectable to the drive assembly to augment the electrical power to the drive assembly provided by the drive circuit power module to move the movable barrier responsive to the instructions from the controller,wherein the controller is further configured to instruct the drive circuit power module to turn on in response to a time of elevated demand and turn off in response to a time of lowered demand.2. The movable barrier opener system of claim 1 , wherein the storage bank connects to the drive circuit power module for charging and connects to the drive assembly to provide power to the drive assembly for moving the movable barrier.3. The movable barrier opener system of claim 2 , wherein the controller turns on the drive circuit power module in response to directing the drive circuit power module to charge ...

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Номер записи: 79
27-01-2022 дата публикации

Pre-charge unit for charging a dc link capacitor and battery system including the same

Номер: US20220029427A1
Автор: Florian MAXL
Принадлежит: Samsung SDI Co Ltd

A pre-charge unit for charging a DC link capacitor includes a printed circuit board including at least one conductive layer; a pre-charge switch on the printed circuit board; and a pre-charge resistor electrically connected in series with the pre-charge switch, wherein the pre-charge resistor is formed by a conductive trace in the at least one conductive layer of the printed circuit board.

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Номер записи: 80
27-01-2022 дата публикации

PHOTOVOLTAIC POWER GENERATION VIRTUAL INERTIA COMPENSATION SYSTEM AND METHOD BASED ON SUPER CAPACITOR ENERGY STORAGE

Номер: US20220029581A1
Автор: Li Feng, Li Suxuan, SHEN Zhipeng, Zhu Jiebei
Принадлежит:

The present invention discloses a photovoltaic power generation virtual inertia compensation system based on SCES, comprising a photovoltaic array, a boost circuit and a grid-connected inverter, which are electrically connected in sequence, and further comprising a supercapacitor assembly for energy storage, a bidirectional DC-DC converter and a virtual inertia control module; an end of the bidirectional DC-DC converter is electrically connected to an output end of the unidirectional DC-DC boost circuit and an input end of the power grid inverter, and the other end thereof is electrically connected to the supercapacitor assembly; the bidirectional DC-DC converter comprises two power switch devices; the virtual inertia control module comprises a first inverting adder, a virtual inertia converter, a second inverting adder, a first PI controller, a third inverting adder, a second PI controller and a PWM modem, which are electrically connected in sequence. 1. A photovoltaic power generation virtual inertia compensation system based on SCES , comprising a photovoltaic array , a unidirectional DC-DC boost circuit and a grid-connected inverter , which are electrically connected in sequence , the grid-connected inverter outputting alternating current to the power grid ,wherein the virtual inertia compensation system further comprises a supercapacitor assembly for energy storage, a bidirectional DC-DC converter and a virtual inertia control module; a port on a side of the bidirectional DC-DC converter is electrically connected to an output end of the unidirectional DC-DC boost circuit and an input end of the power grid inverter, and a port on the other side thereof is electrically connected to the supercapacitor assembly;the bidirectional DC-DC converter comprises two power switch devices; the virtual inertia control module comprises a first inverting adder, a virtual inertia converter, a second inverting adder, a first PI controller, a third inverting adder, a second PI ...

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Номер записи: 81
15-01-2015 дата публикации

SYSTEM AND METHOD FOR CONTROLLING FREQUENCY

Номер: US20150015069A1
Автор: CHOI Jin Young, PARK Eun Sung
Принадлежит:

Provided are a system and a method for controlling a frequency. The system for controlling the frequency includes: at least one power supplying unit generating power; at least one systematic unit consuming the power generated from the power supplying unit; at least one standby power unit storing the power generated from the power supplying unit and including at least one storage device; and at least one grid unit connecting the power supplying unit, the systematic unit, and the standby power unit to one another and controlling a frequency of the systematic unit. 1. A system for controlling a frequency , the system comprising:at least one power supplying unit generating power;at least one systematic unit consuming the power generated from the power supplying unit;at least one standby power unit storing the power generated from the power supplying unit and including at least one storage device; andat least one grid unit connecting the power supplying unit, the systematic unit, and the standby power unit to one another and controlling a frequency of power flowing to the systematic unit.2. The system of claim 1 , wherein the standby power unit includes at least one storage device claim 1 , the at least one storage device being discharged when a frequency supplied to the systematic unit is decreased below a predetermined value and being charged when the frequency supplied to the systematic unit is increased above the predetermined value.3. The system of claim 1 , wherein the standby power unit includes a controlling unit claim 1 , the controlling unit determining a use priority of the storage device using a state of charge (SOC) of the storage device.4. A method for controlling a frequency by the system for controlling the frequency of claim 1 , the method comprising:an operation of calculating a first SOC calculating the respective state of charge (SOC) of the storage devices constituting the standby power unit;an operation of determining a first SOC reference ...

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Номер записи: 82
15-01-2015 дата публикации

CAPACITIVE WELDER AND METHOD FOR CHARGING SAME

Номер: US20150015212A1
Автор: Arai Kouji, Kadoya Yasuo, Komatsu Akio
Принадлежит: ORIGIN ELECTRIC COMPANY, LIMITED

The capacitive welder includes a charging circuit, a welding transformer, a capacitor, a discharging switching element connected in parallel with a primary winding of the welding transformer and the capacitor that are connected in series, a bypass switching element connected in parallel with the primary winding, welding electrodes connected in parallel with a secondary winding of the welding transformer, and a control circuit for bringing the welding transformer into a reset allowing state by allowing a reset current to flow in the primary winding using the input power introduced through the charging circuit without supplying an ON signal to the bypass switching element, and then supplying the ON signal to the bypass switching element such that the capacitor is charged through the bypass switching element by the input power introduced through the charging circuit. 1. A capacitive welder comprising:a charging circuit having a switching element;a welding transformer having a primary winding and a secondary winding;a capacitor to which an input electric power is introduced via the charging circuit;a discharge switching element connected in parallel with the primary winding and the capacitor, the primary winding being connected in series to the capacitor;a bypass switching element connected in parallel with the primary winding;welding electrodes connected in parallel with the secondary winding of the welding transformer; anda control circuit configured to bring the welding transformer into a reset allowing state by causing a reset current to flow in the primary winding using the input electric power introduced through the charging circuit without supplying an ON signal to the bypass switching element, and then supply the ON signal to the bypass switching element such that the capacitor is charged through the bypass switching element by the input electric power introduced through the charging circuit.2. The capacitive welder according to claim 1 , wherein when the ...

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Номер записи: 83
11-01-2018 дата публикации

Wireless Charging Systems with Multicoil Receivers

Номер: US20180013310A1
Автор: Dayal Rohan, Moussaoui Zaki, Qiu Weihong
Принадлежит:

A wireless power transmitting device may have an array of transmitting coils to transmit power wirelessly to a wireless power receiving device having an array of wireless power receiving coils. The receiving device may have a rectifier that receives alternating-current signals from the wireless power receiving coils and provides corresponding rectified direct-current voltage signals to a capacitor and other circuitry. The rectifier circuitry may include bridge circuits each of which is coupled between a respective coil in the array of wireless power receiving coils and the capacitor. The wireless power transmitting coils may be arranged in a hexagonally tiled array. The wireless power receiving coils may include first, second, and third coils that are aligned with respective vertices in an equilateral triangle having sides with lengths equal to half of the center-to-center spacing of the hexagonally tiled transmitting coils. 1. A portable electronic device that is configured to receive wireless power transmitted from an array of hexagonally tiled transmitting coils in a wireless power transmitting device , comprising:a battery; andwireless power receiving circuitry that includes an array of wireless power receiving coils and that includes rectifier circuitry that is configured to rectify alternating-current wireless power signals received by the array of wireless power receiving coils and to provide a corresponding direct-current voltage to the battery, wherein the wireless power receiving coils are laterally spaced from each other in a two-dimensional array so that whenever a first of the wireless power receiving coils is aligned with a transmitting coil in the array of hexagonally tiled transmitting coils, second and third wireless power receiving coils in the array of wireless power receiving coils are not aligned with any of the other transmitting coils.2. The portable electronic device defined in further comprising a capacitor to which the direct-current ...

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Номер записи: 84
14-01-2021 дата публикации

METHOD AND CIRCUIT FOR PROVIDING AUXILIARY POWER AND STORAGE DEVICE INCLUDING THE SAME

Номер: US20210012842A1
Автор: CHOI Jaewoong, Ryu Chunghyun
Принадлежит:

A method of providing an auxiliary power by an auxiliary power supply. The method may include converting an external power to a plurality of charging voltages; charging a charging circuit with a first charging voltage of the plurality of charging voltages; monitoring a voltage of the charging circuit; when capacitance of the charging circuit is less than a first reference capacitance, charging the charging circuit with a second charging voltage of the plurality of charging voltages, the second charging voltage being higher than the first charging voltage by a first voltage amount; and providing an auxiliary power to outside the auxiliary power supply. The auxiliary power may be generated based on the voltage of the charging circuit. 1. A method of providing an auxiliary power by an auxiliary power supply , the method comprising:converting an external power to a plurality of charging voltages;charging a charging circuit with a first charging voltage of the plurality of charging voltages;monitoring a voltage of the charging circuit;when capacitance of the charging circuit is less than a first reference capacitance, charging the charging circuit with a second charging voltage of the plurality of charging voltages, the second charging voltage higher than the first charging voltage by a first voltage amount; andproviding an auxiliary power to outside the auxiliary power supply,wherein the auxiliary power is generated based on the voltage of the charging circuit.2. The method of claim 1 , wherein when a discharge time taken for the voltage of the charging circuit to decrease from the first charging voltage to a first threshold voltage is shorter than a first reference time interval claim 1 , the charging of the charging circuit with the second charging voltage is performed.3. The method of claim 2 , further comprising:when a discharge time taken for the voltage of the charging circuit to decrease from the second charging voltage to a second threshold voltage is shorter ...

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Номер записи: 85
14-01-2021 дата публикации

Plasma processing apparatus

Номер: US20210013004A1
Автор: Tetsuya Saitou
Принадлежит: Tokyo Electron Ltd

A plasma processing apparatus includes: a processing container; a stage provided in the processing container and configured to place a substrate on the stage; a gas introduction part provided in an upper portion of the processing container to face the stage and configured to introduce a processing gas into the processing container; and an annular exhaust path which is provided in an upper portion of a side wall of the processing container, and in which an opening toward a center of the processing container is formed at an inner circumferential side of the exhaust path, wherein the stage and the gas introduction part are respectively connected to high-frequency power supplies for generating plasma of the processing gas, wherein the exhaust path is grounded, wherein the plasma processing apparatus further comprises a grounded plasma distribution adjuster covering the opening, and wherein through-holes are formed in the plasma distribution adjuster.

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Номер записи: 86
10-01-2019 дата публикации

BATTERY MANAGING DEVICE AND BATTERY ENERGY STORING SYSTEM

Номер: US20190013673A1
Автор: KIM Hong Seok, Lee Jin Ho
Принадлежит:

Provided is a battery managing device that stores surplus power provided from a system via a power managing device, and controls the charging and discharging of a battery formed of multiple battery modules which supply stored power to the system. The battery managing device includes: a switch block that connects the multiple battery modules to the power managing device; a charging circuit that charges the battery by means of the power input from the power managing device; a smoothing circuit that discharges or charges the battery according to the real-time power deficit/surplus state of the system; and a control circuit that controls the operation of the switching block, the charging circuit, and the smoothing circuit. 1. A battery management system or BMS for storing surplus power provided from a power grid via a power control system or PCS and controlling charging and discharging a battery with multiple battery modules for supplying stored power to the power grid , comprising:a switch block for connecting the multiple battery modules to the PCS;a charging circuit for charging the battery with power inputted from the PCS;a smoothing circuit for charging or discharging the battery depending on a real-time state of power shortage or surplus of the power grid; anda control circuit for controlling operations of the switch block, the charging circuit, and the smoothing circuit;wherein the control circuit virtually divides a capacity of the battery into a capacity for a battery for storing energy and that for a battery for smoothing.2. The BMS of claim 1 , wherein the control circuit conducts a smoothing operation by adding energy stored in the battery for storing energy to the battery for smoothing at a time of peak in power demand claim 1 , andwhile preferentially storing surplus power in the battery for storing energy at an off-peak time, when the battery for storing energy is fully charged, it stores the power in the battery for smoothing.3. The BMS of claim 1 , ...

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Номер записи: 87
10-01-2019 дата публикации

Device and method for the reconfiguration of a rechargeable energy storage device into separate battery connection strings

Номер: US20190013681A1
Автор: Dominique Weyen, Peter Coenen, Rafael PONNETTE, Sven DE BREUCKER
Принадлежит: VITO NV

Reconfiguration of a rechargeable energy storage system into two or more new capacitor or battery or fuel cell packs arranged in “connections”, e.g. series or parallel strings. Each pack of rechargeable energy storage devices includes rechargeable energy storage modules. In each rechargeable energy storage module, which can include one or more capacitors or fuel cells or battery cells, there is arranged a network of banks of switches. A first bank of switches is arranged to connect a rechargeable energy storage module in a first series connection string with other rechargeable energy storage modules. A second bank of switches is arranged to connect a rechargeable energy storage module in a second connection string with other rechargeable energy storage modules. A first bypass switch is arranged to exclude a rechargeable energy storage module from the first series connection string when the first bypass switch is activated.

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Номер записи: 88
10-01-2019 дата публикации

APPARATUS FOR STARTING AN ELECTRICALLY CRANKED ENGINE

Номер: US20190013692A1
Автор: Dellevergini Sandy
Принадлежит:

An apparatus for starting an electrically cranked engine includes a battery connection, a voltage increase circuit having an electrical input and output, and an electrical energy storage. The voltage increase circuit is connected at its input to the battery connection and at its output to the energy storage such that electrical energy at a relatively low voltage from a battery connected to the battery connection flows to the voltage increase circuit which increases the voltage of the electrical energy to a relatively high voltage, which then flows to the energy storage and is stored therein at the relatively high voltage. The voltage increase circuit may be a DC-to-DC boost converter. The energy storage is capable of storing electrical energy at about 12 V or 13 V, at least, or about 24 V or 25 V, at least, and may be capable of rapid charging and discharge. 1. An apparatus for starting an electrically cranked engine , the apparatus comprising:a battery connection;a voltage increase circuit having an electrical input and an electrical output; andan electrical energy storage, wherein the apparatus is configured such that the battery connection is in electrical connection with the electrical input of the voltage increase circuit, and the electrical energy storage is in electrical connection with the electrical output of the voltage increase circuit such that electrical energy at a relatively low voltage from a battery connected to the battery connection flows to the voltage increase circuit which increases the voltage of the electrical energy to a relatively high voltage, and the electrical energy flows to the electrical energy storage and is stored therein at the relatively high voltage.2. The apparatus of wherein the voltage increase circuit is a DC-to-DC boost converter.3. The apparatus of wherein the electrical energy storage means is capable of storing electrical energy at a voltage of at least about 12 V.4. The apparatus of wherein the electrical energy storage ...

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Номер записи: 89
15-01-2015 дата публикации

APPARATUS AND METHOD TO MEASURE ENERGY CAPACITY OF A BACKUP POWER SUPPLY WITHOUT COMPROMISING POWER DELIVERY

Номер: US20150016206A1
Автор: Hauck Lane T.
Принадлежит:

A device includes a backup power supply configured to provide power to an external system upon loss of primary system power. The backup power provided by at least one capacitor. While the capacitor is available as a backup power supply to the external system, a transient elevation of the capacitor's stored potential is created above an upper predetermined operating potential of the capacitor. Measurements of a capacitor's output voltage are obtained during the transient elevation of the capacitor's stored potential. A capacitance of the capacitor is determined from the measurements. 1. A device , comprising:a backup power supply configured to provide power to a an external system upon loss of primary system power, the backup power provided by at least one capacitor, the backup power supply configured to charge the capacitor to an upper predetermined operating potential sufficient to provide enough energy to complete a memory backup operation upon loss of primary system power;logic to create generate, while the capacitor is available as a backup power supply to the external system, a transient elevation of the capacitor's stored potential above the upper predetermined operating potential of the capacitor;logic to coordinate the generation of the transient elevation of the capacitor's stored potential with obtain measurements of the capacitor's output voltage during the transient elevation of the capacitor's stored potential; andlogic to determine a capacitance of the capacitor from the measurements.2. The device of claim 1 , further comprising:logic to obtain coordinate the measurements during with an increasing phase of the capacitor's stored potential during the transient elevation.3. The device of claim 1 , further comprising:logic to obtain coordinate the measurements during with a decreasing phase of the capacitor's stored potential during the transient elevation.4. The device of claim 2 , further comprising:logic to perform, once the measurements are obtained, ...

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Номер записи: 90
14-01-2021 дата публикации

REACTIVE POWER CONTROL IN POWER SYSTEMS

Номер: US20210013718A1
Автор: Eleftheriadis Lackis, Karapantelakis Athanasios, Vandikas Konstantinos
Принадлежит:

Based on information from a controller scheduling data traffic in a processing arrangement, a super capacitor unit is activated, whereby reactive power is fed to a system bus of said power system. The controller is configured to have information at time t(n) about the data traffic workload of the processing arrangement at time t(n+1). By triggering discharge of the super capacitor unit based on super capacitor data at time t(n+1), transients on a system bus voltage are, at least in part, smoothed out at time t(n+1), which reduces the need for reactive power of the power system, where said transients are related to the data traffic workload of the processing arrangement. The power efficiency of the power system can be improved by 3-4% by the reduction of the need for reactive power from a power grid, for which reason the electrical bill of an operator is reduced. 1. A method of controlling reactive power of a power system , the power system comprising a power supply unit , PSU , with a power input connected to a power grid , the PSU having a power output connected to a power input of a power distribution unit , PDU , that distributes power to a processing arrangement , whereby the power system serves the processing arrangement with power via the PDU , the processing arrangement having a data traffic workload , the power system further comprising a super capacitor unit being connected to the power output of the PSU , the method being performed by a controller connected to the processing arrangement , the PDU and the super capacitor unit , the controller being configured to schedule the data traffic workload of the processing arrangement , whereby the controller is configured to have information at time t(n) about the data traffic workload of the processing arrangement at a subsequent time t(n+1) , where the time t(n+1) is one time interval from , and next to , the time t(n) , the method comprising:obtaining at time t(n), information about data traffic workload to be ...

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Номер записи: 91
11-01-2018 дата публикации

Quasi-Resonant Plasma Voltage Generator

Номер: US20180014398A1
Автор: Buchanan Walter Riley, Forsee Grant William
Принадлежит:

Traditional plasma voltage generator circuits consist mainly of fly-back or pulse forming networks. These systems tend supply plasma generating pulses to plasma reactors at frequencies less than 30 kHz with most being less than 5 kHz. In addition these traditional plasma voltage generators are limited in the ability to adjust to dynamic reactor conditions, are energy inefficient and are limited in the amount of material ionized. An innovative drive system is presented herein that is energy efficient, can operate at frequencies below and well above 30 kHz, and can react to dynamic conditions in the plasma reactor allowing much greater flexibility and enhanced operating capabilities. 1. A method of generating a plasma voltage sufficient to initiate and sustain a plasma in a plasma reactor consisting of:a voltage supply capable of supplying a voltage to a transformer;a transformer consisting of at least one primary and one secondary winding; anda polarity sensitive device or circuit such as a blocking diode in series with the transformer and switch; anda switch capable of turning on and off and conducting current from the voltage supply and through the transformer and polarity sensitive device; anda phase detector capable of detecting a rising voltage on the switch side of the transformer; anda zero cross detection circuit; anda switch driver capable of turning on and off the switch as directed by the phase detector and zero cross detector; and2. The method of claim 1 , further comprising of a duty cycle controller capable of signaling the switch driver when to initiate and stop an operation cycle and control the number of on cycles and relaxation time.3. The method in claim 1 , further comprising an impedance matching network in parallel with claim 1 , in series parallel with claim 1 , or in series with the plasma reactor.4. The method of where the zero cross detector is replaced with a timing circuit to provide the turn off timing to the switch driver.5. The method ...

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Номер записи: 92
09-01-2020 дата публикации

CONTROL OF A POWER TRANSISTOR WITH A DRIVE CIRCUIT

Номер: US20200014192A1
Автор: BARAGUR SURYANARAYANA Dattatreya, Gupta Vishal, RAMACHANDRAN Bhaskar
Принадлежит:

A system includes a first transistor having a first control input and first and second current terminals. The first current terminal couples to an input voltage node. A second transistor has a second control input and third and fourth current terminals. The third current terminal couples to the second current terminal at a first node. The fourth current terminal couples to an output voltage node. A drive circuit is configured to charge a capacitor maintain the first transistor in an off state responsive to a negative voltage on the input voltage node, and, responsive to a negative voltage on the input voltage node, to cause the charge from the capacitor to be used to turn off the first transistor. The system provides a voltage to a load coupled to the output voltage node. 1. A circuit , comprising:a first transistor having a first control input and first and second current terminals, the first current terminal coupled to an input voltage node;a second transistor having a second control input and third and fourth current terminals, the third current terminal coupled to the second current terminal at a first node, and the fourth current terminal coupled to an output voltage node;a third transistor having a third control input and fifth and sixth current terminals, the fifth current terminal coupled to the first control input, and the sixth current terminal coupled to the first current terminal; anda comparator having first and second comparator inputs, the first comparator input coupled to the output voltage node, and the second comparator input coupled to a bias voltage node configured to be biased at a voltage greater than an input voltage on the input voltage node, the comparator having an output configured to control a power state of the third transistor.2. The circuit of claim 1 , further comprising:a capacitor having first and second capacitor terminals;a current source device coupled between the first node and the first capacitor terminal; anda first resistor ...

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Номер записи: 93
09-01-2020 дата публикации

BATTERY MODULE WITH ACTIVE CELL BALANCING USING ENERGY STORAGE ELEMENT AND TWO TIERS OF SWITCHES

Номер: US20200014219A1
Автор: Kim Theodore T., Nitz Larry T., Thomson Tamara R., Wang Fang, WANG TAO
Принадлежит: GM GLOBAL TECHNOLOGY OPERATIONS LLC

A battery system includes a battery module, an active cell balancing circuit, and a battery controller. Each cell has diametrically-opposed positive and negative cell tabs. The circuit includes voltage sensors and, at each end of the battery module, first and second tiers of switches and an energy storage element. Each voltage sensor is located between a different pair of adjacent cells. The controller receives measured voltages from the sensors indicative of an electric potential between adjacent battery cells. Responsive to the measured voltages, the controller commands the first tier to selectively connect or disconnect designated pairs of cells to the corresponding second tier. The controller also commands the second tier to selectively connect or disconnect the designated cells to a corresponding energy storage element. This action shuttles energy between the designated pairs of battery cells to balance a state of charge. 1. A battery system comprising:a battery module having a first end, a second end, and a string of battery cells, wherein each respective battery cell of the string has diametrically-opposed positive and negative cell tabs;an active cell balancing circuit including a plurality of voltage sensors and, at each of the first and second ends of the battery module: first and second tiers of switches, and an energy storage element, wherein each respective voltage sensor of the plurality of voltage sensors is respectively located between a different pair of adjacent battery cells of the string; anda battery controller configured to receive measured voltages from the voltage sensors indicative of an electric potential between each pair of the different pairs of adjacent battery cells; responsive to the measured voltages, to command the first tier of switches at the first or second ends to selectively connect or disconnect designated pairs of the battery cells to the second tier of switches at a corresponding one of the first or second ends; and command ...

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Номер записи: 94
19-01-2017 дата публикации

Switching Arrangement for Discharging an Energy Storage Device of a Motor Vehicle

Номер: US20170015261A1
Автор: John Dennis, MÜLLER Anton
Принадлежит:

A switching arrangement for discharging an energy storage device of a motor vehicle including an energy storage device that stores electrical energy and supplies an electrical machine of a motor vehicle, a discharging circuit having a discharging resistor, a voltage comparison element and an activation switching device. The activation switching device starts discharging the energy storage device via the discharging resistor at the end of a delay period after the motor vehicle has been switched off. The voltage comparison element compares the prevailing voltage of an energy storage voltage and a voltage threshold value and terminates the procedure of discharging the energy storage device if the prevailing voltage of the energy storage device is less than or equal to the voltage threshold value. 1. A switching arrangement for discharging an energy storage device of a motor vehicle that stores electrical energy and is provided to supply an electrical machine of the motor vehicle , comprising:a discharging resistor;a voltage comparison element configured to compare a prevailing voltage of an energy storage device against a voltage threshold value and to terminate discharging the energy storage device when the prevailing voltage of the energy storage device is less than or equal to the voltage threshold value; andan activation switching device configured to one of:start a procedure to discharge the energy storage device by the discharging resistor at an end of a delay period that begins after the motor vehicle has been switched off orbe triggered at the end of the delay period to start the procedure of discharging the energy storage device by way of the discharging resistor.2. The switching arrangement as claimed in claim 1 , wherein the voltage comparison element is configured as a passive voltage comparator circuit that is closed if the prevailing voltage of the energy storage device is greater than the voltage threshold value claim 1 , and is open if the prevailing ...

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Номер записи: 95
19-01-2017 дата публикации

LIGHT-RAY DETECTION CIRCUIT

Номер: US20170016765A1
Автор: MAILLART Patrick
Принадлежит: SOCIETE FRANCAISE DE DETECTEURS INFRAROUGES - SOFRADIR

The circuit of detection of light radiation includes a photodetector. The photodetector is coupled to three capacitors by way of three switches. The capacitors are parallel mounted to form a capacitive load whose value of electrical capacity changes as a function of the openings/closures of the switches. This configuration allows to stabilise the voltage present on the output terminal in the detection circuit for a wider range of illumination sustained by photodetector. 111-. (canceled)12. Detection device , comprisinga photodetector,a biasing circuit configured to bias the photodetector,an integration capacitive load configured to store electrical charges emitted by the photodetector,an output terminal coupled to the integration capacitive load and designed to be connected to a processing circuit,wherein the integration capacitive load is configured to present different values of electrical capacity, the integration capacitive load comprising:at least first and second transit lines branch mounted between the photodetector and the output terminal, the first transit line including first and second switches mounted in series, the second transit line comprising third and switches mounted in series,a first capacitor having a first electrode connected between the first and second switches and a second electrode connected to a first source of predefined voltage,a second capacitor having a first electrode connected between the third and fourth switches and a second electrode connected to a second source of predefined voltage,a third capacitor mounted in series with an additional switch between a third source of predefined voltage and a connection between the first switch and the third switch,a circuitry configured to reset independently the first capacitor, the second capacitor and the third capacitor.13. Detection device according to claim 12 , wherein the first source of predefined voltage claim 12 , the second source of predefined voltage and the third source of ...

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Номер записи: 96
19-01-2017 дата публикации

THERMOSTAT UNIT AND ASSOCIATED SYSTEM AND METHOD

Номер: US20170017247A1
Автор: FASSIER Martin, PÉPIN Patrick
Принадлежит:

The present invention relates to a thermostat system, to a thermostat unit, as well as to a method for managing power supply in a thermostat unit. A thermostat unit is connected between a power supply and a resistive heating element. Input power is received at the thermostat unit. A temperature difference is calculated between a target temperature and a current temperature. The input power is controlled by operating a power supply module between a heating mode wherein in the input power is channeled to the output port for feeding the resistive heating element based on the temperature difference and a regenerative mode wherein the input power is channeled to an energy storage device for charging said energy storage device in order to supply power therefrom to electronic components of the thermostat unit. 1. A method for managing power supply in a thermostat unit connected between a power supply and a resistive heating element , the method comprising:a) receiving, via an input port, input power from a power supply;b) providing a target temperature and a current temperature;c) calculating, by means of a calculator, a temperature difference between the current temperature and the target temperature;d) controlling the input power by operating a power supply module between a heating mode wherein in the input power is channeled to the output port for feeding the resistive heating element based on the temperature difference and a regenerative mode wherein the input power is channeled to an energy storage device for charging said energy storage device in order to supply power therefrom to electronic components of the thermostat unit.2. The method according to claim 1 , wherein the controlling step (d) comprises operating the power supply module in the heating mode during a heating period and operating the power supply module in the regenerative mode during a regenerative period.34.-. (canceled)5. The method according to claim 2 , further comprising after step (c) claim 2 , ...

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Номер записи: 97
21-01-2016 дата публикации

Plasma generation device, method of controlling characteristic of plasma, and substrate processing device using same

Номер: US20160020073A1
Автор: Han Saem Lee, Hee Sun Chae, Hyun Jun Kim, Jeong Hee CHO, Jong Sik LEE
Принадлежит: PSK Inc

Provided are a plasma generation device, a method of controlling a characteristic of plasma, and a substrate processing device using the same. The plasma generation device includes a first radio frequency (RF) power supply supplying a first RF signal; a chamber supplying a space in which plasma is generated; a plasma source installed at the chamber, wherein the plasma source receives the first RF signal and generates plasma; a second RF power supply supplying a second RF signal; a direct current (DC) bias power supply supplying a DC bias signal; and an electrode arranged in the chamber, wherein the electrode receives an overlap signal obtained by overlapping the second RF signal and the DC bias signal and controls a characteristic of the plasma.

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Номер записи: 98
21-01-2016 дата публикации

MODULAR MULTILEVEL CONVERTER FOR HYBRID ENERGY STORAGE

Номер: US20160020628A1
Автор: Guo Feng, Sharma Ratnesh
Принадлежит:

A modular multilevel converter for hybrid energy storage includes a battery. Three phases are connected in serial to the battery and in parallel to one another, each phase having two arms of sub-modules and buffer inductors. Each of the sub-modules includes a half-bridge and an ultracapacitor. A control module is configured to control the battery output power and ultracapacitor output power independently.

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Номер записи: 99
21-01-2021 дата публикации

COMPRESSED AIR ENERGY STORAGE POWER GENERATION APPARATUS

Номер: US20210017905A1
Автор: MATSUKUMA Masaki, NAGAHIRA Ayaka
Принадлежит: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)

A compressed air energy storage power generation apparatus includes a power demand receiving unit that receives a power demand value of a consumer facility. The apparatus includes a first air supply valve that adjusts a flow rate of compressed air to be supplied from a low-pressure tank to an expander, a second air supply valve that adjusts a flow rate of compressed air to be supplied from a high-pressure tank to the expander, and a control device configured to open the first air supply valve according to the power demand value in a state where the second air supply valve is closed when the power demand value is less than a predetermined threshold, and to open the second air supply valve according to the power demand value when the power demand value is equal to or greater than the predetermined threshold. 1. A compressed air energy storage power generation apparatus configured to store input power in a form of compressed air , generate power by using the compressed air as necessary , and supply power to a consumer facility , the compressed air energy storage power generation apparatus comprising:a power demand receiving unit that receives a power demand value of the consumer facility;an electric motor that is driven by the input power;a first compressor that is driven by the electric motor;a first accumulation unit and a second accumulation unit that store the compressed air compressed by the first compressor;an expander that is driven by the compressed air supplied from the first accumulation unit or the second accumulation unit;a generator that is driven by the expander;a first air supply valve that adjusts a flow rate of the compressed air to be supplied from the first accumulation unit to the expander;a second air supply valve that adjusts a flow rate of the compressed air to be supplied from the second accumulation unit to the expander; anda control device configured to open the first air supply valve according to the power demand value in a state where the ...

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Номер записи: 100