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Mixtures for Producing Chlorine Dioxide Gas In Enclosures and Methods of Making The Same

Номер патента: US20140193522A1
Опубликовано: 10-07-2014
Автор(ы): Isaac Thomas L., Tenney Joel D.
Принадлежит: ICA TriNova, LLC
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Etching composition and method of manufacturing integrated circuits using the same

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Catalysts for the oxidation of ethane to acetic acid and ethylene, methods of making and using the same

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Phosphite-borane compounds, and method of making and using the same

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Silica-based matting formulations and methods of making and using the same

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Abrasive particles, abrasive articles, and methods of making and using the same

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