PHOTOMASK FOR PRODUCING LIGHT-PENETRATING CONDUCTOR HAVING NANO-FIBER PATTERN AND METHOD FOR PRODUCING SAME

Embodiment of invention that the user determines to for a a based lacking the invention relates to the embodiment. Such embodiment [...] invention is in the field of the invention a person with skill in the art is for embodiment in cladding gives the spherical content database for each consumer receives exemplary to various other as can be the guide hole, embodiment of the present invention is hereinafter not limited by lacking.

( [...] embodiment 1)

The present embodiment in [...], 1 also illustratively as shown in an, photomask (100) substrate (110) and light shielding layer (120) includes.

Photomask (100) has an optical exposure system that is using photolithography (photo lithography) (exposure system) on a substrate by processes fine electrode to form a pattern fine electrode pattern a pattern corresponding to the digital circulation promoted. formed on the. Wherein photomask (100) corresponding line width of a nanofiber has a critical dimension having pores therethrough used to electrode pattern is formed the recording operation..

Substrate (110) have the light shielding layer (120) or laminated coated with CMOS Image sensor having a self-circulation promoted.. Substrate (110) rigid (rigid) or soft (flexible) can be. Substrate (110) has light transmission. E.g., substrate (110) (glass) or a quartz glass but formed with a substance, such as, are not limited to. Substrate (110) has light transmission. E.g., substrate (110) which is illuminated by the exposure demultiplexer 90% light transmission or more reverse osmosis membranes can be can be.

Light shielding layer (120) a substrate (110) substrate from external as being formed on the (110) a spherical the substrate (110) 330 a shading circulation promoted. a layer. Light shielding layer (120) is substantially constant a thickness that is may have. The photomask (120) light comprises directing light through an can strictly control the set-ups in which precise fine electrode pattern is formed is enabled. Light shielding layer (120) is substantially constant which it is desired to have the thickness, but not limited to forming a layer and any if the may have even thickness. Light shielding layer (120) the in addition one of integrally is formed as a unitary cage body can be and are not limited to which a light-blocking layer to form a can be which is not single.

Light shielding layer (120) light-shielding mass. Light shielding layer (120) is formed a light shielding material may include a metal. E.g., light shielding layer (120) formed of a metal such as chromium the second device, are not limited to. Light-shielding the substrate (110) various on. may be coated with an anti-method. E.g., shielding material is required in a process by integrating deposition a substrate by (110) can be coated on.. E.g., light shielding layer (120) the chromium having a thickness of 100 nm to 50 nm can be formed testing.

Light shielding layer (120) (nano-fiber) of nanofibers are arranged in use to is connected to the nanotubes formed fiber network includes a pattern corresponding to the digital (network). Wherein nano fiber (poly (methyl methacrylate)) acetate, acrylates, methacrylates, an, polyacrylonitrile (poly (acrylonitrile)), polyvinyl pyrrolidone (poly (vinylpyrrolidone)), poly [...] fluoride (poly (vinylidene fluoride)), polylactic acid (poly (lactic acid)), polycaprolactone (poly (caprolactone)), polypropylene (polypropylene), polyurethane (polyurethane), polystyrene (polystyrene), polycarbonate (polycarbonate), polyethylene oxide (polyethylene oxide), polyethylene teraphthalate (polyethylene terephthalate), polyvinyl alcohol (polyvinyl alcohol), poly (9-vinyl fortified) (poly (9-vinylcarbazole)), nylon 6 (nylon6), nylon 6,6 (nylon6,6), polyacrylic acid (poly (acrylic acid)), polyethylene (polyethylene), chitosan (chitosan), collagen (collagen), cellulose (cellulose), fibrinogen (fibrinogen), metal component-containing sol-gel (Sol-gel), hyaluronic acid (hyaluronic acid), polyethylene glycol (polyethylene glycols), from the cross section of (poly (methacrylate)), polyvinyl acetate (polyvinyl acetate), poly [...] 8 880001447888 alcohol selected from the group consisting of and compound and may comprise an one. As such light shielding layer (120) is nanofibers are cross are arranged in use to the nanotubes formed fiber network includes a corresponding to a pattern, light shielding layer (120) for forming fiber each nanoparticle containing at corresponding to portion, producing a high degree, can be designed to be kept narrow such highly are coated with fine size of nano unit light-shielding properties and is used for maintaining a horizontal state of. Thus light shielding layer (120) from an elastic conductive high conductivities are formed of a material which is secure while simultaneously a high degree of light permeability corresponding to fiber network that can be a fine electrode pattern is formed is enabled.

Nanofiber the light shielding layer having low melting point than it is preferable that the. By is mounted on a board by fibers applies the stick out when the light shielding layer being affected by the deviation between the nanofiber on a substrate arranged easily and stably applied is enabled.

Furthermore, nanofiber has a molecular weight of 100,000 or more polymer material is is preferably not less. Is a fiber network is by. have an.

Nanofibers are cross are arranged in use to the nanotubes formed corresponding to fiber network the nanofibers are cross are arranged in use to, the network formed therefrom is single enclosure such network to correspond to a pattern that is circulation promoted.. Such a pattern, also illustratively as shown in an 2, plurality of body portion (121) are, plurality of intersection (122) are, and interposed part (123) comprises an ultra-are. Body portion (121) the nano fiber network of nanofibers numeral key corresponding to a portion, intersection (122) the body portion (121) are formed to cross, and a is speaking and a parts of the inclining faces, interposed part (123) a body portion (121) between circulation promoted. portion. Body portion (121) and a intersection (122) the light shielding layer (120) the outer substrate from (110) a spherical the substrate (110) is used for transmitting the light to which elements are, interposed part (123) the light shielding layer (120) the outer substrate from (110) a spherical the substrate (110) is for elements to permit light to transmit. Demultiplexer a substrate which is exposed using light which is illuminated by light shielding layer (120) the body part (121) and a intersection (122) has not in transmission, light shielding layer (120) by interposing portion (123) is in transmission, has, such light shielding layer (120) photomask having (100) has positive (positive) photomask (100) as body portion (121) and a intersection (122) having pores therethrough a pattern corresponds to the is especially electrode pattern is formed.

Substantial portions (121a, 121b, 121c, 121d) crossing portions (122a, 122b, 122c, 122d) part interposed therein (123a) are connected so as to includes a closure-based (closed system) (125) can be a. Is the main body with a predetermined (121) redundantly one another so as to thereby body portion (121) corresponding to current pattern parts in the improved reliability of the electrical connections between the electrode pattern to upgrade the practicability of the or the porous film of the diffused effectively preventing seamlessly of electrical connection is enabled. In addition other substantial portions (121e, 121f, 121g) and other cross portions (122e, 122f) not distinguished the inner and outer connected to an open-based (open system) (126) can be a. Interposed part (123) closed-based (125) formed by a closed based inclusions portion (123a) and an open-based (126) formed by an open based inclusions part (123b) can be decomposed into.. Closed-based (125) and an open-based (126) are separated from one another the may value contained in the response may be loaded with positioned adjacent the. In addition closed-based (125) internal open-based (126) is located-effect transistor or vice versa and open-based (126) in closed-based (125) may is positioned such that.

Body portion (121) the light shielding layer (120) of converving from one edge to the edge of the is continuously extended in a pattern are in in distal end is it is generally designated on a up/down. Is the main body with a predetermined (121) and a intersection (122) by light shielding layer (120) connected surely 2001 the decoration plate further comprises an body portion (121) having proximal and distal portions and such as a truncated portion is found for a viscosity difference of the liquids without light shielding layer by (120) of the connection pattern current corresponding to securing liability of portion and an end portion, and the static electricity from allows implementing the anti-jam protection is.

Body portion (121) width of w₁ the, also illustratively as shown in an 3, nano a fiber network is 60b input unit receives the instructions can be. Wherein, of the main body width w₁ the body portion (121) actual width or average means can be. E.g., body portion (121) width w₁ the 1x10² nm < w₁ ≤ 2.5x10³ nm can be in the range of approximately.

Body portion (121) the thickness of the can be 150 nm to 50 nm.

Body portion (121) a optical density of at least 2.0. Wherein, optical density (optical density) matrix is interior of the material from being incident into a cell or is one or more of an entry indicative of the extent to which powder. Optical density value log₁₀ (amount of light falling/ entering public life light intensity ) is defined.

Body portion (121) the length of the, 2 and 3 also illustratively as shown in an, nano a fiber network is 60b input unit receives the instructions can be formed. Wherein, body portion (121) the length of the body portion (121) actual length or average means can be. Such body portion (121) length of the d, a substrate when one S, 1x10² (micro m) ≤ d ≤ S range of (micro m) is preferably not less.

Body portion (121) the relation of the width and length of the security zone nanofiber the reference nano having an aspect ratio (aspect ratio) A (i.e., of nanofibers length ratio by dividing the average diameter of nanofibers) substantially entirely determined by a can be. E.g., the A having an aspect ratio nano 1x10² < A can be. Just, body portion (121) the relation of the width and length of the security zone are not limited to.

While, intersection (122) the, 3 and 4 also illustratively as shown in an, body portion (121) substantially equal to the thickness of may have. Is shade the light due to layer (120) pattern of monolith at predetermined intervals, intersection (122) corresponding to current pattern of portion body portion (121) corresponding to current of portion can be is formed with a unique thickness at, intersection (122) current corresponding to structure pattern portion is enabled.

Interposed part (123) but of varying the size and shape of the area of can be. E.g., interposed part (123) substantially the size and shape of the area of body portion (121) by the distance between can be determined. Such interposed part (123) in the area of how a fiber network is sized plant sterol, and thus constituting the dot inversion method can be adjustable, nano fiber network a photomask (100) formed by a third numerical map of a bus, which corresponds a non-woven fabric is covered electrode pattern can be constructed.

Light shielding layer (120) can be the pattern of the amorphous (amorphous). Pattern of amorphous and the light shielding layer (120) using fine electrode pattern is formed fine amorphous when structure in the electrode pattern that emit surface type of fine electrode pattern due to the repetition of a moire becomes visible stripe (moire) is enabled to prevent. Just, second layer is an amorphous pattern do not nanofibers are defined are arranged to cross, and a the nanotubes formed including a pattern corresponding to fiber network and unbreakable is. also if the.

( [...] embodiment 2)

The present embodiment in [...], also illustratively as shown in an 5, photomask (200) of light shielding layer (220) a photoresist (200) formed by current pattern for forming a layer is formed on contact has a terminal portion terminal parts light shielding layer (230) further comprises is characterised in that it has a. Terminal portion light shielding layer (230) light shielding layer (220) substrate from external as well as (210) a spherical the substrate (210) is used for transmitting the light to light-shielding layer which includes one selected from a terminal portion includes a pattern corresponding to the digital pattern.

The photomask (200) the light shielding layer (220) to form a fine electrode pattern formed by light shielding layer terminal portion (230) formed by forming material layer pattern are simultaneously contact has a terminal portion is enabled.

Terminal portion light shielding layer (230) the pattern of the light shielding layer (220) plurality light shielding part (227) respectively connected to a plurality of body portion (231) those between interposed part number 2 (233) includes, further, plurality light shielding part (227) is connected with a plurality of connections (232) including.

( [...] embodiment 3)

The present embodiment can be lacking an, also to 6 also illustratively as shown in an 8, photomask (300) substrate (310) formed on a light-blocking layer are arranged in use to cross nanofibers are the nanotubes formed fiber network comprises an ultra-a pattern corresponding to the digital. Such pattern a plurality of body portion (321) are, plurality of intersection (322) are, and interposed part (323) comprises an ultra-are. Body portion (321) the nano fiber network and an expanded metal, and the sections corresponding to of nanofibers, intersection (322) the body portion (321) are formed to cross, and a a part of the, interposed part (323) a body portion (321) is the portion between. Wherein, body portion (321) and a intersection (322) substrate from an external (310) a spherical the substrate (310) transmits it is established that the token at, interposed part (323) substrate from an external (310) a spherical the substrate (310) 330 20 is formed so as to. A substrate which is exposed using which is illuminated by demultiplexer body portion second layer is light (321) and a intersection (322) the transmitting and second layer is interposed part (323) has in transmission, is the first transfer unit transfers input data. Therefore such photomask having-shielding layer is formed (300) the negative (negative) photomask (300) as body portion (321) and a intersection (322) having pores therethrough a pattern corresponds to the is especially electrode pattern is formed.

Substantial portions (321a, 321b, 321c, 321d) crossing portions (322a, 322b, 322c, 322d) part interposed therein (323a) are connected so as to includes a closure-based (closed system) (325) can be a. In addition other substantial portions (321e, 321f, 321g) and other cross portions (322e, 322f) not distinguished the inner and outer connected to an open-based (open system) (326) can be a. Interposed part (323) closed-based (325) formed by a closed based inclusions part (323a) and an open-based (326) formed by an open based inclusions part (323b) .can be decomposed into. Closed-based (325) and an open-based (326) the being separated from one another may value contained in the response may be loaded with positioned adjacent the. In addition closed-based (325) internal open-based (326) based open-effect transistor or vice versa and is located (326) based closed in (325) may is positioned such that.

Body portion (321) width of w₂ the, also illustratively as shown in an 7, a fiber network is nano 60b input unit receives the instructions can be formed. Wherein, of the main body width w₂ a body portion (321) actual width or average means can be. E.g., body portion (321) width w₂ the 1x10² nm < w₂ ≤ 2.5x10³ nm can be in the range of approximately.

Body portion (321) can be the thickness of the 50 nm to 100 nm.

Body portion (121) a optical density of at least 2.0. Wherein, optical density (optical density) matrix is interior of the material from being incident into a cell or is one or more of an entry indicative of the extent to which powder. Optical density value log₁₀ (amount of light falling/ entering public life light intensity ) is defined.

Body portion (321) the length of the, also illustratively 6 and 7 as shown in an, nano a fiber network is 60b input unit receives the instructions can be formed. Wherein, body portion (321) the length of the body portion (321) actual length or average means can be. Such body portion (321) d length of the, a of one when S, 1x10² (micro m) ≤ d ≤ S range of (micro m) is preferably not less.

Body portion (321) nanofiber the relation of the width and length of the security zone the reference nano having an aspect ratio (aspect ratio) A (i.e., of nanofibers length ratio by dividing the average diameter of nanofibers) substantially entirely determined by a can be. E.g., the A having an aspect ratio nano 1x10² < A can be. Just, body portion (321) the relation of the width and length of the security zone are not limited to.

( [...] embodiment 4)

The present embodiment can be lacking an, 9d also to 9a also illustratively as shown in an, positive mask as an etch mask is disclosed method..

[...] in the present embodiment, first light transmissive substrate (410) on material (430) (also 9a) applying a. Wherein, light-shielding material (430) good light shielding properties such as chromium can be metal. Substrate (410) on material (430) applying a a spin coating, plating, coating layer is can be by various method. Furthermore, light-shielding material (430) so as to cross each other nanofibers are on ordered nanostructured fiber network (440) to form a nano-fiber manufactured by arranged the (also 9b).

Wherein nano fiber (poly (methyl methacrylate)) acetate, acrylates, methacrylates, an, polyacrylonitrile (poly (acrylonitrile)), polyvinyl pyrrolidone (poly (vinylpyrrolidone)), poly [...] fluoride (poly (vinylidene fluoride)), polylactic acid (poly (lactic acid)), polycaprolactone (poly (caprolactone)), polypropylene (polypropylene), polyurethane (polyurethane), polystyrene (polystyrene), polycarbonate (polycarbonate), polyethylene oxide (polyethylene oxide), polyethylene teraphthalate (polyethylene terephthalate), polyvinyl alcohol (polyvinyl alcohol), poly (9-vinyl fortified) (poly (9-vinylcarbazole)), nylon 6 (nylon6), nylon 6,6 (nylon6,6), polyacrylic acid (poly (acrylic acid)), polyethylene (polyethylene), chitosan (chitosan), collagen (collagen), cellulose (cellulose), fibrinogen (fibrinogen), metal component-containing sol-gel (Sol-gel), hyaluronic acid (hyaluronic acid), polyethylene glycol (polyethylene glycols), from the cross section of (poly (methacrylate)), polyvinyl acetate (polyvinyl acetate), poly [...] 8 880001447888 alcohol selected from the group consisting of and compound and may comprise an one.

Nanofiber the light shielding layer having low melting point than it is preferable that the. By is mounted on a board by fibers applies the stick out when the light shielding layer being affected by the deviation between the nanofiber on a substrate arranged easily and stably applied is enabled.

Furthermore, nanofiber has a molecular weight of 100,000 or more polymer material is is preferably not less. Is a fiber network is by. have an.

Nano fiber network (440) different method can be formed by. For example, electrospun (electrospinning) by fiber shield material (430) sprayed onto by vapor fiber network (440) can be a. Electric radiation, also illustratively as shown in an 11, low by means of electrostatic force (electrostatic force) (polymer) polymer state viscosity fiber instant of testing using radiation in the form is method fibers that the nanotubes. Electric radiation filled (charged) polymer jet solution (polymer jet solution) for producing to use an high voltage. A filled with solution jet polymer (charged) in order to obtain polymer fibers either dried solidified high viscosity is produced. Other electrode is adhered to a surface of a collector (collector) to solution to for coatings or similar spindle.

Nano fiber network other dots forming the meltblown in method is connected to the semiconductor layer. (melt blown) method. The meltblown method, also illustratively as shown in an 12, from a molten state to a fine polymer is of extruded from spinneret diameter of to prevent fall of the spinneret located next to a high speed from a slit vexed to cause by means of air in a high temperature before elongation of occurs a nano-fiber it became candle three angercandle three anger to be a collection, installed on front face spinneret fibers are stacked on the body sufficiently solidified provided on an inter-fibre state thermal is a web is formed by bonding.

Nanofiber forming a network is connected to the semiconductor layer. (spunbond) method spunbond in another method. Spunbond method the polymer by a process in which direct spinning continuous filaments, are arbitrarily arrange the laminate the web and a step for enhance the binding of the leaderless fiber form for stabilizing the. consists bonding process. And the raw materials used nylon, polyester, is thermoplastic polymer of polypropylene. Specifically, spinning process in a substantially constant spinners rubbed in the equal to subject the source material to smelting with a viscosity is fed into device filter after continuously through spinning nozzles is radiation filaments. Spinneret filaments emitted the chamber filament is moved to cooling chamber surface as it passes through the isochronous data enters the cooling airflow of the filaments across the molten filaments is solidified.

After nanofibers are light-shielding material (430) the stably applied on it is preferable that the through the steps of carrying out. A variety of process such attachment method may be brought about by.. E.g., light-shielding material a nanofiber arranged on on the material and a light-shielding network to be attached to a reflow applying heat for processing (reflow treatment) can. Arranged on material or light shielding property a nanofiber network is light-shielding on the material and a to be attached to a thermal on the state is pulled upper fiber network in lamination processing (lamination treatment) can. In this case heating roller (heating roller) and a pressure heated to such as device can concurrently. Arranged on material or light shielding property a nanofiber network is light-shielding on the material and a solvent to to be attached to steam (vapor) (solvent treatment) processing solvent exposing the can. This case solvent the nano-fibers couple whereof the type corresponding network preferably selectable. After, nano fiber network (440) of the etchant and by-through such scavenging light-shielding material (430) is caused to contact with the light-shielding material on (430) nano fiber network (440), forming a pattern that the corresponding to (also 9c). The etchant is injection device (470) nanostructures in fiber network (440) layer from (410) is is used for injecting. Light-shielding material (430) nano fiber network (440) a pattern corresponding to the digital then nanostructure fiber network (440) by abrading the light shielding layer (420) by forming a positive photomask (400) to complete is especially (also 9d).

Additionally, substrate (410) on, e.g., light shielding layer (420) a substrate corresponding to an external edge of (410) on layer (420) connected to light shielding layer contact has a terminal portion (not shown) being formed and can comprise of. Wherein terminal portion Mo and alnd photomask (400) to the cassette holder electrode pattern at the time of forming fine electrode pattern contact has a terminal portion is is at least two bodies separated pattern.

( [...] embodiment 5)

The present embodiment can be lacking an, 10c also to 10a also illustratively as shown in an, mask for forming a negative photoresist. is disclosed method.

The present embodiment can be lacking an, first light transmissive substrate (510) so as to cross each other nanofibers are on ordered nanostructured fiber network (540) to form a nano-fiber manufactured by arranged the (also 10a). Nano fiber network (540) different method can be formed by. E.g., by substrate fibers electrospun (electrospinning) (510) sprayed onto by vapor fiber network (540) can be a. After nanofibers are substrate (510) provide a stable transfer of a reflow to be attached can be-(reflow). Furthermore, nano fiber network (540) so as to cover the IC chip substrate (510) the light shielding material (530) (also 10b) applying a. Light-shielding material (530) error based exposure, such as chromium capable of intercepting use an material. Light-shielding material (530) application of a spin coating, printing, be at 500 variety of deposition method. After, nano fiber network (540) a substrate (510) by vapor fiber network separated from (540), forming a pattern that having an opening corresponding to a shielding layer (520) is to form a (also 10c). The negative photoresist mask (500) is is unlikely to complete to.

( [...] embodiment 6)

The present embodiment by establishing an optical fiber at a [...] ink jet printed products produced by such a photomask is a light-transmissive electrically-conductive.

The present embodiment in [...], on light transmissive substrate first coated at the material. Wherein, light-shielding material such as chromium is a metal-light shielding properties can be. Substrate applying a material on a spin coating, plating, coating layer is can be by various method. Furthermore, light-shielding on the material and a [...][...] embodiment 1 to embodiment 3 for arranging a photomask one of. After exposure system through a mask source electrode and the drain electrode is then exposure of the light-shielding material, and the etching process is formed on a photomask by corresponding to pattern fiber network having.-shielding layer is formed.

Is by fiber network having corresponding to pattern shielding comprising a layer of a light-transmissive electrically-conductive it to produce is enabled. Such a light-transmissive electrically-conductive a may all be the same, pattern of nanofibers having a pattern corresponding to the digital network generated from a laser beam-shielding layer is formed, its optical permeable, electrical conductivity, such as visibility can be is maintained constant, and for reliable for mass production and which is convex at a partial outer, method in a very simple way light-transmissive electrically-conductive and a mis ball of a solder is particles can be evaluated.

Decodes a the present invention refers to drawing with reference to are [...] but described embodiment, is an exemplary which purpose: to avoid a, typically encountered in the present invention is in the field of the grow having knowledge of, various modifications from [...] such embodiment for other and equalization [...] enabling embodiment can store references to any number of. Thus the of the present invention scope of protection the idea by a claim is determined.