RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING COPOLYMER

A resist composition for immersion exposure including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing copolymer (C) containing a structural unit (c1) represented by general formula (c1-1) shown below. In the formula, R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group, Q1 represents a single bond or a divalent linking group, A represents an aromatic cyclic group that may have a substituent, Q2 represents a group in which one hydrogen atom has been removed from a monovalent hydrophilic group, R2 represents a base dissociable group, and a represents 1 or 2, provided that at least one among A and the a R2 groups contains a fluorine atom.