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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Применить Всего найдено 1058. Отображено 195.
10-02-2015 дата публикации

КОМПОЗИЦИИ И СПОСОБЫ ЛЕЧЕНИЯ НЕЙРОДЕГЕНЕРАТИВНЫХ ЗАБОЛЕВАНИЙ

Номер: RU2541430C2
Принадлежит: АКУСЕЛА ИНК. (US)

Настоящее изобретение относится к новым соединениям общей Формулы (А), их стереоизомерам или фармацевтически приемлемым солям, обладающим способностью ингибировать активность изомеразы, участвующей в зрительном цикле. Соединения ингибируют дегенерацию ретинальной клетки, в частности нейрональной клетки, такой как фоторецепторная клетка, в сетчатке пациента. Соединения могут найти применение для лечения офтальмологического заболевания или нарушения, такого как возрастная макулярная дегенерация или макулярная дистрофия Штаргардта. В общей формуле (А)Z представляет собой -С(R)(R)-C(R)(R)-; Rи Rкаждый, независимо друг от друга, является выбранным из водорода, галогена, С-Салкила, или -OR; или Rи Rвместе образуют оксо; Rи Rкаждый, независимо друг от друга, является выбранным из водорода; Rвыбран из а) С-Салкила, необязательно замещенного гидрокси, C-Cалкокси; или б) С-Скарбоциклилалкила, в котором карбоцикл является 4-, 5-, 6-, 7- или 8-членным неароматическим карбоциклом, необязательно замещенным ...

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20-01-2009 дата публикации

СПОСОБ ПОЛУЧЕНИЯ ХИРАЛЬНЫХ 1,4-ДИЗАМЕЩЕННЫХ ПИПЕРАЗИНОВ

Номер: RU2007125687A
Принадлежит: Уайт, Уайт (Us)

ÐÎÑÑÈÉÑÊÀß ÔÅÄÅÐÀÖÈß RU (19) (11) 2007 125 687 (13) A (51) ÌÏÊ C07D 319/18 (2006.01) ÔÅÄÅÐÀËÜÍÀß ÑËÓÆÁÀ ÏÎ ÈÍÒÅËËÅÊÒÓÀËÜÍÎÉ ÑÎÁÑÒÂÅÍÍÎÑÒÈ, ÏÀÒÅÍÒÀÌ È ÒÎÂÀÐÍÛÌ ÇÍÀÊÀÌ (12) ÇÀßÂÊÀ ÍÀ ÈÇÎÁÐÅÒÅÍÈÅ (21), (22) Çà âêà: 2007125687/04, 06.07.2007 (71) Çà âèòåëü(è): ÓÀÉÒ (US) (30) Êîíâåíöèîííûé ïðèîðèòåò: 12.03.2002 US 60/363,458 (43) Äàòà ïóáëèêàöèè çà âêè: 20.01.2009 Áþë. ¹ 2 (54) ÑÏÎÑÎÁ ÏÎËÓ×ÅÍÈß ÕÈÐÀËÜÍÛÕ 1,4-ÄÈÇÀÌÅÙÅÍÍÛÕ ÏÈÏÅÐÀÇÈÍΠãäå R è R' êàæäûé íåçàâèñèìî äðóã îò äðóãà ïðåäñòàâë åò ñîáîé Ñ1-Ñ3-àëêèëüíóþ ãðóïïó; Ar ïðåäñòàâë åò ñîáîé äèãèäðîáåíçîäèîêñèíèë, áåíçîäèîêñèíèë èëè ôåíèë, íåîá çàòåëüíî çàìåùåííûé äî òðåõêðàòíî çàìåñòèòåë ìè, íåçàâèñèìî äðóã îò äðóãà âûáðàííûìè èç ãàëîãåíà, ìåòîêñè, ãàëîãåíìåòèëà, äèãàëîãåíìåòèëà è òðèãàëîãåíìåòèëà; âêëþ÷àþùèé âçàèìîäåéñòâèå ñîåäèíåíè ôîðìóëû Ia R U ãäå R' èìååò îïðåäåëåííûå âûøå çíà÷åíè è ñîåäèíåíè ôîðìóëû Ib ñ ïîëó÷åíèåì ñîåäèíåíè ôîðìóëû II Ñòðàíèöà: 1 RU A 2 0 0 7 1 2 5 6 8 7 A (57) Ôîðìóëà èçîáðåòåíè 1. Ñïîñîá ñòåðåîñåëåêòèâíîãî ïîëó÷åíè ñîåäèíåíè ôîðìóëû III 2 0 0 7 1 2 5 6 8 7 Àäðåñ äë ïåðåïèñêè: 129010, Ìîñêâà, óë. Á.Ñïàññêà , 25, ñòð.3, ÎÎÎ "Þðèäè÷åñêà ôèðìà Ãîðîäèññêèé è Ïàðòíåðû", ïàò.ïîâ. À.Â.Ìèö R U (62) Íîìåð è äàòà ïîäà÷è ïåðâîíà÷àëüíîé çà âêè, èç êîòîðîé äàííà çà âêà âûäåëåíà: 2004130313 11.10.2004 (72) Àâòîð(û): ÄÆÈÐÊÎÂÑÊÈ Èâî (US), ÇÅËÄÈÑ Äæîçåô (US), ÔÅÉÃÅËÜÑÎÍ Ãðåãã Áðàéàí (US) ãäå R' èìååò îïðåäåëåííûå âûøå çíà÷åíè , è äàëüíåéøåå âçàèìîäåéñòâèå ñîåäèíåíè ôîðìóëû II ñ àðèëàìèíîì Ar-NH2, ãäå Ar èìååò îïðåäåëåííûå âûøå çíà÷åíè , ñ ïîëó÷åíèåì ñîåäèíåíè ôîðìóëû III. 2. Ñïîñîá ïî ï.1, ãäå óêàçàííûé ñïîñîá îñóùåñòâë þò â âèäå ïîñëåäîâàòåëüíîãî ïðîöåññà áåç âûäåëåíè ñîåäèíåíè ôîðìóëû II. 3. Ñïîñîá ïî ï.1 èëè 2, ãäå ñîåäèíåíèå ôîðìóëû III ïðåäñòàâë åò ñîáîé ïî ñóùåñòâó ÷èñòûé S-ýíàíòèîìåð. 4. Ñïîñîá ïîëó÷åíè ñîåäèíåíè ôîðìóëû IV A 2 0 0 7 1 2 5 6 8 7 A R U ãäå Õ ïðåäñòàâë åò ñîáîé ïðèãîäíóþ óäàë åìóþ ãðóïïó, íåçàâèñèìî âûáðàííóþ èç ãðóïïû, âêëþ÷àþùåé áðîì, õëîð, ìåòàíñóëüôîíèëîêñè, ï-òîëóîëñóëüôîíèëîêñè è ...

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10-09-2009 дата публикации

ПЕРФТОРАЛКАНСУЛЬФОНАТ КАЛИЯ И СПОСОБ ЕГО ПОЛУЧЕНИЯ

Номер: RU2008107984A
Принадлежит:

... 1. Способ получения перфторалкансульфоната калия, включающий: ! электрохимическое фторирование в безводном фтористом водороде алкансульфонилгалогенидного соединения, представленного общей формулой: CnH2n+1SO2X, в которой n представляет собой целое число от 1 до 3, и X представляет собой Cl или F, чтобы таким образом получить газ, содержащий, в качестве основного компонента, перфторалкансульфонилфторид, представленной общей формулой: CnF2n+1SO2F, в которой n представляет собой целое число от 1 до 3, (стадия электрохимического фторирования); ! взаимодействие полученного газа с водным раствором гидроксида калия, чтобы таким образом получить абсорбировавший газ раствор, содержащий перфторалкансульфонат калия, представленный общей формулой: CnF2n+1SO3K, в которой n представляет собой целое число от 1 до 3, (стадия абсорбции газа); ! удаление фторида калия, гидроксида калия и сульфата калия, которые представляют собой примеси, содержащиеся в абсорбировавшем газ растворе, (стадия очистки); и !

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12-11-2008 дата публикации

Alkoxy compounds for disease treatment

Номер: GB0000818175D0
Автор:
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13-01-2011 дата публикации

CYCLIC TRIAZO SODIUM CHANNEL BLOCKERS

Номер: CA0002767296A1
Принадлежит:

The present invention relates to triazine compounds having sodium channel blocking properties, and to use of the compounds for preparation of medicaments for treatment of associated disorders. The compounds are of formula (I): in which z is a single bond or an optionally substituted linking group, R1 is a halo-alkyl group; and A is an optionally substituted aromatic heterocyclic or carbocyclic ring system; or a salt thereof.

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21-09-1995 дата публикации

CARBANILIDE ANTICOCCIDIALS

Номер: CA0002184921A1
Принадлежит:

The present invention is directed to anticoccidial methods, animal feed premixes, and animal feeds, employing a specified carbanilide compound. The present invention is also directed to anticoccidial methods, animal feed premixes, and animal feeds employing the specified carbanilide compound and a polyether antibiotic.

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22-02-2017 дата публикации

Ionic liquid, lubricant, and magnetic recording medium

Номер: CN0106459800A
Принадлежит:

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03-04-2018 дата публикации

Based on the sulfonate compound and its preparation method

Номер: CN0106414400B
Автор:
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16-12-2005 дата публикации

New fluorinated polymer products useful for the polymerization of fluorinated vinyl monomers such as e.g. tetrafluoroethylene, fluorinated vinylidene, hexafluoropropane and their copolymers

Номер: FR0002871461A1
Принадлежит:

La présente invention concerne un procédé de préparation d'un polymère fluoré par polymérisation d'une dispersion aqueuse d'au moins un monomère fluoré cette dispersion contenant en outre un tensioactif fluoré, un initiateur radicalaire (ou amorçeur), éventuellement un agent de transfert et éventuellement une paraffine dans lequel le tensioactif fluoré est choisi parmi un ou plusieurs des produits suivants : Rf(CH2CF2)m-1-(CH2)nCO2M [1] Rf(CH2CF2)mSO2M [2] Rf(CH2CF2)m(CH2)nSO3M [3] dans lesquels : Rf est un groupement perfluoroalkyl linéaire ou ramifié comportant de 1 à 5 atomes de carbone, de préférence de 2 à 4, m est un nombre entier de 2 à 6, n est un nombre entier de 0 à 2 n' est 0 ou 2, M est un atome d'hydrogène ou de métal alcalin ou un groupe ammonium ou un groupe ammonium comportant au moins un substituant alkyl inférieur. A titre d'exemple le procédé de l'invention est utile pour la polymérisation des monomères vinyliques fluorés tels que par exemple le tétrafluoroéthylène C2F4 ...

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17-01-2007 дата публикации

Radiation-sensitive composition of chemical amplification type comprising onium salt-based acid generators

Номер: KR0100668470B1
Автор:
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06-11-2017 дата публикации

감방사선성 조성물 및 신규 화합물

Номер: KR0101794385B1
Автор: 마루야마, 겐
Принадлежит: 제이에스알 가부시끼가이샤

... 본 발명의 목적은 KrF 엑시머 레이저, ArF 엑시머 레이저, EUV 등의 (극)원자외선, 싱크로트론 방사선 등의 X선, 전자선에 유효하게 감응하며, 나노 엣지 러프니스, 감도 및 해상도가 우수하고, 미세 패턴을 고정밀도이면서 안정적으로 형성할 수 있는 화학 증폭형 포지티브형 레지스트막을 성막할 수 있는 감방사선성 조성물 등을 제공하는 것이다. 본 발명의 감방사선성 조성물은 하기 화학식 (1)로 나타내는 산발생제와 용제를 함유한다. 〔화학식에서, R0은 서로 독립적으로 수소 원자, 불소 원자, 또는 치환 또는 비치환의 1가의 유기기를 나타내고, R1은 불소 원자, 또는 치환 또는 비치환의 1가의 유기기를 나타내고, Rf 또는 R2와 서로 결합하여 환상 구조를 형성할 수도 있고, R2는 불소 원자, 또는 치환 또는 비치환의 1가의 유기기를 나타내고, Rf는 플루오로메틸렌기 또는 2가의 플루오로알킬렌기를 나타내고, M+는 1가의 오늄 양이온을 나타냄〕 ...

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25-10-2011 дата публикации

Spirocyclic cyclohexane derivatives

Номер: KR0101075810B1
Автор:
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25-01-2011 дата публикации

REACTIVE IONIC LIQUIDS

Номер: KR1020110008091A
Автор:
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22-02-2008 дата публикации

MANUFACTURE OF HYDROFLUOROALKANESULFONIC ACIDS

Номер: KR1020080016938A
Принадлежит:

A process for manufacture of hydrofluoroalkanesulfonic acid with at least one hydrogen bonded to the carbon atom adjacent to the carbon atom bonded to the sulfonic acid group comprising: contacting a fluoroolefin with sulfite in an aqueous solution adjusted to about pH 4 to pH 12; removing water from the solution to form a solid; directly treating the solid with oleum; and distilling the hydrofluoroalkanesulfonic acid therefrom. Also a process for manufacture of potassium hydrofluoroalkanesulfonate in high purity is described. © KIPO & WIPO 2008 ...

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16-11-2012 дата публикации

Salt, resist composition and method for producing resist pattern

Номер: TW0201245172A
Принадлежит:

A salt represented by the formula (I) and a resist composition containing the salt are provided, wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; L1 represents *-CO-O-La- or *-CH2-O-Lb-, * represents a bond to -CQ1Q2, La and Lb independently represent a C1 to C15 divalent saturated aliphatic hydrocarbon group, and one or more -CH2- contained in the divalent saturated aliphatic hydrocarbon group may be replaced by -O- or -CO-; ring W1 represents a C2 to C36 heterocyclic ring, and one or more -CH2- contained in the heterocyclic ring may be replaced by -O-; Re1, Re2, Re3, Re4, Re5, Re6, Re7, Re8, Re9, Re10, Re11, Re12 and Re13 independently represent a hydrogen atom, a halogen atom, a hydroxy group, a C1 to C12 hydrocarbon group or carboxyl group, or two of Re1, Re2, Re3, Re4, Re5, Re6, Re7, Re8, Re9, Re10, Re11, Re12 and Re13 bonded to adjacent carbon atoms may form a ring together with two carbon atoms bonded thereto, and one or more -CH2- contained ...

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01-05-2016 дата публикации

Salt, acid generator, resist composition and method for producing resist pattern

Номер: TW0201615633A
Принадлежит:

A salt having a group represented by formula (a): wherein Xa and Xb each independently represent an oxygen atom or a sulfur atom, X1 represents a divalent group having an alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and where a hydrogen atom may be replaced by a hydroxy group or a fluorine atom, and * represents a binding site.

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01-06-2018 дата публикации

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation- sensitive film, method for forming pattern and onium salt compound

Номер: TW0201820038A
Принадлежит:

Provided is an actinic-ray- or radiation-sensitive resin composition, including a resin (A) and a compound (B) represented by general formula (I). In general formula (I), Rf represents a fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z is a moiety that includes an onium cation, and represents a moiety that is converted to an imidic acid group or a methide acid group when exposed to actinic rays or radiation.

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21-02-2019 дата публикации

Process for fluorinating sulfonyl halide compounds

Номер: TWI651294B
Принадлежит: RHODIA OPERATIONS

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24-05-2007 дата публикации

PHOTOACTIVE COMPOUNDS

Номер: WO000002007057773A2
Принадлежит:

The present invention relates to novel photoacid generators.

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20-11-2008 дата публикации

PREPARATION AND PURIFICATION OF IONIC LIQUIDS AND PRECURSORS

Номер: WO000002008140496A3
Принадлежит:

Substantially pure ionic liquids and ionic liquid precursors were prepared. The substantially pure ionic liquid precursors were used to prepare substantially pure ionic liquids.

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01-11-2007 дата публикации

PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS

Номер: WO000002007124092A3
Принадлежит:

The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.

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20-06-1995 дата публикации

Method for the preparation of iodonium salts

Номер: US0005426222A
Автор:
Принадлежит:

The present invention relates to an improved method for the preparation of iodonium salts. More specifically, the present invention relates to an improved method for the production of symmetric or asymmetric diaryliodonium triflate (trifluoromethane sulfonate) salts. The diaryliodonium salts of the present invention are useful as photoacid catalysts for use in acid-sensitive polymerization and in curing systems such as radiation curable release coating compositions.

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01-10-2019 дата публикации

Antireflective compositions with thermal acid generators

Номер: US0010429737B2

New methods and substrates are provided that include antireflective compositions that comprise one or more thermal acid generators.

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04-05-2021 дата публикации

Non-aqueous electrolyte magnesium secondary battery

Номер: US0010998574B2

This invention provides a non-aqueous electrolyte magnesium secondary battery comprising a positive electrode, a negative electrode, a separator, and a non-aqueous electrolyte, the non-aqueous electrolyte comprising [N(SO2CF3)2]− as an anion, and Mg2+ and/or an organic onium cation as a cation.

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08-07-2015 дата публикации

感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法

Номер: JP0005746818B2
Принадлежит:

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02-07-2014 дата публикации

Номер: JP0005539821B2
Автор:
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10-05-2009 дата публикации

СПИРОЦИКЛИЧЕСКИЕ ПРОИЗВОДНЫЕ ЦИКЛОГЕКСАНА

Номер: RU2354656C2
Принадлежит: ГРЮНЕНТАЛЬ ГМБХ (DE)

Изобретение относится к новым спироциклическим производным циклогексана общей формулы I в которой R1-R3, R5-R10, W, X раскрыты в пункте 1 формулы. Соединения (I) проявляют анальгетическую активность, что позволяет использовать их для получения лекарственного средства, предназначенного для лечения боли. Описаны способы их получения. 7 н. и 13 з.п. ф-лы, 2 табл.

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29-01-1981 дата публикации

Номер: DE0001967117C3
Принадлежит: FA. UGINE KUHLMANN, PARIS

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09-04-2008 дата публикации

Chemically amplified resist composition

Номер: GB0000804142D0
Автор:
Принадлежит:

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16-08-1967 дата публикации

Phenoxy alkanoic acids

Номер: GB0001079496A
Автор:
Принадлежит:

Novel compounds of the Formula II, wherein R represents a hydrogen atom or an alkyl, trifluoromethyl-C1- 5 alkyl, aryl, aralkyl, cycloalkyl, alkylcycloalkyl, phenoxy, phenylthioalkyl, alkylphenoxy, phenylalkylthio or halophenylalkyl radical; each R1 represents a C1- 5 alkyl radical or the two symbols R1, together with the nitrogen atom to which they are attached, represent a 1-pyrrolidinyl, piperidino or morpholino radical; R2 represents a C1- 5 alkyl or benzyl radical; X represents a hydrogen or halogen atom or C1- 5 alkyl, C1- 5 alkoxy, trifluoromethyl or nitro radical or, taken together, two Xs on adjacent carbon atoms of the benzene ring may represent a 1,3-butadienylene chain; A represent a non-toxic; pharmacologically acceptable anion; m represents 1 or 2 and n represents an integer of from 1 to 5, are prepared by reacting compounds of the Formula IV with quaternizing agents of the formula AR2 wherein A represents the radical corresponding to the anion A-. Amines of the Formula IV ...

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15-12-2009 дата публикации

HEPTAFLUOR-2-PROPANSULFONATSALZE AND YOUR USE IN ELECTRO-TECHNOLOGY

Номер: AT0000450500T
Принадлежит:

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17-09-1998 дата публикации

Improved method for the preparation of iodonium salts

Номер: AU0000696642B2
Принадлежит:

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26-04-1991 дата публикации

PROCESS FOR THE PREPARATION OF OPTICALLY ACTIVE 3-THIOLANYL SULFONATE ESTERS

Номер: AU0000609348B2
Принадлежит:

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25-09-2003 дата публикации

PROCESS FOR MAKING CHIRAL 1,4-DISUBSTITUTED PIPERAZINES

Номер: CA0002477906A1
Принадлежит:

A process for a stereoselective preparation of novel chiral nitrogen mustard derivatives useful in synthesizing optically active 1,4-disubstituted piperazines of formula (I) wherein R, Ar, and Q are defined as set forth herein, and intermediate compounds therefor. The 1,4-disubstituted piperazines act as 5HT1A receptor binding agents useful in the treatment of Central Nervous System (CNS) disorders.

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25-07-2007 дата публикации

СПОСІБ ОДЕРЖАННЯ ХІРАЛЬНИХ 1,4-ДИЗАМІЩЕНИХ ПІПЕРАЗИНІВ, ПРОМІЖНА СПОЛУКА (ВАРІАНТИ)

Номер: UA0000079774C2
Принадлежит: УАЙТ, US, УАЙТ, US

Спосіб стереоселективного отримання нових хіральних похідних азотистих іпритів, придатних для синтезу оптично активних 1, 4-дизаміщених піперазинів формули (І), де R, Аr і Q приймають значення, визначені в описі, і їх проміжних продуктів. 1,4-дизаміщені піперазини діють як засоби, що зв'язують 5НТ1A-рецептори, і придатні для лікування розладів центральної нервової системи (CNS).

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27-07-1970 дата публикации

Polyfluorsulfonsaeuren and their derivatives

Номер: FR0001600425A
Автор:
Принадлежит:

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28-03-1997 дата публикации

PROCEEDED Of ACYLATION Of ONE COMPOSES AROMATIC

Номер: FR0002739098A1
Принадлежит:

La présente invention a pour objet un procédé d'acylation d'un composé aromatique. Plus particulièrement, l'invention a trait à un procédé d'acylation d'un composé aromatique activé ou désactivé. L'invention s'applique à la préparation de cétones aromatiques. Le procédé d'acylation d'un composé aromatique selon l'invention qui consiste à faire réagir ledit composé aromatique avec un agent d'acylation, en présence d'un catalyseur est caractérisé par le fait que l'on conduit la réaction d'acylation en présence d'une quantité efficace de triflate de bismuth.

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08-04-2008 дата публикации

POTASSIUM PERFLUOROALKANESULFONATES AND PROCESS FOR PRODUCTION THEREOF

Номер: KR1020080031506A
Принадлежит:

A process for the production of potassium perfluoroalkane-sulfonates which comprises the electrolytic fluorination step of electrofluorinating an alkanesulfonyl halide in anhydrous hydrofluoric acid to obtain a gas containing a perfluoro-alkanesulfonyl fluoride as the main component. The process may further comprise the gas absorption step of reacting the gas with an aqueous solution of potassium hydroxide to form a solution containing a potassium perfluoroalkanesulfonate, the purification step of removing contaminant potassium fluoride, potassium hydroxide and potassium sulfate from the solution, and the concentration/recovery step of subjecting the purified aqueous solution to concentration and drying. In the electrolytic fluorination, the formation of by-products can be inhibited by keeping the proton concentration of the electrolytic solution within the range of 150 to 1500ppm. © KIPO & WIPO 2008 ...

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01-10-2019 дата публикации

Номер: TWI673258B

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09-06-2011 дата публикации

NON-HALOGEN ACTIVATING AGENT USED AS FLUX

Номер: WO2011066706A1
Автор: YI, Zongming, LIU, Yi
Принадлежит:

A non-halogen activating agent, which is the sulfonate formed by sulfonic acid reacting with an organic base,is provided as flux. The sulfonic acid can be alkyl sulfonic acid, alkyl disulfonic acid, hydroxyl sulfonic acid, halogenated sulfonic acid. The organic base can be organic amine, carbamidine, imidazole, phosphorus. The non-halogen activating agent used as flux has the advantage of high activity and low corrosion.

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18-10-2012 дата публикации

SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN

Номер: US20120264060A1
Принадлежит: SUMITOMO CHEMICAL COMPANY, LIMITED

A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 respectively represent a single bond or a C1-C6 divalent saturated alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 respectively represent a C3-C36 hydrocarbon ring, R1 and R2 respectively represent a hydrogen atom or C1-C6 alkyl group, R3 represents C1-C6 alkyl group, t represents an integer of 0 to 2 and Z+ represents an organic counter ion ...

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30-01-1996 дата публикации

Diaryliodonium fluoroalkyl sulfonate salts and a method of making

Номер: US0005488147A1

The present invention provides a convenient, simple, safe and efficient one-pot method for the synthesis of a number of diarlyiodonium triflate salts which does not involve sulfuric acid and which eliminates the need for any counter-ion exchange processes. The invention also provides a novel salt of the formula см. иллюстрацию в PDF-документе ...

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21-05-2019 дата публикации

Resist composition and patterning process

Номер: US0010295904B2

A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

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14-01-2010 дата публикации

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING SAME

Номер: US2010009288A1
Принадлежит:

An actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin that exhibits an increased solubility in an alkali developer when acted on by an acid, and (B) at least two types of sulfonic acid generators that generate a sulfonic acid when exposed to actinic rays or radiation, wherein the two types of sulfonic acid generators (B) consist of sulfonic acid generators (B1) and (B2) satisfying the following requirements, namely the sulfonic acid generator (B1) generates a sulfonic acid composed of 9 to 20 elements with an acid strength (pKa) satisfying the relationship pKa<-3.50, and the sulfonic acid generator (B2) generates an acid composed of 17 or more elements with an acid strength (pKa) satisfying the relationship -2.00>pKa>=-3.50, provided that no hydrogen atom is included in the number of elements of the generated acids.

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27-05-2011 дата публикации

СПОСОБ ПОЛУЧЕНИЯ АНГИДРИДА ТРИФТОРМЕТАНСУЛЬФОКИСЛОТЫ

Номер: RU2419604C2

Настоящее изобретение относится к способу получения ангидрида трифторметансульфокислоты, используемого в органическом синтезе. Предложенный способ состоит в том, что реакцию трифторметансульфокислоты с пентаоксидом фосфора проводят при мольном соотношении пентаоксида фосфора к трифторметансульфокислоте в диапазоне 0,3 и менее с предотвращением затвердевания реакционного раствора из-за образования в ходе реакции полифосфорной кислоты. Технический результат - увеличение производительности в процессе производства ангидрида трифторметансульфокислоты из трифторметансульфокислоты и пентаоксида фосфора. 2 з.п.ф-лы, 1 табл. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) 2 419 604 (13) C2 (51) МПК C07C 303/00 C07C 309/00 C07C 303/44 (2006.01) (2006.01) (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ, ПАТЕНТАМ И ТОВАРНЫМ ЗНАКАМ (12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ (21)(22) Заявка: 2008109759/04, 24.10.2006 (24) Дата начала отсчета срока действия патента: 24.10.2006 (72) Автор(ы): ЯЦУЯНАГИ Хироюки (JP), КОСИЯМА Хироси (JP), ХОНДА Цунетоси (JP) (73) Патентообладатель(и): МИЦУБИСИ МАТИРИАЛЗ КОРПОРЕЙШН (JP), ДЗЕМКО ИНК. (JP) (43) Дата публикации заявки: 10.12.2009 Бюл. № 34 2 4 1 9 6 0 4 (45) Опубликовано: 27.05.2011 Бюл. № 15 (56) Список документов, цитированных в отчете о поиске: US 5808149 A, 15.09.1998. JP 10114734 А, 06.05.98. RU 2062268 С1, 20.06.1996. US 5004829 А, 02.04.1991. 2 4 1 9 6 0 4 R U (86) Заявка PCT: JP 2006/321157 (24.10.2006) C 2 C 2 (85) Дата начала рассмотрения заявки PCT на национальной фазе: 26.05.2008 (87) Публикация заявки РСТ: WO 2007/049613 (03.05.2007) Адрес для переписки: 129090, Москва, ул.Б.Спасская, 25, стр.3, ООО "Юридическая фирма Городисский и Партнеры", пат.пов. Е.Е.Назиной (54) СПОСОБ ПОЛУЧЕНИЯ АНГИДРИДА ТРИФТОРМЕТАНСУЛЬФОКИСЛОТЫ (57) Реферат: Настоящее изобретение относится к способу получения ангидрида трифторметансульфокислоты, используемого в органическом синтезе. Предложенный способ состоит в том, что реакцию трифторметансульфокислоты с ...

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27-04-2006 дата публикации

СПИРОЦИКЛИЧЕСКИЕ ПРОИЗВОДНЫЕ ЦИКЛОГЕКСАНА

Номер: RU2005118403A
Принадлежит:

... 1. Спироциклические производные циклогексана общей формулы I в которой R1 и R2 независимо друг от друга обозначают Н, С1-С5алкил, разветвленный или неразветвленный, насыщенный или ненасыщенный, незамещенный или одно- либо многозамещенный, или СНО, или остатки R1 и R2 совместно обозначают CH2CH2OCH2CH2, CH2CH2NR11CH2CH2 или (СН2)3-6, где R11 обозначает Н, С1-С5алкил, соответственно насыщенный или ненасыщенный, разветвленный или неразветвленный, одно- либо многозамещенный или незамещенный, С3-С8циклоалкил, соответственно насыщенный или ненасыщенный, одно- либо многозамещенный или незамещенный, арил или гетероарил, каждый соответственно одно- либо многозамещенный или незамещенный, или присоединенный через C1-С3алкил арил, С3-С8диклоалкил или гетероарил, каждый соответственно одно- либо многозамещенный или незамещенный, R3 обозначает С1-С5алкил, соответственно насыщенный или ненасыщенный, разветвленный или неразветвленный, одно- либо многозамещенный или незамещенный, С3-С8циклоалкил, соответственно ...

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14-05-1980 дата публикации

Номер: DE0001967117B2
Принадлежит: FA. UGINE KUHLMANN, PARIS

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29-01-1981 дата публикации

Номер: DE0001942264C3
Принадлежит: FA. UGINE KUHLMANN, PARIS

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03-10-1956 дата публикации

Fluorocarbon sulphonic acid compounds

Номер: GB0000758467A
Автор:
Принадлежит:

... 758,467. Perfluoro sulphonic acids and their salts and acid fluorides. MINNESOTA MINING & MANUFACTURING CO. Jan. 15, 1954 [Jan. 29, 1953], No. 1295/54. Class 2 (3). [Also in Groups XIII and XXXVI] The invention comprises perfluoro sulphonic acids of the formula where Rf is a saturated fluoro-carbon structure composed solely of 1 to 18 fully fluorinated carbon atoms, each of which is present in an acyclic or cyclohexylic group; the metal and ammonium salts of these acids; and the fluorides of these acids. Specified acids are CF 3 SO 3 H, CF 3 CF 2 SO 3 H, perfluoro decane 1,10- disulphonic acid (CF 2 ) 10 (SO 3 H) 2 , perfluoro decane sulphonic acid CF 3 (CF 2 ) 9 SO 3 H, bis(perfluoro cyclohexane sulphonic acid) C(C 6 F 10 ) 2 (SÍ s H) 2' bis-(perfluoro cyclohexane) sulphonic acid F(C 6 F 10 ) 2 SO 3 H, perfluoroisopentane sulphonic acid (CF 3 ) 2 CF(CF 2 )SO 3 H, perfluoro-nhexane sulphonic acid CF 3 (CF 2 ) 5 SO 3 H, perfluoro-n-octane sulphonic acid CF 3 (CF 2 ) 7 SO 3 H, and other higher ...

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15-03-2012 дата публикации

PURIFICATION OF FLUOROALKANESULFONATE SALTS

Номер: CA0002809281A1
Принадлежит:

A process for the purification of fluoroalkanesulfonate salt comprising (a) contacting a mixture of said salt and an inorganic salt contaminant with a solvent to selectively dissolve said fluoroalkanesulfonate salt in solution, and (b) isolating the solution, to yield a fluoroalkanesulfonate salt containing less than 500 micrograms of inorganic salt contaminant per gram of fluoroalkanesulfonate salt, or containing less than a maximum of 0.3% by weight of individual solvent.

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24-04-2018 дата публикации

PURIFICATION OF FLUOROALKANESULFONATE SALTS

Номер: CA0002809281C

A process for the purification of fluoroalkanesulfonate salt comprising (a) contacting a mixture of said salt and an inorganic salt contaminant with a solvent to selectively dissolve said fluoroalkanesulfonate salt in solution, and (b) isolating the solution, to yield a fluoroalkanesulfonate salt containing less than 500 micrograms of inorganic salt contaminant per gram of fluoroalkanesulfonate salt, or containing less than a maximum of 0.3% by weight of individual solvent.

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09-08-1990 дата публикации

PROCESS FOR OPTICALLY ACTIVE 3-THIOLANYL SULFONATE ESTERS

Номер: CA0002009457A1
Принадлежит:

PROCESS FOR OPTICALLY ACTIVE 3-THIOLANYL SULFONATE ESTERS Intermediates and a stepwise process for the conversion of an alkyl 4-chloro-3R-hydroxybutyrate to optically active compounds of the formula wherein R is (C1-C3)alkyl, phenyl or tolyl. The latter compounds are in turn useful as an intermediate in the preparation of penem antibiotic SR,6S-6-(1R-hydroxy-ethyl)-2-(1R-oxo-3S-thiolanylthio)-2-penem-3-carboxylic acid and corresponding pharmaceutically acceptable salts and esters.

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02-01-2013 дата публикации

Photoactive compound

Номер: CN0102161635B
Принадлежит:

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15-07-1966 дата публикации

Manufactoring process of quaternary ammonium salts

Номер: FR0001445472A
Автор:
Принадлежит:

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17-06-1955 дата публикации

Fluorocarbonaceous and derived sulfonic acids

Номер: FR0001096273A
Автор:
Принадлежит:

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09-01-2015 дата публикации

FLUORINATION METHOD SULFONYL HALIDE COMPOUNDS

Номер: FR0003008093A1
Автор: METZ FRANCOIS
Принадлежит:

On décrit la préparation d'un composé de formule (I) comportant une fonction -SO2F par réaction d'un composé de formule (II) avec un agent de fluoration choisi parmi l'acide fluorhydrique et un fluorure ionique d'un cation monovalent ou divalent : R-SO2F (I) R'-SO2X (II) Où R est choisi parmi les groupements R0, R1, R2 et R3 : R0 = F; R1 = -CnHaFb avec n=1-10, a+b = 2n+1, b ≥ 1 ; R2 = -CxHyFz-SO2F avec x = 1-10, y+z = 2x et z ≥ 1 ; R3 = Φ-CcHhFf avec c = 1-10 ; h+f = 2c et f ≥ 1 ; Où R' est choisi parmi les groupements R'0, R'1, R'2 et R'3 suivants : R'0 = X ; R'1 = -CnHaXb avec n=1-10, a+b = 2n+1, b ≥ 1 ; R'2 = -CxHyXz-SO2X avec x = 1-10, y+z = 2x et z ≥ 1 ; R'3 = Φ-CcHhXf avec c = 1-10 ; h+f = 2c et f ≥ 1 ; Φ désignant un groupe phényle, X = Cl, Br.

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12-01-1996 дата публикации

COMPOSE OF HAFNIUM, ITS METHOD OF PREPARATION AND ITS USE AS CATALYST

Номер: FR0002722197A1
Автор: KOBAYASHI SHU
Принадлежит:

L'invention concerne un composé du hafnium représenté par la formule Hf(OS02 CF3 )4 (RMN **19F (CD3 CN, vdelta) 86,0(s)), un procédé pour le préparer et un procédé utilisant ce composé du hafnium comme catalyseur dans une réaction de Friedel et Crafts.

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16-10-2017 дата публикации

포토애시드 발생제 및 이를 포함하는 포토레지스트

Номер: KR0101785429B1

... 포토애시드 발생제(PAG) 화합물의 합성을 위한 새로운 방법, 새로운 포토애시드 발생제 화합물 및 상기한 PAG 화합물을 포함하는 포토레지스트 조성물이 제공된다. 특정 측면에 있어서는, 설포늄-함유(S+) 포토애시드 발생제, 및 설포늄 포토애시드 발생제의 합성방법이 제공된다.

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19-11-1992 дата публикации

Номер: KR19920010181B1
Автор:
Принадлежит:

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05-11-2013 дата публикации

Manufacture of Hydrofluoroalkanesulfonic Acids

Номер: KR0101325830B1
Автор:
Принадлежит:

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17-09-2018 дата публикации

레지스트 조성물 및 레지스트 패턴의 제조 방법

Номер: KR0101899598B1

... 화학식 (I)로 표시되는 구조 단위를 갖는 수지, 알칼리 수용액에 불용성 또는 난용성이지만 산의 작용에 의해 알칼리 수용액에 가용성이 되며, 화학식 (I)로 표시되는 구조 단위를 포함하지 않는 수지, 및 화학식 (II)로 표시되는 산발생제를 포함하는 레지스트 조성물을 제공한다. (식 중, R1, A1, R2, RII1, RII2, LII1, YII1, RII3, RII4, RII5, RII6, RII7, n, s 및 RII8은 본 명세서에 정의되어 있음) ...

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01-10-2010 дата публикации

Resist composition, method of forming resist pattern, novel compound and acid generator

Номер: TW0201035119A
Принадлежит:

A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) that generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a group represented by general formula (I) (in the formula, R5 represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent, and Q5 represents a single bond or a divalent linking group) in the cation moiety thereof.

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16-02-2013 дата публикации

Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, manufacturing method of electronic device and electronic device

Номер: TW0201307997A
Принадлежит:

An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a compound represented by the following formula (I); and (B) a resin: wherein X represents an oxygen atom, a sulfur atom or -N(Rx)-; each of R1 to R8 and Rx independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, an alkylcarbonyloxy group, an aryl group, an aryloxy group, an aryloxycarbonyl group or an arylcarbonyloxy group; and R1 to R8 may combine with each other to form a ring, provided that at least two members out of R1 to R8 represent a structure represented by the following formula (II) as defined in the specification.

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13-06-2013 дата публикации

RADIATION-SENSITIVE COMPOSITION AND COMPOUND

Номер: US20130149644A1
Автор: Ken MARUYAMA
Принадлежит: JSR Corporation

A radiation-sensitive composition includes a photoacid generator represented by a general formula (1), and a solvent. Each Rindependently represents a hydrogen atom, a fluorine atom, or a substituted or unsubstituted monovalent organic group. Rrepresents a fluorine atom or a substituted or unsubstituted monovalent organic group. Rrepresents a fluorine atom or a substituted or unsubstituted monovalent organic group. Rrepresents a fluoromethylene group or a divalent fluoroalkylene group. M represents a monovalent onium cation. Optionally Rbonds to Ror Rto form a cyclic structure. 3. The radiation-sensitive composition according to claim 1 , wherein Rrepresentsa linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, some or all of the hydrogen atoms of the hydrocarbon group being substituted with a fluorine atom,{'sup': '1', 'a linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms and including an ether bond or a sulfide bond, some or all of the hydrogen atoms of the hydrocarbon group represented by Rbeing substituted with a fluorine atom,'}a cyclic or cyclic structure-containing monovalent aliphatic hydrocarbon group having 3 to 30 carbon atoms, some or all of the hydrogen atoms of the aliphatic hydrocarbon group being substituted with a fluorine atom,a group having a structure in which a ring carbon atom of a cyclic or cyclic structure-containing monovalent aliphatic hydrocarbon group having 3 to 30 carbon atoms is replaced with an oxygen atom or a sulfur atom, some or all of the hydrogen atoms of the aliphatic hydrocarbon group being substituted with a fluorine atom, oran aryl group having 6 to 30 carbon atoms, some or all of the hydrogen atoms of the aryl group being substituted with at least a fluorine atom.4. The radiation-sensitive composition according to claim 1 , wherein Rrepresents{'sup': '1', 'a linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, some or all of the hydrogen atoms of the ...

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24-01-1956 дата публикации

Номер: US0002732398A1
Автор:
Принадлежит:

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20-01-2010 дата публикации

ПЕРФТОРАЛКАНСУЛЬФОНАТ КАЛИЯ И СПОСОБ ЕГО ПОЛУЧЕНИЯ

Номер: RU2379286C2

FIELD: chemistry. ^ SUBSTANCE: method of producing potassium perfluoroalkane sulphonate involves a stage for electrochemical fluorination where an alkanesulphonyl halide compound is subjected to electrochemical fluorination in anhydride hydrogen fluoride, thereby obtaining a gas which contains perfluoroalkanesulphonyl fluoride as a main component; a gas absorption stage where the obtained gas is reacted with an aqueous solution of potassium hydroxide to obtain a gas-absorbing solution which contains potassium perfluoroalkane sulphonate; a purification stage where impurities such as potassium fluoride, potassium hydroxide and potassium sulphate are removed; and a concentration and collection stage where the aqueous solution from which impurities have been removed is concentrated and dried. Concentration of protons in the reaction solution is preferably kept in the range from 150 to 1500 parts per million to prevent formation of byproducts. ^ EFFECT: improved method of producing perfluoroalkane sulphonate. ^ 15 cl, 2 dwg, 10 ex РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) 2 379 286 (13) C2 (51) МПК C07C 303/32 C07C 309/06 (2006.01) (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ, ПАТЕНТАМ И ТОВАРНЫМ ЗНАКАМ (12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ (21), (22) Заявка: 2008107984/04, 29.09.2006 (24) Дата начала отсчета срока действия патента: 29.09.2006 (73) Патентообладатель(и): МИЦУБИСИ МАТЕРИАЛЗ КОРПОРЕЙШН (JP), ДЗЕМКО ИНК. (JP) (43) Дата публикации заявки: 10.09.2009 2 3 7 9 2 8 6 (45) Опубликовано: 20.01.2010 Бюл. № 2 (56) Список документов, цитированных в отчете о поиске: US 4927964 A 22.05.1990. US 4925975 A 15.05.1990. US 3919295 A 11.11.1975. SU 598558 A3 20.03.1996. 2 3 7 9 2 8 6 R U (86) Заявка PCT: JP 2006/319545 (29.09.2006) C 2 C 2 (85) Дата перевода заявки PCT на национальную фазу: 29.02.2008 (87) Публикация PCT: WO 2007/037411 (05.04.2007) Адрес для переписки: 129090, Москва, ул. Б.Спасская, 25, стр.3, ООО "Юридическая фирма Городисский и Партнеры", пат.пов ...

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10-11-2011 дата публикации

КОМПОЗИЦИИ И СПОСОБЫ ЛЕЧЕНИЯ НЕЙРОДЕГЕНЕРАТИВНЫХ ЗАБОЛЕВАНИЙ

Номер: RU2010117740A
Принадлежит:

... 1. Соединение Формулы (А) или его таутомер, стереоизомер, геометрический изомер или фармацевтически приемлемый сольват, гидрат, соль, N-оксид или их пролекарства !! в которой ! Z представляет собой -C(R9)(R10)-C(R1)(R2)-, -X-C(R31)(R32)-, -C(R9)(R10)-C(R1)(R2)-C(R36)(R37)- или -X-C(R31)(R32)-C(R1)(R2)-; ! R1 и R2 каждый независимо друг от друга является выбранным из водорода, галогена, C1-C5 алкила, фторалкила, -OR6 или -NR7R8; или R1 и R2 вместе образуют оксо; ! R31 и R32 каждый независимо друг от друга является выбранным из водорода, C1-C5 алкила или фторалкила; ! R36 и R37 каждый независимо друг от друга является выбранным из водорода, галогена, C1-C5 алкила, фторалкила, -OR6 или -NR7R8; или R36 и R37 вместе образуют прямую связь для обеспечения двойной связи; или дополнительно R36 и R1 вместе образуют прямую связь, и R36 и R2 вместе образуют прямую связь для обеспечения тройной связи; ! R3 и R4 каждый независимо друг от друга является выбранным из водорода, алкила, алкенила, фторалкила ...

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20-08-2015 дата публикации

КОМПОЗИЦИИ И СПОСОБЫ ЛЕЧЕНИЯ НЕЙРОДЕГЕНЕРАТИВНЫХ ЗАБОЛЕВАНИЙ

Номер: RU2014151622A
Принадлежит:

... 1. Соединение Формулы (А) или его таутомер, стереоизомер, геометрический изомер или фармацевтически приемлемый сольват, гидрат, соль, N-оксид или их пролекарства:в которойZ представляет собой -C(R)(R)-C(R)(R)-, -X-C(R)(R)-, -C(R)(R)-C(R)(R)-C(R)(R)- или -X-C(R)(R)-C(R)(R)-;Rи Rкаждый, независимо друг от друга, являются выбранными из водорода, галогена, С-Салкила, фторалкила, -ORили -NRR; или Rи Rвместе образуют оксо;Rи Rкаждый, независимо друг от друга, являются выбранными из водорода, С-Салкила или фторалкила;Rи Rкаждый, независимо друг от друга, являются выбранными из водорода, галогена, С-Салкила, фторалкила, -ORили -NRR; или Rи Rвместе образуют прямую связь для обеспечения двойной связи; или дополнительно, Rи Rвместе образуют прямую связь, и Rи Rвместе образуют прямую связь для обеспечения тройной связи;Rи Rкаждый, независимо друг от друга, являются выбранными из водорода, алкила, алкенила, фторалкила, арила, гетероарила, карбоциклила или С-присоединенного гетероциклила; или Rи Rвместе ...

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26-08-2009 дата публикации

Cyclic triazo sodium channel blockers 1B

Номер: GB0000912271D0
Автор:
Принадлежит:

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18-07-2012 дата публикации

Anion exchange in ionic liquids

Номер: GB0201209755D0
Автор:
Принадлежит:

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29-09-1998 дата публикации

Rare earth complexes

Номер: AU0006121498A
Принадлежит:

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16-08-1990 дата публикации

PROCESS FOR OPTICALLY ACTIVE 3-THIOLANYL SULFONATE ESTERS

Номер: AU0004937890A
Принадлежит:

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30-07-2013 дата публикации

PROCESS FOR PRODUCTION OF METHYLENE DISULFONATE COMPOUND

Номер: CA0002648297C

The present invention provides a process for producing a methylene disulfonate compound in a simple manner at low cost. The present invention provides a process for producing a methylene disulfonate compound represented by General Formula (2) comprising: reacting, in the presence of a dehydrating agent, a formaldehyde compound with a sulfonic acid compound represented by General Formula (1): (see formula 1) wherein R1 and R2 are independently a hydrogen atom or a C1-4 alkyl group whose hydrogen atom may be substituted with halogen atom; n is an integer from 1 to 4; and when n is an integer from 2 to 4, n R1s and n R2s may be the same or different: (see formula 2) wherein, R1, R2, and n are the same as those described above for General Formula (1).

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05-12-2017 дата публикации

CYCLIC TRIAZO SODIUM CHANNEL BLOCKERS

Номер: CA0002767296C
Принадлежит: UNIVERSITY OF GREENWICH, UNIV GREENWICH

The present invention relates to triazine compounds having sodium channel blocking properties, and to use of the compounds for preparation of medicaments for treatment of associated disorders. The compounds are of formula (I): in which z is a single bond or an optionally substituted linking group, R1 is a halo-alkyl group; and A is an optionally substituted aromatic heterocyclic or carbocyclic ring system; or a salt thereof.

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17-09-1998 дата публикации

RARE EARTH COMPLEXES

Номер: CA0002283589A1
Принадлежит:

A photofunctional material comprising a rare earth complex represented by general formula (I), wherein M represents a rare earth atom; n1 is 2 or 3; n2 is 2, 3, or 4; R represents a hydrogen-free C1-20 group; X represents an atom of a Group IVA element, Group VA element excluding nitrogen, or Group VIA element excluding oxygen; n3 is 0 or 1; and Y represents C-Z' (wherein Z' is a C1-20 group containing neither deuterium, halogen, nor hydrogen), nitrogen, phosphorus, arsenic, antimony, or bismuth, or general formula (II), wherein M, R, X, n1, n2, and n3 are each as defined above.

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25-11-1922 дата публикации

Process of treatment of mineral oil for obtaining saponifiable products

Номер: FR0000546861A
Автор:
Принадлежит:

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11-12-2015 дата публикации

METHOD FOR FLUORINATING COMPOUNDS SULFONYL HALIDES

Номер: FR0003008093B1
Автор: METZ FRANCOIS
Принадлежит: RHODIA OPERATIONS

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10-06-2016 дата публикации

PROCESS FOR THE PREPARATION OF DERIVATIVES OXYSULFIDE AND FLUORINATED IONIC LIQUID MEDIUM

Номер: FR0003029520A1
Автор: METZ FRANCOIS
Принадлежит: RHODIA OPERATIONS

La présente invention concerne un procédé de préparation d'un dérivé oxysulfuré et fluoré sous forme de sel de formule (II) Ea-SOO-Q+ (II) comprenant la mise en présence d'un composé liquide ionique de formule (I) à l'état liquide Ea-COO-Q+ (I) - Ea représentant l'atome de fluor ou un groupe ayant de 1 à 10 atomes de carbone choisi parmi les fluoroalkyles, les perfluoroalkyles et les fluoroalkényles ; et - Q+ représentant un cation onium, avec un oxyde de soufre, ledit composé liquide ionique de formule (I) représentant au moins 50 % en poids du milieu réactionnel liquide initial.

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26-02-1920 дата публикации

Sulfonic acids coming from mineral oils and proceeded of obtaining these acids

Номер: FR0000499922A
Автор:
Принадлежит:

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31-07-1970 дата публикации

SEGMENTED FLUOROCARBON SULFONIC ACIDS AND DERIVATIVES THEREOF

Номер: FR0002022136A1
Автор:
Принадлежит:

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20-03-2019 дата публикации

Negative resist composition and resist pattern forming process

Номер: KR0101960604B1

본 발명은 패턴 형성 시의 해상성을 향상시키고, 또한 라인 엣지 러프니스가 저감된 패턴을 얻을 수 있는 네거티브형 레지스트 조성물 및 레지스트 패턴 형성 방법을 제공하는 것을 과제로 한다. 상기 과제는 (A) 하기 식(A)으로 표시되는 술포늄 화합물, 및 (B) 하기 식(B1)으로 표시되는 반복 단위를 포함하는 폴리머를 포함하는 베이스 폴리머를 포함하는 네거티브형 레지스트 조성물에 의해 해결된다: An object of the present invention is to provide a negative resist composition and a resist pattern forming method capable of improving the resolution at the time of pattern formation and obtaining a pattern with reduced line edge roughness. The above object is achieved by a negative resist composition comprising (A) a sulfonium compound represented by the following formula (A), and (B) a base polymer comprising a polymer comprising a repeating unit represented by the following formula Resolved:

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02-09-2015 дата публикации

PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING THE PHOTORESIST AND METHOD OF MAKING AN ARTICLE

Номер: KR0101549446B1

... 하기 식 (I)을 갖는 화합물: 여기서, a는 1 내지 10의 정수이고, x는 1 내지 3의 정수이고, X1은 플루오로알코올, 불소화된 에스테르 또는 불소화된 무수물을 포함하고, Y는 단일 결합, C1-20 알킬렌기, O, S, NR, 에스테르, 카보네이트, 설포네이트, 설폰, 또는 설폰아미드이고, 여기서, R은 H 또는 C1-20 알킬이고, 여기서, C1-20 알킬렌기는 구조적으로 탄소만이거나, C1-20 알킬렌기 중의 하나 이상의 구조적 탄소 원자는 산소, 카보닐, 에스테르 또는 이들중 적어도 하나를 포함하는 조합에 의해 대체되고, Ar은 치환 또는 비치환된 C5 이상의 모노사이클릭, 폴리사이클릭 또는 융합된 폴리사이클릭 사이클로알킬; 또는 치환 또는 비치환된 C5 이상의 모노사이클릭, 폴리사이클릭 또는 융합된 폴리사이클릭 아릴기이고, 여기서 사이클로알킬 또는 아릴은 카보사이클이거나, O, S, N, F 또는 이들중 적어도 하나를 포함하는 조합을 포함하는 헤테로원자를 포함하고, 각각의 R1은 독립적으로 치환된 C5-40 아릴, 치환된 C5-40 헤테로아릴, C1-40 알킬, C3-40 사이클로알킬이고, 여기서, x가 1인 경우, 두 개의 R1기는 분리되거나, 또는 C4-40 고리 구조를 형성하기 위해 서로 결합되고, Z-는 카복실레이트, 설페이트, 설포네이트, 설파메이트 또는 설폰이미드의 음이온이고, 여기서 Y가 단일 결합이면, Z-는 설포네이트가 아니다.

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21-01-2013 дата публикации

ALKOXY COMPOUNDS FOR DISEASE TREATMENT

Номер: KR0101224798B1
Автор:
Принадлежит:

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23-10-2012 дата публикации

SALT CAPABLE OF BEING USED AS AN ACID GENERATOR, AND A MANUFACTURING METHOD OF A PHOTORESIST COMPOSITION AND A PHOTORESIST PATTERN

Номер: KR1020120116868A
Принадлежит:

PURPOSE: A salt is provided to be suitable as an acid generator and to provide a photoresist composition capable of providing excellent photoresist patterns which have low line edge roughness. CONSTITUTION: A salt is represented by chemical formula 1. In chemical formula 1, Q^1 and Q^2 is respectively fluorine or C1-C6 perfluoroalkyl group, L^1 is C1-C17 divalent saturated hydrocarbon group, where methylene group can be replaced by a oxygen or a carbonyl group, each of L^2 and L^3 is a single bond or a C1-6 divalent saturated alkyl group, where the methylene group can be replaced by oxygen or a carbonyl group, each of W^1 ring and W^2 ring is a C3-36 hydrocarbon ring, each of R^1 and R^2 is hydrogen or C1-6 alkyl group, R^3 is a C1-6 alkyl group, t is an integer from 0-2, and Z^+ is a counter ion. COPYRIGHT KIPO 2013 ...

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06-04-2015 дата публикации

Номер: KR1020150035455A
Автор:
Принадлежит:

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07-06-2012 дата публикации

RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATOR

Номер: WO2012074077A1
Автор: MARUYAMA Ken
Принадлежит:

The purpose of the present invention is to provide: a radiation-sensitive resin composition which after development, has excellent resistance to pattern falling and an excellent balance between LWR and MEEF; and a radiation-sensitive acid generator which is suitable for use in the composition. This radiation-sensitive resin composition comprises [A] a compound represented by formula (1) and [B] a base polymer. R1 in formula (1) preferably is represented by formula (a1). M+ in formula (1) preferably is a sulfonium cation or an iodonium cation.

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15-03-2012 дата публикации

Purification of fluoroalkanesulfonate salts

Номер: US20120065425A1
Принадлежит: EI Du Pont de Nemours and Co

A process for the purification of fluoroalkanesulfonate salt comprising (a) contacting a mixture of said salt and an inorganic salt contaminant with a solvent to selectively dissolve said fluoroalkanesulfonate salt in solution, and (b) isolating the solution, to yield a fluoroalkanesulfonate salt containing less than 500 micrograms of inorganic salt contaminant per gram of fluoroalkanesulfonate salt, or containing less than a maximum of 0.3% by weight of individual solvent.

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13-09-2012 дата публикации

Salt, resist composition and method for producing resist pattern

Номер: US20120231392A1
Принадлежит: Sumitomo Chemical Co Ltd

A salt represented by the formula (I) and a resist composition containing the salt are provided, wherein Q 1 , Q 2 , L 1 , ring W 1 , R e1 , R e2 , R e3 , R e4 , R e5 , R e6 , R e7 , R e8 , R e9 , R e10 , R e11 , R e12 , R e13 and Z are defined in the specification.

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11-01-2018 дата публикации

Ionic Liquid, Lubricant, and Magnetic Recording Medium

Номер: US20180012623A1
Принадлежит:

A lubricant including an ionic liquid including a conjugate base and a conjugate acid, wherein the conjugate acid includes a straight-chain hydrocarbon group having 6 or greater carbon atoms and a straight chain hydrocarbon group s having 6 or greater but 14 or less carbon atoms, and wherein a pKa of an acid that is a source of the conjugate base in acetonitrile is 10 or less. 1. A lubricant comprising:an ionic liquid including a conjugate base and a conjugate acid,wherein the conjugate acid includes a straight-chain hydrocarbon group having 6 or greater carbon atoms and a straight-chain hydrocarbon group having 6 or greater but 14 or less carbon atoms, andwherein a pKa of an acid that is a source of the conjugate base in acetonitrile is 10 or less.5. A magnetic recording medium comprising:a non-magnetic support;a magnetic layer disposed on the non-magnetic support; and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the lubricant according to , disposed on the magnetic layer.'}6. An ionic liquid comprising:a conjugate base; anda conjugate acid,wherein the conjugate acid includes a straight-chain hydrocarbon group having 6 or greater carbon atoms and a straight-chain hydrocarbon group having 6 or greater but 14 or less carbon atoms, andwherein a pKa of an acid that is a source of the conjugate base in acetonitrile is 10 or less. The present invention relates to an ionic liquid, a lubricant containing the ionic liquid, and a magnetic recording medium using the lubricant.Conventionally, in a thin film magnetic recording medium, a lubricant is applied onto a surface of a magnetic layer for the purpose of reducing frictions between a magnetic head and the surface of the magnetic recording medium, or reducing abrasion. In order to avoid adhesion, such as sticktion, an actual film thickness of the lubricant is of a molecular order. Accordingly, it is not exaggeration to say that the most important thing for a thin film magnetic recording medium is to select a lubricant ...

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18-01-2018 дата публикации

Ionic Liquid, Lubricant, and Magnetic Recording Medium

Номер: US20180016510A1
Принадлежит: Dexerials Corp

A lubricant, which includes an ionic liquid including a conjugate base and a conjugate acid including 2 or more cations in a molecule of the conjugate acid, wherein the conjugate acid includes a monovalent group including a straight-chain hydrocarbon group having 6 or more carbon atoms, and an acid that is a source of the conjugate base has a pKa in acetonitrile of 10 or less.

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28-01-2016 дата публикации

FLUOROSURFACTANTS HAVING IMPROVED BIODEGRADABILITY

Номер: US20160023973A1
Принадлежит:

To address the problem of insufficient biodegradability of perfluorinated surfactants, the present invention provides biodegradable fluorosurfactants derived from olefins having —CHR, —CHRf, —CHF, and/or —CHgroups, where R is an alkyl group and Rf is a perfluoro or fluroroalkyl group. Preferably, the —CHR, —CHRf, —CHF, and/or —CHgroups are contained within partially fluorinated alkenes. 1. A fluorosurfactant having the general formula Rf—X—Y , wherein Rf is a perfluorinated alkyl group , X is a fluoroolefin , Y is a neutral group or a hydrophilic group , and wherein the surfactant is biodegradable.2. The fluorosurfactant of claim 1 , wherein X is derived from a partially fluorinated alkene.3. The fluorosurfactant of claim 3 , wherein the partially fluorinated alkene is selected from the group consisting of CF═CFCl claim 3 , CH═CHF claim 3 , CHF═CHF claim 3 , CH═CF claim 3 , CFCH═CHCF claim 3 , CFCF═CFCF claim 3 , CFC═H claim 3 , and (CF)CF—CF═CFCF(HFP dimer).4. The fluorosurfactant of claim 2 , wherein X is derived from a partially fluorinated propene.5. The fluorosurfactant of claim 3 , wherein the partially fluorinated propene is selected from the group consisting of CFCF═CH(HFO-1234yf) claim 3 , CFCH═CHF (HFO-1234ze) claim 3 , CFCF═CHF (HFO-1225yf) claim 3 , CFCH═CHCl (HCFO 1233zd) claim 3 , CFCH═CH claim 3 , CFCH═CF claim 3 , CFCF═CF claim 3 , CFCH≡CH claim 3 , (CF(CF)(CFH)H claim 3 , and hexafluoropropene trimer.6. The fluorosurfactant of claim 1 , which is an anionic surfactant.7. The fluorosurfactant of claim 6 , wherein the anionic surfactant is selected from the group consisting of carboxylates claim 6 , sulfonates claim 6 , sulfates claim 6 , phosphates claim 6 , and mixtures thereof.8. The fluorosurfactant of claim 1 , which is a cationic surfactant.9. The fluorosurfactant of claim 8 , wherein the cationic surfactant is selected from the group consisting of amino claim 8 , amido claim 8 , ammonio claim 8 , sulfonamido salts claim 8 , and mixtures thereof. ...

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25-01-2018 дата публикации

PROCESS FOR FLUORINATION OF SULPHONYL HALIDE COMPOUNDS

Номер: US20180022694A1
Автор: METZ François
Принадлежит:

The present disclosure relates to the preparation of a compound of formula (I) comprising an —SOF function, R—SOF, by reacting a compound of formula (II), R′—SOX, with a fluorinating agent, the process carried out in the liquid phase in the presence of hydrofluoric acid using an antimony-based fluorination catalyst, wherein R, R′, and X are described herein. 1. A non-electrochemical process for preparing a fluorinated compound of formula (I) comprising at least one —SOF function , wherein the compound of formula (I) is prepared by reacting a compound of formula (II) with at least one fluorinating agent , wherein the process is carried out in the liquid phase in the presence of hydrofluoric acid using an antimony-based fluorination catalyst:{'br': None, 'sub': '2', 'R—SOF \u2003\u2003(I)'}where R is selected from the group consisting of R1, R2 and R3:{'sub': n', 'a', 'b, 'R1=—CHFwith n=1-10, a+b=2n+1, b≧1;'}{'sub': x', 'y', 'z', '2, 'R2=—CHF—SOF with x=1-10, y+z=2x and z≧1;'}{'sub': c', 'h', 'f, 'claim-text': {'br': None, 'sub': '2', 'R′—SOX \u2003\u2003(II)'}, 'R3=Φ-CHFwith c=1-10; h+f=2c and f≧1; Φ denoting a phenyl group;'}where R′ is selected from the group consisting of R′1, R′2 and R′3:{'sub': n', 'a', 'b, 'R′1=—CHXwith n=1-10, a+b=2n+1, b≧1;'}{'sub': x', 'y', 'z', '2, 'R′2=—CHX—SOX with x=1-10, y+z=2x and z≧1;'}{'sub': c', 'h', 'f, 'R′3=Φ-CHXwith c=1-10; h+f=2c and f≧1; Φ denoting a phenyl group;'}X is a halogen atom selected from the group consisting of chlorine and bromine.2. The preparation process as claimed in claim 1 , wherein the radicals R1 and R′1 are perhalogenated so that b=3 and a=0.3. The preparation process as claimed in claim 1 , wherein the radical R of the compound (I) is the radical R1 wherein n=1 claim 1 , a=0 and b=3 claim 1 , or n=1 claim 1 , a=1 claim 1 , b=2 or else n=1 claim 1 , a=2 and b=1.4. The preparation process as claimed in claim 1 , wherein the compound of formula (II) is obtained by radical halogenation of a compound of formula ...

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08-02-2018 дата публикации

METHOD FOR PRODUCING OXYSULPHIDIC AND FLUORINATED DERIVATIVES IN AN IONIC LIQUID MEDIUM

Номер: US20180037543A1
Автор: METZ François
Принадлежит:

The invention relates to a method for producing an oxysulphidic and fluorinated derivative in the form of a salt of formula (II) Ea-SOQ (II) comprising providing an ionic liquid compound of formula (I) in the liquid state Ea-SOOCr (II)—Ea representing the fluorine atom or a group having between 1 and 10 carbon atoms selected from fluoroalkyls, perfluoroalkyls and fluoroalkenyls; and—Q representing an onium cation, with a sulphur oxide, said ionic liquid compound of formula (I) representing at least 50 wt. % of the initial liquid reactive medium. 2. The process as claimed in claim 1 , in which the reaction medium is devoid of organic solvent of amide type.3. The process as claimed in claim 1 , in which the onium cation Qis selected from the group consisting of ammonium claim 1 , phosphonium claim 1 , pyridinium claim 1 , pyrazolinium claim 1 , imidazolium claim 1 , arsenium claim 1 , quaternary ammonium and quaternary phosphonium cations.4. The process as claimed in claim 1 , in which the onium cation Qis a quaternary phosphonium cation.5. The process as claimed in claim 1 , in which the cation Qrepresents a quaternary ammonium cation selected from the group consisting of tetraethylammonium claim 1 , tetrapropylammonium claim 1 , tetrabutylammonium claim 1 , trimethylbenzylammonium claim 1 , methyltributylammonium and Aliquat 336.6. The process as claimed in claim 1 , in which the cation Qrepresents a pyridinium cation.7. The process as claimed in claim 1 , for the preparation of a trifluoromethanesulfinic acid onium salt CF SOOQ.8. The process as claimed in claim 7 , in which the trifluoromethanesulfinic acid onium salt CFSOOQis tetrabutylphosphonium trifluoromethanesulfinate CFSOOPBu.9. A process for the preparation of a compound in the form of a salt of formula (III):{'br': None, 'sub': '3', 'sup': −', '+, 'Ea-SOQ\u2003\u2003(III)'}Ea representing a fluorine atom or a group having from 1 to 10 carbon atoms selected from the group consisting of fluoroalkyls, ...

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09-02-2017 дата публикации

Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film and pattern forming method, each using composition, and method for manufacturing electronic device

Номер: US20170038685A1
Принадлежит: Fujifilm Corp

An active-light-sensitive or radiation-sensitive resin composition includes a resin (A) and a photoacid generator (B) capable of generating an acid upon irradiation with active light or radiation, in which the active-light-sensitive or radiation-sensitive resin composition contains at least a photoacid generator (B1) represented by the following General Formula (1) and a photoacid generator (B2) other than the photoacid generator (B1) as the photoacid generator (B).

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24-02-2022 дата публикации

ELECTROLYTE AND ELECTROCHEMICAL APPARATUS USING SAME

Номер: US20220059873A1
Принадлежит: Ningde Amperex Technology Limited

An electrolyte includes a compound of formula 1: 3. The electrolyte according to claim 1 , wherein based on a total weight of the electrolyte claim 1 , the compound of formula 1 is 0.1 wt % to 10 wt %.10. The electrochemical apparatus according to claim 8 , wherein based on a total weight of the electrolyte claim 8 , the compound of formula 1 is 0.1 wt % to 10 wt %.12. The electrochemical apparatus according to claim 11 , wherein based on the total weight of the electrolyte claim 11 , the nitrile compound is 0.5 wt % to 10 wt %.15. The electrochemical apparatus according to claim 14 , wherein based on a total weight of the electrolyte claim 14 , the fluorosulfonic anhydride compound is 0.1 wt % to 5 wt %.17. The electrochemical apparatus according to claim 8 , wherein the positive active material comprises a lithium cobalt oxide claim 8 , the lithium cobalt oxide comprises an element M claim 8 , and the element M is one or more selected from the group consisting of Mg claim 8 , Ti claim 8 , Al claim 8 , Zr claim 8 , Sn claim 8 , Zn claim 8 , and Ca.18. The electrochemical apparatus according to claim 17 , wherein based on a total weight of the positive active material claim 17 , the element M is 0.005 wt % to 1 wt %.19. The electrochemical apparatus according to claim 8 , wherein a specific surface area of the positive active material is 0.9 m/g to 1.5 m/g. The present application is a continuation of International Application No. PCT/CN2020/097491, filed on 22 Jun. 2020, the disclosure of which is hereby incorporated by reference in its entirety.This application relates to the technical field of electrochemical apparatuses, and in particular, to an electrolyte and an electrochemical apparatus using the same.Along with the pursuit of batteries for small volume and high energy density, the increasing compacted density of positive and negative electrodes or the use of high-capacity negative electrode materials (such as lithium metal and Si/C negative electrodes) with ...

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03-03-2022 дата публикации

SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL

Номер: US20220069354A1
Принадлежит:

An object of the present invention is to provide a highly practical electrolyte solution which has high oxidation resistance and enables dissolution-precipitation of magnesium to proceed repeatedly and stably.

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03-03-2016 дата публикации

Salt, acid generator, resist composition and method for producing resist pattern

Номер: US20160062233A1
Принадлежит: Sumitomo Chemical Co Ltd

A salt having a group represented by formula (a): wherein X a and X b each independently represent an oxygen atom or a sulfur atom, X 1 represents a divalent group having an alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and where a hydrogen atom may be replaced by a hydroxy group or a fluorine atom, and * represents a binding site.

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17-03-2022 дата публикации

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер: US20220082938A1
Принадлежит: FUJIFILM Corporation

An actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin. 2. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,wherein the fluorine-containing group in each of General Formulae (1) to (3) is a fluoroalkyl group.3. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,{'sup': ['1', '2', '3'], '#text': 'wherein in General Formula (1), the aromatic hydrocarbon ring group represented by each of Ar, Ar, and Arhas a total of three or more fluoroalkyl groups or has a total of one or more organic groups other than an electron-withdrawing group, and a total number of carbon atoms included in the total of one or more organic groups other than an electron-withdrawing group is 3 or more,'}{'sup': ['4', '5', '6'], '#text': 'in General Formula (2), the aromatic hydrocarbon ring group represented by each of Ar, Ar, and Arhas a total of three or more fluorine-containing groups, or'}{'sup': ['4', '5', '6'], '#text': 'the aromatic hydrocarbon ring group represented by each of Ar, Ar, and Arhas a total of one or more linear or branched organic groups other than an electron-withdrawing group, and a total number of carbon atoms included in the total of one or more linear or branched organic groups other than an electron-withdrawing group is 3 or more, and'}{'sup': ['7', '8', '9'], '#text': 'in General Formula (3), a total number of carbon atoms included in the organic groups other than an electron-withdrawing group, contained in the aromatic hydrocarbon ring group represented by each of Ar, Ar, and Ar, is 3 or more.'}5. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 4 ,{'sup': ['5', '6'], '#text': 'wherein Arand ...

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08-03-2018 дата публикации

Salt and photoresist composition containing the same

Номер: US20180065925A1
Принадлежит: Sumitomo Chemical Co Ltd

A salt represented by formula (I): wherein R 1 and R 2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X 1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A − represents an organic anion.

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18-03-2021 дата публикации

ALKOXY COMPOUNDS FOR DISEASE TREATMENT

Номер: US20210077427A1
Принадлежит:

The present invention relates generally to compositions and methods for treating neurodegenerative diseases and disorders, particularly ophthalmic diseases and disorders. Provided herein are alkoxyl derivative compounds and pharmaceutical compositions comprising these compounds. The subject compositions are useful for treating and preventing ophthalmic diseases and disorders, including age-related macular degeneration (AMD) and Stargardt's Disease. 137.-. (canceled)3953.-. (canceled)55. The method of claim 54 , wherein the retinal cell is a retinal neuronal cell.56. The method of claim 55 , wherein the retinal neuronal cell is a photoreceptor cell.58. (canceled)59. The method of claim 57 , wherein the lipofuscin is N-retinylidene-N-retinyl-ethanolamine (A2E).6068.-. (canceled) This application is a continuation of U.S. patent application Ser. No. 16/043,019, filed Jul. 23, 2018, which is a continuation of U.S. patent application Ser. No. 15/672,031, filed Aug. 8, 2017, which is a continuation of U.S. patent application Ser. No. 15/260,127, filed Sep. 8, 2016, which issued as U.S. Pat. No. 9,737,496 on Aug. 22, 2017, which is a continuation of U.S. patent application Ser. No. 14/631,763, filed Feb. 25, 2015, which issued as U.S. Pat. No. 9,458,088 on Oct. 4, 2016, and U.S. patent application Ser. No. 14/631,779, filed Feb. 25, 2015, now abandoned, both of which are a continuation of U.S. patent application Ser. No. 13/111,679, filed on May 19, 2011, which issued as U.S. Pat. No. 8,981,153 on Mar. 17, 2015, which is a continuation of U.S. patent application Ser. No. 12/287,039, filed on Oct. 3, 2008, which issued as U.S. Pat. No. 7,982,071 on Jul. 19, 2011, which claims the benefit of U.S. Provisional Application No. 60/977,957, filed Oct. 5, 2007; U.S. Provisional Application No. 61/066,353, filed Feb. 19, 2008; U.S. Provisional Application No. 61/043,127, filed Apr. 7, 2008; U.S. Provisional Application No. 61/051,657, filed May 8, 2008; and U.S. Provisional ...

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24-03-2022 дата публикации

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Номер: US20220091507A1
Автор: Nishikori Katsuaki
Принадлежит: JSR Corporation

A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2), Rrepresents a hydrogen atom, or the like; Rrepresents a hydrogen atom or the like; and Rrepresents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Arrepresents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; Rrepresents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and Rrepresents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like. 2. The radiation-sensitive resin composition according to claim 1 , wherein p in the formula (2) is 1.4. The radiation-sensitive resin composition according to claim 3 , wherein in the formula (2) claim 3 , in a case in which q is 1 claim 3 , Rrepresents a halogen atom claim 3 , a nitro group claim 3 , a monovalent unsubstituted hydrocarbon group having 1 to 20 carbon atoms claim 3 , or a monovalent hydrocarbon group having 1 to 20 carbon atoms in which a part or all of hydrogen atoms are substituted with a substituent claim 3 , and in a case in which q is no less than 2 claim 3 , a plurality of Rs are identical or different and each Rrepresents a halogen atom claim 3 , a nitro group claim 3 , a monovalent unsubstituted hydrocarbon group having 1 to 20 carbon atoms claim 3 , or a monovalent hydrocarbon group having 1 to 20 carbon atoms in which a part or all of hydrogen atoms are substituted with a substituent claim 3 , or at least two of the plurality of Rs taken together represent an alicyclic structure having 4 to 20 ring atoms or an aliphatic heterocyclic structure having 4 to 20 ring atoms claim 3 , together with the carbon chain to ...

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16-03-2017 дата публикации

ONIUM SALT, PHOTOACID GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING DEVICE

Номер: US20170075219A1
Автор: MIYAZAWA Takashi
Принадлежит: TOYO GOSEI CO., LTD.

An onium salt represented by formula (a). Z-A-W—Y(R)X (a) (In formula (a), Z, A, W, Y, (R), and X have the following meanings: Z represents a monovalent organic group having a ring structure provided with a conjugated π electron system, which may have one or more substituent groups; W represents a divalent organic group having a ring structure provided with a conjugated π electron system, which may have one or more substituent groups; A represents a divalent linking group containing a direct coupling of one or more bonds selected from a group consisting of a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-carbon triple bond (any Z and/or W substituent group may form a ring structure in which one or more atoms included in Z and/or W are saturated or partially saturated together with A); Y is an iodine or sulfur atom, n=1 when Y is an iodine atom, and n=2 when Y is a sulfur atom; (R)may be identical to or different from one another, and each (R)is a monovalent organic group having a carbon number of 1 or more, which may have a substituent group; and X is a monovalent anion.) 1. The onium salt of claim 11 , wherein: {'br': None, 'sup': +', '−, 'sub': 'n', 'Z-A-W—Y(R)X\u2003\u2003(a)'}, 'a chemical structure which is represented by the following formula (a),'} Z is a first monovalent organic group having a cyclic structure including a conjugated π-electron system optionally including at least one substituent;', 'W is a divalent organic group having a cyclic structure including a conjugated π-electron system optionally including at least one substituent;', 'A is the direct bond or the divalent linking group including at least one bond selected from the group consisting of the carbon-carbon single bond, the carbon-carbon double bond and the carbon-carbon triple bond;, 'whereany substituent of Z and W may form a cyclic structure saturated or partially saturated with A; 'Y is an iodine atom or a sulfur atom;', 'the cyclic structure includes at least one ...

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22-03-2018 дата публикации

AROMATIC SULFONIUM SALT COMPOUND, PHOTOACID GENERATOR, RESIST COMPOSITION, CATIONIC POLYMERIZATION INITIATOR, AND CATIONICALLY POLYMERIZABLE COMPOSITION

Номер: US20180079738A1
Принадлежит: ADEKA CORPORATION

Provided are: an aromatic sulfonium salt compound which exhibits low corrosion to a substrate and excellent photolithographic characteristics and is thus useful as a photoacid generator and as a cationic polymerization agent; and a photoacid generator, a resist composition, a cationic polymerization initiator and a cationically polymerizable agent composition, which include the aromatic sulfonium salt compound. The aromatic sulfonium salt compound is represented by the following Formula (I): 3. A photoacid generator claim 1 , comprising the aromatic sulfonium salt compound according to .4. A resist composition claim 3 , comprising the photoacid generator according to .5. The resist composition according to claim 4 , which is a positive or negative resist composition for i-line.6. A cationic polymerization initiator claim 1 , comprising the aromatic sulfonium salt compound according to .7. A cationically polymerizable composition claim 6 , comprising the cationic polymerization initiator according to .8. A photoacid generator claim 2 , comprising the aromatic sulfonium salt compound according to .9. A cationic polymerization initiator claim 2 , comprising the aromatic sulfonium salt compound according to . The present invention relates to an aromatic sulfonium salt compound, a photoacid generator, a resist composition, a cationic polymerization initiator, and a cationically polymerizable composition. More particularly, the present invention relates to: an aromatic sulfonium salt compound which exhibits low corrosion to a substrate and excellent photolithographic characteristics and is useful as a photoacid generator and as a cationic polymerization agent; and a photoacid generator, a resist composition, a cationic polymerization initiator and a cationically polymerizable agent composition, which comprise the aromatic sulfonium salt compound.Sulfonium salt compounds are substances that generate an acid when irradiated with an energy beam such as light, and they are ...

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21-03-2019 дата публикации

Antireflective compositions with thermal acid generators

Номер: US20190085173A1

New methods and substrates are provided that include antireflective compositions that comprise one or more thermal acid generators.

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05-04-2018 дата публикации

PHOTOACID-GENERATING COMPOUND AND ASSOCIATED POLYMER, PHOTORESIST COMPOSITION, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE

Номер: US20180095363A1
Автор: Aqad Emad
Принадлежит:

A photoacid-generating compound has the structure 2. The photoacid-generating compound of claim 1 , wherein Rand Rare each independently hydrogen claim 1 , Calkyl claim 1 , or Calkoxycarbonyl.3. The photoacid-generating compound of or claim 1 , wherein n is 1 claim 1 , 2 claim 1 , or 3; and X is independently at each occurrence Calkyl or Calkoxycarbonyl.4. The photoacid-generating compound of any one of - claim 1 , wherein m is zero.7. The photoacid-generating compound of claim 1 , wherein one of Ror Ror Z claim 1 , or one occurrence of X claim 1 , or one occurrence of Y claim 1 , is a polymerizable group claim 1 , provided that if one occurrence of X is the polymerizable group claim 1 , then n is 1 claim 1 , 2 claim 1 , or 3 claim 1 , and provided that if one occurrence of Y is the polymerizable group claim 1 , then m is 1 claim 1 , 2 claim 1 , or 3.8. A polymer comprising repeat units derived from the photoacid-generating compound of .9. A photoresist composition comprising the photoacid-generating compound of any one of to claim 7 , the polymer of claim 7 , or a combination thereof.10. A method of forming a photoresist relief image claim 7 , comprising:{'claim-ref': {'@idref': 'CLM-00009', 'claim 9'}, '(a) applying a layer of the photoresist composition of on a substrate to form a photoresist layer;'}(b) pattern-wise exposing the photoresist layer to activating radiation to form an exposed photoresist layer; and(c) developing the exposed photoresist layer to provide a photoresist relief image. The present invention relates to a photoacid-generating compound useful in photoresists compositions for microlithography.Extreme ultraviolet (EUV) photolithography utilizes radiation at 13.5 nanometer wavelength to create high-resolution features via chemical reactions in a photoresist layer. However, the EUV light source is typically also includes light at higher wavelengths, such as 193 and 248 nanometers. These contaminating wavelengths, sometimes called out-of-band ( ...

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29-04-2021 дата публикации

Radiation-sensitive resin composition and resist pattern-forming method

Номер: US20210124263A1
Принадлежит: JSR Corp

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R 1 , R 2 , and R 3 represents a fluorine atom or the like; and R 4 and R 5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R 6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R 6 s represents a fluorine atom or the like; and R 8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

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05-05-2016 дата публикации

Photoacid generators and photoresists comprising same

Номер: US20160124304A1
Принадлежит: Rohm and Haas Electronic Materials LLC

New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.

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04-05-2017 дата публикации

THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS

Номер: US20170123313A1
Принадлежит:

Provided are ionic thermal acid generators of the following general formula (I): 2. The ionic thermal acid generator of claim 1 , wherein the hydroxyl group is bonded to the aromatic ring through an ester group.3. The ionic thermal acid generator of claim 2 , wherein the anion comprises a plurality of hydroxyl groups.4. The ionic thermal acid generator of claim 3 , wherein the anion comprises a plurality of hydroxyl groups bonded to the aromatic ring through a respective ester group.5. The ionic thermal acid generator of claim 1 , wherein Y independently is chosen from sulfur claim 1 , optionally substituted amino groups claim 1 , amides claim 1 , ethers claim 1 , carbonyl esters claim 1 , sulfonyl esters claim 1 , sulfones claim 1 , sulfonamides claim 1 , divalent hydrocarbon groups claim 1 , and combinations thereof.6. The ionic thermal acid generator of claim 1 , wherein the cation is a pyridine derivative.7. A photoresist pattern trimming composition claim 1 , comprising: an ionic thermal acid generator of claim 1 , a matrix polymer and a solvent.8. The photoresist pattern trimming composition of claim 7 , wherein the solvent is an organic solvent.9. The photoresist pattern trimming composition of claim 7 , wherein the hydroxyl group is bonded to the aromatic ring through an ester group.10. The photoresist pattern trimming composition of claim 9 , wherein the anion comprises a plurality of hydroxyl groups.11. The photoresist pattern trimming composition of claim 10 , wherein the anion comprises a plurality of hydroxyl groups bonded to the aromatic ring through a respective ester group.12. The photoresist pattern trimming composition of claim 7 , wherein Y independently is chosen from sulfur claim 7 , optionally substituted amino groups claim 7 , amides claim 7 , ethers claim 7 , carbonyl esters claim 7 , sulfonyl esters claim 7 , sulfones claim 7 , sulfonamides claim 7 , divalent hydrocarbon groups claim 7 , and combinations thereof.13. The photoresist pattern ...

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04-05-2017 дата публикации

THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS

Номер: US20170123314A1
Принадлежит:

Provided are ionic thermal acid generators comprising an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group and a cation. Also provided are photoresist pattern trimming compositions that include an ionic thermal acid generator, a matrix polymer and a solvent, and methods of trimming a photoresist pattern using the trimming compositions. The thermal acid generators, compositions and methods find particular applicability in the manufacture of semiconductor devices. 1. An ionic thermal acid generator , comprising: an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group; and a cation.2. The ionic thermal acid generator of claim 1 , wherein the fluorinated alcohol group comprises: a fluorine atom bonded to a carbon at the alpha position of the hydroxyl group and/or or a fluorinated group bonded pendant to a carbon at the alpha position of the hydroxyl group.3. The ionic thermal acid generator of claim 1 , wherein the anion comprises a fluoroalcohol group of the formula —C(CF)OH.4. The ionic thermal acid generator of claim 3 , wherein the anion comprises a plurality of fluorinated alcohol groups of the formula —C(CF)OH.5. The ionic thermal acid generator of claim 1 , wherein the fluorinated alcohol group is bonded to an aromatic ring of the anion through an ester group.8. A photoresist pattern trimming composition claim 1 , comprising: an ionic thermal acid generator of claim 1 , a matrix polymer and a solvent.9. The photoresist pattern trimming composition of claim 8 , wherein the solvent is an organic solvent.10. The photoresist pattern trimming composition of claim 8 , wherein the fluorinated alcohol group comprises: a fluorine atom bonded to a carbon at the alpha position of the hydroxyl group and/or or a fluorinated group bonded pendant to a carbon at the alpha position of the hydroxyl group.11. The photoresist pattern trimming composition of claim 8 , wherein the anion comprises a fluoroalcohol group of ...

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21-05-2015 дата публикации

REACTIVE IONIC LIQUID, AND ION-IMMOBILIZED METAL OXIDE PARTICLE, ION-IMMOBILIZED ELASTOMER, AND TRANSDUCER USING SAME

Номер: US20150137666A1
Принадлежит:

A reactive ionic liquid to be used as an ionic component that is contained in an ion-containing layer in a transducer arranged in contact with a high-resistance layer as a dielectric layer of the transducer, and is restrained from migrating from the ion-containing layer to the high-resistance layer on application of a voltage is provided. The reactive ionic liquid comprises an ion pair that consists of an anion and a cation. (a) The cation (a1) is an imidazolium or quaternary ammonium cation, and (a2) comprises a reactive group that consists of an alkoxysilyl or phosphonate group. (b) The anion (b1) is a sulfonate, sulfonylimide, or nitrobenzoate anion. 1. A reactive ionic liquid comprising an ion pair that consists of an anion and a cation , (a1) being an imidazolium or quaternary ammonium cation; and', '(a2) comprising a reactive group that consists of an alkoxysilyl or phosphonate group,, '(a) the cation '(b1) being a sulfonate or nitrobenzoate anion.', '(b) the anion3. An ion-immobilized metal oxide particle comprising:{'claim-ref': {'@idref': 'CLM-00002', 'claim 2'}, 'the cation of the reactive ionic liquid according to ; and'}a metal oxide particle comprising a hydroxyl group,the cation being immobilized to the metal oxide particle via an Si—O or P—O bond between the reactive group of the cation and the hydroxyl group of the metal oxide particle.4. An ion-immobilized elastomer comprising:{'claim-ref': {'@idref': 'CLM-00003', 'claim 3'}, 'the ion-immobilized metal oxide particle according to ; and'}an elastomer that comprises a functional group that is reactive with a hydroxyl group,the ion-immobilized metal oxide particle being immobilized to the elastomer via a bond between a hydroxyl group contained in the ion-immobilized metal oxide particle and the functional group contained in the elastomer.5. A transducer comprising:{'sup': '13', 'a high-resistance dielectric layer that comprises an elastomer and has a volume resistivity of 10Ω·cm or higher;'}a pair of ...

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11-05-2017 дата публикации

IONIC LIQUID, LUBRICANT, AND MAGNETIC RECORDING MEDIUM

Номер: US20170130156A1
Принадлежит: DEXERIALS CORPORATION

A lubricant including: an ionic liquid, which includes a conjugate acid (B) and a conjugate base (X), and is protic, wherein the ionic liquid is represented by the following general formula (1), and wherein the conjugate base is a conjugate base of sulfonic acid, a conjugate base of sulfonimide, or a conjugate base of trisulfonylmethide: 3. A magnetic recording medium comprising:a non-magnetic support;a magnetic layer on the non-magnetic support; and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the lubricant according to on the magnetic layer.'} The present invention relates to a protic ionic liquid, a lubricant containing the ionic liquid, and a magnetic recording medium using the lubricant.Conventionally, in a thin film magnetic recording medium, a lubricant is applied onto a surface of a magnetic layer for the purpose of reducing frictions between a magnetic head and the surface of the magnetic recording medium, or reducing abrasion. In order to avoid adhesion, such as sticktion, an actual film thickness of the lubricant is of a molecular order. Accordingly, it is not exaggeration to say that the most important thing for a thin film magnetic recording medium is to select a lubricant having excellent abrasion resistance in any environment.During a life of a magnetic recording medium, it is important that a lubricant is present on a surface of the medium without causing desorption, spin-off, and chemical deteriorations. Making the lubricant present on a surface of a medium is more difficult, as the surface of the thin film magnetic recording medium is smoother. This is because the thin film magnetic recording medium does not have an ability of replenishing a lubricant as with a coating-type magnetic recording medium.In the case where an adhesion force between a lubricant and a protective film disposed at a surface of a magnetic layer is weak, moreover, a film thickness of the lubricant is reduced during heating or sliding hence accelerating abrasion. Therefore ...

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18-05-2017 дата публикации

Ionic liquid, lubricant, and magnetic recording medium

Номер: US20170137736A1
Принадлежит: Dexerials Corp

A lubricant including an ionic liquid, which includes a conjugate acid (B + ) and a conjugate base (X − ), and is protic, wherein the ionic liquid is represented by the following general formula (1): where R 1 and R 2 each represent a hydrogen atom or R 1 and R 2 form a benzene ring together with carbon atoms to which R 1 and R 2 are bonded, and R 3 represents a straight-chain hydrocarbon group having 10 or more carbon atoms in the general formula (1).

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28-08-2014 дата публикации

CYCLIC TRIAZO SODIUM CHANNEL BLOCKERS

Номер: US20140243343A1
Принадлежит: University of Greenwich

The present invention relates to triazine compounds having sodium channel blocking properties, and to use of the compounds for preparation of medicaments for treatment of associated disorders. The compounds are of formula I: 2. The salt of claim 1 , wherein the salt is a mesylate salt.3. The salt of claim 1 , wherein the salt is an isethionate salt.4. The salt of claim 1 , wherein the salt is a triflate salt.7. The salt of claim 6 , wherein the salt is a mesylate salt.8. The salt of claim 6 , wherein the salt is an isethionate salt.9. The salt of claim 6 , wherein the salt is a triflate salt.11. The compound of or a pharmaceutically acceptable salt or solvate thereof claim 10 , wherein R2 is NH.12. A pharmaceutical composition comprising a compound of or a pharmaceutically acceptable salt or solvate thereof in a therapeutically effective amount and a pharmaceutically acceptable carrier.13. A method of administering a therapeutically effective amount of a compound of or a pharmaceutically acceptable salt or solvate thereof to a subject in need of treatment of epilepsy claim 1 , multiple sclerosis claim 1 , or neuropathic pain.14. A pharmaceutical composition comprising the salt of in a therapeutically effective amount and a pharmaceutically acceptable carrier.15. A method of administering a therapeutically effective amount of the salt of to a subject in need of treatment of epilepsy claim 7 , multiple sclerosis claim 7 , or neuropathic pain.16. A pharmaceutical composition comprising the salt of in a therapeutically effective amount and a pharmaceutically acceptable carrier.17. A method of administering a therapeutically effective amount of the salt of to a subject in need of treatment of epilepsy claim 8 , multiple sclerosis claim 8 , or neuropathic pain.18. A pharmaceutical composition comprising the salt of in a therapeutically effective amount and a pharmaceutically acceptable carrier.19. A method of administering a therapeutically effective amount of the salt of ...

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23-05-2019 дата публикации

Resist composition and patterning process

Номер: US20190155155A1
Принадлежит: Shin Etsu Chemical Co Ltd

A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

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07-06-2018 дата публикации

METAL PARTICLE SUPPORTED CATALYSTS, METHODS FOR PRODUCING SAME, AND FUEL CELLS USING SAME

Номер: US20180159145A1
Принадлежит:

A catalyst, includes: a carbon support that possesses functional groups including a carboxyl group; and a metal that is supported onto the carbon support, wherein the proportion of the carboxyl group to the functional groups is 10% or higher. A method for producing a catalyst includes: (i) supporting metal particles onto a carbon support; (ii) bringing the carbon support into contact with an acid solution; and (iii) calcining the carbon support after Step (ii), wherein the carbon support included in the produced catalyst possesses functional groups including a carboxyl group, and the proportion of said carboxyl group to the functional groups is 10% or higher. 1. A catalyst , comprising:a carbon support that possesses functional groups including a carboxyl group; anda metal that is supported onto the carbon support, wherein the proportion of the carboxyl group to the functional groups is 10% or higher.2. The catalyst according to claim 1 , wherein the metal at least comprises platinum.3. The catalyst according to claim 1 , wherein the proportion is 50% or lower.4. A fuel cell claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the catalyst according to ; and'}an electrode layer containing an ionomer.5. The fuel cell according to claim 4 , wherein the ionomer is a perfluorosulfonic acid ionomer claim 4 , and has an EW value of 1300 or lower.6. A method for producing a catalyst claim 4 , comprising:(i) supporting metal particles onto a carbon support;(ii) bringing the carbon support into contact with an acid solution; and(iii) calcining the carbon, support after Step (ii), wherein the carbon support included in the produced catalyst possesses functional groups including a carboxyl group, and the proportion of said carboxyl group to the functional groups is 10% or higher.7. The method according to claim 6 , wherein Steps (ii) and (iii) are repeated.8. The method according to claim 6 , wherein the acid solution is a 0.5-3 mol/L nitric acid aqueous ...

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16-06-2016 дата публикации

ARYL ACETATE ONIUM MATERIALS

Номер: US20160168117A1
Автор: LaBeaume Paul J.
Принадлежит:

Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component. 8. An acid generator of wherein the acid generator comprises a polymerizable moiety.9. A photoresist composition comprising one or more acid generators of .10. A method for providing a photoresist relief image claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a) applying a coating layer of a photoresist composition of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer.11. A photoresist composition comprising one or more acid generators of .12. A photoresist composition comprising one or more acid generators of .13. A method for providing a photoresist relief image claim 5 , comprising:{'claim-ref': {'@idref': 'CLM-00011', 'claim 11'}, 'a) applying a coating layer of a photoresist composition of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer.14. A method for providing a photoresist relief image claim 5 , comprising:{'claim-ref': {'@idref': 'CLM-00012', 'claim 12'}, 'a) applying a coating layer of a photoresist composition of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer. In one aspect, the present invention relates to new onium acid generators that comprise a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety.Photoresists are photosensitive films for transfer of images to a substrate. They form negative or positive images. After coating a photoresist on a substrate, the coating is exposed through a patterned photomask to a source of activating energy such as ultraviolet light to ...

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16-06-2016 дата публикации

Salt, acid generator, photoresist composition, and method for producing photoresist pattern

Номер: US20160170298A1
Принадлежит: Sumitomo Chemical Co Ltd

A salt represented by the formula (I): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group; R 1 represents a C 1 to C 12 alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group; A 1 represents a C 2 to C 8 alkanediyl group; and R 2 represents a C 5 to C 18 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and “m” represents an integer of 0, 1, 2 or 3.

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28-06-2018 дата публикации

ALKOXY COMPOUNDS FOR DISEASE TREATMENT

Номер: US20180177746A1
Принадлежит:

The present invention relates generally to compositions and methods for treating neurodegenerative diseases and disorders, particularly ophthalmic diseases and disorders. Provided herein are alkoxyl derivative compounds and pharmaceutical compositions comprising these compounds. The subject compositions are useful for treating and preventing ophthalmic diseases and disorders, including age-related macular degeneration (AMD) and Stargardt's Disease. 168.-. (canceled)69. A method of modulating chromophore flux in a retinoid cycle comprising introducing into a subject a non-retinoid aromatic compound that inhibits 11-cis-retinol production with an ICof about 0.1 micromolar or less when assayed in vitro , the assay consisting of a homogenate of HEK293 cell clone expressing recombinant human RPE65 and LRAT as the source of visual enzyme , exogenous all-trans-retinol in the amount of about 20 μM , recombinant human CRALBP in the amount of about 80 μg/mL , about 10 mM pH 7.2 phosphate buffer , about 0.5% BSA and about 1 mM NaPPi , and wherein the amount of assay reaction product 11-cis-retinol being determined by HPLC analysis following heptane extraction of the assay reaction mixture and wherein the non-retinoid aromatic compound consists of a benzene core that is substituted with a first substituent , a second substituent , and an optional third substituent , wherein the first and second substituents are attached to the benzene core in a meta-substitution configuration , wherein the first substituent is a group selected from —CH(OH)CH(R)CHNHwherein R is H , CH , or —OH and the second substituent is an optionally substituted alkoxy group , and wherein the optional third substituent is a halogen or —OH.70. The method of claim 69 , wherein the R is H.71. The method of claim 69 , wherein the optionally substituted alkoxy group is —OR′ wherein R′ is optionally substituted C-Calkyl claim 69 , or optionally substituted carbocyclyalkyl.72. The method of claim 69 , wherein the ...

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04-06-2020 дата публикации

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

Номер: US20200174365A1
Принадлежит:

A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rto Reach independently represent an aryl group which may have a substituent, provided that one or more of Rto Rare aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; X represents a counter anion. 3. A method of forming a resist pattern , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resist film on a support using the resist composition according to ;'}exposing the resist film; anddeveloping the exposed resist film to form a resist pattern.4. The method of forming a resist pattern according to claim 3 , wherein the resist film is exposed with extreme ultraviolet (EUV) rays or electron beams (EB). The present invention relates to a resist composition, a method of forming a resist pattern, and a compound.Priority is claimed on Japanese Patent Application No. 2018-227686, filed on Dec. 4, 2018, the content of which is incorporated herein by reference.In lithography techniques, for example, a resist film formed of a resist material is formed on a substrate, and the resist film is subjected to selective exposure, followed by developing treatment, thereby forming a resist pattern having a predetermined shape on the resist film. A resist material with which the exposed portions of the resist film become soluble in a developing solution is called a positive-tone, and a resist material with which the exposed portions of the resist film become insoluble in a developing solution is called a negative-tone.In recent years, in the production ...

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05-07-2018 дата публикации

NARGENICIN COMPOUNDS AND USES THEREOF AS ANTIBACTERIAL AGENTS

Номер: US20180186808A1
Принадлежит:

The present invention relates to novel nargenicin related compounds which can inhibit DnaE and have antibacterial, particularly antimycobacterial activity against . The present invention also relates to method for inhibiting growth of mycobacterial cells as well as a method of treating mycobacterial infections by by administering an antimycobacterially effective amount of nargenicin or a nargenicin-related compound and/or their pharmaceutically acceptable salts. 2. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Y is O.3. (canceled)4. (canceled)5. (canceled)6. (canceled)9. (canceled)10. (canceled)11. (canceled)12. (canceled)13. (canceled)14. (canceled)15. (canceled)16. (canceled)17. (canceled)18. (canceled)19. A pharmaceutical composition which comprises a compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , and a pharmaceutically acceptable carrier.20. A method for inhibiting bacterial DnaE in a subject having a bacterial infection which comprises administering to the subject (i) an effective amount of a compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , or (ii) a pharmaceutical composition according to .21. A method for treating a bacterial infection which comprises administering to a subject in need of such treatment (i) a therapeutically effective amount of a compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , or (ii) a pharmaceutical composition according to .22. (canceled)23PseudomonasKlebsiellaEnterobacterEscherichiaMorganellaCitrobacterSerratiaAcintetobacter. The method of claim 20 , wherein the bacterial infection is due to spp. claim 20 , spp. claim 20 , spp. claim 20 , spp. claim 20 , spp. claim 20 , spp. claim 20 , spp. or spp.24Mycobacterium tuberculosis. A method for treating a infection in a subject in need thereof claim 20 , comprising administering to the subject a nargenicin compound claim 20 , or a pharmaceutically acceptable ...

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20-06-2019 дата публикации

Alkoxy compounds for disease treatment

Номер: US20190183816A1
Принадлежит: Acucela Inc

The present invention relates generally to compositions and methods for treating neurodegenerative diseases and disorders, particularly ophthalmic diseases and disorders. Provided herein are alkoxyl derivative compounds and pharmaceutical compositions comprising these compounds. The subject compositions are useful for treating and preventing ophthalmic diseases and disorders, including age-related macular degeneration (AMD) and Stargardt's Disease.

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11-08-2016 дата публикации

ONIUM SALT AND COMPOSITION COMPRISING THE SAME

Номер: US20160229801A1
Принадлежит: ASAHI KASEI E-MATERIALS CORPORATION

The onium salt of the present invention contains predetermined compound A represented by the general formula (1). The composition of the present invention contains the onium salt of the present invention, and an onium salt containing predetermined compound B represented by the general formula (2). The onium salt and the composition of the present invention exert well-balanced excellent physical properties in terms of cold curing properties, storage stability, thermal shock resistance after curing, and moisture resistance. 2. The onium salt according to claim 1 , wherein the Rhas an aromatic ring.3. The onium salt according to claim 1 , wherein the X is sulfur.4. The onium salt according to claim 1 , wherein the Ris an alkyl group.5. The onium salt according to claim 1 , wherein each of the R claim 1 , the R claim 1 , and the Ris an aralkyl group or an alkyl group having an unsaturated group at the β position.8. The composition according to claim 7 , wherein a ratio of the compound B to a total mass of the compound A and the compound B is 0.005 or more and 0.995 or less.9. The composition according to claim 7 , further comprising 5 ppm or higher and 10000 ppm or lower of a solvent having a boiling point of 0° C. to 200° C.10. The composition according to claim 7 , further comprising 5 ppm to 5000 ppm of a silver compound.13. A cation-generating agent comprising the onium salt according to .14. A cationically polymerizable composition comprising a cationically polymerizable compound claim 1 , a filler claim 1 , and the onium salt according to .15. An underfill comprising the cationically polymerizable composition according to .16. A method for producing an underfill claim 14 , comprising using the cationically polymerizable composition according to .17. A connecting structure obtained by the method for producing the underfill according to .18. A thermally cationically polymerizable composition comprising a binder component and the onium salt according to .19. An ...

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09-08-2018 дата публикации

Ionic Liquid, Lubricant, and Magnetic Recording Medium

Номер: US20180226094A1
Принадлежит:

A lubricant which includes an ionic liquid including a conjugate acid and a conjugate base having 2 or more anions in a molecule of the conjugate base, wherein the conjugate acid has a group including a straight-chain hydrocarbon group having 6 or more carbon atoms, and a pKa of an acid that is a source of the conjugate base in acetonitrile is 10 or less. 5. A magnetic recording medium comprising:a non-magnetic support;a magnetic layer disposed on the non-magnetic support; and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the lubricant according to , disposed on the magnetic layer.'} The present invention relates to an ionic liquid, a lubricant including the ionic liquid, and a magnetic recording medium using the lubricant.Conventionally, in a thin film magnetic recording medium, a lubricant is applied onto a surface of a magnetic layer for the purpose of reducing frictions between a magnetic head and the surface of the magnetic recording medium, or reducing abrasion. In order to avoid adhesion, such as sticktion, an actual film thickness of the lubricant is of a molecular order. Accordingly, it is not exaggeration to say that the most important thing for a thin film magnetic recording medium is to select a lubricant having excellent abrasion resistance in any environment.During a life of a magnetic recording medium, it is important that a lubricant is present on a surface of the medium without causing desorption, spin-off, and chemical deteriorations. Making the lubricant present on a surface of a medium is more difficult, as the surface of the thin film magnetic recording medium is smoother. This is because the thin film magnetic recording medium does not have an ability of replenishing a lubricant as with a coating-type magnetic recording medium.In the case where an adhesion force between a lubricant and a protective film disposed at a surface of a magnetic layer is weak, moreover, a film thickness of the lubricant is reduced during heating or sliding hence ...

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09-07-2020 дата публикации

Ionic Liquid, Lubricant, and Magnetic Recording Medium

Номер: US20200216773A1
Принадлежит:

A lubricant, which includes an ionic liquid including a conjugate base and a conjugate acid including 2 or more cations in a molecule of the conjugate acid, wherein the conjugate acid includes a monovalent group including a straight-chain hydrocarbon group having 6 or more carbon atoms, and an acid that is a source of the conjugate base has a pKa in acetonitrile of 10 or less. 1. (canceled)2. (canceled)3. (canceled)4. (canceled)5. (canceled)6. (canceled)7. (canceled)10. A magnetic recording medium comprising:a non-magnetic support;a magnetic layer disposed on or above the non-magnetic support; and{'claim-ref': {'@idref': 'CLM-00008', 'claim 8'}, 'the lubricant according to disposed on or above the magnetic layer.'}11. (canceled)12. (canceled)13. (canceled)14. (canceled)15. (canceled)16. (canceled)17. (canceled) The present invention relates to an ionic liquid having a dication structure, a lubricant including the ionic liquid, and a magnetic recording medium using the lubricant.Conventionally, in a thin film magnetic recording medium, a lubricant is applied onto a surface of a magnetic layer for the purpose of reducing frictions between a magnetic head and the surface of the magnetic recording medium, or reducing abrasion. In order to avoid adhesion, such as sticktion, an actual film thickness of the lubricant is of a molecular order. Accordingly, it is not exaggeration to say that the most important thing for a thin film magnetic recording medium is to select a lubricant giving excellent abrasion resistance in any environment.During a life of a magnetic recording medium, it is important that a lubricant is present on a surface of the medium without causing desorption, spin-off, and chemical deteriorations. Making the lubricant present on a surface of a medium is more difficult, as the surface of the thin film magnetic recording medium is smoother. This is because the thin film magnetic recording medium does not have an ability of replenishing a lubricant as with a ...

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19-08-2021 дата публикации

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Номер: US20210255545A1
Принадлежит: Sumitomo Chemical Company, Limited

Disclosed are a salt represented by formula (1), and an acid generator and a resist composition which include the same: 2. The salt according to claim 1 , wherein R claim 1 , Rand Reach independently represent a fluorine atom claim 1 , an iodine atom or a perfluoroalkyl group having 1 to 4 carbon atoms.3. An acid generator comprising the salt according to .4. A resist composition comprising the acid generator according to and a resin having an acid-labile group.7. The resist composition according to claim 4 , further comprising a salt generating an acid having an acidity lower than that of an acid generated from the acid generator.8. A method for producing a resist pattern claim 4 , which comprises:{'claim-ref': {'@idref': 'CLM-00004', 'claim 4'}, '(1) a step of applying the resist composition according to on a substrate,'}(2) a step of drying the applied composition to form a composition layer,(3) a step of exposing the composition layer,(4) a step of heating the exposed composition layer, and(5) a step of developing the heated composition layer. The present invention relates to a salt, an acid generator, a resist composition and a method for producing a resist pattern.Patent Document 1 mentions resist compositions each including, as acid generators, salts represented by the following formulas.Patent Document 2 mentions resist compositions including, as acid generators, salts represented by the following formulas.The present invention provides a salt and a resist composition comprising the salt capable of producing a resist pattern with CD uniformity (CDU) which is better than that of a resist pattern formed from the resist compositions including the salts mentioned above.The present invention includes the following inventions.[1] A salt represented by formula (I):wherein, in formula (I),Rrepresents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms,R, Rand Reach independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 ...

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18-08-2016 дата публикации

PROCESS FOR THE SYNTHESIS OF FLUORALKYL SULFONATE SALTS

Номер: US20160237028A1
Принадлежит:

A process for the preparation of the fluoroalkyl sulfonate salt of a nitrogen-based organic base said process comprising the step of reacting a fluoroalkyl sulfonyl halide with an organic base selected from the group consisting of tertiary amines, pyridines, amidines and guanidines. 1. A process for the preparation of the fluoroalkyl sulfonate salt of an organic base said process comprising the step of reacting a fluoroalkyl sulfonyl halide with an organic base selected from the group consisting of pyridines , amidines and guanidines.2. The process of wherein the fluoroalkyl sulfonyl halide is selected from the group consisting of the fluoroalkyl sulfonates of formula (I) RSOX claim 1 , wherein X is selected from F claim 1 , Cl and Br; and Ris selected from the group consisting of Cto Cstraight-chain claim 1 , branched or cyclic fluorinated alkyl or alkenyl claim 1 , optionally substituted and/or optionally comprising heteroatoms selected from the group consisting of O claim 1 , N and S in the chain.4. The process of claim 1 , wherein the fluoroalkyl sulfonyl halide is reacted with the organic base in the presence of an alcohol.5. The process of wherein the organic base is selected from the group consisting of pyridines and amidines.7. The process of claim 1 , wherein the fluoroalkyl sulfonyl halide is reacted with the organic base in the presence of water under basic conditions.8. The process of wherein the organic base is a guanidine. This application claims priority to European application No. 13187325.9, filed on Oct. 4, 2013; the whole content of this application is incorporated herein by reference for all purposes.The present invention relates to a process for the preparation of fluoroalkyl sulfonate salts of nitrogen-based organic bases.Ionic liquids are liquids composed of ions that are liquid at temperatures of 100° C. or below. The very low vapour pressure, high thermal stability, and tuneable miscibility with other liquid phases that characterizes ionic ...

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26-08-2021 дата публикации

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID

Номер: US20210263413A9
Принадлежит: JSR Corporation

A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), Arepresents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring. 1. A radiation-sensitive resin composition comprising:a polymer that comprises a structural unit comprising an acid-labile group; anda radiation-sensitive acid generating agent,wherein the radiation-sensitive acid generating agent comprises a sulfonate anion and a radiation-sensitive cation,wherein the sulfonate anion comprises two or more rings, andan iodine atom and a monovalent group having 0 to 10 carbon atoms which comprises at least one of an oxygen atom and a nitrogen atom are bonded to at least one of the two or more rings.2. The radiation-sensitive resin composition according to claim 1 , wherein the at least one of the two or more rings to which the iodine atom and the monovalent group having 0 to 10 carbon atoms which comprises at least one of an oxygen atom and a nitrogen atom are bonded is an aromatic ring.4. The radiation-sensitive resin composition according to claim 3 , wherein the ring comprised in Ain the formula (1) is an aromatic ring having 6 to 20 ring atoms.6. The radiation-sensitive resin composition according to claim 3 , wherein Rin the formula (1) represents a hydroxy group claim 3 , a hydroxyhydrocarbon group claim 3 , a group comprising a ...

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09-09-2021 дата публикации

METHODS OF MAKING A POLYFLUORINATED ALLYL ETHER AND COMPOUNDS RELATING TO THE METHODS

Номер: US20210276946A1
Принадлежит:

A method includes combining first components including at least one of CF═CF—CF—OSOCl or CF═CF—CF—OSOCF, a polyfluorinated compound having at least one ketone or carboxylic acid halide, and fluoride ion to provide a compound comprising at least one perfluorinated allyl ether group. A method includes combining second components including B(OSOCl)and hexafluoropropylene to provide CF═CF—CF—OSOCl. Another method includes combining second components including M(OSOCF)and hexafluoropropylene at a temperature above 0° C. to provide CF═CF—CF—OSOCF, wherein M is Al or B. The compound CF═CF—CF—OSOCl is also provided. 1. A method of making a compound comprising at least one perfluorinated allyl ether group , the method comprising:combining first components comprising:{'claim-ref': {'@idref': 'CLM-00011', 'claim 11'}, 'the compound of'}a polyfluorinated compound comprising at least one ketone, carboxylic acid halide, or a combination thereof, andfluoride ionto provide the compound comprising at least one perfluorinated allyl ether group.2. The method of claim 1 , wherein the compound comprising at least one perfluorinated allyl ether group is represented by formula CF═CFCF(OCF)ORf claim 1 , wherein each n is independently from 2 to 6 claim 1 , z is 0 claim 1 , 1 claim 1 , or 2 claim 1 , and Rf is a linear or branched perfluoroalkyl group having from 1 to 8 carbon atoms and optionally interrupted by one or more —O— groups.3. The method of claim 1 , wherein the compound comprising at least one perfluorinated allyl ether group is represented by formula CF═CF—CF—O—R—O—CF—CF═CF claim 1 , wherein Rrepresents linear or branched perfluoroalkylene or perfluoropolyoxyalkylene or arylene claim 1 , which may be non-fluorinated or fluorinated.4. The method of claim 3 , wherein Rrepresents linear or branched perfluoroalkylene or perfluoropolyoxyalkylene.5. The method of claim 1 , wherein the polyfluorinated compound comprising at least one ketone claim 1 , carboxylic acid halide claim 1 , ...

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06-09-2018 дата публикации

Ionic Liquid, Lubricating Agent, and Magnetic Recording Medium

Номер: US20180251468A1
Принадлежит:

A lubricating agent including an ionic liquid formed from a Bronsted acid (HX) and a Bronsted base (B), wherein the Bronsted base has a linear hydrocarbon group having 10 or more carbon atoms and the difference between the pKa value of the Bronsted acid in water and the pKa value of the Bronsted base in water is 12 or more. 129-. (canceled)31. The ionic liquid according to claim 30 , wherein the ionic liquid has an exothermic peak temperature determined by a differential thermal analysis (DTA) measurement of 370° C. or higher.32. The ionic liquid according to claim 30 , wherein the hydrocarbon group is an alkyl group.35. The ionic liquid according to claim 30 , wherein the number of carbon atoms in the linear hydrocarbon group is 10 or more and 25 or less.37. The ionic liquid according to claim 36 , wherein the ionic liquid has an exothermic peak temperature determined by a differential thermal analysis (DTA) measurement of 370° C. or higher.40. The ionic liquid according to claim 36 , wherein the number of carbon atoms in the linear hydrocarbon group is 10 or more and 25 or less.41. A lubricating agent claim 36 , comprising;{'claim-ref': {'@idref': 'CLM-00030', 'claim 30'}, 'the ionic liquid according to .'}42. A lubricating agent claim 36 , comprising;{'claim-ref': {'@idref': 'CLM-00036', 'claim 36'}, 'the ionic liquid according to .'}44. The lubricating agent according to claim 43 , wherein the ionic liquid has an exothermic peak temperature determined by a differential thermal analysis (DTA) measurement of 370° C. or higher.45. The lubricating agent according to claim 43 , wherein the hydrocarbon group is an alkyl group.48. The lubricating agent according to claim 47 , wherein the ionic liquid has an exothermic peak temperature determined by a differential thermal analysis (DTA) measurement of 370° C. or higher. The present invention relates to an ionic liquid comprised of a Bronsted acid and a Bronsted base, a lubricating agent containing the ionic liquid, and ...

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13-09-2018 дата публикации

Salt and photoresist composition containing the same

Номер: US20180259851A1
Принадлежит: Sumitomo Chemical Co Ltd

A salt represented by the formula (I). wherein Z + , Q 1 , Q 2 , R 1 , R 2 , R 3 , R 4 , R 5 , Z, X 1 , X 2 , X a , X b , L 1 , L 2 , L 3 and L 4 are defined in the specification.

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29-09-2016 дата публикации

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, ACID GENERATOR, PHOTOREACTIVE QUENCHER, AND COMPOUND

Номер: US20160280679A1
Принадлежит:

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component including a compound (B0-1) represented by general formula (b0) shown below in which Rarepresents an aromatic ring; Rarepresents an alkyl group of 5 or more carbon atoms optionally having a substituent; Raand Raeach independently represents an alkyl group of 1 to 10 carbon atoms optionally having a substituent; n1 represents an integer of 1 to 5; n2 represents an integer of 0 to 2; 2. The resist composition according to claim 1 , further comprising a photoreactive quencher component (D).4. The resist composition according to claim 1 , wherein Rarepresents a linear alkyl group of 10 or more carbon atoms.5. The resist composition according to claim 2 , wherein Rarepresents a linear alkyl group of 10 or more carbon atoms.6. The resist composition according to claim 3 , wherein Rarepresents a linear alkyl group of 10 or more carbon atoms.7. A method of forming a resist pattern claim 3 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resist film on a substrate using the resist composition of ;'}exposing the resist film; anddeveloping the resist film to form a resist pattern.9. The acid generator according to claim 8 , wherein Rarepresents a linear alkyl group of 10 or more carbon atoms.11. The compound according to claim 10 , wherein Rarepresents a linear alkyl group of 10 or more carbon atoms.14. The resist composition according to claim 12 , wherein Rarepresents a linear alkyl group of 10 or more carbon atoms.15. The resist composition according to claim 13 , wherein Rarepresents a linear alkyl group of 10 or more carbon atoms.16. A method of forming a resist pattern claim 13 , comprising:{'claim-ref': {'@idref': 'CLM-00012', 'claim 12'}, 'forming a resist film on a ...

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29-09-2016 дата публикации

Resist composition, method for forming resist pattern, photo-reactive quencher and compound

Номер: US20160282717A1
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid. The composition includes a base material component whose solubility in a developing solution changes under the action of an acid; an acid generator component which generates an acid upon exposure; and a photo-reactive quencher which contains a compound represented by the general formula shown below: in which Ra 1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent; and Ra 2 and Ra 3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent. X − represents a counter anion.

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18-11-2021 дата публикации

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер: US20210356862A1
Принадлежит: FUJIFILM Corporation

An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin.

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06-10-2016 дата публикации

HYDROGEN OXIDATION CATALYST

Номер: US20160289254A1
Принадлежит:

The present invention is to provide a hydrogen oxidation catalyst that does not contain platinum. Disclosed is a hydrogen oxidation catalyst that is a dinuclear transition metal complex having a chemical structure represented by the following general formula (1) or (2): 1wherein the hydrogen oxidation catalyst is a dinuclear transition metal complex having a chemical structure represented by the following general formula (1) or (2):. A hydrogen oxidation catalyst,wherein, in the general formulae (1) and (2), Mand Mare each independently Fe or Ru; Arand Arare each independently a cyclopentadienyl group or a pentamethylcyclopentadienyl group; Arand Arare each independently a divalent aromatic hydrocarbon group having 6 to 12 carbon atoms; and Aris a monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms, and in the general formula (2), Rand Rare each independently a hydrogen atom or a monovalent aliphatic hydrocarbon group having 1 to 3 carbon atoms. The present invention relates to a hydrogen oxidation catalyst that does not contain platinum.Platinum catalyst is widely used as fuel cell anode catalyst (Patent Literature 1). Platinum catalyst has excellent hydrogen oxidizing ability. However, since platinum, which is a raw material therefor, is expensive and rare, there is a demand for less expensive hydrogen oxidation catalyst, as fuel cell anode catalyst.Meanwhile, an example if described in Non-Patent Literature 1, in which a thiolate-bridged ruthenium dinuclear complex is used for propargyl alcohol reduction.There has been considerable research on hydrogen oxidation catalysts that have excellent hydrogen oxidizing ability and are inexpensive. However, practical examples of hydrogen oxidation catalysts that do not contain platinum, are not found yet.The present invention was achieved in light of such a circumstance that low-cost hydrogen oxidation methods have been sought. The object of the present invention is to provide a hydrogen oxidation catalyst ...

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12-10-2017 дата публикации

NON-AQUEOUS ELECTROLYTE MAGNESIUM SECONDARY BATTERY

Номер: US20170294675A1

This invention provides a non-aqueous electrolyte magnesium secondary battery comprising a positive electrode, a negative electrode, a separator, and a non-aqueous electrolyte, the non-aqueous electrolyte comprising [N(SOCF)] as an anion, and Mg and/or an organic onium cation as a cation. 1. A non-aqueous electrolyte magnesium secondary battery comprising a positive electrode , a negative electrode , a separator , and a non-aqueous electrolyte ,{'sub': 2', '3', '2, 'sup': −', '2+, 'the non-aqueous electrolyte comprising [N(SOCF)] as an anion, and Mg and an organic onium cation as cations,'}the organic onium cation being ethylmethylimidazolium (EMI), an ammonium cation having a symmetrical structure, or a phosphonium cation having a symmetrical structure.2. The non-aqueous electrolyte magnesium secondary battery according to claim 1 , wherein the negative electrode comprises a negative electrode active material selected from the group consisting of a metal magnesium claim 1 , magnesium alloy materials claim 1 , carbon materials claim 1 , and composite materials of metal magnesium or a magnesium alloy with a carbon material.3. The non-aqueous electrolyte magnesium secondary battery according to claim 1 , wherein the positive electrode comprises a positive active material claim 1 , the positive active material being a material in which magnesium ions undergo an insertion/extraction reaction.4. The non-aqueous electrolyte magnesium secondary battery according to claim 3 , wherein the material in which magnesium ions undergo an insertion/extraction reaction is at least one member selected from the group consisting of metal sulfides free from magnesium claim 3 , metal oxides free from magnesium claim 3 , oxides obtained by removing Li from Li-containing composite oxides and replacing the Li with an Mg ion claim 3 , Chevrel materials claim 3 , polyanion materials claim 3 , silicate materials claim 3 , magnesium nitride claim 3 , organic positive-electrode materials claim 3 ...

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19-10-2017 дата публикации

IONIC LIQUID, LUBRICANT, AND MAGNETIC RECORDING MEDIUM

Номер: US20170298285A1
Принадлежит: DEXERIALS CORPORATION

A lubricant, which includes an ionic liquid including a conjugate base and a conjugate acid, wherein the conjugate acid is represented by General Formula (A) below, and wherein a pKa of an acid that is a source of the conjugate base in acetonitrile is 10 or less, 3. A magnetic recording medium comprising:a non-magnetic support;a magnetic layer disposed on the non-magnetic support; and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the lubricant according to , disposed on the magnetic layer.'} Field of the InventionThe present invention relates to an ionic liquid, a lubricant containing the ionic liquid, and a magnetic recording medium using the lubricant.Description of the Related ArtConventionally, in a thin film magnetic recording medium, a lubricant is applied onto a surface of a magnetic layer for the purpose of reducing frictions between a magnetic head and the surface of the magnetic recording medium, or reducing abrasion. In order to avoid adhesion, such as sticktion, an actual film thickness of the lubricant is of a molecular order. Accordingly, it is not exaggeration to say that the most important thing for a thin film magnetic recording medium is to select a lubricant having excellent abrasion resistance in any environment.During a life of a magnetic recording medium, it is important that a lubricant is present on a surface of the medium without causing desorption, spin-off, and chemical deteriorations. Making the lubricant present on a surface of a medium is more difficult, as the surface of the thin film magnetic recording medium is smoother. This is because the thin film magnetic recording medium does not have an ability of replenishing a lubricant as with a coating-type magnetic recording medium.In the case where an adhesion force between a lubricant and a protective film disposed at a surface of a magnetic layer is weak, moreover, a film thickness of the lubricant is reduced during heating or sliding hence accelerating abrasion. Therefore, a large ...

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26-10-2017 дата публикации

SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION

Номер: US20170305848A1
Принадлежит:

A novel sulfonium salt having high sensitivity with respect to active energy rays, a photoacid generator including the sulfonium salt, and a photosensitive composition containing the photoacid generator. The sulfonium salt is represented by formula (a1). In the formula, Rand Reach independently represent the group that is represented by formula (a2) or an alkyl group that may be substituted by a halogen atom, Rand Rare bonded to each other and may form a ring with the sulfur atom within the formula, Ris the group represented by formula (a3) or the group represented by formula (a4), Arepresents S or the like, Xrepresents a monovalent anion, and Rand Rare not both an alkyl group which may be substituted with a halogen atom. In formulas (a2) to (a4), the ring Zrepresents an aromatic hydrocarbon ring, R, R, R, and Reach represents a specific monovalent group, R, R, and Reach represents a specific divalent group, Aand Aeach represents S or the like, m1 represents an integer of 0 or more, and n1 and n2 each represent 0 or more. 2. A photoacid generator comprising the sulfonium salt according to .3. A photosensitive composition containing a photoacid generator comprising the sulfonium salt according to .4. A method of generating an acid claim 1 , comprising irradiating the sulfonium salt according to with an energy ray. The present invention relates to a sulfonium salt, a photoacid generator, and a photosensitive composition. More particularly, the present invention relates to a sulfonium salt suitable for curing a cationically polymerizable compound under the action of active energy rays such as light, electronic beams or X-rays, a photoacid generator including the sulfonium salt and a photosensitive composition containing the photoacid generator.A triarylsulfonim salt (PTL 1), a phenacylsulfonium salt having a naphthalene skeleton (PTL 2), a dialkylbenzylsulfonium salt (PTL 3), a sulfonium salt having a thioxanthone skeleton introduced therein (PTL 4) and a sulfonium ...

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26-10-2017 дата публикации

NARGENICIN COMPOUNDS AND USES THEREOF AS ANTIBACTERIAL AGENTS

Номер: US20170305924A1
Принадлежит: Merck Sharp & Dohme Corp.

The present invention relates to novel nargenicin related compounds which can inhibit DnaE and have antibacterial, particularly antimycobacterial activity against Mycobacterium tuberculosis. The present invention also relates to method for inhibiting growth of mycobacterial cells as well as a method of treating mycobacterial infections by by administering an antimycobacterially effective amount of nargenicin or a nargenicin-related compound and/or their pharmaceutically acceptable salts. 2. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein Y is O.4. The compound of claim 1 , or a pharmaceutically acceptable salt thereof claim 1 , wherein{'sup': 1a', 'A, 'sub': 1-6', '2-6', '3', '3', '3', '3', '3', '1-6, 'Ris H, Calkyl, Calkenyl, —CH(CH)NH-cyclopropyl, —CH(CH)═NOH, —CH(CH)OR, —CH(CH)-1H-indene-1,3(2H)-dione, —CH(CH)-isoindoline-1,3-dione, —C(═O)Calkyl, or AryA;'}{'sup': '1b', 'Ris H;'}{'sup': A', 'g', 'g', 'g', 'g, 'sub': 1-6', '1-6', '2, 'claim-text': {'sub': '3', 'wherein the alkyl is optionally substituted with one or two substituents independently selected from halogen, —SCH, AryA, and HetA; and'}, 'Ris H, Calkyl, —C(═O)Calkyl, C(═O)NHR, —C(═O)OR, —C(═O)C(═O)NHR, —C(═O)C(═O)OR, —C(═O)-AryA, —C(═O)-HetA, —C(═O)C(═O)-HetA, —SOOH, or tert-butyl dimethylsilyl;'}{'sup': g', 'x', 'y', 'x', 'y, 'sub': 1-8', '3-6', '3', '3, 'Ris H, Calkyl, Ccycloalkyl, —C(═O)CCl, NRR, —NHC(═O)NRR, —NHC(═O)OCH;'}and{'sub': 2', '2', '2', '2', '2', '1-6, 'sup': x', 'y', 'x', 'y, 'AryA or —CH(CH-AryA)C(═O)NHCH(CHCHCHNHC(═NH)NH)C(═O)NH-AryA, wherein the alkyl is optionally substituted by 1 to 3 NRRor —OH substituents or 1 sub stituent selected from Calkoxy, —COOH, —C(═O)NRR, AryA, and HetA.'}6. The compound of claim 5 , wherein [{'sub': 1', '6', '1', '6', '2', '0-1', '1-6', '1-6', '2', '1-6', '1-6', '2', '0-1', '2, 'sup': x', 'y, '1) a monocyclic ring selected from furanyl, imidazolyl, pyrazolyl, pyrrolyl, phenyl, pyridinyl, tetrazolyl, thiazolyl, or ...

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12-11-2015 дата публикации

Process for Preparing Spirocyclic Cyclohexane Compounds, Compositions Containing Such Compounds and Method of Using Such Compounds

Номер: US20150322080A1
Принадлежит: GRUENENTHAL GmbH

Spirocyclic cyclohexane compounds corresponding to formula I a method for producing them, pharmaceutical compositions containing them, and methods of using them.

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10-11-2016 дата публикации

One-pot water-free ionic liquids synthesis using trialkyl orthoesters

Номер: US20160326095A1

The present disclosure provides a method for producing an ionic liquid, the method comprising: reacting a nitrogen-containing heterocyclic compound or an amine-based compound with an ammonium salt along with trialkyl orthoformate to acquire an alkylated nitrogen-containing heterocyclic compound or an alkylated nitrogen-containing amine-based compound, wherein the alkylated nitrogen-containing heterocyclic compound or the alkylated nitrogen-containing amine-based compound as a cation of the ionic liquid is ionically bonded to an anion included in the ammonium salt to form the ionic liquid.

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10-12-2015 дата публикации

Ionic Liquid, Lubricating Agent, and Magnetic Recording Medium

Номер: US20150353558A1
Принадлежит:

A lubricating agent including an ionic liquid formed from a Bronsted acid (HX) and a Bronsted base (B), wherein the Bronsted base has a linear hydrocarbon group having 10 or more carbon atoms and the difference between the pKa value of the Bronsted acid in water and the pKa value of the Bronsted base in water is 12 or more. 1. A lubricating agent , comprising:an ionic liquid formed from a Bronsted acid (HX) and a Bronsted base (B),wherein the Bronsted base has a linear hydrocarbon group having 10 or more carbon atoms, andwherein a difference between a pKa value of the Bronsted acid in water and a pKa value of the Bronsted base in water is 12 or more.3. The lubricating agent according to claim 1 , wherein the Bronsted base is a cyclic amidine which contains the linear hydrocarbon group having 10 or more carbon atoms.5. The lubricating agent according to claim 1 , wherein the Bronsted acid is sulfonic acid.6. The lubricating agent according to claim 1 , wherein the ionic liquid has an exothermic peak temperature determined by a differential thermal analysis (DTA) measurement of 370° C. or higher.7. The lubricating agent according to claim 1 , wherein the hydrocarbon group is an alkyl group.8. A lubricating agent claim 1 , comprising:an ionic liquid formed from a Bronsted acid (HX) and a Bronsted base (B),wherein the Bronsted base has a linear hydrocarbon group having 10 or more carbon atoms, andwherein a difference between a pKa value of the Bronsted acid in acetonitrile and a pKa value of the Bronsted base in acetonitrile is 6 or more.10. The lubricating agent according to claim 8 , wherein the Bronsted base is a cyclic amidine which contains the linear hydrocarbon group having 10 or more carbon atoms or a cyclic guanidine which contains the linear hydrocarbon group having 10 or more carbon atoms.12. The lubricating agent according to claim 8 , wherein the ionic liquid has an exothermic peak temperature determined by a differential thermal analysis (DTA) measurement ...

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01-12-2016 дата публикации

Sulfonium salt, chemically amplified resist composition, and patterning process

Номер: US20160349612A1
Принадлежит: Shin Etsu Chemical Co Ltd

A sulfonium salt having both anion and cation moieties in the molecule functions as a photoacid generator and is compatible with other components. A resist composition comprising the sulfonium salt has the advantages of reduced acid diffusion and forms a pattern with a good balance of sensitivity, MEF and DOF, less outgassing, and minimal defects.

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31-10-2019 дата публикации

METHOD FOR PRODUCING C2-C20 FLUORINE-CONTAINING ORGANIC ACID, AND COMPOSITION COMPRISING C2-C20 FLUORINE-CONTAINING ORGANIC ACID

Номер: US20190330135A1
Принадлежит: DAIKIN INDUSTRIES, LTD.

There is provided a method for producing a C2-C20 fluorine-containing organic acid with reduced fluorine-free organic compound. A method for producing a C2-C20 fluorine-containing organic acid, wherein the method comprises contacting a mixture containing a C2-C20 fluorine-containing organic acid and a fluorine-free organic compound with a concentrated sulfuric acid and then separating a C2-C20 fluorine-containing organic acid phase from a concentrated sulfuric acid phase, wherein the contacting is conducted such that an amount of water present in the concentrated sulfuric acid phase is 10% by mass or less, and the C2-C20 fluorine-containing organic acid is obtained in the form of the C2-C20 fluorinated organic acid phase having a reduced content ratio of the fluorine-free organic compound compared with said mixture.

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07-12-2017 дата публикации

Resist composition and patterning process

Номер: US20170351177A1
Принадлежит: Shin Etsu Chemical Co Ltd

A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

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29-10-2020 дата публикации

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID

Номер: US20200341376A1
Принадлежит: JSR Corporation

A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), Arepresents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring. 1. A radiation-sensitive resin composition comprising:a polymer that comprises a structural unit comprising an acid-labile group; anda radiation-sensitive acid generating agent,wherein the radiation-sensitive acid generating agent comprises a sulfonate anion and a radiation-sensitive cation,wherein the sulfonate anion comprises two or more rings, andan iodine atom and a monovalent group having 0 to 10 carbon atoms which comprises at least one of an oxygen atom and a nitrogen atom are bonded to at least one of the two or more rings.2. The radiation-sensitive resin composition according to claim 1 , wherein the at least one of the two or more rings to which the iodine atom and the monovalent group having 0 to 10 carbon atoms which comprises at least one of an oxygen atom and a nitrogen atom are bonded is an aromatic ring.4. The radiation-sensitive resin composition according to claim 3 , wherein the ring comprised in Ain the formula (1) is an aromatic ring having 6 to 20 ring atoms.6. The radiation-sensitive resin composition according to claim 3 , wherein Rin the formula (1) represents a hydroxy group claim 3 , a hydroxyhydrocarbon group claim 3 , a group comprising a ...

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22-12-2016 дата публикации

CYCLIC AZINE COMPOUND HAVING ADAMANTYL GROUP, PRODUCTION METHOD, AND ORGANIC ELECTROLUMINESCENT DEVICE CONTAINING IT AS CONSTITUENT COMPONENT

Номер: US20160372678A1
Принадлежит: TOSOH CORPORATION

An azine compound represented by the formula (1), a method for its production and an organic electroluminescent device containing it as a constituent component. 2. The cyclic azine compound according to claim 1 , wherein Z is a nitrogen atom.3. The cyclic azine compound according to claim 1 , wherein Arand Arare each independently a phenyl group claim 1 , a biphenyl group claim 1 , a naphthyl group claim 1 , a phenanthryl group claim 1 , an anthryl group claim 1 , a pyrenyl group claim 1 , a triphenylenyl group claim 1 , a chrysenyl group claim 1 , a fluoranthenyl group claim 1 , an acenaphthylenyl group claim 1 , a pyridyl group claim 1 , a pyrazyl group claim 1 , a pyrimidyl group claim 1 , a pyridazyl group claim 1 , a triazyl group claim 1 , a quinolyl group or an isoquinolyl group (these groups each independently may have claim 1 , as a substituent claim 1 , a methyl group claim 1 , an ethyl group claim 1 , a propyl group claim 1 , an isopropyl group claim 1 , an n-butyl group or a t-butyl group).4. The cyclic azine compound according to claim 1 , wherein Aris a pyridyl group claim 1 , a pyrazyl group claim 1 , a pyridazyl group claim 1 , a pyrimidyl group claim 1 , a triazyl group claim 1 , a quinolyl group claim 1 , an isoquinolyl group claim 1 , a naphthyridyl group claim 1 , a quinazolyl group claim 1 , a quinoxalyl group claim 1 , a benzoquinolyl group claim 1 , an acridyl group claim 1 , a phenanthridyl group claim 1 , a phenanthrolyl group claim 1 , a phenyl group claim 1 , a biphenyl group claim 1 , a naphthyl group claim 1 , a phenanthryl group claim 1 , an anthryl group claim 1 , a pyrenyl group claim 1 , a triphenylenyl group claim 1 , a chrysenyl group claim 1 , a fluoranthenyl group or an acenaphthylenyl group (these groups each independently may have claim 1 , as a substituent claim 1 , a methyl group claim 1 , a phenyl group claim 1 , a naphthyl group claim 1 , a phenanthryl group claim 1 , an anthryl group claim 1 , a pyrenyl group claim 1 , a ...

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29-12-2016 дата публикации

Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound

Номер: US20160376233A1
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0): Z 01 to Z 04 each independently represent a substituent having electron withdrawing properties, Rb 21 and Rb 22 each independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rb 1 represents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0 − represents an organic anion.

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28-12-2017 дата публикации

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Номер: US20170371241A1
Принадлежит:

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Vais a divalent hydrocarbon group. nrepresents an integer of 0 to 2. Ra′and Ra′are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), Rrepresents a cyclic hydrocarbon group. Yrepresents a divalent linking group containing an ester bond. Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and M is an m-valent organic cation. 2. The resist composition according to claim 1 , wherein a ratio of the structural unit (a0) in the resin component (A1) is 20 to 70 mol % with respect to a total of the entire structural units for constituting the resin component (A1).3. The resist composition according to claim 1 , wherein a content of the compound (B1) is 1 to 40 parts by mass with respect to 100 parts by mass of the base material component (A).4. The resist composition according to claim 1 , wherein the resin component (A1) further comprises a structural unit (a2) containing a lactone-containing cyclic group claim 1 , an —SO— containing cyclic group claim 1 , or a carbonate-containing cyclic group.7. The resist composition according to claim 1 , wherein the structural unit (a10) has a hydroxystyrene skeleton.8. The resist composition according to claim 1 , wherein the resin component (A1) comprises a polymer compound (A1-1) having the structural unit (a0).9. The resist composition according to claim 8 , wherein the polymer compound (A1-1) further comprises the structural unit (a2).10. The resist composition according to claim 8 , wherein the polymer compound (A1-1) further comprises the structural unit (a9).11. The resist composition ...

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28-11-2019 дата публикации

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR

Номер: US20190361345A1
Принадлежит:

A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rxto Rxrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ryto Ryrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rzto Rzrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rxto Rx, Ryto Ryand Rzto Rzhas an anion group, M represents a sulfonium cation having a sulfonyl group, Rto Reach independently represent a monovalent organic group; provided that at least one of Rto Ris an organic group having an acid dissociable group; and M represents an m-valent organic cation having an electron-withdrawing group. 2. The resist composition according to claim 1 ,{'sup': 1', '2', '3', '4, 'wherein at least one of Rxto Rxand at least one of Rxto Rxare mutually bonded to form a ring structure.'}5. The resist composition according to claim 1 ,{'sup': 1', '2, 'wherein Ryto Ryare mutually bonded to form a ring structure.'}6. The resist composition according to claim 3 ,{'sup': 7', '8, 'wherein Rxto Rxare mutually bonded to form a ring structure.'}7. The resist composition according to claim 1 ,{'sup': 1', '4, 'wherein two or more of Rzto Rzare mutually bonded to form a ring structure.'}8. The resist composition according to claim 1 ,{'sup': 1', '4, 'wherein at least one of Rzto Rzhas an anion group.'}9. The resist composition according to claim 3 ,{'sup': 5', '6, 'wherein at least one of Rxand Rxhas an anion group.'}10. The resist composition according to claim 1 ,{'sup': b2', 'b3, 'wherein the sulfonyl group that a cation represented by the general formula (ca-0) has is a bivalent sulfonyl group in which one carbon atom of a ring formed of Rto Rthat are mutually bonded to form a ring together with a sulfur atom in the formula is substituted.'}11. The resist composition according to claim 1 ,{'sub ...

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24-12-2020 дата публикации

PROCESS FOR PRODUCING SULFONIC ACID GROUP-CONTAINING MONOMER

Номер: US20200399210A1
Принадлежит: ASAHI KASEI KABUSHIKI KAISHA

The present disclosure is directed to provide a process capable of producing a sulfonic acid group-containing monomer in a good yield, which can be used as a raw material of fluorine-based polymer electrolytes, such as membranes for fuel cells, catalyst binder polymers for fuel cells, and membranes for chlor-alkali electrolysis. A process for producing a sulfonic acid group-containing monomer represented by the general formula (3) includes the step of mixing and stirring a cyclic compound represented by the general formula (1) and a silanol compound represented by the general formula (2). 3. The process for producing a sulfonic acid group-containing monomer according to claim 1 , wherein the silanol compound is a compound wherein M in the general formula (2) is an alkali metal.4. The process for producing a sulfonic acid group-containing monomer according to claim 1 , wherein the silanol compound is a compound selected from the group consisting of lithium trimethylsilanolate claim 1 , lithium triethylsilanolate claim 1 , lithium triisopropylsilanolate claim 1 , lithium (tert-butyl)dimethylsilanolate claim 1 , lithium triphenylsilanediolate claim 1 , dilithium dimethylsilanediolate claim 1 , dilithium diethylsilanediolate claim 1 , dilithium diphenylsilanediolate claim 1 , sodium trimethylsilanolate claim 1 , sodium triethylsilanolate claim 1 , sodium triisopropylsilanolate claim 1 , sodium (tert-butyl)dimethylsilanolate claim 1 , sodium triphenylsilanediolate claim 1 , disodium dimethylsilanediolate claim 1 , disodium diethylsilanediolate claim 1 , and disodium diphenylsilanediolate.5. The process for producing a sulfonic acid group-containing monomer according to claim 2 , wherein the silanol compound is a compound wherein M in the general formula (2) is an alkali metal.6. The process for producing a sulfonic acid group-containing monomer according to claim 2 , wherein the silanol compound is a compound selected from the group consisting of lithium ...

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30-01-2012 дата публикации

Pattern forming method, chemical amplification resist composition and resist film

Номер: SG176867A1
Принадлежит: Fujifilm Corp

A pattern forming method, including: (i) forming a film from a chemical amplification resist composition; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film by using a developer containing an organic solvent, wherein the chemical amplification resist composition contains: (A) a resin capable of decreasing a solubility of the resin (A) in the developer containing an organic solvent by an action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a basic compound or ammonium salt compound whose basicity decreases upon irradiation with an actinic ray or radiation, and a resist composition used for the pattern forming method and a resist film formed from the resist composition are provided.

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22-05-2013 дата публикации

술포늄 화합물, 광산발생제 및 레지스트 조성물

Номер: KR101263673B1
Принадлежит: 금호석유화학 주식회사

본 발명은 술포늄 화합물, 광산발생제 및 레지스트 조성물에 관한 것으로, 하기 화학식1로 표시되는 화합물을 제공한다. [화학식1] 상기 화학식1에서 상기 X, R 1 내지 R 6 및 -A에 관한 정의는 명세서에 기재된 바와 같다. 본 발명의 술포늄 화합물은 한 개의 분자에 양이온 영역에 서로 다른 흡수체를 도입하여 포톤 일드(photon yield)를 조절할 수 있고, 광산발생제로 적용시에 서로 다른 광산발생제를 혼합하여 사용하는 불편을 해소하고, 레지스트 내에서의 혼화성이 우수하며, 해상도 및 라인에지조도를 향상시킬 수 있다.

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16-03-2018 дата публикации

Radiation-sensitive resin composition and radiation-sensitive acid generator

Номер: KR101839640B1
Автор: 겐 마루야마
Принадлежит: 제이에스알 가부시끼가이샤

본 발명은 현상 후의 패턴 도괴에 대한 내성, LWR 및 MEEF가 양호하고, 그들의 균형이 우수한 화학 증폭형 레지스트막을 형성할 수 있는 감방사선성 수지 조성물을 제공하는 것을 목적으로 한다. 본 발명의 감방사선성 수지 조성물은 [A] 하기 화학식 (1)로 표현되는 화합물, 및 [B] 베이스 중합체를 포함하는 감방사선성 수지 조성물이다. (화학식 (1) 중, R 1 은 탄소수 1 내지 30의 1가의 탄화수소기이다. 단, 상기 탄화수소기는 -CO-, -COO-, -OCO-, -O-CO-O-, -NHCO-, -CONH-, -NH-CO-O-, -O-CO-NH-, -NH-, -S-, -SO-, -SO 2 - 및 -SO 2 -O-로 이루어지는 군에서 선택되는 적어도 1종의 기를 가질 수도 있다. 또한, 상기 탄화수소기가 갖는 수소 원자의 일부 또는 전부는 치환되어 있을 수도 있다. M + 는 1가의 양이온이다) An object of the present invention is to provide a radiation-sensitive resin composition capable of forming a chemically amplified resist film having excellent resistance to patterning after development, good LWR and MEEF, and excellent balance among them. The radiation sensitive resin composition of the present invention is a radiation sensitive resin composition comprising [A] a compound represented by the following formula (1), and [B] a base polymer. (1), R 1 is a monovalent hydrocarbon group having 1 to 30 carbon atoms, provided that the hydrocarbon group is -CO-, -COO-, -OCO-, -O-CO-O-, -NHCO-, -CONH-, -NH-CO-O-, -O-CO-NH-, -NH-, -S-, -SO-, -SO 2 - and -SO 2 -O- Some or all of the hydrogen atoms of the hydrocarbon group may be substituted, and M + is a monovalent cation)

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24-11-2017 дата публикации

방향족 술포늄염 화합물, 광산 발생제, 레지스트 조성물, 양이온 중합 개시제 및 양이온 중합성 조성물

Номер: KR20170129230A
Принадлежит: 가부시키가이샤 아데카

본 발명은, 기판에 대한 부식성이 낮고, 포토리소그래피 특성이 우수한 광산 발생제 및 양이온 중합제에 유용한 방향족 술포늄염 화합물, 이것을 사용한 광산 발생제, 레지스트 조성물, 양이온 중합 개시제 및 양이온 중합성 조성물을 제공한다. 하기 일반식(I), [식(I) 중, R 1 ∼R 10 은 각각 독립적으로 수소 원자, 할로겐 원자, 수산기, 니트로기, 시아노기, 치환기를 가져도 되는 탄소 원자수 1∼18의 알킬기 등을 나타내고, R 11 ∼R 15 는 각각 독립적으로 수소 원자, 치환기를 가져도 되는 탄소 원자수 1∼18의 알콕시기 등을 나타내고, R 11 ∼R 15 중 하나 이상은 수소 원자가 아니고, X 1 - 은 1가의 유기 술폰산 음이온을 나타냄]로 나타내는 방향족 술포늄염 화합물이다.

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21-12-2017 дата публикации

패턴형성방법, 화학증폭형 레지스트 조성물, 및 레지스트막

Номер: KR101811255B1
Принадлежит: 후지필름 가부시키가이샤

(i) 화학증폭형 레지스트 조성물로 막을 형성하는 공정, (ii) 상기 막을 노광하여 노광된 막을 형성하는 공정, 및 (iii) 상기 노광된 막을 유기용제를 포함하는 현상액을 사용해서 현상하는 공정을 포함하는 패턴형성방법으로서, 상기 화학증폭형 레지스트 조성물은 (A) 산의 작용에 의해 유기용제를 포함하는 현상액에서의 용해도가 감소할 수 있는 수지; (B) 활성광선 또는 방사선의 조사에 의해 산을 발생할 수 있는 화합물; 및 (C) 활성광선 또는 방사선의 조사에 의해 염기성이 저하하는 염기성 화합물 또는 암모늄염 화합물을 포함하는 패턴형성방법, 상기 패턴형성방법에 사용되는 레지스트 조성물 및 이 레지스트 조성물로 형성되는 레지스트막을 제공한다.

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06-12-2019 дата публикации

레지스트 조성물 및 레지스트 패턴 형성 방법, 그리고, 화합물 및 산 발생제

Номер: KR20190135414A

일반식 (bd1-1), (bd1-2) 또는 (bd1-3) 으로 나타내는 화합물을 함유하는 레지스트 조성물. 식 중, Rx 1 ∼ Rx 4 는, 탄화수소기 혹은 수소 원자를 나타내거나, 또는 상호 결합하여 고리 구조를 형성하고 있어도 된다. Ry 1 ∼ Ry 2 는, 탄화수소기 혹은 수소 원자를 나타내거나, 또는 상호 결합하여 고리 구조를 형성하고 있어도 된다. Rz 1 ∼ Rz 4 는, 탄화수소기 혹은 수소 원자를 나타내거나, 또는 상호 결합하여 고리 구조를 형성하고 있어도 된다. Rx 1 ∼ Rx 4 , Ry 1 ∼ Ry 2 및 Rz 1 ∼ Rz 4 중 적어도 1 개는 아니온기를 갖는다. M 1 m+ 는, 술포닐기를 갖는 술포늄 카티온을 나타낸다. R 001 ∼ R 003 은, 각각 독립적으로 1 가의 유기기를 나타낸다. 단, R 001 ∼ R 003 중, 적어도 1 개는 산 해리성기를 갖는 유기기이다. M 3 m+ 는, 전자 구인성기를 갖는 m 가의 유기 카티온을 나타낸다. [화학식 1]

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16-10-2020 дата публикации

锍盐、光酸产生剂、固化性组合物和抗蚀剂组合物

Номер: CN111788181A
Автор: 中尾拓人, 高嶋祐作
Принадлежит: San Apro KK

本发明提供一种新的锍盐以及新的光酸产生剂等,所述锍盐对i射线具有高感光性,所述光酸产生剂是含有锍盐而成的,所述锍盐对i射线具有高感光性,且与环氧化合物等阳离子聚合性化合物的相容性高,在其配合物中储存稳定性优异。本发明是一种由下述通式(1)表示的锍盐以及以含有该锍盐为特征的光酸产生剂等。[式(1)中,R表示烷基或芳基,取代基R1~R5相互独立地表示烷基、羟基、烷氧基、芳基、芳氧基、羟基(聚)亚烷基氧基或卤素原子,R6~R9相互独立地表示烷基、芳基或氢原子。m1~m5各自表示R1~R5的个数,m1和m4表示0~3的整数,m2和m5表示0~4的整数,m3表示0~5的整数,X - 表示一价的多原子阴离子]

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03-02-2014 дата публикации

Novel compound, polymer, and resin composition

Номер: KR101357419B1
Принадлежит: 제이에스알 가부시끼가이샤

본 발명은 방사선에 대한 투명성이 높고, 감도, 해상도, 패턴 형상 등의 레지스트로서의 기본 물성이 우수하고, 특히 해상 성능이 우수하고, DOF, LER이 우수하고, 액침 내성이 우수한 감방사선성 수지 조성물, 그 조성물에 이용할 수 있는 중합체, 이 중합체 합성에 사용되는 신규 화합물 및 그의 제조 방법을 제공한다. 신규 화합물은 하기 화학식 1로 표시되며, 액침 내성이 우수한 감방사선성 수지 조성물이 얻어진다. The present invention provides a radiation-sensitive resin composition having high transparency to radiation, excellent basic physical properties as a resist such as sensitivity, resolution, and pattern shape, particularly excellent resolution performance, excellent DOF and LER, and excellent immersion resistance, The polymer which can be used for this composition, the novel compound used for the synthesis | combination of this polymer, and its manufacturing method are provided. The novel compound is represented by the following formula (1), and a radiation sensitive resin composition having excellent immersion resistance is obtained. <화학식 1> &Lt; Formula 1 > (화학식 1에서, R 1 은 메틸기 또는 수소 원자를 나타내고, R 2 , R 3 또는 R 4 는 각각 독립적으로 치환기를 가질 수 있는 탄소수 1 내지 10의 1가의 유기기를 나타내고, n은 0 내지 3의 정수를 나타내고, A는 메틸렌기, 직쇄상 또는 분지상의 탄소수 2 내지 10의 알킬렌기, 또는 아릴렌기를 나타내고, X - 는 S + 의 짝이온을 나타냄) (Formula 1, R 1 represents a methyl group or a hydrogen atom, R 2 , R 3 or R 4 each independently represents a monovalent organic group having 1 to 10 carbon atoms which may have a substituent, n is an integer of 0 to 3 A represents a methylene group, a linear or branched alkylene group having 2 to 10 carbon atoms, or an arylene group, and X − represents a counter ion of S + ) 감방사선성 수지 조성물, 레지스트, 액침 내성, 성형막 Radiation-sensitive resin composition, resist, liquid immersion resistance, molded film

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20-06-2019 дата публикации

Halogenated compound, polymer comprising the same and polymer electrolyte membrane using the same

Номер: KR101991430B1
Принадлежит: 주식회사 엘지화학

본 명세서는 할로겐화 화합물, 중합체 및 이를 포함하는 고분자 전해질막에 관한 것이다. TECHNICAL FIELD The present invention relates to a halogenated compound, a polymer, and a polymer electrolyte membrane containing the same.

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16-02-2018 дата публикации

抗蚀剂材料和图案形成方法

Номер: CN107703716A
Автор: 大桥正树, 畠山润
Принадлежит: Shin Etsu Chemical Co Ltd

本发明涉及抗蚀剂材料和图案形成方法。本发明提供在正型抗蚀剂材料和负型抗蚀剂材料中都为高灵敏度且LWR、CDU小的抗蚀剂材料以及使用其的图案形成方法。抗蚀剂材料,其包含基础聚合物和产酸剂,该产酸剂包含由下述式(1‑1)表示的锍盐或者由下述式(1‑2)表示的碘鎓盐。

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11-05-2011 дата публикации

Novel compound, polymer, and resin composition

Номер: EP1961739A4
Принадлежит: JSR Corp

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29-12-2010 дата публикации

Salt suitable for acid generator and chemical amplifying type corrosion-resistant composition containing the same

Номер: CN1841200B
Принадлежит: Sumitomo Chemical Co Ltd

适合作为酸生成剂的盐和包含该盐的化学放大型抗蚀组合物本发明提供一种式(L)的盐式(L)的盐 其中Q代表-CO-基团或-C(OH)-基团;环X代表含有3-30个碳原子的单环或多环烃基,其中当Q是-C(OH)-基团时,在Q位置上的一个氢原子被一个羟基取代,或者当Q是-CO-基团时,在Q位置上的两个氢原子被=O基取代,并且单环或多环烃基中的至少一个氢原子任选地被含有1-6个碳原子的烷基、含有1-6个碳原子的烷氧基、含有1-4个碳原子的全氟烷基、含有1-6个碳原子的羟烷基、羟基或氰基取代;R 10 和R 20 各自独立地表示氟原子或含有1-6个碳原子的全氟化烷基;A + 表示有机平衡离子。本发明还提供一种包含式(L)的盐的化学放大型抗蚀组合物。

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06-02-2020 дата публикации

Halogenated compound and polymer electrolyte membrane using the same

Номер: KR102074552B1
Принадлежит: 주식회사 엘지화학

본 명세서는 할로겐화 화합물, 상기 할로겐화 화합물로부터 유래되는 중합체 및 이를 포함하는 고분자 전해질막에 관한 것이다. The present specification relates to a halogenated compound, a polymer derived from the halogenated compound, and a polymer electrolyte membrane including the same.

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30-10-2019 дата публикации

Resist composition and resist pattern forming method

Номер: JP6600472B2
Принадлежит: Tokyo Ohka Kogyo Co Ltd

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05-02-2018 дата публикации

Salt and photoresist composition containing the same

Номер: KR101825342B1

&Lt; / RTI &gt; Formula I In the formula (I) R 1 and R 2 each independently represent a fluorine atom or a C 1 -C 6 perfluoroalkyl group, X 1 can have one or more fluorine atoms, and one or more -CH 2 - represents a C1-C17 2 is a saturated hydrocarbon group that may be replaced by -O- or -CO-, R 3 represents a group having a cyclic ether structure, Z 1 + represents an organic cation.

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23-10-2020 дата публикации

Negative resist composition and resist pattern forming method

Номер: CN107688278B
Принадлежит: Shin Etsu Chemical Co Ltd

本发明涉及负型抗蚀剂组合物及抗蚀图案形成方法。本发明提供了一种包含(A)甜菜碱型的锍化合物和(B)聚合物的负型抗蚀剂组合物。该抗蚀剂组合物对于在曝光步骤期间控制酸扩散是有效的,且在图案形成期间呈现出非常高的分辨率,并形成具有最小LER的图案。

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09-06-2014 дата публикации

Radiation sensitive resin composition and radiation sensitive acid generator

Номер: JPWO2012096264A1
Автор: 研 丸山
Принадлежит: JSR Corp

現像後のパターン倒れに対する耐性、LWR及びMEEFが良好で、それらのバランスに優れた化学増幅型レジスト膜を形成することができる感放射線性樹脂組成物を提供することを目的とする。本発明の感放射線性樹脂組成物は、[A]下記式(1)で表される化合物、及び[B]ベース重合体を含む感放射線性樹脂組成物である。(式(1)中、R1は、炭素数1〜30の1価の炭化水素基である。但し、上記炭化水素基は、−CO−、−COO−、−OCO−、−O−CO−O−、−NHCO−、−CONH−、−NH−CO−O−、−O−CO−NH−、−NH−、−S−、−SO−、−SO2−及び−SO2−O−からなる群より選択される少なくとも1種の基を有していてもよい。また、上記炭化水素基が有する水素原子の一部又は全部は、置換されていてもよい。M+は、1価のカチオンである。) An object of the present invention is to provide a radiation-sensitive resin composition capable of forming a chemically amplified resist film having good resistance to pattern collapse after development, LWR and MEEF, and excellent balance between them. The radiation sensitive resin composition of the present invention is a radiation sensitive resin composition comprising [A] a compound represented by the following formula (1) and [B] a base polymer. (In formula (1), R1 is a monovalent hydrocarbon group having 1 to 30 carbon atoms, provided that the hydrocarbon group is -CO-, -COO-, -OCO-, -O-CO-. O-, -NHCO-, -CONH-, -NH-CO-O-, -O-CO-NH-, -NH-, -S-, -SO-, -SO2- and -SO2-O- It may have at least one group selected from the group, and part or all of the hydrogen atoms of the hydrocarbon group may be substituted, and M + is a monovalent cation. is there.)

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31-01-2019 дата публикации

Photoacid generators and photoresists comprising same

Номер: KR101944305B1

광산 발생제 화합물("PAGs")의 새로운 합성방법, 새로운 광산 발생제 화합물 및 이러한 PAG 화합물을 포함하는 포토레지스트 조성물이 제공된다. 특별한 일 측면에서, 광산 발생제는 1) S0 3 - 부분; 2) 하나 이상의 불화 탄소; 및 3) 에스테르 케토 그룹에 의해 직접 또는 간접 치환된 하나 이상의 상기 불화 탄소를 포함한다. A new method for the synthesis of photoacid generator compounds (" PAGs &quot;), novel photoacid generator compounds and photoresist compositions comprising such PAG compounds are provided. In one particular aspect, photoacid generator 1) S0 3 - part; 2) one or more fluorocarbons; And 3) at least one of the fluorocarbons directly or indirectly substituted by ester keto groups.

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24-05-2012 дата публикации

Base reactive photoacid generators and photoresists comprising the same

Номер: KR20120052884A

본 발명은 신규한 포토애시드 발생제 화합물과 이러한 화합물을 포함하는 포토레지스트 조성물에 관한 것이다. 특히, 본 발명은 염기 분해성 그룹을 포함하는 포토애시드 발생제 화합물에 관한 것이다.

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11-06-2014 дата публикации

Ionic thermal acid generators for low temperature applications

Номер: CN103852973A
Принадлежит: Rohm and Haas Electronic Materials LLC

本发明提供了一种新的离子型热酸生成剂组合物。同样提供了光刻胶组合物、抗反射涂覆组合物,和化学修整外涂层组合物,和使用这些组合物的方法。

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13-01-2023 дата публикации

Preparation method of high-purity L-PFOS and high-purity L-PFOS

Номер: CN110590612B
Автор: 吕佳, 汤桦, 温馨, 王尉, 赵新颖

本发明提供了一种高纯度L‑PFOS的制备方法,涉及化工产品技术领域,包括:分离阶段和浓缩干燥阶段,分离阶段包括:步骤一,选取固体PFOS配制成PFOS甲醇溶液,所述PFOS甲醇溶液浓度为5mg/mL‑15mg/mL之间;步骤二,对PFOS甲醇溶液进行半制备液相色谱‑蒸发光散射法分离、以收集L‑PFOS;浓缩干燥阶段包括:步骤三:经过步骤二收集到的L‑PFOS收集液进行浓缩干燥处理,得到L‑PFOS,是一种快速、准确的高纯度L‑PFOS的制备方法,能够提升制备过程的准确度,确保实验成功,提高实验效率,满足准确检测的需求,具有重要的研究意义。

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24-06-2009 дата публикации

Novel compound and method of producing the same, acid generator, resist composition and method of forming resist pattern

Номер: EP2073060A1
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein R x represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q 2 and Q 3 independently represents a single bond or a divalent linkage group; Y 1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z + represents an organic cation exclusive of an ion represented by general formula (w-1).

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17-08-2010 дата публикации

Resist composition, method of forming resist pattern, compound and acid generator

Номер: US7776510B2
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R 7 ″ to R 9 ″ each independently represents an aryl group or an alkyl group, wherein two of R 7 ″ to R 9 ″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R 7 ″ to R 9 ″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X − represents an anion.

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05-02-2013 дата публикации

Resist composition, method of forming resist pattern, novel compound and acid generator

Номер: US8367297B2
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R 5 represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q 5 represents a single bond or a divalent linking group).

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28-10-2014 дата публикации

Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same

Номер: US8871423B2
Принадлежит: SAMSUNG ELECTRONICS CO LTD

A photoresist composition for fabricating a probe array is provided. The photoresist composition includes a photoacid generator having an onium salt and an i-line reactive sensitizer.

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26-05-2015 дата публикации

Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern

Номер: US9040220B2
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which R X represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q 2 and Q 3 independently represents a single bond or a divalent linkage group; Y 1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z + represents an organic cation exclusive of an ion represented by general formula (w-1).

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19-05-2015 дата публикации

Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern

Номер: US9034556B2
Принадлежит: Tokyo Ohka Kogyo Co Ltd

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein R X represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q 2 and Q 3 independently represents a single bond or a divalent linkage group; Y 1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z + represents an organic cation exclusive of an ion represented by general formula (w-1).

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07-07-2014 дата публикации

Chemically Amplified Resist Composition

Номер: KR101416244B1

본 발명은 (A) 화학식 1의 염, (B) 화학식 2의 염 및 (C) 산 불안정 그룹을 갖는 구조 단위를 함유하고 그 자체로는 알칼리 수용액에 불용성이거나 난용성이지만 산의 작용에 의해 알칼리 수용액에서 가용성으로 되는 수지를 포함하는 화학증폭형 레지스트 조성물을 제공한다. The present invention relates to a composition containing a structural unit having (A) a salt of the formula (1), (B) a salt of the formula (2) and (C) an acid labile group and being itself insoluble or poorly soluble in an aqueous alkali solution, And a resin which becomes soluble in an aqueous solution. 화학식 1 Formula 1 상기 화학식 1에서, In Formula 1, Q 1 은 C1-C8 퍼플루오로알킬 그룹이고, Q 1 is a C1-C8 perfluoroalkyl group, A + 는 화학식 1a의 양이온, 화학식 1b의 양이온 및 화학식 1c의 양이온으로부터 선택된 하나 이상의 유기 양이온이다. A + is at least one organic cation selected from the cation of formula (Ia), the cation of formula (Ib) and the cation of formula (Ib). 화학식 1a Formula 1a 상기 화학식 1a에서, In formula (1a) p 1 , p 2 및 P 3 은 각각 독립적으로 하이드록실 그룹, C3-C12 사이클릭 탄화수소 그룹 및 C1-C12 알콕시 그룹으로부터 선택된 하나 이상의 그룹으로 치환될 수 있는 C1-C30 알킬 그룹이거나, 하이드록실 그룹 및 C1-C12 알콕시 그룹으로부터 선택된 하나 이상의 그룹으로 치환될 수 있는 C3-C30 사이클릭 탄화수소 그룹이다. p 1 , p 2 and P 3 are each independently a C1-C30 alkyl group which may be substituted with at least one group selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, And a C3-C30 cyclic hydrocarbon group which may be substituted with one or more groups selected from a C1-C12 alkoxy group. 화학식 1b 1b 상기 화학식 1b에서, In the above formula (1b) P 4 및 P 5 는 각각 독립적으로 수소원자, 하이드록실 그룹, C1-C12 알킬 그룹 또는 C1-C12 알콕시 그룹이다. P 4 and P 5 are each independently a hydrogen atom, a hydroxyl group, a C 1 -C 12 alkyl group or a C 1 -C 12 alkoxy group. 화학식 1c Formula 1c 상기 화학식 1c에서, In the above formula (1c) p 10 , p 11 , p 12 , p 13 , p 14 , p 15 , p 16 , p 17 , p 18 , p 19 , p 20 및 p 21 은 각각 독립적으로 수소원자, 하이드록실 그룹, C1-C12 알킬 그룹 또는 C1-C12 알콕시 그룹이고, p 10, p 11, p 12 , p 13, p 14, p 15, p 16, p 17, p 18, p 19, p 20 and p 21 each independently represent a hydrogen atom, a hydroxyl group, C1-C12 alkyl Group or a C1-C12 alkoxy group, B는 황원자 또는 산소원자이며, B is a sulfur ...

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20-03-2019 дата публикации

Resist composition and patterning process

Номер: KR101960605B1

[과제] 포지티브형 레지스트 재료에 있어서도 네거티브형 레지스트 재료에 있어서도 고감도이면서 또한 LWR이나 CDU가 작은 레지스트 재료 및 이것을 이용하는 패턴 형성 방법을 제공한다. [해결수단] 베이스 폴리머 및 하기 식(1-1)로 표시되는 술포늄염 또는 하기 식(1-2)로 표시되는 요오도늄염을 포함하는 산발생제를 포함하는 레지스트 재료. [PROBLEMS] A resist material having a high sensitivity and a small LWR or CDU in a positive resist material and a negative resist material and a pattern forming method using the same are provided. [MEANS FOR SOLVING PROBLEMS] A resist material comprising an acid generator comprising a base polymer and a sulfonium salt represented by the following formula (1-1) or an iodonium salt represented by the following formula (1-2).

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18-02-2022 дата публикации

Method for producing a sulfonic acid group-containing monomer

Номер: KR102364123B1

본 발명은, 연료 전지용 격막, 연료 전지용 촉매 바인더 폴리머, 식염 전해용 격막 등의 불소계 고분자 전해질의 원재료가 될 수 있는 술폰산기 함유 모노머를 수율 좋게 제조할 수 있는 방법을 제공하는 것을 목적으로 하고 있다. 본 발명의 일반식 (3)으로 표시되는 술폰산기 함유 모노머의 제조 방법은, 일반식 (1)로 표시되는 고리형 화합물과, 일반식 (2)로 표시되는 실라놀 화합물을 혼합 교반하는 공정을 포함하는 것을 특징으로 하고 있다. An object of the present invention is to provide a method for producing a sulfonic acid group-containing monomer, which can be a raw material for a fluorine-based polymer electrolyte such as a fuel cell diaphragm, a catalyst binder polymer for a fuel cell, and a salt electrolyte diaphragm, in good yield. The method for producing the sulfonic acid group-containing monomer represented by the general formula (3) of the present invention comprises a step of mixing and stirring the cyclic compound represented by the general formula (1) and the silanol compound represented by the general formula (2). It is characterized by including.

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