感活性光線性又は感放射線性樹脂組成物、該組成物を用いた感活性光線性又は感放射線性膜及びパターン形成方法、並びに電子デバイスの製造方法

感活性光線性又は感放射線性樹脂組成物、該組成物を用いたレジスト膜及びパターン形成方法、及び電子デバイスの製造方法

指圧代用器ローラー

... 【課題】使用者の肌を極力傷めることなく、効果的かつ簡易に骨気法使用者自身で行うことができる指圧代用器ローラーを提供する。【解決手段】使用者が把持し、また使用部位の骨格等による様々な角度にも柔軟に対応するための椀形状ハンドル部１と、椀形状ハンドル部１の下面側に設けられた４本の回転軸部２と、各回転軸部２に取り付けられると共に、回転軸部２の軸方向を中心に回転自在で肌を余計に摘みあげぬよう涙形状でなく球形状に設計された押圧用の４つの球形状ローラー部３と、を備え、各球形状ローラー部３は、各ローラー部３の回転中心を結ぶ仮想線が、椀形状ハンドル部１の下面側から見て、正方形に形成されるように、配置されている。【選択図】図１ ...

パターン形成方法、及び電子デバイスの製造方法

感活性光線性又は感放射線性樹脂組成物、並びにそれを用いた感活性光線性又は感放射線性膜及びパターン形成方法

パターン形成方法及び該方法に使用するための感活性光線性又は感放射線性樹脂組成物

感活性光線性又は感放射線性樹脂組成物、並びにそれを用いた感活性光線性又は感放射線性膜及びパターン形成方法

PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To provide a pattern forming method excellent in exposure latitude (EL) and performance of preventing development defects. SOLUTION: The pattern forming method includes: forming a film by using an active ray-sensitive or radiation-sensitive resin composition containing (A) a resin whose solubility with an alkali developing solution is increased by the action of an acid and (B) a compound that generates an acid having a moiety structure expressed by general formula (LD) by irradiation with active rays or radiation; exposing the film; and developing the exposed film by using an aqueous solution of tetramethylammonium hydroxide having a concentration of less than 2.38 mass%. COPYRIGHT: (C)2011,JPO&INPIT ...

パターン形成方法、電子デバイスの製造方法、感活性光線性又は感放射線性樹脂組成物、並びに、感活性光線性又は感放射線性膜

ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition adaptable to a normal dry process as well as an immersion process, having excellent sensitivity, and reducing LWR (line width roughness) and blob defects, and to provide a resist film and a pattern forming method using the composition. SOLUTION: The active ray-sensitive or radiation-sensitive resin composition contains a compound having a moiety structure expressed by general formula (1) and generating an acid having a pKa of -2 or lower by irradiation with active rays or radiation. The composition is used for the resist film and the pattern forming method. In general formula (1), X represents an oxygen atom or a sulfur atom; and EWG represents an electron withdrawing group. COPYRIGHT: (C)2012,JPO&INPIT ...

感活性光線性又は感放射線性樹脂組成物、及びそれを用いたパターン形成方法

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition capable of striking a balance between excellent pattern configuration and excellent roughness properties; and to provide a pattern forming method using the same. SOLUTION: The actinic ray- or radiation-sensitive resin composition comprises: (A) a resin whose solubility in an alkali developer increases by the action of an acid; (B) a sulfonium salt compound as a photoacid generator; and (C) an amine compound having a carbonic acid ester. COPYRIGHT: (C)2011,JPO&INPIT ...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition useful to form a fine pattern in semiconductor manufacturing and remarkably reducing pattern collapse, development defects, liquid immersion defects (residual water defects, bubble defects) and scum, and a pattern forming method using the same. SOLUTION: The actinic ray- or radiation-sensitive resin composition is characterized in that a receding contact angle of water at a surface of a film formed of the actinic ray- or radiation-sensitive resin composition is ≥65°, and a receding contact angle of water at a surface of the film processed with an alkali developer is ≤35°. The pattern forming method using the same is also provided. COPYRIGHT: (C)2011,JPO&INPIT ...

感活性光線性又は感放射線性樹脂組成物及びこれを用いたパターン形成方法

パターン形成方法

感活性光線性又は感放射線性樹脂組成物並びに該組成物を用いたレジスト膜及びパターン形成方法

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To provide a positive resist composition that is improved in line edge roughness by normal exposure and liquid immersion exposure and exhibits excellent conformability to water in liquid immersion exposure, and a pattern forming method using the same. SOLUTION: The positive resist composition includes: (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its dissolution rate in an alkali developer by action of an acid; (B) a compound that generates an acid in irradiation with actinic light or radiation; (C) a resin that has: at least one of a fluorine atom and a silicon atom; and a group selected from the group consisting of groups (x) to (z); and (D) a solvent: (x) an alkali soluble group, (y) a group which decomposes by action of an alkali developer and increases a solubility in an alkali developer, and (z) a group which decomposes by action of an acid, wherein, Xa1 represents a hydrogen atom, alkyl, cyano or a halogen ...

PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To provide a pattern forming method excellent in both of pattern shapes and roughness characteristics. SOLUTION: The pattern forming method includes: forming a film by using an active ray-sensitive or radiation-sensitive resin composition containing a resin which has a repeating unit expressed by general formula (1), and whose solubility with an alkali developing solution is increased by the action of an acid, and a compound that generates an acid by irradiation with active rays or radiation; exposing the film; and developing the exposed film by using an aqueous solution of tetramethylammonium hydroxide having a concentration of less than 2.38 mass%. COPYRIGHT: (C)2011,JPO&INPIT ...

PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To form a pattern having less scum and fewer water mark defects. SOLUTION: A pattern forming method includes: forming a film by using an active ray-sensitive or radiation-sensitive resin composition containing (A) a resin whose solubility with an alkali developing solution is increased by the action of an acid, (B) a compound that generates an acid by irradiation with active rays or radiation and (C) a resin containing at least one of a fluorine atom and a silicon atom; exposing the film; and developing the exposed film by using an aqueous solution of tetramethylammonium hydroxide having a concentration of less than 2.38 mass%. COPYRIGHT: (C)2011,JPO&INPIT ...

感活性光線性又は感放射線性樹脂組成物、並びにそれを用いた感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法及び電子デバイス