SHEET POST PROCESSING DEVICE

PROBLEM TO BE SOLVED: To positively eliminate the sheet jam by loading the sheet to be fed from an auxiliary tray when a transfer means to transfer the sheet in the direction orthogonal to the sheet carrying direction transfer the sheet bundle and is returned to the original position on its upper surface, and returning it to the prescribed position. SOLUTION: When a first holding means 7 delivers the sheet bundle S' to a second holding means 10 and is returned to the original position, and an auxiliary tray 13 drops the sheet S on a lower treatment tray 4 side, the sheet S is loaded on the holding means 7 and detached from accumulation trays 9A, 9B side. An upper part 41 of the first sheet holding means 7 is flat, a member 41a such as a rubber sheet of high coefficient of friction is attached thereto to positively detach the sheet S from the accumulation trays 9A, 9B. After the sheet S' is delivered to the second holding means 10, the sheet S is prevented from being pulled in the same direction ...

感活性光線または感放射線樹脂組成物及びそれを用いたパターン形成方法

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having good pitch dependence and coverage dependence of CD and a resist pattern forming method using the same. SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit (a) having a cyano group and a group decomposing by the action of an acid to be made alkali-soluble; (B) a compound generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least either a fluorine atom or a silicon atom and a group decomposing by the action of an alkali developer to increase the solubility in an alkali developer. COPYRIGHT: (C)2011,JPO&INPIT ...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition which is excellent in sensitivity, resolution, roughness properties and temporal stability and enables to form a pattern of good configuration, and to provide a pattern forming method using the same. SOLUTION: The actinic ray- or radiation-sensitive resin composition includes a resin having a structure represented by general formula (I), and a compound which generates an acid upon irradiation with actinic rays or radiation. COPYRIGHT: (C)2011,JPO&INPIT ...

ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION

PROBLEM TO BE SOLVED: To provide an active light sensitive or radiation sensitive resin composition and a method of forming a pattern using the resin composition improved in line edge roughness, BLOB defects and generation of scum, and having good conformability to an immersion liquid in immersion exposure. SOLUTION: The active light sensitive or radiation sensitive resin composition includes (A) a resin that when acted on by an acid, increases its solubility in an alkali developer, (B) a compound that when exposed to active lights or radiation, generates an acid, and (C) a resin containing at least one group selected among the following groups (x) to (z) and further containing at least either a fluorine atom or a silicon atom, in which three or more polymer chains are contained through at least one branch point, (x) an alkali-soluble group, (y) a group that when acted on by an alkali developer, is decomposed to thereby increase its solubility in the alkali developer, and (z) a group that ...

樹脂の製造方法、該製造方法によって製造された樹脂、該樹脂を含有するレジスト組成物及びそれを用いたパターン形成方法

ウレタン樹脂積層体

STAPLER FOR SHEET POSTTREATING APPARATUS

PROBLEM TO BE SOLVED: To facilitate staple resetting operation after a staple needle is supplied by eliminating contact of a stapler with a sheet bundle in the case of releasing the stapler from an engaging state with the bundle, thereby maintaining the bungle of an aligned state. SOLUTION: The stapler 8 is constituted to move in a direction parallel to a sheet treating tray 4 surface and rearward until engagement of at least sheet with a sheet bundle on an S treating tray is released at the time of maintenance such as supplying a staple needle. Thus, the stapler is constituted to move in a direction parallel to a sheet treating tray surface and rearward while it is disposed at a predetermined stapling position by a mounting bracket and engagement with an end predetermined width of the bundle on the treating tray is released. Further, the bracket has a stapler base 202 for mounting the stapler 8 and a guide rail 201 for traveling along the base. And, the rail is parallel to the sheet treating ...

感活性光線性又は感放射線性樹脂組成物、並びに該組成物を用いたレジスト膜及びパターン形成方法

感活性光線性または感放射線性樹脂組成物およびパターン形成方法

SINTERED ABRASIVE ALUMINA GRAIN AND ITS PRODUCTION

PURPOSE: To obtain a high-density and high-hardness abrasive grain by giving thereto a structure containing a specified amount of manganese/alumina spinel. CONSTITUTION: This grain is one having a spinel phase comprising 3-10wt.% (in terms of the manganese atoms) manganese oxide and alumina and having a Vickers hardness (under a load of 500g) of 16GPa or above. This grain is produced by a method comprising adding 3-10wt.%, (in terms of the manganese atoms based on the alumina) manganese nitrate solution to a sol of (pseudo) boemite to form a gel, drying this gel at 80-200°C under conditions in which the formula (wherein T (°C) is the temperature and t is the holding time at that temperature) has a value of 200 or above, calcining and sintering the dried product, or by a method comprising impregnating a calcined alumina gel with 3-10wt.% (in terms of the manganese atoms based on the alumina) manganese nitrate solution, drying the product of impregnation under the same conditions as those ...

POLISHING COMPOSITION FOR POLISHING GLASS

PROBLEM TO BE SOLVED: To obtain a polishing composition that exhibits a high polishing efficiency and does not leave any scratches by mixing water with aluminum oxide and a polish accelerator. SOLUTION: The aluminum oxide used is desirably one having a particle size distribution in which the maximum particle diameter is 10 μm or smaller and the mean particle diameter is 0.1-2 μm. The aluminum oxide content is desirably 1-30 wt.% based on the composition. The polish accelerator used is exemplified by aluminum nitrate, aluminum sulfate, aluminum oxalate, iron nitrate, aluminum lactate, gluconic acid, or malic acid, among which the aluminum salts, especially, aluminum nitrate, are desirable. The aluminum salt content is desirably 0.01-10 wt.% based on the weight of the composition. The polishing composition can be prepared by suspending aluminum hydroxide in water and adding a polish accelerator to the suspension and can attain an industrially advantageous polishing speed through the cooperation ...

重合性化合物、ラクトン含有化合物、ラクトン含有化合物の製造方法、及び、該重合性化合物を重合させた高分子化合物

液浸露光用ポジ型レジスト組成物及びパターン形成方法

SHEET AFTER TREATMENT DEVICE

PROBLEM TO BE SOLVED: To staple against the angle part of a sheet bundle and attain compactness of a device by providing a transfer means movably in the reverse direction to the transfer direction of the sheet bundle, and arranging a stapler inside the conformity end in the transfer direction on the conformity position of the sheet bundle. SOLUTION: A sheet S discharged from a copying machine 2 into an after treatment device main body 20 is carried so as to be distributed to a piling tray 3 in case of no after treatment and to a treatment tray 4 in case of after treatment, a sheet bundle S' adjusted by a conformity means 6 is grasped by a grasping means (transfer means) 7, carried in this state, and it is staple- fastened by a stapler 8. In this case, the stapler 8 is arranged on one end part of the treatment tray 4 to be in the sending out direction of the sheet bundle. The sheet bundle S' grasped by the grasping means 7 is once transferred in the reverse direction of sending out by a ...

重合性化合物及びそれを用いて得られる高分子化合物

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD OF FORMING PATTERN USING THE SAME

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition allowing formation of a resist pattern, which is improved in elution of an acid, line edge roughness, reduction of development defects and scum generation, shows good followability for an immersion liquid in liquid immersion exposure, and further has various favorable performances in terms of particle suppression, a pattern profile and bubble defect prevention, and to provide a method of forming a pattern by using the actinic ray-sensitive or radiation-sensitive resin composition. SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains: resin (A) capable of increasing the solubility with an alkali developing solution by an action of an acid; and resin (C) having at least either a fluorine atom or a silicon atom and containing repeating unit (c) having at least two polarity conversion groups. COPYRIGHT: (C)2011,JPO&INPIT ...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition capable of striking a balance between excellent pattern configuration and excellent roughness properties; and to provide a pattern forming method using the same. SOLUTION: The actinic ray- or radiation-sensitive resin composition comprises: (A) a resin whose solubility in an alkali developer increases by the action of an acid; (B) a sulfonium salt compound as a photoacid generator; and (C) an amine compound having a carbonic acid ester. COPYRIGHT: (C)2011,JPO&INPIT ...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition useful to form a fine pattern in semiconductor manufacturing and remarkably reducing pattern collapse, development defects, liquid immersion defects (residual water defects, bubble defects) and scum, and a pattern forming method using the same. SOLUTION: The actinic ray- or radiation-sensitive resin composition is characterized in that a receding contact angle of water at a surface of a film formed of the actinic ray- or radiation-sensitive resin composition is ≥65°, and a receding contact angle of water at a surface of the film processed with an alkali developer is ≤35°. The pattern forming method using the same is also provided. COPYRIGHT: (C)2011,JPO&INPIT ...

感活性光線性又は感放射線性樹脂組成物及びこれを用いたパターン形成方法

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition, capable of forming a resist pattern improved in the elution of a generated acid, line edge roughness, development defects and generation of scums, less liable to profile degradation, and having proper conformability with an immersion liquid in immersion exposure, and to provide a pattern forming method that uses the composition. SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin, capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit, having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom. The pattern forming method that uses the composition is also provided. COPYRIGHT: (C)2011,JPO&INPIT ...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which enables formation of a pattern having good pattern collapse resistance and few development defects, and a pattern forming method using the composition. SOLUTION: There is provided the actinic ray-sensitive or radiation-sensitive resin composition wherein transmittance for light of wavelength 193 nm for film thickness of 100 nm is 55-80%, and the pattern forming method using the composition. COPYRIGHT: (C)2011,JPO&INPIT ...

感活性光線性または感放射線性樹脂組成物及び該組成物を用いたパターン形成方法

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition capable of pattern formation that is improved in the pattern collapse, line edge roughness and scum occurrence, being free from any profile deterioration, and that exhibits appropriate following properties for the liquid for liquid immersion at the stage of liquid immersion exposure, while improving performance of reducing bubble defects, and to provide a method of forming a pattern with the use of the composition. SOLUTION: The actinic ray- or radiation-sensitive resin composition includes a resin (A) which has at least two polar conversion groups, includes a repeating unit (a) having at least either a fluorine atom or a silicon atom, and exhibits increased solubility in an alkali developer by the action of an acid. COPYRIGHT: (C)2011,JPO&INPIT ...

RESIN MATERIAL, ENDLESS BELT FOR IMAGE FORMING APPARATUS, ROLLER FOR IMAGE FORMING APPARATUS, IMAGE FIXING DEVICE, AND IMAGE FORMING APPARATUS

PROBLEM TO BE SOLVED: To provide a resin material used for a member for an image forming apparatus, which is excellent in both of scratch resistance and quick repair of scratches. SOLUTION: The resin material used for a member for an image forming apparatus includes: a polymer formed by polymerization of an acrylic resin in which a content ratio (molar ratio) of hydroxyl groups of side chains each containing 10 or more carbon atoms to hydroxyl groups of side chains each containing less than 10 carbon atoms is less than 1/3 (wherein a case in which the acrylic resin does not have hydroxyl groups of side chains each containing 10 or more carbon atoms is included); a polyol that contains a plurality of hydroxyl groups in which all the hydroxyl groups are connected together through a chain containing 6 or more carbon atoms; and an isocyanate, with a polymerization ratio of 0.1 to 10, the polymerization ratio being a ratio (B/A) of a total molar amount (B) of hydroxyl groups contained in all ...

SHEET PROCESSOR

PROBLEM TO BE SOLVED: To provide a sheet processor which can efficiently sort sheets. SOLUTION: A sheet processor has a first housing part to house at least a single sheet imparted from an image forming device 2 or the like, a gripping means 10 to grip and transfer the sheet housed in this first housing part and a second housing part 9 to house the sheet transferred by this gripping means 10, and a gripping position of the sheet by the gripping means 10 is made different between a preceding sheet transferred to the second housing part 9 and a succeeding sheet transferred in the next place. COPYRIGHT: (C)1999,JPO ...

液浸露光用ポジ型レジスト組成物及びパターン形成方法

POLYMERIZABLE COMPOUND, LACTONE-CONTAINING COMPOUND, METHOD FOR PRODUCING THE SAME, AND POLYMERIC COMPOUND PREPARED BY POLYMERIZING THE COMPOUND

PROBLEM TO BE SOLVED: To provide a new polymeric compound useful for the production process for semiconductors including IC, for producing liquid crystals and circuit boards such as thermal heads, furthermore, for a resist composition used in lithographic processes in other photofabrications, and to provide a new polymerizable compound to be used in synthesizing the polymeric compound. SOLUTION: The new polymerizable compound having a lactone structure represented by a specific structural formula is provided. Besides, the polymeric compound to be obtained by polymerizing the polymerizable compound is also provided. COPYRIGHT: (C)2011,JPO&INPIT ...

樹脂材料