ГРАНУЛИРОВАННАЯ СИСТЕМА ДОСТАВКИ ВКУСОАРОМАТИЧЕСКИХ ВЕЩЕСТВ ИЛИ ОТДУШКИ, ВКУСОАРОМАТИЗИРОВАННЫЙ ПРОДУКТ, ИЗДЕЛИЕ С ОТДУШКОЙ И СПОСОБ УЛУЧШЕНИЯ, УСИЛЕНИЯ ИЛИ МОДИФИКАЦИИ ОРГАНОЛЕПТИЧЕСКИХ СВОЙСТВ ВКУСОАРОМАТИЧЕСКОЙ КОМПОЗИЦИИ ИЛИ КОМПОЗИЦИИ С ОТДУШКОЙ

ÐÎÑÑÈÉÑÊÀß ÔÅÄÅÐÀÖÈß RU (19) (11) 2007 131 280 (13) A (51) ÌÏÊ A23L 1/22 (2006.01) ÔÅÄÅÐÀËÜÍÀß ÑËÓÆÁÀ ÏÎ ÈÍÒÅËËÅÊÒÓÀËÜÍÎÉ ÑÎÁÑÒÂÅÍÍÎÑÒÈ, ÏÀÒÅÍÒÀÌ È ÒÎÂÀÐÍÛÌ ÇÍÀÊÀÌ (12) ÇÀßÂÊÀ ÍÀ ÈÇÎÁÐÅÒÅÍÈÅ (21), (22) Çà âêà: 2007131280/13, 16.08.2007 (71) Çà âèòåëü(è): ÔÈÐÌÅÍÈØ ÑÀ (CH) (30) Êîíâåíöèîííûé ïðèîðèòåò: 14.06.2002 IB PCT/IB02/02228 (43) Äàòà ïóáëèêàöèè çà âêè: 27.02.2009 Áþë. ¹ 6 R U (57) Ôîðìóëà èçîáðåòåíè 1. Ãðàíóëèðîâàííà ñèñòåìà äîñòàâêè, âêëþ÷àþùà ãèäðîôîáíûé âêóñîàðîìàòè÷åñêèé èëè äóøèñòûé êîìïîíåíò èëè êîìïîçèöèþ, èíêàïñóëèðîâàííûå â îëèãîìåðíîì èëè ïîëèìåðîì íîñèòåëå, îòëè÷àþùà ñ òåì, ÷òî íîñèòåëü, â îñíîâíîì, ñîñòîèò èç ïðîñòîãî ýôèðà öåëëþëîçû è òåì, ÷òî ñèñòåìà âêëþ÷àåò ïëàñòèôèêàòîð, õàðàêòåðèçóþùèéñ ïàðàìåòðîì ðàñòâîðèìîñòè ïî Ãèëüäåáðàíäó δ íèæå 48 [ÌÏà] 1/2. 2. Ñèñòåìà äîñòàâêè ïî ï.1, îòëè÷àþùà ñ òåì, ÷òî ïðîñòîé ýôèð öåëëþëîçû ñîñòàâë åò áîëåå 50% ìàññû íîñèòåë . 3. Âêóñîàðîìàòèçèðîâàííûé ïðîäóêò, îòëè÷àþùèéñ òåì, ÷òî îí ñîäåðæèò â êà÷åñòâå àêòèâíîãî êîìïîíåíòà ñèñòåìó äîñòàâêè ïî ï.1. 4. Âêóñîàðîìàòèçèðîâàííûé ïðîäóêò ïî ï.3 â âèäå æåâàòåëüíîé ðåçèíêè, ëåäåíöà, ñïðåññîâàííîé òàáëåòêè, ëåïåøêè, õëåáîïåêàðíîãî ïðîäóêòà, øîêîëàäíîãî ïðîäóêòà, ò íó÷êè, æåâàòåëüíîé êîíôåòû èëè ïðîäóêòà óõîäà çà ðîòîâîé ïîëîñòüþ. 5. Èçäåëèå ñ îòäóøêîé, îòëè÷àþùååñ òåì, ÷òî îíî âêëþ÷àåò â êà÷åñòâå àêòèâíîãî êîìïîíåíòà ñèñòåìó äîñòàâêè ïî ï.1. 6. Èçäåëèå ñ îòäóøêîé ïî ï.5 â âèäå ìîþùåãî ñðåäñòâà, óì ã÷èòåë òêàíåé, ìûëà, ãåë äë âàííû èëè äóøà, äåçîäîðàíòà, ëîñüîíà äë êîæè, øàìïóí èëè äðóãîãî ïðîäóêòà óõîäà çà âîëîñàìè, áûòîâîãî î÷èñòèòåë èëè î÷èùàþùåãî è äåçîäîðèðóþùåãî áëîêà äë òóàëåòíûõ áà÷êîâ. 7. Ñïîñîá óëó÷øåíè , óñèëåíè èëè ìîäèôèêàöèè îðãàíîëåïòè÷åñêèõ ñâîéñòâ âêóñîàðîìàòè÷åñêîé êîìïîçèöèè èëè êîìïîçèöèè ñ îòäóøêîé, îòëè÷àþùèéñ òåì, ÷òî ê òàêîé êîìïîçèöèè äîáàâë þò ñèñòåìó äîñòàâêè ïî ï.1. Ñòðàíèöà: 1 RU A 2 0 0 7 1 3 1 2 8 0 A ÎÒÄÓØÊÈ, ÂÊÓÑÎÀÐÎÌÀÒÈÇÈÐÎÂÀÍÍÛÉ ÏÐÎÄÓÊÒ, ÈÇÄÅËÈÅ Ñ ÎÒÄÓØÊÎÉ È ÑÏÎÑÎÁ ÓËÓ×ØÅÍÈß, ÓÑÈËÅÍÈß ÈËÈ ÌÎÄÈÔÈÊÀÖÈÈ ÎÐÃÀÍÎËÅÏÒÈ×ÅÑÊÈÕ ÑÂÎÉÑÒ ...

Cleaning stone

A technique for cleaning sulphated stone that is substantially non-abrasive, effectively cleans fine detail in a substantially even manner and does not require a large amount of skilled operator time involves coating the surface with a mud, consisting of a water absorbing mineral and an aqueous solution of organic nitrogen and carbon sources, covering the mud with a water-tight sheet, leaving the mud-pack in position for 4-5 weeks, and removing, consecutively, the sheet and the mud, the latter by a combination of scraping and water- washing. Suitable water-absorbing minerals include magnesium silicates such as Attapulgite or, preferably, Sepiolite. The organic nitrogen source may comprise at least one compound which contains one or more amino groups, and is preferably urea. The organic carbon source may be at least one compound which contains one or more hydroxy groups and may be methane, ethylene glycol, glucose, sucrose, dextran or, preferably, glycerol. The water-tight sheet preferably ...

General solvent synthesis, production an dutility

General solvent synthesis, production an dutility

NON--CRYSTALLINE SMELLING AND FLAVOUR MATERIAL RELEASE SYSTEM

THICKENED WATER

Acidic cleaning compositions

BIODEGRADABLE SCALE CONTROL COMPOSITION FOR USE IN HIGHLY CONCENTRATED ALKALINE DETERGENTS

An alkaline concentrated detergent composition for use in cleaning hard surfaces, medical instruments and other metal components (parts, tools, utensils, vessels, equipment) having superior cleaning efficacy at much lower alkali content than traditional alkaline cleaners and enhanced scale control properties even when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water and even in exceptionally hard water. The inventive composition maintains its superior cleaning efficacy and scale control properties during use.

LENS CARE SOLUTIONS

The present invention provides solutions containing dexpanthenol in combination with xylitol, preferably further including a viscosity-enhancing agent to make solutions viscous so that the viscous solutions are not only capable of cleaning, disinfecting, and/or rinsing a contact lens in a lens case but also capable of cleaning and lubricating the contact lens directly in an eye. Such solutions can provide to the user an ability to clean and to rewet lenses anytime anywhere even without taking them out.

METHOD FOR MANUFACTURING AN ANTI-SCALING PRODUCT

La présente invention concerne un procédé de fabrication de produit antitartre destiné à inhiber la formation de tartres dans les appareils dont des éléments tels que des conduits ou tuyaux peuvent subir une dégradation au fil des utilisations par dépôts de tartres. Le procédé selon l'invention permet plus particulièrement d'obtenir un produit antitartre écologique. Pour cela, le procédé selon l'invention comporte une étape de préparation (1) de matière végétale de la famille des Caryophyllacée, une étape d'infusion (6) de ladite matière végétale, une étape de filtration (7) de ladite infusion et une étape de préparation (9) de solution antitartre à partir d'un filtrat obtenue lors de l'étape de filtration.

DEFORMABLE MASS FOR DISINFECTING SURFACES, BASED ON CROSS-LINKED HYDROPROPYLATED POLYGALACTOMANNAN

The invention relates to a deformable mass for using as a disinfectant, comprising water, between 25 and 40 weight per cent of a solvent component consisting of low-molecular, water-miscible alcohols, between 1 and 10 weight per cent of a bactericide active component, between 3 and 6 weight per cent of a hydroxypropylated polygalactomannan having a degree of esterification of between 0.3 and 1.5, and between 0.1 and 0.5 weight per cent of boric acid or the equivalent quantity of boron ions.

DEFORMABLE MASS FOR DISINFECTING SURFACES, BASED ON CROSS-LINKED HYDROPROPYLATED POLYGALACTOMANNAN

The invention relates to a deformable mass for using as a disinfectant, comprising water, between 25 and 40 weight per cent of a solvent component consisting of low-molecular, water-miscible alcohols, between 1 and 10 weight per cent of a bactericide active component, between 3 and 6 weight per cent of a hydroxypropylated polygalactomannan having a degree of esterification of between 0.3 and 1.5, and between 0.1 and 0.5 weight per cent of boric acid or the equivalent quantity of boron ions.

UNCOMPLEXED CYCLODEXTRIN SOLUTIONS FOR ODOR CONTROL OR INANIMATE SURFACES

The present invention relates to a stable, aqueous odor-absorbing composition, for use on inanimate surfaces. The composition comprises from about 0.1 % to about 5 % by weight of the composition, of solubilized, water-soluble, uncomplexed cyclodextrin, an effective amount of a solubilized, water-soluble, antimicrobial preservative having a water-solubility of greater than about 0.3 %, optional perfume, and an aqueous carrier. The composition is essentially free of any material that would soil or stain fabric and has a pH of greater than about 3. The composition can be incorporated into a spray dispenser to create an article of commerce that can facilitate treatment of articles and/or surfaces with uncomplexed cyclodextrin solutions of a level that is effective yet is not discernible when dried on the surface.

EFFERVESCENT COMPOSITIONS AND DRY EFFERVESCENT GRANULES

The present invention discloses dry effervescent granules comprising an acid , carbonate source and optionally a binder, wherein said acid, carbonate source and optionally binder are in close physical proximity . The invention also discloses granular compositions, containing effervescence material comprising an acid and a carbonate source, which has an effervescence index (EI) of at least 50. The granular compositions may be obtainable by incorporating said pre-formed dry effervescent granules into said granular compositions, especially detergent compositions. Improved effervescence is obtained when diluting the se granular detergent compositions with water to obtain a washing/soaking liquor, resulting thereby in improved dissolution/dispensing characteristics and improved stain removal performance on soiled fabrics.

Viscous cleaner for removing deposits from heating elements - used in synthetic fibre prodn., comprises poly:ol soluble starched, base and cationic nitrogen cpd.

High viscosity cleaner for removing, from heating elements, deposited residues from chemical fibre prodn., comprises (by wt.) 20-50% glycerol or high boiling glycol; 20-40% starch soluble in warm water; 5-15% base and 5-15% heterocyclic cationic cpd. (I). The base is alkanolamine or alkali hydroxide, and (I) is N-methylpyrrolidone (NMP). The cleaner, formulated as a paste, is applied as a thin layer to the cold heating element, heated to 120-140deg.C, allowed to act for 15-30 min and rinsed off with water. The base is pref. 5-10%; (I) 5-10%; glycerol or glycol 20-25% and starch (thickener) 20-25%. The base is pref. mixed with the hot glycerol, then (I) added, followed (with vigorous stirring) by the starch at at least 90deg.C. Within 35 min a homogeneous, viscous product is formed. USE/ADVANTAGE - The cleaner effectively and rapidly removes deposits from vertical heating surfaces, and can be rinsed off with water to leave a residue-free metal surface. It is effective at temps. above 100 ...

[...].

Zur Reinigung von Interdentalzahnbürsten wird ein Mittel vorgeschlagen, welches aus einer ersten und einer zweiten, getrennt zu verwendenden knet- und formbaren Masse besteht. Beide Massen haben dieselbe Basiszusammenstellung. Diese umfasst hydroxypropyliertes Polygalactomanan und 75 Gew.-% bis 97 Gew.-% gebundenes Wasser und eine flüssige, antiseptische Lösungsmittelkomponente, wobei die erste knet- und formbare Masse vorwiegend sterilisierende Wirkstoffe enthält, während die zweite knet- und formbare Masse zahnpflegende, desinfizierende und antiseptische Wirkstoffe enthält. Die erste knet- und formbare Masse dient zur Reinigung der Interdentalzahnbürste und nimmt daran haftende Feststoffpartikel auf. Sie dient zudem der Sterilisation der Interdentalzahnbürste, während die zweite knet- und formbare Masse vor allem antiseptische Mittel enthält, unter Abgabe der Wirkstoffe an die Interdentalzahnbürste vor deren Gebrauch bzw. Wiedergebrauch. Zudem wird eine Vorrichtung zur Verwendung des ...

Domestic animal paw cleaning agent.

Zur Reinigung von Haustierpfoten wird ein Mittel vorgeschlagen, mittels dem Feststoffpartikel von den Haustierpfoten entfernt werden können. Dieses besteht aus einer hochviskosen Knetmasse mit einer Viskosität von 50 000150 000 mPa.s, vorzugsweise von 80120 mPa.s. Diese Masse ist aus natürlichen Polygalactomananen sowie 75 Gew.-%95 Gew.-% gebundenem Wasser gebildet und enthält ein desinfizierendes Lösungsmittel aus der Gruppe der gesättigten, einwertigen Alkohole. Bevorzugterweise enthält die Masse zusätzlich nachfettende, entzündungshemmende, desinfizierende, aseptische und regenerierende Mittel. Die Masse ist so beschaffen, dass durch einige Knetbewegungen Verunreinigungen in die Masse einknetbar sind. Zur Verwendung wird die Masse (3) in einen Behälter (1) gegeben, der eine flache Mulde zur Aufnahme des Haustierpfotenreinigungsmittels enthält. Mittels eines Deckels (4), bevorzugterweise aus einem weichen Kunststoff, der die Mulde formschlüssig abdeckt, wird die Masse gegen Austrocknen ...

Means for the disinfection of surfaces.

Eine erfindungsgemässe formbare Masse zur Verwendung als Desinfektionsmittel umfasst Wasser, 25 bis 40 Gewichtsprozent einer Lösungsmittelkomponente, bestehend aus niedermolekularen, mit Wasser mischbaren Alkoholen, 1 bis 10 Gewichtsprozent einer bakteriziden Wirkkomponente, 3 bis 6 Gewichtsprozent hydroxypropyliertes Polygalactomannan mit einem Veretherungsgrad zwischen 0.3 und 1.5, sowie 0.1 bis 0.5 Gewichtsprozent Borsäure oder eine dazu äquivalente Menge Bor-Ionen.

New product for the cleaning of the stone, bricks, cement and other construction materials

Process allowing to make iron inoffensive in usual water

THICKENED AQUEOUS COMPOSITIONS

The invention relates to thickened aqueous compositions which comprise xanthan gum and a water-softening polymer.

Method for removing rosin soldering flux from a printed wiring board

A method for removing rosin soldering flux with aqueous cleaning compositions. The aqueous cleaning compositions can be employed for household use or for cleaning electronic circuit assemblies. The aqueous cleaning compositions contain an alkaline salt, an alkali metal silicate to boost detersive action or to provide corrosion protection to the substrates which are cleaned and an anionic polymer of a high molecular weight polyacrylic acid which stabilizes the alkali metal silicate to prevent precipitation of the silicate from solution.

Methods for removing silver-oxide

The present invention is directed to compositions for removing silver soil from the surface of objects. These compositions contain a reducing agent, and an alkaline source, and may optionally contain various other components including a chelating agent, cleaning agent, filler, an anti-corrosion agent, a defoaming agent, an odorant, a dye, an antioxidant, or a bleaching agent. Methods of using the compositions are also disclosed, wherein the object to be cleaned is contacted with the composition and the object is then washed with an aqueous solution.

CONTACT LENS SOLUTIONS AND KITS

The present disclosure relates to contact lens solution comprising cyclodextrin, ophthalmic solutions comprising cy-clodextrin for treating disorders or conditions associated with wearing of contact lenses, methods of treating such disorders or conditions using the ophthalmic cyclodextrin solutions, and kits and combination products thereof. 1. A contact lens kit comprising:(a) one or more contact lenses stored in an contact lens solution comprising a cyclodextrin; and(b) a topical ophthalmic solution comprising a cyclodextrin as the only active agent and optionally one or more ophthalmically acceptable excipients.2. The kit of claim 1 , wherein the cyclodextrin in the topical ophthalmic solution is capable of complexing an allergen.3. The kit of claim 1 , wherein the cyclodextrin or derivative thereof in the topical ophthalmic composition is selected from α-cyclodextrin claim 1 , β-cyclodextrin claim 1 , γ-cyclodextrin claim 1 , derivatives thereof claim 1 , and combinations thereof.4. The kit of claim 3 , wherein the cyclodextrin or derivative thereof in the topical ophthalmic composition is selected from carboxyalkyl cyclodextrin claim 3 , hydroxyalkyl cyclodextrin claim 3 , sulfoalkylether cyclodextrin claim 3 , alkyl cyclodextrin claim 3 , and combinations thereof.5. The kit of claim 4 , wherein the cyclodextrin or derivative thereof in the topical ophthalmic solution comprises β-cyclodextrin or a derivative thereof.6. The kit of claim 4 , wherein the β-cyclodextrin or derivative thereof in the topical ophthalmic solution is selected from carboxyalkyl-β-cyclodextrin claim 4 , hydroxyalkyl-β-cyclodextrin claim 4 , sulfoalkylether-β-cyclodextrin claim 4 , alkyl-β-cyclodextrin claim 4 , and combinations thereof.7. The kit of claim 6 , wherein the β-cyclodextrin or derivative thereof in the topical ophthalmic solution is sulfoalkylether-β-cyclodextrin claim 6 , hydroxyalkyl-β-cyclodextrin claim 6 , or combinations thereof.8. The kit of claim 7 , wherein the ...

Semiconductor Device Cleaning Solution, Method of Use, and Method of Manufacture

A semiconductor cleaning solution for cleaning a surface of a semiconductor device, and a method of use and a method of manufacture of the cleaning solution are disclosed. In an embodiment, a material is polished away from a first surface of the semiconductor device and the first surface is cleaned with the cleaning solution. The cleaning solution may include a host having at least one ring. The host may have a hydrophilic exterior and a hydrophobic interior.

Solid controlled release caustic detergent compositions

Solid detergent compositions for dishwashing or warewashing compositions and applications of use are disclosed. In particular, solid caustic-based compositions that do not require a traditional dispenser for controlled rate of release over multiple cycles are disclosed. Compositions, methods of employ and cleaning using the same are disclosed.

BLEACH-CONTAINING CLEANING AGENT

STRIPPER COMPOSITION FOR RESIST

PROBLEM TO BE SOLVED: To provide a stripper composition for a resist which can easily strip in a short time a resist applied on a semiconductor such as Si, GaAS, GaN and InP, a metal wiring and an interlayer insulating thin film, or a resist remaining after dry etching, or a resist residue remaining after ashing after dry etching, which does not corrode the semiconductor and which maintains the characteristics of a field effect transistor (FET), and to provide a method for stripping a resist and a method for manufacturing a semiconductor element by using the above stripper composition for a resist. SOLUTION: The stripper composition for a resist contains (A) amine, (B) an organic solvent having 18 to 33 MPa1/2 Hansen's solubility parameter, (C) saccharides and (D) water by 0 to 5 wt.%. The method for stripping a resist is carried out by using the above stripper composition for a resist. The method for manufacturing a semiconductor element includes a process of stripping a resist, and in ...

СОЛЮБИЛИЗИРОВАННЫЕ АНАЛОГИ МАГНОЛОЛА

... 1. Композиция, включающая:солюбилизированный аналог магнолола, представляющий собой, по меньшей мере, один аналог магнолола, выбранный из пропилмагнолола, изопропилмагнолола, бутилмагнолола и изобутилмагнолола, идиметилизосорбид.2. Композиция по п. 1, в которой аналог магнолола присутствует в количестве, составляющем от 0,01 до 5% массы композиции.3. Композиция по п. 1, в которой диметилизосорбид присутствует в количестве, по меньшей мере, 5-кратном от массы изопропилмагнолола или пропилмагнолола, диметилизосорбид присутствует в количестве, по меньшей мере, 10-кратном от массы изобутилмагнолола, или диметилизосорбид присутствует в количестве, 20-кратном от массы бутилмагнолола.4. Композиция по любому из предшествующих пунктов, дополнительно включающая поверхностно-активное вещество.5. Композиция по п. 1, дополнительно включающая мыло.6. Композиция по п. 5 в форме брускового мыла.7. Композиция по п. 6 в форме жидкого очищающего средства.8. Композиция по любому из пп. 1-3 в форме композиции ...

THICKENED AQUEOUS COMPOSITION OUT AMIDOSCHWEFELSÄURE

PRESERVATIVE AGENT FOR CONTACT CONTACTS CONTAINING DEXPANTHENOL

PRESERVATIVE AGENT FOR CONTACT CONTACTS CONTAINING DEXPANTHENOL

KOGRANULAT TO THE USE IN CELEBRATIONS DETERGENT COMPOSITIONS

PROCEDURE FOR THE TREATMENT OF DEAD SURFACES WITH NOT KOMPLEXIERTEN CYCLODEXTRINLÖSUNGEN FOR SMELL CONTROL

VERAHREN FOR THE CLEANING OF METAL IMPURITIES OF A SUBSTRATE WHILE MAINTAINING THE FLATNESS OF THE SUBSTRATE

WAX-STRIPPING CLEANING COMPOSITION

Method of increasing the viscosity of water, and use of the method

Rinse agents that form clear coatings on ware

Detergent particle

Biodegradable scale control composition for use in highly concentrated alkaline detergents

GRANULATE FOR USE IN A CLEANING PRODUCT AND PROCESS FOR ITS MANUFACTURE

A granulate for use in a particulate cleaning product, the granulate consisting of granules which comprise: (a) at least 30% by weight of granulation auxiliary selected from water-soluble non-acid organic crystalline solids; and (b) at least 0.1% by weight of functional cleaning material other than an enzyme or an inorganic compound; and (c) optionally, one or more other ingredients. The granulate may instead comprise: (a) at least 20% by weight of granulation auxiliary selected from non-acid water-soluble organic crystalline solids; and (b) at least 0.1% by weight of temperature sensitive functional cleaning material other than an enzyme or an inorganic compound; and (c) optionally, one or more other ingredients.

METHOD FOR CORROSION-PROTECTIVE AND CLEANING PRETREATMENT OF METALLIC COMPONENTS

The present invention relates to a method for the corrosion-protective and cleaning pretreatment of metallic components, produced at least partially from metallic materials from the elements iron, zinc and/or aluminium, with the use of an acid aqueous composition containing, in addition to the water-soluble compounds of the elements Zr and/or Ti causing the conversion of the metal surface, a mixture of an aliphatic diol and an aliphatic saturated polyhydroxy compound. It also comprises a chrome(VI)-free aqueous composition based on the constituents mentioned above which delivers outstanding results in cleaning and simultaneous corrosion-protective conversion of technical metal surfaces in one method step.

AMPHIPHILIC POLYSACCHARIDE DERIVATIVES AND COMPOSITIONS COMPRISING SAME

The disclosure relates to compositions comprising a polysaccharide derivative, wherein the polysaccharide derivative comprises a polysaccharide substituted with a) at least one hydrophobic group, and b) at least one hydrophilic group, wherein the polysaccharide is poly alpha-1,3-glucan, poly alpha-1,6-glucan, or poly alpha-1,3-1,6-glucan.

METHOD FOR PRODUCING A BIOLOGICAL SUBSTANCE, BIOLOGICAL SUBSTANCE AND THE USE THEREOF

The invention relates to a method for the production of a substance, more particularly, a substance that can be used as foodstuff or cosmetic. Said substance is obtained from a first substance that is produced by fine grinding grains or nuts, especially sunflower seeds and by adding a first liquid and salt, sugar or substances similar to salt or sugar. By adding oil, especially sunflower seed oil, or a liquefied fat, a second liquid substance is normally obtained which acquires a more solid consistency by adding a second acid liquid or acidifying agent, especially lemon juice. The amount of the second acid liquid determines the consistency of the first substance. The invention is based on a basic substance for the production of foodstuff and cosmetic products exclusively consisting of a small number of original, natural, genetically unaltered substances that have not been genetically modified -nd that contain no additives or residues from drugs or hormones and ostensibly reduce allergens ...

CLEANING COMPOSITION

The invention relates to a cleaning composition comprising 20 - 90 wt.% dimethyl sulfoxide, up to 30 wt.% at least one mineral oil (M), and up to 50 wt.% at least one bipolar organic solvent (L), the specified percentage range being related to the total weight of the cleaning composition. The present invention also relates to a method for cleaning components in which the cleaning composition for use is applied and to the cleaned components themselves.

ENVIRONMENTALLY FRIENDLY ODOUR ELIMINATION FOR GARLIC, ONION AND ODD ODOURS

ОБЩИЙ СИНТЕЗ РАСТВОРИТЕЛЯ, ПРОИЗВОДСТВО И ПРИМЕНЕНИЕ

Заявляемое изобретение относится к химии и медицине. Растворитель в любой безводной или иной форме, обеспеченный в пероральных, или парентеральных, или местных составах, содержащий смесь различных комбинаций безводных, или водных, или молярных объемов следующих солей: где доставленные катионы могут быть выполнены в отдельности или дополнены растворимыми в воде щелочными металлами, предпочтительно кальцием, натрием, калием, магнием, аммонием, серой, железом и ванадием и где доставленные анионы могут быть хлоридами, сульфатами, нитратами, ацетатами, перхлоратами, фосфатами и оксидами при наличии углевода и/или натурального меда. Используется в качестве общего растворителя для кальцификации человеческой или животной ткани, камней в тканях любой системы, таких как почечные камни, камни в желчном пузыре, шлаки в желчном пузыре и т.д.

GRANULAR COMPOSITION

A granular composition is provided and comprises a plurality of granules wherein each of the granules comprises (i) a silicone; (ii) a disintegrant present at at least 50% by weight based on the total weight of the granular composition; and (iii) an effervescent couple comprising a first compound and a second compound capable of reacting to produce effervescence, wherein the first compound and the second compound are dispersed in the disintegrant. A method for contacting the granular composition with an aqueous medium is also provided.

SACCAROSE AS WASHINGPOWDER

Sucrose and all sugars from C2 to C18 as washingpowders.

METHOD OF INCREASING THE VISCOSITY OF WATER, AND USE OF THE METHOD

The method proposed for increasing the viscosity of water is charcterized in that, for the instantaneous production of increased-viscosity water which does not lose its viscosity characteristics on storage, a slurry is prepared containing 1-9 %, preferably 2-5 %, of high-disperse synthetic, preferably pyrogenic, silicic acid in water with only a small amount of added ethers of fatty alcohols or saccaric alcoohols or esters of fatty acids with poly(ethylene glycol) or poly(propylene glycol) with a molecular weight between 250 and 50,000, at a concentration of 0.005 to 1.5 %, poly(ethylene glycol) or poly(propylene glycol) with a molecular weight between 600 and 50,000 at a concentration of 0.05 to 1.5 %, poly(ethylenimine) at a concentration > 0.003 or poly(N-vinyl-2-pyrrolidone) at a concentration of 0.05 to 0.5 %. Characteristic of this system is its marked rheopexic properties which are shown instantaneously under the action of shear forces. Under such conditions, the viscosity increases ...

Composition for paint stripper

A paint stripper composition able to remove a variety of paint systems employing methylene chloride as the active solvent for the composition further includes an amine-glycolate acid salt having a pH of 5 which aids in the swelling of the subsurface of the paint system that is to be removed, thus allowing the permeation of salt complex in conjunction with the chloride ion portion of the methylene chloride to cause a releasing action of the paint bond from the substrate material such as metal, wood, glass, fabric or plastic. The composition further includes a vapor pressure depressant such as paraffin wax, a viscosity increasing agent, and other solvent materials to aid in the stripping action. The composition is substantially totally bio-degradable, is low in toxicity and is further characterized by the variety of paint systems which can be effectively removed by the composition and its ability to remove carbon deposits on metal parts and surface rust from metal and chrome plated surfaces ...

Disinfecting and cold-sterilizing solution

A disinfecting and cold-sterilizing solution, comprising a first hydrogen peroxide component and a second component comprising glucose pentaacetate. The two components are mixed at the time of use, so as to generate a solution that has a high disinfecting power and is suitable for the cold treatment of surgical instruments that cannot be sterilized by heat.

GLUCAN FIBER COMPOSITIONS FOR USE IN LAUNDRY CARE AND FABRIC CARE

НЕКРИСТАЛЛИЧЕСКАЯ СИСТЕМА ДОСТАВКИ ВКУСОАРОМАТИЧЕСКИХ ВЕЩЕСТВ ИЛИ ОТДУШКИ, СПОСОБ ЕЕ ПРИГОТОВЛЕНИЯ (ВАРИАНТЫ), ВКУСОАРОМАТИЗИРОВАННЫЙ ПРОДУКТ, ИЗДЕЛИЕ С ОТДУШКОЙ И СПОСОБ УЛУЧШЕНИЯ, УСИЛЕНИЯ ИЛИ МОДИФИКАЦИИ ОРГАНОЛЕПТИЧЕСКИХ СВОЙСТВ ВКУСОАРОМАТИЧЕСКОЙ КОМПОЗИЦИИ ИЛИ КОМПОЗИЦИИ С ОТДУШКОЙ

FIELD: food industry. SUBSTANCE: delivery system, including hydrophobic flavoring or aromatic component or composition, encapsulated in oligomeric or polymer carrier. The hydrophobic flavoring or aromatic component or composition, not being encapsulated, are in crystal form under the pressure from 0.5x10 5 till 2x10 5 Pa and temperature from 15 till 30°C. Being incapsulated in the delivery system, they are in noncrystalline form at the specified temperature and pressure. The method, according to the first variant, provides for dispersion of components in the carrier, dispersion extrusion at the temperature higher than the component melting temperature and cooling of extrusion melt at the temperature lower than the component melt point with the speed to prevent from recrystallization. According to the second variant, the method provides for the component dispersion with the carrier water solution, dispersion heating till the temperature higher than the component melt point, dispersion homogenization and drying by spraying to prevent from recrystallization. According to the third variant, the method provides for component integration and mixing with the carrier to form homogeneous melt, melt extrusion and cutting-down, cut, grinding or obtained material spraying. EFFECT: capability of getting delivery system providing sensory effect with significantly lower dosage. 25cl, 5 ex ÐÎÑÑÈÉÑÊÀß ÔÅÄÅÐÀÖÈß (19) RU (11) 2 323 595 (13) C2 (51) ÌÏÊ A23L 1/22 (2006.01) A23P 1/04 (2006.01) A61K 8/00 (2006.01) ÔÅÄÅÐÀËÜÍÀß ÑËÓÆÁÀ ÏÎ ÈÍÒÅËËÅÊÒÓÀËÜÍÎÉ ÑÎÁÑÒÂÅÍÍÎÑÒÈ, ÏÀÒÅÍÒÀÌ È ÒÎÂÀÐÍÛÌ ÇÍÀÊÀÌ (12) ÎÏÈÑÀÍÈÅ ÈÇÎÁÐÅÒÅÍÈß Ê ÏÀÒÅÍÒÓ (21), (22) Çà âêà: 2004136291/13, 12.06.2003 (24) Äàòà íà÷àëà îòñ÷åòà ñðîêà äåéñòâè ïàòåíòà: 12.06.2003 (30) Êîíâåíöèîííûé ïðèîðèòåò: 14.06.2002 IB PCT/IB02/02228 (73) Ïàòåíòîîáëàäàòåëü(è): ÔÈÐÌÅÍÈØ ÑÀ (CH) (43) Äàòà ïóáëèêàöèè çà âêè: 10.07.2005 R U (72) Àâòîð(û): ÍÎÐÌÀÍÄ Âàëåðè (FR), ÊÀÍÒÅÐÃÈÀÍÈ Ýííèî (CH), ÁÓÊÐÀÍ Ïüåð-Ýòüåí (FR), ÁÀÐÐÀ Æåðîì (FR), ÁÅÍÖÅÄÈ ...

REINIGUNGSMITTELZUSAMMENSETZUNG

Verdicktes Wasser

Phosphate suspensions

PROCEDURE FOR THE PRODUCTION OF A BIOLOGICAL SUBSTANCE AS WELL AS SUCH SUBSTANCE AND THEIR USE

VERFAHREN ZUM BLEICHEN VON TEXTILARTIKELN

PROCEDURE FOR THE VERDICKUNG WATER MANUFACTURED SUCH A BY WATER, AND ITS USE

SOUR CLEANING COMPOSITIONS

GRANULATES AS ADDITIVE TO CLEANING AGENT AND PROCEDURES FOR ITS PRODUCTION

DEXPANTHENOL CONTAINING PREPARATION TO THE CONTACT LENS CARE

NATURAL EDIBLE CLEANING COMPOSITION

A cleaning solution, composition, and portable cleaner are provided that is all natural, safe, non-toxic, edible, anti-bacterial, anti-microbial, deodorizing, and further includes a pleasant fragrance and taste. In addition, the cleaning composition can be free from sugar, alcohol, surfactants, and other harmful or harsh ingredients. In addition, the cleaning composition allows for quick cleaning of any type of object that may be placed in the mouth, such as pacifiers, toys, candy, eating utensils, musical instruments, and mouth-pieces, among others.

DETERGENT COMPOSITION COMPRISING A CATIONIC DERIVATIVE OF A POLYSACCHARIDE

The invention relates to a detergent composition comprising at least one cationic derivate of a polysaccharide. The cationic derivate has an average molecular weight of less than 30000 g/mol, a degree of substitution ranging between 0.01 and 3. The invention further relates to a method of reducing, limiting or preventing the occurrence of spotting and/or filming on hard surface substrates during rinsing or washing and to the use of a detergent composition to reduce, limit or prevent the occurrence of spotting and/or filming on hard surface substrates during rinsing and/or washing.

USE OF SUGARS IN A STABILIZATION MATRIX AND SOLID COMPOSITIONS

The use of sugars in a stabilization matrix and solid detergent compositions is disclosed along with methods of making and using the solid detergent compositions.

COOLING SYSTEM CLEANING SOLUTIONS

Use of sugars in a stabilization matrix and solid compositions

The use of sugars in a stabilization matrix and solid detergent compositions is disclosed along with methods of making and using the solid detergent compositions.

Thickened aqueous composition of sulfamic acid.

Gypsum remover

Contemplated compositions and methods for treating in service concrete includes the step of contacting a portion of the in service concrete with an composition, wherein the composition comprises a base and at least one of an acid and a salt of an acid in an amount effective to convert insoluble calcium salts into soluble calcium gluconates that can be washed away with water or other liquid.

COMPOSITION AND APPLICATION OF A TWO-PHASE CONTAMINANT REMOVAL MEDIUM

The embodiments provide substrate cleaning techniques to remove contaminants from the substrate surface to improve device yield. The substrate cleaning techniques utilize a cleaning material with solid components and polymers with a large molecular weight dispersed in a cleaning liquid to form the cleaning material, which is fluidic. The solid components remove contaminants on the substrate surface by making contact with the contaminants. The polymers with large molecular weight form polymer chains and a polymeric network that capture and entrap solids in the cleaning materials, which prevent solids from falling on the substrate surface. In addition, the polymers can also assist in removing contaminants form the substrate surface by making contacts with contaminants on the substrate surface. In one embodiment, the cleaning material glides around protruding features on the substrate surface without making a forceful impact on the protruding features to damage them. The present invention ...

SYSTEMS AND METHODS OF FORMING A FLUID BARRIER

The present disclosure provides fluid barriers as well as systems and methods of forming fluid barriers. The method includes cleaning, via a blast media, a first side of a component and heating the component to a first temperature. Subsequently, the component is cleaned using a solvent. Subsequent to heating at least the component, a primer coating layer is formed on the first side of the component, and a topcoat layer is formed in contact with the primer coating layer. A primer coating material can be heated to a second temperature prior to formation of the primer coating layer. The first temperature can be different than the second temperature. 1. A method of forming a fluid barrier , comprising:{'b': '202', '() cleaning, using a blast media, a first side of a component;'}{'b': '204', '(A) heating the component to a first temperature;'}{'b': '206', 'subsequently, () cleaning the component using a solvent; and'}{'b': '208', 'subsequently, () forming a primer coating layer on the first side of the component while the component is at a second temperature, wherein the first temperature is different than the second temperature.'}2. The method of claim 1 , wherein the blast media comprises a wheat starch claim 1 , a corn starch claim 1 , or a polymer-based media.3. The method of claim 1 , wherein each of the first temperature and the second temperature is from about 120° F. to about 140° F.4202. The method of claim 1 , wherein () cleaning the first side of the component using the blast media comprises grit-blasting a plurality of three-dimensional structures formed from a composite material on the first side of the component.5208204. The method of claim 1 , further comprising claim 1 , prior to () forming the primer coating layer claim 1 , (B) heating a container of primer coating to a third temperature claim 1 , the third temperature being from about room temperature (68° F.-77° F.) to about 140° F.6. The method of claim 1 , wherein the primer coating layer comprises ...

Removal of paint from porous, smooth, and mineralogically fragile surfaces

Compositions and methods of the invention are directed to the removal of solid films, and particularly paint layers, from substrates, and particularly smooth, porous, and/or mineralogically fragile substrates such as sandstone. The compositions include cooked aqueous solutions of starch. The compositions can advantageously remove paints and other unwanted solid films from these and other substrates without damaging the substrate itself.

КОМПОЗИЦИЯ ДЛЯ ОЧИСТКИ ПОСЛЕ ХИМИКО-МЕХАНИЧЕСКОГО ПОЛИРОВАНИЯ (ПОСЛЕ - СМР), СОДЕРЖАЩАЯ КОНКРЕТНОЕ СОДЕРЖАЩЕЕ СЕРУ СОЕДИНЕНИЕ И САХАРНЫЙ СПИРТ ИЛИ ПОЛИКАРБОНОВУЮ КИСЛОТУ

Очищающая композиция после химико-механического полирования (после-СМР), содержащая: (А) соединение, представляющее собой цистеин, N-ацетилцистеин, тиомочевину или их производное, (В) эритрит, (С) водную среду и (Е) по меньшей мере одно поверхностно-активное вещество, и ее применение для удаления остатков и загрязнений с поверхности полупроводниковых подложек, содержащих электропроводящие слои (такие как медные слои), электроизолирующие диэлектроизолирующие диэлектрические слои (такие как слои диэлектриков с низкой или сверхнизкой диэлектрической проницаемостью) и барьерные слои (такие как слои тантала, нитрида тантала, нитрида титана или рутения), т.е. изобретение относится к применению очищающей композиции после СМР для удаления остатков и загрязнений, содержащих бензотриазол после СМР. 6 н. и 20 з.п. ф-лы, 5 табл., 3 ил.

КОМПОЗИЦИЯ ДЛЯ ОЧИСТКИ ПОСЛЕ ХИМИКО-МЕХАНИЧЕСКОГО ПОЛИРОВАНИЯ (ПОСЛЕ - СМР), СОДЕРЖАЩАЯ КОНКРЕТНОЕ СОДЕРЖАЩЕЕ СЕРУ СОЕДИНЕНИЕ И САХАРНЫЙ СПИРТ ИЛИ ПОЛИКАРБОНОВУЮ КИСЛОТУ

1. Очищающая композиция после химико-механического полирования, содержащая:(A) по меньшей мере одно соединение, содержащее по меньшей мере одну тиольную (-SH), тиоэфирную (-SR) или тиокарбонильную (>C=S) группу, где Rпредставляет собой алкил, арил, алкиларил или арилалкил,(B) является эритритом, треитом или их стреоизомером или их смесью,(C) водную среду.2. Композиция по п. 1, в которой соединение (А) представляет собой соединение, содержащее по меньшей мере одну тиольную (-SH), тиоэфирную (-SR) или тиокарбонильную (>C=S) группу и по меньшей мере одну амино (-NH, -NHRили -NRR) группу, и где R, R, Rи Rпредставляют собой - независимо друг от друга - алкил, арил, алкиларил или арилалкил.3. Композиция по п. 2, в которой соединение (А) представляет собой тиомочевину или ее производное.4. Композиция по п. 2, в которой соединение (А) представляет собой аминокислоту, содержащую по меньшей мере одну тиольную (-SH) или тиоэфирную (-SR) группу или производное этой аминокислоты,где Rпредставляет собой алкил, арил, алкиларил или арилалкил.5. Композиция по п. 4, в которой соединение (А) представляет собой цистеин, цистин, глутатион, N-ацетилцистеин или их производное.6. Композиция по п. 1, в которой композиция дополнительно содержит (D), по меньшей мере один хелатообразующий агент металла.7. Композиция по п. 1, в которой композиция дополнительно содержит по меньшей мере один хелатообразующий агент металла (D), который выбирают из группы, состоящей из пропан-1,2,3-трикарбоновой кислоты, лимонной кислоты, бутан-1,2,3,4-тетракарбоновой кислоты, пентан-1,2,3,4,5-пентакарбоновой кислоты, тримеллитовой кислоты, тримезитовой кислоты, пиромеллитовой кислоты, меллитовой кислоты и олигомерных и полимерных поликарбоновых кислот.8. Композиция по любому из п.п. 1-7, в которой композиция допол РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (51) МПК C11D 7/22 (13) 2014 136 176 A (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ЗАЯВКА НА ИЗОБРЕТЕНИЕ (21)(22) Заявка: 2014136176, 24.01 ...

Verfahren zum Unschaedlichmachen des Eisens in Wasch- und Textilbehandlungsflotten

DEXPANTHENOL ENTHALTENDES PRÄPARAT ZUR KONTAKTLINSENPFLEGE

STREUFÄHIGES TEPPICHREINIGUNGSMITTEL

Thickened aqueous compositions

Thickened aqueous compositions

The invention relates to thickened aqueous compositions which contain xanthan gum and at least one water softening agent. The water softening agent may be a water-soluble polyacrylate.

PROCEDURE FOR BLEACHING INDIGO COLORED DENIM ARTICLES

STREW-ABLE CARPET CLEANING AGENT

SHOWER COMPOSITIONS AS WELL AS DRY ONES OF SHOWER GRANULATES

PROCEDURE FOR BLEACHING TEXTILE ARTICLES

VERFAHREN ZUM BLEICHEN VON TEXTILARTIKELN

Saccharose as washingpowder

Deformable mass for disinfecting surfaces, based on cross-linked hydropropylated polygalactomannan

The invention relates to a deformable mass for using as a disinfectant, comprising water, between 25 and 40 weight per cent of a solvent component consisting of low-molecular, water-miscible alcohols, between 1 and 10 weight per cent of a bactericide active component, between 3 and 6 weight per cent of a hydroxypropylated polygalactomannan having a degree of esterification of between 0.3 and 1.5, and between 0.1 and 0.5 weight per cent of boric acid or the equivalent quantity of boron ions.

Method of laundering clothes and detergent composition therefor

GRANULATE FOR USE IN A CLEANING PRODUCT AND PROCESS FOR ITS MANUFACTURE

... ²²²A granulate for use in a particulate cleaning product, the granulate ²consisting of granules which comprise: (a) at least 30% by weight of ²granulation auxiliary selected from water-soluble non-acid organic crystalline ²solids; and (b) at least 0.1% by weight of functional cleaning material other ²than an enzyme or an inorganic compound; and (c) optionally, one or more other ²ingredients. The granulate may instead comprise: (a) at least 20% by weight of ²granulation auxiliary selected from non-acid water-soluble organic crystalline ²solids; and (b) at least 0.1% by weight of temperature sensitive functional ²cleaning material other than an enzyme or an inorganic compound; and (c) ²optionally, one or more other ingredients.² ...

CLEANING COMPOSITION

Multi-surface cleaning compositions and methods of use. Compositions have a combination of an alkyl polyglucoside and pyrrolidone, present in an acti ves ratio of at least 2:1, sometimes at least 5:1. A composition concentrate can be diluted with water, at a ratio of 1:800 or even 1:900, to form an ac ceptable use-composition.

DETERGENT PARTICLE

The invention provides a substantially anhydrous effervescent particle, having an average particle size of from 75 microns to 2 cm comprising an anhydrous particle core, which comprises one or more components of an effervescence system intimately mixed with a substantially anhydrous stabilising agent.

Process for the manufacture of a product of cleaning for wallpapers, murals, etc

REMOVER COMPOSITION

composition and use of a composition

CLEANING AGENT

Disclosed is a cleaning agent used for cleaning plastics, ceramics or glasses which is composed of an aqueous solution containing a cyclodextrin and/or chaotropic ions and having a pH of not less than 10.

Composition for cleaning glass and cloth saturated therewith

Method of activating N-methyl-2-pyrrolidone (NMP) varnish and paint remover solvents for removal of organic coatings

This invention is directed to an environmentally safe, water soluble stripping composition comprising between about 30 and about 98.5 wt. % N-methylpyrrolidone or a 10/90 to 90/10 mixture of N-methylpyrrolidone and gamma-butyrolactone and between about 0.1 and about 5 wt. % cyclomethicone. The invention also concerns the use of this composition in a process for stripping organic coatings such as paints, resins, varnishes and shellac from substrates.

Composition For TiN Hard Mask Removal And Etch Residue Cleaning

Composition, method and system for TiN hard mask removal from electronic circuitry devices, such as advanced pattern wafers have been disclosed. The cleaning compositions preferably comprise an etchant agent (also referred to as a base), an oxidizing agent, an oxidizing stabilizer (also referred to as a chelating agent), an ammonium salt, a corrosion inhibitor, and a solvent. Other optional additives could be provided. It is preferable that the pH of the cleaning composition be greater than 5.5. The cleaning composition is preferably free from dimethyl sulfoxide and tetramethylammonium hydroxide.

Compositions and methods for collecting or containing a hydrophilic polymer

Compounds and related methods are present to assist in the collection and/or disposal of polymers and/or coagulants, such as hydrophilic long chain polymers. A compound may be provided as a mixture of a polysaccharide, a salt, and a substrate. Such mixture may be cast over an area including, e.g., a spilled hydrophilic long chain polymer, and the polymer and mixture may be easily swept up and disposed of.

Cleaning composition containing a polysaccharide hybrid polymer composition and methods of improving drainage

A composition includes a polysaccharide hybrid polymer composition. In one embodiment, the polysaccharide hybrid polymer composition includes a polysaccharide residue present in an amount from about 5% to about 90% by weight of the polysaccharide hybrid polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from about 10% to about 75% by weight of the polysaccharide hybrid polymer composition.

CLEANING COMPOSITION CONTAINING A POLYSACCHARIDE GRAFT POLYMER COMPOSITON AND METHODS OF IMPROVING DRAINAGE

A composition includes a polysaccharide graft polymer composition. In one embodiment, the polysaccharide graft polymer composition includes a polysaccharide residue present in an amount from about 5% to about 90% by weight of the polysaccharide graft polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from about 10% to about 75% by weight of the polysaccharide graft polymer composition. 1. A cleaning composition comprising:at least one alkali metal hydroxide present in an amount from about 21% to about 80% by weight of the cleaning composition;water; anda polysaccharide graft polymer composition comprising:polysaccharide residue in an amount from about 5% to about 90% by weight of the polysaccharide graft polymer composition; andresidue of at least one ethylenically unsaturated monomer present in an amount from about 10% to about 75% by weight of the polysaccharide graft polymer composition.2. The cleaning composition of claim 1 , wherein the at least one ethylenically unsaturated monomer includes at least one ethylenically unsaturated anionic monomer.3. The cleaning composition of claim 1 , wherein the at least one ethylenically unsaturated monomer includes at least one member selected from the group consisting of acrylic acid claim 1 , methacrylic acid claim 1 , ethacrylic acid claim 1 , α-chloro-acrylic acid claim 1 , α-cyano acrylic acid claim 1 , β-methyl-acrylic acid (crotonic acid) claim 1 , α-phenyl acrylic acid claim 1 , β-acryloxy propionic acid claim 1 , sorbic acid claim 1 , α-chloro sorbic acid claim 1 , angelic acid claim 1 , cinnamic acid claim 1 , p-chloro cinnamic acid claim 1 , β-styryl acrylic acid (1-carboxy-4-phenyl butadiene-1 claim 1 ,3) claim 1 , itaconic acid claim 1 , maleic acid claim 1 , citraconic acid claim 1 , mesaconic acid claim 1 , glutaconic acid claim 1 , aconitic acid claim 1 , fumaric acid claim 1 , tricarboxy ethylene claim 1 , 2-acryloxypropionic acid claim 1 , 2-acrylamido- ...

Wipes

A wipe comprising a substrate and a cleaning and/or disinfecting compound retained by one or more cyclodextrin compounds. The wipe is wet with one or more fluids comprising water to release the cleaning and/or disinfecting compound from the one or more cyclodextrin compounds, and applied to a surface to clean and/or disinfect the surface. 1. A wipe comprising:a substrate; andethanol retained by one or more cyclodextrin compounds;wherein the one or more cyclodextrin compounds release the ethanol upon wetting the wipe with water; andwherein the substrate carries or is impregnated with the ethanol retained by the one or more cyclodextrin compounds.2. The wipe according to claim 1 , wherein the ethanol retained by the one or more cyclodextrin compounds is in a dry powdered form.3. The wipe according to claim 1 , wherein the wipe is stored in a dry state.4. The wipe according to claim 1 , wherein the substrate is capable of absorbing a fluid.5. The wipe according to claim 4 , wherein the substrate has at least one of: holes claim 4 , pores claim 4 , and openings for absorbing the fluid.6. The wipe according to claim 1 , wherein the substrate comprises at least one of: a sheet claim 1 , a paper towel-like member claim 1 , a woven fabric claim 1 , a mat of bonded fibers claim 1 , and a porous sponge-like member.7. A method of using a wipe as claimed in claim 1 , the method comprising:wetting the wipe with one or more fluids comprising water to release the ethanol from the one or more cyclodextrin compounds; andapplying the wipe to a surface to clean and/or disinfect the surface.8. The method according to claim 7 , wherein the one or more fluids comprising water includes a surface fluid;wherein, before the wipe is applied to the surface, the surface fluid is present on the surface; andwherein wetting the wipe comprises applying the wipe to the surface fluid that is present on the surface.9. The method according to claim 8 , further comprising applying the surface fluid to ...

GEL SOLVENT AND METHOD OF REMOVING DIFFUSION AND OVERLAY COATINGS IN GAS TURBINE ENGINES

A method of stripping an engine component may comprise applying an acidic gel solvent to a coating of a surface of the engine component, leaving the acidic gel solvent on the surface of the engine component for a predetermined duration, and removing the acidic gel solvent from the surface of the engine component. The method may further include mixing an acid with a gelling agent to form the acidic gel solvent. The acid may comprise hydrochloric acid. The gelling agent may comprise a cellulosic material. The gelling agent may comprise a carbohydrate. The method may further include rinsing the acidic gel solvent from the surface of the engine component. The coating may comprise at least one of a diffusion coating or an overlay coating. 1. A method of stripping an engine component , comprising:applying an acidic gel solvent to a coating of a surface of the engine component;leaving the acidic gel solvent on the surface of the engine component for a first duration; andremoving the acidic gel solvent from the surface of the engine component.2. The method of claim 1 , further including mixing an acid with a gelling agent to form the acidic gel solvent.3. The method of claim 2 , wherein the acid comprises hydrochloric acid.4. The method of claim 2 , wherein the gelling agent comprises a cellulosic material.5. The method of claim 2 , wherein the gelling agent comprises a carbohydrate.6. The method of claim 1 , further comprising rinsing the acidic gel solvent from the surface of the engine component.7. The method of claim 1 , wherein the coating comprises at least one of a diffusion coating or an overlay coating.8. The method of claim 1 , wherein the coating comprises aluminum.9. The method of claim 1 , further comprising removing an additive layer of the coating while leaving a diffused layer of the coating.10. The method of claim 1 , wherein the acid comprises a mineral acid.11. The method of claim 1 , further including:determining a thickness of a remainder of the coating ...

Natural edible cleaning composition

A cleaning solution, composition, and portable cleaner are provided that is all natural, safe, non-toxic, edible, anti-bacterial, anti-microbial, deodorizing, and further includes a pleasant fragrance and taste. In addition, the cleaning composition can be free from sugar, alcohol, surfactants, and other harmful or harsh ingredients. In addition, the cleaning composition allows for quick cleaning of any type of object that may be placed in the mouth, such as pacifiers, toys, candy, eating utensils, musical instruments, and mouth-pieces, among others.

MANUFACTURING PROCESS FOR AN ANTI-LIME SCALE PRODUCT

This invention concerns the process for the manufacture of an “anti-lime scaling” product, that is, a product designed to inhibit the formation of lime scale in elements such as pipes or hoses that could be subject to deterioration over time due to lime scale deposits. Specifically, the process of the invention is for an ecological anti-lime scale product. For this, the process according to the invention comprises a preparation step () of vegetal matter from the Caryophyllacae family, an infusion step () of this vegetal matter, a filtration step () of this infusion and a preparation step () of the anti-lime scale solution from a filtrate obtained during the filtration step. 1. A process for the manufacture of an anti-lime scale product , including at least the following steps:a preparation step of vegetal matter including saponosides, flavonoids, monosaccharides and holosides,an infusion step of this vegetal matter,a filtration step for this infusiona preparation step of the anti-lime scale solution using a filtrate obtained during the filtration step wherein the infusion step is performed using boiled water and that the vegetal matter come from plants from at least one of the following families: Caryophyllaceae, Asteraceae, Illecebraceae or Urticaceae.2. The process according to claim 1 , wherein the vegetal matter is comprised of catechols.3. The process according to claim 2 , wherein it comprises a secondary fractioning step using a filtrate obtained during the filtration step.4. The process according to claim 3 , wherein it comprises a secondary fractioning step using a polar fraction obtained during the initial fractioning step.5. The process according to claim 4 , wherein the separation of compounds carried out in the secondary fractioning step claim 4 , takes place according the polarity gradient.6. The process according to claim 4 , wherein it comprises a selection step of intermediate polarity elements from the secondary fractionary step.7. The process ...

Non-toxic VOC free alkali surfactant and a method for floor cleaning machines

Non-toxic and eco-friendly cleaning solutions include water, either sodium carbonate or sodium bicarbonate, sodium tetraborate, and alkyl polyglucoside. In some examples, the cleaning solutions include 70-98% water, 0.04-9.8% sodium carbonate or sodium bicarbonate, 0.03-8.6% sodium tetraborate, and 0.01-20% alkyl polyglucoside (having an HLB range of 10 to 20 and C.sub.8 to C.sub.16). In some further examples, the cleaning solutions include a fragrance and/or a preservative. 1. A non-toxic and eco-friendly cleaning solution compound , comprising:water;at least one of sodium carbonate and sodium bicarbonate;sodium tetraborate; and{'sub': 2', '3, 'an alkyl polyglucoside having the formula R—O—(CH)CH, where R is a glucose derivative, and n is an integer.'}2. The cleaning solution compound of claim 1 , wherein the water is 70% to 98% of the cleaning solution by weight.3. The cleaning solution compound of claim 1 , wherein the water is 82% to 97% of the cleaning solution by weight.4. The cleaning solution compound of claim 1 , wherein the at least one of sodium carbonate and sodium bicarbonate is 0.04% to 9.8% of the cleaning solution by weight.5. The cleaning solution compound of claim 1 , wherein the sodium tetraborate is 0.03% to 8.6% of the cleaning solution by weight.6. The cleaning solution compound of claim 1 , wherein the alkyl polyglucoside has an HLB range of 10 to 20 and C.sub.8 to C.sub.16 claim 1 , and the alkyl polyglucoside is 0.01% to 20% of the cleaning solution by weight.7. (canceled)8. The cleaning solution compound of claim 1 , wherein the cleaning solution has a pH within the range of 8.5 to 11.5.9. The cleaning solution compound of claim 1 , wherein a VOC content is substantially 0%.10. The cleaning solution compound of claim 1 , further comprising a preservative.11. The cleaning solution compound of claim 1 , further comprising a fragrance.12. A non-toxic and environmentally safe alkaline surfactant compound for cleaning hard surface and textiles ...

SOLID CONTROLLED RELEASE CAUSTIC DETERGENT COMPOSITIONS

Solid detergent compositions for dishwashing or warewashing compositions and applications of use are disclosed. In particular, solid caustic-based compositions that do not require a traditional dispenser for controlled rate of release over multiple cycles are disclosed. Compositions, methods of employ and cleaning using the same are disclosed. 1. A system for cleaning wares in an automatic dishwashing environment comprising:a solid controlled release composition comprising from about 20 wt-% to about 95 wt-% of a hydroxide alkalinity source, from about 0.01 wt-% to about 20 wt-% of at least one polysaccharide material having between about a 1 wt-% to about 2 wt-% aqueous solution viscosity at 25° C. of between about 1 cps and about 5000 cps, and a surfactant;wherein the solid composition is a homogenous 2-in-1 composition providing a detergent and rinse aid in a single solid composition, wherein the solid is a multi-use composition, and wherein the solid is not encapsulated with a delayed release chemistry; andwherein the system does not include a dispensing system.2. The system of claim 1 , wherein the solid controlled release composition is a pressed solid.3. The system of claim 1 , wherein the solid controlled release composition is a capsule claim 1 , tablet claim 1 , coated tablet claim 1 , puck claim 1 , brick or block.4. The system of claim 1 , wherein the solid controlled release composition is a pressed solid tablet or block.5. The system of claim 1 , wherein the automatic dishwashing environment is a consumer or commercial dish washing machine.6. The system of claim 1 , wherein the system further comprises a holder to hold the solid controlled release composition and wherein the holder is configured to be secured to a wash tub of a consumer or commercial dish washing machine.7. The system of claim 6 , wherein the solid controlled release composition is placed in the wash tub before the beginning of a wash cycle and is present in the wash tub for more than ...

GEL COMPOSITION FOR CLEANING PIPELINES AND PIPE-NETWORKS AND THE USE THEREOF

The invention relates to a gel composition comprising 0.6 to 2.5 weight percent of guar gum, 0.01 to 0.05 weight percent of boric acid, 0.003 to 0.007 weight percent of a base, 2.5 to 4.5 weight percent of a short carbon chain alcohol, optionally 0.01 to 0.5 weight percent of additives and the necessary amount of water to reach 100% weight. The invention covers a method for producing the gel composition and the use thereof. 1. A gel composition comprising 0.6 to 2.5 weight percent of guar gum , 0.01 to 0.05 weight percent of boric acid , 0.003 to 0.007 weight percent of a base , 2.5 to 4.5 weight percent of a short carbon chain alcohol , optionally 0.01 to 0.5 weight percent of additives and the necessary amount of water to reach 100% weight.2. The gel composition according to claim 1 , wherein the base is NaOH.3. The gel composition according to claim 1 , wherein the short carbon chain alcohol is ethanol.4. The gel composition according to in the form of a pushing gel comprising 1.9 to 2.1 weight percent of guar gum claim 1 , 0.03 to 0.035 weight percent of boric acid claim 1 , 0.0053 to 0.0055 weight percent of a base claim 1 , 3.6 to 3.8 weight percent of a short carbon chain alcohol and the necessary amount of water to reach 100% weight.5. The gel composition according to in the form of an intermediate gel comprising 1.32 to 1.37 weight percent of guar gum claim 1 , 0.03 to 0.033 weight percent of boric acid claim 1 , 0.0053 to 0.0055 weight percent of a base claim 1 , 3.6 to 3.8 weight percent of a short carbon chain alcohol claim 1 , optionally 0.01 to 0.5 weight percent of additives (such as hydrogen-peroxide) and the necessary amount of water to reach 100% weight.61. The gel composition according to in the form of a pick-up gel comprising 1.05 to 1. weight percent of guar gum claim 1 , 0.03 to 0.035 weight percent of boric acid claim 1 , 0.0053 to 0.0055 weight percent of a base claim 1 , 3.65 to 3.85 weight percent of a short carbon chain alcohol claim 1 , ...

NUCLEIC ACID DECONTAMINATION METHODS

Methods and cleaning compositions for reduction of nucleic acid contamination on surfaces, in air, and in solutions using modified pectin are provided. 1. A method of reducing nucleic acid contamination on a surface comprising: contacting a surface contaminated with a nucleic acid with a composition comprising a modified pectin , wherein the modified pectin comprises a plurality of amino groups.2. The method of claim 1 , wherein the modified pectin is an amidated pectin.4. The method of claim 2 , wherein the molecular weight of the amidated pectin is between about 0.5 kDa and about 500 kDa.5. The method of claim 2 , wherein the molecular weight of the amidated pectin is from about 100 kDa to about 300 kDa.6. The method of claim 2 , wherein the composition comprising the amidated pectin is a solution of the amidated pectin.7. The method of claim 6 , wherein the amidated pectin is in solution at a concentration of about 0.01% to about 5%.8. The method of claim 6 , wherein the amidated pectin is in solution at a concentration of about 0.1% to about 0.5%.9. The method of claim 6 , wherein the amidated pectin in solution with a concentration of from about 1 ug/mL to about 1000 ug/mL.10. The method of claim 2 , wherein the amidated pectin is amidated citrus pectin or amidated apple pectin.11. The method of claim 2 , wherein the composition is present on a swab claim 2 , wipe claim 2 , cloth claim 2 , filter claim 2 , or sponge.12. The method of claim 2 , wherein the surface is a surface of an instrument or a laboratory bench surface.13. A method for reducing nucleic acid contamination in a solution claim 2 , comprising: contacting a solution contaminated with a nucleic acid with a solid support comprising a modified pectin covalently bound thereto claim 2 , wherein the modified pectin comprises a plurality of amino groups.14. The method of claim 13 , wherein the modified pectin is an amidated pectin.16. The method of claim 13 , wherein the solid support is a magnetic bead ...

USE OF SUGARS IN A STABILIZATION MATRIX AND SOLID COMPOSITIONS

The use of sugars in a stabilization matrix and solid detergent compositions is disclosed along with methods of making and using the solid detergent compositions. 2. The solidification matrix of claim 1 , comprising from about 0.1 to about 20 wt. % of the sugar.3. The solidification matrix of claim 1 , comprising from about 50 to about 95 wt. % of the carbonate.4. The solidification matrix of claim 1 , comprising from about 5 to about 50 wt. % the water.5. The solidification matrix of claim 1 , wherein the sugar is sucrose.6. The solidification matrix of claim 1 , wherein the carbonate is selected from the group consisting of sodium carbonate claim 1 , potassium carbonate claim 1 , sodium bicarbonate claim 1 , sodium sesquicarbonate claim 1 , and mixtures thereof.7. The solidification matrix of claim 1 , wherein the matrix is substantially free of phosphorous.8. The solidification matrix of claim 1 , wherein the matrix is free of phosphorous.10. The composition of claim 9 , wherein the sugar is sucrose.11. The composition of claim 9 , wherein the carbonate is selected from the group consisting of sodium carbonate claim 9 , potassium carbonate claim 9 , sodium bicarbonate claim 9 , sodium sesquicarbonate claim 9 , and mixtures thereof.12. The composition of claim 9 , the composition further comprising a functional ingredient selected from the group consisting of chelating agents claim 9 , sequestering agents claim 9 , alkaline sources claim 9 , rinse aids claim 9 , bleaching agents claim 9 , antimicrobial agents claim 9 , defoaming agents claim 9 , anti-redeposition agents claim 9 , optical brighteners claim 9 , dyes claim 9 , oderants claim 9 , enzymes claim 9 , corrosion inhibitors claim 9 , dispersants claim 9 , emulsifiers claim 9 , and mixtures thereof.13. The composition of claim 9 , wherein the composition is essentially free of phosphorous.14. The composition of claim 9 , wherein the composition is free of phosphorous. This application is a divisional of U.S. ...

Semiconductor Device Cleaning Solution, Method of Use, and Method of Manufacture

A semiconductor cleaning solution for cleaning a surface of a semiconductor device, and a method of use and a method of manufacture of the cleaning solution are disclosed. In an embodiment, a material is polished away from a first surface of the semiconductor device and the first surface is cleaned with the cleaning solution. The cleaning solution may include a host having at least one ring. The host may have a hydrophilic exterior and a hydrophobic interior. 1. A method of manufacturing a semiconductor device , the method comprising:performing a chemical mechanical polishing (CMP) process to form a first planar surface, the first planar surface comprising a conductive contact, an interlayer dielectric layer surrounding the conductive contact, a capping layer, and gate spacers on sidewalls of the capping layer, wherein an inhibitor is bonded to a conductive material of the conductive contact disposed at the first planar surface after performing the CMP process;reacting a chelator molecule with the conductive material to remove the inhibitor from the first planar surface; andencapsulating the inhibitor with an encapsulant, the encapsulant comprising a cucurbituril.2. The method of claim 1 , wherein the inhibitor comprises a phosphoric ester.3. The method of claim 1 , wherein the conductive material comprises cobalt.4. The method of claim 1 , wherein reacting the chelator molecule with the conductive material removes a one-atom thick layer of conductive material atoms from a bulk conductive material at the first planar surface.5. The method of claim 1 , wherein the inhibitor comprises a hydrophobic molecule.6. The method of claim 1 , further comprising bonding a second inhibitor to the inhibitor.7. The method of claim 6 , wherein the second inhibitor comprises pyridine.8. A method of manufacturing a semiconductor device claim 6 , the method comprising:bonding an inhibitor to a conductive material disposed on a surface of the semiconductor device;reacting a chelator ...

USE OF SUGARS IN A STABILIZATION MATRIX AND SOLID COMPOSITIONS

The use of sugars in a stabilization matrix and solid detergent compositions is disclosed along with methods of making and using the solid detergent compositions. 2. The solidification matrix of claim 1 , comprising from about 0.1 to about 20 wt. % of the sugar.3. The solidification matrix of claim 1 , comprising from about 50 to about 95 wt. % of the carbonate.4. The solidification matrix of claim 1 , comprising from about 5 to about 50 wt. % the water.5. The solidification matrix of claim 1 , wherein the sugar is sucrose.6. The solidification matrix of claim 1 , wherein the carbonate is selected from the group consisting of sodium carbonate claim 1 , potassium carbonate claim 1 , sodium bicarbonate claim 1 , sodium sesquicarbonate claim 1 , and mixtures thereof.7. The solidification matrix of claim 1 , wherein the matrix is substantially free of phosphorous.8. The solidification matrix of claim 1 , wherein the matrix is free of phosphorous.10. The composition of claim 9 , wherein the sugar is sucrose.11. The composition of claim 9 , wherein the carbonate is selected from the group consisting of sodium carbonate claim 9 , potassium carbonate claim 9 , sodium bicarbonate claim 9 , sodium sesquicarbonate claim 9 , and mixtures thereof.12. The composition of claim 9 , the composition further comprising a functional ingredient selected from the group consisting of chelating agents claim 9 , sequestering agents claim 9 , alkaline sources claim 9 , rinse aids claim 9 , bleaching agents claim 9 , antimicrobial agents claim 9 , defoaming agents claim 9 , anti-redeposition agents claim 9 , optical brighteners claim 9 , dyes claim 9 , odorants claim 9 , enzymes claim 9 , corrosion inhibitors claim 9 , dispersants claim 9 , emulsifiers claim 9 , and mixtures thereof.13. The composition of claim 9 , wherein the composition is essentially free of phosphorous.14. The composition of claim 9 , wherein the composition is free of phosphorous. This application is a continuation of U. ...

GLUCAN FIBER COMPOSITIONS FOR USE IN LAUNDRY CARE AND FABRIC CARE

An enzymatically produced α-glucan oligomer/polymer compositions is provided. The enzymatically produced α-glucan oligomer/polymers can be derivatized into α-glucan ether compounds. The α-glucan oligomers/polymers and the corresponding α-glucan ethers are cellulose and/or protease resistant, making them suitable for use in fabric care and laundry care applications. Methods for the production and use of the present compositions are also provided. 126-. (canceled)27. A composition comprising an alpha-glucan ether , wherein the glycosidic linkages of the alpha-glucan ether comprise:(i) 10-25% alpha-1,3 glycosidic linkages,(ii) 65-87% alpha-1,6 glycosidic linkages, and(iii) less than 5% alpha-1,3,6 glycosidic linkages,wherein the percent glycosidic linkages of the alpha-glucan are determined by methylation analysis;and wherein the alpha-glucan ether has a degree of substitution (DoS) with at least one organic group that is no higher than 3.0.28. The composition of claim 27 , wherein said DoS is about 0.05 to about 3.0.29. The composition of claim 27 , wherein the organic group is carboxy alkyl claim 27 , hydroxy alkyl claim 27 , or alkyl.30. The composition of claim 27 , wherein the organic group is carboxymethyl.31. The composition of claim 27 , wherein the organic group is hydroxypropyl claim 27 , dihydroxypropyl claim 27 , hydroxyethyl claim 27 , methyl claim 27 , or ethyl.32. The composition of claim 27 , wherein the organic group is an uncharged organic group.33. The composition of claim 27 , wherein the organic group is an anionic organic group.34. The composition of claim 27 , wherein the organic group is a positively charged organic group.35. The composition of claim 34 , wherein the positively charged organic group is a quaternary ammonium group.36. The composition of claim 34 , wherein the positively charged organic group is a substituted ammonium group.37. The composition of claim 36 , wherein the substituted ammonium group is trialkylammonium.38. The ...

GLUCAN FIBER COMPOSITIONS FOR USE IN LAUNDRY CARE AND FABRIC CARE

An enzymatically produced α-glucan oligomer/polymer compositions is provided. The enzymatically produced α-glucan oligomer/polymers can be derivatized into α-glucan ether compounds. The α-glucan oligomers/polymers and the corresponding α-glucan ethers are cellulose and/or protease resistant, making them suitable for use in fabric care and laundry care applications. Methods for the production and use of the present compositions are also provided. 126-. (canceled)27. A composition comprising an alpha-glucan ether , wherein the glycosidic linkages of the alpha-glucan ether consist of:(i) 25-35% alpha-1,3 glycosidic linkages,(ii) 55-75% alpha-1,6 glycosidic linkages, and(iii) 5-15% alpha-1,3,6 glycosidic linkages,wherein the percent glycosidic linkages of the alpha-glucan are determined by methylation analysis;and wherein the alpha-glucan ether has a degree of substitution (DoS) with at least one organic group that is no higher than 3.0.28. The composition of claim 27 , wherein said DoS is about 0.05 to about 3.0.29. The composition of claim 27 , wherein the organic group is carboxy alkyl claim 27 , hydroxy alkyl claim 27 , or alkyl.30. The composition of claim 27 , wherein the organic group is carboxymethyl.31. The composition of claim 27 , wherein the organic group is hydroxypropyl claim 27 , dihydroxypropyl claim 27 , hydroxyethyl claim 27 , methyl claim 27 , or ethyl.32. The composition of claim 27 , wherein the organic group is an uncharged organic group.33. The composition of claim 27 , wherein the organic group is an anionic organic group.34. The composition of claim 27 , wherein the organic group is a positively charged organic group.35. The composition of claim 34 , wherein the positively charged organic group is a quaternary ammonium group.36. The composition of claim 34 , wherein the positively charged organic group is a substituted ammonium group.37. The composition of claim 36 , wherein the substituted ammonium group is trialkylammonium.38. The composition ...

CLEANING LIQUID, METHOD OF CLEANING, AND METHOD OF MANUFACTURING SEMICONDUCTOR WAFER

The present invention relates to a cleaning liquid on a silicon oxide film and/or a silicon nitride film, and the cleaning liquid contains (i) at least one compound selected from the group consisting of a compound represented by the formula (1), a compound represented by formula (2), a compound represented by formula (3), and a compound represented by the formula (4); and (ii) a reducing agent; 2. The cleaning liquid according to claim 1 , wherein the (i) at least one compound comprises at least one selected from the group consisting of etidronic acid claim 1 , alendronic acid claim 1 , metaphosphoric acid claim 1 , pyrophosphoric acid and polyphosphoric acid.3. The cleaning liquid according to claim 1 , wherein the (i) at least one compound comprises etidronic acid.4. The cleaning liquid according to claim 1 , wherein the (ii) reducing agent comprises at least one selected from the group consisting of ascorbic acid claim 1 , gallic acid claim 1 , phosphinic acid claim 1 , glucose claim 1 , oxalic acid claim 1 , pyrogallol claim 1 , pyrocatechol and glyoxal.5. The cleaning liquid according to claim 1 , wherein the (ii) reducing agent comprises at least one selected from the group consisting of phosphinic acid claim 1 , glucose and pyrogallol.6. The cleaning liquid according to claim 1 , further comprising a water-soluble organic polymer.7. The cleaning solution according to claim 6 , wherein the water-soluble organic polymer comprises at least one of a polycarboxylic acid or a salt thereof.8. The cleaning liquid according to claim 1 , further comprising a pH regulator.9. The cleaning liquid according to claim 8 , wherein the pH regulator comprises at least one of ammonia or a quaternary ammonium salt.10. The cleaning liquid according claim 1 , wherein pH of the cleaning liquid is within a range from 1 to 7.11. The cleaning liquid according to claim 1 , wherein a weight ratio of the (i) at least one compound to the (ii) reducing agent is in a range from 1 to 100.12. ...

POLISHING METHOD

A polishing method for polishing by sliding a semiconductor silicon wafer, held by a polishing head, against a polishing pad attached to a turn table while supplying a polishing agent, wherein the semiconductor silicon wafer is subjected to primary polishing, secondary polishing, and final polishing in turn, the secondary polishing comprises polishing by an alkaline based polishing agent which includes free abrasive grains and does not include a water-soluble polymer agent, and subsequent rinse polishing by a polishing agent which includes a water-soluble polymer agent and the rinse polishing includes two stages of polishing, wherein, after performing a first stage of the rinse polishing while supplying a polishing agent which includes a water-soluble polymer agent, a second stage of the rinse polishing is performed while supplying a switched polishing agent whose water-soluble polymer agent has an average molecular weight larger than the polishing agent of the first stage. 16-. (canceled)7. A polishing method for polishing a semiconductor silicon wafer by sliding the semiconductor silicon wafer , held by a polishing head , against a polishing pad attached to a turn table while supplying a polishing agent , whereinwhen the semiconductor silicon wafer is subjected to primary polishing, secondary polishing, and final polishing in turn,the secondary polishing comprises polishing by an alkaline based polishing agent which includes free abrasive grains and does not include a water-soluble polymer agent, and subsequent rinse polishing by a polishing agent which includes a water-soluble polymer agent andthe rinse polishing comprises two stages of polishing, wherein, after performing a first stage of the rinse polishing while supplying a polishing agent which includes a water-soluble polymer agent, a second stage of the rinse polishing is performed while supplying a switched polishing agent whose water-soluble polymer agent has an average molecular weight larger than the ...

Stable bleaching composition

This invention relates to a bleaching composition comprising hypochlorite-based bleach particles and moisture-sensitive particles encapsulating an oil within starch or starch-derivative matrix, the composition being surprisingly stable toward degradation of the starch upon storage.

Semiconductor Device Cleaning Solution, Method of Use, and Method of Manufacture

A semiconductor cleaning solution for cleaning a surface of a semiconductor device, and a method of use and a method of manufacture of the cleaning solution are disclosed. In an embodiment, a material is polished away from a first surface of the semiconductor device and the first surface is cleaned with the cleaning solution. The cleaning solution may include a host having at least one ring. The host may have a hydrophilic exterior and a hydrophobic interior. 1. A method for cleaning a semiconductor device , the method comprising:polishing a material away from a first surface of a semiconductor device; andcleaning the first surface with a cleaning solution, the cleaning solution comprising a host having at least one ring, the host having a hydrophilic exterior, and the host having a hydrophobic interior.2. The method of claim 1 , wherein cleaning the first surface further comprises scrubbing the first surface with a scrubber selected from the group consisting of a brush claim 1 , a sponge claim 1 , and a pencil brush.3. The method of claim 2 , wherein cleaning the first surface further comprises rotating the semiconductor device.4. The method of claim 3 , further comprising rinsing the first surface with deionized water.5. The method of claim 4 , further comprising drying the first surface with isopropyl alcohol.6. The method of claim 5 , wherein the host forms a host-guest complex with a CMP inhibitor disposed on the first surface of the semiconductor device.7. The method of claim 6 , wherein the host comprises cyclodextrin.8. A method of manufacturing a semiconductor device claim 6 , the method comprising:bonding an inhibitor to a conductive material atom disposed on the surface of the semiconductor device;reacting a chelator molecule with the conductive material atom to remove the inhibitor from the surface of the semiconductor device; andencapsulating the inhibitor with an encapsulant.9. The method of claim 8 , wherein the encapsulant prevents the inhibitor from ...

Gypsum Remover

Contemplated compositions and methods for treating in service concrete includes the step of contacting a portion of the in service concrete with an composition, wherein the composition comprises a base and at least one of an acid and a salt of an acid in an amount effective to convert insoluble calcium salts into soluble calcium gluconates that can be washed away with water or other liquid. 1. A method of treating a sulfuric acid affected in-service concrete , comprising:contacting a surface of the sulfuric acid affected in-service concrete with an composition;wherein the composition comprises a base and at least one of gluconic acid and a salt of gluconic acid; andwherein the step of contacting is performed for a time sufficient to (a) convert insoluble calcium salts into soluble calcium gluconate to a depth of at least 3 mm, and (b) neutralize residual acidity in the concrete to a depth of at least 3 mm.2. The method of wherein the at least one of gluconic acid and the salt of gluconic acid and the base are present in a ratio of at least 5:1.3. The method of wherein the at least one of gluconic acid and the salt of gluconic acid and the base are present in a ratio of at least 7:1.4. The method of wherein the at least one of gluconic acid and the salt of gluconic acid and the base are present in a ratio of at least 10:1.5. The method of wherein the at least one of gluconic acid and the salt of gluconic acid and the base are present in a total amount of at least 30 wt %.6. The method of wherein the at least one of gluconic acid and the salt of gluconic acid and the base are present in a total amount of at least 40 wt %.7. The method of further comprising a step of rinsing the surface to thereby remove the soluble calcium gluconate.8. The method of or further comprising a step of coating the surface with a protecting composition or a primer.9. A composition for treating a sulfuric acid affected in-service concrete claim 1 , comprising:an aqueous formulation ...

Cleaning Composition

This invention relates to cleaning compositions with controlled dissolution and improved chelation system. The cleaning composition is generally comprised of a majority by weight of a percarbonate compound, a chelation system, and a binder system. The invention also relates to non-oxidizing solid cleaning compositions containing peroxide moieties. These compositions are ideal for use in cleaning appliances, such as automatic washing machines and dishwashers. 1. A method for cleaning an automatic washing machine comprising the sequential steps of:(a) providing an automatic washing machine having a wash tub; i. a majority by weight of a percarbonate-based compound;', 'ii. a chelation system, wherein the chelation system is comprised of at least one carboxylic acid compound; and', 'iii. a binding system, wherein the binding system is comprised of at least one polyol and a second binder component;, '(b) adding a sufficient amount of a cleaning composition to the wash tub, wherein the cleaning composition comprises(c) adding a sufficient amount of water to the wash tub to allow the cleaning composition to dissolve and form a mixture of water and cleaning composition;(d) agitating the mixture of step “c”;(e) removing the mixture of step “c” from the wash tub; and(f) rinsing the wash tub.2. The method of claim 1 , wherein the composition is in a compacted or pressed form and is not a solid oxidizer.3. The method of claim 1 , wherein the percarbonate-based compound is present in the range from 50% to 70% by weight of the total cleaning composition.4. The method of claim 1 , wherein the percarbonate-based compound is sodium percarbonate.5. The method of claim 1 , wherein the second binder component is selected from the group consisting of polyols claim 1 , sugars claim 1 , cyclodextrins claim 1 , starches claim 1 , natural gums claim 1 , cellulose gums claim 1 , microcrystalline cellulose claim 1 , methylcellulose claim 1 , cellulose ethers claim 1 , sodium ...

Metal-Safe Solid Form Aqueous-Based Compositions and Methods To Remove Polymeric Materials in Electronics Manufacturing

Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates, are provided. A method is presented which uses a minimum amount of solid form concentrate that is diluted into water, introduced into a manufacturing tool and heated, applied to said substrate for a sufficient time to allow penetration and removal of an organic substance, and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive variety most commonly used in the manufacture of a flat panel display (FPD) and other electronic substrates.

TOILET DEODORANT COMPOSITION AND METHOD

A chemical composition includes citric acid, sodium bicarbonate, starch, at least one oil, and a liquid composition such as water combined to form a solid tablet. The composition may react with water to produce a film over a body of water, such that the film is used to cover the surface of the contents of a latrine and prevent gasses and odors from escaping the latrine. 1. A chemical composition configured to deodorize a space , the chemical composition comprising:citric acid;sodium bicarbonate;a starch;at least one oil; anda liquid composition;wherein the chemical composition reacts with water to produce a cohesive film over a body of water configured to prevent gases from escaping the body of water.2. The chemical composition of claim 1 , wherein the liquid composition includes at least one of dihydrogen oxide and propylene glycol.3. The chemical composition of claim 1 , wherein the at least one oil includes olive oil.4. The chemical composition of claim 1 , wherein the at least one oil includes an aroma oil.5. The chemical composition of claim 1 , wherein the at least one oil includes at least one essential oil.6. The chemical composition of claim 1 , wherein the starch is a corn-derived starch.7. The chemical composition of claim 1 , wherein the starch is a wheat-derived starch.8. The chemical composition of claim 1 , wherein the starch is a rice-derived starch.9. The chemical composition of claim 1 , wherein the starch is a tapioca-derived starch.10. The chemical composition of claim 1 , wherein the chemical composition further includes a fragrance agent configured to mask odors.11. The chemical composition of claim 1 , wherein the chemical composition comprises a solid aggregate having the shape of a substantially cylindrical tablet having a cylinder-length and a cylinder-diameter.12. The chemical composition of claim 11 , wherein the chemical composition further includes a color additive configured to alter the hue of the solid aggregate.13. The chemical ...

Solubilized magnolol analogs

A composition comprising a solubilized magnolol analog comprising at least one magnolol analog chosen from propyl magnolol, isopropyl magnolol, butyl magnolol, and isobutyl magnolol, and dimethyl isosorbide. These solubilized analogs are useful in personal care, oral care, and home care compositions to provide anti-bacterial activity and reducing the expression of pro-inflammatory mediators.

USE OF A STARCH BASE COPOLYMER IN CONJUNCTION WITH A MALEIC POLYMER AND A HYDROXYPOLYCARBOXYLIC ACID TO CONTROL HARDNESS UNDER ALKALINE CONDITIONS

The present invention includes methods and compositions control hard water in an alkaline environment. According to the invention, a unique combination of polymers has been developed which helps to completely control and eliminate hard water. The composition includes a maleic polymer, a hydroxypolycarboxylic acid, and a starch based polymer in a unique synergistic combination that can be used alone, or in combination with standard alkaline detergents in any cleaning regime (laundry, warewash, etc.) where hard water conditions exist. 1. A hardness control composition for use in alkaline cleaning conditions comprising: a starch based hybrid polymer , a maleic polymer and a hydroxycarboxylic acid salt.2. The hardness control composition of wherein said starch based polymer is present in an amount of 0.005 wt. % to about 41.5 wt. % of the composition.3. The hardness control composition of wherein said maleic polymer is present in an amount of from about 20 wt. % to about 40 wt. %.4. The hardness control composition of wherein said hydroxylcarboxylic acid salt is present in an amount of from about 25 wt. % to about 50 wt. %.5. The scale control composition of wherein said starch polymer is a hybrid copolymer of 30-80% starch claim 1 , 5-6-% AMPS claim 1 , and 0.1 to 5% acrylic acid monomer.6. The scale control composition of wherein the hydroxycarboxylic acid salt is sodium citrate.7. The hardness control composition of wherein said starch based polymer is present in an amount of about 45 ppm claim 1 , with at least about 40 ppm maleic polymer and greater than 100 ppm active hydroxylcarboxylic acid.8. The hardness control composition of further comprising a chelant.9. The hardness control composition of comprising:a starch based polymer is present in an amount of 0.005 wt. % to about 41.5 wt. %;a maleic polymer is present in an amount of from about 20 wt. % to about 40 wt. %; anda hydroxylcarboxylic acid salt is present in an amount of from about 25 wt. % to about 50 wt. ...

METHOD OF CLEANING MICROFILTRATION AND ULTRAFILTRATION MEMBRANES

A system for and method of cleaning polymeric and ceramic microfiltration and ultrafiltration membranes in hollow fiber, flat sheet, and tubular membrane units is provided. The method includes using a reducing agent, specifically ascorbic acid, based formulation. The method also includes certain protocols useful in conducting such cleanings. The system includes features for facilitating the method of the present invention. 1. A method of cleaning a membrane contaminated with a contaminant , the method comprising:bringing a solution into direct contact with the contaminant,wherein the solution comprises a solvent that is compatible with the membrane, andwherein the solution comprises a reducing agent that is soluble in the solvent.2. The method of claim 1 , wherein the reducing agent is ascorbic acid.3. The method of claim 2 , wherein ascorbic acid is present in the solution in an amount of approximately 2.0 percentage weight to volume.4. The method of claim 2 , wherein ascorbic acid is present in the solution in an amount of between 0.5 and 5.0 percentage weight to volume.5. The method of claim 4 , wherein the solution pH is between 1.5 and 3.5.6. The method of claim 4 , wherein the solution further comprises an inorganic acid.7. The method of claim 4 , wherein the solution further comprises 0.5 to 2.0 percentage weight to volume of one of sodium bisulfite claim 4 , sodium metabisulfite claim 4 , and sodium hydrosulfite.8. The method of claim 1 , wherein the solution is at ambient temperature.9. The method of claim 8 , wherein the ambient temperature is between one degree Celsius and forty degrees Celsius.10. The method of claim 1 , further comprising heating the solution to an elevated temperature prior to bringing the solution into direct contact with the contaminant.11. The method of claim 10 , wherein the elevated temperature is between fifteen degrees Celsius and ninety-five degrees Celsius.12. The method of claim 10 , wherein the elevated temperature is ...

NATURAL EDIBLE CLEANING COMPOSITION

A cleaning solution, composition, and portable cleaner are provided that is all natural, safe, non-toxic, edible, anti-bacterial, anti-viral, anti-microbial, deodorizing, and further includes a pleasant fragrance and taste. In addition, the cleaning composition can be free from sugar, alcohol, surfactants, and other harmful or harsh ingredients. In addition, the cleaning composition allows for quick cleaning of any type of object that may be placed in the mouth, such as pacifiers, toys, candy, eating utensils, musical instruments, and mouth-pieces, among others.

ENHANCED CATALYST STABILITY FOR ALKALINE DETERGENT FORMULATIONS

Stabilized catalyst detergent compositions are provided in solid alkaline detergent formulations are disclosed. The compositions are suitable for use with additional detergent and/or bleaching compositions while providing stabilized catalysts within an encapsulated cellulose derivative coating. Methods of use for cleaning are disclosed. 2. The detergent composition according to claim 1 , wherein the cellulose derivative is hydroxypropyl methylcellulose (HPMC).3. The detergent composition according to claim 1 , wherein the cellulose derivative is selected from the group consisting of carboxymethylcellulose (CMC) claim 1 , hydroxyethylcellulose (HEC) claim 1 , hydroxypropylcellulose (HPC) claim 1 , methylcellulose (MC) claim 1 , and cellulose triacetate.5. The detergent composition according to claim 1 , wherein the alkalinity source is selected from the group consisting of alkali metal carbonates claim 1 , alkali metal silicates claim 1 , alkali metal metasilicates claim 1 , alkali metal bicarbonates claim 1 , alkali metal sesquicarbonates claim 1 , alkali metal hydroxides claim 1 , and combinations thereof.6. The detergent composition according to claim 5 , wherein the alkalinity source is an alkali metal carbonate.7. The detergent composition according to claim 6 , wherein the composition has a use pH of at least about 8.5.8. The detergent composition according to claim 1 , wherein the stabilized catalyst comprises an inner portion consisting of the catalyst and at least one outer portion comprising the cellulose derivative.9. The detergent composition according to claim 8 , wherein the inner portion consists of between 0.5 wt-% and 10 wt-% of the catalyst.10. The detergent composition according to claim 8 , wherein the outer portion comprises a plurality of layers of the cellulose derivative encapsulate.11. The detergent composition according to claim 1 , comprising from about 25-90 wt-% of the alkalinity source claim 1 , from about 0.5-10 wt-% of the stabilized ...

Stainless Steel, Glass, Wood and Stone Polish and Protectant

A Low-VOC, water-based hard surface polish and protectant containing water, isoparaffinic hydrocarbon, white oil, D-Limonene Trisopropanolomine, and Span 80. The VOC content of this composition is less than or equal to 3.00%. Optionally, a proprietary repellancy treatment component can be added to this composition to increase the composition's hydrophobic and oleophobic capabilities after application to surfaces. 3. A water-based composition for polishing and protecting steel claim 1 , chrome and wood as in where the deionized water is replaced with a range of 49.25 to 51.25% deionized water plus a range of 0.50 to 2.00% Proprietary Repellancy Treatment (PRT) claim 1 , the PRT selected from Fiber Shield Krystal-Kleer™ claim 1 , Krystal-Kleer+™ claim 1 , Terracryl™ claim 1 , or Watercryl™.4. A water-based composition for polishing and protecting glass claim 2 , plastic and stone claim 2 , as in where the amount of de-ionized water is replaced with a range of 49.25 to 51.25% de-ionized water plus a range of 0.50 to 2.00% PRT claim 2 , the PRT selected from Fiber Shield Krystal-Kleer™ claim 2 , Krystal-Kleer+™ claim 2 , Terracryl™ claim 2 , or Watercryl™. Compositions to polish hard surfaces such as glass, metal, stone, and tile to restore them as closely as possible to a clean condition.Surfaces, such as those of stone, and certain metal and metal composites, and other hard surfaces such as tile can be polished with liquid compounds. In response to this requirement, a wide range of cleaning compositions already exists in the market.Generally speaking, commercial compositions are limited both in the range of their effectiveness, and also as to how efficient they really are for their intended purpose. On the consumer market today, for example, there is no known composition which will polish and protect stainless steel and granite. The present invention will polish and protect the following categories of surfaces:Stainless Steel/Metal Substrates—includes brass, copper, ...

Surface treatment composition, surface treatment method using the same, and method for manufacturing semiconductor substrate

Post chemical mechanical polishing (post CMP) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or polycarboxylic acid

DETERGENT COMPOSITION

Polishing composition and rinse composition

A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide.

自化學機械平坦化基板移除殘留物之組合物及方法

本文闡述CMP後清洗溶液，及可用於自CMP基板移除殘留物或防止殘留物在CMP基板表面上形成之方法。

Semiconductor device cleaning solution, method of use, and method of manufacture

A semiconductor cleaning solution for cleaning a surface of a semiconductor device, and a method of use and a method of manufacture of the cleaning solution are disclosed. In an embodiment, a material is polished away from a first surface of the semiconductor device and the first surface is cleaned with the cleaning solution. The cleaning solution may include a host having at least one ring. The host may have a hydrophilic exterior and a hydrophobic interior.

研磨用組成物及びそれを用いたシリコンウエハの研磨方法、並びにリンス用組成物及びそれを用いたシリコンウエハのリンス方法

Cleaning composition following cmp and methods related thereto

본 발명은 화학-기계적 연마 후 반도체 웨이퍼로부터 오염물을 세정하기 위한 조성물을 제공한다. 상기 세정 조성물은 거대 보호 리간드, 유기 아민, 유기 억제제, 및 물을 함유한다. 본 발명은 또한 상기 세정 조성물의 사용 방법을 제공한다. The present invention provides a composition for cleaning contaminants from semiconductor wafers after chemical-mechanical polishing. The cleaning composition contains a large protective ligand, an organic amine, an organic inhibitor, and water. The present invention also provides a method of using the cleaning composition.

Composition and method for removing residue from chemical-mechanical planarization substrate

Described is a post- CMP cleaning solution and methods useful to remove residue from a CMP substrate or to prevent formation of residue on a surface of a CMP substrate.

Surface treatment composition, surface treatment method using the same, and method for manufacturing a semiconductor substrate

적어도 텅스텐을 포함하는 층, 그리고 오르토 규산 테트라에틸 또는 질화 규소를 갖는 연마 완료 연마 대상물의 표면에 잔류하는 불순물을 충분히 제거시키면서, 텅스텐의 용해 속도를 억제하는 수단을 제공한다. 술폰산(염)기를 갖는 고분자 화합물과, 아미노산 및 폴리올로부터 선택되는 적어도 1종의 화합물과, 분산매를 함유하고, 적어도 텅스텐을 포함하는 층, 그리고 오르토 규산 테트라에틸 또는 질화 규소를 갖는 연마 완료 연마 대상물의 표면을 처리하기 위해서 사용되는 표면 처리 조성물. A layer containing at least tungsten and a means for suppressing the dissolution rate of tungsten while sufficiently removing impurities remaining on the surface of a polished object having tetraethyl orthosilicate or silicon nitride is provided. A high molecular compound having a sulfonic acid (salt) group, at least one compound selected from amino acids and polyols, a dispersion medium, a layer containing at least tungsten, and tetraethyl orthosilicate or silicon nitride. A surface treatment composition used to treat a surface.

包含特定含硫化合物及糖醇或多元羧酸之化學機械拋光後之清洗組合物

本發明係關於一種化學機械拋光後(CMP後)清洗組合物，其包含：(A)至少一種化合物，其包含至少一個硫醇基(-SH)、硫醚基(-SR1)或硫羰基(>C=S)，其中R1係烷基、芳基、烷芳基或芳烷基；(B)至少一種糖醇，其包含至少3個羥基(-OH)且不包含任何羧酸基(-COOH)或羧酸酯(-COO-)基；及(C)水性介質。

Polishing composition and rinse composition

A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide.

Polishing composition and rinse composition

A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide.

Polishing composition and rinse composition

A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide.

Polishing composition and rinse composition

A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide.

Polishing composition and rinse composition

A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide.

Post chemical-mechanical-polishing (post-CMP) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid

A post chemical-mechanical-polishing (post-CMP) cleaning composition comprising: (A) at least one compound comprising at least one thiol (—SH), thioether (—SR 1 ) or thiocarbonyl (>C═S) group, wherein R 1 is alkyl, aryl, alkylaryl or arylalkyl, (B) at least one sugar alcohol which contains at least three hydroxyl (—OH) groups and does not comprise any carboxylic acid (—COOH) or carboxylate (—COO—) groups, and (C) an aqueous medium.

A post chemical-mechanical-polishing (post-cmp) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid

A post chemical-mechanical-polishing (post-CMP) cleaning composition comprising: (A) is cysteine, glutathione, N-acetylcysteine, thiourea, (L) at least one oligomeric or polymeric polycarboxylic acid, and (C) water, wherein the post-CMP cleaning composition has a pH-value in the range of from 4 to not more than 7. The use of the composition for removing residues and contaminants from the surface of semiconductor substrates useful for manufacturing microelectronic devices. A process for manufacturing microelectronic devices from semiconductor substrates comprising the step of removing residues and contaminants from the surface of the semiconductor substrates by contacting them at least once with the post-CMP cleaning composition.

Composition for TiN hard mask removal and etch residue cleaning

Composition, method and system for TiN hard mask removal from electronic circuitry devices, such as advanced pattern wafers have been disclosed. The cleaning compositions preferably comprise an etchant agent (also referred to as a base), an oxidizing agent, an oxidizing stabilizer (also referred to as a chelating agent), an ammonium salt, a corrosion inhibitor, and a solvent. Other optional additives could be provided. It is preferable that the pH of the cleaning composition be greater than 5.5. The cleaning composition is preferably free from dimethyl sulfoxide and tetramethylammonium hydroxide.

Post-CMP cleaning composition and related methods

Detergent composition

배선 재료에 대한 부식이 적고, 또한 미소 입자나 금속 불순물이 부착된 반도체용 기판 또는 반도체 소자의 세정성이 우수한 세정제 조성물을 제공하는 것이다. 환원제를 함유하여 이루어지며, 산화 환원 전위 (25 ℃) 가 +0.2 V 이하이고, pH (25 ℃) 가 3∼12 인 세정제 조성물, 및 상기 세정제 조성물을 사용하는 반도체용 기판 또는 반도체 소자의 세정 방법. The present invention provides a cleaning composition that is less corrosive to wiring materials and has excellent cleaning properties of semiconductor substrates or semiconductor devices with microparticles and metal impurities. A cleaning composition comprising a reducing agent, having a redox potential (25 ° C.) of +0.2 V or less, and a pH (25 ° C.) of 3 to 12, and a method for cleaning a semiconductor substrate or semiconductor element using the cleaning composition. . 산화 환원 전위, 반도체용 기판, 반도체 소자 Redox potential, semiconductor substrates, semiconductor devices

Cleaning composition following cmp and methods related thereto

表面处理组合物、以及使用其的表面处理方法和半导体基板的制造方法

[课题]提供的方案在于，边使残留于至少含有包含钨的层、以及原硅酸四乙酯或氮化硅的研磨完成后的研磨对象物的表面的杂质充分去除，边抑制钨的溶解速度。[解决方案]一种表面处理组合物，其含有：具有磺酸(盐)基的高分子化合物；选自氨基酸和多元醇中的至少1种化合物；和，分散介质，所述组合物用于对研磨完成后的研磨对象物的表面进行处理，所述研磨完成后的研磨对象物至少含有包含钨的层、以及原硅酸四乙酯或氮化硅。

A cleaning compsite of the metal etcher and the method thereof

본 발명은 금속 건식 에쳐의 부품 세정제에 관한 것으로, HF, NH 4 OH, CH 3 COOH, (NH 3 OH) 2 SO 4 , 자일리톨, 및 H 2 O를 포함하는 것을 특징으로 하는 금속 건식 에쳐 부품의 세정제 및 이를 사용하는 금속 건식 에쳐 부품의 세정 방법을 제공함으로써 세정시 작업자에 대한 안정성 확보 및 작업 효율성을 극대화시키고, ESC 쳐크(chuck)의 웨이퍼에 대한 어택을 최소화시키고, 세정제의 수급을 안정시킬 수 있으며 화학 물질이 웨이퍼 상에 잔류하는 것을 방지할 수 있다. BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a component cleaner for metal dry archer, comprising: HF, NH 4 OH, CH 3 COOH, (NH 3 OH) 2 SO 4 , xylitol, and H 2 O. By providing a cleaning agent and a method of cleaning metal dry-etcher parts using the same, it is possible to secure worker stability and maximize work efficiency during cleaning, minimize attack of wafers of the ESC chuck, and stabilize supply and demand of the cleaning agent. And prevent chemicals from remaining on the wafer.

Eco-friendly detergent manufacturing method

본 발명은 생활수준의 향상을 위하여 사용되는 각종 세제로 인하여 하천등이 오염되는 것을 방지하면서도 원활한 세척력을 확보할 수 있는 친환경 세제 제조방법에 관한 것이다. The present invention relates to an environmentally friendly detergent manufacturing method that can ensure a smooth washing power while preventing the contamination of rivers due to various detergents used to improve the standard of living. 본 발명을 이루기 위한 방법은, 요구르트, 드라이이스트, 설탕, 낫토를 혼합한 후 35~40℃를 이루는 온수에 첨가하는 재료혼합단계; 상기 재료혼합단계를 통하여 형성된 원재료를 35~40℃를 이루는 저장온도로 7~10일간 보관하며 발효시키는 재료배양단계; 상기 재료배양단계를 통하여 발효된 원재료에 냉수를 첨가하여 혼합하는 냉수첨가단계;를 포함하여 이루어진다. Method for achieving the present invention, the material mixing step of adding to yogurt, dry yeast, sugar, natto after mixing 35 ~ 40 ℃ hot water; A material culture step of fermenting the raw materials formed through the material mixing step for 7 to 10 days at a storage temperature of 35 to 40 ° C .; It comprises a cold water addition step of mixing by adding cold water to the fermented raw material through the material culture step. 위와 같은 본 발명은 첫째, 세정력을 얻기 위하여 주방의 세척하고자 하는 장소에 분무하여 사용하는 경우에 유기산에 의한 중화반응 및 효소분해작용을 통하여 각종 악취의 원인이 되는 부패단백질등을 분해함으로써 악취등 제거하고, 배관의 막힘현상등을 해소할 수 있다. The present invention as described above, first, to remove the odor by decomposing the decay protein, such as various sources of odor through the neutralization reaction and the enzymatic decomposition of the organic acid when sprayed to the place to be washed in the kitchen to obtain cleaning power This can eliminate the blockage of pipes. 둘째, 음식물쓰레기에서 발생될 수 있는 악취를 제거하기 위해 사용하는 경우에도 유기산에 의한 중화반응 및 효소분해작용을 통하여 음식물쓰레기의 미생물 번식을 촉진하여 음식물쓰레기의 악취를 최소화할 수 있다. Second, even when used to remove the odor that can be generated from food waste can be minimized by promoting the microbial propagation of food waste through the neutralization reaction and enzymatic decomposition by organic acids. 셋째, 화장실과 같이 소변을 자주 보는 곳에서 소변에 함유된 요소, 요산, 암모니아이온, 나트륨이온, 칼륨이온, 칼슘이온, 염소이온등에 의해 발생되는 뇨취는 물론이고, 각종 세균을 원활하게 제거할 수 있다. Third, the urine odor generated by urea, uric acid, ammonia ion, ...

Composition and application of a two-phase contaminant removal medium

본 실시형태들은 기판 수율을 개선하기 위해 기판 표면으로부터 오염물질을 제거하는 기판 세정 기술을 제공한다. 이 기판 세정 기술은, 유체인 세정 재료를 형성하기 위해 세정액에 분산된 고분자량을 가진 중합체와 고형 성분들을 갖는 세정 재료를 이용한다. 고형 성분들은 오염물질들과 접촉함으로써 기판 표면 상의 오염물질들을 제거한다. 고분자량의 중합체는 세정 재료의 고형들을 포획하여 인트랩하는 중합체 사슬 및 중합체 그물을 형성하며, 이는 고형이 기판 표면에 떨어지는 것을 방지한다. 이외에도, 중합체는 또한 기판 표면 상의 오염물질들과 접촉함으로써 기판 표면에서 오염물질을 제거하는 것을 도울 수 있다. 일 실시형태에서, 세정 재료는 돌출된 피쳐들에 강력한 충격을 주어 돌출된 피쳐를 손상시키는 것 없이 기판 표면 상의 돌출된 피쳐들 주위로 매끄럽게 옮겨간다. These embodiments provide a substrate cleaning technique for removing contaminants from a substrate surface to improve substrate yield. This substrate cleaning technique uses a polymer having a high molecular weight dispersed in a cleaning liquid and a cleaning material having solid components to form a cleaning material which is a fluid. The solid components remove contaminants on the substrate surface by contact with contaminants. The high molecular weight polymer captures the solids of the cleaning material to form a polymer chain and a polymer net that intrrap, which prevents the solid from falling onto the substrate surface. In addition, the polymer can also help to remove contaminants from the substrate surface by contact with contaminants on the substrate surface. In one embodiment, the cleaning material imparts a strong impact to the protruding features and smoothly moves around the protruding features on the substrate surface without damaging the protruding features.

A post chemical-mechanical-polishing (post-cmp) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid

하기를 포함하는 포스트 화학적-기계적-연마 (포스트-CMP) 클리닝 조성물: (A) 하나 이상의 티올 (-SH), 티오에테르 (-SR 1 ) 또는 티오카르보닐 (>C=S) 기를 포함하는 하나 이상의 화합물 (식 중, R 1 은 알킬, 아릴, 알킬아릴 또는 아릴알킬임), (B) 3 개 이상의 히드록실 (-OH) 기를 함유하고, 임의의 카르복실산 (-COOH) 또는 카르복실레이트 (-COO - ) 기는 포함하지 않는 하나 이상의 당 알코올, 및 (C) 수성 매질.

Cleaning wafer substrates of metal contamination while maintaining wafer smoothness

通过将晶片基片表面与一种清洗水溶液接触清洗微电子晶片基片表面去除金属污染物同时保持晶片基片表面的光滑度，其中清洗水溶液含有无金属离子的碱性碱和具有下式的含有2至10个-OH基团的多羟基化合物：HO-Z-OH，其中-Z-是-R-，-(R 1 -O) x -R 2 -，或式(1)，其中-R-，-R 1 -，-R 2 -和-R 3 -是烯基，x是1-4的所有整数，y是1-8的所有整数，条件是多羟基化合物中的碳原子数不超过10，其中该水清洗溶液中的水含量至少约为清洗组合物的40%(重量)。

Treatment liquid and substrate cleaning method

반도체 디바이스에 포함되는 금속층에 대한 부식 방지성이 우수하면서, 잔사물 제거성이 우수하고, 또한 결함의 발생이 억제된 처리액, 및 기판 세정 방법을 제공한다. 처리액은, 산화제와, 방식제와, 물과, Fe를 함유하는 반도체 디바이스용 처리액으로서, 상기 산화제에 대한, 상기 Fe의 함유 비율이, 질량비로 10 -10 ~10 -4 이다. Provided are a treatment liquid excellent in corrosion resistance to a metal layer included in a semiconductor device, excellent in residue removal, and suppressed in occurrence of defects, and a substrate cleaning method. The processing liquid is a processing liquid for semiconductor devices containing an oxidizing agent, an anticorrosive agent, water, and Fe, wherein the content ratio of Fe to the oxidizing agent is 10 -10 to 10 -4 by mass ratio.

Method of laundering clothes and detergent composition therefor

Washing is carried out using a detergent composition having main detergency obtained through an alkaline inorganic salt and further including at least an anti-soil redeposition agent. There is provided a clothes washing method, and a detergent composition for the same, that uses a detergent having detergency equivalent to or greater than that of synthetic detergents containing a surface active agent as the main detergency ingredient and also has excellent anti-soil redeposition efficiency wherein main detergency is obtained by an alkaline inorganic salt.

Glucan fiber compositions for use in laundry care and fabric care

An enzymatically produced α-glucan oligomer/polymer compositions is provided. The enzymatically produced α-glucan oligomer/polymers can be derivatized into α-glucan ether compounds. The α-glucan oligomers/polymers and the corresponding α-glucan ethers are cellulose and/or protease resistant, making them suitable for use in fabric care and laundry care applications. Methods for the production and use of the present compositions are also provided.

Surfactant-free detergent composition comprising an anti-soil redeposition agent

Washing is carried out using a detergent composition having main detergency obtained through an alkaline inorganic salt and further including at least an anti-soil redeposition agent. There is provided a clothes washing method, and a detergent composition for the same, that uses a detergent having detergency equivalent to or greater than that of synthetic detergents containing a surface active agent as the main detergency ingredient and also has excellent anti-soil redeposition efficiency wherein main detergency is obtained by an alkaline inorganic salt.

Method of laundering clothing and detergent composition for the same

Washing is carried out using a detergent composition having main detergency obtained through an alkaline inorganic salt and further including at least an anti-soil redeposition agent. There is provided a clothes washing method, and a detergent composition for the same, that uses a detergent having detergency equivalent to or greater than that of synthetic detergents containing a surface active agent as the main detergency ingredient and also has excellent anti-soil redeposition efficiency wherein main detergency is obtained by an alkaline inorganic salt.

Surfactant-free detergent composition comprising an anti-soil redeposition agent

Washing is carried out using a detergent composition having main detergency obtained through an alkaline inorganic salt and further including at least an anti-soil redeposition agent. There is provided a clothes washing method, and a detergent composition for the same, that uses a detergent having detergency equivalent to or greater than that of synthetic detergents containing a surface active agent as the main detergency ingredient and also has excellent anti-soil redeposition efficiency wherein main detergency is obtained by an alkaline inorganic salt.

Granulate for Use in a Cleaning Product and Process for Its Manufacture

A granulate for use in a particulate cleaning product, the granulate consisting of granules which comprise: (a) at least 30% by weight of granulation auxiliary selected from water-soluble non-acid organic crystalline solids; and (b) at least 0.1% by weight of functional cleaning material other than an enzyme or an inorganic compound; and (c) optionally, one or more other ingredients. The granulate may instead comprise: (a) at least 20% by weight of granulation auxiliary selected from non-acid water-soluble organic crystalline solids; and (b) at least 0.1% by weight of temperature sensitive functional cleaning material other than an enzyme or an inorganic compound; and (c) optionally, one or more other ingredients.

Cleaning composition containing a polysaccharide hybrid polymer composition and methods of improving drainage

A composition includes a polysaccharide hybrid polymer composition. In one embodiment, the polysaccharide hybrid polymer composition includes a polysaccharide residue present in an amount from about 5% to about 90% by weight of the polysaccharide hybrid polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from about 10% to about 75% by weight of the polysaccharide hybrid polymer composition.

Cleaning composition containing a polysaccharide graft polymer composition and methods of improving drainage

A composition includes a polysaccharide graft polymer composition. In one embodiment, the polysaccharide graft polymer composition includes a polysaccharide residue present in an amount from about 5% to about 90% by weight of the polysaccharide graft polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from about 10% to about 75% by weight of the polysaccharide graft polymer composition.

Granulate for use in a cleaning product and process for its manufacture

A granulate for use in a particulate cleaning product, the granulate consisting of granules which comprise: (a) at least 30% by weight of granulation auxiliary selected from water-soluble non-acid organic crystalline solids; and (b) at least 0.1% by weight of functional cleaning material other than an enzyme or an inorganic compound; and (c) optionally, one or more other ingredients. The granulate may instead comprise: (a) at least 20% by weight of granulation auxiliary selected from non-acid water-soluble organic crystalline solids; and (b) at least 0.1% by weight of temperature sensitive functional cleaning material other than an enzyme or an inorganic compound; and (c) optionally, one or more other ingredients.

Cleaning composition containing a polysaccharide hybrid polymer composition and methods of improving drainage

A composition includes a polysaccharide hybrid polymer composition. In one embodiment, the polysaccharide hybrid polymer composition includes a polysaccharide residue present in an amount from about 5% to about 90% by weight of the polysaccharide hybrid polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from about 10% to about 75% by weight of the polysaccharide hybrid polymer composition.

Method of laundering clothes and detergent composition thereof

本发明使用主要的洗涤作用为碱性无机盐，还至少含有再污染防止成分的洗涤剂组合物进行洗涤。使用具有与以表面活性剂为洗涤主剂的合成洗涤剂同等或其以上的洗净力且再污染防止性能也优良、主要的洗涤作用为无机盐的洗涤剂的衣料的洗涤方法及该洗涤方法所使用的洗涤剂组合物。

Glucan fiber compositions for use in laundry care and fabric care

An enzymatically produced α-glucan oligomer/polymer compositions is provided. The enzymatically produced α-glucan oligomer/polymers can be derivatized into α-glucan ether compounds. The α-glucan oligomers/polymers and the corresponding α-glucan ethers are cellulose and/or protease resistant, making them suitable for use in fabric care and laundry care applications. Methods for the production and use of the present compositions are also provided.

Glucan fiber compositions for use in laundry care and fabric care

An enzymatically produced α-glucan oligomer/polymer compositions is provided. The enzymatically produced α-glucan oligomer/polymers can be derivatized into α-glucan ether compounds. The α-glucan oligomers/polymers and the corresponding α-glucan ethers are cellulose and/or protease resistant, making them suitable for use in fabric care and laundry care applications. Methods for the production and use of the present compositions are also provided.

Glucan fiber compositions for use in laundry care and fabric care

An enzymatically produced α-glucan oligomer/polymer compositions is provided. The enzymatically produced α-glucan oligomer/polymers can be derivatized into α-glucan ether compounds. The α-glucan oligomers/polymers and the corresponding α-glucan ethers are cellulose and/or protease resistant, making them suitable for use in fabric care and laundry care applications. Methods for the production and use of the present compositions are also provided.

Metal contamination cleaning of wafer materials while maintaining wafer smoothness

마이크로일렉트로닉스 웨이퍼물질 표면은, 알칼리의 수용성용액과, 자유염기-금속이온 그리고 2 내지 10의 -OH그룹을 포함하는 폴리하이드록시 복합물로 구성되고 상기 폴리하이드록시 복합물은 다음식을 가지며: HO - Z - OH, 상기 식에서 -Z-는 -R-, -(-R 1 -O-) x -R 2 - 또는 -R 3 - 이며 상기 │ (OH)y -R-, -R 1 -, -R 2 - 그리고 -R 3 -는 알킬렌 라디칼이고, X는 전체 정수의 수가 1 내지 4, Y는 전체정수의 수가 1 내지 8, 복합물에서 탄소원자의 수는 10을 초과하지 않으며, 그리고 수용성용액내에 존재하는 물은 최소한 조성물 중량의 약 40%를 포함되도록 구성되는 수용성 세척용액에 상기 웨이퍼표면물질이 접촉되도록 함에의해 상기 웨이퍼물질 표면평활도를 유지하는 동안 금속오염을 제거하기 위해 청소된다.

Composition for TiN hardmask removal and etch residue cleaning

本发明公开了用于从电子电路器件(例如高级图案晶片)除去TiN硬掩模的组合物、方法和系统。所述清洁组合物优选包含蚀刻剂(也称为基质)、氧化剂、氧化稳定剂(也称为螯合剂)、铵盐、腐蚀抑制剂和溶剂。可以提供其他任选的添加剂。清洁组合物的pH优选大于5.5。清洁组合物优选不含二甲基亚砜和四甲基氢氧化铵。

The composition of two-phase contaminant removal medium and application

具体实施方式提供用于将污染物从基板表面去除以提高器件产量的基板清洗技术。基板清洗技术利用如下清洗材料，该清洗材料带有分散在清洗液体中的固体成分和具有大分子量的聚合物，以形成清洗材料，所述清洗材料是流体性的。固体成分通过与污染物接触而将基板表面上的污染物去除。具有大分子量的聚合物形成将固体捕捉并俘获在清洗材料中的聚合物链和聚合物网，所述聚合物链和聚合物网防止固体落到基板表面上。此外，聚合物还可以通过与基板表面上的污染物接触而辅助将污染物从基板表面上去除。在一种实施方式中，清洗材料在基板表面上的凸出特征周围滑过而不对凸出特征产生有力冲击而损坏它们。

Method of washing clothes and detergent composition therefor

主たる洗浄作用がアルカリ性無機塩により得られる洗浄剤組成物であって、さらに少なくとも再汚染防止剤を含有する洗浄剤組成物を用いて洗濯する。界面活性剤を洗浄主剤とした合成洗剤と同等もしくはそれ以上の洗浄力を有し、さらに再汚染防止性能にも優れた、主たる洗浄作用が無機塩により得られる洗浄剤を用いた衣料の洗濯方法及びそのための洗浄剤組成物を提供する。 Washing is performed using a detergent composition whose main washing action is obtained by an alkaline inorganic salt, and further containing at least a re-staining inhibitor. A method for washing clothes using a detergent that has a detergency equal to or higher than that of a synthetic detergent using a surfactant as a main cleaning agent, and is excellent in re-staining prevention performance, and whose main detergency is obtained by an inorganic salt. And a cleaning composition therefor.

Additive for alkali polishing in solar cell preparation and polishing process

本发明公开了一种太阳能电池制备碱抛光用添加剂及抛光工艺，添加剂由以下质量百分比的原料组成：无机盐0.1％‑5％、缓蚀阻垢剂0.1％‑10％、乳化增稠剂0.1％‑2.5％、PH调节剂0.1％‑3％、余量为去离子水；缓蚀阻垢剂可降低碱对二氧化硅的腐蚀速率，保护电池正面的PN结在刻蚀过程中不被破坏，还促进碱对硅片的抛光效果，避免使用重污染的HNO3，绿色环保，不仅降低了HF的使用量，而且提升了电池转换效率，降低废水废气处理成本和电池生产的材料成本。利用无机盐的高粘度来增大碱抛光使用的氢氧化钠/氢氧化钾的浓度，以控制反应速度，避免腐蚀过度，降低碎片率，且无机盐对金属离子的螯合作用可对硅片表面进行清洁。

Eco-friendly detergent composition and manufactruing method of eco-friendly detergent powder using the same

본 발명은 계면활성제가 첨가되지 않음에도 불구하고, 기존 석유계 계면활성제가 첨가된 합성세제 대비 동등 또는 그 이상의 우수한 세척력을 발휘할 수 있는 친환경 세제 조성물 및 이를 이용한 친환경 세제 분말 제조 방법에 대하여 개시한다. 이 결과, 본 발명에 따른 친환경 세제 조성물은 표백제가 첨가되지 않음에도 불구하고, 색소계 오염물에 대한 세탁 효과가 우수하고, 표백제에 의한 단백질 오염물의 세척력 저하가 일어나지 않는다.

Eco-friendly detergent powder and manufactruing method of eco-friendly detergent powder

본 발명은 계면활성제가 첨가되지 않음에도 불구하고, 기존 석유계 계면활성제가 첨가된 합성세제 대비 동등 또는 그 이상의 우수한 세척력을 발휘할 수 있는 친환경 세제 분말 및 친환경 세제 분말 제조 방법에 대하여 개시한다. 이 결과, 본 발명에 따른 친환경 세제 분말은 표백제가 첨가되지 않음에도 불구하고, 색소계 오염물에 대한 세탁 효과가 우수하고, 표백제에 의한 단백질 오염물의 세척력 저하가 일어나지 않는다.

Cleaning composition containing a polysaccharide graft polymer compositon and methods of improving drainage

A composition includes a polysaccharide graft polymer composition. In one embodiment, the polysaccharide graft polymer composition includes a polysaccharide residue present in an amount from about 5% to about 90% by weight of the polysaccharide graft polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from about 10% to about 75% by weight of the polysaccharide graft polymer composition.

NON-CRYSTAL DELIVERY SYSTEM FOR FLAVORING OR TASTE SUBSTANCES

ÐÎÑÑÈÉÑÊÀß ÔÅÄÅÐÀÖÈß (19) RU (51) ÌÏÊ 7 (11) 2004 136 291 (13) A A 23 L 1/22, A 23 P 1/04, 1/12 ÔÅÄÅÐÀËÜÍÀß ÑËÓÆÁÀ ÏÎ ÈÍÒÅËËÅÊÒÓÀËÜÍÎÉ ÑÎÁÑÒÂÅÍÍÎÑÒÈ, ÏÀÒÅÍÒÀÌ È ÒÎÂÀÐÍÛÌ ÇÍÀÊÀÌ (12) ÇÀßÂÊÀ ÍÀ ÈÇÎÁÐÅÒÅÍÈÅ (21), (22) Çà âêà: 2004136291/13, 12.06.2003 (71) Çà âèòåëü(è): ÔÈÐÌÅÍÈØ ÑÀ (CH) (30) Ïðèîðèòåò: 14.06.2002 IB PCT/IB02/02228 (43) Äàòà ïóáëèêàöèè çà âêè: 10.07.2005 Áþë. ¹ 19 (86) Çà âêà PCT: IB 03/02592 (12.06.2003) Àäðåñ äë ïåðåïèñêè: 103735, Ìîñêâà, óë. Èëüèíêà, 5/2, ÎÎÎ "Ñîþçïàòåíò", ïàò.ïîâ. À.Ï.Àãóðååâó (54) ÍÅÊÐÈÑÒÀËËÈ×ÅÑÊÀß ÑÈÑÒÅÌÀ ÄÎÑÒÀÂÊÈ ÀÐÎÌÀÒÈÇÈÐÓÞÙÈÕ ÈËÈ ÂÊÓÑÎÂÛÕ R U Ôîðìóëà èçîáðåòåíè 1. Ñèñòåìà äîñòàâêè, âêëþ÷àþùà ãèäðîôîáíûé âêóñîâîé èëè àðîìàòè÷åñêèé èíãðåäèåíò èëè êîìïîçèöèþ, èíêàïñóëèðîâàííûå â îëèãîìåðíîì èëè ïîëèìåðîì íîñèòåëå, õàðàêòåðèçóþùà ñ òåì, ÷òî ãèäðîôîáíûé âêóñîâîé èëè àðîìàòè÷åñêèé èíãðåäèåíò èëè êîìïîçèöè , íå áóäó÷è èíêàïñóëèðîâàííûìè, íàõîä òñ â êðèñòàëëè÷åñêîé ôîðìå ïðè äàâëåíèè â ïðåäåëàõ îò 0,5⋅10 5 äî 2⋅10 5 Ïà è òåìïåðàòóðå â ïðåäåëàõ îò 15 äî 30°Ñ è òåì, ÷òî óïîì íóòûé âêóñîâîé èëè àðîìàòè÷åñêèé èíãðåäèåíò èëè êîìïîçèöè , áóäó÷è èíêàïñóëèðîâàííûìè â ñèñòåìå äîñòàâêè, íàõîä òñ â íåêðèñòàëëè÷åñêîé ôîðìå ïðè óêàçàííûõ äàâëåíèè è òåìïåðàòóðå. 2. Ñèñòåìà äîñòàâêè ïî ï.1, õàðàêòåðèçóþùà ñ òåì, ÷òî âêóñîâîé èëè àðîìàòè÷åñêèé èíãðåäèåíò èëè êîìïîçèöè âë þòñ íå ñìåøèâàåìûìè ñ íîñèòåëåì ïðè òåìïåðàòóðå â ïðåäåëàõ îò 15 äî 30°Ñ. 3. Ñèñòåìà äîñòàâêè ïî ï.1, õàðàêòåðèçóþùà ñ òåì, ÷òî âêóñîâîé èëè àðîìàòè÷åñêèé èíãðåäèåíò èëè êîìïîçèöè è íîñèòåëü âë þòñ ñìåøèâàåìûìè ïðè òåìïåðàòóðå â ïðåäåëàõ îò 15 äî 30°Ñ. 4. Ñèñòåìà äîñòàâêè ïî ï.2, õàðàêòåðèçóþùà ñ òåì, ÷òî âêóñîâîé èëè àðîìàòè÷åñêèé èíãðåäèåíò âûáèðàþò èç ãðóïïû, â êîòîðóþ âõîä ò ãåëèîòðîï, áåíçîôåíîí, ìåíòîë, ìåòèëàíèñàò è ïðîïåíèëãâàåòîë. 5. Ñèñòåìà äîñòàâêè ïî ï.2, õàðàêòåðèçóþùà ñ òåì, ÷òî íîñèòåëü ñîäåðæèò, ïî ìåíüøåé ìåðå, óãëåâîäíûé ìàòåðèàë. 6. Ñèñòåìà äîñòàâêè ïî ï.5, õàðàêòåðèçóþùà ñ òåì, ÷òî óãëåâîäíûé ìàòåðèàë âûáèðàþò èç ãðóïïû, â êîòîðóþ âõîä ò ìàëüòîäåêñòðèí èëè ...

Bleach-containing cleaning agent

Diese Anmeldung hat Reinigungsmittel mit einem Wassergehalt unterhalb 5 Gew.-%, umfassend a) 10 bis 45 Gew.-% Sauerstoffbleichmittel, b) 10 bis 89,5 Gew.-% organisches Lösungsmittel, c) 0,5 bis 5 Gew.-% Schwebemittel, sowie Geschirrspülverfahren unter Einsatz dieser Reinigungsmittel zum Gegenstand. This application has cleaning agents having a water content below 5% by weight, comprising a) from 10 to 45% by weight of oxygen bleach, b) from 10 to 89.5% by weight of organic solvent, c) from 0.5 to 5% by weight. % Suspending agents, as well as dishwashing using these detergents to the subject.

Bleach-containing cleaning agent

the invention relates to cleaning agents with a water content of less than 5 wt. %, comprising; a) 10 to 45 wt. % oxygen bleaching agent,b) 10 to 89.5 wt. % organic solvent, c) 0.5 to 5 wt.% suspension agent and dishwasher powder method using said cleaning agent.

Method of laundering clothing and detergent composition for the same

A detergent composition in which the main detergency is attributable to an alkaline inorganic salt and which further contains at least a resoiling inhibitor; and a method of laundering which comprises laundering clothes with the detergent composition. The detergent composition has detergency equal to or higher than that of synthetic detergents containing a surfactant as the main detergent ingredient and has excellent resoiling-preventive performance.

Patent FR2447399B3

Aqueous composition of thickened sulfamic acid

La présente invention a pour objet une composition aqueuse épaissie d'acide sulfamique caractérisée en ce qu'elle contient à titre d'épaississant un hétéropolysaccharide de type succinoglycane, ledit épaississant y étant stabilisé par une quantité efficace de sulfamate de potassium. Elle concerne également les utilisations de ladite composition pour nettoyer des surfaces. The subject of the present invention is a thickened aqueous sulfamic acid composition, characterized in that it contains, as thickener, a succinoglycan-type heteropolysaccharide, said thickener being stabilized therein with an effective amount of potassium sulfamate. It also relates to the uses of said composition for cleaning surfaces.

A kind of fruits and vegetables cleaning agent and preparation method thereof

本发明涉及日用化工品技术领域，具体涉及一种果蔬清洗剂及其制备方法。该果蔬清洗剂包括以下组分：氧化剂、碱性蛋白酶、吸附剂、干燥稳定剂、增稠稳定剂和聚集剂，不使用表面活性剂，避免了表面活性剂对人体及环境的危害。该清洗剂为固态，其质量与体积均远小于液态果蔬清洗剂，可大大降低运输与储存成本，使用时加水分散即可。与现有技术相比，本发明所提供的果蔬清洗剂具有更好的去除农残的效果。

Biodegradable scale control composition for use in highly concentrated alkaline detergents

An alkaline concentrated detergent composition for use in cleaning hard surfaces, medical instruments and other metal components (parts, tools, utensils, vessels, equipment) having superior cleaning efficacy at much lower alkali content than traditional alkaline cleaners and enhanced scale control properties even when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water and even in exceptionally hard water. The inventive composition maintains its superior cleaning efficacy and scale control properties during use.

A kind of disposable fruits and vegetables dish washing detergent and preparation method thereof

本发明属于洗涤剂技术领域，具体涉及一种免洗果蔬餐具洗涤剂及其制备方法。本发明提供的免洗果蔬餐具洗涤剂主要由碳酸氢钠、磷酸氢二钠、水溶性壳聚糖、羟丙基‑β‑环糊精、六偏磷酸钠、柠檬酸、防腐剂、食品用香精和水组成。本发明制备得到的免洗果蔬餐具洗涤剂具有污渍清除效果强，果蔬表面残留农药清除效果高的优点，而且其不含有表面活性剂，不需要另外使用清水清洗，经该洗涤剂清洗过的餐具或果蔬不存在表面活性残留的问题，为人们提供了一种使用便捷、环保、健康的洗涤剂。

METHOD FOR MANUFACTURING ANTITARE PRODUCT

METHOD FOR MANUFACTURING ANTITARE PRODUCT

La présente invention concerne un procédé de fabrication de produit antitartre destiné à inhiber la formation de tartres dans les appareils dont des éléments tels que des conduits ou tuyaux peuvent subir une dégradation au fil des utilisations par dépôts de tartres. Le procédé selon l'invention permet plus particulièrement d'obtenir un produit antitartre écologique. Pour cela, le procédé selon l'invention comporte une étape de préparation (1) de matière végétale de la famille des Caryophyllacée, une étape d'infusion (6) de ladite matière végétale, une étape de filtration (7) de ladite infusion et une étape de préparation (9) de solution antitartre à partir d'un filtrat obtenue lors de l'étape de filtration.

Lens care product containing dexpanthenol

The present invention relates to contact lens care product comprising dexpanthenol and D-sorbit. The invention similarly relates to the usage of a contact lens care compositions of this kind for cleaning and optionally disinfecting contact lenses.