ТЕПЛОПЕРЕДАЮЩИЕ КОМПОЗИЦИИ

... 1. Теплопередающая композиция, включающая транс-1,3,3,3-тетрафторпропен (R-1234ze(E)), фторэтан (R-161) и третий компонент, выбранный из дифторметана (R-32) и/или 1,1-дифторэтана (R-152а).2. Композиция по п.1, включающая до около 30 мас.% третьего компонента и до около 30 мас.% R-161, остальное - R-1234ze.3. Композиция по п.1, в которой третий компонент является R-32.4. Композиция по п.3, включающая от около 58 до около 93 мас.% R-1234ze(E), от около 5 до около 30 мас.% R-161 и от около 2 до около 12 мас.% R-32.5. Композиция по п.4, включающая от около 68 до около 91 мас.% R-1234ze(E), от около 5 до около 20 мас.% R-161 и от около 4 до около 12 мас.% R-32.6. Композиция по п.1, в которой третий компонент является R-152a.7. Композиция по п.6, включающая от около 50 до около 93 мас.% R-1234ze(E), от около 2 до около 20 мас.% R-161 и от около 5 до около 30 мас.% R-152a.8. Композиция по п.7, включающая от около 60 до около 83 мас.% R-1234ze(E), от около 12 до около 20 мас.% R-161 и от около ...

АЗЕОТРОПНАЯ РАСТВОРЯЮЩАЯ КОМПОЗИЦИЯ И СМЕШАННАЯ РАСТВОРЯЮЩАЯ КОМПОЗИЦИЯ

... 1. Азеотропная растворяющая композиция, включающая в себя 62 мас.% 1,1,1,2,2,3,3,4,4,5,5,6,6-тридекафтороктана и 38 мас.% изопропанола. ! 2. Смешанная растворяющая композиция, включающая в себя от 40 до 90 мас.% 1,1,1,2,2,3,3,4,4,5,5,6,6-тридекафтороктана и от 10 до 60 мас.% изопропанола. ! 3. Смешанная растворяющая композиция по п.2, которая дополнительно содержит не более 20%, по крайней мере, одного соединения, выбранного из группы, состоящей из углеводорода, спирта (отличного от изопропанола), кетона, галогензамещенного углеводорода (отличного от 1,1,1,2,2,3,3,4,4,5,5,6,6-тридекафтороктана), простого эфира и сложного эфира. ! 4. Способ очистки готового изделия, которое необходимо чистить, который включает в себя приведение растворяющей композиции, охарактеризованной в п.1, в контакт с готовым изделием, имеющим распространенное на нем масло, с целью удаления масла с готового изделия. ! 5. Способ очистки готового изделия, которое необходимо чистить, который включает в себя приведение ...

BINÄRE AZEOTROPE ZUSAMMENSETZUNGEN

Azeotrope Gemische aus Octamethyltrisiloxan und aliphatischen oder alizyklischen Alkoholen

Verfahren zur Behandlung von Geweben durch Wärmeerzeugung

REINIGUNGSLÖSUNG UND IHRE ANWENDUNG

Heat transfer compositions

A heat transfer composition comprises up to about 30 % by weight carbon dioxide (R-744), from about 30 % to about 80 % by weight difluoromethane (R-32), and 1,3,3,3-tetrafluoropropene (R-1234ze), preferably R-1234ze(E). The composition preferably has a low GWP and may further comprise a lubricant, a stabiliser or a flame retardant. The composition may be a refrigerant, a blowing agent, a foam or a sprayable composition. The composition may be used in a heat transfer device e.g. automotive air conditioning systems, chiller refrigeration systems. Also shown are methods of cooling, heating, extraction and cleaning using the composition.

Heat transfer compositions

Heat transfer compositions comprising: (i) trans-1,3,3,3-tetrafluoropropene (R-1234ze(E)); (ii) a second component selected from difluoromethane (R-32), propene (R-1270) propane (R290) and mixtures thereof; (iii) a third component selected from pentafluoroethane (R-125), 1,1,1,2- tetrafluoroethane (R-134a), and mixtures thereof; and optionally (iv) a fourth component selected from fluoroethane (R-161), 1,1-difluoroethane (R-152a) and mixtures thereof. The composition preferably has a low GWP and may further comprise a lubricant, a stabiliser or a flame retardant. The composition may be a refrigerant, a blowing agent, a foam or a sprayable composition. The composition may be used in a heat transfer device e.g. automotive air conditioning systems, chiller refrigeration systems. Also shown are methods of cooling, heating, extraction and cleaning using the composition.

Compositions

A composition comprising 1,1-difluoroethene (R-1132a); ethane (R-170) and, optionally carbon dioxide (CO2, R-744). The composition preferably has a low GWP and may further comprise a lubricant, a stabiliser or a flame retardant. The composition may be a refrigerant, a foam or a sprayable composition. The composition may be used in a heat transfer device e.g. automotive air conditioning systems, chiller refrigeration systems. Also shown are methods of cooling, heating, extraction and cleaning using the composition.

Cleaning process and apparatus

STABILIZED DRAW MEANS ON THE BASIS OF PERCHLORATHYLEN

PROCEDURE FOR THE OIL SOLUTION AT LOW TEMPERATURES

STABILISIERTES LOSUNGSMITTEL AUF DER BASIS VON PERCHLORATHYLEN

STABILIZED DRAW MEANS ON THE BASIS OF PERCHLORATHYLEN

AZEOTROPARTIGE SOLVENT COMPOSITION AND SOLVENT MIXTURE COMPOSITION

AZEOTROPE OR AZEOTROPÄHNLICHE COMPOSITION ON THE BASIS OF HYDROGEN ABSTENTION CHLORINE FLUOROCARBONS.

PROCEDURE FOR THE CLEANING OF SURFACES

SOLVENT COMPOSITION

COOLING AGENT COMPOSITIONS

CLEANING METHOD AND - DEVICE

HALOGENATED HYDROCARBON SOLVENTS AND USE THEREOF

Heat transfer compositions

The invention provides a heat transfer composition comprising (i) from about 45 to about 75 % by weight 2,3,3,3-tetrafluoropropene (R-1234yf); and (ii) from about 25 to about 55 % by weight 1,1,1,2-tetrafluoroethane (R-134a). A heat transfer composition comprising, optionally consisting essentially of, (i) from about 20 to about 90 % by weight R-1234yf; (ii) from about 10 to about 60 % by weight R-134a; and (iii) from about 1 to about 20 % by weight R-32 is also provided.

Solvent compositions

A fluid dispensing system and methods relating thereto

A sprayer system includes a trigger sprayer having a trigger, a pump mechanism, and a nozzle. The sprayer system further includes a solvent reservoir for accommodating a solvent substance and a bottle for accommodating a concentrate substance. Further, the solvent reservoir is positioned above the trigger sprayer and is in fluid communication with the trigger sprayer and the bottle is positioned below the trigger sprayer and is in fluid communication with the trigger sprayer.

Heat transfer compositions

The invention provides a heat transfer composition comprising trans-1, 3,3,3-tetrafluoropropene (R-1234ze(E)), fluoroethane (R-161) and a third component selected from difluoromethane (R-32) and/or 1, 1 -difluoroethane (R-152a).

SUPERCRITICAL FLUID-BASED CLEANING COMPOSITIONS AND METHODS

Compositions and methods employing supercritical fluids, e.g., supercritical carbon dioxide, for removal of unwanted material from microelectronic device structures and process equipment. One composition of such type, having utility for removing flux and solder perform surface films, includes supercritical fluid, e.g., supercritical CO2, and organic co-solvent, e.g., xylene. Another composition of such type having utility for removal of metals, metal oxides, metal-containing post-etch residues and CMP particles from semiconductor substrates includes supercritical fluid and at least one ~-diketone.

HEAT TRANSFER COMPOSITIONS

The invention provides a heat transfer composition comprising: (i) trans-1,3,3,3-tetrafluoropropene (R-1234ze(E)); (ii) a second component selected from difluoromethane (R-32), propene (R-1270)propane (R290) and mixtures thereof; (iii) a third component selected from pentafluoroethane (R-125), 1,1,1,2-tetrafluoroethane (R-134a), and mixtures thereof; and optionally (iv) a fourth component selected from fluoroethane (R-161), 1,1-difluoroethane (R-152a) and mixtures thereof.

DEPOSIT CLEANING COMPOSITION FOR INTERNAL COMBUSTION ENGINES

It has been found that a composition comprising an alkoxy alcohol, an aliphatic alcohol, a liquid petroleum distillate, a liquid fatty acid, a volatile nitrogen base, polyisobutenyl aminoethylethanolamine, and water may be used as an engine deposit cleaner which removes air and fuel induction system deposits, valve deposits, and combustion chamber deposits. The inventive composition may be introduced into the engine in lieu of fuel, or in conjunction with fuel while the engine is operating.

COLD CLEANING COMPOSITION BASED ON ALKANES OR CYCLOALKANES AND AN ORGANIC COMPOUND COMPRISING A KETONE GROUP

L'invention concerne une composition de nettoyage à froid de surfaces solides en milieu non aqueux. La composition est constituée essentiellement par un mélange d'alcanes ou de cycloalcanes et d'au moins un com posé organique comprenant au moins une fonction cétone, ladite composition présente un point d'éclair supérieur ou égal à 40.deg ree.C et inférieur à 55.degree.C, mesuré selon la norme ASTM D56-70.

Solvent composition, cleaning method and method for forming coating film

Solvent compsns. for cleaning surfaces

Composition liquide à base de solvants organiques permettant un dégraissage de tout type de supports rigides, semi-rigides, tissu, cuir, etc... Cette invention a pour but de débarasser tous types de surfaces (tissus, cuirs, etc...) de tous types de pollution: huile, graisse, mazout, goudron, gomme à macher, paraffine, colle d'autocollant, résine d'arbre, cire et ceci sans agression et sans laisser d'auréole. Composition liquide permettant un excellent dégraissage de tout type de support, par le fait qu'elle est essentiellement composée d'un mélange de solvants organiques dans les proportions suivantes de préférence: - de 30 à 38 % de xylènes - de 63 à 70 % de white spirit.

THE DIESEL PARTICULATE FILTER CLEANING EQUIPMENT AND METHOD FOR DIESEL VEHICLES

METAL AND DIELECTRIC COMPATIBLE SACRIFICIAL ANTI-REFLECTIVE COATING CLEANING AND REMOVAL COMPOSITION

VAPOR PHASE SILOXANE DRY CLEANING PROCESS

The process of the present invetion is direced to a dry cleaning process, comprising the use of volatile cyclic, linear or branched siloxanes in the vapor phase for the cleaning of soiled or staned fabrics. The linear or branched siloxanes have the formula: M2+y+2zD xTyQz wherein: M is R13SiO 1/2; D is R2R3SiO2/2; T is R4 SiO3/2; and Q is SIO4/2. R1, R2, R3 and R4 are each independently a monovalent hydrocarbaon radical having form one to forthy carbon stoms; and x and y are each integers, wherein 0 < x < 10 and 0 < y < 10.and 0 < z < 10. While the cyclic siloxanes have the formula (1) wherein R5, R6,R7 and R8 are each independently a monovalent hydrocarbon group having from one to forty carbon atoms; and a and b are each integers wherein 0 < a < 10 and 0 < b < 10, provided that 3 < (a + b) < 10. © KIPO & WIPO 2007 ...

Stabilization of tris(2-hydroxyethyl)methylammonium hydroxide against decomposition with dialkyhydroxylamine

The invention provides stabilized solutions useful as raw materials in various applications and methods for stabilizing such aqueous solutions with a stabilizer comprising one or more dialkylhydroxylamines or inorganic or organic acid salts thereof. Stabilized solutions and methods for stabilizing aqueous solutions thereof, include, for example, those of tris(2-hydroxyethyl)methylammonium hydroxide (THEMAH) and/or carbohydrazide (CHZ).

Conductive aqueous solution production device and conductive aqueous solution production method

This conductive aqueous solution production device 1 has: an ion exchanger 2 provided partway along a main pipe 11 for supplying ultrapure water W as a starting liquid; a supply pipe 12 which converges with the main pipe 11 on the downstream side of the ion exchanger 2; and a conductivity-imparting substance supply device 3. When the conductivity-imparting substance is ammonia, for example, it is preferable for the ion exchange material which fills the ion exchanger 2 to be a cation exchange resin, because the ions are cations, or in other words, ammonium ions (NH4 +). In addition, when the conductivity-imparting substance is carbon dioxide, it is preferable to fill the ion exchanger 2 with an anion exchange resin, because the ions are anions, or in other words, bicarbonate ions (NCO3 -) or carbonate ions (CO3 2-). This conductive aqueous solution production device is capable of producing a conductive aqueous solution at a stable concentration, with excellent tracking of changes in concentration ...

Process of treating a carpet with a composition comprising a zeolite

The present invention relates to a process of treating a fabric with a composition comprising an activated zeolite.

Solvent composition

A solvent composition which comprises a fluorinated solvent containing no chlorine atom in its molecule, a hydrocarbon solvent and a glycol ether and which is free from phase separation, wherein the compositional ratio of the fluorinated solvent and the hydrocarbon solvent is a compositional ratio such that a two component mixture composed solely of the fluorinated solvent and the hydrocarbon in such a compositional ratio would separate into two phases.

Non-surfactant solubilizing agent

Compositions of the invention include: (a) a solvent at least partially immiscible in water; and (b) a solubilizing agent having a formula: where R is (C₁-C₇)alkyl, substituted (C₁-C₇)alkyl, (C₁-C₇)alkoxy, substituted (C₁-C₇)alkoxy, (C₂-C₇)alkenyl, substituted (C₂-C₇)alkenyl, aryl, heteroaryl, cycloalkyl or heterocycly; and R' and R'' is independently selected from hydrogen, (C₁-C₇)alkyl, substituted (C₁-C₇)alkyl, (C₁-C₇)alkoxy, substituted (C₁-C₇)alkoxy, (C₂-C₇)alkenyl, or substituted (C₂-C₇)alkenyl. Further compositions include: (a) a solvent at least partially immiscible in water; and (b) a solubilizing agent having a formula: R₁-R-OH Подробнее

System and method for cleaning of workpieces using supercritical carbon dioxide

A supercritical CO2 cleaning system according to the invention can include: a pressure chamber configured to clean a workpiece with supercritical CO2; an expansion chamber configured to receive an output of the pressure chamber; a CO2 recycle system configured to receive an expanded CO2 stream from the expansion chamber, and configured to output a recycled CO2 stream; a supply of fresh CO2 configured to output a fresh CO2 stream; a purification system configured to receive at least one of the fresh CO2 stream and the recycled CO2 stream, the purification system configured to output a purified CO2 stream; and a first co-solvent supply configured to output a first co-solvent stream, where the pressure chamber is configured to receive the purified CO2 stream and the first co-solvent stream.

Solvent composition, adhesive composition, and method of bonding surfaces

In an embodiment a solvent composition can comprise, based on the total volume of the solvent composition, 10 to 95 volume percent of a first solvent, wherein the first solvent has Hansen solubility parameters of: 15 MPa0.5≤δD≤17 MPa0.5, 4≤δP≤10.5 MPa0.5, and 7≤δH≤10 MPa0.5; 5 to 95 volume percent of a second solvent, wherein the second solvent has Hansen solubility parameters of: 16 MPa0.5≤δD≤17.5 MPa0.5, 0≤δP≤3 MPa0.5, and 0≤δH≤3 MPa0.5; and 0 to 85 volume percent parachlorobenzotrifluoride; wherein the amounts of the first solvent, the second solvent, and parachlorobenzotrifluoride sum to at least 85 volume percent. The first solvent can comprise methyl acetate, acetone, dimethyl carbonate, ethyl acetate, n-butylamine, propyl acetate, tetrahydrofuran, or a combination thereof. The second solvent can comprise cyclohexene, cyclohexane, cyclopentane, methylcyclohexane, or a combination thereof. The solvent compositions are particularly useful in an adhesive composition. An adhesive composition ...

SUPERCRITICAL CARBON DIOXIDE/CHEMICAL FORMULATION FOR ASHED AND UNASHED ALUMINUM POST-ETCH RESIDUE REMOVAL

A post-etch residue cleaning composition for cleaning ashed or unashed aluminum/SiN/Si post-etch residue from small dimensions on semiconductor substrates. The cleaning composition contains supercritical CO2 (SCCO2), alcohol, fluoride source, an aluminum ion complexing agent and, optionally, corrosion inhibitor. Such cleaning composition overcomes the intrinsic deficiency of SCCO2 as a cleaning reagent, viz., the non-polar character of SCCO2 and its associated inability to solubilize species such as inorganic salts and polar organic compounds that are present in the post-etch residue and that must be removed from the semiconductor substrate for efficient cleaning. The cleaning composition enables damage-free, residue-free cleaning of substrates having ashed or unashed aluminum/SiN/Si post-etch residue thereon.

CLEANING SOLVENT

PURPOSE: To obtain a cleaning solvent which is excellent in the capability of dissolving and cleaning various stain substances, lowly toxic, highly biodegradable, recyclable, and free from the problem of ozone depletion by using a specific carbonic ester compd. as the solvent. CONSTITUTION: A cleaning solvent comprises at least one carbonic ester compd. of the formula (wherein a and bare each 1-6; and R1 and R2 are each 1-30C alkyl, cycloalkyl, alkenyl, alkylphenyl, benzyl, or alkylbenzyl provided that the sum of the number of carbon atoms of them is 50 or lower, that any H of them may be substd. by F, and that they may be the same or different from each other), is excellent in the capability of dissolving and cleaning various stain substances such as a liq. crystal, rosin, oil or fat, lowly toxic, highly biodegradable, recyclable, and free from the problem of ozone depletion. Since the solvent is not volatile and has a high flash point, it is excellent in safety and handleabulnty. COPYRIGHT ...

CLEANING SOLVENT FOR LIQUID CRYTAL CELL

PURPOSE: To wash off the liquid crystal component in the gap between the glass plates constituting a liquid crystal cell without swelling the polymeric material constituting the cell by using a hydrocarbon oil comprising a specified diarylalkane and having specified properties as the cleaning solvent. CONSTITUTION: A hydrocarbon oil which comprises a diarylalkane having the total number of carbon atoms of the side chain alkyl groups of 3 or below and mainly consists of a component having a specific gravity of 0.97 or above at 15°C and a boiling range of 265-320°C is a substantially odorless and thermally stable substance has a high boiling point, yet can be easily vaporized in a vacuum of 1mmHg or below to leave nothing on the surface of a liquid crystal cell. An example of this solvent is triphenylmethane. In its use, the extra liquid crystal adhering to a liquid crystal cell is physically removed by spinning, and the cell is immersed in this solvent for 5-10min and subjected to ultrasonic ...

ТЕПЛОПЕРЕДАЮЩИЕ КОМПОЗИЦИИ

Изобретение относится к теплопередающей композиции, включающей транс-1,3,3,3-тетрафторпропен (R-1234ze(E)), фторэтан (R-161) и третий компонент, выбранный из дифторметана (R-32) и/или 1,1-дифторэтана (R-152a). Указанная теплопередающая композиция используется в смазочной композиции, в композиции, включающей антипирен, в теплообменнике, при получении вспенивающего агента, и во вспенивающей композиции, в пене, при охлаждении или нагреве изделий, в способе экстракции веществ из биомассы, из водного раствора с растворителем, из дисперсной твердой матрицы, в способе очистки изделий. Указанная композиция используется также в механическом устройстве для получения энергии, в способе модификации теплообменника (холодильного аппарата), в способе получения квот на выбросы парниковых газов. Технический результат достигается за счет замены существующих холодильных агентов, таких как R-134a, R-152a, R-1234yf, R-22, R-410, R-407A, R-407B, R-507 и R-404a. 21 н. и 36 з.п. ф-лы,16 табл.

ТЕПЛОПЕРЕДАЮЩИЕ КОМПОЗИЦИИ

... 1. Теплопередающая композиция, содержащая:(i) R-1243zf;(ii) второй компонент, выбираемый из R-32 (дифторметан), R-744 (CO), R-41 (фторметан), R-1270 (пропен), R-290 (пропан), R-161 (фторэтан) и их смесей; и(iii) третий компонент, выбираемый из R-134a (1,1,1,2-тетрафторэтан), R-125 (пентафторэтан), R-1234yf (2,3,3,3-тетрафторпроп-1-ен) и их смесей.2. Композиция по п.1, где второй компонент выбирают из R-32, R-744, R-161 и их смесей.3. Композиция по п.2, где второй компонент представляет собой R-32.4. Композиция по одному из пп.1-3, где третий компонент выбирают из R-134а, R-125 и их смесей.5. Композиция по п.1, где композицию выбирают из смеси:R-1243zf, R-32 и R-125;R-1243zf, R-32 и R-134a;R-1243zf, R-32, R-125 и R-134a;R-1243zf, R-744 и R-125;R-1243zf, R-32, R-744 и R-125;R-1243zf, R-161 и R-125;R-1243zf, R-744 и R-134a;R-1243zf, R-32, R-744 и R-134a; илиR-1243zf, R-161 и R-134a.6. Композиция по п.5, где композицию выбирают из смеси:R-1243zf, R-32 и R-125; илиR-1243zf, R-32, R-125 и R-134a ...

СПОСОБ ПОВЫШЕНИЯ ТЕМПЕРАТУР ВСПЫШКИ И ПОВЫШЕНИЯ МОРОЗОСТОЙКОСТИ ЛЕТУЧИХ ЭКОЛОГИЧЕСКИ БЕЗОПАСНЫХ РАСТВОРИТЕЛЕЙ

... 1. Способ повышения температуры вспышки экологически безопасного растворителя, включающий добавление к экологически безопасному растворителю по меньшей мере одного альфа-терпинового спирта.2. Способ по п.1, в котором количество по меньшей мере одного альфа-терпинового спирта составляет примерно от 0,05 до 5,0 мас.%, в расчете на общую массу экологически безопасного растворителя и по меньшей мере одного альфа-терпинового спирта.3. Способ по п.2, в котором количество по меньшей мере одного альфа-терпинового спирта составляет примерно от 2 до 3 мас.%, в расчете на общую массу экологически безопасного растворителя и по меньшей мере одного альфа-терпинового спирта.4. Способ по п.1, в котором по меньшей мере один альфа-терпиновый спирт выбирают из группы, состоящей из гемитерпена, алкалоидов, кумаринов, флаваноидов, монотерпенов, гераниола, цитронеллола, пинена, нерола, цитраля, камфоры, ментола, лимонена, туйона, сесквитерпенов, неролидола и фарнезола.5. Способ по п.1, в котором по меньшей мере ...

АЗЕОТРОПОПОДОБНЫЕ КОМПОЗИЦИИ ЦИС-1,1,1,4,4,4-ГЕКСАФТОР-2-БУТЕНА

KÜHLMITTELZUSAMMENSETZUNGEN

Reinigungslösung für elektronische Bauteile sowie Verfahren für ihre Verwendung

ZUSAMMENSETZUNG AUS 1,1,1,3,3-PENTAFLUOROBUTAN FÜR ENTFETTUNGS- UND TROCKNUNGSANWENDUNGEN ZUR ABLAGERUNGSENTFERNUNG

Packaged cleansing tissues

A sealable container houses a tissue impregnated with an organic solvent and sealed within a second sealable container. A tissue impregnated with an aqueous cleansing solution sealed is within a third sealable container housed in the first mentioned sealable container. This first container may also include one or more dry tissues. Typically the organic solvent is a petroleum based cleansing agent, for example ethoxyethane or benzene. Other organic solvents for removing grease, paint and the like may however be employed. The packaged tissues may be used by motorists whose hands become soiled by grease etc during work on a vehicle while on a journey.

Process for the separation of diastereomers

Cleaning method

CLEANING WITH LIQUID GASES

USE OF HALOGEN HYDROCARBON SOLVENTS

AZEOTROP SIMILAR COMPOSITIONS OF 1,1 - DICHLOR-1-FLUORÄTHAN, ETHANOL AND NITROMETHAN

USE OF HALOGEN HYDROCARBON SOLVENT AS CLEANING AGENTS

SOLVENT MIXTURE AS WELL AS CLEANING METHOD IT USING

COMPOSITION FOR THE CLEANING OF ENGINES, PROCEDURES AND DEVICE

PROCEDURE FOR CAPS SMELL MATERIALS

NOT CORROSIVE CLEANING AGENTS FOR THE DISTANCE OF ETCHING AGENT ARREARS

AZEOTROPÄHNLICHE COMPOSITIONS AND THEIR USE

COLD CLEANING FLUID ON BASIS OF ALKANES OR CYCLOALKANES AND AN ORGANIC COMPOUND WITH A KETOFUNKTION

EFFERVESCENT COMPOSITIONS

Metal and fiberglass cleaning and polishing article

Cold cleaning composition based on alkanes or cycloalkanes and an organic compound comprising a ketone group

Heat transfer compositions

A fluid dispensing system and methods relating thereto

A sprayer system includes a trigger sprayer having a trigger, a pump mechanism, and a nozzle. The sprayer system further includes a solvent reservoir for accommodating a solvent substance and a bottle for accommodating a concentrate substance. Further, the solvent reservoir is positioned above the trigger sprayer and is in fluid communication with the trigger sprayer and the bottle is positioned below the trigger sprayer and is in fluid communication with the trigger sprayer.

AZEOTROPE-LIKE COMPOSITIONS OF TRICHLOROTRIFLUOROETHANE, ETHANOL, NITROMETHANE, AND 2-METHYLPENTANE OR A MIXTURE OF HEXANES

AZEOTROPE-LIKE COMPOSITIONS OF TRICHLORO TRIFLUOROETHANE, ETHANOL, NITROMETHANE AND 2-METHYLPENTANE OR A MIXTURE OF HEXANES Azeotrope-like compositions comprising trichlorotrifluoroethane, ethanol, nitromethane and 2-methyl-pentane or a mixture of hexanes which are stable and have utility as degreasing agents and as solvents in a variety of industrial cleaning applications.

CLEANING COMPOSITION FOR WAX REMOVAL

A cleaning composition comprising (a) a halogenated and/or non-halogenated hydrocarbon, (b) a fluorinated alcohol, and optionally (c) a polar organic solvent other than the components (a) and (b), the composition being useful for removing waxes, which are used for temporarily fixing objects to be polished in the electronics or optical industry to a support, from the surfaces of the objects after the detachment from the support.

TOUCH SCREEN CLEANING AND PROTECTANT COMPOSITION

A cleaning and protectant composition and a method for using the composition on an article such as a touch screen or screen protector for a mobile device, computer, or other electronic device. The composition comprises a polymeric film former. The polymeric film former is an oxazoline homopolymer or an extended or a modified polymer based on an oxazoline homopolymer. The polymeric film former forms a retention coating to retain components within the composition for an extended period of time. The composition is also present in a kit with an application device.

WASH OIL FOR USE AS AN ANTIFOULING AGENT IN GAS COMPRESSORS

The present invention relates to wash oil for use as an antifouling agent in gas compressors, in particular in cracked gas compressors, comprising at least one compound according to formulae (II) wherein the moieties R2 and R3 are selected from a group comprising linear or branched C1-C20-alkyl, C3-C10-cycloalkyl and linear or branched C1-C10-alkyl substituted C3-C10-cycloalkyl and C6-C12 aryl and C1-C10-alkyl substituted C6-C12 aryl and wherein said moieties can be interrupted by oxygen or nitrogen and wherein said moieties can be functionalised with hydroxyl groups or amino groups and wherein said moieties can be the same or different. The invention relates also to the use of such wash oil as anti-fouling agent.

SOLVENT COMPOSITIONS FOR USE AS XYLENE OR TOLUENE SUBSTITUTES

The present disclosure provides, in part, a solvent composition including an acetic acid alkyl (C1-C4) ester and parachlorobenzotrifluoride.

CLEANING PROCESS AND COMPOSITION

A process for removing contaminants from the surface of a substrate comprises contacting the substrate with a cleaning composition comprising at least one mono-, di-, or trialkoxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylenecontaining perfluoroalkane compound, the compound optionally containing additional catenary heteroatoms. The compounds exhibit good solvency properties while being environmentally acceptable.

SURFACE ACTIVE AGENTS AND COMPOSITIONS CONTAINING THE SAME

CLEANING AGENT FOR SILICON WAFER

COATING SYSTEMS

The invention relates to a coating system, in particular a coating system containing an organometallic layer which allows the selective removal of post coating layers from substrates without detrimental impact to their "in-service" performance. The organometallic layer comprises (a) an organic polymer containing multi-chelating functionalities; and (b)a metallic agent which forms an organo metallic complex with the organic polymer containing multi-chelating functionalities and is located between an optionally coated substrate and at least one post coating layer of a coating system.

Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants

The separation of a contaminant from a substrate that carries the contaminant is disclosed. The process comprises contacting the substrate to a carbon dioxide fluid containing an amphiphilic species so that the contaminant associates with the amphiphilic species and becomes entrained in the carbon dioxide fluid. The substrate is then separated from the carbon dioxide fluid, and then the contaminant is separated from the carbon dioxide fluid.

Compositions for the stabilization of bromochloromethane

A combination of stabilizers and bromochloromethane are used as a cleaning composition in which the bromochloromethane is stabilized against decomposition and the release of bromine into the atmosphere.

Cleaning composition of dibasic ester, hydrocarbon solvent, compatibilizing surfactant and water

A cleaning composition is disclosed which is suitable for cleaning flux residue from a printed circuit board and comprises dibasic ester, a hydrocarbon solvent, a compatibilizing surfactant and water.

COMPOSITION COMPRISING HFC AND HFO

The present invention provides a composition comprising a mixture of HFC and HFO and having improved lubrication performance. Specifically, the present invention provides a composition comprising HFC and HFO, wherein the composition comprises 1) at least one of HFC-134a and HFC-134 as the HFC, 2) at least one of HFO-1234yf and HFO-1234ze as the HFO, and 3) at least one member selected from the group consisting of HCFC-1122, HCFC-124, CFC-1113, and 3,3,3-trifluoropropyne as a third component.

Solvent composition, cleaning method and method of forming a coating film

There is provided a solvent composition which is a stable solvent composition which is excellent in solubility of various organic substances, has a sufficient drying property, and has no adverse effect on a global environment, is stabilized not to decompose, and moreover suppresses metal corrosion under coexistence with metal, and which can be used without having an adverse effect on articles of various materials such as metal, plastic, and elastomer in a wide range of industrial uses such as cleaning and dilution coating uses. A solvent composition including: a solvent (A) including (Z)-1-chloro-3,3,3-trifluoro-1-propene; and a stabilizer (B) consisting of HCFC whose boiling point at normal pressure is not lower than 30° C. nor higher than 60° C.

Compositions and methods for cleaning contaminated articles

Disclosed are compositions and methods for cleaning contaminated articles based on the provision of a zeotropic composition comprising (a) at least one flammable solvent having a boiling point at a first pressure; (b) at least one first nonflammable solvent having a boiling point at said first pressure which is less than about said first pressure boiling point of said flammable solvent; and (c) at least one second nonflammable solvent having a boiling point at said first pressure which is greater than about the first pressure boiling point of said flammable solvent.

SUPERCRITICAL CARBON DIOXIDE/CHEMICAL FORMULATION FOR ASHED AND UNASHED ALUMINUM POST-ETCH RESIDUE REMOVAL

MIXED SOLVENT COMPOSITION

A mixed solvent composition containing at least one member selected between 1,1,1,2,3,4,4,5,5,5-decafluoropentane and perfluorohexane and dichloropentafluoropropane as the essential ingredient, or a mixed solvent composition containing at least one member selected between 1,1,1,2,3,4,4,5,5,5-decafluoropentane and perfluorohexane, dichloropentafluoropropane, and an alcohol as the essential ingredient.

НЕВОСПЛАМЕНЯЮЩИЕСЯ КОМПОЗИЦИИ, СОДЕРЖАЩИЕ ФТОРИРОВАННЫЕ СОЕДИНЕНИЯ, И ПРИМЕНЕНИЕ ЭТИХ КОМПОЗИЦИЙ

Изобретение относится к невоспламеняющимся композициям, включающим фторированное соединение, представляющее собой 1,1,1,3,3-пентафторбутан, 1,2-дихлорэтилен и эффективное количество стабилизатора фторированного соединения или 1,2-дихлорэтилена, где количество стабилизатора составляет меньше чем 0,5% масс. от композиции. Эти невоспламеняющиеся композиции могут быть использованы в качестве растворителей для очистки и удаления флюса с компонентов электронных устройств и для обезжиривания металлов. Композиции далее могут включать пропеллент, например 1,1,1,2-тетрафторэтан. Эти композиции в особенности пригодны в качестве промывающих агентов. 4 н.з. и 12 з.п. ф-лы, 9 пр., 2 табл.

КОМПОЗИЦИЯ ДЛЯ ХОЛОДНОЙ ОЧИСТКИ НА ОСНОВЕ АЛКАНОВ ИЛИ ЦИКЛОАЛКАНОВ И ОРГАНИЧЕСКОГО СОЕДИНЕНИЯ, СОДЕРЖАЩЕГО КЕТОННУЮ ФУНКЦИЮ

Композиция для холодной очистки, в неводной среде, состоящая по крайней мере из одной смеси алканов или смеси циклоалканов и по крайней мере одного органического соединения, содержащего по крайней мере одну кетонную функцию, отличающаяся тем, что смесь алканов или смесь циклоалканов и органическое соединение, содержащее по крайней мере одну кетонную функцию, имеют температуру вспышки выше или равную 40oС и ниже 55oC, и композиция имеет температуру вспышки выше или равную 40oC и ниже 55oC, измеряемую согласно норме ASTMD 56-70. Koмпoзицию можно применить для обезжиривания металлических деталей. Преимущество предложенной композиции заключается в ее легком удалении после операции обезжиривания. 11 з.п.ф-лы, 1 табл.

КОМПОЗИЦИЯ ДЛЯ ОЧИСТКИ ПОСЛЕ ХИМИКО-МЕХАНИЧЕСКОЙ ПОЛИРОВКИ

... 1. Композиция для очистки после химико-механической полировки, содержащая от около 1 до около 30 мас.% водорастворимого амина, от около 10 до около 59 мас.% водорастворимого органического растворителя, и от около 30 до около 89 мас.% деионизированной воды, по отношению к общей массе композиции.2. Композиция по п.1, где водорастворимый амин выбирается из гидразина, гидрата гидразина или их комбинации.3. Композиция по п.1, где водорастворимый органический растворитель выбирается из диметилсульфоксида (ДМСО), диольного соединения, N-метилпирролидона (NMP), диметилацетамида (ДМАЦ), диметилформамида (ДМФ) или их смеси.4. Композиция по п.3, где диольное соединение выбирается из простого монобутилового эфира диэтиленгликоля (БДГ), простого моноэтилового эфира этиленгликоля, простого диметилового эфира этиленгликоля, простого н-бутилового эфира этиленгликоля, ацетата простого монобутилового эфира этиленгликоля или их смеси.5. Композиция по п.1, где водорастворимый амин присутствует в количестве ...

ПРОМЫВНОЕ МАСЛО, ПРЕДНАЗНАЧЕННОЕ ДЛЯ ИСПОЛЬЗОВАНИЯ В КАЧЕСТВЕ СРЕДСТВА ПРОТИВ ОБРАЗОВАНИЯ ОТЛОЖЕНИЙ В ГАЗОВЫХ КОМПРЕССОРАХ

Изобретение относится к промывному маслу, предназначенному для использования в качестве средства против образования отложений в газовых компрессорах, в частности в компрессорах крекинг-газа, содержащему по меньшей мере три соединения, выбранные из группы, включающей соединения, соответствующие формулам (I), (IIa-c) и (IIIa-c), в которых фрагменты R1, R2, R3, R4, R5 и R6 выбраны из группы, включающей алкильные группы С1-С12 и циклоалкильные группы С3-С7, и по меньшей мере одну добавку, выбранную из группы, включающей ингибитор полимеризации, антиоксидант, деактиватор металла, поглотитель металла, ингибитор коррозии и добавку для регулирования рН, где отношение по меньшей мере трех соединений, соответствующих формулам (I), (IIa-c) и (IIIa-c), и по меньшей мере одной добавки, выбранной из группы, включающей ингибитор полимеризации, антиоксидант, деактиватор металла, поглотитель металла, ингибитор коррозии и добавку для регулирования рН, составляет от 1000/1 до 10/1, предпочтительно от 500/ ...

Состав для чистки канализационных труб

Изобретение касается бытовой химии, в частности составов для чистки канализационных труб. Цель изобретения - повышение растворяющей способности состава. Последний содержит, мас.%: NAOH 15 - 25 этанол 0,5 - 20 этиленгликоль 0,1 - 7,5 натриевое жидкое стекло 0,01 - 1 спирто-эфирная фракция с т.кип. 200 - 300°С 15 - 40, вода до 100. В этом случае время 100%-ного разрушения загрязнений снижается с 2 ч до 14 - 35 мин. 2 табл.

AZEOTROPÄHNLICHE ZUSAMMENSETZUNGEN UND IHRE VERWENDUNG

Verfahren zur Herstellung von Zusammensetzungen zum Entfeuchten oder Entfetten der Oberflächen von Festkörpern

TERNÄRE AZEOTROPE ZUSAMMENSETZUNGEN

REINIGUNGSMITTEL, VERFAHREN ZUR REINIGUNG VON HALBLEITERSUBSTRAT SOWIE VERFAHREN ZUR AUSBILDUNG DER LEITUNGSBAHNEN AUF HALBLEITERSUBSTRAT

Zubereitung und diese enthaltendes Detergensmaterial

NICHT KORRODIERENDE REINIGUNGSMITTEL ZUR ENTFERNUNG VON ÄTZMITTELRÜCKSTÄNDEN

Lösungsmittelzusammensetzung

Azeotropic compositions comprising fluorinated compounds for cleaning applications

The present invention relates to compositions comprising fluorinated olefins or fluorinated ketones, and at least one alcohol, halocarbon, hydrofluorocarbon, or fluoroether and combinations thereof. In one embodiment, these compositions are azeotropic or azeotrope-like. In another embodiment, these compositions are useful in cleaning applications as a degreasing agent or defluxing agent for removing oils and/or other residues from a surface.

Azeotrope-like compositions comprising 1-chloro-3,3,3-trifluoropropene

An azeotrope-like mixture consisting essentially of chlorotrifluoropropene and at least one component selected from the group consisting of a C 1 -C 3 alcohol, a C 5 -C 6 hydrocarbon, a halogenated hydrocarbon, methylal, methyl acetone, water, nitromethane, and combinations thereof.

Degreasing composition and production method thereof

As a method for producing a degreasing composition in the form of a slurry, crystallization of the composition during low-temperature storage being suppressed and the composition being used for preparing a cleaning liquid having little environmental impact, provided is a method including a step of obtaining a slurry by mixing a first liquid and a powdery silicate having a particle diameter ranging from 0.2 mm to 10 mm, wherein the first liquid contains an alkaline component composed of at least one of sodium hydroxide and potassium hydroxide, an alcohol having three or fewer carbon atoms, and water; and the degreasing composition contains, with respect to the total composition, 10 mass % to 60 mass % of the alkaline component, 0.1 mass % to 5 mass % of the alcohol, 1 mass % to 50 mass % of the silicate, and 20 mass % to 50 mass % of water including hydration water of the silicate, and contains no chelating agent.

Azeotrope-like compositions comprising 1-chloro-3,3,3-trifluoropropene

An azeotrope-like mixture consisting essentially of chlorotrifluoropropene and at least one component selected from the group consisting of a C 1 -C 3 alcohol, a C 5 -C 6 hydrocarbon, a halogenated hydrocarbon, methylal, methyl acetone, water, nitromethane, and combinations thereof.

Azeotrope-like compositions of tetrafluoropropene and alcohols

A composition including an effective amount of trans-1,3,3,3-tetrafluoropropene component combined with an effective amount of an alcohol selected from the group of methanol, ethanol, propanol, isopropanol, tert-butanol, isobutanol, 2-ethyl hexanol and any combination thereof, where the composition has azeotropic properties.

Azeotropic and azeotrope-like compositions of methyl perfluoroheptene ethers and heptane and uses thereof

The present disclosure provides azeotropic and azeotrope-like compositions comprised of methylperfluoroheptene ethers and heptane. The present disclosure also provides for methods of use for the azeotropic and azeotrope-like compositions.

Azeotropic and azeotrope-like compositions of methyl perfluoroheptene ethers and ethanol and uses thereof

The present disclosure provides azeotropic and azeotrope-like compositions comprised of methylperfluoroheptene ethers and ethanol. The present disclosure also provides for methods of use for the azeotropic and azeotrope-like compositions.

Composition and method for removing photoresist and bottom anti-reflective coating for a semiconductor substrate

A composition for removing photoresist and bottom anti-reflective coating from a semiconductor substrate is disclosed. The composition may comprise a nontoxic solvent, the nontoxic solvent having a flash point above 80 degrees Celsius and being capable of dissolving acrylic polymer and phenolic polymer. The composition may further comprise Tetramethylammonium Hydroxide (TMAH) mixed with the nontoxic solvent.

Process for removing polymeric fouling

A process is provided for removing polymeric fouling on process equipment surfaces to restore the efficiency of such equipment. This is accomplished by contacting the fouled equipment with a solvent comprising at least one non-aromatic hydrocarbon compound, or a mixture of one or more non-aromatic organic compounds and one or more aromatic hydrocarbon compounds, for a period of time sufficient to remove the polymeric fouling.

Low voc composition for releasing adherent deposits from a nonporous surface

Compositions and methods for release of adherent deposits from nonporous surfaces and substrates are provided. The compositions are low volatile organic compound (low VOC) compositions, solutions or mixtures that can be applied in a form that clings to the underlying surface while it is working. Adherent deposits removed using the compositions include grease and oil, and printers ink. The compositions may be used on any nonporous surface or substrate including metals, ceramics and plastics, without harming the surface or substrate. The composition may contain a thixotropic agent to act as an anti-shearing agent.

Photoresist removal

Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In another embodiment, a method for removing photoresist is provided. The method comprises the steps of applying a wet-cleaning composition comprising about 0.1 to about 30 weight percent strong base; about one to about 30 weight percent oxidant; about 20 to about 95 weight percent polar solvent; and removing the photoresist.

Liquid composition for cleaning semiconductor substrate and method of cleaning semiconductor substrate using the same

[Problems] An object of the present invention is to provide a cleaning liquid composition which removes residual liquid and contaminants after chemical-mechanical polishing (CMP) of the surface of a semiconductor substrate in the production process of a semiconductor circuit device; and a cleaning method using the cleaning liquid composition. [Means for Solution] The cleaning liquid composition according to the present invention comprises a quaternary ammonium hydroxide, 1-ethinyl-1-cyclohexanol, a complexing agent, diethylenetriamine pentamethylene phosphonate and water and has a pH of 9 to 13. By cleaning a wiring material with the cleaning liquid composition according to the present invention, the wiring material can be protected against contamination, corrosion, oxidation and generation of foreign substance that are originated from the production process of a semiconductor circuit device or the environment, so that a clean wiring surface can be obtained.

Cleaning Formulations and Method of Using the Cleaning Formulations

A water-rich hydroxylamine formulation for photoresist and post-etch/post-ash residue removal in applications wherein a semiconductor substrate comprises aluminum. The cleaning composition comprises from about 2 to about 15% by wt. of hydroxylamine; from about 50 to about 80% by wt. of water; from about 0.01 to about 5.0% by wt. of a corrosion inhibitor; from about 5 to about 45% by wt. of a component selected from the group consisting of: an alkanolamine having a pKa<9.0, a water-miscible solvent, and a mixture thereof. Employment of such composition exhibits efficient cleaning capability for Al substrates, minimal silicon etch while protecting aluminum for substrates comprising both materials.

SOLVENT COMPOSITION FOR REMOVING RADIOACTIVE SUBSTANCE AND REMOVING MATERIAL, AND METHOD FOR REMOVING RADIOACTIVE SUBSTANCE

The present invention relates to a solvent composition for removing radioactive substance, characterized by comprising at least one selected from hydrofluorocarbon, hydrofluoroether, and perfluoroketone as a medium for transporting the radioactive substance, and a method for removing a radioactive substance characterized by using the solvent composition for removing. 1. A method for removing a radioactive substance , by using a solvent composition which consists essentially of: hydrofluorocarbon or hydrofluoroether as a vehicle for transporting the radioactive substance.2. A method for removing a radioactive substance , by using a solvent composition which consists essentially of: hydrofluorocarbon as a vehicle for transporting the radioactive substance , wherein said hydrofluorocarbon is CHF , CHF , c-CHF , or CHF.3. The method for removing a radioactive substance according to claim 2 , wherein the solvent composition further comprises 3 to 15% by weight of ethanol based on the total weight of the removal solvent composition.4. A method for removing a radioactive substance claim 2 , by using a solvent composition which consists essentially of: hydrofluoroether as a vehicle for transporting the radioactive substance claim 2 , wherein said hydrofluoroether is CFOCH claim 2 , CFOCH claim 2 , CHFOCHF claim 2 , or F(CF(CF)CFO)CHFCF. This application claims priority to U.S. patent application Ser. No. 11/997,278, filed on Jan. 29, 2008, which is a United States national stage of Patent Cooperation Treaty application PCT/JP2005/013941, filed on Jul. 29, 2005, the contents of which are hereby incorporated by reference.1. The Field of the InventionThe present invention relates to a method for simply removing a low-concentration radioactive substance, a removing material suitable for the method, and a solvent composition for removing.2. The Relevant TechnologyAt present, it is considered that materials exposed to radiation in nuclear power plants or the like can be subjected ...

Cleaning compositions and methods

The present invention relates, in part, to compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent. Such compositions may optionally contain one or more alcohols or other co-solvent or agent and may be used to provide one or more cleaning applications.

LIQUID CONCENTRATE FOR CLEANING COMPOSITION, CLEANING COMPOSITION AND CLEANING METHOD

Provided is a liquid concentrate for cleaning composition which could exhibit excellent environmental safety etc. by adding afterward a predetermined amount of water, and also has excellent regeneration efficiency, and provided are a cleaning composition and a cleaning method thereof. Disclosed is a liquid concentrate for cleaning composition which is used as a mixture with water and is intended for cleaning an object to be cleaned in a clouded state, with a predetermined amount of water having been added thereto, the liquid concentrate for cleaning composition including, a first organic solvent which is a predetermined hydrophobic glycol ether compound or the like, and a second organic solvent which is a predetermined hydrophilic amine compound. 1. A liquid concentrate for cleaning composition for cleaning intended for being used as a mixture with water and also for cleaning an object to be cleaned in a clouded state with an amount of water which is a value in the range of 50 to 1900 parts by weight relative to 100 parts by weight of the liquid concentrate for cleaning composition ,the liquid concentrate for cleaning composition comprising, as organic solvents, at least a first organic solvent and a second organic solvent,wherein the first organic solvent is at least one compound selected from the group consisting of a hydrophobic glycol ether compound, a hydrophobic hydrocarbon compound, a hydrophobic aromatic compound, a hydrophobic ketone compound and a hydrophobic alcohol compound, which has a boiling point in the range of 140° C. to 190° C. and a solubility in water (measurement temperature: 20° C.) of 50% by weight or less;the second organic solvent is a hydrophilic amine compound having a boiling point in the range of 140° C. to 190° C. and a solubility in water (measurement temperature: 20° C.) of greater than 50% by weight;the amount of incorporation of the second organic solvent is adjusted to a value in the range of 0.3 parts to 30 parts by weight ...

Heat transfer compositions

The invention provides a heat transfer composition comprising (i) a first component selected from trans-1,3,3,3-tetrafluoropropene (R-1234ze(E)), cis-1,3,3,3-tetrafluoropropene (R-1234ze(Z)) and mixtures thereof; (ii) carbon dioxide (R-744); and (iii) a third component selected from 2,3,3,3-tetrafluoropropene (R-1234yf), 3,3,3-trifluoropropene (R-1243zf), and mixtures thereof.

Azeotrope-like compositions of (z)-1-chloro-3,3,3-trifluoropropene and hydrogen fluoride

Disclosed are azeotropic and azeotrope-like mixtures of (Z)-1-chloro-3,3,3-trifluoropropene (1233zd(Z)) and hydrogen fluoride. Such compositions are useful as an intermediate in the production of 1233zd(Z). The latter compound is useful as a nontoxic, zero ozone depleting fluorocarbon useful as a solvent, blowing agent, refrigerant, cleaning agent, aerosol propellant, heat transfer medium, dielectric, fire extinguishing composition and power cycle working fluid.

NON-AQUEOUS CLEANING LIQUID AND CLEANING METHOD

A non-aqueous cleaning liquid which is used for cleaning an ink flow path, through which a non-aqueous ink is circulated, in an ink jet recording apparatus including the ink flow path and with which a container composed of polyolefin is filled, includes a pigment and an organic solvent. In the non-aqueous cleaning liquid, a content of the pigment is 0.001% by mass to 0.5% by mass and an average particle size (d50) of the pigment is 10 nm to 500 nm. 1. A non-aqueous cleaning liquid which is used for cleaning an ink flow path , through which a non-aqueous ink is circulated , in an ink jet recording apparatus including the ink flow path and with which a container composed of polyolefin is filled , the non-aqueous cleaning liquid comprising:a pigment; andan organic solvent.2. The non-aqueous cleaning liquid according to claim 1 ,wherein a content of the pigment is 0.001% by mass to 0.5% by mass.3. The non-aqueous cleaning liquid according to claim 1 ,wherein an average particle size (d50) of the pigment is 10 nm to 500 nm.4. The non-aqueous cleaning liquid according to claim 1 ,wherein the pigment is an organic pigment.5. A method of cleaning an ink flow path claim 1 , through which a non-aqueous ink is circulated claim 1 , in an ink jet recording apparatus including the ink flow path claim 1 , the method comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'circulating the non-aqueous cleaning liquid according to through the ink flow path,'}{'sup': 2', '2, 'wherein the ink flow path includes a region which has a cross-sectional surface area of 100 μmto 1000 μmperpendicular to a circulation direction of the non-aqueous ink.'}6. A method of cleaning an ink flow path claim 1 , through which a non-aqueous ink is circulated claim 1 , in an ink jet recording apparatus including the ink flow path claim 1 , the method comprising:{'claim-ref': {'@idref': 'CLM-00002', 'claim 2'}, 'circulating the non-aqueous cleaning liquid according to through the ink flow path,'}{'sup ...

Universal Synthetic Golf Club Cleaner and Protectant, Method and Product-by-Process to Clean, Protect Golf Club Faces and Rejuvenate Golf Clubs Grips

The club cleaner, conditioner and protectant comprises alpha-olefins, low-odor aromatic solvents; and at least one base oil selected from the base oil group consisting of Hydroisomerized high base oils and HT Severe Hydro-cracked Base oils; as well as other (optional) ingredients. Also disclosed is a method for producing this product and related product-by-process. This product uses a formulated cleaning mixture to clean and restore the face of the club while rejuvenating the grips. The invention when sprayed on the clubface removes foreign materials and when wiped dry protects the face of the clubs from harsh stains, caused by soils, grass and chemicals related to fertilizers. In experimental testing, the invention increases drive distances by reducing sidespin and increasing backspin. The club is left with a factory-like finish making it easy to wipe clean of soiling. The invention when applied to the grips restores the surface to the new feel. 1. A method for cleaning a golf club , comprising: alpha-olefins;', 'low-odor aromatic solvents; and', 'at least one base oil selected from the base oil group consisting of hydroisomerized high base oils and HT severe hydrocracked base oils., 'applying to a clubface of said golf club, a synthetic golf club cleaner and protectant comprising2. The method of claim 1 , further comprising applying said synthetic golf club cleaner and protectant to a grip of said golf club.3. The method of claim 1 , said synthetic golf club cleaner and protectant further comprising:low-flash mineral spirits which have been subjected to hydrodesulfurization.4. The method of claim 3 , said synthetic golf club cleaner and protectant further comprising:calcium sulfonates.5. The method of claim 3 , said synthetic golf club cleaner and protectant further comprising:methyl-isobutyl ketones; andsolvent-activated fragrance.6. The method of claim 5 , said synthetic golf club cleaner and protectant further comprising:solvent-activated dyes.7. The method of ...

STRIPPER SOLUTIONS EFFECTIVE FOR BACK-END-OF-LINE OPERATIONS

Back end of line (BEOL) stripping solutions which can be used in a stripping process that replaces etching resist ashing process are provided. The stripping solutions are useful for fabricating circuits and/or forming electrodes on semiconductor devices for semiconductor integrated circuits with good efficiency and with low and acceptable metal etch rates. Methods for their use are similarly provided. The preferred stripping agents contain a polar aprotic solvent, water, an amine and a quaternary hydroxide that is not tetramethylammonium hydroxide. Further provided are integrated circuit devices and electronic interconnect structures prepared according to these methods. 2. The stripper solution of claim 1 , wherein the stripper solution additionally contains glycerine and the polar aprotic solvent is selected from the group consisting of dimethyl sulfoxide and 1-formylpiperidine.3. The stripper solution of claim 1 , wherein the aprotic solvent comprises from about 40% to about 90% of the composition; water comprises from about 2% to about 15% of the composition; the quaternary hydroxide comprises from about 1% to about 10% of the composition; and the amine comprises from about 2% to about 60% of the composition.4. The stripper solution of claim 3 , wherein the aprotic solvent is dimethyl sulfoxide.5. The stripper solution of claim 1 , wherein Z is P.6. The stripper solution of claim 3 , wherein said amine is an alkanolamine having at least two carbon atoms claim 3 , at least one amino substituent and at least one hydroxyl substituent claim 3 , the amino and hydroxyl substituents attached to different carbon atoms.7. The stripper solution of claim 3 , wherein the quaternary hydroxide comprises tetrabutyl phosphonium hydroxide claim 3 , tetraphenyl phosphonium hydroxide claim 3 , methyl triphenyl phosphonium hydroxide claim 3 , ethyl triphenyl phosphonium hydroxide claim 3 , propyl triphenyl phosphonium hydroxide claim 3 , butyl triphenyl phosphonium hydroxide claim 3 ...

Solvent Compositions Including 1-Chloro-3,3,3-Trifluoropropene And Uses Thereof

The present invention relates to solvent compositions including an effective amount of 1-chloro-3,3,3-trifluoropropene and uses thereof. In certain aspects, such solvent compositions may be applied to the surface of an article or portion of an article having an ink or ink-based marking so as to remove the ink or ink-based marking without deleteriously impacting the article or surface of the article.

PROCESS FOR REMOVING POLYMERIC FOULING

A process is provided for removing polymeric fouling on process equipment surfaces to restore the efficiency of such equipment. This is accomplished by contacting the fouled equipment with a solvent comprising at least one non-aromatic hydrocarbon compound, or a mixture of one or more non-aromatic organic compounds and one or more aromatic hydrocarbon compounds, for a period of time sufficient to remove the polymeric fouling. 1. A process for removing polymeric fouling on process equipment surfaces comprising the steps of:contacting polymeric fouling on one or more process equipment surfaces with a solvent capable of dissolving the polymeric fouling, the solvent comprising at least one non-aromatic organic compound and at least one aromatic hydrocarbon compound; andmaintaining contact of the polymeric fouling with the solvent at a temperature of from about 115° F. (about 50° C.) to about 600° F. (about 320° C.) for a time sufficient to dissolve at least a portion of the polymeric fouling.2. The process of wherein the solvent comprises from about 5% volume to about 50% volume diphenylethane claim 1 , from about 5% volume to about 50% volume ethylenated benzenes claim 1 , and from about 20% volume to about 80% volume diesel fuel claim 1 , kerosene claim 1 , or a combination of diesel fuel and kerosene.3. The process of including the additional steps of:obtaining a sample of the polymeric fouling from one or more of the fouled process equipment surfaces; andselecting a suitable solvent or custom solvent that dissolves at least a portion of the polymeric fouling sample.4. The process of including the additional steps of:recovering the solvent containing dissolved polymeric fouling;recovering the polymeric fouling from the solvent;recycling the recovered solvent to a process equipment surface having polymeric fouling.5. The process of wherein the polymeric fouling on at least one process equipment surface occurred during a monomer polymerization process.6. The process of ...

HEAT TRANSFER COMPOSITIONS

The invention provides a heat transfer composition consisting essentially of from about 60 to about 85% by weight of trans-1,3,3,3-tetrafluoropropene (R-1234ze(E)) and from about 15 to about 40% by weight of fluoroethane (R-161). The invention also provides a heat transfer composition comprising R-1234ze(E), R-161 and 1,1,1,2-tetrafluoroethane (R-134a). 1. A heat transfer composition consisting essentially of from about 60 to about 85% by weight of trans-1 ,3 ,3 ,3-tetrafluoropropene (R-1234ze(E)) and from about 15 to about 40% by weight of fluoroethane (R-161).2. A composition according to claim 1 , consisting essentially of from about 65 to about 82% by weight of R-1234ze(E) and from about 18 to about 35% by weight of R-161.3. A heat transfer composition comprising R-1234ze(E) claim 1 , R-161 and 1 claim 1 ,1 claim 1 ,1 claim 1 ,2-tetrafluoroethane (R-134a).4. A composition according to comprising up to about 50% by weight of R-134a.5. A composition according to comprising from about 4 to about 20% by weight R-161 claim 4 , from about 25 to about 50% R-134a claim 4 , and from about 30 to about 71% by weight R-1234ze(E).6. A composition according to claim 3 , consisting essentially of R-1234ze(E) claim 3 , R-161 and R-134a.7. A composition according to claim 1 , wherein the composition has a GWP of less than 1000 claim 1 , preferably less than 150.8. A composition according to claim 1 , wherein the temperature glide is less than about 10K claim 1 , preferably less than about 5K.9. A composition according to claim 1 , wherein the composition has a volumetric refrigeration capacity within about 15 of the existing refrigerant that it is intended to replace.10. A composition according to claim 1 , wherein the composition is less flammable than R-161 alone or R-1234yf alone.12. A composition according to which has a fluorine ratio (F/(F+H)) of from about 0.42 to about 0.7 claim 1 , preferably from about 0.46 to about 0.67.13. A composition according to which is non- ...

OFFSET PRINTING BLANKET CLEANING LIQUID, METHOD OF CLEANING OFFSET PRINTING BLANKET, METHOD OF MANUFACTURING DISPLAY UNIT, METHOD OF MANUFACTURING PRINTED MATERIAL, AND INK COMPOSITION AND PRINTING METHOD USING THE SAME

An offset printing blanket cleaning liquid includes: a solvent having a dipole moment of about 1.7 or more but less than about 4.1 and having a π covalent bond in a molecular skeleton thereof. Moreover, an ink composition includes: an organic material; and a solvent having a dipole moment of about 1.3 to about 3.0 both inclusive and having a π covalent bond in a molecular skeleton thereof. 1. An offset printing blanket cleaning liquid comprising: a solvent having a dipole moment of about 1.7 or more but less than about 4.1 and having a π covalent bond in a molecular skeleton thereof.2. The offset printing blanket cleaning liquid according to claim 1 , wherein the solvent includes one or more kinds selected from a group consisting of 1 claim 1 ,2-dimethoxybenzene claim 1 , 1 claim 1 ,3-dimethoxybenzene claim 1 , acetophenone claim 1 , cyclohexanone claim 1 , 2-pentanone claim 1 , 3-pentanone claim 1 , 4-pentanone claim 1 , N-methyl-2-pyrrolidone claim 1 , and 1 claim 1 ,3-dimethyl-2-imidazolidinone.3. The offset printing blanket cleaning liquid according to claim 1 , wherein the content of the solvent is within a range of about 50% to about 100% both inclusive.4. A method of cleaning an offset printing blanket comprising: immersing a blanket in a cleaning liquid including a solvent claim 1 , the solvent having a dipole moment of about 1.7 or more but less than about 4.1 and having a π covalent bond in a molecular skeleton thereof.5. The method of cleaning an offset printing blanket according to claim 4 , wherein the blanket is immersed in the cleaning liquid while supplying the cleaning liquid.6. The method of cleaning an offset printing blanket according to claim 4 , wherein the blanket is formed of silicone rubber.7. A method of manufacturing a display unit comprising: forming a display device on a substrate claim 4 ,wherein the forming of the display device includes:immersing a blanket in a cleaning liquid including a solvent, the solvent having a dipole moment of ...

COMPOSITIONS CONTAINING CHLOROFLUOROOLEFINS OR FLUOROOLEFINS

Compositions and methods based on the use of fluoroalkene containing from 3 to 4 carbon atoms and at least one carbon-carbon double bond, such as HFO-1214, HFO-HFO-1233, or HFO-1354, having properties highly beneficial in foaming and blowing agent applications, articles and methods. 1. A method for forming a foam comprising: {'br': None, 'sub': z', '3−z, 'XCFR\u2003\u2003(I)'}, 'providing a foamable composition comprising a blowing agent comprising at least one compound according to Formula I'}{'sub': 2', '3, 'where X is a Cor a Cunsaturated, chlorine and/or fluorine substituted alkyl group, each R is independently Cl, F, Br, I or H, and z is 1 to 3, said compound having an acute toxicity level substantially less than the acute toxicity level of HFO-1223xd, said compound(s) in accordance with Formula I being present in said blowing agent in an amount of at least about 50% by weight.'}2. The method of wherein z is at least 2.3. The method of wherein z is 3.4. The method of wherein said compound has an acute toxicity level at least about 30 relative percent less than the acute toxicity level of HFO-1223xd.5. The method of wherein said compound comprises 1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene (HFO-1233zd).6. The method of wherein said blowing agent further comprises at least one haloolefin selected from the group consisting of dichloro-tetrafluoro-propene and tetrafluorobutene and combinations of these.7. The method of wherein said blowing agent further comprises at least one co-blowing agent selected from the group consisting of include linear claim 1 , branched and cyclic hydrocarbons claim 1 , halocarbons claim 1 , alcohols claim 1 , ketones claim 1 , esters claim 1 , ethers claim 1 , and acetals.8. The method of wherein said co-blowing agent is an alcohol selected from the group consisting of methanol claim 7 , ethanol claim 7 , propanol claim 7 , isopropanol claim 7 , and butanol.9. A foam formed by the method of .10. A blowing agent comprising at least ...

Aluminum post-etch residue removal with simultaneous surface passivation

Al post-etch residue removal composition doped with an alkanoic acid of the formula R—COOH, where R can be a linear or branched alkyl group in the form of C n H 2n+1 , where n is from 4 to 19, simultaneously passivates exposed Al surfaces while removing post-etch residues.

AZEOTROPIC COMPOSITIONS COMPRISING METHYL PERFLUOROPENTENE ETHERS FOR CLEANING APPLICATIONS

The present disclosure provides azeotropic and azeotrope-like compositions comprised of methylperfluoropentene ethers and at least one of methanol, ethanol, 2-propanol, hexane, heptane, trans-1,2-dichloroethylene, ethyl formate, methyl formate, HFE-7100, HFE-7200 and 1-bromopropane or combinations thereof. The present disclosure also provides for methods of use for the azeotropic and azeotrope-like compositions. 1. An azeotropic or azeotrope-like compositions comprising methyl perfluoropentene ethers and at least one of methanol , ethanol , 2-propanol , hexane , heptane , trans-1 ,2-dichloroethylene , ethyl formate , methyl formate , HFE-7100 , HFE-7200 and 1-bromopropane or combinations thereof.2. An azeotropic or azeotrope-like composition as in claim 1 , wherein the compositions comprises an azeotropic or azeotrope-like composition selected from the group consisting of:about 14 to about 68 percent by weight of methyl perfluoropentene ethers and about 32 to about 86 percent by weight of trans-1,2-dichloroethylene;about 72 to about 95 percent by weight of methyl perfluoropentene ethers and about 5 to about 28 percent by weight methanol;about 72 to about 96 percent by weight of methyl perfluoropentene ethers and about 4 to about 28 percent by weight ethanol;about 70 to about 95 percent by weight of methyl perfluoropentene ethers and about 5 to about 30 percent by weight 2-propanol;about 1 to about 99 percent by weight of methyl perfluoropentene ethers and about 1 to about 9 percent by weight hexane;about 1 to about 15 percent by weight of methyl perfluoropentene ethers and about 85 to about 99 percent by weight n-heptane;about 85 to about 99 percent by weight of methyl perfluoropentene ethers and about 1 to about 15 percent by weight n-heptane;about 1 to about 73 percent by weight of methyl perfluoropentene ethers and about 27 to about 99 percent by weight cyclopentane;about 26 to about 79 percent by weight of methyl perfluoropentene ethers and about 21 to about 74 ...

Methods For Cleaning Articles Using N-propyl Bromide Based Solvent Compositions

Methods for cleaning articles using n-propyl bromide-based solvent compositions are provided. According to one method, an article to be cleaned is contacted with a solvent composition comprising about 50 weight percent to about 99 weight percent n-propyl bromide and about 0.5 weight percent to about 50 weight percent of an alcohol. Such methods remove at least one of water or water soluble contaminants. Such methods are useful as a degreaser and/or cleaner in both cold cleaning and hot rinsing systems for cleaning articles. 1. A method of cleaning an article , the method comprises contacting the article with a solvent composition comprising n-propyl bromide ranging from about 50 weight percent to about 99 weight percent and an alcohol ranging from about 0.5 weight percent to about 50 weight percent for removing at least one of water or water soluble contaminants.2. The method of wherein the concentration of n-propyl bromide ranges from about 70 weight percent to about 98 weight percent.3. The method of wherein the alcohol is an aliphatic monohydric alcohol.4. The method of wherein the alcohol is selected from a group consisting of 1-propanol claim 1 , isopropyl alcohol claim 1 , 1-butanol claim 1 , 2-butanol claim 1 , isobutyl alcohol claim 1 , tertiary butyl alcohol claim 1 , 1-heptanol claim 1 , 1-hexanol and pentanol claim 1 , including mixtures thereof.5. The method of wherein the concentration of the said alcohol ranges from about 2 weight percent to about 30 weight percent.6. The method of wherein the article is selected from a group consisting of metal products claim 1 , glass products claim 1 , plastics claim 1 , polymeric substrates claim 1 , electronic components or articles claim 1 , and combinations thereof.7. The method of cleaning of which is selected from vapor degreasing claim 1 , cold cleaning claim 1 , hand wipes claim 1 , aerosols and sprays.8. The method of wherein the article is contacted with the said solvent by dipping in a sump filled with ...

Water-rich stripping and cleaning formulation and method for using same

The present invention relates to water-rich formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, residues from Al back-end-of-the-line interconnect structures, as well as contaminations. The formulation comprises: hydroxylamine; corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline; an alkanolamine, a water-soluble solvent or the combination of the two; and at least 50% by weight of water.

POLYMER-CLEANING COMPOSITION

The present disclosure relates to a dimethyl sulfoxide composition suitable for cleaning polymer residue found on the devices used for processing plastic materials, in particular polyurethane. 114-. (canceled)15. A composition comprising:from 50% to 95% of dimethyl sulfoxide (DMSO);from 1% to 30% of at least one amine;from 0% to 30% of water; andfrom 0% to 10% of at least one additive.16. The composition according to claim 15 , wherein the composition comprises:from 50% to 95% of dimethyl sulfoxide (DMSO);from 1% to 30% of at least one amine;from 1% to 30% of water; andfrom 0% to 10% of at least one additive.17. The composition according to claim 15 , wherein the composition consists of:from 40% to 95% of dimethyl sulfoxide (DMSO);from 1% to 30% of at least one amine;from 0% to 30% of water; andfrom 0% to 10% of at least one additive.18. The composition according to claim 15 , wherein the at least one amine is chosen from primary claim 15 , secondary or tertiary amines with a molecular weight of less than 500 daltons.19. The composition according to claim 15 , wherein the at least one amine is chosen from primary claim 15 , secondary or tertiary amines with a molecular weight of less than 300 daltons.20. The composition according to claim 15 , wherein the at least one amine is chosen from primary and secondary amines.21. The composition according to claim 15 , wherein the at least one amine comprises a single amine function and at least one oxygen atom.22. The composition according to claim 15 , wherein the at least one amine comprises one or two groups chosen from hydroxyalkyl and alkoxyalkyl groups claim 15 , wherein alkyl represents methyl claim 15 , ethyl claim 15 , propyl claim 15 , or butyl groups.23. The composition according to claim 15 , wherein the at least one amine comprises one or two groups chosen from hydroxyethyl and methoxy groups.24. The composition according to claim 15 , wherein the at least one amine is chosen from monoethanolamine (MEoA) claim ...

ENVIRONMENTALLY-FRIENDLY SOLVENT FOR WASHING AND DRY-CLEANING, AND LAUNDRY COMPOSITION INCLUDING THE SAME

The present invention relates to a solvent for cleaning textiles or clothes. The present invention provides a solvent for cleaning which has a specified formula that is safe on the human body and environment, as well as good cleaning ability against oil-based and water-based contaminants and can be quickly dried. The solvent of the present invention and a composition comprising the same can be effectively used to water clean or dry clean textiles or clothes at home. 2. The solvent of claim 1 , wherein Rand Rare each methyl claim 1 , and Ris hydrogen.3. The solvent of claim 1 , wherein Rand Rare methyl and ethyl claim 1 , respectively claim 1 , and Ris hydrogen.4. The solvent of claim 1 , wherein Rand Rare methyl and isobutyl claim 1 , respectively claim 1 , and Ris hydrogen.5. The solvent of claim 1 , wherein Rand Rare butyl and hydrogen claim 1 , respectively claim 1 , and Ris hydrogen.6. A composition for cleaning textiles or clothes claim 1 , comprising the solvent of .7. The composition of claim 6 , which is used for dry-cleaning.8. The composition of claim 6 , which further comprises water.9. The composition of claim 8 , wherein water is present in an amount of 20 wt % or less based on the total weight of the composition.10. A method of cleaning textiles or clothes claim 1 , characterized by using the solvent of . The present invention relates to a solvent for cleaning, e.g., water-cleaning and dry-cleaning of textiles and clothes, and a composition for water-cleaning or dry-cleaning, which comprises the solvent.This application claims priority to Korean Patent Application No. 10-2011-0020345 filed in the Republic of Korea on Mar. 8, 2011, the entire contents of which are incorporated herein by reference.This application also claims priority to Korean Patent Application No. 10-2011-0108903 filed in the Republic of Korea on Oct. 24, 2011, the entire contents of which are incorporated herein by reference.The cleaning process of textiles and clothes generally ...

Industrial Chemicals

The chemical solvent disclosed includes a means for cleaning and maintaining industrial process components including one or more of a valve, a pump, a pipeline, and a drilling system.

Preparations for All-Purpose Cleaning Compositions

Multi-purpose cleaning compositions, in particular multi-purpose aqueous alkaline compositions for cleaning surfaces, and base preparations for this purpose. Such base preparations comprise one or more solvents that are at least partially water-miscible, one or more alkali metal salts of carboxylic acids, and water. Such multi-purpose cleaning compositions comprise at least such base preparation, a surfactant, a basifying agent, and water. 2. The aqueous base preparation according to claim 1 , further comprising at least one cosolvent selected from the group consisting of dioxolane derivatives claim 1 , glycol ethers claim 1 , alcohols claim 1 , and glycols.3. The aqueous base preparation according to claim 2 , wherein said cosolvent is selected from the group consisting of glycol monoethers claim 2 , glycol diethers claim 2 , glycol triethers claim 2 , C1-C6 alcohols claim 2 , and C2-C6 glycols.4. The aqueous base preparation according to claim 1 , wherein said dioxolanes are the result of a reaction between glycerol and aldehydes or ketones.5. The aqueous base preparation according to claim 1 , wherein said solvent is a dioxolane selected from the group consisting of 2 claim 1 ,2-dimethyl-1 claim 1 ,3-dioxolane-4-methanol claim 1 , 2 claim 1 ,2-diisobutyl-1 claim 1 ,3 -dioxolane-4-methanol claim 1 , 2-isobutyl-2-methyl-1 claim 1 ,3-dioxolane-4-methanol claim 1 , 2-butyl-2-ethyl-1 claim 1 ,3-dioxolane-4-methanol claim 1 , and 2-phenyl- 1 claim 1 ,3-dioxolane-4-methanol.6. The aqueous base preparation according to claim 2 , wherein said cosolvent is a glycol ether selected from the group consisting of:ethylene glycol monobutyl (or n-butyl or t-butyl) ether;ethylene glycol monoethyl ether;ethylene glycol monopropyl (or isopropyl) ether;ethylene glycol monophenyl ether;ethylene glycol monobenzyl ether;ethylene glycol hexyl ether;diethylene glycol monoethyl ether;diethylene glycol mono-n-butyl ether;diethylene glycol diethyl ether;diethylene glycol dimethyl ether; ...

Azeotrope-Like Compositions of Pentafluoroethane and Trifluoroiodomethane

Provided are azeotrope-like compositions comprising heptafluoropropane and trifluoroiodomethane and uses thereof, including use in refrigerant compositions, refrigeration systems, blowing agents, fire suppressant compositions, and aerosol propellants.

COMPOSITIONS OF HYDROCHLOROFLUOROOLEFINS

The present invention relates to solvent/cleaner and heat transfer fluid compositions comprising at least one hydrochlorofluoroolefin (HCFO), 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd), particularly the trans-isomer. The HCFO of the present invention can be used in combination with co-agents including, hydrofluorocarbons (HFCs), hydrofluomolefins (HFOs), hydrocarbons, ethers including hydrofluoroethers (HFEs), esters, ketones, alcohols, 1,2-transdichloroethylene and mixtures thereof. 1. A solvent/cleaner composition comprising the hydrochloroolefin 1233zd and an alcohol wherein the hydrochlorafluorolefin 1233zd comprises about 70 wt % or more the trans steroisomer of hydrochloroolefin. 1233zd.2. The solvent/cleaner composition of wherein said hydrochlorofluoroolefin 1233zd comprises about 90 wt % or more said trans stereoisomer.3. The solvent/cleaner composition of wherein said hydrochlorofluoroolefin 1233zd comprises about 97 wt % or more said trans stereoisomer.4. The solvent/cleaner composition of wherein said alcohol is selected from the group consisting of methanol claim 1 , ethanol and iso-propanol.5. The solvent/cleaner composition of claim 1 , further comprising hydrofluorocarbons claim 1 , hydrofluoroolefins claim 1 , hydrocarbons claim 1 , ethers claim 1 , hydrofluoroethers claim 1 , esters claim 1 , ketones claim 1 , 1 claim 1 ,2-transdichloroethylene and mixtures thereof.6. The solvent/cleaner composition of wherein said ester is selected from the group consisting of methyl formate claim 5 , methyl acetate claim 5 , ethyl formate and ethyl acetate.7. The solvent/cleaner composition of having a Kauri-butanol value of greater than about 15.8. The solvent/cleaner composition of having a Kauri-butanol value of greater than about 20.9. A method of removing contaminates from a surface comprising contact said surface with a liquid and/or vapor comprising the hydrochlorofluoroolefin 1233zd and an alcohol wherein said hydrochlorofluoroolefin 1233zd comprises ...

NON-FLAMMABLE COMPOSITIONS OF CHLORO-TRIFLUOROPROPENE

The present invention relates to non-flammable compositions comprising chlorotrifluoropropene with reduced risk of flammability which are useful as refrigerants, heat transfer fluids, solvents, cleaners, blowing agents, aerosols, extraction fluids, and the like. 1. A non-flammable composition comprising (1) from between 95 wt % to 99.996 wt % of a chlorotrifluoropropene selected from the group consisting of 1-chloro-3 ,3 ,3-trifluoropropene , 2-chloro-3 ,3 ,3-trifluoropropene; and mixtures thereof and (2) from between 5 wt % and 0.001 wt % of a fluoropropene selected from the group consisting of 1 ,3 ,3 ,3-tetrafluoropropene; 3 ,3 ,3-trifluoropropene; and mixtures thereof.2. (canceled)3. The non-flammable composition of where the vapor of said composition is non-flammable at at least one temperature from between 100° C. to 20° C. when mixed with humid air at at least once concentration from between 3 vol % to 22 vol % claim 1 , where the humidity of the air is approximately 50% relative humidity.4. (canceled)5. The non-flammable composition of where the 1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene is greater than 70% the trans-isomer.6. The non-flammable composition of where the 1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene is greater than 90% the trans-isomer.7. The non-flammable composition of where the 1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene is greater than 95% the trans-isomer.8. The non-flammable composition of where the 1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene is greater than 99% the trans-isomer.9. The non-flammable composition of where the 1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene is essentially the trans-isomer.10. The non-flammable composition of further comprising a hydrofluorocarbon claim 1 , hydrochlorofluorocarbon claim 1 , chlorofluorocarbon claim 1 , hydrofluoroolefin claim 1 , hydrochlorofluoroolefin claim 1 , hydrocarbon claim 1 , hydrofluoroether claim 1 , ether claim 1 , ester claim 1 , ketone claim 1 , ...

Azeotrope-like compositions of tetrafluoropropene and hydrofluorocarbons

Provided are azeotrope-like compositions comprising tetrafluoropropene and hydrofluorocarbons and uses thereof, including use in refrigerant compositions, refrigeration systems, blowing agent compositions, and aerosol propellants.

COMPOSITIONS OF 2,4,4,4-TETRAFLUOROBUT-1-ENE AND CIS-1,1,1,4,4,4-HEXAFLUOROBUT-2-ENE

A composition including 2,4,4,4-10-tetrafluorobut-1-ene and cis-1,1,1,4,4,4-hexafluorobut-2-ene, and also the use thereof in particular as a heat transfer fluid. The composition may include: from 1% to 99% of 2,4,4,4-tetrafluorobut-1-ene and from 1% to 99% of cis-1,1,1,4,4,4-hexafluorobut-2-ene; preferably from 5% to 70% of 2,4,4,4-tetrafluorobut-1-ene and from 30% to 95% of cis-1,1,1,4,4,4-hexafluorobut-2-ene; preferably from 20% to 65% of 2,4,4,4-tetrafluorobut-1-ene and from 35% to 80% of cis-1,1,1,4,4,4-hexafluorobut-2-ene; preferably from 25% to 60% of 2,4,4,4-tetrafluorobut-1-ene and from 40% to 75% of cis-1,1,1,4,4,4-hexafluorobut-2-ene; preferably from 28% to 51% of 2,4,4,4-tetrafluorobut-1-ene and from 49% to 72% of cis-1,1,1,4,4,4-hexafluorobut-2-ene. 1. A composition comprising 2 ,4 ,4 ,4-tetrafluorobut-1-ene and cis-1 ,1 ,1 ,4 ,4 ,4-hexafluorobut-2-ene.2. The composition as claimed in claim 1 , consisting of a mixture of 2 claim 1 ,4 claim 1 ,4 claim 1 ,4-tetrafluorobut-1-ene and cis-1 claim 1 ,1 claim 1 ,1 claim 1 ,4 claim 1 ,4 claim 1 ,4-hexafluorobut-2-ene.3. The composition as claimed in claim 1 , comprising:from 1% to 99% of 2,4,4,4-tetrafluorobut-1-ene and from 1% to 99% of cis-1,1,1,4,4,4-hexafluorobut-2-ene;preferably from 5% to 70% of 2,4,4,4-tetrafluorobut-1-ene and from 30% to 95% of cis-1,1,1,4,4,4-hexafluorobut-2-ene;preferably from 20% to 65% of 2,4,4,4-tetrafluorobut-1-ene and from 35% to 80% of cis-1,1,1,4,4,4-hexafluorobut-2-ene;preferably from 25% to 60% of 2,4,4,4-tetrafluorobut-1-ene and from 40% to 75% of cis-1,1,1,4,4,4-hexafluorobut-2-ene;preferably from 28% to 51% of 2,4,4,4-tetrafluorobut-1-ene and from 49% to 72% of cis-1,1,1,4,4,4-hexafluorobut-2-ene.4. A heat-transfer fluid comprising the composition as claimed in .5. The heat-transfer fluid as claimed in claim 4 , in which the composition is quasi-azeotropic claim 4 , preferably azeotropic.6. The heat-transfer fluid as claimed in claim 4 , in which the composition is ...

METAL SILICATE AND ORGANIC DEPOSIT INHIBITOR/DISPERSANT FOR THERMAL RECOVERY OPERATIONS OF HYDROCARBON FUELS

The present invention generally relates to methods for removing an organic deposit or for inhibiting deposition of deposit-forming comprising contacting a cleaning composition or an anti-coking composition with a surface. The surface can have an organic deposit or be susceptible to forming an organic deposit and the surface can be in contact with a liquid containing organics. The liquid can be produced from a thermal recovery system, and the surface can be an internal surface of a piece of steam-generating or vapor-generating equipment. 1. A method for removing an organic deposit or for inhibiting deposition of deposit-forming organics comprising contacting a cleaning composition with a surface , the surface having an organic deposit or being susceptible to forming an organic deposit and the surface being in contact with a liquid containing organics , the liquid being produced from a thermal recovery system , and the surface being an internal surface of a piece of steam-generating or vapor-generating equipment; wherein the cleaning composition comprises an alkoxylated polymer , an alkoxy alcohol , and an aromatic solvent.2. The method of wherein the alkoxylated polymer comprises an alkoxylated alkylphenol-formaldehyde polymer.3. The method of wherein the alkoxylated polymer comprises an ethoxylated nonylphenol-formaldehyde polymer.4. The method of wherein the nonylphenol-formaldehyde polymer has a molar ratio of nonylphenol to formaldehyde of about 1:1.5. The method of claim 4 , wherein the molar ratio of ethylene oxide to nonylphenol-formaldehyde polymer is from about 6:1 to about 10:1.6. The method of claim 5 , wherein the molecular weight of the ethoxylated nonylphenol polymer is from about 4000 to about 10000 Daltons.7. The method of claim 6 , wherein the molar ratio of ethylene oxide to nonylphenol-formaldehyde polymer is from about 8:1 to about 10:1 and the molecular weight of the polymer is from about 4000 to about 5500 Daltons.8. The method of wherein the ...

Heat Transfer Compositions

The invention provides a heat transfer composition comprising: 1. A heat transfer composition comprising:from about 5% to about 40% by weight of R-1234ze(E);from about 20% to about 35% by weight R-32;from about 15% to about 30% by weight R-125; andfrom about 12% to about 50% by weight R-134a.2. A composition according to claim 1 , wherein the composition has a GWP of less than 1800.3. A composition according to claim 1 , wherein the temperature glide is less than about 15 k.4. A composition according to claim 1 , wherein the composition has a volumetric refrigeration capacity within about 15% of the existing refrigerant that it is intended to replace.5. A composition according to claim 1 , wherein the composition is less flammable than R-32 alone.6. A composition according to wherein the composition has:(a) a higher flammable limit;(b) a higher ignition energy; and/or(c) a lower flame velocity compared to R-32 alone.7. A composition according to which is non-flammable.8. A composition according to claim 1 , wherein the composition has a cycle efficiency within about 10% of the existing refrigerant that it is intended to replace.9. A composition according to claim 1 , wherein the composition has a compressor discharge temperature within about 15 k of the existing refrigerant that it is intended to replace.10. A composition comprising a lubricant and a composition according to .11. A composition according to claim 10 , wherein the lubricant is selected from mineral oil claim 10 , silicone oil claim 10 , polyalkyl benzenes (PABs) claim 10 , polyol esters (POEs) claim 10 , polyalkylene glycols (PAGs) claim 10 , polyalkylene glycol esters (PAG esters) claim 10 , polyvinyl ethers (PVEs) claim 10 , poly (alpha-olefins) and combinations thereof.12. A composition according to further comprising a stabiliser.13. A composition according to claim 12 , wherein the stabiliser is selected from diene-based compounds claim 12 , phosphates claim 12 , phenol compounds and epoxides ...

COMPOSITIONS COMPRISING 1,1-DIFLUOROETHENE, TRIFLUOROMETHANE AND A THIRD COMPONENT

The present invention provides a composition, such as a refrigerant composition comprising 1, 1-difluoroethene (vinylidene fluoride, R-1132a); trifluoromethane (R-23); and one or more compound selected from hexafluoroethane (R-116), ethane (R-170) and carbon dioxide (R-744, CO). 1. A composition comprising:i) 1,1-difluoroethene (vinylidene fluoride, R-1132a);ii) trifluoromethane (R-23); and{'sub': '2', 'iii) one or more compound selected from hexafluoroethane (R-116), ethane (R-170) and carbon dioxide (R-744, CO).'}2. A composition according to comprising:v) 1,1-difluoroethene (vinylidene fluoride, R-1132a);vi) trifluoromethane (R-23); andvii) one or more compound selected from hexafluoroethane (R-116) and/or ethane (R-170); and{'sub': '2', 'viii) carbon dioxide (R-744, CO).'}3. A composition according to or comprising:v) 1,1-difluoroethene (vinylidene fluoride, R-1132a);vi) trifluoromethane (R-23); andvii) one or more compound selected from hexafluoroethane (R-116) and/or ethane (R-170); and{'sub': '2', 'viii) less than about 50% by weight carbon dioxide (R-744, CO).'}4. A composition according to any the preceding claims comprising from about 1 to about 98% by weight R-1132a.5. A composition according to any the preceding claims comprising from about 35 to about 95% by weight R-1132a.6. A composition according to any the preceding claims comprising from about 1 to about 98% by weight R-23.7. A composition according to any the preceding claims comprising up to about 80% by weight R-116.8. A composition according to comprising from about 1 to about 60% by weight R-116.9. A composition according to any of the preceding claims comprising from about 1 to about 40% by weight R-116 claim 7 , from about 5 to about 98% by weight R-1132a and from about 5 to about 98% by weight R-23.10. A composition according to comprising from about 1 to about 30% by weight R-116 claim 9 , from about 20 to about 90% by weight R-1132a and from about 5 to about 95% by weight R-23.11. A ...

COMPOSITION FOR CLEANING GASOLINE ENGINE FUEL DELIVERY SYSTEMS, AIR INTAKE SYSTEMS, AND COMBUSTION CHAMBERS

A cleaning composition, which is suitable for cleaning fuel delivery systems, air-intake systems, intake valves, and combustion chambers, includes at least 3 wt. % of a polyether component, at least 5 wt. % of a polar solvent, and at least 5 wt. % a non-polar solvent. The polyether component is selected from polyethers, polyetheramines, and mixtures thereof. 1. A composition for cleaning fuel delivery systems , air intake systems , and combustion chambers comprising:at least 3 wt. % of a polyether component, the polyether component being selected from the group consisting of polyethers, polyetheramines, and mixtures thereof;at least 5 wt. % of a polar solvent;at least 5 wt. % of a non-polar solvent; anda functional solvent, other than the polar solvent and non-polar solvent, the functional solvent comprising an alkoxyalcohol.2. The composition of claim 1 , wherein the polyether component comprises a poly(alkylene oxide)amine.3. The composition of claim 2 , wherein the alkylene oxide in the poly(alkylene oxide)amine is selected from butylene oxide claim 2 , propylene oxide claim 2 , and mixtures thereof.4. The composition of claim 1 , wherein the polyether or polyetheramine is represented by the formula R[OCHCH(R)]A claim 1 , where R is a hydrocarbyl group claim 1 , Ris selected from hydrogen and a hydrocarbyl group claim 1 , A is a nitrogen-containing group or a hydroxyl group claim 1 , and n is a number which is at least 2.5. The composition of claim 4 , wherein R is a hydrocarbyl group of 1-30 carbon atoms.6. (canceled)7. (canceled)8. The composition of claim 4 , wherein n is at least 10.9. The composition of claim 4 , wherein A is selected from amines claim 4 , ether amines and mixtures thereof.10. The composition of claim 9 , wherein A is selected from —OCHCHCHNRRand —NRR claim 9 , where each Ris independently hydrogen or a hydrocarbyl group of one or more carbon atoms claim 9 , and each Ris independently hydrogen claim 9 , a hydrocarbyl group of one or more ...

METHODS AND CLEANING SOLUTIONS FOR REMOVING CHEWING GUM AND OTHER STICKY FOOD SUBSTANCES

Cleaning compositions and methods for removing chewing gum, its components and other sticky soils from surfaces, especially production facilities, are disclosed. Cleaning composition solutions that do not require a rinse step are disclosed and suitable for treatment of surfaces having indirect food contact. In an aspect, the cleaning compositions and methods employ a scraping-spraying-wiping procedure. 1. A cleaning composition for application on a chewing gum residue or other sticky substance comprising:about 1 wt-% to about 50 wt-% of a diluent;about 5 wt-% to about 40 wt-% of a polyol; andabout 10 wt-% to about 50 wt-% of an alkyl ester.2. The composition of claim 1 , wherein a ratio of the polyol to alkyl ester is from about 10:1 to about 1:10.3. The composition of claim 1 , wherein the polyol is propylene glycol claim 1 , glycerin claim 1 , or a combination thereof.4. The composition of claim 1 , wherein the alkyl ester is ethyl lactate claim 1 , ethylene acetate claim 1 , polysorbate claim 1 , or a combination thereof.5. The composition of claim 1 , wherein the composition is free of d-limonene.6. The composition of claim 1 , wherein the diluent is water claim 1 , a simple or mono alcohol claim 1 , or combination thereof.7. The composition of claim 1 , further comprising a buffer made from an organic acid claim 1 , salt thereof claim 1 , or mixture thereof.8. The composition of claim 7 , the buffer is made from sodium of acetate.9. The composition of claim 1 , further comprising at least one additional functional ingredient.10. The composition of claim 9 , wherein the additional functional ingredient is a dye claim 9 , a fragrance claim 9 , or a combination thereof.11. The composition of claim 1 , the composition is free of any material that is not considered to be GRAS or food additive ingredient.12. The composition of claim 1 , comprising about 1 wt-% to about 40 wt-% of diluent claim 1 , about 5 wt-% to about 30 wt-% of the polyol claim 1 , and about 10 wt ...

Cleaning agent composition for semiconductor device substrate, method of cleaning semiconductor device substrate, method of manufacturing semiconductor device substrate, and semiconductor device substrate

According to the present invention, there is provided a cleaning agent composition for a semiconductor device substrate including at least one of wiring and an electrode in which the wiring and the electrode contain cobalt or a cobalt alloy, the cleaning agent composition including a component (A): at least one compound selected from the group consisting of specific compounds; and a component (B): water.

SOLVENT COMPOSITION, CLEANING METHOD AND METHOD OF FORMING A COATING FILM

There is provided a solvent composition which is a stable solvent composition which is excellent in solubility of various organic substances, has a sufficient drying property, and has no adverse effect on a global environment, is stabilized not to decompose, and moreover suppresses metal corrosion under coexistence with metal, and which can be used without having an adverse effect on articles of various materials such as metal, plastic, and elastomer in a wide range of industrial uses such as cleaning and dilution coating uses. A solvent composition including: a solvent (A) including (D-1-chloro-3,3,3-trifluoro-1-propene; and a stabilizer (B) consisting of HCFC whose boiling point at normal pressure is not lower than 30° C. nor higher than 60° C. 110-. (canceled)11. A solvent composition comprising:a solvent including (Z)-1-chloro-3,3,3-trifluoro-1-propene; anda saturated hydrochlorofluorocarbon whose boiling point at normal pressure is not lower than 30° C. nor higher than 60° C. as a stabilizer,wherein the saturated hydrochlorofluorocarbon is one or more selected from the group consisting of 1-chloro-3,3,3-trifluoropropane, 1,1-dichloro-2,2,3,3,3-pentafluoropropane, and 1,3-dichloro-1,1,2,2,3-pentafluoropropane.12. The solvent composition according to claim 11 , wherein a proportion of a content of the stabilizer claim 11 , relative to a content of the solvent claim 11 , is 1 mass ppm to 1 mass %.13. The solvent composition according to claim 11 , wherein a proportion of a content of the stabilizer claim 11 , relative to a content of (Z)-1-chloro-3 claim 11 ,3 claim 11 ,3-trifluoro-1-propene claim 11 , is 1 mass ppm to 1 mass %.14. The solvent composition according to claim 11 , wherein a proportion of a content of (Z)-1-chloro-3 claim 11 ,3 claim 11 ,3-trifluoro-1-propene claim 11 , relative to a total amount of the solvent claim 11 , is 80 to 100 mass %.15. A cleaning method comprising bringing the solvent composition according to and an article to be cleaned ...

Composition having suppressed alumina damage and production method for semiconductor substrate using same

The present invention pertains to: a composition capable of removing dry etching residue present on the surface of a semiconductor integrated circuit, while suppressing alumina damage in a production process for the semiconductor integrated circuit; a cleaning method for semiconductor substrates that use alumina; and a production method for a semiconductor substrate having an alumina layer. This composition is characterized by containing 0.00005%-1% by mass of a barium compound (A) and 0.01%-20% by mass of a fluorine compound (B) and having a pH of 2.5-8.0.

Maintenance liquid and maintenance method

Provided are a maintenance liquid and a maintenance method that can solve an ejection problem of a UV curable inkjet printer. The maintenance liquid includes: a first ingredient in which a water-soluble compound is soluble and a cured matter of a UV curable ink is insoluble. The maintenance method includes: a first cleaning process at which a water-soluble compound that adheres to an inkjet head included in the UV curable inkjet printer is dissolved by a first maintenance liquid including the first ingredient in which the water-soluble compound is soluble and a cured matter of a UV curable ink is insoluble, and a second cleaning process at which the inkjet head is cleaned by a second maintenance liquid including a second ingredient in which the water-soluble compound is insoluble and the cured matter of the UV curable ink is soluble.

METHOD FOR TREATING A SEMICONDUCTOR DEVICE

A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad. 1. A method of treating a sensor array , the sensor array including a plurality of sensors , a sensor of the plurality of sensors having a sensor pad exposed at a surface of the sensor array , the method comprising:exposing at least the sensor pad to a wash solution including acid and an organic solvent; andrinsing the wash solution from the sensor pad.2. The method of claim 1 , wherein the acid includes sulfonic acid.3. The method of claim 2 , wherein the sulfonic acid includes alkyl sulfonic acid claim 2 , alkyl aryl sulfonic acid claim 2 , or a combination thereof.4. The method of claim 3 , wherein the alkyl aryl sulfonic acid includes an alkyl group having between 1 and 20 carbons.5. The method of claim 4 , wherein the alkyl group has between 9 and 18 carbons.6. The method of claim 5 , wherein the alkyl group has between 10 and 14 carbons.7. The method of claim 4 , wherein the alkyl group has between 1 and 6 carbons.8. The method of any one of - and - claim 4 , wherein the sulfonic acid includes methanesulfonic acid claim 4 , ethanesulfonic acid claim 4 , propane sulfonic acid claim 4 , butane sulfonic acid claim 4 , or combinations thereof.9. The method of any one of - and - claim 4 , wherein the sulfonic acid includes dodecyl benzene sulfonic acid.10. The method of any one of - and - claim 4 , wherein the sulfonic acid includes para toluene sulfonic acid.11. The method of any one of - and - claim 4 , wherein the wash solution includes between 10 mM and 500 mM of the acid.12. The method of claim 11 , wherein the wash solution includes between 50 mM and 250 mM of the acid.13. The method of any one of - and - claim 11 , wherein ...

COMPOSITIONS OF CHLORO-TRIFLUOROPROPENE AND HEXAFLUOROBUTENE

Provided are compositions, preferably azeotrope or azeotrope-like compositions including 1,1,1,4,4,4-hexafluoro-2-butene and chlorotrifluoropropene, particularly 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd), and uses thereof of the compositions. The composition may be a heat transfer composition. The composition may be a blowing agent composition. The composition may be a solvent composition. The composition may be a sprayable composition. 113-. (canceled)14. A blowing agent comprising trans-1 ,1 ,1 ,4 ,4 ,4-hexafluoro-2-butene and 2-chloro-3 ,3 ,3-trifluoropropene.15. The blowing agent according to claim 14 , comprising from 1 to 99% by weight of trans-1 claim 14 ,1 claim 14 ,1 claim 14 ,4 claim 14 ,4 claim 14 ,4-hexafluoro-2-butene and from 1 to 99% by weight of 2-chloro-3 claim 14 ,3 claim 14 ,3-trifluoropropene.16. The blowing agent according to claim 14 , comprising from 60 to 99% by weight of trans-1 claim 14 ,1 claim 14 ,1 claim 14 ,4 claim 14 ,4 claim 14 ,4-hexafluoro-2-butene and from 1 to 40% by weight of 2-chloro-3 claim 14 ,3 claim 14 ,3-trifluoropropene.17. The blowing agent according to claim 14 , comprising from 1 to 30% by weight of trans-1 claim 14 ,1 claim 14 ,1 claim 14 ,4 claim 14 ,4 claim 14 ,4-hexafluoro-2-butene and from 70 to 99% by weight of 2-chloro-3 claim 14 ,3 claim 14 ,3-trifluoropropene.18. The blowing agent according to claim 14 , wherein the composition is azeotropic or azeotrope-like.19. A foamable composition comprising the blowing agent of and one or more components capable of reacting and foaming under conditions to form a foam or cellular structure.20. A method of forming foam comprising reacting and foaming the foamable composition of to form a foam.21. A solvent comprising trans-1 claim 19 ,1 claim 19 ,1 claim 19 ,4 claim 19 ,4 claim 19 ,4-hexafluoro-2-butene and 2-chloro-3 claim 19 ,3 claim 19 ,3-trifluoropropene.22. The solvent according to claim 21 , comprising from 1 to 99% by weight of trans-1 claim 21 ,1 claim 21 ,1 ...

ENERGY-EFFICIENT PROCESS FOR PURIFYING VOLATILE COMPOUNDS AND DEGREASING

Disclosed is an energy-efficient method for degreasing or defluxing comprising a) providing a heated distillation vessel capable of being operated under positive pressure; b) charging with a solvent comprising HCFO 1233zd; c) heating to provide positive pressure so that solvent boils at about 30-100° C.; d) distilling using an air-cooled heat exchanger; e) releasing the pressure; f) cooling by channeling through an immersion tank subfloor and/or side; g) collecting the solvent; h) performing degreasing operations; and i) pumping soiled solvent back to the heated distillation vessel. Also disclosed are an energy-efficient method for purifying volatile compounds, and pressurized solvent degreasing system capable of use with HCFO 1233zd. 1. A method for vapor degreasing of articles containing a contaminant comprising:a) providing a vessel capable of operating under positive pressure;b) charging said vessel with a liquid solvent containing contaminant;c) heating the solvent in said vessel to produce vapor containing said solvent at sufficient pressure such that said vapor temperature is from about 30° C. to about 100° C., more preferably from about 50° C. to about 100° C.;d) condensing said vapor using ambient air; and(e) using at least a portion of the solvent condensed in step d) to clean the article.2. The method of claim 1 , further comprising the step of releasing the pressure to ambient pressure to collect purified solvent and wherein said condensing step comprises passing said vapor through an ambient-air-cooled heat exchanger.3. The method of claim 1 , wherein said solvent comprises 1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene.4. The method of claim 1 , wherein said solvent comprises an azeotropic mixture or azeotrope-like mixture comprising 1-chloro-3 claim 1 ,3 claim 1 ,3-trifluoropropene and an alcohol selected from the group consisting of methanol claim 1 , ethanol and isopropanol.5. An energy-efficient method for degreasing or defluxing claim 1 , ...

COMPOSITIONS COMPRISING 1,2-DICHLORO-1,2-DIFLUOROETHYLENE FOR USE IN CLEANING AND SOLVENT APPLICATIONS

The present application provides compositions comprising 1,2-dichloro-1,2-difluoroethylene (i.e., CFO-1112) and, optionally, an additional component. The present application further provides use of the compositions provided herein in cleaning, solvent, carrier fluid, and deposition applications. 1. A process for dissolving a solute , comprising contacting and mixing said solute with a sufficient quantity of a composition comprising:i) 1,2-dichloro-1,2-difluoroethylene, and, optionally,ii) a compound selected from N-pentane, HFE-7000, R-1233xfB, R-1336mzzZ, dimethoxymethane, R-1345mzzE, R-43-10mee, R-365mfc, tetrahydrofuran, and R-153-10mzzy.2. The process of claim 1 , wherein the solute comprises rosin flux claim 1 , oil claim 1 , or a mixture thereof.3. The process of claim 2 , wherein the rosin flux is selected from RMA (rosin mildly activated) claim 2 , RA (rosin activated) claim 2 , WS (water soluble) claim 2 , and OA (organic acid) rosin flux claim 2 , or any mixture thereof.4. The process of claim 2 , wherein the oil is selected from mineral oil claim 2 , motor oil claim 2 , silicone oil claim 2 , a fluorinated oil claim 2 , or any mixture thereof.5. (canceled)6. A process of cleaning a surface claim 2 , comprising contacting with said surface a composition comprising:i) 1,2-dichloro-1,2-difluoroethylene, and, optionally,ii) a compound selected from N-pentane, HFE-7000, R-1233xfB, R-1336mzzZ, dimethoxymethane, R-1345mzzE, R-43-10mee, R-365mfc, tetrahydrofuran, and R-153-10mzzy.7. The process of claim 6 , wherein the contacting comprises immersing the surface in a container comprising the composition claim 6 , spraying the surface with the composition claim 6 , wiping the surface with a material that has been wet with the composition claim 6 , or any combination thereof.8. The process of claim 7 , wherein the surface is an integrated circuit device.9. The process of claim 8 , wherein the integrated circuit device is a circuit board.10. The process of claim 7 , ...

Cleaning liquid composition

An object of the present invention is to provide a cleaning liquid that effectively removes in a short time organic residues and abrasive grains derived from a slurry in a semiconductor substrate in which a Co contact plug and/or Co wiring are present.The present invention relates to a cleaning liquid composition for cleaning a substrate having a Co contact plug and/or Co wiring, which contains one or more reducing agents and water. Furthermore, the present invention relates to a cleaning liquid composition for cleaning a substrate having Co and not having Cu, which contains one or more reducing agents and water and has a pH of 3 or more and less than 12.

SEMICONDUCTOR ELEMENT CLEANING LIQUID AND CLEANING METHOD

The present invention makes it possible to provide a semiconductor element cleaning method that is characterized in that: a hard mask pattern is formed on a substrate that has a low relative permittivity film and at least one of a cobalt, a cobalt alloy, or a tungsten plug; and a cleaning liquid that contains 0.001-20% by mass of an alkali metallic compound, 0.1-30% by mass of quaternary ammonium hydroxide, 0.01-60% by mass of a organic water-soluble solvent, 0.0001-0.1% by mass of hydrogen peroxide, and water is subsequently used on a semiconductor element in which, using the hard mask pattern as a mask, the hard mask, the low relative permittivity film, and a barrier insulating film are dry etched, and dry etch residues are removed. 1. A method for cleaning a semiconductor element which is obtained by forming a hardmask pattern on a substrate that has a low-dielectric-constant film and at least one of cobalt , a cobalt alloy and a tungsten plug , and then subjecting a hardmask , the low-dielectric-constant film and a barrier insulating film to a dry etching treatment using said hardmask pattern as a mask , the method comprising the step of removing dry etch residues with a cleaning liquid containing 0.001-20% by mass of an alkali metal compound , 0.1-30% by mass of a quaternary ammonium hydroxide , 0.01-60% by mass of an organic water-soluble solvent , 0.0001-0.1% by mass of hydrogen peroxide and water.2. The method according to claim 1 , wherein the alkali metal compound is at least one or more selected from the group consisting of sodium hydroxide claim 1 , sodium sulfate claim 1 , sodium carbonate claim 1 , sodium hydrogen carbonate claim 1 , sodium nitrate claim 1 , sodium fluoride claim 1 , sodium chloride claim 1 , sodium bromide claim 1 , sodium iodide claim 1 , potassium hydroxide claim 1 , potassium sulfate claim 1 , potassium carbonate claim 1 , potassium hydrogen carbonate claim 1 , potassium nitrate claim 1 , potassium fluoride claim 1 , potassium ...

CLEANING COMPOSITION FOR LIQUID CRYSTAL ALIGNMENT LAYER AND MANUFACTURING METHOD OF LIQUID CRYSTAL ALIGNMENT LAYER USING THE SAME

The present invention relates to a cleaning composition for a liquid crystal alignment layer, a manufacturing method of a liquid crystal alignment layer using the same, and a liquid crystal display device including the liquid crystal alignment layer manufactured by the manufacturing method. More specifically, the present invention relates to a cleaning composition for a liquid crystal alignment layer that is capable of solving a non-uniformity problem of the liquid crystal alignment layer and effectively removing an ionic byproduct on a polymer surface to increase anisotropy of the liquid crystal alignment layer, by using a cleaning composition including a specific solvent in a cleaning process after a UV alignment process, and a manufacturing method of a liquid crystal alignment layer. 1. A cleaning composition for a liquid crystal alignment layer comprising:tetrahydrofurfuryl alcohol or methyl 2-hydroxyisobutyrate,wherein the cleaning composition for a liquid crystal alignment layer is used for cleaning a UV-aligned liquid crystal alignment layer including polyimide or a polyimide precursor.2. The cleaning composition for a liquid crystal alignment layer of claim 1 , further comprising:at least one compound selected from the group consisting of an alkylene glycol-based compound having a viscosity of 10 cP or less and a boiling point of at least 150° C. or more and a polar solvent having a viscosity of 5 cP or less and a boiling point of at least 100° C. or more.3. The cleaning composition for a liquid crystal alignment layer of claim 1 , wherein:the cleaning composition includesa) 100 wt % of the tetrahydrofurfuryl alcohol or the methyl 2-hydroxyisobutyrate, orb) 1 to 99 wt % of the compound a); and 0.1 to 99 wt % of at least one compound selected from the group consisting of an alkylene glycol-based compound and a polar solvent.4. The cleaning composition for a liquid crystal alignment layer of claim 1 , further comprising:1 to 70 wt % of deionized water.5. The ...

CLEANING AGENT FOR REMOVAL OF CONTAMINATES FROM MANUFACTURED PRODUCTS

A composition effective for removing contaminates from a manufactured product either as a concentrated material or when diluted with water. The composition designed for effective removal of all types of undesirable contaminates from a manufactured product, including but not limited to, solder flux, oils, greases, soil, and particulate matter. Depending on the nature of the process the cleaning composition maybe used in a multistep process. The composition contains propylene glycol phenyl ether and an alkali and has a pH of greater than 7.5. The composition may contain additional optional solvents and additives to enhance cleaning of articles or to impart other properties to the composition. The composition can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present. 1. A composition effective for removing a contaminant from a manufactured product consisting essentially of propylene glycol phenyl ether , an alkali , and optionally one or more secondary solvents , and has a pH of at least about 7.5.2. The composition of claim 1 , further containing water.3. The composition of claim 2 , wherein said composition is diluted with said water to a concentration of from about 99.9 weight % to about 0.1 weight %.4. The composition of claim 1 , wherein said secondary solvent is present in an amount up to about 90%.5. The composition of claim 1 , wherein the secondary solvent is a member of the group consisting of{'sub': 1', 'x', '2x', 'n, 'claim-text': [{'sub': '1', 'Ris an alkyl group having 1 to 6 carbon atoms,'}, 'n is integer from 1 to 4, and', 'x is integer from 1 to 4;, '(a) a glycol ether of the formula R—O—(CHO)—H, wherein{'sub': '2', '(b) an alcohol of the formula R—OH, wherein{'sub': '2', 'Ris an alkyl group having 1 to 8 carbon atoms, a tetrahydrofurfuryl group, or hydrogen;'}{'sub': '3', 'claim-text': Npyrr represents a pyrollidone ring', {'sub': '3', 'Ris an alkyl ...

COMPOSITIONS AND USES OF CIS-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE

This invention relates to compositions, methods and systems having utility in numerous applications, and in particular, uses for compositions containing the compound cis-1,1,1,4,4,4-hexafluoro-2-butene (Z-HFO-1336mzzm), which has the following structure: 130-. (canceled)31. A method for providing refrigeration comprising:(a) providing a centrifugal chiller system comprising a centrifugal compressor, a condenser, an evaporator and a refrigerant in said system, said refrigerant consisting essentially of from about 70% to about 99% by weight of cis-1,1,1,4,4,4-hexafluoro-2-butene and from about 1% by weight to about 30% by weight of trans-1,2 dichloroethylene; and(b) operating said system to provide cooling.32. The method of wherein said refrigerant consists essentially of from about 75% to about 99% by weight of cis-1 claim 31 ,1 claim 31 ,1 claim 31 ,4 claim 31 ,4 claim 31 ,4-hexafluoro-2-butene and from about 1% by weight to about 25% by weight of trans-1 claim 31 ,2 dichloroethylene.33. The method of wherein said refrigerant consists of from about 70% to about 99% by weight of cis-1 claim 31 ,1 claim 31 ,1 claim 31 ,4 claim 31 ,4 claim 31 ,4-hexafluoro-2-butene and from about 1% by weight to about 30% by weight of trans-1 claim 31 ,2 dichloroethylene.34. The method of wherein said refrigerant consists of from about 75% to about 99% by weight of cis-1 claim 31 ,1 claim 31 ,1 claim 31 ,4 claim 31 ,4 claim 31 ,4-hexafluoro-2-butene and from about 1% by weight to about 25% by weight of trans-1 claim 31 ,2 dichloroethylene.35. The method of wherein said refrigerant consists of about 75% of cis-1 claim 34 ,1 claim 34 ,1 claim 34 ,4 claim 34 ,4 claim 34 ,4-hexafluoro-2-butene and about 25% by weight of trans-1 claim 34 ,2 dichloroethylene.36. The method of wherein said centrifugal chiller system is part of a commercial air conditioning system.37. The method of wherein said operating step (b) comprises operating said condenser at a temperature of about 40° C.38. The method ...

Wipes

A wipe comprising a substrate and a cleaning and/or disinfecting compound retained by one or more cyclodextrin compounds. The wipe is wet with one or more fluids comprising water to release the cleaning and/or disinfecting compound from the one or more cyclodextrin compounds, and applied to a surface to clean and/or disinfect the surface. 1. A wipe comprising:a substrate; andethanol retained by one or more cyclodextrin compounds;wherein the one or more cyclodextrin compounds release the ethanol upon wetting the wipe with water; andwherein the substrate carries or is impregnated with the ethanol retained by the one or more cyclodextrin compounds.2. The wipe according to claim 1 , wherein the ethanol retained by the one or more cyclodextrin compounds is in a dry powdered form.3. The wipe according to claim 1 , wherein the wipe is stored in a dry state.4. The wipe according to claim 1 , wherein the substrate is capable of absorbing a fluid.5. The wipe according to claim 4 , wherein the substrate has at least one of: holes claim 4 , pores claim 4 , and openings for absorbing the fluid.6. The wipe according to claim 1 , wherein the substrate comprises at least one of: a sheet claim 1 , a paper towel-like member claim 1 , a woven fabric claim 1 , a mat of bonded fibers claim 1 , and a porous sponge-like member.7. A method of using a wipe as claimed in claim 1 , the method comprising:wetting the wipe with one or more fluids comprising water to release the ethanol from the one or more cyclodextrin compounds; andapplying the wipe to a surface to clean and/or disinfect the surface.8. The method according to claim 7 , wherein the one or more fluids comprising water includes a surface fluid;wherein, before the wipe is applied to the surface, the surface fluid is present on the surface; andwherein wetting the wipe comprises applying the wipe to the surface fluid that is present on the surface.9. The method according to claim 8 , further comprising applying the surface fluid to ...

COMPOSITIONS FOR USE IN SEMICONDUCTOR DEVICES

An improved composition and method for cleaning a surface of a semiconductor wafer are provided. The composition can be used to selectively remove a low-k dielectric material such as silicon dioxide, a photoresist layer overlying a low-k dielectric layer, or both layers from the surface of the wafer. The composition is formulated according to the invention to provide a desired removal rate of the low-k dielectric and/or photoresist from the surface of the wafer. By varying a fluorine ion component, and the amounts of the fluorine ion component and an acid component, and controlling the pH, a composition can be formulated in order to achieve a desired low-k dielectric removal rate that ranges from slow and controlled at about 50 to about 1000 angstroms per minute, to a relatively rapid removal of low-k dielectric material at greater than about 1000 angstroms per minute. The composition can also be foimulated to selectively remove the photoresist layer, leaving the underlying low-k dielectric layer essentially intact. 1. A composition , comprising ammonium fluoride , an organic acid , and a solvent.2. (canceled)3. The composition of claim 1 , wherein the composition has a pH of from about 3 to about 6.4. The composition of claim 1 , wherein the composition has a pH of from about 4 to about 6.5. The composition of claim 1 , wherein the organic acid comprises formic acid claim 1 , acetic acid claim 1 , citric acid claim 1 , ascorbic acid claim 1 , propionic acid claim 1 , butyric acid claim 1 , isobutyric acid claim 1 , benzoic acid claim 1 , gluconic acid claim 1 , malic acid claim 1 , malonic acid claim 1 , succinic acid claim 1 , tartaric acid claim 1 , gallic acid claim 1 , oxalic acid claim 1 , tartaric acid claim 1 , or mixtures thereof.6. The composition of claim 1 , wherein the organic acid comprises an aqueous solution comprising from about 20% to about 60% of the organic acid.7. The composition of claim 1 , wherein the composition comprises ammonium fluoride ...

Detergent composition and aerosol composition of same

A novel detergent composition and an aerosol composition are nonflammable, has little hazard of ignition or risk during fire, and do not require a hazardous material storage warehouse, and which are not subject to legal restrictions with respect to amounts that may be stored when the detergent composition is to be used in large quantities, and which moreover are of low toxicity, and which while having properties such that the environmental impact thereof in terms of depletion of the ozone layer and so forth is small, as well as washability and drying characteristics equivalent to those of conventional detergent compositions which are used as brake cleaner, and have very little tendency to attack rubber and/or resin, a detergent composition and an aerosol composition of same are made to contain (Z)-1-chloro-3,3,3-trifluoropropene and C4F9OCH3, C3F7OCH3, 1,1,2,2-tetrafluoro-1-(2,2,2-trifluoroethoxy)ethane, or other such HFE-type nonflammable fluorinated-type solvent.

Non-flammable compositions and use of these compositions

The invention relates to certain non-flammable compositions containing 1,1,1,3,3-pentafluorobutane (R365mfc), 1,2-dichloroethylene and a hydrofluoroether, to mixtures containing these compositions and to the use of these non-flammable compositions or these mixtures, especially as precision cleaning agents for solid surfaces and for flushing, especially of refrigeration systems.

KIT FOR ADHESIVE REMOVAL ON SURFACES AND METHODS AND DEVICES THEREOF

The present invention provides a kit, method, and device for removing an adhesive from a surface that includes a micro-adhesive material, such as a foam, and a solvent composition. 1. A kit for removing an adhesive from a surface , comprising:a micro-abrasive material; anda solvent composition.2. The kit for removing an adhesive from a surface according to claim 1 , wherein the micro-abrasive material is an open cell foam.3. The kit for removing an adhesive from a surface according to claim 1 , wherein the solvent composition is contained on a disposable cloth.4. The kit for removing an adhesive from a surface according to claim 17 , wherein the foam and solvent composition are stored within a housing.5. The kit for removing an adhesive from a surface according to claim 1 , wherein the micro-abrasive material is a melamine foam.6. The kit for removing an adhesive from a surface according to claim 1 , wherein the solvent composition is composed of an alcohol claim 1 , an ether claim 1 , and a diacid acid ester.7. The kit for removing an adhesive from a surface according to claim 1 , wherein the solvent compositions is composed of a benzyl alcohol claim 1 , glycol ether claim 1 , and dimethyl glutarate.8. The kit for removing an adhesive from a surface according to claim 1 , wherein the solvent compositions is composed of diacid esters.9. The kit for removing an adhesive from a surface according to claim 1 , wherein the solvent compositions is composed of dimethyl adipate and dimethyl glutarate.10. The kit for removing an adhesive from a surface according to claim 1 , wherein the solvent composition is composed of between about 10 to about 60% by weight of benzyl alcohol; between about 1% to about 25% by weight of glycol ether; and between about 20% to about 65% by weight of dimethyl glutarate.11. The kit for removing an adhesive from a surface according to claim 1 , wherein the solvent compositions is composed of between about 1% to about 40% by weight of dimethyl ...

PEROXY SALT COMPOSITIONS AND USES THEREOF

A composition comprising a peroxy salt, fumed silica, and a non-aqueous, water miscible material. These compositions exhibit improved storage stability relative to compositions lacking fumed silica. The peroxy salt is preferably sodium percarbonate. The preparation of the peroxy salt compositions, such as sodium percarbonate compositions described herein, includes non-aqueous liquids as well as solids. The compositions surprisingly, and unexpectedly, exhibit acceptable chemical stability at room temperature in sealed containers. The improved stability is thought to be due to the inclusion of fumed silica in the non-aqueous compositions described herein. The tendency of the composition to decompose in the container is notably reduced and even eliminated, compared to compositions lacking fumed silica. 1. A composition comprising a peroxy salt , fumed silica , and a non-aqueous , water miscible material.2. The composition of claim 1 , wherein the peroxy salt is a percarbonate salt claim 1 , a perborate salt claim 1 , a sodium peroxy salt claim 1 , or mixtures thereof.3. (canceled)4. The A composition of claim 1 , wherein the peroxy salt is sodium percarbonate.5. The composition of claim 4 , wherein the non-aqueous claim 4 , water miscible material comprises a hydroxylic solvent.6. The composition of claim 5 , wherein the hydroxylic solvent comprises a mono hydroxy alcohol claim 5 , a glycol claim 5 , a polymeric alcohol claim 5 , or a polymeric glycol.7. (canceled)8. The composition of claim 6 , wherein the glycol is propylene glycol claim 6 , ethylene glycol claim 6 , dipropylene glycol claim 6 , glycerol claim 6 , or mixtures thereof.910-. (canceled)11. The composition of claim 6 , wherein the polymeric glycol comprises polyethylene glycol claim 6 , polypropylene glycol or polyglycerol claim 6 ,12. (canceled)13. The composition of claim 6 , wherein the polymeric glycol is solid at 25° C.14. (canceled)15. The composition of claim 4 , further comprising a surface ...

Methods and cleaning solutions for removing chewing gum and other sticky food substances

Cleaning compositions and methods for removing chewing gum, its components and other sticky soils from surfaces, especially production facilities, are disclosed. Cleaning composition solutions that do not require a rinse step are disclosed and suitable for treatment of surfaces having indirect food contact. In an aspect, the cleaning compositions and methods employ a scraping-spraying-wiping procedure.

Chemical liquid purification method, chemical liquid manufacturing method, and chemical liquid

Test: 1,500 ml of a test liquid formed of the organic solvent is brought into contact with the filter for 24 hours under a condition of 23° C., and a content of particles containing at least one kind of metal selected from the group consisting of Fe, Al, Cr, Ni, and Ti in the test liquid after the contact satisfies a predetermined condition.

AZEOTROPIC COMPOSITION CONTAINING 1,1,1,3,3,3-HEXAFLUORO-2-METHOXYPROPANE

An azeotropic composition a formulated with 1,1,1,3,3,3,-hexafluoro-2-methoxypropane and a second component selected from the group consisting of isopropyl alcohol, ethanol, methanol, and trans-1,2-dichloroethylene. The azeotropic composition exhibits a substantially constant boiling point at a constant pressure and is useful for various cleaning and degreasing applications. 1. An azeotropic composition comprising:about 52 weight % (wt. %) to about 99 wt. % 1,1,1,3,3,3,-hexafluoro-2-methoxypropane (“HFMOP”); andabout 1 wt. % to about 48 wt. % of a second component selected from the group consisting of isopropyl alcohol (“IPA”), ethanol, methanol, and trans-1,2-dichloroethylene (“trans-1,2-DCE”);wherein the azeotropic composition has a substantially constant boiling point at a constant pressure.2. The azeotropic composition of claim 1 , wherein the azeotropic composition contains about 94 wt. % to about 99 wt. % HFMOP and about 1 wt. % to about 6 wt. % of IPA.3. The azeotropic composition of claim 2 , wherein the azeotropic composition consists essentially of about 97 wt. % of HFMOP and about 3 wt. % of IPA claim 2 , wherein the azeotropic composition has a substantially constant boiling point of about 49° C. at atmospheric pressure.4. The azeotropic composition of claim 1 , wherein the azeotropic composition contains about 94 wt. % to about 99 wt % HFMOP and about 1 wt. % to about 6 wt. % of ethanol.5. The azeotropic composition of claim 4 , wherein the azeotropic composition consists essentially of about 96.6 wt. % HFMOP and about 3.4 wt. % ethanol claim 4 , wherein the azeotropic composition has a substantially constant boiling point of about 47° C. at atmospheric pressure.6. The azeotropic composition of claim 1 , wherein the azeotropic composition contains about 91 wt. % to about 97 wt % HFMOP and about 3 wt. % to about 9 wt. % methanol.7. The azeotropic composition of claim 6 , wherein the azeotropic composition consists essentially of about 94.1 wt. % HFMOP ...

CLEANING COMPOSITION WITH CORROSION INHIBITOR

A cleaning composition and process for cleaning an in-process microelectronic device substrate, e.g., by post-chemical mechanical polishing (CMP) cleaning, to remove residue from a surface thereof, wherein the cleaning composition may be especially effective for cleaning a substrate surface that includes exposed metal such as cobalt, copper, or both, along with dielectric or low k dielectric material, and wherein the cleaning composition includes corrosion inhibitor to inhibit corrosion of the exposed metal. 1. A cleaning composition effective to clean a microelectronic device substrate , the cleaning composition comprising:water,base to provide a pH of at least 8,cleaning compound, andcorrosion inhibitor selected from: a guanidine functional compound, a pyrazolone functional compound, and a hydroxyquinoline compound.2. A cleaning composition of claim 1 , wherein the corrosion inhibitor is selected from:a guanidine functional compound selected from dicyandiamide, guanylurea, a guanidine salt, and glycocyamine,a pyrazolone functional compound selected from 2-methyl-3-butyn-2-ol, 3-methyl-2-pyrazolin-5-one, 3-methyl-1-4(sulfophenyl)-2-pyrazolin-5-one, 3-methyl-1-p-tolyl-5-pyrazolone, anda hydroxyquinoline compound selected from: 8-hydroxyquinoline, 8-hydroxyquinoline-2-carboxylic acid, 5-chloro7-iodo-quinolin-8-ol, 5,7-dichloro-2-[(dimethylamino)methyl)quinolin-8-ol, 8-hydroxyquinoline-4-carbaldehyde, 8-hydroxyquinoline-4-carbaldehyde-oxime, 8-hydroxyquinoline-5-sulfonic acid monohydrate3. A cleaning composition of claim 1 , wherein the base is selected from: choline hydroxide claim 1 , tetraethylammonium hydroxide claim 1 , tetramethylammonium hydroxide claim 1 , a quaternary ammonium compound claim 1 , and a combination thereof.4. A cleaning composition of claim 1 , wherein the cleaning compound is an alkanol amine.5. A cleaning composition of claim 1 , wherein the corrosion inhibitor is a guanine.6. A cleaning composition of claim 1 , wherein the corrosion ...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Pure water, a mixed solution, and an organic solvent are applied to a substrate in this order. The organic solvent is then removed by rotation. The mixed solution is a mixture of pure water and the organic solvent, and has a surface tension lower than that of the pure water. Since the mixed solution has a solubility in pure water, which is higher than that of the organic solvent, local drying on the upper surface becomes less likely at an interface between the mixed solution and the pure water, which suppresses collapse of pattern elements. Since the temperature of the substrate is raised by the mixed solution having a temperature higher than room temperature, it is possible to reduce the time required for a process related to drying. 1. A substrate processing apparatus , comprising:a substrate holding part for holding a substrate;a substrate rotating mechanism for rotating said substrate holding part together with said substrate;a pure water supply part for supplying pure water onto a main surface of said substrate, which faces upward;a mixed solution supply part for supplying a mixed solution onto said main surface, said mixed solution having a temperature higher than a room temperature and being prepared by mixing pure water with an organic solvent having a surface tension lower than that of pure water;an organic solvent supply part for supplying said organic solvent onto said main surface; anda control part for causing said pure water supply part, said mixed solution supply part, and said organic solvent supply part to supply said pure water, said mixed solution, and said organic solvent, respectively, in this order onto said main surface of said substrate which is being rotated by said substrate rotating mechanism and then removing said organic solvent from said main surface by rotation of said substrate.2. The substrate processing apparatus according to claim 1 , whereinsaid mixed solution is prepared by mixing an organic solvent of room temperature with ...

A NON-TOXIC HAND CLEANER COMPRISING A TERNARY SOLVENT MIXTURE

A cleaning composition comprises between about 10% to about 50% of at least one organic solvent comprising vegetable oil. The composition further comprises between about 2% to about 20% of at least one co-solvent. The composition further comprises at least one water-in-oil emulsifier and non-ionic surfactant. The composition also comprises at least one anionic surfactant and between about 20% to about 60% of water. 1. A cleaning composition comprising:between about 10% to about 50% of at least one organic solvent comprising vegetable oil;between about 2% to about 20% of at least one co-solvent;at least one water-in-oil emulsifier and non-ionic surfactant;at least one anionic surfactant; andbetween about 20% to about 60% of water.2. The cleaning composition as recited in claim 1 , further comprising at least one anti-microbial claim 1 , anti-oxidant claim 1 , chelating and PH balancing agent.3. The cleaning composition as recited in claim 2 , in which said anti-microbial claim 2 , anti-oxidant claim 2 , chelating and PH balancing agent comprises a saturated fatty acid.4. The cleaning composition as recited in claim 1 , further comprising at least one denaturant.5. The cleaning composition as recited in claim 4 , in which said denaturant comprises denatonium.6. The cleaning composition as recited in claim 1 , in which said co-solvent comprises at least one carbonate ester of aliphatic alcohols.7. The cleaning composition as recited in claim 1 , in which said anionic surfactant comprises ammonium xylene sulphonate.8. The cleaning composition as recited in claim 1 , further comprising at least one oil-in-water emulsifier.9. The cleaning composition as recited in claim 8 , in which said oil-in-water emulsifier comprises nonyl phenol ethoxylate.10. The cleaning composition as recited in claim 1 , further comprising at least one water phase thickening agent.11. The cleaning composition as recited in claim 10 , in which said water phase thickening agent comprises guar gum. ...

SOLVENT FORMULATIONS

The present disclosure provides, in part, solvent compositions including an acetic acid alkyl (C—C) ester (e.g., methyl acetate (MA), ethyl acetate (EA), or tert-butyl acetate (TBAc)) and a carbonate ester (e.g., dimethyl carbonate, or propylene carbonate), and optionally, a benzene-containing compound. The solvent compositions may be used to replace methyl ethyl ketone (MEK). 1. A solvent composition comprising:{'sub': 1', '4, '(a) an acetate ester in an amount between about 40% v/v and about 90% v/v, wherein the acetate ester is an acetic acid alkyl (C-C) ester;'}(b) a carbonate ester in an amount between about 5% v/v and about 55% v/v; and(c) a benzene-containing compound in an amount between about 5% v/v and about 15% v/v.2. The solvent composition of wherein:(a) the acetate ester is present in an amount between about 65% v/v and about 75% v/v;(b) the carbonate ester is present in an amount between about 10% v/v and about 30% v/v; and(c) the benzene-containing compound is present in an amount between about 5% v/v and about 10% v/v.3. (canceled)4. The solvent composition of wherein the acetate ester is methyl acetate (MA) or tert-butyl acetate (TBAc).5. The solvent composition of wherein the carbonate ester is dimethyl carbonate (DMC) or propylene carbonate (PC).6. The solvent composition of wherein the benzene-containing compound is benzyl alcohol (BA).7. The solvent composition of claim 1 , comprising:(a) the acetate ester in an amount between about 65% v/v and about 80% v/v, wherein the acetate ester is tert-butyl acetate (TBAc);(b) the carbonate ester in an amount between about 15% v/v and about 25% v/v, wherein the carbonate ester is dimethyl carbonate (DMC); and(c) the benzene-containing compound in an amount between about 5% v/v and 10% v/v, wherein the benzene-containing compound is benzyl alcohol (BA).823-. (canceled)24. The solvent composition of consisting essentially of:(a) the acetate ester in an amount of about 40% v/v, wherein the acetate ester is ...

MAINTENANCE LIQUID FOR ACTIVE ENERGY RAY-CURABLE INKJET INK

Provided is a non-aqueous maintenance liquid for an active energy ray-curable inkjet ink which can be used as a cleaning liquid for removing the inkjet ink and as a preserving liquid to fill the head when the printer is not in operation. The non-aqueous maintenance liquid for an active energy ray-curable inkjet ink of the present invention comprises a main liquid component, a pigment dispersant resin, and a surface control agent, wherein the main liquid component is an organic solvent and/or an active energy ray-curable compound, and the amount of the surface control agent is 0.01 to 10% by weight in 100% by weight of the maintenance liquid. 1. A non-aqueous maintenance liquid for an active energy ray-curable inkjet ink , the liquid comprising a main liquid component , a pigment dispersant resin , and a surface control agent ,wherein the main liquid component is an organic solvent and/or an active energy ray-curable compound.2. The maintenance liquid according to claim 1 , wherein the amount of the surface control agent is 0.01 to 10% by weight in 100% by weight of the maintenance liquid.3. The maintenance liquid according to claim 1 , wherein the amount of the pigment dispersant resin is 0.02 to 5% by weight in 100% by weight of the maintenance liquid.4. The maintenance liquid according to claim 1 , wherein the surface control agent comprises an acrylic claim 1 , silicone-based claim 1 , or fluorinated surface control agent.5. The maintenance liquid according to claim 1 , wherein the surface control agent comprises a polyether modified dimethylsiloxane silicone-based surface control agent.6. The maintenance liquid according to claim 1 , wherein the active energy ray-curable compound comprises one or more compounds selected from the group consisting of dipropylene glycol diacrylate claim 1 , 2-(2-vinyl oxyethoxy)ethyl acrylate claim 1 , and phenoxyethyl acrylate.7. The maintenance liquid according to claim 1 , wherein the active energy ray-curable compound comprises ...

Compositions including an alkyl 3-hydroxybutyrate

Compositions comprising an alkyl 3-hydroxybutyrate and one or more additional components are provided. The compositions of the present invention may include at least one alkyl 3-hydroxybutyrate having at least 3 and not more than 5 carbon atoms, along with one or more additional components including, for example, alkyl butyrates, alkyl acetates, alkyl alcohols, and dimers and/or trimers of the alkyl 3-hydroxybutyrate. Such compositions may be products of, for example, the hydrogenation of an acetoacetate-containing composition.

STABILIZED COMPOSITIONS COMPRISING LEUCO COMPOUNDS

A composition comprising: (a) a leuco composition; and (b) a stabilizing amount of an antioxidant composition. The antioxidant composition comprises at least one sterically hindered phenol and at least one substituted diarylamine, and the mole ratio of the hindered phenol to the substituted diarylamine is greater than 1:1. In another embodiment, a composition comprises (a) a leuco composition and (b) an antioxidant composition; and optionally (c) a solvent composition. The combined mass of the leuco compounds and antioxidants present in the composition is 10% or more of the total mass of the composition, and (b) the molar ratio of antioxidants present in the composition to leuco compounds present in the composition is greater than 1:1. 1. A composition comprising: (a) a leuco composition; and (b) a stabilizing amount of an antioxidant composition which comprises at least one sterically hindered phenol and at least one substituted diarylamine , wherein the mole ratio of the hindered phenol to the substituted diarylamine is greater than 1:1.2. The composition of claim 1 , wherein the composition comprises about 1 wt. % or more sterically hindered phenol compounds.3. The composition of claim 2 , wherein the mole ratio of the hindered phenol to the substituted diarylamine is greater than 5.0:1.0.4. A composition comprising: (a) a leuco composition; and (b) an antioxidant composition claim 2 , wherein (i) the combined mass of the leuco compounds and antioxidants present in the composition is 10% or more of the total mass of the composition claim 2 , and (b) the molar ratio of antioxidants present in the composition to leuco compounds present in the composition is greater than 1:1.5. The composition of claim 4 , wherein the antioxidant composition comprises at least one sterically hindered phenol and at least one substituted diarylamine.6. The composition of claim 5 , wherein the hindered phenol is selected from the group consisting of 2 claim 5 ,6-bis(1-methylpropyl) ...

COMPOSITIONS AND METHODS FOR CLEANING AUTOMOTIVE SURFACES

An automotive surface is cleaned by applying an effective amount of a cleaning composition comprising a) at least one hydrocarbon solvent in an amount from about 3 weight percent to about 20 weight percent of the composition, b) at least one thickener/rheology modifier in an amount from about 0.01 weight percent to about 3 weight percent, c) at least one silicone fluid has a viscosity ranging from about 500 to about 20,000 centistokes at 25° C., present in an amount from about 0.1 weight percent to about 3 weight percent, d) at least one wetting agent in an amount from about 0.001 to about 2%, e) at least one hydrophobic additive in an amount from about 0.1 to about 3%, and f) water in an amount from about 60 weight percent to about 85 weight percent to the automotive surface with an application implement. 1. A method of cleaning an automotive surface comprises a) at least one hydrocarbon solvent in an amount from about 3 weight percent to about 20 weight percent of the composition,', 'b) at least one thickener/rheology modifier in an amount from about 0.01 weight percent to about 3 weight percent of the composition,', 'c) at least one silicone fluid has a viscosity ranging from about 500 to about 20,000 centistokes at 25° C., present in an amount from about 0.1 weight percent to about 3 weight percent of the composition,', 'd) at least one wetting agent in an amount from about 0.001 to about 2%,', 'e) at least one hydrophobic additive in an amount from about 0.1 to about 3%, and', 'f) water in an amount from about 60 weight percent to about 85 weight percent of the composition, 'applying an effective amount of a cleaning composition comprisingto the automotive surface; anddistributing the cleaning composition onto the automotive surface with an application implement.2. The method of claim 1 , wherein the at least one silicone fluid comprises a mixture of silicone fluid components claim 1 , wherein a first silicone fluid component has a viscosity ranging from about ...

HEADLIGHT LENS CLEANING AND RESTORING COMPOSITIONS AND METHODS OF USE THEREOF

A polycarbonate headlight lens cleaning and restoring kit has a lens cleaning composition, an applicator wipe; and a lens restoring composition comprising a coating component. The polycarbonate cleaning composition contains only liquid components and is free of water. The cleaning composition has a first solvent that softens a Control Polycarbonate Substrate and has a flash point of from −58 F to 220 F; and a second solvent that does not soften a Control Polycarbonate Substrate. The first solvent and the second solvent are present in an amount effective to substantially remove discoloring contaminants from a polycarbonate headlight lens and the polycarbonate lens, and also in an amount so that, after removal of the discoloring contaminants, the polycarbonate headlight lens can be restored to a clear condition. A method of cleaning and restoring a polycarbonate headlight lens that is at least partially discolored from discoloring contaminants is also provided. 1. A polycarbonate headlight lens cleaning and restoring kit comprising: i) a first solvent that softens a Control Polycarbonate Substrate, the first solvent having a Hash point of from −58° F. to 220° F., and', 'ii) a second solvent that does not soften a Control Polycarbonate Substrate, the second solvent being miscible with the first solvent in the ratio of use at a temperature of 25° C. at 1 atm;, 'a) a polycarbonate headlight lens cleaning composition that contains only liquid components, comprisingwherein the polycarbonate headlight lens cleaning composition is substantially free of water, andwherein the first solvent and the second solvent are present in an amount effective to substantially remove discoloring contaminants from a polycarbonate headlight lens and the first solvent and the second solvent are present in an amount so that the polycarbonate lens can be restored to a clear condition;b) an applicator wipe; andc) a polycarbonate headlight lens restoring composition comprising a coating component. ...

Photoresist Cleaning Composition Used in Photolithography and a Method for Treating Substrate Therewith

It is disclosed a photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 μm, which contains (a) quaternary ammonium hydroxide (b) a mixture of water-soluble organic solvents (c) at least one corrosion inhibitor and (d) water, and a method for treating a substrate therewith. 1. A photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 μm , which comprises (a) 0.5-5 mass % of at least one quaternary ammonium hydroxide or mixtures of two or more quaternary ammonium hydroxides; (b) 60-97.5 mass % of a mixture of water-soluble organic solvent comprising dimethylsulfoxide (DMSO) , sulfolane or dimethylsulfone or mixtures thereof , and at least one additional organic solvent or two or more additional organic solvents; (c) 0.5-15 mass % of at least one corrosion inhibitor or a mixture of two or more corrosion inhibitors; and (d) 0.5-25 mass % of water.2. The photoresist cleaning composition of claim 1 , which comprises (a) 0.5-5 mass % of at least one quaternary ammonium hydroxide or mixtures of two or more quaternary ammonium hydroxides; (b) 82-97.5 mass % of a mixture of water-soluble organic solvent comprising dimethylsulfoxide (DMSO) claim 1 , sulfolane or dimethylsulfone or mixtures thereof claim 1 , and at least one additional organic solvent or two or more additional organic solvents; (c) 1-5 mass % of at least one corrosion inhibitor or mixtures of two or more corrosion inhibitors; and (d) 1-10 mass % of water.3. The photoresist cleaning composition of claim 1 , wherein (b) comprises 80-96 mass % said dimethylsulfoxide (DMSO) claim 1 , sulfolane or dimethylsulfone or mixtures thereof claim 1 , and 1-4 mass % of said at least one additional organic solvent or two or more additional organic solvents; and said (c) comprises 1-5 mass %; and said (d) comprises 1-10 mass %.4. The photoresist cleaning composition of claim 2 , wherein said (c) comprises a mixture of two or more ...

Solvent compositions for removing petroleum residue from a substrate and methods of use thereof

A method of cleaning highway and road construction equipment is disclosed. 1placing equipment on a perforated gridspraying with a spray gun under pressure the residue containing equipmentfiltering the aqueous sludge through the grid and thus separating the insoluble contaminatescollecting the filtered aqueous sludge and preparing for recycling or disposal.. A method of cleaning highway and road construction equipment comprising: This application is a continuation of U.S. patent application Ser. No. 14/617,146 filed on Feb. 9, 2015 and entitled “Solvent compositions for removing petroleum residue from a substrate and methods of use thereof”, which is a continuation of U.S. patent application Ser. No. 13/618,074 filed on Sep. 14, 2012 and entitled “SOLVENT COMPOSITIONS FOR REMOVING PETROLEUM RESIDUE FROM A SUBSTRATE AND METHODS OF USE THEREOF”, now U.S. Pat. No. 8,951,952 issued on Feb. 10, 2015, which is a divisional of U.S. patent application Ser. No. 10/791,427 filed on Mar. 2, 2004 and entitled “Solvent compositions for removing petroleum residue from a substrate and methods of use thereof”, now U.S. Pat. No. 8,951,951 issued on Feb. 10, 2015, the disclosure of all of which is incorporated herein by reference in its entirety.The presently disclosed subject matter generally relates to solvent compositions for removing petroleum residue from a substrate and methods of use thereof. More particularly, the presently disclosed subject matter relates to water-soluble solvent compositions, which can be employed in removing petroleum residue from a substrate.The build-up of petroleum residue, such as asphalt and asphalt-related liquid, on processing equipment used in highway and road construction, as well as on equipment used in petroleum and chemical processing, storage and transport, has long been problematic. After a certain level of buildup occurs, the equipment is often no longer capable of being used for its intended purpose. Accordingly, it becomes necessary to ...

COMPOSITIONS COMPRISING 1,1-DIFLUOROETHENE (R-1132A)

The invention provides a composition comprising 1,1-difluoroethene (R-1132a); a second component selected from the group consisting of hexafluoroethane (R-116), ethane (R-170) and mixtures thereof; and, optionally carbon dioxide (CO, R-744). 1. A heat transfer composition comprising 1 ,1-difluoroethene (R-1132a); ethane (R-170); and , optionally carbon dioxide (R-744).2. A composition according to claim 1 , comprising from 20 to 99% by weight R-1132a claim 1 , a second component which is 1 to 80% by weight R-170 and optionally hexafluoroethane (R-116) claim 1 , and optionally R-744.3. A composition according to claim 1 , wherein the composition is selected from the group consisting of:1 to 50% by weight ethane and from 50 to 99% by weight R-1132a;1 to 25% by weight ethane and from 75 to 99% by weight R-1132a;{'sub': '2', 'R-1132a, ethane and up to 70% by weight CO;'}{'sub': '2', '2 to 98% by weight of R-1132a, from 2 to 98% by weight of ethane, and from 2 to 60% by weight CO;'}{'sub': '2', '4 to 96% by weight of R-1132a, from 4 to 96% by weight of ethane and from 4 to 50% by weight CO; and'}{'sub': '2', 'R-1132a, ethane, and from 6 to 40% by weight CO.'}4. A composition according to claim 1 , further comprising pentafluoroethane (R-125).5. A composition according to claim 1 , further comprising a hydrocarbon claim 1 , wherein the hydrocarbon is in addition to any ethane present in the composition.6. A composition according to claim 1 , wherein the composition is less flammable than R-1132a alone.7. A composition according to claim 6 , wherein the composition has:a. a higher flammable limit;b. a higher ignition energy; and/orc. a lower flame velocitycompared to R-1132a alone.8. A composition according to that is non-flammable.9. A composition according to claim 8 , wherein the composition is non-flammable at ambient temperature claim 8 , said ambient temperature including at least 60° C.10. A composition according to that has a temperature glide in an evaporator or ...

Cleaning solvent compositions exhibiting azeotrope-like behavior and their use

An azeotropic cleaning solvent composition has from about 96 to about 98 weight percent 1,1,1,3,3,3-hexafluoro-2-methoxypropane (“HFMOP”) and from about 2 to about 4 weight percent acetone, for example, about 97 weight percent HFMOP and about 3 weight percent acetone. Another composition of the invention has a weight ratio of HFMOP to acetone of about 24 to about 99, for example, about 24 to 49. Conventional additives such as surfactants, lubricants and co-solvents may be present in an amount not to exceed about 10 weight percent of the composition. A method of the invention comprises contacting an article of manufacture with the solvent composition in order to clean the article of manufacture and then removing the solvent composition from the article of manufacture.

HYDROCHLOROFLUOROOLEFINS AND METHODS OF USING SAME

A composition including a compound having structural formula (I): Ris a linear or branched perfluoroalkyl group having 1-3 atoms; n is 0-2; x is 1-3; and Rand Rare (i) independently, a linear or branched perfluoroalkyl group having 1-8 carbon atoms; or (ii) are bonded together to form a ring structure having 4-8 carbon atoms. The composition further includes a hydrocarbon contaminant. 2. The composition of claim 1 , wherein the hydrocarbon contaminant comprises a hydrocarbon having the formula CH claim 1 , where n is greater than 5.3. The composition of claim 2 , wherein the compound having structural formula (I) is present in the composition at an amount of at least 25% by weight based on the total weight of the composition.4. The composition of claim 2 , wherein the compound having structural formula (I) is present in the composition at an amount of at least 50% by weight based on the total weight of the composition.5. The composition of claim 2 , wherein the hydrocarbon contaminant is present in the composition at an amount of between 0.0001% and 20% by weight claim 2 , based on the total weight of the compounds of structural formula (I) in the post-clean composition.6. The composition of claim 1 , wherein the composition further comprises a co-solvent.7. The composition of claim 6 , wherein said co-solvent comprises alcohols claim 6 , ethers claim 6 , alkanes claim 6 , alkenes claim 6 , haloalkenes claim 6 , perfluorocarbons claim 6 , perfluorinated tertiary amines claim 6 , perfluoroethers claim 6 , cycloalkanes claim 6 , esters claim 6 , ketones claim 6 , oxiranes claim 6 , aromatics claim 6 , haloaromatics claim 6 , siloxanes claim 6 , hydrochlorocarbons claim 6 , hydrochlorofluorocarbons claim 6 , hydrofluorocarbons claim 6 , hydrofluoroolefins claim 6 , hydrochloroolefins claim 6 , hydrochlorofluoroolefins claim 6 , hydrofluoroethers claim 6 , or mixtures thereof.8. The composition of claim 1 , wherein the composition further comprises a surfactant.9. The ...

SUBSTRATE CLEANING SOLUTION AND METHOD FOR MANUFACTURING DEVICE

To obtain a substrate cleaning solution capable of cleaning a substrate and removing particles. The present invention is a substrate cleaning solution comprising a polymer (A), an alkaline component (B), and a solvent (C), provided that the alkaline component (B) does not comprise ammonia. 115.-. (canceled)16. A substrate cleaning solution comprising a polymer (A) , an alkaline component (B) , and a solvent (C) ,provided that the alkaline component (B) does not comprise ammonia.17. The substrate cleaning solution according to claim 16 , wherein the alkaline component (B) comprises at least one of primary amine claim 16 , secondary amine claim 16 , tertiary amine claim 16 , and quaternary ammonium salt claim 16 , and the alkaline component (B) comprises hydrocarbon.18. The substrate cleaning solution according to claim 16 , wherein the solvent (C) comprises an organic solvent.19. The substrate cleaning solution according to claim 16 , wherein the boiling point of the alkaline component (B) at one atmospheric pressure is 20-400° C.20. The substrate cleaning solution according to claim 16 , wherein the polymer (A) comprises at least one of novolak claim 16 , polyhydroxy styrene claim 16 , polystyrene claim 16 , polyachrylate derivative claim 16 , polymaleic acid derivative claim 16 , polycarbonate claim 16 , polyvinyl alcohol derivatives claim 16 , polymethacrylate derivatives claim 16 , and copolymer of any combination of any of these.21. The substrate cleaning solution according to claim 20 , wherein the polymer (A) does not contain fluorine and/or silicon.22. The substrate cleaning solution according to claim 16 , further comprising a crack accelerating component (D) claim 16 ,wherein the crack accelerating component (D) comprises hydrocarbon and further comprises a hydroxy group and/or a carbonyl group.23. The substrate cleaning solution according to claim 16 , wherein the content of the polymer (A) is 0.1-50 mass % based on the total mass of the substrate cleaning ...

PHOTORESIST STRIPPING AND CLEANING COMPOSITION, METHOD OF ITS PREPARATION AND ITS USE

A photoresist stripping and cleaning composition free from N-alkylpyrrolidones and added quaternary ammonium hydroxides comprising a component (A) which comprises the polar organic solvents N-methylimidazole, dimethylsulfoxide and 1-aminopropane-2-ol. 1. A composition comprising a component (A) which comprises the polar organic solvents N-methylimidazole , dimethylsulfoxide and 1-aminopropane-2-ol , wherein said composition is free from N-alkylpyrrolidones and added quaternary ammonium hydroxides.2. The composition according to claim 1 , wherein component (A) comprises claim 1 , based on the complete weight of all the three polar organic solvents claim 1 ,from 10-80% by weight N-methylimidazole,from 10-45% by weight dimethyl sulfoxide andfrom 10-45% by weight 1-aminopropane-2-ol.3. The composition according to claim 2 , wherein component (A) comprises N-methylimidazole claim 2 , dimethyl sulfoxide and 1-aminopropane-2-ol in a weight ratio of from 0.5:(0.6-1.4):1 to 4:(0.6-1.4):1.4. The composition according to claim 1 , further comprising at least one additive (B) selected from the group consisting of:(B-I) quaternary ammonium salts,(B-II) sulfoxides and thioethers,(B-III) surfactants and(B-IV) other additives, wherein the other additives are selected from the group consisting of: {'br': None, 'sub': 3', '2, 'CH—CH(—OH)—C(═O)—NR\u2003\u2003(I),'}, '(b1) 2-hydroxypropionic acid amides of formula Iwherein R represents alkyl groups having 1-6 carbon atoms, {'br': None, 'sup': 1', '2, 'R—C(═O)—O—R\u2003\u2003(II),'}, '(b2) aliphatic esters of the formula II{'sup': 1', '2, 'wherein Rrepresents alkyl groups having from 1-4 carbon atoms and Rrepresents linear and branched alkyl groups having from 4-8 carbon atoms;'} {'br': None, 'sub': 3', '2', 'j', '2, 'sup': '3', 'CH—(CH)—C(═O)—N(—R)\u2003\u2003(III),'}, '(b3) acetic, propionic, butyric, pentanoic acid and hexanoic acid amides of formula III{'sup': '3', 'wherein j represents 0 or an integer from 1 to 4 and Rrepresents an ...

CONDUCTIVE AQUEOUS SOLUTION PRODUCTION DEVICE AND CONDUCTIVE AQUEOUS SOLUTION PRODUCTION METHOD

A conductive aqueous solution production device 1 has an ion exchange device mounted on the way of the main pipe supplying ultrapure water W as raw water, a supply pipe which joins the main pipe on the downstream side of the ion exchange device and a conductivity-imparting substance supply device For example, if the conductivity-imparting substance is ammonia, since the ions are cations, that is, ammonium ions (NH), it is preferable that an ion exchanger which fills the ion exchange device be a cation exchange resin. If the conductivity-imparting substance is carbon dioxide, the ions are anions, that is, bicarbonate ions (HCO) or carbonate ions (CO), and therefore it is preferable that the ion exchange device be filled with an anion exchange resin. Such a conductive aqueous solution production device is capable of producing a conductive aqueous solution with a stable concentration, and achieves excellent follow-up performance with respect to a change in concentration. 1. A conductive aqueous solution production device comprising:an ion exchange device configured to circulate raw water; anda conductivity-imparting substance supply device for adding a conductivity-imparting substance to the raw water, which has passed through the ion exchange device, to generate a conductive aqueous solution,wherein if ions, which are generated by dissolving the conductivity-imparting substance in the raw water having passed through the ion exchange device and impart conductivity to the raw water, are cations, the ion exchange device is filled with a cation exchanger, whereas if the ions are anions, the ion exchange device is filled with an anion exchanger.2. The conductive aqueous solution production device according to claim 1 , wherein a separation distance between an outlet of the ion exchange device and an addition point of the conductivity-imparting substance by the conductivity-imparting substance supply device is 5 m or less.3. The conductive aqueous solution production device ...

Printing Press Wash

The present invention is drawn to a wash that will effectively clean printing related equipment such as a printing press, including all of its components, of materials used in the printing process, including printing inks, paper, and fountain solutions. 1. A low VOC press wash comprising 10-50% parachlorobenzotrifluoride; 40-70% water; 0.1-10% of a 100% VOC solvent with a flashpoint above 100° F.; 0.1-10% solvent with less than 100% VOC; 0.10-5% surfactants; and optionally a corrosion inhibitor.2. The press wash of example 1 wherein the water content is 50-70%.3. The press wash of example 1 , wherein the water content is 55-65%.4. The press wash of example 1 , wherein the surfactant is selected from sodium monooleate and dioctyl sodium sulfosuccinate and blends thereof.5. The press wash of example 1 , wherein the solvent with a flashpoint above 100° F. is selected from the group consisting of Aromatic 100 , Mineral Spirits , Aliphatic 142 Solvent , Aromatic 150 and blends thereof.6. The press wash of example 1 , wherein the solvent with less than 100% VOC is selected from the group consisting of example mineral oil and paraffin solvent and blends thereof.7. The press wash of example 1 , having 100 grams/liter or less volatile organic compounds.8. A method of cleaning press equipment comprising using the press wash of . U.S. Pat. No. 9,683,205US20120220511US20080280802U.S. Pat. No. 8,207,103WO2008141210US20080287331U.S. Pat. No. 8,512,481U.S. Pat. No. 5,340,495EP2041229EP1511833U.S. Pat. No. 4,829,897EP0435943WO2011089238The key advantage to the press washes of the present invention is improved cleaning power and efficiency over other low VOC (volatile organic compounds) South Coast Air Quality Management District (SCQAMD) compliant washes when cleaning printing ink and paper residue from rollers in the press ink train, the printing plate, and the printing blanket, without the negative effects that inhibit the printing process, such as slow evaporation and drying. ...

COMPOSITIONS AND METHODS FOR CLEANING AND STRIPPING

The present disclosure provides a composition for cleaning or stripping a material from a substrate. The composition includes a primary solvent and a co-solvent. The co-solvent includes one or more caprolactam-derived solvents. 2. The composition of claim 1 , wherein a concentration of the co-solvent is 5 wt. %-49 wt. % of the composition.3. The composition of claim 1 , wherein the one or more caprolactam-derived solvents include at least one of: N-methylcaprolactam claim 1 , N-ethylcaprolactam claim 1 , and N-butylcaprolactam.4. The composition of claim 1 , wherein the one or more caprolactam-derived solvents include two caprolactam-derived solvents.5. The composition of claim 4 , wherein each of the two caprolactam-derived solvents is from 5 wt. %-95 wt. % of the co-solvent.6. The composition of claim 4 , wherein the two caprolactam-derived solvents are N-methylcaprolactam and N-ethylcaprolactam.7. The composition of claim 4 , wherein the two caprolactam-derived solvents are N-methylcaprolactam and N-butylcaprolactam.8. The composition of claim 4 , wherein the two caprolactam-derived solvents are N-ethylcaprolactam and N-butylcaprolactam.9. The composition of claim 4 , wherein the caprolactam-derived solvents further include a third caprolactam-derived solvent.10. The composition of claim 9 , wherein each of the three caprolactam-derived solvents is from 5 wt. %-90 wt. % of the co-solvent.11. The composition of claim 9 , wherein the three caprolactam-derived solvents are N-methylcaprolactam claim 9 , N-ethylcaprolactam claim 9 , and N-butylcaprolactam.12. The composition of claim 1 , further including a surfactant.13. The composition of claim 1 , further including thickening agent.15. The method of claim 14 , wherein the one or more caprolactam-derived solvents include at least one of: N-methylcaprolactam claim 14 , N-ethylcaprolactam claim 14 , and N-butylcaprolactam.16. The method of claim 14 , wherein the one or more caprolactam-derived solvents include at ...

Separating method of fluorine-containing solvent, removing method of fluorine-containing solvent contaminant, and apparatus therefore

An object of the invention is to separate a fluorine-containing solvent in a short time and efficiently from a fluorine-containing solvent which contains alcohol. There is provided a method for separating a fluorine-containing solvent by filtering a mixed liquid composition containing the fluorine-containing solvent, alcohol and water with a membrane containing fluorine resin.

CLEANING SOLUTION FOR REMOVING DRY ETCHING RESIDUE AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE USING SAME

The present invention can provide a cleaning solution containing 0.2-20 mass % of an amine compound (A), 40-70 mass % of a water-soluble organic solvent (B), and water, wherein the amine compound (A) contains at least one selected from the group consisting of n-butylamine, hexylamine, octylamine, 1,4-butanediamine, dibutylamine, 3-amino-1-propanol, N,N-diethyl-1,3-diaminopropane, and bis(hexamethylene)triamine, and the water-soluble organic solvent (B) has a viscosity of 10 mPa·s or less at 20° C. and a pH of 9.0-14. 1. A cleaning solution , comprising:from 0.2 to 20 mass % of an amine compound,from 40 to 70 mass % of a water-soluble organic solvent andwater,wherein:the amine compound comprises one or more selected from the group consisting of n-butylamine, hexylamine, octylamine, 1,4-butanediamine, dibutylamine, 3-amino-1-propanol, N,N-diethyl-1,3-diaminopropane and bis(hexamethylene)triamine;the water-soluble organic solvent has a viscosity of 10 mPa·s or less at 20° C.; andpH is in a range of from 9.0 to 14.2. The cleaning solution according to claim 1 , wherein a content of the amine compound is from 2.0 to 4.0 mass %.3. The cleaning solution according to claim 1 , wherein a content of water is from 28 to 59 mass %.4. The cleaning solution according to claim 1 , wherein the water-soluble organic solvent comprises one or more selected from the group consisting of diethylene glycol monomethyl ether claim 1 , diethylene glycol monobutyl ether claim 1 , triethylene glycol monomethyl ether claim 1 , dipropylene glycol monomethyl ether and N claim 1 ,N-dimethyl isobutylamide.5. The cleaning solution according to claim 1 , wherein the amine compound comprises one or more selected from the group consisting of 3-amino-1-propanol claim 1 , N claim 1 ,N-diethyl-1 claim 1 ,3-diaminopropane and bis(hexamethylene)triamine.6. The cleaning solution according to claim 1 , which is suitable for removing dry etching residue.7. A method for manufacturing a semiconductor substrate ...

SUBSTRATE CLEANING SOLUTION, AND USING THE SAME, METHOD FOR MANUFACTURING CLEANED SUBSTRATE AND METHOD FOR MANUFACTURING DEVICE

[Problem] To obtain a substrate cleaning solution capable of cleaning a substrate and removing particles. [Means for Solution] The present invention is a substrate cleaning solution comprising an insoluble or hardly soluble solute (A), a soluble solute (B), and a solvent (C). 114.-. (canceled)15. A substrate cleaning solution comprising an insoluble or hardly soluble solute (A); a soluble solute (B); and a solvent (C) ,wherein the substrate cleaning solution is dripped on a substrate and dried to remove the solvent (C), and filmed insoluble or hardly soluble solute (A) together with the soluble solute (B) remains in the film on the substrate, the film being then removed from the substrate by a remover.16. The substrate cleaning solution according to claim 15 , wherein the insoluble or hardly soluble solute (A) is insoluble or hardly insoluble in the remover; and the soluble solute (B) is soluble in the remover.17. The substrate cleaning solution according to claim 15 , the solvent (C) comprises an organic solvent claim 15 , andthe solvent (C) has volatility; andthe boiling point of the solvent (C) at one atmospheric pressure is 50-250° C.18. The substrate cleaning solution according to claim 15 , wherein the insoluble or hardly soluble solute (A) comprises at least one of novolak claim 15 , polyhydroxy styrene claim 15 , polystyrene claim 15 , polyacrylate derivatives claim 15 , polymaleic acid derivatives claim 15 , polycarbonate claim 15 , polyvinyl alcohol derivatives claim 15 , polymethacrylate derivatives claim 15 , and copolymer of any combination of any of these claim 15 , and the insoluble or hardly soluble solute (A) does not contain fluorine and/or silicon.19. The substrate cleaning solution according to claim 15 , wherein the soluble solute (B) is a crack accelerating component (B′) claim 15 ,where the crack accelerating component (B′) comprises hydrocarbon and further comprises a hydroxy group and/or a carbonyl group.21. The substrate cleaning solution ...

METHOD FOR CLEANING A SYNTHETIC SURFACE

The invention relates to a method for cleaning a synthetic surface, in particular to remove metal dirt and/or particles therefrom, said method being characterized by the following steps: a) the synthetic surface is rinsed with deionized water; b) the synthetic surface is rinsed with electrolyzed water; and c) the synthetic surface is rinsed with deionized water. 1. A method for cleaning and/or removing metallic contaminants and/or particles from a plastics surface , comprising:a) rinsing the plastics surface with deionized water, thenb) rinsing the plastics surface with electrolyzed water, and thenc) rinsing the plastics surface with deionized water.2. The method as claimed in claim 1 , wherein the rinsing the plastics with electrolyzed water comprises rinsing with anodic water having a pH of less than 7.3. The method as claimed in claim 1 , wherein the rinsing the plastics with electrolyzed water comprises rinsing with cathodic water having a pH of greater than 7.4. The method as claimed in claim 3 , wherein the plastics surface is rinsed with anodic water before it is rinsed with the cathodic water.5. The method as claimed in further comprising the step of adjusting the pH and/or the redox potential of the electrolyzed water to a predetermined value.6. The method as claimed in claim 5 , wherein in the step of adjusting the electrolyzed water is produced in an electrolysis cell which comprises two electrodes and into which water admixed with an electrolyte is introduced claim 5 , and the pH and/or the redox potential of the electrolyzed water is adjusted by using a concentration of the electrolyte and/or an electrical current flowing between the two electrodes as control parameter(s).7. The method as claimed in wherein the rinsing of the plastics surface in steps a) claim 1 , b) claim 1 , and c) lasts between 5 seconds and 600 seconds.8. The method as claimed in wherein the rinsing of the plastic surface in steps a) claim 1 , b) claim 1 , and c) lasts for different ...

Heat Transfer Compositions

A heat transfer composition comprising trans-1,3,3,3-tetrafluoropropene (R-1234ze(E)), carbon dioxide (R-744) and a third component selected from difluoromethane (R-32), 1,1-difluoroethane (R-152a), fluoroethane (R-161), 1,1,1,2-tetrafluoroethane (R-134a), propylene, propane and mixtures thereof. 1. A heat transfer composition comprising:trans-1,3,3,3-tetrafluoropropene (R-1234ze(E));carbon dioxide (R-744, CO2); anda third component selected from a group consisting of propylene, propane and mixtures thereof.2. A composition according to claim 1 , said composition comprising at least about 45% by weight of said R-1234ze(E).3. A composition according to claim 1 , said composition comprising greater than zero percent and up to about 12% by weight of said CO2.4. A composition according to claim 3 , said composition comprising from about 1 to about 10% by weight of said CO2.5. A composition according to claim 4 , said composition comprising about 2 to about 7% by weight of said CO2.6. A composition according to claim 1 , said composition comprising greater than zero percent and up to about 50% by weight of said third component.7. A composition according to claim 6 , wherein said third component is selected from a group consisting of propylene and propane claim 6 , said composition comprising from about 1 to about 10% by weight of said third component.8. A composition according to claim 7 , said composition comprising from about 2 to about 8% by weight of said third component.9. A composition according to claim 8 , said composition comprising from about 2 to about 10% by weight of said R-744.10. A composition according to claim 8 , said composition comprising from about 3 to about 6% by weight of said third component.11. A composition according to claim 10 , said composition comprising from about 2 to about 10% by weight of said R-744.12. A composition according to claim 1 , said composition consisting essentially of said R-1234ze(E) claim 1 , said R-744 and said third ...

Azeotropic and Azeotrope-Like Compositions of Hfo-E-1,3,4,4,4-Pentafluoro-3-Trifluoromethyl-1-Butene and Uses Thereof

Azeotropic or azeotrope-like compositions are disclosed. The azeotropic or azeotrope-like compositions are mixtures of HFO-E-1,3,4,4,4-pentafluoro-3-trifluoromethyl-1-butene with a second compound selected from the group consisting of methyl formate and HFO-E-1,1,1,4,4,4-hexafluoro-2-butene. Also disclosed are processes of preparing a thermoplastic or thermoset foam by using such azeotropic or azeotrope-like compositions as blowing agents; of producing refrigeration by using such azeotropic or azeotrope-like compositions; of producing cooling; of producing heating; of using such azeotropic or azeotrope-like compositions as solvents; of producing an aerosol product by using such azeotropic or azeotrope-like compositions; of using such azeotropic or azeotrope-like compositions as heat transfer media; of extinguishing or suppressing a fire by using such azeotropic or azeotrope-like compositions; and of using such azeotropic or azeotrope-like compositions as dielectrics. 1. A composition consisting essentially of:(a) HFO-E-1,3,4,4,4-pentafluoro-3-trifluoromethyl-1-butene; and(b) methyl formate; wherein the methyl formate is present in an effective amount to form an azeotropic composition with the HFO-E-1,3,4,4,4-pentafluoro-3-trifluoromethyl-1-butene.2. The composition of claim 1 , consisting essentially of:(a) from about 11.2 mole percent to about 46.5 mole percent HFO-E-1,3,4,4,4-pentafluoro-3-trifluoromethyl-1-butene; and(b) from about 53.5 mole percent to about 88.8 mole percent methyl formate.3. The composition of claim 2 , consisting essentially of:(a) about 42.1 mole percent HFO-E-1,3,4,4,4-pentafluoro-3-trifluoromethyl-1-butene; and(b) about 57.9 mole percent methyl formate.4. A composition consisting essentially of:(a) HFO-E-1,3,4,4,4-pentafluoro-3-trifluoromethyl-1-butene; and(b) methyl formate; wherein the methyl formate is present in an effective amount to form an azeotrope-like composition with the HFO-E-1,3,4,4,4-pentafluoro-3-trifluoromethyl-1-butene.5. ...

ADHESIVE REMOVER COMPOSITIONS AND METHODS OF USE

The invention is directed to adhesive remover compositions and methods of their use. The adhesive remover compositions generally comprise a glycol ether solvent system comprising an aliphatic glycol ether, an aromatic glycol ether, a hydrophobic glycol ether, and a hydrophilic glycol ether, and a surfactant system. In further embodiment of the invention, the surfactant system may comprise three surfactants. In another aspect of the invention, the composition effectively removes medical adhesives from healthcare textiles. In a particular embodiment of the invention, the surfactant system may comprise one or more nonionic surfactants 1. An adhesive remover composition comprising:a glycol ether solvent system comprising an aliphatic glycol ether, an aromatic glycol ether, a hydrophobic glycol ether, and a hydrophilic glycol ether; anda surfactant system.2. The composition of claim 1 , wherein the surfactant system contains at least one nonionic surfactant.3. The composition of claim 1 , wherein the surfactant system comprises at least two surfactants.4. The composition of further comprising water between about 0 wt. % and about 20 wt. %.5. The composition of claim 1 , wherein the glycol ether solvent system is between about 8 wt. % and about 94 wt. % of the composition.6. The composition of claim 1 , wherein the surfactant system is between about 6 wt. % and about 90 wt. % of the composition.7. The composition of claim 1 , wherein the composition is phosphorus-free.8. The composition of claim 1 , wherein the composition is free of petroleum distillates.9. The composition of claim 1 , wherein the composition is free of nonylphenol ethoxylates.10. The composition of claim 1 , wherein the composition is free of D-limonene.11. An adhesive remover composition comprising:an aliphatic glycol ether present between about 5 wt. % and about 35 wt. %;an aromatic glycol ether present between about 1 wt. % and about 20 wt. %;a hydrophobic glycol ether present between about 1 wt. % ...

Cleaning solution and cleaning method for a semiconductor substrate or device

A cleaning solution and a cleaning method for a semiconductor substrate or device, which has particularly excellent cleaning performance for removing a residue or film including an inorganic substance that contains silicon atoms, and that has a high flash point. The cleaning solution contains a water miscible organic solvent, a quaternary ammonium hydroxide, and water. The water miscible organic solvent is a glycol ether based solvent or an aprotic polar solvent having a flash point of 60° C. or greater. The cleaning method includes using the cleaning solution to clean from the semiconductor substrate or the device a residue or film formed on the semiconductor substrate or adhered to the device, the residue or film including at least one of a resist and an inorganic substance that contains silicon atoms.

CLEANING COMPOSITION AND CLEANING METHOD

Provided are a cleaner composition that can exhibit excellent cleaning ability by including a predetermined amount of water, and can also effectively suppress metal corrosion; and a cleaning method thereof. Disclosed is a cleaner composition in a white turbid state including first to fourth organic solvents and water, in which the first organic solvent is a hydrophobic aromatic compound or the like; the second organic solvent is a hydrophobic monoalcohol compound; the third organic solvent is a predetermined hydrophilic nitrogen-containing compound or the like; the fourth organic solvent is a hydrophilic amine compound; the amount of incorporation of water is adjusted to a value within the range of 50 to 3,900 pbw with respect to 100 pbw of the total amount of the organic solvents, and when the cleaner composition is subjected to phase separation, the water concentration in the oil phase is adjusted to a value of 5 wt. % or less. 1. A cleaner composition for cleaning an object of cleaning in a white turbid state ,the cleaner composition comprising first to fourth organic solvents and water,wherein the first organic solvent is at least one compound selected from the group consisting of a hydrophobic aromatic compound, a hydrophobic terpene-based compound, and a hydrophobic naphthene-based compound, all of the compounds having a solubility value in water (measurement temperature: 20° C.) of 10% by weight or less,the second organic solvent is a hydrophobic monoalcohol compound having a solubility value in water (measurement temperature: 20° C.) of 10% by weight or less,the third organic solvent is a hydrophilic nitrogen-containing compound and a hydrophilic sulfur-containing compound, or any one of the compounds, both the compounds having a solubility value in water (measurement temperature: 20° C.) of 50% by weight or greater,the fourth organic solvent is a hydrophilic amine compound having a solubility value in water (measurement temperature: 20° C.) of 50% by weight ...

CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 5) at least one quaternary ammonium hydroxide; and 6) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate. 1. A cleaning composition , comprising:1) at least one redox agent;2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid;3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole;4) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers;5) at least one quaternary ammonium hydroxide; and6) water.2. The composition of claim 1 , wherein the pH of the composition is between about 6 and about 11.3. The composition of claim 1 , wherein the at least one redox agent comprises hydroxylamine.4. The composition of claim 1 , wherein the at least one redox agent is from about 0.5% to about 20% by weight of the composition.5. The composition of claim 1 , wherein the polyaminopolycarboxylic acid is selected from the group consisting of mono- or polyalkylene polyamine polycarboxylic acids claim 1 , polyaminoalkane polycarboxylic acids claim 1 , polyaminoalkanol polycarboxylic acids claim 1 , and hydroxyalkylether polyamine polycarboxylic acids.6. The composition of claim 1 , wherein the polyaminopolycarboxylic acid is selected from the group consisting of butylenediaminetetraacetic acid claim 1 , ...

COMPOSITION FOR REMOVING PHOTORESIST RESIDUE AND/OR POLYMER RESIDUE

To provide a composition for removing photoresist residue and/or polymer residue formed in a process for producing a semiconductor circuit element, and a removal method employing same. A composition for removing photoresist residue and/or polymer residue, the composition containing saccharin and water, and the pH being no greater than 9.7. 1. A composition for removing photoresist residue and/or polymer residue , the composition comprising saccharin and water , and the pH being no greater than 9.7.2. The composition according to claim 1 , wherein it further comprises one or more types of substance selected from the group consisting of (A) a water-soluble solvent claim 1 , (B) an acid claim 1 , and (C) a dissociable nitrogen-containing compound.3. The composition according to claim 1 , wherein the content of saccharin is at least 0.01 mass %.4. A method for removing photoresist residue and/or polymer residue claim 1 , the method employing the composition according to .5. A method for producing a semiconductor circuit element having metal wiring claim 1 , the method comprising a step of removing photoresist residue and/or polymer residue remaining on a metal wiring-forming structure using the composition according to .6. A semiconductor circuit element produced by the method according to .7. The composition according to claim 2 , wherein the content of saccharin is at least 0.01 mass %.8. A method for removing photoresist residue and/or polymer residue claim 2 , the method employing the composition according to .9. A method for producing a semiconductor circuit element having metal wiring claim 2 , the method comprising a step of removing photoresist residue and/or polymer residue remaining on a metal wiring-forming structure using the composition according to .10. A semiconductor circuit element produced by the method according to . The present invention relates to a composition for removing photoresist residue and/or polymer residue remaining after dry etching or ...

WAFER TREATMENT SOLUTION FOR EDGE-BEAD REMOVAL, EDGE FILM HUMP REDUCTION AND RESIST SURFACE SMOOTH, ITS APPARATUS AND EDGE-BEAD REMOVAL METHOD BY USING THE SAME

The present disclosure provides a wafer treatment solution for edge-bead removal, edge film hump reduction and resist surface smooth. The wafer treatment solution includes a solution and a fluorine-containing additive mixed in the solution. The fluorine-containing additive has a following formula (I): R—X—(CHCHO)—R(I); or a following formula (II): 3. The wafer treatment solution of claim 1 , wherein the fluorine-containing additive has the compound of the formula (I) claim 1 , wherein Ris a C6 perfluoroalkyl group claim 1 , R1 is hydrogen claim 1 , X is CH2O claim 1 , and m is between 1 to 6 claim 1 , so that the chemical structure of the fluorine-containing additive is formula (III):{'br': None, 'sub': 3', '2', '2', '2', '2', '2', '2', '2', '2, 'i': 'm', 'CFCFCFCFCFCFCHO(CHCHO)H\u2003\u2003(III).'}4. The wafer treatment solution of claim 1 , wherein the content of the fluorine-containing additive in the wafer treatment solution is in a range of 0.1-5 wt %.5. The wafer treatment solution of claim 1 , wherein the solution is selected from the group consisting of propylene glycol methyl ether (PGME) claim 1 , propylene glycol methyl ether acetate (PGMEA) claim 1 , cyclohexanol claim 1 , cyclohexanone claim 1 , γ-butyrolactone (GBL) claim 1 , N-methyl-2-pyrrolidone (NMP) claim 1 , n-butyl acetate (NBA) claim 1 , methyl ethyl ketone (MEK) claim 1 , diacetone alcohol (DAA) claim 1 , methyl isobutyl ketone (MIBK) claim 1 , dimethyl sulfoxide (DMSO) claim 1 , water claim 1 , ethanol claim 1 , propanol claim 1 , butanol claim 1 , isopropyl alcohol (IPA) claim 1 , 4-methyl-2-pentanol (MIBC) and a combination thereof.6. The wafer treatment solution of claim 1 , wherein the solution is a mixed solution of PGME and PGMEA claim 1 , and the weight ratio of PGME and PGMEA is 70:30.7. A method for edge-bead removal claim 1 , comprising:forming a photoresist layer on a semiconductor wafer, the semiconductor wafer is positioned on and in contact with a rotatable wafer chuck; and{' ...

USE OF IMPROVED N-ALKYL PYRROLIDONE SOLVENT

The present invention is concerned with the use of pyrrolidones selected from the group consisting of N-n-butylpyrrolidone, N-isobutylpyrrolidone, N-t-butylpyrrolidone, N-n-pentylpyrrolidone, N-(methyl-substituted butyl)pyrrolidones, ring-methyl-substituted N-propyl and N-butyl pyrrolidones and N-(methoxypropyl) pyrrolidone as replacement solvents in specific applications wherein N-methylpyrrolidone (NMP), N-ethyl-2-pyrrolidone (NEP), N,N-dimethyl acetamide (DMAc), and/or dimethyl formamide (DMF) is the appropriate solvent to be used. The invention is also concerned with a solvent comprising NMP, NEP, DMAc, or DMF and one or more pyrrolidones selected from said group, as well as a solvent comprising a second solvent, which is a replacement solvent for NMP, NEP, DMAc, or DMF and one or more selected from said group. 118.-. (canceled)19. A method of using one or more pyrrolidones selected from the group consisting of N-n-butylpyrrolidone , N-isobutylpyrrolidone , N-t-butylpyrrolidone , N-n-pentylpyrrolidone , N-(methyl-substituted butyl)pyrrolidones , ring-methyl-substituted N-propyl and N-butyl pyrrolidones , and N-(methoxypropyl)pyrrolidone , as a non-reprotoxic solvent.20. The method according to for the partial or complete replacement of a solvent selected from the list consisting of N-methylpyrrolidone (NMP) claim 19 , N-ethyl-2-pyrrolidone (NEP) claim 19 , dimethyl formamide (DMF) claim 19 , N claim 19 ,N-dimethyl acetamide (DMAc) claim 19 , and mixtures thereof as a solvent whereby the solvent comprises at least 1 vol % of at least one of the selected pyrrolidones.21. The method according to as a co-solvent in a solvent comprising at least NMP claim 19 , NEP claim 19 , DMAc claim 19 , or DMF whereby the solvent comprises at least 1 vol % of at least one of the selected pyrrolidones.22. The method according to as a co-solvent in a solvent comprising a second solvent which is a replacement solvent for NMP claim 19 , NEP claim 19 , DMAc claim 19 , or DMF claim 19 ...

AZEOTROPIC COMPOSITION, AZEOTROPE-LIKE COMPOSITION, COMPOSITION, CLEANING AGENT, SOLVENT, AND HEAT TRANSFER MEDIUM

To provide an azeotropic composition, an azeotrope-like composition and a composition, which have little influence over the global environment, which are non-flammable, and which are less likely to undergo composition change even when evaporated and condensed repeatedly, and a detergent, a solvent and a heat transfer fluid, which contain the azeotropic composition, the azeotrope-like composition or the composition. 1. An azeotropic composition consisting essentially of 34.5 mass % of (Z)-1-chloro-2 ,3 ,3-trifluoropropene and 65.5 mass % of trans-1 ,2-dichloroethylene.2. An azeotrope-like composition consisting essentially of from 28 to 41 mass % of (Z)-1-chloro-2 ,3 ,3-trifluoropropene and from 59 to 72 mass % of trans-1 ,2-dichloroethylene.3. The azeotrope-like composition according to claim 2 , which has a relative volatility of 1.00±0.10.4. A composition containing (Z)-1-chloro-2 claim 2 ,3 claim 2 ,3-trifluoropropene and trans-1 claim 2 ,2-dichloroethylene claim 2 , wherein the total proportion of (Z)-1-chloro-2 claim 2 ,3 claim 2 ,3-trifluoropropene and trans-1 claim 2 ,2-dichloroethylene in the composition to the total amount of the composition is at least 90 mass % claim 2 , and the mass ratio of (Z)-1-chloro-2 claim 2 ,3 claim 2 ,3-trifluoropropene to trans-1 claim 2 ,2-dichloroethylene is from 28/72 to 41/59.5. The composition according to claim 4 , which further contains (E)-1-chloro-2 claim 4 ,3 claim 4 ,3-trifluoropropene.6. A detergent containing the azeotropic composition as defined in .7. A detergent containing the azeotrope-like composition as defined in .8. A detergent containing the composition as defined in .9. A solvent containing the azeotropic composition as defined in .10. A solvent containing the azeotrope-like composition as defined in .11. A solvent containing the composition as defined in .12. An aerosol composition containing the azeotropic composition as defined in .13. An aerosol composition containing the azeotrope-like composition as ...

SILICONE SOLVENT

A composition comprising a phosphonitrile halide and an oligomeric organopolysiloxanes having from 10 to 50 Si units is effective to remove silicone residues from substrates with minimal swelling of thin polymer substrates. 15.-. (canceled)6. Composition for removal of crosslinked polydimethylsiloxanes , containing:A) at least one phosphonitrile halide compound, andB) at least one linear polydimethylsiloxane having a chain length of 10 to 50 Si units and a molar mass of 730 g/mol to 5000 g/mol.7. The composition of claim 6 , wherein 0.1-3.0 parts by weight of A) are used per 100 parts by weight of B).8. The composition of claim 6 , wherein A) is phosphonitrile chloride.9. The composition of claim 7 , wherein A) is phosphonitrile chloride.10. Process for preparing the composition of claim 6 , comprising mixing components A) and B).11. A method for depolymerization and removal of crosslinked or uncrosslinked silicone residue from surfaces or substrates claim 6 , comprising applying a composition of to the silicone residue. This application is the U.S. National Phase of PCT Appln. No. PCT/EP2012/060531 filed Jun. 4, 2012, which claims priority to German Application No. 10 2011 077 004.6 filed Jun. 6, 2011, the disclosures of which are incorporated in their entirety by reference herein.1. Field of the InventionThe present invention relates to a composition containing a phosphonitrile halide catalyst and also linear polydimethylsiloxanes having a defined MW range and defined chain length for depolymerization and removal of silicone residues. The composition of the present invention is particularly useful for removing crosslinked or uncrosslinked, filled or unfilled silicone residues from sensitive surfaces and substrates. The silicone dissolver can be liquid, pasty or gel-like in the various applications, depending on the field of use.2. Description of the Related ArtVarious methods and compositions for removing or depolymerizing crosslinked or uncrosslinked silicones ...