Anordnung zur Halterung eines optischen Elementes in einer mikrolithographischen Projektionsbelichtungsanlage

Die Erfindung betrifft eine Anordnung zur Halterung eines optischen Elementes in einer mikrolithographischen Projektionsbelichtungsanlage mit wenigstens einem Aktor, welcher eine steuerbare Kraft auf das optische Element ausübt, wobei zwischen dem Aktor und dem optischen Element wenigstens ein elastisches Mehrschichtlager (110, 210, 310, 410, 411, 510, 610, 710, 711, 712, 810, 811, 812, 911, 912) angeordnet ist.

Durchsichtiger Gegenstand aus Glas oder anderen durchsichtigen Stoffen

Methode und Vorrichtung zur Kompensation transienter thermischer Belastung eines Photolithographiespiegels

VERFAHREN ZUR HERSTELLUNG EINES BEHEIZTEN SPIEGELS

Anordnung eines optischen Systems und Temperierungsverfahren

Ausgegangen wird von einer Anordnung eines optischen Systems mit mindestens einem optischen Element und einer elektromagnetische Wellen emittierenden Strahlungsquelle, beispielsweise einem Laser. Das optische Element umfasst zumindest einen Einstrahlbereich für die elektromagnetische Strahlung. Unter Einwirkung der elektromagnetischen Strahlung weist das optische Element lokale Bereiche unterschiedlicher Erwärmung auf, wodurch sich insbesondere in einem Funktionsbereich oder -fläche des Einstrahlbereichs eine Temperaturverteilung mit voneinander unterschiedlichen Temperaturwerten ausbildet. Zusätzlich umfasst die Anordnung eine Heizvorrichtung, die ausgebildet ist, zumindest in lokalen Bereichen mit erniedrigter Erwärmung durch Einbringen einer Wärmeenergie die Temperaturwerte zu erhöhen.

Optisches Element

Ein optisches Element (40) insbesondere reflektives Element wie Spiegel oder Beugungsgitter, weist einen Körper (42), der ein lichteinfallseitiges Vorderteil (44), der eine optische wirksame Fläche (48) aufweist, und ein Rückteil (46) auf, und der zwischen dem Vorteil (44) und dem Rückteil (46) einen Hohlraum (50) aufweist, wobei sich der Hohlraum (50) im Wesentlichen entlang der gesamten optisch wirksamen Fläche (48) erstreckt, und wobei der Hohlraum (50) zur Aufnahme eines Kühlmediums dient, wobei der Körper (42) weiterhin zumindest einen Einlass (54) und zumindest einen Auslass (56) des Kühlmediums aufweist. In dem Hohlraum (50) verteilt sind eine Mehrzahl an strömungsbeeinflussenden Elementen (52) angeordnet, die sich von dem Vorderteil (44) zu dem Rückteil (46) erstrecken und das Vorderteil (44) mit dem Rückteil (46) verbinden.

ELEKTRISCH BEHEIZBARES REFLEXIONSELEMENT

Condensation free mirror installation

Condensation free mirror installation having electrical heater layer to raise temperature above dew point ...

Temperiervorrichtung für eine optische Baugruppe

Eine Temperiervorrichtung (19) dient zum Temperieren einer optischen Baugruppe (16) mit mindestens einem zu temperierenden optischen Körper (17) mit mindestens einer mit einem Wärmestrom beaufschlagbaren optischen Fläche (18). Die Temperiervorrichtung (19) hat eine Wärmesenke (20) zum Empfangen eines Wärmestroms (21), die vom optischen Körper (17) oder einem mit dem optischen Körper (17) in thermischer Verbindung stehenden Übertragungskörper abgegeben wird. Die Wärmesenke (20) ist einem Umfangsbereich (22) der optischen Fläche (18) benachbart angeordnet. Die Temperiervorrichtung (19) hat eine Heizeinrichtung (28) mit mindestens einem Heizkörper (29), der dem optischen Körper (17) benachbart angeordnet ist. Der Heizkörper (29) ist über eine körperliche Wärmebrücke (32) mit der Wärmesenke (20) verbunden.

HIGH POWER LASER APPARATUS

LASER MIRROR HEAD

Fluid pressure applied to a power laser mirror 23 controls mirror geometry and offsets thermal deformations. Cooling 83 is provided, and display 81 shows concave/ convex bending values (eg focal length). Pressure control may be manual via wheel 80, or by feedback. Mirror thickness may vary (Fig 3). Laser beams may be controlled outside the resonator, and the focussing area changed. …… ...

MIRROR WITH HEATER ELEMENT

Heated mirror

A device incorporated into a mirror to avoid the formation of misting; and comprising at least one chamber 17, one of whose larger sides is formed by a mirror 18; a fluid inside the chamber 21; and means 22 for heating said fluid to above dew point at which misting occurs on the outside of the mirror. Alternatively, the mirror may be heated by an electrical heating panel or by having hot air blown over the mirror surface. ...

MIRROR WITH AN ELECTRICAL HEATING MECHANISM

RESISTANCE HEATING DEVICE FOR LAMINAR OBJECTS, IN PARTICULAR FOR MIRRORS

DEFORMABLE-MIRROR COOLING

Anti-breathing mirror

DEVICE INCORPORATED INTO A MIRROR TO AVOID THE FORMATION OF MISTINT

Adaptive mirror with cooling channels

HEATED REAR-VIEW MIRROR

MIRROR HAVING ELECTRICAL HEATING MEANS

Optisches Element

MIROIR INCORPORANT UN MOYEN DE CHAUFFAGE ELECTRIQUE.

LASER MIRROR HEAD.

Arrangement for measuring laser beam parameters has mirror with sensitive layer(s) applied to mirror substrate or in mirror coating, connected to evaluation circuit

The arrangement has a mirror with a mirror substrate (1) and layers of mirror coating at which the laser beam is reflected and to which sensors are attached. At least one sensitive layer (3,6) is applied to the mirror substrate or within the mirror coating and is connected to an evaluation circuit.

Deformation-cash mirror, in particular for a laser beam material processing mechanism.

MIROIR DEFORMABLE REFROIDI ET PROCEDE POUR REFROIDIR SA PLAQUE FRONTALE CONTINUE

L'INVENTION CONCERNE UN MIROIR DEFORMABLE REFROIDI PRESENTANT UNE SURFACE REFLECHISSANTE CONTINUE ET UN PROCEDE POUR REFROIDIR CE MIROIR. UN OU PLUSIEURS ESPACES FERMES, DELIMITES A L'INTERIEUR DE LA PLAQUE FRONTALE 12 DU MIROIR, SONT ALIMENTES EN FLUIDE DE REFROIDISSEMENT A TRAVERS UN OU PLUSIEURS ACTIONNEURS 16 DESTINES A DEFORMER LA SURFACE DU MIROIR. UN OU PLUSIEURS AUTRES DE CES ACTIONNEURS 16 SONT UTILISES POUR EVACUER LE FLUIDE DE REFROIDISSEMENT DE LA PLAQUE FRONTALE 12. LE MIROIR COMPORTE UN COLLECTEUR DE BASE 10 RECEVANT LE FLUIDE DE REFROIDISSEMENT D'UNE SOURCE EXTERIEURE ET LE DISTRIBUANT VERS CERTAINS, CHOISIS, DES ACTIONNEURS 16 DE CERTAINS AUTRES DESQUELS IL RECOIT LE FLUIDE DE REFROIDISSEMENT RENVOYE VERS LA SOURCE EXTERIEURE. DOMAINE D'APPLICATION: SYSTEMES OPTIQUES A LASER.

Heating mirror, process and device for its realization.

TOGETHER OF GUARD FOR TELESCOPE Of OBSERVATION

Un ensemble de garde pour télescope d'observation (10) comprend au moins un élément chauffant (15-1,..., 15-5) pour chauffer une structure tubulaire (14) qui est agencée autour de l'entrée optique du télescope. Le chauffage de la structure permet de réduire des écarts de température et des variations d'écart de température présents dans un miroir primaire (1) du télescope, et de réduire en conséquence des déformations et des variations de déformation dudit miroir. Une dégradation de qualité optique pour des images formées par le télescope est ainsi limitée. L'ensemble de garde peut aussi comprendre des portions de surface distinctes (21, 22) sur la face interne de la structure tubulaire. Des portions de surface (21) ayant une émissivité Infra Rouge faible sont tournées vers le champ d'observation, et des portions de surface (22) ayant une émissivité Infra Rouge élevée sont tournées vers le miroir primaire.

Mirror for power laser

다층 반사기, 다층 반사기를 제조하는 방법 및 리소그래피 장치

EUV 방사선에 대한 반사기가 개시되며, 반사기는 반사기 기판 및 반사 표면을 포함하고, 반사기 기판은 그 안에 형성된 복수의 냉각재 채널들을 가지며, 냉각재 채널들은 실질적으로 직선이고 서로 실질적으로 평행하며 반사 표면에 실질적으로 평행하고 냉각재가 반사기 기판과 접촉하여 및 냉각재 채널들을 통해 병행하여 흐르도록 구성된다.

Device for controlling temperature of an optical element

A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.

Reflection mirror apparatus, exposure apparatus and device manufacturing method

A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure light, and radiation plates for radiation-cooling provided in positions away from an outer surface of the mirror. The radiation plates are provided so as to ensure a passage area for the exposure light incident on and reflected from the reflection surface of the mirror. Further, the respective radiation plates are temperature-controlled by cooling liquid flowing through cooling pipes. Thus the temperature rise of the mirror used in the reflection optical system of the exposure apparatus can be suppressed, and the accuracy of surface form of the mirror reflection surface can be maintained.

ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

An illumination optical unit for projection lithography has a first polarization mirror device (16) for the reflection and polarization of illumination light (3). A second mirror device (22), which is disposed downstream of the polarization mirror device (16), serves for the reflection of an illumination light beam (25). At least one drive device (21; 27) is operatively connected to at least one of the two mirror devices (16; 22). The two mirror devices (16; 22) are displaceable relative to one another with the aid of the drive device (21; 27) between a first relative position, which leads to a first beam geometry of the illumination light beam (25) after reflection at the second mirror device (22), and a second relative position, which leads to a second beam geometry of the illumination light beam (25) after reflection at the second mirror device (22), which is different from the first beam geometry. This results in a flexible predefinition of different illumination geometries, in particular ...

Thermal condensate reducer for optical devices

The present invention provides a method and system to overcome and eliminate the effects of condensation contamination of optical surfaces that are induced by radiative cooling. The invention counteracts the effects of radiative cooling on optical surfaces and maintains an optical system within a very tight limit to the ambient temperature by utilizing a resistive heater element that is in contact with the optical components subject to condensation. In thermal contact with this optical component is a solid-state precision temperature sensor. In addition, there is a matching solid-state precision temperature in thermal contact with the ambient air but thermally isolated from the optical element. Signals from these two sensors are applied to a comparator that functions to generate a data signal when the optical surface temperature is less than the ambient or reference temperature. This data signal is used to activate a solid-state power switch that applies a voltage to a resistive heating ...

Cooled optical component manufacture

An optical component having a plurality of cooling channels in a surface region underlying its effective surface is manufactured by first forming a precursor of the optical component consisting of a main body which carries the effective surface, and a plurality of solid fugitive material cores embedded in the main body at the desired locations of the cooling channels, and then converting the precursor into at least a portion of the optical component by consolidating the main body, and removing the cores from the cooling channels, such as by melting the fugitive material of the cores.

Water- and air-cooled reflection mirror

The water- and air-cooled reflection mirror of this invention, which can be applied to light projector, sterilizing lamp and development device, cools with water and air the reflection mirror that is heated by intense heat of the light source. The water flowing into the water passages formed in the reflection, mirror base body cools the base body to cool the air present in the opening in the base body, thereby preventing overheating of the reflection mirror by the circulating water and cooling air.

SYNTHETIC JETS TO COOL DIGITAL MICROMIRROR DEVICES

An apparatus and a method for cooling a digital micromirror device are disclosed. For example, the apparatus includes a digital micromirror device (DMD), a housing coupled to the DMD, wherein a first side of the housing is coupled to a bottom of the DMD and a cooling block coupled to a second side of the housing that is opposite the first side. The cooling block includes a plate that includes a plurality of openings, a diaphragm coupled to the plate, an air inlet to generate an airflow across the plate, wherein the diaphragm creates a force to move the airflow in a direction that is perpendicular to a direction of the airflow towards the second side of the housing, and an air outlet to collect the airflow. 1. A laser imaging module (LIM) , comprising:a digital micromirror device (DMD);a housing coupled to the DMD, wherein a first side of the housing is coupled to a bottom of the DMD; and a plate comprising a plurality of openings;', 'a diaphragm coupled to the plate;', 'an air inlet to generate an airflow across the plate, wherein the diaphragm creates a force to move the airflow in a direction that is perpendicular to a direction of the airflow towards the second side of the housing; and', 'an air outlet to collect the airflow., 'a cooling block coupled to a second side of the housing that is opposite the first side, wherein the cooling block comprises2. The LIM of claim 1 , wherein the diaphragm comprises:a movable floor that oscillates to create the force to move the airflow in the direction that is perpendicular to the direction of the airflow.3. The LIM of claim 2 , wherein the movable floor oscillates in between and including 1-2 millimeters in a direction towards and away the plate.4. The LIM of claim 2 , wherein the movable floor oscillates at a frequency in a range of in between and including 30 hertz to 10 kilohertz.5. The LIM of claim 1 , wherein the diaphragm comprises a piezo electric diaphragm.6. The LIM of claim 1 , wherein the diaphragm comprises:a ...

OPTICAL ELEMENT ANGLE ADJUSTMENT DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE

An optical element angle adjustment device includes a first hinge that is an elastic hinge configured to connect a first plate and a second plate with each other, an optical element holding part attached to at least one of the first plate and the second plate, and a first adjusting screw configured to apply force in a direction of closing the first hinge to adjust a tilt angle of at least one of the first plate and the second plate. An end in an axis direction of the first adjusting screw is provided with a first press member configured to slidably abut on one of the first plate and the second plate. At least one of a first press member side abutting portion and a first hinge side abutting portion on which the first press member abuts has a curved surface in a curved surface shape.

Supеr сооlеr fоr а hеаt prоduсing dеviсе

А supеr сооlеr dеviсе inсluding а thеrmо еlесtriс сооlеr оn а digitаl miсrо mirrоr dеviсе.

Apparatus for compensating transients heat loads in a lithography mirror

Laser beam guidance device

Device for guiding a laser beam used in laser welding has a support surface for an optical element provided with a coating having a surface which is harder than the housing material Device for guiding a laser beam (14) comprises an optical element (17) and a housing (12) with a housing section (19) which partially surrounds the optical element. A support surface (33) for the optical element is provided and has a coating (41) having a surface which is harder than the housing material. Preferred Features: The housing is made from an aluminum alloy having a heat conductivity of more than 150 J/smk. The support surface has a coating made from nickel, molybdenum and/or chromium. The optical element is a deviating mirror, partial transmission mirror, coupling element or total reflection mirror, preferably made from silicon, zinc selenide, gallium selenide, gallium arsenide, diamond or copper.

ROTATABLE OUTSIDE MIRROR WITH IMAGER ASSEMBLY

THERMAL DEFORMATION PREVENTION METHOD OF REFLECTIVE MIRROR AND REFLECTIVE MIRROR FOR EUV HARDLY CAUSING THERMAL DEFORMATION

PROBLEM TO BE SOLVED: To provide an EUV exposure apparatus which is capable of preventing a deformation of a reflective mirror caused by absorbing incident EUV light and uses the reflective mirror causing no deformation by such an extent of heat, and to provide a manufacturing method of semiconductor device which does not cause the lowering of through-put and yield by the influence of heat. SOLUTION: Channels are formed inside the reflective mirror, cooling fluid is allowed to flow therethrough and cooling is performed. Residual deformation is compensated by adding heat from the rear surface of the reflective mirror. Therein, it is effective that the cooling liquid is made to be a turbulence, fluid is allowed to flow through a pipe in the channel so that vibrations accompanied by the turbulence are not transferred to the reflective mirror and the gas for heat transfer is enclosed between the pipe and the channel. COPYRIGHT: (C)2005,JPO&NCIPI ...

Projektionsbelichtungsanlage für die Halbleiterlithographie mit verbesserten Signalanschlüssen

Die Erfindung betrifft eine Projektionsbelichtungsanlage für die Halbleiterlithographie mit einer optischen Baugruppe (2), wobei die optische Baugruppe (2) einen gewölbten Trägerkörper (21) aufweist. Auf dem gewölbten Trägerkörper (21) ist eine Mehrzahl einzelner optischer Elemente (22) angeordnet, wobei die optischen Elemente (22) auf der konvexen Seite (23) des gewölbten Trägerkörpers (21) mit Signalanschlüssen (24) versehen sind und wobei mindestens zwei Signalanschlüsse (24) mit einer gemeinsamen Anschlussplatte (25) kontaktiert sind. Erfindungsgemäß verläuft die Ebene der Anschlussplatte (25) in Normalenrichtung zu der Oberfläche der konvexen Seite (23) des Trägerkörpers (21).

Thermische Einstellung der Krümmung von Abtastzeilen in optischen Abtastsystemen

VERDUNSTUNGS-WÄRMEMANAGEMENT VON KOLLEKTOREN MIT STREIFENDEM EINFALL FÜR DIE EUV-LITHOGRAPHIE

Spiegelkühlanordnung (150) für einen Kollektor (100) mit streifendem Einfall (GIC), umfassend: eine GIC-Spiegelschale (110) mit einer reflektiven inneren Fläche (166) und einer entgegengesetzten äußeren Fläche (168); einen Mantel (160) mit einer inneren Fläche und gekoppelt an die GIC-Spiegelschale (110), um eine Kammer (180) mit vorderem und rückwärtigem Ende zu definieren, wobei eine Dampfleitung (240) sich in Flüssigkeitsaustausch-zulassender Verbindung mit der Kammer (180) am rückwärtigen Ende (170L, 170T) befindet; mindestens eine Kapillarschicht (200M, 200J), angeordnet unmittelbar angrenzend und in thermischem Kontakt mit der äußeren Fläche der GIC-Spiegelschale (110); eine Leitung, die mindestens eine Kapillarschicht (200M, 200J) unterstützt und die eine Dampfleitung (240) definiert; und ein Kondensationssystem (250) in Flüssigkeitsaustausch-zulassender Verbindung mit der Leitung und mit der mindestens eine Kapillarschicht (200M, 200J), wobei die mindestens eine Kapillarschicht ...

Cooled mirror mounting for laser beam guidance system - has cooling medium fed across rear face of mirror for direct removal of heat

The mirror mounting has a base element (11) with an adjustable support ring (13) against which the mirror (12) is pressed via a resilient element (15) and a clamp element (16), fitted to the base element (11). The clamp element (16) has connections (16a,16k) for a cooling medium fed through the space (19) between the clamp element (16) and the mirror (12), in direct contact with the rear face of the latter. Pref. the clamp element (16) acts simultaneously as a cover cap, its inside surface providing a space (19) between it and the mirror (12) which is of different width at different points. ADVANTAGE - Simple compact construction.

Vorrichtung mit einem Spiegelkopf

Projektionsbelichtungsanlage für die Halbleiterlithographie

Die Erfindung betrifft eine Projektionsbelichtungsanlage (1) für die Halbleiterlithographie mit einem Spiegel (50), wobei der Spiegel (50) mindestens eine Aussparung (53) umfasst, einer Temperiervorrichtung (30,40) zur Temperierung auf Basis von Strahlung mit einem Temperierkörper (31,41), welcher berührungslos in der Aussparung (53) des Spiegels (50) angeordnet ist und welcher einen Hohlraum (33,43) aufweist. Erfindungsgemäß ist in dem Hohlraum (33,43) ein Fluid (39) zur Temperierung des Temperierkörpers (31) mittels Konvektion vorhanden.

COOLED DEFORMABLE MIRROR

HEATED MIRROR,WITH OR WITHOUT A LUMINAIRE

COOLING REFLECTING MIRROR

HIGH POWER LASER MIRROR

... 1499684 Laser mirrors WESTINGHOUSE ELECTRIC CORP 19 May 1975 [20 June 1974] 9850/77 Divided out of 1499683 Heading G2J A method of making a high power laser mirror (e.g. that of Parent Specification) comprises the steps of:-(a) forming a substrate 12 of a refractory composition having a thermal conductivity of at least 2W/cm/‹K, a thermal coefficient of expansion of less than 5 x 10-6 per ‹C, a hardness of at least 9 MOH and a density of less than 4 gm/cm3 and greater than 99% theoretical density (b) polishing at least one optical surface thereof and (c) depositing a reflective metal film 18 on the or each optical surface, the metal film having a thickness not greater than 8000Š. The substrate 12 may be silicon carbide, silicon nitride or mixtures thereof. The powdered refractory material is green pressed about a graphite core which is burnt out after sintering. Cooling channels 16 may be provided. A film 20 of metal (e.g. chromium) or 200Š thickness may be deposited before ...

Device for deflecting a laser beam

ELECTRICAL HEATING DEVICE

MIRROR DEFOGGING APPARATUS

CANTILEVER ONE, ADJUSTABLE ONE, CONDENSATION SUITOR SHOWER MIRROR.

LAMINATED ANTI-FITTING MIRROR ARRANGEMENT

MIRROR WITH AN ELECTRICAL HEATING MECHANISM

Heat storage equipment for mirrors

SELF-SUPPORTED, ADJUSTABLE, CONDENSATION-FREE SHOWER MIRROR

SELF-SUPPORTED, ADJUSTABLE, CONDENSION-FREE SHOWER MIRROR : A condensation-free, self-supported shower mirror assembly is heated by water dispersed into a temperature-control space behind the mirror. The water is supplied by a supply tube connected from a showerhead pipe to a dispenser which disperses the heated water in either liquid or spray form, preferably from holes in a tube mounted in such temperature-control space. Also the tube acts as a gasket to prevent the heated water from leaking through the front of the mirror. The back surface of the mirror is thereby heated to raise the temperature of the front surface of the mirror sufficiently to eliminate water condensation thereon. In one version, mirror adjustment is accomplished through a single flex-joint, such as a hinge or a ball joint which is physically separated from the supply tube. In a preferred version, mirror adjustment is accomplished through a flex-arm which allows rotatable and translational movement. Preferably the ...

DEVICE FOR CORRECTING OPTICAL DEFECTS OF A TELESCOPE MIRROR

The present invention relates to a device for correcting optical defects o f a telescope mirror, compatible with use in a space environment, where the criteria of weight, reliability, service life, cost and resistance to extreme temperatur es are fundamental, and it is characterized in that it comprises at least one controllable-length element (2), means (4) for controlling the length of this element, this element being connected to the minor (1) by its ends in zones that are diametrically or diagonally opposed and close to the periphery of this minor, the connection between the controllable-length element and the mirror comprising attachments that a re rigid on the axis joining these two attachment zones and flexible in the other degrees of freedom.

Radiation collector, cooling system and lithographic apparatus

MANUFACTORING PROCESS Of a REAR VIEW MIRROR AND REAR VIEW MIRROR THUS OBTAINED

Electrical heating device

L'invention concerne un dispositif de chauffage électrique associé à un miroir (11), et destiné à éliminer ou empêcher la condensation qui a tendance à se former sur les surfaces réfléchissantes des miroirs placés dans des environnements mouillés ou humides. Le dispositif comprend un bloc réducteur de tension, tel qu'un transformateur, conçu pour réduire la tension d'alimentation secteur à une valeur efficace, mais présentant un risque négligeable de choc électrique pour l'utilisateur, c'est-à-dire inférieur à 50 V, et la transmette à un élément chauffant (8) appliqué sur la face non réfléchissante du miroir (11). Suivant une réalisation préférée un accumulateur (14) est alimenté à travers une connection (12) et un circuit de charge (15) conçu pour que l'élément chauffant (8) soit alimenté seulement lorsque l'accumulateur est déconnecté de la tension secteur.

MIRROR FOR LASER

Method of obtaining an optical element by reflection for a power laser

EUV exposure apparatus

A projection lens of an EUV-lithographic projection exposure system, comprising a plurality of reflective optical elements, each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light. The lens further comprises support means for passively or actively supporting at least one optical element which is controlled to a temperature by a first tempering means. The support means comprising a temperature sensitive element, wherein the temperature sensitive element is controlled to a constant or to a predefined temperature by a second tempering element which is arranged between the temperature sensitive element and the first tempering element.

LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND RADIATION COLLECTOR

A collector is disclosed that is constructed to receive radiation from a radiation source and to transmit radiation to an illumination system, the collector comprising a reflective element which is internally provided with a fluid channel.

HIGH HEAT LOAD OPTICS WITH A LIQUID METAL INTERFACE FOR USE IN AN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The mirror assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred form the first mirror block to the heat exchanger.

TEMPERATURE MEASURING SYSTEM, HEATING DEVICE USING IT AND PRODUCTION METHOD FOR SEMICONDUCTOR WAFER, HEAT RAY INSULATING TRANSLUCENT MEMBER, VISIBLE LIGHT REFLECTION MEMBNER, EXPOSURE SYSTEM-USE REFLECTION MIRROR AND EXPOSURE SYSTEM, AND SEMICONDUCTOR DEVICE PRODUCED BY USING THEM AND VETICAL HEAT TREATING DEVICE

A reflection member (28) is disposed to face the temperature measuring surface of an object of measurement (16) with a reflection space (35) formed between it and the temperature measuring surface. The reflection member (28) is constituted at a portion including a reflection surface (35) of a heat ray reflecting material for reflecting a heat ray in a specific wavelength band. Heat ray extracting passages (30a) are disposed to pass through a reflection member (28) with one end of each passage facing the temperature measuring surface. Heat ray extracted from the reflection space via the heat ray extracting passages is detected by a temperature detector (34). The above heat ray reflecting material consists of a laminate including a plurality of element reflection layers each consisting of a material translucent to a heat ray, wherein these element reflection layers consist of a combination of materials that provide mutually different refractive indexes for a heat ray in adjoining two layers ...

OPTICAL STRUCTURE WITH RIDGES ARRANGED AT THE SAME AND METHOD FOR PRODUCING THE SAME

An apparatus having an optical structure and ridges is described, wherein the ridges connect the optical structure to a supporting structure and wherein the optical structure is able to perform a movement in relation to a reference plane. 1. Apparatus comprising:an optical structure;at least two ridges, each connecting the optical structure to a supporting structure; wherein the ridges are implemented to effect, by heating the ridges, deformation of the ridges and a movement of the optical structure with regard to a reference plane;wherein the at least two ridges comprise a first layer and a second layer that are deflectable differently in relation to one another;wherein the optical structure comprises a layer, wherein the layer of the optical structure and the first layer of the ridges are formed of the same material;wherein the optical structure comprises a further layer, wherein the further layer of the optical structure and the second layer of the ridges are formed of the same material;wherein the layer of the optical structure and the first layer of the ridges are integrated and the further layer of the optical structure and the second layer of the ridges are integrated;wherein the supporting structure comprises a portion of the ridge material,wherein the movement of the optical structure with regard to the reference plane counteracts a thermally induced change of an optical characteristic of the optical structure; andwherein the first layer and the second layer comprise different coefficients of thermal expansion.2. Apparatus according to claim 1 , wherein the first layer extends from the optical structure to the supporting structure claim 1 , and wherein the second layer completely covers the first layer.3. Apparatus according to claim 1 , wherein the first layer and/or the second layer comprise a constant or varying thickness.4. Apparatus according to claim 3 , wherein the thickness of the first layer and/or the second layer varies continuously at least ...

Fabrication of cooling and heat transfer systems by electroforming

A process for the fabrication of a metallic component, such as those used in energy generation and heat transfer systems (e.g., reactor vessels, combustion chambers), in propulsion systems (e.g., rocket engines), and communications (e.g., optical telescopes). The process comprises: providing an object (e.g. a shaped mandrel) having surface; performing a first electroforming operation, thereby forming a first metallic layer comprising a metallic material (e.g. nickel, copper) on said surface; forming a first mask layer on the first metallic layer, the first mask layer comprising a non-conductive material (e.g. PMMA); patterning the first mask layer, thereby providing a plurality of first recesses in the first mask layer in which the non-conductive material above the first metallic layer is removed, said first recesses having a dimension of elongation; performing second electroforming operation using a metallic material whereby said first recesses are filled with said metallic material and ...

Supеr сооlеr fоr а hеаt prоduсing dеviсе

А supеr сооlеr dеviсе inсluding а thеrmо еlесtriс сооlеr оn а digitаl miсrо mirrоr dеviсе.

MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM

A mirror, such as for a microlithographic projection exposure apparatus, comprises an optical effective surface. The mirror comprises a mirror substrate and a plurality of cavities in the mirror substrate. Fluid can be applied to each cavity. A deformation is transferable to the optical effective surface by varying the fluid pressure in the cavities. Related optical systems methods are provided.

УСТРОЙСТВО ДЛЯ КОРРЕКЦИИ ОПТИЧЕСКИХ ДЕФЕКТОВ ЗЕРКАЛА ТЕЛЕСКОПА

Предложены устройство для изменения формы оптической поверхности и зеркало телескопа. Устройство для изменения формы оптической поверхности содержит элемент с регулируемой длиной и средства контроля длины этого элемента. Этот элемент соединён с оптической поверхностью концевыми участками в зонах, диаметрально или диагонально противоположных и близких к периферии этой оптической поверхности. Элемент с регулируемой длиной и оптическая поверхность связаны жёстким креплением вдоль оси, смежной с двумя зонами соединения, и гибкими по другим степеням свободы. Техническим результатом является обеспечение устройства для изменения формы оптической поверхности, предназначенного для использования в космосе. 2 н. и 13 з.п. ф-лы, 15 ил.

Messverfahren und Messanordnung zur Ermittlung der Position und/oder Orientierung eines optischen Elements, sowie Projektionsbelichtungsanlage

Die Erfindung betrifft ein Messverfahren zur Ermittlung der Position und/oder Orientierung eines optischen Elements (2). Es ist wenigstens eine primäre Sensoreinrichtung (9) vorgesehen, die einen von dem optischen Element (2) beabstandeten Primärsensor (14) und ein dem Primärsensor (14) zugeordnetes, mittels einer stoffschlüssigen Verbindung (8) an dem optischen Element (2) befestigtes primäres Messtarget (7) aufweist. Die primäre Sensoreinrichtung (9) erfasst eine primäre Ist-Distanz (L) zwischen dem Primärsensor (14) und dem primären Messtarget (7). Weiter ist wenigstens eine sekundäre Sensoreinrichtung (11) vorgesehen, die einen von dem optischen Element (2) beabstandeten Sekundärsensor (15) und ein dem Sekundärsensor (15) zugeordnetes, mittels einer stoffschlüssigen Verbindung (8) an dem optischen Element (2) befestigtes sekundäres Messtarget (10) aufweist. Die sekundäre Sensoreinrichtung (9) erfasst eine sekundäre Ist-Distanz (L) zwischen dem Sekundärsensor (15) und dem sekundären ...

Heated exterior driving mirror - has resistive heating backing layer keeping surface clear

A heated mirror, esp. an external driving mirror, consists of a silvered mirror (2), of which the rear surface is fully or partially coated with a resistive coating (6) extending between a pair of electrodes (7) for the supply of heating current. The resistive coating may be of carbon/artificial resin, sprayed or painted on, and the electrodes may be made of a silver or copper paste. This arrangement prevents disposits forming on the mirror surface.

Rahmenloser Spiegel und zugehöriges Montageverfahren

Montageverfahren für einen rahmenlosen Spiegel, bei dem ein Spiegelglas auf einer Trägerplatte befestigt wird, mit den folgenden Schritten: Verwenden einer einen Rand aufweisenden Trägerplatte; Positionieren und Aufkleben des Spiegelglases auf der Trägerplatte, indem der Rand als Anschlag benutzt wird; und Abtrennen des eine Sollbruchstelle aufweisenden Rands von der Trägerplatte.

Verfahren zum Verbinden eines ersten Bauteils mit einem zweiten Bauteil

Die vorliegende Erfindung schlägt ein Verfahren zum Verbinden eines ersten Bauteils mit einem zweiten Bauteil vor, wobei das erste Bauteil einen Verformungsbereich aufweist, wobei der Verformungsbereich in einem ersten Verfahrensschritt zumindest teilweise erwärmt wird, wobei in einem zweiten Verfahrensschritt ein Innenstempel mit einem optischen Bauteil zur plastischen Verformung bereitgestellt wird, wobei in einem dritten Verfahrensschritt das erste Bauteil im Verformungsbereich zum Verbinden des ersten Bauteils mit dem zweiten Bauteil plastisch verformt wird und wobei Licht zum Erwärmen des ersten Bauteils über das optische Bauelement des Innenstempels im ersten und/oder dritten Verfahrensschritt auf den Verformungsbereich gelenkt wird.

Verfahren und Vorrichtung zum Kühlen einer Komponente einer Projektionsbelichtungsanlage

Die Erfindung betrifft ein Verfahren zum Kühlen einer Komponente (46) einer Projektionsbelichtungsanlage (1) für die Halbleiterlithographie, dadurch gekennzeichnet, dass Wärme aus der Komponente (46) dadurch abgeführt wird, dass auf der Komponente (46) mindestens bereichsweise eine Flüssigkeit verdampft wird. Ferner betrifft die Erfindung eine Projektionsbelichtungsanlage, in der das erfindungsgemäße Verfahren zur Anwendung kommt. The invention relates to a method for cooling a component (46) of a projection exposure apparatus (1) for semiconductor lithography, characterized in that heat is removed from the component (46) by at least partially evaporating a liquid on the component (46). Furthermore, the invention relates to a projection exposure apparatus in which the method according to the invention is used.

Wärmemanagementsysteme, -anordnungen und -verfahren für Kollektoren mit streifendem Einfall für die EUV-Lithographie

Systeme, Anordnungen und Verfahren zum thermischen Management bzw. zur thermischen Handhabung eines Kollektors mit streifendem Einfall (grazing indicence collector) (GIC) für EUV-Lithographie-Anwendungen werden offenbart. Die GIC-Wärmemanagementanordnung umfasst eine GIC-Spiegelhülle bzw. -schale, angekoppelt an einen Mantel, um eine verschlossene bzw. abgedichtete Kammer zu bilden. Ein offenzelliges Wärmetransfer(OCHT)-Material ist in der Metallkammer abgeschieden und ist thermisch und mechanisch mit der GIC-Spiegelhülle bzw. -schale und dem Mantel verbunden. Ein Kühlmittel fließt in einer azimutal-symmetrischen Art und Weise durch das OCHT-Material zwischen den Eintritts- und Austritts-Verteilerkanälen, um ein Kühlen zu bewirken, wenn die GIC-Wärmemanagementanordnung in einem GIC-Spiegelsystem verwendet wird, das aufgebaut ist, um Kollektor-EUV-Strahlung von einer EUV-Strahlungsquelle aufzunehmen und zu bilden.

Mirror, for traffic, with anti=icing facility

The mirror for displaying road traffic comprises a mirror plate (4) on a carrier (2) with an additional plate (5) behind the mirror plate at a small distance (A) so that air can flow between them. Both plates have holes (8) in their corners. On the front of the mirror plate is a frame with bolts (7) going through these corner holes and through spacers (9). The ends of the bolts are fastened to the carrier. The mirror plate is either silvered glass or polished metal. The backing plate has the same dimensions and the same base material as the mirror plate.

Electrical heating device

COOLED MIRROR AND METHOD OF COOLING PARTICULARLY USEFUL IN LASERS

Steam proof mirror

Light transmissive electrically conducting optical articles suitable for use as a lens, a window or windshield, or the like

A transparent article, such as a lens, window or windshield, comprises a body of glassy silicious material having a smooth continuous surface, a transparent interlayer of metal compound applied to the smooth surface and an electrically conductive, continuous metal outer film, having resistivity of not more than 150 ohms/square and of uniform thickness such that the light conductivity of the article is at least 50 per cent a heating current being passed through the metal film to prevent misting or icing of the article. The outer film is Au, Ag, Cu, Fe or Ni and the interlayer, which is 4-108 A DEG thick, is an oxide of Pb, Ag, Al, Mg, Ni, Zn, Cd, Sb, Bi, Hg, Cu, Au, Pt, Pd, Th or rare earth metals, or the sulphide, sulphate, selenide, selenate, telluride, tellurate, or fluoride of these metals. The outer film is preferably applied by thermal evaporation. The interlayer may be applied by direct thermal evaporation, e.g. in the case of the oxides of Pb, Cd, Zn, Sb, Al and the sulphides of ...

DEFORMATION-CASH MIRROR, IN PARTICULAR FOR A LASER BEAM MATERIAL PROCESSING MECHANISM

DEVICE TO STRAHLF�HRUNG A LASER BEAM

MIRROR DE-FOGGING APPARATUS

NON-FOGGING MIRRORS

MIRROR SUPPORT FOR A COMPOSITE OPTICAL MIRROR AND METHOD FOR ITS PRODUCTION

The invention relates to a mirror support (1), comprising a mirror body (2), which has an aluminium composite material reinforced with diamond particles, and a polished layer (3), which is arranged on the mirror body (2). The content of diamond particles in the aluminium composite material is between % by 5 mass and 50 % by mass, and is selected such that the coefficient of linear thermal expansion of the mirror body (2) is adapted to the coefficient of linear thermal expansion of the polished layer (3). The invention further relates to the production of the mirror support (1).

MIRROR AND METHOD OF MAKING SAME

EUV Exposure Apparatus

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

FLY'S EYE OPTICAL MIRROR WITH A PLURALITY OF OPTICAL ELEMENTS ROTATIONALLY ALIGNED ALONG TWO AXES

A fly's eye mirror including first and second complementary M×N arrays, each including a plurality of faceted reflective surfaces arranged along both the first and the second axes. When assembled, the two complementary arrays are integrated together and mounted onto a common base plate. With the increased lineal length of each array along both axes, the faceted reflective surfaces of each array are in rotational or tilt alignment with a base plate along both axes. 126-. (canceled)27. A fly's eye mirror structure , comprising:a first sub-structure including first reflective fly's eye mirror surfaces with more than one of the first reflective fly's eye mirror surfaces arranged along both a first axis and a second axis; anda second sub-structure including second reflective fly's eye mirror surfaces with more than one of the second reflective fly's eye mirror surfaces arranged along both the first axis and the second axis;the first and the second sub-structures integrated together with respect to one another so that the first and the second reflective fly's eye mirror surfaces are along both the first axis and the second axis to form the fly's eye mirror structure.28. The fly's eye mirror structure of claim 27 , wherein the first and the second sub-structures are integrated together with respect to one another so that the first and the second reflective fly's eye mirror surfaces are in rotational alignment.29. The fly's eye mirror structure of claim 27 , wherein the first and the second sub-structures are integrated together onto a base plate.30. The fly's eye mirror structure of claim 27 , further comprising a plurality of spacers positioned between the first reflective fly's eye mirror surfaces and the second reflective fly's eye mirror surfaces when the first sub-structure and the second sub-structure are integrated together.31. The fly's eye mirror structure of claim 27 , wherein the first reflective fly's eye mirror surfaces and the second reflective fly's eye ...

Optical element

The invention relates to an optical element for a projection exposure apparatus for semiconductor lithography comprising an optically active surface and at least one cooling component for cooling the optical element, wherein the cooling component is connected to at least two separate cooling circuits and embodied in such a way that the optically active surface can be cooled to a greater extent in at least one partial region than in a further partial region. The invention furthermore relates to a projection exposure apparatus comprising an optical element according to the invention.

Photothermally Actuated Self-Tuning Optical Light Valve

A tunable optical filter for a detector is presented including a plate having a top side and a bottom side. The plate has material properties making it transparent to a range of optical frequencies. A transparent metasurface is proximate the top side of the plate. The transparent metasurface is configured to have a transmissive pass band and a stop band. An undercarriage support structure is proximate the bottom side of the plate. The undercarriage support is responsive to photothermal heating. The undercarriage support is configured to deform from the photothermal heating caused by an undesired signal thereby shifting the stop band in frequency toward the undesired signal to block reception of the undesired signal by the detector.

REFLECTOR AND LIGHT SINTERING APPARATUS COMPRISING THE SAME

Provided is a reflector comprising: an outer wall; and an inner wall which reflects the xenon lamp light from a xenon lamp toward an object to be light sintered, and which consists of inner side walls and an inner top wall which are spaced apart by a predetermined distance from the outer wall to allow cooling water for cooling heat generated by the xenon lamp light to flow, wherein at least a part of the inner side walls has the same thickness as at least a part of the inner top wall. 1. A reflector comprising:an outer wall; andan inner wall configured to reflect xenon lamp light from a xenon lamp toward an object to be light sintered and include inner side walls and an inner top wall which are spaced apart from the outer wall by a predetermined distance so as to allow cooling water for cooling heat generated by the xenon lamp light to flow, whereinat least a part of the inner side walls has a thickness same as at least a part of the inner top wall.2. The reflector of claim 1 , wherein the cooling water cools all of the inner side walls and the inner top wall.3. The reflector of claim 1 , wherein the inner top wall includes:a first main curved portion arranged in an upper left side of a position provided with the xenon lamp and formed upwardly convex toward the outer wall; anda second main curved portion symmetrical to the first main curved portion rightward around a position provided with the xenon lamp and formed upwardly convex toward the outer wall.4. The reflector of claim 1 , wherein the inner top wall includes a reflective surface that reflects the xenon lamp light from the xenon lamp toward the object to be light sintered claim 1 , and a cooling surface that provides a surface on which the cooling water flows claim 1 , whereinthe reflective surface has a shape upwardly convex to both sides from a vertically upward site from the xenon lamp, and the cooling surface has a shape corresponding to a shape of the reflective surface.5. The reflector of claim 4 , ...

Ceramic Wavelength Converter Having a High Reflectivity Reflector

There is herein described a ceramic wavelength converter having a high reflectivity reflector. The ceramic wavelength converter is capable of converting a primary light into a secondary light and the reflector comprises a reflective metal layer and a dielectric buffer layer between the ceramic wavelength converter and the reflective metal layer. The buffer layer is non-absorbing with respect to the secondary light and has an index of refraction that is less than an index of refraction of the ceramic wavelength converter. Preferably the reflectivity of the reflector is at least 80%, more preferably at least 85% and even more preferably at least 95% with respect to the secondary light emitted by the converter. 1. A ceramic wavelength converter having a high reflectivity reflector , the ceramic wavelength converter being capable of converting a primary light into a secondary light , the reflector comprising a reflective metal layer and a dielectric buffer layer between the ceramic wavelength converter and the reflective metal layer , the buffer layer being non-absorbing and non-wavelength selective with respect to the secondary light and having an index of refraction that is less than an index of refraction of the ceramic wavelength converter.2. The ceramic wavelength converter of claim 1 , wherein the reflectivity of the reflector is at least 80% with respect to the secondary light.3. The ceramic wavelength converter of claim 1 , wherein the reflectivity of the reflector is at least 85% with respect to the secondary light.4. The ceramic wavelength converter of claim 1 , wherein the reflectivity of the reflector is at least 95% with respect to the secondary light.5. The ceramic wavelength converter of claim 1 , where the converter comprises at least one phosphor selected from (Y claim 1 ,Lu claim 1 ,Gd)AlO:Ce and (Ba claim 1 ,Ca claim 1 ,Sr)SiON:Eu.6. The ceramic wavelength converter of claim 1 , wherein the converter is in the form of a flat plate having a thickness ...

DIGITAL MICROMIRROR DEVICE COOLING SYSTEM AND METHOD

A DMD chip includes a micromirror array mounted on a very thin silicon wafer attached to a cooling system integrated within the DMD chip. The cooling system includes a fluid cooled heat sink with a cooling channel. Fluid coolant may be pumped through the channel and out of the DMD to remove heat from the silicon substrate and the micromirror array. The micromirror array may be hermetically sealed within the housing, with the heat sink located between the micromirror array and a back wall of the housing, with both the heat sink and the array within the interior of the housing. 1. A Digital Micromirror Device (DMD) , comprising:a housing having a back wall and side walls ascending from the back wall, the housing including a front window spatially offset from the back wall and defining an interior therebetween;an array of DMD pixels hermetically sealed within the housing, each pixel having a micromirror configured to tilt independently towards a light source in a projection system and away from the light source; anda heat sink between the array of DMD pixels and the back wall of the housing with both the heat sink and the array in the interior of the housing, the heat sink including a channel there through, the channel having an inlet port and an outlet port configured for fluid communication with a coolant source having a coolant, the channel configured to convey the coolant within the heat sink from the inlet port through the outlet port to actively cool the array of DMD pixels.2. The DMD of claim 1 , further comprising an inlet conduit between the inlet port and the coolant source claim 1 , the inlet conduit extending through the housing to provide fluid communication from the coolant source to the heat sink channel.3. The DMD of claim 2 , further comprising an outlet conduit between the outlet port and the coolant source claim 2 , the outlet conduit extending through the housing to provide fluid communication from the heat sink channel to the coolant source.4. The ...

Illumination optical unit for projection lithography

An illumination optical unit for projection lithography has a first polarization mirror device to reflect and polarize of illumination light. A second mirror device, which is disposed downstream of the polarization mirror device reflects an illumination light beam. At least one drive device is operatively connected to at least one of the two mirror devices. The two mirror devices are displaceable relative to one another via the drive device between a first relative position, which leads to a first beam geometry of the illumination light beam after reflection at the second mirror device, and a second relative position, which leads to a second beam geometry of the illumination light beam after reflection at the second mirror device, which is different from the first beam geometry. This results in a flexible predefinition of different illumination geometries, in particular of different illumination geometries with rotationally symmetrical illumination.

Multilayer Reflector, Method of Manufacturing a Multilayer Reflector and Lithographic Apparatus

A reflector for EUV radiation, the reflector comprising a reflector substrate and a reflective surface, the reflector substrate having a plurality of coolant channels formed therein, the coolant channels being substantially straight, substantially parallel to each other and substantially parallel to the reflective surface and configured so that coolant flows in parallel through the coolant channels and in contact with the reflector substrate. 117.-. canceled18. A reflector for EUV radiation , the reflector comprising: the reflector substrate having a plurality of coolant channels formed therein,', 'the coolant channels being substantially straight, substantially parallel to each other and substantially parallel to the reflective surface and configured so that coolant flows in parallel through the coolant channels and in contact with the reflector substrate, and', 'each coolant channel is spaced apart from the reflective surface by a distance in a range of about 3 to about 30 times a diameter of the coolant channel., 'a reflector substrate and a reflective surface, wherein19. The reflector of claim 18 , wherein each coolant channel has a substantially constant cross-section.20. The reflector of claim 18 , wherein a distance between centers of adjacent coolant channels is in a range of about 5 to about 10 times the diameter of the coolant channels.21. The reflector of claim 18 , wherein the reflector substrate comprises a first reflector substrate part joined to a second reflector substrate part claim 18 , the second reflector substrate part having a different composition from the first reflector substrate part.22. The reflector of claim 18 , wherein the reflector substrate is formed of a titanic silicate glass.23. The reflector of claim 18 , further comprising a coolant supply system connected to the coolant channels and configured to supply a coolant comprising water and/or carbon dioxide.24. The reflector of claim 23 , wherein the coolant supply system is ...

Radiation Collector, Radiation Source and Lithographic Apparatus

A radiation collector () comprising a plurality of reflective surfaces (-), wherein each of the plurality of reflective surfaces is coincident with part of one of a plurality of ellipsoids (-), wherein the plurality of ellipsoids have in common a first focus () and a second focus (), each of the plurality of reflective surfaces coincident with a different one of the plurality of ellipsoids, wherein the plurality of reflective surfaces are configured to receive radiation originating from the first focus () and reflect the radiation to the second focus (). An apparatus () shown in FIG. comprising a cooling system () and a reflector (), wherein the cooling system is configured to cool the reflector, the cooling system comprising: a porous structure () situated in thermal contact with the reflector, wherein the porous structure is configured to receive a coolant in a liquid phase state; a condenser () configured to receive coolant from () the porous structure in a vapour phase state, condense the coolant thereby causing the coolant to undergo a phase change to a liquid phase state and output the condensed coolant in the liquid phase state for entry () into the porous structure. 1. A radiation collector comprising:a plurality of reflective surfaces, wherein each of the plurality of reflective surfaces is coincident with part of one of a plurality of ellipsoids,wherein the plurality of ellipsoids have in common a first focus and a second focus,each of the plurality of reflective surfaces coincident with a different one of the plurality of ellipsoids, andthe plurality of reflective surfaces are configured to receive radiation originating from the first focus and reflect the radiation to the second focus.2. The radiation collector of claim 1 , wherein the reflective surfaces are disposed around an optical axis of the radiation collector.3. The radiation collector of claim 1 , wherein the reflective surfaces extend circumferentially around the optical axis.4. The radiation ...

MIRROR ASSEMBLY WITH HEAT TRANSFER MECHANISM

A mirror assembly () for directing a beam () includes a base (), and an optical element () that includes (i) a mirror (), (ii) a stage () that retains the mirror (), (iii) a mover assembly () that moves the stage () and the mirror () relative to the base (), and (v) a thermally conductive medium () that is positioned between the stage () and the base () to transfer heat between the stage () and the base (). The thermally conductive medium () has a thermal conductivity that is greater than the thermal conductivity of air. The thermally conductive medium () can include an ionic fluid or a liquid metal. 147-. (canceled)48. An optical element assembly for directing a beam , the optical element assembly comprising:a base; anda first element that includes (i) an optical element, (ii) a mover assembly that is coupled to the optical element, the mover assembly moving the optical element about a first axis and about a second axis that is orthogonal to the first axis relative to the base, (iii) a transfer region that is connected to the optical element, and (iv) a thermally conductive medium positioned between the transfer region and the base to transfer heat from the transfer region to the base so that heat transferred with the thermally conductive medium does not cause thermal distortion of the mover assembly.49. The optical element assembly of wherein the mover assembly includes (i) a first axis movement assembly that moves the optical element about the first axis claim 48 , the first axis movement assembly including a first flexure so that movement of the optical element about the first axis with the first axis movement assembly is decoupled from the movement of the optical element about the second axis; and (ii) a second axis movement assembly that moves the optical element about the second axis claim 48 , the second axis movement assembly including a second flexure so that movement of the optical element about the second axis with the second axis movement assembly is ...

THERMOELECTRICALLY CONTROLLED OPTICAL MIRROR MOUNT

An optical assembly is part of an optical system such as a laser communication system on a moveable platform that operates in a range of temperature extremes. The optical assembly has a mount with a plurality of supports that couple an optical mirror to a frame or chassis of the optical system. The supports may be selectively heated or cooled in accordance with their respective coefficients of thermal expansion to reduce, minimize, or eliminate angular drift of the mounted optic or mount. The supports expand or contract to correct for misalignments of the beam reflection angle to improve the accuracy and efficiency of the optical system without significantly increasing size, weight, and power of the optical system. 1. An optical assembly comprising:an optical mirror adapted to receive and reflect a beam of electromagnetic radiation;a first support coupled to the optical mirror having a first coefficient of thermal expansion (CTE);a second support coupled to the optical mirror having a second CTE;a first tilt axis of the optical mirror;a temperature operating range, wherein the optical mirror tilts about the first tilt axis as the first support and the second support expand or contract in response to the first CTE and the second CTE, respectively, as temperatures of the first support and the second support vary within the temperature operating range.2. The optical assembly of claim 1 , further comprising:a variable optical beam deflection angle;a first temperature within the temperature operating range;a different second temperature within the temperature operating range;wherein the mirror tilts about the first tilts axis to vary the variable optical beam deflection angle as the temperature changes from the first temperature to the second temperature.3. The optical assembly of claim 2 , further comprising:wherein a greater temperature difference between the first temperature and the second temperature results in a greater optical beam deflection angle than a lesser ...

MICROMIRROR SYSTEM AND METHOD OF MANUFACTURING A MICROMIRROR SYSTEM

A micromirror system that includes a chip frame, at least one spring element, and at least one mirror plate oscillatorily suspended in the chip frame via the at least one spring element. The chip frame and the at least one spring element include at least one microchannel which is provided with an inlet opening and an outlet opening for leading through a flowing coolant. 113-. (canceled)14. A micromirror system comprising:a chip frame;at least one spring element; andat least one mirror plate oscillatorily suspended in the chip frame via the at least one spring element, wherein the chip frame and the at least one spring element include at least one microchannel which is provided with an inlet opening and an outlet opening for leading through a flowing coolant.15. The micromirror system of claim 14 , wherein the inlet opening and the outlet opening are situated on one of a side of the chip frame and different sides of the chip frame.16. The micromirror system of claim 14 , wherein at least one of the inlet opening and the outlet opening is directed in the longitudinal direction of a portion of the at least one microchannel which connects to the at least one of the inlet opening and the outlet opening.17. The micromirror system of claim 14 , wherein at least one of the inlet opening and the outlet opening is directed in a direction angled to the longitudinal direction of a portion of the at least one microchannel which connects to the at least one of the inlet opening and the outlet opening at an angle between 0 and 180 degrees.18. The micromirror system of claim 14 , wherein the at least one microchannel is loop shaped or branch shaped.19. The micromirror system of claim 14 , comprising a cover claim 14 , wherein at least one of an upper side and a lower side of the chip frame is connected to the cover such that at least a part of the chip frame claim 14 , the at least one spring element claim 14 , and the at least one mirror plate are encapsulated in a cavity.20. The ...

ELECTRO-OPTICAL DEVICE, MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS

An electro-optical apparatus has an element substrate that is provided with a mirror and a sealing member which seals the mirror, and the sealing member includes a light-transmitting cover which faces the mirror opposite from the element substrate. An infrared cut filter is laminated on the light-transmitting cover. 1. An electro-optical device comprising:an element substrate;a mirror that is provided on a first face side of the element substrate;a driving element that drives the mirror;a sealing member that has a light-transmitting cover and is provided such that the mirror is positioned between the light-transmitting cover and the element substrate;an infrared cut filter that is provided on the light-transmitting cover;a substrate on which the element substrate is mounted; anda lead terminal that extends outside from the substrate, the lead terminal having a bent section that is bent in a direction in which a leading end section of the lead terminal is away from the substrate.2. The electro-optical device according to claim 1 ,wherein the infrared cut filter is formed of a film that is laminated on at least one of a second face of the light-transmitting cover and a third face of the light-transmitting cover, the second face faces the mirror, and the third face is on an opposite side from the second face.3. (canceled)4. The electro-optical device according to claim 1 ,wherein the lead terminal includes a convex section that protrudes in a direction which intersects with an extension direction of the lead terminal.5. The electro-optical device according to claim 1 ,wherein a heat dissipation unit is provided on a face on an opposite side from the element substrate of the substrate.6. The electro-optical device according to claim 5 ,wherein the heat dissipation unit is a heat sink on which a heat dissipation fin is provided.7. The electro-optical device according to claim 1 ,wherein the sealing member includes a spacer that surrounds a region in which the mirror is ...

ISOTHERMAL ENCLOSURE WITH OPTICAL APERTURE

An optical device may include an enclosure including an optical aperture and a plurality of optical components positioned within the enclosure, where the plurality of optical components are to emit and/or receive light through the optical aperture. The optical device may include at least one heating element or cooling element to provide an isothermal environment to the plurality of optical components, where the at least one heating element or cooling element is thermally coupled with the enclosure. 1. An optical device , comprising:a first enclosure including a first optical aperture;a plurality of optical components positioned within the first enclosure; wherein the first enclosure is positioned within the second enclosure, and', the first enclosure is an isothermal enclosure and the second enclosure is a hermetically-sealed enclosure, or', 'the first enclosure is the hermetically-sealed enclosure and the second enclosure is the isothermal enclosure;, 'wherein], 'a second enclosure including a second optical aperture,'} 'wherein the at least one heating element or cooling element is thermally coupled with the isothermal enclosure; and', 'at least one heating element or cooling element to provide an isothermal environment to the plurality of optical components,'} 'wherein the first enclosure and the second enclosure are positioned within the thermally-insulating enclosure; and', 'a thermally-insulating enclosure including a third optical aperture,'}wherein the plurality of optical components are to emit and/or receive light through the first optical aperture, the second optical aperture, and the third optical aperture.2. The optical device of claim 1 , wherein the plurality of optical components include a laser component to emit an optical beam and a scanning component to scan a field of view with the optical beam through the first optical aperture claim 1 , the second optical aperture claim 1 , and the third optical aperture.3. The optical device of claim 1 , ...

ARRANGEMENT FOR THERMAL ACTUATION OF A MIRROR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

The invention concerns an arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatus, wherein the mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface, wherein the arrangement is designed for thermal actuation of the mirror via electromagnetic radiation which is propagated in the access passage, wherein the arrangement further has at least one heat radiating mechanism which produces the electromagnetic radiation which is propagated in the access passage, and wherein the heat radiating mechanism is actuable along the access passage. 119.-. (canceled)20. An arrangement , comprising:a mirror comprising a first surface which is an optical effective surface, a second surface which is different from the first surface, and a passage which extends from the second surface in a direction of the first surface; anda first device configured to produce electromagnetic radiation which, during use of the arrangement, propagates into the passage of the mirror to thermally actuate the mirror,wherein the first device is actuable along the passage.21. The arrangement of claim 20 , further comprising a manipulator configured to move the first device along the passage.22. The arrangement of claim 20 , wherein the first device comprises a heating bar.23. The arrangement of claim 20 , wherein the first device comprises a substantially needle-shaped heating bar.24. The arrangement of claim 20 , wherein the mirror has a plurality of passages which extend from the second surface in the direction of the first surface.25. The arrangement of claim 24 , comprising a plurality of first devices claim 24 , wherein each first device is configured to produce electromagnetic radiation which claim 24 , during use of the arrangement claim 24 , propagates into a respective passage of the mirror to thermally ...

METHOD OF COOLING FULL DISPLAY MIRROR

A rearview assembly for a vehicle includes a rearview device and a processor. A housing supports the rearview device and the processor. The housing defines a recess therein. An air moving device is operably coupled with the housing and is configured to draw air from an area exterior to the housing into the recess, thereby cooling at least one of the rearview device and the processor. 1. A rearview assembly for a vehicle , the rearview assembly comprising:a rearview device;a processor;a housing supporting the rearview device and processor, the housing defining a recess therein;an air moving device operably coupled with the housing and configured to draw air from an area exterior to the housing into the recess, thereby cooling at least one of the rearview device and the processor.2. The rearview assembly of claim 1 , further comprising:a light-emitting diode (LED) board that is cooled by the air moving device.3. The rearview assembly of claim 1 , wherein the air moving device includes multiple fans.4. The rearview assembly of claim 1 , wherein the air moving device includes at least one piezoelectric blower.5. The rearview assembly of claim 1 , further comprising:a heat pipe disposed proximate the air moving device.6. The rearview assembly of claim 1 , further comprising:a speed modulating control configured to reduce a speed of the air moving device and reduce a related noise output associated with the speed of the air moving device.7. The rearview assembly of claim 6 , wherein the speed modulating control is operable to change revolutions per minute (RPM) of the air moving device claim 6 , thereby changing the noise output of the air moving device based on a vehicle speed.8. The rearview assembly of claim 7 , wherein the speed modulating control is operable to reduce the volumetric flow rate of the air moving device claim 7 , thereby reducing the speed modulating control noise output when a motor of the vehicle is operating below a threshold revolutions per minute ( ...

Diffractive optical element and method of manufacturing the same

A diffractive optical element prevents degradation of the optical performance of the element due to moisture absorption of the resin layers from taking place and also can prevent cracks of the resin layers and peeling of the resin layers along the interface thereof from taking place in a hot environment or in a cold environment. The diffractive optical element comprises a first layer and a second layer sequentially laid on a substrate, a diffraction grating being formed at the interface of the first layer and the second layer, the height d of the diffraction grating, the average film thickness t1 of the first layer and the average film thickness t2 of the second layer satisfying the relationship requirements expressed by the expressions of 1.1×d≦t 1 ≦50 μm and 30 μm≦t 2 ≦(400 μm−t 1 −d).

COOLER FOR PLASMA GENERATION CHAMBER OF EUV RADIATION SOURCE

The disclosure provides a cooler for use in a plasma generation chamber of a radiation source for an extreme ultraviolet wavelength range. The cooler has a heat sink which is at least partially manufactured of a substrate material having a thermal conductivity of greater than 50 W/mK. A coolant duct is formed in the substrate material, and the coolant duct is configured to have a coolant flow therethrough. The cooler also includes a connection piece made of a metal or a metal alloy for connecting a coolant line to the coolant duct. The cooler further includes a connecting element for connecting the connection piece to the heat sink so that, when the connection piece is connected to the heat sink, a continuous line is formed by the coolant duct and the coolant line. 1. A cooler , comprising:a heat sink comprising a substrate material having a thermal conductivity of greater than 50 W/mK, the heat sink including a coolant duct comprising the substrate material, the coolant duct being configured to have coolant flow therethrough;a connection piece configured to connect a coolant line to the coolant duct, the connection piece comprising a material selected from the group consisting of a metal and a metal alloy;a connecting element connecting the connection piece to the heat sink so that, when the connection piece connects the coolant duct to the coolant line, the coolant duct and the coolant line define a continuous line;a first sealing element comprising a material selected from the group consisting of a metallic material, the first sealing element being between the heat sink and the connection piece being configured so that, when the connection piece connects the coolant duct to the coolant line, the first sealing element surrounds to the continuous line; anda device configured to protect the first sealing element against corrosion,wherein the cooler is configured to be used in a plasma generation chamber of an EUV radiation source.2. The cooler of claim 1 , wherein ...

Heated Shaving Mirror

A portable heated mirror includes a mount subassembly that includes a mount housing and a mount member that is configured to releasably attach the heated mirror to a support surface. The heated mirror also includes a mirror subassembly that is pivotally attached to the mount subassembly by a ball-in-socket arrangement. The mirror subassembly includes a mirror housing that contains a mirror and a flexible heating element in the form of a flexible heat film that contains heating elements and is secured to a rear surface of the mirror for heating the mirror when the flexible heat film is actuated. A battery power source is operatively connected to a printed circuit board that is contained within the mirror housing. 1. A portable heated mirror comprising:a mount subassembly including a mount housing and a mount member that is configured to releasably attach the heated mirror to a support surface;a mirror subassembly that is pivotally attached to the mount subassembly, the mirror subassembly including a mirror housing that contains a mirror and a flexible heating element that is disposed relative to a rear surface such that when the flexible heating element is actuated, heat is generated along the rear surface of the mirror; and a battery power source that is operatively connected to heating element.2. The portable heated mirror of claim 1 , the mount member is a suction cup that is coupled to a suction cup cuff and the mount housing claim 1 , the suction cup cuff being coupled to the mount housing.3. The portable heated mirror of claim 2 , further including a knob coupled to a post of the suction cup such that rotation of the knob is translated into movement of the suction cup claim 2 , the knob being disposed along a front face of the mount housing claim 2 , the suction cup and suction cup cuff being disposed along a rear surface of the mount housing.4. The portable heated mirror of claim 1 , wherein the mount member comprises an adhesive mount that is coupled to the ...

DEFORMABLE OPTICAL SYSTEM AND METHOD FOR CONTROLLING THE SAME AS WELL AS A LITHOGRAPHIC SYSTEM COMPRISING THE DEFORMABLE OPTICAL SYSTEM

The deformable optical system comprises at least one optical element (), an actuator facility () and a control unit (). Therein the at least one optical element () has a body () with a thermal expansion coefficient and the actuator facility () serves to exert a force distribution at a main surface () of the body (). The control unit () is arranged for controlling the actuator facility () in order to control a shape of the body (). The actuator facility comprises a body layer () formed on said main surface () of the body () and the body layer has a thermal expansion coefficient differing from the thermal expansion coefficient of the body. The actuator facility further comprises a thermal array () facing the body layer () and distanced from said body layer () by a gap (). The thermal array has a plurality of thermal elements (, T,T, . . . T) distributed at a surface of the thermal array facing the body layer that allow for a heat flow between the thermal array and the body layer. The heat flow has an amplitude controlled by the control unit () as a function of the position on the thermal array and as a function of time. 2. A deformable optical system according to claim 1 , wherein the control unit is arranged to control the actuator facility in order to counteract distortions of the body.3. A deformable optical system according to claim 1 , wherein said optical element is a mirror having a reflective surface opposite said main surface.4. A deformable mirror system according to claim 1 , wherein the body layer has a thermal expansion coefficient higher than the thermal expansion coefficient of the body.5. A deformable mirror system according to claim 1 , wherein the body layer has a thermal expansion coefficient lower than the thermal expansion coefficient of the body.6. A deformable mirror system according to claim 5 , wherein the body layer has a negative thermal expansion coefficient.7. A deformable mirror system according to claim 1 , wherein the control unit ...

CURVATURE VARIABLE MIRROR, CURVATURE VARIABLE UNIT, AND MANUFACTURING METHOD OF CURVATURE VARIABLE MIRROR

A curvature variable mirror includes a mirror base material that is configured such that the curvature is variable and that reflects laser light on the mirror reflective surface side, wherein the mirror base material is formed by using spring-material copper alloy, and the spring-material copper alloy is constituted by using any of phosphor bronze, copper-nickel-zinc alloy, chromium copper, zirconium copper, titanium copper alloy, copper-nickel alloy, and alloy obtained by adding at least one of Ni (nickel), Sn (tin), Si (silicone), Mg (magnesium), Zn (zinc), Mn (manganese), Pb (lead), Fe (iron), and Al (aluminum) to copper. 17-. (canceled)8. A curvature variable mirror comprising a mirror base material that is configured such that a curvature is variable and that reflects laser light on a mirror reflective surface side , whereinthe mirror base material is formed by using spring-material copper alloy with a higher hardness than that of oxygen-free copper and is formed by annealing to be softened to a Rockwell hardness of HRB80 or lower, andthe spring-material copper alloy is any of phosphor bronze, copper-nickel-zinc alloy, chromium copper, zirconium copper, titanium copper alloy, copper-nickel alloy, and alloy obtained by adding at least one of Ni, Sn, Si, Mg, Zn, Mn, Pb, Fe, and Al to copper.9. The curvature variable mirror according to claim 8 , wherein a dielectric multi-layer film is formed on a mirror reflective surface side of the mirror base material.10. A curvature variable mirror comprising a mirror base material that is configured such that a curvature is variable and that reflects laser light on a mirror reflective surface side claim 8 , whereinthe mirror base material is formed by using spring-material copper alloy with a higher hardness than that of oxygen-free copper and is formed by annealing to be softened to a Rockwell hardness of HRB80 or lower, andthe spring-material copper alloy is any of phosphor bronze, copper-nickel-zinc alloy, chromium ...

DEVICE FOR CONTROLLING TEMPERATURE OF AN OPTICAL ELEMENT

A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics. 1. (canceled)2. An optical system , comprising:a plurality of optical elements including a first optical element;a cooling element disposed away from the first optical element, the cooling element being configured to cool the first optical element by radiation heat transfer;a heating device configured to heat the first optical element; anda controller configured to control a) the cooling element according to a temperature of the first optical element; or b) the heating device according to the temperature of the first optical element,wherein the first optical element is in a vacuum atmosphere, and the system is a microlithography optical system.3. The optical system of claim 2 , wherein the controller is configured so that claim 2 , during use of the optical system claim 2 , a radiation heat transfer from the first optical element to a heat sink is kept constant.4. The optical system of claim 2 , wherein the controller is configured so that claim 2 , during use of the optical system claim 2 , the cooling element is controlled individually for different parts of the first optical element.5. The optical system of claim 2 , wherein the controller is configured so that claim 2 , during use of the optical system claim 2 , the heating device is controlled individually for different ...

METHOD AND COOLING SYSTEM FOR COOLING AN OPTICAL ELEMENT FOR EUV APPLICATIONS

A method for cooling an optical element for EUV applications is disclosed. Heat is transferred from the optical element to a heat sink, and, via a first feed line, a first cooling medium is introduced into a cooling channel in the heat sink, in such a way that the first cooling medium effects laminar flow through the cooling channel and in the process absorbs heat from the heat sink. After flowing through the cooling channel, the first cooling medium is discharged into a discharge line leading away from the optical element. A second cooling medium is introduced into the discharge line via a second feed line, and the first cooling medium and the second cooling medium, downstream of the second feed line at a location that is further away from the optical element than the cooling channel, are subjected to a force field introduced into the discharge line externally. 120-. (canceled)21. A method , comprising:a) transferring heat from an optical element to a heat sink;b) introducing a first cooling medium into a first cooling channel of the heat sink so that the first cooling medium has laminar flow through the cooling channel and absorbs heat from the heat sink;c), after b), discharging the first cooling medium into a discharge line leading away from the optical element;d) introducing a second cooling medium into the discharge line via a second feed line;e) downstream of the second feed line at a location that is further from the optical element than the cooling channel, subjecting the first and second cooling media to a force field externally introduced into the discharge line so that the first and second cooling media mix with each other.22. The method of claim 21 , wherein:the force field comprises an alternating electric field that acts through a wall of the discharge line; and forming an electrical double layer comprising the first and second cooling media;', 'forming an electrical double layer comprising the first cooling medium and the wall of the discharge line; ...

On-Axis And Diffuse Illumination For Inspection Systems

An inspection system is described. The inspection system includes a camera and a housing. The housing contains a reflective dome. The reflective dome includes an apex and a viewport. The viewport is offset from the apex. The camera is mounted to capture light exiting the reflective dome through the viewport. And, a plurality of light sources are arranged about the reflective dome such that light output from the plurality of light sources enters the dome. 1. An inspection system , comprising:a camera; and a reflective dome, the reflective dome including an apex and a viewport, the viewport offset from the apex, the camera mounted to capture light exiting the reflective dome through the viewport; and', 'a plurality of light sources, the plurality of light sources arranged about the reflective dome such that light output from the plurality of light sources enters the dome., 'a housing, the housing having2. The system of claim 1 , wherein the light exiting the reflective dome through the viewport and received by the camera contains light that is diffuse and replicates light that is on-axis and with respect to the orientation of the camera.3. The system of claim 1 , wherein the reflective dome includes a top side and a bottom side claim 1 , the bottom side including a highly reflective concave surface.4. The system of claim 3 , wherein each light source of the plurality of light sources includes a back side and a face from which illumination generated by the light source is emitted claim 3 , and wherein the highly reflective concave surface and the faces of the plurality of light sources are arranged in the housing to face a downward direction.5. The system of claim 4 , further comprising a reflector ring that overlaps the bottom side of the reflective dome claim 4 , the reflector ring including a highly reflective surface that reflects a substantial amount of the light directly emitted in a downward direction from the plurality of light sources into the reflective dome ...

METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT, REFLECTIVE OPTICAL ELEMENT, AND USE OF A REFLECTIVE OPTICAL ELEMENT

The disclosure provides a method that includes filling a cavity in a substrate with a second material, wherein the substrate includes a first material. The method also includes using galvanic and/or chemical deposition of a third material to apply an overcoating to a first surface of the substrate in a region of the cavity. The method further includes removing the second material from the cavity. In addition, the method includes, before or after removing the second material from the cavity, applying a reflective layer to the overcoating. The disclosure also provides related optical articles and systems. 113.-. (canceled)14. An optical element , comprising:a substrate;an overcoating comprising a galvanically or chemically deposited layer on a first surface of the substrate;a cavity configured to receive a fluid; anda reflective layer comprising an optically effective surface, the cavity is near the first surface of the substrate;', 'the overcoating extends over the cavity;', 'the cavity is free of material of the overcoating; and', 'the reflective layer is on a surface of the overcoating that faces away from the substrate., 'wherein15. The optical element of claim 14 , wherein the cavity comprises at least one channel.16. The optical element of claim 14 , wherein cavity comprises a plurality of channels claim 14 , and the channels have a width which is in the range from a few micrometers to around one millimeter.17. The optical element of claim 14 , wherein the cavity comprises an opening that leads into the optically effective surface of the reflective layer.18. The optical element of claim 14 , wherein the substrate comprises steel claim 14 , a copper alloy and/or aluminum-silicon.19. The optical element of claim 14 , wherein the overcoating comprises copper claim 14 , nickel and/or nickel with phosphorus.20. The optical element of claim 14 , wherein the materials of the substrate and of the overcoating have an at least approximately identical coefficient of ...

ELECTRO-OPTICAL DEVICE, MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS

An electro-optical apparatus has an element substrate that is provided with a mirror and a sealing member which seals the mirror, and the sealing member includes a light-transmitting cover which faces the mirror opposite from the element substrate. An infrared cut filter is laminated on the light-transmitting cover. 1. A method of manufacturing an electro-optical device , comprising:preparing a first wafer that is provided with a mirror, a driving element that drives the mirror, and a terminal;forming a translucent second wafer having a bottom section with a concave section provided thereon, the second wafer having an infrared cut filter that overlaps with the concave section;adhering a face of the first wafer on a side on which the mirror is provided to a face of the second wafer on which the concave section is provided such that the mirror and the concave section overlap in planar view; andsplitting the first wafer and the second wafer.2. The method of manufacturing an electro-optical device according to claim 1 , wherein the forming of the second wafer includes:forming the infrared cut filter on a light-transmitting wafer;forming of a through hole in a spacer wafer; andobtaining the second wafer by adhering the light-transmitting wafer with the spacer wafer so as to overlap each other. This Application is a Division from U.S. patent application Ser. No. 15/017,964, filed Feb. 8, 2016, which claims priority to Japanese Patent Application No. 2015-063930, filed Mar. 26, 2015. The entire disclosures of both applications are expressly incorporated by reference herein.1. Technical FieldThe present invention relates to an electro-optical device which is provided with a mirror, a manufacturing method of the electro-optical device, and an electronic apparatus.2. Related ArtAs an electronic apparatus, for example, a projection-type display apparatus or the like is known which displays an image on a screen by enlarging and projecting modulated light using a projection ...

Beam Reverser Module and Optical Power Amplifier Having Such a Beam Reverser Module

A beam reverser module for an optical power amplifier of a laser arrangement comprises at least one reflecting surface for receiving an incoming laser beam propagating in a first direction and reflecting the incoming laser beam into a second direction different from the first direction, wherein the at least one reflecting surface is a highly reflecting surface of at least one mirror. 122.-. (canceled)23. A module , comprising:a prism comprising an entrance surface, a first total internal reflection surface, a second total internal reflection surface, and an exit surface, a laser beam enters the prism via the entrance surface;', 'the first total internal reflection surface receives the laser beam entering the prism;', 'the second total internal reflection surface receives the laser beam reflected at the first total internal reflection surface;', 'the first and second internal reflection surfaces define an angle greater than 60° with one another;', 'after reflecting at the second internal reflection surface, the laser beam emerges from the prism via the laser beam exit surface; and', 'the entrance surface is configured so that an angle of incidence of the laser beam as it impinges on the entrance surface is greater than the Brewster angle., 'wherein the module is configured so that, during use of the module in an optical power amplifier of a laser arrangement24. The module of claim 23 , wherein the first and second total internal reflection surfaces comprise protection coatings configured to change an electric field of the laser beam on these surfaces to reduce surface absorption of the laser beam.25. The module of claim 23 , wherein the prism comprises CaFhaving a linear laser induced absorption coefficient of less than 0.2×10cm/mJ.26. The module of claim 23 , wherein the first and second total internal reflection surfaces comprise protection coatings configured to change an electric field of the laser beam on these surfaces to reduce surface absorption of the laser ...

METHOD AND DEVICE FOR CORRECTING DEFORMATIONS OF A SURFACE AND MIRROR USING SAID METHOD AND/OR SAID DEVICE

A method for correcting deformations of the surface of an object equipped with a device for correcting deformations, the device including a piezoelectric layer including first and second surfaces, a first plurality of electrical tracks arranged on the first surface, a second plurality of electrical tracks arranged on the second surface, the tracks of the first plurality forming a plurality of lines and the tracks of the second plurality forming a plurality of columns, each column of the plurality of columns being perpendicular to the lines of the plurality of lines, the crossing of a line and a column forming a pixel. The method includes measuring the deformations of the surface; identifying the pixels for correcting the deformations and applying, for each identified pixel, with the line and the column corresponding to the pixel, an electric field greater than the coercive field of the piezoelectric material of the piezoelectric layer. 1. A method for correcting deformations of a surface of an object equipped with a correction device for correcting deformations , said correction device comprising a piezoelectric layer including a first surface and a second surface , a first plurality of electrical tracks arranged on the first surface of the piezoelectric layer , a second plurality of electrical tracks arranged on the second surface of the piezoelectric layer , the electrical tracks of the first plurality forming a plurality of lines and the electrical tracks of the second plurality forming a plurality of columns , each column of the plurality of columns crossing the lines of the plurality of lines , the crossing of a line and a column forming a pixel , said method comprising:a first step of measuring the deformations of the surface to correct;a second step of identifying the pixels necessary for the correction of said deformations; anda third step of applying, for each identified pixel, by means of the line and the column corresponding to said pixel, an electric ...

MIRROR ARRANGEMENT FOR MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND RELATED METHOD

A mirror arrangement, in particular for a microlithographic projection exposure apparatus, includes at least one mirror element bearing a mirror surface provided for reflecting electromagnetic radiation, at least one carrier element including a head section, which is provided for receiving at least one mirror element, and also a seat section. The arrangement further includes a mount arrangement, for receiving the at least one carrier element. At least one insertion opening is in the mount arrangement. The seat section of the carrier element plunges into the insertion opening. In addition, the arrangement includes a channel device for guiding a heat transfer medium is formed in the mount arrangement in the region surrounding the seat section. A method for dissipating heat is provided. 1. A mirror arrangement , comprising: aa mirror element bearing a mirror surface configured to reflect electromagnetic radiation;a carrier element comprising a head section and a seat section; anda mount arrangement having an insertion opening and a channel device, the head section is configured to receive the mirror element;', 'the seat section is disposed in the insertion opening;', 'the channel device configured to guide a heat transfer medium on a region surrounding the seat section;', 'the carrier element has a passage channel extending through the seat section., 'wherein2. The mirror arrangement of claim 1 , wherein the carrier element is a pin-like component claim 1 , and the seat section tapers in an insertion direction.3. The mirror arrangement of claim 2 , wherein the seat section has a conical outer surface.4. The mirror arrangement of claim 1 , wherein an inner wall of the insertion opening comprises a bush element linked into the mount arrangement.5. The mirror arrangement of claim 4 , wherein the bush element is linked into the mount arrangement in a sealing manner.6. The mirror arrangement of claim 5 , wherein the bush element is a hollow cone bush.7. The mirror ...

Diffractive optical element and method of manufacturing the same

A diffractive optical element prevents degradation of the optical performance of the element due to moisture absorption of the resin layers from taking place and also can prevent cracks of the resin layers and peeling of the resin layers along the interface thereof from taking place in a hot environment or in a cold environment. The diffractive optical element comprises a first layer and a second layer sequentially laid on a substrate, a diffraction grating being formed at the interface of the first layer and the second layer, the height d of the diffraction grating, the average film thickness t1 of the first layer and the average film thickness t2 of the second layer satisfying the relationship requirements expressed by the expressions of 1.1×d≤t1≤50 μm and 30 μm≤t2≤(400 μm−t1−d).

OPTICAL ASSEMBLY HAVING A THERMALLY CONDUCTIVE COMPONENT

An optical assembly includes: an optical element, which is transmissive or reflective to radiation at a used wavelength and has an optically used region; and a thermally conductive component, which is arranged outside the optically used region of the optical element. The thermally conductive component can include a material having a thermal conductivity of more than 500 W mK. Additionally or alternatively, the product of the thickness of the thermally conductive component in millimeters and the thermal conductivity of the material of the thermally conductive component is at least 1 W mm mK. 1. (canceled)2. The optical assembly of claim 34 , wherein the material has a thermal conductivity of more than 500 W mK.35.-. (canceled)6. The optical assembly of claim 34 , wherein the product of a thickness of the thermally conductive component in millimeters and the thermal conductivity of the material is greater than 1 W mm mK.78.-. (canceled)9. The optical assembly of claim 34 , wherein the material comprises polycrystalline diamond and/or monocrystalline diamond.10. The optical assembly of claim 34 , wherein the material comprises carbon nanotubes.11. The optical assembly of claim 34 , wherein the material comprises a CVD material.12. The optical assembly of claim 34 , wherein the thickness of the thermally conductive component is less than 500 μm.13. The optical assembly of claim 34 , wherein the material comprises a metal.14. (canceled)15. The optical assembly of claim 34 , wherein the material comprises a woven fabric.16. The optical assembly of claim 34 , wherein the material comprises a woven fabric claim 34 , and the woven fabric comprises a metallic material and/or a carbon compound.17. The optical assembly of claim 34 , wherein the thermally conductive component is connected to the device.18. The optical assembly of claim 34 , wherein the thermally conductive component is connected to the device over at least one surface area at at least one isolated point.19. The ...

COOLING A DIGITAL MICROMIRROR DEVICE

An apparatus and a method for cooling a digital mirror device are disclosed. For example, the apparatus includes a digital mirror device (DMD), a thermal pad, wherein a first side of the thermal pad is coupled to a bottom of a housing of the DMD and a cooling block coupled to a second side of the thermal pad that is opposite the first side. The cooling block includes a plate that includes a plurality of openings that generates a liquid jet of a liquid that is forced through the plurality of openings towards a side of the cooling block coupled to the thermal pad. 1. A laser imaging module (LIM) , comprising:a digital mirror device (DMD);a thermal pad, wherein a first side of the thermal pad is coupled to a bottom of a housing of the DMD; and 'a plate comprising a plurality of openings that generates a liquid jet of a liquid that is forced through the plurality of openings towards a side of the cooling block coupled to the thermal pad.', 'a cooling block coupled to a second side of the thermal pad that is opposite the first side, wherein the cooling block comprises2. The LIM of claim 1 , further comprising:a cooling loop coupled to the cooling block, wherein the cooling loop delivers the liquid towards the plurality of openings.3. The LIM of claim 2 , wherein the cooling loop and the cooling block comprises copper.4. The LIM of claim 2 , wherein a diameter of the cooling loop is sized to provide 0.3 gallons per minute (gpm) to 0.5 gpm at 19 pounds per square inch (psi) to 50 psi.5. The LIM of claim 1 , wherein the liquid comprises a coolant comprising at least one of: a mixture of water and ethylene glycol or Fluorinert.6. The LIM of claim 1 , wherein the thermal pad comprises at least a layer of Indium.7. The LIM of claim 5 , wherein the thermal pad further comprises a layer of aluminum nitride.8. The LIM of claim 1 , further comprising:a thermoelectric cooling device located between the thermal pad and the cooling block.9. The LIM of claim 8 , further comprising:a ...

OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION AND OPTICAL ARRANGEMENT

The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (λ) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element. 1. An optical element , comprising:a substrate having first and second sides;a first coating supported by the first side of the substrate; and the first coating is configured to reflect radiation having a used wavelength in the EUV wavelength range;', 'the first coating comprises a layer configured to reflect heating radiation having a first wavelength; and', 'the second coating is configured to influence heating radiation., 'a second coating supported by the second side of the substrate, wherein2. The optical element of claim 1 , wherein the second coating comprises a layer configured to absorb heating radiation at a second wavelength which is different from the used wavelength.3. The optical element of claim 2 , further comprising an anti-reflecting layer configured to suppress reflection radiation at the second wavelength claim 2 , wherein the layer of the second coating is between the substrate and the anti-reflection layer.4. The optical element of claim 3 , wherein at least one of the following holds:a maximum absorbance of the layer of the second coating is at wavelengths of more than 1500 nm; anda maximum suppression of the anti-reflection layer is at wavelengths of more than 1500 nm.5. The optical element of claim 2 , wherein the layer of the second coating is configured to transmit heating radiation at a third wavelength which is different from the second wavelength.6. The optical element of claim 5 , wherein the layer of the second coating has a maximum transmission ...

OPTICAL MODULE FOR GUIDING A RADIATION BEAM

An optical module includes a chamber capable of being evacuated and a mirror in the chamber. The mirror includes a plurality of individual mirrors. Each individual mirror includes: a mirror body including a reflection face; a support structure; and a thermally conductive portion that mechanically connects the support structure to the mirror body. For at least one individual mirror, the thermally conductive portion includes a plurality of thermally conductive strips arranged radially, adjacent thermally conductive strips being separated from each other, and each of the plurality of thermally conductive strips connecting the mirror body to the support structure. For at least one individual mirror, an actuator is associated with the mirror body, the actuator being configured to displace the mirror body relative to the support structure in at least one degree of freedom. 118.-. (canceled)19. An optical module , comprising:a chamber capable of being evacuated; and a mirror body including a reflection face;', 'a support structure; and', 'a thermally conductive portion that mechanically connects the support structure to the mirror body,, 'a mirror in the chamber, the mirror comprising a plurality of individual mirrors, each individual mirror comprising for at least one individual mirror, the thermally conductive portion comprises a plurality of thermally conductive strips arranged radially, adjacent thermally conductive strips being separated from each other, and each of the plurality of thermally conductive strips connecting the mirror body to the support structure;', 'for at least one individual mirror, an actuator is associated with the mirror body, the actuator being configured to displace the mirror body relative to the support structure in at least one degree of freedom;', 'for at least some of the thermally conductive portions, the thermally conductive portion includes an inner connection portion and an outer connection portion, the inner connection portion ...

FRAMELESS MIRROR AND ASSOCIATED INSTALLATION METHOD

In a method for installing a frameless mirror, a mirror glass is positioned on a carrier plate against a stop formed by a border of the carrier plate and glued on the carrier plate. The border is then separated from the carrier plate via a predetermined breaking point of the border. 110.-. (canceled)11. A method for installing a frameless mirror , comprising:positioning a mirror glass on a carrier plate against a stop formed by a border of the carrier plate;gluing the mirror glass on the carrier plate; andseparating the border from the carrier plate via a predetermined breaking point of the border.12. The method of claim 11 , further comprising forming the border of the carrier plate as a circumferential border.13. The method of claim 11 , further comprising providing the border of the carrier plate with sections to form several border sections.14. The method of claim 11 , further comprising forming the predetermined breaking point between the carrier plate and the border with one or more sections of reduced diameter.15. The method of claim 11 , further comprising arranging the predetermined breaking point between the carrier plate and the border as a perforation.16. The method of claim 11 , further comprising arranging a heating element between the carrier plate and the mirror glass.17. The method of claim 11 , further comprising forming the border of the carrier plate with a tab which can be grabbed for separating the border.18. A frameless mirror claim 11 , comprising:a carrier plate having a border formed with a predetermined breaking point; anda mirror glass mounted on the carrier plate by positioning the mirror glass on the carrier plate against a stop formed by the border, gluing the mirror glass on the carrier plate, and separating the border from the carrier plate via the predetermined breaking point.19. The frameless mirror of claim 18 , wherein the border of the carrier plate is formed as a circumferential border.20. The frameless mirror of claim 18 , ...

MICROMIRROR ARRAYS

A micromirror array comprises a substrate, a plurality of minors for reflecting incident light and, for each mirror () of the plurality of minors, at least one piezoelectric actuator () for displacing the minor, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars () connecting the minor to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus. 132-. (canceled)33. A micromirror array comprising:a substrate;a plurality of mirrors configured to reflect incident light;for each mirror of the plurality of mirrors, at least one piezoelectric actuator connected to the substrate and configured to displace the mirror;one or more pillars connecting the mirror to the at least one piezoelectric actuator; a heat diffuser configured to diffuse heat from the mirror, wherein the heat diffuser comprises a heat sink, and', 'a thermally conductive post configured to connect the heat sink to the mirror., 'for each mirror of the plurality of mirrors34. The micromirror array of claim 33 , wherein the heat sink comprises a flexible membrane that allows the thermally conductive post to pivot in response to the mirror being displaced.35. The micromirror array of claim 34 , wherein the flexible membrane comprises a patterned silicon layer.36. The micromirror array of claim 34 , wherein the flexible membrane comprises grooves through the silicon layer and extending from an outer edge of the heat diffuser towards the thermally conductive post.37. The micromirror array of claim 36 , wherein the grooves are curved grooves.38. The micromirror array of claim 33 , wherein the thermally conductive post is electrically conductive and connected to ground.39. The micromirror array of claim 33 , wherein ...

OPTICAL ELEMENT AND LITHOGRAPHY SYSTEM

An optical element reflects radiation, such as EUV radiation. The optical element includes a substrate with a surface to which a reflective coating is applied. The substrate has at least one channel through which a coolant can flow. The substrate is formed from fused silica, such as titanium-doped fused silica, or a glass ceramic. The channel has a length of at least 10 cm below the surface to which the reflective coating is applied. The cross-sectional area of the channel varies by no more than +/−20% over the length of the channel. 1. An optical element , comprising:a substrate comprising a surface; andan EUV reflective coating supported by the surface, the substrate comprises a member selected from the group consisting of fused silica and a fused glass ceramic;', 'the substrate comprises a channel configured to have a coolant flow therethrough;', 'below the surface supporting the EUV reflective coating, the channel has a length that is at least 10 centimeters;', 'below the surface supporting the EUV reflective coating, the channel has a cross-sectional area that varies by no more than +/−20% over the length of the channel., 'wherein2. The optical element of claim 1 , wherein claim 1 , below the surface supporting the EUV reflective coating claim 1 , the length of the channel is at least 20 centimeters.3. The optical element of claim 2 , wherein claim 2 , below the surface supporting the EUV reflective coating claim 2 , the cross-sectional area of the channel varies by no more than +/−10% over the length of the channel.4. The optical element of claim 1 , wherein claim 1 , below the surface supporting the EUV reflective coating claim 1 , the cross-sectional area of the channel varies by no more than +/−10% over the length of the channel.5. The optical element of claim 1 , wherein the substrate comprises a titanium-doped fused silica.6. The optical element of claim 1 , wherein the substrate is monolithic.7. The optical element of claim 1 , wherein the channel has a ...

OPTICAL SYSTEM, HEATING ARRANGEMENT, AND METHOD FOR HEATING AN OPTICAL ELEMENT IN AN OPTICAL SYSTEM

An optical system includes at least one optical element which has an optically effective surface and which is designed for an operating wavelength of less than 30 nm. The optical system also includes a heating arrangement for heating this optical element and comprising a plurality of IR emitters for irradiating the optically effective surface with IR radiation. The IR emitters are activatable and deactivatable independently of each other to variably set different heating profiles in the optical element. The optical system further includes at least one beam shaping unit for shaping the beam of the IR radiation steered onto the optically effective surface by the IR emitters. The optical system also includes a multi-fiber head comprising a multi-fiber connector for connecting optical fibers. IR radiation from a respective one of the IR emitters is suppliable by way of each of these optical fibers. 1. An optical system , comprising:an optical element comprising an optically effective surface configured to operate at an operating wavelength of less than 30 nm;a plurality of IR emitters configured to emit IR radiation;a plurality of optical fibers;a multi-fiber connector; anda beam shaping unit, for each IR emitter, the IR emitter has a corresponding optical fiber so that IR radiation emitted by the IR emitter is coupled into its corresponding optical fiber;', 'the multi-fiber connector is connected to the optical fibers so that, for each IR emitter, the corresponding optical fiber supplies the IR radiation emitted by the IR emitter to the multi-fiber connector;', 'the beam shaping unit is configured to shape a beam of the IR radiation emitted by the multi-fiber connector onto the optically effective surface of the optical element; and', 'for each IR emitter, the IR emitter is activatable and deactivatable independently from the other IR emitters to variably set different heating profiles in the optical element., 'wherein2. The optical system of claim 1 , wherein the beam ...

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

A projection exposure apparatus for semiconductor lithography includes a mirror and a temperature-regulating device for regulating temperature on the basis of radiation. The mirror includes at least one cutout. The temperature-regulating device includes a temperature-regulating body arranged without contact in the cutout of the mirror. The temperature-regulating body has a cavity. A fluid for temperature regulation of the temperature-regulating body is present in the cavity. 1. An apparatus , comprising:a mirror comprising a cutout; anda cavity in the cutout of the mirror, the cavity is configured to allow a fluid to flow therethrough to regulate a temperature of the temperature-regulating body;', 'the cavity does not contact the cutout of the mirror; and', 'the apparatus is a semiconductor lithography projection exposure apparatus., 'wherein2. The apparatus of claim 1 , wherein:the mirror comprises a mirror facet, a baseplate, and two bar bodies supported by the baseplate;the cutout is between the two bar bodies; andone of the bar bodies is between the baseplate and the mirror facet.3. The apparatus of claim 1 , wherein the cavity comprises an inlet configured to allow the fluid into the cavity and an outlet configured to allow the fluid out of the cavity.4. The apparatus of claim 1 , further comprising a laser configured to cool the fluid when the fluid is in the cavity by irradiating the fluid with laser radiation.5. The apparatus of claim 4 , wherein a reflectivity of an inner surface of the cavity is at least 90% for the laser radiation.6. The apparatus of claim 1 , wherein the cavity is configured so that claim 1 , during use of the temperature-regulating body claim 1 , a temperature of the temperature-regulating body is adjustable in a range of 20° C. to minus 70° C.7. The apparatus of claim 1 , further comprising a coating claim 1 , wherein the coating is supported by an outer surface of the cavity or an inner surface of the cutout.8. The apparatus of claim ...

MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD FOR OPERATING THE SAME, AND EUV PROJECTION EXPOSURE APPARATUS

A mirror arrangement for an EUV projection exposure apparatus for microlithography comprises a plurality of mirrors each having a layer which is reflective in the EUV spectral range and to which EUV radiation can be applied, and having a main body. In this case, at least one mirror of the plurality of mirrors has at least one layer comprising a material having a negative coefficient of thermal expansion. Moreover, a method for operating the mirror arrangement and a projection exposure apparatus are described. At least one heat source is arranged, in order to locally apply heat in a targeted manner to the at least one layer having a negative coefficient of thermal expansion of the at least one mirror. 130.-. (canceled)31. An arrangement , comprising:a plurality of mirrors comprising a first mirror, each of the plurality of mirrors comprising:a surface that is reflective in the EUV spectral range; anda main body; anda first heat source,wherein:the first mirror comprises a layer comprising a material having a negative coefficient of thermal expansion; andthe first heat source is configured to apply heat to the layer of having a negative coefficient of thermal expansion.32. The arrangement of claim 31 , wherein:the first mirror further comprises:a thermally insulating layer; anda layer comprising a material having a positive coefficient of thermal expansion; andthe thermally insulating layer separates the layer comprising the material having the positive coefficient of thermal expansion from the layer comprising the material having the negative coefficient of thermal expansion.33. The arrangement of claim 32 , wherein the material having the positive coefficient of thermal expansion comprises at least one material selected from the group consisting of Zr claim 32 , Y claim 32 , Nb claim 32 , Mo claim 32 , Si claim 32 , Ge claim 32 , Ru claim 32 , RuO2 claim 32 , RuSi claim 32 , Ni.34. The arrangement of claim 32 , further comprising a second heat source claim 32 , ...

Digital micromirror device projector

A digital micromirror device projector is provided. The digital micromirror device projector includes a digital micromirror device chip, a heat conductive member, a thermo-electric cooler unit and a thermal insulator. The heat conductive member includes a heat conductive plate and a heat conductive protrusion. The heat conductive plate includes a first surface and a second surface, wherein the first surface is opposite to the second surface. The heat conductive protrusion is formed on the first surface. The heat conductive protrusion is thermally connected to the digital micromirror device chip by conduction. The thermo-electric cooler unit includes a cool side and a hot side, wherein the cool side is connected to the second surface. The thermal insulator is attached to the first surface. The thermal insulator surrounds the heat conductive protrusion.

REFLECTIVE MIRROR DEFOGGER

A defogger defogs a reflective mirror with heat from sunlight without relying on electric power. A defogger for a reflective mirror includes a heat collector with a hollow structure to store heat from sunlight, an air inlet port through which air is fed into the heat collector, a warm-air outlet port through which air from the heat collector is discharged in a heated state, a support attached to a pole of the reflective mirror, and a connector connecting the heat collector and the support. The structure allows warm air discharged through the warm-air outlet port to come in contact with the surface of the reflective mirror to increase the surface temperature and thus defog the reflective mirror. 1. A defogger for defogging a reflective mirror using air heated with heat from sunlight , the defogger comprising:a heat collector having a hollow structure and located below the reflective mirror;an air inlet port and a warm-air outlet port in the heat collector, the air inlet port and the warm-air outlet port being located below the reflective mirror;a support attached to a pole of the reflective mirror; anda connector connecting the support and the heat collector,wherein the warm-air outlet port is located above the air inlet port to allow air in the heat collector to ascend for feeding or discharging air in or out the heat collector when the air is heated by heat from sunlight absorbed by the heat collector.2. The defogger according to claim 1 , further comprising:a warm-air guide assist including a transparent plate and configured to guide warm air discharged through the warm-air outlet port to below the reflective mirror with the heat collector located below the reflective mirror. This application is a continuation application of International Patent Application No. PCT/JP2018/013004 filed on Mar. 28, 2018, which claims priority to Japanese Patent Application No. 2017-145905 filed on Jul. 27, 2017, the entire contents of which are incorporated by reference.The present ...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFLUENCE OF TEMPERATURE VARIATION

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K. 119-. (canceled)20. A projection lens of an EUV-lithographic projection exposure system including a reticle and an illumination system for illuminating the reticle , the projection lens comprising:{'sub': 'i', 'a plurality of reflective optical elements M;'}{'sub': i', 'i', 'i, 'said reflective optical elements Mhaving respective bodies MBdefining respective reflective surfaces MSfor projecting an object field on said reticle onto an image field on a substrate when said projection lens is exposed with an exposure power of EUV light at a wavelength lying in a wavelength range of less than 50 nm, the EUV light being reflected from said reticle when illuminated by said illumination system;'}{'sub': 'k', 'a support unit for passively or actively supporting at least one optical element M;'}{'sub': 'k', 'a pressure control system for the control of the pressure Δp within a surrounding of said at least one reflective optical element M;'}{'sub': k', 'k', 'k, 'said control being based on a parameter selected from the group consisting of the temperature of the optical element M, the time, a parameter which directly or indirectly influence the temperature of the optical element M, an illumination setting, a change of the reticle, thermally or mechanically induced optical aberration data of the optical element Mor the projection lens and an output parameter from a model; and ...

Mirror Support for a Composite Optical Mirror and Method for Its Production

A mirror support for an optical mirror and a method for producing an optical mirror are disclosed. In an embodiment a mirror support includes a mirror body comprising a diamond particle reinforced aluminum composite material and a polishing layer arranged on the mirror body, wherein a content of diamond particles in the aluminum composite material is between 5% by mass and 50% by mass inclusive and is selected such that a thermal coefficient of linear expansion of the mirror body is adapted to a thermal coefficient of linear expansion of the polishing layer. 114-. (canceled)15. A mirror support comprising:a mirror body comprising a diamond particle reinforced aluminum composite material; anda polishing layer arranged on the mirror body,wherein a content of diamond particles in the aluminum composite material is between 5% by mass and 50% by mass inclusive and is selected such that a thermal coefficient of linear expansion of the mirror body is adapted to a thermal coefficient of linear expansion of the polishing layer.16. The mirror support according to claim 15 , wherein the mirror body is produced by additive manufacturing.17. The mirror support according to claim 15 , wherein the content of diamond particles in the aluminum composite material is selected such that the thermal coefficient of linear expansion of the mirror body at temperatures of −180° C. to 100° C. is in a range of 3*10/K to 20*10/K.18. The mirror support according to claim 15 , wherein the content of diamond particles in the aluminum composite material is between 10% by mass and 20% by mass inclusive.19. The mirror support according to claim 15 , wherein a cooling structure and/or a supporting structure is integrated into the mirror body.20. The mirror support according to claim 15 , wherein a lightweight structure is integrated into the mirror body.21. The mirror support according to claim 15 , wherein the polishing layer comprises NiP claim 15 , SiC claim 15 , Si claim 15 , SiO claim 15 , SiN ...

HEATING SYSTEM FOR AN OPTICAL COMPONENT OF A LITHOGRAPHIC APPARATUS

A system for heating an optical component of a lithographic apparatus, the system comprising a heating radiation source, the heating radiation source being configured to emit heating radiation for heating of the optical component, wherein the system is configured to direct the heating radiation emitted by the heating radiation source onto the optical component, a portion of the heating radiation being absorbed by the optical component and another portion of the heating radiation being reflected by optical component, and wherein the system is configured to vary or change a property of the heating radiation emitted by the heating radiation source such that the other portion of the heating radiation that is reflected by the optical component is constant during operation of the lithographic apparatus. 1. A system for heating an optical component of a lithographic apparatus , the system comprising:a heating radiation source, the heating radiation source being configured to emit heating radiation for heating of the optical component;wherein the system is configured to direct the heating radiation emitted by the heating radiation source onto the optical component, a portion of the heating radiation being absorbed by the optical component and another portion of the heating radiation being reflected by the optical component, and wherein the system is configured to vary or change a property of the heating radiation emitted by the heating radiation source such that the other portion of the heating radiation that is reflected by the optical component is constant during operation of the lithographic apparatus.2. The system of claim 1 , wherein the property comprises at least one of the following: a polarisation claim 1 , polarisation state claim 1 , intensity claim 1 , power and wavelength of the heating radiation emitted by the heating radiation source.3. The system of claim 1 , further comprising:a first configuration, in which the heating radiation directed onto the optical ...

MECHANISM, SYSTEM AND METHOD FOR REDUCING INTERNAL AIR TEMPERATURE GRADIENT IN A CENTRALLY-OBSCURED REFLECTIVE TELESCOPE

In some embodiments, a catadioptric optical system (CDOS) including a centrally obscured reflective telescope is disclosed, which includes: a telescope compartment defining a telescope space therein, a primary reflector including a central opening and a secondary reflector. The reflectors are located in the telescope compartment. The CDOS also includes a mechanism for reducing temperature gradient in the telescope space. The mechanism includes an air duct including a first opening and a second opening; a hollow enclosure including side openings and one or more airflow generation devices. The mechanism is configured for forming an air passageway between the airflow generation device and the inner telescope space via the air duct and hollow enclosure located therebetween, for reducing internal air temperature gradient in the telescope space. 2. The catadioptric optical system according to claim 1 , wherein said hollow enclosure is located to form a gap between said hollow enclosure and a rear side of said primary reflector claim 1 , said gap being located and configured to direct part of an airflow exiting the hollow enclosure over a back side of said primary reflector.3. The catadioptric optical system according to further comprising a baffle located inside said telescope compartment in an area of the central opening of the primary reflector.4. The catadioptric optical system according to claim 3 , wherein said baffle includes a coned baffle being coaxially located in respect to said primary reflector.5. The catadioptric optical system according to claim 3 , wherein said baffle includes at least one perforation located in a vicinity of an optical surface of the primary reflector.6. The catadioptric optical system according to claim 1 , wherein said hollow enclosure comprises a spectral beam-splitter in a form of a hollow pentaprism claim 1 , and said rear refractive optics further comprises at least two separate spectral channels.7. The catadioptric optical system ...

MOUNTS FOR MICRO-MIRRORS

Mounts for micro-mirrors are disclosed. A disclosed example apparatus includes a micro-mirror having a reflective surface area, and a movable mount to support and move the micro-mirror to direct light onto a printing area, where the movable mount includes a cross-sectional profile area that is at least 30% of the reflective surface area of the micro-mirror. 1. An apparatus comprising:a micro-mirror having a reflective surface area; anda movable mount to support and move the micro-mirror to direct light onto a printing area, wherein the movable mount includes a cross-sectional profile area that is at least 30% of the reflective surface area of the micro-mirror.2. The apparatus as defined in claim 1 , further including a flash lamp to generate the light.3. The apparatus as defined in claim 2 , wherein the light generated by the flash lamp is to have a peak intensity of 1 kilowatt per centimeter squared or greater.4. The apparatus as defined in claim 1 , wherein the cross-sectional profile area of the movable mount is greater than 50% of the reflective surface area.5. The apparatus as defined in claim 1 , wherein the reflective surface area includes a metallic or dielectric coating.6. The apparatus as defined in claim 1 , further including a metal plate proximate or disposed in a complementary metal-oxide-semiconductor (CMOS) substrate coupled to the movable mount.7. An apparatus comprising:a micro-mirror having a reflective surface area; anda movable heatsink coupled to the micro-mirror, the movable heatsink to move the micro-mirror to reflect light from a light source toward a print area and provide a conduction heat path for the micro-mirror.8. An apparatus as defined in claim 7 , wherein the light reflected by the micro-mirror has a peak intensity that is at least 1 kilowatt per centimeter squared.9. An apparatus as defined in claim 7 , wherein the movable heatsink includes a cross-sectional profile area that is at least 30% of the reflective surface area of the ...

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY WITH REDUCE THERMAL DEFORMATION

A projection exposure apparatus for semiconductor lithography has a mirror arrangement that is exposed to thermal loads in operation. The mirror arrangement includes a mirror carrier having an optically active surface arranged on a top surface of the mirror carrier. A cooling system is integrated into the mirror carrier. The cooling system has cooling lines through which a cooling fluid circulates. The cooling system is designed so that the thermal load introduced into the mirror carrier via the optically active surface is dissipated at least partially into a rear region remote from the top surface of the mirror carrier. 1. An apparatus , comprising: cooling lines;', 'an inlet region adjoining a surface of the mirror carrier, the inlet region comprising a cooling fluid feed line;', 'an outlet region arranged at a distance from the surface of the mirror carrier, the outlet region comprising a cooling fluid drain line; and', 'a connecting line connecting the inlet and outlet regions;, 'a mirror carrier comprising a cooling system integrated therein, the cooling system comprisinga mirror arrangement comprising an optically active surface arranged on the surface of the mirror carrier, the apparatus is configured so that, during use of the apparatus when a cooling fluid circulates through the cooling lines, the cooling fluid dissipates a thermal load introduced into the mirror carrier via the optically active surface of the mirror, at least partially into a region of the mirror carrier which is remote from the surface of the mirror carrier;', 'the connecting lines are configured to throttle flow of cooling fluid between the inlet and outlet regions; and', 'the apparatus is a semiconductor lithography projection exposure apparatus., 'wherein2. The apparatus of claim 1 , wherein a cross section of the connecting line is less than a cross section of the inlet region.3. The apparatus of claim 2 , wherein:the connecting line has a first flow cross section at a first location ...

Spatial light modulating devices with cooling

An image modulating system including layers such as a formatter plate (PCB), an electrical connector plate called an interposer, a back cooling block, a front cooling frame and a reflective spatial light modulator. A cooling heat transfer channel is provided to transfer heat between the front cooling frame of the light valve and the back cooling block of the reflective spatial light modulator so as to reduce the thermal gradient between the front and back of the reflective spatial light modulator. The cooling heat transfer channel passes through any intervening layers such as the formatter plate (PCB), and/or the electrical connector plate called the interposer. The cooling heat transfer channel is preferably formed of a heat pipe or a circulating cooling medium.

HIGH-POWER LASER PACKAGING UTILIZING CARBON NANOTUBES

In various embodiments, laser devices include a thermal bonding layer featuring an array of carbon nanotubes and at least one metallic thermal bonding material. 1113.-. (canceled)114. A laser apparatus comprising:a beam emitter having first and second opposed surfaces;a first electrode mount disposed beneath the first surface of the beam emitter; anda thermal bonding layer disposed between the beam emitter and first electrode mount, the thermal bonding layer improving thermal conduction between the beam emitter and the first electrode mount,wherein the thermal bonding layer comprises (i) a first layer of a first metallic bonding material, the first layer being in direct contact with the beam emitter and comprising at least one of In, Sn, AuSn, or InSn, (ii) a second layer of a second metallic bonding material being in direct contact with the first electrode mount, and (iii) disposed between and in direct contact with the first and second layers, a third layer comprising an array of carbon nanotubes embedded within a matrix material, the matrix material being in direct contact with the first and second layers and comprising at least one of In, Sn, Au, Ag, Zn, Pb, AuSn, or InSn.115. The laser apparatus of claim 114 , wherein the thermal bonding layer consists of the first layer claim 114 , the second layer claim 114 , and the third layer.116. The laser apparatus of claim 114 , wherein the third layer consists of the array of carbon nanotubes embedded within the matrix material.117. The laser apparatus of claim 116 , wherein the matrix material consists of at least one of In claim 116 , Sn claim 116 , Au claim 116 , Ag claim 116 , Zn claim 116 , Pb claim 116 , AuSn claim 116 , or InSn.118. The laser apparatus of claim 114 , wherein the matrix material consists of at least one of In claim 114 , Sn claim 114 , Au claim 114 , Ag claim 114 , Zn claim 114 , Pb claim 114 , AuSn claim 114 , or InSn.119. The laser apparatus of claim 114 , wherein the matrix material consists ...

Method for temperature control of a component

A method for temperature control of a component that is transferable between a first system and a second system includes: ascertaining a temperature drift of a temperature of the component that is to be expected after transfer of the component from the first system into the second system; and modifying a temperature prevailing in the first system and/or a temperature prevailing in the second system such that the temperature drift that is actually occurring after transfer of the component from the first system into the second system is reduced with respect to the expected temperature drift. 1. A method of modifying a temperature of an optical replacement component that is adapted to a test specimen geometry , the method comprising:a) determining an expected drift of a temperature of the optical replacement component due to transferring the optical replacement component from a first system to a second system; andb) after transferring the optical replacement component from the first system to the second system, modifying a temperature prevailing in the first system and/or a temperature prevailing in the second system so that an actual drift of the temperature of the optical replacement component is reduced compared to the expected temperature drift determined in a).2. The method of claim 1 , wherein a) comprises measuring a temperature that is currently prevailing in the first system and/or measuring a temperature that is currently prevailing in the second system.3. The method of claim 1 , further comprising performing temperature measurements using a sensor attached to the optical replacement component before and/or after transferring the optical replacement component from the first system to the second system.4. The method of claim 1 , further comprising establishing a model to predict a development of the temperature of the optical replacement component over time after transferring the optical replacement component from the first system to the second system.5. The ...

FANLESS COOLING SYSTEM FOR FULL DISPLAY MIRROR

A display mirror assembly for a vehicle includes a housing. An electro-optic element may be operably coupled with the housing. A circuit board may be adjacent the electro-optic element. An electrostatic fluid accelerator may be adjacent the circuit board and may be configured to move ions within the housing. An actuator device may be disposed on the housing and may be operably coupled with the electro-optic element. The actuator device may be adjustable to tilt the electro-optic element in one direction, thereby moving the electro-optic element to an off-axis position which approximately simultaneously changes an activation state of a display module. The actuator device may be also adjustable to tilt the electro-optic element in another direction, thereby moving the electro-optic element to an on-axis position which approximately simultaneously changes the activation state of the display module. 1. A display mirror assembly comprising:a housing;an electro-optic element disposed within the housing;a printed circuit board in communication with the electro-optic element; andan electrostatic fluid accelerator disposed within the housing.2. The display mirror assembly of claim 1 , wherein the electrostatic fluid accelerator is disposed on or adjacent to the printed circuit board.3. The display mirror assembly of claim 2 , wherein the printed circuit board is disposed adjacent to the electro-optic element.4. The display mirror assembly of claim 1 , wherein the electrostatic fluid accelerator comprises a corona electrode and a collector electrode; wherein the corona electrode is in a spaced relationship with the collector electrode.5. The display mirror assembly of claim 4 , further comprising a heat sink disposed within the housing; wherein the corona electrode is disposed adjacent the heat sink.6. The display mirror assembly of claim 4 , wherein the corona electrode is disposed on the printed circuit board.7. The display mirror of claim 4 , further comprising a rear ...

VARIABLE AREA MICROJETS TO COOL DIGITAL MICROMIRROR DEVICES

An apparatus and a method for cooling a digital micromirror device are disclosed. For example, the apparatus includes a digital micromirror device (DMD), a housing coupled to the DMD, wherein a first side of the housing is coupled to a bottom of the DMD and a cooling block coupled to a second side of the housing that is opposite the first side. The cooling block includes a plate that includes a plurality of openings, a diaphragm coupled to the plate, an air inlet to generate an airflow across the plate, wherein the diaphragm creates a force to move the airflow in a direction that is perpendicular to a direction of the airflow towards the second side of the housing, and an air outlet to collect the airflow. 1. A laser imaging module (LIM) , comprising:a digital micromirror device (DMD);a housing coupled to the DMD, wherein a first side of the housing is coupled to a bottom of the DMD; and a plate comprising a plurality of openings, wherein each one of the plurality of openings has a converging opening in a direction from an inlet side to an outlet side;', 'an air inlet to force an airflow through the plurality of openings towards the second side of the housing, wherein the continuously changing diameter of the plurality of openings increases the airflow to an approximately sonic velocity; and', 'an air outlet to collect the airflow., 'a cooling block coupled to a second side of the housing that is opposite the first side, wherein the cooling block comprises2. The LIM of claim 1 , wherein the plurality of openings are arranged symmetrically in a center area of the plate.3. The LIM of claim 1 , wherein the plate comprises a plurality of ventilation holes located around the plurality of openings claim 1 , wherein the airflow moves out of the cooling block through the plurality of ventilation holes towards the air outlet.45. The LIM of claim 3 , wherein a diameter of the plurality of ventilation holes comprises approximately times a diameter of the outlet side of the ...

COMPOSITE-OPTICAL-SYSTEM UNIT AND PROJECTOR

[Solving Means] A composite-optical-system unit includes a polarization beam splitter and a thermal conduction member. The polarization beam splitter includes a first prism including a first surface, a second prism including a second surface having an area different from an area of the first surface, and an overlap interface on which the first surface is attached to and overlaps the second surface. The thermal conduction member is thermally connected to a connection region being a region other than the overlap interface of the first surface or the second surface having an area larger than an area of the other surface. 1. A composite-optical-system unit , comprising:a polarization beam splitter that includes a first prism including a first surface, a second prism including a second surface having an area different from an area of the first surface, and an overlap interface on which the first surface is attached to and overlaps the second surface; anda thermal conduction member that is thermally connected to a connection region being a region other than the overlap interface of the first surface or the second surface having an area larger than an area of the other surface.2. The composite-optical-system unit according to claim 1 , further comprisinga heat source that supplies heat to the polarization beam splitter via the thermal conduction member.3. The composite-optical-system unit according to claim 1 , whereinthe thermal conduction member includes a heater that supplies heat to the polarization beam splitter.4. The composite-optical-system unit according to claim 1 , whereinthe first prism and the second prism are attached to each other in order that the connection region is provided in at least a part of a region around the overlap interface.5. The composite-optical-system unit according to claim 4 , whereinthe connection region is provided on both ends of the first surface or the second surface to be on either end of the overlap interface.6. The composite- ...

OPTICAL ASSEMBLY HAVING A THERMALLY CONDUCTIVE COMPONENT

An optical assembly includes: an optical element, which is transmissive or reflective to radiation at a used wavelength and has an optically used region; and a thermally conductive component, which is arranged outside the optically used region of the optical element. The thermally conductive component can include a material having a thermal conductivity of more than 500 W mK. Additionally or alternatively, the product of the thickness of the thermally conductive component in millimeters and the thermal conductivity of the material of the thermally conductive component is at least 1 W mm mK. 1. An optical assembly , comprising:an optical element that is transmissive or reflective to radiation at a used wavelength, the optical element having an optically used region; anda thermally conductive component arranged outside the optically used region of the optical element, [{'sup': −1', '−1, 'the thermally conductive component comprises a material with a thermal conductivity of more than 500 W mK; and'}, {'sup': −1', '−1, 'a product of a thickness of the thermally conductive component in millimeters and the thermal conductivity of the material is greater than 1 W mm mK.'}], 'wherein at least one of the following holds2. The optical assembly of claim 1 , wherein the material has a thermal conductivity of more than 500 W mK.3. The optical assembly of claim 1 , wherein the material has a thermal conductivity of more than 1000 W mK.4. The optical assembly of claim 1 , wherein the material has a thermal conductivity of more than 1700 W mK.5. The optical assembly of claim 1 , wherein the material has a thermal conductivity of more than 2000 W mK.6. The optical assembly of claim 1 , wherein the product of a thickness of the thermally conductive component in millimeters and the thermal conductivity of the material is greater than 1 W mm mK.7. The optical assembly of claim 1 , wherein the product of a thickness of the thermally conductive component in millimeters and the thermal ...

ELECTRO-OPTICAL DEVICE, MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS

An electro-optical apparatus has an element substrate that is provided with a mirror and a sealing member which seals the mirror, and the sealing member includes a light—transmitting cover which faces the mirror opposite from the element substrate. An infrared cut filter is laminated on the light-transmitting cover. 1. An electro-optical device comprising:an element substrate;a mirror that is provided on a first face side of the element substrate;a driving element that drives the mirror;a sealing member that has a light-transmitting cover and is provided such that the mirror is positioned between the light-transmitting cover and the element substrate; andan infrared cut filter that is provided on the light-transmitting cover.2. The electro-optical device according to claim 1 ,wherein the infrared cut filter is formed of a film that is laminated on at least one of a second face of the light-transmitting cover and a third face of the light-transmitting cover, the second face faces the mirror, and the third face is on an opposite side from the second face.3. The electro-optical device according to claim 1 , further comprising:a substrate on which the element substrate is mounted,wherein a lead terminal extends outside from the substrate, andthe lead terminal has a bent section that is bent in a direction in which a leading end section of the lead terminal is away from the substrate.4. The electro-optical device according to claim 3 ,wherein the lead terminal includes a convex section that protrudes in a direction which intersects with an extension direction of the lead terminal.5. The electro-optical device according to claim 3 ,wherein a heat dissipation unit is provided on a face on an opposite side from the element substrate of the substrate.6. The electro-optical device according to claim 5 ,wherein the heat dissipation unit is a heat sink on which a heat dissipation fin is provided.7. The electro-optical device according to claim 3 ,wherein the sealing member ...

COOLING DEVICE, OPTICAL MODULE PROVIDED WITH THE SAME, AND PROJECTING DEVICE

A cooling device is adapted to cool a DMD including a reflection surface and a support frame for supporting the outer edge of the reflection surface, and includes first and second contact portions and a water cooling pump. The first and second contact portions each have a contact surface that is brought into contact with a side surface in a direction transverse the reflection surface at the support frame. The water cooling pump is connected to the first and second contact portions so as to cool the first and second contact portions. 1. A cooling device for cooling an optical element including a light receiving surface and a support frame for supporting an outer edge of the light receiving surface , the cooling device comprising:a contact member having a first contact surface that is brought into contact with a side surface in a direction transverse the light receiving surface at the support frame; anda cooling unit that is connected to the contact member and cools the contact member.2. The cooling device according to claim 1 , wherein the contact member includes a first contact portion that is brought into contact with a first side surface of the support frame and a second contact portion that is brought into contact with a second side surface that is different from the first side surface of the support frame.3. The cooling device according to claim 2 , further comprising a position adjusting mechanism that adjusts positions of the first contact portion and the second contact portion in a direction substantially parallel to the light receiving surface.4. The cooling device according to claim 2 , whereinthe support frame is formed into a rectangular shape,the first contact portion is brought into contact with two adjacent side surfaces forming the support frame, andthe second contact portion is connected to two side surfaces different from the side surfaces, with which the first contact portion is brought into contact.5. The cooling device according to claim 1 , ...

OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION AND OPTICAL ARRANGEMENT

The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (λ) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element. 1. An optical element , comprising:a substrate having first and second sides;a first coating supported by the first side of the substrate; anda second coating supported by the second side of the substrate, the substrate comprises a glass;', 'the first coating reflects EUV radiation;', an absorbing layer that absorbs radiation having a wavelength in a range selected from the group consisting of the visible range and the infrared range; and', 'is an anti-reflecting layer that suppresses reflection of radiation at the wavelength,, 'the second coating comprises, 'the absorbing layer is between the substrate and the anti-reflection layer; and', 'the optical element is an EUV mirror., 'wherein2. The optical element of claim 1 , wherein a maximum absorbance of the absorbing layer is at wavelengths of more than 1500 nm.3. The optical element of claim 1 , wherein a maximum suppression of the anti-reflection layer is at wavelengths of more than 1500 nm.4. The optical element of claim 2 , wherein a maximum suppression of the anti-reflection layer is at wavelengths of more than 1500 nm.5. The optical element of claim 1 , wherein the substrate comprises a material that is at least partially absorbent for radiation at the wavelength.6. The optical element of claim 1 , wherein the glass comprises a silicate glass.7. The optical element of claim 1 , wherein the glass comprises a quartz glass.8. The optical element of claim 1 , wherein the glass comprises a TiO-doped quartz glass.9. The optical ...

Arrangement for the actuation of at least one element in an optical system

An arrangement for the actuation of an element in an optical system. The arrangement includes first actuation and second actuation units for tilting the element about at least two different tilting axes. The first and second actuation units respectively include a flexure unit arranged outside an area defined by the element. Each flexure unit includes a first flexing element, rotatable with respect to a first axis of rotation, and a second flexing element, rotatable with respect to a second axis of rotation. For each flexure unit, the two associated axes of rotation intersect at a virtual connecting point of the flexure unit concerned to the optical element. The virtual connecting point is arranged in the area defined by the element and defines a rotating point for the element.

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFLUENCE OF TEMPERATURE VARIATION

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K. 1. A projection lens of an EUV-lithographic projection exposure system , comprising{'sub': 'i', 'a plurality of reflective optical elements M, each comprising'}{'sub': i', 'i, 'a body MBand a reflective surface MSfor projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light with a wavelength in a wavelength range of less than 50 nm, being reflected from the reticle while illuminated by an illumination system of the EUV-lithographic projection exposure system, wherein the lens comprises'}{'sub': 'k', 'support means for passively or actively supporting at least one optical element M,'}the support means comprising a temperature sensitive element selected from the group consisting of linking points, bipod structures, linking elements, support element and housing structure, whereinthe temperature sensitive element is controlled to a constant or to a predefined temperature, the lens further comprises{'sub': k', 'k, 'a first tempering element for heating and/or cooling the at least one optical element Mto a temperature T,'}a second tempering element for tempering the temperature sensitive element to the predefined temperature, whereinthe second tempering element is spatially arranged between the temperature sensitive element and the first tempering element.2. The projection lens of claim ...

MIRROR DEVICE

A mirror device may include: an optical element configured to reflect part of a laser beam and transmit the other part of the laser beam therethrough; and a holder in surface contact with the optical element to hold the optical element. A flatness of a contact surface of the holder in contact with the optical element may be equal to or smaller than a flatness of the optical element. 1. A mirror device comprising:an optical element configured to reflect part of a laser beam and transmit the other part of the laser beam therethrough; anda holder in surface contact with the optical element to hold the optical element,wherein a flatness of a contact surface of the holder in contact with the optical element is equal to or smaller than a flatness of the optical element.2. The mirror device according to claim 1 , wherein the holder includes:a support member having the contact surface in surface contact with a first surface of the optical element to support the optical element; anda pushing member configured to push the optical element against the support member by pushing a second surface of the optical element.3. The mirror device according to claim 2 , wherein:the holder further includes a first intermediate member disposed between the support member and the first surface, the first intermediate member being in surface contact with the support member and the first surface; anda flatness of a contact surface of the first intermediate member in contact with the first surface is equal to or smaller than a flatness of the first surface.4. The mirror device according to claim 3 , wherein a flatness of a contact surface of the first intermediate member in contact with the support member is equal to or smaller than the flatness of the first surface.5. The mirror device according to claim 2 , wherein:the holder further includes a second intermediate member disposed between the pushing member and the second surface, the second intermediate member being in surface contact with the ...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFLUENCE OF TEMPERATURE VARIATION

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K. 121-. (canceled)22. A mirror comprising:{'sub': k', 'k, 'a body MBhaving a reflective surface MS;'}{'sub': '0k', 'a material with a temperature dependent coefficient of thermal expansion which is zero at a zero cross temperature T;'}{'sub': 'k', 'b': 2', '2, 'said body MBis at least partly coated with a resistive coating C, wherein the resistive coating C has an electrical resistance suitable to heat the body by electrical resistive heating; and,'}said mirror being adapted for a projection lens of an EUV-lithographic projection exposure system for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light with a wavelength in a wavelength range of less than 50 nm.23. The mirror of claim 22 , wherein the resistive heating is between 0.01 W and 1 W.242. The mirror of claim 22 , wherein the coating C is connected to a voltage source VS selected from the group consisting of a voltage source attached to the mirror body MBand a voltage source electrically connecting the mirror body MBby a wire.252. The mirror of claim 22 , wherein the coating C covers the mirror body MBexcept in the area of the reflective surface MS.262. The mirror of claim 22 , wherein the body MBof the optical element Mis semitransparent to an IR radiation and wherein the resistive coating C is on a reflective coating ...

METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT, REFLECTIVE OPTICAL ELEMENT, AND USE OF A REFLECTIVE OPTICAL ELEMENT

The disclosure provides a method that includes filling a cavity in a substrate with a second material, wherein the substrate includes a first material. The method also includes using galvanic and/or chemical deposition of a third material to apply an overcoating to a first surface of the substrate in a region of the cavity. The method further includes removing the second material from the cavity. In addition, the method includes, before or after removing the second material from the cavity, applying a reflective layer to the overcoating. The disclosure also provides related optical articles and systems. 1. A method , comprising:filling a cavity in a substrate with a second material, the substrate comprising a first material;using galvanic and/or chemical deposition of a third material to apply an overcoating to a first surface of the substrate in a region of the cavity;removing the second material from the cavity;before or after removing the second material from the cavity, applying a reflective layer to the overcoating,wherein the method forms an article.2. The method of claim 1 , further comprising forming the article into a reflective optical element having an optically effective surface claim 1 , wherein claim 1 , before filling the cavity with the second material claim 1 , the first surface of the substrate is preformed to form a surface shape corresponding to a basic shape of the optically effective surface of the reflective optical element.3. The method of claim 1 , wherein the second material is liquefiable by applying heat claim 1 , and/or the second material is soluble in a solvent.4. The method of claim 1 , wherein the second material is electrically conductive.5. The method of claim 3 , wherein the second material comprises at least one material selected from the group consisting of a wax claim 3 , a polymer and a salt.6. The method of claim 1 , further comprising claim 1 , between filling the cavity and applying the overcoating claim 1 , applying an ...

Euv exposure apparatus with reflective elements having reduced influence of temperature variation

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

Ceramic Wavelength Converter Having a High Reflectivity Reflector

There is herein described a ceramic wavelength converter having a high reflectivity reflector. The ceramic wavelength converter is capable of converting a primary light into a secondary light and the reflector comprises a reflective metal layer and a dielectric buffer layer between the ceramic wavelength converter and the reflective metal layer. The buffer layer is non-absorbing with respect to the secondary light and has an index of refraction that is less than an index of refraction of the ceramic wavelength converter. Preferably the reflectivity of the reflector is at least 80%, more preferably at least 85% and even more preferably at least 95% with respect to the secondary light emitted by the converter. 1. A ceramic wavelength converter having a high reflectivity reflector , the ceramic wavelength converter being capable of converting a primary light into a secondary light , the reflector comprising a reflective metal layer and a dielectric buffer layer between the ceramic wavelength converter and the reflective metal layer , the buffer layer being non-absorbing with respect to the secondary light and having an index of refraction that is less than an index of refraction of the ceramic wavelength converter.2. The ceramic wavelength converter of wherein the reflectivity of the reflector is at least 80% with respect to the secondary light.3. The ceramic wavelength converter of wherein the reflectivity of the reflector is at least 85% with respect to the secondary light.4. The ceramic wavelength converter of wherein the reflectivity of the reflector is at least 95% with respect to the secondary light.5. The ceramic wavelength converter of where the converter comprises at least one phosphor selected from (Y claim 1 ,Lu claim 1 ,Gd)AlO:Ce and (Ba claim 1 ,Ca claim 1 ,Sr)SiON:Eu.6. The ceramic wavelength converter of wherein the converter is in the form of a flat plate having a thickness greater than a scattering length of the secondary light in the converter.7. The ...

Beam Reverser Module and Optical Power Amplifier Having Such a Beam Reverser Module

A beam reverser module for an optical power amplifier of a laser arrangement comprises at least one reflecting surface for receiving an incoming laser beam propagating in a first direction and reflecting the incoming laser beam into a second direction different from the first direction, wherein the at least one reflecting surface is a highly reflecting surface of at least one mirror.

Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus

An optical arrangement in an optical system, such as a microlithographic projection exposure apparatus, includes: at least one heat-emitting subsystem which emits heat during the operation of the optical system; a first heat shield which is arranged such that it at least partly absorbs the heat emitted by the heat-emitting subsystem; a first cooling device which is in mechanical contact with the first heat shield and is designed to dissipate heat from the first heat shield; and a second heat shield which at least partly absorbs heat emitted by the first heat shield. The second heat shield is in mechanical contact with a cooling device that dissipates heat from the second heat shield.

TRANSPARENT HEAT EXCHANGER

In one aspect, a transparent heat exchanger includes a first transparent substrate optically attached to a heat source, one or more fins to transfer heat from the heat source, the one or more fins comprising transparent material and further comprising one of a manifold coupled to the first transparent substrate or a facesheet coupled to the first transparent material.

Mirror assembly with heat transfer mechanism

A mirror assembly (32) for directing a beam (28) includes a base (450), and an optical element (454) that includes (i) a mirror (460), (ii) a stage (462) that retains the mirror (460), (iii) a mover assembly (464) that moves the stage (462) and the mirror (460) relative to the base (450), and (v) a thermally conductive medium (466) that is positioned between the stage (462) and the base (450) to transfer heat between the stage (462) and the base (450). The thermally conductive medium (466) has a thermal conductivity that is greater than the thermal conductivity of air. The thermally conductive medium (466) can include an ionic fluid or a liquid metal.

OPTICAL PATH CHANGING DEVICE AND PROJECTOR

An optical path changing device includes: a reflective member that reflects a light beam incident thereto, in a predetermined reflection direction; and a housing holding the reflective member. The housing has a first surface and a second surface with the reflective member interposed therebetween in a direction orthogonal to the reflection direction. The first surface and the second surface have openings, respectively, and a cooling gas is circulated from the opening in the first surface to the opening in the second surface. 1. An optical path changing device comprising:a reflective member that reflects a light beam incident thereto, in a predetermined reflection direction; anda housing holding the reflective member,wherein the housing has a first surface and a second surface with the reflective member interposed therebetween in a direction orthogonal to the reflection direction,wherein the first surface and the second surface have openings, respectively, andwherein a cooling gas is circulated from the opening in the first surface to the opening in the second surface.2. The optical path changing device according to claim 1 ,wherein the opening in the first surface and the opening in the second surface are formed at positions, respectively, at which the cooling gas is circulated to a side opposite to a reflective surface of the reflective member.3. The optical path changing device according to claim 1 ,wherein the housing has a holding section that holds the reflective member, andwherein the opening in the first surface and the opening in the second surface are formed at positions at which the cooling gas is circulated to at least one of the holding section and a surface of the reflective member on an opposite side to a reflective surface thereof.4. The optical path changing device according to claim 3 ,wherein the holding section is formed of a heat conductive material.5. A projector comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the optical path ...

OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION AND OPTICAL ARRANGEMENT

The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (λ) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element. 1. An optical element , comprising:a substrate having first and second sides;a first coating supported by the first side of the substrate; anda second coating supported by the second side of the substrate, the substrate comprises a glass;', 'the first coating reflects EUV radiation;', 'the second coating transmits radiation at a first wavelength;', 'the second coating comprises a member selected from the group consisting of an absorbing layer that absorbs radiation having a second wavelength and a transmitting layer that transmits radiation having the second wavelength;', 'the first wavelength is in a range selected from the group consisting of the visible range and the infrared range;', 'the second wavelength is in a range selected from the group consisting of the visible range and the infrared range;', 'the second wavelength is different from the first wavelength; and', 'the optical element is an EUV mirror., 'wherein2. The optical element of claim 1 , wherein the second coating further comprises an anti-reflecting layer that suppresses reflection of radiation at the second wavelength claim 1 , and the absorbing layer is between the substrate and the anti-reflection layer.3. The optical element of claim 2 , wherein a maximum absorbance of the absorbing layer is at wavelengths of more than 1500 nm.4. The optical element of claim 3 , wherein a maximum suppression of the anti-reflection layer is at wavelengths of more than 1500 nm.5. The optical element of claim 2 , wherein a ...

Optische baugruppe zur führung eines strahlungsbündels

Eine optische Baugruppe dient zur Führung eines EUV-Strahlungsbündels. Die optische Baugruppe hat eine evakuierbare Kammer (32) und mindestens einen in der Kammer (32) untergebrachten Spiegel. Letzterer hat eine Mehrzahl von Einzelspiegeln (27), deren Reflexionsflächen (34) sich zu einer gesamten Spiegel-Reflexionsfläche ergänzen. Eine Tragstruktur (36) ist jeweils über einen Wärmeleitungsabschnitt (37) mit einem Spiegelkörper (35) des jeweiligen Einzelspiegels (27) mechanisch verbunden. Zumindest einige der Spiegelkörper (35) haben einen zugeordneten Aktuator (50) zur vorgegebenen Verlagerung des Spiegelkörpers (35) relativ zur Tragstruktur (36) in mindestens einem Freiheitsgrad. Die Wärmeleitungsabschnitte (37) sind zur Abführung einer von den Spiegelkörpern (35) aufgenommenen thermischen Leistungsdichte von mindestens 1 kW/m 2 auf die Tragstruktur (36) ausgebildet. Bei einem Aspekt der optischen Baugruppe ist jedem der verlagerbaren Einzelspiegel (27) eine integrierte elektronische Verlagerungsschaltung räumlich benachbart zugeordnet. Eine zentrale Steuereinrichtung steht mit den integrierten elektronischen Verlagerungsschaltungen der verlagerbaren Einzelspiegel (27) bei dieser Variante in Signalverbindung. Es resultiert eine optische Baugruppe, mit der eine Beleuchtungsoptik aufgebaut werden kann, die auch bei nicht zu vernachlässigender thermischer Last auf den Einzelspiegeln einen hohen EUV-Strahlungsdurchsatz gewährleistet.

Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography

The invention relates to an optical correction device (208, 600) with thermal actuators (205) for influencing the temperature distribution in the optical correction device (208, 600). The optical correction device (208, 600) is constructed from at least two partial elements (201, 202, 604) which differ with regard to their ability to transport heat. Furthermore, the invention relates to methods for influencing the temperature distribution in an optical element (208).

Optical element

Die Erfindung betrifft ein optisches Element für eine Projektionsbelichtungsanlage der Halbleiterlithographie mit einer optisch aktiven Fläche (9) und mindestens einer Kühlkomponente zum Kühlen des optischen Elements, wobei die Kühlkomponente mit mindestens zwei separaten Kühlkreisläufen verbunden und in der Weise ausgebildet ist, dass die optisch aktive Fläche (9) in mindestens einem Teilbereich stärker gekühlt werden kann als in einem weiteren Teilbereich. Ferner betrifft die Erfindung eine Projektionsbelichtungsanlage mit einem erfindungsgemäßen optischen Element. The invention relates to an optical element for a projection exposure system in semiconductor lithography with an optically active surface (9) and at least one cooling component for cooling the optical element, the cooling component being connected to at least two separate cooling circuits and being designed in such a way that the optically active surface (9) can be more strongly cooled in at least one sub-area than in a further sub-area. The invention also relates to a projection exposure system with an optical element according to the invention.

Mirror assembly with thermal contour control

A system for compensating for heating effects in a mirror. Different areas of the mirror are associated with buried temperature sensors. Each temperature sensor is monitored, and used to create a map of current temperatures. The map of current temperatures may be corrected according to baseline values, and then is used to compensate for temperature differences.

Mirror array

Ein Spiegel-Array (22) mit einer sich senkrecht zu einer Flächennormalen (41) erstreckenden Gesamtfläche umfasst eine Vielzahl von Spiegel-Elementen (23), welche jeweils eine Reflexionsfläche (36) und mindestens einen Verlagerungs-Freiheitsgrad aufweisen, wobei die Gesamtheit der Spiegel-Elemente (23) eine Parkettierung einer Gesamt-Reflexionsfläche des Spiegel-Arrays (22) bilden, und wobei das Spiegel-Array (22) derart modular als Kachel-Element ausgebildet ist, dass die Parkettierung der Gesamt-Reflexionsfläche durch eine Kachelung mehrerer derartiger Spiegel-Arrays (22) erweiterbar ist. A mirror array (22) with a total surface extending perpendicular to a surface normal (41) comprises a plurality of mirror elements (23), each of which has a reflection surface (36) and at least one degree of freedom of displacement, the entirety of the mirrors -Elemente (23) form a tiling of an overall reflection surface of the mirror array (22), and wherein the mirror array (22) is designed in a modular manner as a tile element in such a way that the tiling of the entire reflection surface is achieved by tiling a plurality of such Mirror arrays (22) can be expanded.

OPTICAL COMPONENT AND CLAMP USED IN LITHOGRAPHIC APPARATUS

An optical element and a lithographic apparatus including the optical element. The optical element includes a first member having a curved optical surface and a heat transfer surface, and a second member that comprises at least one recess, the at least one recess sealed against the heat transfer surface to form at least one closed channel between the first member and the second member to allow fluid to flow therethrough for thermal conditioning of the curved optical surface. In an embodiment, one or more regions of the heat transfer surface exposed to the at least one closed channel are positioned along a curved profile similar to that of the curved optical surface. 1. An optical element comprising:a first member having a curved optical surface and a heat transfer surface; anda second member that comprises at least one recess, the at least one recess sealed against the heat transfer surface to form at least one closed channel between the first member and the second member to allow fluid to flow therethrough for thermal conditioning of the curved optical surface,wherein one or more regions of the heat transfer surface exposed to the at least one closed channel are positioned along a curved profile similar to that of the curved optical surface.2. The optical element of claim 1 , wherein the curved optical surface is at a first side where an incident beam is received.3. The optical element of claim 2 , wherein the heat transfer surface is at a second side opposite to the first side of the curved optical surface.4. The optical element of claim 1 , wherein the heat transfer surface is a flat surface.5. The optical element of claim 1 , wherein the heat transfer surface is a curved surface having the curved profile similar to that of the curved optical surface.6. The optical element of claim 1 , wherein the heat transfer surface and the second member are sealed against each other by fusion bonding or anodic bonding.7. The optical element of claim 1 , wherein the heat ...

THERMALLY ACTUATED ADAPTIVE OPTICS

A thermally actuated adaptive optic includes a base, a reflector, and a plurality of actuators coupled therebetween. The reflector has a light-receiving front surface, and a back surface facing the base. Each actuator includes a bracket rigidly bonded to the reflector at a perimeter of the reflector, and an inner rod and an outer rod. Each rod is rigidly connected between the bracket and the base, with the inner rod being closer to a center of the reflector. The length of each rod is temperature dependent. In another adaptive optic, the rods are instead bonded directly to the reflector. This adaptive optic may be modified to implement an integrally formed, thermally actuated support. The disclosed adaptive optics are suitable for use in laser systems, allow for significant cost savings over piezoelectric devices, provide a reflective area free of surface-figure perturbations caused by the actuator-interfaces, and are relatively simple to manufacture. 1. A thermally actuated adaptive optic , comprising:a base;a reflector having a front surface for receiving incident light, and a back surface facing the base; and a bracket rigidly bonded to the reflector at a perimeter of the reflector, and', 'an inner rod and an outer rod, each rigidly connected to and joining the bracket and the base, the inner rod being closer than the outer rod to a center of the reflector, the length of each rod between the bracket and the base being temperature dependent., 'a plurality of actuators coupled between the base and the reflector, each actuator including2. The adaptive optic of claim 1 , further comprising claim 1 , for at least one of the inner and outer rods of each actuator claim 1 , a respective thermal element attached to the rod and operable to change the temperature of the rod.3. The adaptive optic of claim 2 , wherein each of the inner and outer rods of each actuator has a respective thermal element attached thereto.4. A laser apparatus claim 2 , comprising:{'claim-ref': {'@ ...

一种自适应光学相干层析成像设备

本申请公开了一种自适应光学相干层析成像设备，包括低相干光源，耦合器，参考臂，光谱仪，像散校正镜，物镜，抛物面镜；像散校正镜包括第一镜体；位于第一镜体上表面两个交叉设置且开口面向第一镜体上表面的U型支架，且每个U型支架开口两侧的侧壁位于第一镜体上表面的边缘；位于两个U型支架交叉区域的电加热片，电加热片包括加热杆和缠绕在加热杆表面的加热丝。像散校正镜中的两个U型支架交叉区域设有电加热片，通过电加热片加热与否产生的热胀冷缩，结合杠杆的放大作用，驱动U型支架移动，结构简单，且U型支架开口两侧的侧壁位于第一镜体上表面的边缘，即从缘处改变第一镜体的面形，避免“印透效应”，且专门对像散进行校正，校正范围宽。

반도체 리소그래피용 투영 노광 장치

본 발명은 반도체 리소그래피용 투영 노광 장치(1,101)로서, 적어도 하나의 광학 요소(20) 및 광학 요소(20)의 표면(22)으로부터 방사되는 전자기 방사선(34)에 의해 광학 요소(20)의 표면(22)의 온도를 감지하기 위한 적어도 하나의 온도 기록 장치(26)를 포함하고, 온도 기록 장치(26)는 전자기 방사선(34)을 필터링 하기 위한 필터(30)을 포함할 수 있다.

How to cool a full display mirror

차량용 백미러 조립체는 백미러 장치 및 프로세서를 포함한다. 하우징은 백미러 장치와 프로세서를 지지한다. 하우징은 그 안에 리세스를 한정한다. 공기 이동 장치는 하우징에 작동 가능하게 결합되고, 하우징 외부의 영역으로부터 리세스 내로 공기를 흡인하도록 구성됨으로써, 백미러 장치 및 프로세서 중 적어도 하나를 냉각시킨다. A rearview mirror assembly for a vehicle includes a rearview mirror device and a processor. The housing supports the rearview mirror device and the processor. The housing defines a recess therein. The air moving device is operatively coupled to the housing and configured to draw air into the recess from an area outside the housing, thereby cooling at least one of the rearview mirror device and the processor.

Projection display

Euv exposure apparatus

투영 렌즈가 EUV 광의 노광 파워로 노광되면, 레티클 상의 오브젝트 필드를 기판 상의 이미지 필드로 투영하는 바디 및 반사면을 각각 포함하는 적어도 2개의 반사 광학 소자를 포함하고, 적어도 2개의 반사 광학 소자의 바디는 각각의 제로 크로스 온도에서 제로인 열 팽창의 온도 종속 계수를 갖는 재료를 포함하고, 제로 크로스 온도 사이의 차이의 절대 값은 6K보다 큰, EUV 리소그래피 투영 노광 시스템의 투영 렌즈가 제공된다. Wherein the body of at least two reflective optical elements comprises a body and a reflective surface respectively projecting an object field on the reticle onto an image field on the substrate when the projection lens is exposed with an exposure power of EUV light, A material having a temperature dependent coefficient of thermal expansion of zero at each zero crossing temperature, wherein the absolute value of the difference between the zero crossing temperatures is greater than 6K, is provided for a projection lens of an EUV lithographic projection exposure system.

Euv exposure apparatus

A projection lens of an EUV-lithographic projection exposure system, comprising a plurality of reflective optical elements, each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein at least one reflective optical element comprises a material with a temperature dependent coefficient of thermal expansion which is zero at a zero cross temperature, and wherein the body of the optical element is semitransparent to IR radiation. Further, the body comprises a coating on or on almost its entire surface, wherein the coating reflects IR radiation inside the body.

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

Euv exposure apparatus

The invention relates to a projection lens of an EUV-lithographic projection exposure system, comprising: at least two reflective optical elements M_i, each comprising a body MB_iand a reflective surface MS_ifor projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light with a wavelength in a wavelength range of less than 50 nm, being reflected from the reticle while illuminated by an illumination system of an EUV-lithographic projection exposure system, wherein the bodies MB_m, MB_nof at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at least two zero cross temperatures T¹_0mnand T²_0mn, and wherein the lens comprises a support structure for passively or actively supporting the reflective optical elements M_i, wherein the temperature of at least a part of the support structure is at a reference temperature T_Ref, at least two tempering means for independently heating and/or cooling the at least two bodies MB_n, MB_m, and a temperature control system for independently controlling the temperature of the at least two heated or cooled bodies MB_n, MB_mto respective temperatures T_knand a T_km, and wherein during exposure of the lens with the exposure power of the EUV light the temperatures T_knof the temperature controlled body MB_nis within an interval of ± 5K, better ± 2K centered around the first zero cross temperatures T¹_0mn, and the ...

Euv exposure apparatus

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

Lithographic apparatus, device manufacturing method, and use of a radiation collector

A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.

Lithographic apparatus, device manufacturing method and radiation collector

A collector is disclosed that is constructed to receive radiation from a radiation source and to transmit radiation to an illumination system, the collector comprising a reflective element which is internally provided with a fluid channel.

Optical module for guiding a radiation beam

An optical module is used to guide an EUV radiation beam. The optical module has a chamber that can be evacuated and at least one mirror accommodated in the chamber. The mirror has a plurality of individual mirrors, the reflection faces of which complement one another to form an overall mirror reflection face. A support structure is in each case mechanically connected via a thermally conductive portion to a mirror body of the respective individual mirror. At least some of the mirror bodies have an associated actuator for the predetermined displacement of the mirror body relative to the support structure in at least one degree of freedom. The thermally conductive portions are configured to dissipate a thermal power density of at least 1 kW/m2 absorbed by the mirror bodies to the support structure. In one aspect of the optical module, an integrated electronic displacement circuit is associated with each of the displaceable individual mirrors in spatial proximity, and a central control device has a signal connection with the integrated electronic displacement circuits of the displaceable individual mirrors. The result is an optical module, with which an illumination optical system can be constructed, which, even with a non-negligible thermal load on the individual mirrors, ensures a high EUV radiation throughput.

Mirrors for guiding a beam of radiation, devices with such a mirror and methods for producing microstructured or nanostructured components

Spiegel (8; 44) zur Führung eines Strahlungsbündels (3)- mit einem Grundkörper (21; 45)- mit einer die Reflektivität des Spiegels (8; 44) steigernden Beschichtung (22) einer Reflexionsfläche (19) des Grundkörpers (21; 45),- mit einer Wärmeabführeinrichtung (24) zur Abführung von in der Beschichtung (22) deponierter Wärme (23), wobei- die Wärmeabführeinrichtung (24) mindestens ein Peltierelement (25) aufweist,- die Beschichtung (22) direkt auf dem Peltierelement (25) aufgebracht ist,- wobei die Beschichtung (22) auf einem der Halbleiterelemente (35) des Peltierelements (25) aufgebracht ist. Mirror (8; 44) for guiding a radiation beam (3) - with a base body (21; 45) - with a coating (22) increasing the reflectivity of the mirror (8; 44) on a reflection surface (19) of the base body (21; 45 ),- with a heat dissipation device (24) for dissipating heat (23) deposited in the coating (22), wherein- the heat dissipation device (24) has at least one Peltier element (25),- the coating (22) directly on the Peltier element ( 25) is applied, - the coating (22) being applied to one of the semiconductor elements (35) of the Peltier element (25).

Facet assembly for a facet mirror

Eine Facetten-Baugruppe (26) ist Bestandteil eines Facettenspiegels für eine Beleuchtungsoptik für die Projektionslithographie. Die Facetten-Baugruppe (26) hat eine Facette (7) mit einer Reflexionsfläche (27) zur Reflexion von Beleuchtungslicht. Ein Facetten-Grundkörper (28) der Facetten-Baugruppe (26) hat mindestens eine Hohlkammer (29). Eine Reflexionsflächen-Kammerwand der Hohlkammer (29) bildet mindestens einen Abschnitt (27ij) der Reflexionsfläche (27). Eine Aktor-Steuervorrichtung (30) der Facetten-Baugruppe (26) steht mit der Hohlkammer (29) zur gesteuerten Deformation der Reflexionsflächen-Kammerwand in Wirkverbindung. Es resultiert eine Facetten-Baugruppe, die flexibel als Bestandteil eines hiermit ausgerüsteten Facettenspiegels innerhalb einer Beleuchtungsoptik für die Projektionslithographie einsetzbar ist. A facet assembly (26) is part of a facet mirror for illumination optics for projection lithography. The facet assembly (26) has a facet (7) with a reflecting surface (27) for reflecting illuminating light. A facet base body (28) of the facet assembly (26) has at least one hollow chamber (29). A reflective surface chamber wall of the hollow chamber (29) forms at least one section (27ij) of the reflective surface (27). An actuator control device (30) of the facet assembly (26) is in operative connection with the hollow chamber (29) for the controlled deformation of the reflection surface chamber wall. The result is a facet assembly that can be used flexibly as a component of a facet mirror equipped therewith within an illumination optics for projection lithography.