Настройки

Укажите год
-

Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

Подробнее
-

Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

Подробнее

Форма поиска

Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
Ведите корректный номера.
Ведите корректный номера.
Ведите корректный номера.
Ведите корректный номера.
Укажите год
Укажите год
Применить Всего найдено 1984. Отображено 100.
19-01-2012 дата публикации

Projection Exposure System, Beam Delivery System and Method of Generating a Beam of Light

Номер: US20120013878A1
Автор: Damian Fiolka, Gerd Reisinger, Manfred Maul, Matthias Kuss, Vladimir Davydenko
Принадлежит: CARL ZEISS SMT GMBH

A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λ lat , wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λ lat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λ b corresponding to plural lateral laser modes, and wherein λ m <λ lat <λ b , and wherein an optical delay apparatus disposed in the beam provides an optical path difference Δl, wherein 0.8 · λ 0 2 ( 2 · Δ   λ l ) < Δ   l < 1.8 · λ 0 2 ( 2 · Δλ l ) , wherein λ 0 is an average wavelength of the light of the first beam of laser light, and Δλ lat represents the second line width.

Подробнее
Номер записи: 1
20-09-2012 дата публикации

Laser device for exposure apparatus

Номер: US20120236885A1
Автор: Hidenori Watanabe, Hiroshi Tanaka, Osamu Wakabayashi
Принадлежит: GIGAPHOTON INC

A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus,

Подробнее
Номер записи: 2
03-01-2019 дата публикации

LASER APPARATUS

Номер: US20190006814A1
Автор: Miyamoto Hirotaka
Принадлежит: Gigaphoton Inc.

A laser apparatus includes: a laser chamber in which a pair of discharge electrodes is provided; a first beam expander configured to expand a beam width of a beam outputted from the laser chamber at least in a first direction substantially parallel to a direction of electric discharge between the discharge electrodes; and a line narrow optical system including: a second beam expander configured to expand a beam width of the beam outputted from the laser chamber at least in a second direction substantially perpendicular to the first direction, the second beam expander including at least one optical element and a grating configured to perform wavelength dispersion of the beam expanded by the first and second beam expanders, the wavelength dispersion being performed in a plane substantially parallel to the second direction, wherein at least one of the grating and the at least one optical element is arranged so as to compensate for wavelength dispersion caused by the first beam expander. 1. A laser apparatus comprising:a laser chamber in which a pair of discharge electrodes is provided;a first beam expander configured to expand a beam width of a beam outputted from the laser chamber at least in a first direction substantially parallel to a direction of electric discharge between the discharge electrodes; and a second beam expander configured to expand a beam width of the beam outputted from the laser chamber at least in a second direction substantially perpendicular to the first direction, the second beam expander including at least one optical element; and', 'a grating configured to perform wavelength dispersion of the beam expanded by the first and second beam expanders, the wavelength dispersion being performed in a plane substantially parallel to the second direction,, 'a line narrow optical system includingat least one of the grating and the at least one optical element being arranged so as to compensate for wavelength dispersion caused by the first beam expander.2 ...

Подробнее
Номер записи: 3
10-01-2019 дата публикации

Photoexcitation method

Номер: US20190011836A1
Автор: Theodoros Manouras, Vangelis Angelakos
Принадлежит: Nanotronix Inc

A method and composition for enabling indirect photoexcitation whereby a large energy gap between energy levels in a second material is circumvented by a series of lower energy photoexcitations in a first material.

Подробнее
Номер записи: 4
09-01-2020 дата публикации

OPTICAL SYSTEM AND METHOD

Номер: US20200012199A1
Автор: BASELMANS Johannes Jacobus Matheus
Принадлежит:

An optical system comprising: an illumination system configured, to form a periodic illumination mode comprising radiation in a pupil plane of the optical system having a spatial intensity profile which is periodic in at least one direction, a measurement system configured to measure a dose of radiation which is received in an field plane of the optical system as a function of position in the field plane, and a controller configured to: select one or more spatial frequencies in the field plane at which variation in the received dose of radiation as a function of position is caused by speckle, and determine a measure of the variation of the received dose of radiation as a function of position at the selected one or more spatial frequencies, the measure of the variation in the received dose being indicative of speckle in the field plane. 1. A method of measuring speckle in a lithographic apparatus , the method comprising:forming a periodic illumination mode of radiation;patterning the radiation using a pattern comprising a grating to create patterned radiation;projecting the patterned radiation onto a substrate to form an image of the grating;measuring line width variation of lines of the imaged grating; andperforming a two-dimensional correlation of the line widths in which lines are correlated with themselves and are correlated with other lines of the image2. The method of claim 1 , wherein the method further comprises determining a ratio of a local maximum to a central maximum for one or more lines which were correlated with other lines of the image claim 1 , and using that ratio together with a local maximum for lines which were correlated with themselves to determine a central maximum caused by speckle for the lines which were correlated with themselves.3. The method of claim 2 , wherein the method further comprises using a previously performed calibration to convert the size of the central maximum to a measurement of dose variation caused by speckle.4. A method ...

Подробнее
Номер записи: 5
11-01-2018 дата публикации

LIGHT SOURCE DEVICE

Номер: US20180012750A1
Автор: ASAI Akinori, Fukumitsu Kenshi
Принадлежит:

In a light source device, a control unit causes an energy density of a laser light in a lighting start region RS when a laser support light is maintained to be lower than an energy density of the laser light in the lighting start region RS when the laser support light is put on. For this reason, when the laser support light is maintained, a laser light L is radiated to the lighting start region RS at an energy density of a degree where sputtering does not occur. Therefore, in the light source device, because sputtering in a light emission sealing body can be suppressed, a sufficiently long life can be realized. 117-. (canceled)18. A light source device comprising:a laser unit generating a laser light; anda light source having a light emission sealing body with an internal space in which a light emitting gas is sealed and a metal structure is accommodated,wherein a laser support light is put on by heating the metal structure and then irradiating the laser light having an energy density for putting on the laser support light onto the metal structure, andthe laser support light is maintained by continuously irradiating the laser light onto the laser support light that has been put on.19. The light source device according to claim 18 , wherein the metal structure is heated by irradiation of the laser light.20. The light source device according to claim 18 , whereinthe metal structure extends in a direction orthogonal to an optical axis of the laser light, andthe metal structure is heated by irradiation of the laser light from a direction of a side surface of the metal structure.21. The light source device according to claim 18 , wherein irradiation of the laser light onto the metal structure is performed in a defocused state.22. The light source device according to claim 18 , wherein the laser light is approximately irradiated onto a surface of the metal structure when putting on the laser support light.23. The light source device according to claim 18 , wherein a ...

Подробнее
Номер записи: 6
03-02-2022 дата публикации

EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

Номер: US20220035249A1
Автор: Honda Yoshiyuki, HOSODA Hirokazu, KOBAYASHI Takanari
Принадлежит: Gigaphoton Inc.

An extreme ultraviolet light generation system may include a laser system emitting first prepulse laser light, second prepulse laser light, and main pulse laser light in this order; a chamber including at least one window for introducing, into the chamber, the first prepulse laser light, the second prepulse laser light, and the main pulse laser light; a target supply unit supplying a target to a predetermined region in the chamber; and a processor controlling the laser system to irradiate the target with the first prepulse laser light, irradiate the target, having been irradiated with the first prepulse laser light, with the second prepulse laser light having a pulse time width longer than a pulse time width of the main pulse laser light, and irradiate the target, having been irradiated with the second prepulse laser light, with the main pulse laser light temporally separated from the second prepulse laser light. 1. An extreme ultraviolet light generation system , comprising:a laser system configured to emit first prepulse laser light, second prepulse laser light, and main pulse laser light in this order;a chamber including at least one window for introducing, into the chamber, the first prepulse laser light, the second prepulse laser light, and the main pulse laser light;a target supply unit configured to supply a target to a predetermined region in the chamber; anda processor configured to control the laser system so as to irradiate the target with the first prepulse laser light, irradiate the target, having been irradiated with the first prepulse laser light, with the second prepulse laser light having a pulse time width longer than a pulse time width of the main pulse laser light, and irradiate the target, having been irradiated with the second prepulse laser light, with the main pulse laser light temporally separated from the second prepulse laser light.2. The extreme ultraviolet light generation system according to claim 1 ,wherein the pulse time width of the ...

Подробнее
Номер записи: 7
18-01-2018 дата публикации

Lithography optics adjustment and monitoring

Номер: US20180017878A1
Автор: Abhishek SUBRAMANIAN, Omar Zurita, Thomas Frederick Allen Bibby, Jr., Thomas Patrick Duffey
Принадлежит: Cymer LLC

Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.

Подробнее
Номер записи: 8
19-01-2017 дата публикации

Novel solution for euv power increment at wafer level

Номер: US20170019981A1
Автор: En-Chao Shen, Yiming Chiu
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

The present disclosure relates to a photolithography radiation source having an angled primary laser, and an associated method of formation. In some embodiments, the photolithography radiation source has a fuel droplet generator that provides fuel droplets to a source vessel along a first trajectory. A primary laser is configured to generate a primary laser beam along a second trajectory that intersects the first trajectory. The primary laser beam is configured to ignite a plasma from the plurality of fuel droplets that emits radiation. A collector mirror is configured to focus the radiation to an exit aperture of the source vessel. The primary laser beam does not intersect the exit aperture.

Подробнее
Номер записи: 9
21-01-2021 дата публикации

LITHOGRAPHY SYSTEM BANDWIDTH CONTROL

Номер: US20210021094A1
Автор: Aggarwal Tanuj
Принадлежит:

Methods and apparatus for controlling laser firing timing and hence bandwidth in a laser capable of operating at any one of multiple repetition rates. 1. Apparatus comprising:a laser configured to operate at a first repetition rate selected from a plurality of repetition rates at which the laser is capable of operating;a comparison module adapted to determine if the first repetition rate is substantially the same as a second repetition rate used immediately prior by the laser; anda control module adapted to alter a control parameter of the laser if the comparison module determines that the first repetition rate is not substantially the same as the second repetition rate.2. Apparatus as claimed in wherein the laser has a first chamber and a second chamber and wherein the control parameter is a timing parameter DtMOPA relating to a timing of firing in the second chamber relative to a timing of firing in the first chamber.3. Apparatus as claimed in wherein the laser has a first chamber and a second chamber and wherein the control parameter is a moving average of a timing parameter DtMOPA relating to a timing of firing in the second chamber relative to a timing of firing in the first chamber.4. Apparatus as claimed in further comprising a timing module adapted to determine an amount of elapsed time since the second repetition rate used was substantially the same as the first repetition rate; and wherein the control module is additionally adapted to alter the control parameter at least partially on the basis of the amount of elapsed time as determined by the timing module.5. Apparatus as claimed in wherein the control module is further adapted to alter the control parameter at least partially on the basis of the amount of elapsed time by altering a feedforward gain.6. Apparatus as claimed in further comprising a correlator including a memory claim 1 , the memory being adapted to store feedforward correlation data correlating a value of the control signal to each of the ...

Подробнее
Номер записи: 10
23-01-2020 дата публикации

Euv radiation modification methods and systems

Номер: US20200026179A1
Автор: BO-TSUN Liu, Chun-Lin Louis CHANG, Jen-Hao Yeh, Li-Jui Chen, Po-Chung Cheng, Tzung-Chi Fu
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

A method and system for generating EUV light includes providing a laser beam having a Gaussian distribution. This laser beam can be then modified from a Gaussian distribution to a ring-like distribution. The modified laser beam is provided through an aperture in a collector and interfaces with a moving droplet target, which generates an extreme ultraviolet (EUV) wavelength light. The generated EUV wavelength light is provided to the collector away from the aperture. In some embodiments, a mask element may also be used to modify the laser beam to a shape.

Подробнее
Номер записи: 11
28-01-2021 дата публикации

EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

Номер: US20210026254A1
Автор: HOSODA Hirokazu, KOBAYASHI Takanari
Принадлежит: Gigaphoton Inc.

An extreme ultraviolet light generation system includes: a chamber; a target generation unit; a laser system configured to output a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that fluence of the first pre-pulse laser beam is 1.5 J/cmto 16 J/cminclusive at a position where a target is irradiated with the first pre-pulse laser beam; and a control unit configured to control the laser system so that a first delay time from a timing of irradiation of the target with the first pre-pulse laser beam to a timing of irradiation with the second pre-pulse laser beam and a second delay time from the timing of irradiation of the target with the second pre-pulse laser beam to a timing of irradiation with the main pulse laser beam have a following relation: 1. An extreme ultraviolet light generation system comprising:a chamber;a target generation unit configured to output a target toward a predetermined region in the chamber;{'sup': 2', '2, 'a laser system configured to output a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam to irradiate the target with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order so that fluence of the first pre-pulse laser beam is 1.5 J/cmto 16 J/cminclusive at a position where the target is irradiated with the first pre-pulse laser beam; and'} {'br': None, 'the first delay time Подробнее

Номер записи: 12
01-02-2018 дата публикации

MASTER MANUFACTURING METHOD, OPTICAL BODY, OPTICAL MEMBER, AND DISPLAY DEVICE

Номер: US20180029251A1
Автор: Kajiya Shunichi
Принадлежит: DEXERIALS CORPORATION

There is provided a master, an optical body, and a master manufacturing method, including: forming, on a surface of a master body that includes a base material, a periodic micro concave-convex structure in which an average cycle of concavities and convexities is less than or equal to visible light wavelengths; forming an inorganic resist layer on the surface of the master body; microparticulating and spraying an organic resist dissolved in a diluent onto the inorganic resist layer, to thereby form an organic resist layer, on a surface of which is provided a macro concave-convex structure in which the average cycle of concavities and convexities is greater than the visible light wavelengths; and etching the organic resist layer, the inorganic resist layer, and the master body, to thereby superimpose and uniformly form the micro concave-convex structure and the macro concave-convex structure on the surface of the base material. 1. A master manufacturing method , comprising:a step of forming, on a surface of a master body that includes a base material, a periodic micro concave-convex structure in which an average cycle of concavities and convexities is less than or equal to visible light wavelengths;a step of forming an inorganic resist layer on the surface of the master body;a step of microparticulating and spraying an organic resist dissolved in a diluent onto the inorganic resist layer, to thereby form an organic resist layer, on a surface of which is provided a macro concave-convex structure in which the average cycle of concavities and convexities is greater than the visible light wavelengths; anda step of etching the organic resist layer, the inorganic resist layer, and the master body, to thereby superimpose and form the micro concave-convex structure and the macro concave-convex structure on the surface of the base material.2. The master manufacturing method according to claim 1 , whereinthe diluent includes a solvent that volatilizes during spraying.3. The ...

Подробнее
Номер записи: 13
28-01-2021 дата публикации

EUV CHAMBER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND ELECTRONIC DEVICE MANUFACTURING METHOD

Номер: US20210029811A1
Автор: Hoshino Yusuke, KOUGE Kouichiro, NISHISAKA Toshihiro, Okada Takashi
Принадлежит: Gigaphoton Inc.

An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber. 1. An EUV chamber apparatus comprising:a chamber;a target generation unit configured to output a target toward a predetermined region inside the chamber;a gas nozzle through which gas is supplied into the chamber; anda shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of a trajectory of the target inside the chamber.2. The EUV chamber apparatus according to claim 1 , wherein the gas contains hydrogen gas.3. The EUV chamber apparatus according to claim 1 , further comprising a heat shield disposed between the predetermined region and the chamber inside the chamber claim 1 , wherein the shroud is fixed to the heat shield.4. The EUV chamber apparatus according to claim 3 , wherein the heat shield includes a through-hole through which the shroud penetrates claim 3 , part of the shroud is positioned outside the heat shield and fixed to an outer surface of the heat shield claim 3 , and another part of the shroud is positioned inside the heat shield.5. The EUV chamber apparatus according to claim 1 , further comprising:a temperature sensor configured to measure a temperature of the shroud;a first temperature adjustment device configured to adjust a temperature of the first cooling medium; anda control unit configured to control the first temperature adjustment device based on an output from the temperature sensor.6. The EUV chamber apparatus according to claim 1 , wherein the shroud is maintained at a temperature lower than 40° C.7. The EUV chamber apparatus according to claim 1 , wherein the shroud is maintained at a temperature lower ...

Подробнее
Номер записи: 14
04-02-2016 дата публикации

OPTICAL ILLUMINATION SYSTEM

Номер: US20160033874A1
Автор: Emiliani Valentina, PENNEFATHER Peter, TANG Cha-Min
Принадлежит: UNITED STATES GOVERNMENT AS REPRESENTED BY THE DEPARTMENT OF VETERANS AFFAIRS

Systems and methods are provided that combine an amplitude modulation SLM with a phase modulating SLM in the same optical illumination system. The combination of the amplitude modulation SLM and the phase modulation SLM allows the optical illumination to compensate for the limitations of amplitude modulation SLM by using phase modulating SLM and conversely to compensate for the limitations of phase modulation SLM by using amplitude modulating SLM. 1. An optical illumination system having an optical axis comprising:an image plane perpendicular to an optical axis;an amplitude modulating spatial light modulator positioned in a conjugate plane of the image plane and configured to direct an optical signal to the image plane;an aperture plane perpendicular to the optical axis;a phase modulating spatial light modulator positioned in a conjugate plane of the aperture plane and configured to direct an optical signal to the amplitude modulating spatial light modulator;a coherence light source optically coupled with the phase modulating spatial light modulator, wherein said coherence light source is configured to illuminate at least a portion of the image plane by directing an optical signal to the phase modulating spatial light modulator, which directs said optical signal to the amplitude modulating spatial light modulator, which directs said optical signal to the image plane.2. The system of claim 1 , wherein the coherence light source comprises a continuous wave laser.3. The system of claim 1 , wherein the coherence light source comprises a pulsed laser.4. The system of claim 1 , wherein the coherence light source comprises an amplified laser.5. The system of claim 1 , further comprising a beam expander positioned in an optical path between the coherence light source and the phase modulating spatial light modulator claim 1 , said beam expander configured to direct the optical signal to fill at least a portion of a surface of the phase modulating spatial light modulator.6. ...

Подробнее
Номер записи: 15
01-02-2018 дата публикации

Radiation Source

Номер: US20180031979A1
Автор: BLEEKER Arno Jan, Buurman Erik Petrus, Eurlings Markus Franciscus Antonius, HOFSTRA Ramon Mark, Moors Johannes Hubertus Josephina, MUYS Peter Frans Maria, OEMRAWSINGH Sumant Sukdew Ramanujan, Struycken Alexander Matthijs, VOORMA Harm-Jan
Принадлежит: ASML Netherlands B.V.

A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module. 1. A laser radiation source for a lithographic tool , the laser radiation source comprising:a laser module configured to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength;a beam separation device configured to separate optical paths of the first and second laser beams and substantially recombine the optical paths of the first and second laser beams;a beam delivery system configured to direct the first and second laser beams to be incident on a fuel target; and adjust a polarization state of the first laser beam such that a reflection of the first laser beam from the fuel target has a first polarization state;', 'adjust a polarization state of the second laser beam such that a reflection of the second laser beam from the fuel target has a second polarization state; and', 'block radiation having the first and second polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module., 'an optical isolation apparatus configured to2. The laser radiation source of claim 1 , wherein the optical isolation apparatus comprises a first polarization ...

Подробнее
Номер записи: 16
01-02-2018 дата публикации

RADIATION SYSTEM

Номер: US20180031982A1
Автор: BASELMANS Johannes Jacobus Matheus, BOGAART Erik Willem, Botma Hako, De Vries Gosse Charles, DONKER Rilpho Ludovicus, Frijns Olav Waldemar Vladimir, Kruizinga Borgert, Loopstra Erik Roelof, NIENHUYS Han-Kwang
Принадлежит: ASML Netherlands B.V.

A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern. 191.-. (canceled)92. A radiation alteration device comprising a continuously undulating reflective surface , wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern in two perpendicular directions.93. (canceled)94. The radiation alteration device of claim 92 , wherein a unit cell of the periodic undulating reflective surface comprises:a first portion having a substantially convex shape;a second portion having a substantially concave shape;a third portion having a substantially saddle shape; anda fourth portion having a substantially saddle shape.95. The radiation alteration device of claim 94 , wherein the unit cell comprises a single period of the periodic pattern in a first direction and a single period of the periodic pattern in a second direction perpendicular to the first direction.96. The radiation alteration device of claim 94 , wherein the reflective surface is shaped such within at least one of the first claim 94 , second claim 94 , third and fourth portions claim 94 , the curvature of the reflective surface is substantially the same throughout the respective portion.97. The radiation alteration device of claim 94 , wherein the reflective surface is shaped such that within at least one of the first claim 94 , second claim 94 , third and fourth portions claim 94 , the curvature of the reflective surface is different at different positions in the respective portion.98. The radiation alteration device of claim 92 , wherein the reflective surface is configured to receive a radiation beam and reflect the radiation beam so as to form a modified radiation beam and wherein the reflective surface is shaped such that the modified radiation beam has an intensity distribution in a far field plane claim 92 , the intensity ...

Подробнее
Номер записи: 17
17-02-2022 дата публикации

LASER PROCESSING METHOD AND LASER PROCESSING SYSTEM

Номер: US20220050382A1
Автор: KAKIZAKI Koji, KOBAYASHI Masakazu, SUWA Akira, Wakabayashi Osamu
Принадлежит: Gigaphoton Inc.

A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light by using a laser processing system includes: performing relative positioning of a transfer position of a transfer image and the transparent material in an optical axis direction of a pulse laser beam so that the transfer position is set at a position inside the transparent material at a predetermined depth ΔZsf from a surface of the transparent material in the optical axis direction; and irradiating the transparent material with the pulse laser beam having a pulse width of 1 ns to 100 ns inclusive and a beam diameter of 10 μm to 150 μm inclusive at the transfer position. 1. A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light by using a laser processing system including a laser apparatus configured to output a pulse laser beam that is the ultraviolet light , a transfer mask provided with a transfer pattern through which the pulse laser beam passes , and a transfer optical system configured to transfer a transfer image formed when the pulse laser beam passes through the transfer pattern and having a shape in accordance with the transfer pattern , the laser processing method comprising:A. a positioning step of performing relative positioning of a transfer position of the transfer image transferred by the transfer optical system and the transparent material in an optical axis direction of the pulse laser beam so that the transfer position is set at a position inside the transparent material at a predetermined depth ΔZsf from a surface of the transparent material in the optical axis direction; andB. an irradiation step of irradiating the transparent material with the pulse laser beam having a pulse width of 1 ns to 100 ns inclusive and a beam diameter of 10 μm to 150 μm inclusive at the transfer position, wherein:the transparent material is synthetic quartz glass, and the pulse ...

Подробнее
Номер записи: 18
31-01-2019 дата публикации

WAVELENGTH MEASURING DEVICE

Номер: US20190033133A1
Автор: MORIYA Masato
Принадлежит: Gigaphoton Inc.

A wavelength measuring device configured to detect a wavelength of ultraviolet laser light outputted from a laser resonator with at least one etalon, the wavelength measuring device includes: a first housing having an interior space being sealed and accommodating the etalon, an input window through which the ultraviolet laser light enters to the first housing, the input window being provided at a first opening of the first housing, a first sealing member configured to seal a gap between a rim part of the input window and a circumferential portion of the first opening, a shielding film provided between the rim part of the input window and the first sealing member and configured to shield the first sealing member from the ultraviolet laser light coming from the input window, and a diffusing element provided outside of the first housing and configured to diffuse the ultraviolet laser light before being incident on the input window. 1. A wavelength measuring device configured to detect a wavelength of ultraviolet laser light outputted from a laser resonator with at least one etalon , the wavelength measuring device comprising:a first housing having an interior space being sealed and accommodating the etalon;an input window through which the ultraviolet laser light enters to the first housing, the input window being provided at a first opening of the first housing;a first sealing member configured to seal a gap between a rim part of the input window and a circumferential portion of the first opening;a shielding film provided between the rim part of the input window and the first sealing member and configured to shield the first sealing member from the ultraviolet laser light coming from the input window; anda diffusing element provided outside of the first housing and configured to diffuse the ultraviolet laser light before being incident on the input window.2. The wavelength measuring device according to claim 1 , whereinthe shielding film includes aluminum, anda ...

Подробнее
Номер записи: 19
01-02-2018 дата публикации

Radiation Source

Номер: US20180034235A1
Автор: Olga Alexandrovna SYTINA
Принадлежит: ASML Netherlands BV

A laser system comprises a seed module ( 33 ) operable to emit a pulse of a first laser beam followed by a pulse of a second laser beam and a plurality of amplification chambers each comprising a gain medium having a gain, wherein the plurality of amplification chambers are arranged to receive the pulse of the first laser beam ( 45 ) and amplify the first laser beam in a second order (PA 3 , PA 2 , PA 1 , PA 0 ) and wherein the plurality of amplification chambers are further arranged to receive the pulse of the second laser beam ( 41 ) and amplify the second laser beam in a first order (PA 0 , PA 1 , PA 2 , PA 3 ) which is the reverse of the second order. Saturation powers and small signal gain coefficients of the gain media are selected such that the pulse of the first laser beam experiences a total amplification which is less than the total amplification experienced by the pulse of the second laser beam.

Подробнее
Номер записи: 20
31-01-2019 дата публикации

EXPOSURE APPARATUS AND EXPOSURE METHOD

Номер: US20190033721A1
Автор: NOGAMI Asahiko
Принадлежит: DEXERIALS CORPORATION

An exposure apparatus is an exposure apparatus for forming a pattern by exposure by irradiating a set master with laser light, comprising: an optical pickup which is capable of adjusting the focus of laser light and a control unit which adjusts the focus of laser light emitted from the optical pickup using integrated surface profile data indicating the relative positional relationship between the surface of the master and the optical pickup according to at least one of the surface roughness of the master the inclination of the master and the decentering of the master 1. An exposure apparatus for forming a pattern by exposure by irradiating a set master with laser light , comprising:a light source unit emitting the laser light and capable of adjusting a focus of the laser light; anda control unit adjusting a focus of laser light emitted from the light source unit using integrated surface profile data indicating a relative positional relationship between a surface of the master and the light source unit depending on at least one of surface roughness of the master, inclination of the master, and decentering of the master.2. The exposure apparatus according to claim 1 , whereinthe control unit comprises:an error detection unit performing output corresponding to a focus error of the laser light;an adder adding a target value corresponding to an output from the error detection unit with the laser light focusing on the surface of the master and an offset value based on a correction signal generated based on the integrated surface profile data; anda control computing unit adjusting a focus of the laser light based on a difference between a sum obtained by the adder and the output from the error detection unit.3. The exposure apparatus according to claim 2 , whereinthe correction signal is one of a table and a function corresponding to the position of the surface of the master.4. The exposure apparatus according to claim 1 , whereinthe control unit comprises:an error ...

Подробнее
Номер записи: 21
04-02-2021 дата публикации

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

Номер: US20210033971A1
Автор: Hatakeyama Jun
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

A positive resist composition comprising a base polymer comprising recurring units (a) of an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and improved dimensional uniformity. 1. A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodine or bromine-substituted hydrocarbyl group which does not contain an iodine or bromine-substituted aromatic ring and recurring units of at least one type selected from recurring units (b1) having a carboxyl group substituted with an acid labile group and recurring units (b2) having a phenolic hydroxyl group substituted with an acid labile group.4. The resist composition of wherein the base polymer further comprises recurring units (c) having an adhesive group selected from the group consisting of hydroxyl claim 1 , carboxyl claim 1 , lactone ring claim 1 , carbonate claim 1 , thiocarbonate claim 1 , carbonyl claim 1 , cyclic acetal claim 1 , ether bond claim 1 , ester bond claim 1 , sulfonic acid ester bond claim 1 , cyano claim 1 , amide bond claim 1 , —O—C(═O)—S— claim 1 , and —O—C(═O)—NH—.6. The resist composition of claim 1 , further comprising an acid generator.7. The resist composition of claim 1 , further comprising an organic solvent.8. The resist composition of claim 1 , further comprising a quencher.9. The resist composition of claim 1 , further comprising a surfactant.10. A process for forming a pattern comprising the steps of applying the positive resist composition of onto a substrate to form a resist film thereon claim 1 , exposing the resist film to high-energy radiation claim 1 , and developing the exposed ...

Подробнее
Номер записи: 22
31-01-2019 дата публикации

LASER APPARATUS

Номер: US20190036290A1
Автор: ASAYAMA Takeshi
Принадлежит: Gigaphoton Inc.

A laser apparatus includes a controller that selects one of a first gas control and a second gas control based on gas pressure measured by a pressure sensor. The first gas control causes at least one of first laser gas and second laser gas is supplied to a chamber such that the gas pressure in the chamber after the first gas control is higher than the gas pressure in the chamber before the first gas control. The second gas control causes at least the first laser gas is supplied to the chamber and causes a part of the laser gas in the chamber is exhausted such that a difference between the gas pressure in the chamber before the second gas control and the gas pressure in the chamber after the second gas control is smaller than a difference between the gas pressure in the chamber before the first gas control and the gas pressure in the chamber after the first gas control. 1. A laser apparatus comprising:a chamber in which a pair of discharge electrodes is provided;a gas supply device configured to supply first laser gas including halogen gas and second laser gas having a halogen gas concentration lower than the first laser gas to the chamber;an exhausting device configured to exhaust laser gas in the chamber;a pressure sensor configured to measure gas pressure in the chamber; and the first gas control causing at least one of the first laser gas and the second laser gas to be supplied to the chamber such that the gas pressure in the chamber after the first gas control is higher than the gas pressure in the chamber before the first gas control, and', 'the second gas control causing at least the first laser gas to be supplied to the chamber and causing a part of the laser gas in the chamber to be exhausted such that a difference between the gas pressure in the chamber before the second gas control and the gas pressure in the chamber after the second gas control is smaller than a difference between the gas pressure in the chamber before the first gas control and the gas ...

Подробнее
Номер записи: 23
24-02-2022 дата публикации

APPARATUS FOR THE EXPOSURE OF PLATE-SHAPED WORKPIECES WITH HIGH THROUGHPUT

Номер: US20220057721A1
Автор: KLOWSKY Uwe, RUECKER Steffen
Принадлежит:

A movable table system comprising two identical tables on a common rail arrangement having a linear rail region underneath a detection unit and a processing unit, and therefore the tables can be alternatingly moved in a straight line along the common rail arrangement, in the same table-movement direction, fully underneath the detection unit and processing unit, and can be independently controlled by a computer unit. The movable table system provides a new option for processing planar workpieces, in which a particularly high throughput rate and improved precision can be achieved using merely one processing unit. 1. An apparatus for processing plate-shaped workpieces , comprising:a movable table system for receiving a plate-shaped workpiece,a registration unit above the movable table system for acquiring targets,a processing unit with a controllable processing path for processing the workpiece, anda computer unit for controlling the alignment between processing unit and workpiece and for spatial differentiation of a predetermined processing depending on a position of the workpiece determined on the basis of the registered targetswherein the movable table system has two identical tables on a common rail arrangement with a linear rail area below registration unit and processing unit so that the tables are movable alternately in a straight line along the common rail arrangement in a conspiring table movement direction completely under the registration unit and the processing unit and that the tables are controllable independently from one another by the computer unit.2. The apparatus according to claim 1 , wherein the computer unit is configured for independent control of the two tables with respect to direction claim 1 , speed of table movement and alternate inward and outward movement of the tables for a purpose of loading and unloading plate-shaped workpieces in order to feed plate-shaped workpieces from two opposite sides of the common rail arrangement for ...

Подробнее
Номер записи: 24
06-02-2020 дата публикации

Light generation system using metal-nonmetal compound as precursor and related light generation method

Номер: US20200045801A1
Автор: Chi-Ming Yang, Ching-Hsiang Hsu, Feng Yuan Hsu, Hsu-Kai Chang
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

A light generation system is provided. The light generation system includes a vaporization device, a laser device and a lens structure. The vaporization device is configured to vaporize a metal-nonmetal compound to generate a metal-nonmetal precursor gas. The laser device is configured to provide laser light, and irradiate the metal-nonmetal precursor gas released from the vaporization device with the laser light to emit a light signal. The lens structure is configured to direct the light signal toward a photomask used in a lithography process.

Подробнее
Номер записи: 25
25-02-2021 дата публикации

LIGHT SOURCE, EUV LITHOGRAPHY SYSTEM, AND METHOD FOR GENERATING EUV RADIATION

Номер: US20210055664A1
Автор: CHEN Li-Jui, Chen Ssu-Yu, CHENG Po-Chung, CHIEN Shang-Chieh, FU Tzung-Chi, HSIEH Chieh, LIU Bo-Tsun, YANG Chi
Принадлежит: Taiwan Semiconductor Manufacturing Company, Ltd.

A light source for EUV is provided. The light source includes a target droplet generator, a laser generator, and a controller. The target droplet generator is configured to provide target droplets to a source vessel. The laser generator is configured to provide first laser pulses according to a control signal to irradiate the target droplets in the source vessel. The controller is configured to provide the control signal according to at least two of process parameters including temperature of the source vessel, droplet positions of the target droplets, and beam sizes and focal points of the first laser pulses. When the average value or the standard deviation of the temperature of the source vessel and the droplet positions of the target droplets exceed the predetermined range, the controller is configured to provide the control signal to the laser generator to stop providing the first laser pulses. 1. A light source for extreme ultraviolet (EUV) radiation , comprising:a target droplet generator configured to provide a plurality of target droplets to a source vessel;a laser generator configured to provide a plurality of first laser pulses according to a control signal to irradiate the target droplets in the source vessel, so as to generate plasma as the EUV radiation; anda controller configured to provide the control signal according to at least two of process parameters including a temperature of the source vessel, droplet positions of the target droplets, beam sizes of the first laser pulses, and focal points of the first laser pulses;wherein when an average value or a standard deviation of the temperature of the source vessel exceeds a first predetermined range and an average value or a standard deviation of the droplet positions of the target droplets exceeds a second predetermined range, the controller is configured to provide the control signal to the laser generator, so as to stop providing the first laser pulses.2. The light source as claimed in claim 1 , ...

Подробнее
Номер записи: 26
13-02-2020 дата публикации

CHARGED PARTICLE BEAM OPTICAL SYSTEM, EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD

Номер: US20200051774A1
Автор: YAHIRO Takehisa
Принадлежит: NIKON CORPORATION

A charged particle beam optical system is provided with a plurality of irradiation optical systems each of which irradiates an object W with a charged particle beam EB, the plurality of irradiation optical system includes a first irradiation optical system and a second irradiation optical system that generates a second magnetic field having a characteristics different from a characteristics of a first magnetic field generated by the first irradiation optical system. 1. A charged particle beam optical system comprising a plurality of irradiation optical systems each of which is configured to irradiate an object with a charged particle beam ,the plurality of irradiation optical system including a first irradiation optical system and a second irradiation optical system that generates a second magnetic field having a characteristics different from a characteristics of a first magnetic field generated by the first irradiation optical system.2. The charged particle beam optical system according to claim 1 , whereinthe characteristics of the first magnetic field includes a polarity of the first magnetic field,the characteristics of the second magnetic field includes a polarity of the second magnetic field,the polarity of the first magnetic field is different from the polarity of the second magnetic field.3. The charged particle beam optical system according to claim 2 , whereinthe polarity of the first magnetic field and the polarity of the second magnetic field have an inverted relationship.4. The charged particle beam optical system according to claim 1 , whereinthe first magnetic field is generated in a space between the first irradiation optical system and the object.5. The charged particle beam optical system according to claim 1 , whereinthe second magnetic field is generated in a space between the second irradiation optical system and the object.6. The charged particle beam optical system according to claim 4 , whereinthe first magnetic field in the space is ...

Подробнее
Номер записи: 27
13-02-2020 дата публикации

CHARGED PARTICLE BEAM OPTICAL APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, CONTROL APPARATUS, CONTROL METHOD, INFORMATION GENERATION APPARATUS, INFORMATION GENERATION METHOD AND DEVICE MANUFACTURING METHOD

Номер: US20200051780A1
Автор: Nagasaka Hiroyuki
Принадлежит: NIKON CORPORATION

A charged particle beam optical apparatus has a plurality of irradiation optical systems each of which irradiates an object with a charged particle beam and a first control apparatus configured to control a second irradiation optical system on the basis of an operation state of a first irradiation optical system. 1. A charged particle beam optical apparatus that is configured to irradiate an object with a charged particle beam ,the charged particle beam optical apparatus comprising:a plurality of irradiation optical systems each of which is configured to irradiate the object with the charged particle beam; anda first control apparatus that is configured to control, on the basis of an operation state of at least one first irradiation optical system of the plurality of irradiation optical systems, a second irradiation optical system of the plurality of irradiation optical systems that is different from the first irradiation optical system.2. The charged particle beam optical apparatus according to claim 1 , whereinthe operation state includes at least one of a first irradiation state of the charged particle beam irradiated by the first irradiation optical system and a temperature of the first irradiation optical system.3. The charged particle beam optical apparatus according to claim 1 , whereinthe first irradiation optical system has a deflector that is configured to deflect the charged particle beam,the operation state includes an amount of an electrical current that is supplied to the deflector.4. The charged particle beam optical apparatus according to claim 1 , whereinthe first control apparatus is configured to adjust a second irradiation state of the charged particle beam irradiated by the second irradiation optical system on the basis of the operation state of the first irradiation optical system.5. The charged particle beam optical apparatus according to claim 4 , whereinthe first and second irradiation states include at least one of an irradiation position ...

Подробнее
Номер записи: 28
20-02-2020 дата публикации

Optical Illumination System

Номер: US20200057380A1
Автор: Emiliani Valentina, PENNEFATHER Peter, TANG Cha-Min
Принадлежит:

Systems and methods are provided that combine an amplitude modulation SLM with a phase modulating SLM in the same optical illumination system. The combination of the amplitude modulation SLM and the phase modulation SLM allows the optical illumination to compensate for the limitations of amplitude modulation SLM by using phase modulating SLM and conversely to compensate for the limitations of phase modulation SLM by using amplitude modulating SLM. 1. An optical illumination system having an optical axis comprising: an image plane perpendicular to an optical axis;an amplitude modulating spatial light modulator positioned in a conjugate plane of the image plane and configured to direct an optical signal to the image plane;an aperture plane perpendicular to the optical axis;a phase modulating spatial light modulator positioned in a conjugate plane of the aperture plane and configured to direct an optical signal to the amplitude modulating spatial light modulator;a coherence light source optically coupled with the phase modulating spatial light modulator, wherein said coherence light source is configured to illuminate at least a portion of the image plane by directing an optical signal to the phase modulating spatial light modulator, which directs said optical signal to the amplitude modulating spatial light modulator, which directs said optical signal to the image plane.2. The system of claim 1 , wherein the coherence light source comprises a continuous wave laser.3. The system of claim 1 , wherein the coherence light source comprises a pulsed laser.4. The system of claim 1 , wherein the coherence light source comprises an amplified laser.5. The system of claim 1 , further comprising a beam expander positioned in an optical path between the coherence light source and the phase modulating spatial light modulator claim 1 , said beam expander configured to direct the optical signal to fill at least a portion of a surface of the phase modulating spatial light modulator.6. ...

Подробнее
Номер записи: 29
04-03-2021 дата публикации

Sensor System

Номер: US20210066877A1
Автор: SMOLAREK Szymon Dominik
Принадлежит: ASML Netherlands B.V.

A system, comprising an optical component that, in operational use of the optical component, optically interacts with a laser beam, an electrically conductive element disposed on or within the optical component that, in operational use of the optical component, is exposed to the laser beam, and a monitoring system operative to monitor a physical quantity representative of an electrical resistance of the electrically conductive element and to determine based on the physical quantity, a position of the laser beam relative to the optical component. 120-. (canceled)21. A system , comprising;an optical component located in a path of a laser beam; and an electrically conductive element disposed at the optical component, wherein during use of the system the laser beam is incident on the electrically conductive element; and', a position of the laser beam relative to the optical component; and', 'a temperature of the optical component., 'a monitoring system operative to monitor a physical quantity representative of an electrical resistance of the electrically conductive element and to determine, based on the physical quantity, at least one selected from the list comprising], 'a sensor system, comprising22. The system of claim 21 , further comprising a positional control system operative to determine an adjustment to be made to operation of a further component based on the physical quantity.23. The system of claim 22 , wherein the further component is a component of at least one of a laser system configured to generate the laser beam or a beam delivery system configured to deliver the laser beam to a predetermined site24. The system of claim 22 , wherein the positional control system is operative to control the further component to adjust the position of the laser beam relative to the optical component based on the physical quantity.25. The system of claim 24 , wherein the positional control system is operative to adjust a spatial attribute of the optical component or a ...

Подробнее
Номер записи: 30
04-03-2021 дата публикации

APPARATUS FOR TUNING DISCHARGE PERFORMANCE IN A LASER CHAMBER

Номер: US20210066880A1
Автор: Luo Edward Siqi, Ujazdowski Richard Carl, XU Shuang
Принадлежит:

Disclosed is a laser discharge chamber in which useful lifetime is extended by local electrical tuning using one or a combination of design of the chamber internal geometry, placement and distribution of components within the chamber such as electrodes, current returns, and capacitors, and selective electrical isolation of portions of the components 1. Apparatus comprising:a discharge chamber;a first electrode positioned in the discharge chamber;a second electrode positioned in the discharge chamber to create an electrode gap having a height extending between the first and second electrode in a first direction and a length extending in a second direction transverse to the first direction between the first electrode and the second electrode; anda plurality of conductive elements electrically connected to the second electrode, each of the plurality of conductive elements extending substantially in the first direction laterally of the electrode gap, the plurality of conductive elements being arranged in a row extending in the second direction, the plurality of conductive elements comprising a first pair of adjacent conductive elements spaced apart in the second direction at a first spacing and a second pair of adjacent conductive elements being spaced apart in the second direction at a second spacing, the second spacing being larger than the first spacing.2. Apparatus as in wherein the conductive elements of the plurality of conductive elements are positioned substantially symmetrically about a midline of the length of the electrode gap.3. An apparatus as in wherein the plurality of conductive elements comprises a first plurality of conductive elements claim 1 , and further comprising a second plurality of conductive elements electrically connected to the second electrode claim 1 , each of the second plurality of conductive elements extending substantially in the first direction laterally of the electrode gap on a side of the electrode gap opposite to the first ...

Подробнее
Номер записи: 31
09-03-2017 дата публикации

LASER DIRECT IMAGING SYSTEM AND METHOD FOR SOLDER MASK EXPOSURE

Номер: US20170068167A1
Автор: Chuang Chun-Chih, Hu Yung-Peng
Принадлежит:

A laser direct imaging system includes a stage, a laser device and an oxygen-reducing device. The stage is subjected to an atmospheric pressure. The laser device is configured to provide a laser beam to scan across the substrate. The oxygen-reducing device operates simultaneously with the laser device for outputting an inert gas only to a specific area where the laser beam is being aimed such that any portion of the substrate, if enters the specific area, will be exposed to the laser beam under a low-oxygen environment. 1. A laser direct imaging system , comprising:a stage being subjected to an atmospheric pressure;a laser device configured to provide at least one laser beam to scan across a surface of the substrate located on the stage; andan oxygen-reducing device, which operates simultaneously with the laser device for outputting an inert gas only to a specific area where the laser beam is being aimed such that any portion of the substrate, if enters the specific area, can be exposed to the laser beam under a low-oxygen environment.2. A laser direct imaging system as recited in claim 1 , wherein the oxygen-reducing device includes:a gas supply system for supplying the insert gas; anda chamber having an inlet connected to the gas supply system for entrance of the insert gas into the chamber, and an outlet facing the substrate to allow the insert gas to flow across the surface of the substrate to create the low-oxygen environment above the substrate.3. A laser direct imaging system as recited in claim 2 , wherein the laser beam of the laser device is passed through the outlet of the chamber to the surface of the substrate.4. A laser direct imaging system as recited in claim 3 , wherein the chamber is cylindrical in shape claim 3 , and the chamber and the laser beam share a common axis.5. A laser direct imaging system as recited in claim 1 , wherein the laser device is a linear laser module which produces a linear laser beam.6. A laser direct imaging system as ...

Подробнее
Номер записи: 32
11-03-2021 дата публикации

Extreme ultraviolet light generating apparatus, extreme ultraviolet light generating method, and electronic device manufacturing method

Номер: US20210072646A1
Автор: Kengo Hayashi
Принадлежит: GIGAPHOTON INC

An extreme ultraviolet light generating apparatus for generating extreme ultraviolet light in a chamber according to one aspect of the present disclosure includes a piezoelectric element provided in the chamber; a pressure sensor configured to detect pressure in the chamber; a gas introducing unit configured to introduce gas into the chamber; an exhaust unit configured to exhaust the gas from the chamber; and a control unit configured to control application of a voltage to the piezoelectric element. The control unit is configured to determine whether or not to apply a voltage to the piezoelectric element based on information on the pressure in the chamber obtained by the pressure sensor.

Подробнее
Номер записи: 33
27-02-2020 дата публикации

LASER APPARATUS AND METHOD FOR MANUFACTURING OPTICAL ELEMENT

Номер: US20200067257A1
Автор: TEI Daisuke, Wakabayashi Osamu
Принадлежит: Gigaphoton Inc.

A laser apparatus including an optical element made of a CaFcrystal and configured to transmit an ultraviolet laser beam obliquely incident on one surface of the optical element, the electric field axis of the P-polarized component of the laser beam propagating through the optical element coinciding with one axis contained in <111> of the CaFcrystal, with the P-polarized component defined with respect to the one surface. A method for manufacturing an optical element, the method including causing a seed CaFcrystal to undergo crystal growth along one axis contained in <111> to form an ingot, setting a cutting axis to be an axis inclining by an angle within 14.18±5° with respect to the crystal growth direction toward the direction of another axis contained in <111>, which differs from the crystal growth direction, and cutting the ingot along a plane perpendicular to the cutting axis. 1. A laser apparatus comprising:{'sub': '2', 'an optical element that is made of a CaFcrystal and configured to transmit an ultraviolet laser beam obliquely incident on one surface of the optical element,'}{'sub': '2', 'an electric field axis of a P-polarized component of the laser beam propagating through an interior of the optical element coinciding with one axis contained in <111> of the CaFcrystal, with the P-polarized component defined with respect to the one surface of the optical element.'}2. The laser apparatus according to claim 1 ,wherein the optical element is a plane-parallel substrate.3. The laser apparatus according to claim 2 ,wherein the optical element forms a window of a chamber disposed in an optical path of the laser beam.4. The laser apparatus according to claim 2 ,wherein an angle of incidence of the laser beam incident on the optical element is in a range of 56.34±5°.5. The laser apparatus according to claim 4 ,wherein the optical element is so configured that an angle between a normal to the surface on which the laser beam is incident and the one axis contained in < ...

Подробнее
Номер записи: 34
27-02-2020 дата публикации

LASER APPARATUS FOR GENERATING EXTREME ULTRAVIOLET LIGHT

Номер: US20200068695A1
Автор: NAGANO Hitoshi, WADA Yasunori, Wakabayashi Osamu, YANAGIDA Tatsuya
Принадлежит: Gigaphoton Inc.

A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal. 1. A system for an extreme ultraviolet (EUV) light source , the system comprising a pre-pulse laser apparatus and a main pulse laser apparatus ,the pre-pulse laser apparatus configured to output a pre-pulse laser beam so as to turn a target into a diffused target, and a light generator configured to output an optical pulse;', 'an optical element configured to transform a waveform of the optical pulse;', 'a controller configured to determine a characteristic of the transformed waveform, the transformed waveform including a first portion and a second portion, the second portion having a temporal energy profile based on a temporal profile of the optical pulse and the first portion having a temporal energy profile that is different from the temporal energy profile of the optical pulse; and', 'an amplifier including a gain medium, the amplifier configured to amplify the first portion and the second portion to form a main pulse laser beam including an amplified first portion and an amplified second portion, the amplified first portion and the amplified second portion containing sufficient energy to turn the diffused target into a plasma that emits EUV light., 'the main pulse laser apparatus including2. The system according to claim 1 , wherein the diffused target has one of a disc-shape and a torus-shape.3. The system according to claim 1 , wherein the target has a droplet shape. ...

Подробнее
Номер записи: 35
15-03-2018 дата публикации

SUB-RESOLUTION ASSIST FEATURES IN SEMICONDUCTOR PATTERN WRITING

Номер: US20180074393A1
Автор: Fujimura Akira, Pang Leo
Принадлежит: D2S, INC.

A method for optical proximity correction includes inputting a physical design having a plurality of shapes. Each shape has a plurality of corners, and the physical design is to be exposed on a surface of a substrate. A set of sub-resolution assist features (SRAFs) for the physical design is determined, where a plurality of SRAFs in the set of SRAFs interact. The plurality of SRAFs together provide better dimensional control of one corner of one shape in the plurality of shapes, when exposed on the substrate, compared to using a single SRAF to control a dimension of the one corner. The plurality of SRAFs includes a positive SRAF and a negative SRAF. A modified physical design is output, where the modified physical design comprises the physical design, as modified by the set of SRAFs. 1. A method for optical proximity correction (OPC) , the method comprising:inputting a physical design comprising a plurality of shapes, wherein each shape comprises a plurality of corners, and wherein the physical design is to be exposed on a surface of a substrate;determining a set of sub-resolution assist features (SRAFs) for the physical design, wherein a plurality of SRAFs in the set of SRAFs interact, wherein the plurality of SRAFs together provide better dimensional control of one corner of one shape in the plurality of shapes, when exposed on the substrate, compared to using a single SRAF to control a dimension of the one corner, wherein the plurality of SRAFs comprises a positive SRAF and a negative SRAF, and wherein the determining is performed using a computing hardware device; andoutputting a modified physical design, wherein the modified physical design comprises the physical design, as modified by the set of SRAFs.2. The method of wherein the plurality of SRAFs comprises rectangular SRAFs.3. The method of wherein the one shape in the plurality of shapes comprises a perimeter claim 1 , and wherein the negative SRAF is located entirely within the perimeter of the one shape.4 ...

Подробнее
Номер записи: 36
24-03-2022 дата публикации

LASER CHAMBER AND ELECTRONIC DEVICE MANUFACTURING METHOD

Номер: US20220091515A1
Автор: Fujimaki Yosuke, ITO Takashi, Kawagoe Yousuke, Tanaka Makoto
Принадлежит: Gigaphoton Inc.

A laser chamber of a discharge-excitation-type gas laser apparatus may include a container which contains laser gas therein; a pair of discharge electrodes arranged in the container; a cross flow fan configured to supply the laser gas to a discharge space between the discharge electrodes, the cross flow fan including a rotation shaft with which the cross flow fan rotates in a predetermined rotation direction and a plurality of blades, each longitudinal direction of which is parallel to an axial direction of the rotation shaft; and a stabilizer arranged outside a rotation trajectory of the cross flow fan, and arranged such that a difference between a maximum position and a minimum position of an end portion in the rotation direction on a side opposite to the rotation direction is larger than 0 and is smaller than an interval of two blades adjacent to each other among the plurality of blades. 1. A laser chamber of a discharge-excitation-type gas laser apparatus , comprising:a container which contains laser gas therein;a pair of discharge electrodes arranged in the container;a cross flow fan configured to supply the laser gas to a discharge space between the discharge electrodes, the cross flow fan including a rotation shaft with which the cross flow fan rotates in a predetermined rotation direction and a plurality of blades, each longitudinal direction of which is parallel to an axial direction of the rotation shaft; anda stabilizer arranged outside a rotation trajectory of the cross flow fan, and arranged such that a difference between a maximum position and a minimum position of an end portion in the rotation direction on a side opposite to the rotation direction is larger than 0 and is smaller than an interval of two blades adjacent to each other among the plurality of blades.2. The laser chamber according to claim 1 ,wherein the difference is larger than one quarter of the interval of the two blades and smaller than three quarters of the interval of the two blades ...

Подробнее
Номер записи: 37
24-03-2022 дата публикации

RETICLE TRANSFER DEVICE AND EXPOSURE SYSTEM

Номер: US20220091518A1
Автор: Liu Zicheng
Принадлежит:

Provide are a reticle transfer device and an exposure system. The reticle transfer device includes a bearing member, a light source, a light detector and a controller. The bearing member is configured to bear the reticle, and the light source is configured to emit irradiation light to the reticle and form reflected light. The light detector is configured to obtain the reflected light and generate a light detection signal. The controller is configured to determine whether particulate matter exists on a surface of the reticle based on the light detection signal. The reticle transfer device can determine whether particulate matter exists on the surface of the reticle in real time based on the light detection signal. 1. A reticle transfer device , configured to convey a reticle between different components , and comprising:a bearing member, configured to bear the reticle;a light source, the light source being arranged on, a side for bearing the reticle, of the bearing member, to emit an irradiation light to the reticle, wherein a reflected light is formed when the irradiation light is irradiated onto the reticle;a light detector, configured to obtain the reflected light and generate a light detection signal based on the reflected light; anda controller, electrically connected to the light detector and configured to determine whether particulate matter exists on a surface of the reticle based on the light detection signal.2. The reticle transfer device of claim 1 , wherein the bearing member has a first area for bearing the reticle claim 1 , and an orthographic projection of the light source on the bearing member is located outside of the first area.3. The reticle transfer device of claim 2 , wherein the orthographic projection of the light source on the bearing member adjoins an edge of the first area.4. The reticle transfer device of claim 1 , wherein the irradiation light is a parallel light beam.5. The reticle transfer device of claim 4 , further comprising:an ...

Подробнее
Номер записи: 38
16-03-2017 дата публикации

Imaging Device

Номер: US20170075226A1
Автор: Aknin Ofer, LANDA Benzion, NAGLER Michael, RUBIN BEN HAIM Nir
Принадлежит:

An imaging device is disclosed for projecting individually controllable laser beams onto an imaging surface that is movable relative thereto in X-direction. The device includes a plurality of semiconductor chips comprising a plurality of individually controllable laser emitting elements arranged in a two dimensional array of M rows and N columns. The chips are mounted on a support in at least one pair of rows, such that each pair of adjacent chips in Y-direction are offset from one another in the X-direction, and the laser beams are substantially uniformly spaced in the Y-direction. The chips are arranged such that corresponding elements in any group of three adjacent chips in the X and Y-directions lie at the apices of congruent equilateral triangles. A plurality of GRIN rod based lens systems focuses the beams for each of the chips onto the imaging surface. 1. An imaging device for projecting individually controllable laser beams onto an imaging surface that is movable relative thereto in a reference X-direction , the device comprising:a support;{'sub': r', 'c, 'a plurality of semiconductor chips coupled to the support, each of the chips comprising a plurality of individually controllable laser beam emitting elements arranged in a two dimensional main array of M rows and N columns, the emitting elements in each row having a uniform spacing Aand the emitting elements in each column having a uniform spacing a;'}{'sub': 'r', 'the chips being arranged in at least one pair of rows such that the main array of each pair of chips that are adjacent one another in a reference Y-direction, transverse to the X-direction, are offset from one another in the X-direction, and such that the center of each two Y-direction adjacent laser beam emitting elements in the main arrays of both chips in the pair be uniformly spaced from one another in the Y-direction by a nominal distance A/M, and wherein the centers of laser beams emitting elements of both chips do not overlap in the Y- ...

Подробнее
Номер записи: 39
16-03-2017 дата публикации

LITHOGRAPHY APPARATUS, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING PRODUCT

Номер: US20170075229A1
Автор: YAMADA Masanori
Принадлежит:

At least one lithography apparatus that suppresses a decrease in the accuracy of stage control is provided. A lithography apparatus includes a moving unit configured to move with an original or a substrate mounted thereon, a plurality of measurement units configured to obtain information about a position of the moving unit, measurement areas of the respective measurement units overlapping each other, and a control unit configured to switch the measurement units used to obtain the information about the position of the moving unit, based on a switching position lying in an overlapping measurement area, wherein, in a case where a plurality of processes is performed on one of a plurality of processing targets on the original or on the substrate, the control unit makes the switching position changeable and controls the measurement units so that the same one of the measurement units is used in performing the plurality of processes. 1. A lithography apparatus that forms a pattern on a substrate , the lithography apparatus comprising:a moving unit configured to move with an original or the substrate mounted thereon;a plurality of measurement units configured to obtain information about a position of the moving unit, measurement areas of the respective measurement units overlapping each other; anda control unit configured to switch the measurement units used to obtain the information about the position of the moving unit, based on a switching position lying in an overlapping measurement area,wherein, in a case where a plurality of processes is performed on one of a plurality of processing targets on the original or on the substrate, the control unit makes the switching position changeable and controls the measurement units so that the same one of the measurement units is used in performing the plurality of processes.2. A lithography apparatus that forms a pattern on a substrate , the lithography apparatus comprising:a moving unit configured to move with an original or the ...

Подробнее
Номер записи: 40
18-03-2021 дата публикации

Broadband radiation generation in hollow-core fibers

Номер: US20210080803A1
Автор: Yongfeng Ni
Принадлежит: ASML Netherlands BV

Radiation source assemblies and methods for generating broadened radiation by spectral broadening. A radiation source assembly includes a pump source configured to emit modulated pump radiation at one or more wavelengths. The assembly further has an optical fiber configured to receive the modulated pump radiation emitted by the pump source, the optical fiber including a hollow core extending along at least part of a length of the fiber. The hollow core is configured to guide the received radiation during propagation through the fiber. The radiation emitted by the pump source includes first radiation at a pump wavelength, and the pump source is configured to modulate the first radiation for stimulating spectral broadening in the optical fiber.

Подробнее
Номер записи: 41
18-03-2021 дата публикации

EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

Номер: US20210080842A1
Автор: SAUMAGNE Georg
Принадлежит: Gigaphoton Inc.

An extreme ultraviolet light generation device according to an aspect of the present disclosure includes: a chamber; a mirror configured to condense extreme ultraviolet light radiated from plasma generated by irradiating a target supplied into the chamber with a laser beam; an electromagnet disposed outside the chamber to form a magnetic field between a generation region of the plasma in the chamber and the mirror; a current inversion device configured to invert the direction of current flowing through the electromagnet; and a controller configured to control the current inversion device to invert the direction of the current when a set condition is satisfied. 1. An extreme ultraviolet light generation device comprising:a chamber;a mirror configured to condense extreme ultraviolet light radiated from plasma generated by irradiating a target supplied into the chamber with a laser beam;an electromagnet disposed outside the chamber to form a magnetic field between a generation region of the plasma in the chamber and the mirror;a current inversion device configured to invert a direction of current flowing through the electromagnet; anda controller configured to control the current inversion device to invert the direction of the current when a set condition is satisfied.2. The extreme ultraviolet light generation device according to claim 1 , wherein the controller acquires event information to be used for determination of the condition and determines whether to invert the direction of the current based on the event information.3. The extreme ultraviolet light generation device according to claim 1 , wherein the condition includes at least one of a condition that a timing of performing maintenance has been reached claim 1 , a condition that the number of times of maintenance performed has reached a defined number of times claim 1 , a condition that the number of shots of the extreme ultraviolet light has reached a defined number of shots claim 1 , a condition that an ...

Подробнее
Номер записи: 42
26-03-2015 дата публикации

METHOD AND APPARATUS FOR LOCALLY DEFORMING AN OPTICAL ELEMENT FOR PHOTOLITHOGRAPHY

Номер: US20150085269A1
Автор: Dmitriev Vladimir, Stern Uri
Принадлежит:

The invention relates to a method for locally deforming an optical element for photolithography in accordance with a predefined deformation form comprising: (a) generating at least one laser pulse having at least one laser beam parameter; and (b) directing the at least one laser pulse onto the optical element, wherein the at least one laser beam parameter of the laser pulse is selected to yield the predefined deformation form. 1. A method for locally deforming an optical element for photolithography in accordance with a predefined deformation form , the method comprising:a. generating at least one laser pulse having at least one laser beam parameter; andb. directing the at least one laser pulse onto the optical element, wherein the at least one laser beam parameter of the laser pulse is selected to yield the predefined deformation form.2. The method of claim 1 , wherein the at least one laser beam parameter comprises a polarization of the at least one laser pulse.3. The method of claim 1 , wherein the at least one laser pulse is linearly polarized and wherein the predefined deformation form is essentially parallel to the linear polarization of the at least one laser pulse.4. The method of claim 1 , wherein the at least one laser pulse is elliptically polarized and wherein a predefined elliptical deformation form is essentially aligned to the at least one elliptically polarized laser pulse.5. The method of claim 1 , wherein the at least one laser pulse is circularly polarized and wherein the predefined deformation form is an essentially circular deformation form of the optical element.6. The method of claim 2 , wherein a wave plate generates the polarization of the at least one laser pulse.7. The method of claim 1 , wherein the at least one laser beam parameter comprises an astigmatism of the at least one laser pulse.8. The method of claim 7 , wherein at least one cylindrical lens generates the astigmatism of the at least one laser pulse.9. The method of claim 1 , ...

Подробнее
Номер записи: 43
22-03-2018 дата публикации

Measurement Apparatus and Method

Номер: US20180081279A1
Автор: KOPPERT Willem Jakobus Cornelis
Принадлежит: ASML Netherlands B.V.

A measurement apparatus for measuring at least one property of an electron bunch or other group of charged particles travelling through a cavity (), comprises a plurality of electrodes (-) arranged around the cavity, a plurality of optical sensors (-), wherein the plurality of electrodes are configured to provide signals to the optical sensors thereby to modulate at least one optical property of the optical sensors. The apparatus further comprises at least one laser source () for providing a laser beam comprising a series of laser pulses to the plurality of optical sensors to obtain measurements representative of said at least one optical property of the optical sensors, and a processing resource () configured to process at least a first measurement signal from a first one of the optical sensors and a second measurement signal from a second one of the optical sensors, thereby to determine at least one property of the electron bunch or other group of charged particles, wherein the at least one property comprises charge and/or lateral position. 126-. (canceled)27. A measurement apparatus configured to measure a property of an electron bunch or other group of charged particles travelling through a cavity , comprising:electrodes arranged around the cavity;optical sensors, wherein the electrodes are configured to provide signals to the optical sensors thereby to modulate an optical property of the optical sensors;a laser source configured to provide a laser beam comprising a series of laser pulses to the optical sensors to obtain measurements representative of the optical property of the optical sensors; anda processing resource configured to process at least a first measurement signal from a first one of the optical sensors and a second measurement signal from a second one of the optical sensors, thereby to determine the property of the electron bunch or other group of charged particles, wherein the property comprises charge and/or lateral position.28. The apparatus of ...

Подробнее
Номер записи: 44
23-03-2017 дата публикации

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Номер: US20170082928A1
Автор: Deguenther Markus, Korb Thomas
Принадлежит:

An optical system of a microlithographic projection exposure apparatus designed for an operating wavelength of at least 150 nm. In one disclosed aspect, the optical system includes an element () producing an angular distribution for light incident during the operation of the optical system and a fly's eye condenser () which includes two arrangements () following one another in the light propagation direction and made of beam-deflecting optical elements (------), which produce a multiplicity of optical channels. No optical element with refractive power is arranged in the beam path between the element () producing an angular distribution and the fly's eye condenser (). 1. An optical system of a microlithographic projection exposure apparatus designed for operating with light having a wavelength of at least 150 nm and propagating in a light propagation direction , comprising:an element producing an angular distribution for light incident during operation of the optical system; anda fly's eye condenser which comprises two arrangements, one following the other in the light propagation direction and comprising beam-deflecting optical elements arranged to produce a multiplicity of optical channels;wherein no optical element with refractive power is arranged in the beam path between the element producing the angular distribution and the fly's eye condenser.2. The optical system as claimed in claim 1 , wherein the two arrangements comprising the beam-deflecting optical elements one following the other in the light propagation direction have differing period lengths.3. The optical system as claimed in claim 1 , wherein at least some of the beam-deflecting optical elements in both arrangements made of beam-deflecting optical elements are arranged such that respective chief rays passing centrally through the respective beam-deflecting optical elements producing the optical channels during operation of the optical system are incident perpendicularly onto the respective beam- ...

Подробнее
Номер записи: 45
31-03-2022 дата публикации

Writing data generating method, multi charged particle beam writing apparatus, pattern inspecting apparatus, and computer-readable recording medium

Номер: US20220100099A1
Автор: Kenichi Yasui, Noriaki Nakayamada
Принадлежит: Nuflare Technology Inc

According to the present invention, writing data capable of suppressing a data amount and a calculation amount in a multi charged particle beam writing apparatus is generated from design data including a figure having a curve. The present embodiment relates to a writing data generating method for generating writing data used in a multi charged particle beam writing apparatus. The method includes calculating a pair of curves each representing a curve portion of a figure included in design data, the curves each being defined by a plurality of control points, and generating the writing data by expressing a position of a second control point adjacent in a traveling direction of the curve to a first control point of the plurality of control points as a displacement from the first control point in the traveling direction of the curve and a displacement from the first control point in a direction orthogonal to the traveling direction.

Подробнее
Номер записи: 46
25-03-2021 дата публикации

Optical module structure

Номер: US20210088744A1
Автор: Ho-Ping Chen, Yung-Yao Lee
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

An optical module structure is provided. The optical module structure includes a holder, an elastic damper layer, and an optical component. The holder has an inner surface; the elastic damper layer is on the inner surface and has a trench at a first surface of the elastic damper layer; and the optical component is engaged with the elastic damper layer through the trench. Also, an optical system is provided. The optical system includes a light source, an, and a reflector, wherein a plurality of optical components in the optical module are arranged along a direction perpendicular to a direction of gravity.

Подробнее
Номер записи: 47
31-03-2022 дата публикации

EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEMS

Номер: US20220104336A1
Автор: Gil Myeongjun, KIM SUNGHYUP, Lee Injae, Lee Sanghoon, Nam Yebin
Принадлежит:

Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle. 1. An extreme ultraviolet light source system comprising:a chamber including a condensing mirror that is configured to reflect extreme ultraviolet light along an optical path;a blocking plate on the chamber and comprising an opening that is configured to pass the extreme ultraviolet light therethrough;a transparent cover on the blocking plate and covering the opening, the blocking plate extending between the transparent cover and the chamber;a nozzle between the chamber and the blocking plate and comprising an end portion adjacent the opening, the end portion of the nozzle being configured to spray a first gas in a direction intersecting the optical path; andan exhaust pipe between the chamber and the blocking plate and facing the end portion of the nozzle,wherein a width of the transparent cover is larger than a width of the opening.2. The extreme ultraviolet light source system of claim 1 , wherein an internal space of the chamber is configured to include a second gas that comprises a material the same as that of the first gas.3. The extreme ultraviolet light source system of claim 2 , wherein the first gas and the second gas are each hydrogen (H) gas.4. The extreme ultraviolet light source system of ...

Подробнее
Номер записи: 48
12-05-2022 дата публикации

Extreme ultraviolet light generation system and electronic device manufacturing method

Номер: US20220146943A1
Автор: Atsushi Ueda, Koichiro KOGE, Takayuki OSANAI
Принадлежит: GIGAPHOTON INC

An extreme ultraviolet light generation system may include a chamber, a first partition wall having at least one opening which provides communication between a first space and a second space, an EUV light concentrating mirror located in the second space and configured to concentrate extreme ultraviolet light generated in a plasma generation region located in the first space, a first gas supply port formed at the chamber, and a gas exhaust port formed in the first partition wall, a distance between the center of the plasma generation region and an edge of the at least one opening being equal to or more than a stop distance L STOP [mm] calculated by the following equation. L STOP =272.8· E VG 0.4522 ·P −1 E AVG [eV] representing average kinetic energy of ions generated in the plasma generation region and P [Pa] representing a gas pressure inside the first partition wall

Подробнее
Номер записи: 49
28-03-2019 дата публикации

LIGHT SOURCE, EUV LITHOGRAPHY SYSTEM, AND METHOD FOR GENERATING EUV RADIATION

Номер: US20190094717A1
Автор: CHEN Li-Jui, Chen Ssu-Yu, CHENG Po-Chung, CHIEN Shang-Chieh, FU Tzung-Chi, HSIEH Chieh, LIU Bo-Tsun, YANG Chi
Принадлежит: Taiwan Semiconductor Manufacturing Co., Ltd.

A light source for extreme ultraviolet (EUV) radiation is provided. The light source includes a target droplet generator, a laser generator, a measuring device, and a controller. The target droplet generator is configured to provide a plurality of target droplets to a source vessel. The laser generator is configured to provide a plurality of first laser pulses according to a control signal to irradiate the target droplets in the source vessel, so as to generate plasma as the EUV radiation. The measuring device is configured to measure process parameters including temperature of the source vessel, droplet positions of the target droplets, and beam sizes and focal points of the first laser pulses. The controller is configured to provide the control signal according to at least two of the process parameters. 1. A light source for extreme ultraviolet (EUV) radiation , comprising:a target droplet generator configured to provide a plurality of target droplets to a source vessel;a laser generator configured to provide a plurality of first laser pulses according to a control signal to irradiate the target droplets in the source vessel, so as to generate plasma as the EUV radiation;a measuring device configured to measure process parameters including temperature of the source vessel, droplet positions of the target droplets, and beam sizes and focal points of the first laser pulses; anda controller configured to provide the control signal according to at least two of the process parameters.2. The light source as claimed in claim 1 , wherein when a first process parameter of the at least two of the process parameters is outside a first predetermined range or is greater than a first threshold value and a second process parameter of the at least two of the process parameters is outside a second predetermined range or is greater than a second threshold value claim 1 , the controller is configured to provide the control signal to the laser generator claim 1 , so as to stop ...

Подробнее
Номер записи: 50
06-04-2017 дата публикации

Imaging Device

Номер: US20170097573A1
Автор: Aknin Ofer, Kashti Tamar, LANDA Benzion, NAGLER Michael, RUBIN BEN HAIM Nir, TZUR Itai, YOGEV Ronen
Принадлежит:

An imaging device for projecting individually controllable laser beams onto an imaging surface movable in an X-direction. The device includes a plurality of semiconductor chips each comprising a plurality of laser beam emitting elements arranged in a main array of M·N. The chips are mounted such that each pair of adjacent chips in the Y-direction are offset from one another in the X-direction and, if activated continuously, the emitted laser beams of the two chips of said pair trace on the imaging surface a set of parallel lines that are substantially uniformly spaced in the Y-direction. In addition to the M·N elements of the main array, each chip comprises at least one additional column on one or each side, each additional column containing at least one selectively operable element capable of compensating for any misalignment in the Y-direction in the relative positioning of the adjacent chips on the support. 1. An imaging device for projecting individually controllable laser beams onto an imaging surface , the imaging device and imaging surface being movable relative to each other in a reference X-direction , the imaging device comprising:{'sub': r', 'c, 'a plurality of semiconductor chips each of which comprises a plurality of individually controllable laser beam emitting elements arranged in a two dimensional main array of M rows and N columns, the elements in each row having a uniform spacing Aand the elements in each column having a uniform spacing a;'}{'sub': 'r', 'wherein the chips are mounted on a support such that the main arrays of each pair of chips that are adjacent one another in a reference Y-direction, transverse to the X-direction, are offset from one another in the X-direction, wherein when the chips are nominally placed, were all the laser emitting elements to be activated continuously and the imaging surface and the imaging device relatively moved in the X-direction, the emitted laser beams of the respective main arrays of the two chips of the ...

Подробнее
Номер записи: 51
01-04-2021 дата публикации

OPTICAL ASSEMBLY FOR REDUCING A SPECTRAL BANDWIDTH OF AN OUTPUT BEAM OF A LASER

Номер: US20210098958A1
Автор: Deubel Markus, Gloeckl Oliver, Kraus Johannes
Принадлежит:

An optical assembly reduces a spectral bandwidth of an output beam of a laser. The assembly includes a beam-expanding optical unit within a laser resonator. The latter serves to increase a beam cross section of a resonator-internal laser beam in at least one expansion cross-sectional dimension such that at least one resonator-internal expansion laser beam section arises. The assembly also includes an optical grating in a retroreflective arrangement for the resonator-internal laser beam. A beam-limiting stop acts in the expansion cross-sectional dimension and is arranged in the beam path of the expansion laser beam section. This yields an optical assembly in which unwanted thermal effects on account of optical components of the optical assembly heating during laser operation due to a local power density of the resonator-internal laser beam are reduced or avoided. 1. An optical assembly , comprising:a beam-expanding optical unit within a laser resonator, the beam-expanding optical unit configured to increase a beam cross section and reduce a divergence of a resonator-internal laser beam in an expansion cross-sectional dimension so that a resonator-internal expansion laser beam section arises;an optical grating in a retroreflective arrangement for the resonator-internal laser beam;a first beam-limiting stop in a beam path of the expansion laser beam section, the first beam-limiting stop configured to act in the expansion cross-sectional dimension; anda second beam-limiting stop in a beam path of the resonator-internal laser beam on a side of the beam-expanding optical unit facing away from the grating, a width of the second beam-limiting stop is such that the first beam-limiting stop is overexposed by the resonator-internal laser beam and such that a width of a used beam cross section on the grating is defined by the first beam-limiting stop; and', 'an adjustment range of the beam-expanding optical unit and a width of an input aperture of the second beam-limiting stop ...

Подробнее
Номер записи: 52
02-04-2020 дата публикации

ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

Номер: US20200102271A1
Автор: Honda Kazuya, Kera Yuki, OHASHI Masaki, SUKA Yuki
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

A novel onium salt having formula (1) and a resist composition comprising the same as a quencher are provided. When the resist composition is processed by photolithography using high-energy radiation, there is formed a resist pattern which is improved in LWR and CDU. In formula (1), R, Rand Reach are a C-Cmonovalent hydrocarbon group which may contain a heteroatom exclusive of fluorine, and Z is a sulfonium, iodonium or ammonium cation. 2. A resist composition comprising (A) the onium salt of claim 1 , (B) an organic solvent claim 1 , (C) a polymer comprising recurring units containing an acid labile group claim 1 , and (D) a photoacid generator.6. The resist composition of claim 2 , further comprising (E) a surfactant which is insoluble or substantially insoluble in water and soluble in alkaline developer claim 2 , and/or a surfactant which is insoluble or substantially insoluble in water and alkaline developer.7. The resist composition of claim 2 , further comprising (F) a nitrogen-containing compound.8. A pattern forming process comprising the steps of applying the resist composition of onto a substrate to form a resist film claim 2 , exposing the resist film to KrF excimer laser claim 2 , ArF excimer laser claim 2 , EB or EUV claim 2 , and developing the exposed resist film in a developer. This non-provisional application claims priority under 35 U.S.C. § 119(a) on Patent Application No. 2018-183103 filed in Japan on Sep. 28, 2018, the entire contents of which are hereby incorporated by reference.This invention relates to an onium salt, a resist composition comprising the same, and a pattern forming process using the resist composition.To meet the demand for higher integration density and operating speed of LSIs, the effort to reduce the pattern rule is in rapid progress. The wide-spreading flash memory market and the demand for increased storage capacities drive forward the miniaturization technology. As the advanced miniaturization technology, manufacturing of ...

Подробнее
Номер записи: 53
30-04-2015 дата публикации

ULTRAVIOLET LASER DEVICE, AND EXPOSURE DEVICE AND INSPECTION DEVICE PROVIDED WITH ULTRAVIOLET LASER DEVICE

Номер: US20150116680A1
Автор: Tokuhisa Akira
Принадлежит:

An ultraviolet laser device, includes: a first laser light output unit outputs a first infrared laser light; a second laser light output unit outputs a second infrared laser light; a first wavelength conversion optical system generates a first ultraviolet laser light of a fifth harmonic of the first infrared laser light; and a second wavelength conversion optical system to which the first ultraviolet laser light and the second infrared laser light enter, wherein the second wavelength conversion optical system includes a first wavelength conversion optical element which generates a second ultraviolet laser light by sum frequency generation of the first ultraviolet laser light and the second infrared laser light, and a second wavelength conversion optical element which generates a deep ultraviolet laser light by sum frequency generation of the second ultraviolet laser light and the second infrared laser light. 1. An ultraviolet laser device , comprising:a first laser light output unit that outputs a first infrared laser light with a wavelength within a wavelength band of 1520 to 1580 nm;a second laser light output unit that outputs a second infrared laser light with a wavelength within a wavelength band of 1020 to 1100 nm;a first wavelength conversion optical system that includes a plurality of wavelength conversion optical elements and generates a first ultraviolet laser light which is a fifth harmonic of the first infrared laser light by sequentially wavelength converting, by the plurality of wavelength conversion optical elements, the first infrared laser light output from the first laser light output unit; anda second wavelength conversion optical system to which the first ultraviolet laser light generated by the first wavelength conversion optical system and the second infrared laser light output from the second laser light output unit enter, whereinthe second wavelength conversion optical system comprises a first wavelength conversion optical element that ...

Подробнее
Номер записи: 54
29-04-2021 дата публикации

EXTREME ULTRAVIOLET LIGHT CONDENSATION MIRROR, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD

Номер: US20210124275A1
Автор: TOIDA Tomoyoshi
Принадлежит: Gigaphoton Inc.

An extreme ultraviolet light condensation mirror includes: a substrate; a multi-layer reflective film on the substrate and configured to reflect extreme ultraviolet light having a wavelength of 13.5 nm; and a protective film on the multi-layer reflective film. The protective film includes an oxide silicon layer on the multi-layer reflective film and a titanium oxide layer on the oxide silicon layer having one surface exposed. When x represents the thickness of the titanium oxide layer, the phase of standing wave of the extreme ultraviolet light at the position of the one surface for the maximum reflectance of the extreme ultraviolet light is defined to be zero, and a direction from the one surface toward the multi-layer reflective film is defined to be negative, the position of the one surface is a position at which the phase y of standing wave satisfies the expression below. 1. An extreme ultraviolet light condensation mirror comprising:a substrate;a multi-layer reflective film provided on the substrate and configured to reflect extreme ultraviolet light having a wavelength of 13.5 nm; anda protective film provided on the multi-layer reflective film,the protective film including an oxide silicon layer provided on the multi-layer reflective film and a titanium oxide layer that is provided on the oxide silicon layer and one surface of which is exposed, {'br': None, 'i': x', 'x', 'x', 'y, 'sup': 3', '2, '−0.313+1.44+2.57−51.0≤<0'}, 'when x represents a thickness of the titanium oxide layer, a phase of standing wave of the extreme ultraviolet light at the position of the one surface at time of a reflectance of the extreme ultraviolet light being maximum is defined to be zero, and a direction from the one surface toward the multi-layer reflective film is defined to be negative, a position of the one surface being a position at which the phase of standing wave, which is represented by y, satisfies an expression below.'}2. The extreme ultraviolet light condensation mirror ...

Подробнее
Номер записи: 55
07-05-2015 дата публикации

Assembly For Modifying Properties Of A Plurality Of Radiation Beams, A Lithography Apparatus, A Method Of Modifying Properties Of A Plurality Of Radiation Beams And A Device Manufacturing Method

Номер: US20150124231A1
Автор: De Jager Pieter Willem Herman, Mulder Heine Melle
Принадлежит: ASML Netherlands B.V.

An assembly to modify a property of a plurality of radiation beams, the assembly including a plurality of waveguides configured to guide the plurality of radiation beams closer together, and a frequency multiplying device configured to receive the plurality of radiation beams guided by the plurality of waveguides and generate a corresponding plurality of radiation beams having frequencies that are an integer multiple higher. Also described are a corresponding lithography apparatus, method of modifying a property of a plurality of radiation beams and device manufacturing method. 1. An assembly to modify a property of a plurality of radiation beams , the assembly comprising:a plurality of waveguides configured to guide the plurality of radiation beams closer together; anda frequency multiplying device configured to receive the plurality of radiation beams guided by the plurality of waveguides and generate a corresponding plurality of radiation beams having frequencies that are an integer multiple higher.2. The assembly according to claim 1 , wherein the frequency multiplying device is configured to use second harmonic generation to double the radiation frequency.3. The assembly according to claim 1 , wherein the frequency multiplying device is configured to use third harmonic generation to triple the radiation frequency.4. The assembly according to claim 1 , further comprising a filter configured to remove radiation output by the frequency multiplying device that has the same frequency as radiation input to the frequency multiplying device.5. The assembly according to claim 1 , wherein the frequency multiplying device is configured to allow each of one or more of the radiation beams to pass through a conversion material having a non-linear optical property a plurality of times in order to increase the proportion of the radiation beam that is converted to higher frequency radiation.6. The assembly according to claim 1 , wherein the frequency multiplying device ...

Подробнее
Номер записи: 56
07-05-2015 дата публикации

ILLUMINATION SYSTEM FOR AN EUV PROJECTION LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Номер: US20150124233A1
Автор: Patra Michael
Принадлежит:

An illumination system for an EUV projection lithographic projection exposure apparatus comprises an EUV light source, which generates an output beam of EUV illumination light with a predetermined polarization state. An illumination optical unit guides the output beam along an optical axis, as a result of which an illumination field in a reticle plane is illuminated by the output beam. The light source comprises an electron beam supply device, an EUV generating device and a polarization setting device. The EUV generating device is supplied with an electron beam by the electron beam supply device. The polarization setting device exerts an adjustable deflecting effect on the electron beam for setting the polarization of the output beam. This results in an illumination system, which operates on the basis of an electron beam-based EUV light source and provides an output beam, which is improved for a resolution-optimized illumination. 113-. (canceled)14. An illumination system , comprising: a first device configured to generate an electron beam;', 'a second device configured to interact with the electron beam to generate EUV radiation; and', 'a third device configured to exert an adjustable defecting effect on the electron beam to set a polarization of the EUV radiation beam; and, 'a free electron laser configured to generate an EUV radiation beam, the free electron laser comprisingan illumination optical unit configured to guide the EUV radiation beam along an optical axis to an illumination field.151. The illumination system of claim , wherein the second device comprises an undulator comprising deflection magnets , and the third device is configured to influence an effect of the deflection magnets on the electron beam.161. The illumination system of claim , wherein the second device comprises an undulator comprising deflection electromagnets , and the third device is configured to control an intensity of a current flow through the electromagnets.17. The illumination ...

Подробнее
Номер записи: 57
25-08-2022 дата публикации

METHOD OF COMPENSATING WAVELENGTH ERROR INDUCED BY REPETITION RATE DEVIATION

Номер: US20220269181A1
Автор: Ahlawat Rahul, Teng Kuo-Tai
Принадлежит:

A radiation system for controlling pulses of radiation comprising an optical element configured to interact with the pulses of radiation to control a characteristic of the pulses of radiation, an actuator configured to actuate the optical element according to a control signal received from a controller, the control signal at least partially depending on a reference pulse repetition rate of the radiation system and, a processor configured to receive pulse information from the controller and use the pulse information to determine an adjustment to the control signal. The radiation system may be used to improve an accuracy of a lithographic apparatus operating in a multi-focal imaging mode. 1. A radiation system for controlling pulses of radiation the radiation system comprising:an optical element configured to interact with the pulses of radiation to control a characteristic of the pulses of radiation; andan actuator configured to actuate the optical element according to a control signal received from a controller, the control signal at least partially depending on a reference pulse repetition rate of the radiation system, wherein the controller is configured to receive pulse information and use the pulse information to determine and apply an adjustment to the control signal.2. The radiation system of claim 1 , wherein the characteristic is a wavelength of the pulses of radiation.3. The radiation system of claim 1 , wherein the pulse information includes an operational pulse repetition rate of the radiation system and wherein the adjustment at least partially accounts for a difference between the reference pulse repetition rate and the operational pulse repetition rate.4. The radiation system of claim 1 , wherein the adjustment changes a magnitude of the control signal.8. The radiation system of claim 7 , wherein the correction factor is calculated and applied to the control signal for each pulse of radiation generated by the radiation system.9. The radiation system of ...

Подробнее
Номер записи: 58
25-08-2022 дата публикации

SYSTEM AND METHOD FOR OMNIDIRECTIONAL REAL TIME DETECTION OF PHOTOLITHOGRAPHY CHARACTERISTICS

Номер: US20220269182A1
Автор: CHEN Li-Jui, CHEN Tai-Yu, CHIEN Shang-Chieh, Liu Heng-Hsin, YU Sheng-Kang
Принадлежит:

An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a collector and a plurality of vibration sensors coupled to the collector. The vibration sensors generate sensor signals indicative of shockwaves from laser pulses and impacts from debris. The system utilizes the sensor signals to improve the quality of EUV light generation. 1. A method , comprising:performing a photolithography process by generating extreme ultraviolet light in an extreme ultraviolet light generation chamber;generating sensor signals with a plurality of vibration sensors coupled to the extreme ultraviolet light generation chamber;analyzing the sensor signals; andadjusting a parameter of extreme ultraviolet light generation based on the sensor signals.2. The method of claim 1 , wherein generating extreme ultraviolet light includes generating extreme ultraviolet light by generating a plasma from droplets within the extreme ultraviolet light generation chamber.3. The method of claim 2 , wherein the plurality of vibration sensors are coupled to a collector mirror of the extreme ultraviolet light generation chamber.4. The method of claim 3 , further comprising determining characteristics of the plasma based on the sensor signals.5. The method of claim 4 , wherein generating the plasma includes: irradiating the droplets with laser light claim 4 , wherein adjusting a parameter of radiation generation includes adjusting a parameter of the laser light based on the sensor signals.6. The method of claim 4 , wherein adjusting a parameter of radiation generation includes adjusting a parameter of the droplets.7. The method of claim 4 , further comprising:detecting a distribution of droplet debris on the collector mirror based on the sensor signals; anddetermining characteristics of the plasma based on the distribution of droplet debris.8. The method of claim 7 , wherein determining characteristics of the plasma includes generating a ...

Подробнее
Номер записи: 59
16-04-2020 дата публикации

RADIATION SOURCE SUPPLY SYSTEM FOR LITHOGRAPHIC TOOLS

Номер: US20200117094A1
Автор: Liao Chi-Hung, YANG Yueh Lin
Принадлежит:

Embodiments described herein provide a lithographic system having two or more lithographic tools connected to a radiation source using two or more variable attenuation units. In some embodiments, the variable attenuation unit reflects a portion of the received light beam to the lithographic tool attached thereto and transmits a remaining portion of the received light beam to the lithographic tools downstream. In some embodiments, the radiation source includes two or more laser sources to provide laser beams with an enhanced power level and which can prevent operation interruption due to laser source maintenances and repair. 1. A method , comprising:directing a laser light beam from a radiation source to a first attenuation unit connected to a first lithographic tool;by the first attenuation unit, directing a first portion of the laser light beam to the first lithographic tool; andby the first attenuation unit, directing a second portion of the laser light beam to a second attenuation unit connected to a second lithographic tool.2. The method of claim 1 , wherein directing the first portion of the laser light beam to the first lithographic tool comprises:reflecting the first portion of the laser light beam using a reflector in the first attenuation unit.3. The method of claim 2 , wherein reflecting the first portion of the laser light beam further comprises:adjusting an incident angle of the laser light beam relative to the reflector to reflect a predetermined percentage of the laser light beam.4. The method of claim 3 , wherein adjusting the incident angle comprises rotating the reflector using an actuator coupled to the reflector.5. The method of further comprising: by the second attenuation unit claim 1 , directing a third portion of the laser light beam to the second lithographic tool.6. The method of wherein the directing a third portion of the laser light beam to the second lithographic tool includes reflecting a third portion of the laser light beam using a ...

Подробнее
Номер записи: 60
02-05-2019 дата публикации

EMPIRICAL DETECTION OF LENS ABERRATION FOR DIFFRACTION-LIMITED OPTICAL SYSTEM

Номер: US20190128825A1
Автор: JEONG Hwan J., MANENS Antoine P., ZHONG Qin
Принадлежит:

A method for qualitatively detecting aberration and determine aberration types in a photolithography system is disclosed. The method includes using a digital micromirror device (DMD) pattern to project an optical signal on a reflective substrate, acquiring a return optical signal reflected from the substrate at different focus heights (ranging from above to below best focus), forming a through focus curve based off of the return optical signal at various focus heights, comparing the through focus curve to a predetermined curve—the predetermined curve being a function of focus, and determining if a lens aberration is present. By using the existing hardware of the photolithography system to determine if a lens aberration exists, costs are maintained at a minimum and the DMD pattern creates a through focus curve (TFC) image in less than five minutes allowing for quick correction. 1. A method of determining focus in a photolithography system , comprising:using a digital micromirror device (DMD) pattern to project an optical signal on a substrate;acquiring a return optical signal from the substrate;measuring one or more focus heights of the return optical signal;forming a through focus curve based off of the one or more focus heights of the return optical signal;comparing the through focus curve to a predetermined curve, wherein the predetermined curve is a function of focus; anddetermining if a lens aberration is present.2. The method of claim 1 , wherein the DMD pattern is a Dots5×5 pattern.3. The method of claim 1 , wherein the optical signal is a light beam.4. The method of claim 3 , wherein the light beam has a wavelength in a range from about 360 nm to about 410 nm.5. The method of claim 3 , wherein a combination of mirrors in on positions and off positions forms the DMD pattern.6. The method of claim 1 , wherein the return optical signal is a light beam created from the reflection and transformation of the first optical signal.7. The method of claim 1 , wherein ...

Подробнее
Номер записи: 61
01-09-2022 дата публикации

MULTI-COMPONENT KERNELS FOR VECTOR OPTICAL IMAGE SIMULATION

Номер: US20220276567A1
Автор: HO Kenneth Lik Kin, Lai Chien-Jen, Peng Danping, Yamazoe Kenji, ZHOU Xin
Принадлежит:

A method of enhancing a layout pattern includes determining a vector transmission cross coefficient (vector-TCC) operator of an optical system of a lithographic system based on an illumination source of the optical system and an exit pupil of the optical system of the lithographic system. The method also includes performing an optical proximity correction (OPC) operation of a layout pattern of a photo mask to generate an OPC corrected layout pattern. The OPC operation uses the vector-TCC operator to determine a projected pattern of the layout pattern of the photo mask on a wafer. The method includes producing the OPC corrected layout pattern on a mask blank to create a photo mask. 1. A method comprising:combining first elements of an illumination profile of an illumination source of an optical system of a lithographic system and second elements of an exit pupil function of the optical system to form a generalized pupil function;determining a vector transmission cross coefficient (vector-TCC) operator of the optical system of the lithographic system based on a product of the generalized pupil function and a conjugate of the generalized pupil function;performing an optical proximity correction (OPC) operation of a layout pattern of a photo mask to generate an OPC corrected layout pattern, wherein the OPC operation uses the vector-TCC operator to determine a projected pattern of the layout pattern of the photo mask on a wafer.2. (canceled)3. The method of claim 1 , wherein the vector-TCC operator implements a vector representation for radiation of the illumination source claim 1 , and wherein the vector-TCC operator implements a vector representation for transmission of the radiation of the illumination source in the optical system of the lithographic system.4. (canceled)5. The method of claim 1 , further comprising prior to the determining the vector-TCC operator:receiving the illumination profile of the illumination source and the exit pupil function of the optical ...

Подробнее
Номер записи: 62
01-09-2022 дата публикации

LIGHT SOURCE, EUV LITHOGRAPHY SYSTEM, AND METHOD FOR PERFORMING CIRCUIT LAYOUT PATTERNING PROCESS

Номер: US20220276574A1
Автор: CHEN Li-Jui, Chen Ssu-Yu, CHENG Po-Chung, CHIEN Shang-Chieh, FU Tzung-Chi, HSIEH Chieh, LIU Bo-Tsun, YANG Chi
Принадлежит: Taiwan Semiconductor Manufacturing Company, Ltd.

A light source for EUV radiation is provided. The light source includes a target droplet generator, a laser generator, and a controller. The target droplet generator is configured to provide target droplets to a source vessel. The laser generator is configured to provide a plurality of first laser pulses according to a control signal to irradiate the target droplets in the source vessel to generate plasma as the EUV radiation. The controller is configured to provide the control signal according to the temperature of the source vessel and droplet positions of the target droplets. When the temperature of the source vessel exceeds a temperature threshold value and a standard deviation of the droplet positions of the target droplets exceeds a first standard deviation threshold value, the controller is configured to provide the control signal to the laser generator, so as to stop providing the first laser pulses. 1. A light source for extreme ultraviolet (EUV) radiation , comprising:a target droplet generator configured to provide a plurality of target droplets to a source vessel;a laser generator configured to provide a plurality of first laser pulses according to a control signal to irradiate the target droplets in the source vessel, so as to generate plasma as the EUV radiation; anda controller configured to provide the control signal according to process parameters comprising a temperature of the source vessel and droplet positions of the target droplets;wherein when the temperature of the source vessel exceeds a temperature threshold value and a standard deviation of the droplet positions of the target droplets exceeds a first standard deviation threshold value, the controller is configured to provide the control signal to the laser generator, so as to stop providing the first laser pulses.2. The light source as claimed in claim 1 , wherein the process parameters further comprise beam sizes of the first laser pulses claim 1 , and when the temperature of the source ...

Подробнее
Номер записи: 63
03-06-2021 дата публикации

RADIATION SOURCE AND DEVICE FOR FEEDING BACK EMITTED RADIATION TO A LASER SOURCE

Номер: US20210167569A1
Автор: DINGER Udo
Принадлежит:

An FEL includes a feedback device for feeding back emitted illumination radiation. 1. A radiation source , comprising:a free electron laser configured to emit radiation having a wavelength of at most 30 nm; and a first optical component configured to couple out of a beam path the emitted radiation; and', 'a second optical component configured to couple into the free electron laser at least a portion of the coupled-out radiation,, 'a device configured to feed back the emitted radiation to the free electron laser, the device comprisingwherein the first optical component comprises a diffractive optical component.2. The radiation source of claim 1 , wherein the first optical component comprises a grazing incidence mirror.3. The radiation source of claim 2 , wherein the grazing incidence mirror comprises at least one member selected from the group consisting of silicon carbide (SiC) claim 2 , silicon (Si) claim 2 , copper (Cu) claim 2 , ruthenium (Ru) claim 2 , aluminum (Al) claim 2 , and diamond.4. The radiation source of claim 2 , wherein the second optical component comprises a grazing incidence mirror.5. The radiation source of claim 1 , wherein the second optical component comprises a grazing incidence mirror.6. The radiation source of claim 5 , wherein the grazing incidence mirror comprises at least one member selected from the group consisting of silicon carbide (SiC) claim 5 , silicon (Si) claim 5 , copper (Cu) claim 5 , ruthenium (Ru) claim 5 , aluminum (Al) claim 5 , and diamond.7. The radiation source of claim 1 , wherein the diffractive optical element is drivable.8. The radiation source of claim 1 , wherein the diffractive optical element comprises lines perpendicular to a direction of the radiation incident on the diffractive optical element.9. The radiation source of claim 1 , wherein the diffractive optical element comprises lines parallel to a direction of the radiation incident on the diffractive optical element.10. The radiation source of claim 1 , ...

Подробнее
Номер записи: 64
08-09-2022 дата публикации

SYSTEMS AND METHODS FOR COMBINATORIAL ARRAYS USING DYNAMIC INTERFERENCE LITHOGRAPHY

Номер: US20220283510A1
Автор: Lee Ki-Bum, Yang Letao
Принадлежит: Rutgers, The State University of New Jersey

A dynamic interference lithography (DIL) device is provided. The device includes a laser source configured for providing a laser beam, a substrate stage configured for mounting a substrate, an at least partially convex curved mirror, and a spatial filter configured to divide the laser beam into a first beam portion directed towards the at least partially convex curved mirror and a second beam portion directed towards the substrate. The first beam portion is reflected by the at least partially convex curved mirror towards the substrate to form an interference pattern on the substrate. 1. A dynamic interference lithography (DIL) device comprising:a laser source configured for providing a laser beam;a substrate stage configured for mounting a substrate;an at least partially convex curved mirror; anda spatial filter configured to divide the laser beam into a first beam portion directed towards the at least partially convex curved mirror and a second beam portion directed towards the substrate,wherein the first beam portion is reflected by the at least partially convex curved mirror towards the substrate to form an interference pattern on the substrate.2. The DIL device of claim 1 , wherein the at least partially convex curved mirror is mounted on a rotatable stage configured for adjusting a location on the at least partially convex curved mirror where the first beam portion is reflected from.3. The DIL device of claim 1 , wherein the at least partially convex curved mirror is mounted on a rotatable stage configured for adjusting an angle at which the first beam portion impinges on the at least partially convex curved mirror.4. The DIL device of claim 1 , wherein the interference pattern comprises a plurality of heterogeneous topographical patterns.5. The DIL device of claim 4 , wherein the plurality of heterogeneous topographic patterns comprise at least one of the following topographic features: grooves claim 4 , grids claim 4 , pores claim 4 , lines claim 4 , dots ...

Подробнее
Номер записи: 65
09-05-2019 дата публикации

LIGHT SOURCE FOR LITHOGRAPHY EXPOSURE PROCESS

Номер: US20190137882A1
Автор: CHANG Han-Lung, CHEN Li-Jui, Lai Cheng-Hao
Принадлежит:

A method for generating a radiation light in a lithography exposure system. The method includes producing a predetermined gas pressure in a storage chamber to supply a first load of a target fuel in the storage chamber via a nozzle. The method further includes irradiating the target fuel from the nozzle with a laser to generate the radiation light. The method also includes increasing the gas pressure in a buffer chamber which receives a second load of target fuel to the predetermined gas pressure. In addition, the method includes actuating the flow of the target fuel from the buffer chamber to the storage chamber. 1. A target fuel generator , comprising:a buffer chamber configured to receive a target fuel;a storage chamber connected to the buffer chamber and configured to receive the target fuel from the buffer chamber;a valve mechanism configured to control a flow of the target fuel from the buffer chamber to the storage chamber; anda nozzle connected to the storage chamber and configured to supply the target fuel.2. The target fuel generator as claimed in claim 1 , further comprising heating members connected to an outer wall of the buffer chamber and an outer wall of the storage chamber claim 1 , wherein the heating members are configured to control the buffer chamber and the storage chamber having the same temperature.3. The target fuel generator as claimed in claim 1 , further comprising:a gas source in communication with the buffer chamber and the storage chamber; andtwo gas pressure sensors each positioned in the buffer chamber and the storage chamber and configured to detect gas pressure in the buffer chamber and the storage chamber;wherein the gas source supplies gas into to the buffer chamber and the storage chamber based on the gas pressure detected by the two gas pressure sensors to control the buffer chamber and the storage chamber having the same gas pressure.4. The target fuel generator as claimed in claim 1 , further comprising a fuel source ...

Подробнее
Номер записи: 66
09-05-2019 дата публикации

Method for forming semiconductor structure

Номер: US20190137883A1
Автор: Chin-Hsiang Lin, Ching-Yu Chang, Li-Yen Lin
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

A method for forming a semiconductor device structure is provided. The method includes forming a material layer over a substrate and forming a resist layer over the material layer. The method includes exposing a portion of the resist layer by performing an exposure process. The resist layer includes a compound, and the compound has a carbon backbone, and a photoacid generator (PAG) group and/or a quencher group are bonded to the carbon backbone. The method also includes performing a baking process on the resist layer and etching a portion of the resist layer to form a patterned resist layer. The method includes patterning the material layer by using the patterned resist layer as a mask and removing the patterned resist layer.

Подробнее
Номер записи: 67
10-06-2021 дата публикации

RADIATION SOURCE FOR LITHOGRAPHY PROCESS

Номер: US20210173316A1
Автор: CHEN Li-Jui, CHENG Po-Chung, CHIEN Shang-Chieh, LIU Bo-Tsun, WU Shang-Ying
Принадлежит: Taiwan Semiconductor Manufacturing Company, Ltd.

A method for a lithography exposure process is provided. The method includes irradiating a target droplet with a laser beam to create an extreme ultraviolet (EUV) light. The method further includes reflecting the EUV light with a collector. The method also includes discharging a cleaning gas over the collector through a gas distributor positioned next to the collector. A portion of the cleaning gas is converted to free radicals before the cleaning gas leaves the gas distributor, and the free radicals are discharged over the collector along with the cleaning gas. 1. A method for a lithography exposure process , comprising:discharging a cleaning gas over a collector through a gas distributor;applying an electromagnetic radiant energy into the cleaning gas positioned in the gas distributor to convert a portion of the cleaning gas to a free radicals before discharging the cleaning gas;applying a thermal energy into the cleaning gas before applying the electromagnetic radiant energy to heat up the cleaning gas;trapping debris by vanes of a debris collection mechanism; andheating the vanes so that the trapped debris is melt and flows into a bucket.2. The method for a lithography exposure process as claimed in claim 1 , wherein the gas distributor includes two flow guiding members at two outer sides of the collector claim 1 , and flow rates in the flow guiding members are different.3. The method for a lithography exposure process as claimed in claim 2 , wherein each of the flow guiding member includes an end portion claim 2 , the end portion has two inner walls which intersects with an optical axis at an angle less than 90 degrees claim 2 , and one of the inner walls of the end portion is extends toward the collector claim 2 , and the other one of the inner walls of the end portion is extended along a direction substantially perpendicular to an optical axis claim 2 , so that the cleaning gas discharged by the flow guiding members forms a gas shield.4. The method for a ...

Подробнее
Номер записи: 68
25-05-2017 дата публикации

LIGHT SOURCE SYSTEM, BEAM TRANSMISSION SYSTEM, AND EXPOSURE APPARATUS

Номер: US20170149198A1
Автор: OKAZAKI Shinji, Suzuki Akiyoshi, Wakabayashi Osamu
Принадлежит: Gigaphoton Inc.

There is provided a light source system that may include a free electron laser apparatus, a light concentrating mirror, and a delaying optical system. The free electron laser apparatus may include an undulator, and may be configured to output a pulsed laser light beam toward an exposure apparatus. The light concentrating mirror may be configured to concentrate the pulsed laser light beam to enter the exposure apparatus. The delaying optical system may be provided in an optical path between the undulator and the light concentrating mirror, and may be configured to delay the pulsed laser light beam to allow an amount of delay of the pulsed laser light beam to be varied depending on a position in a beam cross-section of the pulsed laser light beam. 1. A light source system , comprising:a free electron laser apparatus including an undulator, and configured to output a pulsed laser light beam toward an exposure apparatus;a light concentrating mirror configured to concentrate the pulsed laser light beam to enter the exposure apparatus; anda delaying optical system provided in an optical path between the undulator and the light concentrating mirror, and configured to delay the pulsed laser light beam to allow an amount of delay of the pulsed laser light beam to be varied depending on a position in a beam cross-section of the pulsed laser light beam.2. The light source system according to claim 1 , wherein the delaying optical system spatially divides the pulsed laser light beam into a plurality of segments in the beam cross-section to vary the amount of delay for each of the segments.3. The light source system according to claim 1 , wherein a pulse width of the pulsed laser light beam that enters the delaying optical system is in a range from 0.1 ps to 0.2 ps both inclusive.4. The light source system according to claim 1 , wherein the delaying optical system provides the pulsed laser light beam with an optical path difference ΔL depending on the position in the beam cross- ...

Подробнее
Номер записи: 69
16-05-2019 дата публикации

LITHOGRAPHY SYSTEM HAVING INVISIBLE PELLICLE OVER MASK

Номер: US20190146362A1
Автор: Chang Shih-Ming, CHEN Chiu-Hsiang, LEE Chih-Jie, Liu Ru-Gun, WU Han-Wei, YEN Yung-Sung
Принадлежит: Taiwan Semiconductor Manufacturing Co., Ltd.

A lithography system is provided. The lithography system includes a mask and an optical module. The optical module is configured to optically form an invisible pellicle over the mask to protect the mask from contaminant particles. As a solid pellicle used in the prior arts is omitted, the critical dimension (CD) error from the boarder effect due to reflection of some light by the solid pellicle and the exposure radiation energy consumption caused by the solid pellicle can be avoided 1. A lithography system , comprising:a mask; andan optical module configured to optically form an invisible pellicle over the mask to protect the mask from contaminant particles; whereinthe optical module includes a pair of laser units including two laser units disposed on opposite sides of the mask, wherein the laser units are configured to generate a pair of opposing laser beams to scan back and forth over the mask to optically form the invisible pellicle for trapping the contaminant particles.2. The lithography system as claimed in claim 1 , wherein the mask includes a patterned surface and a chucking surface opposite to the patterned surface claim 1 , the mask is held in the lithography system such that the patterned surface faces a substrate stage claim 1 , and the invisible pellicle is formed over the patterned surface to avoid contaminant particles moving onto the patterned surface.3. The lithography system as claimed in claim 2 , wherein the laser beams claim 2 , when scanning over the mask claim 2 , move the trapped contaminant particles away from the patterned surface.4. The lithography system as claimed in claim 3 , wherein the laser beams produce radiation pressure to trap the contaminant particles on the invisible pellicle.5. The lithography system as claimed in claim 3 , wherein each of the laser units includes a movable optic configured to direct the laser beam.6. The lithography system as claimed in claim 3 , further comprising a blade module configured to define an ...

Подробнее
Номер записи: 70
16-05-2019 дата публикации

DROPLET DETECTOR AND EUV LIGHT GENERATION DEVICE

Номер: US20190150260A1
Автор: YANAGIDA Tatsuya
Принадлежит: Gigaphoton Inc.

A droplet detector preferably includes: an application unit configured to emit a pulsed beam at a predetermined cycle and apply a plurality of pulsed beams to a droplet moving in a detection region on a trajectory; and a light receiving unit configured to receive a scattered pulsed beam that is generated from the plurality of pulsed beams applied to the droplet and scattered by the droplet. 1. A droplet detector comprising:an application unit configured to apply, to one droplet moving in a detection region, a plurality of pulsed beams at a predetermined cycle; anda light receiving unit configured to receive a plurality of scattered pulsed beams, the plurality of scattered pulsed beams being generated by scattering, at the one droplet, the plurality of pulsed beams having been applied to the one droplet.2. The droplet detector according to claim 1 , whereinthe application unit and the light receiving unit are placed in a plane orthogonal to a trajectory of the one droplet and placed at positions different from positions facing to each other across the trajectory.3. The droplet detector according to claim 1 , comprisinga beam splitter configured to transmit the pulsed beam applied from the application unit and reflect the scattered pulsed beam propagating toward an optical axis of the pulsed beam applied from the application unit, in the scattered pulsed beam scattered from the droplet moving in the detection region, whereinthe light receiving unit receives a scattered pulsed beam reflected off the beam splitter.4. The droplet detector according to claim 1 , whereinthe application unit includesa mode-locked laser, andan illuminating optical system configured to shape a pulsed beam emitted from the mode-locked laser in a manner that the pulsed beam is shaped in a sheet-like pulse beam in the detection region.5. The droplet detector according to claim 1 , whereinthe light receiving unit includesa photodetector configured to subject the scattered pulsed beam to ...

Подробнее
Номер записи: 71
23-05-2019 дата публикации

Radiation source for lithography process

Номер: US20190155179A1
Автор: BO-TSUN Liu, Li-Jui Chen, Po-Chung Cheng, Shang-Chieh Chien, Shang-Ying WU
Принадлежит: Taiwan Semiconductor Manufacturing Co TSMC Ltd

A method for a lithography exposure process is provided. The method includes irradiating a target droplet with a laser beam to create an extreme ultraviolet (EUV) light. The method further includes reflecting the EUV light with a collector. The method also includes discharging a cleaning gas over the collector through a gas distributor positioned next to the collector. A portion of the cleaning gas is converted to free radicals before the cleaning gas leaves the gas distributor, and the free radicals are discharged over the collector along with the cleaning gas.

Подробнее
Номер записи: 72
24-06-2021 дата публикации

Illumination Source for an Inspection Apparatus, Inspection Apparatus and Inspection Method

Номер: US20210191274A1
Автор: BRUSSAARD Gerrit Jacobus Hendrik, O Dwyer David, Smorenburg Petrus Wilhelmus
Принадлежит: ASML Netherlands B.V.

An illumination source apparatus (), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (); a pump radiation source () operable to emit a beam of pump radiation (); and adjustable transformation optics () configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam () such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (), wherein the location of said outer region is dependent on an adjustment N setting of the adjustable transformation optics. 115-. (canceled)16. An illumination source apparatus , suitable for use in a metrology apparatus for the characterization of a structure on a substrate , the illumination source apparatus comprising:a high harmonic generation, HHG, medium;a pump radiation source operable to emit a beam of pump radiation; andtransformation optics configured to transform a transverse spatial profile of the beam of pump radiation to produce a transformed beam such that relative to a center axis of the transformed beam, a central region of the transformed beam has substantially zero intensity, and an outer region which is radially outwards from the center axis of the transformed beam has a non-zero intensity,wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation,wherein the transformation optics comprise a negative element.17. The illumination source apparatus of claim 16 , wherein the transformation optics comprise a positive element.18. The illumination source apparatus of claim 17 , wherein ...

Подробнее
Номер записи: 73
30-05-2019 дата публикации

EXPOSURE SYSTEM, EXPOSURE DEVICE AND EXPOSURE METHOD

Номер: US20190163074A1
Автор: CHEN Yonghui, GE Yaping, Lan Ke
Принадлежит:

An exposure system (), an exposure apparatus and an exposure method are disclosed. The exposure system () includes: a laser unit (), a light spot switching unit () and a lens unit (); the laser unit () is configured for producing a laser beam; the light spot switching unit () is configured to direct the laser beam to travel along one of different optical paths based on a desired size of a light spot for a workpiece to be exposed so that a laser beam in correspondence with the desired size of the light spot is obtained; and the lens unit () is configured for altering a direction in which the laser beam is incident on the workpiece. The light spot switching unit () enables the laser beam to be switched between the different optical paths so as to form light spots sized in different ranges, which can satisfy different needs of workpieces with various critical dimensions. As a result, an improvement in processing adaptability to different workpieces and a significant reduction in cost can be achieved. 1. An exposure system , comprising: a laser unit , a light spot switching unit and a lens unit , the laser unit configured to produce a laser beam , the light spot switching unit comprising a first optical path and a second optical path and configured to direct the laser beam to travel along one of the first and second optical paths based on a desired size of a light spot for a workpiece to be exposed so that a laser beam in correspondence with the desired size of the light spot is obtained , the lens unit configured to alter a direction in which the laser beam is incident on the workpiece , the first optical path configured to follow a diffraction-limit principle to generate a first light spot that is adjustable and has a size smaller than the threshold light spot size , the second optical path configured to generate , by geometrical imaging , a second light spot that is adjustable and has a size greater than or equal to the threshold light spot size.2. The exposure ...

Подробнее
Номер записи: 74
01-07-2021 дата публикации

Radiation source and a method for use in metrology applications

Номер: US20210199885A1
Автор: Hendrik Sabert, Patrick Sebastian UEBEL
Принадлежит: ASML Netherlands BV

A system and method for providing a radiation source. In one arrangement, the radiation source includes an optical fiber that is hollow, and has an axial direction, a gas that fills the hollow of the optical fiber, and a plurality of temperature setting devices disposed at respective positions along the axial direction of the optical fiber, wherein the temperature setting devices are configured to control the temperature of the gas to locally control the density of the gas.

Подробнее
Номер записи: 75
21-06-2018 дата публикации

EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE

Номер: US20180173102A1
Автор: YABU Takayuki
Принадлежит: Gigaphoton Inc.

An extreme ultraviolet light generation device may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target with laser light output by a laser device, in a generation region therein; a target supply unit configured to output the target as a droplet toward the generation region; a droplet detector configured to detect the droplet in a detection region; and a controller. The droplet detector may transmit, to the controller, a pass timing signal indicating a timing when the droplet passes through the detection region. The controller may include a noise compensation unit configured to compensate for noise of the pass timing signal caused by an electromagnetic wave from the plasma, and transmit a trigger signal that gives a trigger to output the laser light to the laser device based on the pass timing signal in which the noise is compensated for. 1. An extreme ultraviolet light generation device used together with a laser device configured to output laser light , the extreme ultraviolet light generation device comprising:a chamber in which extreme ultraviolet light is generated from plasma, the plasma being generated when a target is irradiated with the laser light in a generation region inside the chamber;a target supply unit configured to output the target as a droplet toward the generation region;a droplet detector configured to detect the droplet in a detection region located between the target supply unit and the generation region; anda controller configured to transmit a trigger signal to the laser device, the trigger signal giving a trigger to the laser device to output the laser light,the droplet detector transmitting a pass timing signal to the controller, the pass timing signal indicating a timing when the droplet passes through the detection region,the controller including a noise compensation unit configured to compensate for noise, the noise being caused by an electromagnetic wave radiated from the ...

Подробнее
Номер записи: 76
06-06-2019 дата публикации

MAINTAINING CONSISTENT DARKNESS LEVELS PRODUCED BY A PHOTOCONDUCTIVE DRUM DURING THE LIFE OF THE PHOTOCONDUCTIVE DRUM

Номер: US20190171110A1
Автор: BROWN MICHAEL WESLEY, LUND MARK EDWIN KIRTLEY, SENG STEVEN ALAN
Принадлежит:

An imaging device has a photoconductive drum with a surface that is charged and selectively discharged to create a latent electrostatic image of an image to-be-printed for attracting toner for transfer to a media. A memory of the imaging device stores energy density values for use by the laser beam that can be accessed by a controller according to a predetermined number of media imaged by the photoconductive drum. During imaging, the controller controls the laser beam based on the stored energy density values. The energy density of the laser beam is increased or decreased when the laser beam is scanned along the photoconductive drum. 1. In an imaging device having a photoconductive drum including a surface that is selectively discharged by a laser beam to form a latent electrostatic image for attracting toner for transfer to a media , a method comprising:storing in a memory of the imaging device energy density values for the laser beam according to a coating thickness of the photoconductive drum that can be accessed by a controller to control the laser beam; andcontrolling by the controller the laser beam based on the stored energy density values by increasing or decreasing energy density of the laser beam when the laser beam is scanned along the photoconductive drum.2. The method of claim 1 , wherein the controlling further includes increasing the energy density of the laser beam when the photoconductive drum has imaged a predetermined number of media.3. The method of claim 1 , wherein the controlling further includes increasing the energy density of the laser beam as the laser beam is scanned on one or more portions of the photoconductive drum having thinner coating thickness compared to an initial coating thickness of the photoconductive drum.4. The method of claim 1 , wherein the controlling further includes decreasing the energy density of the laser beam as the laser beam is scanned on one or more portions of the photoconductive drum having thicker coating ...

Подробнее
Номер записи: 77
22-06-2017 дата публикации

LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS

Номер: US20170181259A1
Автор: NOGIWA Seiji
Принадлежит: Gigaphoton Inc.

A laser beam having desired properties is output at desired timings. A laser apparatus is a laser apparatus for use with an extreme ultraviolet light generating apparatus that generates extreme ultraviolet light at a repetition frequency which is set in advance, and may be equipped with: a semiconductor laser that outputs a laser beam when a trigger signal is input thereto; an optical switch that switches between a state in which the laser beam passes therethrough and a state in which the laser beam does not pass therethrough, provided along the optical path of the laser beam; and a control unit configured to output the trigger signal to the semiconductor laser at a frequency which is an integer multiple of the repetition frequency, and to control the optical switch such that the laser beam passes therethrough at the repetition frequency. 1. A laser apparatus for use with an extreme ultraviolet light generating apparatus that generates extreme ultraviolet light at a repetition frequency which is set in advance , comprising:a semiconductor laser that outputs a laser beam when a trigger signal is input thereto;an optical switch that switches between a state in which the laser beam passes therethrough and a state in which the laser beam does not pass therethrough, provided along the optical path of the laser beam; anda control unit configured to output the trigger signal to the semiconductor laser at a frequency which is an integer multiple of the repetition frequency of twice or greater, and to control the optical switch such that the laser beam passes therethrough at the repetition frequency.2. A laser apparatus as defined in claim 1 , further comprising:a regenerative amplifier that amplifies the laser beam which is output from the semiconductor laser and includes the optical switch.3. A laser apparatus for use with an extreme ultraviolet light generating apparatus that generates extreme ultraviolet light at a repetition frequency which is set in advance claim 1 , ...

Подробнее
Номер записи: 78
29-06-2017 дата публикации

AN UNDULATOR

Номер: US20170184975A1
Автор: AKKERMANS Johannes Antonius Gerardus, GRIMMINCK Leonardus Adrianus Gerardus, Loopstra Erik Roelof, NIENHUYS Han-Kwang, NIKIPELOV Andrey Alexandrovich, RENKENS Michael Jozef Mathijs, Toma Adrian
Принадлежит: ASML Netherlands B.V.

An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe. 1. An undulator for guiding an electron beam along a periodic path , the undulator comprising:one or more periodic magnetic structures extending axially along the undulator, each periodic magnetic structure comprising a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction; anda plurality of spacer elements,wherein each of the plurality of magnets is spatially separated from the periodic path followed by the electron beam and one or more of the plurality of magnets is separated from the periodic path by one of the plurality of spacer elements,wherein each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the periodic path followed by the electron beam, andwherein the plurality of spacer elements have a radial thickness of at least the Moliere radius of the material from which it is formed.2. (canceled)3. The undulator of claim 1 , wherein the plurality of spacer elements are formed from a non-magnetic material.4. (canceled)5. The undulator of claim 3 , wherein the plurality of spacer elements are formed from tungsten or lead.6. The undulator of ...

Подробнее
Номер записи: 79
11-06-2020 дата публикации

Imaging Device

Номер: US20200183285A1
Автор: Aknin Ofer, Kashti Tamar, LANDA Benzion, NAGLER Michael, RUBIN BEN HAIM Nir, TZUR Itai, YOGEV Ronen
Принадлежит:

An imaging device for projecting individually controllable laser beams onto an imaging surface movable in an X-direction. The device includes a plurality of semiconductor chips each comprising a plurality of laser beam emitting elements arranged in a main array of M•N. The chips are mounted such that each pair of adjacent chips in the Y-direction are offset from one another in the X-direction and, if activated continuously, the emitted laser beams of the two chips of said pair trace on the imaging surface a set of parallel lines that are substantially uniformly spaced in the Y-direction. In addition to the M•N elements of the main array, each chip comprises at least one additional column on one or each side, each additional column containing at least one selectively operable element capable of compensating for any misalignment in the Y-direction in the relative positioning of the adjacent chips on the support. 1. An imaging device for projecting individually controllable laser beams onto an imaging surface that is movable relative thereto in a reference X-direction , the device comprising:a support;{'sub': r', 'c, 'a plurality of semiconductor chips coupled to the support, each of the chips comprising a plurality of individually controllable laser elements arranged in a two dimensional main array of M rows and N columns, the laser elements in each row having a uniform spacing Aand the laser elements in each column having a uniform spacing a;'}{'sub': 'r', 'the chips being arranged in at least one pair of rows such that the main array of each pair of chips that are adjacent one another in a reference Y-direction, transverse to the X-direction, are offset from one another in the X-direction, and such that the center of each two adjacent laser elements in the main arrays of both chips be uniformly spaced from one another in the Y-direction by a nominal distance A/M, whereby the centers of laser elements of both chips do not overlap in the Y direction;'}{'sub': r', 'r, ...

Подробнее
Номер записи: 80
22-07-2021 дата публикации

Charged particle beam optical apparatus, exposure apparatus, exposure method, control apparatus, control method, information generation apparatus, information generation method and device manufacturing method

Номер: US20210225611A1
Автор: Hiroyuki Nagasaka
Принадлежит: Nikon Corp

A charged particle beam optical apparatus has a plurality of irradiation optical systems each of which irradiates an object with a charged particle beam and a first control apparatus configured to control a second irradiation optical system on the basis of an operation state of a first irradiation optical system.

Подробнее
Номер записи: 81
12-07-2018 дата публикации

MULTIPHOTON ABSORPTION LITHOGRAPHY PROCESSING SYSTEM

Номер: US20180196353A1
Автор: FU Chien-Chung, Yeh Che-Wei
Принадлежит: National Tsing Hua University

A multiphoton absorption lithography processing system configured to process a to-be-processed object is provided. The multiphoton absorption lithography processing system includes a femtosecond laser source, a spatial light modulator, a lens array, and a stage. The femtosecond laser source is configured to emit a femtosecond laser beam. The spatial light modulator is configured to modulate the femtosecond laser beam into a modulated beam. The lens array is disposed on a path of the modulated beam and configured to divide the modulated beam into a plurality of sub-beams and make the sub-beams be focused on a plurality of position points at the to-be-processed object, so as to form multiphoton absorption reaction at the position points. The stage is configured to carry the to-be-processed object. The stage and the lens array are adapted to move with respect to each other in three dimensions. 1. A multiphoton absorption lithography processing system , configured to process a to-be-processed object , comprising:a femtosecond laser source, configured to emit a femtosecond laser beam;a spatial light modulator, disposed on a path of the femtosecond laser beam and configured to modulate the femtosecond laser beam to a modulated beam;a lens array, disposed on a path of the modulated beam and configured to divide the modulated beam into a plurality of sub-beams and respectively focus the sub-beams on a plurality of position points of the to-be-processed object, so as to generate a multiphoton absorption reaction on the position points; anda stage, configured to carry the to-be-processed object, wherein the stage and the lens array are adapted to move with respect to each other in three dimensions to move the position points, on which the sub-beams are focused, with respect to the to-be-processed object in three dimensions in the to-be-processed object, so as to three-dimensionally process the to-be-processed object.2. The multiphoton absorption lithography processing system ...

Подробнее
Номер записи: 82
12-07-2018 дата публикации

Lithographic Apparatus

Номер: US20180196361A1
Автор: André Gillis VAN DE VELDE, Edwin Cornelis KADIJK, Franciscus Johannes Joseph Janssen, Hubert Matthieu Richard STEIJNS, Jan LIEFOOGHE, Johannes Paul Marie DE LA ROSETTE, Marcel Johannus Elisabeth MUITJENS, Marinus Aart Van Den Brink, Markus Rolf Werner MATTHES, Nicolas Alban Lallemant
Принадлежит: ASML Netherlands BV

A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.

Подробнее
Номер записи: 83
22-07-2021 дата публикации

GAS MONITORING SYSTEM

Номер: US20210226407A1
Автор: Bhaban Shreyas, Dorobantu Andrei
Принадлежит:

A system includes an optical source configured to emit a pulsed light beam, the optical source comprising one or more chambers, each of the one or more chambers configured to hold a gaseous gain medium, the gaseous gain medium being associated with an assumed gas life; at least one detection module configured to: receive and analyze data related to the pulsed light beam, and produce a beam quality metric based on the data related to the pulsed light beam; and a monitoring module configured to: analyze the beam quality metric, determine a health status of the gaseous gain medium based on the analysis of the beam quality metric, and produce a status signal based on the determined health status, the status signal indicating whether to extend use of the gaseous gain medium beyond the assumed gas life or to end use of the gaseous gain medium. 1. A system comprising:an optical source configured to emit a pulsed light beam, the optical source comprising one or more chambers, each of the one or more chambers configured to hold a gaseous gain medium, the gaseous gain medium being associated with an assumed gas life; receive and analyze data related to the pulsed light beam, and', 'produce a beam quality metric based on the data related to the pulsed light beam; and, 'at least one detection module configured to analyze the beam quality metric,', 'determine a health status of the gaseous gain medium based the analysis of the beam quality metric, and', 'produce a status signal based on the determined health status, the status signal indicating whether to extend use of the gaseous gain medium beyond the assumed gas life or to end use of the gaseous gain medium., 'a monitoring module configured to2. The system of claim 1 , wherein analyzing the beam quality metric comprises determining whether the pulsed light beam meets a pre-determined specification claim 1 , and the beam quality metric comprises an optical energy of the pulsed light beam claim 1 , a spectral bandwidth of the ...

Подробнее
Номер записи: 84
18-06-2020 дата публикации

Mask treating apparatus and mask treating method

Номер: US20200192214A1
Автор: Hyunseok UHM, SunPyo LEE, Yunsong Jeong
Принадлежит: SAMSUNG ELECTRONICS CO LTD

Disclosed are a mask treating apparatus and a mask treating method. The mask treating apparatus comprises a process chamber that receives a blank mask package inclusive of a blank mask and performs a process on the blank mask, an unpacking unit that is disposed in the process chamber and unpacks the blank mask package, and a laser marking unit that is disposed in the process chamber and irradiates a laser onto the blank mask to form a fiducial mark.

Подробнее
Номер записи: 85
20-07-2017 дата публикации

METHOD FOR MANUFACTURING MASTER, TRANSFER COPY, AND REPLICA MASTER

Номер: US20170205707A1
Автор: KIKUCHI Masanao, Muramoto Yutaka
Принадлежит: DEXERIALS CORPORATION

There is provided a method for manufacturing a master on which an arbitrary pattern is formed, the method including: forming a thin-film layer on an outer circumferential surface of a base material in a round cylindrical or round columnar shape; generating a control signal corresponding to an object on the basis of an input image in which the object is depicted; irradiating the thin-film layer with laser light on the basis of the control signal and thereby forming a thin-film pattern corresponding to the object on the thin-film layer; and forming a pattern corresponding to the object on the outer circumferential surface of the base material using, as a mask, the thin-film layer on which the thin-film pattern is formed. 1. A method for manufacturing a master comprising:forming a thin-film layer on an outer circumferential surface of a base material in a round cylindrical or round columnar shape;generating a control signal corresponding to an object on the basis of an input image in which the object is depicted;irradiating the thin-film layer with laser light on the basis of the control signal and thereby forming a thin-film pattern corresponding to the object on the thin-film layer; andforming a pattern corresponding to the object on the outer circumferential surface of the base material using, as a mask, the thin-film layer on which the thin-film pattern is formed.2. The method for manufacturing a master according to claim 1 , whereinthe input image is divided into a plurality of small areas, whether to irradiate each of the small areas with the laser light is determined on the basis of whether the object is included in the small area, and the control signal is generated on the basis of the determination result.3. The method for manufacturing a master according to claim 2 , whereina size of the small area is smaller than a size of a spot of the laser light.4. The method for manufacturing a master according to claim 1 , whereinthe forming the thin-film pattern on the ...

Подробнее
Номер записи: 86
20-07-2017 дата публикации

Extreme ultraviolet light generating apparatus and method for generating extreme ultraviolet light

Номер: US20170205713A1
Автор: Takayuki Yabu
Принадлежит: GIGAPHOTON INC

An extreme ultraviolet light generating apparatus may include: a chamber, in which extreme ultraviolet light is generated; a target supply unit that outputs a target into the chamber as droplets to supply the target to a plasma generating region; a stage that moves the target supply unit in a direction substantially perpendicular to the trajectory of droplets output from the target supply unit; a droplet detector provided between the target supply unit and the plasma generating region at an inclination of a predetermined angle with respect to a substantially vertical direction, that detects the droplets from a direction inclined at the predetermined angle; and a calculation control unit that controls the irradiation timings of the laser beam at which the laser beam is irradiated onto the droplets within the plasm generating region, by adding delay times to the timings at which the droplets are detected by the droplet detector.

Подробнее
Номер записи: 87
29-07-2021 дата публикации

OPTICAL SYSTEM IN PARTICULAR FOR MICROLITHOGRAPHY

Номер: US20210231965A1
Автор: Kraus Johannes
Принадлежит:

An optical system, in particular for microlithography, includes a beam splitter, which has at least one light entry surface. The beam splitter is arranged in the optical system so that the angles of incidence with respect to the surface normal which occur at the light entry surface during operation of the optical system lie in the range of 45°±5°. The beam splitter is produced in the [110] crystal cut. 1. An optical system , comprising:a beam splitter comprising a light entry surface having a surface normal, the beam splitter is arranged in the optical system so that, during use of the optical system, angles of incidence with respect to the surface normal lie in a range of 45°±5°; and', 'the beam splitter is produced in the [110] crystal cut., 'wherein2. The optical system of claim 1 , wherein the beam splitter is configured so that claim 1 , during use of the optical system claim 1 , the (001) crystal direction lies in a common plane with a beam that is incident on the beam splitter and an associated beam that is reflected at the beam splitter.3. The optical system of claim 1 , wherein the beam splitter is configured so that claim 1 , during use of the optical system claim 1 , a beam entering the beam splitter through the light entry surface passes through the beam splitter at an angle of less than 10° with respect to the (111) crystal direction.4. The optical system of claim 1 , wherein the beam splitter is configured so that claim 1 , during use of the optical system claim 1 , a beam reflected at the beam splitter enters the beam splitter after circulating in the optical system.5. The optical system of claim 4 , wherein the beam splitter is configured so that claim 4 , during use of the optical system claim 4 , the beam that enters the beam splitter after circulating in the optical system passes through the beam splitter at an angle of less than 10° with respect to the (11-1) crystal direction.6. The optical system of claim 1 , wherein the beam splitter has a ...

Подробнее
Номер записи: 88
05-08-2021 дата публикации

REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE

Номер: US20210239998A1
Автор: "op t Root Wilhelmus Patrick Elisabeth Maria", Duffey Thomas Patrick, Everts Frank, GODFRIED Herman Philip, King Brian Edward, Thornes Joshua Jon
Принадлежит:

A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus. 1. An apparatus comprising:an optical source configured to produce a light beam made up of pulses and having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration;a coherence reduction system in the path of the light beam of pulses and configured to, for each of the pulses in the light beam, modulate an optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; anda beam directing apparatus in the path of a light beam of pulses formed from the modified pulses, the beam directing apparatus configured to direct the light beam of pulses formed from the modified pulses toward a substrate within a lithography exposure apparatus.2. The apparatus of claim 1 , wherein the second temporal coherence length is between 50-95% of the first temporal coherence length.3. The apparatus of claim 1 , wherein the optical source comprises:a first stage light source configured to produce a seed light beam made up of seed light beam pulses; anda second stage optical amplifier configured to receive the seed light beam ...

Подробнее
Номер записи: 89
04-08-2016 дата публикации

BEAM DELIVERY APPARATUS AND METHOD

Номер: US20160225477A1
Автор: AMENT Lucas Johannes Peter, Banine Vadim Yevgenyevich, BARTRAIJ Peturs Rutgerus, De Jager Pieter Willem Herman, De Vries Gosse Charles, DONKER Rilpho Ludovicus, ENGELEN Wouter Joep, Frijns Olav Waldemar Vladimir, GRIMMINCK Leonardus Adrianus Gerardus, JANSSEN Franciscus Johannes Joseph, Katalenic Andelko, Kruizinga Borgert, Loopstra Erik Roelof, NIENHUYS Han-Kwang, NIKIPELOV Andrey Alexandrovich, RENKENS Michael Jozef Mathijs, Van Gorkom Ramon Pascal
Принадлежит: ASML Netherlands B.V.

A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools. 1. A beam splitting apparatus for use within a lithographic system , comprising:a plurality of static mirrors each arranged to receive a different part of a first radiation beam from a radiation source and to reflect a respective portion of radiation along one of a plurality of directions to form a plurality of branch radiation beams for provision to a plurality of tools.2. The beam splitting apparatus of claim 1 , wherein each of the plurality of directions provides a respective branch optical path claim 1 , each branch optical path being associated with a respective one of the plurality of tools.3. The beam splitting apparatus of claim 2 , wherein at least one branch optical path is associated with two or more of the plurality of the static mirrors such that at least one of the plurality of branch radiation beams comprises a plurality of said reflected portions of radiation.4. The beam splitting apparatus of claim 2 , wherein each of the branch optical paths is associated with a respective plurality of the static mirrors such that each branch radiation beam comprises a plurality of said reflected portions.5. The beam splitting apparatus of claim 1 , wherein each static mirror is arranged to extend partially across the first radiation beam.6. The beam splitting apparatus claim 1 , wherein at least some of the plurality of static mirrors are configured to reflect a solid area of the first radiation beam.7. The beam splitting apparatus of claim 2 , wherein at least two or more of the plurality of static mirrors comprise a reflective grating claim 2 , each of a plurality faces of the grating providing a respective one of the two or more of the plurality of ...

Подробнее
Номер записи: 90
02-08-2018 дата публикации

MASKLESS PHOTOLITHOGRAPHIC SYSTEM IN COOPERATIVE WORKING MODE FOR CROSS-SCALE STRUCTURE

Номер: US20180217501A1
Автор: Dong Xianzi, Duan Xuanming, Zheng Meiling
Принадлежит:

A maskless photolithoghrapic system includes a laser point-by-point scanning exposure unit, a plane-projection exposure unit, a mobile station and a calculation control unit that decomposes a pattern to be exposed, so that a pattern portion with a precision requirement below a pre-determined threshold is exposed by the laser point-by-point scanning exposure unit, and a pattern portion with a precision requirement greater than the pre-determined threshold is exposed by the plane-projection exposure unit; when conducting laser point-by-point scanning exposure on a sample on the mobile station, the light emitted by the laser point-by-point scanning exposure unit moves relative to the sample according to the pattern portion with a precision requirement below the pre-determined threshold; and when conducting plane-projection exposure on the sample, the plane-projection exposure unit emits light with a corresponding pattern shape onto the sample according to the graph with a precision requirement greater than the pre-determined threshold. 1. A maskless photolithographic system in cooperative working mode for cross-scale structures , comprising:a laser point-by-point scanning exposure unit, a plane projection exposure unit, a mobile station and a calculation and control unit,wherein the calculation and control unit decomposes a pattern to be exposed, such that a pattern portion with a required precision below a predetermined threshold is exposed by the laser point-by-point scanning exposure unit, and the pattern portion with a required precision above the predetermined threshold is exposed by the plane projection exposure unit;when laser point-by-point scanning exposure is performed to a sample on the mobile station, light emergent from the laser point-by-point scanning exposure unit moves relative to the sample according to the pattern portion with the required precision below the predetermined threshold, so as to realize the laser point-by-point scanning exposure to the ...

Подробнее
Номер записи: 91
02-07-2020 дата публикации

Laser processing method and laser processing system

Номер: US20200209760A1
Автор: Akira SUWA, Koji Kakizaki, Masakazu Kobayashi, Osamu Wakabayashi
Принадлежит: GIGAPHOTON INC

A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light by using a laser processing system includes: performing relative positioning of a transfer position of a transfer image and the transparent material in an optical axis direction of a pulse laser beam so that the transfer position is set at a position inside the transparent material at a predetermined depth ΔZsf from a surface of the transparent material in the optical axis direction; and irradiating the transparent material with the pulse laser beam having a pulse width of 1 ns to 100 ns inclusive and a beam diameter of 10 μm to 150 μm inclusive at the transfer position.

Подробнее
Номер записи: 92
09-08-2018 дата публикации

LORENTZ ACTUATOR, OBJECT POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND LORENTZ ACTUATOR OPERATING METHOD

Номер: US20180224756A1
Автор: Boon Fidelus Adrianus, FISCHER Olof Martinus Josephus
Принадлежит: ASML Netherlands B.V.

A Lorentz actuator includes: a magnet arrangement; a coil arrangement; and a current controller for supplying a current to the coil arrangement; wherein the magnet and coil arrangement are moveable relative to each other in a main direction, wherein the coil arrangement has a first and second coil portion that are separately operable by the current controller, such that when the same current is supplied to the first coil portion as is supplied to the second coil portion, Lorentz forces generated in the main direction by the first and second coil portions are also the same, and wherein the current controller is configured to supply a current to the first and second coil portions with a phase difference in order to compensate for parasitic reluctance and/or Lorentz forces in an auxiliary direction perpendicular to the main direction. 2. The Lorentz actuator according to claim 1 , wherein the first coil portion and the second coil portion are configured to generate substantially the same Lorentz forces in the main direction when substantially the same current is provided to the first coil portion and to the second coil portion.3. The Lorentz actuator according to claim 1 , wherein the magnet arrangement is stationary and the coil arrangement is moveable relative to the magnet arrangement.4. The Lorentz actuator according to claim 1 , wherein the coil arrangement is stationary and the magnet arrangement is moveable relative to the coil arrangement.5. The Lorentz actuator according to claim 1 , wherein the current controller is configured to determine the phase difference between the first current and the second current supplied to the first and second coil portions based on a measured position of the coil arrangement relative to the magnet arrangement in the main direction.6. The Lorentz actuator according to claim 1 , wherein the current controller is configured to base the to be applied phase difference between the currents supplied to the first and second coil ...

Подробнее
Номер записи: 93
18-08-2016 дата публикации

LASER DEVICE, AND EXPOSURE DEVICE AND INSPECTION DEVICE PROVIDED WITH THE LASER DEVICE

Номер: US20160240993A1
Автор: Tokuhisa Akira
Принадлежит: NIKON CORPORATION

A laser device includes: a laser light source which generates a laser light in a pulse waveform of preset predetermined frequency; intensity modulator which is driven with a transmittance waveform wherein transmittance changes at either the predetermined frequency or an integer-multiple frequency thereof and which extracts and outputs the laser light which is outputted from the laser light source; control unit which controls an operation of the intensity modulator; an amplifier which amplifies the laser light which is outputted from the intensity modulator; and a wavelength conversion optical element which converts a wavelength of the laser light which is amplified by the amplifier, wherein the control unit changes relative timing of the transmittance waveform with respect to the pulse waveform, thereby changing the pulse waveform of the laser light which is emitted from the intensity modulator, to output a pulse light of predetermined waveform from the wavelength conversion optical element. 1. A laser device comprising:a laser light source which generates a laser light in a pulse waveform of a preset predetermined frequency;an intensity modulator which is driven with a transmittance waveform wherein transmittance changes at either the predetermined frequency or an integer-multiple frequency thereof and which extracts and outputs the laser light which is outputted from the laser light source;a control unit which controls an operation of the intensity modulator;an amplifier which amplifies the laser light which is outputted from the intensity modulator; anda wavelength conversion optical element which converts a wavelength of the laser light which is amplified by the amplifier, whereinthe control unit changes relative timing of the transmittance waveform with respect to the pulse waveform, thereby changing the pulse waveform of the laser light which is emitted from the intensity modulator, to output a pulse light of a predetermined waveform from the wavelength ...

Подробнее
Номер записи: 94
26-08-2021 дата публикации

A PHOTORESIST COMPOSITION, A METHOD FOR MANUFACTURING A PHOTORESIST COATING, ETCHED PHOTORESIST COATING, AND ETCHED SI CONTAINING LAYER(S), AND MANUFACTURING A DEVICE USING THEREOF

Номер: US20210263414A1
Автор: HAMA Yusuke, Hirayama Taku, KAWATO Shunji, Sao Takayuki, YANAGITA Hiroshi
Принадлежит:

The present invention relates to a photoresist composition comprising a polymer(s), a photo acid generator(s), a (C) compound(s) comprising unit EO and unit PO, and a solvent(s). And the present invention relates to a method for manufacturing a photoresist coating, etched photoresist coating, and etched Si containing layer(s). And the present invention relates to a method for a manufacturing a device. 2. The photoresist composition according to claim 1 , wherein (C) a single or a plurality of compound is a plasticizer claim 1 , andthe (C) compound comprises a copolymer at least one selected from the group consisting of random copolymer, block copolymer, alternating copolymer, graft copolymer and combination of any of these.3. The photoresist composition according to claim 1 , wherein the (C) compound comprises a copolymer comprising both unit EO and unit PO claim 1 , or the (C) compound is a plurality of compounds in which at least one compound comprised unit EO and at least one compound comprises unit PO.5. The photoresist composition according to claim 1 , wherein molecular ratio of [(unit EO)/(unit PO)] in the (C) compound(s) is 10/90 to 90/10.6. The photoresist composition according to claim 1 , wherein the weight average molecular weight (Mw) of the (C) compound(s) is 1 claim 1 ,000-50 claim 1 ,000.7. The photoresist composition according to claim 1 , the (D) solvent comprises at least one selected from the group consisting of aliphatic hydrocarbon solvent claim 1 , aromatic hydrocarbon solvent claim 1 , monoalcohol solvent claim 1 , polyol solvent claim 1 , ketone solvent claim 1 , ether solvent claim 1 , ester solvent claim 1 , nitrogen-containing solvent claim 1 , and sulfur-containing solvent.8. The photoresist composition according to claim 1 , wherein the (B) photo acid generator comprises at least one selected from the group consisting of sulfonic acid derivative claim 1 , diazomethane compound claim 1 , onium salt claim 1 , sulfone imide compound claim ...

Подробнее
Номер записи: 95
26-08-2021 дата публикации

METHOD FOR FORMING SEMICONDUCTOR STRUCTURE

Номер: US20210263419A1
Автор: Chang Ching-Yu, Lin Chin-Hsiang, LIN Li-Yen
Принадлежит: Taiwan Semiconductor Manufacturing Company, Ltd.

A method for forming a semiconductor device structure is provided. The method includes forming a material layer over a substrate and forming a resist layer over the material layer. The method includes exposing a portion of the resist layer. The resist layer includes a photoacid generator (PAG) group, a quencher group, an acid-labile group (ALG) and a polar unit (PU). The method also includes performing a baking process on the resist layer and developing the resist layer to form a patterned resist layer. The method further includes doping a portion of the material layer by using the patterned resist layer as a mask to form a doped region. In addition, the method includes removing the patterned resist layer. 1. A method for forming a semiconductor structure , comprising:forming a material layer over a substrate;forming a resist layer over the material layer;exposing a portion of the resist layer, wherein the resist layer comprises a photoacid generator (PAG) group, a quencher group, an acid-labile group (ALG) and a polar unit (PU);performing a baking process on the resist layer;developing the resist layer to form a patterned resist layer;doping a portion of the material layer by using the patterned resist layer as a mask to form a doped region; andremoving the patterned resist layer.2. The method for forming the semiconductor structure as claimed in claim 1 , wherein the PAG group and the quencher group are bonded to a linker claim 1 , and the ALG and the PG are bonded to a polymer backbone.3. The method for forming the semiconductor structure as claimed in claim 2 , wherein the ALG cleaves from the polymer backbone when performing the baking process on the resist layer.4. The method for forming the semiconductor structure as claimed in claim 2 , wherein the linker is a carboxylic acid group or an ether group.5. The method for forming the semiconductor structure as claimed in claim 1 , wherein the PAG group claim 1 , the quencher group claim 1 , the ALG and the PG are ...

Подробнее
Номер записи: 96
23-08-2018 дата публикации

Attenuation Apparatus and Method

Номер: US20180239259A1
Автор: De Vries Gosse Charles, NIENHUYS Han-Kwang
Принадлежит: ASML Netherlands B.V.

An apparatus () for adjusting an intensity of radiation. The apparatus comprises a grating () for receiving a radiation beam (B) and for directing at least a portion of the radiation beam in a first direction in the form of a first reflected radiation beam (B), and one or more first actuators operable to rotate the grating to adjust a grazing angle between the radiation beam and a surface of the grating so as to vary an intensity of the reflected radiation beam. 1. An apparatus for adjusting an intensity of radiation , comprising:a grating configured to receive a radiation beam and to direct at least a portion of the radiation beam in a first direction as a first reflected radiation beam; andone or more first actuators operable to rotate the grating to adjust a grazing angle between the radiation beam and a surface of the grating so as to vary an intensity of the reflected radiation beam, wherein the one or more first actuators are operable to translate the grating such that an attenuated radiation beam is directed from an attenuation apparatus in a fixed position and direction.2. The apparatus of claim 1 , wherein the one or more first actuators are operable to rotate the grating through an angle of less than 1 degree.3. The apparatus of claim 1 , wherein the one or more first actuators are operable to rotate the grating about a normal to a surface of the grating so as to vary an angle between one or more grooves of the grating and a plane of incidence of the first radiation beam.4. The apparatus of claim 1 , wherein the grating is operable to direct at least one diffracted radiation beam away from the first direction.5. The apparatus of claim 1 , further comprising:a reflective optic operable to receive the reflected radiation beam and to direct at least a portion of the reflected radiation beam in a second direction in a second reflected radiation beam; andone or more second actuators arranged to adjust an orientation of the reflective optic so as to vary an ...

Подробнее
Номер записи: 97
23-08-2018 дата публикации

COMPACT STORAGE RING EXTREME ULTRAVIOLET FREE ELECTRON LASER

Номер: US20180241172A1
Автор: Feser Michael, Loewen Roderick J., Ruth Ronald D.
Принадлежит:

A high power extreme ultraviolet (EUV) beam is produced. An electron beam is injected in a compact electron storage ring configured for emission of free-electron laser (FEL) radiation. The electron beam is passed through a magnetic undulator on each of a plurality of successive revolutions of the electron beam around the compact electron storage ring. The electron beam is induced to microbunch and radiate coherently while passing through the magnetic undulator. A portion of the free-electron laser radiation at an extreme ultraviolet wavelength produced by an interaction of the electron beam through the magnetic undulator is outputted. 1. A system for producing a high power extreme ultraviolet (EUV) beam , including:a compact electron storage ring configured for emission of free-electron laser (FEL) radiation, wherein a circumference of the compact electron storage ring is less than 60 meters;an electron injector configured to insert an electron beam into the compact electron storage ring;a plurality of bending magnets and a plurality of quadrupole magnets interspersed along the compact electron storage ring, wherein at least a corresponding one of the quadrupole magnets is between any two of the bending magnets along the compact electron storage ring;a magnetic undulator configured to allow the electron beam to pass through the magnetic undulator where the electron beam is induced to microbunch and radiate coherently, wherein the magnetic undulator is a transverse gradient undulator that includes a plurality of transverse gradient undulator components and each of the transverse gradient undulator components includes a periodic structure of mechanically coupled set of magnetic components with alternating poles that create alternating transverse magnetic fields along at least a portion of a length of the transverse gradient undulator to generate at least a portion of the free-electron laser radiation when the electron beam travels along at least the portion of the ...

Подробнее
Номер записи: 98
31-08-2017 дата публикации

Light source device

Номер: US20170250066A1
Автор: Akinori ASAI, Kenshi Fukumitsu
Принадлежит: Hamamatsu Photonics KK

In a light source device, a control unit causes an energy density of a laser light in a lighting start region RS when a laser support light is maintained to be lower than an energy density of the laser light in the lighting start region RS when the laser support light is put on. For this reason, when the laser support light is maintained, a laser light L is radiated to the lighting start region RS at an energy density of a degree where sputtering does not occur. Therefore, in the light source device, because sputtering in a light emission sealing body can be suppressed, a sufficiently long life can be realized.

Подробнее
Номер записи: 99
06-09-2018 дата публикации

Beam splitting apparatus

Номер: US20180252930A1
Автор: De Vries Gosse Charles, NIENHUYS Han-Kwang
Принадлежит: ASML Netherlands B.V.

A beam-splitting apparatus arranged to receive an input radiation beam and split the input radiation beam into a plurality of output radiation beams. The beam-splitting apparatus comprising a plurality of reflective diffraction gratings arranged to receive a radiation beam and configured to form a diffraction pattern comprising a plurality of diffraction orders, at least some of the reflective diffraction gratings being arranged to receive a 0diffraction order formed at another of the reflective diffraction gratings. The reflective diffraction gratings are arranged such that the optical path of each output radiation beam includes no more than one instance of a diffraction order which is not a 0diffraction order. 162.-. (canceled)63. A beam-splitting apparatus arranged to receive an input radiation beam and split the input radiation beam into a plurality of output radiation beams , the beam-splitting apparatus comprising:{'sup': 'th', 'a plurality of reflective diffraction gratings arranged to receive the input radiation beam and configured to form a diffraction pattern comprising a plurality of diffraction orders, at least some of the reflective diffraction gratings being arranged to receive a 0diffraction order formed at another of the reflective diffraction gratings;'}{'sup': 'th', 'wherein the plurality of reflective diffraction gratings are further arranged such that the optical path of each output radiation beam includes no more than one instance of a diffraction order that is not a 0diffraction order.'}64. The beam-splitting apparatus of claim 63 , wherein the output radiation beams are coupled to a plurality of lithographic apparatus.65. The beam-splitting apparatus of claim 63 , wherein the diffraction gratings are configured such that the output radiation beams each have substantially the same power.66. The beam-splitting apparatus of claim 63 , wherein the beam-splitting apparatus further comprises:a first reflective diffraction grating arranged to receive ...

Подробнее
Номер записи: 100