レジストパターン形成方法

RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition that is used for double patterning and suitably used also for a liquid (such as water) immersion exposure process. SOLUTION: This radiation-sensitive composition is used in a resist pattern forming method including double patterning as a predetermined process. The radiation-sensitive composition contains (a) polymer containing repeating unit having a lactone structure or cyclic carbonate structure and also having acid-labile group, (b) radiation-sensitive acid generator, and (c) solvent. COPYRIGHT: (C)2012,JPO&INPIT ...

レジストパターン形成方法

パターン形成方法

レジストパターン形成方法

RESIN COMPOSITION FOR FINE PATTERN FORMATION, METHOD FOR FORMING FINE PATTERN, AND POLYMER

PROBLEM TO BE SOLVED: To provide a resin composition for fine pattern formation, which smoothly shrinks a resist pattern by a heat treatment, and is easily removed by subsequent treatment with an aqueous alkali solution. SOLUTION: The resin composition for fine pattern formation contains a resin, a crosslinking agent for crosslinking the resin, and a solvent and is used for microfabrication of a resist pattern. The resin contains a repeating unit (I) expressed by formula (1) and a repeating unit (II) expressed by formula (2). In the formula (1): R1 represents a hydrogen atom or a methyl group; R2 represents a single bond, a methylene group, a 2-5C chain or branched alkylene group, an -NH- group, an -O- group, a -COO- group, or a -CINH- group; R3 each independently represents a hydrogen atom, a 1-6C saturated chain hydrocarbon group, a 3-8C monocyclic hydrocarbon group, or a 7-10C polycyclic hydrocarbon group; m represents 1 to 2; and n represents 0 to 2. In the second formula (2): R1 represents ...

パターン形成方法及び感放射線性樹脂組成物