液浸上層膜形成用組成物

液浸上層膜形成用組成物及びレジストパターン形成方法

液浸用上層膜形成用組成物

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is a material of a resist film that obtains a good pattern shape, has excellent depth of focus, prevents elution into a liquid for liquid immersion exposure, such as water, ensures a large receding contact angle to the liquid for liquid immersion exposure, and prevents development defects, and to provide a polymer to be used as a resin component of the radiation-sensitive resin composition, and a resist pattern forming method using the radiation-sensitive resin composition. SOLUTION: In the invention, a plurality of fluorine atom-containing polymers are used at the same time. The radiation-sensitive resin composition comprises a fluorine atom-containing polymer (A1) which, under the following conditions, dissolves in a 2.38% aqueous solution of tetramethylammonium hydroxide at 23°C at a dissolution rate of <10 nm/s; a fluorine atom-containing polymer (A2) which, under the following conditions, dissolves in a ...

液浸用上層膜形成組成物及びレジストパターン形成方法

COMPOSITION FOR FORMING UPPER LAYER FILM FOR LIQUID IMMERSION

PROBLEM TO BE SOLVED: To provide a composition for forming an upper layer film of which the applied quantity is reduced, and from which the upper layer film which hardly causes a foreign substance in the lapse of time, and further hardly causes a Blob defect is formed. SOLUTION: A polymer having a predetermined repeating unit is used for the composition for forming the upper layer film, which includes an ether-based solvent as a solvent. COPYRIGHT: (C)2012,JPO&INPIT ...

液浸上層膜形成用組成物及びレジストパターン形成方法

COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN

PROBLEM TO BE SOLVED: To provide a composition for forming an upper film, which provides an immersion upper film which reduces remaining water even in high scan speed at 700 mm/s, for instance, and prevents bubbles in an interface between an immersion liquid and the upper film. SOLUTION: The composition for forming an immersion upper film includes: a polymer (A) containing at least one selected from a group consisting of repeating units represented by general formulas (1-1) and (1-2), a repeating unit having a hydrocarbon group and a repeating unit having a fluorine substituted hydrocarbon group; and a solvent (S), wherein in the general formulas (1-1) and (1-2) R1 represents a hydrogen atom, R2 and R3 independently represent a single bond or a hydrocarbon group, and R4 represents a fluorine substituted hydrocarbon. COPYRIGHT: (C)2012,JPO&INPIT ...

液浸上層膜形成用組成物及びレジストパターン形成方法

液浸上層膜形成用組成物及び重合体

液浸用上層膜形成用組成物

液浸上層膜形成用組成物及びレジストパターン形成方法

液浸上層膜形成用組成物及びフォトレジストパターン形成方法

液浸用上層膜形成用組成物