STRUCTURE MULTI-LAYER CONTAINING RUBBER AND OF COPOLYMER GRAFTS HAS BLOCKS POLYAMIDES, AND ITS USE AS TUBES FOR CIRCUITS Of AIR CONDITIONING.

IMPLANTABLE DEVICE SYSTEM

An implantable device system is disclosed. The implantable device system comprises, a first energy transceiver system, a second energy transceiver system at least partially implanted within an organic tissue and capable of being interrogated by the first energy transceiver system, and a sensing system, wherein a state of the sensing system is available at the second energy transceiver system. 1. An implantable device system comprising:a first energy transceiver system;a second energy transceiver system implanted within an organic tissue and capable of being interrogated by the first energy transceiver system, wherein the second energy transceiver system comprises a control component, wherein the control component comprises at least one of a switch controller, a position controller, and a reference controller;a sensing system, wherein a state of the sensing system is available at the second energy transceiver system;an elastic member; anda physical parameter sensing system capable of sensing a pressure acting on the elastic member.2. The implantable device system of claim 1 , wherein the first energy transceiver system and the second energy transceiver system are separated by a distance of up to about 15 cm.37-. (canceled)8. The implantable device system of claim 1 , wherein the physical parameter sensing system comprises a physical interface member claim 1 , a sensor claim 1 , and a data interface module.9. The implantable device system of claim 8 , wherein the physical interface member comprises a membrane.10. (canceled)11. The implantable device system of claim 8 , wherein the sensor comprises a distributed sensor comprising a capacitive sensor.12. (canceled)13. The implantable device system of claim 8 , wherein the sensor is capable of quantitatively detecting.14. The implantable device system of claim 1 , wherein the second energy transceiver system comprises:an energy transformer; andan energy interface.15. (canceled)16. (canceled)17. The implantable device ...

ELECTROLYTE SUPPORTED CELL DESIGNED FOR LONGER LIFE AND HIGHER POWER

A solid oxide fuel cell (SOFC) includes a cathode electrode, an anode electrode, and a solid oxide electrolyte located between the anode electrode and the cathode electrode. The cathode electrode is a porous ceramic layer infiltrated with a cathode catalyst material, and the anode electrode is a porous ceramic layer infiltrated with an anode catalyst material, and the electrolyte is a ceramic layer having a lower porosity than the anode and the cathode electrodes. A ceramic reinforcing region may be located adjacent to the riser opening in the electrolyte. 1. A method of making a hole-reinforced electrolyte , comprising:providing a ceramic reinforcing region adjacent to a riser opening in a ceramic electrolyte; andsintering the ceramic reinforcing region.2. The method of claim 1 , wherein the step of providing the reinforcing region comprises laminating an additional layer of electrolyte material comprising yttria or scandia onto the electrolyte.3. The method of claim 1 , wherein the step of providing the reinforcing region comprises screen printing a ceramic paste onto the electrolyte.4. The method of claim 3 , wherein the ceramic paste comprises fibers or particles.5. The method of claim 3 , wherein the reinforcing region is screen printed onto a green tape comprising the electrolyte.6. The method of claim 5 , wherein the step of sintering comprises co-sintering the electrolyte claim 5 , the anode claim 5 , and the cathode.7. The method of claim 1 , where the ceramic reinforcing region is located at least partially around a circumference of the riser opening.8. The method of claim 7 , wherein:the electrolyte comprises an active region and an inactive region;an anode and a cathode contact opposite sides of the electrolyte at least partially on the active region of the electrolyte;the ceramic reinforcing region is located on the inactive region of the electrolyte; anda combined thickness of the electrolyte and the ceramic reinforcing region is thicker than a ...

SYSTEM AND METHOD FOR MONITORING HEALTH OF ELECTRICAL MACHINES

A system for monitoring health of an electrical machine is provided. The system includes at least one sensor element embedded in at least one substrate element located in a stator core. The system further includes a measuring subsystem coupled to the at least one sensor element and configured to monitor the health based on changes in electromagnetic characteristics of the sensor element due to changes in force acting on the substrate element or compression of the substrate element. 1. A system for monitoring health of an electrical machine , the system comprising:at least one sensor element embedded in or disposed on at least one substrate element located in a stator core;a measuring subsystem coupled to the at least one sensor element and configured to monitor the health based on changes in electromagnetic characteristics of the sensor element due to changes in force acting on the substrate element or compression of the substrate element.2. The system of claim 1 , wherein the substrate element comprises a flat plate claim 1 , a spring claim 1 , a ripple spring and a force-to-displacement transducer.3. The system of claim 1 , wherein the substrate element is located between stator windings of the stator core claim 1 , said substrate element includes a metallic or non-metallic flat plate.4. The system of claim 2 , wherein the substrate element is located between a stator wedge and a stator winding in a stator slot.5. The system of claim 1 , wherein the electromagnetic characteristics of the sensor element embedded in or disposed on the substrate element varies with the time varying force acting on the substrate element during the operation of the electrical machine.6. The system of claim 1 , wherein the electromagnetic characteristics of the sensor element embedded in or disposed on the substrate element varies with compression of the substrate element during the operation or shutdown of the electrical machine.7. The system of claim 1 , wherein the system comprises ...

BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME

This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups. 2. A polymer comprising as polymerized units a photoacid generator compound of formula (II) according to .3. A photoresist composition comprising the polymer of .7. The photoacid generator of wherein Pcomprises a (meth)acrylic group or a vinyl group.8. A photoresist composition comprising a photoacid generator compound of .9. A method for forming a photoresist relief image on a substrate comprising: (a) applying a coating layer of a photoresist composition of on a substrate; and (b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image.10. The method of further comprising developing the exposed photoresist layer with aqueous alkaline developer whereby the one or more base-reactive groups undergo a bond-breaking reaction to provide one or more polar groups. This application claims the benefit of priority under 35 U.S.C. §119(3) to U.S. Provisional Application No. 61/458,014, filed on Nov. 15, 2010, the entire contents of which are incorporated by reference.This invention relates to new photoacid generator compounds (“PAGs”) and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-reactive groups. Positive- and negative-acting chemically amplified resists that contain such PAGs and that are imaged with short wavelength radiation such as sub-300 nm and sub-200 nm radiation are particularly preferred.Photoresists are photosensitive films for transfer of images to a substrate. They form negative or positive images. After coating a photoresist on a substrate, the coating is exposed through a patterned photomask to a source of activating energy such as ultraviolet light to ...

Integrated circuit and method of fabricating same

A method includes providing a substrate with at least one semiconducting layer. The method also includes forming a plurality of isolation barriers within the at least one semiconducting layer, thereby forming a plurality of device islands. The method further includes inserting a plurality of electronic devices into a portion of the at least one semiconducting layer such that each electronic device is substantially isolated from each other electronic device by the device islands.

METHOD FOR LINKING CONTROL SYSTEM INPUTS AND OUTPUTS TO SYMBOLIC CONTROLS

A method for generating a graphical user interface for use in a smoke control system. In the method, a computer drawing of a building is provided which includes positioning information for equipment that is used in the smoke control system. In addition, a key is provided which is indicative of the equipment and operations for the smoke control system. The key is then associated with inputs and outputs of the smoke control system. The key is also associated with the positioning information of the building equipment and the inputs and outputs. Further, the key is associated with control widgets for enabling control of the equipment. The inputs and outputs, positioning information and the control widgets are merged based on the key to provide merged data. A graphical user interface is then generated from the merged data. 1. A method in a computer for generating a graphical user interface based on a computer generated drawing of a building having equipment for use in a building control system having inputs and outputs wherein said computer generated drawing includes position information for said equipment and wherein said graphical user interface utilizes a library of control blocks for enabling control of said equipment , comprising the steps of:receiving a key for cross referencing said inputs and outputs, said positioning information and said control blocks;merging said inputs and outputs, said positioning information and said control blocks based on said key to provide merged data; andgenerating said graphical user interface from said merged data.2. The method according to claim 1 , wherein a format for said key is Znnn-Cxmm-yy-f wherein Z represents a smoke zone claim 1 , x represents a smoke control widget claim 1 , yy represents an object and f indicates a flashing light emitting diode.3. The method according to claim 1 , wherein said control blocks include widgets for controlling smoke control claim 1 , mop-up fan system control claim 1 , pressure system control ...

AUTO-COMPENSATING SYSTEM AND METHOD FOR CONDITION MONITORING OF ELECTRICAL MACHINES

A condition monitoring method for an electrical machine is provided. The method includes providing at least one first sensor element embedded in or disposed on at least one substrate element located in a stator core for obtaining a first set of data. The method also includes providing at least one second sensor element for obtaining a second set of data from the electrical machine. Further, the method includes generating signals indicative of changes in characteristics of the first sensor element based on the second set of data. Finally, the method includes refining the first set of data by combining the first set of data with the generated signals. 1. A condition monitoring method for an electrical machine , the method comprising:providing at least one first sensor element embedded in or disposed on at least one substrate element located in a stator core for obtaining a first set of data;providing at least one second sensor element for obtaining a second set of data;generating signals indicative of changes in characteristics of the first sensor element based on the second set of data; andrefining the first set of data by combining the first set of data with the generated signals.2. The method of claim 1 , further comprising determining health of the machine by analyzing the refined signals.3. The method of claim 1 , wherein said at least one second sensor element is disposed in the stator core.4. The method of claim 1 , wherein the first set of data comprises compression force data of the at least one substrate element.5. The method of claim 1 , wherein the second set of data comprises one of temperature data claim 1 , time varying force data claim 1 , time varying force data on stator winding claim 1 , field strength data of the electrical machine claim 1 , and combinations thereof.6. The method of claim 5 , wherein the field strength data corresponds to a load on the electrical machine.7. The method of claim 1 , further comprising calibrating the at least one ...

PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME

A photoacid generator compound has the formula (I): 1. A compound having the formula (I):{'br': None, 'sup': 1', '2', '−', '+, 'sub': p', 'k', '2', 'm', '2', 'n', '3, '[A-(CHR)]-(L)-(CH)—(C(R))—SOZ\u2003\u2003(I)'}wherein{'sub': '5', 'A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic Cor greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing,'}{'sup': 1', '1', '1, 'sub': '1-30', 'Ris H, a single bond, or a substituted or unsubstituted Calkyl group, wherein when Ris a single bond, 12is covalently bonded to a carbon atom of A,'}{'sup': 2', '2, 'sub': '1-4', 'each Ris independently H, F, or Cfluoroalkyl, wherein at least one Ris not hydrogen,'}{'sub': '1-30', 'L is a linking group comprising a sulfonate group, a sulfonamide group, or a Csulfonate or sulfonamide-containing group,'}Z is an organic or inorganic cation, andp is an integer of 0 to 10, k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater.2. The compound of claim 1 , having the formula (IIa) or (IIb):{'br': None, 'sup': 1', '2', '−', '+, 'sub': p', '2', '2', 'm', '2', 'n', '3, 'A-(CHR)—O—SO—(CH)—(C(R))—SOZ\u2003\u2003(IIa)'}{'br': None, 'sup': 1', '2', '−', '+, 'sub': p', '2', '2', 'm', '2', 'n', '3, 'A-(CHR)—SO—O—(CH)—(C(R))—SOZ\u2003\u2003(IIb)'}{'sup': 1', '2, 'wherein A, R, Rp, m, n, and Z are as defined for formula (I).'}3. The compound of claim 1 , having the formula (IIIa) or (IIIb):{'br': None, 'sup': 1', '3', '2', '−', '+, 'sub': p', '2', '2', 'm', '2', 'n', '3, 'A-(CHR)—N(R)—SO—(CH)—(C(R))—SOZ\u2003\u2003(IIIa)'}{'br': None, 'sup': 1', '3', '2', '−', '+, 'sub': p', '2', '2', 'm', '2', 'n', '3, 'A-(CHR)—SO—N(R)—(CH)—(C(R))—SOZ\u2003\u2003(IIIb)'}{'sup': 1', '2', '3', '1, 'sub': 1-20', 'p, 'wherein A, R, Rp, m, n, and Z are as defined for formula (I), and Ris H, a Calkyl group, or A-(CHR)—.'}8. A compound having the formula:{'br': None, 'sup': +−', '2, 'sub': 2', '2', 'n', '2', ...

METHOD AND SYSTEM FOR TRANSIENT VOLTAGE SUPPRESSORS

A method of forming a silicon carbide transient voltage suppressor (TVS) assembly and a system for a transient voltage suppressor (TVS) assembly are provided. The TVS assembly includes a semiconductor die in a mesa structure that includes a first layer of a first wide band gap semiconductor having a conductivity of a first polarity, a second layer of the first or a second wide band gap semiconductor having a conductivity of a second polarity coupled in electrical contact with the first layer wherein the second polarity is different than the first polarity. The TVS assembly also includes a third layer of the first, the second, or a third wide band gap semiconductor having a conductivity of the first polarity coupled in electrical contact with the second layer. The layer having a conductivity of the second polarity is lightly doped relative to the layers having a conductivity of the first polarity. 1. A transient voltage suppressor (TVS) assembly comprising: a substrate comprising a layer of a first wide band gap semiconductor having a conductivity of a first polarity;', 'a second layer of the first or a second wide band gap semiconductor having a conductivity of a second polarity coupled in electrical contact with said substrate, the second polarity being different than the first polarity; and', 'a third layer of the first, the second, or a third wide band gap semiconductor having a conductivity of the first polarity coupled in electrical contact with said second layer, where', 'said layer having a conductivity of the second polarity is lightly doped relative to the layers having a conductivity of the first polarity;, 'a semiconductor die in a mesa structure comprisinga first electrode coupled in electrical contact with said substrate; anda second electrode coupled in electrical contact with said third layer, wherewhen a voltage greater than a predetermined magnitude is applied across the first and second electrodes, the TVS assembly operates in a punch-though mode ...

Multi-Layered Coating Providing Corrosion Resistance to Zirconia Based Electrolytes

A solid oxide fuel cell (SOFC) stack including a plurality of SOFCs and a plurality of interconnects. Each interconnect is located between two adjacent SOFCs, and each interconnect contains a Mn or Co containing, electrically conductive metal oxide layer on an air side of the interconnect. The SOFC stack also includes a barrier layer located between the electrically conductive metal oxide layer and an adjacent SOFC. The barrier layer is configured to prevent Mn or Co diffusion from the electrically conductive metal oxide layer to the adjacent SOFC. 1. A solid oxide fuel cell (SOFC) stack , comprising:a plurality of SOFCs;a plurality of interconnects, each interconnect located between two adjacent SOFCs, and each interconnect comprising a Mn or Co containing, electrically conductive metal oxide layer on an air side of the interconnect; anda barrier layer located between the electrically conductive metal oxide layer and an adjacent SOFC, the barrier layer configured to prevent Mn or Co diffusion from the electrically conductive metal oxide layer to the adjacent SOFC.2. The SOFC stack of claim 1 , wherein the SOFC stack further comprises a silica based glass or glass ceramic seal located between each interconnect and a cathode electrode of each adjacent SOFC.3. The SOFC stack of claim 2 , wherein the barrier layer is located on the interconnect between the electrically conductive metal oxide layer and the seal.4. The SOFC stack of claim 2 , wherein the barrier layer is located on a cathode side of the SOFC electrolyte between the seal and the adjacent SOFC.5. The SOFC stack of claim 2 , wherein the SOFC stack comprises a first barrier layer located between the electrically conductive metal oxide layer and the seal and a second barrier layer located between the seal and a cathode side of the electrolyte the adjacent SOFC.6. The SOFC stack of claim 1 , wherein the barrier layer comprises at least one of a clay claim 1 , a ceramic claim 1 , an alkali earth silicate or a ...

PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME

A photoacid generator includes those of formula (I): 2. The photoacid generator of claim 1 , wherein Lis a Clinking group comprising an ether claim 1 , ester claim 1 , amine claim 1 , amide claim 1 , ketone claim 1 , acetal claim 1 , ketal claim 1 , sulfide claim 1 , disulfide claim 1 , thiocarbonyl claim 1 , sulfonate claim 1 , sulfonamide claim 1 , or a combination comprising at least one of the foregoing groups.3. The photoacid generator of claim 1 , wherein Lis linear or branched claim 1 , and fluorinated or non-fluorinated claim 1 , and comprises a Calkylene claim 1 , Calkyleneoxy claim 1 , Cester claim 1 , Camide claim 1 , Csulfonate claim 1 , Csulfonamide claim 1 , or a combination comprising at least one of the foregoing.10. A photoresist comprising the photoacid generator of and an acid deprotectable copolymer.11. A coated film comprising: (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of the photoresist of over the one or more layers to be patterned. This application claims the benefit of U.S. Patent Application Ser. No. 61/582,341, filed Dec. 31, 2011, which is incorporated by reference herein in its entirety.Improved photolithographic technologies based on short wavelength radiation (e.g., as generated by an ArF excimer laser operating at 193 nm), or other such short wavelength sources, are useful in the pursuit of ever faster and more efficient semiconductor devices by increasing device density of an integrated circuit. Photoresist materials useful in such short wavelength applications include chemical amplification-type radiation-sensitive resin compositions, which rely on the efficient interaction of a resin component having an acid labile functional group, and a photoacid generator (PAG) that generates an acid upon irradiation.The requisite properties for photoresist materials useful for ArF excimer laser lithographies include transparency (i.e., low optical density) at 193 nm, as well as high etch ...

METHOD AND APPARATUS FOR OBTAINING DISCRETE AXIAL CLEARANCE DATA USING RADIAL CLEARANCE SENSORS

A method and apparatus for determining axial clearance data between a rotor and a stator are disclosed. At least one radial clearance sensor is positioned on the stator and is configured to gather radial clearance data, i.e., measurements of a radial distance between the rotor and the stator taken at discrete time intervals. A computing device is operably connected with the at least one radial clearance sensor and is configured to use the radial clearance data to determine axial clearance data, i.e., an axial distance between the stator and the rotor. In one embodiment, the computing device uses, among other data points, an indication of a loss of signal from at least one radial clearance sensor to extrapolate the axial clearance data. 1. An apparatus for determining axial clearance data between a rotor and a stator , the apparatus comprising:at least one radial clearance sensor positioned on the stator, the at least one radial clearance sensor configured to gather radial clearance data, wherein the radial clearance data comprises measurements of a radial distance between the rotor and the stator taken at discrete time intervals; anda computing device operably connected with the at least one radial clearance sensor, the computing device configured to use the radial clearance data to determine axial clearance data, wherein the axial clearance data comprises an axial distance between the stator and the rotor.2. The apparatus of claim 1 , wherein the at least one radial clearance sensor comprises a plurality of radial clearance sensors circumferentially spaced around the rotor.3. The apparatus of claim 1 , wherein the at least one radial clearance sensor comprises a plurality of radial clearance sensors axially spaced along the stator such that one radial clearance sensor is axially aligned with each of a plurality of stages of rotor blades.4. The apparatus of claim 1 , wherein the at least one radial clearance sensor comprises a plurality of radial clearance sensors ...

Brain Stimulation for Enhancement of Learning, Motivation, and Memory

A system and method for stimulating a brain structure of a patient for treating a condition. A stimulating electrode is inserted into a brain structure of the patient. After inserting the stimulating electrode into a brain structure of the patient, the patient is prompted with a task. When the task is completed by the patient, the stimulating electrode is used to transmit a stimulating signal into the brain structure of the patient. In an alternative implementation, the patient's brain is monitored for the existence of a particular condition. When the condition is detected, the stimulating electrode is used to transmit a stimulating signal into the brain structure of the patient.

System and method for determining physiological parameters based on electrical impedance measurements

A system and method for determining physiological parameters based on electrical impedance measurements is provided. One method includes obtaining electrical measurement signals acquired from a plurality of transducers coupled to a surface of an object and spatially pre-conditioning the obtained electrical measurement signals. The method also includes performing multiple-input-multiple-output (MIMO) analog to information conversion (AIC) of the spatially pre-conditioned electrical measurement signals to correlate the spatially pre-conditioned electrical measurement signals to separate the electrical measurement signals.

Method and system for ultra miniaturized packages for transient voltage suppressors

A method of forming a silicon carbide transient voltage suppressor (TVS) assembly and a system for a transient voltage suppressor (TVS) assembly are provided. The transient voltage suppressor (TVS) assembly includes a semiconductor die including a contact surface on a single side of the die, the die further including a substrate comprising a layer of at least one of an electrical insulator material, a semi-insulating material, and a first wide band gap semiconductor having a conductivity of a first polarity, at least a TVS device including a plurality of wide band gap semiconductor layers formed on the substrate; a first electrode coupled in electrical contact with the TVS device and extending to the contact surface, and a second electrode electrically coupled to the substrate extending to the contact surface.

DISTRIBUTED GAS TURBINE ENGINE CONTROL SYSTEM

In one embodiment, a gas turbine engine control system includes an engine controller configured to control multiple parameters associated with operation of a gas turbine engine system. The gas turbine engine control system also includes multiple remote interface units communicatively coupled to the engine controller. The remote interface unit is configured to receive an input signal from the engine controller indicative of respective target values of at least one parameter, and the remote interface unit is configured to provide closed-loop control of the at least one parameter based on the input signal and feedback signals indicative of respective measured values of the at least one parameter. 1. A gas turbine engine control system , comprising:an engine controller configured to control a plurality of parameters associated with operation of a gas turbine engine system; anda plurality of remote interface units communicatively coupled to the engine controller, wherein the remote interface unit is configured to receive an input signal from the engine controller indicative of respective target values of at least one parameter of the plurality of parameters, and the remote interface unit is configured to provide closed-loop control of the at least one parameter based on the input signal and feedback signals indicative of respective measured values of the at least one parameter.2. The gas turbine engine control system of claim 1 , wherein the remote interface unit comprises an actuator configured to adjust the at least one parameter claim 1 , and a sensor configured to output the feedback signals.3. The gas turbine engine control system of claim 1 , wherein at least one remote interface unit comprises a multiple local loop closure module configured to provide closed-loop control of a respective set of the plurality of parameters.4. The gas turbine engine control system of claim 1 , wherein at least one remote interface unit comprises a plurality of local loop closure ...

METHOD AND SYSTEM FOR LIGHTNING PROTECTION WITH DISTRIBUTED TRANSIENT VOLTAGE SUPPRESSION

A method of method of forming a wide band-gap semiconductor transient voltage suppressor (TVS) assembly and a system for a transient voltage suppressor (TVS) assembly are provided. The TVS assembly includes a connecting component configured to electrically couple a first electrical component to a second electrical component located remotely from the first electrical component through one or more electrical conduits and a transient voltage suppressor device positioned within the connecting component and electrically coupled to the one or more electrical conduits wherein the TVS device includes a wide band-gap semiconductor material. 1. An electrical system comprising:a plurality of distributed electrical components, at least some of the plurality of distributed electrical components positioned remotely from other ones of the plurality of distributed electrical components, at least some of the plurality of distributed electrical components electrically coupled through respective electrical conduits to other ones of the plurality of distributed electrical components; anda networked distributed protection system comprising a plurality of transient voltage suppression (TVS) devices electrically coupled to at least one of said electrical conduits and said distributed electrical components, said TVS devices positioned proximate said at least one of said electrical conduits and said distributed electrical components providing a plurality of electrical dissipation paths for each distributed electrical component through the electrical conduits and TVS devices.2. A system in accordance with claim 1 , wherein said electrical system comprises at least one of an airframe electrical system claim 1 , an aircraft engine electrical system claim 1 , an unmanned vehicle electrical system claim 1 , a wind turbine electrical system claim 1 , a power generation electrical system claim 1 , and a power distribution and transmission electrical system.3. A system in accordance with claim 1 , ...

METHOD FOR SOLID OXIDE FUEL CELL FABRICATION

A method of making a solid oxide fuel cell (SOFC) includes forming a first sublayer of a first electrode on a first side of a planar solid oxide electrolyte and drying the first sublayer of the first electrode. The method also includes forming a second sublayer of the first electrode on the dried first sublayer of the first electrode prior to firing the first sublayer of the first electrode, firing the first and second sublayers of the first electrode during the same first firing step, and forming a second electrode on a second side of the solid oxide electrolyte. 1. A method of making a solid oxide fuel cell (SOFC) , comprising:forming a first sublayer of a first electrode on a first side of a planar solid oxide electrolyte;drying the first sublayer of the first electrode;forming a second sublayer of the first electrode on the dried first sublayer of the first electrode prior to firing the first sublayer of the first electrode;firing the first and second sublayers of the first electrode during a same first firing step; andforming a second electrode on a second side of the solid oxide electrolyte.2. The method of claim 1 , wherein the step drying is conducted at a first temperature claim 1 , the step of firing is conducted at a second temperature claim 1 , and the first temperature is at least three times less than the second temperature.3. The method of claim 2 , wherein the first temperature is less than 150 C and the second temperature is greater than 1000 C.4. The method of claim 1 , wherein the first electrode comprises an anode electrode.5. The method of claim 4 , wherein:the first sublayer of the anode electrode comprises a cermet comprising a nickel containing phase and a doped ceria containing phase;the second sublayer of the anode electrode comprises a cermet comprising a nickel containing phase and a doped ceria containing phase; andthe first sublayer of the anode electrode contains a lower ratio of the nickel containing phase to the ceramic phase than ...

Wireless sensors, detection methods, and systems

A wireless sensor including a resistive element, a modulating element located on a rotating component and at least one of a transmitting element and a receiving element, wirelessly coupled to the modulating element. The modulating element is configured to modulate the wireless coupling, between the at least one of a transmitting element and a receiving element, in response to a change in resistance in the resistive element. The modulation of the wireless coupling is indicative of a measurand on the rotating component. A method of detecting a measurand in a rotating component of a rotary machine includes wirelessly coupling at least one of a transmitting element and a receiving element to a modulating element; modulating the wireless coupling with the modulating element located on the rotating component; and calculating the measurand in the rotating component based on the modulation of the wireless coupling.

ROTATIONAL CLEARANCE MEASUREMENT SYSTEM AND METHOD OF OPERATION

A radial clearance measurement system is provided. The radial clearance measurement system comprises a radial clearance sensor that is relatively insensitive to axial movement of an object rotating relative to the radial clearance sensor. In one embodiment, the radial clearance sensor includes an electrode having a relatively constant overlap area over the range of axial movement of the object. 1. A capacitive clearance probe , comprising:a probe body; and 'an electrode head having a substantially uniform overlap area within a range of axial movement of a component that rotates relative to the capacitive clearance probe.', 'an electrode fitted within the probe body, the electrode comprising2. The capacitive clearance probe of claim 1 , wherein the electrode comprises a hollow electrode.3. The capacitive clearance probe of claim 1 , comprising a cable connected to the probe body.4. The capacitive clearance probe of claim 3 , comprising a conductor connecting the cable to the electrode.5. The capacitive clearance probe of claim 1 , wherein the probe body comprises a ceramic head in which the electrode is fitted.6. The capacitive clearance probe of claim 1 , wherein the probe body comprises:two or more metallic main body pieces fitted together; anda ceramic head piece fitted to the metallic main body pieces, wherein the electrode is fitted within the ceramic head piece.7. The capacitive clearance probe of claim 1 , wherein the electrode head has a width selected to be less than a corresponding width of a reference feature provide on the component.8. The capacitive clearance probe of claim 1 , comprising a leak tube connecting an internal cavity of the probe body and an exterior environment.9. The capacitive clearance probe of claim 1 , wherein the capacitive clearance probe is hermetically sealed.10. The capacitive clearance probe of claim 1 , comprising a mount assembly configured to hold the probe body and to mount the probe body to a housing of a rotating machine ...

METHOD AND SYSTEM FOR TRANSIENT VOLTAGE SUPPRESSORS

A method of forming a silicon carbide transient voltage suppressor (TVS) assembly and a system for a transient voltage suppressor (TVS) assembly are provided. The TVS assembly includes a semiconductor die in a mesa structure that includes a first layer of a first wide band gap semiconductor having a conductivity of a first polarity, a second layer of the first or a second wide band gap semiconductor having a conductivity of a second polarity coupled in electrical contact with the first layer wherein the second polarity is different than the first polarity. The TVS assembly also includes a third layer of the first, the second, or a third wide band gap semiconductor having a conductivity of the first polarity coupled in electrical contact with the second layer. The layer having a conductivity of the second polarity is lightly doped relative to the layers having a conductivity of the first polarity. 1. A method of forming a silicon carbide transient voltage suppressor (TVS) assembly , said method comprising:providing a punch-through silicon carbide semiconductor transient voltage suppressor die that includes a first side and an opposite second side;encapsulating the die in a glass housing at least partially surrounding said die; andcoupling a respective electrode in electrical communication with each of the first and the second sides, each electrode having a coefficient of thermal expansion that substantially matches a coefficient of thermal expansion of the glass housing.2. A method in accordance with wherein providing the die comprises:providing a silicon carbide substrate having a first surface and an opposite second surface;diffusing a dopant of a first conductivity type into the substrate forming a silicon carbide layer having a conductivity of a first polarity;epitaxially forming a layer having a conductivity of a second polarity over at least a portion of the first surface; andepitaxially forming a layer having a conductivity of a first polarity over at least a ...

INTEGRATED CIRCUIT AND METHOD OF FABRICATING SAME

An integrated circuit includes a plurality of transistors. Each transistor is associated with a corresponding body terminal. At least one transistor is reverse biased at a first voltage level, and at least one other transistor is reverse biased at a second voltage level that is different from the first voltage level. Each body terminal is electrically isolated from every other body terminal via an isolation barrier. A transistor that is reverse biased at the first voltage level is electrically connected to a transistor that is reverse biased at the second voltage level, such that the electrically connected transistors operate to interact with each other while the respective body voltage levels are different from each other and are changing independently of each other during operation of the integrated circuit. 1. An integrated circuit , comprising:a first transistor and a corresponding body terminal, wherein the first transistor is reverse biased at a first body voltage level; anda second transistor and a corresponding body terminal electrically isolated from the first transistor body terminal, wherein the second transistor is reverse biased at a second body voltage level different from the first body voltage level, and further wherein the first transistor is electrically connected to the second transistor, such that the first and second transistors operate to interact with each other while the respective body voltage levels are different from each other and are changing independently of each other during operation of the integrated circuit.2. The integrated circuit according to claim 1 , wherein the first and second transistors comprise depletion mode transistors claim 1 , enhancement mode transistors claim 1 , or a combination of depletion mode transistors and enhancement mode transistors.3. The integrated circuit according to claim 1 , wherein the first and second transistors comprise MOSFET devices.4. The integrated circuit according to claim 1 , wherein the ...

ELECTRONIC CIRCUIT BOARD, ASSEMBLY AND A RELATED METHOD THEREOF

An apparatus includes a substrate and a plurality of conductive traces formed on the substrate. The conductive traces are doped with a concentration of an aluminum material forming a protective layer as a portion of the plurality of conductive traces to inhibit oxidation. A set of first metal contact pads are formed in contact with the plurality of conductive traces. The substrate, the plurality of conductive traces and the set of first metal contact pads define an electronic circuit board configured to operate at a temperature greater than 200 degrees Celsius. A high operating temperature electronic device is configured in electrical communication with the conductive traces defining an assembly configured to operate at a temperature greater than 200 degrees Celsius. 1. An apparatus comprising:a substrate;a plurality of conductive traces formed on the substrate, the plurality of conductive traces comprising a conductive material doped with a concentration of an aluminum material to form a protective layer as a portion of the plurality of conductive traces to inhibit oxidation; anda set of first metal contact pads in contact with the plurality of conductive traces,wherein the substrate, the plurality of conductive traces and the set of first metal contact pads define an electronic circuit board configured to operate at a temperature greater than 200 degrees Celsius.2. The apparatus of claim 1 , wherein the substrate claim 1 , the plurality of conductive traces and the set of first metal contact pads define an electronic circuit board configured to operate at a temperature greater than 260 degrees Celsius.3. The apparatus of claim 1 , wherein the substrate claim 1 , the plurality of conductive traces and the set of first metal contact pads define an electronic circuit board configured to operate at a temperature greater than 350 degrees Celsius.4. The apparatus of claim 1 , wherein the substrate comprises a ceramic material.5. The apparatus of claim 1 , wherein the ...

METHOD AND SYSTEM FOR ULTRA MINIATURIZED PACKAGES FOR TRANSIENT VOLTAGE SUPPRESSORS

A high temperature electronic system includes an electronics unit configured for exposure to an environment having a temperature greater than approximately 150.0° C. The remote electronics unit includes a transient voltage suppressor (TVS) assembly coupled in operative relationship with at least some electronic components of the electronics unit. The TVS assembly includes at least one TVS device comprising at least one of a punch-through wide band-gap semiconductor TVS die and an avalanche breakdown wide band-gap semiconductor TVS die encapsulated in a flip-chip package at least partially surrounding the die, and coupled to first and second electrodes exposed to a single side of the encapsulation. 1. A high temperature electronic system comprising an electronics unit configured for exposure to an environment having a temperature greater than approximately 150.0° C. , said remote electronics unit comprising a transient voltage suppressor (TVS) assembly coupled in operative relationship with at least some electronic components of the electronics unit , said TVS assembly comprising at least one TVS device comprising at least one of a punch-through wide band-gap semiconductor TVS die and an avalanche breakdown wide band-gap semiconductor TVS die encapsulated in a flip-chip package at least partially surrounding said die , and coupled to first and second electrodes exposed to a single side of the encapsulation.2. A high temperature electronic system according to claim 1 , wherein said die comprises a plurality of TVS assemblies each comprising separate first electrical connections and second electrical connections electrically coupled to a common bus claim 1 , said first electrical connections and said second electrical connections all exposed to the single side of the encapsulation.3. A high temperature electronic system according to claim 1 , wherein said die comprises a plurality of TVS assemblies each comprising separate first and second electrodes exposed to the ...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

A photoresist composition comprising: a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group; a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-substituted aryl group; a photoacid generator; and a solvent, wherein the first polymer and the second polymer are different from each other. 1. A photoresist composition comprising:a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group;a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-aryl group;a photoacid generator; anda solvent,wherein the first polymer and the second polymer are different from each other.5. The photoresist composition of claim 1 , wherein the first polymer or the second polymer comprises a repeating unit comprising the photoacid generator.6. The photoresist composition of claim 5 , further comprising a non-polymeric photoacid generator.7. The photoresist composition of claim 1 , further comprising a photo-decomposable quencher.8. The photoresist composition of claim 1 , further comprising a base-labile material comprising one or more base-labile groups claim 1 , wherein the base-labile material is different from the first polymer and the second polymer.9. The photoresist composition of claim 1 , wherein a weight ratio of the first polymer to the second polymer is from 1:4 to 4:1.10. A ...

RESINS FOR UNDERLAYERS

Polymeric reaction products of certain substituted tetraarylmethane monomers are useful as underlayers in semiconductor manufacturing processes. 2. The polymeric reaction product of wherein AG is OR.5. The polymeric reaction product of wherein Ar claim 1 , Ar claim 1 , Arand Arare independently chosen from phenyl claim 1 , biphenyl claim 1 , naphthalenyl claim 1 , anthracenyl claim 1 , phenanthrenyl claim 1 , pyrenyl claim 1 , tetracenyl claim 1 , triphenylenyl claim 1 , tetraphenyl claim 1 , benzo[f]tetraphenyl claim 1 , benzo[m]tetraphenyl claim 1 , benzo[k]tetraphenyl claim 1 , pentacenyl claim 1 , perylenyl claim 1 , benzo[a]pyrenyl claim 1 , benzo[e]pyrenyl claim 1 , benzo[ghi]perylenyl claim 1 , coronenyl claim 1 , quinolonyl claim 1 , 7 claim 1 ,8-benzoquinolinyl claim 1 , fluorenyl claim 1 , chrysenyl claim 1 , triphenylenyl claim 1 , and 12H-dibenzo[b claim 1 ,h]fluorenyl.6. A composition comprising the polymeric reaction product of claim 1 , an organic solvent claim 1 , and optionally one or more additives chosen from curing agents and surfactants.7. The composition of wherein the curing agent is an acid or a thermal acid generator.8. A method of forming a patterned layer comprising disposing a layer of the composition of on a substrate; removing organic solvent to form a polymeric underlayer; disposing a layer of a photoresist on the polymeric underlayer; exposing the photoresist layer to actinic radiation through a mask; developing the exposed photoresist layer to form a resist pattern; and transferring the pattern to the polymeric underlayer to expose portions of the substrate. The present invention relates generally to field of manufacturing electronic devices, and more specifically to the field of materials for use in semiconductor manufacture.It is well-known in lithographic processes that a resist pattern can collapse due to surface tension from the developer used if the resist pattern is too tall (high aspect ratio). Multilayer resist processes ( ...

Electrical component with a dielectric passivation stack

An electrical component and method for manufacturing the electrical component with a substrate a conductor stack having multiple layers and including at least one electrically conductive path. The conductor stack mounted to the substrate with a dielectric passivation stack encasing at least a portion of the conductor stack.

Apparatus with saw-toothed blade for cutting tissue

A tissue splitting device for splitting a harvested soft tissue to provide a layer of tissue having a uniform thickness and methods for tissue transplantation using uniform layers of tissue.

METHOD FOR FORMING PATTERN USING ANTIREFLECTIVE COATING COMPOSITION INCLUDING PHOTOACID GENERATOR

An antireflective coating composition, including a polymer, a photoacid generator having a crosslinkable group, a compound capable of crosslinking the polymer and the photoacid generator, a thermal acid generator, and an organic solvent. 1. An antireflective coating composition , comprising:a polymer,a photoacid generator comprising a crosslinkable group,a compound capable of cros slinking the polymer and the photoacid generator,a thermal acid generator, andan organic solvent.9. A coated substrate claim 1 , comprising (a) a substrate; and (b) a layer of a antireflective coating composition of disposed over the substrate.10. A method of forming a pattern claim 1 , comprising: (a) applying a layer of the antireflective coating composition of over a substrate; (b) curing the applied antireflective coating composition to form an antireflective layer; (c) forming a photoresist layer over the antireflective layer; and (d) patterning the photoresist layer and transferring the pattern from the patterned photoresist layer to the antireflective layer.11. The method of claim 10 , wherein the patterning the photoresist layer and transferring the pattern from the patterned photoresist layer to the antireflective layer comprises: (d)(1) exposing the photoresist layer and the antireflective layer to activating radiation claim 10 , and (d)(2) developing the exposed photoresist layer and antireflective layer with an organic solvent developer. The present disclosure generally relates to antireflective coating compositions for use with photoresist applications. Specifically, the disclosure provides antireflective compositions for improving a pattern collapse margin in negative tone development.A photoresist is a photosensitive composition which is used to transfer an image to a substrate. A coating layer of the photoresist is formed on the substrate, and then exposed to actinic radiation through a photomask. The photomask has regions which are opaque and transparent to actinic ...

Wireless Emergency Alert Notifications

An approach is described for sending alert messages and notifications to individual devices and in a format understandable by a user of the communication device. 1. A safety alarm system that signals an emergency condition , comprising:a notification server with a network interface; andan alert message received at the network interface, where the alert message results in another message being formatted for transmission to communication devices and provides notice of the emergency condition, wherein the selection of the communication devices by the server occurs independent of data in the alert message.2. The safety alarm system of claim 1 , where the notification server is an internet notification server and the alert message is received via the internet.3. The safety alarm system of claim 1 , where the alert message is a text message and results in an audio message as the other message that is generated by a text-to-speech translation module.4. The safety alarm system of claim 3 , where the audio message is changed from a first language to a second language by the multilingual speech translation module.5. The safety alarm system of claim 1 , where the alert message is a text message having a first language and results in an audio message as the other message with the audio message having a second language.6. The safety alarm system of claim 1 , where the notification severs is a cloud gateway sever and the other message is sent for receipt by a cloud push notify service.7. The safety alarm system of claim 1 , where the notification server is an internet notification server where the other message is a digital audio message formatted for transmission by an emergency notification module for receipt by communication devices.8. The safety alarm system of claim 1 , where the alert message is a digital audio message that results in a text message as the other message by the speech-to-text translation module.9. The safety alarm system of claim 8 , where the text message ...

Capacitive Sensor Device and Method of Manufacture

A capacitive sensor device and a method of manufacture are provided. The capacitive sensor device includes at least one sensor tip that includes an electrode positioned at a first end of the sensor tip, and a stem member coupled to the electrode and extending toward a second end of the sensor tip. The device also includes a coaxial cable including a center conductor, the center conductor coupled to the sensor tip at the second end, and an insulation layer supporting the sensor tip between the first and second ends. The insulation layer includes a metallization on a portion surrounding the second end of the sensor tip. The device further includes a casing surrounding a portion of the coaxial cable, the metallization, and the coupling of the center conductor and the sensor tip, wherein a braze joint is formed between the casing and the metallization to form a hollow, hermetic cavity. 1. A capacitive sensor device comprising:at least one sensor tip comprising an electrode positioned at a first end of said at least one sensor tip, and a stem member coupled to said electrode and extending toward a second end of said at least one sensor tip;a coaxial cable comprising a center conductor, the center conductor coupled to said at least one sensor tip at the second end;an insulation layer supporting said at least one sensor tip between the first and second ends, said insulation layer including a metallization on a portion surrounding the second end of said at least one sensor tip; anda casing surrounding a portion of said coaxial cable, the metallization of said insulation layer, and the coupling of said center conductor and said at least one sensor tip, wherein a braze joint is formed between said casing and the metallization to form a hollow, hermetic cavity.2. A device in accordance with claim 1 , wherein said center conductor is coupled to an inner surface of said at least one sensor tip through a recess in the second end of said at least one sensor tip using a weld joint. ...

PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING THE PHOTORESIST AND METHOD OF MAKING AN ARTICLE

A compound having the formula (I): 2. The compound of claim 1 , wherein a is an integer of from 1 to 4 claim 1 , x is 1 claim 1 , Xis a 1 claim 1 ,1 claim 1 ,1 claim 1 ,3 claim 1 ,3 claim 1 ,3-hexafluoroisopropanol-containing group claim 1 , and Y is —O— claim 1 , —S— claim 1 , NR— claim 1 , —O—C(C═O)— claim 1 , —C(C═O)—O— claim 1 , —O—C(C═O)—O— claim 1 , —OCH—(C═O)O— claim 1 , —OCHC(═O)— claim 1 , —SO— claim 1 , —O—SO— claim 1 , or a combination comprising at least one of the fore going groups claim 1 , wherein R is H or Calkyl.3. The compound of claim 1 , wherein Ar is a substituted or unsubstituted phenylene claim 1 , naphthylene claim 1 , anthracenylene claim 1 , phenanthrenylene claim 1 , quinolinylene claim 1 , dibenzothiophenylene claim 1 , thioxanthone claim 1 , thiooxaanthracenylene claim 1 , or a combination comprising at least one of the foregoing.4. The compound of claim 1 , wherein Ris independently a substituted Caryl or a Calkyl claim 1 , wherein when x is 1 claim 1 , the two groups Rare separate or bonded to each other to form a Cring structure.7. The compound of claim 1 , wherein Z has the formula (II):{'br': None, 'sup': 4', '5', '−, 'sub': 2', 'm', '2', 'n', '3, 'A-(L)-(C(R))—(C(R))—SO\u2003\u2003(II)'}wherein{'sub': 3', '3, 'A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic Cor greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, or a Cor greater aliphatic or cycloaliphatic group containing a polymerizable double or triple bond,'}{'sup': 4', '4', '4, 'sub': '1-30', 'Ris H, a single bond, or a substituted or unsubstituted Calkyl group, wherein when Ris a single bond, Ris covalently bonded to a carbon atom of A,'}{'sup': 5', '5, 'sub': '1-4', 'each Ris independently H, F, or Cfluoroalkyl, wherein at least one Ris not hydrogen,'}L is a linking group comprising an —O—, —S—, —C(C═O)—, carbonate, carboxylate, sulfonate, sulfate, or a sulfonamide group, ...

Autonomous driving algorithm evaluation and implementation

Methods and systems for autonomous driving algorithm evaluation are described herein. A computing device may receive, via telematics sensors associated with a vehicle, telematics data corresponding to one or more trips taken by the vehicle during a period of time. Portions of the telematics data corresponding to use of an autonomous driving algorithm may be determined. One or more performance metrics of the autonomous driving algorithm may be determined based on the portions of the telematics data corresponding to use of the autonomous driving algorithm. The one or more performance metrics may be compared to one or more other performance metrics, such as those corresponding to other autonomous driving algorithms. An autonomous vehicle score may be assigned to the autonomous driving algorithm. Based on the autonomous vehicle score, an indication of a second autonomous driving algorithm may be sent to the vehicle.

Driver behavior tracking and prediction

Methods and systems for tracking driver behavior across a variety of vehicles are described herein. One or more first performance metrics which indicate performance of a first vehicle when driven by a user may be determined. One or more second performance metrics indicating performance of a second vehicle when driven by the user may be determined. The first vehicle and the second vehicle may be compared to determine a vehicle difference. The performance metrics may be compared. One or more third performance metrics that predict performance of a third vehicle, different from the first vehicle and the second vehicle, when driven by the user may be determined based on the vehicle difference and the comparison. Whether to provide the user access to the third vehicle may be determined based on the one or more third performance metrics.

UNDERLAYER COMPOSITIONS AND PATTERNING METHODS

An underlayer composition, comprising a polymer comprising a repeating unit of formula (1):

MANAGING DIVING ACTIVITIES BY WIRELESS DATA COMMUNICATION

A portable diver device () for managing diving activities for a diver, wherein the portable diver device () comprises at least one data storage unit () storing identification data being indicative of an identity of the diver and optionally storing diving related data related to the diver, and a wireless data communications interface () configured for wirelessly communicating at least one of the group consisting of the identification data and the diving related data with a diving activities management apparatus (), when the portable diver device () is in sufficient spatial vicinity of the diving activities management apparatus (). 1. A portable diver device for managing diving activities for a diver , the portable diver device comprising:at least one data storage unit storing identification data being indicative of an identity of the diver and optionally storing diving related data related to the diver;and a wireless data communications interface configured for wirelessly communicating at least one of the group consisting of the identification data and the diving related data, with a diving activities management apparatus when the portable diver device is in sufficient spatial vicinity of the diving activities management apparatus.2. The device of claim 1 , wherein the wireless data communications interface is configured for wirelessly communicating the data by one of the group consisting of Near Field Communication claim 1 , Radio Frequency Identification claim 1 , and infrared communication.3. The device of claim 1 , configured to be wearable by or attachable to the diver.4. The device of claim 1 , configured as one of the group consisting of a tag such as an NFC tag or an RFID tag claim 1 , a bracelet claim 1 , a watch claim 1 , and a dive computer.5. The device of claim 1 , configured to be waterproof and dive pressure resistant.6. The device of claim 1 , comprising at least one sensor configured for sensing dive related data during a dive of the diver and for ...

PHOTOACID-GENERATING COMPOUND, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE PHOTOACID-GENERATING COMPOUND OR POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE

A photoacid-generating compound has the structure 8. A polymer comprising repeat units derived from the photoacid-generating compound of .9. A photoresist composition comprising the photoacid-generating compound of .10. A method of forming a photoresist relief image claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00009', 'claim 9'}, '(a) applying a layer of the photoresist composition of on a substrate to form a photoresist layer;'}(b) pattern-wise exposing the photoresist layer to activating radiation to form an exposed photoresist layer; and(c) developing the exposed photoresist layer to provide a photoresist relief image.11. A photoresist composition comprising the polymer of . The present invention relates to a photoacid-generating compound, a polymer formed from an embodiment of the photoacid-generating compound comprising a polymerizable group, a photoresist composition comprising the photoacid-generating compound, the polymer, or a combination thereof, and a method of forming a photoresist relief image with the photoresist composition.Advance lithographic techniques such as electron beam and Extreme Ultraviolet (EUV) lithographies are being used for the formation of fine patterns. Further shrinking of pattern size to 25 nanometers and less requires, in addition to other process and exposure tool related requirements, the development of highly resolving chemically amplified photoresist compositions. The use of slow diffusion photoacid-generating (PAG) compounds has proved to be critical for the improvement in resolution and pattern quality. Slow acid diffusion in a chemically amplified photoresist composition was achieved by attaching the acidic unit to one or more bulky substituents. However, the use of bulky substituents often decreases the solubility of the PAG compound, which is associated with PAG compound aggregation and/or inhomogeneous PAG compound distribution in the photoresist layer, and with the formation of defects during and after lithographic ...

PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE

A photoacid generator compound has formula (1) 7. A photoresist composition comprising:an acid-sensitive polymer, and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the photoacid generator compound of .'}8. A coated substrate comprising:(a) a substrate having one or more layers to be patterned on a surface thereof; and{'claim-ref': {'@idref': 'CLM-00007', 'claim 7'}, '(b) a layer of the photoresist composition of over the one or more layers to be patterned.'}9. A method of forming an electronic device , comprising:{'claim-ref': {'@idref': 'CLM-00007', 'claim 7'}, '(a) applying a layer of a photoresist composition of on a substrate;'}(b) pattern-wise exposing the photoresist composition layer to activating radiation; and(c) developing the exposed photoresist composition layer to provide a resist relief image.10. The method of claim 9 , wherein the activating radiation is extreme ultraviolet (EUV) or electron-beam radiation. The present invention relates to photoacid generators and their use in photoresist compositions.Advanced lithographic techniques such as 193 nanometer immersion lithography have been developed to achieve high quality and smaller feature sizes in microlithography processes, for purposes of forming ever-smaller logic and memory transistors. It is important to achieve both smaller critical dimension (CD) in the imaged photoresist used in the microlithography process, and for the photoresists to provide both the lowest line edge roughness (LER) and line width roughness (LWR), while still retaining good process control tolerances such as high exposure latitude (EL) and a wide depth of focus (DOF). Also important is low mask error factor (MEF), which is defined as the ratio of critical dimension (CD) change on the resolved resist pattern to the dimension change on the mask pattern.To meet the challenges for photoresist materials raised by high resolution lithography, photoacid generators (PAGs) have been made that are soluble in aqueous developers ...

Sensing system and method

A sensor system includes an electrical circuit having plural leads coupled with one or more sensing regions. The sensing regions include gaps having sensing materials that detect an analyte of interest. The gaps close responsive to the sensing material corresponding to the gaps detecting the analyte of interest. One or more processors communicatively coupled with the electrical circuit receive electrical signals from the electrical circuit indicative of the gaps closing responsive to the sensing material of the corresponding gaps detecting the analyte of interest. The electrical circuit is in a closed position in the presence of the analyte of interest. The sensor system is configured to consume an increased amount of power when the electrical circuit is in the closed position relative to the electrical circuit in an open position responsive to the one or more of the gaps closing. A responsive action is determined based on the electrical signals.

Adjustable Termination Circuit for High Speed Laser Driver

Disclosed is a circuit having a high speed laser driver circuit, a semiconductor laser electrically connected to the high speed laser driver circuit, and an adjustable termination circuit electrically connected between the high speed laser driver circuit and the semiconductor laser, where the adjustable termination circuit is configured to control an output impedance seen by the semiconductor laser as a function of an input current provided to the adjustable termination circuit.

MONOLITHIC GAS-SENSING CHIP ASSEMBLY AND METHOD

A monolithic gas-sensing chip assembly for sensing a gas analyte includes a sensing material to detect the gas analyte, a sensing system including a resistor-capacitor electrical circuit, and a heating element. A sensing circuit measures an electrical response of the sensing system to an alternating electrical current applied to the sensing system at (a) one or more different frequencies, or (b) one or more different resistor-capacitor configurations of the system. One or more processors control a low detection range of the system to the gas, a high detection range of the system to the gas, a linearity of a response of the system to the gas, a dynamic range of measurements of the gas by the system, a rejection of interfering gas analytes by the system, a correction for aging or poisoning of the system, or a rejection of ambient interferences that may affect the electrical response of the system. 1. A monolithic gas-sensing chip assembly for sensing at least one gas analyte , the chip assembly comprising:a sensing material configured to detect the at least one gas analyte;a sensing system that includes a resistor-capacitor electrical circuit in contact with the sensing material;a heating element configured to control a temperature of the sensing material of the sensing system;a sensing circuit configured to measure an electrical response of the sensing system to an alternating electrical current applied to the sensing system at one or more of: (a) one or more different frequencies or (b) one or more different resistor-capacitor configurations of the sensing system; andone or more processors configured to control one or more of a low detection range of the sensing system to the at least one gas analyte, a high detection range of the sensing system to the at least one gas analyte, a linearity of a response of the sensing system to the at least one gas analyte, a dynamic range of measurements of the at least one gas analyte by the sensing system, a rejection of one or ...

POLYMERIC CHARGE TRANSFER LAYER AND ORGANIC ELECTRONIC DEVICE COMPRISING THE SAME

Polymeric charge transfer layer compositions suitable for organic layers of electronic devices that show reduced driving voltage and increased luminous efficiency. 2. The polymeric charge transfer layer composition according to claim 1 , wherein Monomer A is present in an amount of at least 54% by mole claim 1 , based on the total moles of all monomers in the polymer.4. The polymeric charge transfer layer composition according to wherein the polymer further comprises claim 1 , as polymerized unit claim 1 , at least one Monomer B having the following Structure B:{'br': None, 'sub': 2', '2', '3, 'R—CHO—R\u2003\u2003(Structure B),'}{'sub': 2', '3, 'wherein Rand Rare each independently selected from the group consisting of hydrogen, deuterium, a substituted or unsubstituted hydrocarbyl, a substituted or unsubstituted heterohydrocarbyl, a halogen, a cyano, a substituted or unsubstituted aryl, and a substituted or unsubstituted heteroaryl.'}5. The polymeric charge transfer layer composition according to claim 4 , wherein Monomer B is present in an amount of at most 46% by mole claim 4 , based on the total moles of all monomers in the polymer.7. The polymeric charge transfer layer composition according to claim 1 , wherein it further comprises a p-dopant selected from ionic compounds including trityl salts claim 1 , ammonium salts claim 1 , iodonium salts claim 1 , tropylium salts claim 1 , imidazolium salts claim 1 , phosphonium salts claim 1 , oxonium salts claim 1 , and mixtures thereof.8. The polymeric charge transfer layer composition according to claim 7 , wherein the ionic compounds are selected from trityl borates claim 7 , ammonium borates claim 7 , iodonium borates claim 7 , tropylium borates claim 7 , imidazolium borates claim 7 , phosphonium borates claim 7 , oxonium borates claim 7 , and mixtures thereof.10. The polymeric charge transfer layer composition according to claim 7 , wherein the p-dopant is present at an amount of from 1% to 20% by weight claim 7 , ...

Imaging spectropolarimeter

An imaging spectropolarimeter for examining targets with polarized light, the spectropolarimeter including a light source adapted to produce polarized light directed at a target. Embodiments also include a three-camera camera system defining a three-camera camera axis with a first camera unit comprising a first analyzer set at 0°, a lens and a first multi-pixel sensor, a second camera unit comprising a second analyzer set at 45°, a lens and a second multi-pixel sensor, and a third camera unit comprising a third analyzer set at 90°, a lens and a third multi-pixel sensor. At least two beam splitters adapted to direct a portion of polarized light reflected from the target to each of the first, second and third camera units. Preferred systems include a processor adapted to produce polarimetric images of the target utilizing intensity information collected by the multi-pixel sensors. 1. An imaging spectropolarimeter for examining targets with polarized light , the spectropolarimeter comprising:A) a light source adapted to produce polarized light directed at a target, 1) a first camera unit comprising a first analyzer set at 0°, a lens and a first multi-pixel sensor,', '2) a second camera unit comprising a second analyzer set at 45°, a lens and a second multi-pixel sensor,', '3) a third camera unit comprising a third analyzer set at 90°, a lens and a third multi-pixel sensor,, 'B) a three-camera system comprisingC) at least two beam splitters adapted to direct a portion of polarized light reflected from the target to each of the first, second and third camera units,D) a processor adapted to produce polarimetric images of the target utilizing intensity information collected by the multi-pixel sensors.2. The imaging spectropolarimeter as in wherein the polarized light source is comprised of a light source claim 1 , a filter and a polarizer.3. The imaging spectropolarimeter as in wherein the camera system is adapted to monitor specular reflections.4. The imaging ...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

A photoresist composition comprises a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group, wherein the first polymer does not comprise a lactone group; a second polymer comprising a first repeating unit comprising a hydroxy-aryl group, a second repeating unit comprising an acid-labile group, and a third repeating unit comprising a lactone group; a photoacid generator; and a solvent. 1. A photoresist composition comprising:a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group, wherein the first polymer does not comprise a lactone group;a second polymer comprising a first repeating unit comprising a hydroxy-aryl group, a second repeating unit comprising an acid-labile group, and a third repeating unit comprising a lactone group;a photoacid generator; anda solvent.5. The photoresist composition of any one of claim 1 , wherein the photoacid generator is non-polymeric.6. The photoresist composition of claim 1 , wherein the photoacid generator comprises a sulfonate group on the anion claim 1 , andthe photoresist composition further comprises a second photoacid generator that is non-polymeric, wherein the second photoacid generator comprises an anion that is free of sulfonate groups.7. The photoresist composition of claim 1 , further comprising a photo-decomposable quencher.8. The photoresist composition of claim 1 , further comprising a base-labile material comprising one or more base-labile groups claim 1 , wherein the base-labile material is different from the first polymer and the second polymer.9. The photoresist composition of claim 1 , wherein a weight ratio of the first polymer to the second polymer is from 1:4 to 4:1.10. A pattern formation method claim 1 , comprising:(a) applying a layer of a photoresist composition on a substrate;(b) pattern-wise exposing the photoresist composition layer ...

LIVE PAGING SYSTEM AND METHODS OF USING THE SAME

Systems, methods, and devices for live paging from a mobile device in operable communication with a fire control panel are provided. Upon an occurrence of a stimulus activity at a fire control panel, e.g., an emergency event, an operator, remote from the fire control panel, may launch a control application from the mobile device. Upon launching the control application, a connection between the mobile device and the fire control panel may be established, and a microphone coupled to the mobile device may be activated for the operator to begin paging. The page may then be broadcasted in real-time via one or more annunciators operably connected to the fire control panel, or, as a recorded message. 1. A fire control panel with paging capabilities comprising:a processor in signal communication with a memory and configured to execute a plurality of instructions of a control panel application stored in the memory and in response to an emergency event; generate a message identifying the emergency event;', 'transmit the message to a mobile device;', 'relinquish the paging capabilities to the mobile device;', 'receive a reply message, via the mobile device, in response to the message;', 'determine whether the reply message identifies an audio file corresponding to the emergency event and resulting from the relinquished paging capabilities; and, 'wherein upon receiving an alert indicative of the emergency event, the processor, under the control of the control panel application, is configured tobroadcast, via one or more notification devices operably connected to the fire control panel, an audio signal in response to determining whether the reply message identifies the audio file.2. The fire control panel of claim 1 ,wherein the reply message includes the audio file; andwherein the broadcasted audio signal is representative of the identified audio file.3. The fire control panel of claim 2 ,wherein the identified audio file is representative of audio received via a microphone ...

Method and apparatus for inter-user equipment coordination signaling

Methods and apparatuses for inter user equipment (UE) coordination signaling. A method of operating a UE includes determining a first set of first sidelink (SL) resources based on SL sensing and resource exclusion; selecting a first one or more SL resources within the first determined set for reservation, transmitting information about the first one or more SL resources, and receiving inter UE co-ordination information indicating whether a SL resource in the first one or more SL resources has a conflict. The method further includes transmitting on one of the first one or more SL resources, when the one SL resource does not have a conflict; and determining a second set of SL resources based on SL sensing and resource exclusion, and selecting a second one or more SL resources within the second set for transmission and reservation, when all of the first one or more SL resources have a conflict.

INTERNET-OF-THINGS-BASED SAFETY SYSTEM

Building safety system architecture, methods, and mediums. A method includes receiving substantially-continuous heartbeat communications from a plurality of safety control devices over a packet data network. The method includes monitoring a status of each of the safety control devices. The method includes aggregating the received statuses of the plurality of safety control devices. The method includes transmitting the aggregated statuses to a cloud safety system. The method includes receiving control commands from the cloud safety system. The method includes controlling the safety control devices according to the received control commands. 1. A method performed by at least one safety control gateway in communication with a plurality of safety control devices , comprising:receiving substantially-continuous heartbeat communications from a plurality of safety control devices over a packet data network;monitoring a status of each of the safety control devices;aggregating the received statuses of the plurality of safety control devices;transmitting the aggregated statuses to a cloud safety system;receiving control commands from the cloud safety system; andcontrolling the safety control devices according to the received control commands,wherein the at least one safety control gateway is also connected to communicate with and control a heating, ventilating and air conditioning system (HVAC), wherein controlling the safety control devices is coordinated with HVAC functions.2. The method of claim 1 , further comprising independently controlling the safety control devices claim 1 , according to an internal configuration of the safety control gateway claim 1 , when the safety control gateway is not in communication with the cloud safety system.3. The method of claim 1 , wherein each heartbeat communication comprises a data packet that identifies one of the plurality of safety control devices by including a specific unique device identifier for that safety control device.4. The ...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

A photoresist composition, comprising an acid-sensitive polymer comprising a repeating unit having an acid-labile group; an iodonium salt comprising an anion and a cation, the iodonium salt having Formula (1):

HISTORY ARCHIVE OF LIVE AUDIO AND METHODS OF USING THE SAME

Systems and methods for archiving data, e.g., log files with live audio, corresponding to an emergency event is provided. Upon an occurrence of a safety event, a notification device, e.g., a smoke detector, detects smoke, and transmits an alert to a fire control panel (FACP). Upon receiving the alert, the FACP generates a log file with data corresponding to the devices responsive to the event. Additionally, a live audio file corresponding to the event is generated, via the FACP or other device. The FACP may then connect to a data controller, via a gateway application, for transmitting the log file and audio file for archiving the same. An audio message of the audio file may then be embedded, via an embedding means, into the log file. 1. A fire control panel with archiving capabilities , comprising:a processor in signal communication with a memory and configured to execute a plurality of instructions of a control panel application stored in the memory and in response to an emergency event; identify one or more devices responsive to the emergency event;', 'identify an audio file representative of an audio message corresponding to the emergency event,', 'generate a log file in response to the emergency event, and record one or more values corresponding to the one or more devices as an entry in the log file; and', 'embed the audio message into the log file via an embedding means., 'wherein upon receiving an alert indicative of the emergency event, the processor, under the control of the control panel application, is configured to2. The fire control panel of claim 1 ,wherein the embedding means is a log file generator residing in the memory of the fire control panel.3. The fire control panel of claim 1 , establish a connection with a data controller operably connected to the fire control panel; and', 'transmit the log file to the data controller., 'wherein the processor, under the control of the control application, is further configured to4. The fire control panel of ...

Device for Performing Regional Anesthesia

An anesthetic administration device comprising an infusion device, which is in fluid connection with a regional anesthetic needle by means of a feed tube. The infusion device comprises one or more anesthetic flow devices capable of triggering forward flow, and optionally backward flow, of the local anesthetic through the regional anesthetic needle. Forward, and optionally backward flow, of the local anesthetic through the regional anesthetic needle is controlled by a controller that comprises one or more actuator switches. The one or more actuator switches are positioned on the device such that they may be operated by hand.

PHOTOACID-GENERATING COMPOUND AND ASSOCIATED POLYMER, PHOTORESIST COMPOSITION, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE

A photoacid-generating compound has the structure 2. The photoacid-generating compound of claim 1 , wherein Rand Rare each independently hydrogen claim 1 , Calkyl claim 1 , or Calkoxycarbonyl.3. The photoacid-generating compound of or claim 1 , wherein n is 1 claim 1 , 2 claim 1 , or 3; and X is independently at each occurrence Calkyl or Calkoxycarbonyl.4. The photoacid-generating compound of any one of - claim 1 , wherein m is zero.7. The photoacid-generating compound of claim 1 , wherein one of Ror Ror Z claim 1 , or one occurrence of X claim 1 , or one occurrence of Y claim 1 , is a polymerizable group claim 1 , provided that if one occurrence of X is the polymerizable group claim 1 , then n is 1 claim 1 , 2 claim 1 , or 3 claim 1 , and provided that if one occurrence of Y is the polymerizable group claim 1 , then m is 1 claim 1 , 2 claim 1 , or 3.8. A polymer comprising repeat units derived from the photoacid-generating compound of .9. A photoresist composition comprising the photoacid-generating compound of any one of to claim 7 , the polymer of claim 7 , or a combination thereof.10. A method of forming a photoresist relief image claim 7 , comprising:{'claim-ref': {'@idref': 'CLM-00009', 'claim 9'}, '(a) applying a layer of the photoresist composition of on a substrate to form a photoresist layer;'}(b) pattern-wise exposing the photoresist layer to activating radiation to form an exposed photoresist layer; and(c) developing the exposed photoresist layer to provide a photoresist relief image. The present invention relates to a photoacid-generating compound useful in photoresists compositions for microlithography.Extreme ultraviolet (EUV) photolithography utilizes radiation at 13.5 nanometer wavelength to create high-resolution features via chemical reactions in a photoresist layer. However, the EUV light source is typically also includes light at higher wavelengths, such as 193 and 248 nanometers. These contaminating wavelengths, sometimes called out-of-band ( ...

Device for performing regional anesthesia

An anesthetic administration device comprising an infusion device, which is in fluid connection with a regional anesthetic needle by means of a feed tube. The infusion device comprises one or more anesthetic flow devices capable of triggering forward flow, and optionally backward flow, of the local anesthetic through the regional anesthetic needle. Forward, and optionally backward flow, of the local anesthetic through the regional anesthetic needle is controlled by a controller that comprises one or more actuator switches. The one or more actuator switches are positioned on the device 1 such that they may be operated by hand.

Power Aware Techniques For Energy Harvesting Remote Sensor Systems

A monitoring system for an aircraft. 1. A method for monitoring operational conditions of an aerodynamic structure , the method comprising:harvesting energy from an immediate environment around the aerodynamic structure;converting the harvested energy into a time varying raw power;conditioning the time varying raw power to produce a time varying available power;monitoring the time varying available power to determine whether the time varying available power is sufficient for executing at least one operation at a sensor node located around the aerodynamic structure;producing a listing of the at least one operation, given that the time varying available power is sufficient for executing the at least one operation;assessing at least one next possible operation of the sensor node, given that the time varying available power is sufficient for executing the at least one operation;determining whether the at least one next possible operation is included in the listing of the at least one operation;establishing a priority order for executing the at least one next possible operation, given that the at least one next possible operation is included in the listing of the at least one operation;allocating the time varying available power such that the sensor node has sufficient power to execute a top priority next possible operation, the top priority next possible operation being pursuant to the priority order for executing the at least one next possible operation; andexecuting the top priority next possible operation, given that the time varying available power is allocated to the sensor node.2. The method of claim 1 , wherein the energy is selected from the group consisting of: electromagnetic energy claim 1 , vibrational energy claim 1 , heat energy claim 1 , wind energy claim 1 , and combinations thereof.3. The method of claim 1 , wherein the sensor node is configured to monitor one selected from the group consisting of: stress claim 1 , strain claim 1 , temperature claim 1 , ...

DENDRITIC COMPOUNDS, PHOTORESIST COMPOSITIONS AND METHODS OF MAKING ELECTRONIC DEVICES

Dendritic compounds are provided. The dendritic compounds include an anionic dendron that has a focal point having an anionic group and a linking group, and a photoreactive cation. The dendritic compounds find particular use as photoacid generators. Also provided are photoresist compositions that include such a dendritic compound, as well as methods of forming electronic devices with the photoresist compositions. The dendritic compounds, photoresist compositions and methods find particular applicability in the manufacture of semiconductor devices. 1. A dendritic compound , comprising:an anionic dendron comprising a focal point comprising an anionic group and a linking group; anda photoreactive cation.3. The dendritic compound of claim 2 , wherein one or more terminal group T comprises an acid labile group.4. The dendritic compound of claim 2 , wherein one or more terminal group T comprises an unprotected group.7. A photoresist composition claim 2 , comprising:an acid-sensitive polymer, and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a dendritic compound of .'}8. A method of forming an electronic device claim 2 , comprising:{'claim-ref': {'@idref': 'CLM-00007', 'claim 7'}, '(a) applying a layer of a photoresist composition of on a substrate;'}(b) patternwise exposing the photoresist composition layer to activating radiation; and(c) developing the exposed photoresist composition layer to provide a resist relief image.9. The method of claim 9 , wherein the activating radiation is EUV radiation.10. The method of claim 8 , wherein the developing is conducted with an organic solvent developer. This application claims the benefit of priority under 35 U.S.C. §119(e) to U.S. Provisional Application No. 61/748,023, filed Dec. 31, 2012, the entire contents of which application are incorporated herein by reference.Advanced lithographic techniques such as 193 nm immersion lithography have been developed to achieve high quality and smaller feature sizes in microlithography ...

PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE

A photoacid generator compound has the formula (1) 7. A polymer comprising a unit formed from the photoacid generator compound of .8. A photoresist composition comprising a polymer of and an acid-sensitive polymer claim 1 , wherein the polymer of and the acid-sensitive polymer are the same or different.9. A photoresist composition comprising an acid-sensitive polymer and the photoacid generator compound of .10. A method of forming an electronic device claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00009', 'claim 9'}, '(a) applying a layer of a photoresist composition of on a substrate;'}(b) pattern-wise exposing the photoresist composition layer to activating radiation; and(c) developing the exposed photoresist composition layer to provide a resist relief image. The present invention relates to photoacid generators and their use in photoresist compositions.Advanced lithographic techniques such as 193 nanometer immersion lithography have been developed to achieve high quality and smaller feature sizes in microlithography processes, for purposes of forming ever-smaller logic and memory transistors. It is important to achieve both smaller critical dimension (CD) in the imaged photoresist used in the microlithography process, and for the photoresists to provide improved line width roughness (LWR) or contact hole dimension uniformity, while still retaining good process control tolerances such as high exposure latitude (EL). Also important is low mask error factor (MEF), which is defined as the ratio of critical dimension (CD) change on the resolved resist pattern to the dimension change on the mask pattern.Photoacid generators are used to generate protons in response to irradiation. The cations of onium salt-based photoacid generators are typically highly hydrophobic, a property that renders the photoacid generators poorly soluble in negative tone developers, such as n-butyl acetate, 2-heptanone, n-butyl propionate or blends made of the aforementioned solvents. The ...

Method for position control for a steering system

A method is described for position control for an electromechanically assisted steering system of a motor vehicle, which has electromechanical steering assistance with an electric motor and at least one controller, wherein a torque to be applied by the electric motor is the controlled variable of the at least one controller, and wherein the controlled system for the design of the at least one controller comprises at least a lower part of the steering system containing the electric motor. A frequency response of the controlled system is determined based on a mathematical model of the controlled system and/or by measuring the controlled system. Controller parameters of the at least one controller are adjusted based on the frequency response of the controlled system.

INTERVENTION FOR TENDINOPATHY

Methods for treating tendinopathy and tendonitis and for preventing tendinopathy are disclosed. 1. A method of treating a soft tissue degradation pathology in a subject comprising administering to the subject an amount of mesenchymal stem cells (MSCs) or tendon stem/progenitor cells (TSPCs) transfected to express CREB-binding protein/p300-interacting protein 2 (CITED2) effective to treat a soft tissue degradation pathology in a subject.2. The method of claim 1 , wherein the soft tissue is cartilage claim 1 , a ligament or a tendon.3. A method of treating a tendinopathy in a subject comprising administering to the subject an amount of mesenchymal stem cells (MSCs) or tendon stem/progenitor cells (TSPCs) transfected to express CREB-binding protein/p300-interacting protein 2 (CITED2) effective to treat a tendinopathy in a subject.4. The method of claim 1 , wherein the MSCs or TSPCs have been obtained from a human prior to their transfection to express CITED2.5. The method of claim 1 , wherein the MSCs or TSPCs have been obtained from a human biceps brachii tendon.6. The method of claim 3 , wherein the tendinopathy is of an Achilles tendon claim 3 , a knee tendon or an arm tendon.7. The method of claim 3 , wherein the tendinopathy does not comprise a ruptured tendon.8. The method of claim 3 , wherein the amount of the MSCs or TSPCs is administered directly to the tendon.9. The method of claim 3 , wherein the amount of the MSCs or TSPCs is implanted into claim 3 , or directly adjacent to claim 3 , the tendon.10. The method of claim 3 , wherein the MSCs or TSPCs are obtained from an adult human prior to their transfection to express CITED2.11. The method of claim 3 , wherein the tendinopathy comprises a tendinosis.12. The method of claim 3 , wherein the tendinopathy comprises a tendonitis.13. The method of claim 3 , wherein the subject is a human.14. The method of claim 1 , wherein the MSCs are administered.15. The method of claim 1 , wherein the TSPCs are administered.16 ...

MINING DETECTION SYSTEM AND METHOD

A device for detecting proximity to an active alternating current (AC) voltage source is provided. The device includes a housing, at least one antenna configured to generate a signal in response to exposure to electromagnetic radiation, signal processing circuitry configured to process the signal generated by the at least one antenna, a microprocessor configured to determine, from the processed signal, whether the alert device is proximate to the active AC voltage source, a communication device configured to generate a signal in response to a determination that the alert device is proximate the active AC voltage source, and an interference reduction device configured to discharge an accumulated charge on the alert device to reduce electromagnetic interference from sources other than the active AC voltage source. 1. A mining detection system comprising:a housing configured to be worn by a user or carried on a mobile device;at least one sensing first circuit selectively coupled to the housing that is configured to sense or detect one or more of electromagnetic radiation, ionizing radiation, a determined liquid analyte, a determined gaseous analyte, a determined powdered analyte concentration, a level of oxygen below a determine threshold value, a data signal strength, a determined level of magnetic flux, a temperature, or a pressure;at least one communication device that is configured to one or more of generate or communicate a signal in response to the sensing or detecting by the sensing first circuit; andan interference second circuit configured to reduce or eliminate interference by the sensing first circuit.2. The detection system defined in claim 1 , further comprising a locating device configured to determine a location of the housing.3. The detection system defined in claim 2 , wherein the sensing first circuit is configured to detect at least electromagnetic radiation claim 2 , and the second interference circuit is configured to dissipate an accumulated ...

IODINE-CONTAINING PHOTOACID GENERATORS AND COMPOSITIONS COMPRISING THE SAME

A photoacid generator compound having formula (I): 2. The photoacid generator compound of claim 1 , wherein W is a single bond or —(C═O)O—.3. The photoacid generator compound of claim 1 , wherein L is a single bond or a group having formula —(CH)—(CRR)— claim 1 , wherein{'sup': 2', '3', '2', '3', '2', '3, 'Rand Rare selected from hydrogen and fluorine, provided that at least one of Rand Rin each —(CRR)— is fluorine,'}n1 is an integer of 0 to 10, andn2 is an integer of 1 to 10.5. The photoacid generator compound of claim 1 , wherein the photoacid generator compound I comprises claim 1 , two claim 1 , three claim 1 , four claim 1 , or five iodine atoms.7. A photoresist composition comprising the photoacid generator compound of any of to and a copolymer.9. A coated substrate claim 7 , comprising: (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition of over the one or more layers to be patterned.10. A method of forming an electronic device claim 7 , comprising:{'claim-ref': {'@idref': 'CLM-00007', 'claim 7'}, '(a) applying a layer of the photoresist composition of over a surface of the substrate;'}(b) pattern-wise exposing the photoresist composition layer to activating radiation; and(c) developing the exposed photoresist composition layer to provide a resist relief image. The present disclosure generally relates to polymer compositions including a photoacid generator. Specifically, the disclosure provides copolymers derived from a monomer including at least two iodine atoms.Extreme ultraviolet lithography (“EUVL”) is one of the leading technology options to replace optical lithography for volume semiconductor manufacturing at feature sizes <20 nm. The extremely short wavelength (13.4 nm) is a key enabling factor for high resolution required at multiple technology generations. In addition, the overall system concept scanning exposure, projection optics, mask format, and resist technology—is quite ...

SYSTEM AND METHOD FOR ESTIMATION AND CONTROL OF CLEARANCE IN A TURBO MACHINE

A method implemented using at least one processor includes receiving a plurality of measured operational parameters of a turbo machine having a rotor and a stator. The plurality of measured operational parameters includes a plurality of real-time operational parameters and a plurality of stored operational parameters. The method further includes generating a finite element model of the turbo machine and generating a plurality of snapshots based on the finite element model and the plurality of stored operational parameters. The method further includes generating a reduced order model based on the plurality of snapshots. The method also includes determining an estimated clearance between the rotor and the stator during operation of the turbo machine, based on the reduced order model and the plurality of real-time operational parameters. 1. A method comprising:receiving a plurality of measured operational parameters of a turbo machine having a rotor and a stator, wherein the plurality of measured operational parameters comprises a plurality of real-time operational parameters and a plurality of stored operational parameters;generating a finite element model of the turbo machine;generating a plurality of snapshots based on the finite element model and the plurality of stored operational parameters;generating a reduced order model based on the plurality of snapshots; anddetermining an estimated clearance between the rotor and the stator during operation of the turbo machine, based on the reduced order model and the plurality of real-time operational parameters.2. The method of claim 1 , wherein generating the plurality of snapshots comprises determining a plurality of element matrices for each element of the finite element model.3. The method of claim 2 , wherein generating the plurality of snapshots further comprises evaluating a plurality of integrals of a thermal model of the finite element model claim 2 , having a plurality of pre-defined material properties.4. The ...

ZWITTERION COMPOUNDS AND PHOTORESISTS COMPRISING SAME

New Te-zwitterion compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography. 1. A zwitterion that comprises one or more Te atoms.4. A zwitterion of wherein Rand/or Rcomprise an anionic group.6. A zwitterion of wherein Rcomprises an anionic group.8. A zwitterion of wherein Rcomprises an anionic group.9. A zwitterion of wherein the zwitterion comprises a polymerizable group and/or one or more acid labile groups.10. A photoresist composition comprising a resin and one or more zwitterions of .11. The photoresist composition of wherein the photoresist composition comprises one or more acid generator compounds that are distinct from the one or more zwitterions.12. A method for providing a photoresist relief image comprising:{'claim-ref': {'@idref': 'CLM-00010', 'claim 10'}, 'a) applying a coating layer of a photoresist of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer. The present invention relates to zwitterion compounds. In one preferred aspect, photoactive tellurium salt compounds are provided that are useful for extreme ultraviolet lithography.Extreme ultraviolet lithography (“EUVL”) is one of the leading technologies options to replace optical lithography for volume semiconductor manufacturing at feature sizes<20 nm. The extremely short wavelength (13.4 nm) is a key enabling factor for high resolution required at multiple technology generations. In addition, the overall system concept—scanning exposure, projection optics, mask format, and resist technology—is quite similar to that used for current optical technologies. Like previous lithography generations, EUVL consists of resist technology, exposure tool technology, and mask technology. The key challenges are EUV source power and throughput. Any improvement in EUV power source will directly impact the currently strict resist sensitivity specification. ...

SALTS AND PHOTORESISTS COMPRISING SAME

New Te-salts are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography. 1. A salt comprising an anion component that comprises one or more Te atoms.2. A salt of wherein the anion component comprises one or more divalent Te atoms.3. A salt of wherein the salt comprises one or more tetravalent Te atoms.4. A salt of wherein the salt corresponds to the following Formula (I):{'br': None, 'sup': +', '1', '2', '3, 'sub': n', 'y, 'M(Z)—R—(Te)—R—X—R—Y\u2003\u2003(I)'}{'sup': '1', 'wherein Ris a non-hydrogen substituent;'}{'sup': '2', 'Ris a chemical bond or a non-hydrogen substituent;'}X is a chemical bond or a divalent linking group;{'sup': '3', 'Ris a linker;'}Z is absent or a non-hydrogen substituent;Y is an anionic group;n is an integer equal to or greater than 0; and y is an integer equal to or greater than 1; and{'sup': '+', 'M is a cation component.'}6. A salt of wherein the salt comprises a cation component that comprise one or more I claim 1 , S claim 1 , Se and/or Te.7. A salt of wherein the salt comprises a polymerizable group.8. A salt of wherein the salt comprises one or more acid-labile groups.9. A photoresist composition comprising a resin and one or more salts of .10. The photoresist composition of wherein the photoresist composition comprises one or more acid generator compounds that are distinct from the one or more salts.11. A method for providing a photoresist relief image comprising:{'claim-ref': {'@idref': 'CLM-00009', 'claim 9'}, 'a) applying a coating layer of a photoresist of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer. The present invention relates to new salt compounds that comprise one or more Te atoms. In one preferred aspect, photoactive tellurium salt compounds are provided that are useful for extreme ultraviolet lithography.Extreme ultraviolet lithography (“EUVL”) is one of the leading ...

SALTS AND PHOTORESISTS COMPRISING SAME

New Te-salt compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography. 6. A salt of wherein the salt comprises a polymerizable group.7. A salt of wherein the salt comprises one or more acid-labile groups.8. A photoresist composition comprising a resin and one or more salts of .9. The photoresist composition of wherein the photoresist composition comprises one or more acid generator compounds that are distinct from the one or more salts.10. A method for providing a photoresist relief image comprising:{'claim-ref': {'@idref': 'CLM-00008', 'claim 8'}, 'a) applying a coating layer of a photoresist of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer. The present invention relates to new salt compounds that comprise one or more Te atoms. In one preferred aspect, photoactive tellurium salt compounds are provided that are useful for extreme ultraviolet lithography.Extreme ultraviolet lithography (“EUVL”) is one of the leading technologies options to replace optical lithography for volume semiconductor manufacturing at feature sizes <20 nm. The extremely short wavelength (13.4 nm) is a key enabling factor for high resolution required at multiple technology generations. In addition, the overall system concept—scanning exposure, projection optics, mask format, and resist technology—is quite similar to that used for current optical technologies. Like previous lithography generations, EUVL consists of resist technology, exposure tool technology, and mask technology. The key challenges are EUV source power and throughput. Any improvement in EUV power source will directly impact the currently strict resist sensitivity specification. Indeed, a major issue in EUVL imaging is resist sensitivity, the lower the sensitivity, the greater the source power that is needed or the longer the exposure time that is required to fully ...

POLYMERS AND PHOTORESIST COMPOSITIONS

A polymer comprising a first repeating unit derived from a monomer comprising a hydroxy-aryl group; a second repeating unit derived from a monomer comprising a hydroxy-aryl group protected with an acetal or ketal group; a third repeating unit derived from a (meth)acrylate monomer comprising a cycloaliphatic group; and a fourth repeating unit derived from a monomer comprising an acid-sensitive group, wherein the first, the second, the third, and the fourth repeating units are different from each other. 1. A polymer comprising:a first repeating unit derived from a monomer comprising a hydroxy-aryl group;a second repeating unit derived from a monomer comprising a hydroxy-aryl group protected with an acetal or ketal group;a third repeating unit derived from a (meth)acrylate monomer comprising a cycloaliphatic group; anda fourth repeating unit derived from a monomer comprising an acid-sensitive group,wherein the first repeating unit, the second repeating unit, the third repeating unit, and the fourth repeating unit are different from each other.4. The polymer of claim 1 , comprising:45 to 70 mole percent of the first repeating unit;5 to 45 mole percent of the second repeating unit;3 to 40 mole percent of the third repeating unit; and5 to 30 mole percent of the fourth repeating unit,each based on 100 mole percent of total repeating units in the polymer.5. A photoresist composition claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the polymer of ;'}a photoacid generator; anda solvent.6. The photoresist composition of claim 1 , further comprising a second polymer that is different from the polymer of claim 1 , wherein the second polymer is capable of switching solubility from insoluble to soluble in a 0.26 N TMAH aqueous solution upon reaction with acid.7. The photoresist composition of claim 5 , further comprising a plasticizer.8. A method of forming a pattern claim 5 , the method comprising:{'claim-ref': {'@idref': 'CLM-00005', 'claim 5'}, 'applying ...

Extraction of products from titanium-bearing minerals

The invention relates to a process for extracting metals and salts from titanium-bearing minerals such as perovskite. More particularly, although not exclusively, the invention relates to extracting titanium dioxide and optionally other compounds from melter slag derived from an iron-making process.

PORE-FILL COMPOSITIONS

A composition comprising a polymer and a solvent, wherein the polymer comprises: a repeat unit of the following general formula (I): 2. The composition of claim 1 , wherein the polymer further comprises a divalent linking group within the polymer backbone.3. The composition of claim 2 , wherein the divalent linking group is chosen from Cdivalent fluorinated or non-fluorinated hydrocarbon groups claim 2 , optionally containing —O— within the polymer backbone.6. The composition of claim 1 , wherein the endcapping group is an optionally substituted aromatic or aromatic oxide group.8. The composition of claim 1 , wherein m is 0 claim 1 , o is 0 and Arrepresents optionally substituted phenylene.9. The composition of claim 1 , wherein the polymer exhibits a weight loss of less than 5% under nitrogen atmosphere at a temperature of 400° C. as determined by thermal gravimetric analysis at a heating rate of 10° C./min from room temperature.10. The composition of claim 1 , wherein the polymer is 99.9% free of residual unreacted monomers claim 1 , oligomers claim 1 , catalysts and solvents used in synthesizing the polymer claim 1 , based on the total weight of the polymer. This application claims the benefit of priority under 35 U.S.C. §119(e) to U.S. Provisional Application No. 62/096,995, filed Dec. 26, 2014, the entire contents of which are incorporated herein by reference.The invention relates generally to the manufacture of electronic devices. More specifically, this invention relates to compositions useful for filling pores of a porous feature on a semiconductor substrate. The compositions have particular applicability to semiconductor device manufacturing, for example, in processes making use of porous dielectric materials.Advances in integrated circuit technology have reduced the spacing between metal lines on a given layer and between interconnected lines in different layers of an integrated circuit. Such reduced spacing between metal lines results in an increase in ...

METHODS OF FORMING ELECTRONIC DEVICES

Methods of forming an electronic device comprise: (a) providing a semiconductor substrate comprising a porous feature on a surface thereof; (b) applying a composition over the porous feature, wherein the composition comprises a polymer and a solvent, wherein the polymer comprises a repeat unit of the following general formula (I): 2. The method of claim 1 , wherein the polymer further comprises a divalent linking group within the polymer backbone.3. The method of claim 2 , wherein the divalent linking group is chosen from Cdivalent fluorinated or non-fluorinated hydrocarbon groups claim 2 , optionally containing —O— within the polymer backbone.5. The method of claim 1 , wherein the polymer further comprises an endcapping group that is free of hydroxyl groups.6. The method of claim 5 , wherein the endcapping group is an optionally substituted aromatic or aromatic oxide group.7. The method of claim 1 , wherein m is 0 claim 1 , o is 0 and Arrepresents optionally substituted phenylene.8. The method of claim 1 , wherein the porous feature comprises pores having a width of 20 nm or less.9. The method of claim 1 , wherein the polymer exhibits a weight loss of less than 5% under nitrogen atmosphere at a temperature of 400° C. as determined by thermal gravimetric analysis at a heating rate of 10° C./min from room temperature.10. The method of claim 1 , further comprising: (d) removing the polymer from the pores. This application claims the benefit of priority under 35 U.S.C. §119(e) to U.S. Provisional Application No. 62/096,907, filed Dec. 26, 2014, the entire contents of which are incorporated herein by reference.The invention relates generally to the manufacture of electronic devices. More specifically, this invention relates to methods of forming electronic devices that involve filling pores of a porous feature on a semiconductor substrate. The methods have particular applicability to semiconductor device manufacturing, for example, in processes making use of porous ...

SYSTEMS AND METHODS FOR NETWORKED SENSOR NODES

A sensor assembly includes an impedance sensor element, an impedance sensor reader and a communications module. The communications module is configured to communicate with a remote computing device. The impedance sensor reader is coupled to the impedance sensor element. The impedance sensor reader includes a synthesizer and a detector. The synthesizer is configured to output an excitation signal having known values for a plurality of signal characteristics to the impedance sensor element and to generate the excitation signal based on a plurality of direct digital synthesizer (DDS) coefficients received from the remote computing device through the communications module. The detector is coupled to the impedance sensor element and configured to detect a response of the impedance sensor element to the excitation signal and determine an impedance of the impedance sensor element based at least in part on the response of the impedance sensor element to the excitation signal. 1. A sensor assembly comprising:an impedance sensor element;a communications module configured to communicate with a remote computing device; a synthesizer configured to output an excitation signal having known signal characteristics over a range of frequencies, said synthesizer configured to generate the excitation signal based on a plurality of direct digital synthesizer (DDS) coefficients received from the remote computing device through said communications module; and', 'a detector coupled to said impedance sensor element and configured to detect a response of said impedance sensor element to the excitation signal and determine an impedance of said impedance sensor element; and, 'an impedance sensor reader coupled to said impedance sensor element and comprisinga power harvesting and management unit to allow for stand-alone operation of said sensor assembly.2. The sensor assembly according to claim 1 , wherein said detector is configured to determine impedance changes of said impedance sensor ...

METHOD AND SYSTEM USING COMPUTATIONAL SIGMA-DELTA MODULATORS

An analog-to-digital converter (ADC) is provided includes a first sigma-delta modulator (SDM) electrically coupled to a first signal input. The first SDM includes a first summing junction configured to receive a plurality of inputs to the first SDM. The ADC further includes a second sigma-delta modulator (SDM) electrically coupled to a second signal input. The second SDM includes a second summing junction configured to receive a plurality of inputs to the second SDM. The first SDM also includes a cross-coupled feedback loop from an output of the first SDM to a negative input of the first summing junction and to a positive input of the second summing junction. The second SDM also includes a cross-coupled feedback loop from an output of the second SDM to a negative input of the first summing junction and to a negative input of the second summing junction. 1. An analog-to-digital converter (ADC) comprising:a first sigma-delta modulator (SDM) electrically coupled to a first signal input, said first SDM comprising a first summing junction configured to receive a plurality of inputs to said first SDM; anda second sigma-delta modulator (SDM) electrically coupled to a second signal input, said second SDM comprising a second summing junction configured to receive a plurality of inputs to said second SDM, said first SDM comprising a cross-coupled feedback loop extending from an output of said first SDM to a negative input of said first summing junction and to a positive input of said second summing junction, said second SDM comprising a cross-coupled feedback loop extending from an output of said second SDM to a negative input of said first summing junction and to a negative input of said second summing junction.2. The ADC of claim 1 , wherein at least one of said first SDM and said second SDM comprises a plurality of cascaded SDMs.3. The ADC of claim 2 , wherein said plurality of cascaded SDMs comprises an output of a first quantizer section electrically coupled in series ...

PHOTOACID GENERATOR

A photoacid generator compound having Formula (I): 3. The photoacid generator compound of claim 2 , wherein in Formula (III):EWG is CN;{'sub': '3-20', 'R is a polycyclic Ccycloalkyl group;'}{'sup': 30', '31', '30', '31, 'sub': 2', '2', '1-6, 'Y is a single bond, —C(R)—, —N(R)—, —O—, —S—, —S(═O)—, —C(═O)—, or a combination thereof, wherein each Rand Ris independently hydrogen or a Calkyl group; and'}{'sup': '+', 'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'M is the same as in .'}4. The photoacid generator compound of claim 2 , wherein in Formula (III):{'sup': 5', '6, 'sub': '2', 'Xand Xare each C(CN);'}R is hydrogen;Y is a single bond; and{'sup': 1', '2', '+, 'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'Z, Z, and M are the same as in .'}9. An acid-sensitive polymer claim 1 , which is a polymerization product of the photoacid generator compound of .10. A photoresist composition claim 1 , comprising:an acid-sensitive polymer,a solvent, and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the photoacid generator compound of .'}11. A photoresist composition claim 1 , comprising:{'claim-ref': {'@idref': 'CLM-00009', 'claim 9'}, 'the acid-sensitive polymer of , and'}a solvent.12. A method of forming an electronic device claim 10 , comprising: (a) applying a layer of the photoresist composition of on a substrate; (b) patternwise exposing the photoresist composition layer to activating radiation; and (c) developing the exposed photoresist composition layer to provide a resist relief image. This application claims priority to provisional U.S. Application No. 62/273,521, filed on Dec. 31, 2015, the content of which is incorporated herein by reference in its entirety.This invention relates to methide-containing photoacid generator (PAG) compounds.Known photoresists can provide features having resolution and size sufficient for many existing commercial applications. However for many other applications, the need exists for new photoresists that can provide highly ...

PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST COMPOSITION, AND METHOD OF FORMING ELECTRONIC DEVICE

A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): 3. The photoresist composition of claim 2 , wherein in Formula (III):EWG is CN;{'sub': '3-20', 'R is a polycyclic Ccycloalkyl group;'}{'sup': 30', '31', '30', '31, 'sub': 2', '2', '1-6, 'Y is a single bond, —C(R)—, —N(R)—, —O—, —S—, —S(═O)—, —(C═O)—, or a combination thereof, wherein each Rand Ris independently hydrogen or a Calkyl group; and'}{'sup': '+', 'M is an organic sulfonium cation or an organic iodonium cation.'}4. The photoresist composition of claim 2 , wherein in Formula (III):{'sup': 5', '6, 'sub': '2', 'Xand Xare each C(CN);'}R is hydrogen; andY is a single bond.9. The photoresist composition of claim 1 , wherein R comprises a polymerizable group claim 1 , and wherein the photoacid generator is a polymerized unit of the acid-sensitive polymer.10. A coated substrate claim 1 , comprising: (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of the photoresist composition of over the one or more layers to be patterned.11. A method of forming an electronic device claim 1 , comprising: (a) applying a layer of the photoresist composition of on a substrate; (b) patternwise exposing the photoresist composition layer to activating radiation; and (c) developing the exposed photoresist composition layer to provide a resist relief image. This application claims priority to provisional U.S. Application No. 62/273,523, filed on Dec. 31, 2015, the content of which is incorporated herein by reference in its entirety.This invention relates to a photoresist composition including a methide-containing photoacid generator (PAG) compound and a method of forming an electronic device.Known photoresists can provide features having resolution and size sufficient for many existing commercial applications. However for many other applications, the need exists for new photoresists that can provide highly resolved images of ...

METHOD AND SYSTEM FOR DETERMINATION OF PIPE LOCATION IN BLOWOUT PREVENTERS

A system to detect a position of a pipe with respect to a BOP includes a casing disposed around an outer surface of a section of the pipe. The system further includes sensing devices that are disposed on the casing and arranged to form a plurality of arrays and configured to generate position signals. The arrays are disposed circumferentially around the casing and spaced from one another along the length of the casing. The system includes a processing unit configured to compute distance between the pipe and each sensing device. The processing unit generates a first alert when the distance between the pipe and at least one sensing device is different from a reference distance. The processing unit generates a second alert when the distance between the pipe and each sensing device of at least one array of sensing devices is different from the reference distance. 1. A system to detect a position of a pipe with respect to a blowout preventer (BOP) , comprising:a casing configured to be disposed around an outer surface of a section of the pipe, wherein a length of the casing is greater than or equal to a length of the section of the pipe;a plurality of sensing devices configured to generate a plurality of position signals, wherein the plurality of sensing devices are arranged to form a plurality of arrays of sensing devices and wherein each of the plurality of arrays is disposed circumferentially around the casing and spaced from one another along the length of the casing; and compute a distance between the pipe and each of the plurality of sensing devices based on the plurality of position signals;', 'generate a first alert when the distance of the pipe determined from at least one sensing device is different from a reference distance between the pipe and the sensing devices; and', 'generate a second alert when the distance between the pipe and each sensing device of at least one array of sensing devices is different from the reference distance between the pipe and ...

Imaging Spectropolarimeter

An imaging spectropolarimeter for examining targets with polarized light, the spectropolarimeter including a light source adapted to produce polarized light directed at a target. Embodiments also include a three-camera camera system defining a three-camera camera axis with a first camera unit comprising a first analyzer set at 0°, a lens and a first multi-pixel sensor, a second camera unit comprising a second analyzer set at 45°, a lens and a second multi-pixel sensor, and a third camera unit comprising a third analyzer set at 90°, a lens and a third multi-pixel sensor. At least two beam splitters adapted to direct a portion of polarized light reflected from the target to each of the first, second and third camera units. Preferred systems include a processor adapted to produce polarimetric images of the target utilizing intensity information collected by the multi-pixel sensors. 2. The imaging spectropolarimeter as in wherein the light source is comprised of a broadband light source and a filter wheel that allows incident spectral ranges to be defined.3. The imaging spectropolarimeter as in wherein the camera system is adapted to monitor specular reflections.4. The imaging spectropolarimeter as in wherein the camera system is adapted to monitor non-specular reflections.5. The imaging spectropolarimeter as in wherein the first claim 1 , second and third cameras are CCD cameras.6. The imaging spectropolarimeter as in wherein the polarized light source supplies incident light in a range from ultra violet to near infrared.7. The imaging spectropolarimeter as in wherein the system having all of the limitations of is applied in a medical field.8. The imaging spectropolarimeter as in wherein the medical field is cancer detection and screening.9. The imaging spectropolarimeter as in wherein the system having all of the limitations of is applied in a semiconductor field.10. The imaging spectropolarimeter as in wherein the semiconductor field is one of the following fields: ...

ACID GENERATORS AND PHOTORESISTS COMPRISING SAME

Acid generator compounds are provided that comprise an oxo-1,3-dioxolane moiety and/or an oxo-1,3-dioxane moiety. The acid generators are particularly useful as a photoresist composition component. 1. A photoacid generator comprising an oxo-1 ,3-dioxolan moiety and/or an oxo-dioxane moiety.3. The photoacid generator of or wherein the photoacid generator is an onium compound.4. The photoacid generator of any one of , or wherein the photoacid generator comprises a cation component that comprises an oxo-1 ,3-dioxolan moiety and/or an oxo-1 ,3-dioxane moiety.65. The photoacid generator of any one of through wherein the acid generator comprises an oxo-1 ,3-dioxane moiety.76. A photoacid generator of any one of through wherein the photoacid generator is a component of a resin.87. A photoresist composition comprising 1) a resin and 2) one or more photoacid generators of any one of through .9. A method for providing a photoresist relief image , comprising:{'claim-ref': {'@idref': 'CLM-00008', 'claim 8'}, 'a) applying a coating layer of a photoresist composition of on a substrate; and'}b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer.10. The method of wherein the activating radiation is EUV or electron-beam radiation. The present invention relates to new acid generators that comprise an oxo-dioxolan and/or oxo-dioxane moiety.Photoresists are photosensitive films for transfer of images to a substrate. They form negative or positive images. After coating a photoresist on a substrate, the coating is exposed through a patterned photomask to a source of activating energy such as ultraviolet light to form a latent image in the photoresist coating. The photomask has areas opaque and transparent to activating radiation that define an image desired to be transferred to the underlying substrate. A relief image is provided by development of the latent image pattern in the resist coating.Known ...

PHOTORESIST COMPOSITIONS AND METHODS

New photoresist and topcoat compositions are provided that are useful in a variety of applications. In one aspect, new photoresist compositions are provided that comprise: (a) a first matrix polymer; (b) one or more acid generators; and (c) one or more additive compounds of Formulae (I) and/or (II). 2. The photoresist composition of further comprising a second polymer distinct from the first polymer.3. The photoresist composition of wherein the second polymer is fluorinated.5. The photoresist composition of where the additive is an anhydride.7. The topcoat composition of wherein the second polymer is fluorinated.9. The topcoat of where the additive is an anhydride.10. A method for forming a photolithographic pattern claim 6 , comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(a) applying a layer of a photoresist composition of on a substrate;'}(b) patternwise exposing the photoresist composition layer to activating radiation; and(c) developing the exposed photoresist composition layer to provide a photoresist relief image.11. A method for processing a photoresist composition claim 6 , comprising:(a) applying a layer of a photoresist composition on a substrate;{'claim-ref': {'@idref': 'CLM-00006', 'claim 6'}, '(b) above the photoresist composition layer, applying a layer of a composition of to form a topcoat layer;'}(c) patternwise exposing the topcoat layer and photoresist layer to activating radiation; and(d) developing the exposed photoresist composition layer to provide a photoresist relief image. The invention relates generally to the manufacture of electronic devices. More specifically, this invention relates to photoresist and topcoat compositions and to photolithographic processes which allow for the formation of fine patterns. Compositions of the invention are particularly useful in immersion lithography processes for the formation of semiconductor devices.Photoresists are photosensitive films used for the transfer of images to a substrate. A ...

PROCESS FOR MAKING AN ORGANIC CHARGE TRANSPORTING FILM

A method for producing an organic charge transporting film. The method comprises steps of: (a) applying to a substrate a first polymer resin which has substituents which are sulfonic acids, sulfonic acid salts or esters of sulfonic acids; and (b) applying over the first polymer resin a second polymer resin having Mat least 3,000 and comprising arylmethoxy linkages. 1. A method for producing an organic charge transporting film; said method comprising steps of: (a) applying to a substrate a first polymer resin which has substituents which are sulfonic acids , sulfonic acid salts or esters of sulfonic acids; and (b) applying over the first polymer resin a second polymer resin having Mat least 3 ,000 and comprising arylmethoxy linkages.2. The method of in which the second polymer resin has Mfrom 5 claim 1 ,000 to 100 claim 1 ,000.3. The method of in which the second polymer resin comprises at least 50 wt % polymerized units of a monomer having from 6 to 20 aromatic rings.4. The method of in which the first polymer resin has Mfrom 2 claim 3 ,000 to 1 claim 3 ,000 claim 3 ,000.5. The method of in which the second polymer resin comprises at least 50 wt % polymerized units of a monomer of formula NArArAr claim 4 , wherein Ar claim 4 , Arand Arindependently are C-Caromatic substituents and at least one of Ar claim 4 , Arand Arcontains a vinyl group attached to an aromatic ring.6. The method of in which the first polymer resin comprises a first polymer comprising polymerized units of styrene substituted by sulfonic acid claim 5 , sulfonic acid salt or sulfonic acid ester substituents.7. The method of in which the first polymer resin comprises a second polymer which does not comprise polymerized units of styrene substituted by sulfonic acid claim 6 , sulfonic acid salt or sulfonic acid ester substituents.8. The method of in which the second polymer comprises polymerized units of a monomer comprising an aromatic ring.9. The method of in which the coated surface is heated to a ...

COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORESIST, AND PROCESS OF PREPARING THE SAME

A photoresist composition, including a polymer having a Chydroxyaromatic group, a solvent, and a sulfonium salt having Formula (I): 2. The photoresist composition of claim 1 , wherein Rin Formula (I) is —C(R)(R) claim 1 , wherein Ris independently selected from F and fluorinated methyl claim 1 , Ris independently selected from Clinear or branched alkyl and Clinear or branched fluorinated alkyl claim 1 , y and z are independently an integer from 0 to 3 claim 1 , provided that the sum of y and z is 3 claim 1 , wherein the total number of carbon atoms in Ris from 1 to 6.3. The photoresist composition of claim 1 , wherein R is an unsubstituted or substituted Caromatic group or an unsubstituted or substituted Cheteroaromatic group.4. The photoresist composition of claim 3 , wherein R is a substituted phenyl group.5. The photoresist composition of claim 1 , wherein each of Rto Ris hydrogen.6. The photoresist composition of claim 1 , wherein the polymer comprises structural units formed from a substituted or unsubstituted styrene monomer in an amount of equal to or greater than 50 weight percent based on 100 weight percent of the total amount of structural units in the polymer.7. The photoresist composition of claim 1 , wherein X is O.8. The photoresist composition of claim 1 , wherein the photoresist composition is capable of being coated in a single application to a thickness in a dried state of greater than 5.0 microns and less than 30 microns.9. A coated substrate claim 1 , comprising: (a) a substrate claim 1 , and (b) a layer of the photoresist composition of disposed over the substrate.10. A method of forming a resist pattern claim 1 , the method comprising: (a) applying a layer of the photoresist composition of onto a substrate; (b) drying the applied photoresist composition to form a composition layer; (c) exposing the composition layer to activating radiation; (d) heating the exposed composition layer; and (e) developing the exposed composition layer.11. The ...

IODINE-CONTAINING POLYMERS FOR CHEMICALLY AMPLIFIED RESIST COMPOSITIONS

A monomer having formula (I): 2. The monomer of claim 1 , wherein{'sub': 1-20', '1-20', '1-10, 'L is an unsubstituted Calkylene group or a Calkylene group substituted with —F, a hydroxyl group, or a Calkyl group; and'}X is a hydroxyl group; andn is 1, 2, or 3.4. The copolymer of claim 3 , further comprising a polymerized product of a base-soluble monomer claim 3 , a lactone-containing monomer claim 3 , a photoacid generator claim 3 , or a combination thereof.6. A photoresist composition comprising a copolymer of .9. A coated substrate claim 6 , comprising: (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition of over the one or more layers to be patterned.10. A method of forming an electronic device claim 6 , comprising:{'claim-ref': {'@idref': 'CLM-00006', 'claim 6'}, '(a) applying a layer of the photoresist composition of over a surface of the substrate;'}(b) pattern-wise exposing the photoresist composition layer to activating radiation; and(c) developing the exposed photoresist composition layer to provide a resist relief image. The present disclosure generally relates to polymer compositions including a photoacid generator. Specifically, the disclosure provides copolymers derived from an iodine-containing monomer.Extreme ultraviolet lithography (“EUVL”) is one of the leading technology options to replace optical lithography for volume semiconductor manufacturing at feature sizes <20 nm. The extremely short wavelength (13.4 nm) is a key enabling factor for high resolution required at multiple technology generations. In addition, the overall system concept—scanning exposure, projection optics, mask format, and resist technology—is quite similar to that used for current optical technologies. Like previous lithography generations, EUVL consists of resist technology, exposure tool technology, and mask technology. The key challenges are EUV source power and throughput. Any improvement in EUV power ...

SYSTEMS AND METHODS FOR NETWORKED SENSOR NODES

A sensor assembly includes an impedance sensor element, an impedance sensor reader and a communications module. The communications module is configured to communicate with a remote computing device. The impedance sensor reader is coupled to the impedance sensor element. The impedance sensor reader includes a synthesizer and a detector. The synthesizer is configured to output an excitation signal having known values for a plurality of signal characteristics to the impedance sensor element and to generate the excitation signal based on a plurality of direct digital synthesizer (DDS) coefficients received from the remote computing device through the communications module. The detector is coupled to the impedance sensor element and configured to detect a response of the impedance sensor element to the excitation signal and determine an impedance of the impedance sensor element based at least in part on the response of the impedance sensor element to the excitation signal. 1. A sensor assembly comprising:an impedance sensor element;a communications module configured to communicate with a remote computing device; a synthesizer configured to output an excitation signal having known signal characteristics over a range of frequencies, said synthesizer configured to generate the excitation signal based on a plurality of direct digital synthesizer (DDS) coefficients received from the remote computing device through said communications module; and', 'a detector coupled to said impedance sensor element and configured to detect a response of said impedance sensor element to the excitation signal and determine an impedance of said impedance sensor element; and, 'an impedance sensor reader coupled to said impedance sensor element and comprisinga power harvesting and management unit to allow for stand-alone operation of said sensor assembly.2. The sensor assembly according to claim 1 , wherein said detector is configured to determine impedance changes of said impedance sensor ...

Synthetic methods for spiro-oxindole compounds

This invention is directed to methods of preparing certain spiro-oxindole derivatives, which are useful for the treatment and/or prevention of sodium channel-mediated diseases or conditions, such as pain.

BATTERY CELL WITH INTEGRATED SENSING PLATFORM

A battery cell that comprises a sensing platform with sensing elements configured to provide information about in-situ characteristics and parameters of the battery cell. Embodiments of the battery cell can have the sensing platform integrated into the structure of the battery cell, as a separate structure incorporated in the battery cell, and combinations thereof. In one embodiment, the battery cell comprises a sensing platform having sensing elements proximate a localized measurement region, where the sensing platform comprises a substrate with material layers disposed thereon. The material layers comprise at least one sensing layer that forms the sensing elements so that the sensing elements are responsive to properties of the battery cell. 1. A battery cell comprisinga first electrode;a second electrode positioned relative to the first electrode in a manner generating electrochemical activity between the first electrode and the second electrode;an active region responsive to the electrochemical activity, the active region comprising a localized measurement region exhibiting a cell property; anda sensing platform proximate the localized measurement region, the sensing platform comprising a sensing element for collecting data corresponding to the cell property in the localized measurement region.2. A battery cell according to claim 1 , further comprising a plurality of localized measurement regions claim 1 , wherein the sensing platform comprises one or more of the sensing elements for each of the localized measurement regions.3. A battery cell according to claim 1 , wherein the localized measurement region is proximate one or more of the first electrode and the second electrode.4. A battery cell according to claim 1 , further comprising a cell wall in surrounding relation to the first electrode and the second electrode claim 1 , the cell wall comprising an outer surface claim 1 , and an inner surface forming a cell volume claim 1 , wherein the localized ...

PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION

A monomer has the structure 2. The monomer of claim 1 , wherein p is 1 claim 1 , 2 claim 1 , 3 claim 1 , or 4.3. The monomer of claim 1 , wherein EWG1 and EWG2 are independently at each occurrence F claim 1 , partially fluorinated alkyl or perfluorinated alkyl.4. The monomer of claim 3 , wherein EWG1 and EWG2 are at each occurrence F.5. The monomer of claim 1 , wherein EWG1 and EWG2 are independently at each occurrence F claim 1 , CF claim 1 , —CN claim 1 , —NO claim 1 , —C(═O)R claim 1 , —C(═O)OR claim 1 , and —SOR claim 1 , wherein is a Caliphatic organic group claim 1 , a Caromatic organic group claim 1 , or a Cheteroaromatic organic group.6. The monomer of claim 1 , wherein R comprises as part or all of its structure Calkenyl claim 1 , Calkynyl claim 1 , acryloyl claim 1 , 2-(C-alkyl)acryloyl claim 1 , 2-(C-fluoroalkyl)acryloyl claim 1 , 2-cyanoacryloyl claim 1 , or 2-fluoroacryloyl.8. The monomer of claim 1 , wherein the sum of n and p is at least 3.9. The monomer of claim 1 , wherein p is 1 claim 1 , 2 claim 1 , 3 claim 1 , or 4; and X and Y are hydrogen.12. A polymer comprising repeat units derived from the monomer of .13. A photoresist composition comprising the polymer of .14. A method of forming a photoresist relief image claim 12 , comprising:{'claim-ref': {'@idref': 'CLM-00013', 'claim 13'}, '(a) applying a layer of a photoresist composition of on a substrate to form a photoresist layer;'}(b) pattern-wise exposing the photoresist layer to activating radiation to form an exposed photoresist layer; and(c) developing the exposed photoresist layer to provide a photoresist relief image. This application claims the benefit of U.S. Nonprovisional application Ser. No. 15/055,911, filed 29 Feb. 2016, the contents of which are incorporated herein in their entirety.The present invention relates to a monomer with a photoacid-generating group, a polymer formed from the monomer, a photoresist composition comprising the polymer, and a method of forming a photoresist ...

Corrosion Resistant Barrier Layer for a Solid Oxide Fuel Cell Stack and Method of Making Thereof

A method of forming diffusion barrier layer includes providing an interconnect for a fuel cell stack, forming a glass barrier precursor layer over a Mn and/or Co containing electrically conductive contact layer on the interconnect, and heating the barrier precursor layer to precipitate crystals in the barrier precursor layer to convert the barrier precursor layer to a glass ceramic barrier layer. 1. A method of forming a diffusion barrier layer , comprising:providing an interconnect for a fuel cell stack, wherein the interconnect contains an electrically conductive contact layer located on an air surface of the interconnect, and wherein the electrically conductive contact layer contains at least one of Co and Mn;forming a barrier precursor layer comprising at least 90 wt. % glass over the electrically conductive contact layer; andheating the barrier precursor layer to precipitate crystals in the barrier precursor layer to convert the barrier precursor layer to a glass ceramic barrier layer.2. The method of claim 1 , wherein the electrically conductive contact layer comprises a metal oxide contact layer comprising at least of Mn and Co.3. The method of claim 1 , wherein:the metal oxide contact layer comprises lanthanum strontium manganite (LSM), manganese cobalt oxide spinel (MCO) or a mixture thereof;the interconnect comprises a chromium-iron alloy interconnect having gas flow channels and ribs; andthe barrier precursor layer comprises 99-100 wt % glass.4. The method of claim 2 , further comprising forming a glass or glass ceramic seal in at least one region over the barrier precursor layer.5. The method of claim 4 , wherein the at least one region comprises a fuel riser region around a fuel riser opening through the interconnect claim 4 , and the seal comprises a ring seal formed around the fuel riser opening.6. The method of claim 4 , further comprising placing the interconnect containing the metal oxide contact layer claim 4 , the glass ceramic barrier layer and ...

PHOTOACID GENERATOR

A photoacid generator compound having Formula (I): 3. The photoacid generator compound of claim 2 , wherein in Formula (III):{'sup': 5', '6, 'sub': '2', 'Xand Xare each C(CN);'}{'sub': '3-20', 'R is a polycyclic Ccycloalkyl group; and'}{'sup': 30', '31', '30', '31, 'sub': 2', '2', '1-6, 'Y is a single bond, —C(R)—, —N(R)—, —O—, —S—, —S(═O)—, —C(═O)—, or a combination thereof, wherein each Rand Ris independently hydrogen or a Calkyl group.'}4. The photoacid generator compound of claim 2 , wherein in Formula (III):{'sup': 5', '6, 'sub': '2', 'Xand Xare each C(CN);'}R is hydrogen; andY is a single bond.9. The photoacid generator compound of claim 1 , wherein R is a polymerizable group.10. The photoacid generator compound of claim 2 , wherein R is a polymerizable group.12. A photoresist composition claim 2 , comprising:an acid-sensitive polymer,a solvent, and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a photoacid generator compound of .'}13. A photoresist composition claim 2 , comprising:{'claim-ref': {'@idref': 'CLM-00011', 'claim 11'}, 'the acid-sensitive polymer of , and'}a solvent.14. A method of forming an electronic device claim 12 , comprising: (a) applying a layer of the photoresist composition of on a substrate; (b) patternwise exposing the photoresist composition layer to activating radiation; and (c) developing the exposed photoresist composition layer to provide a resist relief image.15. A method of forming an electronic device claim 13 , comprising: (a) applying a layer of the photoresist composition of on a substrate; (b) patternwise exposing the photoresist composition layer to activating radiation; and (c) developing the exposed photoresist composition layer to provide a resist relief image.17. A photoresist composition claim 13 , comprising:an acid-sensitive polymer,a solvent, and{'claim-ref': {'@idref': 'CLM-00002', 'claim 2'}, 'a photoacid generator compound of .'}18. A photoresist composition claim 13 , comprising:{'claim-ref': {'@idref': 'CLM ...

SENSOR SYSTEM FOR BLOWOUT PREVENTER AND METHOD OF USE

A sensor system for a sub-sea oil and gas well includes a casing, a transmit coil, a receive coil, and a processor. The casing defines an interior space through which a drilling pipe string transits. The transmit coil is coupled to the casing and is configured to conduct a current pulse and induce an electromagnetic field within the interior space. The electromagnetic field corresponds with the current pulse and interacts with the drilling pipe string. The receive coil is coupled to the casing and is configured to detect the electromagnetic field, including perturbations of the electromagnetic field due to the drilling pipe string's interaction therewith. The processor is coupled to the transmit coil and the receive coil. The processor is configured to compute a diameter of the drilling pipe string based on the current pulse and the electromagnetic field detected by the receive coil. 1. A sensor system for a sub-sea oil and gas well , said sensor system comprising:a casing defining an interior space through which a drilling pipe string transits;a transmit coil coupled to said casing, said transmit coil configured to conduct a current pulse and induce an electromagnetic field, corresponding with the current pulse, within the interior space and with which the drilling pipe string interacts;a first receive coil coupled to said casing, said first receive coil configured to detect the electromagnetic field, including perturbations of the electromagnetic field due to the drilling pipe string's interaction with the electromagnetic field; anda processor coupled to said transmit coil and said first receive coil, said processor configured to compute a diameter of the drilling pipe string based on the current pulse and the electromagnetic field detected by said first receive coil.2. The sensor system in accordance with claim 1 , wherein said first receive coil is separated from said transmit coil by a separation distance in an axial direction of said casing.3. The sensor ...

Method and apparatus for uplink reference signal-based beam management

Methods and apparatuses for UL reference signal-based beam management. A method of operating a UE includes receiving configuration information for UL reference signals for beam management, source reference signals for spatial relation, and a beam report; receiving the source reference signals; and measuring a signal quality metric for the source reference signals for spatial relation. The method further includes transmitting a beam report based on measured signal quality metric and receiving, in response to the beam report, updated configuration information for the UL reference signals for beam management. The method further includes determining a time for update of the UL reference signals for beam management and transmitting the UL reference signals for beam management based on the updated configuration information at the determined time.

Electro-mechanical actuator for automatic transmission

The present disclosure relates to a vehicle transmission system that includes a transmission component and an electro-mechanical actuator coupled to the transmission component. The electro-mechanical actuator includes an electric motor and a solenoid that are configured to maintain the transmission component in one of a park position and a non-park position upon receipt of a command. The electric motor and the solenoid are also configured to prevent the transmission component from returning to the park position upon receipt of the command. Further, the electric motor and solenoid are configured to receive the command from a vehicle control system.

SYSTEM AND METHOD FOR DETERMINATION OF FLAMES IN A HARSH ENVIRONMENT

A system for determination of presence of flames is provided. The system includes a photosensitive transducer configured to generate a response signal that is a function of electromagnetic radiation from a flame source. The system also includes a signal processing unit that includes a modulation unit and a demodulation unit. The modulation unit is configured to generate a modulated response signal by modulating the response signal with a modulation signal of frequency higher than that of an unwanted signal present the response signal. The demodulation unit is configured to determine an output signal by demodulating the modulated response signal. The demodulation unit eliminates the unwanted signal from the modulated response signal during the determination of the output signal. Further, the system also includes a processing unit configured to process the output signal to determine flame presence based on the intensity of the incident radiation from the flame. 1. A system comprising:a photosensitive transducer configured to generate a response signal that is a function of electromagnetic radiation from a flame source that is proximate to the photosensitive transducer; and a modulation unit configured to generate a modulated response signal by modulating the response signal with a modulation signal having a frequency higher than that of an unwanted signal present in the response signal; and', 'a demodulation unit configured to determine an output signal by demodulating the modulated response signal, wherein the demodulation unit is configured to eliminate the unwanted signal from the modulated response signal; and, 'a signal processing unit, comprisinga processing unit configured to process the output signal to determine flame presence based on the intensity of the incident radiation from the flame.2. The system as recited in further comprising a housing configured to hold one or both of the photosensitive transducer and the signal processing unit claim 1 , wherein ...

Method and apparatus for dynamic downlink multi-beam operations

A method for operating a user equipment (UE) comprises receiving configuration information about a transmission configuration indicator (TCI) state indication via a downlink control information (DCI), the configuration information including a set of TCI states and information for configuring the DCI from one of a downlink (DL) DCI (DL-DCI) and a DL-TCI-DCI, wherein the DL-DCI schedules a DL physical DL shared channel (PDSCH) assignment and the DL-TCI-DCI is a dedicated DCI for TCI state indication; receiving, based on the configuration information, the configured DCI; decoding the configured DCI to obtain a TCI state update; determining a receive beam based on the TCI state update; and applying the receive beam for a reception of a DL control or a DL data.

Group-based dynamic beam indication mechanism

A method for operating a user equipment (UE) comprises receiving configuration information about a transmission configuration indicator (TCI) state indication, the configuration information including a set of TCI states and information for configuring a medium for the TCI state indication; receiving, based on the configuration information, the TCI state indication via the configured medium, wherein the TCI state indication indicates M>1 TCI states; determining M beams based on the M TCI states, applying at least one of the M beams for a reception of a downlink (DL) data channel, and applying a control beam determined based on the M beams for a reception of a DL control channel.

Piezoelectric micromachined ultrasound transducer device

A piezoelectric micromachined ultrasound transducer (PMUT) device may include a plurality of layers including a structural layer, a piezoelectric layer, and electrode layers located on opposite sides of the piezoelectric layer. Conductive barrier layers may be located between the piezoelectric layer and the electrodes to the prevent diffusion of the piezoelectric layer into the electrode layers.

Fluid Distribution System For Optimising Consumption Of Energy

There is provided a fluid distribution system for optimising consumption of energy, the system comprising: a thermal controller configured to be connected to an external fluid tank containing external fluid having an external fluid temperature adapted to be heated by solar energy, and to an internal fluid tank containing an internal fluid having an internal fluid temperature and a heater adapted to be heated by a non-renewable energy, the thermal controller being configured to be connected to thermostats located a the internal and external tanks for determining the internal fluid temperature and the external fluid temperature; a valve in fluid communication with the internal and external tanks; a fluid controller connected to the thermal controller and to the valve, the fluid controller being configured to operate the valve based on the internal and external fluid temperatures in such a manner to optimise consumption of the non-renewable energy for heating the internal fluid.

Stiction reduction system and method thereof

Methods and systems for reducing stiction through roughening the surface and reducing the contact area in MEMS devices are disclosed. A method includes fabricating bumpstops on a surface of a MEMS device substrate to reduce stiction. Another method is directed to applying roughening etchant to a surface of a silicon substrate to enhance roughness after cavity etch and before removal of hardmask. Another embodiment described herein is directed to a method to reduce contact area between proof mass and UCAV (“upper cavity”) substrate surface with minimal impact on the cavity volume by introducing a shallow etch process step and maintaining high pressure in accelerometer cavity. Another method is described as to increasing the surface roughness of a UCAV substrate surface by depositing a rough layer (e.g. polysilicon) on the surface of the substrate and etching back the rough layer to transfer the roughness.

Methods and systems for determining crosstalk for a line in a vectored system

At least one example embodiment discloses a method of determining crosstalk for at least one first line in a communication system having a plurality of second lines. The method includes obtaining at least one pilot matrix representing a sequence of pilot signals and transmitting pilot signals across the plurality of second lines in accordance with the at least one pilot matrix. The method further includes obtaining measurement vectors for the at least one first line on a plurality of subcarriers, in response to the transmitted pilot signals, determining a weighted vector, the weighted vector being a weighted combination of the measurement vectors and determining a crosstalk coupling vector based on the determined weighted vector.

CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME

New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds. 2. A photoacid generator compound of the following formula (III):{'br': None, 'sub': 2', 'm', 'n', '3, 'sup': '+', '(R)—X—(C═O)O(CH)(CWY)SOM\u2003\u2003(III)'}wherein R is a steroid structure,X is a linker;W and Y are each independently in each occurrence hydrogen or fluoro;{'sup': '+', 'M represent an organic onium group;'}m is an integer of 0 to 10:n is a positive integer.3. A photoacid generator compound of the following formula (IV):{'br': None, 'sub': 2', 'm', 'n', '3, 'sup': '+', '(R)—X—O(C═O)(CH)(CWY)SOM\u2003\u2003(IV)'}wherein R is a steroid structure,X is a linker;W and Y are each independently in each occurrence hydrogen or fluoro;{'sup': '+', 'Mrepresent an organic onium group;'}m is an integer of 0 to 10;n is a positive integer.6. A photoresist composition comprising a resin component and a photoacid generator compound of .7. A method for forming a photoresist relief image comprising:{'claim-ref': {'@idref': 'CLM-00006', 'claim 6'}, '(a) applying a coating layer of a photoresist composition of on a substrate;'}(b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image.8. A photoresist composition comprising a resin component and a photoacid generator compound of .9. A photoresist composition comprising a resin component and a photoacid generator compound of .10. A photoresist composition comprising a resin component and a photoacid generator compound of .11. A photoresist composition comprising a resin component and a photoacid generator compound of .12. A method for forming a photoresist relief image comprising:{'claim-ref': {'@idref': 'CLM-00008', 'claim 8'}, '(a) applying a coating layer of a photoresist composition of on a substrate;'}(b) exposing the photoresist coating layer to patterned activating radiation and ...

ACID-CLEAVABLE MONOMER AND POLYMERS INCLUDING THE SAME

A monomer having formula (I): 2. The monomer of claim 1 , wherein the Carylene group is a monocyclic Carylene group claim 1 , a fused bicyclic Carylene group claim 1 , or a singly bonded Carylene group.3. The monomer of claim 1 , wherein Rand Rare different and each chosen from an unsubstituted Clinear or branched alkyl group.4. The monomer of claim 3 , wherein one of Rand Ris an unsubstituted Clinear or branched alkyl group and the other one of Rand Ris a Clinear or branched alkyl group substituted with at least one fluorine atom.5. The monomer of claim 1 , wherein n is 1 claim 1 , 2 claim 1 , or 3.6. A copolymer comprising a polymerized product of a monomer of .7. The copolymer of claim 6 , further comprising a polymerized product of a base-soluble monomer claim 6 , a lactone-containing monomer claim 6 , or a combination thereof.9. The copolymer of claim 6 , further comprising a polymerized product of a monomer comprising a photoacid generator.11. A photoresist composition comprising:{'claim-ref': {'@idref': 'CLM-00006', 'claim 6'}, 'a copolymer of ;'}a photoacid generator; anda solvent.14. A coated substrate claim 11 , comprising: (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition of over the one or more layers to be patterned.15. A method of forming an electronic device claim 11 , comprising:{'claim-ref': {'@idref': 'CLM-00011', 'claim 11'}, '(a) applying a layer of the photoresist composition of over a surface of the substrate;'}(b) pattern-wise exposing the photoresist composition layer to activating radiation; and(c) developing the exposed photoresist composition layer to provide a resist relief image.16. The monomer of claim 1 , wherein one of Rand Ris an unsubstituted or substituted Clinear or branched alkyl group and the other one of Rand Ris an unsubstituted or substituted Cbranched alkyl group claim 1 , a Clinear or branched alkyl group substituted with at least one fluorine atom ...

SYSTEMS AND METHODS FOR WEARABLE VOLTAGE DETECTION DEVICES

A voltage detection device for detecting proximity to an active alternating current (AC) voltage source is provided. The device includes a housing, at least one antenna configured to generate a signal in response to exposure to electromagnetic radiation, signal processing circuitry configured to process the signal generated by the at least one antenna, a processing device embedded in the housing and communicatively coupled to the signal processing circuitry, the processing device configured to determine, from the processed signal, whether the voltage detection device is proximate to the active AC voltage source, and an electronic switch embedded in the housing and one of included within the processing device and communicatively coupled to the processing device, the electronic switch configured to reduce an impact of interference on detection of the active AC voltage source. 1. A voltage detection device for detecting proximity to an active alternating current (AC) voltage source , said voltage detection device comprising:a housing sized and shaped to be worn by a user;at least one antenna embedded in said housing, said at least one antenna configured to generate a signal in response to exposure to electromagnetic radiation; at least one amplifier, each amplifier communicatively coupled to a different antenna of said at least one antenna and configured to amplify the signal generated by said antenna;', 'a first filter communicatively coupled to a single amplifier of said at least one amplifier and configured to filter the amplified signal output by said amplifier;', 'a second filter communicatively coupled to a single amplifier of said at least one amplifier and configured to filter the amplified signal output by said amplifier; and', 'a signal combiner communicatively coupled to each of said first and second filters, said signal combiner configured to combine the outputs of said first and second filters into a processed signal;, 'signal processing circuitry embedded ...

Methods, apparatuses, and systems for providing transfer block indication in uplink grant-free transmissions

A system, apparatus, method, and non-transitory computer readable medium for providing transfer block indications in uplink (UL) grant-free transmissions may include a memory having computer readable instructions stored thereon, and at least one processor configured to execute the computer readable instructions to transmit a first transport block (TB) to a base station (BS) during a first transmission time interval (TTI) using a grant-free UL transmission, receive a UL grant from the BS in a physical downlink control channel (PDCCH) region during a time window, determine a target of the UL grant, the target including at least one of the first TB, a second TB, or a previously transmitted TB, based on the UL grant, and transmitting the target of the UL grant to the BS.

FUEL CELL INTERCONNECT WITH REDUCED VOLTAGE DEGRADATION OVER TIME

A method of making an interconnect for a solid oxide fuel cell stack includes providing a chromium alloy interconnect and providing a nickel mesh in contact with a fuel side of the interconnect. Formation of a chromium oxide layer is reduced or avoided in locations between the nickel mesh and the fuel side of the interconnect. A Cr—Ni alloy or a Cr—Fe—Ni alloy is located at least in the fuel side of the interconnect under the nickel mesh. 1. A method of making an interconnect for a solid oxide fuel cell stack , comprising:providing a chromium alloy interconnect; andproviding a nickel mesh in contact with a fuel side of the interconnect;wherein formation of a chromium oxide layer is reduced or avoided in locations between the nickel mesh and the fuel side of the interconnect.2. The method of claim 1 , further comprising a Cr—Ni alloy or a Cr—Fe—Ni alloy located at least in the fuel side of the interconnect under the nickel mesh.3. The method of claim 1 , wherein the formation of the chromium oxide layer is reduced or avoided by at least one of increasing compression pressure between the nickel mesh and the interconnect claim 1 , providing undiffused Fe in the interconnect under the nickel mesh claim 1 , reducing surface contamination between the interconnect and the nickel mesh claim 1 , attaching the nickel mesh to the interconnect claim 1 , adding nickel to the interconnect alloy claim 1 , or coating a metal or metal oxide contact layer over ribs on the fuel side of the interconnect.4. (canceled)5. The method of claim 3 , wherein the formation of the chromium oxide layer is reduced or avoided by increasing the compression pressure between the nickel mesh and the interconnect by generating a pressure field or gradient on the mesh.6. The method of claim 5 , wherein interconnect ribs in a middle of the interconnect have a greater height than interconnect ribs in a periphery of the interconnect to generate the pressure field or gradient on the mesh in a solid oxide ...

DETECTION SYSTEM INCLUDING SENSOR AND METHOD OF OPERATING SUCH

A detection system to detect an object in a blowout prevention system of a production system includes a sensor coupled to the blowout prevention system and configured to send an ultrasonic pulse toward the object. The sensor is further configured to receive a signal including the ultrasonic pulse and noise after the ultrasonic pulse interacts with the object. The detection system also includes a controller coupled to the sensor and configured to identify the ultrasonic pulse in the signal using a first cancellation signal at a first time and a second cancellation signal at a second time. The controller is further configured to determine that the first cancellation signal corresponds to the noise in the signal at the first time, and determine that the second cancellation signal corresponds to the noise in the signal at the second time. The controller is configured to determine a characteristic of the object based on the ultrasonic pulse. 1. A detection system to detect an object in a blowout prevention system of a production system , said detection system comprising:a sensor coupled to the blowout prevention system and configured to send an ultrasonic pulse toward the object, wherein said sensor is further configured to receive a signal including the ultrasonic pulse and noise after the ultrasonic pulse interacts with the object; anda controller coupled to said sensor and configured to identify the ultrasonic pulse in the signal using a first cancellation signal at a first time and a second cancellation signal at a second time, wherein said controller is further configured to determine that the first cancellation signal corresponds to the noise in the signal at the first time, and determine that the second cancellation signal corresponds to the noise in the signal at the second time, and wherein said controller is configured to determine a characteristic of the object based on the ultrasonic pulse.2. The detection system in accordance with claim 1 , wherein said ...