26-07-2018 дата публикации
Номер: US20180212146A1
Принадлежит:
Subject matter disclosed herein may relate to fabrication of correlated electron materials used, for example, to perform specified application performance parameters. In embodiments, CEM devices fabricated at a first stage of a wafer fabrication process, such as a front-end-of-line stage, may differ from CEM devices fabricated at a second stage of a wafer fabrication process, such as a middle-of-line stage or a back-end-of-line stage, for example. 1. A method of forming one or more correlated electron material (CEM) devices at a stage of a fabrication process , comprising:determining electrical characteristics of the one or more CEM devices to be formed at the stage of the fabrication process; and 'forming one or more CEM devices at the fabrication stage according to physical dimensional parameters or compositional parameters, or a combination thereof.', 'in response to determining the electrical characteristics, and in response to specified application performance parameters of the one or more CEM devices2. The method of claim 1 , wherein forming the one or more CEM devices occurs at a middle-of-line stage of the fabrication stage claim 1 , the one or more CEM devices to operate as an interconnect.3. The method of claim 2 , wherein forming comprises forming the one or more CEM devices to exhibit a resistance of less than 1.6 microohm-cm in a low-resistance state.4. The method of claim 3 , wherein forming comprises providing a dopant during forming of the one or more CEM devices to bring about an atomic concentration of dopant within at least a portion of the CEM of between 0.1% and 15.0%.5. The method of claim 2 , wherein the forming the one or more CEM devices comprises forming at least one CEM device to exhibit a resistance of greater than 16.0 microohm-cm in a high-resistance state.6. The method of claim 1 , wherein the forming of the one or more CEM devices comprising forming at least one CEM device to operate as a logic device at a front-end-of-line stage of ...
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