Animal feed additives based on fermentation broth and production process thereof by granulation

A process for the production of animal feed additives from fermentation broth containing L-lysine is disclosed. The process does not require filtering of biomass in order to remove the biomass and produces granulated lysine of controllable lysine content with a high bulk density, low viscosity, and a low hygroscopic property which does not require the addition of an anti-absorptive substance. In this process, a lysine fermentation broth produced after slant culture, flask culture, seed process, and cultivation process is concentrated to a solid content of about 4452%. A product with low hygroscopicity, high bulk density, and the intended amount of contents is produced after being mixed with substances for controlling the amount of contents and granulated by coating the surface of the seeds. This process enables a production of animal feed additives having a lysine-HCl content of at least 65%, a water content of at most 3%, and a bulk density of 670±50 kg/m3.

Animal feed additives based on fermentation broth and production process thereof by granulation

A process for the production of animal feed additives from fermentation broth containing L-lysine is disclosed. The process does not require filtering of biomass in order to remove the biomass and produces granulated lysine of controllable lysine content with a high bulk density, low viscosity, and a low hygroscopic property which does not require the addition of an anti-absorptive substance. In this process, a lysine fermentation broth produced after slant culture, flask culture, seed process, and cultivation process is concentrated to a solid content of about 44˜52%. A product with low hygroscopicity, high bulk density, and the intended amount of contents is produced after being mixed with substances for controlling the amount of contents and granulated by coating the surface of the seeds. This process enables a production of animal feed additives having a lysine-HCl content of at least 65%, a water content of at most 3%, and a bulk density of 670±50 kg/m3.

Semiconductor device

A semiconductor device includes a first interlayer insulating film; a conductive connection structure provided in the first interlayer insulating film; a second interlayer insulating film provided on the first interlayer insulating film; a wiring structure provided in the second interlayer insulating film and connected to the conductive connection structure; and an insertion liner interposed between an upper surface of the conductive connection structure and the wiring structure, the insertion liner including carbon.

Semiconductor device

A semiconductor device and a method of fabricating a semiconductor device, the device including a fin-type pattern extending in a first direction; a gate electrode extending in a second direction over the fin-type pattern, the second direction being different from the first direction; spacers on sidewalls of the gate electrode; a capping structure on the gate electrode and the spacers, the capping structure including a first capping pattern and a second capping pattern, the second capping pattern being on the first capping pattern; and an interlayer insulating film surrounding sidewalls of each of the spacers and sidewalls of the capping structure, the interlayer insulating film being in contact with the first capping pattern.

INDUSTRIAL METHOD FOR THE PREPARATON OF HIGH-PURITY METHIOZOLIN

Provided is an industrial method for the preparation of [5-{(2,6-difluorobenzyloxy)methyl}-4,5-dihydro-5-methyl-3-(3-methylthiophene-2-yl)-isoxazole](common name: methiozolin) represented by Formula 1 that is a herbicidal substance in high-purity. 2. The method of claim 1 , wherein the organic solvent is selected from the group consisting of benzene claim 1 , toluene claim 1 , xylene claim 1 , chlorobenzene claim 1 , and 1 claim 1 ,2-dichloroethane.3. The method of claim 1 , wherein the alkali metal salt is selected from the group consisting of sodium hydroxide claim 1 , potassium hydroxide claim 1 , and lithium hydroxide.4. The method of claim 1 , wherein the phase transfer catalyst is selected from the group consisting of tetrabutylammoniumhydrogensulfate claim 1 , tetrabutylammoniumbromide claim 1 , and tetrabutylphosphoniumbromide.5. The method of claim 1 , wherein the mixed solvent used to purify methiozolin by crystallization of the concentrate of the isolated organic layer is a mixed solvent comprising water and a Cto Calcohol or a mixed solvent comprising a Cto Calcohol and a Cto Caliphatic hydrocarbon.6. The method of claim 5 , wherein the mixed solvent used to purify methiozolin by crystallization of the concentrate of the isolated organic layer is a mixed solvent comprising water and isopropanol or a mixed solvent comprising isopropanol and n-heptane.7. The method of claim 1 , wherein toluene is used as the organic solvent of the mixed solvent system comprising water and the organic solvent claim 1 , sodium hydroxide is used as the base claim 1 , tetrabutylphosphoniumbromide is used as the phase transfer catalyst claim 1 , a reaction temperature is in a range of 60 to 65° C. claim 1 , and the concentrate of the organic layer is crystallized in a mixed solvent comprising isopropanol and n-heptane.8. The method of claim 1 , wherein the high-purity indicates a purity of 99% or more. The present invention relates to an industrial method for the preparation of ...

PYRIDINE-BASED COMPOUND INCLUDING ISOXAZOLINE RING AND USE THEREOF AS HERBICIDE

A pyridine-based compound containing an isoxazoline ring represented by Formula 1 or an agrochemically acceptable salt thereof can be used as a herbicide. A method of preparing the pyridine-based compound containing an isoxazoline ring represented by Formula 1 includes reacting a compound represented by Formula 2 with a compound represented by Formula 3. 3: The compound of claim 1 , wherein Ris H claim 1 , a methyl group claim 1 , an ethyl group claim 1 , or a benzyl group;{'sub': '2', 'Ris H or a methyl group;'}n is an integer of 0 to 1;{'sub': 3', '4', '3', '4, 'X is —NRRwherein Rand Rare each independently H, a methyl group, or a C(O)methyl group;'}Y is CH, CCl, CF, or N; andZ is H, Br, Cl, a methyl group, a tert-butyl group, or a trifluoromethyl group.4: The compound of claim 1 , wherein the compound is any one compound selected from the group consisting of:methyl 4-amino-3-chloro-6-(3-chloro-4,5-dihydroisoxazol-5-yl)picolinate;4-amino-3-chloro-6-(3-chloro-4,5-dihydroisoxazol-5-yl)picolinic acid;methyl 4-amino-3-chloro-6-(3-methyl-4,5-dihydroisoxazol-5-yl)picolinate;4-amino-3-chloro-6-(3-methyl-4,5-dihydroisoxazol-5-yl)picolinic acid;methyl 4-amino-3-chloro-6-(3-bromo-4,5-dihydroisoxazol-5-yl)picolinate;4-amino-3-chloro-6-(3-bromo-4,5-dihydroisoxazol-5-yl)picolinic acid;methyl 4-amino-3-chloro-6-(3-trifluoromethyl-4,5-dihydroisoxazol-5-yl)picolinate;4-amino-3-chloro-6-(3-trifluoromethyl-4,5-dihydroisoxazol-5-yl)picolinic acid;methyl 4-amino-3-chloro-6-(3-tert-butyl-4,5-dihydroisoxazol-5-yl)picolinate;4-amino-3-chloro-6-(3-tert-butyl-4,5-dihydroisoxazol-5-yl)picolinic acid;methyl 4-amino-3-chloro-6-(4,5-dihydroisoxazol-5-yl)picolinate;methyl 4-amino-3-chloro-6-(3-bromo-5-methyl-4,5-dihydroisoxazol-5-yl)picolinate;4-amino-3-chloro-6-(3-bromo-5-methyl-4,5-dihydroisoxazol-5-yl)picolinic acid;methyl 4-amino-3-chloro-6-(3-chloro-5-methyl-4,5-dihydroisoxazol-5-yl)picolinate;methyl 4-amino-6-((3-chloro-4,5-dihydroisoxazol-5-yl)methyl)-3-chloropicolinate;4-amino-6-((3- ...

PHENYLISOXAZOLINE-BASED COMPOUND HAVING HERBICIDAL ACTIVITY AND USE THEREOF

Provided are an ortho-substituted phenylisoxazoline-based compound with 2,6-difluorobenzyloxymethyl represented by Formula 1, or a racemate or enantiomer thereof, a herbicide including the ortho-substituted phenylisoxazoline-based compound, or the racemate or enantiomer thereof as an active ingredient, and a method of selectively controlling grass weed comprising treating with the ortho-substituted phenylisoxazoline-based compound, or the racemate or enantiomer thereof before or after the grass weed emerges.

Semiconductor device

A semiconductor device and a method of fabricating a semiconductor device, the device including a fin-type pattern extending in a first direction; a gate electrode extending in a second direction over the fin-type pattern, the second direction being different from the first direction; spacers on sidewalls of the gate electrode; a capping structure on the gate electrode and the spacers, the capping structure including a first capping pattern and a second capping pattern, the second capping pattern being on the first capping pattern; and an interlayer insulating film surrounding sidewalls of each of the spacers and sidewalls of the capping structure, the interlayer insulating film being in contact with the first capping pattern.

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME

Semiconductor devices and methods for fabricating the same are provided. A semiconductor device may include a substrate including first and second regions, a first interface film disposed on the substrate in the first region, a second interface film disposed on the substrate in the second region, a dielectric film disposed on the first and second interface films, a first metal film disposed on the dielectric film in the first region, and a second metal film disposed on the dielectric film in the second region. The first and second interface films may comprise an oxide of the substrate, the first and second metal films may comprise different materials, and the first and second interface films may have different thicknesses. Channels may be provided in the first and second regions, and the channels may be fin-shaped or wire-shaped. The metal films may have different oxygen content. 2. The semiconductor device of claim 1 , whereinthe substrate includes a first channel, which extends in a first direction, in the first region,the substrate includes a second channel, which extends in a second direction, in the second region, anda cross-sectional area of the second channel in a direction perpendicular to the second direction is different from a cross-sectional area of the first channel in a direction perpendicular to the first direction.3. The semiconductor device of claim 2 , wherein the substrate further includes first source/drain regions claim 2 , which are disposed on both sides of the first channel in the first direction claim 2 , and second source/drain regions claim 2 , which are disposed on both sides of the second channel in the second direction claim 2 , a first gap-fill metal claim 2 , which is disposed on the first metal film claim 2 , and a second gap-fill metal claim 2 , which is disposed on the second metal film.4. The semiconductor device of claim 2 , whereinthe first and second channels are fin-shaped and protrude from the substrate to extend in the first ...

Pyridine-based compound including isoxazoline ring and use thereof as herbicide

The present invention relates to: any one compound selected from the group consisting of pyridine-based compounds including an isoxazoline ring represented by Formula 1 and agriculturally acceptable salts thereof; a herbicide including the compound of Formula 1, an agriculturally acceptable salt thereof, or a mixture thereof as an active component; and a method for preparing a pyridine-based compound including an isoxazoline ring represented by Formula 1 from a reaction involving compounds represented by Formula 2 and Formula 3.

Phenylisoxazoline compound having herbicidal properties and use thereof

Provided are an ortho-substituted phenylisoxazoline-based compound with 2,6-difluorobenzyloxymethyl represented by Formula 1, or a racemate or enantiomer thereof, a herbicide including the ortho-substituted phenylisoxazoline-based compound, or the racemate or enantiomer thereof as an active ingredient, and a method of selectively controlling grass weed comprising treating with the ortho-substituted phenylisoxazoline-based compound, or the racemate or enantiomer thereof before or after the grass weed emerges.

Industrial method for manufacturing high-purity methiozoline

Provided is an industrial method for the preparation of [5-{(2,6-difluorobenzyloxy)methyl}-4,5-dihydro-5-methyl-3-(3-methylthiophene-2-yl)-isoxazole] (common name: methiozolin) represented by Formula 1 that is a herbicidal substance in high-purity.

Process for the preparation of granular L-lysine feed supplement

Phenylisoxazoline compound having herbicidal properties and use thereof

Method of recovering l-threonine from l-threonine fermentation broth using nonsolvent

L-TREONINE RECOVERY METHOD FROM L-TREONINE, CRYSTALLINE L-TREONINE AND FOOD ADDITIVE PRODUCTION MICROORGANISM

Industrial method for manufacturing high-purity methiozolin

The present invention relates to an industrial method, according to Reaction Scheme 1, for manufacturing highly pure [5-{2,6-difluorobenzyloxy}methyl]-4,5-dihydro-5-methyl-3-(3-methylthiophene-2-yl)-isoxazole] (generic name: methiozoline), which is represented by chemical Formula 1 and is an herbicidal substance. [Reaction Scheme 1] (see formula 2) (see formula 3) (see formula 4)

Pyridine-based compound including isoxazoline ring and use thereof as herbicide

Provided are any one compound selected from a pyridine-based compound containing an isoxazoline ring represented by Formula 1 and an agrochemically acceptable salt thereof; a herbicide including, as an active ingredient, the pyridine-based compound containing an isoxazoline ring represented by Formula l, the agrochemically acceptable salt thereof, or a combination of the pyridine-based compound containing an isoxazoline ring represented by Formula l and the agrochemically acceptable salt thereof; and a method of preparing the pyridine-based compound containing an isoxazoline ring represented by Formula 1 by reacting a compound represented by Formula 2 with a compound represented by Formula 3.

Pyridine-based compound including isoxazoline ring, and use thereof as herbicide

Pyridine-based compound including isoxazoline ring, and use thereof as herbicide

The present invention relates to: any one compound selected from the group consisting of pyridine-based compounds including an isoxazoline ring represented by Formula 1 and agriculturally acceptable salts thereof; a herbicide including the compound of Formula 1, an agriculturally acceptable salt thereof, or a mixture thereof as an active component; and a method for preparing a pyridine-based compound including an isoxazoline ring represented by Formula 1 from a reaction involving compounds represented by Formula 2 and Formula 3.

Semiconductor device

A semiconductor device and a method of fabricating a semiconductor device, the device including a fin-type pattern extending in a first direction; a gate electrode extending in a second direction over the fin-type pattern, the second direction being different from the first direction; spacers on sidewalls of the gate electrode; a capping structure on the gate electrode and the spacers, the capping structure including a first capping pattern and a second capping pattern, the second capping pattern being on the first capping pattern; and an interlayer insulating film surrounding sidewalls of each of the spacers and sidewalls of the capping structure, the interlayer insulating film being in contact with the first capping pattern.

Semiconductor device

A semiconductor device and a method of fabricating a semiconductor device, the device including a fin-type pattern extending in a first direction; a gate electrode extending in a second direction over the fin-type pattern, the second direction being different from the first direction; spacers on sidewalls of the gate electrode; a capping structure on the gate electrode and the spacers, the capping structure including a first capping pattern and a second capping pattern, the second capping pattern being on the first capping pattern; and an interlayer insulating film surrounding sidewalls of each of the spacers and sidewalls of the capping structure, the interlayer insulating film being in contact with the first capping pattern.

Semiconductor device

A semiconductor device includes an active pattern; gate spacers on the active pattern defining a gate trench; a gate insulating layer along a sidewall and a bottom surface of the gate trench; a first conductive layer on the gate insulating layer; a second conductive layer on the first conductive layer in the gate trench; a third conductive layer on the second conductive layer in the gate trench and including a first portion between parts of the second conductive layer, and a second portion on the first portion and in contact with an upper surface of the second conductive layer; and a capping pattern on the second and third conductive layers and including a portion between the gate insulating layer and the second portion, and in contact with a sidewall of the second portion, wherein a width of the second portion is greater than a width of the first portion.

Semiconductor device

A semiconductor device and a method of fabricating a semiconductor device, the device including a fin-type pattern extending in a first direction; a gate electrode extending in a second direction over the fin-type pattern, the second direction being different from the first direction; spacers on sidewalls of the gate electrode; a capping structure on the gate electrode and the spacers, the capping structure including a first capping pattern and a second capping pattern, the second capping pattern being on the first capping pattern; and an interlayer insulating film surrounding sidewalls of each of the spacers and sidewalls of the capping structure, the interlayer insulating film being in contact with the first capping pattern.

Phenylisoxazoline-based compound having herbicidal activity and use thereof

Provided are an ortho-substituted phenylisoxazoline-based compound with 2,6-difluorobenzyloxymethyl represented by Formula 1, or a racemate or enantiomer thereof, a herbicide including the ortho-substituted phenylisoxazoline-based compound, or the racemate or enantiomer thereof as an active ingredient, and a method of selectively controlling grass weed comprising treating with the ortho-substituted phenylisoxazoline-based compound, or the racemate or enantiomer thereof before or after the grass weed emerges.